TWI696798B - Hot air flow control mechanism of substrate baking machine - Google Patents

Abstract

The invention is a control mechanism for hot air flow of a substrate baking machine, which can control the overall distribution of hot air in the cavity, thereby enhancing the uniform heating of the substrate and effectively reducing the defect rate. It is mainly equipped with a hot air device in the baking cavity. The hot air blown by the hot air device is absorbed and discharged by the air suction unit, so that the lower temperature part of the cavity can be evenly heated, and the hot air is used to perform heat convection in the cavity In order to stabilize the temperature in the cavity, so that the substrate can be maintained at a uniform temperature environment, to achieve better substrate baking quality, it is actually an innovative substrate bake machine hot air flow control mechanism.

Description

Hot air flow control mechanism of substrate baking machine

The invention is a hot air flow control mechanism of a substrate baking machine, which is provided with a hot air device in a cavity, and performs hot convection in the cavity by the hot air, so that the substrate is uniformly heated.

According to the press, the glass substrate is the main process material of the liquid crystal display device (TFT-LCD), which is commonly known as mother glass or plain glass. It is a high-precision and transparent electronic component. Glass plays a role in the liquid crystal display device (TFT-LCD) industry. The role is like a wafer in the semiconductor industry, so the liquid crystal display device (TFT-LCD) industry has nearly perfect requirements for the surface precision of the glass substrate.

Secondly, the manufacturing process of the liquid crystal display device (TFT-LCD) is to use two alkali-free glass substrates, construct color filters and IC circuits on the surface of the alkali-free glass substrates, and dry-etch the surface of the glass substrates. The three primary colors of blue, green and black are built on the glass surface with a fine structure to become a color filter. The IC drive circuit uses a semiconductor process to build a CMOS circuit on the glass surface. The function of the glass substrate is used as a color filter The carrier material of the chip and IC drive circuit, and the liquid crystal display device (TFT-LCD) process requires vacuum evaporation and etching, so the glass substrate must be able to withstand the corrosion of strong acids and alkalis, high temperature process environment, and must be very precise Flatness and flatness of the surface.

Therefore, each process of the glass substrate in the manufacturing process is very fine. Among them, the glass substrate is a very precise electronic part, and absolutely no impurities, damage or scratches on the glass substrate are allowed. When the substrate 30 is baked, please refer to FIG. 8, the substrate 30 is placed in the cavity 3, and is generally heated by the hot plate 31 under the substrate 30, and then by the hot plate 31 The heat evaporates the chemical substances on the surface of the substrate 30. During this process, the temperature is as high as about 70~150℃, and the heat source of the hot plate 31 usually comes from the heater 311 at the bottom, and the heater 311 is set on the hot plate Below 31, the center, ring or end of the hot plate 31 can be kept at a balanced temperature as much as possible. However, although the hot plate 31 has been divided into regions to adjust the heating temperature, it is still unable to maintain the average temperature during the baking process, plus The temperature of each adjacent area will interfere with each other, making the baking effect poor, and affecting the quality of the production of the substrate 30, especially the end 301 or part of the substrate 30 is prone to warp or swell, often causing the warp or Long The raised portion cannot be heated, thereby causing defects in the substrate 30.

In view of this, the inventor specially developed a mechanism to control the flow of hot air, which uses hot air to generate heat convection and control its flow direction, so that the cavity can not only fill the heat evenly, so as to bake the substrate, and improve the lack of temperature at the end of the cavity Missing, strengthen the heating of the substrate uplift or bulge, so as to achieve the overall heating of the substrate, and make up for the shortcomings of the hot plate, and further reduce the defect rate in baking, which is an ideal substrate baking machine hot air Flow to the control agency.

The invention relates to a hot air flow control mechanism for a substrate baking machine, which is a hot air mechanism for a substrate baking machine, which uses a hot air device to gradually heat in a cavity, and then the hot air is discharged by an air suction unit In order to generate thermal convection in the cavity, the substrate is heated uniformly, and the defect rate is effectively reduced.

