TWI632400B - Line type light exposure apparatus and lenticular assembly - Google Patents

Abstract

The present invention relates to a line light source generating device, a lenticular lens sheet system used in the line light source generating device, and an exposure device including the line light source generating device. The invention further relates to a method of manufacturing a microwire source. The present invention further relates to a method of fabricating a microcircuit substrate using a line source having a fine line width and a microcircuit substrate manufactured by the method.

The line light source generating device of the present invention is manufactured by utilizing the linear light source characteristics of the lenticular lens sheet, and includes a light source and a lenticular lens plate system, and the light source uniformly illuminates the entire area of the lenticular lens sheet system with uniform intensity. The present invention uses a lenticular lens sheet system to produce a line source having a line size of nanometers. The lenticular lens system is composed of one or a plurality of stacked lenticular lens sheets. The invention can be effectively utilized in the field of exposure devices.

Description

Line source generating device and lenticular lens plate system thereof

The present invention relates to a line light source generating device, a lenticular lens system for the line light source generating device, and an exposure device including the line light source generating device. The present invention relates to a method of manufacturing a microwire source. The present invention also relates to a method of manufacturing a microcircuit substrate using a line source having a fine line width, and a microcircuit substrate.

The feature of the present invention is the use of the characteristics of a line source provided by a lenticular lens sheet. With the lenticular lens sheet system of the present invention, the line width of the line source can be made up to the nanometer size. A line source exposure apparatus in which a line of nanometer size occurs is an invention of the era. With conventional exposure devices, the area that can be exposed is very limited. In contrast, the exposure apparatus having the line light source generating device of the present invention is not subject to any length or amplitude of the exposure to be exposed. Can process large areas as needed.

The line light source generating device using the lenticular lens sheet of the present invention and the exposure apparatus including the line light source generating device utilize the concentrating function of the lenticular sheet. In particular, the vertical light function generated in the vicinity of the central portion of the lens of the lenticular lens sheet is effectively used. The line light source generating device of the present invention uses a lenticular lens sheet system in which a lenticular lens sheet is combined in various forms. The lenticular lens sheet system has a configuration in which a lenticular lens sheet is formed and a laminated body in which a plurality of lenticular lens sheets are stacked. The lenticular lens sheet lamination system is formed by appropriately combining a lenticular lens sheet or a concave lens sheet. The lenticular lens system can simultaneously utilize the light collecting function of the lenticular sheet and the light splitting function of the concave lens plate. The concave lens plate has a light splitting function. After splitting, the line source changes subtly and the number of line sources increases. This allows for more precise exposure work.

The exposure device is a device that transfers a pattern to a substance (photo-resist (PR), photosensitive material) that reflects light. The process is as follows. A substrate coated with a photosensitive material is prepared on the substrate, and a pattern film having a pattern formed thereon is placed on the substrate. Then, the pattern film is irradiated with ultraviolet rays. The ultraviolet ray exposes the photosensitive material in a shape of a pattern by a pattern film. After the exposure work, the non-exposed portion is chemically removed, and the desired pattern is transferred. In the present invention, a material of various forms in which a photosensitive material is applied is defined as a substrate. In the past, a parallel light exposure apparatus was used to manufacture a circuit having a fine pitch. Parallel light exposure devices are not only expensive to manufacture, but also have a limited area to be applied. In the present invention, an expensive exposure apparatus is used instead of a high-priced parallel light exposure apparatus, and an exposure apparatus having a line light source generating apparatus using a lenticular lens sheet is manufactured.

Generally, an exposure apparatus includes a light source, an optical system that processes light of the light source by arranging various lenses, a table, other transfer devices, a cooling device, and a controller. The exposure apparatus of the present invention is provided with an exposure apparatus using a line light source generating device of a lenticular lens sheet. The line source generating device includes a light source and a lenticular lens plate system. The exposure operation of the exposure apparatus of the present invention is accomplished by the relative transfer of the line source generating means to the pattern film or mask. The exposure apparatus of the present invention uses the line light source generating apparatus of the present invention instead of the optical system used in a general exposure apparatus. The line light source generating device of the present invention uses a lenticular lens sheet.

When the exposure apparatus of the line light source generating apparatus of the present invention is used, the photosensitive layer is accurately and precisely exposed in accordance with the pattern of the pattern film or the mask. Even a pattern with extremely fine pitch can be exposed, and the thickness of the photosensitive layer can be vividly exposed. The line light source generating device of the present invention replaces a complicated optical system which is formed by combining a very large lens with a simple structure. For fine and precise exposure, complex and large optical systems are used. However, in practice, only the effective area of the exposed substrate of the palm is obtained in the area near the center of the optical system.

However, the present invention is very surprising in that a simple lenticular lens system can be used to obtain a desired effective area. The thickness of the lenticular lens sheet system used in the present invention is mostly within 1 mm. At the current scientific level, the lenses that make up the optical system are made with very large physical limits. However, at the current scientific level, it is simple to make a lenticular lens sheet very large, and there is no limitation. Further, an exposure apparatus including the line light source generating device of the present invention is characterized in that it is very strong against vibration. Moreover, it can be correctly exposed even in a slightly vibrating environment.

The present invention relates to a line light source generating device, a lenticular lens sheet system for the line light source generating device, and an exposure device including the line light source generating device. The present invention relates to a method of manufacturing a microwire source. The present invention also relates to a method of manufacturing a microcircuit substrate using a line source having a fine line width, and a microcircuit substrate.

The feature of the present invention utilizes the characteristics of a line source possessed by a lenticular lens sheet. The exposure apparatus having the line light source generating device of the present invention can be manufactured at low cost, and a ripple effect can be obtained in the field of an exposure apparatus. Moreover, with the exposure apparatus of the present invention, it is possible to mass-produce a large-area micro-pitch circuit which cannot be fabricated by using a parallel light exposure apparatus. The technical aspects suitable for the field of exposure devices are an epoch-making advance.

It is an object of the present invention to expose an ultra-micro circuit at a low cost and to develop an exposure technique capable of exposing a large area. In order to develop this technology, the light collecting function and the vertical light function of the lenticular sheet are utilized. By maximizing the use of convex lenses The characteristics of the board, by the exposure technique of the present invention, even a circuit formed with a thick photosensitive layer and composed of ultra-fine pitch can be easily exposed. With the line light source generating device of the present invention, the largest feature is that even an ultra-micro circuit composed of a few micrometers can be exposed, and a large area can be quickly exposed, and the exposure operation can be continuously performed by scanning operation.

In terms of the working environment, laser processing is required in a space where there is no vibration. However, the exposure apparatus including the line light source generating device of the present invention is suitable even if there is a slight vibration that does not affect the resultant. The function of the microcircuit of the laser is formed by a point source, and the line source generating device of the present invention is in the form of a line source. With respect to the exposure speed, by scanning with the line source of the present invention, it is possible to easily and efficiently expose a large area. The observation of the result of the observation by precise observation confirmed that the cross section of the laser exposure by the point light source was very rough, and the exposure cross section exposed by the exposure apparatus of the present invention was very clean.

In order to expose an ultramicro circuit, a parallel light exposure device has been used. However, the parallel light exposure apparatus has a complicated structure of an optical system and a high manufacturing cost. The parallel light exposure device needs to be combined with a large lenticular lens plate and a concave lens plate to form a very complicated structure, so the manufacturing cost of the optical system is very high. Moreover, even if a large optical system is manufactured, the effective area in the optical system that can be used in actual work is limited to only the limited area of the center portion of the lens. However, the exposure apparatus of the present invention having a line light source generating device has a simple structure and is manufactured by using only the optical properties of the lenticular lens sheet without using expensive equipment. In the present invention, the light of the line source has the properties of a vertical light having a line shape or a parallel light having a line shape. The linear vertical light having a fine line width can reduce the light diffusion, the refracting, and the scattering effect even when the pattern film is transmitted, so that the ultrafine pattern can be accurately exposed.

In order to realize a large-area ultra-micro circuit, the following conditions are required. The line light source generating device of the present invention satisfies all of the following conditions: first, to prevent refraction and dispersion of light; second, to be a line source capable of rapidly performing scanning work; third, to collect light energy by a lens; fourth Compared with the exposed ultra-micro circuit, a line source with a finer line width is provided; and the fifth line source and the line source are not in contact with each other and have a spacing.

The light provided by the line light source generating device of the exposure apparatus of the present invention is irradiated to the substrate formed on the photosensitive layer through the pattern film or the mask. The illuminating light exposes the photosensitive layer in the shape of a pattern film or a pattern of the reticle.

Embodiments of the line source generating device of the present invention can be constructed in a wide variety of ways. The basic elements in the present invention include a light source and a lenticular lens plate system. In the line light source generating device, vibration is also applied to the lenticular lens system by a vibration mechanism. The most basic form is to fix the light source and lenticular lens system to prevent relative movement. When the line light source generating device is applied to the exposure device of the present invention, the line light source generating device moves relative to the pattern film provided in the exposure device, and the exposure operation is performed by the transfer operation.

A feature of the present invention is the use of a line source provided by a lenticular lens sheet. The lenticular lens sheet for the line light source generating device can have various pitches and focal lengths depending on the purpose of exposure. In order to expose ultrafine pitches, the lenticular lens sheets should also be designed to have a fine pitch. The line source cross-fade device preferably utilizes the lenticular sheet vertical light function that is vertically illuminated by the light transmitted through the lenticular sheet. For the vertical light, please refer to the details below. When the line light source generating device using the lenticular lens sheet of the present invention is applied to an exposure apparatus, the line light source generating means must be located on the pattern film or the upper portion of the reticle.

When the flexible substrate is continuously exposed by the exposure apparatus of the present invention, the line light source generating means is separated from the pattern film or the mask by a predetermined distance to prevent mutual rubbing. The exposure operation is performed by the transfer operation while the line light source generating means is separated from the pattern film. With this transfer operation, even if the area of the substrate is large, it can be easily exposed by the scanning operation of the line light source generating device. Generally, in all exposure apparatuses, a substrate is disposed under the pattern film or the mask, and a thin layer of photosensitive material is coated on the substrate. During the exposure operation, there is no possibility of sliding between the substrate and the pattern film, and no relative movement is allowed between each other. That is, in the exposure operation, the substrate and the pattern film are integrally moved.

The concave lens plate used in the present invention allows a line source collected by a lenticular sheet to be a line source having a narrower line width. At the same time, increase the number of rays of the line source. In this way, by increasing the number of rays of the line source and using a line source with a narrower line width, it is possible to expose more precisely. If a lenticular lens plate system combining the properties of a concave lens plate and a lenticular lens plate is used, an ultrafine line light source having a line source having a line width of several tens to several hundreds of nanometers can be produced. This means that if an exposure apparatus having the line light source generating device of the present invention is used, it can be exposed to a fine pitch of several micrometers.

