TWI665254B - 樹脂組成物、附樹脂銅箔、介電體層、貼銅層合板、電容器元件及內裝電容器之印刷配線板 - Google Patents
樹脂組成物、附樹脂銅箔、介電體層、貼銅層合板、電容器元件及內裝電容器之印刷配線板 Download PDFInfo
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- TWI665254B TWI665254B TW107108396A TW107108396A TWI665254B TW I665254 B TWI665254 B TW I665254B TW 107108396 A TW107108396 A TW 107108396A TW 107108396 A TW107108396 A TW 107108396A TW I665254 B TWI665254 B TW I665254B
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- Prior art keywords
- resin
- resin composition
- dielectric layer
- weight
- copper foil
- Prior art date
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- 229920005989 resin Polymers 0.000 title claims abstract description 120
- 239000011347 resin Substances 0.000 title claims abstract description 120
- 239000011342 resin composition Substances 0.000 title claims abstract description 65
- 239000003990 capacitor Substances 0.000 title claims abstract description 39
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims description 44
- 239000011889 copper foil Substances 0.000 title claims description 43
- 239000003822 epoxy resin Substances 0.000 claims abstract description 37
- 150000002148 esters Chemical class 0.000 claims abstract description 37
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 37
- 239000000945 filler Substances 0.000 claims abstract description 30
- 239000004760 aramid Substances 0.000 claims abstract description 11
- 229920003235 aromatic polyamide Polymers 0.000 claims abstract description 11
- 125000003118 aryl group Chemical group 0.000 claims description 17
- 229920000768 polyamine Polymers 0.000 claims description 13
- 229910002367 SrTiO Inorganic materials 0.000 claims description 2
- 239000007787 solid Substances 0.000 claims description 2
- 238000009413 insulation Methods 0.000 abstract description 6
- 239000010410 layer Substances 0.000 description 58
- 238000011156 evaluation Methods 0.000 description 31
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 27
- 239000002270 dispersing agent Substances 0.000 description 11
- 239000004848 polyfunctional curative Substances 0.000 description 10
- 239000002966 varnish Substances 0.000 description 10
- 239000011888 foil Substances 0.000 description 9
- -1 polyethylene Polymers 0.000 description 9
- 239000000126 substance Substances 0.000 description 9
- 238000000034 method Methods 0.000 description 8
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 7
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 7
- 229920003986 novolac Polymers 0.000 description 7
- 239000002184 metal Substances 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 238000002156 mixing Methods 0.000 description 6
- 238000000576 coating method Methods 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 230000009467 reduction Effects 0.000 description 5
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 4
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 4
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 239000007822 coupling agent Substances 0.000 description 4
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 4
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 4
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 239000004843 novolac epoxy resin Substances 0.000 description 4
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 4
- 239000002893 slag Substances 0.000 description 4
