TWI697664B - Mura quantifying system by laser crystallization facility and mura quantifying method by laser crystallization facility - Google Patents
Mura quantifying system by laser crystallization facility and mura quantifying method by laser crystallization facility Download PDFInfo
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Abstract
Description
本發明關於一種雲紋量化系統及方法,更明確地關於一種透過雷射結晶設備之雲紋量化系統、及一種透過雷射結晶設備之雲紋量化方法,該系統藉由量化一基板中之雲紋來即時判定基板的品質以提供穩定的製程管理,其中該基板在一雷射結晶裝置中結晶化。The present invention relates to a moiré quantification system and method, and more specifically to a moiré quantification system through laser crystallization equipment, and a moiré quantification method through laser crystallization equipment. The system quantifies the clouds in a substrate The pattern is used to instantly determine the quality of the substrate to provide stable process management, where the substrate is crystallized in a laser crystallization device.
通常需要將譬如非晶質矽薄膜(amorphous silicon thin film)等非晶質多晶形薄膜(amorphous polycrystalline thin film)結晶化之製程,以製造譬如液晶顯示器或太陽能元件等電氣/電子元件。A process of crystallization of amorphous polycrystalline thin films such as amorphous silicon thin films is usually required to manufacture electrical/electronic components such as liquid crystal displays or solar devices.
需要輻射具既定能量之雷射,以將非晶質矽薄膜結晶化成晶形矽薄膜(此後,為了方便,將待結晶化薄膜稱為「基板」)。該製程中之能量的密度被稱作能量密度(此後稱為「ED」),且具有將結晶化結果最佳化之條件的ED稱作最佳化能量密度(此後稱為「OPED」)。It is necessary to irradiate a laser with a predetermined energy to crystallize the amorphous silicon film into a crystalline silicon film (hereafter, for convenience, the film to be crystallized is referred to as a "substrate"). The density of energy in the process is called energy density (hereinafter referred to as "ED"), and ED with conditions for optimizing the crystallization result is called optimized energy density (hereinafter referred to as "OPED").
當以掃描式電子顯微鏡(SEM)針對曝露於一具有OPED之雷射下的產品進行觀察時,晶粒之方向均一致,且晶粒尺寸之均勻性亦屬最優。然而,由於製造程序所需之時間及人力,大體上不可能以SEM檢查所有產品。When using a scanning electron microscope (SEM) to observe a product exposed to a laser with OPED, the orientation of the crystal grains is consistent, and the uniformity of the crystal grain size is also optimal. However, due to the time and manpower required for the manufacturing process, it is generally impossible to inspect all products with SEM.
緣是,已建立一經由目視檢測來選擇OPED之標準,其被稱作雲紋,且係基於雲紋的強度、發生頻率、及發生趨勢來判定OPED。當以目視檢測已歷經ED分裂(在不同ED下,對數十毫米之區域實施結晶化的試驗)之產品時,將難以觀察雲紋,且在OPED區域中可較在ED區域中清楚地察看該產品,及當從OPED區域到一較高ED區域時,將顯現許多雲紋。OPED將依此方式被選定。The reason is that a standard for selecting OPED through visual inspection has been established, which is called moiré, and it is determined based on the intensity, frequency, and trend of the moiré. When visually inspecting a product that has undergone ED splitting (a test of crystallization of an area of tens of millimeters under different EDs), it will be difficult to observe the moiré, and it can be seen more clearly in the OPED area than in the ED area This product, and when moving from the OPED area to a higher ED area, will show a lot of moiré. OPED will be selected in this way.
另一方面,使用雷射之結晶化製程係掃描製程,其中雷射脈衝將重疊,且將在重疊區域中因不同於周圍之能量差異而產生雲紋。如此產生之條紋被稱作點(shot)雲紋。On the other hand, the crystallization process using lasers is a scanning process, in which the laser pulses will overlap, and moiré will be generated in the overlap area due to the energy difference different from the surroundings. The fringes thus produced are called shot moiré.
又,當待結晶化基板被掃描,且對目標薄膜實施結晶化時,將藉線性雷射光束之不均勻性產生色斑,其被稱作掃描雲紋。In addition, when the substrate to be crystallized is scanned and the target film is crystallized, the unevenness of the linear laser beam will generate color spots, which is called scanning moiré.
為了在藉結晶裝置進行結晶化後,檢查產品的品質,已使用在試驗儀器中目視檢驗產品的目視檢測。In order to check the quality of the product after the crystallization device is used for crystallization, visual inspection has been used to visually inspect the product in a testing instrument.