In the exposure apparatus of the present invention, if the vertical light function of the lenticular sheet is used, the distance between the circuits to be exposed is only a few micrometers, and even if the thickness of the photosensitive layer used is thicker than several tens of micrometers, it can be exposed to be clean. The nature of the vertical light reduces light refraction, interference, and scattering, so the ultra-microcircuit can also be exposed. If the exposure operation is performed by the exposure apparatus of the present invention, there is no defect, it is clear, and a clean circuit can be constructed. Even in the case of a large-area substrate, the exposure apparatus having the line light source generating device of the present invention can directly expose a large area in a short time by the relative movement of the line light source generating means.

The exposure apparatus of the present invention requires a line source generating device and a pattern film or The line light source generating device and the reticle move relative to each other. The relative movement method includes: first, moving the line light source generating device when the pattern film or the reticle is stopped; second, moving the pattern film or the reticle when the line light source generating device is stopped; third, simultaneously moving the line Light source generating means and pattern film or reticle. When the exposure apparatus of the present invention is designed, it can be designed into different shapes as needed.

The line light source generating device of the present invention mainly uses the light collecting function of each lens constituting the lenticular lens sheet. In particular, when a line source having a fine line width is used, a concave lens plate and a lenticular sheet are laminated and used. Each lens of the lenticular lens plate has the function of collecting the light source in the form of a line light source, and each lens of the concave lens plate has a function of further subdividing the light in the form of a line light source. The lenticular lens plate and the lenticular lens plate system of the concave lens plate simultaneously perform the light collecting and splitting functions. The light transmitted through the lenticular lens system is formed into a line shape.

In the present invention, the function of blowing light by vertical illumination is utilized. The lenticular sheet refracts light from the source and focuses on the focus. However, the region near the central portion of the lens of the lenticular sheet is a region in which the refraction of light is very weak. Here, the light from the light source is not refracted, and the light from the light source is directly irradiated to the lower portion. In the present invention, the vertical light function of the lenticular sheet is concentrated. The line light source generating device uses a vertical light lenticular lens sheet. When an exposure apparatus including a line light source generating device is used, the thickness of the photosensitive layer is several tens of micrometers or more, and the exposure operation can be performed accurately even if the distance between exposures is only several micrometers. Even if the distance between the patterns formed by the pattern film or the reticle is ultra-fine pitch, if a vertical lenticular lens plate system is used, light scattering, refraction, diffusion, dispersion, and the like can be reduced, and the film can be cleanly and vividly exposed.

If a conventional parallel light exposure apparatus and the exposure apparatus of the present invention are compared, first, a parallel light exposure apparatus requires a high-priced optical system. Compared with this, this The exposure apparatus of the invention utilizes only the physical function of the lenticular lens sheet, so that the economic effect is good. Moreover, the conventional parallel light exposure apparatus is difficult to perform large-area exposure, but the exposure apparatus of the present invention easily and quickly performs large-area exposure by the relative movement of the line light source generating means.

The line light source generating device and the lenticular lens plate system of the present invention can be widely used in display devices and display panels in addition to the field of exposure devices. A display panel for a conventional display device transmits light from a backlight through a polarizing filter. At this time, if the polarizing filter is transmitted, the light from the backlight is greatly reduced. With this, power consumption is also high. At that time, if the line light source generating device of the present invention is used for a display device, a polarizing filter can be omitted. The polarizing filter has the function of a line source. The line source generating device of the present invention does not require a polarizing filter, but itself has the function of a line source. Moreover, the line light source generating device of the present invention does not cause light loss when the light source is provided. Thereby, if the line light source generating device of the present invention is used in place of the backlight and the polarizing filter of the display panel, since there is no light loss, the life of the battery can be greatly increased.

When the line light source generating device of the present invention is applied to a display panel, microvibration can be applied to the lenticular lens sheet system. Observing the line source of the line source generating device of the present invention, it can be seen that the interval between the line source and the line source is several micrometers. This interval can be solved by microvibration applied to the lenticular lens sheet. That is, by vibrating the lenticular lens system by vibration, the gap between the line source and the line source can be instantaneously filled. By the vibration of the lenticular lens system, the visual illusion effect of the image behind the display panel can be utilized. That is, due to the ultra-high-speed micro-vibration, the blank cannot be recognized by the human eye.

The present invention relates to a line light source generating device using a lenticular lens sheet, A lenticular lens system for the line light source generating device, an exposure device including the line light source generating device, and a method of manufacturing a fine line light source for converting light from a light source into a line source having a fine line width. The line light source generating device uses a lenticular lens plate system having a fine pitch. The present invention further relates to a method of manufacturing a microcircuit substrate using a line source having a fine line width and a microcircuit substrate manufactured thereby.

Hereinafter, various embodiments of the invention will be described. The present invention utilizes the characteristics of a line source produced by the lenticular lens sheet system of the present invention. The line light source generating device of the present invention is fabricated using a lenticular lens sheet system. An exposure apparatus including the line light source generating device is manufactured. When the line light source generating device of the present invention using the lenticular lens sheet is used, it is possible to produce an ultrafine micro line light source whose line width is a nanometer size. The lenticular lens sheet system of the present invention is constructed to produce a line source having a nanometer-sized wire web. The line light source generating apparatus using the lenticular lens sheet system of the present invention can be utilized in various industries, among which the most effective use is in the field of exposure apparatuses.

The line light source generating apparatus using the lenticular lens sheet of the present invention generally includes a light source and a lenticular lens sheet system, but may include other equipment. The light source utilizes an LED surface light source using a chemical semiconductor, or a light source in which a plurality of LEDs are mounted can be used. All illuminating illuminants can be used as light sources in addition to LEDs. In the present invention, a lenticular lens sheet system can also be constructed using a lenticular lens sheet. However, in most cases, a lenticular lens sheet and a concave lens plate are laminated for use, or a plurality of lenticular lens sheets are stacked for use. The intensity of the light source of the present invention that is exposed to the exposure is very important. Also, evenly distributing light plays a very important role. It is preferred that the light source from the light source is uniformly irradiated to the entire area of the lenticular lens sheet system with uniform distribution and uniform intensity.

In the exposure apparatus of the present invention, the line light source generating device of the present invention can perform the exposure operation when moving relative to the pattern film attached to the exposure device. The light source and the lenticular lens system constituting the linear light source generating device of the present invention are moved relative to each other in the same direction so as not to move relative to each other, and are moved toward the pattern film of the exposure device. To this end, the exposure apparatus of the present invention is mostly installed in a container with a light source and a lenticular lens system. As described above, when a light source and a lenticular lens system are mounted in a container, the light source is shaken in a plane inside the container, or microvibration is applied to the lenticular lens system. However, at this time, since the light source and the lenticular lens system are installed in one container, it is necessary to relatively move in the same direction with respect to the pattern film of the exposure device at the same speed.

In the present invention, the light transmitted through the line light source generating device of the present invention is preferably irradiated in the vertical direction. When irradiated in the vertical direction as described above, the light is not scattered to the outside, and the light is directly irradiated to the vertical direction without being refracted. In the present invention, the line light source generating device is referred to as a vertical light source generating device. In order to generate vertical light, the function of the central portion of the lenticular lens sheet is mainly used.

The lenticular lens sheet has a function of irradiating light to the substrate substantially in a vertical direction. In the present invention, the lenticular lens sheet is defined as a vertical light cylindrical lens sheet. The vertical light lenticular lens sheet as defined by the present invention does not mean that the light is directed toward the entire vertical direction, so that it means that it is substantially perpendicular to the vertical direction. The lenticular lens sheet used in the line light source generating device of the present invention can use a general lenticular lens sheet, but the accuracy of exposure work may be lowered. In the present invention, in order to perform the exposure work correctly, it is preferable to use a vertical light lenticular lens sheet that illuminates light substantially in the vertical direction.

The form of the lenticular lens sheet system used in the present invention is the simplest and The basic form consists of a lenticular sheet. Next, a concave lens plate is laminated on the lower portion of a lenticular sheet. However, in order to obtain a more excellent effect, it is possible to form a laminate of one or more lenticular lens sheets and one or more concave lens sheets. The lenticular lens sheet lamination system is formed by arranging a lenticular lens sheet or a concave lens sheet in an appropriate order.

The exposure apparatus of the present invention will be described below. The basic concept of the exposure apparatus will be described while explaining the exposure apparatus of the present invention. Further, the embodiment will be described with reference to the upper structure and the lower structure for the purpose of specifically explaining the structure.

The exposure apparatus of the present invention includes a line light source generating device using a lenticular lens sheet. The line source generating device includes a light source and a lenticular lens sheet system. The exposure operation of the exposure apparatus of the present invention is achieved by the relative movement of the line source generating means and the pattern film. In the description of the present invention, the pattern film and the photomask have almost the same functions and almost the same functions. Therefore, only the pattern film will be described here, and the same applies to the photomask unless otherwise specified.

When the exposure operation is performed by the exposure apparatus of the present invention, the exposure operation can be performed as long as the relative movement between the line light source generating means and the pattern film is performed. In order to perform the exposure work, it is necessary to relatively move the line light source generating device and the pattern film, and the relative movement method has three forms. First, the case where the line light source generating means is moved and the pattern film is fixed; secondly, the line source generating means is fixed to move the pattern film; and third, the line source generating means moves together with the pattern film, but The movement speed is different. The movement of the substrate disposed on the lower portion of the pattern film and the table disposed on the lower portion of the substrate can be appropriately designed as needed. The exposure apparatus of the present invention is applied to one of the above three forms. The structure is designed according to the action of the exposure device. This structural design is well known in the art, and therefore its description will be omitted.

In order to further explain the structure of the exposure apparatus of the present invention, the present description will be described. The upper structure of the exposure apparatus of the invention. The line structure generating device is formed in the upper structure. The superstructure may further include a transfer device, a cooling device that cools the heat of the light source, a controller, and the like. An elastic roller may also be further included.

The lower structure of the exposure apparatus of the present invention is formed below the structure of the upper structure. A table is provided in the lower portion of the exposure apparatus of the present invention. A substrate on which the photosensitive material is coated is detachably mounted on the table. A means for adhering to the substrate can be provided at the table. The lower configuration may include a conveying device for conveying the table, a cooling device for cooling the line source generating device, a power supply device, a controller, and the like.

