TWI635951B - Method for producing flexible copper-clad laminated plate - Google Patents

Abstract

The present invention provides a flexible copper-clad laminate having excellent flexibility by a simple method using a pair of hot-pressing rollers.

The invention provides a method for manufacturing a flexible copper-clad laminated board, which comprises the steps of heating and pressing a laminated body (B) of a copper foil (A), a polyimide film, and the like using a hot pressing roller. And a reheating step; wherein the polyimide layer of the aforementioned laminated body (B) is composed of a plurality of polyimide layers having a thermoplastic polyimide layer (ii) as an adhesive layer, and heat-pressed The lamination temperature T1 of the step is equal to or higher than the glass transition temperature of the thermoplastic polyimide layer (ii), and the heat treatment temperature T2 in the reheating step is set to be T1 or higher, so that the copper foil ( A) Diffraction intensity (I) of the (200) plane obtained by X-ray diffraction in the thickness direction, and (200) plane diffraction intensity (X) of X-ray diffraction of fine powder copper ( The relationship of Io) becomes I / Io> 100.

Description

Manufacturing method of flexible copper-clad laminated board

The present invention relates to a method for manufacturing a flexible copper-clad laminated board for a flexible circuit board. The flexible circuit board is suitable for housing a mobile phone, a smart phone, a tablet PC, and the like. It is used in a narrow space and is folded into a folded shape or continuously bent with a small radius of curvature like a read / write cable of a hard disk drive. The term “folded and bent” refers to a state of being bent in order to be accommodated in a thin frame and provided with a bending point. Hereinafter, in the present specification, the upper side of the FPC is slightly reversed at 180 ° C to become the lower side. It is called "folding and bending."

In recent years, with the rapid development of miniaturization, thinness, and weight reduction of electronic devices such as mobile phones, notebook computers, digital cameras, and game consoles, materials for such devices are expected to be used even in High-density and high-performance materials that can also store parts in a small space. Even in flexible circuit boards, as high-performance small electronic devices such as smart phones and tablet PCs are spreading, and the density of parts is being increased, it is necessary to store flexible circuit boards in a narrower space than currently. Inside the box. Therefore, even if it is dependent on the flexibility of the flexible circuit board material Looking at the material side of the copper clad laminate, it is also necessary to improve the folding resistance and bending resistance.

For these issues, it has been proposed to be used in copper foil of flexible copper-clad laminates. It is softened by annealing of copper foil during heat treatment by adding a small amount of silver or tin, etc., and in some specific directions. (200 faces) A special rolled copper foil with a well-developed cubic collection of crystalline orientations (see Patent Document 1). Thereby, when stress is applied to the copper foil during deflection, transitions occurring in the crystal and its movement do not accumulate in the crystal grain boundary, and it is possible to suppress the occurrence and progress of cracks in the crystal grain boundary caused by movement toward the surface. It causes damage and has excellent flexing characteristics.

Such a rolled copper foil cannot exhibit the aforementioned characteristics at room temperature, and in order to develop such a cubic structure, it must be annealed by a predetermined heat treatment. The heat required for the annealing is, for example, a treatment at 150 ° C. for 60 minutes if the temperature is low, and a temperature of 300 ° C. or more for 1 minute to end the treatment.

Generally, a method for manufacturing a copper-clad laminated board composed of polyimide and copper foil is known: coating a polyimide precursor on a copper foil and drying and heat-treating at high temperature to obtain a single-sided coating. After the copper laminate is laminated, it is produced by the method of thermally laminating the copper foil; a polyimide film containing thermoplastic polyimide in the outermost layer is prepared in advance, and thermal lamination is performed on both sides of the polyimide film Copper foil way. This thermal lamination method has the advantage of using a simple method of using a pair of opposed thermal pressure bonding rollers, and the introduction of the device is relatively easy. However, in this method, since the amount of heat input to the copper foil during thermal lamination is about a few seconds, a sufficient amount of rolled copper foil cannot be obtained. The cube is well-organized with enough heat.

Here, in order to improve the flexibility of the copper foil and to suppress defects such as microcracks and cracks, a method is known in which an annealing process is performed after the copper foil is pressure-bonded by a thermal layer (see Patent Document 2). . However, the conditions of the annealing treatment shown here are only shown in a wide range of temperature and time, and it is not clear whether the specific annealing conditions are used to improve the characteristics. In addition, since the annealing time shown in Patent Document 2 is set to 2 minutes or longer, in addition to the lack of productivity, the effect obtained by the annealing treatment is only focused on the elasticity of the copper foil, and it has not been mentioned in (200). The viewpoint of cubic structure control such as surface crystalline alignment can hardly be coped with for the development of more severe flexural applications.

On the other hand, a method for manufacturing a flexible copper-clad laminated board different from a thermal lamination method using a heat roller has been disclosed. A method of performing thermal lamination using a plurality of rollers and a steel strip is also referred to as a dual-belt ( double belt) system (refer to Patent Document 3). This method is easy to increase the number of rollers and the like, so that sufficient time can be secured during lamination, but there are problems such as large equipment costs.

[Advanced technical literature]

[Patent Literature]

[Patent Document 1] Japanese Patent No. 4285526

[Patent Document 2] Japanese Patent Laid-Open No. 2013-21281

[Patent Document 3] Japanese Patent Laid-Open No. 2011-270035

This invention is made | formed in view of the said subject. The purpose is to provide a flexible copper-clad laminated board with polyimide which is excellent in heat resistance and dimensional stability as an insulating layer. The simple method of a pair of hot-pressed rollers provides excellent flexibility Flexible copper clad laminate.