然而,目視偵測雲紋有其限制,且依據位置產生各不同型態之雲紋,而難以檢查該雲紋。又,檢測人員有檢測差異,使檢測之生產力、準確度、及重現性較低。更,由於需要檢測人員,因此將浪費人力及成本。However, visual detection of moiré has its limitations, and different types of moiré are generated depending on the location, and it is difficult to inspect the moiré. In addition, the detection personnel have detection differences, which makes the detection productivity, accuracy, and reproducibility low. Moreover, due to the need for inspection personnel, manpower and cost will be wasted.
本發明之一目的係提供一種透過雷射結晶設備之雲紋量化系統、及一種透過雷射結晶設備之雲紋量化方法,該系統藉由量化一基板中之雲紋來即時判定基板的品質以提供穩定的製程管理,其中該基板在一雷射結晶裝置中結晶化。An object of the present invention is to provide a moiré quantification system through laser crystallization equipment and a moiré quantification method through laser crystallization equipment. The system quantifies the moiré in a substrate to determine the quality of the substrate in real time. Provide stable process management, where the substrate is crystallized in a laser crystallization device.
為達成以上目的,依據本發明之一構想,提供一種透過包含有雷射結晶裝置之雷射結晶設備的雲紋量化系統,其中該雲紋量化裝置被設於該雷射結晶設備中,使得一基板藉該雷射結晶裝置而結晶化,且在移動該結晶化基板的同時即時量化雲紋。In order to achieve the above objective, according to one concept of the present invention, there is provided a moiré quantization system through a laser crystallization device including a laser crystallization device, wherein the moiré quantization device is provided in the laser crystallization device so that a The substrate is crystallized by the laser crystallization device, and the moiré is instantly quantified while moving the crystallized substrate.
又,為達成以上目的,依據本發明之另一構想,提供一種透過雷射結晶設備的雲紋量化方法,包含:裝載基板之第一步驟、使用雷射將已裝載基板結晶化之第二步驟、在移動結晶化基板的同時即時量化雲紋之第三步驟、及將已歷經結晶化與雲紋量化的基板卸載之第四步驟。In addition, in order to achieve the above objective, according to another concept of the present invention, a method for quantifying moiré through a laser crystallization device is provided, which includes: a first step of loading a substrate, and a second step of crystallizing the loaded substrate using a laser , The third step of real-time quantification of moiré while moving the crystallized substrate, and the fourth step of unloading the substrate that has undergone crystallization and moiré quantization.
該雷射結晶裝置可包含:一處理腔;一雷射光束產生器,被設置於該處理腔之一側端且朝該基板輻射雷射光束;及一平台,被設置於該處理腔中且用於裝載與卸載該基板。The laser crystallization apparatus may include: a processing chamber; a laser beam generator arranged at one side end of the processing chamber and radiating the laser beam toward the substrate; and a platform arranged in the processing chamber and Used to load and unload the substrate.
該雲紋量化裝置可包含:一影像取得單元,被設置於該平台上方,以即時取得藉該平台所裝載之結晶化基板中的雲紋而不與雷射光束干涉;一照明單元,被設置於該影像取得單元之一側端,且照射該結晶化基板;一影像處理單元,實施影像預處理及影像處理,以析取已取得到的雲紋影像上之反差影像、及藉由分析經過處理的影像成數據來量化雲紋;及一中央處理單元,控制該影像取得單元、該照明單元、及該影像處理單元,顯示藉該影像取得單元所取得之影像、及藉該影像處理單元所取得之影像數據,及判定該結晶化基板的品質。The moiré quantification device may include: an image acquisition unit arranged above the platform to instantly acquire the moiré in the crystallized substrate loaded by the platform without interfering with the laser beam; an illumination unit is arranged At one side of the image acquisition unit, and irradiate the crystallized substrate; an image processing unit implements image preprocessing and image processing to extract the contrast image on the acquired moiré image and analyze the process The processed image becomes data to quantify the moiré; and a central processing unit that controls the image acquisition unit, the lighting unit, and the image processing unit, displays the image acquired by the image acquisition unit, and the image processing unit Obtain the image data and determine the quality of the crystallized substrate.
該影像取得單元可為一面型攝影機,且該影像取得單元藉反應關於該平台位置之訊號來調整一觸發,以依固定間隔取得雲紋影像。The image acquisition unit may be an area camera, and the image acquisition unit adjusts a trigger by responding to the signal on the position of the platform to acquire the moiré image at a fixed interval.
該影像取得單元可藉調整對每一具有最佳化能量密度(OPED)之區域的觸發,以依固定間隔取得雲紋影像。The image obtaining unit can obtain a moiré image at a fixed interval by adjusting the trigger for each region with optimized energy density (OPED).
該影像取得單元可為一線性掃描攝影機。The image acquisition unit can be a linear scan camera.