A pattern film or a substrate on which a photomask and a photosensitive layer are formed, or the like is detachably mounted between the upper structure and the lower structure. The pattern film between the upper structure and the lower structure or the substrate on which the photomask and the photosensitive layer are formed, or the like can be removed at the end of the preparation for the exposure work or the exposure work. A member detachable from the structure of the exposure apparatus of the present invention is not considered as a constituent element of the exposure apparatus, but is defined as an accessory.

The order of the exposure apparatus constituting the present invention is as follows, but may be changed depending on the circumstances and characteristics. A pattern film or a mask and a substrate are disposed between the line source generating device and the stage. The substrate is located under the pattern film or the reticle and is detachably mounted on the work surface. A lower means for adhering the substrate to the table, a conveying means for conveying the table, a cooling means for cooling the light from the light source, a power supply means, a controller, and the like may be disposed at a lower portion of the table.

The light from the line source made by the line source generating device of the present invention is irradiated to the pattern film or the mask of the exposure device. The light of the line source is exposed to the photosensitive layer of the substrate after passing through the pattern film or the mask.

When performing the exposure work, the pattern film or the photomask is in close contact with the substrate or The substrate is removed. During the exposure operation, no slippage occurs between the pattern film or the mask and the substrate. Further, when the exposure operation is performed, usually the substrate does not slip against the table, but there is a case where sliding occurs between the substrate and the table.

When the exposure work is performed, when there is no slip between the substrate and the table, the substrate and the table can be closely adhered to the table, and the adhesion means is formed on the table, and the substrate is adhered by vacuum pressure. The workbench. At this time, the line light source generating means moves to fix the table, and the line light source generating means can be fixed to move the table.

In the case where the exposure work is performed, the substrate is slid with respect to the stage, and the flexible substrate is used, and the substrate is wound and wound while the exposure is continuously performed. At this time, the stage and the line light source generating device are stopped, and the pattern film and the substrate are in close contact with each other or are separated from each other, and are slidably moved with respect to the table.

At this time, an elastic roller is formed in the upper structure, and the pattern film can be pressed by the elastic roller. That is, the pattern film is pressed against the substrate by pressing with the elastic roller, so that the pattern film is integrated with the substrate and is slidably moved with respect to the stage in the stopped state. At this time, the elastic roller moves in the same manner as the line light source generating device. In the exposure work, the upper structure of the line source generating device is stopped.

In the exposure apparatus of the present invention, a device for generally moving the upper structure and the lower structure, a cooling device for removing heat from the light source, a superstructure driving device, a substructure driving device, Controller, power supply, etc. Appropriate configurations are omitted in the present invention. An embodiment of the exposure apparatus of the present invention will be described below. However, the invention is not limited to the embodiment.

Fig. 1 is a view showing the concept of the exposure apparatus of the present invention. The exposure apparatus of the present invention comprises the line light source generating apparatus of the present invention. The exposure apparatus 1 of the present invention constitutes a basic frame by a device unit including a substrate structure 9, a line light source generator 2, and an opening and closing port. The specific configuration of the exposure apparatus will be described using the concepts of the upper structure and the lower structure.

The line light source generating device 2 of the present invention includes a light source 4 and a lenticular lens sheet system 5. The light source uniformly illuminates the entire area of the lenticular lens sheet system having a predetermined area. The most important part of the exposure apparatus having the line light source generating device of the present invention is a lenticular lens system.

The line light source generating device of the present invention has many forms. The line source generating device includes a light source and a lenticular lens plate system. The lenticular lens system does not move relative to the light source. The simplest form of the line source generator is in the form of the same container mounted light source and lenticular lens system. At this point, the light source is rocking within the container, and the lenticular lens system can be microvibrated within the container. In the exposure operation, the line light source generating device moves relative to the pattern film mounted on the exposure device.

Mounting the light source and the lenticular lens system in the same container is a common construction of the linear light source generating device of the present invention. It is also possible to mount the light source and the lenticular lens system in a container without being mounted in a container. Moving the entire light source and the lenticular lens system at the same speed in the same direction is one of the core concepts of the present invention. The light source and the lenticular lens system cannot move with each other, which is the core technology of the present invention. Since the light source and the lenticular lens system move together at the same speed in the same direction, it is a matter of course that the lenticular lens system is also in a stopped state when the light source is in a stopped state.

In the technique of using a lenticular lens sheet, there is a line light source of the present invention Stereoscopic camera technology with different mechanisms of the device. In the stereoscopic video camera, a lenticular lens sheet is disposed in front of the negative film on which the image is recorded. When capturing a stereoscopic image, open the shutter of the camera and open the lens. When shooting, the film is at a standstill, and multiple images are recorded while moving the subject. As another method, there is a method in which a subject is in a stationary state, and a plurality of images are recorded while moving the lenticular sheet and the negative film. This mechanism is quite different from the mechanism of the present invention. The subject corresponds to a light source.

The stereoscopic image camera uses a mechanism in which the lenticular lens sheet is in a stationary state, but only the light source is moved, or the light source is in a stationary state, and only the lenticular lens sheet is moved. A mechanism for recording a stereoscopic image using a lenticular lens sheet is often used in a recording apparatus for stereoscopic images. Observing the stereoscopic image, it is known that a plurality of images are recorded on the bottom surface by the lenses of the respective lenticular sheets. This means that a plurality of images having mutually different light angles are recorded in a plurality of lenticular lens plate pitches for the same subject. This makes it possible to observe the principle of a stereoscopic image by recording an image of a subject having a different angle of light between the lenses of the lenticular sheet.

A substrate uniformly coated with a photosensitive material is disposed on a stage of the exposure apparatus of the present invention. The substrate can be detached from the table during the preparation of the exposure work or the end of the exposure work. The substrate can be tightly fixed to the upper portion of the table by the abutment means. A pattern film or a photomask is placed on the substrate. The pattern film or mask can be detached from the table when preparing for exposure work or ending exposure work.

The patterned film or reticle is in close contact with or isolated from the substrate. The pattern film or reticle does not move relative to the substrate during the exposure operation. The pattern film or the reticle and the line source generating means should move relative to each other during the exposure operation of the exposure apparatus. That is, when the line light source generating device is in a stationary state, the pattern film or the mask moves, and when the pattern film or the mask is in a stationary state, the line light source occurs. The device moves. It is also possible to move the line light source generating means together with the pattern film. At this time, the moving speed of the line light source generating means and the pattern film should be made different.

In the exposure apparatus of the present invention, the lenticular lens system of the line light source generating device is disposed under the line light source generating device. The lenticular lens sheet system disposed in the line light source generating device preferably has a predetermined distance to prevent friction with the movement of the pattern film or the reticle. For the correct exposure work, the smaller the distance, the better.

This relative movement can be achieved by various transfer means 3. In the exposure apparatus of the present invention, in order to move the line light source generating device, a motor and a rail are used, or a rack and pinion structure is used, or various forms such as an LM guide are used. Referring to Fig. 1, it is also possible to move by a motor drive using a slide bar.

In the exposure operation of the exposure apparatus of the present invention, the line light source generating means may be in a stationary state, and the substrate structure 9 disposed at the lower portion of the line light source generating means may be moved. In the present invention, the substrate structure is a general term for the structure of the lower portion of the line light source generating device. The substrate structure may include a table, a table transfer device, a vacuum pressure generating device, a cooling device, and the like. The substrate coated with the photosensitive material is detachably disposed on a stage which is constructed independently of the substrate structure.

When the substrate is mounted on a workbench, an adhesion device for attaching the substrate to the workbench by vacuum pressing may be provided. The table transfer device of the table of the mobile exposure device can be configured in various forms. Suitable devices are included in the substrate structure. At the lower portion of the pattern film 6 or the reticle, the substrate is detachably mounted on the stage of the exposure apparatus. The photosensitive layer 7 is uniformly coated on the substrate 8. The patterned film or reticle is in close contact with or isolated from the substrate. In the exposure operation, the pattern film or mask is not allowed to move relative to the substrate.

The photosensitive layer on the substrate is coated with a transparent protective film to protect the photosensitive material. When the exposure operation is performed by using the exposure apparatus of the present invention, the exposure operation is performed in a state in which a transparent protective film is adhered, or the transparent protective film is removed to perform an exposure operation. When the exposure is performed in a state in which a transparent protective film is adhered, the photosensitive layer is protected, and when the transparent protective film is removed, the exposure is performed, and the exposure can be performed with precision.

When the state of the transparent protective film is peeled off, the pattern film or the mask is not allowed to damage the photosensitive layer. To this end, first, the pattern film or the photomask is separated from the photosensitive layer by a predetermined distance for exposure work, and secondly, the profile is added to the surface of the pattern film or the photomask, and then adhered to the photosensitive layer for exposure work.

If the exposure work is performed while the photosensitive layer is adhered to the protective film, the photosensitive material is not damaged. The most accurate exposure method in theory is to expose the pattern film or the photomask to the photosensitive layer in a state where the protective film of the photosensitive layer is peeled off. Secondly, in a state in which the protective film of the photosensitive layer is adhered, the pattern film or the photomask is adhered to the photosensitive layer, and then exposure work is performed. Third, in a state where the protective film of the photosensitive layer is peeled off, the pattern film or the photomask is isolated from the photosensitive layer to perform an exposure operation. Fourth, in a state in which the protective film of the photosensitive layer is adhered, the pattern film or the photomask is isolated from the photosensitive layer for exposure work.

Exposure work under the condition of sticking the protective film is beneficial to not damage the photosensitive layer, but the transparent protective film is affected by light refraction, interference and diffusion. The exposure apparatus of the present invention can be manufactured to appropriately correspond to exposure conditions and states on site.

When the line light source generating device 2 of the present invention irradiates light to the pattern film 6, the transparent portion of the pattern film transmits light, and the opaque portion cuts off light. The light collected by the line light source generating device 2 of the present invention passes through the transparent portion of the pattern film 6 to harden the photosensitive layer. If formed by the line source generating device of the present invention When the light of the line source is irradiated to the pattern film, the photosensitive material is exposed in accordance with the pattern of the pattern film. After the exposure work, the portion of the photosensitive material that is not exposed, that is, the portion that is not hardened is chemically removed, and the pattern formed by the exposed portion is formed on the flat plate 8.

In the exposure apparatus of the present invention, the substrate is detachably mounted on the stage of the exposure apparatus. When performing the exposure work, it is preferred to adhere the substrate to the workbench. To this end, micropores are formed on the upper portion of the table, and the substrate is tightly fixed to the table by vacuum pressing. For convenience of explanation, a plate uniformly coated with a photosensitive material is referred to as a substrate, and a state in which the substrate is flattened is referred to as a flat plate. The pattern film or the reticle is detachably disposed on the lower portion of the in-line light source generating device and the upper portion of the substrate.

