TWI670178B - Reflection film and display device for electronic component containing the same - Google Patents

Reflection film and display device for electronic component containing the same Download PDF

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TWI670178B
TWI670178B TW104136721A TW104136721A TWI670178B TW I670178 B TWI670178 B TW I670178B TW 104136721 A TW104136721 A TW 104136721A TW 104136721 A TW104136721 A TW 104136721A TW I670178 B TWI670178 B TW I670178B
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layer
reflectance
film
light
thin film
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TW104136721A
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TW201622980A (en
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Kouhei HOSOI
細井康平
Shin-ichirou KANAI
金井慎一郎
Hironobu TADA
多田博信
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Mitsubishi Chemical Corporation
日商三菱化學股份有限公司
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    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133553Reflecting elements
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/04Interconnection of layers
    • B32B7/12Interconnection of layers using interposed adhesives or interposed materials with bonding properties
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21LIGHTING
    • F21VFUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V7/00Reflectors for light sources
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21LIGHTING
    • F21VFUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V7/00Reflectors for light sources
    • F21V7/22Reflectors for light sources characterised by materials, surface treatments or coatings, e.g. dichroic reflectors
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21LIGHTING
    • F21VFUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V7/00Reflectors for light sources
    • F21V7/22Reflectors for light sources characterised by materials, surface treatments or coatings, e.g. dichroic reflectors
    • F21V7/24Reflectors for light sources characterised by materials, surface treatments or coatings, e.g. dichroic reflectors characterised by the material
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21LIGHTING
    • F21VFUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V7/00Reflectors for light sources
    • F21V7/22Reflectors for light sources characterised by materials, surface treatments or coatings, e.g. dichroic reflectors
    • F21V7/28Reflectors for light sources characterised by materials, surface treatments or coatings, e.g. dichroic reflectors characterised by coatings
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/08Mirrors
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/40Properties of the layers or laminate having particular optical properties
    • B32B2307/416Reflective
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00Electrical equipment

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Laminated Bodies (AREA)

Abstract

本發明藉由如下反射膜,提供一種具備適合作為液晶顯示器之反射構件之高反射率、高耐久性,並且為低成本且色度良好之光反射膜,該反射膜之特徵在於:其係依序具有白色基材層、金屬薄膜層、及保護層,該白色基材層配置於反射使用面側者,且於自上述白色基材層側對該反射膜照射光之情形時,下述所表示之△b為1.0%以上且未達4.0%,且下述所表示之△a與上述△b之比所表示之反射率提高度(△a/△b)為1.3以上且3.0以下。 The present invention provides a light reflecting film having high reflectivity, high durability, and low cost and good chromaticity, which is suitable as a reflecting member of a liquid crystal display, by the following reflecting film. The reflecting film is characterized in that: In order to have a white base material layer, a metal thin film layer, and a protective layer, the white base material layer is disposed on the reflective use surface side, and when the reflective film is irradiated with light from the white base material layer side, the following The Δb indicated is 1.0% or more and less than 4.0%, and the reflectance improvement degree (Δa / Δb) expressed by the ratio of Δa to Δb described below is 1.3 or more and 3.0 or less.

△a:上述白色基材層之波長450nm之光之反射率與波長750nm之光之反射率之差 △ a: The difference between the reflectance of light with a wavelength of 450 nm and the reflectance of light with a wavelength of 750 nm of the white substrate layer

△b:上述反射膜之波長450nm之光之反射率與波長750nm之光之反射率之差 △ b: Difference between the reflectance of the above-mentioned reflective film with a wavelength of 450 nm and the reflectance of a light with a wavelength of 750 nm

Description

反射膜及含有其之電子元件用顯示裝置 Reflective film and display device for electronic component containing the same

本發明係關於一種反射膜。進而詳細而言,關於一種液晶顯示器之反射板等所使用之反射膜。 The present invention relates to a reflective film. Furthermore, the reflective film used for the reflective plate etc. of a liquid crystal display is mentioned in detail.

先前以來,作為光學構件或液晶顯示器、照明器具、太陽電池等所使用之光反射體,已知有由藉由使無機粒子或有機粒子分散於塑膠膜而獲得之白色膜代表之擴散型光反射膜、或由藉由形成包含鋁或銀等金屬之薄膜之金屬反射層而獲得的鏡面膜代表之正反射型光反射膜等。 Conventionally, as a light reflector used in an optical member or a liquid crystal display, a lighting device, a solar cell, or the like, a diffusion type light reflection represented by a white film obtained by dispersing inorganic particles or organic particles in a plastic film is known. Film, or a specular reflection type light reflection film represented by a mirror film obtained by forming a metal reflection layer containing a thin film of a metal such as aluminum or silver.

於液晶顯示器用途中,涉及自液晶電視等超過50英吋之大型者、至行動電話等移動用途之為5英吋以下之小型者之眾多方面,尤其是於小型顯示器中,為了實現畫面顯示裝置自身之小型化、輕量化而要求光反射膜之薄型化,並且迫切期望有助於旨在實現電池之長壽命化之背光裝置之省電化的高效率之光反射膜。 In the application of liquid crystal displays, there are many aspects ranging from large people over 50 inches such as LCD TVs to small people under 5 inches in mobile applications such as mobile phones, especially in small displays, in order to realize screen display devices. The miniaturization and weight reduction of the light-reflection film is required, and a highly efficient light-reflection film that contributes to the power saving of a backlight device which is intended to achieve a longer life of the battery is urgently desired.

進而,作為移動用途,具體而言存在行動電話或車載用顯示器等,但由於設想將該等於屋外使用,又說起來亦存在來自LED(Light Emitting Diode,發光二極體)光源之輻射熱之影響,故而針對光反射膜,要求即使於高溫環境下亦較高之耐久性。即,於上述之光反射膜中,必須抑制高溫條件下之反射率之降低。 Furthermore, mobile applications include mobile phones and on-vehicle displays. However, since it is assumed to be used outdoors, there is also the influence of radiant heat from LED (Light Emitting Diode) light sources. Therefore, the light reflection film is required to have high durability even in a high temperature environment. That is, in the above-mentioned light reflecting film, it is necessary to suppress a decrease in the reflectance under high temperature conditions.

[先前技術文獻] [Prior technical literature] [專利文獻] [Patent Literature]

[專利文獻1]日本專利特開2014-178697 [Patent Document 1] Japanese Patent Laid-Open No. 2014-178697

[專利文獻2]日本專利特開平04-239540 [Patent Document 2] Japanese Patent Laid-Open No. 04-239540

[專利文獻3]日本專利特開2005-031653 [Patent Document 3] Japanese Patent Laid-Open No. 2005-031653

[專利文獻4]日本專利特開2012-35616 [Patent Document 4] Japanese Patent Laid-Open No. 2012-35616

[專利文獻5]日本專利特開平10-128908 [Patent Document 5] Japanese Patent Laid-Open No. 10-128908

[專利文獻6]日本專利特開2006-126236 [Patent Document 6] Japanese Patent Laid-Open No. 2006-126236

[專利文獻7]日本專利特開平10-193494 [Patent Document 7] Japanese Patent Laid-Open No. 10-193494

[專利文獻8]WO2005-039872 [Patent Document 8] WO2005-039872

為了滿足該等要求,例如於專利文獻1中,提出有如下情況:藉由對折射率不同之2種透明聚酯層嚴格地調整膜厚,交替積層使其超多層化,而遍及廣範圍之波長區域,實現有效率之光反射,進而利用添加劑等賦予耐久性;但需要高度之超多層薄膜化技術,結果成為極為昂貴之物品。 In order to meet these requirements, for example, in Patent Document 1, it is proposed that the thickness of two transparent polyester layers having different refractive indices be strictly adjusted, and the super-multilayers be alternately laminated to cover a wide range of areas. In the wavelength region, efficient light reflection is achieved, and durability is provided by additives. However, a highly ultra-thin film technology is required, resulting in extremely expensive articles.

作為更廉價、且為一定之高反射率之膜,一般已知有:白色膜(專利文獻2~4),其係藉由使氧化鈦等微粉狀填充劑分散於多環式及脂肪族之聚酯、聚烯烴等樹脂基質中、及/或將該膜延伸,而進行多孔化,於膜內構成折射率不同之樹脂/空氣/微粉狀填充劑而成;或金屬薄膜鏡面反射膜(專利文獻5或6),其係藉由於塑膠或金屬板等適當之基材上,利用蒸鍍或濺鍍等形成銀或鋁等反射率較高之金屬薄膜而獲得。白色膜雖耐久性或機械強度優異但反射率不充分,尤其是於進行薄膜化時,漏光(light leaking)顯著,反射率極度降低。另一方面,金屬薄膜鏡面膜即便使膜薄膜化亦可期待較高之反射特性,但存在如下問題:就其金屬表面容易劣化之觀點而言,耐久性較差,且就均勻地反射所有波長之金屬之特徵而言,相對地略帶黃色。 White films (Patent Documents 2 to 4), which are generally cheaper and have a certain high reflectance, are generally known, which are dispersed in polycyclic and aliphatic by finely powdered fillers such as titanium oxide. It is made of resin matrix such as polyester, polyolefin, etc., and / or the film is extended to be porous to form resin / air / fine powder filler with different refractive index in the film; or metal thin film mirror reflection film (Patent Document 5 or 6) is obtained by forming a metal film with a high reflectance such as silver or aluminum on a suitable substrate such as a plastic or metal plate by evaporation or sputtering. Although a white film is excellent in durability or mechanical strength, its reflectance is insufficient. Especially when a thin film is formed, light leakage is significant, and the reflectance is extremely reduced. On the other hand, a metal thin film mirror film can expect high reflection characteristics even if the film is thinned. However, there are problems in that the metal surface is susceptible to deterioration in terms of durability, and that it reflects uniformly all wavelengths. The characteristics of metal are relatively yellowish.

進而,亦提出有將該白色膜與鏡面反射膜適當組合而成之反射膜(專利文獻7或8)。然而,所提出之任一物品相對於實現如近年來所要求之高亮度而言,均為相差甚遠之反射率。 Furthermore, a reflection film in which the white film and a specular reflection film are appropriately combined is also proposed (Patent Document 7 or 8). However, any of the proposed articles is far away from the reflectivity in realizing the high brightness as required in recent years.

因此,本發明之目的在於更廉價地提供一種為高反射率、高亮度且高耐久性,並且反射光為良好之色度之(可抑制反射光之發黃之)反射膜。 Therefore, an object of the present invention is to provide a reflective film that has high reflectivity, high brightness, and high durability, and that the reflected light has a good chromaticity (which suppresses yellowing of the reflected light).

本發明者等人為了解決上述課題,而一般以期待高反射率之銀薄膜為基礎,反覆努力研究,結果獲得以下之見解。 In order to solve the above-mentioned problems, the inventors of the present invention have repeatedly studied on the basis of a silver thin film expected to have a high reflectance, and as a result, have obtained the following findings.

(1)針對銀薄膜成為高反射率,理想而言,不實施表面塗層者較佳。 (1) For the silver film to have a high reflectance, ideally, a surface coating is not performed.

(2)然而,銀薄膜於空氣中慢慢進行氧化或硫化,導致反射率顯著降低。因此,必須於銀薄膜之表面設置保護層。 (2) However, the silver film is slowly oxidized or sulfided in the air, resulting in a significant decrease in reflectance. Therefore, a protective layer must be provided on the surface of the silver thin film.

(3)另一方面,於在銀薄膜之表面設置有保護層之情形時,導致反射光之亮度降低。 (3) On the other hand, when a protective layer is provided on the surface of the silver thin film, the brightness of the reflected light is reduced.

