TWI694292B - Display panel - Google Patents

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TWI694292B
TWI694292B TW108107112A TW108107112A TWI694292B TW I694292 B TWI694292 B TW I694292B TW 108107112 A TW108107112 A TW 108107112A TW 108107112 A TW108107112 A TW 108107112A TW I694292 B TWI694292 B TW I694292B
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substrate
display panel
gate
scan line
panel according
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TW108107112A
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TW202034047A (en
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林斯巖
謝曜安
黃馨諄
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友達光電股份有限公司
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Priority to TW108107112A priority Critical patent/TWI694292B/en
Priority to CN201910988101.7A priority patent/CN110703524B/en
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Publication of TW202034047A publication Critical patent/TW202034047A/en

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    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/136286Wiring, e.g. gate line, drain line
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/136209Light shielding layers, e.g. black matrix, incorporated in the active matrix substrate, e.g. structurally associated with the switching element
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • H01L27/124Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Chemical & Material Sciences (AREA)
  • Computer Hardware Design (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Liquid Crystal (AREA)

Abstract

A display panel includes a substrate and a plurality of pixel units. The pixel units are disposed on the substrate. Each of the pixel units includes a channel layer, an insulator layer, a first patterned metal layer, and a pixel electrode. The channel layer is disposed on the substrate. The channel layer includes a main body portion and at least one branch portion connected to the main body portion. The main body portion extends along a first direction. The main body portion and the branch portion define a first angle. The insulator layer covers the channel layer. The first patterned metal layer is disposed on the insulator layer and includes a scan line and a first gate connected to the scan line. The scan line extends along a second direction. The first gate and the scan line define a second angle. An orthogonal projection of the first gate on the substrate is between an orthogonal projection of the scan line on the substrate and an orthogonal projection of the branch portion on the substrate. The first direction is perpendicular to the second direction. The pixel electrode is electrically connected to the channel layer.

Description

顯示面板 Display panel

本揭露是關於一種顯示面板。 This disclosure is about a display panel.

由於液晶顯示器具有小體積、低輻射等優點,所以液晶顯示器成為市場上最常見的顯示器。除去被黑色矩陣遮蔽的不透光區域,每個畫素區域的透光區域,即為顯示面板的開口率,開口率越大,顯示面板的光穿透率越好,整體畫面越亮,功耗越低。 The liquid crystal display has become the most common display on the market due to its advantages of small size and low radiation. Excluding the opaque areas blocked by the black matrix, the transparent area of each pixel area is the aperture ratio of the display panel. The larger the aperture ratio, the better the light transmittance of the display panel and the brighter the overall picture. The lower the consumption.

在畫素結構中,當畫素電極與資料線過於接近時,畫素電極與資料線間的雜散電容Cpd(capacitance between pixel and data line)會變大,導致畫素電極的電壓在多晶矽薄膜電晶體關閉期間,會受到資料線所傳送之訊號的影響,而產生所謂的串音效應(cross talk),進而影響液晶顯示面板的顯示品質。為降低上述畫素結構之串音效應,同時使畫素結構的開口率維持在一定程度,已有許多畫素結構相繼被提出。 In the pixel structure, when the pixel electrode and the data line are too close, the stray capacitance Cpd (capacitance between pixel and data line) between the pixel electrode and the data line will increase, resulting in the voltage of the pixel electrode in the polysilicon film When the transistor is turned off, it will be affected by the signal transmitted by the data line, and a so-called cross talk will be generated, which will affect the display quality of the liquid crystal display panel. In order to reduce the crosstalk effect of the above pixel structure and maintain the aperture ratio of the pixel structure to a certain degree, many pixel structures have been proposed one after another.

本揭露之實施例提供一種顯示面板,藉由設計通 道層具有主體部與分支部以及設計第一閘極具有第一部分與第二部分,可以使屏蔽金屬在第一基板的垂直投影重疊於遮光圖案在第一基板的垂直投影,而免於配置額外的遮光圖案來遮蔽屏蔽金屬,而提升了開口率。 The embodiment of the present disclosure provides a display panel The track layer has a main body portion and a branch portion and the first gate is designed to have a first portion and a second portion, so that the vertical projection of the shielding metal on the first substrate overlaps the vertical projection of the shading pattern on the first substrate without additional configuration The shading pattern to shield the shielding metal, and improve the aperture ratio.

於一實施例中,一種顯示面板包含第一基板與複數畫素單元。畫素單元設置於第一基板上,每一畫素單元包含通道層、絕緣層、第一圖案化金屬層以及畫素電極。通道層設置第一基板上,通道層具有一主體部與連接主體部的至少一分支部,主體部沿第一方向延伸,主體部與分支部夾第一角度。絕緣層覆蓋通道層。第一圖案化金屬層設置於絕緣層上,並包含掃描線與連接掃描線的第一閘極,掃描線沿第二方向延伸,第一閘極與掃描線夾二角度,第一閘極在第一基板的垂直投影位於掃描線在第一基板的垂直投影與分支部在第一基板的垂直投影之間,第一方向垂直於第二方向。畫素電極與通道層電性連接。 In one embodiment, a display panel includes a first substrate and a plurality of pixel units. The pixel unit is disposed on the first substrate, and each pixel unit includes a channel layer, an insulating layer, a first patterned metal layer, and a pixel electrode. The channel layer is disposed on the first substrate. The channel layer has a body portion and at least one branch portion connecting the body portion. The body portion extends along the first direction, and the body portion and the branch portion are at a first angle. The insulating layer covers the channel layer. The first patterned metal layer is disposed on the insulating layer and includes a scan line and a first gate electrode connected to the scan line. The scan line extends along the second direction. The first gate electrode and the scan line are at two angles. The vertical projection of the first substrate is between the vertical projection of the scan line on the first substrate and the vertical projection of the branch portion on the first substrate, and the first direction is perpendicular to the second direction. The pixel electrode is electrically connected to the channel layer.

