TWI635353B - 光罩及顯示裝置之製造方法 - Google Patents

光罩及顯示裝置之製造方法 Download PDF

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Publication number
TWI635353B
TWI635353B TW106130522A TW106130522A TWI635353B TW I635353 B TWI635353 B TW I635353B TW 106130522 A TW106130522 A TW 106130522A TW 106130522 A TW106130522 A TW 106130522A TW I635353 B TWI635353 B TW I635353B
Authority
TW
Taiwan
Prior art keywords
pattern
light
photomask
film
main
Prior art date
Application number
TW106130522A
Other languages
English (en)
Chinese (zh)
Other versions
TW201743129A (zh
Inventor
今敷修久
吉川裕
菅原浩幸
Original Assignee
Ｈｏｙａ股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ｈｏｙａ股份有限公司 filed Critical Ｈｏｙａ股份有限公司
Publication of TW201743129A publication Critical patent/TW201743129A/zh
Application granted granted Critical
Publication of TWI635353B publication Critical patent/TWI635353B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/34—Phase-edge PSM, e.g. chromeless PSM; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/121—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements
    • H10K59/1213—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements the pixel elements being TFTs

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Geometry (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW106130522A 2014-09-29 2015-08-25 光罩及顯示裝置之製造方法 TWI635353B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014-199013 2014-09-29
JP2014199013A JP6335735B2 (ja) 2014-09-29 2014-09-29 フォトマスク及び表示装置の製造方法

Publications (2)

Publication Number Publication Date
TW201743129A TW201743129A (zh) 2017-12-16
TWI635353B true TWI635353B (zh) 2018-09-11

Family

ID=55605593

Family Applications (4)

Application Number Title Priority Date Filing Date
TW104127730A TWI604264B (zh) 2014-09-29 2015-08-25 光罩及顯示裝置之製造方法
TW108109637A TWI694302B (zh) 2014-09-29 2015-08-25 光罩及顯示裝置之製造方法
TW106130522A TWI635353B (zh) 2014-09-29 2015-08-25 光罩及顯示裝置之製造方法
TW106130523A TWI658320B (zh) 2014-09-29 2015-08-25 圖案轉印方法及顯示裝置之製造方法

Family Applications Before (2)

Application Number Title Priority Date Filing Date
TW104127730A TWI604264B (zh) 2014-09-29 2015-08-25 光罩及顯示裝置之製造方法
TW108109637A TWI694302B (zh) 2014-09-29 2015-08-25 光罩及顯示裝置之製造方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
TW106130523A TWI658320B (zh) 2014-09-29 2015-08-25 圖案轉印方法及顯示裝置之製造方法

Country Status (4)

Country Link
JP (1) JP6335735B2 (ja)
KR (3) KR20160037806A (ja)
CN (2) CN105467745B (ja)
TW (4) TWI604264B (ja)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6259509B1 (ja) * 2016-12-28 2018-01-10 株式会社エスケーエレクトロニクス ハーフトーンマスク、フォトマスクブランクス及びハーフトーンマスクの製造方法
JP6808665B2 (ja) * 2017-03-10 2021-01-06 Hoya株式会社 表示装置製造用フォトマスク、及び表示装置の製造方法
JP7080070B2 (ja) * 2017-03-24 2022-06-03 Hoya株式会社 フォトマスク、及び表示装置の製造方法
JP6368000B1 (ja) * 2017-04-04 2018-08-01 株式会社エスケーエレクトロニクス フォトマスク及びフォトマスクブランクス並びにフォトマスクの製造方法
TWI659262B (zh) * 2017-08-07 2019-05-11 日商Ｈｏｙａ股份有限公司 光罩之修正方法、光罩之製造方法、光罩及顯示裝置之製造方法
TWI710649B (zh) * 2017-09-12 2020-11-21 日商Ｈｏｙａ股份有限公司 光罩及顯示裝置之製造方法
JP6731441B2 (ja) * 2018-05-01 2020-07-29 Hoya株式会社 フォトマスク及び表示装置の製造方法
KR102254646B1 (ko) 2018-07-30 2021-05-21 호야 가부시키가이샤 포토마스크 수정 방법, 포토마스크의 제조 방법, 포토마스크, 및 표시 장치용 디바이스의 제조 방법
KR102367141B1 (ko) * 2019-02-27 2022-02-23 호야 가부시키가이샤 포토마스크, 포토마스크의 제조 방법, 및 표시 장치의 제조 방법
JP7437959B2 (ja) * 2019-03-07 2024-02-26 Hoya株式会社 修正フォトマスク、及び表示装置の製造方法
JP7383490B2 (ja) * 2020-01-07 2023-11-20 株式会社エスケーエレクトロニクス フォトマスク

