JPH0618956U - Oblique illumination device for visual inspection - Google Patents
Oblique illumination device for visual inspectionInfo
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- JPH0618956U JPH0618956U JP5888092U JP5888092U JPH0618956U JP H0618956 U JPH0618956 U JP H0618956U JP 5888092 U JP5888092 U JP 5888092U JP 5888092 U JP5888092 U JP 5888092U JP H0618956 U JPH0618956 U JP H0618956U
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- illumination
- oblique
- oblique illumination
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Abstract
(57)【要約】
【目的】本考案は、基板上の観察対象部分を対物視野位
置に迅速且つ高精度に整合させることができる簡単な構
成で低価格且つコンパクトな外観検査用斜照明装置を提
供する。
【構成】顕微鏡のレボルバ２に対して着脱自在に構成さ
れた斜照明ユニット４を備えており、この斜照明ユニッ
トは、レボルバの対物レンズ取付ねじ部６に螺合可能で
中空円筒状のユニット取付金具８と、このユニット取付
金具にビス１０を介して取付可能なユニット本体１２と
を備えている。ユニット本体には、対物光軸１４に対し
て傾斜して配置された偏向ミラー１６と、この偏向ミラ
ーによって偏向された照明光を対物光軸に対して所定角
度だけ斜光させて照明する斜光ミラー１８とが内蔵され
ている。
(57) [Summary] [Object] The present invention provides a low-cost and compact oblique illumination device for appearance inspection with a simple configuration that can quickly and accurately align an observation target portion on a substrate with an objective visual field position. provide. [Structure] An oblique illumination unit 4 configured to be attachable / detachable to / from a revolver 2 of a microscope is provided. The metal fitting 8 and the unit main body 12 that can be mounted on the unit mounting metal fitting via the screw 10 are provided. The unit main body has a deflection mirror 16 arranged to be inclined with respect to the objective optical axis 14, and an oblique mirror 18 for illuminating the illumination light deflected by the deflection mirror by obliquely illuminating it with a predetermined angle with respect to the objective optical axis. And are built in.
Description
【０００１】[0001]
本考案は、例えば、ウェハ又は液晶ガラス基板等の基板上の外観を検査するた めの外観検査用斜照明装置に関する。 The present invention relates to an oblique illumination device for appearance inspection for inspecting the appearance on a substrate such as a wafer or a liquid crystal glass substrate.
【０００２】[0002]
従来、基板の検査では、各膜付け工程及びエッチング工程毎にマクロ観察が行 われ、マクロ観察において基板上の欠陥が発見されたとき、更に、かかる欠陥部 位について顕微鏡によってミクロ観察が行われていた。 Conventionally, in the inspection of a substrate, macro observation is performed in each film forming process and etching process, and when a defect on the substrate is found in the macro observation, further micro observation is performed on the defect position with a microscope. It was
【０００３】 しかし、このようなマクロ観察及びミクロ観察は、独立したステージ上で夫々 個別に行われていたため、マクロ観察からミクロ観察への移行の際、マクロ観察 で発見された基板上の欠陥部位をミクロ観察で用いられる対物レンズの真下（即 ち、対物光軸下）に位置付けることが極めて困難であった。 そこで、特開平２−２５９０９４号公報には、上述した弊害を除去したステー ジ移動装置が開示されている。However, since such macro observation and micro observation are individually performed on independent stages, when the macro observation is changed to the micro observation, the defect site on the substrate found by the macro observation is detected. It was extremely difficult to position the lens directly below the objective lens used for micro observation (immediately below the objective optical axis). Therefore, Japanese Patent Application Laid-Open No. 2-259094 discloses a stage moving device which eliminates the above-mentioned harmful effects.
【０００４】 このステージ移動装置は、スケールを有しないＸ−Ｙステージと、顕微鏡の対 物光軸から回避した位置に設けられたスポット照明もしくはクロス入りの低倍 （０．５×〜２×）の対物レンズと、を備えており、目視観察及び低倍観察によ って発見された欠陥部位をスポット位置もしくはクロスに合致させた後、ステー ジを定量移動（具体的には、対物レンズとスポット間距離だけ移動）させて欠陥 部位を顕微鏡対物光軸下に位置付けるように構成されている。This stage moving device includes an XY stage having no scale and a low magnification (0.5 × to 2 ×) with spot illumination or a cross provided at a position avoiding the optical axis of the microscope. After aligning the defect site found by visual observation and low-magnification observation with the spot position or cross, the stage is moved quantitatively (specifically, with the objective lens). It is configured to move the distance between spots) and position the defect site under the microscope optical axis.