- 238000004381 surface treatment Methods 0.000 description 4
- 238000011282 treatment Methods 0.000 description 4
- RUEBPOOTFCZRBC-UHFFFAOYSA-N (5-methyl-2-phenyl-1h-imidazol-4-yl)methanol Chemical compound OCC1=C(C)NC(C=2C=CC=CC=2)=N1 RUEBPOOTFCZRBC-UHFFFAOYSA-N 0.000 description 3
- TYOXIFXYEIILLY-UHFFFAOYSA-N 5-methyl-2-phenyl-1h-imidazole Chemical compound N1C(C)=CN=C1C1=CC=CC=C1 TYOXIFXYEIILLY-UHFFFAOYSA-N 0.000 description 3
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000004891 communication Methods 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 229920001577 copolymer Polymers 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 239000011229 interlayer Substances 0.000 description 3
- 125000001624 naphthyl group Chemical group 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 238000003825 pressing Methods 0.000 description 3
- FBHPRUXJQNWTEW-UHFFFAOYSA-N 1-benzyl-2-methylimidazole Chemical compound CC1=NC=CN1CC1=CC=CC=C1 FBHPRUXJQNWTEW-UHFFFAOYSA-N 0.000 description 2
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1 ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 0.000 description 2
- RSEBUVRVKCANEP-UHFFFAOYSA-N 2-pyrroline Chemical compound C1CC=CN1 RSEBUVRVKCANEP-UHFFFAOYSA-N 0.000 description 2
- VHYFNPMBLIVWCW-UHFFFAOYSA-N 4-Dimethylaminopyridine Chemical compound CN(C)C1=CC=NC=C1 VHYFNPMBLIVWCW-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- ZTQSAGDEMFDKMZ-UHFFFAOYSA-N Butyraldehyde Chemical compound CCCC=O ZTQSAGDEMFDKMZ-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
- 150000004984 aromatic diamines Chemical class 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- 239000001530 fumaric acid Substances 0.000 description 2
- 238000007756 gravure coating Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 239000011256 inorganic filler Substances 0.000 description 2
- 229910003475 inorganic filler Inorganic materials 0.000 description 2
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 230000014759 maintenance of location Effects 0.000 description 2
- 230000005012 migration Effects 0.000 description 2
- 238000013508 migration Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- BDJRBEYXGGNYIS-UHFFFAOYSA-N nonanedioic acid Chemical compound OC(=O)CCCCCCCC(O)=O BDJRBEYXGGNYIS-UHFFFAOYSA-N 0.000 description 2
- WLJVNTCWHIRURA-UHFFFAOYSA-N pimelic acid Chemical compound OC(=O)CCCCCC(O)=O WLJVNTCWHIRURA-UHFFFAOYSA-N 0.000 description 2
- 238000012643 polycondensation polymerization Methods 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- TYFQFVWCELRYAO-UHFFFAOYSA-N suberic acid Chemical compound OC(=O)CCCCCCC(O)=O TYFQFVWCELRYAO-UHFFFAOYSA-N 0.000 description 2
- 230000001629 suppression Effects 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- MQRMTENGXFRETM-UHFFFAOYSA-N (2-methyl-1h-imidazol-5-yl)methanol Chemical class CC1=NC=C(CO)N1 MQRMTENGXFRETM-UHFFFAOYSA-N 0.000 description 1
- SSUJUUNLZQVZMO-UHFFFAOYSA-N 1,2,3,4,8,9,10,10a-octahydropyrimido[1,2-a]azepine Chemical compound C1CCC=CN2CCCNC21 SSUJUUNLZQVZMO-UHFFFAOYSA-N 0.000 description 1
- GIWQSPITLQVMSG-UHFFFAOYSA-N 1,2-dimethylimidazole Chemical compound CC1=NC=CN1C GIWQSPITLQVMSG-UHFFFAOYSA-N 0.000 description 1
- LDVVTQMJQSCDMK-UHFFFAOYSA-N 1,3-dihydroxypropan-2-yl formate Chemical compound OCC(CO)OC=O LDVVTQMJQSCDMK-UHFFFAOYSA-N 0.000 description 1
- XZKLXPPYISZJCV-UHFFFAOYSA-N 1-benzyl-2-phenylimidazole Chemical compound C1=CN=C(C=2C=CC=CC=2)N1CC1=CC=CC=C1 XZKLXPPYISZJCV-UHFFFAOYSA-N 0.000 description 1