一偏光鏡可尚被設置於該照明單元或該影像取得單元前方。藉由旋轉該偏光鏡,只有與雲紋具相同方向的光線可通過,且一綠色濾光鏡可被設置於該照明單元或該影像取得單元前方。A polarizer can still be arranged in front of the illumination unit or the image acquisition unit. By rotating the polarizer, only light in the same direction as the moiré can pass through, and a green filter can be placed in front of the illumination unit or the image acquisition unit.
該中央處理單元可判定該結晶化基板的品質,且該中央處理單元可當問題產生時,改變被輻射至該基板之雷射光束的能量密度(ED)。The central processing unit can determine the quality of the crystallized substrate, and the central processing unit can change the energy density (ED) of the laser beam radiated to the substrate when a problem occurs.
依據本發明,可能藉量化在一設備中結晶化之一基板中的雲紋、及即時判定該結晶化基板的品質,以達成穩定的製程管理,其中該設備包含有一雷射結晶裝置。According to the present invention, it is possible to achieve stable process management by quantifying the moiré in a substrate crystallized in a device and determining the quality of the crystallized substrate in real time, wherein the device includes a laser crystallization device.
又,可能較現有方式減少偵測雲紋所耗費的時間,以確保生產良率。更,可能藉由取得透過檢測人員判定時之誤差及差異的客觀數據,以確保結晶化基板之可靠品質與客觀性。In addition, it is possible to reduce the time it takes to detect moiré compared with the existing methods to ensure production yield. Furthermore, it is possible to obtain the objective data of the error and difference when judged by the inspector to ensure the reliable quality and objectivity of the crystallized substrate.
又,藉使用面型攝影機或線性掃描攝影機來取得影像,偵測雲紋所耗費的時間將減少,且反應觸發訊號來取得影像,以可輕易地對一基板的每一區域偵測雲紋。In addition, by using an area camera or a linear scanning camera to obtain an image, the time it takes to detect the moiré will be reduced, and the image can be obtained in response to the trigger signal, so that the moiré can be easily detected in each area of a substrate.
又,藉使用一偏光鏡或一綠色濾光鏡取得更多雲紋影像,以輕易偵測與量化雲紋。Moreover, by using a polarizer or a green filter to obtain more moiré images, the moiré can be easily detected and quantified.
本發明關於藉量化基板中之雲紋來即時判定基板的品質,該基板在包含有一雷射結晶裝置之一設備中結晶化,其中雲紋係經由機器視覺偵測,且數據將被析取與量化。The present invention relates to real-time determination of the quality of the substrate by quantifying the moiré in the substrate. The substrate is crystallized in a device that includes a laser crystallization device, where the moiré is detected by machine vision, and the data will be extracted and Quantify.
已實施本發明,藉由在包含有一雷射結晶裝置之一設備中即時檢查製程品質,以提供穩定的製程管理。The present invention has been implemented to provide stable process management by real-time inspection of process quality in a device including a laser crystallization device.
此後,將參考隨附圖式,以詳細說明本發明。Hereinafter, referring to the accompanying drawings, the present invention will be described in detail.
第1圖係顯示依據本發明之透過雷射結晶設備的雲紋量化系統之主要部件示圖,第2圖係顯示依據本發明之透過雷射結晶設備的雲紋量化方法方塊圖,第3圖係顯示依據本發明之一具體實施例而使用面型攝影機的雲紋量化系統示圖,第4圖係顯示使用第3圖所示之面型攝影機來析取雲紋量化數據的方法示圖,第5圖係顯示依據本發明之一具體實施例而使用線性掃描攝影機的雲紋量化系統示圖,第6圖係顯示使用第5圖所示之線性掃描攝影機來析取雲紋量化數據的方法示圖,第7A圖係顯示依據本發明之一具體實施例的具有偏光鏡之機構示圖與第7B圖係顯示使用偏光鏡前與後的雲紋影像示圖,及第8A圖係顯示當使用依據本發明之一具體實施例的綠色濾光鏡時所取得的雲紋影像與第8B圖係顯示基於雲紋影像之EPD結晶的數據示圖。Figure 1 is a diagram showing the main components of the moiré quantification system through laser crystallization equipment according to the present invention, Figure 2 is a block diagram showing the moiré quantification method through laser crystallization equipment according to the present invention, and Figure 3 It is a diagram showing a moiré quantization system using an area camera according to a specific embodiment of the present invention. FIG. 4 is a diagram showing a method of extracting moiré quantization data using the area camera shown in FIG. 3. Figure 5 is a diagram showing a moiré quantization system using a linear scan camera according to a specific embodiment of the present invention, and Figure 6 shows a method for extracting moiré quantization data using the linear scan camera shown in Figure 5 Fig. 7A is a diagram showing a mechanism with a polarizer according to an embodiment of the present invention and Fig. 7B is a diagram showing a moiré image before and after using a polarizer, and Fig. 8A is a diagram showing when The moiré image obtained when using the green filter according to an embodiment of the present invention and Figure 8B are data diagrams showing the EPD crystal based on the moiré image.