In order to solve the above-mentioned problems, as a result of research by the present inventors, it was found that the temperature T1 of the heating and crimping step for crimping the copper foil and the polyimide, and the temperature T2 of the reheating step for performing post-heating, were compared with the copper foil When the glass transition temperature (Tg) of the attached thermoplastic polyimide layer is set to be T1, and when T1 <T2, sufficient flexural characteristics can be developed, and the present invention has been completed.

That is, the method for manufacturing a flexible copper-clad laminated board according to the present invention includes: using a pair of hot-pressing rollers, heat-pressing a copper foil (A) and providing an adhesive layer as a laminate with the copper foil (A). Heating and pressure-bonding step of the polyimide film on the surface or the polyimide laminate (B) with a metal layer; and then, a reheating step of further heat treatment, wherein the polyimide film or the The polyimide laminate (B) of the metal layer has a thermoplastic polyimide layer (ii) having a glass transition temperature of 260 ° C. or higher as a bonding layer, and the lamination temperature T1 of the aforementioned thermal compression bonding step is the aforementioned thermoplastic polyimide The layer (ii) has a glass transition temperature or higher, and the heat treatment temperature T2 in the aforementioned reheating step is set to the aforementioned lamination temperature T1 or higher, thereby bringing the copper foil (A) after the aforementioned thermocompression step in a thickness direction. (200) plane diffraction intensity (I) obtained from X-ray diffraction and (200) plane diffraction intensity (Io) obtained from X-ray diffraction of fine powder copper The relationship is I / Io> 100.

In the manufacturing method of the present invention, the heat treatment in the reheating step is preferably performed in a vacuum or an inert (inactive) atmosphere. The heat treatment temperature T2 is 300 ° C or higher, and the heating time is 10 seconds or longer.

In addition, the polyimide film or the polyimide laminate (B) with a metal layer is preferably a polyimide layer (i) having a low thermal expansion property having a thermal expansion coefficient of less than 17 ppm / K and a thermoplastic polymer. The polyimide layer of the amidine layer (ii).

Further, as for the copper foil (A), a rolled copper foil having a thickness of 5 to 100 μm is a preferred aspect of the present invention.

According to the method for manufacturing a flexible copper-clad laminated board according to the present invention, the elasticity of the copper foil can be reduced by the reheating step (annealing process), and the specific orientation of the (200) plane can be performed at the same time, so that the cubic structure can be developed. Obtains the high bending resistance required by the wiring board, so it is particularly suitable for use in electronic devices that require continuous bending such as bending resistance around bent parts around small liquid crystals such as smart phones and hard disk read-write cables. Device.

Hereinafter, the present invention will be described in detail.

The method for producing a flexible copper-clad laminated board according to the present invention is a heat-pressed copper foil (A) and a polyimide film or a metal-attached layer provided as an adhesive layer with the copper foil (A) Polyimide laminate (B), which is heat-pressed The middle system uses a pair of hot-pressing rollers.

The heat-pressing roller may be, for example, a metal roller or a resin-coated metal roller whose surface is covered with a resin. However, the copper foil (A) and the polyimide film or the polyimide laminate (B) with a metal layer are laminated. (Lamination) is preferably performed at a relatively high temperature, so the heat resistance of the material used on the surface of the roller and / or the heat transfer from the inside of the roller to the surface is necessary, from such a point of view In view of this, a metal roller is preferred, and its surface has a surface roughness (Ra) of 0.01 to 5 μm, and particularly preferably a roughened state of 0.1 to 3 μm.

In the present invention, a copper foil (A) and a polyimide film or a polyimide laminate (B) with a metal layer are introduced and heat-bonded between the pair of hot-pressing rollers. In this specification, this step is referred to as a thermocompression bonding step, and the object to be thermocompression-bonded with the copper foil (A) is a polyimide film or a polyimide laminate (B) with a metal layer, and attached Laminating copper foil (A) and polyimide film, or laminating copper foil (A) and polyimide laminate (B) with metal layer.

The polyimide film (B) is only required to have an adhesive layer on the layer with the copper foil (A). Such a film is a thermoplastic polyimide film except for a single layer having a glass transition temperature of 260 ° C or higher. In addition, for example, a non-thermoplastic polyimide layer may include a polyimide film composed of a plurality of polyimide layers having a thermoplastic polyimide layer having a glass transition temperature of 260 ° C. or higher on one or both sides. The polyimide film (B) may be prepared by a known method, or a commercially available polyimide film may be used. Examples of commercially available polyimide films include Kapton EN made by Toray Dupont and the like. In addition, a commercially available low thermal expansion polyimide film can also be applied to obtain a thermoplastic. Resin solution of the polyimide precursor of the flexible polyimide layer (ii) and harden it.

In addition, the polyimide laminate (B) with a metal layer may be a polyimide layer having a single layer or a plurality of layers on a metal foil such as a copper foil. When the polyimide is a single layer, the polyimide layer itself is an adhesive layer, so the polyimide must be formed from a thermoplastic polyimide layer (ii) having a glass transition temperature of 260 ° C or more. When the amine is a plurality of layers, at least the surface laminated with the copper foil (A) may be a thermoplastic polyimide layer (ii). Examples of the structure of the polyimide laminate (B) with a metal layer include a metal layer / thermoplastic polyimide layer (ii) / low thermal expansion polyimide layer (i) / thermoplastic polyimide layer. (ii), or the structure of a metal layer / low thermal expansion polyfluorene imine layer (i) / thermoplastic polyimide layer (ii). The polyimide in the polyimide laminate (B) with a metal layer is composed of a plurality of layers, which can satisfy the bonding strength or dimensional stability of copper foil and polyimide, heat resistance of solder, etc. Many characteristics required for flexible copper clad laminates. The metal foil constituting the metal layer is, in addition to a copper foil, an aluminum foil or a stainless steel foil.

