KR20130116674A - Exposure apparatus - Google Patents

Exposure apparatus Download PDF

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Publication number
KR20130116674A
KR20130116674A KR1020120039281A KR20120039281A KR20130116674A KR 20130116674 A KR20130116674 A KR 20130116674A KR 1020120039281 A KR1020120039281 A KR 1020120039281A KR 20120039281 A KR20120039281 A KR 20120039281A KR 20130116674 A KR20130116674 A KR 20130116674A
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KR
South Korea
Prior art keywords
light
lenticular
light source
present
film
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KR1020120039281A
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Korean (ko)
Inventor
성낙훈
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성낙훈
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Publication date
Application filed by 성낙훈 filed Critical 성낙훈
Priority to KR1020120039281A priority Critical patent/KR20130116674A/en
Priority to EP12850328.1A priority patent/EP2851751B1/en
Priority to US14/443,396 priority patent/US10197920B2/en
Priority to PCT/KR2012/009685 priority patent/WO2013073873A1/en
Priority to TW101142835A priority patent/TWI632400B/en
Publication of KR20130116674A publication Critical patent/KR20130116674A/en

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/02—Simple or compound lenses with non-spherical faces
    • G02B3/06—Simple or compound lenses with non-spherical faces with cylindrical or toric faces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: A lenticular exposure apparatus including a lenticular assembly is provided to easily perform a large-sized exposure by extending the transfer area of a light source device. CONSTITUTION: A light source device (2) emits light to a film (6) with a pattern. A photoresist (7) is exposed by the light to form the same pattern. The light source device includes a light source and a lenticular assembly. A light source device moves on the film. The lenticular assembly comprises a convex lenticular and a concave lenticular.

Description

A lenticular exposure apparatus characterized by including a lenticular assembly {EXPOSURE APPARATUS}

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a vertical light lenticular exposure apparatus used for forming a semiconductor circuit or a fine circuit or a fine pattern and more particularly to an exposure apparatus capable of performing a clean exposure of a photosensitizer by using a light- . It is possible to perform fine exposure to the photosensitive layer according to the shape of a film in which patterns of various patterns are formed by vertical light generated by the vertical light lenticule of the present invention.

Generally, an exposure apparatus is a device for transferring a desired pattern onto a photosensitive agent by placing a film on which a desired pattern is formed on a substrate, a wafer, glass or the like having a photo-resist (PR) .

Conventionally, in an exposure apparatus for exposing a fine pitch circuit, a configuration of expensive equipment for producing balanced light has been essential. However, in the present invention, by omitting the facility for the configuration of expensive balanced light, only the vertical light emitted by the lenticular is configured to replace this function.

In the exposure operation, a light source, a flat plate coated with a photosensitive agent and opposed to the light source, and a transparent part and an opaque part adhering to the upper surface of the flat plate are used.

When light is irradiated from a light source to a film, the transparent portion transmits light and the opaque portion blocks light. When the exposure agent is exposed through the light source, the photosensitive agent applied to the flat plate is cured only in the portion through which the light is transmitted through the transparent portion of the film.

After the exposure operation using such an exposure apparatus, the uncured portions of the photosensitive agent are removed with water or a developing solution to form a circuit pattern by the exposure unit on the flat plate.

In conventional exposure apparatuses, when the thickness of a photosensitive agent applied to a flat plate becomes thick (for example, 50 microns or more), the exposed state of the photosensitive agent becomes unclear or impossible.

In addition, when the pitch of the circuit is 10 to 20 microns, a high defect rate is caused.

The present invention has been made so that not only a cost can be reduced by forming a low-cost vertical light exposure device, but also a circuit of a fine pitch can be easily manufactured. The present invention uses a light-condensing function and a vertical light function of a lenticure in an exposure apparatus, so that a clean exposure can be performed even if the thickness of the photosensitizer is several tens of microns to several hundreds of microns. Even if the pitch of the circuit is 2 to 20 microns, It is an object of the present invention to provide a lenticular exposure apparatus capable of forming a clear and clean circuit.