【０００５】[0005]
このような装置では、Ｘ−Ｙステージを定量移動させるため、ステージ移動機 構に更に特殊な構成を付加する必要があると共に、複数の欠陥部位を次の工程の ために記憶しておくことができないため、１つの欠陥部位が発見される度毎に、 Ｘ−Ｙステージ移動させてミクロ観察を行わねばならず、基板観察に時間がかか り面倒である。しかも、ウェハより数倍大きい例えば液晶基板を検査するために は、定量移動のための機構も大型化せざるを得ず設計上無理がある。 In such an apparatus, in order to move the XY stage quantitatively, it is necessary to add a special configuration to the stage moving mechanism, and it is possible to store a plurality of defective portions for the next process. Since it is not possible, microscopic observation must be performed by moving the XY stage every time one defect site is found, which makes the substrate observation time-consuming and troublesome. Moreover, in order to inspect, for example, a liquid crystal substrate that is several times larger than the wafer, the mechanism for the fixed amount movement must be increased in size, which is impossible in terms of design.
【０００６】 そこで、特願平４−１３２５７７号公報に開示された基板観察装置には、被検 査基板表面全体に照明光を照明し、反射光の光学的変化から被検査基板表面に存 在する欠陥部位を観察するマクロ観察系と、このマクロ観察系を介して検出され た欠陥部位を拡大して観察するミクロ観察系と、マクロ観察系とミクロ観察系と の間を被検査基板を載置した状態で移動可能に構成され、載置された被検査基板 をマクロ観察系あるいはミクロ観察系の観察領域内に位置付けるスケール付きＸ −Ｙステージと、マクロ観察系に設けられたスポット照明装置のスポット照明と ミクロ観察系の対物光軸との間の相対座標を表示する座標表示装置とが設けられ ている。Therefore, in the substrate observing apparatus disclosed in Japanese Patent Application No. 4-132577, the entire surface of the substrate to be inspected is illuminated with illumination light, and the surface of the substrate to be inspected exists due to the optical change of reflected light. The macro observation system for observing the defective portion to be observed, the micro observation system for magnifying and observing the defect portion detected through this macro observation system, and the substrate to be inspected are mounted between the macro observation system and the micro observation system. The XY stage with a scale, which is configured to be movable while being placed and positions the placed substrate to be inspected in the observation area of the macro observation system or the micro observation system, and the spot illumination device provided in the macro observation system. A coordinate display device is provided for displaying relative coordinates between the spot illumination and the objective optical axis of the micro observation system.
【０００７】 しかし、このような基板観察装置では、対物光軸とは離れた箇所に落射したス ポット照明に対して基板の欠陥部位を整合させた後、ステージを定量移動させて スポット照明位置から対物視野位置に欠陥部位を位置付ける工程が必要となる関 係上、観察対象部分を対物光軸下に整合させるためにある程度の時間が必要とな る。更に、ミクロ観察系とマクロ観察系とが離間して設けられているため、装置 全体が大型化且つ複雑化して構造上不利であり、製造コストも上昇する。However, in such a substrate observing apparatus, after the defective portion of the substrate is aligned with the spot illumination incident on a position apart from the objective optical axis, the stage is quantitatively moved to move from the spot illumination position. Since it requires a step of locating the defective portion at the objective visual field position, some time is required to align the observation target portion under the objective optical axis. Further, since the micro observation system and the macro observation system are provided separately from each other, the entire apparatus becomes large and complicated, which is disadvantageous in structure and the manufacturing cost also rises.
【０００８】 本考案の目的は、基板上の観察対象部分を対物視野位置に迅速且つ高精度に整 合させることができる簡単な構成で低価格且つコンパクトな外観検査用斜照明装 置を提供することにある。An object of the present invention is to provide a low-cost and compact oblique illumination device for appearance inspection with a simple structure that can quickly and accurately adjust an observation target portion on a substrate to an objective visual field position. Especially.
【０００９】[0009]
このような目的を達成するために、本考案は、顕微鏡のレボルバに対して着脱 自在に構成された斜照明ユニットを備えており、この斜照明ユニットは、観察用 照明光を偏向させる偏向手段と、この偏向手段を介して導光された照明光を対物 視野に対して斜光させて照明する斜光手段とを備える。 In order to achieve such an object, the present invention comprises an oblique illumination unit which is detachably attached to a revolver of a microscope, and the oblique illumination unit includes a deflecting means for deflecting observation illumination light. And obliquely illuminating means for obliquely illuminating the illumination light guided through the deflecting means with respect to the objective visual field.
