TWI640435B - Refractive index matching film and ito conductive film - Google Patents

Abstract

The invention discloses a refractive index matching film and an ITO conductive film. The refractive index matching film includes a first low-refractive optical matching layer, a substrate, and an anti-blocking and hardening layer, which are sequentially stacked, and a material of the first low-refractive optical matching layer includes a mixture of a fluorine-containing compound and a metal oxide. The invention also discloses that an ITO conductive film is formed by sequentially stacking a second low-refractive optical matching layer and an ITO conductive layer on the refractive index matching film. Through the optimization of the material of the first low-refractive index matching layer of the present invention, the material of the first low-refractive index matching layer not only maintains the product performance, but also significantly reduces the cost, and takes into account ink printing, yellow light, and laser processes; meanwhile, it uses the high refractive index of the substrate itself. The coating of the first low-refractive optical matching layer can reduce the thickness of subsequent plating layers, increase the speed of the plating film, and effectively reduce the cost of the ITO conductive film.

Description

   Refractive index matching film and ITO conductive film   

The invention belongs to the field of optical technology, and particularly relates to a refractive index matching film and an ITO conductive film.

In the current capacitive touch panels of mobile phones and tablet computers, the most widely used transparent conductive film is an ITO (Indium Tin Oxide) conductive film. In the actual production of conductive films, there are two types of processes according to the substrate: the first type is glass-based ITO film (hereinafter referred to as ITO Glass), such as in-cell or OGS (One Glass Solution), which is directly spattered on glass ITO film; the second type is ITO conductive film (hereinafter referred to as ITO film) based on flexible plastic substrate (PET). The second process route is based on flexible substrates, which is suitable for large-scale rapid roll-to-roll production. The cost of the substrate and process is lower than that of ITO Glass, and it has good optoelectronic and mechanical characteristics. It is currently used in smart phones and tablets. Widely used on computers.

Common PET substrate films for ITO film are divided into two types: Hard-coated-PET and Index-Matched PET, which are called double-sided hardened films and refractive index matching films, hereinafter referred to as HC-PET and IM-PET. See this application People have previously applied for patents CN103756383A and CN104485156A. Generally, the structure of HC-PET substrate is coated with a hardened layer and an anti-blocking hardened layer on both sides of the base material. The thickness of the hardened layer is 4 ~ 4.5μm and the refractive index is 1.5 ~ 1.52. The thickness of the anti-blocked hardened layer is 2 ~ 4μm, refractive index is 1.5 ~ 1.52. The IM-PET substrate structure is coated with a hardened layer on one side of the substrate and coated with a refractive index matching layer on the other side. The thickness of the refractive index matching layer is 0.8 to 1.5 μm and the refractive index is 1.6 to 1.75; the thickness of the hardened layer is 4 to 4.5 μm, refractive index is 1.5 ~ 1.52.

The two substrates can meet the basic requirements of the existing ITO film for touch screens. The difference lies in the different optical refractive indices of the substrates, which results in different matching optical layers in subsequent coatings in order to achieve the effect of transparent conductivity. The detailed structure of the PVD coating based on the above two substrates is detailed in the patent applications CN104240799A and CN104485156A previously submitted by the applicant. For example, the surface refractive index of HC-PET is relatively low (about 1.52). The above physical vapor deposition coating (hereinafter referred to as PVD coating) film layer is "high-fold layer + low-fold layer + ITO layer". The total thickness of the coating is about 100nm. Etching The pattern is not obvious, and it is commonly used in ink printing and yellow light process. The thickness of the coating is thicker and the coating speed is slower. The refractive index of the IM-PET surface is higher than that of the HC-PET surface layer (about 1.66). The PVD coating layer is on the top. It is a "low-fold layer + ITO layer". The total thickness of the plating layer is about 42nm. The etching pattern using the wide line width etching process is obvious. It is often used in yellow light and laser processes with narrow line widths. The thickness of the coating is thinner and can be higher. Speed production. In general, the obvious degree of the etched pattern is related to the difference between the visible light transmission and reflection of the ITO etched channel and the ITO non-etched region. The smaller the difference, the less obvious the etched pattern.