(4)進而,即使於銀薄膜之表面設置有保護層,亦無法充分地抑制色度之黃色化。 (4) Furthermore, even if a protective layer is provided on the surface of the silver thin film, yellowing of chromaticity cannot be sufficiently suppressed.

基於上述見解,發明者等人進而大力進行研究,結果明瞭:藉由如上述般將高耐久性之白色基材、金屬薄膜層、及保護層適當地組合之後,將白色基材側設為反射面側,且使相對於2種特定波長之光之反射率之差(△b)處於一定範圍內,而可完全克服上述課題。 Based on the above-mentioned findings, the inventors and others further conducted research, and as a result, it became clear that the white substrate side is set as a reflection by appropriately combining the white substrate with high durability, the metal thin film layer, and the protective layer as described above. On the surface side, the difference (Δb) of the reflectance with respect to the light of the two specific wavelengths is within a certain range, and the above-mentioned problem can be completely overcome.

即,本發明係一種反射膜,其特徵在於:其係依序具有白色基材層、金屬薄膜層、及保護層,該白色基材層配置於反射使用面側者,且於自上述白色基材層側對該反射膜照射光之情形時,下述所表示之△b為1.0%以上且未達4.0%,且下述所表示之△a與上述△b之比所表示之反射率提高度(△a/△b)為1.3以上且3.0以下, △a:上述白色基材層之波長450nm之光之反射率與波長750nm之光之反射率之差 That is, the present invention is a reflective film, which is characterized in that it has a white base material layer, a metal thin film layer, and a protective layer in this order. The white base material layer is disposed on the side of the reflective use surface, and When the reflective layer is irradiated with light by the material layer side, the Δb indicated below is 1.0% or more and less than 4.0%, and the reflectance indicated by the ratio of Δa indicated below to Δb increased. Degree (△ a / △ b) is 1.3 or more and 3.0 or less, △ a: The difference between the reflectance of light with a wavelength of 450 nm and the reflectance of light with a wavelength of 750 nm of the white substrate layer

△b:上述反射膜之波長450nm之光之反射率與波長750nm之光之反射率之差。 Δb: The difference between the reflectance of light of a wavelength of 450 nm and the reflectance of light of a wavelength of 750 nm of the reflective film.

根據本發明,可提供一種具備適合作為液晶顯示器之反射構件之高反射率、高亮度、高耐久性,並且為低成本且色度良好之光反射膜。 According to the present invention, it is possible to provide a light reflecting film having high reflectivity, high brightness, and high durability suitable as a reflecting member of a liquid crystal display, and which is low in cost and good in chromaticity.

1‧‧‧白色基材層 1‧‧‧white substrate layer

2‧‧‧中間層 2‧‧‧ middle layer

3‧‧‧金屬薄膜層 3‧‧‧ metal thin film layer

4‧‧‧保護層 4‧‧‧ protective layer

圖1係表示本發明之反射膜之層構成之說明圖。圖1(a)表示依序形成有白色基材層1、金屬薄膜層3、保護層4之積層體。圖1(b)表示依序形成有白色基材層1、中間層2、金屬薄膜層3、保護層4之積層體。 FIG. 1 is an explanatory diagram showing a layer structure of a reflective film of the present invention. FIG. 1 (a) shows a laminated body in which a white substrate layer 1, a metal thin film layer 3, and a protective layer 4 are sequentially formed. FIG. 1 (b) shows a laminated body in which a white substrate layer 1, an intermediate layer 2, a metal thin film layer 3, and a protective layer 4 are sequentially formed.

圖2係表示550nm時之反射率與亮度之關係之說明圖。 FIG. 2 is an explanatory diagram showing the relationship between reflectance and brightness at 550 nm.

圖3係表示450nm與750nm之反射率之差(△b)與y值之關係之說明圖。 FIG. 3 is an explanatory diagram showing the relationship between the difference in reflectance (Δb) between 450 nm and 750 nm and the y value.

以下,對作為本發明之實施形態之一例之反射膜進行說明。然而,本發明並不限定於該反射膜。 Hereinafter, a reflection film as an example of an embodiment of the present invention will be described. However, the present invention is not limited to this reflective film.

再者,作為反射膜可取之形態,較佳為膜狀、或片狀。一般而言,所謂「膜」,為與長度及寬度相比厚度極小,最大厚度被任意地限定之較薄且平坦之製品,通常指以輥之形式供給者(日本工業規格JISK6900),一般而言所謂「片材」,就JIS中之定義而言,係指較薄、一般其厚度較長度與寬度小且平坦之製品。然而,片材與膜之界限並不明確,於本發明中,在用語方面無需對兩者區別,故而於本發明中,即使於稱為「膜」之情形,亦包含「片材」,即便於稱為「片 材」之情形,亦包含「膜」。 Moreover, as a preferable form of a reflective film, a film shape or a sheet shape is preferable. Generally speaking, the so-called "film" is a thin and flat product whose thickness is extremely small compared to the length and width. It usually refers to the supplier in the form of a roller (Japanese Industrial Standard JISK6900). The so-called "sheet", as defined in JIS, refers to a product that is thin, generally thinner and flatter than its length and width. However, the boundary between sheet and film is not clear. In the present invention, there is no need to distinguish between the two in terms of terms. Therefore, in the present invention, even in the case of "film", "sheet" is included. Called "Materials" also includes "film".

1.反射膜 Reflective film

如圖1(a)所示,本發明之反射膜(以下,存在記載為本反射膜之情況)之特徵在於:其係依序具有白色基材層1、金屬薄膜層3、及保護層4,該白色基材層1配置於反射使用面側者,且於自白色基材層1側對該反射膜照射光之情形時,下述所表示之△b為1.0%以上且未達4.0%,且下述所表示之△a與上述△b之比所表示之反射率提高度(△a/△b)為1.3以上且3.0以下, △a:上述白色基材層之波長450nm之光之反射率與波長750nm之光之反射率之差 As shown in FIG. 1 (a), the reflective film of the present invention (hereinafter, it may be described as a reflective film) is characterized in that it has a white substrate layer 1, a metal thin film layer 3, and a protective layer 4 in this order. In the case where the white base material layer 1 is disposed on the reflective use surface side and when the reflective film is irradiated with light from the white base material layer 1 side, Δb shown below is 1.0% or more and less than 4.0% And the reflectance improvement degree (△ a / △ b) represented by the ratio of △ a to △ b shown below is 1.3 or more and 3.0 or less, △ a: The difference between the reflectance of light with a wavelength of 450 nm and the reflectance of light with a wavelength of 750 nm of the white substrate layer

△b:上述反射膜之波長450nm之光之反射率與波長750nm之光之反射率之差。 Δb: The difference between the reflectance of light of a wavelength of 450 nm and the reflectance of light of a wavelength of 750 nm of the reflective film.

1.1.白色基材層 1.1. White substrate layer

白色基材層之特徵在於包含熱塑性樹脂與填充劑。熱塑性樹脂及填充劑並無特別限定。白色基材層相對於波長550nm之光之反射率較佳為95%以上。更佳為96%以上,進而較佳為97%以上。於550nm時之反射率小於95%之情形時,存在製成積層構成之反射膜之反射率不會為充分高之值,相應地亮度亦變低之情況。 The white substrate layer is characterized by containing a thermoplastic resin and a filler. The thermoplastic resin and the filler are not particularly limited. The reflectance of the white substrate layer with respect to light having a wavelength of 550 nm is preferably 95% or more. It is more preferably 96% or more, and still more preferably 97% or more. In the case where the reflectance at 550 nm is less than 95%, the reflectance of a reflective film made of a laminate may not be a sufficiently high value, and the brightness may be lowered accordingly.

構成白色基材層之熱塑性樹脂只要為可保持反射性及優異之耐久性者,則並無特別限制,可使用:聚對苯二甲酸乙二酯、聚萘二甲酸乙二酯等聚酯系樹脂、丙烯酸系樹脂、聚醯亞胺系樹脂、氟系樹脂、聚乙烯、聚丙烯等烯烴系樹脂、環烯烴系樹脂等各種熱塑性樹脂。再者,熱塑性樹脂可分別以單體形式使用,亦可將2種以上混合使用。 The thermoplastic resin constituting the white base material layer is not particularly limited as long as it can maintain reflectivity and excellent durability. Polyester resins such as polyethylene terephthalate and polyethylene naphthalate can be used. Various thermoplastic resins such as resins, acrylic resins, polyimide resins, fluorine resins, olefin resins such as polyethylene and polypropylene, and cycloolefin resins. In addition, the thermoplastic resin may be used individually as a monomer, or two or more types may be mixed and used.

上述中,於重視例如反射特性、生產成本、耐水解性等之情形時,較佳為選擇包含聚烯烴之膜。作為聚烯烴系樹脂層,例如可列舉 選自聚丙烯、丙烯-乙烯共聚物等聚丙烯樹脂、或聚乙烯、高密度聚乙烯、低密度聚乙烯等聚乙烯樹脂、或乙烯-環狀烯烴共聚物等環烯烴系樹脂、或乙烯-丙烯橡膠(EPR)、乙烯-丙烯-二烯三元共聚物(EPDM)等烯烴系彈性物之至少一種聚烯烴樹脂。該等之中,就機械性質、柔軟性等而言,較佳為聚丙烯樹脂(PP)或聚乙烯樹脂(PE)、環烯烴系樹脂,其中,就耐熱性優異、彈性模數等機械特性較高之觀點而言,尤佳為聚丙烯樹脂(PP)、環烯烴系樹脂(COC(cyclic olefin copolymer,環烯烴共聚物)、COP(Cyclo olefin Polymer,環烯烴聚合物))。 Among the above, when consideration is given to, for example, reflection characteristics, production costs, hydrolysis resistance, and the like, it is preferable to select a film containing a polyolefin. Examples of the polyolefin-based resin layer include It is selected from polypropylene resins such as polypropylene and propylene-ethylene copolymers, or polyethylene resins such as polyethylene, high-density polyethylene, and low-density polyethylene, or cycloolefin-based resins such as ethylene-cyclic olefin copolymers, or ethylene- At least one polyolefin resin of an olefin-based elastomer such as propylene rubber (EPR) and ethylene-propylene-diene terpolymer (EPDM). Among these, polypropylene resin (PP), polyethylene resin (PE), and cycloolefin-based resin are preferable in terms of mechanical properties, flexibility, and the like, and among them, excellent mechanical properties such as heat resistance and elastic modulus From a higher viewpoint, polypropylene resin (PP), cyclic olefin resin (COC (cyclic olefin copolymer), COP (Cyclo olefin Polymer)) are particularly preferred.

另一方面,於重視膜之剛性或耐熱性之情形時,較佳為選擇包含聚酯之膜。其中,於重視耐熱性或耐水解性等之情形時,較佳為選擇芳香族聚酯,可列舉選自聚對苯二甲酸乙二酯、聚2,6-萘二甲酸乙二酯、聚對苯二甲酸丙二酯、聚對苯二甲酸丁二酯等之至少一種聚酯樹脂。 On the other hand, when rigidity or heat resistance of a film is important, it is preferable to select a film containing polyester. Among them, in cases where heat resistance or hydrolysis resistance is important, it is preferable to select an aromatic polyester, and examples thereof include polyethylene terephthalate, polyethylene 2,6-naphthalene dicarboxylate, and polyethylene. At least one polyester resin such as trimethylene terephthalate, polybutylene terephthalate, and the like.

