TWI663671B - Wafer conversion device and wafer conversion method - Google Patents

Wafer conversion device and wafer conversion method Download PDF

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Publication number
TWI663671B
TWI663671B TW104113864A TW104113864A TWI663671B TW I663671 B TWI663671 B TW I663671B TW 104113864 A TW104113864 A TW 104113864A TW 104113864 A TW104113864 A TW 104113864A TW I663671 B TWI663671 B TW I663671B
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Taiwan
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carrier
grooves
receiving
slots
wafer
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TW104113864A
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Chinese (zh)
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TW201639059A (en
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林塘棋
李德浩
施英汝
徐文慶
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環球晶圓股份有限公司
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Priority to TW104113864A priority Critical patent/TWI663671B/en
Priority to CN201610220193.0A priority patent/CN106098603B/en
Priority to JP2016092735A priority patent/JP6294908B2/en
Publication of TW201639059A publication Critical patent/TW201639059A/en
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Publication of TWI663671B publication Critical patent/TWI663671B/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations

Abstract

一種晶圓轉換裝置,可供一第一承載架及一第二承載架放置,該第一承載架形成有複數個上下相間隔排列的第一容置槽,各該第一容置槽用以容置一晶圓,該第二承載架形成有複數個上下相間隔排列的第二容置槽,該等第一容置槽的數量與該等第二容置槽的數量不同,該晶圓轉換裝置包含一基座、一第一定位架、一第二定位架、一高度調整機構,及一頂推機構。該第一承載架及該第二承載架分別放置於該第一、第二定位架,該高度調整機構可帶動該第一承載架在一第一高度位置及一第二高度位置間轉換,再藉由該頂推機構將第一承載架中的晶圓推送至該第二承載架中。 A wafer conversion device can be used for placing a first carrier and a second carrier. The first carrier is formed with a plurality of first receiving grooves arranged at an interval from each other. Each of the first receiving grooves is used for A wafer is accommodated, and the second carrier is formed with a plurality of second accommodation grooves arranged at an interval from each other. The number of the first accommodation grooves is different from the number of the second accommodation grooves. The conversion device includes a base, a first positioning frame, a second positioning frame, a height adjusting mechanism, and a pushing mechanism. The first carrier and the second carrier are placed on the first and second positioning frames, respectively, and the height adjustment mechanism can drive the first carrier to switch between a first height position and a second height position, and then The wafer in the first carrier is pushed into the second carrier by the pushing mechanism.

Description

晶圓轉換裝置及其晶圓轉換方法 Wafer conversion device and wafer conversion method

本發明是有關於一種轉換裝置,特別是指一種用以將一承載架內的晶圓轉移傳送至另一個承載架內的晶圓轉換裝置。 The present invention relates to a conversion device, and particularly to a wafer conversion device for transferring and transferring wafers in one carrier to another carrier.

在半導體製程中,晶圓需通過多種機台的加工製程,透過承載裝置承載晶圓在不同的製程機台之間移動,以確保晶圓在移動過程中不會損壞。為了配合不同製程所需的機台及製程環境,晶圓需存放在不同構型的承載裝置,而當晶圓要在不同承載裝置間轉換時,會使用晶圓轉換裝置來協助晶圓在兩不同承載裝置間安全地互換位置。晶圓轉換裝置的使用概念是操作人員先將要轉出晶圓的承載裝置及要接收晶圓的承載裝置依照順序放置在晶圓轉換裝置上的指定位置,確認兩承載裝置放置的位置正確後,再利用晶圓轉換裝置的推移機構,將要轉出晶圓的承載裝置中的晶圓轉移至要接收晶圓的承載裝置內,確認轉移動作完成後,操作人員再依序將兩承載裝置取出。 In the semiconductor manufacturing process, the wafers need to be processed by a variety of machines, and the wafers are moved between different process machines through the carrier device to ensure that the wafers will not be damaged during the movement. In order to match the machine and process environment required for different processes, the wafers need to be stored in different configurations of the carrier device. When the wafer is to be transferred between different carrier devices, the wafer conversion device is used to assist the wafer between the two. Safely interchange positions between different bearing devices. The concept of using the wafer conversion device is that the operator first places the carrier device to be transferred out of the wafer and the carrier device to receive the wafer in a specified position on the wafer conversion device in order. After confirming that the positions of the two carrier devices are correct, Then, the moving mechanism of the wafer conversion device is used to transfer the wafers in the carrier device to be transferred out to the carrier device to receive the wafers. After confirming that the transfer operation is completed, the operator sequentially removes the two carrier devices.

然而,習知的晶圓轉換裝置只能容許兩承載容 量相同的承載裝置彼此間做交換晶圓的動作,如何容許兩承載容量不同的承載裝置彼此間交換晶圓,將可提升整體製程的效率,是一值得研究的主題。 However, the conventional wafer conversion device can only tolerate two load capacities. The same amount of carrier devices exchange wafers with each other. How to allow two carrier devices with different load capacities to exchange wafers with each other will improve the overall process efficiency, which is a topic worthy of research.

因此,本發明之一目的,即在提供一種可在兩晶圓數量不同的承載架間做晶圓交換的晶圓轉換裝置。 Therefore, an object of the present invention is to provide a wafer conversion device capable of performing wafer exchange between two carriers having different numbers of wafers.

本發明之另一目的,即在提供一種在兩晶圓數量不同的承載架間做晶圓交換的晶圓轉換裝置的晶圓轉換方法。 Another object of the present invention is to provide a wafer conversion method for a wafer conversion device that performs wafer exchange between two carriers having different numbers of wafers.

於是,本發明晶圓轉換裝置,可供一第一承載架及一第二承載架放置,該第一承載架形成有複數個上下相間隔排列的第一容置槽,各該第一容置槽用以容置一晶圓,該第二承載架形成有複數個上下相間隔排列的第二容置槽,該等第一容置槽的數量與該等第二容置槽的數量不同,該晶圓轉換裝置包含:一第一定位架,設置於該基座,該第一定位架包括一前端,及一相反於該前端的後端;一第二定位架,設置於該基座且位於該第一定位架的該後端,該第二定位架用以承載並定位該第二承載架;一高度調整機構,設置於該第一定位架,該高度調整機構用以承載該第一承載架並可將該第一承載架由一第一高度位置調整至一高度高於該第一高度位置的第二高度位置,當該第一承載架在該第一高度位置時,該等第一容置槽與該等第二容置槽其中之一的全部容置槽與其中另一的一部分容置槽位置相互對齊,當該第一承載架在該第二高度位置時, 該等第一容置槽與該等第二容置槽其中之一的全部容置槽與其中另一的另一部分容置槽位置相互對齊;及一頂推機構,可滑動地設置於該基座且位於該第一定位架的該前端,該頂推機構可沿一由前朝後的頂推方向移動,用以將與該等第二容置槽位置相互對齊的該等第一容置槽中的該等晶圓由該等第一容置槽頂推至該等第二容置槽內。 Therefore, the wafer conversion device of the present invention can be used for placing a first carrier and a second carrier. The first carrier is formed with a plurality of first receiving grooves spaced from each other. The groove is used for accommodating a wafer, and the second carrier is formed with a plurality of second accommodating grooves which are spaced up and down. The number of the first accommodating grooves is different from the number of the second accommodating grooves. The wafer conversion device includes: a first positioning frame disposed on the base, the first positioning frame including a front end and a rear end opposite to the front end; a second positioning frame disposed on the base and Located at the rear end of the first positioning frame, the second positioning frame is used to carry and position the second supporting frame; a height adjusting mechanism is provided on the first positioning frame, and the height adjusting mechanism is used to carry the first The carrier can adjust the first carrier from a first height position to a second height position higher than the first height position. When the first carrier is at the first height position, the first All of one accommodation slot and one of the second accommodation slots And wherein the other part receiving groove position aligned with each other when the first carrier in the second height position, The positions of all the accommodation grooves of one of the first accommodation grooves and the second accommodation grooves and the other of the other accommodation grooves are aligned with each other; and a pushing mechanism is slidably disposed on the base. And is located at the front end of the first positioning frame, the pushing mechanism can be moved in a pushing direction from front to back, for aligning the first containers with the positions of the second containers The wafers in the slot are pushed from the first receiving slot into the second receiving slot.

在一些實施態樣中,該高度調整機構包括一第一承載板,及一第二承載板,該第一承載板的高度小於該第二承載板的高度,該第一承載板及該第二承載板其中之一可選擇地設置於該第一定位架,該第一承載板可承載該第一承載架使其位在該第一高度位置,該第二承載板可承載該第一承載架使其位在該第二高度位置。 In some embodiments, the height adjustment mechanism includes a first bearing plate and a second bearing plate. The height of the first bearing plate is less than the height of the second bearing plate, the first bearing plate and the second bearing plate. One of the supporting plates is optionally disposed on the first positioning frame. The first supporting plate can support the first supporting frame to be positioned at the first height position, and the second supporting plate can support the first supporting frame. Position it at this second height position.

在一些實施態樣中,該第一定位架包括一定位板、二凸設於該定位板表面且左右相間隔的限位板,及一由該等限位板及該定位板界定出的定位槽,該第一承載板及該第二承載板其中之一可選擇地卡置於該定位槽內。 In some embodiments, the first positioning frame includes a positioning plate, two limiting plates protruding from the surface of the positioning plate and spaced left and right, and a positioning defined by the limiting plates and the positioning plate. One of the first bearing plate and the second bearing plate can be selectively clamped in the positioning groove.

在一些實施態樣中,該第二定位架包括一設置於該基座的承載座,及一安裝治具,該承載座的表面凹陷形成一放置槽,該安裝治具卡接於該放置槽內,該安裝治具包含兩個左右相間隔的側壁,各該側壁形成有複數個上下相間隔排列的導引槽,該第二承載架接合於該安裝治具後側,且該等第二容置槽分別與該等導引槽位置對齊,各該導引槽用以導引對應的該晶圓移動至對應的該第二容置槽內。 In some embodiments, the second positioning frame includes a bearing seat disposed on the base, and a mounting jig. A surface of the bearing seat is recessed to form a placement groove, and the installation jig is snapped to the placement groove. Inside, the mounting jig includes two side walls spaced from left to right, each of the side walls is formed with a plurality of guide grooves spaced up and down, the second carrier is joined to the rear side of the mounting jig, and the second The accommodating grooves are respectively aligned with the positions of the guide grooves, and each of the guide grooves is used to guide the corresponding wafer to move into the corresponding second accommodating groove.

在一些實施態樣中,該承載座包括一形成有該放置槽的基板,及一凸設於該基板後端用以阻擋該第二承載架的阻擋板。 In some embodiments, the supporting base includes a substrate with the placement groove formed thereon, and a blocking plate protruding from the rear end of the substrate to block the second supporting frame.

在一些實施態樣中,該基座包括一立壁,該第一定位架及該第二定位架設置於該立壁,該高度調整機構包括一可滑動地連接於該第一定位架並可承載該第一承載架的滑動架,及一設置於該第一定位架並與該滑動架相連接的旋轉組件,該旋轉組件可透過該滑動架沿一上下方向帶動該第一承載架在該第一高度位置與該第二高度位置之間移動。 In some embodiments, the base includes a vertical wall, the first positioning frame and the second positioning frame are disposed on the vertical wall, and the height adjustment mechanism includes a slidably connected to the first positioning frame and can carry the A sliding frame of a first supporting frame, and a rotating component disposed on the first positioning frame and connected to the sliding frame, the rotating component can drive the first supporting frame in the first direction through the sliding frame in the up and down direction. Move between the height position and the second height position.

在一些實施態樣中,該頂推機構包括一頂針導引板,及複數個頂針,每一頂針用以頂推對應的該晶圓,各該頂針末端面凹陷形成一溝槽,該溝槽延伸於該頂針左右兩端之間,且該溝槽的縱向截面呈開口朝後的V字形,該頂針導引板設置於該基座,且具有多個數量與該等頂針相同的穿孔,供該等頂針穿設定位。 In some embodiments, the ejection mechanism includes a ejector guide plate and a plurality of ejectors, each ejector is used to eject a corresponding wafer, and the end surface of each ejector is recessed to form a groove, and the groove The thimble extends between the left and right ends of the thimble, and the longitudinal section of the groove is a V-shaped opening. The thimble guide plate is provided on the base and has a plurality of perforations the same as the thimbles. The thimbles penetrate the setting positions.