如圖所示,依據本發明之透過一雷射結晶設備10的雲紋量化系統係以包含有一雷射結晶裝置之雷射結晶設備10為基礎的雲紋量化系統,其中雷射結晶裝置100將基板結晶化,且雷射結晶設備10包含有一雲紋量化裝置200。該雲紋量化裝置在移動結晶化基板20的同時,即時量化雲紋。As shown in the figure, the moiré quantization system through a
本發明藉由量化基板20中之雲紋,即時判定基板20的品質,該基板係在包含有雷射結晶裝置100的雷射結晶設備10中結晶化,其中透過機器視覺自動偵測雲紋以量化數據,且在包含有雷射結晶裝置100的雷射結晶設備10中即時檢查製程品質,以穩定地管理製程。The present invention quantifies the moiré in the
通常,雷射結晶裝置100包含一處理腔110、一雷射光束產生器120、及一平台130,且雲紋量化裝置200內含於雷射結晶裝置100中。該雷射光束產生器120被設置於處理腔110之一側端且朝基板20輻射雷射光束。該平台被設置於處理腔110中,以裝載與卸載基板20。Generally, the
依據本發明,用於取得雲紋影像之配置內含於雷射結晶裝置100中,用於處理被偵測到之雲紋影像、製作雲紋之數據、及控制部件的配置被設置於雷射結晶裝置100之外,且包含所有雷射結晶裝置100、及用於量化雲紋之裝置的配置被稱為雷射結晶設備10,該雷射結晶設備包含有雷射結晶裝置100。亦即,可在雷射結晶設備10中實施雷射結晶、雲紋偵測、及量化。According to the present invention, the configuration for obtaining the moiré image is contained in the
用於一般結晶的雷射結晶裝置100處理腔110可為真空腔,其在側端具有閘門,以供置入基板20。The
用於輻射雷射光束以將基板20結晶化的雷射光束產生器120被設置於處理腔110外之一側端,且設計成使用光學模組及光功率偵測器模組(OPDM),有效率地將呈線型之雷射光束輻射至基板20。The
通常,基板20具有一沉積於玻璃上之矽薄膜,其中該矽薄膜為非晶質物質,且此中所述之基板20結晶意指,在譬如玻璃等基材基板上之非晶質矽薄膜結晶。為便於說明,本發明中假定基板20包含待結晶之薄膜、及該薄膜下方之基材基板。Generally, the
用於結晶之雷射光束能量的密度被稱作能量密度(此後稱為「ED」),及具有將結晶成果最佳化之狀態的ED被稱作最佳化能量密度(此後稱為「OPED」)。緣是,提供在既定OPED下之雷射光束。The energy density of the laser beam used for crystallization is called the energy density (hereinafter referred to as "ED"), and the ED with the state of optimizing the crystallization result is called the optimized energy density (hereinafter referred to as "OPED") "). The reason is to provide laser beams under the established OPED.