作為填充劑,可列舉無機微粉體、有機微粉體等。作為無機微粉體,例如可列舉:碳酸鈣、碳酸鎂、碳酸鋇、硫酸鎂、硫酸鋇、硫酸鈣、氧化鋅、氧化鎂、氧化鈣、氧化鈦、氧化鋅、氧化鋁、氫氧化鋁、羥磷灰石、二氧化矽、雲母、滑石、高嶺土、黏土、玻璃粉、石棉粉、沸石、矽酸黏土(clay silicate)等。該等之中,可使用任1種,或將2種以上混合使用。該等之中,若考慮與構成本反射片材之熱塑性樹脂之折射率差,則較佳為折射率較大者,尤佳為使用折射率為1.6以上之碳酸鈣、硫酸鋇、氧化鈦或氧化鋅。 Examples of the filler include inorganic fine powder and organic fine powder. Examples of the inorganic fine powder include calcium carbonate, magnesium carbonate, barium carbonate, magnesium sulfate, barium sulfate, calcium sulfate, zinc oxide, magnesium oxide, calcium oxide, titanium oxide, zinc oxide, aluminum oxide, aluminum hydroxide, and hydroxyl. Apatite, silica, mica, talc, kaolin, clay, glass powder, asbestos powder, zeolite, clay silicate, etc. Among these, any one may be used, or two or more may be used in combination. Among these, in consideration of the refractive index difference from the thermoplastic resin constituting the reflective sheet, the one having a larger refractive index is preferred, and calcium carbonate, barium sulfate, titanium oxide, or titanium carbonate having a refractive index of 1.6 or more is particularly preferred. Zinc oxide.

關於白色基材層,於僅考慮相對於上述之波長550nm之光之反射率、或反射光之亮度之情形時,只要使厚度較大即可。然而,為了響應近年來之對薄膜化之要求,而必須儘量使白色基材層較薄。此外,於本發明中,必須如下所述,使反射膜整體之上述之△b滿足特 定之值。於考慮以上情況之情形時,白色基材層之厚度較佳為40μm以上且200μm以下。下限更佳為50μm以上,進而較佳為60μm以上,尤佳為70μm以上,上限更佳為160μm以下,進而較佳為140μm以下,尤佳為120μm以下。其中,於白色基材層之厚度為60μm以上之情形時,可製成具備更高之反射率之反射膜。另一方面,於白色基材層之厚度為140μm以下之情形時,△a/△b成為更良好之值,而可製成儘管較薄亦具備優異之性能之反射膜。 Regarding the white base material layer, when considering only the reflectance of the above-mentioned light having a wavelength of 550 nm or the brightness of the reflected light, the thickness may be made large. However, in order to respond to thin film requirements in recent years, it is necessary to make the white substrate layer as thin as possible. In addition, in the present invention, it is necessary to make the above-mentioned Δb of the entire reflective film satisfy the characteristics as described below. Fixed value. When considering the above situation, the thickness of the white substrate layer is preferably 40 μm or more and 200 μm or less. The lower limit is more preferably 50 μm or more, even more preferably 60 μm or more, particularly preferably 70 μm or more, and the upper limit is more preferably 160 μm or less, still more preferably 140 μm or less, and even more preferably 120 μm or less. Among them, when the thickness of the white substrate layer is 60 μm or more, a reflective film having a higher reflectance can be produced. On the other hand, when the thickness of the white base material layer is 140 μm or less, Δa / Δb becomes a more favorable value, and a reflective film having excellent performance despite being thin can be produced.

白色基材層可於內部具有空隙。於具有空隙之情形時,空隙於白色基材層中所占之比率(空隙率)較佳為5%以上,進而較佳為10%以上,尤佳為20%以上。若空隙率為5%以上,則樹脂中之折射率相對較高之填充劑與折射率相對較低之空氣層直接接觸之界面之面積增大,藉此可使白色基材層之反射率進一步提高。另一方面,就白色基材層之機械強度或耐久性之觀點而言,上述之空隙率較佳為50%以下。於白色基材層之內部形成空隙之方法為公知。例如,只要於向構成白色基材層之熱塑性樹脂中添加填充劑,製成基材層(基材膜)後,將該基材層(基材膜)於至少單軸方向進行延伸即可。為了使白色基材層之內部之空隙率為所需之範圍,關於面積倍率較佳為延伸至5倍以上,更佳為延伸至7倍以上。又,較佳為於雙軸方向進行延伸。 The white base material layer may have voids inside. When there are voids, the ratio (void ratio) occupied by the voids in the white substrate layer is preferably 5% or more, more preferably 10% or more, and even more preferably 20% or more. If the void ratio is more than 5%, the area of the interface where the filler with a relatively high refractive index in the resin directly contacts the air layer with a relatively low refractive index increases, thereby further improving the reflectance of the white substrate layer. improve. On the other hand, from the viewpoint of mechanical strength or durability of the white substrate layer, the above-mentioned porosity is preferably 50% or less. A method for forming a void in the white substrate layer is known. For example, it is sufficient to add a filler to the thermoplastic resin constituting the white base material layer to form a base material layer (base material film), and then extend the base material layer (base material film) in at least a uniaxial direction. In order to make the porosity inside the white base material layer into a desired range, the area ratio is preferably extended to 5 times or more, and more preferably 7 times or more. Moreover, it is preferable to extend in a biaxial direction.

本發明之反射膜藉由設置白色基材層,並於該白色基材層之反射使用面之相反側之面側設置金屬薄膜層,而即便於反射膜整體之厚度較薄之情形時,亦可獲得高亮度。就該觀點而言,只要白色基材層之厚度比率相對於本反射膜之所有層之厚度為70%以上,則藉由與金屬薄膜層之協同效應,則可獲得充分之亮度及反射率。就該觀點而言,白色基材層之厚度比率更佳為相對於本反射膜之所有層之厚度為80%以上,進而較佳為90%以上,尤佳為92.4%以上,最佳為93.5%以上。上限較佳為99.5%以下,更佳為99%以下,進而較佳為98%以 下,尤佳為97.4%以下,最佳為97.2%以下。 The reflective film of the present invention is provided with a white base material layer, and a metal thin film layer is provided on the surface side opposite to the reflective use surface of the white base material layer, even when the overall thickness of the reflective film is thin. Obtains high brightness. From this point of view, as long as the thickness ratio of the white base material layer to the thickness of all the layers of the reflective film is 70% or more, sufficient brightness and reflectance can be obtained through the synergistic effect with the metal thin film layer. From this point of view, the thickness ratio of the white substrate layer is more preferably 80% or more, and more preferably 90% or more, more preferably 92.4% or more, and most preferably 93.5 relative to the thickness of all the layers of the reflective film. %the above. The upper limit is preferably 99.5% or less, more preferably 99% or less, and still more preferably 98% or less. Below, the best is 97.4% or less, and the best is 97.2% or less.

又,本發明之反射膜藉由設置白色基材層,並於該白色基材層之反射使用面之相反側之面側設置金屬薄膜層,而即便於白色基材層之550nm之光之透過率有點高之情形時,亦可獲得高亮度。只要白色基材層之550nm之光之透過率為1.0%以上,則藉由與金屬薄膜層之協同效應,則可獲得充分之亮度及反射率。就該觀點而言,白色基材層之550nm之光之透過率更佳為1.0%以上,進而較佳為1.1%以上。上限較佳為4.0%以下,更佳為3.8%以下,進而較佳為3.5%以下,尤佳為3.1%以下。 In the reflective film of the present invention, a white base material layer is provided, and a metal thin film layer is provided on the surface side opposite to the reflective use surface of the white base material layer. When the rate is a little high, high brightness can also be obtained. As long as the transmittance of light at 550 nm of the white substrate layer is 1.0% or more, sufficient brightness and reflectance can be obtained by the synergistic effect with the metal thin film layer. From this viewpoint, the transmittance of light at 550 nm of the white substrate layer is more preferably 1.0% or more, and still more preferably 1.1% or more. The upper limit is preferably 4.0% or less, more preferably 3.8% or less, still more preferably 3.5% or less, and even more preferably 3.1% or less.

1.2.金屬薄膜層 1.2. Metal thin film layer

本發明之反射膜於白色基材層之背面側即於白色基材層之反射使用面之相反側之面,具有金屬薄膜層。金屬薄膜層可藉由對金屬進行蒸鍍而形成,例如,可藉由真空蒸鍍法、離子化蒸鍍法、濺鍍法、離子鍍覆法等而形成。作為蒸鍍金屬材料,只要為反射率較高之材料,則可並無特別限制地使用,一般而言,較佳為銀、鋁等,該等之中,尤佳為銀。或者,就耐腐蝕性之觀點而言,亦較佳為使用銀之合金。例如可列舉銀與選自Cu、Au、Ni、Pd、Pt、Ru、Rh、In、Al、Si、Mn、Zr、Sn、Bi、Ge、Ti、Cr、Mo、V、Nb、Ta、Hf、W、Co、Ge之群之1種以上之合金。又,金屬薄膜層可為金屬之單層品或積層品,或者為金屬氧化物之單層品或積層品,亦可為金屬之單層品與金屬氧化物之單層品之2層以上之積層體。金屬薄膜層之厚度因形成層之材料或層形成法等不同而不同,較佳為10nm~300nm之範圍內,更佳為20nm~200nm之範圍內,進而較佳為40nm~150nm之範圍內,尤佳為60nm~120nm之範圍內。若金屬薄膜層之厚度為10nm以上,則能獲得充分之反射率。另一方面,於金屬薄膜層之厚度超過300nm之情形時,不能看到反射率之進一步之提高,生產效率降低, 故而欠佳。 The reflective film of the present invention has a metal thin film layer on the back side of the white substrate layer, that is, on the side opposite to the reflective use surface of the white substrate layer. The metal thin film layer can be formed by vapor-depositing a metal, and can be formed, for example, by a vacuum vapor deposition method, an ionization vapor deposition method, a sputtering method, an ion plating method, or the like. The vapor-deposited metal material may be used without particular limitation as long as it has a high reflectance. Generally, silver, aluminum, and the like are preferred, and among these, silver is particularly preferred. Alternatively, from the viewpoint of corrosion resistance, an alloy using silver is also preferable. For example, silver and Cu selected from Cu, Au, Ni, Pd, Pt, Ru, Rh, In, Al, Si, Mn, Zr, Sn, Bi, Ge, Ti, Cr, Mo, V, Nb, Ta, Hf , W, Co, Ge one or more alloys. In addition, the metal thin film layer may be a single-layer product or a multilayer product of a metal, or a single-layer product or a multilayer product of a metal oxide, or may be a two-layer product of a single-layer product of a metal and a single-layer product of a metal oxide. Laminated body. The thickness of the metal thin film layer varies depending on the material or the method of forming the layer. The thickness is preferably within a range of 10 nm to 300 nm, more preferably within a range of 20 nm to 200 nm, and further preferably within a range of 40 nm to 150 nm. It is particularly preferably within a range of 60 nm to 120 nm. When the thickness of the metal thin film layer is 10 nm or more, sufficient reflectance can be obtained. On the other hand, when the thickness of the metal thin film layer exceeds 300 nm, a further increase in reflectance cannot be seen, and production efficiency decreases. So it's not good.