在一些實施態樣中,該滑動架包括一可滑動地連接於該第一定位架的立板,該立板形成有一卡槽,該立板具有一界定出該卡槽的圍繞面,該圍繞面具有一下側面部及一上側面部,該旋轉組件包含一樞接於該第一定位架的轉軸、一設置於該轉軸一端用以供旋轉的旋鈕、一固定地連接於該轉軸另一端的偏心軸,及一套設於該偏心軸上的軸承,該轉軸及該偏心軸的中心軸線彼此平行且相間隔,該軸承穿設於該卡槽內且分別卡接於該下側面部及該上 側面部。 In some embodiments, the sliding frame includes a vertical plate slidably connected to the first positioning frame, the vertical plate is formed with a card slot, and the vertical plate has a surrounding surface defining the card slot, and the surrounding The surface has a lower side portion and an upper side portion. The rotating component includes a rotating shaft pivotally connected to the first positioning frame, a knob provided at one end of the rotating shaft for rotation, and a fixed connection to the other end of the rotating shaft. An eccentric shaft and a set of bearings provided on the eccentric shaft, the rotating shaft and the central axis of the eccentric shaft are parallel and spaced from each other, the bearing is penetrated in the card slot and is respectively engaged with the lower side portion and the on Side.

在一些實施態樣中,該偏心軸包括一軸件,及一用以將該軸件固定於該轉軸的插銷。 In some embodiments, the eccentric shaft includes a shaft member and a latch for fixing the shaft member to the rotating shaft.

在一些實施態樣中,該滑動架更包括一設置於該立板並與其垂直的承載板,該高度調整機構更包括一設置於該承載板上的安裝治具,該安裝治具包含兩個左右相間隔的側壁,各該側壁形成有複數個上下相間隔排列的導引槽,該第一承載架接合於該安裝治具且位於該兩側壁前側,該等第一容置槽分別與該等導引槽位置對齊,各該導引槽用以導引對應的該晶圓移動至對應的該第二容置槽內。 In some embodiments, the sliding frame further includes a bearing plate disposed on the vertical plate and perpendicular to the bearing plate. The height adjustment mechanism further includes a mounting jig provided on the bearing plate. The mounting jig includes two The left and right side walls are spaced apart, and each of the side walls is formed with a plurality of guide grooves spaced up and down. The first carrier is connected to the mounting fixture and is located on the front side of the two side walls. When the guide grooves are aligned, each guide groove is used to guide the corresponding wafer to move into the corresponding second accommodating groove.

在一些實施態樣中,該第一定位架包括一固定於該立壁的第一導軌、一固定於該立壁且間隔位於該第一導軌後側的第二導軌,該第一導軌及該第二導軌分別呈長形且其長向平行於該上下方向,該立板設置於該第一導軌與該第二導軌之間,且該立板分別與該第一導軌及該第二導軌抵接。 In some embodiments, the first positioning frame includes a first guide rail fixed to the vertical wall, a second guide rail fixed to the vertical wall and spaced behind the first guide rail, the first guide rail and the second guide rail. The guide rails are respectively elongated and parallel to the up-and-down direction. The vertical plate is disposed between the first rail and the second rail, and the vertical plate abuts the first rail and the second rail, respectively.

本發明晶圓轉換裝置的晶圓轉換方法適於將一第一承載架所承載的晶圓轉移傳送至一第二承載架內,該第一承載架形成有複數個上下相間隔排列的第一容置槽,各該第一容置槽用以容置一晶圓,該第二承載架形成有複數個上下相間隔排列的第二容置槽,該等第一容置槽的數量小於該等第二容置槽的數量,該方法包含以下步驟:安裝步驟,將該第一承載架及該第二承載架分別安裝於一高 度調整機構及一定位架,使該第一承載架位於一第一高度位置,該等第一容置槽與該等第二容置槽中的一部分容置槽位置相互對齊;第一次頂推步驟,透過一頂推機構將位置相互對齊的該等第一容置槽與該等第二容置槽中的該等晶圓由該等第一容置槽頂推至該等第二容置槽內;更換步驟,將空的該第一承載架移離該高度調整機構;高度調整步驟,將另一個滿載晶圓的第一承載架安裝於該高度調整機構,透過該高度調整機構將該另一個第一承載架調整至一高度高於該第一高度位置的第二高度位置,使該另一個第一承載架的該等第一容置槽與該等第二容置槽中的另一部分容置槽位置相互對齊;及第二次頂推步驟,透過該頂推機構頂推與該等第二容置槽中的另一部分容置槽相互對齊的該等第一容置槽中的該等晶圓,以將該等晶圓由該等第一容置槽頂推至該等第二容置槽內。 The wafer conversion method of the wafer conversion device of the present invention is suitable for transferring and transferring a wafer carried by a first carrier to a second carrier. The first carrier is formed with a plurality of first and second spaced-apart first arrays. Receiving slots, each of the first receiving slots is used to receive a wafer, the second carrier is formed with a plurality of second receiving slots arranged at an interval from each other, and the number of the first receiving slots is less than the number of the first receiving slots. After waiting for the number of the second accommodating slots, the method includes the following steps: an installation step of installing the first carrier and the second carrier separately on a high Degree adjusting mechanism and a positioning frame, so that the first supporting frame is located at a first height position, the positions of the first receiving grooves and some of the second receiving grooves are aligned with each other; A pushing step, pushing the wafers in the first accommodating slot and the second accommodating slot aligned with each other through a pushing mechanism from the first accommodating slot to the second accommodating slot In the groove; in the replacement step, the empty first carrier is removed from the height adjustment mechanism; in the height adjustment step, another first carrier with full wafers is installed in the height adjustment mechanism, and the height adjustment mechanism The other first carrier is adjusted to a second height position higher than the first height position, so that the first receiving grooves and the second receiving grooves of the other first carrier are The positions of the other receiving grooves are aligned with each other; and the second pushing step is to push the first receiving grooves aligned with the other receiving grooves of the second receiving grooves through the pushing mechanism. The wafers to push the wafers from the first receiving slots to Etc. The second receiving groove.

在一些實施態樣中,該等第一容置槽數量為該等第二容置槽數量的二分之一,該等第二容置槽數量為偶數個,在該安裝步驟中,該等第一容置槽是分別與位在偶數位置的該等第二容置槽相互對齊,在該高度調整步驟中,該等第一容置槽是分別與位在奇數位置的該等第二容置槽相互對齊。 In some implementation forms, the number of the first receiving slots is one-half of the number of the second receiving slots, and the number of the second receiving slots is an even number. In the installation step, the The first receiving grooves are aligned with the second receiving grooves at even positions, respectively. In the height adjustment step, the first receiving grooves are respectively aligned with the second receivers at odd positions. The slots are aligned with each other.

本發明晶圓轉換裝置的晶圓轉換方法,適於將一第一承載架所承載的晶圓轉移傳送至一第二承載架內,該第一承載架形成有複數個上下相間隔排列的第一容置槽,各該第一容置槽用以容置一晶圓,該第二承載架形成有 複數個上下相間隔排列的第二容置槽,該等第一容置槽的數量大於該等第二容置槽的數量,該方法包含以下步驟:安裝步驟,將該第一承載架及該第二承載架分別安裝於一高度調整機構及一定位架,使該第一承載架位於一第一高度位置,該等第一容置槽中的一部分容置槽與該等第二容置槽位置相互對齊;第一次頂推步驟,透過一頂推機構將與該等第二容置槽位置相互對齊的該等第一容置槽中的該等晶圓由該等第一容置槽頂推至該等第二容置槽內;更換步驟,將滿載晶圓的該第二承載架移離該定位架,並將另一個空的第二承載架安裝於該定位架;高度調整步驟,透過該高度調整機構將該第一承載架調整至一高度高於該第一高度位置的第二高度位置,使該等第一容置槽中的另一部分容置槽與該另一個空的第二承載架的該等第二容置槽位置相互對齊;及第二次頂推步驟,透過該頂推機構頂推與該等第二容置槽位置相互對齊的該等第一容置槽的另一部分容置槽中的該等晶圓,以將該等晶圓由該等第一容置槽頂推至該等第二容置槽內。 The wafer conversion method of the wafer conversion device of the present invention is suitable for transferring and transferring a wafer carried by a first carrier to a second carrier. The first carrier is formed with a plurality of first and second spaced-apart arrays. An accommodating slot, each of the first accommodating slots is used for accommodating a wafer, and the second carrier is formed with A plurality of second accommodating slots spaced apart from each other, the number of the first accommodating slots is greater than the number of the second accommodating slots, the method includes the following steps: an installation step, the first carrier and the The second carrier is respectively mounted on a height adjustment mechanism and a positioning frame, so that the first carrier is located at a first height position, and a part of the receiving grooves in the first receiving grooves and the second receiving grooves. The positions are aligned with each other; in the first pushing step, the wafers in the first receiving slots that are aligned with the positions of the second receiving slots are aligned with each other by a first pushing mechanism. Push into the second accommodating slots; replace step, move the second carrier full of wafers away from the positioning frame, and install another empty second carrier on the positioning frame; height adjustment step By adjusting the first carrier to a second height position higher than the first height position through the height adjustment mechanism, so that another part of the first accommodation grooves and the other empty space The positions of the second receiving slots of the second carrier are aligned with each other; and The second pushing step pushes the wafers in the other receiving grooves of the first receiving grooves which are aligned with the positions of the second receiving grooves through the pushing mechanism, so as to push the crystals. The circle is pushed from the first receiving grooves into the second receiving grooves.

在一些實施態樣中,該等第一容置槽數量為該等第二容置槽數量的二倍,該等第一容置槽數量為偶數個,在該安裝步驟中,該等第二容置槽是分別與位在偶數位置的該等第一容置槽相互對齊,在該高度調整步驟中,該等第二容置槽是分別與位在奇數位置的該等第一容置槽相互對齊。 In some implementation forms, the number of the first receiving slots is twice the number of the second receiving slots, and the number of the first receiving slots is an even number. In the installation step, the second receiving slots The accommodating grooves are aligned with the first accommodating grooves at even positions, respectively. In the height adjustment step, the second accommodating grooves are respectively with the first accommodating grooves at odd positions. Align with each other.

本發明之功效在於:透過該高度調整機構帶動 該第一承載架分別在第一高度位置及第二高度位置時藉由該頂推機構將該等晶圓自該第一承載架轉換至該第二承載架,且第一承載架與第二承載架的可容置的晶圓數量不相同,如此便可達成在不同承載裝置間轉換晶圓的目的。 The effect of the invention lies in that: driven by the height adjustment mechanism When the first carrier is in the first height position and the second height position, the wafers are transferred from the first carrier to the second carrier by the pushing mechanism, and the first carrier and the second carrier The number of wafers that can be accommodated in the carrier frame is different, so that the purpose of changing wafers between different carrier devices can be achieved.