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 description 1
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 1
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 1
- YTWBFUCJVWKCCK-UHFFFAOYSA-N 2-heptadecyl-1h-imidazole Chemical compound CCCCCCCCCCCCCCCCCC1=NC=CN1 YTWBFUCJVWKCCK-UHFFFAOYSA-N 0.000 description 1
- LARNQUAWIRVQPK-UHFFFAOYSA-N 2-methyloxiran-2-amine Chemical compound NC1(CO1)C LARNQUAWIRVQPK-UHFFFAOYSA-N 0.000 description 1
- BKCCAYLNRIRKDJ-UHFFFAOYSA-N 2-phenyl-4,5-dihydro-1h-imidazole Chemical compound N1CCN=C1C1=CC=CC=C1 BKCCAYLNRIRKDJ-UHFFFAOYSA-N 0.000 description 1
- LLEASVZEQBICSN-UHFFFAOYSA-N 2-undecyl-1h-imidazole Chemical compound CCCCCCCCCCCC1=NC=CN1 LLEASVZEQBICSN-UHFFFAOYSA-N 0.000 description 1
- HYTXDGPNBWYWDM-UHFFFAOYSA-N 3,4-dicarboxybenzoate;3-(2-undecyl-1h-imidazol-3-ium-3-yl)propanenitrile Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1.CCCCCCCCCCCC1=NC=CN1CCC#N HYTXDGPNBWYWDM-UHFFFAOYSA-N 0.000 description 1
- UIDDPPKZYZTEGS-UHFFFAOYSA-N 3-(2-ethyl-4-methylimidazol-1-yl)propanenitrile Chemical compound CCC1=NC(C)=CN1CCC#N UIDDPPKZYZTEGS-UHFFFAOYSA-N 0.000 description 1
- SESYNEDUKZDRJL-UHFFFAOYSA-N 3-(2-methylimidazol-1-yl)propanenitrile Chemical compound CC1=NC=CN1CCC#N SESYNEDUKZDRJL-UHFFFAOYSA-N 0.000 description 1
- SZUPZARBRLCVCB-UHFFFAOYSA-N 3-(2-undecylimidazol-1-yl)propanenitrile Chemical compound CCCCCCCCCCCC1=NC=CN1CCC#N SZUPZARBRLCVCB-UHFFFAOYSA-N 0.000 description 1
- ZBMISJGHVWNWTE-UHFFFAOYSA-N 3-(4-aminophenoxy)aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC(N)=C1 ZBMISJGHVWNWTE-UHFFFAOYSA-N 0.000 description 1
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 1
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 1
- NFVPEIKDMMISQO-UHFFFAOYSA-N 4-[(dimethylamino)methyl]phenol Chemical compound CN(C)CC1=CC=C(O)C=C1 NFVPEIKDMMISQO-UHFFFAOYSA-N 0.000 description 1
- WXAIEIRYBSKHDP-UHFFFAOYSA-N 4-phenyl-n-(4-phenylphenyl)-n-[4-[4-(4-phenyl-n-(4-phenylphenyl)anilino)phenyl]phenyl]aniline Chemical compound C1=CC=CC=C1C1=CC=C(N(C=2C=CC(=CC=2)C=2C=CC=CC=2)C=2C=CC(=CC=2)C=2C=CC(=CC=2)N(C=2C=CC(=CC=2)C=2C=CC=CC=2)C=2C=CC(=CC=2)C=2C=CC=CC=2)C=C1 WXAIEIRYBSKHDP-UHFFFAOYSA-N 0.000 description 1
- IZSHZLKNFQAAKX-UHFFFAOYSA-N 5-cyclopenta-2,4-dien-1-ylcyclopenta-1,3-diene Chemical group C1=CC=CC1C1C=CC=C1 IZSHZLKNFQAAKX-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- 101001134276 Homo sapiens S-methyl-5'-thioadenosine phosphorylase Proteins 0.000 description 1
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical compound OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 102100022050 Protein canopy homolog 2 Human genes 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- FDLQZKYLHJJBHD-UHFFFAOYSA-N [3-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC(CN)=C1 FDLQZKYLHJJBHD-UHFFFAOYSA-N 0.000 description 1
- UUQQGGWZVKUCBD-UHFFFAOYSA-N [4-(hydroxymethyl)-2-phenyl-1h-imidazol-5-yl]methanol Chemical compound N1C(CO)=C(CO)N=C1C1=CC=CC=C1 UUQQGGWZVKUCBD-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 150000004645 aluminates Chemical class 0.000 description 1
- 150000001409 amidines Chemical class 0.000 description 1
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 description 1
- ARCGXLSVLAOJQL-UHFFFAOYSA-N anhydrous trimellitic acid Natural products OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 150000003937 benzamidines Chemical class 0.000 description 1