【００１０】[0010]
本考案は、偏向手段によって偏向された観察用照明光は、斜光手段によって斜 照明光となって対物視野を照明する。 In the present invention, the observation illumination light deflected by the deflecting means becomes oblique illumination light by the oblique light means and illuminates the objective field of view.
【００１１】[0011]
以下、本考案の一実施例に係る外観検査用斜照明装置について、図１及び図２ を参照して説明する。 Hereinafter, an oblique illumination device for visual inspection according to an embodiment of the present invention will be described with reference to FIGS. 1 and 2.
【００１２】 図１に示すように、本実施例の外観検査用斜照明装置は、顕微鏡のレボルバ２ に対して着脱自在に構成された斜照明ユニット４を備えており、この斜照明ユニ ット４は、レボルバ２の対物レンズ取付ねじ部６に螺合可能なユニット取付金具 ８と、このユニット取付金具８にビス１０を介して取付可能なユニット本体１２ とを備えている。As shown in FIG. 1, the oblique illumination device for appearance inspection according to the present embodiment includes an oblique illumination unit 4 that is detachably attached to a revolver 2 of a microscope. Reference numeral 4 includes a unit mounting bracket 8 that can be screwed into the objective lens mounting screw portion 6 of the revolver 2, and a unit body 12 that can be mounted to the unit mounting bracket 8 via a screw 10.
【００１３】 このユニット本体１２には、レボルバ２を介して導光された観察用照明光の対 物光軸１４に対して傾斜して配置された偏向手段即ち偏向ミラー１６と、この偏 向ミラー１６によって偏向された照明光を対物光軸１４に対して所定角度（θ） だけ斜光させて照明する斜光手段即ち斜光ミラー１８とが内蔵されている。In the unit main body 12, a deflecting means or a deflecting mirror 16 arranged to be inclined with respect to the object optical axis 14 of the observation illumination light guided through the revolver 2, and this deflecting mirror. An oblique light means for obliquely illuminating the illumination light deflected by 16 with respect to the objective optical axis 14 by a predetermined angle (θ), that is, an oblique light mirror 18 is incorporated.
【００１４】 また、ユニット取付金具８は、観察用照明光の光路を確保するために、中空円 筒状に構成されており、その内部の光路中にフィルタ２０が対物光軸１４に直交 して嵌合されている。The unit mounting bracket 8 is formed in a hollow cylindrical shape in order to secure the optical path of the observation illumination light, and the filter 20 is orthogonal to the objective optical axis 14 in the internal optical path. It is fitted.
【００１５】 このような構成を有する本実施例の外観検査用斜照明装置では、対物の同焦距 離（Ｌ）だけ離れた点Ｏにおいて、斜光ミラー１８から反射した斜照明光の光軸 ２２と対物光軸１４とが交叉するように構成されている。 このとき、基板表面には、φ２０程度の楕円状照野２４が形成される。 以下、本実施例の外観検査用斜照明装置の動作について簡単に説明する。In the oblique illumination device for appearance inspection according to the present embodiment having such a configuration, the optical axis 22 of the oblique illumination light reflected from the oblique mirror 18 at the point O separated by the same focal distance (L) of the object is used. The objective optical axis 14 is configured to intersect. At this time, an elliptical illumination field 24 of about φ20 is formed on the surface of the substrate. The operation of the oblique illumination device for appearance inspection according to this embodiment will be briefly described below.
【００１６】 まず、レボルバ２から適当な１個の対物レンズ（図示しない）を取り外した後 、この箇所にユニット取付金具８を螺合する。次に、ユニット本体１２をビス１ ０によってユニット取付金具８に取り付ける。First, after removing an appropriate one objective lens (not shown) from the revolver 2, the unit mounting bracket 8 is screwed into this location. Next, the unit main body 12 is attached to the unit mounting bracket 8 with screws 10.
【００１７】 次に、観察対象たるウェハ又は液晶ガラス基板等の基板（図示しない）を顕微 鏡ステージ（図示しない）に載置し、予め設定された同焦距離（Ｌ）に基板を位 置付ける。Next, a wafer (not shown) such as a wafer to be observed or a liquid crystal glass substrate is placed on a microscope stage (not shown), and the substrate is placed at a preset parfocal distance (L). .