100‧‧‧晶圓轉換裝置 100‧‧‧ Wafer Conversion Device

200‧‧‧晶圓轉換裝置 200‧‧‧ Wafer Conversion Device

1‧‧‧基座 1‧‧‧ base

2‧‧‧第一定位架 2‧‧‧The first positioning frame

21‧‧‧定位板 21‧‧‧ Positioning plate

22‧‧‧限位板 22‧‧‧ limit plate

23‧‧‧定位槽 23‧‧‧ positioning groove

24‧‧‧前端 24‧‧‧Front

25‧‧‧後端 25‧‧‧ backend

3‧‧‧第二定位架 3‧‧‧Second Positioning Frame

31‧‧‧承載座 31‧‧‧bearing seat

311‧‧‧基板 311‧‧‧ substrate

312‧‧‧阻擋板 312‧‧‧ barrier

313‧‧‧放置槽 313‧‧‧Slot

32‧‧‧安裝治具 32‧‧‧Mounting fixture

321‧‧‧側壁 321‧‧‧ sidewall

322‧‧‧導引槽 322‧‧‧Guide groove

4‧‧‧高度調整機構 4‧‧‧ height adjustment mechanism

41‧‧‧第一承載板 41‧‧‧The first bearing plate

42‧‧‧第二承載板 42‧‧‧Second loading plate

5‧‧‧頂推機構 5‧‧‧ Pushing mechanism

51‧‧‧連接桿 51‧‧‧ connecting rod

52‧‧‧頂推板 52‧‧‧ Pusher

6‧‧‧第一承載架 6‧‧‧first carrier

61‧‧‧第一容置槽 61‧‧‧first receiving slot

62‧‧‧第一開口 62‧‧‧First opening

63‧‧‧第二開口 63‧‧‧Second opening

7‧‧‧第二承載架 7‧‧‧Second carrier

71‧‧‧第二容置槽 71‧‧‧Second accommodation slot

8‧‧‧晶圓 8‧‧‧ wafer

1'‧‧‧基座 1'‧‧‧ base

11'‧‧‧立壁 11'‧‧‧ Libi

2'‧‧‧第一定位架 2'‧‧‧first positioning frame

21'‧‧‧第一導軌 21'‧‧‧First rail

22'‧‧‧第二導軌 22'‧‧‧Second Rail

23'‧‧‧前端 23'‧‧‧Front

24'‧‧‧後端 24'‧‧‧Back

25'‧‧‧鎖固板 25'‧‧‧Locking plate

251'‧‧‧樞接孔 251'‧‧‧ pivot hole

3'‧‧‧第二定位架 3'‧‧‧Second Positioning Frame

4'‧‧‧高度調整機構 4'‧‧‧ height adjustment mechanism

41'‧‧‧滑動架 41'‧‧‧Slider

42'‧‧‧旋轉組件 42'‧‧‧Rotary components

43'‧‧‧安裝治具 43'‧‧‧Mounting fixture

431'‧‧‧側壁 431'‧‧‧ sidewall

432'‧‧‧導引槽 432'‧‧‧Guide

44'‧‧‧立板 44'‧‧‧ stand

441'‧‧‧卡槽 441'‧‧‧Card Slot

442'‧‧‧圍繞面 442'‧‧‧ around

442a'‧‧‧上側面部 442a'‧‧‧ upper side

442b'‧‧‧下側面部 442b'‧‧‧ lower side

45'‧‧‧承載板 45'‧‧‧carrying plate

46'‧‧‧轉軸 46'‧‧‧Shaft

47'‧‧‧旋鈕 47'‧‧‧ knob

471'‧‧‧指示槽 471'‧‧‧indication slot

48'‧‧‧偏心軸 48'‧‧‧eccentric shaft

481'‧‧‧軸件 481'‧‧‧Shaft

482'‧‧‧插銷 482'‧‧‧ Bolt

49'‧‧‧軸承 49'‧‧‧bearing

5'‧‧‧頂推機構 5'‧‧‧ Pushing mechanism

50'‧‧‧連接桿 50'‧‧‧ connecting rod

51'‧‧‧頂針 51'‧‧‧ thimble

511'‧‧‧溝槽 511'‧‧‧ Trench

52'‧‧‧頂針導引板 52'‧‧‧ thimble guide plate

521'‧‧‧穿孔 521'‧‧‧Perforated

6'‧‧‧第一承載架 6'‧‧‧first carrier

61'‧‧‧第一容置槽 61'‧‧‧First receiving slot

62'‧‧‧第一開口 62'‧‧‧First opening

63'‧‧‧第二開口 63'‧‧‧Second opening

7'‧‧‧第二承載架 7'‧‧‧Second carrier

71'‧‧‧第二容置槽 71'‧‧‧Second accommodation slot

P‧‧‧頂推方向 P‧‧‧ Pushing direction

D‧‧‧復位方向 D‧‧‧ Reset direction

D1‧‧‧上下方向 D1‧‧‧ Up and down direction

H1、H2‧‧‧高度 H1, H2‧‧‧ height

L1、L2‧‧‧中心軸線 L1, L2‧‧‧ center axis

S1~S5‧‧‧步驟 Steps S1 ~ S5‧‧‧‧

S1'~S5'‧‧‧步驟 S1 '~ S5'‧‧‧ steps

本發明之其他的特徵及功效,將於參照圖式的實施例詳細說明中清楚地呈現,其中:圖1是一立體圖,說明本發明晶圓轉換裝置的一第一實施例;圖2是一局部剖面前視圖,說明該第一實施例的一第一承載架在一第一高度位置;圖3是一局部剖面前視圖,說明該第一實施例的該第一承載架在一第二高度位置;圖4是一俯視圖,說明該第一實施例的一頂推機構尚未頂推多個晶圓,該等晶圓位於該第一承載架的狀態;圖5是一俯視圖,說明該第一實施例的一頂推機構將該等晶圓自該第一承載架頂推至一第二承載架的狀態;圖6是一流程示意圖,說明本發明晶圓轉換裝置的晶圓轉換方法,適用於該第一實施例;圖7為圖2的一局部放大圖,說明該等晶圓位於該第一承載架的多個第一容置槽內;圖8是一局部放大剖面前視圖,說明該等晶圓被該頂推機構頂推至該第二承載架的多個第二容置槽內;圖9為圖3的一局部放大圖,說明該等晶圓位於該等第 一容置槽內;圖10是一局部放大剖面前視圖,說明該等晶圓被該頂推機構頂推至該等第二容置槽內;圖11是一立體圖,說明本發明晶圓轉換裝置的一第二實施例;圖12是一立體圖,為圖11的另一視角;圖13是一部分立體分解圖,說明該第二實施例的一旋轉組件及一立板;圖14是一部分立體分解圖,為圖13的另一視角;圖15是一部分剖面側視圖,說明該第二實施例的該旋轉組件及該立板;圖16是一部分立體圖,說明一頂針及該頂針的溝槽;圖17為圖16的一側視圖;圖18是一部分剖面前視圖,說明該第一承載架在第一高度位置,該等晶圓位於該等第一容置槽中;圖19是一部分剖面側視圖,說明該旋轉組件的一偏心軸在第一高度位置;圖20是一部分剖面前視圖,說明該第一承載架在第二高度位置,該等晶圓位於該等第一容置槽中;圖21是一部分剖面側視圖,說明該旋轉組件的該偏心軸在第二高度位置;圖22是一流程示意圖,說明本發明晶圓轉換裝置的晶圓轉換方法,適用於該第二實施例;圖23是一部分剖面側視圖,說明該等頂針在第一高度 位置頂推該等晶圓至該等第二容置槽內;及圖24是一部分剖面側視圖,說明該等頂針在第二高度位置頂推該等晶圓至該等第二容置槽內。 Other features and effects of the present invention will be clearly presented in the detailed description of the embodiment with reference to the drawings, in which: FIG. 1 is a perspective view illustrating a first embodiment of the wafer conversion device of the present invention; FIG. 2 is a A partial cross-sectional front view illustrating a first carrier of the first embodiment at a first height position; FIG. 3 is a partial cross-sectional front view illustrating the first carrier of the first embodiment at a second height Position; FIG. 4 is a top view illustrating a state in which a pushing mechanism of the first embodiment has not pushed a plurality of wafers, and the wafers are located on the first carrier; FIG. 5 is a top view illustrating the first A pushing mechanism of the embodiment pushes the wafers from the first carrier to a second carrier; FIG. 6 is a schematic flowchart illustrating a wafer conversion method of the wafer conversion device of the present invention, which is applicable In the first embodiment; FIG. 7 is a partially enlarged view of FIG. 2, illustrating that the wafers are located in a plurality of first receiving grooves of the first carrier; FIG. 8 is a partially enlarged sectional front view, illustrating The wafers are pushed to the second carrier by the pushing mechanism A second plurality of frame receiving groove; FIG. 9 is a partial enlarged view of FIG. 3, the description of the wafers positioned such An accommodation slot; FIG. 10 is a partially enlarged sectional front view showing that the wafers are pushed into the second accommodation slots by the pushing mechanism; FIG. 11 is a perspective view illustrating the wafer conversion of the present invention A second embodiment of the device; FIG. 12 is a perspective view, which is another perspective of FIG. 11; FIG. 13 is a partial exploded view, illustrating a rotating assembly and a vertical plate of the second embodiment; FIG. 14 is a partial perspective An exploded view is another perspective of FIG. 13; FIG. 15 is a partial cross-sectional side view illustrating the rotary assembly and the vertical plate of the second embodiment; FIG. 16 is a partial perspective view illustrating a thimble and a groove of the thimble; FIG. 17 is a side view of FIG. 16; FIG. 18 is a partial cross-sectional front view illustrating the first carrier at a first height position, and the wafers are located in the first receiving grooves; FIG. 19 is a partial cross-sectional side A view showing that an eccentric shaft of the rotary assembly is at a first height position; FIG. 20 is a partial cross-sectional front view showing that the first carrier is at a second height position, and the wafers are located in the first receiving grooves; FIG. 21 is a partial cross-sectional side view illustrating the The eccentric shaft of the rotating assembly is at the second height position; FIG. 22 is a schematic flowchart illustrating a wafer conversion method of the wafer conversion device of the present invention, which is applicable to the second embodiment; FIG. 23 is a partial cross-sectional side view illustrating the Wait for the thimble at the first height Position to push the wafers into the second receiving grooves; and FIG. 24 is a partial cross-sectional side view illustrating that the ejectors push the wafers into the second receiving grooves at the second height position .

在本發明被詳細描述之前,應當注意在以下的說明內容中,類似的元件是以相同的編號來表示。 Before the present invention is described in detail, it should be noted that in the following description, similar elements are represented by the same numbers.

參閱圖1及圖2,本發明晶圓轉換裝置100的第一實施例可供一第一承載架6及一第二承載架7放置,該第一承載架6形成有複數個上下相間隔排列的第一容置槽61、一第一開口62,及一相反於第一開口62的第二開口63,各第一容置槽61用以容置一晶圓8。第二承載架7形成有複數個上下相間隔排列的第二容置槽71,該等第一容置槽61的數量與該等第二容置槽71的數量不同。該第一實施例的晶圓轉換裝置100包含一基座1、一第一定位架2、一第二定位架3、一高度調整機構4,及一頂推機構5。在本實施例中,第一承載架6是採用鐵氟龍晶圓盒,第二承載架7是採用石英晶舟,第二容置槽71數量為偶數個,而第一容置槽61的數量小於第二容置槽71的數量,第一容置槽61數量為第二容置槽71數量的二分之一,其中,第一容置槽61數量是以25個為例,第二容置槽71數量是以50個為例,但不以此為限。 Referring to FIG. 1 and FIG. 2, the first embodiment of the wafer conversion device 100 of the present invention can be used to place a first carrier 6 and a second carrier 7. The first carrier 6 is formed with a plurality of upper and lower spaced arrays. The first accommodating groove 61, a first opening 62, and a second opening 63 opposite to the first opening 62 are used for accommodating a wafer 8. The second carrier 7 is formed with a plurality of second accommodating grooves 71 which are spaced from each other. The number of the first accommodating grooves 61 is different from the number of the second accommodating grooves 71. The wafer conversion device 100 of the first embodiment includes a base 1, a first positioning frame 2, a second positioning frame 3, a height adjusting mechanism 4, and a pushing mechanism 5. In this embodiment, the first carrier 6 is a Teflon wafer box, the second carrier 7 is a quartz crystal boat, the number of the second receiving slots 71 is an even number, and the number of the first receiving slots 61 is even. The number is smaller than the number of the second accommodating slots 71, and the number of the first accommodating slots 61 is one half of the number of the second accommodating slots 71. Among them, the number of the first accommodating slots 61 is 25. The number of the accommodating slots 71 is 50 as an example, but is not limited thereto.