- UHOVQNZJYSORNB-UHFFFAOYSA-N benzene Substances C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 1
- 229940073608 benzyl chloride Drugs 0.000 description 1
- 239000004841 bisphenol A epoxy resin Substances 0.000 description 1
- 239000004842 bisphenol F epoxy resin Substances 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007607 die coating method Methods 0.000 description 1
- 150000005690 diesters Chemical class 0.000 description 1
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 1
- CZZYITDELCSZES-UHFFFAOYSA-N diphenylmethane Chemical compound C=1C=CC=CC=1CC1=CC=CC=C1 CZZYITDELCSZES-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- ZONYXWQDUYMKFB-UHFFFAOYSA-N flavanone Chemical compound O1C2=CC=CC=C2C(=O)CC1C1=CC=CC=C1 ZONYXWQDUYMKFB-UHFFFAOYSA-N 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- MTNDZQHUAFNZQY-UHFFFAOYSA-N imidazoline Chemical compound C1CN=CN1 MTNDZQHUAFNZQY-UHFFFAOYSA-N 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- RCHKEJKUUXXBSM-UHFFFAOYSA-N n-benzyl-2-(3-formylindol-1-yl)acetamide Chemical compound C12=CC=CC=C2C(C=O)=CN1CC(=O)NCC1=CC=CC=C1 RCHKEJKUUXXBSM-UHFFFAOYSA-N 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 239000011120 plywood Substances 0.000 description 1
- 229920001084 poly(chloroprene) Polymers 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000002594 sorbent Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229920003048 styrene butadiene rubber Polymers 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 238000010345 tape casting Methods 0.000 description 1
- 125000005270 trialkylamine group Chemical group 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 1
- HGBOYTHUEUWSSQ-UHFFFAOYSA-N valeric aldehyde Natural products CCCCC=O HGBOYTHUEUWSSQ-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/33—Thin- or thick-film capacitors
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/0353—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
- H05K1/0373—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement containing additives, e.g. fillers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/043—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of metal
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
- B32B15/088—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin comprising polyamides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
- B32B15/09—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin comprising polyesters
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
- B32B15/092—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin comprising epoxy resins
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/20—Layered products comprising a layer of metal comprising aluminium or copper
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/18—Layered products comprising a layer of synthetic resin characterised by the use of special additives
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
- C08K3/22—Oxides; Hydroxides of metals
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
- C08L63/04—Epoxynovolacs