10、10a‧‧‧顯示面板 10.10a‧‧‧Display panel

100‧‧‧第一基板 100‧‧‧The first substrate

102‧‧‧畫素單元 102‧‧‧Pixel unit

104、104A‧‧‧通道層 104, 104A‧‧‧channel layer

1040‧‧‧主體部 1040‧‧‧Main part

1042‧‧‧分支部 1042‧‧‧ Branch

106‧‧‧畫素電極 106‧‧‧Pixel electrode

108‧‧‧絕緣層 108‧‧‧Insulation

110‧‧‧掃描線 110‧‧‧scan line

112‧‧‧第一閘極 112‧‧‧ First gate

1120‧‧‧第一部分 1120‧‧‧Part 1

1122‧‧‧第二部分 1122‧‧‧Part 2

114、114a‧‧‧第二閘極 114、114a‧‧‧Second gate

1140‧‧‧第三部分 1140‧‧‧Part III

1142‧‧‧第四部分 1142‧‧‧Part 4

116‧‧‧資料線 116‧‧‧Data cable

118‧‧‧源極 118‧‧‧Source

120‧‧‧汲極 120‧‧‧ Jiji

122‧‧‧第二基板 122‧‧‧Second substrate

124‧‧‧遮光圖案 124‧‧‧shading pattern

126‧‧‧第一保護層 126‧‧‧The first protective layer

128‧‧‧彩色濾光單元 128‧‧‧Color filter unit

130‧‧‧顯示介質層 130‧‧‧Display medium layer

132‧‧‧平坦層 132‧‧‧flat layer

134‧‧‧第二保護層 134‧‧‧Second protective layer

136‧‧‧共用電極 136‧‧‧Common electrode

138‧‧‧第三保護層 138‧‧‧The third protective layer

140、140a‧‧‧屏蔽金屬 140, 140a‧‧‧shield metal

D1‧‧‧第一方向 D1‧‧‧First direction

D2‧‧‧第二方向 D2‧‧‧Second direction

M1‧‧‧第一圖案化金屬層 M1‧‧‧ First patterned metal layer

M2‧‧‧第二圖案化金屬層 M2‧‧‧Second patterned metal layer

S1、S2‧‧‧距離 S1, S2‧‧‧Distance

TH1、TH2、TH3‧‧‧接觸洞 TH1, TH2, TH3 ‧‧‧ contact hole

α1‧‧‧第一角度 α1‧‧‧First angle

α2‧‧‧第二角度 α2‧‧‧Second Angle

α3‧‧‧第三角度 α3‧‧‧ Third angle

α4‧‧‧第四角度 α4‧‧‧The fourth angle

α5‧‧‧第五角度 α5‧‧‧The fifth angle

A-A’‧‧‧線段 A-A’‧‧‧ line

閱讀以下詳細敘述並搭配對應之圖式,可了解本揭露之多個樣態。需留意的是,圖式中的多個特徵並未依照該業界領域之標準作法繪製實際比例。事實上,所述之特徵的尺寸可以任意的增加或減少以利於討論的清晰性。 Read the following detailed description and the corresponding diagrams to understand the various aspects of this disclosure. It should be noted that many features in the drawings are not drawn according to the standard practice in the industry. In fact, the size of the features described can be arbitrarily increased or decreased to facilitate clarity of the discussion.

第1圖為根據一實施例之顯示面板之俯視圖;第2圖為第1圖之區域R的放大圖;第3圖為沿第2圖的線段A-A’的剖面示意圖;以及 第4圖為根據另一實施例之顯示面板的放大俯視圖。 Figure 1 is a top view of a display panel according to an embodiment; Figure 2 is an enlarged view of the area R of Figure 1; Figure 3 is a schematic cross-sectional view taken along line A-A' of Figure 2; and FIG. 4 is an enlarged plan view of a display panel according to another embodiment.

以下將以圖式及詳細說明清楚說明本揭露之精神,任何所屬技術領域中具有通常知識者在瞭解本揭露之實施例後,當可由本揭露所教示之技術,加以改變及修飾,其並不脫離本揭露之精神與範圍。舉例而言,敘述「第一特徵形成於第二特徵上方或上」,於實施例中將包含第一特徵及第二特徵具有直接接觸;且也將包含第一特徵和第二特徵為非直接接觸,具有額外的特徵形成於第一特徵和第二特徵之間。此外,本揭露在多個範例中將重複使用元件標號以和/或文字。重複的目的在於簡化與釐清,而其本身並不會決定多個實施例以和/或所討論的配置之間的關係。 The spirit of the present disclosure will be clearly explained in the following figures and detailed descriptions. Any person with ordinary knowledge in the technical field who understands the embodiments of the present disclosure may be changed and modified by the techniques taught in the present disclosure. Depart from the spirit and scope of this disclosure. For example, describing "the first feature is formed on or above the second feature", in the embodiment will include the first feature and the second feature have direct contact; and will also include the first feature and the second feature are indirect Contact, with additional features formed between the first feature and the second feature. In addition, in the present disclosure, element labels and/or words will be reused in multiple examples. The purpose of repetition is to simplify and clarify, and it does not itself determine the relationship between multiple embodiments and/or the configurations in question.

