TWI688675B - 熔射用材料、熔射被膜及附熔射被膜之構件 - Google Patents

熔射用材料、熔射被膜及附熔射被膜之構件 Download PDF

Info

Publication number
TWI688675B
TWI688675B TW105110772A TW105110772A TWI688675B TW I688675 B TWI688675 B TW I688675B TW 105110772 A TW105110772 A TW 105110772A TW 105110772 A TW105110772 A TW 105110772A TW I688675 B TWI688675 B TW I688675B
Authority
TW
Taiwan
Prior art keywords
rare earth
earth element
spraying
particles
spray coating
Prior art date
Application number
TW105110772A
Other languages
English (en)
Chinese (zh)
Other versions
TW201639978A (zh
Inventor
長山将之
伊部博之
都築一志
Original Assignee
日商東京威力科創股份有限公司
日商福吉米股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=57550805&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=TWI688675(B) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by 日商東京威力科創股份有限公司, 日商福吉米股份有限公司 filed Critical 日商東京威力科創股份有限公司
Publication of TW201639978A publication Critical patent/TW201639978A/zh
Application granted granted Critical
Publication of TWI688675B publication Critical patent/TWI688675B/zh

Links

Images

Landscapes

  • Coating By Spraying Or Casting (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Drying Of Semiconductors (AREA)
TW105110772A 2015-05-08 2016-04-06 熔射用材料、熔射被膜及附熔射被膜之構件 TWI688675B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2015-095516 2015-05-08
JP2015095516 2015-05-08
JP2016-043940 2016-03-07
JP2016043940A JP6722005B2 (ja) 2015-05-08 2016-03-07 溶射用材料、溶射皮膜および溶射皮膜付部材

Publications (2)

Publication Number Publication Date
TW201639978A TW201639978A (zh) 2016-11-16
TWI688675B true TWI688675B (zh) 2020-03-21

Family

ID=57550805

Family Applications (1)

Application Number Title Priority Date Filing Date
TW105110772A TWI688675B (zh) 2015-05-08 2016-04-06 熔射用材料、熔射被膜及附熔射被膜之構件

Country Status (2)

Country Link
JP (1) JP6722005B2 (ja)
TW (1) TWI688675B (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11414325B2 (en) 2016-11-02 2022-08-16 Nippon Yttrium Co., Ltd. Film-forming material and film
US20190078199A1 (en) * 2017-09-08 2019-03-14 Applied Materials, Inc. Rare-earth-based oxyfluoride ald coating for chamber productivity enhancement

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014002580A1 (ja) * 2012-06-27 2014-01-03 日本イットリウム株式会社 溶射材料及びその製造方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4160224B2 (ja) * 1998-12-21 2008-10-01 信越化学工業株式会社 オキシハロゲン化物系部材
US9017765B2 (en) * 2008-11-12 2015-04-28 Applied Materials, Inc. Protective coatings resistant to reactive plasma processing
US20130115418A1 (en) * 2011-11-03 2013-05-09 Coorstek, Inc. Multilayer rare-earth oxide coatings and methods of making
JP5939084B2 (ja) * 2012-08-22 2016-06-22 信越化学工業株式会社 希土類元素オキシフッ化物粉末溶射材料の製造方法
JP5636573B2 (ja) * 2013-01-18 2014-12-10 日本イットリウム株式会社 溶射材料
JP5668260B1 (ja) * 2013-08-08 2015-02-12 日本イットリウム株式会社 プラズマ溶射用スラリー
JP5911036B1 (ja) * 2014-11-21 2016-04-27 日本イットリウム株式会社 焼結体

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014002580A1 (ja) * 2012-06-27 2014-01-03 日本イットリウム株式会社 溶射材料及びその製造方法

Also Published As

Publication number Publication date
JP6722005B2 (ja) 2020-07-15
TW201639978A (zh) 2016-11-16
JP2016211071A (ja) 2016-12-15

Similar Documents

Publication Publication Date Title
KR102611076B1 (ko) 용사용 재료, 용사 피막 및 용사 피막 부착 부재
TWI751106B (zh) 熔射用材料、熔射被膜及附熔射被膜之構件
KR102611074B1 (ko) 용사용 재료, 용사 피막 및 용사 피막 부착 부재
JP6722004B2 (ja) 溶射用材料、溶射皮膜および溶射皮膜付部材
TWI738645B (zh) 熔射用材料、熔射被膜及附熔射被膜之構件
CN107287545B (zh) 氟化钇喷涂涂层、用于其的喷涂材料以及包括喷涂涂层的抗腐蚀涂层
TWI719814B (zh) 附熔射皮膜之基材
WO2016080459A1 (ja) 焼結体
TWI756374B (zh) 熔射皮膜、熔射用粉、熔射用粉之製造方法、及熔射皮膜之製造方法
TWI688675B (zh) 熔射用材料、熔射被膜及附熔射被膜之構件
JP6918996B2 (ja) 溶射用材料、溶射皮膜および溶射皮膜付部材
KR102395660B1 (ko) 용사 재료 및 그 용사 재료로 제조된 용사 피막
JP7476433B2 (ja) プラズマエッチング装置用部材等に好適な成膜材料およびその製造方法
TW202347461A (zh) 複合結構物及具備複合結構物之半導體製造裝置