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L67/00—Compositions of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Compositions of derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L77/00—Compositions of polyamides obtained by reactions forming a carboxylic amide link in the main chain; Compositions of derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L77/00—Compositions of polyamides obtained by reactions forming a carboxylic amide link in the main chain; Compositions of derivatives of such polymers
- C08L77/10—Polyamides derived from aromatically bound amino and carboxyl groups of amino-carboxylic acids or of polyamines and polycarboxylic acids
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
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- H01G4/06—Solid dielectrics
- H01G4/08—Inorganic dielectrics
- H01G4/12—Ceramic dielectrics
- H01G4/1209—Ceramic dielectrics characterised by the ceramic dielectric material
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- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
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- H01G4/06—Solid dielectrics
- H01G4/14—Organic dielectrics
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- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/018—Dielectrics
- H01G4/06—Solid dielectrics
- H01G4/14—Organic dielectrics
- H01G4/18—Organic dielectrics of synthetic material, e.g. derivatives of cellulose
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- H01—ELECTRIC ELEMENTS
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- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/018—Dielectrics
- H01G4/20—Dielectrics using combinations of dielectrics from more than one of groups H01G4/02 - H01G4/06
- H01G4/206—Dielectrics using combinations of dielectrics from more than one of groups H01G4/02 - H01G4/06 inorganic and synthetic material
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- H05K1/16—Printed circuits incorporating printed electric components, e.g. printed resistor, capacitor, inductor
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-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2255/00—Coating on the layer surface
- B32B2255/06—Coating on the layer surface on metal layer
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2255/00—Coating on the layer surface
- B32B2255/26—Polymeric coating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2264/00—Composition or properties of particles which form a particulate layer or are present as additives
- B32B2264/10—Inorganic particles
- B32B2264/102—Oxide or hydroxide
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/20—Properties of the layers or laminate having particular electrical or magnetic properties, e.g. piezoelectric
- B32B2307/204—Di-electric
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2457/00—Electrical equipment
- B32B2457/08—PCBs, i.e. printed circuit boards
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
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- C08L2205/00—Polymer mixtures characterised by other features
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- H01—ELECTRIC ELEMENTS
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- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/018—Dielectrics
- H01G4/06—Solid dielectrics
- H01G4/08—Inorganic dielectrics
- H01G4/12—Ceramic dielectrics
- H01G4/1209—Ceramic dielectrics characterised by the ceramic dielectric material
- H01G4/1236—Ceramic dielectrics characterised by the ceramic dielectric material based on zirconium oxides or zirconates