此外,方位相對詞彙,如「在...之下」、「下面」、「下」、「上方」或「上」或類似詞彙,在本文中為用來便於描述繪示於圖式中的一個元件或特徵至另外的元件或特徵之關係。方位相對詞彙除了用來描述裝置在圖式中的方位外,其包含裝置於使用或操作下之不同的方位。當裝置被另外設置(旋轉90度或者其他面向的方位),本文所用的方位相對詞彙同樣可以相應地進行解釋。 In addition, relative words such as "below", "below", "below", "above" or "upper" or similar words are used in this text to facilitate description and are shown in the drawings The relationship from one element or feature to another. In addition to describing the orientation of the device in the drawings, the relative term of orientation includes the different orientation of the device under use or operation. When the device is set separately (rotated 90 degrees or other facing orientation), the relative vocabulary of orientation used in this article can also be interpreted accordingly.

第1圖為根據一實施例之顯示面板10之俯視圖。參照第1圖,顯示面板10包含第一基板100與複數畫素單元102。畫素單元102設置於第一基板100上,為了方便說明,第1圖中繪示了第一方向D1與第二方向D2,且第一方向D1與第 二方向D2相異,例如第一方向D1與第二方向D2分別為第1圖的縱向方向與橫向方向,且其彼此呈正交關係。第一基板100可以是透光基板,例如像是玻璃基板。畫素單元102包括通道層104、第一圖案化金屬層M1、第二圖案化金屬層M2以及畫素電極106。 FIG. 1 is a top view of a display panel 10 according to an embodiment. Referring to FIG. 1, the display panel 10 includes a first substrate 100 and a plurality of pixel units 102. The pixel unit 102 is disposed on the first substrate 100. For convenience of description, the first direction D1 and the second direction D2 are shown in FIG. 1, and the first direction D1 and the second direction The two directions D2 are different. For example, the first direction D1 and the second direction D2 are the longitudinal direction and the lateral direction of FIG. 1, respectively, and they are orthogonal to each other. The first substrate 100 may be a light-transmitting substrate, such as a glass substrate, for example. The pixel unit 102 includes a channel layer 104, a first patterned metal layer M1, a second patterned metal layer M2, and a pixel electrode 106.

第2圖為第1圖之區域R的放大圖。第3圖為沿第2圖的線段A-A’的剖面示意圖。為了方便說明,畫素電極106在第2圖中省略。參照第2圖及第3圖,畫素單元102更包含絕緣層108。通道層104、絕緣層108、第一圖案化金屬層M1、第二圖案化金屬層M2以及畫素電極106設置於第一基板100上。絕緣層108覆蓋通道層104。第一圖案化金屬層M1設置於絕緣層108上。通道層104具有主體部1040與連接主體部1040的至少一分支部1042,主體部1040沿第一方向D1延伸,主體部1040與分支部1042夾第一角度α1。於本實施例中,第一角度α1為直角,換句話說,主體部1040實質上垂直於分支部1042。於其他實施例中,第一角度α1可為銳角或鈍角,也就是說,主體部1040不垂直於分支部1042。於本實施例中,通道層104的分支部1042的數量為一。於其他實施例中,分支部1042數量可大於一。通道層104的材料可包含多晶材料,例如多晶矽材料,或是金屬氧化物或類似物,且通道層104可藉由進行擴散、離子佈植、電漿處理或是其他合適製程,來改變其部分區域的導電性,以定義出導體區及半導體區。絕緣層108的材料可包含無機材料(例如:氧化矽、氮化矽、氮氧化矽、其它合適的材料、或上述之組合)。 Figure 2 is an enlarged view of the area R of Figure 1. Fig. 3 is a schematic cross-sectional view taken along line A-A' of Fig. 2. For convenience of explanation, the pixel electrode 106 is omitted in FIG. 2. 2 and 3, the pixel unit 102 further includes an insulating layer 108. The channel layer 104, the insulating layer 108, the first patterned metal layer M1, the second patterned metal layer M2, and the pixel electrode 106 are disposed on the first substrate 100. The insulating layer 108 covers the channel layer 104. The first patterned metal layer M1 is disposed on the insulating layer 108. The channel layer 104 has a body portion 1040 and at least one branch portion 1042 connected to the body portion 1040. The body portion 1040 extends in the first direction D1, and the body portion 1040 and the branch portion 1042 include a first angle α1. In this embodiment, the first angle α1 is a right angle, in other words, the body portion 1040 is substantially perpendicular to the branch portion 1042. In other embodiments, the first angle α1 may be an acute angle or an obtuse angle, that is, the body portion 1040 is not perpendicular to the branch portion 1042. In this embodiment, the number of branch portions 1042 of the channel layer 104 is one. In other embodiments, the number of branch portions 1042 may be greater than one. The material of the channel layer 104 may include polycrystalline material, such as polysilicon material, or metal oxide or the like, and the channel layer 104 may be changed by diffusion, ion implantation, plasma treatment, or other suitable processes The conductivity of some areas defines the conductor area and the semiconductor area. The material of the insulating layer 108 may include inorganic materials (for example: silicon oxide, silicon nitride, silicon oxynitride, other suitable materials, or a combination thereof).