The most significant feature of the present invention is that the extremely fine circuit can be dimmed. Conventionally, a balanced light exposure apparatus is used for extremely minute circuit light exposure. Such a balanced light exposure apparatus is complicated in equipment and requires a high production cost. However, the present invention is not limited to a complicated apparatus or expensive equipment, And can achieve the object of the present invention.

The present invention is advantageous in that the vertical light to be irradiated is a vertical light having no light diffusion or scattering action, and can expose an extremely fine pattern.

According to an aspect of the present invention, there is provided a light source device comprising: a light source emitting light; The light source unit includes a vertical light source for guiding vertical light generated at the center of the lenticular lens.

The light source device of the present invention is located on the top of the film on which the pattern is formed. Since the light source device of the present invention is spaced apart from the film by a predetermined distance, the light source device and the film can be moved without friction.

In the present invention, relative to the relationship between the exposure apparatus and the film, it is possible to relatively easily expose the photoresist even in a large area in a short time, and also to use the condensed vertical light by the lenticure The accuracy of the exposure can be in the order of 1 micron to 2 micron units.

In the present invention, by using the condensing function of each of the lenticurea lenses of Lenticular lenses in the exposure apparatus to form the vertical light, it is possible to perform a clear exposure even if the thickness of the photosensitive agent is a thick layer of the photosensitive agent of several tens of microns or more, Because scattering is prevented, clean exposure is possible even if the pitch of the circuit is 1 to 2 microns. The safety of the operation is ensured and the circuit configuration without defects and clear and clear is possible. In addition, even a wide-area photosensitive agent can be easily and economically exposed through the movement of the vertical light source.

In the present invention, the light source device performs a relative movement in the left-right direction or the back-and-forth direction with respect to the film on which the pattern is formed. The concept of such a relative movement motion includes the case where the film is transported while the light source device is stopped and the case where the film is transported while the light source device is stationary.

As described above, the vertical light lenticular exposure apparatus according to the present invention uses vertical light at the central portion of the lenticular lens located under the light source. Further, the present invention utilizes the independent light condensing performance of each lenticular lens constituting the lenticular.

By using the condensing function, which is a physical phenomenon of each lenticular lens, in the exposure apparatus, the vertical light lenticular exposure apparatus of the present invention can perform a clear exposure even when the thickness of the photosensitive agent is several tens of microns or more, Even with a fine pitch, a clear and clear exposure can be achieved by vertical light without scattering of light or diffusion dispersion. In other words, it is possible to construct a circuit that is clean and free of defects.

In addition, since the expensive function is not used to make parallel light as in the prior art, the function of the conventional expensive apparatus can be extremely easily performed by making full use of the physical function of the lenticular lens.

In contrast to the conventional technique, it is difficult to expose a large area, whereas the present invention has a great feature that exposure of a large area can be extremely easily realized by enlarging the transfer area of the light source device.

1 is a view showing a structure of a vertical light lenticular exposure apparatus according to an embodiment of the present invention,
2 is a perspective view of a typical Lenticular,
3 is a view showing a state in which light of a light source passes through a general lenticule to expose a photosensitizer,
4 is a view showing a state in which a photosensitizer is exposed by vertical light generated in a central portion of each lens of a general lenticular,
5 is an explanatory view for explaining a configuration of a vertical optical lenticular according to the present invention,
FIG. 6 is an explanatory diagram illustrating a vertical light lenticule that implements vertical light through a lens shield of Lenticular.
FIG. 7 is an explanatory view for explaining a vertical light lenticule for realizing vertical light through a light amount slit of a lenticular.

Hereinafter, various embodiments of the present invention will be described in detail, but the present invention is not limited to the following embodiments unless it departs from the gist thereof.

1 is a view showing a structure of a vertical light lenticular exposure apparatus according to an embodiment of the present invention.

The body of the vertical light lenticular exposure device 1 of the present invention is constituted by a substrate structure 9, a light source device 2, and an opening / closing port, which are mainly composed of flat plates.