該雷射光束產生器譬如使用準分子雷射光束,將基板20結晶化,及平台130被設置於處理腔110中且安裝有基板20,以裝載與卸載基板20。The laser beam generator, for example, uses an excimer laser beam to crystallize the
平台130使待結晶化基板20相對於雷射光束移動,使得雷射光束輻射至基板20之整個區域。在這種配置中,可能藉由將平台130位置之編碼器訊號供應至以下將說明的雲紋量化裝置200之一影像取得單元210,且接著使用此等訊號作為影像取得單元210之觸發訊號,而得依固定間隔取得影像。這是為依據平台130之位置來取得雲紋影像且量化雲紋,且因此,可能準確地尋得已產生雲紋之處。The
雲紋量化裝置200被設於雷射結晶設備10中,以在移動結晶化基板20的同時,即時量化雲紋。The
雲紋量化裝置200包含:一影像取得單元210,被設置於平台130上方,以即時取得藉平台130所裝載之結晶化基板20中的雲紋而不與雷射光束干涉;一照明單元220,被設置於影像取得單元210之一側端,且照射結晶化基板20;一影像處理單元230,實施影像預處理及影像處理,以析取已取得到的雲紋影像上之反差影像、及藉由分析經過處理的影像成數據來量化雲紋;及一中央處理單元240,控制影像取得單元210、照明單元220、及影像處理單元230,顯示藉影像取得單元210所取得之影像、及藉影像處理單元230所取得之影像數據,及判定結晶化基板20的品質。The
如上所述,雲紋量化裝置200之影像取得單元210照明單元220可被設於雷射結晶裝置100之處理腔110內,而用於處理已取得到的影像之影像處理單元230及中央處理單元240可被設於處理腔110外。As mentioned above, the
用於取得結晶化基板20之雲紋影像的影像取得單元210係常用的電荷耦合元件(CCD)攝影機,其連接至中央處理單元240以作開啟/關閉、角度(θ)及操作控制,其中使用一面型攝影機211(第3圖)及一線性掃描攝影機212(第5圖)以減少偵測雲紋所耗費的時間,且可使用其他能夠取得影像之攝影機。The
當需要使用面型攝影機211來取得影像時,如第4圖所示,可能藉調整一同步化觸發而依固定間隔取得影像。例如,可能反應關於平台130位置之編碼器訊號來調整面型攝影機211之觸發,以依固定間隔取得雲紋影像。緣是,可能尋得已在基板20上取得到的雲紋影像,而可能輕易地判定依據基板20上多個位置之良好與不良結晶。When it is necessary to use the
又,可能藉調整對每一OPED區域、即每一最佳化能量密度區域之觸發,以依固定間隔取得雲紋影像。亦即,可能藉由對每一基板20區域以不同OPED實施結晶化、及輸入OPED至影像取得單元210作為觸發,以判定何處已較佳實施結晶化。In addition, it is possible to adjust the trigger for each OPED area, that is, each optimized energy density area, to obtain a moiré image at a fixed interval. That is, it is possible to determine where the crystallization is better performed by performing crystallization with different OPEDs for each area of the
照明單元220被設置於影像取得單元210之一側端且照射結晶化基板20,以可適當地取得影像,其中可藉由以下將說明之中央處理單元240來控制照明單元220之角度、及開啟/關閉。The
倘必要時,可使用複數個照明單元220,且可進一步設置一偏光鏡250或一綠色濾光鏡於照明單元220或影像取得單元210前方,以取得具有顯著雲紋的影像。If necessary, a plurality of
第7A圖係當偏光鏡250被設置於照明單元220前方時的示圖,其中二照明單元220被設置於影像取得單元210之一側端,且提供數個偏光鏡250。亦即,一第一偏光鏡250被設置於不具有偏光的一普通照明單元220前方,以達成具有偏光的光源;及一第二偏光鏡250被設於影像取得單元210與基板20之間。緣是,藉旋轉偏光鏡250,使得只有與雲紋具相同方向的光線通過,以取得具有顯著雲紋的影像。FIG. 7A is a diagram when the
又,如第8B圖所示,可藉設置綠色濾光鏡於照明單元220前方,以取得具有顯著雲紋的影像。Moreover, as shown in FIG. 8B, a green filter can be arranged in front of the
又,影像處理單元230實施影像預處理及影像處理,以在已取得到的雲紋影像上取得反差影像,並且分析經處理過的影像成數據來量化雲紋。In addition, the image processing unit 230 performs image preprocessing and image processing to obtain a contrast image on the obtained moiré image, and analyzes the processed image into data to quantify the moiré.
通常難以目視辨識雲紋影像,因此需析取反差影像來增加該雲紋影像之可見度,因此藉由平均已取得到的影像中之局部亮度值來創建平滑影像,以取得反差影像。It is usually difficult to visually recognize a moiré image, so it is necessary to extract a contrast image to increase the visibility of the moiré image. Therefore, a smooth image is created by averaging the local brightness values in the acquired image to obtain the contrast image.
藉由從最初取得到的影像扣除透過預處理所取得到的參考影像數據值,將取得反差影像。藉由輸入基於該反差影像之譬如反差比及線型等選擇性條件,可取得分析影像。緣是,將取得最終雲紋偵測之量化影像數據。By subtracting the reference image data value obtained through preprocessing from the initially obtained image, a contrast image will be obtained. By inputting selective conditions such as contrast ratio and line type based on the contrast image, an analysis image can be obtained. The reason is that the quantified image data of the final moiré detection will be obtained.