The polyfluorene imide laminate (B) with a metal layer can be more specifically a single-sided flexible copper-clad laminate. The single-sided flexible copper-clad laminated board can make the aforementioned low thermal expansion polyimide layer (i) or a polyimide precursor of a thermoplastic polyimide layer (ii) on a long copper foil. The resin solution is sequentially applied and dried, and is hardened (fluorinated). One feature of the present invention is that a flexible copper-clad laminate can be continuously and efficiently manufactured by a simple method of a pair of hot-pressed rolls. From this viewpoint, a metal polyimide laminate (B) with a metal layer is formed. Copper foil can be used in a long shape.

The copper foil in such a form is sold by a copper foil manufacturer and rolled into a roll shape, and can be used. In addition, according to the present invention, the wiring formed by processing the copper foil of the flexible copper-clad laminated board manufactured by the wiring can maximize the flexural performance of the copper foil. From this viewpoint, even if it is first used as a single surface As the copper foil used in the flexible copper-clad laminated board, it is preferable to use a rolled copper foil that is the same as the copper foil (A) that is subsequently heat-pressed by a pair of hot-pressing rollers.

The low-thermal-expansion polyimide layer (i) and the thermoplastic polyimide layer (ii) constituting the polyimide layer are capable of performing imidization of the polyimide acid of the precursor that imparts these characteristics. However, in general, the polyamidoacids can be appropriately selected according to the characteristics of polyamidoimide obtained from known diamines and acid dianhydrides, and then synthesized in an organic solvent. The viscosity of the polymerized resin is, for example, preferably within a range of 500 cps or more and 35,000 cps or less.

Examples of the diamine system used as a raw material of polyfluoreneimide include 4,6-dimethyl-m-phenyldiamine, 2,5-dimethyl-p-phenyldiamine, and 2,4- Diamino mesitylene, 4,4'-methylenebis-o-toluidine, 4,4'-methylenebis-2,6-xylyleneamine, 4,4'-methylene-2 1,6-diethylaniline, 2,4-toluenediamine, m-phenyldiamine, p-phenyldiamine, 4,4'-diaminodiphenylpropane, 3,3'-diamine Diphenylpropane, 4,4'-diaminodiphenylethane, 3,3'-diaminodiphenylethane, 4,4'-diaminodiphenylmethane, 3,3 '-Diaminodiphenylmethane, 2,2-bis [4- (4-aminophenoxy) phenyl] propane, 4,4'-diaminodiphenylsulfide, 3,3' -Diaminodiphenylsulfide, 4,4'-diaminodiphenylphosphonium, 3,3'-diaminodiphenylphosphonium, 4,4'-diaminodiphenylether, 3 1,3-bisaminodiphenyl ether, 1,3-bis (3-aminophenoxy) benzene, 1,3-bis (4-aminophenoxy) benzene, 1,4-bis (4 -Aminophenoxy) benzene, benzidine, 3,3'-diaminobiphenyl, 3,3'-dimethyl-4,4'-diaminobiphenyl, 3,3'-dimethyl Oxybenzidine, 4,4'-diamino-p-terphenyl, 3,3'-diamino-p-terphenyl, bis (p-amine Cyclohexyl) methane, bis (p-β-amino-t-butylphenyl) ether, bis (p-β-methyl-δ-aminopentyl) benzene, p-bis (2-methyl- 4-aminopentyl) benzene, p-bis (1,1-dimethyl-5-aminopentyl) benzene, 1,5-diaminonaphthalene, 2,6-diaminonaphthalene, 2, 4-bis (β-amino-t-butyl) toluene, 2,4-diaminotoluene, m-xylene-2,5-diamine, p-xylene-2,5-diamine, m -Xylylenediamine, p-xylylenediamine, 2,6-diaminopyridine, 2,5-diaminopyridine, 2,5-diamino-1,3,4- Diazole, piperazine , 2,2'-dimethyl-4,4'-diaminobiphenyl, 3,7-diaminodibenzofuran, 1,5-diaminofluorene, dibenzo-p-di Alkan-2,7-diamine, 4,4'-diaminobenzyl and the like.