於本發明中,為了達成下述之△b,而亦較佳為對金屬薄膜層之厚度與白色基材層之厚度之比率進行調整。本發明之反射膜中,於將金屬薄膜層之厚度設為X(μm),將白色基材層之厚度設為Y(μm)之情形時,厚度比(X/Y)較佳為5.0×10-5以上且7.5×10-3以下。下限更佳為1.0×10-4以上,進而較佳為5.0×10-4以上,尤佳為8.6×10-4以上,上限更佳為5.0×10-3以下,進而較佳為3.0×10-3以下,尤佳為2.0×10-3以下。 In the present invention, in order to achieve the following Δb, it is also preferable to adjust the ratio of the thickness of the metal thin film layer to the thickness of the white substrate layer. In the reflection film of the present invention, when the thickness of the metal thin film layer is set to X (μm) and the thickness of the white substrate layer is set to Y (μm), the thickness ratio (X / Y) is preferably 5.0 × 10 -5 or more and 7.5 x 10 -3 or less. The lower limit is more preferably 1.0 × 10 -4 or more, further preferably 5.0 × 10 -4 or more, particularly preferably 8.6 × 10 -4 or more, and the upper limit is more preferably 5.0 × 10 -3 or less, and further preferably 3.0 × 10. -3 or less, particularly preferably 2.0 x 10 -3 or less.

1.3.中間層 1.3. Middle layer

於本發明中,上述之金屬薄膜層係設置於白色基材層之背面側。作為於白色基材層之背面側設置金屬薄膜層之方法,可列舉各種方法。尤佳為如圖1(b)所示,金屬薄膜層3係經由中間層2設置於白色基材層1之背面側。 In the present invention, the above-mentioned metal thin film layer is provided on the back side of the white substrate layer. As a method of providing a metal thin film layer on the back surface side of a white base material layer, various methods are mentioned. Particularly preferably, as shown in FIG. 1 (b), the metal thin film layer 3 is provided on the back side of the white substrate layer 1 via the intermediate layer 2.

1.3.1.平滑塗層 1.3.1. Smooth coating

例如,於白色基材層之表面設置平滑塗層後,於該平滑塗層之表面藉由濺鍍法等使金屬蒸鍍,藉此可於白色基材層之背面側設置金屬薄膜層。即,本發明之白色基材層亦可於設置有金屬薄膜層之側之面包括平滑塗層。此時,平滑塗層擔負使設置有金屬薄膜層之側之表面粗糙度降低,賦予更進一步之反射率提高效果之作用。就該觀點而言,於白色基材層設置有該平滑塗層時之設置有金屬薄膜層之側之表面粗糙度(Ra)較佳為1.0μm以下,更佳為0.7μm以下,進而較佳為0.4μm以下。 For example, after a smooth coating is provided on the surface of the white base material layer, a metal thin film layer can be provided on the back side of the white base material layer by depositing a metal on the surface of the smooth coating layer by a sputtering method or the like. That is, the white base material layer of the present invention may include a smooth coating layer on the surface on the side where the metal thin film layer is provided. At this time, the smooth coating is responsible for reducing the surface roughness of the side on which the metal thin film layer is provided, and giving a further effect of improving the reflectance. From this viewpoint, the surface roughness (Ra) of the side where the metal thin film layer is provided when the smooth coating layer is provided on the white substrate layer is preferably 1.0 μm or less, more preferably 0.7 μm or less, and further preferably It is 0.4 μm or less.

平滑塗層可製成以各種硬化樹脂作為主體之層或以無機氧化物(玻璃或陶瓷等)作為主體之層。或者,亦可製成包含矽晶圓之層。尤其是就於白色基材層之表面容易地設置,賦予某種程度之柔軟性,藉此與金屬薄膜層之密接性亦提高,進而操作性亦為優異之觀點而言, 平滑塗層較佳為以各種硬化樹脂作為主體之層,尤佳為以丙烯酸系樹脂、聚酯樹脂、或三聚氰胺樹脂、胺基甲酸酯樹脂之任一種以上作為主體之層。為了不損害本反射膜之反射率及亮度,而平滑塗層之全光線透過率較佳為80%以上,更佳為90%以上。 The smooth coating can be made into a layer mainly composed of various hardened resins or a layer mainly composed of an inorganic oxide (glass or ceramic, etc.). Alternatively, a layer including a silicon wafer can also be made. In particular, from the viewpoint of being easily provided on the surface of the white base material layer and imparting a certain degree of flexibility, the adhesion with the metal thin film layer is also improved, and the operability is also excellent. The smooth coating layer is preferably a layer mainly composed of various hardening resins, and particularly preferably a layer mainly composed of any one or more of an acrylic resin, a polyester resin, or a melamine resin and a urethane resin. In order not to damage the reflectance and brightness of the reflective film, the total light transmittance of the smooth coating is preferably 80% or more, and more preferably 90% or more.

所謂「作為主體」,係意指占層之構成成分中之50質量%以上,較佳為80質量%以上,更佳為90質量%以上。平滑塗層中,除上述之各種硬化樹脂或金屬氧化物以外,亦可於無損本發明之效果之範圍內,包含公知之各種添加劑。 The "main body" means 50% by mass or more of the constituent components of the layer, preferably 80% by mass or more, and more preferably 90% by mass or more. In addition to the above-mentioned various hardened resins or metal oxides, the smooth coating layer may contain various known additives within a range that does not impair the effects of the present invention.

平滑塗層之厚度較佳為設為0.5μm以上且10μm以下。平滑塗層之厚度之下限更佳為1μm以上,尤佳為2μm以上。於平滑塗層之厚度過小之情形時,存在不能使白色基材層之表面充分地平滑化之情況。於平滑塗層之厚度過大之情形時,存在因塗佈不均、形成不均,反而平滑性變差之情況。 The thickness of the smooth coating is preferably 0.5 μm or more and 10 μm or less. The lower limit of the thickness of the smooth coating is more preferably 1 μm or more, and even more preferably 2 μm or more. When the thickness of the smooth coating is too small, the surface of the white base material layer may not be sufficiently smoothed. When the thickness of the smooth coating is too large, the smoothness may be deteriorated due to uneven coating and uneven formation.

1.3.2.接著層或黏著層 1.3.2. Adhesive layer or adhesive layer

或者,亦可藉由將形成有金屬薄膜層之膜與白色基材層經由接著層或黏著層進行積層,而於白色基材層之背面側設置金屬薄膜層。 Alternatively, the metal thin film layer and the white base material layer may be laminated through an adhesive layer or an adhesive layer to form a metal thin film layer on the back side of the white base material layer.

於將白色基材層與金屬薄膜層經由接著層或黏著層進行積層之情形時,較佳為設置全光線透過率為80%以上之接著層或黏著層。若接著層或黏著層之全光線透過率為80%以上,則不會損害本反射膜之反射率及亮度。就該觀點而言,全光線透過率更佳為85%以上,進而較佳為90%以上。 When the white substrate layer and the metal thin film layer are laminated via an adhesive layer or an adhesive layer, it is preferable to provide an adhesive layer or an adhesive layer having a total light transmittance of 80% or more. If the total light transmittance of the adhesive layer or the adhesive layer is more than 80%, the reflectance and brightness of the reflective film will not be damaged. From this viewpoint, the total light transmittance is more preferably 85% or more, and still more preferably 90% or more.

再者,所謂本發明中之接著層或黏著層,係為了確保白色基材層與金屬薄膜層之密接而設置之層,只要為滿足上述情況者,則亦包含所有意義者。關於上述接著層或黏著層,例如可列舉胺基甲酸酯系、丙烯酸系、橡膠系、聚矽氧系、聚酯系、聚醯胺系、環氧系、聚乙酸乙烯酯系、乙烯基烷基醚系、氟系之接著層或黏著層。其中,較 佳為滿足上述之所需之全光線透過率者,更佳為包含丙烯酸酯系黏著劑之黏著層。 In addition, the so-called adhesive layer or adhesive layer in the present invention is a layer provided to ensure the close contact between the white substrate layer and the metal thin film layer, and includes all meanings as long as the above conditions are satisfied. Examples of the adhesive layer or the adhesive layer include urethane-based, acrylic-based, rubber-based, silicone-based, polyester-based, polyamide-based, epoxy-based, polyvinyl acetate-based, and vinyl-based Alkyl ether-based, fluorine-based adhesive layer or adhesive layer. Of which Those that satisfy the above-mentioned required total light transmittance are more preferable, and an adhesive layer containing an acrylate-based adhesive is more preferable.

1.3.3.空氣層 1.3.3. Air layer

於本發明中,作為於白色基材層之背面側設置金屬薄膜層之方法,並不限定於上述之設置平滑塗層之形態或設置接著層或黏著層之形態。例如,於本發明中,於白色基材層與金屬薄膜層之間亦可具有空氣層。空氣層之厚度較佳為設為0.1μm以上且100μm以下,更佳為設為0.2μm以上且50μm以下,尤佳為設為0.5μm以上且10μm以下。該空氣層可藉由將金屬薄膜層與白色基材層簡單地重疊而設置,或者藉由將金屬蒸鍍層與白色基材層於反射膜之實際使用面積中之0.1%~50%之範圍內接著而設置。上述範圍更佳為0.1%~30%,進而較佳為0.1%~10%。藉由於白色基材層與金屬薄膜層之間存在空氣層,可使亮度及反射率進一步提高。 In the present invention, the method of providing the metal thin film layer on the back side of the white substrate layer is not limited to the above-mentioned configuration in which a smooth coating is provided or the configuration in which an adhesive layer or an adhesive layer is provided. For example, in the present invention, an air layer may be provided between the white substrate layer and the metal thin film layer. The thickness of the air layer is preferably 0.1 μm or more and 100 μm or less, more preferably 0.2 μm or more and 50 μm or less, and most preferably 0.5 μm or more and 10 μm or less. The air layer can be provided by simply overlapping the metal thin film layer and the white substrate layer, or by placing the metal vapor-deposited layer and the white substrate layer within a range of 0.1% to 50% of the actual use area of the reflective film Then set it up. The above range is more preferably 0.1% to 30%, and still more preferably 0.1% to 10%. The presence of an air layer between the white substrate layer and the metal thin film layer can further improve brightness and reflectance.

再者,於本發明中,只要滿足所需之反射率及△b,則亦可在不介隔如上述之中間層之情況下,於白色基材層之表面直接設置金屬薄膜層。然而,於設置有如上述之中間層之情形時,可更容易滿足所需之反射率及△b。 Furthermore, in the present invention, as long as the required reflectance and Δb are satisfied, a metal thin film layer may be directly provided on the surface of the white substrate layer without interposing the intermediate layer as described above. However, when the intermediate layer is provided as described above, it is easier to satisfy the required reflectance and Δb.

1.4.保護層 1.4. Protective layer

本發明之反射膜為了保護金屬薄膜層,而於金屬薄膜層之背面側即膜之反射使用面之相反側具有保護層。關於形成保護層之材料,只要可防止金屬薄膜層之腐蝕、且與金屬薄膜層之密接性為良好,則可無特別限定地使用,例如,可使用包含熱塑性樹脂、熱硬化性樹脂、電子束硬化性樹脂、紫外線硬化性樹脂等中之任一者之塗料。具體而言,可單獨使用胺基系樹脂、胺基醇酸系樹脂、丙烯酸系樹脂、苯乙烯系樹脂、丙烯酸-苯乙烯共聚物、脲-三聚氰胺系樹脂、環氧系樹脂、氟系樹脂、聚碳酸酯、硝化纖維素、乙酸纖維素、醇酸系樹 脂、松香改性馬來酸樹脂、聚醯胺系樹脂等,或者使用包含該等之混合物之樹脂塗料。該塗料係可使上述樹脂分散於水、溶劑等溶劑中等而形成。又,可視需要添加塑化劑、穩定劑、紫外線吸收劑。再者,作為溶劑,可使用與通常塗料所使用之溶劑同樣者。 In order to protect the metal thin film layer, the reflective film of the present invention has a protective layer on the back side of the metal thin film layer, that is, on the opposite side to the reflective use surface of the film. The material for forming the protective layer can be used without particular limitation as long as it can prevent corrosion of the metal thin film layer and has good adhesion to the metal thin film layer. For example, a material including a thermoplastic resin, a thermosetting resin, and an electron beam can be used. A coating material for any of a curable resin and an ultraviolet curable resin. Specifically, amine-based resins, amino-alkyd resins, acrylic resins, styrene-based resins, acrylic-styrene copolymers, urea-melamine-based resins, epoxy-based resins, fluorine-based resins, Polycarbonate, nitrocellulose, cellulose acetate, alkyd trees Grease, rosin-modified maleic resin, polyamide resin, etc., or a resin coating containing a mixture of these. This coating is formed by dispersing the resin in a solvent such as water and a solvent. Moreover, a plasticizer, a stabilizer, and an ultraviolet absorber may be added as needed. In addition, as a solvent, the same thing as the solvent used for general coating materials can be used.

