TWI722088B - 感光性組成物、由此所成的硬化物之製造方法及該硬化物 - Google Patents

感光性組成物、由此所成的硬化物之製造方法及該硬化物 Download PDF

Info

Publication number
TWI722088B
TWI722088B TW106100614A TW106100614A TWI722088B TW I722088 B TWI722088 B TW I722088B TW 106100614 A TW106100614 A TW 106100614A TW 106100614 A TW106100614 A TW 106100614A TW I722088 B TWI722088 B TW I722088B
Authority
TW
Taiwan
Prior art keywords
group
bis
anthracene
meth
photosensitive composition
Prior art date
Application number
TW106100614A
Other languages
English (en)
Chinese (zh)
Other versions
TW201738660A (zh
Inventor
千坂博樹
引田二郎
木下哲郎
塩田大
Original Assignee
日商東京應化工業股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商東京應化工業股份有限公司 filed Critical 日商東京應化工業股份有限公司
Publication of TW201738660A publication Critical patent/TW201738660A/zh
Application granted granted Critical
Publication of TWI722088B publication Critical patent/TWI722088B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
TW106100614A 2016-01-14 2017-01-09 感光性組成物、由此所成的硬化物之製造方法及該硬化物 TWI722088B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016005550A JP6788971B2 (ja) 2016-01-14 2016-01-14 感光性組成物
JP2016-005550 2016-01-14

Publications (2)

Publication Number Publication Date
TW201738660A TW201738660A (zh) 2017-11-01
TWI722088B true TWI722088B (zh) 2021-03-21

Family

ID=59335095

Family Applications (1)

Application Number Title Priority Date Filing Date
TW106100614A TWI722088B (zh) 2016-01-14 2017-01-09 感光性組成物、由此所成的硬化物之製造方法及該硬化物

Country Status (4)

Country Link
JP (1) JP6788971B2 (ja)
KR (1) KR102557630B1 (ja)
CN (1) CN106970503B (ja)
TW (1) TWI722088B (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101788399B1 (ko) * 2015-09-23 2017-10-19 (주)경인양행 내열안정성이 우수한 옥심 에스테르 화합물, 그것을 포함하는 광중합 개시제 및 감광성 수지 조성물
JP7008508B2 (ja) * 2016-09-30 2022-01-25 株式会社Ｄｎｐファインケミカル カラーフィルタ用感光性着色樹脂組成物、カラーフィルタ、及び表示装置
JP6968633B2 (ja) * 2017-09-07 2021-11-17 東京応化工業株式会社 感光性組成物、及びそれに用いられる光重合開始剤
WO2019187851A1 (ja) * 2018-03-29 2019-10-03 富士フイルム株式会社 感光性転写材料、電極保護膜、積層体、静電容量型入力装置、及び、タッチパネルの製造方法

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200739260A (en) * 2006-01-13 2007-10-16 Toyo Ink Mfg Co Diketoxime ester compound and use thererof
JP2010156879A (ja) * 2008-12-29 2010-07-15 Fujifilm Corp 感光性組成物、カラーフィルタ、及び液晶表示装置
TW201035049A (en) * 2009-01-30 2010-10-01 Fujifilm Corp Colored photopolymerizable composition, method for producing colored pattern, and color filter and liquid crystal display device with the color filter
WO2012045736A1 (en) * 2010-10-05 2012-04-12 Basf Se Oxime ester derivatives of benzocarbazole compounds and their use as photoinitiators in photopolymerizable compositions
TW201425283A (zh) * 2012-09-28 2014-07-01 Daito Chemix Corp 茀系化合物、含有該茀系化合物之光聚合起始劑及含有該光聚合起始劑之感光性組成物
JP2014137466A (ja) * 2013-01-16 2014-07-28 Jsr Corp 感放射線性着色組成物、着色硬化膜及び表示素子
TW201518275A (zh) * 2013-09-10 2015-05-16 Basf Se 肟酯光起始劑