Examples of the acid anhydride used as the raw material of polyimide include 1,2,4,5-benzenetetracarboxylic dianhydride, 3,3 ', 4,4'-diphenylketone tetracarboxylic dianhydride, and the like. 2,2 ', 3,3'-diphenylketone tetracarboxylic dianhydride, 2,3,3', 4'-diphenylketone tetracarboxylic dianhydride, naphthalene-1,2,5,6- Tetracarboxylic dianhydride, naphthalene-1,2,4,5-tetracarboxylic dianhydride, naphthalene-1,4,5,8-tetracarboxylic dianhydride, naphthalene-1,2,6,7-tetracarboxylic acid Acid dianhydride, 4,8-dimethyl-1,2,3,5,6,7-hexahydronaphthalene-1,2,5,6-tetracarboxylic dianhydride, 4,8-dimethyl- 1,2,3,5,6,7-hexahydronaphthalene-2,3,6,7-tetracarboxylic dianhydride, 2,6-dichloronaphthalene-1,4,5,8-tetracarboxylic acid di Anhydride, 2,7-dichloronaphthalene-1,4,5,8-tetracarboxylic dianhydride, 2,3,6,7-tetrachloronaphthalene-1,4,5,8-tetracarboxylic dianhydride, 1,4,5,8-Tetrachloronaphthalene-2,3,6,7-tetracarboxylic dianhydride, 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride, 2,2', 3 , 3'-biphenyltetracarboxylic dianhydride, 2,3,3 ', 4'-biphenyltetracarboxylic dianhydride, 3,3 ", 4,4" -p-terphenyltetracarboxylic dianhydride , 2,2 ", 3,3" -p-terphenyltetracarboxylic dianhydride, 2,3,3 ", 4" -p-terphenyltetracarboxylic dianhydride, 2,2-bis (2 , 3-dicarboxyphenyl) -propane dianhydride, 2,2-bis (3,4-dicarboxyphenyl) -propane dianhydride, bis (2,3-dicarboxyphenyl) ether dianhydride, bis ( 2,3-dicarboxyphenyl) methyl Dianhydride, bis (3.4-dicarboxyphenyl) methane dianhydride, bis (2,3-dicarboxyphenyl) fluorene dianhydride, bis (3,4-dicarboxyphenyl) fluorene dianhydride, 1,1- Bis (2,3-dicarboxyphenyl) ethane dianhydride, 1,1-bis (3,4-dicarboxyphenyl) ethane dianhydride, fluorene-2,3,8,9-tetracarboxylic acid di Anhydride, hydrazone-3,4,9,10-tetracarboxylic dianhydride, fluorene-4,5,10,11-tetracarboxylic dianhydride, fluorene-5,6,11,12-tetracarboxylic dianhydride, Phenanthrene-1,2,7,8-tetracarboxylic dianhydride, phenanthrene-1,2,6,7-tetracarboxylic dianhydride, phenanthrene-1,2,9,10-tetracarboxylic dianhydride, cyclopentyl Alkane-1,2,3,4-tetracarboxylic dianhydride, pyridine -2,3,5,6-tetracarboxylic dianhydride, pyrrolidine-2,3,4,5-tetracarboxylic dianhydride, thiophene-, 3,4,5-tetracarboxylic dianhydride, 4,4 '-Oxydiphthalic dianhydride, 2,3,6,7-naphthalenetetracarboxylic dianhydride and the like.

These diamines and acid anhydride systems may be used alone or in combination of two or more. Examples of the solvent used in the polymerization include dimethylacetamide, N-methylpyrrolidone, 2-butanone, diethylene glycol dimethyl ether, and xylene. One type or two types can be used in combination. the above.

In order to make the polyimide layer a low-thermal-expansion polyimide layer (i) having a thermal expansion coefficient of less than 17 × 10 ^-6 / K, an acid anhydride component as a raw material can also be used. 1, 2, 4, 5- Pyromellitic dianhydride, 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride, and diamine components can use 2,2'-dimethyl-4,4'-diaminobiphenyl, 2 -Methoxy-4, 4'-diaminobenzoacetanilide, particularly preferred are 1,2,4,5-benzenetetracarboxylic dianhydride and 2,2'-dimethyl-4,4 ' -Diaminobiphenyl as a main component of each raw material component.

In addition, in order to make the polyimide layer a thermoplastic polyimide layer (ii) having a glass transition temperature of 260 ° C or higher, an acid anhydride is used as a raw material. 1,2,4,5-benzenetetracarboxylic dianhydride, 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride, 3,3', 4,4'-diphenyl ketone Tetracarboxylic dianhydride, 3,3 ', 4,4'-diphenylphosphonium tetracarboxylic dianhydride, and diamine components can use 2,2'-bis [4- (4-aminophenoxy) benzene Group] propane, 4,4'-diaminodiphenyl ether, 1,3-bis (4-aminophenoxy) benzene, particularly preferably 1,2,4,5-benzenetetracarboxylic dianhydride and 2,2'-bis [4- (4-aminophenoxy) phenyl] propane is a main component of each raw material component.

In the present invention, the surface to be laminated with the copper foil (A) must be an adhesive layer when a polyimide film is used or when a polyimide laminate with a metal layer is used. The next layer is composed of a thermoplastic polyimide layer (ii), but its glass transition temperature is 260 ° C or higher, preferably in the range of 280 ° C to 320 ° C. When the glass transition temperature of the thermoplastic polyimide layer (ii) is in this range, it becomes the temperature between the copper foil and the polyimide surface required when the flexible copper-clad laminated board can be processed into a flexible circuit board. Next, those having excellent strength and dimensional stability and excellent solder heat resistance required for solder bonding at the time of component packaging.

On the other hand, the low thermal expansion polyimide layer (i) is such that the thermal expansion coefficient of the entire polyimide layer is close to 12 to 23 ppm / K of the thermal expansion coefficient of the copper foil (A), and it is preferably less than The thermal expansion coefficient of 17 ppm / K is more preferably in the range of 5 to 10 ppm / K. Thereby, the thermal expansion coefficient of the entire polyimide layer can be matched with the thermal expansion coefficient of the copper foil (A), and the warpage of the flexible copper-clad laminate and the dimensional change rate after heating can be easily suppressed.

