TWI688675B - 熔射用材料、熔射被膜及附熔射被膜之構件 - Google Patents
熔射用材料、熔射被膜及附熔射被膜之構件 Download PDFInfo
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- TWI688675B TWI688675B TW105110772A TW105110772A TWI688675B TW I688675 B TWI688675 B TW I688675B TW 105110772 A TW105110772 A TW 105110772A TW 105110772 A TW105110772 A TW 105110772A TW I688675 B TWI688675 B TW I688675B
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- Prior art keywords
- rare earth
- earth element
- spraying
- particles
- spray coating
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- Coating By Spraying Or Casting (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Drying Of Semiconductors (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015-095516 | 2015-05-08 | ||
JP2015095516 | 2015-05-08 | ||
JP2016-043940 | 2016-03-07 | ||
JP2016043940A JP6722005B2 (ja) | 2015-05-08 | 2016-03-07 | 溶射用材料、溶射皮膜および溶射皮膜付部材 |
Publications (2)
Publication Number | Publication Date |
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TW201639978A TW201639978A (zh) | 2016-11-16 |
TWI688675B true TWI688675B (zh) | 2020-03-21 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW105110772A TWI688675B (zh) | 2015-05-08 | 2016-04-06 | 熔射用材料、熔射被膜及附熔射被膜之構件 |
Country Status (2)
Country | Link |
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JP (1) | JP6722005B2 (ja) |
TW (1) | TWI688675B (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11414325B2 (en) | 2016-11-02 | 2022-08-16 | Nippon Yttrium Co., Ltd. | Film-forming material and film |
US20190078199A1 (en) * | 2017-09-08 | 2019-03-14 | Applied Materials, Inc. | Rare-earth-based oxyfluoride ald coating for chamber productivity enhancement |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2014002580A1 (ja) * | 2012-06-27 | 2014-01-03 | 日本イットリウム株式会社 | 溶射材料及びその製造方法 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4160224B2 (ja) * | 1998-12-21 | 2008-10-01 | 信越化学工業株式会社 | オキシハロゲン化物系部材 |
US9017765B2 (en) * | 2008-11-12 | 2015-04-28 | Applied Materials, Inc. | Protective coatings resistant to reactive plasma processing |
US20130115418A1 (en) * | 2011-11-03 | 2013-05-09 | Coorstek, Inc. | Multilayer rare-earth oxide coatings and methods of making |
JP5939084B2 (ja) * | 2012-08-22 | 2016-06-22 | 信越化学工業株式会社 | 希土類元素オキシフッ化物粉末溶射材料の製造方法 |
JP5636573B2 (ja) * | 2013-01-18 | 2014-12-10 | 日本イットリウム株式会社 | 溶射材料 |
JP5668260B1 (ja) * | 2013-08-08 | 2015-02-12 | 日本イットリウム株式会社 | プラズマ溶射用スラリー |
JP5911036B1 (ja) * | 2014-11-21 | 2016-04-27 | 日本イットリウム株式会社 | 焼結体 |
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2016
- 2016-03-07 JP JP2016043940A patent/JP6722005B2/ja active Active
- 2016-04-06 TW TW105110772A patent/TWI688675B/zh active
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
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WO2014002580A1 (ja) * | 2012-06-27 | 2014-01-03 | 日本イットリウム株式会社 | 溶射材料及びその製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JP6722005B2 (ja) | 2020-07-15 |
TW201639978A (zh) | 2016-11-16 |
JP2016211071A (ja) | 2016-12-15 |
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