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Abstract
本發明係提供一種樹脂組成物,其係在作為電容器元件或內裝電容器之印刷配線板的介電體層使用的情況時,可一邊確保優異的電路密接性,一邊改善高溫高濕下之電容器元件的容量安定性及絕緣性。此樹脂組成物係包含樹脂成分與介電體填料,樹脂成分包含環氧樹脂、活性酯樹脂、與芳香族聚醯胺樹脂。
Description
本發明係關於樹脂組成物、附樹脂銅箔、介電體層、貼銅層合板、電容器元件及內裝電容器之印刷配線板者。
作為使用於貼銅層合板或印刷配線板之製造的樹脂組成物,已知有內裝電容器之印刷配線板用樹脂組成物。該樹脂組成物係藉由硬化而發揮電容器中之作為介電體層的功能者。例如,於專利文獻1(日本專利第4148501號公報)中,記載有包含(設為樹脂成分100重量份)環氧樹脂20~80重量份及芳香族聚醯胺樹脂20~80重量份,且包含(設為樹脂組成物100wt%)介電體填料75~85wt%的內裝電容器之印刷配線板用樹脂組成物。又,於專利文獻2(國際公開第2009/008471號)中,記載有包含(設為樹脂成分100重量份)環氧樹脂25~60重量份、活性酯樹脂28~60重量份、聚乙烯縮醛樹脂1~20重量份,且包含(設為樹脂組成物100wt%)介電體填料65~85wt%的內裝電容器之印刷配線板製造用樹脂組成物。
另一方面,已知有可達成樹脂組成物之硬化物的低介電正切化,且可抑制將硬化物進行鑽孔加工來粗化處理之後的貫通孔內之膠渣的樹脂組成物。例如,於專利文獻3(日本特開2016-156019號公報)中,記載有一種樹脂組成物,其係含有(A)環氧樹脂、(B)活性酯化合物、(C)膠渣抑制成分及(D)無機充填材的樹脂組成物,其在將該樹脂組成物之非揮發性成分設為100質量%的情況時,(B)活性酯化合物之含量為5質量%以上,在將該樹脂組成物之非揮發性成分設為100質量%的情況時,(C)膠渣抑制成分為0.001~10質量%,在將該樹脂組成物之非揮發性成分設為100質量%的情況時,(D)無機充填材為70質量%以上,且(C)膠渣抑制成分為橡膠粒子。 [先前技術文獻] [專利文獻]
[專利文獻1]日本專利第4148501號公報 [專利文獻2]國際公開第2009/008471號 [專利文獻3]日本特開2016-156019號公報 [專利文獻4]日本特開2004-277460號公報
另外,印刷配線板被廣泛使用於攜帶用電子機器等之電子通訊機器。尤其,伴隨著近年來之攜帶用電子通訊機器等之輕薄短小化及高功能化,於印刷配線板之雜訊的減低等成為課題。為了使雜訊減低成為可能,電容器雖重要,但為了實現高性能化,而期望如此之電容器小型化及薄型化以組裝於印刷配線板的內層。伴隨此,而期望即使是在更嚴苛的環境之高溫高濕下亦可保持所期望之電容量的容量安定性。
因而,在攜帶用電子機器等之電子通訊機器的高性能化時,期望抑制印刷配線板內裝電容器於高溫高濕下之電容量降低或介電率降低。為此而要求構成電容器之介電體層的樹脂層之更加的改善。另一方面,亦期望樹脂層與電路之高密接性(亦即電路密接性)。
本發明者們這回得到以下見解:藉由使用包含環氧樹脂、活性酯樹脂及芳香族聚醯胺樹脂與介電體填料的樹脂組成物作為電容器之介電體層,而可一邊確保優異的電路密接性,一邊抑制於高溫高濕下之電容量降低或介電率降低。
因而,本發明之目的為提供一種樹脂組成物,其係在作為電容器之介電體層使用的情況時,可一邊確保優異的電路密接性,一邊抑制高溫高濕下之電容量降低或介電率降低。
依據本發明之一樣態,可提供一種樹脂組成物,其係包含樹脂成分與介電體填料的樹脂組成物, 前述樹脂成分包含環氧樹脂、活性酯樹脂、與芳香族聚醯胺樹脂。
依據本發明之另一樣態,可提供一種附樹脂銅箔,其係包含銅箔、與設置於前述銅箔之至少一面的如請求項1~5中任一項之樹脂組成物。
依據本發明之另一樣態,可提供一種介電體層,其係前述樹脂組成物硬化而成之層。
依據本發明之另一樣態,可提供一種貼銅層合板,其係依序具備有第一銅箔、前述介電體層、與第二銅箔。
依據本發明之另一樣態,可提供一種電容器元件,其係具有前述介電體層。
依據本發明之另一樣態,可提供一種內裝電容器之印刷配線板,其係具有前述介電體層。
以下說明本發明之實施形態。另外,於本說明書中,以「X~Y」之形式所表示的數值範圍係意味著「X以上Y以下」者。
樹脂組成物 本發明之樹脂組成物係包含樹脂成分與介電體填料。並且,此樹脂成分包含環氧樹脂、活性酯樹脂、與芳香族聚醯胺樹脂。如此般,藉由使用包含環氧樹脂、活性酯樹脂及芳香族聚醯胺樹脂與介電體填料的樹脂組成物作為電容器之介電體層,而可一邊確保優異的電路密接性,一邊抑制於高溫高濕下之電容量降低或介電率降低。亦即,包含本發明之樹脂組成物之介電體層原本靜電容量便高,即使於高溫高濕下其之高靜電容量也不易降低。又,包含本發明之樹脂組成物之介電體層即使於高溫高濕下亦不易引起電路構成成分(典型而言為Cu等之金屬)之遷移,因此,可長期保持層間絕緣性。因而,介電體層在高溫高濕下介電率不易降低,因此,於高溫高濕下之電容量不易降低。同時,包含本發明之樹脂組成物之介電體層係電路密接性亦優異,而不易引起於電容器之電路剝離。
本發明之樹脂組成物係以相對於樹脂成分100重量份而言,包含芳香族聚醯胺樹脂9~85重量份及活性酯樹脂5~50重量份者為佳,較佳係包含芳香族聚醯胺樹脂10~80重量份及活性酯樹脂10~40重量份者,更佳係芳香族聚醯胺樹脂15~70重量份及活性酯樹脂12~38重量份,再更佳係芳香族聚醯胺樹脂25~60重量份及活性酯樹脂15~35重量份,特佳係芳香族聚醯胺樹脂30~50重量份及活性酯樹脂20~30重量份。可使作為如此之含量的上述之本發明的效果更有效地發揮。
環氧樹脂係只要於分子內具有2個以上之環氧基,且可使用於電氣及電子材料用途中者,則無特別限定。作為環氧樹脂之例,可列舉:雙酚A型環氧樹脂、雙酚F型環氧樹脂、雙酚S型環氧樹脂、酚酚醛清漆型環氧樹脂、聯苯酚醛清漆型環氧樹脂、甲酚酚醛清漆型環氧樹脂、脂環式環氧樹脂、環氧丙基胺型環氧樹脂、萘型環氧樹脂、蒽型環氧樹脂、二環戊二烯型環氧樹脂、及該等任意之組合。就保持硬化物之耐熱性的點而言,較佳為芳香族環氧樹脂或多官能環氧樹脂,更佳為酚酚醛清漆型環氧樹脂、萘型環氧樹脂、甲酚酚醛清漆型環氧樹脂或聯苯酚醛清漆型環氧樹脂。對保持該等之環氧樹脂硬化物之耐熱性而言為有效的。
活性酯樹脂係發揮作為與環氧樹脂進行反應而硬化的環氧樹脂硬化劑之作用。活性酯樹脂並無特別限定,可使用周知者。例如,亦可使用專利文獻4(日本特開2004-277460號公報)中所揭示之活性酯化合物。又,亦可使用市售之活性酯化合物。作為市售之活性酯化合物之例,可列舉:包含二環戊二烯基構造之活性酯系硬化劑、包含萘構造之活性酯系硬化劑、包含酚酚醛清漆之乙醯基化物之活性酯系硬化劑、及包含酚酚醛清漆之苯甲醯基化物之活性酯系硬化劑,較佳係可列舉包含萘構造之活性酯系硬化劑、及包含二環戊二烯二酚構造之活性酯系硬化劑。作為包含二環戊二烯二酚構造之活性酯系硬化劑之例,可列舉:EXB9451、EXB9460、EXB9460S、HPC-8000-65T(DIC(股)製)。作為包含萘構造之活性酯系硬化劑之例,可列舉:EXB9416-70BK(DIC(股)製)。作為包含酚酚醛清漆之乙醯基化物之活性酯系硬化劑之例,可列舉:DC808(三菱化學(股)製)。作為包含酚酚醛清漆之苯甲醯基化物之活性酯系硬化劑之例,可列舉:YLH1026(三菱化學(股)製)。若使用如上述之活性酯樹脂,則可一面確保環氧樹脂硬化物之耐熱性,一面減低吸水率。
在樹脂組成物為相對於樹脂成分100重量份而言,包含芳香族聚醯胺樹脂25~60重量份及活性酯樹脂15~35重量份的情況,活性酯樹脂含量,較佳係相對於環氧樹脂之1當量的環氧基而言,以羥基換算計,成為0.75~1.25當量之量。若活性酯樹脂相對於環氧樹脂之含量為0.75當量以上,則由於環氧樹脂不易自我聚合,可防止因少的分子之環氧樹脂而終結硬化反應,因此活性酯樹脂之羥基不會殘留,而可得到介電正切大的介電層。又,若活性酯樹脂相對於環氧樹脂之摻合量為1.25當量以下,則於硬化後之介電層中活性酯樹脂不易因未反應而殘留,而可防止介電層之耐熱特性劣化。