Generally, in order to sensitize a photosensitive agent, a flat plate 8 having a photosensitive agent 7 coated on a lower portion of a patterned film 6 is placed on a substrate structure 9, and then the photosensitive agent And exposed.

The light is irradiated through the patterned film through the light source device and the photosensitive agent is exposed according to the shape of the pattern formed on the film by the irradiated light.

The light source device (2) of the present invention comprises a light source (4) emitting light and a vertical light source (5) located below the light source.

The light source device of the present invention may include a conveying means 3 for allowing conveyance in the left-right direction or the back-and-forth direction.

The light source device according to the present invention is positioned above the film on which the pattern is formed, and is positioned at a predetermined distance from the film so as to make relative movement without friction with respect to the film. A flat plate 8 on which a photosensitive agent 7 is applied is placed under the patterned film 6.

The flat plate 8 is a substrate for forming a circuit pattern, in which an exposure section is formed for the exposure process of the photosensitizer to make a circuit corresponding to the pattern of the film on top of the photosensitive layer.

The light source device 2 of the present invention is disposed on the top of the film so that light is irradiated onto the photosensitive layer on the top of such a flat plate. The patterned film 6 is brought into close contact with the upper surface of the flat plate 8 to which the photosensitive agent 7 is applied. The film 6 is made of a transparent part and an opaque part. When light is irradiated from the light source device 2 to the film 6, the transparent part transmits light and the opaque part blocks light. Therefore, when the light is irradiated through the light source device 2, the portion of the film 6 through which the light is transmitted through the transparent portion 51 of the film 6 is cured. After the exposure operation, the unexposed portion of the photosensitive agent, that is, the uncured portion is removed with water or a developing solution to form a circuit pattern on the flat plate 8. [

2 is a perspective view showing a typical lenticular.

As shown in FIG. 2, the lenticular 10 is generally formed by a plurality of lenticular lenses 11 having a convex cross section and a long length, which are laterally connected to each other.

3 shows a state in which the light of the light source passes through the general lenticule to expose the photosensitive agent

Fig. After the photosensitive layer is adhered to the lower part of the lenticule, the light of the light source is irradiated

The lenticular lenses 13 and 14 have a property of condensing the light of the light source 12. The condensed light forms an exposure unit 15 on the photosensitive layer 16.

When the light is irradiated through the lenticule, the exposed portion and the non-exposed portion are regularly arranged in the photosensitive layer adhered to the lenticule. The lenticule can be described as a transparent body in which one surface is planar and the other surface is a convex lens, which is a part of a cylinder, connected in plural in the longitudinal direction. It has the function of condensing light by functioning as a convex lens called Lenticular.

As shown in the figure, when the light of the light source 12 is illuminated through the lenticular lens, the light is focused toward the focal point of the convex lens by the convex lenses 13 and 14 formed on the lenticular lens. The degree to which light is condensed on the photosensitive agent 15 can be adjusted according to the distance (a) between the convex lens and the photosensitive agent of the rental lens. In the photosensitive layer, an exposed portion 16 is formed by the condensed light.

In describing the drawings of the present invention, it is needless to say that a film formed with a pattern is placed between the vertical light-transmissive layer and the photosensitive layer. For convenience of explanation, the film on which the pattern is formed is not illustrated and proceeded to explain.

4 is a view showing a state in which a photosensitizer is exposed by vertical light generated in the vicinity of a central portion of each lenticure lens of a general lenticular.

The curved surface of the Lenticular lens condenses the light received from the top to transmit light to the underlying photosensitive layer. At this time, the light located at the center of the lens of the Lenticular lens is vertically downwardly downward, and at the curved portion of the Lenticular lens, which is deviated from the center of the lens, the light is refracted at a predetermined angle to condense the light.

In the present invention, the function of vertically lowering the light in the central portion of each lenticular lens is called vertical light Lenticular. When the central regions of the respective Lenticular lenses are cut and connected to the side, the irradiated light functions to vertically downward.

In the present invention, the central region of each lenticular lens is not limited to the central portion of the lenticular lens but is defined as including a region of a small region on the right and left sides with respect to the central region.