Since 2013, the average unit price of capacitive panels has dropped by more than 20%, and gross profit margin has dropped significantly. In order to gain a foothold in the red sea ITO film market, controlling product costs is especially critical. PET substrates account for about 40% of the cost of ITO film. In addition, the depreciation of the high-end imported equipment used also accounts for more than 10% of the cost. If the cost of the substrate can be reduced and the coating speed can be increased, the cost can be effectively reduced and the cost Market competitiveness of ITO film products.

It can be seen from the above prior art that the cost of HC-PET-based ITO film mainly comes from coating hardened layers and coatings. The disadvantage is that the total thickness of the PVD coating is about 100nm, the coating travel speed is slow, and the coating cost is high; the advantage is that the ITO etching area The difference between the spectrum and color of the non-etched area is small, and the etched pattern is almost invisible, which is suitable for ink printing and yellow light process. The cost of IM-PET-based ITO film mainly comes from coating hardened layer and refractive index matching layer. The advantage is that the total thickness of the coating is less than 50nm, and the coating speed is fast. The disadvantages are the high cost of the refractive matching layer and the spectrum of ITO etched and non-etched areas. It has a large difference with color, and is often used in yellow light and laser etching processes with narrow line width.

The cost of the above two substrates and the prepared ITO conductive film are relatively high, and it is difficult to balance ink printing, yellow light, and laser processes. Therefore, it is necessary to propose a new refractive index matching film and an ITO conductive film.

An object of the present invention is to provide a refractive index matching film to reduce costs while taking into account ink printing, yellow light, and laser processes, and using the high refractive index characteristics of the substrate itself, coating a first low refractive index on the substrate The optical matching layer can reduce the thickness of subsequent coatings and increase the coating speed.

In order to achieve the above object, the present invention provides a refractive index matching film including a first low-refractive optical matching layer, a substrate, and an anti-blocking and hardening layer which are sequentially stacked. The material of the first low-refractive optical matching layer includes a fluorine-containing compound and A mixture of metal oxides.

Further, the thickness of the first low-refractive optical matching layer is 10-50 nm, and the refractive index is 1.3-1.55.

Further, the metal oxide accounts for 20 to 40% by weight of the mixture, and preferably, the metal oxide accounts for 20 to 30% by weight of the mixture.

Further, the fluorine-containing compound is one or more of hexafluoroacrylate, dodecafluoroacrylate, and fluorine-containing polyurethane acrylate.

Further, the metal oxide is one or more of zirconium dioxide, aluminum oxide, zinc oxide, and antimony oxide.

Further, the thickness of the anti-blocking hardened layer 20 is 1 to 5 μm, and the refractive index is 1.5 to 1.52.

Further, the substrate 10 includes a polyester film layer 11 and precoat layers 12 formed on both sides of the polyester film layer 11.

Further, the thickness of the polyester film layer 11 is 50 to 125 μm, and the thickness of the pre-coat layer 12 on one side of the polyester film layer 11 is 60 to 120 nm.

Further, the refractive index of the polyester film layer 11 is 1.63 to 1.65, and the refractive index of the pre-coat layer 12 is 1.575 to 1.58.

Another object of the present invention is to provide a low-cost ITO conductive film with a thin thickness and a fast coating speed.

In order to achieve the above object, the present invention provides an ITO conductive film, and a second low refractive optical matching layer and an ITO conductive layer are sequentially stacked on the first low refractive optical matching layer of the refractive index matching film.

Further, the thickness of the second low-refractive optical matching layer is 5 to 40 nm, the refractive index is 1.3 to 1.6, and the material is SiOx.

Further, the thickness of the ITO conductive layer is 19 to 22 nm, and the refractive index is 2.0.

Further, the ITO conductive film further includes a high-refractive optical matching layer disposed between the first low-refractive optical matching layer 3 and the second low-refractive optical matching layer.

Further, the thickness of the high-refractive optical matching layer is 2 to 10 nm, the refractive index is 2.0 to 2.5, and the materials are SiNx and Nb2O5.

Compared with the prior art, the present invention has the following beneficial effects:

1. The refractive index matching film of the present invention is directly coated with a first low-refractive optical matching layer on the substrate. By reducing the thickness of the first low-refractive optical matching layer and optimizing the material of the layer, it is compared with the original HC-PET and IM-PET substrate not only maintains product performance, but also significantly reduces the cost of the refractive index matching film. At the same time, using the high refractive index characteristics of the substrate itself, coating a first low refractive optical matching layer on the substrate can reduce subsequent The thickness of the coating layer increases the speed of the coating film and effectively reduces the cost of the ITO conductive film.