【００１８】 この状態において、発光された観察用照明光は、フィルタ２０を透過して偏向 ミラー１６に照射され、ここで２方向に振り分けられる。その一方の照明光は、 対物光軸１４に沿って偏向ミラー１６を透過して基板表面に垂直に照射され、そ の他方の照明光は、偏向ミラー１６で反射された後、斜光ミラー１８で反射され 、対物光軸１４に対して所定角度（θ）だけ斜光して基板表面に照射される。In this state, the emitted illumination light for observation passes through the filter 20 and is applied to the deflecting mirror 16, where it is divided into two directions. One of the illumination lights passes through the deflecting mirror 16 along the objective optical axis 14 and is irradiated perpendicularly to the substrate surface, and the other illuminating light is reflected by the deflecting mirror 16 and then reflected by the oblique mirror 18. The reflected light is obliquely incident on the substrate surface with a predetermined angle (θ) with respect to the objective optical axis 14.
【００１９】 このようなマクロ観察と同様な照明下において、基板表面に傷やごみ等の欠陥 部位が存在した場合、基板表面に形成された楕円状照野２４から反射する反射光 中には、欠陥部位によって生じた散乱光が混入する。観察者２６は、かかる散乱 光が混入した反射光を顕微鏡側方から観察しつつ、顕微鏡ステージによって基板 を移動させて、散乱光の発生部位を照視２４の略中心に位置付ける。この結果、 欠陥部位が対物視野の略中心即ち対物光軸１４近傍に位置付けられる。Under the same illumination as in the macro observation, when a defect site such as a scratch or dust is present on the substrate surface, in the reflected light reflected from the elliptical illumination field 24 formed on the substrate surface, The scattered light generated by the defect site is mixed. The observer 26 moves the substrate by the microscope stage while observing the reflected light in which the scattered light is mixed from the side of the microscope, and positions the scattered light generation site at substantially the center of the illumination 24. As a result, the defective portion is positioned substantially in the center of the objective visual field, that is, near the objective optical axis 14.
【００２０】 この状態で、レボルバを回転して、例えば、倍率５×の対物レンズ（図示しな い）を対物光軸中に挿入した場合、基板の欠陥部位は、自動的に対物レンズの光 軸に整合し、接眼レンズ（図示しない）を介して欠陥部位のミクロ観察を行うこ とができる。In this state, when the revolver is rotated and, for example, an objective lens (not shown) with a magnification of 5 × is inserted into the objective optical axis, the defective portion of the substrate is automatically detected by the optical axis of the objective lens. Aligned with the axis, microscopic observation of the defect site can be performed through an eyepiece (not shown).
【００２１】 このように本実施例の外観検査用斜照明装置は、基板表面に存在する欠陥部位 を検出する際、観察者側に障害物が存在せず、且つ、斜照明光による基板表面か らの反射光を観察者側に直接導光させることができる。このため、照野２４を明 るくさせることができ、欠陥部位の発見が容易となるだけでなく、欠陥部位検出 用照明光と顕微鏡観察用照明光とが同一照野内に位置付けられているため、欠陥 部位検出時において発見された欠陥部位を照野中心即ち対物光軸近傍に移動させ る時間を低減させることができ、迅速な位置合わせが可能となる。更に、斜照明 ユニット４は、レボルバ２に対して着脱可能に構成されており、レボルバ２を回 転させて斜照明ユニット４と対物レンズとを切換えるだけで、欠陥部位検出用照 明光と顕微鏡観察用照明光との切換えを行うことができるため、装置の構成が簡 単であると共に低価格且つコンパクトな外観検査用斜照明装置を提供することが できる。As described above, the oblique illumination device for appearance inspection according to the present embodiment detects no defect on the surface of the substrate, and that there is no obstacle on the observer side, and whether the surface of the substrate is illuminated by oblique illumination light. The reflected light from these can be directly guided to the observer side. Therefore, it is possible to make the illumination field 24 brighter, which makes it easier to find the defective portion, and the illumination light for detecting the defective portion and the illumination light for microscope observation are positioned in the same illumination field. , It is possible to reduce the time to move the defective portion found at the time of detecting the defective portion to the center of the illumination field, that is, near the objective optical axis, and it is possible to perform quick alignment. Further, the oblique illumination unit 4 is configured to be attachable to and detachable from the revolver 2, and by rotating the revolver 2 and switching between the oblique illumination unit 4 and the objective lens, the illumination light for defect site detection and microscope observation can be obtained. It is possible to provide an oblique illumination device for appearance inspection, which has a simple structure and is low in cost and compact because it can be switched to the illumination light for use.