As for the copper foil (A) used for manufacture of the flexible copper-clad laminated board of this invention, it is preferable to use a rolled copper foil. Examples of the rolled copper foil include Ag added during the thermal compression bonding and annealing in the subsequent step so as to perform crystal orientation of the (200) plane. Copper alloy foil with Sn as an additive element. Known examples include HA copper foil manufactured by JX Nippon Metal and HPF foil manufactured by Hitachi Electric Wire. The thickness of the copper foil (A) is not particularly limited, but is generally in the range of 5 to 100 μm, and preferably in the range of 7 to 50 μm. From the viewpoint of reducing the stress added to the copper foil during deflection, it is more The range is preferably 9 to 18 μm.

Next, the thermal compression bonding conditions of the copper foil (A) and the polyimide film or the polyimide laminate (B) with a metal layer in the present invention will be described. The lamination temperature T1, that is, the temperature of the hot-pressing roller in the heat-pressing step, must be a thermoplastic polyimide layer from the viewpoint of the adhesion of the copper foil (A) and the polyimide of the adhesive layer. (ii) The glass transition temperature of the polyimide is preferably 300 to 400 ° C. In addition, it is desirable to perform heat-pressure bonding under a condition that the linear pressure between the heating rollers is 50 to 500 Kg / cm and the roller passing time is 2 to 5 seconds. Examples of the laminated atmosphere include an atmospheric atmosphere and an inert atmosphere, but from the viewpoint of preventing oxidation and discoloration of copper foil, an inert atmosphere is desirable. Here, the inert atmosphere is synonymous with the inert atmosphere, and is a state in which it is replaced with an inert gas such as nitrogen or argon and is substantially free of oxygen.

Here, the (200) plane crystal orientation performed by the heat treatment of copper foil (A) will be described in detail. Generally speaking, the aforementioned copper foil is softened by heat treatment, reduces the elastic modulus, and becomes soft, and the (200) plane is preferentially aligned and the cube structure is developed. The crystal orientation of the (200) plane can be performed at a temperature above the semi-softening temperature for a predetermined time, but it must be at least a temperature of 300 ° C or higher for 10 seconds to 60 seconds. As in the present invention, in the method of heating and crimping by a pair of hot-pressing rollers, from the viewpoint of ensuring productivity, the crimping of the rollers can be performed instantaneously within 10 seconds, so that The heating and crimping step must be combined with the annealing step of the reheating step.

Here, the reheating step (annealing treatment) must be heat-treated at a temperature higher than the lamination temperature T1. If it is a temperature lower than the lamination temperature T1, the crystal structure of the copper foil partially recrystallized in the heat and pressure bonding step cannot be crystallized again, and the cubic structure cannot be sufficiently formed with the (200) plane crystal orientation. That is, it is important to set the heat treatment temperature T2 of the reheating step to a lamination temperature T1 or higher in order to further perform the partial recrystallization by the lamination in the heat and pressure bonding step. At this time, when the temperature of the reheating step in the subsequent step is 300 ° C or higher, a processing time of about 10 seconds to 60 seconds is sufficient. On the other hand, when it is set above 400 ° C, problems such as heat resistance degradation of polyimide and warpage due to heating may occur, so it is preferably set to 400 ° C or lower.

After such a reheating step, the diffraction intensity (I) of the (200) plane obtained by the X-ray diffraction of the copper foil (A) in the thickness direction after the aforementioned heating and crimping step, and The relationship between the (200) plane diffraction intensity (Io) obtained by X-ray diffraction of fine powder copper becomes I / Io> 100. Here, the I value and the Io value can be measured by the X-ray diffraction method. The X-ray diffraction in the thickness direction of the copper foil is used to confirm the alignment on the surface of the copper foil (the rolled surface when rolling the copper foil). The intensity (I) of the (200) plane is the integral value of the intensity of the (200) plane obtained by X-ray diffraction. In addition, the strength (Io) is an integral value of the strength of the (200) plane of finely powdered copper (Class I of copper powder reagent manufactured by Kanto Chemical Co., Ltd., 325 mesh, purity 99.99% or more).

The annealing method of the reheating step is not limited, but it is considered that the polyimide film to be continuously conveyed or the polyimide laminate with a metal layer (B) or the copper foil (A) is placed in a uniform temperature environment, and it is preferable to set a block of a step as a furnace-shaped chamber and heat it with hot air. In addition, in order to prevent the influence of the deterioration of the surface of the copper foil, etc., the hot air is preferably heated with nitrogen. Heating with this nitrogen requires higher temperature conditions, and since there is still an upper limit, other heating means can be added. An example of a preferred heating means is to place a heater beside the transport path. In addition, a plurality of heaters may be provided, and the types may be the same or different.

[Example]

Hereinafter, the present invention will be described in more detail based on examples. In each of the following examples, each characteristic was evaluated by the following method.

[Measurement of crystal orientation I / Io by XRD]

The crystal orientation of the (200) plane of the copper foil was calculated from the (200) plane diffraction intensity (Io) obtained by X-ray diffraction of fine powder copper using the XRD method of Mo to the cathode. (200) ) Plane diffraction intensity (I), defined as the I / Io value.