The light received from the light source 17 located at the upper portion is irradiated in the vertical direction in the left and right fixed range regions 18 centering on the center of the respective lenticular lenses. That is, in the region where the refraction of light is minimized, the condensed light is irradiated almost vertically, and the exposure portion 19 is formed in the lower photosensitive layer 20 by the vertical light.

And the light irradiated from the light source 17 is irradiated to the exposure layer in a substantially vertical direction with a minimum refracting action. In the present invention, the lenticure is defined as a vertical lenticule.

Also, the area of each lenticure lens, in which light is irradiated in an almost vertical direction to the exposure layer with a minimum refracting action, is defined as a vertical optical area of the lenticular.

Therefore, the area 18 of a small constant range on the left and right sides of the center of the respective lenticular lenses becomes the vertical light area of the lenticular lens.

5 is an explanatory view for explaining a configuration of an embodiment of the vertical optical lenticular according to the present invention.

The vertical optical lenticular according to the present invention is configured as various embodiments.

5 is a typical vertical lenticular lens, in which only the vertical light regions 21 of the respective lenticular lenses are assembled and reconnected. The vertical light source of the present invention is characterized in that light from a light source located at an upper portion is condensed and vertically transmitted to a lower portion. And is configured to condense the light received from the light source with a minimum refraction action so that the exposure layer is irradiated with light in a substantially vertical direction with respect to the exposure layer 22 placed thereunder.

In order to fabricate the vertical optical lenticular according to the present embodiment, it is possible to mechanically manufacture the lenticular lenses by forming the left and right sides of the lenticular lenses in a small range around the center, have.

Alternatively, a vertical lenticular lens may be fabricated by making a small amount of photoresist, then plated with photoresist.

The pitch of the vertical light lenticular in this embodiment is inevitably smaller than the pitch of the normal lenticular. This is because the lenticular lens is constituted only by the region near the center of the general lenticular lens. In the present invention, it is preferable that the pitch of the vertical light lenticular is set to a very small pitch with a size of several tens of microns.

FIG. 6 is an explanatory view of a vertical lens cantilever constituting a lens shield of a lenticular according to another embodiment of the present invention.

In this embodiment, except for the vertical light region 25 of each lenticular lens, each lenticular lens is shielded from passing light by the opaque shield 24. That is, opaque shields are formed in regions other than the vertical light region of each lenticular lens, thereby constituting the lenticular. In this case, the irradiated light forms the exposure portion 26 in the photosensitive layer 27 through only the vertical light region 25 of each lenticular lens.

FIG. 7 is an explanatory diagram illustrating a vertical optical lenticular according to another embodiment of the present invention, which realizes vertical light through a light transmitting slit formed at the bottom of the lenticular.

A light transmission slit 30 is formed in the lower portion of the lenticular. The light transmitting slit is configured at the lower part of the central portion of each lenticular lens 29. The light transmitting slit 30 is formed to be long along the longitudinal direction of each lenticular lens. The light transmitting and receiving slit 30 is constituted by a groove formed in the slit support 30.

The light passes through the light transmission slit 30 through the lenticule, and then is irradiated to the photosensitive layer 31 to which the photosensitive agent is applied to form an exposure section 33. [ Of course, although not illustrated, a film having a pattern formed thereon is placed under the slit support, and a photosensitive layer is placed under the film.

It is preferable that the light transmitting slit 30 has a fine gap so that the light transmitting slit 30 can move with respect to each other without friction with the patterned film.

The light transmitting slit 30 may be constituted by printing. That is, a transparent portion is formed along the longitudinal direction of the lenticular lens in the lower center of the lower center of the respective lenticular lenses, and the opaque portion in which the remaining portions are not allowed to pass the light is printed.

This also corresponds to the lenticurea in which the light transmitting slit is formed along the longitudinal direction of the lenticurea lens at the lower part of the central part of each lenticular lens.

In another embodiment of the present invention, the lens shield of the lenticular lens shown in Fig. 6 and the light transmitting slit of the lenticular lens of Fig. 7 are simultaneously formed in the lenticular lens.