2. The refractive index matching film of the present invention is applicable to both laser and yellow light processes with narrow line widths, and yellow light and ink printing processes with wide line widths. .

1‧‧‧ refractive index matching film

2‧‧‧Second Low Refractive Optical Matching Layer

3‧‧‧ITO conductive layer

4‧‧‧ High refractive optical matching layer

10‧‧‧ Substrate

11‧‧‧ polyester film layer

12‧‧‧ pre-coated

20‧‧‧Anti-blocking hardening layer

30‧‧‧The first low refractive optical matching layer

FIG. 1 shows a schematic diagram of a refractive index matching film according to the present invention.

FIG. 2 is a schematic diagram showing the structure of an ITO conductive film in an embodiment of the present invention.

FIG. 3 shows a schematic structural diagram of an ITO conductive film in another embodiment of the present invention.

FIG. 4 shows a reflection spectrum diagram of an ITO conductive film before and after etching according to Embodiment 4 of the present invention.

FIG. 5 shows a reflection spectrum diagram of the ITO conductive film before and after etching according to Embodiment 7 of the present invention.

In order to enable those skilled in the art to better understand the solutions of the present invention, the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only The embodiments are part of the present invention, but not all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by a person of ordinary skill in the art without creative efforts should fall within the protection scope of the present invention.

It should be noted that the terms "first", "second", "upper", "lower" and the like in the description and claims of the present invention and the above-mentioned drawings are used to distinguish similar items, and do not have to be used for Describe a specific order or sequence. It should be understood that the materials so used are interchangeable under appropriate circumstances in order to facilitate the embodiments of the invention described herein. Furthermore, the terms "including" and "having" and any of their variations are intended to cover non-exclusive inclusions, for example, a process, method, system, product, or device that includes a series of steps or units need not be limited to those explicitly listed Those steps or units may instead include other steps or units not explicitly listed or inherent to these processes, methods, products or equipment.

It can be known from the background art that in the prior art, the overall thickness of the two substrate films of HC-PET and IM-PET is thick, the cost is high, and it is difficult to take into account the ink printing, yellow light, and laser processes. The inventor of the present invention has studied the above problems and proposed a new refractive index matching film. As shown in FIG. 1, the refractive index matching film 1 includes a first low-refractive optical matching layer 30 and a substrate 10 that are sequentially stacked. The anti-blocking hardening layer 20 and the material of the first low-refractive optical matching layer 30 are a mixture of a fluorine-containing compound and a metal oxide. The refractive index matching film 1 can take into account ink printing, yellow light, and laser processes, and utilizes the high refractive index characteristics of the substrate 10 itself. Coating the substrate 10 with a first low-refractive optical matching layer 30 can reduce subsequent coating thickness. , Increase the coating film speed, effectively reduce the cost of ITO conductive film.

In the refractive index matching film 1, the thickness of the first low-refractive optical matching layer 30 is preferably 10 to 50 nm and the refractive index is 1.3 to 1.55. Compared with the original HC-PET and IM-PET substrate films, the product performance is excellent, and The thickness of the refractive index matching film 1 is reduced, and the cost of the refractive index matching film 1 is significantly reduced.

In the refractive index matching film 1, the metal oxide accounts for 20 to 40% of the weight of the mixture, preferably, the metal oxide accounts for 20 to 30% of the weight of the mixture, and the weight of the metal oxide is limited to the above range, which can ensure that A low-refractive optical matching layer 30 has a sufficiently low refractive index while maintaining the surface properties of the refractive index matching film 1. Wherein, the fluorine-containing compound in the first low-refractive optical matching layer 30 mainly provides low-refractive properties, and may be, for example, one or more of hexafluoroacrylate, dodecylfluoroacrylate, and fluorine-containing polyurethane acrylate. The metal oxide may be a material commonly used in the art, and is mainly used to adjust the surface characteristics of the refractive index matching film 1 and increase the adhesion of subsequent plating layers. Preferably, the metal oxide is selected from any one or more of zirconia, alumina, zinc oxide and antimony oxide. Of course, the type of metal oxide is not limited to the above-mentioned preferred embodiments.