第一定位架2設置於基座1,第一定位架2包括一定位板21、二凸設於定位板21表面且左右相間隔的限位板22、一由定位板21與該等限位板22界定出的定位槽23 、一前端24,及一相反於前端24的後端25。第一承載座31的第一開口62是朝向前端24,第二開口63是朝向後端25。 The first positioning frame 2 is disposed on the base 1. The first positioning frame 2 includes a positioning plate 21, two limiting plates 22 protruding from the surface of the positioning plate 21 and spaced left and right, and a positioning plate 21 and the limiting positions. Positioning groove 23 defined by the plate 22 , A front end 24, and a rear end 25 opposite to the front end 24. The first opening 62 of the first bearing base 31 faces the front end 24, and the second opening 63 faces the rear end 25.

第二定位架3設置於基座1且位於第一定位架2的後端25,第二定位架3用以承載並定位第二承載架7。第二定位架3包括一設置於基座1的承載座31及一安裝治具32,承載座31的表面凹陷形成一放置槽313,安裝治具32卡接於放置槽313內,安裝治具32包含兩個左右相間隔的側壁321,各側壁321形成有複數個上下相間隔排列的導引槽322。第二承載架7接合於安裝治具32後側,且該等第二容置槽71分別與該等導引槽322位置對齊。在本實施例中,導引槽322的數量與第二容置槽71的數量相同,皆為50個,但不以此為限,只要數量相同即可。 The second positioning frame 3 is disposed on the base 1 and located at the rear end 25 of the first positioning frame 2. The second positioning frame 3 is used to carry and position the second supporting frame 7. The second positioning frame 3 includes a supporting base 31 and a mounting fixture 32 provided on the base 1. The surface of the supporting base 31 is recessed to form a placement groove 313. The mounting fixture 32 is snapped into the placement groove 313 to install the fixture. 32 includes two side walls 321 spaced from left to right, and each side wall 321 is formed with a plurality of guide grooves 322 spaced from each other. The second carrier 7 is coupled to the rear side of the mounting jig 32, and the second receiving grooves 71 are aligned with the guiding grooves 322 respectively. In this embodiment, the number of the guide grooves 322 is the same as the number of the second accommodating grooves 71, and they are all 50, but it is not limited thereto, as long as the number is the same.

參閱圖1至圖3,高度調整機構4設置於第一定位架2,用以承載第一承載架6並可將第一承載架6由一第一高度位置(如圖2所示)調整至一高度高於第一高度位置的第二高度位置(如圖3所示)。高度調整機構4包括一第一承載板41及一第二承載板42,第一承載板41的高度H1小於該第二承載板42的高度H2。第一承載板41及第二承載板42其中之一可選擇地卡置於第一定位架2的定位槽23內,高度調整機構4即是藉由第一承載板41及第二承載板42的置換來調整第一承載架6在第一高度位置及第二高度位置間轉換。第一承載板41可承載第一承載架6使其位在第一高度位置,該第二承載板42可承載第一承載架6使其 位在該第二高度位置。當第一承載架6在第一高度位置時,該等第一容置槽61與該等第二容置槽71其中之一的全部容置槽與其中另一的一部分容置槽位置相互對齊。當第一承載架6在第二高度位置時,該等第一容置槽61與該等第二容置槽71其中之一的全部容置槽與其中另一的另一部分容置槽位置相互對齊。具體而言,在本實施例中,如圖2所示,當第一承載架6在第一高度位置時,該等第一容置槽61的全部容置槽與該等第二容置槽71的偶數位置容置槽(由上至下數來)相互對齊;如圖3所示,當第一承載架6在第二高度位置時,該等第一容置槽61的全部容置槽與該等第二容置槽71的奇數位置容置槽(由上至下數來)相互對齊,。 Referring to FIGS. 1 to 3, the height adjustment mechanism 4 is disposed on the first positioning frame 2 to carry the first supporting frame 6 and can adjust the first supporting frame 6 from a first height position (as shown in FIG. 2) to A second height position higher than the first height position (as shown in FIG. 3). The height adjustment mechanism 4 includes a first bearing plate 41 and a second bearing plate 42. The height H1 of the first bearing plate 41 is smaller than the height H2 of the second bearing plate 42. One of the first load bearing plate 41 and the second load bearing plate 42 can be selectively clamped in the positioning groove 23 of the first positioning frame 2. The height adjusting mechanism 4 can pass the first load bearing plate 41 and the second load bearing plate 42. To adjust the first carrier 6 to switch between the first height position and the second height position. The first carrier plate 41 can carry the first carrier frame 6 at a first height position, and the second carrier plate 42 can carry the first carrier frame 6 Located at this second height position. When the first carrier 6 is at the first height position, the positions of all the receiving slots of one of the first receiving slots 61 and the second receiving slots 71 and a part of the receiving slots of the other are aligned with each other. . When the first supporting frame 6 is at the second height position, all the receiving slots of one of the first receiving grooves 61 and the second receiving slot 71 and the other part of the other receiving slots are positioned to each other. Aligned. Specifically, in this embodiment, as shown in FIG. 2, when the first carrier 6 is at the first height position, all the receiving grooves of the first receiving grooves 61 and the second receiving grooves The even-numbered receiving grooves (numbered from top to bottom) of 71 are aligned with each other; as shown in FIG. 3, when the first carrier 6 is at the second height position, all the receiving grooves of the first receiving grooves 61 The odd-numbered receiving grooves (counted from the top to the bottom) of the second receiving grooves 71 are aligned with each other.

參閱圖1至圖5,頂推機構5可滑動地設置於基座1且位於第一定位架2的前端24,且可沿一由前朝後的頂推方向P移動,用以將與該等第二容置槽71位置相互對齊的該等第一容置槽61中的該等晶圓8由該等第一容置槽61頂推至該等第二容置槽內。頂推機構5包括一長條狀連接桿51及一呈長方形的頂推板52,連接桿51可滑動地設置於基座1且沿垂直於基座1的方向延伸,頂推板52設置於連接桿51朝頂推方向P延伸。 Referring to FIGS. 1 to 5, the pushing mechanism 5 is slidably disposed on the base 1 and located at the front end 24 of the first positioning frame 2, and can be moved in a pushing direction P from front to back, for The wafers 8 in the first receiving grooves 61 that are aligned with each other in the second receiving grooves 71 are pushed into the second receiving grooves by the first receiving grooves 61. The pushing mechanism 5 includes a long connecting rod 51 and a rectangular pushing plate 52. The connecting rod 51 is slidably disposed on the base 1 and extends in a direction perpendicular to the base 1. The pushing plate 52 is provided on The connecting rod 51 extends in the pushing direction P.

參閱圖6,本實施例的晶圓轉換裝置100的晶圓轉換方法適於將第一承載架6所承載的晶圓8轉移傳送至第二承載架7內,該轉換方法包含以下步驟:一安裝步驟S1、一第一次頂推步驟S2、一更換步驟S3、一高度調整步 驟S4,及一第二次頂推步驟S5。 Referring to FIG. 6, the wafer conversion method of the wafer conversion apparatus 100 of this embodiment is suitable for transferring and transferring the wafer 8 carried by the first carrier 6 into the second carrier 7. The conversion method includes the following steps: Installation step S1, a first push step S2, a replacement step S3, a height adjustment step Step S4, and a second pushing step S5.

參閱圖4、圖6及圖7,在安裝步驟S1中,先將第二承載架7接合於安裝治具32後側,再將第一承載架6安裝於高度調整機構4的第一承載板41上,以及將安裝治具32卡接於第二定位架3的放置槽313內。此時,第一承載架6位於第一高度位置,該等第一容置槽61的全部容置槽與該等第二容置槽71中的一部分容置槽位置相互對齊,在本實施例中,該等第一容置槽61的全部容置槽與該等第二容置槽71中的偶數位置容置槽相互對齊。 Referring to FIG. 4, FIG. 6, and FIG. 7, in the mounting step S1, the second carrier 7 is first connected to the rear side of the mounting fixture 32, and then the first carrier 6 is mounted on the first carrier plate of the height adjustment mechanism 4. 41, and the mounting jig 32 is snapped into the placement groove 313 of the second positioning frame 3. At this time, the first carrier 6 is located at the first height position, and the positions of all the accommodation grooves of the first accommodation grooves 61 and some of the accommodation grooves of the second accommodation grooves 71 are aligned with each other. In this embodiment, In the embodiment, all the receiving grooves in the first receiving grooves 61 and the even-numbered receiving grooves in the second receiving grooves 71 are aligned with each other.

參閱圖5、圖6及圖8,在第一次頂推步驟S2中,使用者可透過手推動頂推機構5的連接桿51使頂推板52沿頂推方向P移動。頂推板52沿頂推方向P移動的過程中會穿伸入第一承載架6的第一開口62內,隨後頂推板52會頂推與該等第二容置槽71的偶數位置容置槽相互對齊的該等第一容置槽61中的該等晶圓8移動,使各晶圓8移離第一容置槽61並且藉由安裝治具32的對應導引槽322導引而移動至對應的第二容置槽71內。當各晶圓8移動至對應的第二容置槽71後,使用者可透過手拉動頂推機構5的連接桿51,使頂推機構5沿一相反於頂推方向P的復位方向D移動至圖4所示的一初始位置。 Referring to FIGS. 5, 6 and 8, in the first pushing step S2, the user can push the connecting rod 51 of the pushing mechanism 5 by hand to move the pushing plate 52 in the pushing direction P. During the movement of the ejection plate 52 in the ejection direction P, the ejection plate 52 penetrates into the first opening 62 of the first carrier 6, and then the ejection plate 52 ejects the even-numbered positions of the second accommodation slots 71. The wafers 8 in the first receiving grooves 61 in which the grooves are aligned with each other are moved, so that each wafer 8 is moved away from the first receiving grooves 61 and guided by the corresponding guide grooves 322 of the mounting fixture 32 Then, it moves into the corresponding second accommodation groove 71. After each wafer 8 moves to the corresponding second accommodating slot 71, the user can move the pushing mechanism 5 in a reset direction D opposite to the pushing direction P by pulling the connecting rod 51 of the pushing mechanism 5 by hand. Go to an initial position shown in FIG. 4.

參閱圖6及圖9,在更換步驟S3中,將空的該第一承載架6移離第一承載板41。 Referring to FIG. 6 and FIG. 9, in the replacement step S3, the empty first carrier 6 is moved away from the first carrier plate 41.

在高度調整步驟S4中,先將第一承載板41移離第一定位架2的定位槽23,隨後將第二承載板42安裝於 定位槽23內,接著,將另一個滿載晶圓8的第一承載架6安裝於高度調整機構4的第二承載板42上。藉由將第一承載板41更換為第二承載板42的方式,便可將該另一個滿載晶圓8的第一承載架6調整至第二高度位置,使該另一個第一承載架6的該等第一容置槽61與該等第二容置槽71中的另一部分容置槽位置相互對齊,在本實施例中,該等第一容置槽61的全部容置槽是與該等第二容置槽71中的奇數位置容置槽相互對齊。 In the height adjustment step S4, the first bearing plate 41 is first moved away from the positioning groove 23 of the first positioning frame 2, and then the second bearing plate 42 is mounted on the In the positioning groove 23, another first carrier 6 full of wafers 8 is mounted on the second carrier plate 42 of the height adjustment mechanism 4. By replacing the first carrier plate 41 with the second carrier plate 42, the other first carrier 6 which is fully loaded with the wafer 8 can be adjusted to the second height position, so that the other first carrier 6 The positions of the first accommodating grooves 61 and the other accommodating grooves in the second accommodating grooves 71 are aligned with each other. In this embodiment, all of the accommodating grooves of the first accommodating grooves 61 are aligned with The odd-numbered receiving grooves in the second receiving grooves 71 are aligned with each other.