[Measurement of flexural characteristics]

A commercially available photoresist film was bonded to a double-sided flexible copper-clad laminated board composed of copper foil / polyimide / copper foil. After exposure to a mask for a predetermined pattern formation, a residual bonding In the method of copper foil on the side of the photoresist film, after the copper foil on the opposite side is completely etched, the remaining copper foil is hardened to form a pattern of L / S = 100μm / 100μm (L: line width, S : Wide line spacing). Next, the hardening resist is developed, and the copper foil unnecessary for the predetermined pattern formation is etched and removed, and the hardening resist layer is further stripped and removed with an alkaline liquid to prepare a test sample. Use the IPC test device after putting the overlay on the test pattern, set the deflection radius r = 1.5mm, stroke 25mm, slip The moving speed is 1500 cpm. The determination of the flex life is to apply a predetermined voltage to the sample and perform a flex test. A sample with a resistance value increase of 10% is regarded as a wire break and used as the number of flex times. In the following examples and comparative examples, the flexural characteristics when the cast surface copper foil was formed into a predetermined pattern (the laminated surface copper foil (base material 2) was removed), and the laminated surface copper foil (the base material 2) were individually evaluated. ) Deflection characteristics when a predetermined pattern is preformed (coated copper foil is removed).

[Determination of solder heat resistance test]

A commercially available photoresist film was bonded to a double-sided flexible copper-clad laminated board composed of copper foil, polyimide, and copper foil, and exposed on a mask for a predetermined pattern formation. Otherwise, the same position is hardened to form a 1 mm circular pattern resist layer. Next, the hardening resist is developed, and an unnecessary copper foil layer is removed by etching in a predetermined pattern, and the hardening resist is peeled off with an alkaline liquid to prepare a test sample. After the samples were dried, they were immersed in solder baths having different temperatures for 10 seconds, and the temperature at which the copper foil did not swell and peel was measured. This temperature was used as the solder heat-resistant temperature.

[Measurement of peel strength]

A commercially available photoresist film was laminated on a laminate composed of copper foil, polyimide, and copper foil, and exposed to a predetermined pattern-forming mask, and then cured to form a pattern with a copper wiring width of 1 mm. Resistor layer. Next, the hardening resist is developed, and an unnecessary copper foil layer is formed by etching in a predetermined pattern. The hardening resist layer is further stripped and removed with an alkaline liquid to prepare a test sample. After the sample was dried, the peel strength was measured by a 180 ° pull-peel method using a tensile tester (Strograph M-1) manufactured by Toyo Seiki Co., Ltd.

[Measurement of dimensional change rate]

The measurement of the dimensional change rate is performed in the following order.

First, using a 300 mm square sample (flexible copper-clad laminate), a dry film resist was exposed at 200 mm intervals, and a target for position measurement was formed by development. After measuring the dimensions before etching (normal state) in an atmosphere at a temperature of 23 ± 2 ° C and a relative humidity of 50 ± 5%, copper other than the target of the test piece is etched (liquid temperature below 40 ° C, within 10 minutes) To remove. After standing for 24 ± 4 hours in an atmosphere with a temperature of 23 ± 2 ° C and a relative humidity of 50 ± 5%, the distance between the targets was measured. The dimensional change rate with respect to the normal state at each of the three directions in the vertical direction and the horizontal direction was calculated, and the size after etching was measured with each average value. Next, this test piece was heat-treated in an oven at 250 ° C. for 1 hour, and the distance between the targets after that was measured. The dimensional change rates with respect to the normal state at each of the three positions in the vertical direction and the horizontal direction were calculated, and the average value of each was used as the dimensional change rate after the heat treatment. The heating dimensional change rate is obtained by the following mathematical formula.

Dimension change rate after etching (%) = (B-A) / A × 100

A; Distance between targets after development by resist

B; Distance between targets after wiring formation

Heating dimensional change rate (%) = (D-C) / C × 100

C; Distance between targets after wiring formation

D; distance between targets after heating

[Determination of warpage]

A 10 cm × 10 cm size sheet was made from a flexible copper-clad laminate. When this sheet was placed on a table, the height of the table top separated from the table top was measured using a vernier ruler. Set this height as the amount of warp, the amount of warp is less than 2mm At that time, it was evaluated as "no warpage".

[Measurement of glass transition temperature]

The copper foil was coated with a polyamic acid resin solution, and heat-treated to obtain a laminate. The polyimide film (10 mm x 22.6 mm) obtained by etching to remove the copper foil of the laminate was measured by DMA for dynamic viscoelasticity at a temperature rise of 5 ° C / min from 20 ° C to 500 ° C, and the glass transition temperature Tg (tan delta maximum).

[Determination of thermal expansion coefficient]

The polyimide film obtained by etching the copper foil was heated to 250 ° C using a thermomechanical analyzer manufactured by Seiko Instruments Inc., and further maintained at this temperature for 10 minutes, and then cooled at a rate of 5 ° C / min. Average thermal expansion coefficient (linear thermal expansion coefficient) from 240 ° C to 100 ° C.

Next, synthesis examples of polyamic acid used in Examples and Comparative Examples are shown.

(Synthesis example 1)

Into a reaction vessel capable of introducing nitrogen while having a thermocouple and a stirrer, N, N-dimethylacetamide was added, and 2,2-bis [4- (4-aminophenoxy) was placed in the reaction vessel. ) Phenyl] propane (BAPP) and dissolved in a container while stirring. Next, pyromellitic dianhydride (PMDA) was added so that the total amount of monomers was 12 wt%. Thereafter, stirring was continued for 3 hours to perform a polymerization reaction to obtain a resin solution of polyamino acid a. The glass transition point temperature of the polyimide obtained from the polyamic acid a was 310 ° C, and the linear thermal expansion coefficient was 45 ppm / K.