In the refractive index matching film 1 described above, the anti-blocking hardened layer 20 may be any hardened coating for preventing blocking, and its thickness and refractive index may be set according to actual needs. In a preferred embodiment, the thickness of the anti-blocking hardened layer 20 is 1 to 5 μm, and the refractive index is 1.5 to 1.52.

In the refractive index matching film 1, the substrate 10 may include a polyester film layer 11 and precoat layers 12 formed on both side surfaces of the polyester film layer 11. The polyester film layer 11 is a polyester-based resin, such as a polyethylene terephthalate (PET) resin. The pre-coating layer 12 may be an adhesive, for example, composed of a hot-melt adhesive or an organic polymer low-temperature resin. Those skilled in the art can set the thickness and refractive index of the substrate 10 according to actual needs. Preferably, the thickness of the polyester film layer 11 is 50 to 125 μm, the thickness of the precoat layer 12 on one side of the polyester film layer 11 is 60 to 120 nm, and the refractive index of the polyester film layer 11 is 1.63 to 1.65. The refractive index of the pre-coat layer 12 is 1.575 to 1.58.

At the same time, the present invention also provides an ITO conductive film based on the above-mentioned refractive index matching film. The overall thickness of the ITO conductive film is thin, the coating speed is fast, and the cost is low.

In a preferred embodiment, the ITO conductive film of the present invention is shown in FIG. 1 and FIG. 2. A second low-refractive optical layer is sequentially stacked on the first low-refractive optical matching layer 30 of the refractive index matching film 1. Matching layer 2 and ITO conductive layer 3. By providing a second low-refractive optical matching layer 2 on the first low-refractive optical matching layer 30, the main purpose is to reduce the roughness of the first low-refractive optical matching layer 30 and adjust the etching chromatic aberration. The ITO conductive film thus prepared can be used in yellow light and laser etching processes with narrow line widths.

In the above ITO conductive film, the thickness and refractive index of the second low-refractive optical matching layer 2 can be set according to actual needs. Preferably, the thickness of the second low-refractive optical matching layer 2 is 5 to 40 nm, the refractive index is 1.3 to 1.6, and the material is SiOx.

In the above ITO conductive film, the thickness and refractive index of the ITO conductive layer 3 can be set according to actual needs. Preferably, the thickness of the ITO conductive layer 3 is 19 to 22 nm, and the refractive index is 2.0.

In another preferred embodiment, the ITO conductive film of the present invention, as shown in FIG. 1 and FIG. 3, further includes an ITO conductive film disposed between the first low-refractive optical matching layer 30 and the second low-refractive optical matching layer 2. High refractive optical matching layer 4. As a result, two pairs of high and low refractive index matching layers are formed. The ITO conductive film has a small difference in spectrum and color between the etched and non-etched areas, and the etched pattern is almost invisible. It can be used for ink printing and yellow light with wider line width.

In the above ITO conductive film, the material of the high-refractive optical matching layer 4 is SiNx and Nb ₂ O ₅ , and the material of the second low-refractive optical matching layer 2 is SiOx. The thickness and refractive index of the high-refractive optical matching layer 4 and the second low-refractive optical matching layer 2 can be set according to actual needs. Preferably, the high-refractive optical matching layer 4 has a thickness of 2 to 10 nm and a refractive index of 2.0 to 2.5; the second low-refractive optical matching layer 2 has a thickness of 5 to 40 nm and a refractive index of 1.3 to 1.6. Limiting the thickness to the above range reduces the thickness of the coating compared to the original ITO conductive film based on HC-PET substrate, the speed of the coating becomes faster, and the cost of the coating is reduced.

In the above ITO conductive film, a process of providing the high-refractive optical matching layer 4, the second low-refractive optical matching layer 2, and the ITO conductive layer 3 on the refractive index matching film 1 may be a vapor deposition method, a sputtering method, an ion plating method, The processes of electroplating and chemical vapor deposition are prior art in the art, and will not be repeated here.

The beneficial effects of the present invention will be further described below in combination with the examples and comparative examples. Obviously, the described embodiments are only a part of the embodiments of the present invention, but not all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by a person of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.