個人電腦通常被用作為中央處理單元240,其控制影像取得單元210、照明單元220、及影像處理單元230,顯示藉影像取得單元210所取得之影像的數據、及藉影像處理單元230所取得的影像,以及判定結晶化基板20的品質。A personal computer is usually used as the central processing unit 240, which controls the
例如,中央處理單元240可由一鍵盤、一面板、及一控制器組成。該鍵盤用於控制影像取得單元210、照明單元220、及影像處理單元230,且輸入設定值。該面板用於顯示已取得到的影像及經處理過的影像數據。該控制器基於影像數據來判定結晶化基板20的品質,及用於控制所有組件。For example, the central processing unit 240 may be composed of a keyboard, a panel, and a controller. The keyboard is used to control the
中央處理單元240被設於雷射結晶裝置100外。該中央處理單元可控制不僅雲紋量化裝置200,且亦可控制包含有雷射結晶裝置100之整個雷射結晶設備10。又,中央處理單元240可控制雷射光束產生器120及雷射結晶裝置100之平台130的運動及位置,其中平台130之位置被輸入至影像取得單元210作為觸發訊號,以依固定間隔操作影像取得單元210。The central processing unit 240 is provided outside the
中央處理單元240可使用已取得到的影像來判定結晶化基板20的品質。可當問題產生時,改變被輻射至基板20之雷射光束的能量密度,其中該ED可藉由使用者當必要時基於判定品質之結果作預先或直接設定的一程式而自動地改變。The central processing unit 240 can use the acquired images to determine the quality of the crystallized
此後將說明依據本發明之透過雷射結晶設備10的雲紋量化方法。Hereinafter, the moiré quantification method through the
第2圖係顯示依據本發明之雲紋量化方法示圖。如第2圖所示,透過雷射結晶設備10之雲紋量化方法包含裝載基板20之第一步驟、使用雷射對已裝載基板20實施結晶化之第二步驟、在移動結晶化基板20的同時即時量化雲紋之第三步驟、及將已歷經結晶化與雲紋量化的基板20卸載之第四步驟。Figure 2 is a diagram showing the moiré quantification method according to the present invention. As shown in Figure 2, the moiré quantification method through the
基板20被安裝於雷射結晶裝置100之平台130上,且被裝載至一雷射結晶化位置。藉由來自該雷射光束產生器之雷射光束將已裝載基板20結晶化。藉由在移動結晶化基板20的同時透過影像取得單元210從結晶化基板20取得雲紋影像、及藉由處理此等影像,將即時量化雲紋。接著,將已歷經結晶化及雲紋量化的基板20卸載,從而完成處理。The
第三步驟係從結晶化基板20取得雲紋影像、對已取得到的雲紋影像實施影像處理、藉分析經影像處理過的影像成數據來量化雲紋、及接著基於該已量化雲紋來判定基板20結晶化程度品質的程序。The third step is to obtain a moiré image from the crystallized
在從結晶化基板20取得雲紋影像的步驟中,藉由調整同步化觸發而依固定間隔取得雲紋影像。In the step of obtaining the moiré image from the crystallized
可使用CCD攝影機作為影像取得單元210,以從結晶化基板20取得雲紋影像。當使用面型攝影機211取得影像時,將如第4圖所示者,調整一位置同步化觸發,以依固定間隔取得影像。A CCD camera can be used as the
例如,可能反應關於平台130位置之編碼器訊號來調整面型攝影機211之觸發,以依固定間隔取得雲紋影像。緣是,可能尋得已在基板20上取得到的雲紋影像,而可能輕易地判定基板20上多個位置處之良好與不良結晶。For example, it is possible to adjust the triggering of the
又,可能藉調整對每一OPED區域、即每一最佳化能量密度區域之觸發,以依固定間隔取得雲紋影像。亦即,可能藉由對每一基板20區域以不同OPED實施結晶化、及輸入OPED至影像取得單元210作為觸發,以判定何處已較佳建立結晶化。In addition, it is possible to adjust the trigger for each OPED area, that is, each optimized energy density area, to obtain a moiré image at a fixed interval. That is, it is possible to determine where crystallization is better established by performing crystallization with different OPEDs for each area of the
又,用於已取得到的雲紋影像之影像處理係由影像處理單元230實施,其中用於取得反差影像之影像預處理及影像處理可對已取得到的雲紋影像實施,且可藉分析經處理過的影像成數據來量化雲紋。In addition, the image processing for the obtained moiré image is implemented by the image processing unit 230, wherein the image preprocessing and image processing for obtaining the contrast image can be performed on the obtained moire image, and can be analyzed The processed image becomes data to quantify the moiré.
例如,藉由平均已取得到的影像中之局部亮度值來建立平滑影像,以析取反差影像。亦即,藉由從最初取得到的影像扣除透過預處理所取得到的參考影像數據值,將取得反差影像。藉由輸入基於該反差影像之譬如反差比及線型等選擇性條件,可取得分析影像。緣是,將取得最終雲紋偵測之量化影像數據。For example, a smooth image is created by averaging the local brightness values in the acquired image to extract the contrast image. That is, by subtracting the reference image data value obtained through preprocessing from the initially obtained image, a contrast image will be obtained. By inputting selective conditions such as contrast ratio and line type based on the contrast image, an analysis image can be obtained. The reason is that the quantified image data of the final moiré detection will be obtained.