第一圖案化金屬層M1包括掃描線110與連接掃描線110的第一閘極112,掃描線110沿第二方向D2延伸,第一閘極112包含第一部分1120與第二部分1122,第二部分1122與第一部分1120連接,第一部分1120沿第一方向D1延伸,第二部分1122沿第二方向D2延伸,第二部分1122與掃描線110沿第一方向D1的距離S1介於約1微米至約10微米之間,第一閘極112的第一部分1120與掃描線110夾第二角度α2,第一閘極112在第一基板100的垂直投影位於掃描線110在第一基板100的垂直投影與通道層104的分支部1042在第一基板100的垂直投影之間。於本實施例中,第二角度α2為直角,換句話說,掃描線110實質上垂直於第一閘極112的第一部分1120。於其他實施例中,第二角度α2可為銳角或鈍角,也就是說,掃描線110不垂直於第一閘極112。 The first patterned metal layer M1 includes a scan line 110 and a first gate 112 connected to the scan line 110. The scan line 110 extends along the second direction D2. The first gate 112 includes a first portion 1120 and a second portion 1122. The portion 1122 is connected to the first portion 1120. The first portion 1120 extends along the first direction D1, the second portion 1122 extends along the second direction D2, and the distance S1 between the second portion 1122 and the scan line 110 along the first direction D1 is between about 1 micron Between about 10 microns, the first portion 1120 of the first gate 112 and the scan line 110 are at a second angle α2. The vertical projection of the first gate 112 on the first substrate 100 is located perpendicular to the scan line 110 on the first substrate 100 The projection and the branch portion 1042 of the channel layer 104 are between the vertical projections of the first substrate 100. In this embodiment, the second angle α2 is a right angle. In other words, the scan line 110 is substantially perpendicular to the first portion 1120 of the first gate 112. In other embodiments, the second angle α2 may be an acute angle or an obtuse angle, that is, the scan line 110 is not perpendicular to the first gate 112.

第二部分1122與第一部分1120夾第三角度α3。於本實施例中,第三角度α3為直角,換句話說,第一部分1120實質上垂直於第二部分1122。於其他實施例中,第三角度α3可為銳角或鈍角,也就是說,第一部分1120不垂直於第二部分1122。 The second portion 1122 and the first portion 1120 include a third angle α3. In this embodiment, the third angle α3 is a right angle. In other words, the first portion 1120 is substantially perpendicular to the second portion 1122. In other embodiments, the third angle α3 may be an acute angle or an obtuse angle, that is, the first portion 1120 is not perpendicular to the second portion 1122.

第一圖案化金屬層M1更包括第二閘極114,第二閘極114電性連接於相鄰另一畫素單元的通道層104A。第二閘極114包含第三部分1140與第四部分1142,第四部分1142與第三部分1140連接,第三部分1140沿第一方向D1延伸,第四部分1142沿第二方向D2延伸,第四部分1142與掃描線110沿第一方向D1的距離S2介於約1微米至約10微米之間。第二閘極114 的第三部分1140與掃描線110夾第四角度α4。於本實施例中,第四角度α4為直角,換句話說,第二閘極114的第三部分1140實質上垂直於掃描線110。於其他實施例中,第四角度α4可為銳角或鈍角,也就是說,第二閘極114的第三部分1140不垂直於掃描線110。於本實施例中,第一閘極112與第二閘極114位於掃描線110的相異側,換句話說,掃描線110位於第一閘極112與第二閘極114之間。於本實施例中,第一閘極112與第二閘極114位於掃描線110的一對角線上。 The first patterned metal layer M1 further includes a second gate 114 that is electrically connected to the channel layer 104A of another adjacent pixel unit. The second gate 114 includes a third portion 1140 and a fourth portion 1142. The fourth portion 1142 is connected to the third portion 1140. The third portion 1140 extends along the first direction D1, and the fourth portion 1142 extends along the second direction D2. The distance S2 between the four portions 1142 and the scan line 110 along the first direction D1 is between about 1 micrometer and about 10 micrometers. Second gate 114 The third portion 1140 and the scan line 110 are at a fourth angle α4. In this embodiment, the fourth angle α4 is a right angle. In other words, the third portion 1140 of the second gate 114 is substantially perpendicular to the scan line 110. In other embodiments, the fourth angle α4 may be an acute angle or an obtuse angle, that is, the third portion 1140 of the second gate 114 is not perpendicular to the scan line 110. In this embodiment, the first gate 112 and the second gate 114 are located on different sides of the scan line 110. In other words, the scan line 110 is located between the first gate 112 and the second gate 114. In this embodiment, the first gate 112 and the second gate 114 are located on a diagonal line of the scan line 110.

第四部分1142與第三部分1140夾第五角度α5。於本實施例中,第五角度α5為直角,換句話說,第三部分1140實質上垂直於第四部分1142。於其他實施例中,第五角度α5可為銳角或鈍角,也就是說,第三部分1140不垂直於第四部分1142。於一實施例中,第一閘極112的第一部分1120與第二部分1122分別平行於第二閘極114的第三部分1140與第四部分1142。 The fourth portion 1142 and the third portion 1140 sandwich a fifth angle α5. In this embodiment, the fifth angle α5 is a right angle. In other words, the third portion 1140 is substantially perpendicular to the fourth portion 1142. In other embodiments, the fifth angle α5 may be an acute angle or an obtuse angle, that is, the third portion 1140 is not perpendicular to the fourth portion 1142. In an embodiment, the first portion 1120 and the second portion 1122 of the first gate 112 are parallel to the third portion 1140 and the fourth portion 1142 of the second gate 114, respectively.

第二圖案化金屬層M2設置於第一圖案化金屬層M1上方,並包含資料線116、源極118與汲極120,源極118與汲極120分別與通道層104電性連接,且汲極120與資料線116與源極118沿第二方向D2間隔開,且汲極120與源極118亦沿第一方向D1間隔開。 The second patterned metal layer M2 is disposed above the first patterned metal layer M1 and includes a data line 116, a source 118 and a drain 120. The source 118 and the drain 120 are electrically connected to the channel layer 104, respectively The pole 120 and the data line 116 and the source 118 are spaced apart in the second direction D2, and the drain 120 and the source 118 are also spaced apart in the first direction D1.