【００２２】 また、本実施例に適用されたフィルタ２０には、一般的にグリーンフィルタが 適用されるが、このフィルタ２０の中心に例えばφ２程度の遮光部（黒点）を形 成し（図示しない）、且つ、光軸ＢＣ間に凸レンズを配置することによって、照 野２４の中心即ち、対物光軸上にφ２の黒点を投影することができる。 具体的には、φ２の黒点を照野２４の中心に形成する場合には、光軸ＡＢの長 さをｍ1 、光軸ＢＣの長さをｍ2 、光軸ＣＯの長さをｍ3 とすると、 ｍ1 ＋ｍ2 ＋ｍ3 の中間に焦点距離がｆ＝（ｍ1 ＋ｍ2 ＋ｍ3 ）／４のレンズ ２８を配置させることになる。Further, a green filter is generally applied to the filter 20 applied to this embodiment, but a light-shielding portion (black dot) of, for example, about φ2 is formed at the center of this filter 20 (not shown). ), And by disposing a convex lens between the optical axes BC, it is possible to project a φ2 black dot on the center of the illumination field 24, that is, on the objective optical axis. Specifically, when forming a black spot of φ2 at the center of the illumination field 24, the length of the optical axis AB is m 1 , the length of the optical axis BC is m 2 , and the length of the optical axis CO is m 3. When will be intermediate to the focal length of m 1 + m 2 + m 3 is disposed a f = (m 1 + m 2 + m 3) / 4 of the lens 28.
【００２３】 観察者は、発見した欠陥部位をこの照野２４の黒点中に位置付けた後、レボル バ２を回転して、倍率５×の対物レンズを対物光軸中に挿入する。黒点は対物光 軸に整合しているため、黒点中に位置付けられた欠陥部位は、対物レンズの光軸 に自動的に位置付けられることになる。 このように照野２４の中心に黒点を形成することによって、欠陥部位の対物光 軸上への位置合わせを迅速且つ高精度に行うことが可能となる。 ただし、斜照明ユニット４から発光された照明光は、対物光軸１４に対して傾 斜しているため、照野２４内の黒点は楕円となる。The observer positions the found defect site in the black spot of the illumination field 24, and then rotates the revolver 2 to insert an objective lens with a magnification of 5 × into the objective optical axis. Since the black spot is aligned with the objective optical axis, the defect site located in the black spot will be automatically located at the optical axis of the objective lens. By thus forming the black spot in the center of the illumination field 24, it becomes possible to quickly and highly accurately align the defective portion with the objective optical axis. However, since the illumination light emitted from the oblique illumination unit 4 is inclined with respect to the objective optical axis 14, the black spot in the illumination field 24 becomes an ellipse.
【００２４】 従って、予めフィルタ２０の黒点を図２に示すような楕円形状にしておけば良 いし、単なるクロスの線でも使用上の不都合はない。なお、図２には、角度θ＝ ４５°の場合において、｛短軸２、長軸２．８｝の割合の楕円状黒点３０がフィ ルタ２０に形成された状態が示されている。Therefore, it suffices if the black dots of the filter 20 are made elliptical as shown in FIG. 2 in advance, and even a simple cross line does not cause any inconvenience in use. Note that FIG. 2 shows a state in which elliptic black dots 30 having a ratio of {minor axis 2, major axis 2.8} are formed on the filter 20 when the angle θ = 45 °.
