TWI626871B - Circuit board manufacturing method - Google Patents

Abstract

The invention relates to a method for manufacturing a circuit board, comprising: preparing a substrate with a resin layer and a blocking layer; forming at least one via hole through the resin layer and stopping at the blocking layer; forming a first metal layer by sputtering to cover a resin layer and a blocking layer; forming a second metal layer on the first metal layer by a chemical plating process; forming a third metal layer having a line pattern by electroplating, and exposing a portion of the second metal layer and filling the via holes; And etching the second metal layer and the underlying first metal layer to expose the underlying resin layer. Since the first metal layer provides better surface characteristics, the second and third metal layers are more stable, and a line having a line width/line spacing of less than 10 um is formed after the line is etched, thereby satisfying the electronic component packaging and the electronic application product to the circuit board. Thin line width / line spacing requirements.

Description

Circuit board manufacturing method

The invention relates to a method for fabricating a circuit board, in particular to sequentially form a stacked first metal layer, a second metal layer and a line pattern on a substrate by using a sputtering process, a chemical plating process, and a plating process. The three metal layers are further etched by a line to etch a portion of the first and second metal layers to form a thin line width/line distance line.

In recent years, with the rapid development of large integrated circuits (VLSI), the connection lines have become more and more fine. For example, in semiconductor 22nm technology, wafer density and signal processing capacity per unit area have been continuously increased, forcing the connection lines to be further miniaturized, resulting in unprecedented challenges in existing production, manufacturing equipment and processes. Furthermore, in order to further increase the package density, the wafers are stacked to form a three-dimensional package, and at this time, the line width/line distance of the circuit substrate needs to be reduced from 100 um to 30-50 um. As the industry continues to reduce the line width / line spacing requirements, the copper surface structure requirements of the line are also increasingly strict. Generally, the copper roughness Rz in a general printed circuit board (PCB) is 5-7um, wherein the roughness of the carrier must be less than 5um, but for the line width/line spacing 10-20um, the copper of the line The line surface roughness Rz is generally 2 um, otherwise it is easy to cause line deformation and the overall electrical function failure, or the line will be short-circuited due to residual copper, thus failing to achieve high precision and high reliability. even.

In the conventional technology, a semi-additive process (SAP) is generally used to make a line with a fine line width/line spacing of 50 μm or less, and a semi-additive SAP technique with a line width of less than 25 μm is a plain ABF resin. When the insulating layer material, or the use of Mitsubishi Gas, the production of Copper Coated Copper Foil (PCF) and prepreg (or film, Prepreg), by pressing. For the coated resin copper foil (PCF), the surface of the copper foil which is roughened on one side is first coated with a layer of resin having a thickness of 2-3 micrometers, and after being cured, it is formed by pressing together with the prepreg, and after pressing, The copper foil can be removed to form a surface of the resin having a certain coarseness on the surface, thus An electroless copper plating layer (or a chemical plating method) can be used on the surface of the resin to obtain an electroless copper plating layer having a good bonding force, thereby making a circuit requiring finer wiring.

Taking the SAP method using coated resin copper foil (PCF) as an example, the specific method is to press PCF onto the inner layer line, and then remove the copper foil on the PCF, leaving a resin with high surface characteristics for A wiring pattern layer having a fine line width/line pitch is formed on the surface of the resin by a chemical plating method.

However, the above-mentioned conventional technique has a disadvantage in that the resin remaining after removing the copper foil of the PCF is not sufficiently stable, so that the wiring pattern layer formed by the chemical skin plating method is liable to be broken, peeled, and peeled off due to insufficient adhesion, and is very It is difficult to keep the line pattern layer filling the blind hole to be used as the upright shape of the connecting post without offset, affecting the electrical quality of the line and the reliability of operation.

Therefore, there is a great need for a method for fabricating a circuit board, which sequentially forms a stacked first metal layer, a second metal layer, and a line pattern on a substrate by using a sputtering process, a chemical plating process, or an electroless plating process or a plating process. The third metal layer is further etched to etch a portion of the first and second metal layers to form a thin line width/line distance line, thereby solving all of the above problems of the prior art.

SUMMARY OF THE INVENTION A primary object of the present invention is to provide a method of fabricating a circuit board for fabricating a circuit board which is easy to form a thin line width/line line and to improve the accuracy of the line.

First, the manufacturing method of the circuit board of the present invention comprises preparing a substrate, and the substrate has a blocking layer and a resin layer, wherein the resin layer is on the blocking layer, and the surface has a roughness of Ra=0~1um and Rz=0~10um. And located on the surface of the substrate, and the blocking layer has a pattern and may be composed of a metal or an alloy.