It is general that each of the lenticular lenses of the present invention is called a vertical optical lenticular lens. However, in the present invention, not only a single lenticular lens but also a configuration in which a few lenticular lenses such as two, three, or four lenses are connected may be included. In the present invention, the smaller the number of the lenticular lenses is, the longer the exposure time becomes. Also, when the number of lenses of the Lenticular lens is the same, it is natural that the smaller the pitch of the Lenticular lens is, the longer the exposure time becomes.

In general, Lenticure means connecting a large number of Lenticular lenses. However, if the number of lenses of the lenticular lens in the present invention is at least one, it is referred to as lenticular. Therefore, it is needless to say that the number of lenses of the Lenticular lens is one.

The present invention can be applied not only to the vertical light lenticular exposure apparatus described above as an embodiment but also to a small range of left and right constant regions centering on the central part of each lenticular lens, Type exposure apparatus belong to the scope of the present invention.

In addition, in all the embodiments of the present invention, a Fresnel lens can be disposed on the upper portion of the lenticular to induce more efficient light condensation. This also belongs to an embodiment of the present invention.

In the present invention, a device including a light source and a vertical optical lenticular is defined as a light source device.

The light sources in the present invention are various. LEDs and laser light sources are also included. The light source used in the present invention may be constituted by a plurality of point light sources, or may be constituted by a shape of a linear light source or a surface light source type by connecting point light sources.

In the present invention, when the light emitted from the light source is irradiated to the film through the vertical light lenticular, the light irradiated to the film is seen as a plurality of lines. The number of lines corresponding to the number of lenticular lenses constituting the vertical optical lenticular is irradiated onto the film.

In order to irradiate the entire surface of the large-area film with the vertical light irradiated on the line, it is necessary to transfer the light source device. Therefore, the light source device of the present invention includes a conveying means for conveying the light source device. However, if the light source device is fixed, the base on which the lower photosensitizer is placed may be moved. The transfer of the present invention is satisfactory if the movement of either the light source device or the base on which the photosensitizer is placed is possible. When the light source device is moved from the left side to the right side or from the front side to the rear side, the entire light-sensitive portion is exposed with the movement of the light source device.

The light source device in the present invention is located on the top of the film. In the present invention, in general, the light source device is slightly spaced from the film to allow relative movement of the light source device and the film. In a special case, however, the light source device may be moved in contact with the film.

In order to allow the film and the light source device to move without friction, the film and the light source device are separated from each other by a predetermined distance. The present invention can form a large-area exposed portion through relative movement between the light source device and the film.

As a specific embodiment of the moving means of the light source device in the present invention, the light source device can be constituted by a rail portion and a driving portion.

The drive unit is formed of a drive motor having a drive gear, and a rail gear may be formed in the rail unit to engage the drive gear. As described above, the vertical light lenticular exposure apparatus according to the present invention uses a condensing function of lenticure in an exposure apparatus, thereby enabling a clear exposure even if the thickness of the photosensitizer is several tens of microns or more. Even if the pitch of the circuit is several microns, It is possible to construct a clean circuit with no defects due to exposure and clear. This means that vertical light can maximally prevent scattering and reflections of light to be irradiated, which means that it is possible to provide an ideal, clean exposure.

As another embodiment of the present invention, the vertical light exposure apparatus may be configured by configuring only the light transmitting slits in the lower portion of the light source without using a lenticula. That is, the light of the light source device is irradiated onto the film on which the pattern is formed, and the light source device is composed of a light source and a light transmitting slat, and the light source device can be configured as a vertical light exposure machine, which moves relative to the film.

At this time, the light transmitting slits are composed of an opaque portion formed between the transparent portion formed long and the transparent portion. At this time, the width of the transparent portion is preferably composed of a size of several microns, and the width of the opaque portion is preferably composed of a size of several microns to several tens of microns. In this case, it is preferable that the interval between the light transmitting slits and the film is configured to be extremely narrow.