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6009774B2 (ja) * 2011-02-22 2016-10-19 東京応化工業株式会社 感光性樹脂組成物、並びにそれを用いたカラーフィルタ及び表示装置
JP6000942B2 (ja) * 2011-03-25 2016-10-05 株式会社Adeka オキシムエステル化合物及び該化合物を含有する光重合開始剤
JP5914379B2 (ja) * 2012-03-02 2016-05-11 富士フイルム株式会社 着色硬化性組成物およびカラーフィルタ
KR101518774B1 (ko) * 2012-05-03 2015-05-11 한국화학연구원 신규한 옥심에스테르 플로렌 화합물, 이를 포함하는 광중합 개시제 및 포토레지스트 조성물
JP2014134763A (ja) * 2012-12-11 2014-07-24 Jsr Corp 感放射線性樹脂組成物、表示素子用硬化膜、表示素子用硬化膜の形成方法及び表示素子
KR101508744B1 (ko) 2013-04-23 2015-04-07 대한민국 배추과 작물 종 판별을 위한 엽록체 ｄｎａ 마커 및 이를 이용한 판별 방법
JP6252039B2 (ja) * 2013-08-27 2017-12-27 凸版印刷株式会社 カラーフィルタ及び液晶表示装置
KR101435652B1 (ko) * 2014-01-17 2014-08-28 주식회사 삼양사 신규한 β-옥심에스테르 플루오렌 화합물, 이를 포함하는 광중합 개시제 및 포토레지스트 조성물
KR102190911B1 (ko) * 2014-07-15 2020-12-14 도쿄 오카 고교 가부시키가이샤 감광성 조성물 및 화합물
JP6195584B2 (ja) * 2015-02-04 2017-09-13 東京応化工業株式会社 着色剤分散液、それを含む感光性樹脂組成物、及び分散助剤
JP6195645B2 (ja) * 2015-07-21 2017-09-13 東京応化工業株式会社 着色感光性組成物
JP6088105B1 (ja) * 2015-08-27 2017-03-01 東京応化工業株式会社 感光性組成物、パターン形成方法、硬化物、及び表示装置
WO2017059772A1 (zh) * 2015-10-08 2017-04-13 常州强力电子新材料股份有限公司 一种含芴肟酯类光引发剂、其合成、含有其的感光性树脂组合物及其应用

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200739260A (en) * 2006-01-13 2007-10-16 Toyo Ink Mfg Co Diketoxime ester compound and use thererof
JP2010156879A (ja) * 2008-12-29 2010-07-15 Fujifilm Corp 感光性組成物、カラーフィルタ、及び液晶表示装置
TW201035049A (en) * 2009-01-30 2010-10-01 Fujifilm Corp Colored photopolymerizable composition, method for producing colored pattern, and color filter and liquid crystal display device with the color filter
WO2012045736A1 (en) * 2010-10-05 2012-04-12 Basf Se Oxime ester derivatives of benzocarbazole compounds and their use as photoinitiators in photopolymerizable compositions
TW201425283A (zh) * 2012-09-28 2014-07-01 Daito Chemix Corp 茀系化合物、含有該茀系化合物之光聚合起始劑及含有該光聚合起始劑之感光性組成物
JP2014137466A (ja) * 2013-01-16 2014-07-28 Jsr Corp 感放射線性着色組成物、着色硬化膜及び表示素子
TW201518275A (zh) * 2013-09-10 2015-05-16 Basf Se 肟酯光起始劑

Also Published As

Publication number Publication date
JP6788971B2 (ja) 2020-11-25
CN106970503A (zh) 2017-07-21
KR20170085444A (ko) 2017-07-24
JP2017125972A (ja) 2017-07-20
CN106970503B (zh) 2022-02-01
KR102557630B1 (ko) 2023-07-20
TW201738660A (zh) 2017-11-01

Similar Documents

Publication Publication Date Title
JP6617132B2 (ja) 感光性組成物及び化合物
JP6860978B2 (ja) 感光性組成物
TWI722088B (zh) 感光性組成物、由此所成的硬化物之製造方法及該硬化物
TWI723005B (zh) 著色劑分散液、含此的感光性樹脂組成物、及分散助劑
TWI774844B (zh) 感光性樹脂組成物、硬化膜、顯示裝置、及圖型形成方法
JP6713112B2 (ja) 化合物及びその製造方法
TWI677524B (zh) 著色感光性組合物
TW201736521A (zh) 化合物、含有其的彩色組成物、含有其的樹脂組成物、彩色濾光片以及顯示裝置
TWI551947B (zh) A photosensitive resin composition, a pattern forming method, a color filter, and a display device
TW202030554A (zh) 感光性樹脂組合物、經圖案化之硬化膜的製造方法、及經圖案化之硬化膜
TW201827926A (zh) 感光性組合物、感光性組合物之製造方法、光聚合起始劑及光聚合起始劑之調製方法
TW201820033A (zh) 感光性組合物及硬化膜之形成方法
TWI773813B (zh) 感光性組合物及用於其之光聚合起始劑
TW202000796A (zh) 化合物、聚合物、著色材料組成物、樹脂組成物、彩色濾光器以及顯示裝置