It is mainly provided with a hot air device on the inner side of the cavity, which blows out the hot air and then distributes it in the cavity, and then discharges the hot air through a plurality of suction units arranged around the cavity, and is used in the process of air supply and exhaust. It can control the flow of hot gas to move the hot air to all corners of the cavity, and can strengthen the end of the substrate, warp or bulge.

The main point of the present invention is that the hot air device is composed of a hot air device and an air suction unit, which sends out hot air from one side of the cavity, and then discharges the hot air by the air suction unit provided on the side of the cavity and the surrounding corners. The air suction units arranged in the four corners are used to make the hot air flow to the edge of the cavity, and fill the cavity with hot air, so as to make up for the lack of heat at the end of the substrate, thereby achieving all-round heating of the substrate.

The key point of the present invention is that in order to enhance the overall air supply of hot air, the hot air device can be installed inside the upper cover, so that the hot air device directly blows out hot air to the substrate, and then is sucked by a plurality of The air unit can control the opening and closing of the air suction unit according to the temperature, so that the hot air can compensate the temperature of the edge of the substrate, and can accelerate the flow of the hot air and the diffusion of the hot air.

The invention is provided with a hot air device on the substrate baking machine, and can use heat convection to make the heat spread throughout the cavity. The concept seems simple, but no one has ever applied it to the cavity of the baking substrate. To improve the lack of heat resistance at the end of the substrate, and after the patent search, there is no hot air flowing to the control mechanism similar to this case, which is an innovative substrate baking machine.

〔Knowledger〕

3‧‧‧cavity

30‧‧‧ substrate

301‧‧‧End

31‧‧‧Hot plate

〔this invention〕

11‧‧‧Base

12‧‧‧Controller

13‧‧‧ Cavity

131‧‧‧Temperature sensor

132‧‧‧Bottom plate

14‧‧‧Hot air device

141‧‧‧Suction unit

15‧‧‧Top cover

2‧‧‧ substrate

21‧‧‧End

Figure 1 is a perspective view of the hot air device of the substrate baking machine of the present invention.

Figure 2 is a schematic diagram of the hot air flow direction of the present invention.

Fig. 3 is a diagram of the first embodiment of the air suction unit of the hot air device of the present invention.

Figure 4 is another schematic diagram of the hot air flow direction of the present invention.

Figure 5 is a schematic cross-sectional view of the hot air flow direction of the present invention.

Fig. 6 is another embodiment of the hot air device of the present invention.

FIG. 7 is a schematic diagram of hot air flow in another embodiment of the hot air device of the present invention.

FIG. 8 is a schematic diagram of a conventional baking substrate.

The inventor specializes in the development, improvement and sale of photoresist pre-baking furnace equipment. In order to improve the quality of substrate baking, it continuously improves the substrate baking machine, including: internal components such as hot plates, cavity... The technical research and development, the inventor has registered the invention No. I601926 structure to increase the number of independent temperature control areas in the photoresist pre-baked oven, No. I574346 composite cold plate for cooling the glass substrate and No. I557389 photoresist pre-baked oven heating device The improvement is mainly for the improvement of the hot plate, and with the fine temperature control, it really improves the baking quality of the substrate.

First, please refer to FIG. 1, which is a perspective view of the hot air device of the substrate baking machine of the present invention, which is composed of a base 11, a controller 12, a cavity 13 and a hot air device 14 and an upper cover 15, the base 11 A controller 12 is provided on the side, and a cavity 13 is placed above the base 11, and a hot air device 14 is disposed in the cavity 13, and the cavity 13 is closed by an upper cover 15, wherein the hot air device 14 is disposed in the cavity The inner side of the body 13, and a plurality of air suction units 141 are provided on the corresponding side of the hot air device 14, through the air supply and suction process, the hot air convection (as shown in Figure 2), so as to expand the hot air Flow and fill the cavity 13 with hot air, wherein the controller 12 can adjust the timing, fixed temperature and quantitative settings of the hot air device 14, and the opening and closing of the air suction unit 141, and has a temperature sensor in the cavity 13 131, to control the temperature and adjust the air volume.