又,基於已量化之雲紋來判定基板20之結晶化程度品質,且當問題產生時,輻射至基板20之雷射光束的ED將改變,該改變係由中央處理單元240實施。In addition, the quality of the crystallization degree of the
此後,將說明本發明之一具體實施例。Hereinafter, a specific embodiment of the present invention will be explained.
第3圖係依據本發明之一具體實施例而使用面型攝影機211的雲紋量化系統,及第4圖係顯示使用第3圖所示之面型攝影機211來析取雲紋量化數據的方法示圖。Fig. 3 is a moiré quantization system using an
如第3圖所示,取得藉面型攝影機211結晶化之基板20的雲紋影像,其中藉中央處理單元240控制,以控制面型攝影機211及照明單元220之位置與角度,而可取得最佳化的雲紋影像。As shown in Figure 3, the moiré image of the
藉面型攝影機211取得結晶化基板20之特定區域的雲紋影像,且將該雲紋影像傳送至中央處理單元240並顯示於面板上。The
如第4圖所示,可反應關於平台130運動之編碼器訊號來觸發面型攝影機211,且因此可依固定間隔T1
、T2
、T3
、T4
、T5
、T6
及T7
取得影像。As shown in Figure 4, the
可選擇性地對來自已取得到的影像之一聚焦區域、亦即除散焦區域外之一有效區域偵測與量化雲紋,且可依每一區域之特性與參考位準作比較的一絕對比較型、或比較各區域之特性差異的一相對比較型,來判定基板20的品質。Moiré can be selectively detected and quantified from a focus area of the acquired image, that is, an effective area except the defocus area, and can be compared with the reference level according to the characteristics of each area The absolute comparison type, or a relative comparison type that compares the characteristic difference of each area, is used to determine the quality of the
第5圖係依據本發明之一具體實施例而使用線性掃描攝影機212的雲紋量化系統,及第6圖係顯示使用第5圖之線性掃描攝影機212來析取雲紋量化資料的方法示圖。Fig. 5 is a moiré quantization system using a
如第5圖所示,取得藉線性掃描攝影機212結晶化之基板20的雲紋影像,其中藉中央處理單元240控制,以控制線性掃描攝影機212及照明單元220之位置與角度θ,而可取得最佳化的雲紋影像。As shown in Fig. 5, the moiré image of the
藉線性掃描攝影機212取得結晶化基板20之特定區域的雲紋影像,且將該雲紋影像傳送至中央處理單元240並顯示於面板上。A
如第6圖所示,針對藉線性掃描攝影機212所取得之影像,修正透視角,析取一處理區域、即一有效區域,及藉實施直方圖量化或以累積廓形為基礎的計算來計算區域特性,從而判定基板20的品質。As shown in Figure 6, for the image obtained by the
藉每一區域之特性與參考位準作比較、或比較各區域特性之差異,以達成基板品質之判定。By comparing the characteristics of each area with the reference level, or comparing the differences of the characteristics of each area, the substrate quality can be judged.
第7A圖係顯示依據本發明之一具體實施例的具有偏光鏡250之機構示圖,及第7B圖係顯示使用偏光鏡250前與後的雲紋影像示圖。FIG. 7A is a diagram showing a mechanism with a
第7A圖係當偏光鏡250被設置於照明單元220前方時的示圖,其中二照明單元220被設置於影像取得單元210之一側端,且提供數個偏光鏡250。亦即,一第一偏光鏡250被設置於不具有偏光的一普通照明單元220前方,以達成具有偏光的光源;及一第二偏光鏡250被設於影像取得單元210與基板20之間。緣是,藉旋轉偏光鏡250,使得只有與雲紋具相同方向的光線通過,以取得具有顯著雲紋的影像。FIG. 7A is a diagram when the
第7B圖係使用偏光鏡250前與後的雲紋影像,且由此可看出,在使用偏光鏡250後可取得較清楚的雲紋影像。FIG. 7B shows the moiré images before and after the
第8A圖係顯示當使用依據本發明之一具體實施例的綠色濾光鏡時所取得的雲紋影像,及第8B圖係顯示基於雲紋影像之EPD結晶的數據示圖。Fig. 8A shows a moiré image obtained when the green filter according to an embodiment of the present invention is used, and Fig. 8B shows a data diagram of EPD crystal based on the moiré image.
