JPS63102928A - Metallic film laminate - Google Patents

Abstract

(57) [Abstract] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

[Detailed Description of the Invention] <Industrial Application Field> The present invention relates to a transparent metal film laminate with excellent adhesion to a transparent substrate, and by presenting such a metal film laminate, It is intended for industrial use.

(Conventional technology) Conventionally, transparent conductive members made of metal film laminates can be applied to many applications such as surface heating elements, touch panels, and electromagnetic shielding materials. Those on which a conductive metal layer was formed tended to have insufficient adhesion between the transparent substrate surface and the metal surface.

On the other hand, if an appropriate binder is added to the conductive metal layer, it may impede its conductivity and transparency.
It is difficult to use as a transparent conductive member, and a conductive metal layer must be formed directly by some physical method. However, as mentioned above, when a metal layer is directly attached to a transparent substrate, its strength tends to be insufficient.
Currently, methods for increasing the adhesion strength of the metal layer are implemented as needed.

Measures to Solve the Problems> In view of the current situation, the present inventors have repeatedly conducted various studies on an intermediate layer that improves the adhesion strength of the metal layer and does not cause a decrease in transparency, and as a result, has finally developed the present invention. The unique feature is that one side of the transparent base material in the metal film laminate is a conductive metal layer formed through one metal oxide layer made of indium-tin oxide. be.

Next, the means for solving the problem will be described in more detail.

The transparent substrate according to the present invention can be exemplified by films, sheets, etc. made of relatively transparent polymeric materials such as polyethylene terephthalate, polyethersulfone, polyarylate, polycarbonate, polybutylene terephthalate, etc. Glass and the like can also be used, and there is no particular limitation in this case.

It goes without saying that the films, sheets, etc. described above may be unstretched, or may be -axially or biaxially stretched, and may be crystalline or non-stretched. .

Indium-tin oxide includes, for example, indium oxide containing tin oxide, and in this case, the content of tin oxide is not particularly limited, but is generally 3 to 20% by weight.
That's about it.

The conductive metal layer refers to a conductive metal thin film layer, and examples of metals include gold, platinum, silver, palladium, nickel, chromium, and alloys thereof, and are not particularly limited. In the present invention, an appropriate metal may be used depending on the application. For example, when used as a surface heating element, a metal with a surface resistance value of 1 to 500 Ω/hole, preferably 1 to 10 Ω/hole is used. is desirable. Of course,
The surface resistance value is merely a guideline and is not particularly limited, and may be set to an appropriate value depending on the required temperature, applied voltage, etc., for example. At this time, care must be taken because unless the resistance value is above a certain level, current will not flow even if voltage is applied, and heat may not be generated.

Examples of methods for forming a metal oxide layer and a conductive metal layer on a transparent substrate include sputtering method, vacuum evaporation method,
Examples include ion blating method, chemical plating method, and vapor phase method. The one shown in Figure 1 is a transparent base material (1
This is a transparent metal film laminate in which a metal oxide layer (2) made of indium-tin oxide is sputtered on one side of the transparent base material ( There is no particular restriction on the thickness of 1) and each layer (2) and (3), but usually the metal oxide layer (2) is 1
00 OA'' or less, preferably about 100 to 500 A'' is sufficient, and the metal layer (3) also has a thickness of 100 OA'' or less, preferably about 100 to 500 A''.

Naturally, an embodiment in which a metal oxide layer (2) and a metal layer (3) are formed on both sides of the transparent base material (1) is also within the scope of one embodiment of the present invention.

Applications of the metal film laminate according to the present invention include surface heating elements, touch panels, electromagnetic shielding materials, electroluminescence, heat ray shielding materials, anti-glare panels, etc., and there are no particular limitations, and the metal film laminate can be applied to any application as necessary. It is possible.

<Example 1> Indium-tin oxide (indium oxide containing 5% by weight of tin oxide) was formed on one side of a biaxially stretched transparent polyethylene terethalate film having a thickness of 1004 mm by sputtering, A metal oxide layer with a thickness of 200 A was obtained.Next, gold was further formed on the formed metal oxide layer by sputtering, and a thickness of 20 A was obtained.
A metal layer of 0A" was obtained.

These sputtering conditions are as follows.

Metal oxide layer Metal layer gas Argon + oxygen Argon pressure
I X I O Torr I X 10Torr
Applied voltage 1w/cra” 1w/cm
! The thus obtained transparent conductive metal film laminate had a surface resistance value of 20.6 Ω/hole, a transparency of 69.8%, and a JI
A friction test was conducted according to S-LO849 under the conditions of a load of 100g and a test cloth of nylon taffeta No. 15 (resistance after test/resistance before test = 1.02), and the resistance value before and after the test was almost unchanged. Ta. From this, it can be said that there is almost no peeling of the metal layer due to friction. In addition, tape peeling slat (J I 5-DO202
) were also good.

On the other hand, a transparent conductive film obtained by sputtering gold directly onto the same polyethylene terephthalate film under the same conditions had a surface resistance of 20.007 mm, a transparency of 70.0%, and a friction test result of The value of [resistance after test/resistance before test] was extremely large. The fact that this value is greater than 0, which indicates that most of the sputtered metal layer has been peeled off, reveals the exceptional effect of the present invention.

<Example 2> The transparent conductive film obtained in Example (1) was cut to have a width x length of 80 mm x 100 mm in order to be used as a surface heating element, and an extraction circuit was printed on both sides in the width direction. When a voltage of 12 V (1, IA) was applied to the transparent conductive film, the temperature reached 45° C. at room temperature. In addition, this 12V corresponds to the battery voltage of many cars,
This also shows that the transparent conductive film obtained in this example can be suitably used as a surface heating element for automobile glass.

(Effects of the invention) As described above, the metal film laminate of the present invention has significantly improved adhesion strength of the metal layer compared to the conventional one, so it is easy to use repeatedly. It does not cause peeling of the metal layer and can be applied to a variety of applications, and is expected to have even more applications in the future.

[Brief explanation of the drawing]

FIG. 1 is a sectional view showing an embodiment of a metal film laminate according to the present invention.

Claims (1)

[Claims] A metal film laminate, characterized in that one side of a transparent substrate is a conductive metal layer formed through a metal oxide layer made of indium-tin oxide.