(Synthesis example 2)

With a thermocouple and a stirrer, the reaction capacity of nitrogen can be introduced In the reactor, add N, N-dimethylacetamide, and put 2,2'-dimethyl-4,4'-diaminobiphenyl (m-TB) in the reaction vessel while stirring in the vessel Let it dissolve. Secondly, 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride (BPDA) and 1,2,4,5-benzenetetracarboxylic dianhydride (PMDA) were used so that the total monomer input was 15wt %, And the molar ratio (BPDA: PMDA) of each acid anhydride is 20:80. Thereafter, stirring was continued for 3 hours to perform a polymerization reaction to obtain a resin solution of polyamino acid b. The glass transition point temperature of the polyimide obtained from the polyamic acid b was 380 ° C, and the linear thermal expansion coefficient was 8 ppm / K.

(Synthesis example 3)

In a reaction vessel equipped with a thermocouple and a stirrer and capable of introducing nitrogen, N, N-dimethylacetamide was added, and 2,2-bis [4- (4-aminophenoxy) was placed in the reaction vessel. ) Phenyl] propane (BAPP) was dissolved in the container while stirring. Secondly, 3,3 ', 4,4'-diphenyl ketone tetracarboxylic dianhydride (BTDA) was added so that the total amount of monomers was 12% by weight. Thereafter, stirring was continued for 3 hours to perform a polymerization reaction to obtain a resin solution of polyamidic acid c. The glass transition point temperature of the polyimide obtained from the polyamic acid c was 240 ° C, and the linear thermal expansion coefficient was 42 ppm / K.

(Example 1)

Uniformly coated on a single side of a 12-m-thick rolled copper foil (JX Nippon Nippon Steel Metal HA foil; I / Io = 7) so that the thickness after hardening was 2.2 μm and prepared in Synthesis Example 1 After the resin solution of polyamic acid a (first layer), it was dried by heating at 130 ° C to remove the solvent. Next, the resin solution (second layer) of the polyamic acid b prepared in Synthesis Example 2 was uniformly coated on the coating surface side so that the thickness after curing was 7.6 μm, and dried by heating at 135 ° C. Dry and remove the solvent. Furthermore, the same resin solution (third layer) of polyamic acid a as that applied to the first layer was uniformly coated on the coating surface side so that the thickness after curing was 2.2 μm, and dried by heating at 130 ° C. to remove Solvent. A continuous hardening furnace that was set up in a stepwise manner from 130 ° C to 300 ° C for this long laminated body was heat-treated for a total of about 6 minutes to obtain a single polyimide layer having a thickness of 12 μm. Surface flexible copper-clad laminated board (base material 1).

Next, on the surface of the polyimide layer of the single-sided flexible copper-clad laminate (base material 1), a long rolled copper foil as a base material 2 (made by JX Nippon Steel & Nippon Metal) HA foil; I / Io = 7). The laminating device is applicable: the laminated long substrate is transported by the guide roller through the unwinding shaft, and a pair of opposite metal rollers (surface roughness Ra = 0.15 μm) is used in a furnace under an inert atmosphere. ) Heating and crimping. The thermocompression bonding conditions were set to a temperature of 360 ° C., a pressure of 130 Kg / cm, and a passing time; 2 to 5 seconds (layering: a thermocompression bonding step). Then, it heat-processed (reheating process) for 60 second in the heating hot air furnace of 380 degreeC, and obtained the double-sided flexible copper-clad laminated board. Table 1 shows the substrate, thermal lamination temperature, and annealing conditions used in each example.

In the double-sided flexible copper-clad laminated board obtained above, a copper foil coated with a resin solution of polyamic acid (referred to as a "casting copper foil"), and a copper foil laminated by a heat-pressing step (Base material 2: referred to as "laminated surface copper foil"), Table 2 shows the diffraction intensity (I) of the (200) plane obtained by X-ray diffraction in the thickness direction, and The ratio (I / Io) of the (200) plane diffraction intensity (Io) obtained from the X-ray diffraction of fine powder copper. Table 2 shows the flexural characteristics and solder heat resistance. The (200 side) I / Io of the cast surface copper foil is In 195, the number of deflections obtained by the IPC test was 17 million. On the other hand, the laminated copper foil (200 faces) had an I / Io of 185, and the number of deflections obtained by the IPC test was 16 million. It had the same flexural characteristics as the cast copper foil. In addition, the solder heat resistance temperature is 350 ° C, which is a practically sufficient level.

(Example 2)

The copper foil used in the base material 1 and the copper foil used as the base material 2 were each rolled copper foil (HPF-ST-X made by Hitachi Metal) having a thickness of 12 μm in each strip shape. 1 Similarly, a double-sided flexible copper-clad laminated board was obtained. Table 2 shows the evaluation results of the obtained double-sided flexible copper-clad laminated board. The I / Io of the (200 sides) of the copper foil on the casting surface was 205, and the number of deflections obtained by the IPC test was 16 million times. On the other hand, the laminated surface copper foil (200 sides) has an I / Io of 200, and the number of deflections obtained by the IPC test is 17 million times, and has the same deflection characteristics as the cast surface. In addition, the solder heat resistance temperature was 350 ° C.

(Example 3)

On both sides of a commercially available polyimide film (Kapton EN), the resin solution of the polyamidic acid a synthesized in Synthesis Example 1 was applied and dried, and then cured in the atmosphere to obtain a polymer containing a thermoplastic polyimide.醯 imine 醯 imine film (substrate 1). On both sides of the polyimide film, the copper foil (substrate 2) shown in Example 1 was thermally laminated at a temperature of 360 ° C in the same manner as in Example 1, and then heated at 380 ° C by a hot-air heating furnace. The heat treatment was performed for 1 minute to obtain a double-sided flexible copper-clad laminate. The evaluation results of the obtained double-sided flexible copper-clad laminated board are shown in Table 2. The copper foil (200 sides) of the laminated surface side had an I / Io of 198, and the number of deflections obtained by the IPC test was 13 million times. solder The heat-resistant temperature is 320 ° C.