參閱圖5、圖6及圖10,在第二次頂推步驟S5中,使用者可透過手推動頂推機構5的連接桿51使頂推板52沿頂推方向P移動。頂推板52沿頂推方向P移動的過程中會穿伸入第一承載架6的第一開口62內,隨後頂推板52會頂推與該等第二容置槽71中的奇數位置的第二容置槽71相互對齊的該等第一容置槽61中的該等晶圓8移動,使各晶圓8移離第一容置槽61並且藉由安裝治具32的對應導引槽322導引而移動至對應的第二容置槽71內。如此便完成將晶圓8由兩個25片裝的鐵氟龍晶圓盒轉換至50片裝的石英晶舟的步驟。 Referring to FIGS. 5, 6 and 10, in the second pushing step S5, the user can push the connecting rod 51 of the pushing mechanism 5 by hand to move the pushing plate 52 in the pushing direction P. During the movement of the pushing plate 52 in the pushing direction P, the pushing plate 52 penetrates into the first opening 62 of the first carrier 6, and then the pushing plate 52 pushes against the odd positions in the second receiving slots 71. The wafers 8 in the first accommodating grooves 61 in the second accommodating grooves 71 aligned with each other are moved, so that each wafer 8 is moved away from the first accommodating grooves 61 and correspondingly guided by the mounting fixture 32. The guide groove 322 guides and moves into the corresponding second accommodation groove 71. This completes the step of converting wafer 8 from two 25-piece Teflon wafer cassettes to a 50-piece quartz wafer boat.

參閱圖11及圖12,本發明晶圓轉換裝置的第二實施例可供一第一承載架6'及一第二承載架7'放置,該第一承載架6'形成有複數個上下相間隔排列的第一容置槽61'(如圖18所示)、一位於前端的第一開口62',及一位於後端且相反於第一開口62'的第二開口63',各該第一容置槽61'用以容置一晶圓8。該第二承載架7'形成有複數個上 下相間隔排列的第二容置槽71',該等第一容置槽61'的數量與該等第二容置槽71'的數量不同。該第二實施例的晶圓轉換裝置200包含一基座1'、一第一定位架2'、一第二定位架3'、一高度調整機構4',及一頂推機構5'。在本實施例中,第一承載架6'是採用石英晶舟,第二承載架7'是採用鐵氟龍晶圓盒,第一容置槽61'的數量為偶數個,第一容置槽61'的數量大於第二容置槽71'的數量,第一容置槽61'數量為第二容置槽71'數量的二倍,其中,第一容置槽61'數量是以50個為例,第二容置槽71'的數量是以25個為例,但不以此為限。 Referring to FIG. 11 and FIG. 12, a second embodiment of the wafer conversion device of the present invention may be used to place a first carrier 6 ′ and a second carrier 7 ′. The first carrier 6 ′ is formed with a plurality of upper and lower phases. The first accommodating grooves 61 ′ (as shown in FIG. 18) arranged at intervals, a first opening 62 ′ at the front end, and a second opening 63 ′ at the rear end opposite to the first opening 62 ′, each of which The first receiving groove 61 ′ is used to receive a wafer 8. The second carrier 7 'is formed with a plurality of upper brackets 7'. The number of the first accommodating grooves 61 ′ and the number of the second accommodating grooves 71 ′ are different from each other. The wafer conversion device 200 of the second embodiment includes a base 1 ′, a first positioning frame 2 ′, a second positioning frame 3 ′, a height adjustment mechanism 4 ′, and a pushing mechanism 5 ′. In this embodiment, the first carrier 6 ′ is a quartz crystal boat, and the second carrier 7 ′ is a Teflon wafer box. The number of the first accommodation grooves 61 ′ is an even number, and the first accommodation The number of the grooves 61 ′ is greater than the number of the second receiving grooves 71 ′. The number of the first receiving grooves 61 ′ is twice the number of the second receiving grooves 71 ′. The number of the first receiving grooves 61 ′ is 50. For example, the number of the second accommodating grooves 71 ′ is 25, but not limited thereto.

基座1'包括一立壁11'。第一定位架2'包括一前端23'、一相反於前端23'的後端24'、一固定於立壁11'的第一導軌21'、一固定於該立壁11'且間隔位於第一導軌21'後側的第二導軌22',及一固接於第一導軌21'及第二導軌22'的鎖固板25'。第一導軌21'及第二導軌22'分別呈長條形且沿一上下方向D1延伸。第二定位架3'設置於立壁11'且位於第一定位架2'的後端24',用以承載並定位第二承載架7'。 The base 1 'includes a standing wall 11'. The first positioning frame 2 'includes a front end 23', a rear end 24 'opposite to the front end 23', a first rail 21 'fixed to the vertical wall 11', and a first rail fixed to the vertical wall 11 'and spaced from the first rail. A second guide rail 22 'on the rear side of 21', and a locking plate 25 'fixed to the first guide rail 21' and the second guide rail 22 '. The first guide rail 21 ′ and the second guide rail 22 ′ are respectively elongated and extend along an up-down direction D1. The second positioning frame 3 ′ is disposed on the vertical wall 11 ′ and is located at the rear end 24 ′ of the first positioning frame 2 ′ for carrying and positioning the second supporting frame 7 ′.

參閱圖11、圖12及圖13,高度調整機構4'設置於第一定位架2',用以承載第一承載架6'並可將第一承載架6'由一第一高度位置調整至一高度高於第一高度位置的第二高度位置。高度調整機構4'包括一可滑動地連接於第一定位架2'並可承載第一承載架6'的滑動架41'、一設置於第一定位架2'並與該滑動架41'相連接的旋轉組件42', 及一設置於滑動架41'的安裝治具43'。滑動架41'包括一可滑動地連接於該第一定位架2'的第一導軌21'及第二導軌22'間的立板44',及一設置於立板44'並與其垂直的承載板45'。立板44'形成有一卡槽441',且具有一界定出卡槽441'的圍繞面442',圍繞面442'具有一下側面部442b'及一上側面部442a'。承載板45'是用以承載安裝治具43'及第一承載架6'。旋轉組件42'可透過滑動架41'沿上下方向D1帶動第一承載架6'在第一高度位置與第二高度位置之間移動。安裝治具43'包含兩個左右相間隔的側壁431',各側壁431'形成有複數個上下相間隔排列的導引槽432'(如圖18所示),第一承載架6'接合於安裝治具43'且位於兩側壁431'前側,該等第一容置槽61'分別與該等導引槽432'位置對齊,各導引槽432'用以導引對應的晶圓8移動至對應的該第二容置槽71'內。在本實施例中,導引槽432'的數量與第一容置槽61'的數量相同,皆為50,但不以此為限,只要數量相同即可。 Referring to FIG. 11, FIG. 12, and FIG. 13, the height adjustment mechanism 4 ′ is disposed on the first positioning frame 2 ′ for carrying the first supporting frame 6 ′ and can adjust the first supporting frame 6 ′ from a first height position to A second height position higher than the first height position. The height adjustment mechanism 4 'includes a sliding frame 41' slidably connected to the first positioning frame 2 'and can bear the first supporting frame 6', and a sliding frame 41 'disposed on the first positioning frame 2' and opposite to the sliding frame 41 '. Connected swivel assembly 42 ', And a mounting fixture 43 'disposed on the sliding frame 41'. The sliding frame 41 'includes a vertical plate 44' slidably connected between the first guide rail 21 'and the second guide rail 22' of the first positioning frame 2 ', and a bearing provided on the vertical plate 44' and perpendicular thereto. Plate 45 '. The vertical plate 44 'is formed with a latching groove 441', and has a surrounding surface 442 'defining the latching groove 441'. The surrounding surface 442 'has a lower side surface portion 442b' and an upper side surface portion 442a '. The carrying plate 45 'is used to carry the mounting fixture 43' and the first carrying frame 6 '. The rotating component 42 'can drive the first supporting frame 6' between the first height position and the second height position through the sliding frame 41 'in the up-down direction D1. The mounting fixture 43 'includes two side walls 431' spaced from left to right, and each side wall 431 'is formed with a plurality of guide grooves 432' (shown in Fig. 18) spaced apart from each other. The mounting fixture 43 ′ is located on the front side of the two side walls 431 ′. The first receiving grooves 61 ′ are aligned with the guide grooves 432 ′, and each guide groove 432 ′ is used to guide the corresponding wafer 8 to move. Into the corresponding second receiving slot 71 '. In this embodiment, the number of the guide grooves 432 'is the same as the number of the first accommodating grooves 61', both being 50, but it is not limited thereto, as long as the number is the same.

參閱圖13至圖15,在此更進一步介紹旋轉組件42',其具有一轉軸46'、一卡合於轉軸46'一端用以供旋轉的旋鈕47'、一固定地連接於轉軸46'另一端的偏心軸48',及一套設於偏心軸48'上的軸承49'。轉軸46'可轉動地樞接於鎖固板25'的樞接孔251'。旋鈕47'上凹陷形成有一指示槽471',用以指示高度調整機構4'是在何種高度位置。轉軸46'及偏心軸48'的中心軸線L1、L2彼此平行且相間隔,偏心軸48'包括一軸件481'及一用以將軸件481'固定於轉 軸46'的插銷482'。軸承49'套設於偏心軸48'的軸件481'上,且軸承49'穿設於立板44'的卡槽441'內且分別卡接於下側面部442b'及上側面部442a'。 Referring to FIGS. 13 to 15, a rotating assembly 42 ′ is further described here, which has a rotating shaft 46 ′, a knob 47 ′ engaged with one end of the rotating shaft 46 ′ for rotation, and a fixed connection to the rotating shaft 46 ′. An eccentric shaft 48 'at one end and a set of bearings 49' provided on the eccentric shaft 48 '. The rotating shaft 46 'is rotatably connected to the pivot hole 251' of the locking plate 25 '. An indicator groove 471 'is formed in the recess of the knob 47' to indicate the height position of the height adjustment mechanism 4 '. The central axes L1, L2 of the rotating shaft 46 'and the eccentric shaft 48' are parallel and spaced from each other. The eccentric shaft 48 'includes a shaft member 481' and a shaft member 481 'for fixing the shaft member 481' to the rotating shaft. Pin 482 'for shaft 46'. The bearing 49 'is sleeved on the shaft member 481' of the eccentric shaft 48 ', and the bearing 49' is inserted into the slot 441 'of the vertical plate 44' and is engaged with the lower side portion 442b 'and the upper side portion 442a', respectively. .

參閱圖11、圖16及圖17,頂推機構5'可滑動地設置於基座1'的立壁11'且位於第一定位架2'的前端23',且可沿一由前朝後的頂推方向P移動,用以將與該等第二容置槽71'位置相互對齊的該等第一容置槽61'中的該等晶圓8由該等第一容置槽61'頂推至該等第二容置槽71'內。頂推機構5'包括一可滑動地連接於立壁11'的連接桿50'、複數個彼此上下相間隔地設置於連接桿50'上的頂針51',及一頂針導引板52'。每一頂針51'用以頂推對應的該晶圓8,各該頂針51'末端面凹陷形成一溝槽511',溝槽511'延伸於頂針51'左右兩端之間,且該溝槽511'的縱向截面呈開口朝後的V字形,此結構設計是用以夾持晶圓8在頂推的過程中不易晃動產生上下的位移,確保頂推過程順利,防止晶圓8在過程中破裂。頂針導引板52'設置於基座1'的立壁11',且具有多個數量與該等頂針51'相同的穿孔521',供該等頂針51'穿設定位。在本實施例中,該等頂針51'及穿孔521'的數量為25,但不以此為限。 Referring to FIG. 11, FIG. 16 and FIG. 17, the pushing mechanism 5 ′ is slidably disposed on the vertical wall 11 ′ of the base 1 ′ and is located at the front end 23 ′ of the first positioning frame 2 ′. The pushing direction P is used to move the wafers 8 in the first receiving grooves 61 'aligned with the positions of the second receiving grooves 71' to each other by the first receiving grooves 61 '. Pushed into the second accommodation grooves 71 '. The pushing mechanism 5 ′ includes a connecting rod 50 ′ slidably connected to the vertical wall 11 ′, a plurality of pushing pins 51 ′ disposed on the connecting rod 50 ′ and spaced apart from each other, and a guiding pin guide plate 52 ′. Each thimble 51 'is used to push the corresponding wafer 8. The end surface of each thimble 51' is recessed to form a groove 511 '. The groove 511' extends between the left and right ends of the thimble 51 '. The longitudinal section of 511 'is V-shaped with the opening facing backward. This structure is designed to hold the wafer 8 during the pushing process so that it is not easy to shake and produce up and down displacement, ensuring the pushing process is smooth and preventing the wafer 8 from being in the process. rupture. The thimble guide plate 52 'is disposed on the vertical wall 11' of the base 1 ', and has a plurality of perforations 521' the same as the thimbles 51 'for the thimbles 51' to pass through the setting position. In this embodiment, the number of the thimbles 51 ′ and the perforations 521 ′ is 25, but not limited thereto.