保護層係藉由如下操作而形成:利用凹版塗佈法、輥塗法、浸漬塗佈法等通常之塗佈法將視需要對上述塗料適當用溶劑等進行稀釋而成者塗佈於例如金屬薄膜層之整個面,並使其乾燥(於硬化性樹脂之情形時使其硬化)。 The protective layer is formed by applying, to a metal, for example, a suitable coating method such as a gravure coating method, a roll coating method, or a dip coating method, and diluting the coating material with a solvent or the like as necessary. The entire surface of the film layer is dried (in the case of a curable resin, it is cured).

即便不進行塗料塗佈,亦可形成保護層。作為用以實現上述情況之保護層形成方法,例如,可列舉膜之貼合、或其他材料之蒸鍍、濺鍍等。如上所述,於在膜之表面形成金屬薄膜層後,積層白色基材層之情形時,膜自身發揮保護層之作用。 A protective layer can be formed without coating. Examples of the method for forming the protective layer to achieve the above-mentioned conditions include lamination of films, vapor deposition and sputtering of other materials, and the like. As described above, when a white substrate layer is laminated after a metal thin film layer is formed on the surface of the film, the film itself functions as a protective layer.

保護層之厚度並無特別限制,較佳為0.1μm~200μm之範圍內。若保護層之厚度為0.1μm以上,則可均勻地被覆金屬薄膜層之表面,而充分地發揮形成保護層之效果。又,於膜自身發揮保護層之作用之情形時,藉由將保護層之厚度於該範圍內進行調整,而可根據用途或目的,調整本反射膜之整體厚度。 The thickness of the protective layer is not particularly limited, but is preferably within a range of 0.1 μm to 200 μm. When the thickness of the protective layer is 0.1 μm or more, the surface of the metal thin film layer can be uniformly covered, and the effect of forming the protective layer can be fully exerted. In addition, when the film itself functions as a protective layer, by adjusting the thickness of the protective layer within this range, the overall thickness of the reflective film can be adjusted according to the purpose or purpose.

藉由添加無機或有機微粒子,可使保護層著色化。藉由使保護層著色化,可防止自金屬薄膜層漏出之若干之漏光。又,除防止將金屬薄膜層誤用為反射使用面之失誤以外,可抑制金屬薄膜層之眩光。進而,亦可將該保護層有效地用作印刷層。就該觀點而言,於保護層用樹脂材料中,例如可使用將硫酸鋇、碳酸鋇、碳酸鈣、石膏、氧化鈦、氧化矽、氧化鋁、二氧化矽、滑石、矽酸鈣、碳酸鎂、碳黑、石墨、氧化銅、二氧化錳、苯胺黑、苝黑、鈦黑、花青黑、活性碳、鐵氧體、磁鐵礦、氧化鉻、氧化鐵、二硫化鉬、鉻錯合物、複合氧化物系黑色色素等無機顏料、或丙烯酸系、聚苯乙烯系、聚胺基甲酸酯 系、醯胺系、聚碳酸酯系、聚矽氧系、脲-福馬林系、三聚氰胺系等有機樹脂粒子、鋁粉、黃銅粉、銅粉等金屬粉末、顏料、染料等墨水組合物等預先混合、分散而得者。上述無機或有機微粒子之添加量較佳為相對於保護層之固形物成分為5~50質量%,進而較佳為10~40質量%。 The protective layer can be colored by adding inorganic or organic fine particles. By coloring the protective layer, some light leakage from the metal thin film layer can be prevented. In addition, in addition to preventing the misuse of the metal thin film layer as a reflection use surface, the glare of the metal thin film layer can be suppressed. Furthermore, this protective layer can also be effectively used as a printing layer. From this viewpoint, as the resin material for the protective layer, for example, barium sulfate, barium carbonate, calcium carbonate, gypsum, titanium oxide, silica, alumina, silica, talc, calcium silicate, and magnesium carbonate can be used. , Carbon black, graphite, copper oxide, manganese dioxide, aniline black, perylene black, titanium black, cyanine black, activated carbon, ferrite, magnetite, chromium oxide, iron oxide, molybdenum disulfide, chromium Materials, inorganic pigments such as complex oxide black pigments, or acrylic, polystyrene, polyurethane Based, amine based, polycarbonate based, polysiloxane based, urea-formalin based, melamine based organic resin particles, aluminum powder, brass powder, copper powder and other metal powders, pigments, dyes and other ink compositions, etc. Pre-mixed and dispersed. The addition amount of the inorganic or organic fine particles is preferably 5 to 50% by mass, and more preferably 10 to 40% by mass relative to the solid content of the protective layer.

再者,於本發明中,保護層較佳為其背面側即膜之反射使用面之相反側係由硬塗層構成。藉由硬塗層,可更適當地防止金屬薄膜層之剝落或對膜之物理性損傷、金屬薄膜層之腐蝕化。作為硬塗層之具體例,較佳為丙烯酸系樹脂、胺基甲酸酯系樹脂、三聚氰胺系樹脂、環氧系樹脂、有機矽酸鹽化合物、聚矽氧系樹脂等。硬塗層之厚度只要考慮保護層整體之厚度適當決定即可。 In addition, in the present invention, the protective layer is preferably composed of a hard coat layer on the back side, that is, on the opposite side to the reflective use surface of the film. With the hard coating layer, it is possible to more appropriately prevent peeling of the metal thin film layer or physical damage to the film and corrosion of the metal thin film layer. Specific examples of the hard coat layer are preferably an acrylic resin, a urethane resin, a melamine resin, an epoxy resin, an organic silicate compound, and a polysiloxane resin. The thickness of the hard coat layer may be appropriately determined in consideration of the thickness of the entire protective layer.

1.5.層構成 1.5. Layer composition

若例示本發明之反射膜之層構成,則可列舉白色基材層/平滑塗層/金屬薄膜層/保護層、白色基材層/黏著層或接著層/金屬薄膜層/保護層、白色基材層/空氣層/金屬薄膜層/保護層、或者白色基材層/平滑塗層/空氣層/金屬薄膜層/保護層等層構成。其中,白色基材層係配置於照射光之側。又,本發明之反射膜亦可於該等層之間,進而具有其他層,白色基材層、金屬薄膜層、保護層等亦可分別獨立地包含複數層。 If the layer structure of the reflective film of the present invention is exemplified, white substrate layer / smooth coating layer / metal thin film layer / protective layer, white substrate layer / adhesive layer or adhesive layer / metal thin film layer / protective layer, white base Material layer / air layer / metal film layer / protective layer, or white substrate layer / smooth coating / air layer / metal film layer / protective layer. Among them, the white base material layer is arranged on the light-irradiating side. In addition, the reflective film of the present invention may have other layers between these layers, and the white substrate layer, the metal thin film layer, the protective layer, and the like may each include a plurality of layers independently.

關於本發明之反射膜之厚度,為了獲得所需之反射率,較佳為至少45μm以上,更佳為50μm以上,進而較佳為60μm以上。另一方面,為了響應近年來之對薄膜化之要求,而較佳為更薄,上限較佳為250μm以下,更佳為200μm以下,進而較佳為150μm以下。 Regarding the thickness of the reflective film of the present invention, in order to obtain a desired reflectance, it is preferably at least 45 μm or more, more preferably 50 μm or more, and still more preferably 60 μm or more. On the other hand, in order to respond to the demand for thin film in recent years, it is preferably thinner, and the upper limit is preferably 250 μm or less, more preferably 200 μm or less, and even more preferably 150 μm or less.

於本發明中,可於無損本發明之效果之範圍內,向各層中視需要調配抗氧化劑、光穩定劑、熱穩定劑、抗水解劑、潤滑劑、分散劑、紫外線吸收劑、白色顏料、螢光增白劑、及其他添加劑。 In the present invention, as long as the effect of the present invention is not impaired, antioxidants, light stabilizers, heat stabilizers, anti-hydrolysis agents, lubricants, dispersants, ultraviolet absorbers, white pigments, fluorescent Light whitening agent, and other additives.

1.6.反射膜之特性 1.6. Characteristics of reflective film

1.6.1.反射率 1.6.1. Reflectivity

本發明之反射膜之自白色基材層側照射光時之波長550nm之光之反射率較佳為98%以上,更佳為98.5%以上,進而較佳為99%以上。如圖2所示,550nm時之反射率與用於作為例如液晶顯示器之構件之背光裝置時之畫面顯示裝置之亮度值密切相關,若550nm時之反射率為98%以上,則畫面顯示裝置之亮度值亦較高,可對液晶顯示器賦予充分之明亮度。再者,於圖2中,擴散型反射膜與正反射型反射膜中,分光裝置內之積分球中之感度不同,故而不能將兩者間之反射率之絕對值單純進行比較。 In the reflection film of the present invention, the reflectance of light having a wavelength of 550 nm when the light is irradiated from the white substrate layer side is preferably 98% or more, more preferably 98.5% or more, and even more preferably 99% or more. As shown in FIG. 2, the reflectance at 550 nm is closely related to the brightness value of the screen display device when used as a backlight device such as a liquid crystal display. If the reflectance at 550 nm is more than 98%, the The brightness value is also high, which can give sufficient brightness to the liquid crystal display. Furthermore, in FIG. 2, the sensitivity of the integrating sphere in the spectroscopic device is different between the diffuse reflection film and the specular reflection film, so the absolute value of the reflectance between the two cannot be simply compared.

1.6.2.反射率差(△b) 1.6.2. Reflectance difference (△ b)

又,於本發明之反射膜中,將反射膜之波長450nm之光之反射率與波長750nm之光之反射率之差定義為△b。此時,上述△b必須為1.0%以上且未達4.0%。如圖3所示,本發明者等人發現450nm時之反射率與750nm時之反射率之差(△b)與測定亮度時獲得之色度中之y值密切相關。此處,若450nm時之反射率與750nm時之反射率之差未達1.0%,則就實用上之觀點而言,發黃變得過於強烈。就該觀點而言,該反射率之差更佳為1.3%以上,進而較佳為1.5%以上。另一方面,若上限為4.0%以上,則幾乎不能看到亮度之提高效果。進而,於△b為4.0%以上之情形時,於以白色基材層與金屬薄膜層作為必須組成之本發明中,金屬薄膜層之特性幾乎未發揮出來。即,有作為反射膜,不能獲得高反射率等之虞。就該觀點而言,更佳為未達3.5%,進而較佳為未達3.0%。再者,此處所述之y值,係指下述之亮度測定法即將本反射膜用於顯示器之背光裝置時與亮度值同時測定之CIE(Commission Internationale de L'Eclairage,國際照明委員會)表色系統中的色度座標中之x及y中之y,於該xy色度座標之一定區域(x、 y:0.28~0.35)中,x及y之值越大,意指越帶黃色,故而為了方便起見將y值之大小用於黃色度之評價。 In the reflective film of the present invention, the difference between the reflectance of the reflective film with a wavelength of 450 nm and the reflectance of the light with a wavelength of 750 nm is defined as Δb. At this time, the Δb must be 1.0% or more and less than 4.0%. As shown in FIG. 3, the present inventors found that the difference (Δb) between the reflectance at 450 nm and the reflectance at 750 nm is closely related to the y value in the chromaticity obtained when measuring the brightness. Here, if the difference between the reflectance at 450 nm and the reflectance at 750 nm is less than 1.0%, yellowing becomes too strong from a practical standpoint. From this viewpoint, the difference in reflectance is more preferably 1.3% or more, and further preferably 1.5% or more. On the other hand, if the upper limit is 4.0% or more, the effect of improving the brightness is hardly seen. Furthermore, when Δb is 4.0% or more, in the present invention in which the white base material layer and the metal thin film layer are required compositions, the characteristics of the metal thin film layer are hardly exhibited. That is, there is a possibility that a high reflectance or the like cannot be obtained as a reflective film. From this viewpoint, it is more preferably less than 3.5%, and still more preferably less than 3.0%. In addition, the y value mentioned here refers to the CIE (Commission Internationale de L'Eclairage) table, which is measured simultaneously with the brightness value when the reflective film is used in a backlight device of a display, as described below. X and y in chromaticity coordinates in the chromaticity system are in a certain area of the xy chromaticity coordinates (x, In y: 0.28 ~ 0.35), the larger the values of x and y, the more yellowish it means, so the size of the y value is used for the evaluation of yellowness for convenience.