【００２５】[0025]
本考案の外観検査用斜照明装置は、例えば、基板表面に存在する欠陥部位を検 出する際、観察者側に障害物が存在せず、且つ、斜照明光による基板表面からの 反射光を観察者側に直接導光させることができる。このため、照野を明るくさせ ることができ、欠陥部位の発見が容易となるだけでなく、欠陥部位検出用照明光 と顕微鏡観察用照明光とが同一照野内に位置付けられているため、欠陥部位検出 時において発見された欠陥部位を照野中心即ち対物光軸近傍に移動させる時間を 低減させることができ、迅速な位置合わせが可能となる。更に、斜照明ユニット は、レボルバに対して着脱可能に構成されており、レボルバを回転させて斜照明 ユニットと対物レンズとを切換えるだけで、欠陥部位検出用照明光と顕微鏡観察 用照明光との切換えを行うことができるため、装置の構成が簡単であると共に低 価格且つコンパクトな外観検査用斜照明装置を提供することができる。 The oblique illumination device for visual inspection according to the present invention, for example, when detecting a defect site existing on the substrate surface, there is no obstacle on the observer side, and the reflected light from the substrate surface due to the oblique illumination light is detected. The light can be directly guided to the observer side. For this reason, the illumination field can be made brighter, and the defect area can be easily found. In addition, the illumination light for defect area detection and the illumination light for microscope observation are located in the same illumination field, so It is possible to reduce the time to move the defective portion found at the time of detecting the portion to the center of the illumination field, that is, near the objective optical axis, and it is possible to perform quick alignment. Furthermore, the oblique illumination unit is configured to be attachable to and detachable from the revolver, and by rotating the revolver and switching between the oblique illumination unit and the objective lens, the illumination light for detecting defect areas and the illumination light for microscope observation can be combined. Since switching can be performed, it is possible to provide a low-cost and compact oblique illumination device for appearance inspection, which has a simple device configuration.
【図面の簡単な説明】[Brief description of drawings]
【図１】本考案の一実施例に係る外観検査用斜照明装置
の構成を示す断面図。FIG. 1 is a cross-sectional view showing the structure of an oblique illumination device for visual inspection according to an embodiment of the present invention.
【図２】黒点が形成されたフィルタの平面図。FIG. 2 is a plan view of a filter in which black dots are formed.
２…レボルバ、４…斜照明ユニット、６…対物レンズ取
付ねじ部、８…ユニット取付金具、１０…ビス、１２…
ユニット本体、１４…対物光軸、１６…偏光ミラー、１
８…斜光ミラー。2 ... Revolver, 4 ... Oblique illumination unit, 6 ... Objective lens mounting screw part, 8 ... Unit mounting bracket, 10 ... Screw, 12 ...
Unit body, 14 ... Objective optical axis, 16 ... Polarizing mirror, 1
8 ... Oblique mirror.
Claims (1)
成された斜照明ユニットを備えており、 この斜照明ユニットは、観察用照明光を偏向させる偏向
手段と、 この偏向手段を介して導光された照明光を対物視野に対
して斜光させて照明する斜光手段と、を備えていること
を特徴とする外観検査用斜照明装置。1. An oblique illumination unit detachably attached to a revolver of a microscope, wherein the oblique illumination unit deflects observation illumination light and guides light through the deflecting means. An oblique illumination device for visual inspection, comprising: oblique illumination means for obliquely illuminating the illuminated light with respect to an objective visual field.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5888092U JPH0618956U (en) | 1992-08-21 | 1992-08-21 | Oblique illumination device for visual inspection |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5888092U JPH0618956U (en) | 1992-08-21 | 1992-08-21 | Oblique illumination device for visual inspection |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0618956U true JPH0618956U (en) | 1994-03-11 |
Family
ID=13097083
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5888092U Withdrawn JPH0618956U (en) | 1992-08-21 | 1992-08-21 | Oblique illumination device for visual inspection |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0618956U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2014136640A1 (en) * | 2013-03-06 | 2014-09-12 | 株式会社サタケ | Grain transilluminating device |
| JP2017005252A (en) * | 2015-06-09 | 2017-01-05 | エイピー系▲統▼股▲フン▼有限公司Ａｐ Ｓｙｓｔｅｍｓ Ｉｎｃ． | System for quantifying unevenness caused by laser crystallization equipment and method for quantifying unevenness caused by laser crystallization equipment |
-
1992
- 1992-08-21 JP JP5888092U patent/JPH0618956U/en not_active Withdrawn
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2014136640A1 (en) * | 2013-03-06 | 2014-09-12 | 株式会社サタケ | Grain transilluminating device |
| US9739703B2 (en) | 2013-03-06 | 2017-08-22 | Satake Corporation | Grain transilluminating device |
| JP2017005252A (en) * | 2015-06-09 | 2017-01-05 | エイピー系▲統▼股▲フン▼有限公司Ａｐ Ｓｙｓｔｅｍｓ Ｉｎｃ． | System for quantifying unevenness caused by laser crystallization equipment and method for quantifying unevenness caused by laser crystallization equipment |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A300 | Withdrawal of application because of no request for examination |
Free format text: JAPANESE INTERMEDIATE CODE: A300 Effective date: 19961107 |