參閱圖18及圖19,高度調整機構4'是藉由操作旋鈕47'來改變高度位置。當旋鈕47'的指示槽471'是指向後側,且偏心軸48'的中心軸線L1是低於轉軸46'的中心軸線L2,滑動架41'將安裝治具43'及第一承載架6'支撐在第一高度位置。此時,第一承載架6'的該等第一容置槽61' 中的奇數位置容置槽分別與該等頂針51'以及第二承載架7'的該等第二容置槽71'的全部容置槽位置相互對齊。接著參閱圖20及圖21,操作旋鈕47'順時針旋轉180度使指示槽471'指向前側,旋鈕47'會帶動轉軸46'旋轉進而帶動偏心軸48'旋轉180度,使偏心軸48'的中心軸線L1高於轉軸46'的中心軸線L2,進而使軸承49'向上位移並且同時帶動立板44'及承載板45'向上移動,使第一承載架6'到達第二高度位置。在第二高度位置時,該等第一容置槽61'中的偶數位置容置槽分別與該等頂針51'以及第二承載架7'的該等第二容置槽71'的全部容置槽位置相互對齊。 Referring to FIGS. 18 and 19, the height adjustment mechanism 4 ′ changes the height position by operating the knob 47 ′. When the indication groove 471 ′ of the knob 47 ′ is pointing to the rear side, and the central axis L1 of the eccentric shaft 48 ′ is lower than the central axis L2 of the rotating shaft 46 ′, the jig 43 ′ will be equipped with a jig 43 ′ and the first carrier 6. 'Support in the first height position. At this time, the first receiving slots 61 'of the first carrier 6' The odd-numbered receiving grooves in the middle are aligned with the positions of all the receiving grooves of the second receiving grooves 71 ′ of the ejector pins 51 ′ and the second carrier 7 ′. Next referring to FIGS. 20 and 21, the operation knob 47 ′ is rotated 180 degrees clockwise to make the indicating groove 471 ′ point to the front side, and the knob 47 ′ will rotate the rotation shaft 46 ′ and then rotate the eccentric shaft 48 ′ 180 degrees, so that the The central axis L1 is higher than the central axis L2 of the rotating shaft 46 ', so that the bearing 49' is upwardly displaced and simultaneously drives the vertical plate 44 'and the bearing plate 45' to move upward, so that the first bearing frame 6 'reaches the second height position. In the second height position, the even-numbered receiving grooves in the first receiving grooves 61 ′ and the entire contents of the second receiving grooves 71 ′ of the ejector pins 51 ′ and the second carrier 7 ′ are respectively The slot positions are aligned with each other.

參閱圖22,本實施例的晶圓轉換裝置200的晶圓轉換方法適於將一第一承載架6'所承載的晶圓轉移傳送至一第二承載架7'內,該轉換方法包含以下步驟:一安裝步驟S1'、一第一次頂推步驟S2'、一更換步驟S3'、一高度調整步驟S4',及一第二次頂推步驟S5'。 Referring to FIG. 22, the wafer conversion method of the wafer conversion device 200 of this embodiment is suitable for transferring and transferring a wafer carried by a first carrier 6 ′ to a second carrier 7 ′. The conversion method includes the following: Steps: a mounting step S1 ', a first pushing step S2', a replacement step S3 ', a height adjusting step S4', and a second pushing step S5 '.

參閱圖18及圖22,在安裝步驟S1',先將第一承載架6'接合於安裝治具43'內,再將安裝治具43'安裝於高度調整機構4'的滑動架41'的承載板45'上,以及將第二承載架7'安裝於第二定位架3'上。此時,第一承載架6'位於第一高度位置,該等第一容置槽61'中的一部分第一容置槽61'與該等第二容置槽71'位置相互對齊,在本實施例中,該等第一容置槽61'中的奇數位置容置槽與該等第二容置槽71'的全部容置槽以及該等頂針51'位置相互對齊。 Referring to FIG. 18 and FIG. 22, in the mounting step S1 ′, the first carrier 6 ′ is firstly engaged with the mounting jig 43 ′, and then the mounting jig 43 ′ is mounted on the slide frame 41 ′ of the height adjustment mechanism 4 ′. The carrier plate 45 'and the second carrier frame 7' are mounted on the second positioning frame 3 '. At this time, the first carrier 6 'is located at the first height position, and a part of the first receiving grooves 61' and the second receiving grooves 71 'in the first receiving grooves 61' are aligned with each other. In the embodiment, the odd-numbered position receiving grooves in the first receiving grooves 61 ′ are aligned with all the receiving slots of the second receiving grooves 71 ′ and the ejector pins 51 ′.

參閱圖22及圖23,在第一次頂推步驟S2'中, 使用者可透過手推動頂推機構5'的連接桿50'使該等頂針51'沿頂推方向P移動。頂針51'沿頂推方向P移動的過程中會穿伸入第一承載架6'的第一開口62'內,隨後頂針51'會頂推與該等第二容置槽71'位置相互對齊的該等第一容置槽61'的奇數位置容置槽中的該等晶圓8移動,使各晶圓8移離第一容置槽61'並且藉由安裝治具43'的對應導引槽432'導引而移動至對應的第二容置槽71'內。當各晶圓8移動至對應的第二容置槽71'後,使用者可透過手拉動頂推機構5'的連接桿50',使頂推機構5'沿一相反於頂推方向P的復位方向D移動至圖18所示的初始位置。 Referring to FIG. 22 and FIG. 23, in the first pushing step S2 ', The user can push the connecting rod 50 'of the pushing mechanism 5' to move the pushing pins 51 'along the pushing direction P by hand. During the movement of the ejector pin 51 'in the ejection direction P, it will penetrate into the first opening 62' of the first carrier 6 ', and then the ejector pin 51' will eject and align with the positions of the second accommodation grooves 71 '. The wafers 8 in the odd-numbered receiving grooves 61 'of the first receiving grooves 61 are moved, so that each wafer 8 is moved away from the first receiving groove 61' and correspondingly guided by the mounting fixture 43 '. The guide groove 432 'guides and moves into the corresponding second accommodation groove 71'. After each wafer 8 is moved to the corresponding second accommodating slot 71 ′, the user can pull the connecting rod 50 ′ of the pushing mechanism 5 ′ by hand to cause the pushing mechanism 5 ′ to move in a direction opposite to the pushing direction P. The reset direction D is moved to an initial position shown in FIG. 18.

參閱圖20及圖22,在更換步驟S3'中,將滿載晶圓8的第二承載架7'移離第二定位架3',並將另一個空的第二承載架7'安裝於第二定位架3'。 Referring to FIGS. 20 and 22, in the replacement step S3 ′, the second carrier 7 ′ full of wafers 8 is moved away from the second positioning rack 3 ′, and another empty second carrier 7 ′ is mounted on the first Two positioning frames 3 '.

在高度調整步驟S4'中,透過旋轉旋鈕47'帶動滑動架41'的立板44'及承載板45'向上位移,便可將第一承載架6'調整至一高度高於第一高度位置的第二高度位置,使該等第一容置槽61'中的另一部分第一容置槽61'與該另一個空的第二承載架7'的該等第二容置槽71'位置相互對齊,在本實施例中,該等第一容置槽61'中的偶數位置容置槽與該等第二容置槽71'的全部容置槽以及該等頂針51'位置相互對齊。 In the height adjustment step S4 ', by rotating the knob 47' to drive the vertical plate 44 'and the bearing plate 45' of the slide frame 41 'to move upward, the first bearing frame 6' can be adjusted to a position higher than the first height. The second height position of the first receiving grooves 61 ′ and the second receiving grooves 71 ′ of another part of the first receiving grooves 61 ′ and the other empty second carrier 7 ′. The positions are aligned with each other. In this embodiment, the positions of the even-numbered positions in the first accommodation slots 61 ′, all the positions of the second accommodation slots 71 ′, and the ejector pins 51 ′ are aligned with each other.

參閱圖22及圖24,在第二次頂推步驟S5'中,使用者可透過手推動頂推機構5'的連接桿50'使該等頂針51'沿頂推方向P移動。頂針51'沿頂推方向P移動的過程中 會穿伸入第一承載架6'的第一開口62'內,隨後頂針51'會頂推與該等第二容置槽71'位置相互對齊的該等第一容置槽61'中的該等晶圓8移動,使各晶圓8移離第一容置槽61'並且藉由安裝治具43'的對應導引槽432'導引而移動至對應的第二容置槽71'內。如此便完成將晶圓8由50片裝的石英晶舟轉換至兩個25片裝的鐵氟龍晶圓盒的步驟。 Referring to FIG. 22 and FIG. 24, in the second pushing step S5 ′, the user can push the connecting rod 50 ′ of the pushing mechanism 5 ′ to move the pushing pins 51 ′ along the pushing direction P by hand. During the movement of the ejector pin 51 'in the ejection direction P Will penetrate into the first opening 62 'of the first supporting frame 6', and then the ejector pin 51 'will push against the first receiving grooves 61' aligned with the positions of the second receiving grooves 71 '. The wafers 8 are moved, so that each wafer 8 is moved away from the first accommodation groove 61 ′ and guided to the corresponding second accommodation groove 71 ′ by the corresponding guide groove 432 ′ of the mounting fixture 43 ′. Inside. This completes the step of converting wafer 8 from a 50-piece quartz wafer boat to two 25-piece Teflon wafer cassettes.

值得一提的是,本發明晶圓轉換裝置的第二實施例,只需些微地修改其設計,將頂推機構5'以第二承載架7'為基準鏡像地設置在第二承載架7'的後側,如此一來頂推機構5'便可將第二承載架7'中的晶圓8頂推至第一承載架6'中,達到本發明晶圓轉換裝置的第一實施例所能達到的效果,將晶圓8由25片裝的鐵氟龍晶圓盒轉換至50片裝的石英晶舟。 It is worth mentioning that the second embodiment of the wafer conversion device of the present invention only needs to slightly modify its design, and the pusher mechanism 5 ′ is mirror-imaged on the second carrier 7 with the second carrier 7 ′ as a reference. 'Back side, in this way, the pushing mechanism 5' can push the wafer 8 in the second carrier 7 'into the first carrier 6', thereby achieving the first embodiment of the wafer conversion device of the present invention. The effect that can be achieved is to convert wafer 8 from a 25-piece Teflon wafer box to a 50-piece quartz crystal boat.

需要說明的是,本發明晶圓轉換裝置的發明背景是因為在半導體製程中有一燒結站製程,晶圓在進行此製程前是以25片裝的鐵氟龍晶圓盒做輸送的作業,但在進行燒結製程前須將晶圓轉換至石英晶舟才可繼續進行燒結製程。為了提高燒結站點的產能效率,石英晶舟的容量設計為50片裝。因此先藉由本發明第一實施例的晶圓轉換裝置100的本發明晶圓轉換方法,經步驟S1~S5將晶圓自鐵氟龍晶圓盒轉換至石英晶舟。待燒結製程結束後,再藉由本發明第二實施例的晶圓轉換裝置200的晶圓轉換方法,經步驟S1'~S5'將晶圓自石英晶舟轉換至鐵氟龍晶圓盒內,便可透過鐵氟龍晶圓盒承載晶圓以進行後續的製程。因此 ,藉由本發明晶圓轉換裝置使晶圓可達到在不同容量的承載裝置間轉換的目的,進而可提高整體製程的產能效率。其中,還需要補充的是,第一高度位置及第二高度位置的高度差僅為石英晶舟的一個槽位的高度,因此高度調整機構僅需控制第一承載架在此高度差間變化,不需要大量的機構作動空間,可精簡整體裝置的設計。再者,高度調整機構帶動第一承載架移動一小段的移動行程便能使其由第一高度位置調整至第二高度位置,藉此,使得操作人員能迅速地調整第一承載架的高度,以縮短操作工時並提升操作上的效率。 It should be noted that the background of the wafer conversion device of the present invention is because there is a sintering station process in the semiconductor process. Before this process is performed, the wafer is transported in a Teflon wafer box of 25 pieces. Before the sintering process, the wafer must be converted to a quartz wafer boat to continue the sintering process. In order to increase the productivity of the sintering station, the capacity of the quartz crystal boat is designed to be 50 pieces. Therefore, by using the wafer conversion method of the wafer conversion device 100 of the first embodiment of the present invention, the wafers are converted from the Teflon wafer box to the quartz wafer boat through steps S1 to S5. After the sintering process is completed, the wafer conversion method of the wafer conversion device 200 according to the second embodiment of the present invention is used to convert the wafer from the quartz wafer boat to the Teflon wafer box through steps S1 ′ to S5 ′. The wafer can be carried through the Teflon wafer box for subsequent processing. therefore The wafer conversion device of the present invention enables the wafer to achieve the purpose of changing between carrier devices with different capacities, thereby improving the productivity of the overall process. Among them, it should be added that the height difference between the first height position and the second height position is only the height of one slot of the quartz crystal boat, so the height adjustment mechanism only needs to control the first carrier to change between the height differences. It does not require a large amount of space for the mechanism to operate, which can simplify the design of the overall device. In addition, the height adjustment mechanism drives the first carrier to move a short movement stroke so that it can be adjusted from the first height position to the second height position, thereby enabling the operator to quickly adjust the height of the first carrier In order to shorten operating hours and improve operational efficiency.

綜上所述,透過高度調整機構4、4'調整第一承載架6、6'分別在第一高度位置及第二高度位置移動,藉由頂推機構5、5'將該等晶圓8自該第一承載架6、6'頂推傳送至該第二承載架7、7'內,如此便可達成在不同容量的第一承載架6、6'與第二承載架7、7'間轉換晶圓8的目的,進而可提高整體製程的產能效率,故確實能達成本發明之目的。 In summary, the height adjustment mechanisms 4, 4 'are used to adjust the first carrier 6, 6' to move at the first height position and the second height position, respectively, and the wafers 8 are pushed by the pushing mechanisms 5, 5 '. Push from the first carrier 6, 6 'into the second carrier 7, 7', so that the first carrier 6, 6 'and the second carrier 7, 7' with different capacities can be achieved. The purpose of interchanging the wafers 8 can further improve the productivity efficiency of the overall process, so it can indeed achieve the purpose of cost invention.

惟以上所述者,僅為本發明之實施例而已,當不能以此限定本發明實施之範圍,凡是依本發明申請專利範圍及專利說明書內容所作之簡單的等效變化與修飾,皆仍屬本發明專利涵蓋之範圍內。 However, the above are only examples of the present invention. When the scope of implementation of the present invention cannot be limited in this way, any simple equivalent changes and modifications made in accordance with the scope of the patent application and the content of the patent specification of the present invention are still Within the scope of the invention patent.

Claims (14)