In the state in which the exposure operation is performed by the exposure apparatus of the present invention, the pattern film is not allowed to move relative to the substrate, and no sliding is allowed. The substrate uniformly coated with the photosensitive material may have various forms. There is also a form in which a very thin photosensitive material is coated on an undeformed hard substrate. The exposure operation can be continuously performed in a state in which the flexible substrate is wound.

In the exposure apparatus of the present invention, a drum on which a flexible substrate can be wound is formed on both sides or one side of the exposure apparatus. Thereby, the exposure work can be continuously performed.

The line light source generating device of the present invention may include constituent elements for performing other functions in addition to the light source lenticular lens sheet system. In the line light source generating device of the present invention, even if the other constituent elements are included, the so-called light source 4 having the core elements of the line source generating device and the lenticular lens sheet system 5 disposed at the lower portion of the light source are all generated by the line source of the present invention. Device.

The lenticular lens sheet system used in the present invention has the following forms. First, a configuration in which one lenticular lens sheet is formed; and second, a configuration in which a plurality of lenticular lens sheets are stacked. A lenticular lens system composed of a lenticular lens sheet is used A lenticular sheet or a concave lens plate is used. The lenticular lens sheet system in which a plurality of lenticular lens sheets are stacked has a form in which lens plates of the same shape are stacked, or a combination of different types of lens plates is appropriately combined and stacked. The form in which the lens plates are stacked in the same manner is a form in which a lenticular lens sheet is laminated and a form in which a concave lenticular lens sheet is laminated, and a form in which different types of lens sheets are stacked has one or more lenticular lens sheets and one or more concave lens sheets arranged in an appropriate order.

At least a portion of the lenticular lens sheet of the lenticular lens sheet system of the present invention preferably includes a vertical light lenticular lens sheet. The vertical light lenticular lens sheet includes a vertical light lenticular lens sheet or a vertical light concave lens sheet. The lamination combination or arrangement order of the lenticular lens sheets can be designed according to the circumstances, and thus can be applied in various forms. When the lenticular lens sheet or the concave lens plate is laminated, the front surface of each of the lenticular lens sheets may be laminated or the opposite surface may be laminated.

In the lenticular lens system of the present invention, a lenticular lens sheet is generally disposed at the uppermost portion, but a concave lens plate may be disposed. A concave lens is laminated on the lower portion of the lenticular sheet. The number of the concave lens plates is at least one or more. When dividing the collected light from the line source into more light, the number of concave lens plates can be increased.

When the exposure apparatus including the linear light source generating apparatus of the present invention is manufactured, the line light source generating device is disposed on the pattern film or the upper portion of the mask. For continuous exposure work, the line light source generating device is configured to be spaced apart from the pattern film or the reticle by a predetermined distance to perform relative movement without friction.

Figure 2 is a schematic view of a general lenticular lens sheet. As shown in Fig. 2, the lenticular lens sheet 10 is continuously connected to the shape of a pillar having a convex portion. The lenticular lens sheet is formed by continuously connecting a plurality of lenticular lens sheets 11 toward the side. Each of the lenticular lens sheets has a long column shape.

The lenticular lens sheet has a shape in which a plurality of lenticular lens sheets are connected sideways. Each of the convex lens lenses is formed on one side surface to form a plane on the other side surface The shape of the pillar forming the boss. The light of the light source converges into a line shape by the respective convex lenses of the lenticular sheet. The lenticular sheet is often used to record or reproduce stereoscopic images.

Fig. 3 is a schematic view showing a state in which light from a light source is concentrated by a lenticular sheet. Each of the lenticular sheet lenses 13, 14 converges the light of the light source 12. After the lower portion of the lenticular lens sheet is in contact with the photosensitive layer, the light is irradiated, and the concentrated light exposes the photosensitive layer 15 in a line shape. The concentrated light forms the exposure portion 16. A linear exposure portion and a non-exposure portion appear in the photosensitive layer.

Referring to the drawings, when the light of the light source 12 is irradiated to the lenticular lens sheet, the light is concentrated toward the respective lenticular lens sheets 13, 14. When the curvature of the lens is changed, the focal length of the lens changes. At this time, the light concentrated on the photosensitive material 15 can be adjusted by adjusting the focal length of the lenticular sheet. With this feature, the light collecting ability of the lens can be adjusted. The exposure portion 16 is formed on the photosensitive layer 15 by the concentrated light.

Fig. 4 is a view showing the state of vertical light generated at the central portion of each of the lenses of the lenticular sheet. The lenticular sheet refracts light from the upper portion by the curved surface of each lens and gathers toward the focus. At this time, the light that is irradiated to the vicinity of the center of the lenticular lens sheet produces a fine refractive effect. That is, in a state where the refraction is very small, the lower portion is vertically irradiated. The farther away from the center of each of the lenticular lens lenses, the more the light is refracted and converges in focus. A light collecting phenomenon is generated by the refraction. The further away from the center of each lens, the greater the angle of refraction.

In the lenticular lens sheet, a portion that is irradiated toward the lower portion substantially perpendicularly in a state where the refraction of light is very fine is defined as a vertical light region. The vertical light area corresponds to a region near the central portion of each of the lenses of the lenticular sheet.

a region near the central portion of each lens of the lenticular lens plate constitutes a convex lens The board is defined as a vertical light lenticular sheet. The light is also irradiated to the lower portion almost vertically in the vertical light lenticular sheet. However, the system is not in a state of no refraction at all. Since the vertical lenticular lens sheet also has a refractive effect, the light collecting function can be performed. A vertical lenticular lens sheet can be expressed as light illuminating almost in a vertical direction as compared with a general lenticular lens sheet. In the present invention, the vertical lenticular lens sheet has a refractive effect, but its refractive effect is very small.

In the present invention, for convenience of explanation, the vertical light lenticular lens sheet cuts only the region near the center of each lens of the lenticular lens sheet, and is connected only to form a lenticular lens sheet. A vertical lenticular lens sheet that functions to converge light from a source and pass it to the lower portion, where it is transmitted almost vertically. In the present invention, the central portion of the lenticular lens sheet does not refer only to the central portion of the lenticular lens sheet. It includes a small-range area 18 on the left and right sides of the center of the center.

The predetermined range region 18 near the center of the lenticular lens sheet converges the light from the light source 17 and transmits it almost vertically to the lower portion. The refraction of the predetermined range region 18 near the center of the lenticular lens sheet becomes minimum. The light that has been irradiated to the area is concentrated and then irradiated vertically downward.

In the present invention, the light that is concentrated by the region near the center of the lenticular lens sheet and concentrated in the vertical direction is defined as vertical light. In the present invention, the area of the lenticular lens sheet is defined as a vertical light area 18, and the area of the lenticular sheet lens causes light to be concentrated almost in the vertical direction to be irradiated downward. The predetermined range near the center of the lenticular lens sheet becomes a vertical light region. The vertical light lenticular sheet is also the object of protection of the invention.

In the present invention, vertical light means substantially vertical. The vertical light lenticular lens sheet is a representative example of the lenticular lens sheet system used in the line light source generating device of the present invention. The lenticular lens sheet of various forms can be used in the exposure apparatus of the present invention, but the effect of the vertical lenticular lens sheet is the best. Exposure device of the invention In addition to the vertical lenticular lens sheet, a variety of lenticular lens sheets can be used.

If you want to obtain a line source with a fine line width, the distance between the lenticular lens sheets used must be fine. As an embodiment, when the distance between the perpendicular light convex lenses is 20 micrometers, the line width of the line light source is 3 micrometers. A microcircuit having a pitch of 20 μm was constructed using the lenticular lens sheet system. It is understood that in the lenticular lens sheet, the efficiency of the line light source generating device changes depending on the distance between the lenticular lens sheets and the focal length. A vertical light lenticular lens sheet having an ultrafine pitch can be produced by various methods. Hereinafter, various methods of manufacturing a vertical light lenticular lens sheet will be described.

After the shape of the area near the center of the center of the lenticular lens sheet is formed by a bite or laser processing, it can be reproduced continuously. The distance between the vertical light lenticular lens plates is significantly smaller than the distance between the general lenticular lens plates. It is suitable to form a lenticular lens sheet only by taking a region near the center of the lenticular lens sheet. A circuit substrate having a pitch of several micrometers can be processed only when the distance between the vertical light lenticular lens sheets is several tens of micrometers or less.

Fig. 5 is an explanatory view showing the structure of a vertical light lenticular lens sheet of the present invention. In the present invention, the vertical light lenticular lens sheet can be constructed by various embodiments. Fig. 5 is made by connecting only the vertical light regions 21 of the respective lenticular lens sheets. A representative form of the vertical light lenticular lens sheet of the present invention is suitable. The light of the light source located at the upper portion is irradiated to the lower portion in a substantially vertical direction by the vertical light lenticular lens sheet of the present invention.

Fig. 6 is an explanatory view showing a vertical light lenticular lens sheet which forms a lens shield on a lenticular sheet to realize vertical light. This figure is an embodiment of the vertical light lenticular lens sheet of the present invention. In each of the lenticular lens sheets, the opaque shield 24 is partially filled except for the vertical light region 25, thereby shielding light from transmitting. The lenticular lens sheet constitutes a vertical light lenticular lens sheet by filling an opaque shield with a portion other than the vertical light region. A photosensitive material is formed under the vertical lenticular lens sheet, and the exposed portion 26 is formed by irradiating light only to the vertical light region 25 of the lenticular lens sheet.

Fig. 7 is an explanatory view showing a vertical light lenticular lens sheet in which a light transmission slit is formed in a lenticular sheet. In this embodiment, a light transmission slit is formed at a lower portion of the lenticular sheet. The light transmission slit is formed at a lower portion of the center portion of each of the lenticular lens sheets 29. The light transmission slit is formed to transmit light only through a region in the lower right center of the lenticular lens sheet 29. The light transmission slit can be manufactured by forming a long groove in the longitudinal direction of each lenticular lens sheet on the opaque plate.

The light is transmitted through the slit from the film, and the film is formed into a transparent portion so that the light passes only through the region in the lower central portion of the lenticular lens sheet 29. When the light collected by the respective lenses 29 of the lenticular sheet is irradiated to the lower portion, only the light transmitted through the slit through the light is allowed to be irradiated to the lower portion. When the photosensitive layer is disposed under the light transmission slit, the collected light is irradiated onto the photosensitive layer to form the exposure portion 33. The light transmission through the slit is supported by the slit support body 33.