1.6.3.反射率提高度(△a/△b) 1.6.3. Reflectivity improvement (△ a / △ b)

進而,於本發明之反射膜中,將白色基材層之波長450nm之光之反射率與波長750nm之光之反射率之差定義為△a。於本發明中,上述△a與上述△b之比所表示之反射率提高度(△a/△b)為1.3以上且3.0以下。藉由上述情況,可最大限度地發揮白色基材層與金屬薄膜層之協同效應。 Furthermore, in the reflective film of the present invention, the difference between the reflectance of light with a wavelength of 450 nm and the reflectance of light with a wavelength of 750 nm of the white substrate layer is defined as Δa. In the present invention, the reflectance improvement degree (Δa / Δb) represented by the ratio of the Δa to the Δb is 1.3 or more and 3.0 or less. With the above circumstances, the synergistic effect of the white base material layer and the metal thin film layer can be maximized.

即,若上述(△a/△b)為1.3以上,則可充分地獲得藉由使白色基材層與金屬薄膜層積層而獲得之亮度提高效果。就該觀點而言,更佳為1.5以上,進而較佳為1.8以上。另一方面,藉由上限為3.0以下,而可抑制發黃,獲得色度良好之反射膜。就該觀點而言,更佳為2.8以下,進而較佳為2.6以下。 That is, if the above (Δa / Δb) is 1.3 or more, the brightness improvement effect obtained by laminating the white base material layer and the metal thin film can be sufficiently obtained. From this viewpoint, it is more preferably 1.5 or more, and still more preferably 1.8 or more. On the other hand, when the upper limit is 3.0 or less, yellowing can be suppressed and a reflective film having good chromaticity can be obtained. From this viewpoint, it is more preferably 2.8 or less, and still more preferably 2.6 or less.

本反射膜之波長550nm之光之透過率較佳為未達1.0%。藉由使全光線透過率未達1.0%,而除可高效率地將背光裝置之光反射,可提高亮度以外,亦可提高顯示對比度。就該觀點而言,更佳為未達0.5%,進而較佳為未達0.3%,尤佳為未達0.1%。 The transmittance of light having a wavelength of 550 nm of the reflective film is preferably less than 1.0%. By reducing the total light transmittance to less than 1.0%, in addition to efficiently reflecting the light of the backlight device, the brightness can be increased, and the display contrast can be improved. From this viewpoint, it is more preferably less than 0.5%, still more preferably less than 0.3%, and even more preferably less than 0.1%.

1.6.4.耐久性 1.6.4. Durability

本反射膜之耐久性係藉由算出於恆溫槽內、在80℃條件下、保持240小時之高溫處理前後的相對於波長550nm之光之反射率之差而求出。上述反射率之差較佳為0.5%以下,更佳為0.4%以下,進而較佳為0.3%以下。藉由上述反射率之差為0.5%以下,而例如,用於液晶顯示器之背光裝置時,即便於被曝曬之條件下,亦可在亮度不降低之情況下使用。 The durability of this reflective film was calculated by calculating the difference in reflectance with respect to light having a wavelength of 550 nm before and after high-temperature treatment in a thermostatic bath at 80 ° C. for 240 hours. The difference in the reflectance is preferably 0.5% or less, more preferably 0.4% or less, and still more preferably 0.3% or less. Since the difference in the reflectance is 0.5% or less, for example, when it is used in a backlight device of a liquid crystal display, it can be used without a decrease in brightness even under the conditions of exposure.

2.反射膜之製造方法 2. Manufacturing method of reflective film

以下,列舉一例對本反射膜之製造方法進行說明,但並不受下 述製造法任何限定。 Hereinafter, an example will be described to explain the manufacturing method of the reflective film, but it is not limited to the following. Said any limitation of the manufacturing method.

首先,向構成白色基材層之熱塑性樹脂中調配填充劑,視需要調配其他添加劑等,而製作樹脂組合物。具體而言,向熱塑性樹脂中加入填充劑等,用帶式混合機、滾筒、亨舍爾混合機等混合之後,使用單軸或雙軸擠出機等,於樹脂之熔點以上之溫度下進行混練,藉此可獲得各層用樹脂組合物。或者,亦可預先製作將填充劑等高濃度地調配於熱塑性樹脂而成之所謂的母料,將該母料與樹脂混合而製成所需濃度之樹脂組合物。 First, a filler is blended into the thermoplastic resin constituting the white substrate layer, and other additives are blended as necessary to prepare a resin composition. Specifically, a filler is added to the thermoplastic resin, and the mixture is mixed with a belt mixer, a drum, a Henschel mixer, and the like, and then a uniaxial or biaxial extruder is used, and the temperature is above the melting point of the resin By kneading, a resin composition for each layer can be obtained. Alternatively, a so-called master batch prepared by mixing a filler and the like with a thermoplastic resin at a high concentration may be prepared in advance, and the master batch and the resin may be mixed to prepare a resin composition having a desired concentration.

繼而,將如此獲得之基材用樹脂組合物熔融,並形成於膜上。作為形成於膜上之方法,一般較佳地使用吹脹成形法或使用T型模頭之擠出成形法。具體而言,視需要將基材用樹脂組合物乾燥之後,供給至擠出機中,加熱至樹脂之熔點以上之溫度,而熔融。或者,亦可在不使樹脂組合物乾燥之情況下供給至擠出機中,但較佳為於不使其乾燥之情形時,進行熔融擠出時,使用真空排氣。其後,將已熔融之基材層用樹脂組合物自T型模頭之狹縫狀之流出口擠出,使其密接固化於冷卻輥,而形成鑄造片材。 Then, the thus obtained resin composition for a substrate is melted and formed on a film. As a method for forming the film, an inflation molding method or an extrusion molding method using a T-die is generally preferred. Specifically, after drying the resin composition for a base material as needed, it is supplied to an extruder and heated to a temperature higher than the melting point of the resin to be melted. Alternatively, it may be supplied to the extruder without drying the resin composition, but it is preferable to use a vacuum exhaust when performing melt extrusion when the resin composition is not dried. Thereafter, the molten resin composition for the base material layer is extruded from a slit-shaped outflow port of the T-die, and is tightly solidified on a cooling roll to form a cast sheet.

白色基材層較佳為於至少單軸方向被延伸,進而較佳為於雙軸方向被延伸。延伸可藉由輥、拉幅機、空氣吹脹、管式法、心軸等進行。例如,可於藉由輥於MD方向(machine direction,縱向)延伸之後,利用拉幅機於TD方向(transverse direction,橫向)延伸,亦可藉由管式法進行雙軸延伸。繼而,視需要進行熱固定,藉此可獲得白色反射膜。 The white substrate layer is preferably extended in at least a uniaxial direction, and more preferably is extended in a biaxial direction. Stretching can be performed by roller, tenter, air inflation, tubular method, mandrel, and the like. For example, after the roller is extended in the MD direction (machine direction), the tenter can be used in the TD direction (transverse direction), or the tube method can be used for biaxial extension. Then, if necessary, heat fixing is performed, whereby a white reflective film can be obtained.

繼而,視需要,將平滑塗層用樹脂塗料塗佈於白色基材層上,並使其乾燥或硬化。於該平滑塗層上,形成金屬薄膜層。其後,藉由於金屬薄膜層之上,形成保護層而獲得反射膜(白色基材層/平滑塗層/金屬薄膜層/保護層)。 Then, if necessary, a resin coating material for smooth coating is applied on the white base material layer, and is dried or hardened. A metal thin film layer is formed on the smooth coating. Thereafter, a reflective layer (white substrate layer / smooth coating layer / metal thin film layer / protective layer) is obtained by forming a protective layer on the metal thin film layer.

或者,與上述情況不同,使金屬薄膜層形成於保護層。繼而,使白色基材層與金屬薄膜層視需要經由接著劑或黏著劑等而積層。或者,將金屬薄膜層與白色基材層簡單地重疊,或將金屬蒸鍍層與白色基材層於上述反射膜之實際使用面積中之0.1%~10%之範圍內接著,而經由空氣層積層。 Alternatively, unlike the above case, a metal thin film layer is formed on the protective layer. Next, a white base material layer and a metal thin film layer are laminated | stacked via an adhesive agent, an adhesive agent, etc. as needed. Alternatively, the metal thin film layer and the white substrate layer are simply overlapped, or the metal vapor-deposited layer and the white substrate layer are adhered in a range of 0.1% to 10% of the actual use area of the above-mentioned reflective film, and then laminated by air .

[實施例] [Example]

以下表示實施例及比較例,對本發明進而具體地進行說明,但本發明並不受實施例及比較例任何限定。再者,實施例所示之測定值及評價係以下文所示之方式進行。 Examples and comparative examples are shown below to further specifically describe the present invention, but the present invention is not limited to the examples and comparative examples. The measured values and evaluations shown in the examples were performed as described below.

(測定及評價方法) (Measurement and evaluation method)

1.反射率 Reflectivity

反射膜之反射率係使用日立高新技術股份有限公司製造之分光光度計「UV-4000」(商品名),於以用氧化鋁製標準構成板校準而得之反射率為基準(100%)般之條件下,於300nm-800nm之波長區域(以0.5nm為單位)內進行測定。 The reflectance of the reflective film is based on the use of a spectrophotometer "UV-4000" (trade name) manufactured by Hitachi High-tech Co., Ltd. The reflectance is based on a standard calibration plate made of alumina (100%) Under the conditions, the measurement is performed in a wavelength range of 300 nm to 800 nm (in units of 0.5 nm).

2.反射率提高度之算出 2. Calculation of reflectance improvement

藉由上述之反射率測定,讀取450nm與750nm時之反射率,將△a設為白色基材單獨之450nm時之反射率與750nm時之反射率之差,將△b設為本反射膜之450nm時之反射率與750nm時之反射率之差,算出反射膜之反射率提高度(△a/△b)。 Based on the above-mentioned reflectance measurement, read the reflectance at 450nm and 750nm, set Δa as the difference between the reflectance at 450nm and the reflectance at 750nm for a white substrate alone, and set Δb as the reflection film The difference between the reflectance at 450 nm and the reflectance at 750 nm was used to calculate the degree of improvement in the reflectance of the reflective film (Δa / Δb).

