TWI666346B - 電鍍設備 - Google Patents
電鍍設備 Download PDFInfo
- Publication number
- TWI666346B TWI666346B TW107141288A TW107141288A TWI666346B TW I666346 B TWI666346 B TW I666346B TW 107141288 A TW107141288 A TW 107141288A TW 107141288 A TW107141288 A TW 107141288A TW I666346 B TWI666346 B TW I666346B
- Authority
- TW
- Taiwan
- Prior art keywords
- extension
- rotating cathode
- electrolyte
- supply unit
- item
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/04—Wires; Strips; Foils
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
??10-2017-0160541 | 2017-11-28 | ||
KR1020170160541A KR102045630B1 (ko) | 2017-11-28 | 2017-11-28 | 전주 도금 장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201925547A TW201925547A (zh) | 2019-07-01 |
TWI666346B true TWI666346B (zh) | 2019-07-21 |
Family
ID=66665655
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW107141288A TWI666346B (zh) | 2017-11-28 | 2018-11-20 | 電鍍設備 |
Country Status (3)
Country | Link |
---|---|
KR (1) | KR102045630B1 (ko) |
TW (1) | TWI666346B (ko) |
WO (1) | WO2019107740A1 (ko) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113089034B (zh) * | 2021-04-02 | 2021-10-08 | 广东嘉元科技股份有限公司 | 一种侧液槽、电解液流动方法、生箔机及其工作方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1523137A (zh) * | 2003-02-17 | 2004-08-25 | 未来金属株式会社 | 使用电铸技术的金属纤维制造装置及其方法 |
US6984456B2 (en) * | 2002-05-13 | 2006-01-10 | Mitsui Mining & Smelting Co., Ltd. | Flexible printed wiring board for chip-on flexibles |
TWI342900B (ko) * | 2006-11-08 | 2011-06-01 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4426127B2 (ja) * | 2001-03-29 | 2010-03-03 | 三井金属鉱業株式会社 | 金属箔電解製造装置 |
KR100451253B1 (ko) * | 2001-11-09 | 2004-10-06 | 엘지전선 주식회사 | 전해동박 제조장치 |
JP2010090467A (ja) * | 2008-10-10 | 2010-04-22 | Mitsubishi Materials Corp | めっき装置 |
US9816194B2 (en) * | 2015-03-19 | 2017-11-14 | Lam Research Corporation | Control of electrolyte flow dynamics for uniform electroplating |
-
2017
- 2017-11-28 KR KR1020170160541A patent/KR102045630B1/ko active IP Right Grant
-
2018
- 2018-10-19 WO PCT/KR2018/012448 patent/WO2019107740A1/ko active Application Filing
- 2018-11-20 TW TW107141288A patent/TWI666346B/zh not_active IP Right Cessation
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6984456B2 (en) * | 2002-05-13 | 2006-01-10 | Mitsui Mining & Smelting Co., Ltd. | Flexible printed wiring board for chip-on flexibles |
CN1523137A (zh) * | 2003-02-17 | 2004-08-25 | 未来金属株式会社 | 使用电铸技术的金属纤维制造装置及其方法 |
TWI342900B (ko) * | 2006-11-08 | 2011-06-01 |
Also Published As
Publication number | Publication date |
---|---|
KR102045630B1 (ko) | 2019-11-15 |
KR20190061799A (ko) | 2019-06-05 |
WO2019107740A1 (ko) | 2019-06-06 |
TW201925547A (zh) | 2019-07-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI580823B (zh) | 用於垂直流電金屬沉積於一基板上之裝置 | |
TWI666346B (zh) | 電鍍設備 | |
TWI716130B (zh) | 電鍍裝置 | |
KR20120129125A (ko) | 반도체 기판의 전기 도금 장치 및 방법 | |
TW490510B (en) | Method and apparatus for producing electrolytic copper foil | |
JP4426127B2 (ja) | 金属箔電解製造装置 | |
TWI513859B (zh) | 製造可撓性印刷電路板的電鍍設備 | |
JP2007308783A (ja) | 電気めっき装置およびその方法 | |
JP4866706B2 (ja) | 金属箔電解製造装置 | |
KR102065228B1 (ko) | 전주 도금 장치 | |
TW202022169A (zh) | 電鑄設備 | |
JP6687415B2 (ja) | 部分めっき方法およびそれに用いるマスク部材 | |
US20230313407A1 (en) | Shield body system for a process fluid for chemical and/or electrolytic surface treatment of a substrate | |
CN116411329B (zh) | 电镀装置 | |
CN210215608U (zh) | 一种用于电镀设备的电镀溶液输入装置和相应电镀设备 | |
CN218404472U (zh) | 均流器和镀槽 | |
KR200430588Y1 (ko) | 균일 도금을 위한 차폐유도판 | |
JP3753114B2 (ja) | 電気めっき用電極及びそれを用いた金属帯の電気めっき方法 | |
TW202307283A (zh) | 扇出型面板級封裝電鍍之電極遮板構造 | |
JPH07188992A (ja) | 複合メッキ液の気泡分散装置 | |
JPS63171897A (ja) | 電気めつき装置 | |
JPH0740772U (ja) | 電解金属箔製造装置 | |
JPH01129992A (ja) | 合金電気めっき鋼板の製造方法およびその製造装置 | |
JP2011153334A (ja) | めっき方法および電解めっき装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |