TWI644103B - Buffer position limiting device - Google Patents
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- TWI644103B TWI644103B TW106134255A TW106134255A TWI644103B TW I644103 B TWI644103 B TW I644103B TW 106134255 A TW106134255 A TW 106134255A TW 106134255 A TW106134255 A TW 106134255A TW I644103 B TWI644103 B TW I644103B
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Abstract
一種可緩衝之限位裝置,適用於限制一晶片於一測試座上的位置,其包含一晶片限位單元,及一晶片緩衝單元。該晶片限位單元包括一圍繞界定出一第一容置空間之限位部,以限制該晶片置放於該測試座的位置。該晶片緩衝單元包括一設置於該測試座與該晶片限位單元之間的緩衝部,其中,該緩衝部具有彈性,當該晶片置入該第一容置空間時,該緩衝部可緩衝該晶片對該限位部的衝擊。 A bufferable limiting device adapted to limit the position of a wafer on a test socket, comprising a chip stop unit and a wafer buffer unit. The chip limiting unit includes a limiting portion surrounding a first receiving space to limit a position at which the wafer is placed on the test socket. The buffer unit includes a buffer portion disposed between the test socket and the chip limiting unit, wherein the buffer portion has elasticity, and the buffer portion can buffer the wafer when the wafer is placed in the first receiving space. The impact of the wafer on the limit portion.
Description
本發明是有關於一種限位裝置,尤其是一種限制一晶片於一測試座的位置,並可緩衝該晶片之放置力量的限位裝置。 The present invention relates to a limiting device, and more particularly to a limiting device that limits the position of a wafer to a test socket and can buffer the placement force of the wafer.
晶圓(Wafer)自半導體廠產生後,會切割成複數晶粒(Chip)並進行封裝,一般封裝會進行拉線、灌膠等製程,以形成具有複數引腳(電極)之晶片。 After the Wafer is produced by the semiconductor factory, it is cut into a plurality of chips and packaged. Generally, the package is subjected to a process such as drawing and potting to form a wafer having a plurality of pins (electrodes).
灌膠製程中所使用之膠體呈液體態,但膠體衝擊引線時仍有機會造成引線脫落或斷裂,因此,半導體封裝製程後會進行電性測試,以將良好的晶片選出。 The colloid used in the potting process is in a liquid state, but there is still a chance that the colloid will be detached or broken when the colloid hits the lead. Therefore, electrical testing is performed after the semiconductor packaging process to select a good wafer.
參閱圖1,為一種晶片測試裝置,包含一測試座11,一可分離地設置於該測試座11之晶片座12。該晶片座12上設有一導引邊13,該導引邊13之內緣的形狀與晶片之外緣相符,以將晶片之引腳與測試座11之測試電極點電線連接,以測試晶片之電性是否好。 Referring to FIG. 1 , a wafer testing apparatus includes a test socket 11 , a wafer holder 12 detachably disposed on the test socket 11 . The wafer holder 12 is provided with a guiding edge 13 whose inner edge has a shape conforming to the outer edge of the wafer to connect the pins of the wafer with the test electrode of the test socket 11 to test the wafer. Is the electrical property good?
其中,晶片是由機器手臂進行搬移,每次拿取晶片的位置會出現極小的誤差,而產生位置不一致的狀況。該導引邊13呈斜邊態樣,以使機器手臂將晶片放置於該晶片座12中間時,導引晶片落入正確的位置,因此,該晶片座12上之導引邊13時常遭受晶片撞擊,會產生磨損, 甚至崩壞,造成該晶片座12與該導引邊13必須時常進行更換。 Among them, the wafer is moved by the robot arm, and each time the wafer is taken, the position of the wafer is extremely small, and the position is inconsistent. The guiding edge 13 is in a beveled manner so that when the robot arm places the wafer in the middle of the wafer holder 12, the guiding wafer falls into the correct position. Therefore, the guiding edge 13 on the wafer holder 12 often suffers from the wafer. Impact, it will cause wear, Even collapses, causing the wafer holder 12 and the leading edge 13 to be replaced from time to time.
由於半導體製程是以量制價,每一次停工都會造成損失,因此,如何提高晶片座12及該導引邊13的使用壽命,避免停工所造成的損失,是相關技術人員亟需努力的目標。 Since the semiconductor process is based on the quantity, the loss is caused by each stoppage. Therefore, how to improve the service life of the wafer holder 12 and the leading edge 13 and avoid the loss caused by the shutdown is an urgent need of the technicians.
有鑑於此,本發明之目的是在提供一種可緩衝之限位裝置,適用於限制一晶片於一測試座上的位置,其包含一晶片限位單元,及一晶片緩衝單元。 In view of the above, it is an object of the present invention to provide a bufferable limiting device suitable for limiting the position of a wafer on a test socket, comprising a wafer stop unit and a wafer buffer unit.
該晶片限位單元包括一圍繞界定出一第一容置空間之限位部,以限制該晶片置放於該測試座的位置。 The chip limiting unit includes a limiting portion surrounding a first receiving space to limit a position at which the wafer is placed on the test socket.
該晶片緩衝單元包括一設置於該測試座與該晶片限位單元之間的緩衝部,該緩衝部具有彈性,當該晶片置入該第一容置空間時,該緩衝部可緩衝該晶片對該限位部的衝擊。 The buffer unit includes a buffer portion disposed between the test socket and the chip limiting unit, and the buffer portion has elasticity. When the wafer is placed in the first receiving space, the buffer portion can buffer the wafer pair. The impact of the limit.
本發明的又一技術手段,是在於上述之可緩衝之限位裝置,更包含一外框固定單元,包括一設置於該測試座與該緩衝部之間的固定部。 Another technical means of the present invention is the above-mentioned storable limiting device, further comprising an outer frame fixing unit, comprising a fixing portion disposed between the test seat and the buffer portion.
本發明的另一技術手段,是在於上述之外框固定單元更包括一由該固定部圍繞界定之第二容置空間,該限位部設置於該第二容置空間中,該緩衝部設置於該限位部及該固定部之間。 Another technical means of the present invention is that the outer frame fixing unit further includes a second accommodating space defined by the fixing portion, and the limiting portion is disposed in the second accommodating space, and the buffer portion is disposed. Between the limiting portion and the fixing portion.
本發明的再一技術手段,是在於上述之可緩 衝之限位裝置,更包含一隔離單元,包括一與該固定部連接之外部隔離層,用以將該緩衝部與外界隔離。 A further technical means of the present invention is that the above is slow The rushing limit device further includes an isolation unit including an external isolation layer connected to the fixing portion for isolating the buffer portion from the outside.
本發明的又一技術手段,是在於上述之隔離單元更包括一與該固定部連接之內部隔離層,用以將該緩衝部與該測試座隔離。 Another technical means of the present invention is that the isolation unit further includes an internal isolation layer connected to the fixing portion for isolating the buffer portion from the test seat.
本發明的另一技術手段,是在於上述之限位部之表面具有一緩衝導角,以將該晶片導入該第一容置空間,並將該晶片對該限位部的衝擊力導向該緩衝部。 Another technical means of the present invention is that the surface of the limiting portion has a buffering lead angle to introduce the wafer into the first receiving space, and direct the impact force of the wafer on the limiting portion to the buffer. unit.
本發明的再一技術手段,是在於上述之限位部是由複數與該緩衝部連接之限位構件所構成。 According to still another aspect of the present invention, the above-described stopper portion is constituted by a plurality of stopper members connected to the buffer portion.
本發明的又一技術手段,是在於上述之限位部之材質為剛性材料。 According to still another aspect of the present invention, the material of the limiting portion is a rigid material.
本發明的另一技術手段,是在於上述之緩衝部之材質為高分子材料。 Another technical means of the present invention is that the material of the buffer portion is a polymer material.
本發明的再一技術手段,是在於上述之緩衝部是由彈性金屬所構成。 According to still another aspect of the present invention, the buffer portion is made of an elastic metal.
本發明之有益功效在於,該緩衝部為彈性材質,配合該緩衝導角的傾斜設置,當該晶片置入該第一容置空間時,該緩衝部可以緩衝該晶片衝擊該限位部的力道,該限位部隨著該晶片位置偏移,可以減低衝擊力造成的磨損或崩壞,有效延長該限位部的壽命,該緩衝部之彈力可將該限位部彈回原來的位置,以使該晶片位於正確的位置,並使該測試座可以對該晶片進行電性測試。 The beneficial effect of the present invention is that the buffer portion is an elastic material, and the tilting arrangement of the buffer lead angle is arranged. When the wafer is placed in the first receiving space, the buffer portion can buffer the force of the wafer impacting the limiting portion. The limiting portion can reduce the wear or collapse caused by the impact force, and effectively extend the life of the limiting portion, and the elastic force of the buffer portion can rebound the limiting portion back to the original position. The wafer is placed in the correct position and the test stand can be electrically tested on the wafer.
11‧‧‧測試座 11‧‧‧ test seat
12‧‧‧晶片座 12‧‧‧ Wafer holder
13‧‧‧導引邊 13‧‧‧ Leading edge
A‧‧‧晶片 A‧‧‧chip
B‧‧‧測試座 B‧‧‧ test seat
31‧‧‧晶片限位單元 31‧‧‧ Chip Limit Unit
311‧‧‧第一容置空間 311‧‧‧First accommodation space
312‧‧‧限位部 312‧‧‧Limited
313‧‧‧緩衝導角 313‧‧‧buffer lead angle
314‧‧‧掏孔 314‧‧‧掏孔
315‧‧‧限位構件 315‧‧‧Limited components
32‧‧‧晶片緩衝單元 32‧‧‧ wafer buffer unit
321‧‧‧緩衝部 321‧‧‧ buffer
33‧‧‧外框固定單元 33‧‧‧Frame fixing unit
331‧‧‧固定部 331‧‧‧ Fixed Department
332‧‧‧第二容置空間 332‧‧‧Second accommodating space
333‧‧‧孔洞 333‧‧‧ hole
34‧‧‧隔離單元 34‧‧‧Isolation unit
341‧‧‧外部隔離層 341‧‧‧External insulation
342‧‧‧內部隔離層 342‧‧‧Internal insulation
圖1是一裝置示意圖,說明習知一種晶片測試裝置;圖2是一裝置示意圖,說明本發明可緩衝之限位裝置之一第一較佳實施例;圖3是一裝置示意圖,說明該第一較佳實施例之一晶片限位單元;圖4是一裝置示意圖,說明該第一較佳實施例之一晶片緩衝單元;圖5是一裝置示意圖,說明該第一較佳實施例之外框固定單元;圖6是一裝置示意圖,說明本發明可緩衝之限位裝置之一第二較佳實施例;圖7是一裝置示意圖,說明本發明可緩衝之限位裝置之一第三較佳實施例;圖8是一裝置示意圖,說明本發明可緩衝之限位裝置之一第四較佳實施例;圖9是一裝置示意圖,說明本發明可緩衝之限位裝置之一第五較佳實施例;圖10是一裝置剖面示意圖,說明本發明可緩衝之限位裝置之一第六較佳實施例;圖11是一裝置剖面示意圖,說明本發明可緩衝之限位裝置之一第七較佳實施例。 1 is a schematic view of a device for describing a wafer testing device; FIG. 2 is a schematic view of a device for illustrating a first preferred embodiment of a buffer capable limiting device of the present invention; FIG. 3 is a schematic view of the device A chip limiting unit of a preferred embodiment; FIG. 4 is a schematic view of a wafer buffer unit of the first preferred embodiment; FIG. 5 is a schematic view of the apparatus, illustrating the first preferred embodiment. Figure 6 is a schematic view of a device, illustrating a second preferred embodiment of the bufferable limit device of the present invention; and Figure 7 is a schematic view of a device for illustrating a third of the limitable devices of the present invention. 8 is a schematic view of a device, illustrating a fourth preferred embodiment of the bufferable limit device of the present invention; and FIG. 9 is a schematic view of a device for illustrating a fifth of the limitable devices of the present invention. 10 is a cross-sectional view of a device, illustrating a sixth preferred embodiment of the buffer-capable device of the present invention; FIG. 11 is a cross-sectional view of a device illustrating one of the buffer-capable devices of the present invention. Seven better Example.
有關本發明之相關申請專利特色與技術內 容,在以下配合參考圖式之七個較佳實施例的詳細說明中,將可清楚地呈現。在進行詳細說明前應注意的是,類似的元件是以相同的編號來做表示。 Relevant patent applications and technologies related to the present invention The details of the seven preferred embodiments, which are described below in conjunction with the reference drawings, will be apparent. It should be noted that before the detailed description, similar elements are denoted by the same reference numerals.
參閱圖2、3、4、5,為本發明一種可緩衝之限位裝置之一第一較佳實施例,適用於限制一晶片A於一測試座B上的位置,該第一較佳實施例包含一晶片限位單元31、一晶片緩衝單元32,及一外框固定單元33。 Referring to Figures 2, 3, 4 and 5, a first preferred embodiment of a buffer-capable limiting device is adapted to limit the position of a wafer A on a test socket B. The first preferred embodiment The example includes a chip stop unit 31, a wafer buffer unit 32, and an outer frame fixing unit 33.
該晶片A之下表面具有複數引腳,該測試座B之上表面具有複數測試電極,該晶片A之複數引腳與該測試座B之複數測試電極彼此接觸,用以傳輸電位,進一步測試該晶片A之電性是否良好。由於晶片測試之技術手段已為相關業者所知悉,並廣泛運用於半導體封裝測試產業中,在此不再詳加贅述。 The lower surface of the wafer A has a plurality of pins, and the upper surface of the test block B has a plurality of test electrodes, and the plurality of pins of the chip A and the plurality of test electrodes of the test block B are in contact with each other for transmitting potential, and the test is further tested. Whether the electrical properties of the wafer A are good. Since the technical means of wafer testing have been known to the relevant industry and widely used in the semiconductor packaging and testing industry, it will not be described in detail herein.
該晶片限位單元31包括一圍繞界定出一第一容置空間311之限位部312,該限位部312之表面形成一緩衝導角313,該限位部312之內緣與該晶片A之外緣形狀相符,以使該晶片A可以置入該容置空間311中,並限制該晶片A於該測試座B的位置,令該晶片A之複數引腳對準該測試座B之複數測試電極。 The chip limiting unit 31 includes a limiting portion 312 defining a first accommodating space 311. The surface of the limiting portion 312 forms a buffering lead 313. The inner edge of the limiting portion 312 and the wafer A The outer edge shape is matched so that the wafer A can be placed in the accommodating space 311, and the position of the wafer A in the test socket B is restricted, so that the plurality of pins of the wafer A are aligned with the plurality of test sockets B. Test the electrode.
其中,該限位部312之材質為剛性材料,其剛性材料就是硬度較高的材料,不容易因外力產生形變或磨損,較佳地,剛性材料選自於陶瓷材料、鈦金屬材料、鑽石材料、剛玉材料、碳化矽材料、碳化鎢材料、碳化鈦材料、碳化硼材料、氮化硼材料、斯石英材料、硼材料、 二硼化錸材料、二硼化鈦材料等高硬度的材質。可以減低該晶片A撞擊該限位部312所造成的損耗。 The material of the limiting portion 312 is a rigid material, and the rigid material is a material with high hardness, and is not easily deformed or worn by external force. Preferably, the rigid material is selected from ceramic materials, titanium materials, and diamond materials. , corundum material, tantalum carbide material, tungsten carbide material, titanium carbide material, boron carbide material, boron nitride material, quartz material, boron material, High hardness material such as barium diboride material or titanium diboride material. The loss caused by the wafer A striking the limiting portion 312 can be reduced.
早期之限位部312為金屬材質,容易因撞擊或摩擦而產生耗損或崩壞,因此發明人使用硬度較高的陶瓷材料作為該限位部312的材質,可提高抗摩擦力,以延長該限位部312使用壽命。實際實施時,該限位部312可使用其他硬度較高的鋼性材料,例如鈦金屬或鍍鈦的結構體,不應本較佳實施例之舉例為限。 The early limit portion 312 is made of a metal material and is easily worn or collapsed by impact or friction. Therefore, the inventors use a ceramic material having a higher hardness as the material of the stopper portion 312 to improve the friction resistance and extend the The limit portion 312 has a service life. In practical implementation, the limiting portion 312 can use other high-hardness steel materials, such as titanium metal or titanium-plated structures, and should not be limited by the examples of the preferred embodiment.
該晶片緩衝單元32包括一設置於該測試座B與該晶片限位單元31之間的緩衝部321,其中,該緩衝部321是使用具有彈性之高分子材料,當該晶片A置入該第一容置空間311時,該緩衝部321可緩衝該晶片A對該限位部312的衝擊力,並利用彈力將該晶片A移至正確位置。 The buffer unit 32 includes a buffer portion 321 disposed between the test socket B and the wafer limiting unit 31. The buffer portion 321 is made of a flexible polymer material. When the space 311 is accommodated, the buffer portion 321 can buffer the impact of the wafer A on the limiting portion 312, and the wafer A can be moved to the correct position by the elastic force.
該緩衝導角313為設置於該限位部312之上表面內緣的導角斜邊,用以將該晶片A導入該第一容置空間,更可以緩衝該晶片A對該限位部312的衝擊力。當該晶片A導入該第一容置空間311時,該緩衝導角313可以將該晶片A對該限位部312的衝擊力導向該緩衝部321,再藉由該緩衝部321之彈力,恢復該限位部312的位置。 The buffer lead angle 313 is a beveled bevel disposed on the inner edge of the upper surface of the limiting portion 312 for guiding the wafer A into the first receiving space, and further buffering the wafer A to the limiting portion 312. The impact. When the wafer A is introduced into the first accommodating space 311, the buffering lead angle 313 can guide the impact force of the wafer A on the limiting portion 312 to the buffer portion 321 and recover by the elastic force of the buffer portion 321 . The position of the limiting portion 312.
該外框固定單元33包括一設置於該測試座B與該緩衝部321之間的固定部331,及一由該固定部331圍繞界定之第二容置空間332。其中,該固定部331為金屬材質,該固定部331上設有複數孔洞333,可以使用螺 絲將該固定部331固定於該測試座B上。 The frame fixing unit 33 includes a fixing portion 331 disposed between the testing block B and the buffer portion 321 , and a second receiving space 332 defined by the fixing portion 331 . The fixing portion 331 is made of a metal material, and the fixing portion 331 is provided with a plurality of holes 333, and the snail can be used. The wire fixes the fixing portion 331 to the test seat B.
該限位部312設置於該第二容置空間332中,該緩衝部321設置於該限位部312及該固定部331之間,該緩衝部321可以緩衝該晶片A對該限位部312的衝擊力,該固定部331撐抵於該緩衝部321,以使該限位部312的位置固定。 The limiting portion 312 is disposed in the second accommodating space 332. The buffer portion 321 is disposed between the limiting portion 312 and the fixing portion 331. The buffer portion 321 can buffer the wafer A to the limiting portion 312. The impact portion 331 abuts against the buffer portion 321 to fix the position of the limiting portion 312.
該緩衝部321的製作方法是,先利用模具將該限位部312與該固定部331之位置固定,在利用液態之高分子材料灌注於該限位部312與該固定部331之間的第二容置空間332,當高分子材料固化後形成該緩衝部321,其中,高分子材選自於橡膠、矽膠、AB膠,及此等之組合。 The buffer portion 321 is formed by first fixing the position of the stopper portion 312 and the fixing portion 331 by a mold, and pouring the liquid polymer material between the stopper portion 312 and the fixing portion 331. The second accommodating space 332 forms the buffer portion 321 when the polymer material is solidified, wherein the polymer material is selected from the group consisting of rubber, silicone rubber, AB glue, and the like.
該晶片A的移動通常是以機器手臂進行搬移,每次機器手臂夾取或吸取該晶片A時的位置不會相同,因此當機器手臂將該晶片A放置於該第一容置空間311時,該晶片A有機會碰觸到該緩衝導角313,並藉由該緩衝部321具有彈性的特性,該限位部312的位置將隨著該晶片A的位置偏移,有效緩衝該晶片對該限位部312的衝擊。接著該緩衝部321之彈力再將該限位部312及位於該限位部312中的晶片A彈回至正確的位置,使該晶片A之複數引腳與該測試座B之複數測試電極相互接觸。 The movement of the wafer A is usually carried out by the robot arm, and the position of the wafer A is not the same when the robot arm grips or sucks the wafer A. Therefore, when the robot arm places the wafer A in the first accommodating space 311, The wafer A has a chance to touch the buffer lead angle 313, and the buffer portion 321 has an elastic property, and the position of the limiting portion 312 will be offset with the position of the wafer A, thereby effectively buffering the wafer. The impact of the limiting portion 312. Then, the elastic force of the buffer portion 321 rebounds the limiting portion 312 and the wafer A located in the limiting portion 312 to the correct position, so that the plurality of pins of the wafer A and the plurality of test electrodes of the test block B are mutually contact.
其中,該第一容置空間311的角落分別設有一掏孔314,用以提供作業人員將卡於該第一容置空間311的晶片A掏出。雖然以目前的灌膠技術可以讓每一顆晶片A的大小一致,但是每一顆晶片A的外觀還是有些微的差 異。 Each of the corners of the first accommodating space 311 is provided with a boring hole 314 for the operator to pull out the wafer A stuck in the first accommodating space 311. Although the size of each wafer A can be made uniform by the current glue filling technology, the appearance of each wafer A is slightly different. different.
因為該限位部312使用硬質材料,當該晶片之外緣尺寸略大於該第一容置空間311,且機器手臂硬將該晶片A置入該第一容置空間311中,該晶片A將卡於該第一容置空間311中,機器手臂無法將該晶片A取出,作業人員可利用該複數掏孔314將卡該第一容置空間311的晶片A掏出。 Because the limiting portion 312 uses a hard material, when the outer edge of the wafer is slightly larger than the first accommodating space 311, and the robot hardly places the wafer A into the first accommodating space 311, the wafer A will In the first accommodating space 311, the robot arm cannot take out the wafer A, and the worker can use the plurality of boring holes 314 to pull out the wafer A that has been inserted into the first accommodating space 311.
參閱圖6為本發明一種可緩衝之限位裝置之一第二較佳實施例,該第二較佳實施例與該第一較佳實施例大致相同,相同之處於此不再詳述,不同之處在於該第二較佳實施例沒有設置該外框固定單元,該緩衝部321直接與該測試座B連接。 Referring to FIG. 6 is a second preferred embodiment of a bufferable limiting device according to the present invention. The second preferred embodiment is substantially the same as the first preferred embodiment, and the same is not described in detail herein. The second preferred embodiment is not provided with the outer frame fixing unit, and the buffer portion 321 is directly connected to the test socket B.
較佳地,該緩衝部321於灌膠時已將該限位部312框圍起來,並形成尺寸固定之膠體,以使該緩衝部321可以容置於該測試座B的測試槽中,令該緩衝部321設置於該測試座B與該限位部312之間。 Preferably, the buffering portion 321 has been framed by the limiting portion 312 at the time of filling, and a colloid having a fixed size is formed, so that the buffering portion 321 can be received in the test slot of the test seat B. The buffer portion 321 is disposed between the test seat B and the limiting portion 312.
實際實施時,該測試座B上可以設置限位結構,用以固定該緩衝部321的位置,或是可以使用螺絲將該緩衝部321鎖設於該測試座B上,由於固定彈性之高分子材料的技術手段,以廣泛運用於市售產品中,且固定技術非本案之重點,在此不再詳加贅述。 In the actual implementation, the test seat B can be provided with a limiting structure for fixing the position of the buffering portion 321 , or the buffering portion 321 can be locked on the test socket B by using a screw, because the elastic polymer is fixed. The technical means of materials are widely used in commercially available products, and the fixed technology is not the focus of this case, and will not be described in detail here.
該第二較佳實施例之測試座B的內緣直接撐抵該緩衝部321之外緣,不僅可以使該限位部312的位置固定,更可以讓該緩衝部321提供彈力,用以緩衝該晶片 A對該限位部312的衝擊,更可以將該限位部312彈回原來的位置。 The inner edge of the test seat B of the second preferred embodiment directly supports the outer edge of the buffer portion 321 , so that the position of the limiting portion 312 can be fixed, and the buffer portion 321 can be provided with elastic force for buffering. The wafer A impact on the limiting portion 312 can further bounce the limiting portion 312 back to the original position.
參閱圖7,為本發明一種可緩衝之限位裝置之一第三較佳實施例,該第三較佳實施例與該第一較佳實施例大致相同,相同之處於此不再詳述,不同之處在於該限位部312是由複數與該緩衝部321連接之限位構件315所構成。 FIG. 7 is a third preferred embodiment of a buffer-capable device according to the present invention. The third preferred embodiment is substantially the same as the first preferred embodiment, and the same is not described in detail herein. The difference is that the limiting portion 312 is constituted by a plurality of limiting members 315 connected to the buffer portion 321 .
一般晶片A之外觀呈方形,該第三較佳實施例之限位構件315設有四個,用以分別撐抵住該晶片A的四個邊。較佳地,該複數限位構件315彼此間隔,間隔空間可以做為該第一較佳實施例之掏孔,實際實施時,該複數限位構件315可以彼此靠近,不應以此為限。 Generally, the appearance of the wafer A is square, and the limiting member 315 of the third preferred embodiment is provided with four for respectively supporting the four sides of the wafer A. Preferably, the plurality of limiting members 315 are spaced apart from each other, and the spacing space can be used as the pupil of the first preferred embodiment. In practice, the plurality of limiting members 315 can be close to each other, and should not be limited thereto.
較佳地,該複數限位構件315分別與該緩衝部321連接,該緩衝部321可以分別提供該複數限位構件315之彈力,以緩衝該晶片A置入該第一容置空間311時對該複數限位構件315的衝擊力,也可將該晶片A彈回正確的位置。 Preferably, the plurality of limiting members 315 are respectively connected to the buffering portion 321 , and the buffering portion 321 can respectively provide the elastic force of the plurality of limiting members 315 to buffer the wafer A when the first receiving space 311 is placed. The impact force of the plurality of limiting members 315 can also bounce the wafer A back to the correct position.
發明人要強調的是,該第三較佳實施例之限位部312是由複數限位構件315所組成,且每一限位構件315分別與該緩衝部321連接,因此,該緩衝部321分別提供每一限位構件315彈力,令該第一容置空間311之形狀可以改變不再固定。 The inventor has to be emphasized that the limiting portion 312 of the third preferred embodiment is composed of a plurality of limiting members 315, and each of the limiting members 315 is respectively connected to the buffering portion 321 . Therefore, the buffering portion 321 The elastic force of each of the limiting members 315 is respectively provided, so that the shape of the first accommodating space 311 can be changed and is no longer fixed.
舉例來說,當該晶片A之外緣尺寸略大於該第一容置空間311時,該複數限位構件315所形成之限位 部312,將分別藉由該緩衝部321之彈力向外撐開。不僅該晶片A放入該第一容置空間311時不會將該複數限位構件315撐壞,作業員更可以直接將該晶片A取出。 For example, when the outer edge of the wafer A is slightly larger than the first accommodating space 311, the limit formed by the plurality of limiting members 315 is formed. The portion 312 will be outwardly extended by the elastic force of the buffer portion 321 respectively. Not only when the wafer A is placed in the first accommodating space 311, but also the plurality of limiting members 315 are not broken, and the worker can directly take out the wafer A.
參閱圖8,為本發明一種可緩衝之限位裝置之一第四較佳實施例,該第四較佳實施例與該第一較佳實施例大致相同,相同之處於此不再詳述,不同之處在於該緩衝部321是由複數彈力膠體所構成。 FIG. 8 is a fourth preferred embodiment of a buffer-capable limiting device according to the present invention. The fourth preferred embodiment is substantially the same as the first preferred embodiment, and the same is not described in detail herein. The difference is that the buffer portion 321 is composed of a plurality of elastic colloids.
較佳地,該限位部312及該固定部331上分別設置複數膠體固定凹槽,用以固定該複數彈力膠體所構成之緩衝部321。 Preferably, the limiting portion 312 and the fixing portion 331 are respectively provided with a plurality of colloidal fixing grooves for fixing the buffer portion 321 formed by the plurality of elastic colloids.
當該緩衝部321由一整塊膠體變成了複數小塊膠體後,所提供之彈力會變得比較小,因此可提供之緩衝力道較佳,以使該晶片A置入該第一容置空間311時所產生的衝擊力,都會被該緩衝部321所吸收。 When the buffer portion 321 is changed from a single piece of colloid to a plurality of small pieces of colloid, the elastic force provided will become relatively small, so that a buffering force can be provided, so that the wafer A is placed in the first receiving space. The impact force generated at 311 is absorbed by the buffer portion 321.
參閱圖9,為本發明一種可緩衝之限位裝置之一第五較佳實施例,該第五較佳實施例與該第三較佳實施例大致相同,相同之處於此不再詳述,不同之處在於該緩衝部321是由彈性金屬所構成。 FIG. 9 is a fifth preferred embodiment of a buffer-capable limiting device according to the present invention. The fifth preferred embodiment is substantially the same as the third preferred embodiment, and the same is not described in detail herein. The difference is that the buffer portion 321 is made of an elastic metal.
彈性金屬可做成多種結構,該第五較佳實施例是使用複數彈簧,實際實施實,可以使用彈片、簧片等其他的彈性金屬結構,再搭配滑塊產生滑動功效。由於以彈性金屬之緩衝結構,已為業界所知悉,並廣泛運用於市售產品中,在此不再詳加贅述。 The elastic metal can be made into a variety of structures. The fifth preferred embodiment uses a plurality of springs. Actually, other elastic metal structures such as springs and reeds can be used, and the slider can be used to produce a sliding effect. Due to the buffer structure of the elastic metal, it has been known to the industry and is widely used in commercially available products, and will not be described in detail herein.
雖然使用彈性金屬所構成的緩衝部321結構 較為複雜,但是彈性金屬之耐用度高於具有彈性之高分子材料,可以提升晶片A測試的次數,有效提升限位裝置的使用壽命。 Although the buffer portion 321 structure composed of an elastic metal is used More complicated, but the durability of the elastic metal is higher than that of the elastic polymer material, which can increase the number of wafer A tests and effectively improve the service life of the limit device.
發明人要強調的是,使用彈性金屬所構成的緩衝部321可以調整彈力,一般可以使用止付螺絲對彈性金屬進行調整,以使該緩衝部321具有足夠的彈力將該晶片A彈至正確的位置,也具有足夠的緩衝力讓機器手臂可以將置入該第一容置空間311的晶片A取出,當然,實際實施時並不以此為限。 The inventors have emphasized that the elastic portion can be adjusted by using the buffer portion 321 made of an elastic metal. Generally, the elastic metal can be adjusted by using a stop screw so that the buffer portion 321 has sufficient elasticity to spring the wafer A to the correct one. The position also has sufficient cushioning force for the robot arm to take out the wafer A placed in the first accommodating space 311. Of course, the actual implementation is not limited thereto.
參閱圖10、為本發明一種可緩衝之限位裝置之一第六較佳實施例,該第六較佳實施例與該第五較佳實施例大致相同,相同之處於此不再詳述,不同之處在於該可緩衝之限位裝置更包含一隔離單元34。 FIG. 10 is a sixth preferred embodiment of a buffer-capable limiting device according to the present invention. The sixth preferred embodiment is substantially the same as the fifth preferred embodiment, and the same is not described in detail herein. The difference is that the bufferable limiting device further comprises an isolation unit 34.
該隔離單元34包括一與該固定部331連接之外部隔離層341。該外部隔離層341用以將該緩衝部321與外界隔離,較佳地,該外部隔離層341使用鋁片,實際實施實,可以使用其它隔離材,不應以此為限。 The isolation unit 34 includes an outer isolation layer 341 connected to the fixing portion 331. The external isolation layer 341 is used to isolate the buffer portion 321 from the outside. Preferably, the external isolation layer 341 is made of an aluminum sheet. Actually, other spacer materials may be used, and should not be limited thereto.
當該緩衝部321每一次緩衝該晶片A對該限位部312之衝擊力時,金屬會摩擦會產生粉塵,該外部隔離層341可以阻擋粉塵。除此之外,使用彈性金屬之緩衝部321也必須避免異物進入金屬的活動空間,避免干涉彈性金屬的彈力,該外部隔離層341更可以避免外力破壞該緩衝部321。其中,該隔離單元34並不限定設置於使用彈性金屬之緩衝部321,也可以使用於高分子材料所構成的 緩衝部321。 When the buffer portion 321 buffers the impact force of the wafer A on the limiting portion 312 every time, the metal may generate dust by friction, and the outer isolation layer 341 can block dust. In addition, the buffer portion 321 using the elastic metal must also prevent foreign matter from entering the movable space of the metal to avoid interference with the elastic force of the elastic metal, and the outer spacer layer 341 can further prevent the external force from damaging the buffer portion 321 . The isolation unit 34 is not limited to the buffer portion 321 which is provided with an elastic metal, and may be used for a polymer material. Buffer portion 321.
參閱圖11、為本發明一種可緩衝之限位裝置之一第七較佳實施例,該第七較佳實施例與該第六較佳實施例大致相同,相同之處於此不再詳述,不同之處在於該隔離單元34更包括一與該固定部331連接之內部隔離層342。 Referring to FIG. 11, a seventh preferred embodiment of a buffer-capable limiting device of the present invention is substantially the same as the sixth preferred embodiment, and the same is not described in detail herein. The difference is that the isolation unit 34 further includes an internal isolation layer 342 connected to the fixing portion 331.
該內部隔離層342用以將該緩衝部321與該測試座B隔離。該內部隔離層342使用鋁片,實際實施實,可以使用其它隔離材,不應以此為限。該內部隔離層342可以將該緩衝部321與測試座B隔離,以避免異物掉入該測試座B,而影響該晶片A的電性測試。 The inner isolation layer 342 is used to isolate the buffer portion 321 from the test socket B. The inner isolation layer 342 is made of an aluminum sheet. Actually, other spacer materials can be used, and should not be limited thereto. The inner isolation layer 342 can isolate the buffer portion 321 from the test socket B to prevent foreign matter from falling into the test socket B, thereby affecting the electrical test of the wafer A.
由上述說明可知,本發明可緩衝之限位裝置確實具有下列功效: It can be seen from the above description that the bufferable limit device of the present invention does have the following effects:
一、延長壽命:該限位部312使用堅硬的剛性材質,可以減低該晶片A對該限位部312衝擊時所造成的磨損,有效延長限位裝置的使用壽命。 1. Extending the life: the limiting portion 312 uses a rigid rigid material, which can reduce the wear caused by the wafer A against the limiting portion 312, and effectively extend the service life of the limiting device.
二、緩衝衝擊:當機器手臂將該晶片A放置於該第一容置空間311時,該晶片A有機會碰觸到該緩衝導角313,藉由該緩衝部321具有彈性的特性,該限位部312的位置可以順勢偏移,以緩衝該晶片A對該限位部的衝擊。 2. Buffering impact: when the robot arm places the wafer A in the first accommodating space 311, the wafer A has a chance to touch the buffering lead angle 313, and the buffering portion 321 has elastic characteristics. The position of the bit portion 312 can be offset to offset the impact of the wafer A on the stop portion.
三、定位正確:具有彈力之緩衝部321可以將偏移位置之限 位部312彈回正確的位置,以使容置於該第一容置空間311的晶片A位置正確,以使該測試座B對該晶片A進行電性測試。 Third, the positioning is correct: the elastic buffer portion 321 can limit the offset position The position 312 bounces back to the correct position so that the position of the wafer A accommodated in the first accommodating space 311 is correct, so that the test stand B can electrically test the wafer A.
綜上所述,本發明利用該緩衝部321具有彈性的特性,可以緩衝該晶片A置入該第一容置空間311時對該限位部312所造成的衝擊力,再利用該緩衝部321的彈力,將該晶片A移動至正確位置,以使該測試座B可以對該晶片A進行電性測試,故確實可以達成本發明之目的。 In summary, the present invention utilizes the buffer portion 321 to have an elastic property, and can buffer the impact force of the limiting portion 312 when the wafer A is placed in the first receiving space 311, and the buffer portion 321 is reused. The elastic force moves the wafer A to the correct position so that the test stand B can perform electrical test on the wafer A, so that the object of the present invention can be achieved.
惟以上所述者,僅為本發明之七個較佳實施例而已,當不能以此限定本發明實施之範圍,即大凡依本發明申請專利範圍及發明說明內容所作之簡單的等效變化與修飾,皆仍屬本發明專利涵蓋之範圍內。 However, the above is only the seven preferred embodiments of the present invention, and the scope of the invention is not limited thereto, that is, the simple equivalent changes made by the scope of the invention and the description of the invention are Modifications are still within the scope of the invention.
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TWM469491U (en) * | 2013-09-05 | 2014-01-01 | Chroma Ate Inc | Inspection device with dual-axis positioning mechanism |
TWM514004U (en) * | 2015-07-30 | 2015-12-11 | Cheng Yun Technology Co Ltd | Integrated circuit inspection device and inspection equipment |
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