As another embodiment of the vertical light cylindrical lens plate of the present invention, the shield of Fig. 6 and the light transmission slit of Fig. 7 are simultaneously formed on the lenticular lens sheet. In the present invention, as long as one portion of the lenticular lens sheet can form vertical light, the lenticular lens sheet is referred to as a vertical light cylindrical lens sheet. Usually, a lenticular lens sheet is formed by connecting a plurality of lenticular lens sheets. Each of the lenticular lens sheets has the same cross section toward the longitudinal direction of the lens. In the present invention, as long as the number of the lenticular lens sheets is one or more, it is called a lenticular lens sheet. Therefore, a cylindrical lens plate in which the number of lenticular lens sheets is one also belongs to the present invention.

The more the number of lenticular lens lenses, the easier it is to expose. That is, the more the number of the lenticular lens sheets, the shorter the exposure time. In the embodiment of the present invention, light is more effectively utilized by using a Fresnel lens. Suitable embodiments are also within the scope of the invention.

The concept of the line source generating device using the lenticular lens sheet of the present invention is very important. The line light source generating device of the present invention must use a lenticular lens sheet. The line light source generating device of the present invention comprises a light source and a lenticular lens sheet system. The light source and the lenticular lens system are mounted in a single container, which is a representative embodiment.

In the present invention, the light source includes an LED light source, and various forms of light sources can be used. The light source is preferably uniformly illuminated over the entire area. In order to achieve uniform distribution of light, in the present invention, the light source is rocked in the front and rear and/or left and right directions in a plane parallel to the lenticular lens system. To adjust the light intensity, the distance to the lenticular lens system is adjusted by moving the light source up and down. As a method of adjusting the distance, a bolt or other various methods can be used. Further, a vibration means is provided in the lenticular lens system so that microvibration can be applied.

The lenticular lens sheet system of the present invention may include more than one lenticular lens sheet, or may include more than one concave lens sheet, or may include more than one lenticular lens sheet and one or more concave lens sheets. The lenticular lens system preferably includes more than one vertical light lenticular lens sheet. In the present invention, it is preferable that all of the lenticular lens sheets constituting the lenticular lens sheet system are formed of a vertical light lenticular lens sheet. Here, the vertical light lenticular lens sheet includes a vertical light lenticular lens sheet or a vertical light concave lens sheet.

The lenticular lens system may include more than one lenticular lens sheet formed with an opaque shield. The lenticular lens system can include more than one shape A lenticular lens sheet having light transmitted through the slit. The lenticular lens sheet system may include one or more lenticular lens sheets on which the light shielding portions are formed.

The line light source generating device of the present invention comprises a light source and a lenticular lens sheet system, and the light source and the lenticular lens sheet system do not move with each other, but are fixed. As other embodiments, the line source generating device includes a light source and a lenticular lens system that is mounted in the same line source container as the lenticular lens system.

When the lenticular lens sheet system of the present invention is composed of only one lenticular lens sheet, the same number of lines as the lenticular lens sheet lens are formed under the lenticular lens sheet system. That is, when only one lenticular lens sheet is used, the number of the lenticular lens sheets forms a line of the line light source.

Hereinafter, the terminology defining the size of the line light source generating device will be described. The size of the line source generating device will be compared with the size of the lenticular lens system. In the lenticular lens system, the length direction of the lenticular lens sheet is defined as the length of the lenticular lens system, and is defined as the length of the linear light source generating device. The size of the lenticular lens system is defined as the amplitude of the lenticular lens system relative to the right angle of the lenticular lens sheet and is defined as the amplitude of the linear light source generating device. When the exposure operation is performed, the line light source generating means relatively moves toward the amplitude direction of the lenticular lens sheet, that is, in the amplitude direction of the line light source generating means.

In order to perform large-area exposure work using the exposure apparatus of the present invention, the length of the line light source generating means must be long, and the transmission distance to the amplitude direction of the line light source generating means must be long. Since the transfer operation can be performed in the amplitude direction of the line light source generating device, large-area exposure can be performed even if the line light source generating device has a small amplitude. The length of the line light source generating device of the present invention, that is, the length direction of the lenticular lens sheet is the same when manufacturing the lenticular lens sheet Can be manufactured to any length. Therefore, the present invention can perform large-area exposure work.

Hereinafter, an embodiment of the size of the line light source generating device of the present invention will be described. When the size of the substrate to be exposed is 1 m in width and 2 m in length, the amplitude of the line source generating device is approximately 10 cm, and the length of the line source generating device is slightly larger than 1 m. At this time, the transmission distance needs to be 200m or more.

In the exposure work, the line light source generating device of the present invention must be moved relative to the pattern film. In the exposure apparatus of the present invention, the lenticular lens system is disposed at the bottom of the in-line light source generating device, and is disposed on the pattern film or the upper portion of the mask. In order to enable the pattern film or the reticle and the line source generating device to move in a frictionless state, it is preferred to separate the pattern film or reticle from the line source generating device by a predetermined distance.

In the exposure operation, a large-area exposure portion can be formed by the relative movement of the line light source generating device of the present invention and the pattern film or the photomask. The relative movement of the present invention can be achieved by various methods. As a specific example, a case where the line light source generating means is moved and the pattern film is fixed together with the stage of the exposure apparatus will be described. The linear light source generating device forms a rail and a driving portion. The driving portion is formed by a driving motor having a driving gear, and a rack gear that meshes with the driving gear can be formed in the rail portion.

The line light source generating device of the present invention uses the light collecting function of the lenticular lens sheet. In the exposure apparatus of the present invention, the light collecting function of the vertical light lenticular lens sheet is maximally used, and in this case, even if the thickness of the photosensitive layer is several tens of micrometers or more, and the distance between the exposed circuit amplitudes is several micrometers, it can be cleanly exposure. Since it can be exposed cleanly, there is no defect and it can constitute a clear circuit. In particular, when the line light source generating device of the present invention uses a vertical light lenticular lens sheet, vertical light from the line light source generating device can prevent light Scattering, refraction, and reflection.

The line light source generating device using the lenticular lens sheet of the present invention as a basic element includes a light source and a lenticular lens sheet system. The form of the lenticular lens sheet system is roughly classified into two types. The first type is formed by one lenticular lens sheet, and the second type is a lenticular lens sheet laminated body in which a plurality of lenticular lens sheets are stacked. The lenticular lens sheet lamination system is formed by appropriately combining a lenticular lens sheet or a concave lens sheet. A typical example of the lenticular lens sheet system is an example in which one or more concave lens plates are stacked under the lenticular lens sheet. The form of the lenticular lens sheet system has a form in which only one or more concave lens sheets are stacked, and various other laminated forms exist.

In the present invention, a laminated body of a laminated lenticular lens sheet and a concave lens plate is used as the lenticular lens sheet system, and a circuit having a finer pitch can be exposed during the exposure operation. If a laminated lenticular lens sheet is used, a line source of a line source having a line width of several tens of nanometers can be produced. If the film is irradiated with a line source having a line width of several tens of nanometers, exposure operation with a circuit amplitude of several micrometers can be performed.

Hereinafter, the lenticular lens sheet and the concave lens plate will be briefly described. The lenticular lens sheet is made of a transparent material. One side is formed as a flat surface, and the other side is formed as a convex lens or a concave lens. The concave lens or the convex lens is continuously arranged in the form of a column. The concave lens plate is made of a transparent material, and one surface is formed into a flat surface, and the other surface is formed by continuously arranging concave lenses in the form of pillars.

Figure 8 is a perspective view of a concave lens plate. The lenticular lens sheet is formed by continuously connecting the columns of the convex lens, and the concave lens plate 34 is formed by continuously connecting the columns of the concave lens. Light is collected by the lenticular sheet, and the light is divided into a plurality by the concave lens plate. The lenticular lens sheet system of the present invention may be configured by arranging one or more lenticular lens sheets, or arranging one or more concave lens sheets, or laminating a laminated body of one or more lenticular lens sheets and one or more concave lens sheets.

The lenticular lens sheet system of the present invention can be constituted by a lenticular sheet. this The lenticular lens sheet system of the invention is formed by laminating a lenticular lens sheet and a concave lens sheet in various orders, and different effects can be obtained according to the lamination order and the method. The lamination order of the lenticular lens sheets greatly affects the performance of the exposure apparatus, and therefore should be designed according to the situation.

Figures 9a, 9b, and 9c are embodiments of a lenticular lens plate system. In Fig. 9a, a concave lens plate is laminated on the lower portion of the lenticular sheet. The lenticular lens plate functions as a convex lens, and the concave lens plate lens functions as a concave lens. The central portion of the concave portion in the concave lens plate is referred to as a concave hook.

In Fig. 9b, four concave lens plates 38, 39, 40, 41 are laminated on the lower portion of the lenticular lens sheet 37. Different effects can be obtained when the concave concave lens plate is arranged. The performance of the lenticular lens system can be changed by laminating the concave lens plate at the uppermost portion and morphing the convex lens plate at the lowermost portion.

Fig. 9c shows an embodiment in which a concave lens plate is disposed under the lenticular lens sheet, and a convex lens plate 44 is disposed under the concave lens plate 43.

Hereinafter, the form in which the light collected by the lenticular sheet is divided by the concave lens plate will be described. The concave lens plate has a splitting effect of the light dividing the line source. The lenticular lens sheet is disposed at the upper portion, and when the concave lens plate is laminated at the lower portion, the light from the light source is transmitted to the concave lens plate by the same amount of light as the lens of the lenticular lens sheet. The light is split by the lens of the lower concave lens plate.

The same amount of light as the lens of the lenticular sheet is split into a greater amount of light by the concave lens plate located at the lower portion. The line source is split into a larger number of line sources by a concave lens plate. At the same time, the line width of the line source is changed fine. The line source with reduced line thickness is subject to little refraction and interference and passes through the pattern film.

This means that the exposed layer of the substrate can be exposed more finely. By collecting and dividing the light by the laminated lenticular lens sheets, the line width of the first and line light sources is thinned, and the number of the second and line light sources is increased. Used in the present invention by columnar The mirror system collects or splits the light so that the exposure can be performed more finely. In the present invention, a line source made by a lenticular lens system can be made into a light having a line width of several tens of nanometers to several hundreds of nanometers.

Fig. 10 is a structural view of a vertical light lenticular lens sheet having a light shielding portion. In the present invention, a line source of several tens of nanometers to several hundreds of nanometers can be produced by a laminated lenticular lens sheet system. However, at this time, the interval between the adjacent line sources passing through the lenticular lens system is too narrow. Too dense a line source can cause undesirable phenomena. If the interval between adjacent rays is too narrow, it will become a block.