一種晶圓轉換裝置,可供一第一承載架及一第二承載架放置,該第一承載架形成有複數個上下相間隔排列的第一容置槽,各該第一容置槽用以容置一晶圓,該第二承載架形成有複數個上下相間隔排列的第二容置槽,該等第一容置槽的數量與該等第二容置槽的數量不同,該晶圓轉換裝置包含:一基座;一第一定位架,設置於該基座,該第一定位架包括一前端,及一相反於該前端的後端;一第二定位架,設置於該基座且位於該第一定位架的該後端,該第二定位架用以承載並定位該第二承載架;一高度調整機構,包括一第一承載板及一第二承載板,該第一承載板的高度小於該第二承載板的高度,該第一承載板及該第二承載板其中之一可選擇地設置於該第一定位架,該第一承載板可承載該第一承載架使其位在一第一高度位置,該第二承載板可承載該第一承載架使其位在一高度高於該第一高度位置的第二高度位置,藉此可將該第一承載架在該第一高度位置及該第二高度位置間調整變換,當該第一承載架在該第一高度位置時,該等第一容置槽與該等第二容置槽其中之一的全部容置槽與其中另一的一部分容置槽位置相互對齊,當該第一承載架在該第二高度位置時,該等第一容置槽與該等第二容置槽其中之一的全部容置槽與其中另一的另一部分容置槽位置相互對齊;及一頂推機構,可滑動地設置於該基座且位於該第一定位架的該前端,該頂推機構可沿一由前朝後的頂推方向移動,用以將與該等第二容置槽位置相互對齊的該等第一容置槽中的該等晶圓由該等第一容置槽頂推至該等第二容置槽內。A wafer conversion device can be used for placing a first carrier and a second carrier. The first carrier is formed with a plurality of first receiving grooves arranged at an interval from each other. Each of the first receiving grooves is used for A wafer is accommodated, and the second carrier is formed with a plurality of second accommodation grooves arranged at an interval from each other. The number of the first accommodation grooves is different from the number of the second accommodation grooves. The conversion device includes: a base; a first positioning frame disposed on the base, the first positioning frame including a front end and a rear end opposite to the front end; a second positioning frame disposed on the base And located at the rear end of the first positioning frame, the second positioning frame is used for carrying and positioning the second supporting frame; a height adjusting mechanism includes a first bearing plate and a second bearing plate, the first bearing The height of the plate is smaller than the height of the second bearing plate. One of the first bearing plate and the second bearing plate is optionally disposed on the first positioning frame. The first bearing plate can bear the first bearing frame. It is located at a first height position, and the second bearing plate can carry the first bearing The rack is positioned at a second height position that is higher than the first height position, thereby adjusting and changing the first carrier between the first height position and the second height position. When the rack is at the first height position, the positions of all the accommodation grooves of one of the first accommodation grooves and the second accommodation grooves and a portion of the other accommodation grooves are aligned with each other. When the frame is at the second height position, the positions of all the accommodation grooves of one of the first accommodation grooves and the second accommodation grooves and the other of the other accommodation grooves are aligned with each other; and A mechanism slidably disposed on the base and located at the front end of the first positioning frame, the pushing mechanism can be moved in a pushing direction from front to back, and is used to position the second receiving slots The wafers in the first receiving slots aligned with each other are pushed from the first receiving slots into the second receiving slots. 如請求項1所述的晶圓轉換裝置,其中,該第一定位架包括一定位板、二凸設於該定位板表面且左右相間隔的限位板,及一由該等限位板及該定位板界定出的定位槽,該第一承載板及該第二承載板其中之一可選擇地卡置於該定位槽內。The wafer conversion device according to claim 1, wherein the first positioning frame includes a positioning plate, two limit plates protruding from the surface of the positioning plate and spaced from left to right, and one of the limit plates and A positioning slot defined by the positioning plate, and one of the first bearing plate and the second bearing plate can be selectively locked in the positioning slot. 如請求項1所述的晶圓轉換裝置,其中,該第二定位架包括一設置於該基座的承載座,及一安裝治具,該承載座的表面凹陷形成一放置槽,該安裝治具卡接於該放置槽內,該安裝治具包含兩個左右相間隔的側壁,各該側壁形成有複數個上下相間隔排列的導引槽,該第二承載架接合於該安裝治具後側,且該等第二容置槽分別與該等導引槽位置對齊,各該導引槽用以導引對應的該晶圓移動至對應的該第二容置槽內。The wafer conversion device according to claim 1, wherein the second positioning frame includes a bearing seat disposed on the base and a mounting jig, and a surface of the bearing seat is recessed to form a placement groove, and the mounting jig The jig is clamped in the placing groove. The mounting jig includes two side walls spaced from left to right. Each side wall is formed with a plurality of guide grooves spaced up and down. The second carrier is connected to the mounting jig. Side, and the second accommodating grooves are respectively aligned with the positions of the guide grooves, and each of the guide grooves is used to guide the corresponding wafer to move into the corresponding second accommodating groove. 如請求項3所述的晶圓轉換裝置,其中,該承載座包括一形成有該放置槽的基板,及一凸設於該基板後端用以阻擋該第二承載架的阻擋板。The wafer conversion device according to claim 3, wherein the carrier includes a substrate on which the placement groove is formed, and a blocking plate protruding from a rear end of the substrate to block the second carrier. 一種晶圓轉換裝置,可供一第一承載架及一第二承載架放置,該第一承載架形成有複數個上下相間隔排列的第一容置槽,各該第一容置槽用以容置一晶圓,該第二承載架形成有複數個上下相間隔排列的第二容置槽,該等第一容置槽的數量與該等第二容置槽的數量不同,該晶圓轉換裝置包含:一基座,包括一立壁;一第一定位架,設置於該基座的該立壁,該第一定位架包括一前端,及一相反於該前端的後端;一第二定位架,設置於該基座的該立壁且位於該第一定位架的該後端,該第二定位架用以承載並定位該第二承載架;一高度調整機構,包括一可滑動地連接於該第一定位架並可承載該第一承載架的滑動架,及一設置於該第一定位架並與該滑動架相連接的旋轉組件,該旋轉組件可透過該滑動架沿一上下方向帶動該第一承載架自一第一高度位置調整至一高度高於該第一高度位置的第二高度位置,且可帶動該第一承載架在該第一高度位置與該第二高度位置之間移動,當該第一承載架在該第一高度位置時,該等第一容置槽與該等第二容置槽其中之一的全部容置槽與其中另一的一部分容置槽位置相互對齊,當該第一承載架在該第二高度位置時,該等第一容置槽與該等第二容置槽其中之一的全部容置槽與其中另一的另一部分容置槽位置相互對齊;及一頂推機構,可滑動地設置於該基座且位於該第一定位架的該前端,該頂推機構可沿一由前朝後的頂推方向移動,用以將與該等第二容置槽位置相互對齊的該等第一容置槽中的該等晶圓由該等第一容置槽頂推至該等第二容置槽內。A wafer conversion device can be used for placing a first carrier and a second carrier. The first carrier is formed with a plurality of first receiving grooves arranged at an interval from each other. Each of the first receiving grooves is used for A wafer is accommodated, and the second carrier is formed with a plurality of second accommodation grooves arranged at an interval from each other. The number of the first accommodation grooves is different from the number of the second accommodation grooves. The conversion device includes: a base including a vertical wall; a first positioning frame disposed on the vertical wall of the base, the first positioning frame including a front end and a rear end opposite to the front end; a second positioning A frame, which is disposed on the vertical wall of the base and is located at the rear end of the first positioning frame; the second positioning frame is used for carrying and positioning the second supporting frame; a height adjusting mechanism includes a slidably connected to The first positioning frame can carry a sliding frame of the first supporting frame, and a rotating component disposed on the first positioning frame and connected to the sliding frame, and the rotating component can be driven in a vertical direction through the sliding frame. The first carrier is adjusted from a first height position to A second height position that is higher than the first height position and can drive the first carrier to move between the first height position and the second height position, when the first carrier is at the first height position At this time, the positions of all the receiving slots of one of the first receiving slots and the second receiving slots and a part of the receiving slots of the other are aligned with each other, and when the first carrier is at the second height position When all of the first receiving slots and the second receiving slots are aligned with each other and the other part of the receiving slots are aligned with each other; and a pushing mechanism is slidably disposed on The base is located at the front end of the first positioning frame, and the pushing mechanism can be moved in a pushing direction from front to back for aligning the first receiving positions with the positions of the second receiving slots. The wafers in the accommodating slots are pushed from the first accommodating slots into the second accommodating slots. 如請求項5所述的晶圓轉換裝置,其中,該頂推機構包括一頂針導引板,及複數個頂針,每一頂針用以頂推對應的該晶圓,各該頂針末端面凹陷形成一溝槽,該溝槽延伸於該頂針左右兩端之間,且該溝槽的縱向截面呈開口朝後的V字形,該頂針導引板設置於該基座,且具有多個數量與該等頂針相同的穿孔,供該等頂針穿設定位。The wafer conversion device according to claim 5, wherein the ejection mechanism includes a ejector guide plate and a plurality of ejectors, each ejector is used to eject a corresponding wafer, and the end surface of each ejector is formed by depression A groove extending between the left and right ends of the thimble, and the longitudinal section of the groove is a V-shaped opening rearward, and the thimble guide plate is provided on the base, and has a plurality of numbers and the Wait for the same perforation of the thimbles for the thimbles to penetrate the set position. 如請求項6所述晶圓轉換裝置,其中,該滑動架包括一可滑動地連接於該第一定位架的立板,該立板形成有一卡槽,該立板具有一界定出該卡槽的圍繞面,該圍繞面具有一下側面部及一上側面部,該旋轉組件包含一樞接於該第一定位架的轉軸、一設置於該轉軸一端用以供旋轉的旋鈕、一固定地連接於該轉軸另一端的偏心軸,及一套設於該偏心軸上的軸承,該轉軸及該偏心軸的中心軸線彼此平行且相間隔,該軸承穿設於該卡槽內且分別卡接於該下側面部及該上側面部。The wafer conversion device according to claim 6, wherein the sliding frame includes a vertical plate slidably connected to the first positioning frame, the vertical plate is formed with a card slot, and the vertical plate has a card slot defining the card slot The rotating surface includes a lower side portion and an upper side portion. The rotating component includes a rotating shaft pivotally connected to the first positioning frame, a knob provided at one end of the rotating shaft for rotation, and a fixed connection. An eccentric shaft at the other end of the rotating shaft, and a set of bearings provided on the eccentric shaft. The central axes of the rotating shaft and the eccentric shaft are parallel and spaced from each other. The bearings are inserted into the slot and are respectively engaged with The lower side portion and the upper side portion. 如請求項7所述的晶圓轉換裝置,其中,該偏心軸包括一軸件,及一用以將該軸件固定於該轉軸的插銷。The wafer conversion device according to claim 7, wherein the eccentric shaft includes a shaft member and a pin for fixing the shaft member to the shaft. 如請求項8所述的晶圓轉換裝置,其中,該滑動架更包括一設置於該立板並與其垂直的承載板,該高度調整機構更包括一設置於該承載板上的安裝治具,該安裝治具包含兩個左右相間隔的側壁,各該側壁形成有複數個上下相間隔排列的導引槽,該第一承載架接合於該安裝治具且位於該兩側壁前側,該等第一容置槽分別與該等導引槽位置對齊,各該導引槽用以導引對應的該晶圓移動至對應的該第二容置槽內。The wafer conversion device according to claim 8, wherein the sliding frame further includes a supporting plate disposed on the vertical plate and perpendicular to the supporting plate, and the height adjustment mechanism further includes a mounting fixture provided on the supporting plate. The mounting jig includes two side walls spaced from left to right. Each side wall is formed with a plurality of guide grooves spaced up and down. The first carrier is connected to the mounting jig and is located on the front side of the two side walls. An accommodating groove is respectively aligned with the positions of the guide grooves, and each of the guide grooves is used to guide the corresponding wafer to move into the corresponding second accommodating groove. 如請求項7所述的晶圓轉換裝置,其中,該第一定位架包括一固定於該立壁的第一導軌、一固定於該立壁且間隔位於該第一導軌後側的第二導軌,該第一導軌及該第二導軌分別呈長形且其長向平行於該上下方向,該立板設置於該第一導軌與該第二導軌之間,且該立板分別與該第一導軌及該第二導軌抵接。The wafer conversion device according to claim 7, wherein the first positioning frame includes a first guide rail fixed to the vertical wall, and a second guide rail fixed to the vertical wall and spaced behind the first guide rail. The first guide rail and the second guide rail are respectively elongated and their longitudinal directions are parallel to the up-down direction. The vertical plate is disposed between the first guide rail and the second guide rail, and the vertical plate and the first guide rail and This second rail abuts. 一種晶圓轉換裝置的晶圓轉換方法,適於將一第一承載架所承載的晶圓轉移傳送至一第二承載架內,該第一承載架形成有複數個上下相間隔排列的第一容置槽,各該第一容置槽用以容置一晶圓,該第二承載架形成有複數個上下相間隔排列的第二容置槽,該等第一容置槽的數量小於該等第二容置槽的數量,該方法包含以下步驟:安裝步驟,將該第一承載架及該第二承載架分別安裝於一高度調整機構的一第一承載板及一定位架,使該第一承載架位於一第一高度位置,該等第一容置槽與該等第二容置槽中的一部分容置槽位置相互對齊;第一次頂推步驟,透過一頂推機構將與該等第二容置槽位置相互對齊的該等第一容置槽中的該等晶圓由該等第一容置槽頂推至該等第二容置槽內;更換步驟,將空的該第一承載架移離該高度調整機構的該第一承載板;高度調整步驟,將該高度調整機構的該第一承載板替換為該高度調整機構的一高度大於該第二承載板,再將另一個滿載晶圓的第一承載架安裝於該第二承載板,使該另一個第一承載架調整至一高度高於該第一高度位置的第二高度位置,使該另一個第一承載架的該等第一容置槽與該等第二容置槽中的另一部分容置槽位置相互對齊;及第二次頂推步驟,透過該頂推機構頂推與該等第二容置槽中的另一部分容置槽相互對齊的該等第一容置槽中的該等晶圓,以將該等晶圓由該等第一容置槽頂推至該等第二容置槽內。A wafer conversion method of a wafer conversion device is suitable for transferring and transferring a wafer carried by a first carrier to a second carrier. The first carrier is formed with a plurality of first and second spaced-apart first arrays. Receiving slots, each of the first receiving slots is used to receive a wafer, the second carrier is formed with a plurality of second receiving slots arranged at an interval from each other, and the number of the first receiving slots is less than the number of the first receiving slots. After waiting for the number of the second receiving grooves, the method includes the following steps: an installation step of installing the first carrier and the second carrier on a first carrier plate and a positioning frame of a height adjustment mechanism, respectively, so that the The first carrier is located at a first height position, and the positions of the first receiving grooves and some of the second receiving grooves are aligned with each other; the first pushing step is to push the The wafers in the first accommodating slots in which the second accommodating slots are aligned with each other are pushed from the first accommodating slots into the second accommodating slots; in the replacement step, the empty The first carrier is moved away from the first carrier plate of the height adjustment mechanism; In the step, the first carrier plate of the height adjustment mechanism is replaced with a height of the height adjustment mechanism that is greater than the second carrier plate, and then another first carrier frame full of wafers is mounted on the second carrier plate, so that The other first carrier is adjusted to a second height position higher than the first height position, so that the first receiving grooves and the second receiving grooves of the other first carrier are The positions of the other receiving grooves are aligned with each other; and the second pushing step is to push the first receiving grooves aligned with the other receiving grooves of the second receiving grooves through the pushing mechanism. The wafers to push the wafers from the first receiving grooves into the second receiving grooves. 如請求項11所述的晶圓轉換裝置的晶圓轉換方法,其中,該等第一容置槽數量為該等第二容置槽數量的二分之一,該等第二容置槽數量為偶數個,在該安裝步驟中,該等第一容置槽是分別與位在偶數位置的該等第二容置槽相互對齊,在該高度調整步驟中,該等第一容置槽是分別與位在奇數位置的該等第二容置槽相互對齊。The wafer conversion method of the wafer conversion device according to claim 11, wherein the number of the first accommodation slots is a half of the number of the second accommodation slots, and the number of the second accommodation slots is For the even number, in the installation step, the first receiving grooves are aligned with the second receiving grooves in even positions, respectively. In the height adjustment step, the first receiving grooves are Align with the second receiving slots at odd positions, respectively. 一種晶圓轉換裝置的晶圓轉換方法,適於將一第一承載架所承載的晶圓轉移傳送至一第二承載架內,該第一承載架形成有複數個上下相間隔排列的第一容置槽,各該第一容置槽用以容置一晶圓,該第二承載架形成有複數個上下相間隔排列的第二容置槽,該等第一容置槽的數量大於該等第二容置槽的數量,該方法包含以下步驟:安裝步驟,將該第一承載架及該第二承載架分別安裝於一高度調整機構的一滑動架及一定位架,使該第一承載架位於一第一高度位置,該等第一容置槽中的一部分容置槽與該等第二容置槽位置相互對齊;第一次頂推步驟,透過一頂推機構將與該等第二容置槽位置相互對齊的該等第一容置槽中的該等晶圓由該等第一容置槽頂推至該等第二容置槽內;更換步驟,將滿載晶圓的該第二承載架移離該定位架,並將另一個空的第二承載架安裝於該定位架;高度調整步驟,操作該高度調整機構的一與該滑動架相連接的旋轉組件,該旋轉組件透過該滑動架沿一上下方向帶動該第一承載架自一第一高度位置調整至一高度高於該第一高度位置的第二高度位置,使該等第一容置槽中的另一部分容置槽與該另一個空的第二承載架的該等第二容置槽位置相互對齊;及第二次頂推步驟,透過該頂推機構頂推與該等第二容置槽位置相互對齊的該等第一容置槽的另一部分容置槽中的該等晶圓,以將該等晶圓由該等第一容置槽頂推至該等第二容置槽內。A wafer conversion method of a wafer conversion device is suitable for transferring and transferring a wafer carried by a first carrier to a second carrier. The first carrier is formed with a plurality of first and second spaced-apart first arrays. Receiving slots, each of the first receiving slots is used to receive a wafer, the second carrier is formed with a plurality of second receiving slots arranged at an interval from each other, and the number of the first receiving slots is greater than the number of the first receiving slots. After waiting for the number of the second receiving grooves, the method includes the following steps: an installation step of installing the first carrier and the second carrier on a sliding frame and a positioning frame of a height adjustment mechanism, respectively, so that the first The carrier is located at a first height position, a part of the receiving grooves in the first receiving grooves and the positions of the second receiving grooves are aligned with each other; the first pushing step, through a pushing mechanism, The wafers in the first receiving slots whose second receiving slots are aligned with each other are pushed from the first receiving slots into the second receiving slots; in the replacement step, the The second carrier is moved away from the positioning frame and another empty second carrier Mounted on the positioning frame; a height adjustment step of operating a rotating component of the height adjusting mechanism connected to the sliding frame, the rotating component driving the first carrier from a first height position through the sliding frame in an up-down direction Adjusted to a second height position higher than the first height position, so that another part of the first receiving slots and the second receiving slots of the other empty second carrier The positions are aligned with each other; and the second pushing step, pushing the wafers in another part of the receiving slots aligned with the positions of the second receiving slots through the pushing mechanism. To push the wafers from the first receiving grooves into the second receiving grooves. 如請求項13所述的晶圓轉換裝置的晶圓轉換方法,其中,該等第一容置槽數量為該等第二容置槽數量的二倍,該等第一容置槽數量為偶數個,在該安裝步驟中,該等第二容置槽是分別與位在偶數位置的該等第一容置槽相互對齊,在該高度調整步驟中,該等第二容置槽是分別與位在奇數位置的該等第一容置槽相互對齊。The wafer conversion method of the wafer conversion device according to claim 13, wherein the number of the first accommodation slots is twice the number of the second accommodation slots, and the number of the first accommodation slots is an even number. In the installation step, the second accommodating slots are aligned with the first accommodating slots in even positions, respectively. In the height adjustment step, the second accommodating slots are respectively aligned with the first accommodating slots. The first accommodating slots located at the odd positions are aligned with each other.
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