Secondly, please continue to refer to Figures 3 and 4 to show that in order to enhance the effect of hot air convection, the plurality of air suction units 141 are arranged around the bottom plate 132 of the cavity 13 when the hot air device 14 blows out hot air, The direction of the hot air flow can be controlled by adjusting the opening and closing of each air suction unit 141, so that the air flow can move to the corresponding side and the left and right sides of the hot air device 14, and the hot air can be extended to the lower temperature of the cavity 13 Corners to reinforce the lack of lower temperature of the end 21 of the substrate 2 (as shown in FIG. 5).

Next, please continue to refer to Figure 6 for another embodiment of the hot air device of the present invention The embodiment drawing is to accelerate the overall flow of hot air and to surely control the flow of hot air. The hot air device 14 is installed inside the upper cover 15. When the upper cover 15 closes the cavity 13, the hot air device 14 can be blown downward. At this time, a plurality of suction units 141 provided around the bottom plate 132 of the cavity 13 can be used to activate the hot air to move to each suction unit 141 when the suction unit 141 is activated (as shown in FIG. 7) In which, the air suction unit 141 can be selectively opened or closed. Therefore, during baking, the lower surrounding temperature of the bottom plate 132 can be detected to open the air suction unit 141 in this area, which effectively enhances the efficiency of the heat convection in the cavity 13 and makes the heat convection more frequent to reinforce the edge of the cavity 13 The temperature does indeed enable a comprehensive heat source diffusion in the cavity 13, especially for the end 21 of the substrate 2 where the end 21 is warped or raised effectively (please review FIG. 5) to enhance the uniform heating of the substrate 2.

Next, please still refer to FIG. 7, the present invention subverts the traditional way of heating by a hot plate or infrared, and uses a hot air device 14 to blow hot air to heat the substrate 2 (please review FIG. 6 ), and then The air suction unit 141 distributed around the four sides of the bottom plate 132 is used to exhaust air to generate heat convection and control the flow of hot air, especially for the area that is not easily heated at the edge of the cavity 13, and can also make the heat spread all over the corner of the cavity 13 to Maintaining the uniform temperature of the entire cavity 13 makes the heating of the substrate 2 more uniform, and indeed reduces the defect rate of the substrate 2.

In summary, the hot air flow control mechanism of the present invention is unique in the industry. It uses convection of hot air to achieve comprehensive heating, and can fill the cavity with hot air, so that the substrate can be heated uniformly in a comprehensive manner, effectively reducing the defect rate. For patent requirements for inventions, a patent application is filed in accordance with the law.

11‧‧‧Base

12‧‧‧Controller

13‧‧‧ Cavity

131‧‧‧Temperature sensor

14‧‧‧Hot air device

141‧‧‧Suction unit

15‧‧‧Top cover

Claims (3)

A hot air flow control mechanism for a substrate baking machine is mainly composed of a base, a controller, a cavity, a hot air device and an upper cover. A controller is provided on the side of the base, and the cavity is placed above the base. A hot air device is arranged in the cavity, and the cavity is closed by an upper cover, characterized in that the hot air device is arranged on the inner side of the cavity, and a plurality of air suction units are arranged on the corresponding side of the air supply unit. The air supply of the hot air device cooperates with the exhaust air of the air suction unit to promote the convection of the hot air, so that the cavity and its edges are evenly filled with hot air. A hot air flow control mechanism for a substrate baking machine is mainly composed of a base, a controller, a cavity, a hot air device and an upper cover. A controller is provided on the side of the base, and the cavity is placed above the base. A hot air device is arranged in the cavity, and the cavity is closed by an upper cover. The hot air device is arranged on the inner side of the upper cover to blow down the hot air, and a plurality of air suction units are arranged on the bottom plate of the cavity Around the four sides, by the air supply of the hot air device and the exhaust air of the suction unit, the hot air is convected to make the cavity and its edges evenly filled with hot air. The hot air flow control mechanism of the substrate baking machine according to claim 1 or 2, wherein the plurality of air suction units are provided on the four sides of the bottom plate of the cavity, so that the hot air can flow to the four ends of the cavity after being blown out , And can adjust the opening or closing of the suction unit to control the air flow to the set end.

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