Therefore, when the in-line light source passes through the pattern film, light interference and refraction occur, and the exposure operation cannot be performed correctly. In order to prevent adjacent line light sources from being coupled to each other, as shown in Fig. 10, a light blocking portion 47 for cutting light is provided between the lenticular lens sheets 46.

In the present invention, whether it is a lenticular lens plate or a concave lens plate, a light shielding portion is provided between the lens and the adjacent lens to prevent light from entering. Thus, in the region where the lenticular lens sheet is formed to prevent light from transmitting, the present invention is defined as a light shielding portion. The light shielding portion forms a flat portion between the lens and the lens, and is printed as an opaque portion by a printing method, or a flat portion is formed between the lens and the lens, and a pattern film forming an opaque portion is adhered to the flat portion. In the present invention, a suitable lenticular lens sheet is defined as a lenticular lens sheet 45 having a light shielding portion.

Fig. 11 is a structural view showing a concave lens plate having a light shielding portion. Corresponding to a lenticular lens plate having a light shielding portion. In the concave lens plate 49 including the light shielding portion 50, the light shielding portion 50 is disposed between the concave portion 51 and the concave portion.

Fig. 12 is another embodiment of a lenticular lens system having a light shielding portion. The lenticular lens sheet 53 including the light shielding portion and the concave lens plates 54, 55 and 56 having the light shielding portions are laminated to constitute a lenticular lens system including a light shielding portion.

Fig. 13 is a view showing a laminated lenticular lens sheet 57, 59, 61 having a light shielding portion and The other lenticular lens sheet system including the light shielding portion is configured to include the concave lens plates 58 and 60 of the light shielding portion. This configuration has the advantage of separating the line source and the line source that occur in the lenticular lens system. The lenticular lens system including the light shielding portion can be combined with a lenticular lens plate having a light shielding portion and/or a concave lens plate having a light shielding portion.

The present invention relates to a lenticular lens sheet system for use in a line source generating device. The lenticular lens sheet system of the present invention is composed of a lenticular lens sheet or a lenticular lens sheet laminate. In the case of the lenticular lens sheet laminate, one or more lenticular lens sheets are included or include one or more concave lens sheets or one or more lenticular lens sheets and one or more concave lens sheets to form a laminated body.

The lenticular lens sheet system of the present invention may further include a vibration means. A portion of the lenticular lens sheet system of the present invention may comprise a vertical light lenticular lens sheet. As the vertical light lens plate, there are a vertical light convex lens plate and a vertical light concave lens plate. As an example of the vertical light cylindrical lens plate, the cylindrical lens plate may include a shield or a light transmitting slit or a light blocking portion.

In the present invention, the lenticular lens sheet system needs to maintain flatness. In order to keep the lenticular lens sheet in a plane, it may be supported by a transparent plate such as a glass plate. Since the lenticular lens system is very thin, it is easy to bend. A glass plate is preferably used for the transparent plate to maintain flatness. In order to maintain the plane, a transparent plate is disposed on the upper or lower portion or the upper and lower portions of the lenticular lens system.

When the lenticular lens system is a laminate, the lenticular lens sheets do not move with each other. For this purpose it is preferred to weld into a whole. Welding is not performed on the entire surface of the lenticular lens sheet, but is performed on the edge portion of the lenticular lens sheet. This welding can be carried out by various methods. As a representative example, there are ultrasonic bonding or UV resin bonding. When the welded portion is formed, it is preferable to perform a vacuum state to prevent a gap from being formed in the laminated portion between the lenticular lens sheet and the lenticular lens sheet.

Hereinafter, an exposure apparatus including a line light source generator of the present invention using a lenticular lens sheet will be further described.

The exposure apparatus provided with the linear light source generating apparatus of the present invention is characterized by the use of a lenticular lens sheet. The line source generating device includes a light source and a lenticular lens system that is synchronized with the lenticular lens system, that is, moved at the same speed as a whole in the same direction.

Synchronous structure means that the light source and the lenticular lens system move in the same direction while the two move at the same speed as a whole. The most representative method is to install a light source and lenticular lens system in a container that is made of a sealed or open structure. At this time, the light source and the lenticular lens system as a whole move at the same speed in the same direction. The direction of movement is a right angle to the longitudinal direction of the lenticular lens sheet.

The shaking motion of the light source does not absolutely affect the speed of the light source, but causes the shaking speed of the light source to be faster than the moving speed of the light source, so as not to affect the speed of the entire light source. That is, when the light source and the lenticular lens system are transmitted for the exposure operation, the transmission speed of the light source is not affected by the shaking, and the light source moves at the same speed as the lenticular lens system.

In the line light source generating device of the present invention, a vibration means can be provided in the lenticular lens system to apply microvibration. Strictly speaking, when a lenticular lens system with a shaking light source or vibration is used, the parts do not move at the same speed. For convenience of explanation, it is defined as moving at the same speed as a whole.

For convenience of explanation, the present invention is expressed by the term "synchronous structure". As a representative example, in the exposure apparatus including the linear light source generating apparatus of the present invention, the light source and the lenticular lens system are fixed in the same container, and move without moving, and move at the same speed. At this time, the light source does not shake, and the lenticular lens system does not vibrate, and moves integrally.

In the present invention, the nature of the light source is very important. When a light source such as a plurality of LEDs is attached to a flat plate to produce a light source, strictly speaking, the light intensity of the entire area is not uniform. A gap is formed between the LED light source and the adjacent LED, and the interval cannot make the light intensity of the entire area uniform. However, in spite of this, efforts are made to obtain a uniform light distribution over the entire area by oscillating the light source laterally and/or longitudinally on the same plane as the plane formed by the lenticular lens sheets. In order to ensure the uniformity of the light source, it is necessary to repeatedly shake in a short time. The light source can be shaken in any direction, and it is important to move it over a short period of time.

Light intensity plays a very important role in the exposure device. To adjust the light intensity, the most representative method is to adjust the power consumption. As an additional method, in order to adjust the light intensity, a method of adjusting the distance between the light source and the lenticular lens system is proposed in the line light source generating device of the present invention. Although the power consumption is the same, the closer the light source is to the lenticular lens system, the more intense the light can be illuminated.

To adjust the light intensity, the source can be adjusted away from or close to the lenticular lens system. When the light source is mounted in the same container as the lenticular lens system, the lenticular lens system is located at the lowermost end of the container. In the container, the light source is moved toward the lenticular lens system side and a strong light intensity is obtained when the light source is close. In order to constitute a device for adjusting the distance between the light source and the lenticular lens system, various types of linear conveying devices can be applied.

When the light source and the lenticular lens system are installed in the same container, the light source and the lenticular lens system are fixed in the container to prevent the light source and the lenticular lens system from moving, and the light source and the lenticular lens system can also be Can't move relative to each other. At this time, the intensity of the light can be controlled only by adjusting the power source used. At this time, there is no rocking action or lenticular lens system of the light source. The vibration of the system. An exposure apparatus in which the light source and the lenticular lens system are not movable relative to each other is also an embodiment of the exposure apparatus of the present invention.

When the light source and the lenticular lens system are installed in the same container, the container itself is configured to be movable in the vertical direction with respect to the table of the exposure apparatus of the present invention. By using the container to move up and down, preparatory work for the exposure work can be performed on the workbench.

In the exposure apparatus of the present invention, the heat generated by the light source is cooled by the cooling device, and the cooling air or the cooling water can be forcibly circulated inside the container to be cooled. At this time, the mechanical device for manufacturing the cooling air or the cooling water may be installed inside or outside the line light source generating device, or may be disposed below the work table of the exposure device.

In the exposure apparatus of the present invention, the pattern film or the mask is located below the lenticular lens system. When the exposure operation is performed, the lenticular lens system is disposed at a position spaced apart from the pattern film or the mask by a predetermined distance. This interval reduces friction when moving relative to each other, so that it can be smoothly transmitted. The smaller the interval between the lenticular lens system and the pattern film or the reticle, the better. A substrate on which a photosensitive layer is formed is disposed under the pattern film or the mask. The substrate is in close contact with or spaced apart from the pattern or reticle by a predetermined distance. When the substrate is separated from the pattern film or the mask, side effects such as light refraction and interference cannot be excluded.

Therefore, in order to perform precise exposure work, it is preferable to make the substrate in close contact with the pattern film or the photomask. However, when the pattern film or the photomask is in close contact with the photosensitive layer, the photosensitive film is damaged because the pattern film or the photomask is in contact with the photosensitive layer. Therefore, the pattern film or the photomask and the photosensitive layer should be spaced apart from each other by a predetermined interval. However, when separated from each other, the smaller the spacing, the better, to reduce light refraction and interference.

In order to perform the correct exposure work, the photosensitive layer and the pattern film or mask must be made. Close to. When exposure is performed immediately after exposure, since light is directly transmitted to the photosensitive layer, side effects such as light refraction or interference are remarkably reduced. Separately or closely depending on the precision of the exposure work.

In the lenticular lens sheet system of the present invention, a lenticular lens sheet is usually disposed in the uppermost layer of the lenticular lens sheet system, but a concave lens sheet may be disposed depending on the case. The type and laminated form of the lenticular lens sheet are changed according to the characteristics required for each exposure apparatus. In order to constitute a highly efficient exposure apparatus, it is preferable to include one or more vertical light lenticular lens sheets. The lenticular lens sheet system of the exposure apparatus of the present invention includes a lenticular lens sheet on which an opaque shield is formed or a lenticular lens sheet in which a light transmission slit is formed or a lenticular lens sheet in which a light shielding portion is formed.

Fig. 14 is an explanatory view showing the concept of the upper and lower structures of the exposure apparatus of the present invention. Additional explanation will be made from the side of the exposure apparatus of the present invention. The upper structure includes a pressing roller 74 surrounded by an elastic body 73, and a line light source generating device 75. Further, auxiliary rollers 62, 64, 65 may be provided. The squeeze roller 74 and the line light source generating device 75 move in conjunction with each other.

The pressing roller is disposed in front of the in-line light source generating device, and the work of adhering the pattern film 63 to the substrate 70 is performed. Thereby, the exposure operation is performed by the line light source from the line light source generating device in a state where the pattern film and the substrate are in close contact with each other. The lower structure includes a table 69 on which the substrate 70 is placed, and a snug means 68 for adhering the substrate to the table. The exposure apparatus is designed such that the table and the upper structure are fixed, and the substrate and the pattern film are moved during the exposure operation.

The substrate 70 uniformly coated with the photosensitive layer 72 is detachably disposed on the stage 69 of the exposure apparatus. A pattern film 62 is disposed on the substrate. When performing exposure work, the structure of the upper part of the line source generating device should be relative to The pattern film is moved. When the pattern film is moved integrally with the table of the lower structure, a transfer device should be provided in any part of the upper structure and the lower structure.