Example 1

This embodiment provides a refractive index matching film 1. As shown in FIG. 1, the refractive index matching film 1 includes a first low-refractive optical matching layer 30, a substrate 10, and an anti-blocking hardening layer 20. The substrate 10 includes a polyester film. Layer 11 and precoat layers 12 formed on both side surfaces of the polyester film layer 11. The material of the first low-refractive optical matching layer 30 is a mixture of dodecafluoroacrylate and metal oxide, and the metal oxide accounts for 20% of the weight of the mixture. The thickness of the first low-refractive optical matching layer 30 is 10 nm. , The refractive index is 1.3; the thickness of the polyester film layer 11 is 50 μm, and the refractive index is 1.65; the pre-coat layer 12 is composed of a phenol resin with a thickness of 60 nm and a refractive index of 1.575; the thickness of the anti-blocking hardened layer 20 is 1 μm, The refractive index is 1.5.

Example 2

This embodiment provides a refractive index matching film 1. As shown in FIG. 1, the refractive index matching film 1 includes a first low-refractive optical matching layer 30, a substrate 10, and an anti-blocking hardening layer 20. The substrate 10 includes a polyester film. Layer 11 and precoat layers 12 formed on both side surfaces of the polyester film layer 11. The material of the first low-refractive optical matching layer 30 is a mixture of hexafluoroacrylate and a metal oxide, and the metal oxide accounts for 40% of the weight of the mixture. The thickness of the first low-refractive optical matching layer 30 is 50 nm. The refractive index is 1.55; the thickness of the polyester film layer 11 is 125 μm and the refractive index is 1.63; the pre-coating layer 12 is composed of a phenol resin with a thickness of 120 nm and a refractive index of 1.575; the thickness of the anti-blocking hardened layer 20 is 5 μm and is refracted The rate is 1.52.

Example 3

This embodiment provides a refractive index matching film 1. As shown in FIG. 1, the refractive index matching film 1 includes a first low-refractive optical matching layer 30, a substrate 10, and an anti-blocking hardening layer 20. The substrate 10 includes a polyester film. Layer 11 and precoat layers 12 formed on both side surfaces of the polyester film layer 11. Wherein, the material of the first low-refractive optical matching layer 30 is a mixture of a fluorine-containing urethane acrylate and a metal oxide, and the metal oxide accounts for 30% of the weight of the mixture. The thickness of the layer is 30 nm and the refractive index is 1.4; The thickness of the ester film layer 11 is 100 μm, and the refractive index is 1.64. The pre-coat layer 12 is composed of a phenol resin with a thickness of 80 nm and a refractive index of 1.58. The thickness of the anti-blocking hardened layer 20 is 3 μm and the refractive index is 1.51.

Example 4

This embodiment provides an ITO conductive film. As shown in FIGS. 1 and 2, a second low-refractive optical matching layer with a thickness of 5 nm is sequentially plated on the first low-refractive optical matching layer 30 of the refractive index matching film 1 of the first embodiment. 2. 19nm ITO conductive layer 3. The material of the second low-refractive optical matching layer 2 is SiOx and the refractive index is 1.3; the refractive index of the ITO conductive layer 3 is 2.0.

Example 5

This embodiment provides an ITO conductive film. As shown in FIGS. 1 and 2, a second low-refractive optical matching layer of 40 nm is sequentially plated on the first low-refractive optical matching layer 30 of the refractive index matching film 1 of the first embodiment. 2. 22nm ITO conductive layer 3. The material of the second low-refractive optical matching layer 2 is SiOx and the refractive index is 1.5; the refractive index of the ITO conductive layer 3 is 2.0.

Example 6

This embodiment provides an ITO conductive film. As shown in FIGS. 1 and 2, a second low-refractive optical matching layer of 20 nm is sequentially plated on the first low-refractive optical matching layer 30 of the refractive index matching film 1 of the first embodiment. 2. 20nm ITO conductive layer 3. The material of the second low-refractive optical matching layer 2 is SiOx and the refractive index is 1.3; the refractive index of the ITO conductive layer 3 is 2.0.

Example 7

This embodiment provides an ITO conductive film. As shown in FIGS. 1 and 3, a high-refractive optical matching layer 4 of 2 nm is sequentially plated on the first low-refractive optical matching layer 30 of the refractive index matching film 1 of the first embodiment. A 5 nm second low-refractive optical matching layer 2 and a 19 nm ITO conductive layer 3. The material of the high-refractive optical matching layer 4 is SiNx and Nb ₂ O ₅ with a refractive index of 2.0; the material of the second low-refractive optical matching layer 2 is SiOx and the refractive index is 1.3; the refractive index of the ITO conductive layer 3 is 2.0 .