當面型攝影機呈40o 角、照明單元呈30o 角、及415~505毫焦耳/平方公分(mJ/cm2 )之雷射光束送至基板時,使用綠色濾光鏡,在10個區段的既定能量密度下取得雲紋影像。藉由對雲紋影像實施影像處理與量化分析,可看出OPED為470毫焦耳/平方公分。When the area camera is at a 40 o angle, the illumination unit is at a 30 o angle, and the laser beam of 415~505 millijoules/cm² (mJ/cm 2 ) is sent to the substrate, a green filter is used, in 10 sections Moiré images are obtained at a predetermined energy density of. By performing image processing and quantitative analysis on the moiré image, it can be seen that the OPED is 470 mJ/cm².
10‧‧‧雷射結晶設備10‧‧‧Laser crystallization equipment
20‧‧‧基板20‧‧‧Substrate
100‧‧‧雷射結晶裝置100‧‧‧Laser crystal device
110‧‧‧處理腔110‧‧‧Processing chamber
120‧‧‧雷射光束產生器120‧‧‧Laser beam generator
130‧‧‧平台130‧‧‧Platform
200‧‧‧雲紋量化裝置200‧‧‧Moiré quantization device
210‧‧‧影像取得單元210‧‧‧Image Acquisition Unit
211‧‧‧面型攝影機211‧‧‧Area Camera
212‧‧‧線性掃描攝影機212‧‧‧Line Scan Camera
220‧‧‧照明單元220‧‧‧Lighting Unit
230‧‧‧影像處理單元230‧‧‧Image Processing Unit
240‧‧‧中央處理單元240‧‧‧Central Processing Unit
250‧‧‧偏光鏡250‧‧‧Polarizer
θ‧‧‧角度θ‧‧‧angle
T1~T7‧‧‧間隔T 1 ~T 7 ‧‧‧ interval
由以下詳細說明結合隨附圖式,將可更清楚地了解本發明的以上及其他目的、特點、與其他優點,其中:The above and other objectives, features, and other advantages of the present invention can be understood more clearly from the following detailed description in conjunction with the accompanying drawings, among which:
第1圖係顯示依據本發明之透過雷射結晶設備的雲紋量化系統之主要部件示圖;Figure 1 is a diagram showing the main components of the moiré quantification system through laser crystallization equipment according to the present invention;
第2圖係顯示依據本發明之透過雷射結晶設備的雲紋量化方法方塊圖;Figure 2 is a block diagram showing the moiré quantification method through laser crystallization equipment according to the present invention;
第3圖係顯示依據本發明之一具體實施例而使用面型攝影機的雲紋量化系統示圖;Figure 3 is a diagram showing a moiré quantization system using an area camera according to a specific embodiment of the present invention;
第4圖係顯示使用第3圖所示之面型攝影機來析取雲紋量化數據的方法示圖;Figure 4 is a diagram showing the method of extracting quantitative data of moiré using the area camera shown in Figure 3;
第5圖係顯示依據本發明之一具體實施例而使用線性掃描攝影機的雲紋量化系統示圖;Fig. 5 is a diagram showing a moiré quantization system using a linear scan camera according to a specific embodiment of the present invention;
第6圖係顯示使用第5圖所示之線性掃描攝影機來析取雲紋量化數據的方法示圖;Figure 6 is a diagram showing the method of extracting moiré quantitative data using the linear scan camera shown in Figure 5;
第7A圖係顯示依據本發明之一具體實施例的具有偏光鏡之機構示圖,及第7B圖係顯示使用偏光鏡前與後的雲紋影像示圖;及Fig. 7A is a diagram showing a mechanism with a polarizer according to an embodiment of the present invention, and Fig. 7B is a diagram showing the moiré images before and after using the polarizer; and
第8A圖係顯示當使用依據本發明之一具體實施例的綠色濾光鏡時所取得的雲紋影像,及第8B圖係顯示基於雲紋影像之EPD結晶的數據示圖。Fig. 8A shows a moiré image obtained when the green filter according to an embodiment of the present invention is used, and Fig. 8B shows a data diagram of EPD crystal based on the moiré image.
10‧‧‧雷射結晶設備 10‧‧‧Laser crystallization equipment
20‧‧‧基板 20‧‧‧Substrate
100‧‧‧雷射結晶裝置 100‧‧‧Laser crystal device
110‧‧‧處理腔 110‧‧‧Processing chamber
120‧‧‧雷射光束產生器 120‧‧‧Laser beam generator
130‧‧‧平台 130‧‧‧Platform
200‧‧‧雲紋量化裝置 200‧‧‧Moiré quantization device
210‧‧‧影像取得單元 210‧‧‧Image Acquisition Unit
220‧‧‧照明單元 220‧‧‧Lighting Unit
230‧‧‧影像處理單元 230‧‧‧Image Processing Unit
240‧‧‧中央處理單元 240‧‧‧Central Processing Unit
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