Further, a portion of the upper structure or the lower structure is formed with a cooling device for cooling the heat generated by the light source of the in-line light source generating device. The cooling air or cooling water generated in the cooling device is cooled by the heat generated by the line source generating device. The pattern film is pressed against the substrate by a squeeze roll.

The substrate is in close contact with the workbench by means of abutting means. The fastening means forms a micro hole in the table, and the substrate is pressed against the table by the vacuum pressure of the vacuum pump. In order to prepare for the exposure work, the superstructure can be moved up and down with respect to the table. In the preparation of the exposure work, the superstructure needs to be moved upward from the workbench.

In the exposure apparatus of the present invention, the pattern film has various forms. A sheet-like pattern film formed separately is generally used. As another aspect, it may be formed into a crawler form in which the start end and the end portion of the pattern film are connected. This track mode is advantageous for mass production. In the case of constituting the pattern film of the crawler belt, the line light source generating means is located inside the pattern film.

When the pattern film of the crawler belt is not used, the upper structure is moved from the state in which the lower structure is separated after the exposure operation at the initial position, and then returned to the initial position, thereby performing the exposure work in this manner.

A roll structure for winding a flexible substrate is formed at both end portions or one end portion of the table of the exposure apparatus of the present invention. When the substrate is a non-conductive substrate, in order to provide the conductive layer 71 on the substrate 70, the surface is first sputter-sputtered with a conductive metal clad, and if necessary, electroplating is performed on the sputter layer to increase the thickness of the conductive layer 71.

During the exposure operation, the line source generating means and the pattern film of the exposure device should move relative to each other. The patterned film system is connected to the lower structure to be movable. At this time, if the upper structure is fixed, the lower structure can be relatively moved, and if the lower structure is fixed, the upper structure can be relatively moved. The pattern film 63 on which the pattern is formed may be composed of a crawler belt. The pattern film is in close contact with the substrate by the pressing roller 74. That is, the pattern film is pressed against the substrate 70 coated with the photosensitive material 72, and the pattern film is brought into contact with the photosensitive layer coated on the substrate without being slid by each other by the pressing roller. The substrate and the workbench can be closely attached by the close fitting means.

When the pattern film is in the track form, the line light source generating device 75 is located inside the crawler belt 53. The upper structure is configured to be movable in the up and down direction with respect to the lower structure so that exposure preparation work such as exchange of substrates can be performed. As the substrate 70, a flexible substrate uniformly coated with the photosensitive layer 72 is used. When a flexible substrate is used, the flexible substrate can be wound around the two sides of the table 69 to continuously perform the exposure operation.

If the pattern film is formed into a wireless track form, it can be operated continuously. As the substrate, a conductive metal layer 71 is formed on the polyimide film 70, and a substrate of the photosensitive material 72 is uniformly coated on the metal layer. If the pattern film is not in the form of a wireless track, if the exposure operation is performed within a predetermined range, the upper structure should be moved to the initial position. To explain this configuration, the position at which the exposure device is started is referred to as an initial position. Here, after the exposure operation is performed within a predetermined range, the upper structure is moved to a state separated from the lower structure and returned to the initial position.

Fig. 15 is a further explanatory view of Fig. 14. The pattern film formed as a crawler belt is composed of a transparent portion 87 and an opaque portion 76. A line light source generating device 86 is disposed inside the crawler belt.

The upper structure includes a squeeze roller 84 supported by the elastic body 83, one or more auxiliary rollers 77, 78, 79, and a line light source generating device 86. The lower structure includes a table and a means for adhering the substrate to the table. Line light The light source of the source generating device and the lenticular lens sheet system are firmly integrated integrally by the support frame 85. The substrate 80 is uniformly coated with the photosensitive material 81.

Fig. 16 is an explanatory view showing an embodiment of the line light source generating device of the present invention. In the present embodiment, the light source 88 and the lenticular lens sheet system 89 constituting the line light source generating device 91 are mounted in a container. The light source is rocked inside the container or can be moved up and down.

A rocking structure for shaking the light source or a vibration structure for causing the lenticular lens system to vibrate slightly may be formed inside the container. This structure is a well-known device, and thus a detailed description thereof will be omitted. Various additional devices such as a cooling device for cooling the heat generated by the light source may be provided inside the container.

A device for moving the light source device in the vertical direction may be formed inside the container. In the present invention, the lenticular lens system is disposed at the bottom of the container. To adjust the light intensity, the distance between the light source and the lenticular lens system can be adjusted inside the container.

By adjusting the distance between the light source and the lenticular lens system, the intensity of light that strikes the pattern film or mask can be adjusted.

Figure 17 is another embodiment of the superstructure. The superstructure includes a squeeze roller 97 surrounded by an elastomer, one or more auxiliary rollers 100, 101, 102, 103 and a line source generating device 98. The squeezing roller and the line light source generating device move in conjunction with each other and move in the up and down direction with respect to the table so that the exposure operation can be prepared. Further, the squeezing roller and the line light source generating device are moved in the left-right direction, so that a large-area exposure operation can be performed. Alternatively, the squeezing roller and the line light source generating means are stopped, and the pattern film and the substrate are moved in the left-right direction, so that a large-area exposure operation can be performed.

In this embodiment, after the exposure operation is performed at the initial position, the upper structure is returned to the initial position in a state separated from the lower structure, and is repeated in this manner. working. A metal layer is sputtered on the upper portion of the substrate 93 to impart conductivity, and after a thin plating layer 92 is formed on the sputter metal layer with a metal such as copper, a thin photosensitive layer is formed on the thin plating layer.

The exposure apparatus of the present invention is a form in which a light source is mounted in a container. However, the light source used in the present invention is not limited to the form of being mounted in a container. For example, the light from the source illuminates the table of the entire exposure device. There is also a case where the light of the light source uniformly illuminates the working chamber of the exposure apparatus. The present invention resides in the present invention regardless of the form of the light source as long as the light of the light source is transmitted only through the lenticular lens system to the photosensitive layer.

When the exposure apparatus of the present invention performs an exposure operation, light is not transmitted to the photosensitive layer when it passes through a portion other than the lenticular lens sheet system. Suitable for all light sources of the exposure apparatus of the present invention. As mentioned above, there is no need to move the light source when the light source illuminates the entire area of the table or the entire working chamber. During the exposure work, light is not allowed to pass through the portion other than the lenticular lens system to the photosensitive layer. The lenticular lens system should be relatively moved relative to the patterned film.

The light source configured as shown is also included in the concept of the light source constituting the line light source generating device of the present invention. At this time, the line light source generating device includes a light source and a lenticular lens plate system, and the line light source generating device performs an exposure operation by relative movement with the pattern film.

Fig. 18 is an explanatory view of a line light source generating device for adjusting light intensity in a container. The light source is mounted in the same container 104 as the lenticular lens system. The light source installed in the container can move in the container in the up and down direction. As an embodiment of the light source, an LED light source 106 can be mentioned. The LED system combines a plurality of LEDs with a support to constitute a light source. It is also possible to form the LED as a surface light source. In the present invention, the support body combined with each LED or the surface light source The support in which the LEDs are combined is referred to as a light source support 105.

In an embodiment of the invention, the light source support body is mounted in the container in a movable manner in the vertical direction. A lenticular lens sheet system 107 is disposed at the bottom of the container. The light source support is moved in the up and down direction inside the container to adjust the intensity of light that is incident on the lenticular lens system. The light intensity is controlled by controlling the power consumption, or by adjusting the distance between the light source and the lenticular lens system. In the exposure apparatus of the present invention, the light intensity of the substrate and the relative transport speed of the line source generating means play a very important role in determining the exposure quality. Therefore, it is very important to control the intensity of the line light source that is irradiated onto the substrate to be fine. Further, it is also important to control the relative transmission speed of the line light source generating device to be fine.

Fig. 19 is an explanatory view for explaining the positional relationship between the line light source generating device, the pattern film, and the substrate. In the line light source generating device of the present invention, a lenticular lens plate system is disposed at the bottom of the container. The pattern film or mask is disposed under the lenticular lens system. The substrate is disposed under the pattern film or the mask. Fig. 19 is a view in which the pattern film or mask 108 is adhered to the substrate 109. Attaching the patterned film or mask 108 to the photosensitive layer of the substrate minimizes light refraction or interference. Thereby the exposure work can be performed correctly. If the exposure operation is performed without peeling off the protective film formed on the photosensitive layer, the photosensitive layer is not damaged even if it is operated in the close state. If the protective film is peeled off and the work is performed, the photosensitive layer will be damaged. At this time, it is preferable to perform exposure by separating the pattern film or the photomask from the photosensitive layer by a predetermined distance.

The lenticular lens sheet system used in the present invention has the most basic form in which the uppermost portion is a lenticular lens sheet and one or more concave lens sheets are combined under the lenticular lens sheet. However, depending on the situation, it can also be used in the lenticular lens system. A concave lens plate is disposed at the uppermost portion, and a lenticular lens plate is disposed at the lowermost portion.

The line light source generating device of the present invention and the lenticular lens plate system for the line light source generating device are used in various forms in an exposure device, and can also be used in a display panel of a general display device. In the conventional display device, light is transmitted to the display panel through the backlight and the polarizing filter, and at this time, the light transmitted through the polarizing film is much reduced. However, if the line light source generating device is used in the display device, the line light source generating device can replace the functions of the backlight and the polarizing filter. Therefore, the line light source generating device of the present invention has the advantage of utilizing light from a light source without loss. Without the loss of light, the life of the battery can be greatly increased.

In order to enable the line light source generating device of the present invention to be used in a general display panel, a microvibration means can be further provided in the lenticular lens system. By installing a vibration mechanism that generates microvibration in the lenticular lens system, the blank portion between the line source and the line source generated by the in-line source generating device can be eliminated. The spacing between the line source and the line source is only a factor of a few microns to tens of microns. The blank portion due to the interval between the line source and the line source can be solved by the micro-vibration of the lenticular lens system. That is, the illusion is used to make the viewer feel no blank portion.

The invention further relates to a method of fabricating a microwire source. The microwire source manufacturing method of the present invention produces a fine line light source by transmitting light irradiated by a light source through a lenticular lens system having a fine pitch. The distance between the lenticular lens sheets used for making the fine line light source should be fine. Also, it is preferred to use a lenticular lens sheet system including a vertical light lenticular lens sheet.