Example 8

This embodiment provides an ITO conductive film. As shown in FIGS. 1 and 3, a 10-nm high-refractive optical matching layer 4 is sequentially plated on the first low-refractive optical matching layer 30 of the refractive index matching film 1 of the embodiment 1. 40nm second low-refractive optical matching layer 2 and 22nm ITO conductive layer 3. The material of the high-refractive optical matching layer 4 is SiNx and Nb ₂ O ₅ with a refractive index of 2.5; the material of the second low-refractive optical matching layer 2 is SiOx and the refractive index is 1.6; the refractive index of the ITO conductive layer 3 is 2.0 .

Example 9

This embodiment provides an ITO conductive film. As shown in FIGS. 1 and 3, a 5 nm high-refractive optical matching layer 4 is sequentially plated on the first low-refractive optical matching layer 30 of the refractive index matching film 1 of the first embodiment. 10nm second low-refractive optical matching layer 2 and 20nm ITO conductive layer 3. The material of the high-refractive optical matching layer 4 is SiNx and Nb ₂ O ₅ with a refractive index of 2.2; the material of the second low-refractive optical matching layer 2 is SiOx and the refractive index is 1.6; the refractive index of the ITO conductive layer 3 is 2.0 .

Comparative Example 1

This comparative example provides a HC-PET film including a hardened layer, a substrate, and an anti-blocking hardened layer that are sequentially stacked, and the substrate includes a polyester film layer and precoat layers formed on both sides of the polyester film layer. . Among them, the thickness of the hardened layer is 4um and the refractive index is 1.5; the thickness of the polyester film layer is 125μm and the refractive index is 1.65; the precoat layer is composed of a phenolic resin with a thickness of 120nm and the refractive index of 1.58; the anti-blocking hardened layer The thickness is 3 μm and the refractive index is 1.5.

On the hardened layer of the HC-PET film of this comparative example, a high-refractive optical matching layer of 10 nm, a low-refractive optical matching layer of 70 nm, and an ITO conductive layer of 20 nm were sequentially arranged. The material of the high-refractive optical matching layer is SiNx and Nb ₂ O ₅ , and the refractive index is 2.0; the material of the low-refractive optical matching layer is SiOx, the refractive index is 1.3; and the refractive index of the ITO conductive layer is 2.0.

Comparative Example 2

This comparative example provides an IM-PET film, which includes a refractive index matching layer, a substrate, and an anti-blocking hardened layer that are sequentially stacked, and the substrate includes a polyester film layer and pre-forms formed on both sides of the polyester film layer. coating. Among them, the thickness of the refractive index matching layer is 1 μm and the refractive index is 1.65; the thickness of the polyester film layer is 125 μm and the refractive index is 1.65; the pre-coating layer is composed of a phenol resin with a thickness of 120 nm and a refractive index of 1.58; anti-blocking The thickness of the hardened layer was 4 μm, and the refractive index was 1.5.

A 20 nm low-refractive optical matching layer and a 20 nm ITO conductive layer were sequentially arranged on the refractive index matching layer of the IM-PET film of this comparative example. The material of the low-refractive optical matching layer is SiOx and the refractive index is 1.3; the refractive index of the ITO conductive layer is 2.0.

The color spectrum tester ColorQuest XE from Hunterlab was used to perform reflection spectrum test on the ITO conductive films of Examples 4 and 7 of the present invention. The test results are shown in Figures 4 and 5, where the solid line represents the reflection spectrum before the ITO-containing conductive layer is etched, and the dashed line represents the reflection spectrum after the ITO conductive layer is etched. It can be seen that the reflection spectrum of FIG. 5 is smaller than that of FIG. 4 before and after the etching, and the etching pattern is not obvious. Therefore, the ITO conductive film structure shown in Embodiment 4 of the present invention can be applied to laser and yellow light processes with narrow line widths, while the ITO conductive film structure shown in Embodiment 5 can be used with yellow light and inks with wide line widths. printing art.