(Comparative example 1)

After the single-sided copper-clad laminate (base material 1) was produced in the same manner as in Example 1, the copper foil (base material 2) shown in Example 1 was used, and the lamination conditions were implemented under the conditions shown in Table 1. Thereafter, the heat treatment in the reheating step was not performed, and a double-sided flexible copper-clad laminated board of Comparative Example 1 was obtained. The evaluation results of the obtained double-sided flexible copper-clad laminated board are shown in Table 2. The (200 sides) I / Io of the copper foil on the casting surface was 195, and the number of deflections obtained by the IPC test was 17 million. On the other hand, the I / Io of the (200 sides) of the laminated copper foil is 87, which is less than about half of the cast copper or the copper foil of the example. The number of deflections obtained by the IPC test is 700. 10,000 times, less than 50% of the examples.

(Comparative example 2)

A double-sided flexible copper-clad laminated board of Comparative Example 2 was obtained in the same manner as in Example 1 except that the lamination temperature T1 of the heating and crimping step was set to 380 ° C and the reheating step was performed at 350 ° C for 60 seconds. . The evaluation results of the obtained double-sided flexible copper-clad laminated board are shown in Table 2. The (200 sides) I / Io of the copper foil on the casting surface was 195, and the number of deflections obtained by the IPC test was 17 million. On the other hand, the I / Io of the (200 sides) of the laminated copper foil was 90 without improvement after lamination, and the number of deflections obtained by the IPC test was 7.6 million times.

(Comparative example 3)

A double-sided flexible copper-clad laminated board of Comparative Example 3 was obtained in the same manner as in Example 1 except that the lamination temperature T1 of the heating and crimping step was set to 380 ° C and the reheating step was performed at 350 ° C for 600 seconds. . The evaluation results of the obtained double-sided flexible copper-clad laminated board are shown in Table 2. Even if extended In the time of the heating step, the (200 sides) I / Io of the laminated copper foil was 89, and the number of deflections obtained by the IPC test was 7.2 million times.

(Comparative Example 4)

When a single-sided flexible copper-clad laminated board of the substrate 1 was obtained, the polyamic acid c shown in Synthesis Example 3 was used instead of the polyamic acid used in the first layer and the third layer of Example 1. Other than that, it carried out similarly to Example 1, and obtained the double-sided flexible copper-clad laminated board of the comparative example 4. The evaluation results of the obtained double-sided flexible copper-clad laminated board are shown in Table 2. The I / Io of the laminated copper foil (200 sides) was increased to 189, and the number of deflections obtained by the IPC test was 15.5 million times, which was equivalent to that of the cast copper. Withstands levels such as solder reflow during component packaging.

In addition, the peel strength, dimensional change rate, and warpage of the flexible copper-clad laminate after this example were evaluated, but the peel strength was 0.8 kN / m in any of the examples. The dimensional change rate after heating and the dimensional change rate after heating are both within 0.1%, and the warpage is also 2 mm or less. That is, the characteristics required for the flexible copper-clad laminated board can be maintained, and it has been confirmed that there is no problem in practical use.

Claims (5)

A method for manufacturing a flexible copper-clad laminated board, comprising: using a pair of hot-pressing rollers to heat and pressure-bond a copper foil (A); and providing an adhesive layer as a stacking layer with the copper foil (A). A step of heating and crimping the fluorene imine film or the polyfluorene imide laminate (B) with a metal layer; and thereafter, further performing a reheating step of heat treatment, wherein the foregoing fluorene film or the metal-clad layer The polyfluorene imide laminate (B) has a thermoplastic polyfluorene subcavity layer (ii) having a glass transition temperature of 260 ° C. or higher as a bonding layer, and the lamination temperature T1 of the aforementioned thermal compression bonding step is the aforementioned thermoplastic polyimide layer ( ii) above the glass transition temperature, the heat treatment temperature T2 in the aforementioned reheating step is set to be above the aforementioned lamination temperature T1, so that the thickness X of the copper foil (A) after the aforementioned heat and pressure bonding step is changed from X The relationship between the diffraction intensity (I) of the (200) plane obtained by the line diffraction and the diffraction intensity (Io) of the (200) plane obtained by the X-ray diffraction of fine powder copper is I / Io> 100 . The method for manufacturing a flexible copper-clad laminated board according to item 1 of the scope of the patent application, wherein the heat treatment in the reheating step is performed under a vacuum or an inert atmosphere, and the heat treatment temperature T2 is 300 ° C or higher, and the heating time is More than 10 seconds. The method for manufacturing a flexible copper-clad laminated board according to item 1 or 2 of the patent application scope, wherein the polyimide film or the polyimide laminate (B) with a metal layer has: Polyimide layer (i) with low thermal expansion of 17 ppm / K and multiple polyimide layers of thermoplastic polyimide layer (ii). The method for manufacturing a flexible copper-clad laminated board according to item 1 or 2 of the scope of patent application, wherein the copper foil (A) is a rolled copper foil having a thickness of 5 to 100 μm. The method for manufacturing a flexible copper-clad laminated board according to item 3 of the scope of patent application, wherein the copper foil (A) is a rolled copper foil having a thickness of 5 to 100 μm.