芳香族聚醯胺樹脂係有助於樹脂層之耐熱性的提昇。芳香族聚醯胺樹脂係藉由芳香族二胺與二羧酸之縮聚合而被合成者。作為使用於上述縮聚合的芳香族二胺之例,可列舉:3,4’-二胺基二苯基醚、4,4’-二胺基二苯基醚、4,4’-二胺基二苯基甲烷、3,3’-二胺基二苯基碸、m-二甲苯二胺、3,3’-氧二苯胺等、及該等任意之組合。又,作為使用於上述縮聚合的二羧酸之例,可列舉:草酸、丙二酸、琥珀酸、戊二酸、己二酸、庚二酸、辛二酸、壬二酸、癸二酸、鄰苯二甲酸、間苯二甲酸、對苯二甲酸、富馬酸、及該等任意之組合。為了對芳香族聚醯胺樹脂賦予耐熱性,二羧酸較佳為芳香族二羧酸,作為芳香族二羧酸之例,可列舉:鄰苯二甲酸、間苯二甲酸、對苯二甲酸、富馬酸、及該等任意之組合。尤其,較佳係於分子內含有酚性羥基之芳香族聚醯胺樹脂。又,此芳香族聚醯胺樹脂,亦可在不損害耐熱性的範圍內,作為柔軟鏈而於分子內適當具有對芳香族聚醯胺樹脂賦予可撓性之化學鍵,亦可為作為與聚醯胺樹脂之交聯性聚合物合金而一部分以凝聚狀態存在者。作為柔軟鏈而帶來對芳香族聚醯胺樹脂賦予可撓性之化學鍵的化合物之例,可列舉例如:丁二烯、乙烯-丙烯共聚物、苯乙烯-丁二烯共聚物、羧酸丁二烯共聚物、丙烯腈-丁二烯共聚物、聚胺基甲酸酯、聚氯丁二烯、矽氧烷等。藉由使用如上述之芳香族聚醯胺,而可確保環氧樹脂硬化物之柔軟性來提高剝離強度可靠性,並且亦可提昇耐熱性。
較佳係為了促進樹脂之反應,而於樹脂成分中添加硬化促進劑。作為硬化促進劑之較佳例,可列舉:咪唑系及胺系硬化促進劑。硬化促進劑之含量,就樹脂組成物之保存安定性或硬化之效率化的觀點而言,相對於樹脂組成物中之非揮發性成分100質量%而言,較佳為0.01~3質量%,更佳為0.1~2質量%。
咪唑系硬化促進劑在與環氧樹脂之硬化反應後並非作為離子而游離,而是作為環氧樹脂的一部分而進入分子構造中,因此,可使樹脂層之介電特性或絕緣可靠性成為優異者。咪唑系硬化促進劑之含量,只要考量樹脂層之組成等的各條件而適當決定帶來所期望的硬化之量即可,並無特別限定。作為咪唑硬化促進劑之例,可列舉:2-十一烷基咪唑、2-十七烷基咪唑、2-乙基-4-甲基咪唑、2-苯基-4-甲基咪唑、1-氰乙基-2-十一烷基咪唑、1-氰乙基-2-乙基-4-甲基咪唑、2-乙基-4-甲基咪唑、1-氰乙基-2-苯基咪唑、2-苯基-4,5-二羥甲基咪唑、2-苯基-4-甲基-5-羥甲基咪唑、2-甲基咪唑、1,2-二甲基咪唑、2-苯基咪唑、1-苄基-2-甲基咪唑、1-苄基-2-甲基咪唑、1-苄基-2-苯基咪唑、1-氰乙基-2-甲基咪唑、偏苯三酸1-氰基乙基-2-十一烷基咪唑鹽、偏苯三酸1-氰乙基-2-苯基咪唑鹽、2,4-二胺基-6-[2’-甲基咪唑基-(1’)]-乙基-s-三嗪、2,4-二胺基-6-[2’-十一烷基咪唑基-(1’)]-乙基-s-三嗪、2,4-二胺基-6-[2’-乙基-4’-甲基咪唑基-(1’)]-乙基-s-三嗪、2,4-二胺基-6-[2’-甲基咪唑基-(1’)]-乙基-s-三嗪異三聚氰酸加成物、2-苯基咪唑異三聚氰酸加成物、2,3-二氫-1H-吡咯[1,2-a]苯并咪唑、1-十二烷基-2-甲基-3-苄基氯鹽、2-甲基咪唑啉、2-苯基咪唑啉、及該等任意之組合。作為咪唑系硬化促進劑之較佳例,可列舉:2-甲基咪唑、2-乙基-4-甲基咪唑、2-苯基-4-甲基咪唑、2-苯基-4-甲基-5-羥甲基咪唑,其中,就樹脂層之半硬化(B階段)狀態下之化學安定性的點而言,作為更佳例可列舉:作為具有苯基之咪唑系硬化促進劑之2-苯基-4-甲基咪唑、2-苯基-4-甲基-5-羥甲基咪唑。其中,特佳係可列舉:2-苯基-4-甲基-5-羥甲基咪唑。
作為胺系硬化促進劑之例,可列舉:三乙基胺、三丁基胺等之三烷基胺、4-二甲基胺基吡啶、苄基二甲基胺、2,4,6,-參(二甲基胺基甲基)酚、1,8-二氮雜雙環(5,4,0)-十一烯、及該等任意之組合。
介電體填料係對作為介電體層之樹脂組成物帶來所期望之高靜電容量的成分,可使用周知者。較佳之介電體填料係包含由BaTiO3
、SrTiO3
、Pb(Zr,Ti)O3
、PbLaTiO3
、PbLaZrO及SrBi2
Ta2
O9
所成之群中選出的至少1種。就使介電體層形成的電容器之靜電容量成為高者的點而言,特佳之介電體填料為BaTiO3
。於樹脂組成物中之介電體填料之較佳含量,相對於樹脂組成物之固體成分100重量份而言,為60~95重量份,更佳為70~90重量份,再更佳為70~80重量份。
依期望,樹脂組成物亦可進一步包含填料分散劑。藉由進一步包含填料分散劑,而可在將樹脂清漆與介電體填料進行混練時,提昇介電體填料之分散性。填料分散劑可適當使用可使用之周知者,並無特別限定。作為較佳之填料分散劑之例,可列舉:作為離子系分散劑之膦酸型、陽離子型、羧酸型、陰離子型分散劑,此外,作為非離子系分散劑之醚型、酯型、山梨醇酐酯型、二酯型、單甘油酯型、環氧乙烷加成型、乙烯二胺基礎型、酚型分散劑等。其他,可列舉:矽烷偶合劑、鈦酸酯偶合劑、鋁酸酯偶合劑等之偶合劑。
附樹脂銅箔 本發明之樹脂組成物較佳係作為附樹脂銅箔之樹脂使用。附樹脂銅箔中之樹脂組成物,就將2片附樹脂銅箔以使樹脂組成物彼此相對的方式來進行層合而形成介電體層的觀點而言,較佳係半硬化者。藉由預先成為附樹脂銅箔的形態,而無須另外形成樹脂層或介電體層,可有效率地進行電容器元件或內裝電容器之印刷配線板之製造。亦即,依據本發明之較佳樣態,可提供一種附樹脂銅箔,其係包含銅箔、與設置於銅箔之至少一面的樹脂組成物。典型而言,樹脂組成物為樹脂層之形態,將樹脂組成物,以乾燥後之樹脂層的厚度成為特定的方式,來以凹版塗佈方式塗佈於銅箔上,並使其乾燥,而得到附樹脂銅箔。針對此塗佈方式雖為任意,但除了凹版塗佈方式以外,可採用模具塗佈方式、刀塗佈方式等。其他,亦可使用刮刀或刮棒塗佈等來進行塗佈。
樹脂層之厚度,只要在作為介電體層來組裝於電容器的情況時可確保所期望之靜電容量則無特別限定,較佳為0.1~15μm,更佳為0.2~10μm,再更佳為0.5~5.0μm。若為此等之範圍內的厚度,則具有:容易實現高靜電容量、藉由樹脂組成物之塗佈而容易形成樹脂層、在與銅箔之間容易確保充分的密接性的優點。
銅箔,亦可為電解製箔或壓延製箔的狀態之金屬箔(所謂的生箔),亦可為於至少任一面施以表面處理的表面處理箔之形態。表面處理係為了於金屬箔之表面提昇或賦予某些性質(例如:防鏽性、耐濕性、耐藥品性、耐酸性、耐熱性、及與基板之密接性)而進行之各種的表面處理。表面處理,亦可對金屬箔之至少單面進行,亦可對金屬箔之兩面進行。作為對於銅箔進行之表面處理之例,可列舉:防鏽處理、矽烷處理、粗化處理、阻隔形成處理等。
於銅箔之樹脂層側的表面之依據JIS B0601-2001所測定的十點平均粗度Rzjis較佳為2.0μm以下,更佳為1.5μm以下,再更佳為1.0μm以下,特佳為0.5μm以下。若為如此之範圍內,則可將樹脂層之厚度更加減薄。銅箔之樹脂層側的表面之十點平均粗度Rzjis的下限值雖無特別限定,但就與樹脂層之密接性提昇的觀點而言,Rzjis較佳為0.005μm以上,更佳為0.01μm以上,再更佳為0.05μm以上。
銅箔之厚度雖無特別限定,但較佳為0.1~100μm,更佳為0.5~70μm以下,再更佳為2~70μm以下,特佳為10~70μm以下,最佳為10μm~35μm以下。若為該等之範圍內的厚度,則可採用印刷配線板之配線形成之一般的圖型形成方法之MSAP(改良・半加成)法、SAP(半加成)法、減成法等之工法。基本上,於銅箔之厚度成為例如10μm以下的情況等中,本發明之附樹脂銅箔亦可為為了提昇操作性而將樹脂層形成於具備有剝離層及載體的附載體銅箔之銅箔表面者。