顯示面板10更包括第二基板122、遮光圖案124、第一保護層126、彩色濾光單元128以及顯示介質層130,第二基板122設置於第一基板100的對向。顯示介質層130位於第一基板100與第二基板122之間。遮光圖案124設置於第二基板 122上,且位於第二基板122和顯示介質層130之間。第二圖案化金屬層M2設置於第一保護層126上方。遮光圖案124遮蔽相鄰之多個畫素單元102之多個畫素電極106之間的間隙,例如,遮光圖案124可遮蔽掃描線110、第一閘極112、汲極120與資料線116。於其他實施例中,顯示面板10還可包括其他遮光圖案遮蔽源極118。並且,配置於另一畫素單元102的遮光圖案124可遮蔽第二閘極114。第一保護層126設置於第一圖案化金屬層M1上,具體而言,第一保護層126位於第一圖案化金屬層M1與第二圖案化金屬層M2之間,以使兩者電性絕緣。第一保護層126的材質可為無機材料、有機材料或其組合,無機材料例如是氧化矽、氮化矽、氮氧化矽、或上述至少二種材料的堆疊層。有機材料例如是聚醯亞胺系樹脂、環氧系樹脂或壓克力系樹脂等高分子材料。 The display panel 10 further includes a second substrate 122, a light-shielding pattern 124, a first protective layer 126, a color filter unit 128, and a display medium layer 130. The second substrate 122 is disposed opposite to the first substrate 100. The display medium layer 130 is located between the first substrate 100 and the second substrate 122. The light shielding pattern 124 is disposed on the second substrate On 122, and between the second substrate 122 and the display medium layer 130. The second patterned metal layer M2 is disposed above the first protective layer 126. The light shielding pattern 124 covers the gaps between the pixel electrodes 106 of the adjacent pixel units 102. For example, the light shielding pattern 124 can shield the scan line 110, the first gate 112, the drain 120 and the data line 116. In other embodiments, the display panel 10 may further include other light-shielding patterns to shield the source 118. Moreover, the light-shielding pattern 124 disposed on the other pixel unit 102 can shield the second gate 114. The first protective layer 126 is disposed on the first patterned metal layer M1. Specifically, the first protective layer 126 is located between the first patterned metal layer M1 and the second patterned metal layer M2 to make the two electrically insulation. The material of the first protective layer 126 may be an inorganic material, an organic material, or a combination thereof. The inorganic material is, for example, silicon oxide, silicon nitride, silicon oxynitride, or a stacked layer of at least two materials. The organic material is, for example, a polymer material such as polyimide-based resin, epoxy-based resin, or acrylic-based resin.

在本實施例中,顯示介質層130例如為液晶。但本揭露不限於此,在其他實施例中,顯示介質層130也可為有機發光二極體(organic light-emitting diode,OLED)或其他適當材料。在本實施例中,遮光圖案124的材質可為遮光材料,例如:黑色樹脂或金屬。值得說明的是第一基板100另包括配向膜(未繪示),且第二基板122也另包括配向膜(未繪示)等液晶顯示面板10之必要元件,為本領域具通常知識者所熟知,故在此不多加贅述其作用及製作方式。 In this embodiment, the display medium layer 130 is, for example, liquid crystal. However, the disclosure is not limited to this. In other embodiments, the display medium layer 130 may also be an organic light-emitting diode (OLED) or other suitable materials. In this embodiment, the material of the light-shielding pattern 124 may be a light-shielding material, such as black resin or metal. It is worth noting that the first substrate 100 further includes an alignment film (not shown), and the second substrate 122 also includes an alignment film (not shown) and other necessary elements of the liquid crystal display panel 10, which are known to those skilled in the art. It is well known, so I will not repeat its function and production method here.

在本實施例中,為了使顯示介質層130能夠在具有良好平坦度的表面形成,顯示面板10可更包括配置於彩色濾光單元128與顯示介質層130之間的平坦層132。平坦層132的 材質可為無機材料、有機材料或其組合,無機材料例如是氧化矽、氮化矽、氮氧化矽、或上述至少二種材料的堆疊層。有機材料例如是聚醯亞胺系樹脂、環氧系樹脂或壓克力系樹脂等高分子材料。 In this embodiment, in order to enable the display medium layer 130 to be formed on a surface with good flatness, the display panel 10 may further include a flat layer 132 disposed between the color filter unit 128 and the display medium layer 130. Flat layer 132 The material may be an inorganic material, an organic material, or a combination thereof. The inorganic material is, for example, silicon oxide, silicon nitride, silicon oxynitride, or a stacked layer of at least two materials. The organic material is, for example, a polymer material such as polyimide-based resin, epoxy-based resin, or acrylic-based resin.

畫素單元102還包括第二保護層134、共用電極136與第三保護層138。第二保護層134位於第二圖案化金屬層M2上,接觸洞TH1貫穿第二保護層134,共用電極136配置於第二保護層134上,第三保護層138配置於第二保護層134與共用電極136上,接觸洞TH2貫穿第三保護層138,畫素電極106配置於第三保護層138上,並透過接觸洞TH2與汲極120電性連接。源極118透過接觸洞TH3與通道層104(例如:主體部1040)電性連接。 The pixel unit 102 further includes a second protective layer 134, a common electrode 136, and a third protective layer 138. The second protective layer 134 is located on the second patterned metal layer M2, the contact hole TH1 penetrates the second protective layer 134, the common electrode 136 is disposed on the second protective layer 134, and the third protective layer 138 is disposed on the second protective layer 134 and On the common electrode 136, the contact hole TH2 penetrates the third protective layer 138, the pixel electrode 106 is disposed on the third protective layer 138, and is electrically connected to the drain 120 through the contact hole TH2. The source electrode 118 is electrically connected to the channel layer 104 (for example, the body portion 1040) through the contact hole TH3.