3.透過率 3.Transmittance

分別測定「白色基材層單獨之光之透過率」及「反射膜整體之光之透過率」。具體而言,使用日立高新技術股份有限公司製造之分光光度計「UV-4000」(商品名),以用氧化鋁製標準構成板校準而得之透過率為基準(100%),向光路中插入膜樣品,藉此測定300nm-800nm之波長區域(以0.5nm為單位)中之膜樣品之透過率。 The "transmittance of light alone of the white substrate layer" and the "transmittance of light of the entire reflection film" were measured separately. Specifically, a spectrophotometer "UV-4000" (trade name) manufactured by Hitachi High-Tech Co., Ltd. was used, and the transmittance was calibrated with a standard board made of alumina (100%). The film sample is inserted to thereby measure the transmittance of the film sample in a wavelength range of 300 nm to 800 nm (in 0.5 nm units).

4.亮度、y值 4.Brightness and y value

作為液晶顯示器(世特力(CENTURY)股份有限公司製造之「PLUS ONE」8英吋,型號:LCD8000V)之背光單元之反射膜,使用本反射膜樣品,利用亮度計(柯尼卡美能達(Konica Minolta)股份有限公司製造,型式:CA-2000)測定距離45cm之該顯示器之9點平均亮度值、及y值。 As a reflective film for a backlight unit of a liquid crystal display ("PLUS ONE" 8-inch, model: LCD8000V, manufactured by CENTURY) Co., Ltd., this reflective film sample was used and a luminance meter (Konica Minolta (Konica (Manufactured by Minolta) Co., Ltd., Type: CA-2000) Determines the 9-point average brightness value and y value of the display at a distance of 45 cm.

5.耐久性 5.durability

測定膜樣品之反射率,作為高溫試驗,於恆溫槽內在80℃條件下、保持240小時後,再次測定反射率。算出高溫試驗前後之550nm時之反射率之差,基於下述評價基準進行評價。 The reflectance of the film sample was measured. As a high temperature test, the reflectance was measured again after being held at 80 ° C. for 240 hours in a constant temperature bath. The difference in reflectance at 550 nm before and after the high temperature test was calculated and evaluated based on the following evaluation criteria.

◎:高溫處理前後之550nm時之反射率之差為0.3%以內 ◎: The difference in reflectance at 550 nm before and after high temperature treatment is within 0.3%

○:高溫處理前後之550nm時之反射率之差為0.5%以內 ○: The difference in reflectance at 550 nm before and after high temperature treatment is within 0.5%

×:高溫處理前後之550nm時之反射率之差超過0.5% ×: The difference in reflectance at 550 nm before and after high temperature treatment exceeds 0.5%

6.銀層之剝離強度 6. Peel strength of silver layer

將Sellotape(註冊商標,米其邦製造,CT405AP-18)於膜樣品之塗佈面貼附10cm,於180°方向急速地剝離,對銀層剝落者進行評價。 Sellotape (registered trademark, manufactured by Michelin, CT405AP-18) was attached to the coated surface of the film sample by 10 cm, and it was quickly peeled off at 180 ° to evaluate the peeled silver layer.

◎:塗層完全未剝離之級別。 (Double-circle): The grade in which a coating layer is not peeled at all.

○:塗層幾乎未剝離、於實際使用方面無問題之級別 ○: Level where the coating hardly peels off and there is no problem in practical use

×:塗層大幅剝離之級別 ×: The level of coating peeling

(實施例1) (Example 1)

(白色基材層) (White substrate layer)

白色基材層係使用厚度100μm之聚烯烴系白色基材(三菱樹脂股份有限公司製造,商品名「Lumirex II R20」)。 As the white substrate layer, a polyolefin-based white substrate (manufactured by Mitsubishi Resin Co., Ltd., trade name "Lumirex II R20") was used with a thickness of 100 μm.

(金屬薄膜層之形成) (Formation of metal thin film layer)

於聚對苯二甲酸乙二酯膜(三菱樹脂股份有限公司製造,商品名「DIAFOIL T600E25」,厚度25μm)之底塗處理面,作為平滑塗層, 利用棒式塗佈機塗佈將電子束硬化型丙烯酸系樹脂與稀釋溶劑MIBK(methyl isobutyl ketone,甲基異丁酮)以質量比率1:1進行混合,並將樹脂固形物成分比率調整為50質量%而成之樹脂溶液(墨水),使其乾燥、硬化,而形成厚度2μm之平滑塗層。於平滑塗層之表面,作為金屬薄膜層,利用濺鍍法形成厚度120nm之銀薄膜層,而獲得銀薄膜。 Apply a smoothing coating to the underside of a polyethylene terephthalate film (manufactured by Mitsubishi Resin Co., Ltd. under the trade name "DIAFOIL T600E25", thickness 25 µm). Coating with a bar coater, mixing an electron beam-curable acrylic resin with a diluting solvent MIBK (methyl isobutyl ketone, methyl isobutyl ketone) at a mass ratio of 1: 1, and adjusting the resin solid content component ratio to 50 The resin solution (ink) made by mass% is dried and hardened to form a smooth coating with a thickness of 2 μm. On the surface of the smooth coating, as a metal thin film layer, a silver thin film layer having a thickness of 120 nm was formed by a sputtering method to obtain a silver thin film.

(反射膜之製作) (Production of reflective film)

對上述白色基材層塗佈丙烯酸酯系黏著劑,進行乾燥,形成黏著層(厚度2μm),以上述銀薄膜之銀薄膜面成為黏著層側之方式進行重疊,用手壓輥進行層壓,藉此製作厚度為129.12μm之反射膜。對製作而成之反射膜,進行上述所示之各評價。將其結果示於表1。 The white base material layer was coated with an acrylate-based adhesive, and dried to form an adhesive layer (thickness: 2 μm). The silver film surface of the silver film was overlapped so that the silver film side became the adhesive layer side. Thus, a reflective film having a thickness of 129.12 μm was produced. Each of the produced reflective films was evaluated as described above. The results are shown in Table 1.

(實施例2) (Example 2)

對與實施例1同樣之白色基材層,利用棒式塗佈機塗佈將電子束硬化型丙烯酸系樹脂、光起始劑、及稀釋溶劑MIBK以質量比率1:0.03:1進行混合並將樹脂固形物成分比率調整為50質量%而成之樹脂溶液(墨水),使其乾燥、硬化,而形成厚度2μm之平滑塗層。於平滑塗層之表面,作為金屬薄膜層,利用濺鍍法形成厚度120nm之銀薄膜層,於銀薄膜層之表面,作為保護層,形成與上述之平滑塗層同樣之層,而製作厚度為104.12μm之反射膜。對所獲得之反射膜,進行上述所示之各評價。將結果示於表1。 The same white substrate layer as in Example 1 was applied by a bar coater, and an electron beam-curable acrylic resin, a photoinitiator, and a diluent MIBK were mixed at a mass ratio of 1: 0.03: 1 and mixed. A resin solution (ink) prepared by adjusting the ratio of the solid content of the resin to 50% by mass is dried and hardened to form a smooth coating having a thickness of 2 μm. On the surface of the smooth coating layer, as a metal thin film layer, a silver thin film layer having a thickness of 120 nm was formed by a sputtering method. On the surface of the silver thin film layer, as a protective layer, the same layer as the smooth coating layer described above was formed to produce a thickness of 104.12 μm reflective film. Each of the obtained reflection films was evaluated as described above. The results are shown in Table 1.

(實施例3) (Example 3)

除設為將白色基材層與銀薄膜簡單地重合之狀態,製成厚度為130.12μm之反射膜以外,以與實施例1同樣之方式製作反射膜。其中,空氣層為3μm。對所獲得之反射膜,進行上述所示之各評價。將結果示於表1。 A reflective film was produced in the same manner as in Example 1 except that the white substrate layer and the silver thin film were simply superimposed, and a reflective film having a thickness of 130.12 μm was prepared. The air layer is 3 μm. Each of the obtained reflection films was evaluated as described above. The results are shown in Table 1.

(實施例4) (Example 4)

除將白色基材層變更為厚度70μm之聚烯烴系白色基材(三菱樹脂股份有限公司製造,商品名「Lumirex II R20」),獲得厚度為100.12μm之反射膜以外,以與實施例3同樣之方式製作反射膜。其中,空氣層為3μm。對所獲得之反射膜,進行上述所示之各評價。將結果示於表1。 Except that the white substrate layer was changed to a polyolefin-based white substrate with a thickness of 70 μm (manufactured by Mitsubishi Resins Co., Ltd. under the trade name “Lumirex II R20”) and a reflective film having a thickness of 100.12 μm was obtained, the same procedure as in Example 3 Way to make a reflective film. The air layer is 3 μm. Each of the obtained reflection films was evaluated as described above. The results are shown in Table 1.

(實施例5) (Example 5)

除將白色基材層變更為厚度80μm之聚烯烴系白色基材(三菱樹脂股份有限公司製造,商品名「Lumirex II R20」),獲得厚度為111.12μm之反射膜以外,以與實施例2同樣之方式製作反射膜。對所獲得之反射膜,進行上述所示之各評價。將結果示於表1。 Except that the white base material layer was changed to a polyolefin-based white base material (manufactured by Mitsubishi Resin Co., Ltd., trade name "Lumirex II R20") with a thickness of 80 μm, and a reflective film having a thickness of 111.12 μm was obtained, the same procedure as in Example 2 Way to make a reflective film. Each of the obtained reflection films was evaluated as described above. The results are shown in Table 1.

(實施例6) (Example 6)

除於實施例5中,於不設置平滑塗層之情況下直接進行銀蒸鍍以外,同樣地進行加工,並對所獲得之反射膜,進行上述所示之各評價。將結果示於表1。 Except that in Example 5, silver vapor deposition was directly performed without providing a smooth coating layer, the same processing was performed, and the obtained reflection film was subjected to each of the evaluations described above. The results are shown in Table 1.

(實施例7) (Example 7)

除將金屬薄膜層製成厚度60nm之銀薄膜層以外,以與實施例5同樣之方式製作反射膜。對所獲得之反射膜,進行上述所示之各評價。將結果示於表1。 A reflective film was produced in the same manner as in Example 5 except that the metal thin film layer was a silver thin film layer having a thickness of 60 nm. Each of the obtained reflection films was evaluated as described above. The results are shown in Table 1.

(實施例8) (Example 8)

於實施例2中,在保護層之上,進而利用棒式塗佈機塗佈將電子束硬化型丙烯酸系樹脂、氧化鈦、光起始劑、及稀釋溶劑MIBK以質量比率1:0.3:0.02:3進行混合並將樹脂固形物成分比率調整為50質量%而成之樹脂溶液(墨水),使其乾燥、硬化,藉此設置厚度2.0μm之硬塗層。對所獲得之反射膜,進行上述所示之各評價。將結果示於表1。 In Example 2, an electron beam-curable acrylic resin, titanium oxide, a photoinitiator, and a diluent MIBK were coated on the protective layer by a bar coater at a mass ratio of 1: 0.3: 0.02. : 3 A resin solution (ink) prepared by mixing and adjusting the resin solid content component ratio to 50% by mass, and drying and curing the resin solution (ink), thereby providing a hard coat layer having a thickness of 2.0 μm. Each of the obtained reflection films was evaluated as described above. The results are shown in Table 1.

(實施例9) (Example 9)

除將白色基材層製成聚酯系白色膜(東麗股份有限公司製造,商品名「Lumirror E80E」)以外,以與實施例3同樣之方式製作反射膜。對所獲得之反射膜,進行上述所示之各評價。將結果示於表1。 A reflective film was produced in the same manner as in Example 3 except that the white base layer was made of a polyester-based white film (trade name "Lumirror E80E" manufactured by Toray Industries, Ltd.). Each of the obtained reflection films was evaluated as described above. The results are shown in Table 1.