It can be seen from the above embodiments that the refractive index matching film of the present invention uses the high refractive index of the substrate to coat a first low-refractive layer. By optimizing the material of the first low-refractive matching layer, the product performance is maintained, And can take into account ink printing, yellow light and laser technology. It can be clearly seen from Examples 1 to 3 that the thickness of the first low-refractive matching layer in the refractive index matching film of the present invention is reduced from 4um to less than 50nm with respect to the thickness of the hardened layer of the HC-PET substrate film in Comparative Example 1, relative to The thickness of the refractive index matching layer of the IM-PET substrate film in Comparative Example 2 was reduced from 1 um to 50 nm or less. The cost of the refractive index matching film of the present invention is reduced by more than 30%. It can be further seen from Examples 7 to 9 that, compared with the ITO conductive film of Comparative Example 1, the thickness of the plating layer of the ITO conductive film of the present invention is reduced from 100 nm to 70 nm or less. It can be seen from the above that the thickness of the refractive index matching film and the ITO conductive film of the present invention is significantly reduced, the travel speed of the plating film can be increased from 3 m / min to 5.5 m / min, and the overall cost of the ITO conductive film is reduced by 20-30%.

It should be noted that the specific implementation mode is only an explanation of the technical solution of the present invention, and should not be construed as a limitation on the technical solution of the present invention. Any application that adopts the essential inventive content of the present invention with only partial changes should still fall into the present invention. Within the scope of the invention. .

Claims (14)

A refractive index matching film, characterized in that the refractive index matching film includes a first low-refractive optical matching layer, a substrate, and an anti-blocking and hardening layer which are sequentially stacked, and a material of the first low-refractive optical matching layer includes a fluorine-containing compound. And the metal oxide, the refractive index of the substrate is higher than the refractive index of the first low-refractive optical matching layer. The refractive index matching film according to item 1 of the scope of the patent application, wherein the first low-refractive optical matching layer has a thickness of 10 to 50 nm and a refractive index of 1.3 to 1.55. The refractive index matching film according to item 1 of the scope of patent application, wherein the metal oxide accounts for 20 to 40% of the weight of the mixture. The refractive index matching film according to item 1 of the scope of patent application, wherein the fluorine-containing compound is one or more of hexafluoroacrylate, dodecylfluoroacrylate, and fluorine-containing polyurethane acrylate. The refractive index matching film according to item 1 of the scope of patent application, wherein the metal oxide is one or more of zirconium dioxide, aluminum oxide, zinc oxide, and antimony oxide. The refractive index matching film according to item 1 of the scope of the patent application, wherein the anti-blocking hardened layer has a thickness of 1 to 5 μm and a refractive index of 1.5 to 1.52. The refractive index matching film according to item 1 of the patent application scope, wherein the substrate comprises a polyester film layer and pre-coating layers formed on both sides of the polyester film layer. The refractive index matching film according to item 7 of the scope of the patent application, wherein the thickness of the polyester film layer is 50-125 μm, and the thickness of the pre-coat layer on one side of the polyester film layer is 60 ~ 120nm. The refractive index matching film according to item 7 of the scope of the patent application, wherein the refractive index of the polyester film layer is 1.63 to 1.65, and the refractive index of the precoat layer is 1.575 to 1.58. An ITO conductive film, characterized in that a second low-refractive optical matching layer is sequentially stacked on the first low-refractive optical matching layer of the refractive index matching film according to any one of claims 1 to 9 of the patent application scope. Layer and ITO conductive layer. The ITO conductive film according to item 10 of the patent application scope, wherein the thickness of the second low-refractive optical matching layer is 5 to 40 nm, the refractive index is 1.3 to 1.6, and the material is SiOx. The ITO conductive film according to item 10 of the scope of patent application, characterized in that the thickness of the ITO conductive layer is 19 to 22 nm and the refractive index is 2.0. For example, the ITO conductive film according to any one of the tenth to twelve patent applications, characterized in that the ITO conductive film further includes a layer disposed between the first low-refractive optical matching layer and the second low-refractive optical matching layer. High refractive optical matching layer. The ITO conductive film according to item 13 of the scope of the patent application, wherein the high refractive optical matching layer has a thickness of 2 to 10 nm, a refractive index of 2.0 to 2.5, and a material of SiNx and Nb ₂ O ₅ .