TW200834260A - Light source for exposure and exposure device using the same - Google Patents

Light source for exposure and exposure device using the same

Info

Publication number
TW200834260A
TW200834260A TW096126205A TW96126205A TW200834260A TW 200834260 A TW200834260 A TW 200834260A TW 096126205 A TW096126205 A TW 096126205A TW 96126205 A TW96126205 A TW 96126205A TW 200834260 A TW200834260 A TW 200834260A
Authority
TW
Taiwan
Prior art keywords
exposure
light source
same
lamp units
lamps
Prior art date
Application number
TW096126205A
Other languages
Chinese (zh)
Inventor
Tetsuya Shirai
Yoshihiko Seiki
Atsuji Nakagawa
Original Assignee
Phoenix Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Phoenix Electric Co Ltd filed Critical Phoenix Electric Co Ltd
Publication of TW200834260A publication Critical patent/TW200834260A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70016—Production of exposure light, i.e. light sources by discharge lamps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

The purpose of this invention is to provide a light source for exposure, which has long product lifespan for the application on exposure of photoresist layer, and an exposure device using the same. The light source for exposure 10 comprises at least two lamp units 20 (20a, 20b, 20c…) having lamps 24 with different internal pressures and a lamp unit base for supporting the lamp units 20 (20a, 20b, 20c…) as its characteristics. Because there are at least two lamp units 20 (20a, 20b, 20c…) having lamps 24 with different internal pressures, this invention can selectively emit light to expose a to-be-exposed object X with the most adequate lamp unit 20 (20a, 20b, 20c…).
TW096126205A 2007-02-01 2007-07-18 Light source for exposure and exposure device using the same TW200834260A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007023293A JP2008191252A (en) 2007-02-01 2007-02-01 Light source for exposure and exposure apparatus using the same

Publications (1)

Publication Number Publication Date
TW200834260A true TW200834260A (en) 2008-08-16

Family

ID=39751444

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096126205A TW200834260A (en) 2007-02-01 2007-07-18 Light source for exposure and exposure device using the same

Country Status (4)

Country Link
JP (1) JP2008191252A (en)
KR (1) KR20080072509A (en)
CN (1) CN101236358A (en)
TW (1) TW200834260A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI632400B (en) * 2011-11-16 2018-08-11 成洛勳 Line type light exposure apparatus and lenticular assembly

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5320006B2 (en) * 2008-10-03 2013-10-23 株式会社オーク製作所 Exposure drawing device
KR101138681B1 (en) * 2009-04-09 2012-04-24 닛본 세이고 가부시끼가이샤 Light irradiation apparatus for exposure apparatus, exposure apparatus, and exposure method
JP5598789B2 (en) * 2009-04-09 2014-10-01 Ｎｓｋテクノロジー株式会社 Light irradiation apparatus for exposure apparatus and exposure apparatus
JP5345443B2 (en) * 2009-04-21 2013-11-20 株式会社日立ハイテクノロジーズ Exposure apparatus, exposure light irradiation method, and display panel substrate manufacturing method
WO2011096365A1 (en) * 2010-02-05 2011-08-11 日本精工株式会社 Light irradiation device for exposure devices, method for controlling turn-on of same, exposure device, exposure method, and substrate
CN102483587B (en) * 2010-07-22 2014-11-05 恩斯克科技有限公司 Light irradiation device for exposure apparatus, method for controlling light irradiation device, exposure apparatus, and exposure method
JPWO2012067246A1 (en) * 2010-11-19 2014-05-19 Ｎｓｋテクノロジー株式会社 Proximity exposure apparatus and proximity exposure method
JP5702122B2 (en) * 2010-11-29 2015-04-15 Ｎｓｋテクノロジー株式会社 Light irradiation device for exposure equipment
JP7060244B2 (en) 2018-12-12 2022-04-26 フェニックス電機株式会社 A light source for an exposure device, an exposure device using the light source, and an exposure method for a resist.

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006344383A (en) * 2003-06-24 2006-12-21 Matsushita Electric Ind Co Ltd Light irradiation device
JP2005227465A (en) * 2004-02-12 2005-08-25 Mejiro Genossen:Kk Method of use of illumination optical system and method for manufacturing flat panel display
JP4765433B2 (en) * 2005-06-24 2011-09-07 ウシオ電機株式会社 Ultraviolet irradiation device and light irradiation method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI632400B (en) * 2011-11-16 2018-08-11 成洛勳 Line type light exposure apparatus and lenticular assembly

Also Published As

Publication number Publication date
JP2008191252A (en) 2008-08-21
KR20080072509A (en) 2008-08-06
CN101236358A (en) 2008-08-06

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