第二保護層134可以提供保護與平坦化下方疊層的功能,舉例而言,第二保護層134可以保護與平坦化第二圖案化金屬層M2(例如源極118、汲極120與資料線116),第三保護層138可以保護與平坦化共用電極136。第二與第三保護層134、138的材質可為無機材料、有機材料或其組合,無機材料例如是氧化矽、氮化矽、氮氧化矽、或上述至少二種材料的堆疊層。有機材料例如是聚醯亞胺系樹脂、環氧系樹脂或壓克力系樹脂等高分子材料。 The second protection layer 134 can provide the function of protecting and planarizing the underlying stack. For example, the second protection layer 134 can protect and planarize the second patterned metal layer M2 (such as the source 118, the drain 120, and the data line 116), the third protective layer 138 can protect and planarize the common electrode 136. The materials of the second and third protective layers 134 and 138 may be inorganic materials, organic materials, or a combination thereof. The inorganic materials are, for example, silicon oxide, silicon nitride, silicon oxynitride, or a stacked layer of at least two materials. The organic material is, for example, a polymer material such as polyimide-based resin, epoxy-based resin, or acrylic-based resin.

共用電極136與畫素電極106之間的電位差能驅動顯示介質層130的液晶分子,進而使顯示面板10顯示畫面。在本實施例中,共用電極136與畫素電極106配置於同一基板(即第一基板100)上。 The potential difference between the common electrode 136 and the pixel electrode 106 can drive the liquid crystal molecules of the display medium layer 130 to further cause the display panel 10 to display a screen. In this embodiment, the common electrode 136 and the pixel electrode 106 are disposed on the same substrate (ie, the first substrate 100).

顯示面板10還包括屏蔽金屬(Shielding metal;SM)140,屏蔽金屬140設置於第一基板100上並形成於通道層104所對應的區域,具體而言,屏蔽金屬140位於第一基板100與通道層104之間,換句話說,屏蔽金屬140在第一基板100的垂直投影重疊於通道層104的主體部1040在第一基板100的垂直投影,亦重疊於資料線116在第一基板100的垂直投影,屏蔽金屬140為不透明,其作用為遮蔽光線。舉例而言,可以阻擋來自第一基板100下方的光線(例如:背光模組)及來自側面及上方的反射光線入射到形成在資料線116下方的通道層104的主體部1040,避免通道層104的主體部1040照光所引發的光漏電,有效提升電晶體的元件穩定性與畫面顯示品質。 The display panel 10 further includes a shielding metal (SM) 140. The shielding metal 140 is disposed on the first substrate 100 and formed in a region corresponding to the channel layer 104. Specifically, the shielding metal 140 is located between the first substrate 100 and the channel Between the layers 104, in other words, the vertical projection of the shielding metal 140 on the first substrate 100 overlaps the vertical projection of the body portion 1040 of the channel layer 104 on the first substrate 100, and also overlaps the data line 116 on the first substrate 100 In vertical projection, the shielding metal 140 is opaque, and its role is to shield light. For example, the light from below the first substrate 100 (for example: a backlight module) and the reflected light from the side and above can be blocked from entering the body portion 1040 of the channel layer 104 formed below the data line 116 to avoid the channel layer 104 The light leakage caused by the illumination of the main body portion 1040 effectively improves the device stability and picture display quality of the transistor.

屏蔽金屬140在第一基板100的垂直投影重疊於遮光圖案124在第一基板100的垂直投影。於一實施例中,屏蔽金屬140在第一基板100的垂直投影面積完全落在遮光圖案124在第一基板100的垂直投影面積之內。由於遮光圖案124為不透光區域,屏蔽金屬140是設計在遮光圖案124正下方(例如:屏蔽金屬140在第一基板100的垂直投影重疊於遮光圖案124在第一基板100的垂直投影),因此不會影響開口率。詳細而言,藉由設計通道層104具有主體部1040與分支部1042,以及第一閘極112具有第一部分1120與第二部分1122,可使屏蔽金屬140的位置落在遮光圖案124正下方,也就是說,使屏蔽金屬140在第一基板100的垂直投影重疊於遮光圖案124在第一基板100的垂直投影,如此一來,由於可藉由現有的遮光圖案124遮蔽屏蔽電極,故無須設計額外的遮光圖案124於屏蔽電極 上,使顯示面板10的開口率不受到屏蔽電極的限制,換句話說,在不降低顯示面板10的開口率的前提下,可利用屏蔽電極使通道層104的主體部1040免於受到照而引發光漏電,而有效提升電晶體的元件穩定性與畫面顯示品質。也可以說,因為無須設計額外的遮光圖案124於屏蔽電極上,因此,可以增加顯示面板10的開口率。 The vertical projection of the shielding metal 140 on the first substrate 100 overlaps the vertical projection of the light shielding pattern 124 on the first substrate 100. In one embodiment, the vertical projection area of the shielding metal 140 on the first substrate 100 completely falls within the vertical projection area of the light shielding pattern 124 on the first substrate 100. Since the light shielding pattern 124 is an opaque area, the shielding metal 140 is designed directly under the light shielding pattern 124 (for example, the vertical projection of the shielding metal 140 on the first substrate 100 overlaps the vertical projection of the light shielding pattern 124 on the first substrate 100), Therefore, it will not affect the aperture ratio. In detail, by designing the channel layer 104 to have a body portion 1040 and a branch portion 1042, and the first gate 112 to have a first portion 1120 and a second portion 1122, the position of the shielding metal 140 can be placed directly under the light shielding pattern 124, In other words, the vertical projection of the shielding metal 140 on the first substrate 100 overlaps the vertical projection of the light-shielding pattern 124 on the first substrate 100. In this way, since the shielding electrode can be shielded by the existing light-shielding pattern 124, there is no need to design Additional shading pattern 124 on the shield electrode On the other hand, the aperture ratio of the display panel 10 is not limited by the shielding electrode. In other words, the shielding electrode can be used to protect the body portion 1040 of the channel layer 104 from exposure without reducing the aperture ratio of the display panel 10 Light leakage is caused, which effectively improves the device stability and picture display quality of the transistor. It can also be said that since there is no need to design an additional light-shielding pattern 124 on the shield electrode, the aperture ratio of the display panel 10 can be increased.