介電體層 本發明之樹脂組成物較佳係被硬化而作為介電體層者。亦即,依據本發明之較佳樣態,可提供一種介電體層,其係本發明之樹脂組成物硬化而成之層。樹脂組成物之硬化雖只要根據周知之手法來進行即可,但較佳係藉由熱真空加壓而進行。介電體層之厚度,雖只要可確保所期望之靜電容量則無特別限定,但較佳為0.2~30μm,更佳為0.5~20μm,再更佳為1~8μm,最佳為2~6μm。若為此等之範圍內的厚度,則具有:容易實現高靜電容量、藉由樹脂組成物之塗佈而容易形成樹脂層、在與銅箔之間容易確保充分的密接性的優點。
貼銅層合板 本發明之樹脂組成物或包含其之介電體層較佳係適用於貼銅層合板。亦即,依據本發明之較佳樣態,可提供一種貼銅層合板,其係依序具備有第一銅箔、上述之介電體層、與第二銅箔。藉由成為貼銅層合板的形態,而可製作理想之包含本發明之樹脂組成物作為介電體層之電容器元件或內裝電容器之印刷配線板。貼銅層合板之製作方法雖無特別限定,但例如,可藉由將2片上述之附樹脂銅箔以使樹脂層彼此相對的方式進行層合並以高溫進行真空加壓,而製造貼銅層合板。
電容器元件及內裝電容器之印刷配線板 本發明之樹脂組成物或包含其之介電體層較佳係組裝於電容器元件。亦即,依據本發明之較佳樣態,可提供一種電容器元件,其係具有上述之介電體層。電容器元件之構造並無特別限定,可使用周知之構造。特佳之形態係作為印刷配線板之內層部分而組裝有電容器或其之介電體層的內裝電容器之印刷配線板。亦即,依據本發明之較佳樣態,可提供一種內裝電容器之印刷配線板,其係具有上述之介電體層。尤其,藉由使用本發明之附樹脂銅箔,而可根據周知之手法有效率地製造電容器元件或內裝電容器之印刷配線板。 [實施例]
藉由以下之例來具體地說明本發明。
例1~7 (1)樹脂清漆之調製 首先,作為樹脂清漆用原料成分,準備有以下所示之樹脂成分、咪唑系硬化促進劑及介電體填料。 ‐ 環氧樹脂:聯苯酚醛清漆型環氧樹脂、日本化藥股份有限公司製、NC-3000 ‐ 活性酯樹脂:DIC股份有限公司製、HPC-8000-65T ‐ 芳香族聚醯胺樹脂:日本化藥股份有限公司製、BPAM-155 ‐ 咪唑硬化促進劑:四國化成工業股份有限公司製、2P4MHZ、添加量1.0wt%(相對於樹脂成分100wt%而言) ‐ 介電體填料:BaTiO3
、日本化學工業股份有限公司製、AKBT-M ‐ 填料分散劑:鈦酸酯系偶合劑、Ajinomoto Fine-Techno股份有限公司製、KR-44
以表1所示之摻合比(重量比)來秤量上述樹脂清漆用原料成分。進而,追加環戊酮作為溶劑,並以60℃進行攪拌。在確認樹脂清漆之透明性之後,將樹脂清漆回收。
(2)與填料之混練 分別秤量環戊酮、介電體填料及填料分散劑。將經秤量的溶劑、介電體填料及填料分散劑以分散機進行漿體化。在確認漿體化之後,秤量樹脂清漆,以分散機與含介電體填料之漿體一起進行混練,而得到樹脂組成物4。
(3)樹脂塗佈 如第1圖所示般,將所得之樹脂組成物4,以使厚度成為1.5μm的方式使用刮棒塗佈機來塗佈於銅箔2(三井金屬礦業股份有限公司製、厚度35μm、表面粗度Rz=0.5μm),其後,以加熱至130℃的烘箱進行3分鐘乾燥,而使樹脂成為半硬化狀態。以此方式得到附樹脂銅箔6。
(4)加壓 如第1圖所示般,將2片附樹脂銅箔6以使樹脂組成物4彼此相對的方式來層合,以壓力40kgf/cm2
、200℃,進行90分鐘之真空加壓,而使樹脂組成物4成為硬化狀態。得到包含以此方式硬化後之樹脂組成物4作為介電體層之貼銅層合板8。
(5)電路形成及評估 於所得之貼銅層合板8之單面或兩面施行蝕刻來形成各種評估用之電路10,進行以下之各種評估。
<評估1:剝離強度> 於貼銅層合板之單面施行蝕刻來製作10mm寬之直線狀的電路之後,利用AUTOGRAPH以剝離速度50mm/分將電路剝離,而測定其之剝離強度。此測定係依據IPC-TM-650 2.4.8而進行。依據以下的基準來評估所測定之剝離強度。結果係如表1所示般。 ‐評估A:0.8kgf/cm以上(佳) ‐評估B:0.4kgf/cm以上且未達0.8kgf/cm(可) ‐評估C:未達0.4kgf/cm(不可)
<評估2:熱處理後之靜電容量之降低率> 首先,於貼銅層合板之單面施行蝕刻來製作直徑0.5吋(12.6mm)的圓形之電路之後,以LCR計(日置電氣股份有限公司製、LCR HITESTER 3532-50),測定於頻率1kHz之靜電容量。此測定係依據IPC-TM-650 2.5.2而進行。結果係如表1所示般。
接著,將上述測定結束後的樣品投入230℃之烘箱中110分鐘之後,再度測定靜電容量,而算出熱處理前後之靜電容量之降低率。依據以下的基準來評估所算出之靜電容量降低率。結果係如表1所示般。 ‐評估AA:未達2%(最佳) ‐評估A:2%以上且未達3%(佳) ‐評估B:3%以上且未達6%(可) ‐評估C:6%以上(不可)
<評估3:層間絕緣性保持時間> 於貼銅層合板之兩面施行蝕刻來製作直徑0.5吋(12.6mm)的圓形之電路之後,將配線焊接於上部電極及下部電極,並將配線連接於遷移測定用測試器。將評估電路投入85℃及85%RH之恆溫恆濕槽,施加外加電壓3V之負荷,計測出保持1×105
Ω以上之絕緣電阻的時間。依據以下的基準來評估所計測之層間絕緣性保持時間。結果係如表1所示般。 ‐評估AA:1000小時以上(最佳) ‐評估A:500小時以上且未達1000小時(佳) ‐評估B:200小時以上且未達500小時(可) ‐評估C:未達200小時(不可)
<綜合評估> 藉由將評估1~3之評估結果套用於以下的基準,而決定綜合評估。結果係如表1所示般。 ‐評估AA:於所有的評估中成為A以上之判定者(最佳) ‐評估A:無成為C判定者,且成為B判定者為1個者(佳) ‐評估B:無成為C判定者,且成為B判定者為2個者(可) ‐評估C:C判定至少1個者(不可)
例8(比較) 取代活性酯樹脂,而使用酚樹脂(明和化成股份有限公司製、MEH-7500)20.0重量份,將環氧樹脂之摻合比增加至40.0重量份,除此之外,以與例3相同方式,進行樹脂清漆之調製及各種評估。結果係如表1所示般。
例9(比較) 取代芳香族聚醯胺樹脂,而使用丁醛樹脂(積水化學工業製、KS-5Z),除此之外,以與例2相同方式,進行樹脂清漆之調製及各種評估。結果係如表1所示般。
例10(比較) 不使用芳香族聚醯胺樹脂,而將環氧樹脂之摻合比增加至56.0重量份、將活性酯樹脂之摻合比增加至44.0重量份,除此之外,以與例1相同方式,進行樹脂清漆之調製及各種評估。結果係如表1所示般。
2‧‧‧銅箔
4‧‧‧樹脂組成物
6‧‧‧附樹脂銅箔
8‧‧‧貼銅層合板
10‧‧‧電路
[第1圖]係顯示例1~8之附樹脂銅箔、貼銅層合板及評估用電路之製作步驟的圖。
Claims (11)
- 一種樹脂組成物,其係包含樹脂成分與介電體填料的樹脂組成物,前述樹脂成分包含環氧樹脂、活性酯樹脂、與芳香族聚醯胺樹脂,相對於前述樹脂成分100重量份而言,前述芳香族聚醯胺樹脂為15~70重量份,且前述活性酯樹脂為10~40重量份。
- 如請求項1之樹脂組成物,其係相對於前述樹脂成分100重量份而言,包含前述芳香族聚醯胺樹脂15~70重量份及前述活性酯樹脂12~38重量份。
- 如請求項1之樹脂組成物,其中,前述介電體填料包含由BaTiO3、SrTiO3、Pb(Zr,Ti)O3、PbLaTiO3、PbLaZrO及SrBi2Ta2O9所成之群中選出的至少1種。
- 如請求項1之樹脂組成物,其中,前述介電體填料為BaTiO3。
- 如請求項1之樹脂組成物,其係相對於前述樹脂組成物之固體成分100重量份而言,包含前述介電體填料60~95重量份。
- 一種附樹脂銅箔,其係包含銅箔、與設置於前述銅箔之至少一面的如請求項1~5中任一項之樹脂組成物。
- 一種介電體層,其係如請求項1~5中任一項之樹脂組成物硬化而成之層。
- 如請求項7之介電體層,其中,前述介電體層之厚度為0.2~30μm。
- 一種貼銅層合板,其係依序具備有第一銅箔、如請求項7或8之介電體層、與第二銅箔。
- 一種電容器元件,其係具有如請求項7或8之介電體層。
- 一種內裝電容器之印刷配線板,其係具有如請求項7或8之介電體層。
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