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6306547B1 (en) * 1998-12-16 2001-10-23 Sharp Kabushiki Kaisha Photomask and manufacturing method thereof, and exposure method using the photomask
JP2007219038A (ja) * 2006-02-15 2007-08-30 Hoya Corp マスクブランク及びフォトマスク
TW201109833A (en) * 2009-04-16 2011-03-16 Hoya Corp Mask blank and transfer mask and method of evaluating film denseness
US20110183240A1 (en) * 2009-12-21 2011-07-28 Hoya Corporation Mask blank, mask blank manufacturing method, transfer mask, and transfer mask manufacturing method
TW201400977A (zh) * 2012-06-01 2014-01-01 Hoya Corp 光罩、光罩之製造方法及圖案之轉印方法

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JPH0315845A (ja) 1989-06-14 1991-01-24 Hitachi Ltd マスク及びマスク作製方法
JPH0695360A (ja) * 1992-09-10 1994-04-08 Fujitsu Ltd 光学マスク
JP2000019710A (ja) * 1998-07-07 2000-01-21 Hitachi Ltd 半導体集積回路装置の製造方法
JP3746497B2 (ja) * 2003-06-24 2006-02-15 松下電器産業株式会社 フォトマスク
JP4645076B2 (ja) * 2004-06-28 2011-03-09 凸版印刷株式会社 位相シフトマスクおよびその製造方法およびパターン転写方法
DE602006021102D1 (de) * 2005-07-21 2011-05-19 Shinetsu Chemical Co Photomaskenrohling, Photomaske und deren Herstellungsverfahren
JP3971775B2 (ja) * 2005-10-17 2007-09-05 松下電器産業株式会社 フォトマスク
JP3971774B2 (ja) * 2005-10-17 2007-09-05 松下電器産業株式会社 パターン形成方法
JP4484909B2 (ja) * 2007-07-24 2010-06-16 キヤノン株式会社 原版データ作成方法、原版作成方法、露光方法および原版データ作成プログラム
CN108267927B (zh) * 2011-12-21 2021-08-24 大日本印刷株式会社 大型相移掩膜
JP2013140236A (ja) * 2011-12-29 2013-07-18 Hoya Corp マスクブランク及び位相シフトマスクの製造方法
CN104040428B (zh) * 2012-02-15 2018-11-13 大日本印刷株式会社 相移掩模及使用该相移掩模的抗蚀图案形成方法
JP6139826B2 (ja) * 2012-05-02 2017-05-31 Hoya株式会社 フォトマスク、パターン転写方法、及びフラットパネルディスプレイの製造方法
JP5916680B2 (ja) * 2012-10-25 2016-05-11 Hoya株式会社 表示装置製造用フォトマスク、及びパターン転写方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6306547B1 (en) * 1998-12-16 2001-10-23 Sharp Kabushiki Kaisha Photomask and manufacturing method thereof, and exposure method using the photomask
JP2007219038A (ja) * 2006-02-15 2007-08-30 Hoya Corp マスクブランク及びフォトマスク
TW201109833A (en) * 2009-04-16 2011-03-16 Hoya Corp Mask blank and transfer mask and method of evaluating film denseness
US20110183240A1 (en) * 2009-12-21 2011-07-28 Hoya Corporation Mask blank, mask blank manufacturing method, transfer mask, and transfer mask manufacturing method
TW201400977A (zh) * 2012-06-01 2014-01-01 Hoya Corp 光罩、光罩之製造方法及圖案之轉印方法

Also Published As

Publication number Publication date
KR20200132813A (ko) 2020-11-25
CN110824828A (zh) 2020-02-21
JP2016071059A (ja) 2016-05-09
CN105467745B (zh) 2019-12-20
TWI604264B (zh) 2017-11-01
TW201627751A (zh) 2016-08-01
TW201740184A (zh) 2017-11-16
KR20170117988A (ko) 2017-10-24
CN105467745A (zh) 2016-04-06
KR20160037806A (ko) 2016-04-06
KR102304206B1 (ko) 2021-09-17
TW201743129A (zh) 2017-12-16
TWI694302B (zh) 2020-05-21
TWI658320B (zh) 2019-05-01
CN110824828B (zh) 2023-12-29
KR102182505B1 (ko) 2020-11-24
JP6335735B2 (ja) 2018-05-30
TW201928507A (zh) 2019-07-16

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