由於第二閘極114與第一閘極112分別位於掃描線110的相異側,因此,畫素單元102的屏蔽電極以及配置於相鄰另一畫素單元102的屏蔽電極亦位於掃描線110的相異側。 Since the second gate 114 and the first gate 112 are respectively located on different sides of the scan line 110, the shield electrode of the pixel unit 102 and the shield electrode disposed adjacent to another pixel unit 102 are also located on the scan line 110 The different side.

第4圖為根據另一實施例之顯示面板10a的放大俯視圖。為了方便說明,畫素電極106在第4圖中省略。第4圖與第2圖之差異在於第二閘極114a相對於第一閘極112的位置。具體而言,第一閘極112與第二閘極114a位於掃描線110的相同側。遮光圖案124a同時遮蔽第一閘極112與第二閘極114。 FIG. 4 is an enlarged plan view of a display panel 10a according to another embodiment. For convenience of explanation, the pixel electrode 106 is omitted in FIG. 4. The difference between FIG. 4 and FIG. 2 is the position of the second gate 114a relative to the first gate 112. Specifically, the first gate 112 and the second gate 114a are located on the same side of the scan line 110. The light-shielding pattern 124a simultaneously shields the first gate 112 and the second gate 114.

以上概述數個實施方式或實施例的特徵,使所屬領域中具有通常知識者可以從各個方面更加瞭解本揭露。本技術領域中具有通常知識者應可理解,且可輕易地以本揭露為基礎來設計或修飾其他製程及結構,並以此達到相同的目的及/或達到在此介紹的實施方式或實施例相同之優點。本技術領域中具有通常知識者也應了解這些相等的結構並未背離本揭露的揭露精神與範圍。在不背離本揭露的精神與範圍之前提下,可對本揭露進行各種改變、置換或修改。 The above summarizes the features of several embodiments or examples, so that those with ordinary knowledge in the art can understand the disclosure from various aspects. Those with ordinary knowledge in this technical field should understand and can easily design or modify other processes and structures based on this disclosure to achieve the same purpose and/or to achieve the embodiments or examples described herein The same advantages. Those of ordinary skill in the art should also understand that these equivalent structures do not deviate from the disclosure spirit and scope of this disclosure. It is possible to make various changes, replacements or modifications to this disclosure without departing from the spirit and scope of this disclosure.

10‧‧‧顯示面板 10‧‧‧Display panel

102‧‧‧畫素單元 102‧‧‧Pixel unit

104、104A‧‧‧通道層 104, 104A‧‧‧channel layer

1040‧‧‧主體部 1040‧‧‧Main part

1042‧‧‧分支部 1042‧‧‧ Branch

110‧‧‧掃描線 110‧‧‧scan line

112‧‧‧第一閘極 112‧‧‧ First gate

1120‧‧‧第一部分 1120‧‧‧Part 1

1122‧‧‧第二部分 1122‧‧‧Part 2

114‧‧‧第二閘極 114‧‧‧The second gate

1140‧‧‧第三部分 1140‧‧‧Part III

1142‧‧‧第四部分 1142‧‧‧Part 4

116‧‧‧資料線 116‧‧‧Data cable

118‧‧‧源極 118‧‧‧Source

120‧‧‧汲極 120‧‧‧ Jiji

124‧‧‧遮光圖案 124‧‧‧shading pattern

140‧‧‧屏蔽金屬 140‧‧‧shield metal

D1‧‧‧第一方向 D1‧‧‧First direction

D2‧‧‧第二方向 D2‧‧‧Second direction

M1‧‧‧第一圖案化金屬層 M1‧‧‧ First patterned metal layer

M2‧‧‧第二圖案化金屬層 M2‧‧‧Second patterned metal layer

R‧‧‧區域 R‧‧‧Region

S1、S2‧‧‧距離 S1, S2‧‧‧Distance

TH2、TH3‧‧‧接觸洞 TH2, TH3‧‧‧contact hole

α1‧‧‧第一角度 α1‧‧‧First angle

α2‧‧‧第二角度 α2‧‧‧Second Angle

α3‧‧‧第三角度 α3‧‧‧ Third angle

α4‧‧‧第四角度 α4‧‧‧The fourth angle

α5‧‧‧第五角度 α5‧‧‧The fifth angle

A-A’‧‧‧線段 A-A’‧‧‧ line

Claims (17)