(實施例10) (Example 10)

除將金屬薄膜層製成厚度120nm之鋁薄膜層以外,以與實施例3同樣之方式製作反射膜。對所獲得之反射膜,進行上述所示之各評價。將結果示於表1。 A reflective film was produced in the same manner as in Example 3 except that the metal thin film layer was an aluminum thin film layer having a thickness of 120 nm. Each of the obtained reflection films was evaluated as described above. The results are shown in Table 1.

(比較例1) (Comparative example 1)

單獨對厚度100μm之聚烯烴系白色基材(三菱樹脂股份有限公司製造,商品名「Lumirex II R20」),進行上述所示之各評價。將結果示於表2。 The polyolefin-based white substrate (manufactured by Mitsubishi Resin Co., Ltd., trade name "Lumirex II R20") having a thickness of 100 μm was individually subjected to each of the evaluations described above. The results are shown in Table 2.

(比較例2) (Comparative example 2)

單獨對厚度70μm之聚烯烴系白色基材(三菱樹脂股份有限公司製造,商品名「Lumirex II R20」),進行上述所示之各評價。將結果示於表2。 A polyolefin white substrate (manufactured by Mitsubishi Resin Co., Ltd., trade name "Lumirex II R20") having a thickness of 70 µm was individually evaluated for each of the evaluations described above. The results are shown in Table 2.

(比較例3) (Comparative example 3)

單獨對厚度80μm之聚烯烴系白色基材(三菱樹脂股份有限公司製造,商品名「Lumirex II R20」),進行上述所示之各評價。將結果示於表2。 The polyolefin-based white substrate (manufactured by Mitsubishi Resin Co., Ltd., trade name "Lumirex II R20") having a thickness of 80 µm was individually subjected to each of the evaluations described above. The results are shown in Table 2.

(比較例4) (Comparative Example 4)

單獨對實施例1中所示之銀薄膜,進行上述所示之各評價。將結果示於表2。 Each of the silver films shown in Example 1 was evaluated as described above. The results are shown in Table 2.

(比較例5) (Comparative example 5)

除對銀薄膜面不設置保護層以外,以與實施例2同樣之方式製作反射膜。對所獲得之反射膜,將銀薄膜面作為反射使用面,進行上述所示之各評價。將結果示於表2。 A reflective film was produced in the same manner as in Example 2 except that a protective layer was not provided on the silver thin film surface. With respect to the obtained reflection film, each of the evaluations described above was performed using the silver thin film surface as a reflection use surface. The results are shown in Table 2.

(比較例6) (Comparative Example 6)

除將白色基材層變更為厚度225μm之聚烯烴系白色基材(三菱樹脂股份有限公司製造,商品名「Lumirex II R20」),獲得厚度為229.12μm之反射膜以外,以與實施例2同樣之方式製作反射膜。對所獲得之反射膜,進行上述所示之各評價。將結果示於表2。 Except that the white base material layer was changed to a polyolefin-based white base material (manufactured by Mitsubishi Resin Co., Ltd., trade name "Lumirex II R20") with a thickness of 225 μm, and a reflective film having a thickness of 229.12 μm was obtained, the same procedure as in Example 2 Way to make a reflective film. Each of the obtained reflection films was evaluated as described above. The results are shown in Table 2.

(比較例7) (Comparative Example 7)

單獨對厚度225μm之聚烯烴系白色基材(三菱樹脂股份有限公司製造,商品名「Lumirex II R20」),進行上述所示之各評價。將結果示於表2。 The polyolefin-based white substrate (manufactured by Mitsubishi Resin Co., Ltd., trade name "Lumirex II R20") having a thickness of 225 µm was individually evaluated for each of the evaluations described above. The results are shown in Table 2.

(比較例8) (Comparative Example 8)

單獨對實施例9中之厚度80μm之聚酯系白色基材,進行上述所示之各評價。將結果示於表2。 Each of the polyester-based white substrates having a thickness of 80 μm in Example 9 was evaluated as described above. The results are shown in Table 2.

(參考例1) (Reference example 1)

對利用折射率不同之2種透明聚酯層獲得之超多層型反射膜(3M(Minnesota Mining and Manufacturing,明尼蘇達礦業及製造)公司製造,商品名「ESR-80」),進行上述所示之各評價。將結果示於表2。 For the ultra-multilayer reflective film (manufactured by 3M (Minnesota Mining and Manufacturing) company, trade name "ESR-80") obtained by using two types of transparent polyester layers having different refractive indexes, each of the above is performed. Evaluation. The results are shown in Table 2.

(模擬試驗) (Simulation test)

如表3所示,變更白色基材層之厚度,使用光線追蹤模擬軟體(製品名:Light Tools)計測450nm、750nm、550nm時之反射率。將根據各反射率之值獲得之△a、△b、及△a/△b之值示於表3。 As shown in Table 3, the thickness of the white substrate layer was changed, and the reflectances at 450 nm, 750 nm, and 550 nm were measured using ray tracing simulation software (product name: Light Tools). Table 3 shows the values of Δa, Δb, and Δa / Δb obtained from the values of the respective reflectances.

作為參考,關於實施例1~10、比較例1~8及參考例1,於圖2中表示550nm時之反射率與亮度之關係,於圖3中表示△b與y值之關係。 For reference, regarding Examples 1 to 10, Comparative Examples 1 to 8, and Reference Example 1, the relationship between reflectance and brightness at 550 nm is shown in FIG. 2, and the relationship between Δb and y values is shown in FIG. 3.

<考察> <Inspection>

根據表1明確,各實施例之膜之反射率、亮度、色度(黃色化之降低)、耐久性均為良好。另一方面,為單獨之白色基材層之比較例1或為使其薄膜化而成之膜之比較例2及比較例3中,反射率較低,相應地亮度亦降低。又,為單獨之銀薄膜之比較例4之膜,發黃較為強烈,耐久性較差。進而明確,於白色基材層設置平滑塗層,進行銀蒸鍍,自銀薄膜層面進行特性評價之比較例5中,發黃極為強烈,亮度亦降低。 It is clear from Table 1 that the reflectance, brightness, chromaticity (reduction in yellowing), and durability of the films of each example are good. On the other hand, in Comparative Example 1 which is a single white base material layer or Comparative Examples 2 and 3 which are thin films, the reflectance is low and the brightness is accordingly reduced. In addition, the film of Comparative Example 4 which is a single silver thin film has strong yellowing and poor durability. Furthermore, it was clear that in Comparative Example 5 in which a smooth coating was provided on a white substrate layer, silver was vapor-deposited, and characteristics were evaluated from the silver thin film layer, yellowing was extremely intense and the brightness was also reduced.

又,根據表3明確,藉由相對於特定之金屬薄膜層之厚度,適當變更白色基材層之厚度,而可將本發明之反射膜之△a、△b、及△a/△b之值調整為適宜之範圍,結果可使反射率、亮度、色度(黃色化之降低)為良好。 In addition, it is clear from Table 3 that by appropriately changing the thickness of the white substrate layer with respect to the thickness of the specific metal thin film layer, the Δa, Δb, and Δa / △ b of the reflective film of the present invention can be changed. When the value is adjusted to an appropriate range, the reflectance, brightness, and chromaticity (reduction in yellowing) can be made good.

[產業上之可利用性] [Industrial availability]

根據本發明,可更廉價地提供一種為高反射率、高亮度且高耐久性,並且反射光為良好之色度之(可抑制反射光之發黃之)反射膜。本發明之反射膜作為先前之昂貴之超多層之反射膜之代替品,例如可較佳地用作液晶顯示器之反射構件。於此情形時,即便不進行LED光源或光學膜之再設計,亦可確保良好之光反射特性。 According to the present invention, it is possible to provide a reflective film which has high reflectivity, high brightness, and high durability, and whose reflected light has a good chromaticity (which suppresses yellowing of the reflected light). The reflective film of the present invention can be used as a substitute for a reflective member of a liquid crystal display, as a substitute for the previous expensive ultra-multilayer reflective film. In this case, even without redesigning the LED light source or optical film, good light reflection characteristics can be ensured.

Claims (9)

一種反射膜,其特徵在於:其係依序具有白色基材層、金屬薄膜層、及保護層,該白色基材層配置於反射使用面側者,且於自上述白色基材層側對該反射膜照射光之情形時,下述所表示之△b為1.0%以上且未達4.0%,且下述所表示之△a與上述△b之比所表示之反射率提高度(△a/△b)為1.3以上且3.0以下,△a:上述白色基材層之波長450nm之光之反射率與波長750nm之光之反射率的差△b:上述反射膜之波長450nm之光之反射率與波長750nm之光之反射率的差。A reflective film is characterized in that it has a white base material layer, a metal thin film layer, and a protective layer in this order. The white base material layer is disposed on the reflective use surface side, and is disposed on the side from the white base material layer side. When the reflecting film is irradiated with light, Δb represented by the following is 1.0% or more and less than 4.0%, and the degree of reflectance improvement represented by the ratio of △ a represented by the following △ b (△ a / Δb) is 1.3 or more and 3.0 or less, Δa: the difference between the reflectance of the white substrate layer with a wavelength of 450 nm and the reflectance of the light with a wavelength of 750 nm Δb: the reflectance of the reflective film with a wavelength of 450 nm Difference from the reflectance of light with a wavelength of 750 nm. 如請求項1之反射膜,其中上述白色基材層之波長550nm之光之反射率為95%以上。For example, the reflective film of claim 1, wherein the reflectance of the white substrate layer with a wavelength of 550 nm of light is 95% or more. 如請求項1之反射膜,其中上述白色基材層之波長550nm之光之透過率為1.0%以上。For example, the reflective film of claim 1, wherein the white substrate layer has a transmittance of light having a wavelength of 550 nm of 1.0% or more. 如請求項2之反射膜,其中上述白色基材層之波長550nm之光之透過率為1.0%以上。For example, the reflective film of claim 2, wherein the transmittance of light of a wavelength of 550 nm of the white substrate layer is 1.0% or more. 如請求項1至4中任一項之反射膜,其中上述白色基材層之厚度比率為上述反射膜之厚度之50%以上。The reflective film according to any one of claims 1 to 4, wherein the thickness ratio of the white substrate layer is 50% or more of the thickness of the reflective film. 如請求項1至4中任一項之反射膜,其中於上述白色基材層與金屬薄膜層之間具有空氣層。The reflective film according to any one of claims 1 to 4, wherein an air layer is provided between the white substrate layer and the metal thin film layer. 如請求項1至4中任一項之反射膜,其中於上述白色基材層中,於設置有金屬薄膜層之側之面包括平滑塗層,且該平滑塗層之設置有金屬薄膜層之側之表面粗糙度(Ra)為300nm以下。The reflective film according to any one of claims 1 to 4, wherein in the above-mentioned white base material layer, a surface on the side provided with the metal thin film layer includes a smooth coating, and the smooth coating is provided with the metal thin film layer. The surface roughness (Ra) of the side is 300 nm or less. 如請求項1至4中任一項之反射膜,其中上述保護層之厚度為1~200μm。The reflective film according to any one of claims 1 to 4, wherein the thickness of the protective layer is 1 to 200 μm. 一種電子元件用顯示裝置,其包括如請求項1至8中任一項之反射膜。A display device for an electronic component includes the reflective film according to any one of claims 1 to 8.
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TW201622980A (en) 2016-07-01
WO2016072472A1 (en) 2016-05-12

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