The above-mentioned micro-wire source means that the line width of the line source is fine, and the line width is about several tens of nanometers to several tens of micrometers. In the specific experiment of the present invention, in order to obtain a line source having a line width of 700 nm, vertical light with a pitch of 33 μm is used. A lenticular lens sheet is stacked with eight concave lens plates under the vertical lenticular lens sheet.

Further, in order to produce a line source having a line width of 3 μm, a vertical lenticular lens sheet having a pitch of 30 μm and a lenticular lens sheet system in which a concave lens plate is laminated under the vertical lenticular lens sheet are used. A line source generating device having a line width of 3 micrometers using the line source can quickly perform large-area exposure work. As a result of the exposure operation using an exposure apparatus having a line source having a line width of 3 μm, the large-area substrate can be quickly exposed, that is, the substrate has an exposure portion of 10 μm and the non-exposed portion has an amplitude of 10 μm, and the photosensitive layer is The thickness is 15 microns.

In the lenticular lens sheet system of the present invention, even if the distance between the lenticular lens sheets is the same, the exposure work can be performed more precisely by changing the focal length of the lenticular lens sheet lens. Although the distance between the lenticular lens sheets used in the present invention is fine, the focal length of the lenticular lens sheets can be designed in many ways at the fine pitch.

In the present invention, the so-called fine line light source is such that the line width of the line source is in the range of several tens of micrometers of several tens of nanometers. However, the exposure apparatus or the line light source generating apparatus of the present invention can also be applied to an area other than the fine range. When the term fine pitch is used in the lenticular lens sheet system of the present invention, the fine pitch range represents a range of several tens of micrometers of several micrometers. However, the lenticular lens sheet system of the present invention is also applicable to an area other than the fine range. How to fabricate the micro lenticular lens sheet used in the present invention is very important, but since it is not included in the scope of the present invention, the description thereof will be omitted.

The present invention further relates to a method of fabricating a microcircuit substrate using a linear line light source and a microcircuit substrate produced by the method of fabrication. Generally, a substrate on which a microcircuit is formed is formed by an exposure operation and an etching operation. or Made by exposure work and plating work. It is conventional to scatter light from a light source that performs exposure work on a circuit board having a large pitch. For example, it is possible to operate using a scattering light source when performing exposure work on a PCB substrate having a circuit having a large line width. It is known to work with parallel light when performing exposure work on a circuit substrate having fine pitch. In the present invention, a large-area exposure operation can be easily performed by an exposure apparatus having a line light source generating device capable of producing a fine line width.

The method of manufacturing the fine circuit substrate of the present invention irradiates light from a light source to the lenticular lens sheet system of the present invention to produce a line source having a fine line width, and then, by using the line source, the substrate coated with the photosensitive layer is exposed. Then, the microcircuit substrate is fabricated on the exposed substrate by phenomena engineering and etching engineering. Alternatively, the microcircuit substrate is fabricated on the exposed substrate by phenomena engineering and electroplating engineering.

In the substrate, copper is generally sputtered on the flexible substrate, and copper is further plated on the sputter layer to form a copper plating layer. A conductive metal can be used instead of copper. The process of performing the phenomenon operation and the etching operation on the substrate on which the exposure operation has been performed is the same as the conventional process, and thus the description thereof will be omitted.

A method of fabricating a fine circuit substrate by the electroplating process will be described below. First, electroplating is performed on the substrate on which the phenomenon has been performed, and at this time, no etching process is performed on the substrate. The metal circuit portion is formed by electroplating by removing the space portion of the non-exposed portion by the phenomenon engineering. The plating operation is stopped after the circuit portion is formed. Then, the exposed portion is removed chemically. The conductive metal appearing at the portion where the exposed portion is removed is removed by soft etching. Thereby, a fine circuit substrate is manufactured by an electroplating method. Hereinafter, a method of fabricating a fine circuit substrate by electroplating will be described more specifically.

First, a thin conductive layer is formed on the non-conductor supporting substrate. As A representative example of the non-conductor supporting substrate is a polyimide film. To form a thin conductive layer, a thin conductive layer is formed by sputtering a metal such as copper onto the non-conductive support substrate. When it is necessary to increase the thickness of the conductive layer, a conductive metal such as copper may be plated on the sputter layer.

In the present invention, the non-conductor supporting substrate may include a hard material. Further, the non-conductor supporting substrate is preferably a wound type flexible substrate in terms of mass production. The non-conductive body supporting substrate used in the present invention may be a polyimide film. A photosensitive material is coated on the upper portion of the conductive layer formed on the non-conductor supporting substrate. The photosensitive material is uniformly coated in a thickness of several micrometers to several tens of micrometers. At this time, in order to apply the photosensitive material favorably, it is cleaned by plasma work and applied to the conductive layer.

The pattern film is irradiated with light of a line-like fine line source generated by the line source generating device of the present invention. The exposed portion and the non-exposed portion are formed on the substrate by the pattern film. When the light from the line source is irradiated to the photosensitive layer by the pattern film, the portion that receives the light is referred to as an exposure portion, and the portion that is not subjected to the light is referred to as a non-exposed portion. When the non-exposed portion is chemically removed, a space portion is formed. A thin conductive layer appears below the space portion.

Electroplating is applied to the emerging conductive layer in the plating bath. At the same time, a conductive microcircuit is formed in the space portion. The plating is stopped after the predetermined height of the microcircuit is formed. And polishing the surface of the microcircuit to make it clean. Polishing can be performed by polishing the wheel, or it can be polished by other methods.

Then, in order to remove the thin conductive layer in the lower portion of the exposed portion, the exposed portion is chemically removed. A space portion is formed at a portion where the exposure portion is removed. A thin conductive layer is exposed under the space portion. The thinner conductive layer that is exposed is removed by soft etching. If a thin conductive layer is removed, a new etching space is formed unit. The invention can be widely used in the processing of micro-parts. As a type of micro part, a micro metal circuit is mentioned. The ultrafine metal circuit of the present invention is mostly used for a chip on film or an FPCB. Typically, the non-conductor support substrate is a polyimide film.

The present invention relates to a microcircuit fabricated by the method of fabricating the microcircuit substrate. However, the above description is only a preferred embodiment of the present invention, and the applicable parts can be used. Various modifications and changes can be made without departing from the spirit and scope of the present invention. The equivalent structural changes of the present specification and the illustrated contents are all included in the scope of the present invention and are combined with Chen Ming.

1‧‧‧Exposure device

2, 86‧‧‧ line source generating device

3‧‧‧Line light source generating device conveyor

4, 12, 17, 88, 106‧‧‧ light source

5,89,107‧‧‧ lenticular lens system

6‧‧‧film

7, 15, 72, 81‧‧‧Photosensitive materials / photosensitive layer

8‧‧‧ tablet

9‧‧‧Substrate structure

10, 37, 44, 46, 53, 57, 59, 61‧ ‧ lenticular lens plates

11, 13, 14, 29‧‧ ‧ lenticular lens

16, 26, 33‧ ‧ exposure department

18, 21, 25‧‧‧ vertical light areas

24‧‧‧ opaque shield

34, 38, 39, 40, 41, 43, 49, 54, 55, 56, 58, 60‧‧‧ concave lens plates

45‧‧‧ lenticular lens plate

47, 50‧‧‧ shading department

51‧‧‧Depression

62,64,65‧‧‧Auxiliary wheel

63, 108‧‧‧ pattern film

68‧‧‧ Close means

69‧‧‧Workbench

70, 80, 93, 109‧‧‧ substrates

71‧‧‧ Conductive layer

73‧‧‧ Elastomers

74‧‧‧Extrusion film

75, 91, 98‧‧‧ line source generating device

76‧‧‧Opacity Department

77, 78, 79, 100, 101, 102, 103‧‧‧ auxiliary rolls

83‧‧‧ Elastomers

84, 97‧‧‧Squeeze roller

85‧‧‧Support frame

87‧‧‧Transparent Department

92‧‧‧Electroplating

104‧‧‧Container

105‧‧‧Light source support

Fig. 1 is a general conceptual view of an exposure apparatus of the present invention including a line light source generating device.

Figure 2 is a perspective view of a general lenticular lens sheet.

Fig. 3 is a schematic view showing a state in which light is collected by a lenticular sheet.

Fig. 4 is an explanatory view showing the vertical light of the lenticular sheet.

Fig. 5 is an explanatory view of a vertical light lenticular lens sheet.

Fig. 6 is an explanatory view showing a vertical light lenticular lens sheet on which a lens shield is formed.

Fig. 7 is an explanatory view showing a vertical light lenticular lens sheet in which a light transmission slit is formed in a lenticular sheet.

Figure 8 is a perspective view of a general concave lens plate.

Figures 9a, 9b, and 9c are embodiments of a lenticular lens plate system.

Fig. 10 is a structural view showing a lenticular lens sheet having a light shielding portion.

Fig. 11 is a structural view showing a concave lens plate having a light shielding portion.

Fig. 12 is another embodiment of a lenticular lens system having a light shielding portion example.

Fig. 13 is another embodiment of a lenticular lens system having a light shielding portion.

Fig. 14 is an explanatory view showing the configuration of an exposure apparatus of the present invention.

Fig. 15 is an explanatory diagram of an additional explanation of Fig. 14.

Fig. 16 is an explanatory view showing a line light source generating device of the present invention.

Fig. 17 is an explanatory view showing the structure of the upper portion of the exposure apparatus of the present invention.

Fig. 18 is an explanatory view of a line light source generating device for adjusting the light intensity inside the container.

Fig. 19 is an explanatory view showing the positional relationship between the line light source generating device, the pattern film, and the substrate in the exposure apparatus.

Claims (3)

A lenticular lens sheet system for a line light source generating device, wherein the lenticular lens sheet system is formed by laminating a plurality of lenticular lens sheets, wherein the lenticular lens sheet system is formed by stacking one or more continuous connections and having convex portions The shape of the pillar is formed by a lenticular lens sheet and one or more concave lens plates which are continuously connected to the shape of the concave lens column. A lenticular lens sheet system for a line light source generating device, wherein the lenticular lens sheet system stacks a plurality of lenticular lens sheets, the lenticular lens sheet system is formed by vertically stacking one or more columns continuously connected with protrusions The shaped lenticular lens sheet is constructed with one or more concave lens plates continuously connected to the shape of the concave lens column, the lenticular lens sheet system including an opaque shield. A line light source generating device using a lenticular lens plate, wherein the line light source generating device comprises a light source and a lenticular lens plate system, the light source and the lenticular lens plate system being mounted in a container, wherein the lenticular lens plate system is One or more lenticular lens sheets continuously connecting the shape of the pillars having the convex portions and one or more concave lens plates continuously connecting the concave lens column shapes are stacked.