一種顯示面板,包含:一第一基板;以及複數畫素單元,設置於該第一基板上,每一畫素單元包含:一通道層,設置於該第一基板上,該通道層具有一主體部與至少一分支部連接該主體部,該主體部沿一第一方向延伸,該主體部與該分支部夾一第一角度;一絕緣層,覆蓋該通道層;一第一圖案化金屬層,設置於該絕緣層上,並包含一掃描線與一第一閘極連接該掃描線,該掃描線沿一第二方向延伸,該第一閘極與該掃描線夾一第二角度,該第一閘極在該第一基板的垂直投影位於該掃描線在該第一基板的垂直投影與該分支部在該第一基板的垂直投影之間,該第一方向垂直於該第二方向;一畫素電極,與該通道層電性連接;以及一屏蔽金屬,設置於該第一基板與該通道層之間。 A display panel includes: a first substrate; and a plurality of pixel units disposed on the first substrate, each pixel unit includes: a channel layer disposed on the first substrate, the channel layer has a main body The body portion is connected to the body portion with at least one branch portion. The body portion extends in a first direction. The body portion and the branch portion are at a first angle; an insulating layer covers the channel layer; and a first patterned metal layer , Disposed on the insulating layer, and includes a scan line connected to the scan line with a first gate, the scan line extends in a second direction, the first gate and the scan line are at a second angle, the The vertical projection of the first gate electrode on the first substrate is between the vertical projection of the scan line on the first substrate and the vertical projection of the branch portion on the first substrate, the first direction is perpendicular to the second direction; A pixel electrode is electrically connected to the channel layer; and a shielding metal is disposed between the first substrate and the channel layer. 如請求項1所述之顯示面板,其中該通道層包含多晶材料。 The display panel according to claim 1, wherein the channel layer includes a polycrystalline material. 如請求項1所述之顯示面板,其中該第一閘極包含一第一部分與一第二部分,第二部分與該第一部分連接並夾一第三角度。 The display panel according to claim 1, wherein the first gate includes a first part and a second part, and the second part is connected to the first part at a third angle. 如請求項3所述之顯示面板,其中該第三角度為直角。 The display panel according to claim 3, wherein the third angle is a right angle. 如請求項3所述之顯示面板,其中該第一部分沿該第一方向延伸,該第二部分沿該第二方向延伸,該第二部分與該掃描線沿該第一方向的距離介於約1微米至約10微米之間。 The display panel of claim 3, wherein the first portion extends along the first direction, the second portion extends along the second direction, and the distance between the second portion and the scan line along the first direction is between about Between 1 micron and about 10 microns. 如請求項1所述之顯示面板,其中該第一圖案化金屬層更包含一第二閘極,該第二閘極與該掃描線夾一第四角度。 The display panel according to claim 1, wherein the first patterned metal layer further includes a second gate, and the second gate and the scan line are at a fourth angle. 如請求項6所述之顯示面板,其中該第二閘極電性連接於相鄰另一畫素單元的一通道層。 The display panel according to claim 6, wherein the second gate is electrically connected to a channel layer adjacent to another pixel unit. 如請求項5所述之顯示面板,其中該第一閘極與該第二閘極位於該掃描線的相同側。 The display panel according to claim 5, wherein the first gate and the second gate are located on the same side of the scan line. 如請求項5所述之顯示面板,其中該第一閘極與該第二閘極位於該掃描線的相異側。 The display panel according to claim 5, wherein the first gate and the second gate are located on different sides of the scan line. 如請求項9所述之顯示面板,其中該第一閘極與該第二閘極位於該掃描線的一對角線上。 The display panel according to claim 9, wherein the first gate and the second gate are located on a diagonal line of the scan line. 如請求項5所述之顯示面板,其中該第二閘極包含一第三部分與一第四部分,該第四部分與該第三部分連接並夾一第五角度。 The display panel according to claim 5, wherein the second gate includes a third part and a fourth part, and the fourth part is connected to the third part and a fifth angle is included. 如請求項11所述之顯示面板,其中該第五角度為直角。 The display panel according to claim 11, wherein the fifth angle is a right angle. 如請求項1所述之顯示面板,其中該通道層的該分支部的數量為一。 The display panel according to claim 1, wherein the number of the branch portions of the channel layer is one. 如請求項1所述之顯示面板,更包含:一第二基板,設置於該第一基板的對向;以及一遮光圖案,設置於該第二基板上,其中該遮光圖案在該第一基板的垂直投影重疊於該屏蔽金屬在該第一基板的垂直投影。 The display panel according to claim 1, further comprising: a second substrate disposed opposite to the first substrate; and a light shielding pattern disposed on the second substrate, wherein the light shielding pattern is on the first substrate The vertical projection of is overlapped with the vertical projection of the shielding metal on the first substrate. 如請求項14所述之顯示面板,更包含:一保護層,設置於該第一圖案化金屬層上;以及一第二圖案化金屬層,設置於該保護層上,並包含一資料線、一源極與一汲極,該源極與該汲極分別與該通道層電性連接,且該汲極分別與該資料線及該源極沿該第二方向間隔開。 The display panel according to claim 14, further comprising: a protective layer disposed on the first patterned metal layer; and a second patterned metal layer disposed on the protective layer and including a data line, A source electrode and a drain electrode, the source electrode and the drain electrode are electrically connected to the channel layer respectively, and the drain electrode is spaced apart from the data line and the source electrode along the second direction. 如請求項15所述之顯示面板,其中該資料線在該第一基板的垂直投影重疊於該屏蔽金屬在該第一基板的垂直投影。 The display panel according to claim 15, wherein the vertical projection of the data line on the first substrate overlaps the vertical projection of the shielding metal on the first substrate. 如請求項14所述之顯示面板,其中該屏蔽金屬在該第一基板的垂直投影面積完全落在該遮光圖案在該第一基板的垂直投影面積之內。 The display panel according to claim 14, wherein the vertical projection area of the shielding metal on the first substrate falls completely within the vertical projection area of the shading pattern on the first substrate.
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