As another embodiment of the present invention, a combination of convex lenticura and concave lenticura can be used to make an exposure machine capable of more precise work. That is, light of the light source device is irradiated onto the film on which the pattern is formed, and the light source device is composed of a light source and a lenticular combination. To make a large exposure machine, the light source device is configured to move relative to the film.

In the present invention, the optical system constituted by combining the convex lenticura and the concave lenticula is defined as the lenticula combination. The lenticular assembly in the present invention may be composed of a plurality of convex lenticuras, or may be composed of a plurality of concave lenticulas, or may be configured by appropriately combining at least one convex lenticura and at least one concave lenticula. .

One of the most important means of seeing stereoscopic image is the convex lenticule which we generally know. It is made of a transparent material called convex lenticew, and one side is composed of a plane, and the other side is composed of a part of the convex lens continuously in the longitudinal direction. In the present invention, the convex lens corresponds to the convex lens, and concave lenses are defined as concave lenticuras.

In the case where the lenticular assembly is formed by combining the convex lenticura and the concave lenticula, the pitches of the convex lenticura and the concave lenticula must be configured in the same manner. When the light is irradiated to the lenticular assembly in which the convex lenticura and the concave lenticula are combined, the light is condensed through the convex lenticura, and the condensed light is divided into a plurality of fine lights through the concave lenticula.

That is, the light source of the line form which has a finer line width is comprised. In detail, when light passes through the convex lenticura, the light is composed of condensed light in the form of lines as many as the number of convex lenses. One convex lenticura lens is represented by the focused light in the form of a line. When the light is irradiated to the lenticular assembly in which the concave lenticura is positioned below the convex lenticura, the light condensed by the convex lenticura is finely divided again by the concave lenticura below. Through the experiment, the light collected through one convex lenticura was divided into three condensed lines through one concave lenticura. By using this phenomenon, the present invention provides an advantage of condensing the light to be irradiated with vertical light having an extremely fine line shape.

It will be apparent to those skilled in the art that various modifications and variations can be made in the present invention without departing from the spirit or scope of the invention as defined by the appended claims. . In addition, in the present invention, the light source device is configured to move relative to the film, so that exposure of a large area is generally performed. However, the exposure of the light source device and the film does not have to be relatively performed when the exposure of a narrow area is performed. This case is also part of the invention.

1: Exposure device 2: Light source device
6: Film 7: Photosensitizer
8: Plate 9: Substrate structure
11: Lenticular lens

Claims (3)

Wherein the light emitted from the light source device is irradiated onto a patterned film, and the irradiated light exposes a photosensitizer in a shape of a pattern formed on the film,
And the light source device includes a light source and a lenticular assembly. The lenticular exposure apparatus according to claim 1, wherein the light source device and the film are relatively moved. The lenticular exposure apparatus according to claim 1, wherein the lenticular assembly is a combination of at least one convex lenticura and at least one concave lenticura.







KR1020120039281A 2011-11-16 2012-04-16 Exposure apparatus KR20130116674A (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
KR1020120039281A KR20130116674A (en) 2012-04-16 2012-04-16 Exposure apparatus
EP12850328.1A EP2851751B1 (en) 2011-11-16 2012-11-15 Stepper having linear light source generating device
US14/443,396 US10197920B2 (en) 2011-11-16 2012-11-15 Linear light source generating device, exposure having linear light source generating device, and lenticular system used for linear light source generating device
PCT/KR2012/009685 WO2013073873A1 (en) 2011-11-16 2012-11-15 Linear light source generating device, exposure having linear light source generating device, and lenticular system used for linear light source generating device
TW101142835A TWI632400B (en) 2011-11-16 2012-11-16 Line type light exposure apparatus and lenticular assembly

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020120039281A KR20130116674A (en) 2012-04-16 2012-04-16 Exposure apparatus

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020190074276A Division KR20190077271A (en) 2019-06-21 2019-06-21 Exposure apparatus

Publications (1)

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KR20130116674A true KR20130116674A (en) 2013-10-24

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KR1020120039281A KR20130116674A (en) 2011-11-16 2012-04-16 Exposure apparatus

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