Then, at least one via hole is formed through the laser drilling and/or mechanical drilling to penetrate the resin layer, wherein the via hole is a blind hole penetrating through the bottom of the substrate, and stops at the blocking layer without entering the blocking layer, that is, The via hole is prevented from entering by the blocking layer. In addition, the via hole can also be formed by directly using a laser beam drilling method. For example, a photoresist layer having a specific pattern can be formed on the resin layer, and then the photoresist layer can be used as a mask to perform laser irradiation. An etched laser hole is drilled to form a via.

Then, a sputtering process is performed to form a first metal layer on the resin layer and cover the surface of the via hole. Thereafter, a chemical plating treatment or an electroless plating treatment is performed to form a second metal layer covering the surface of the first metal layer. Next, on the second metal layer, a third metal layer is formed by a plating process, wherein the third metal layer has a wiring pattern to expose a portion of the second metal layer and fill the via holes, so that the first metal layer and the second metal The layer and the third metal layer can be electrically connected to each other.

Finally, the exposed second metal layer is line etched, and the underlying first metal layer is further etched to expose a portion of the underlying resin to complete the desired circuit board fabrication.

Furthermore, the resin layer may further comprise a reinforcing material uniformly distributed in the resin substrate, and the reinforcing material may comprise a plurality of glass fibers or carbon fibers for increasing the flexibility and strengthening the mechanical strength of the overall structure and avoiding Deflection and deformation occur.

In addition, the upper surface of the resin layer may be covered with a copper foil layer. Therefore, when forming the via hole, the copper foil layer is pre-treated, for example, the copper foil layer is blackened or browned to oxidize the copper foil layer. The surface is then subjected to a laser etching process to form via holes. The upper surface and/or the lower surface of the substrate may also have inner layer lines, such as a conductive metal material, and have an electrical pattern.

More specifically, the first metal layer may include an upper metal layer stacked on the lower metal layer and a lower metal layer stacked on the exposed portion of the inner wiring layer of the substrate. Further, the upper metal layer contains copper (Cu), and the lower metal layer contains titanium (Ti), chromium (Cr) or tantalum (Ta), and the second metal layer and the third metal layer may contain copper. The first metal layer may further comprise a bottom metal layer underlying the lower metal layer and contacting the exposed portion of the inner wiring layer, wherein the bottom metal layer may comprise titanium nitride (TiN).

Another object of the present invention is to provide a method for fabricating a circuit board, comprising: preparing a substrate, forming a via hole, forming a first metal layer, forming a second metal layer, forming a third metal layer, and etching a line, wherein the via hole is through a through hole of the substrate, wherein the first, second, and third metal layers sequentially cover the upper surface, the lower surface, and the surface of the through hole, and the third metal layer has a circuit pattern to expose a portion of the second metal layer And fill the entire through hole. In particular, the first and second metal layers are etched away by the wiring pattern of the third metal layer during the etching of the line, thereby exposing a portion of the resin layer under the first metal layer.

Specifically, the circuit board produced by the present invention may have a line width of less than 10 um. / line spacing, greatly improving the quality of the circuit board, especially the process steps are simple, easy to implement, while reducing the production cost, with a price advantage, can really meet the thin line width / line spacing of the electronic component packaging and electronic application products on the circuit board The requirements are conducive to market competition.

10‧‧‧Substrate

12‧‧‧blocking layer

20‧‧‧ resin layer

30‧‧‧vias

40‧‧‧First metal layer

50‧‧‧Second metal layer

60‧‧‧ third metal layer

62‧‧‧ openings

S10~S60‧‧‧Steps

The first figure shows an operational flow chart of a method of fabricating a circuit board according to a first embodiment of the present invention.

2A to 2F are schematic views showing the processing steps of the manufacturing method of the first embodiment of the present invention.

The third to third F diagrams sequentially show the processing steps of the manufacturing method of the second embodiment of the present invention.

The embodiments of the present invention will be described in more detail below with reference to the drawings and the reference numerals, which can be implemented by those skilled in the art after having studied this specification.

Referring to the first figure, an operational flowchart of a method for fabricating a circuit board according to a first embodiment of the present invention. As shown in the first figure, the manufacturing method of the circuit board according to the first embodiment of the present invention mainly includes steps S10, S20, S24, S30, S40, S50 and S60 which are sequentially performed for making a thin line width/line line easy to be formed. Circuit board. In addition, in order to further facilitate the understanding of the technical features of the manufacturing method of the present invention, the schematic diagrams of the second A to the second F drawings may be referred to at the same time.

First, in the manufacturing method of the present invention, the substrate 10 is prepared starting from step S10, as shown in FIG. 2A, wherein the substrate 10 has a stopper layer 12 and a resin layer 20. The resin layer 20 is on the stopper layer 12 and is located on the surface of the substrate 10, and the stopper layer 12 has a pattern and is composed of a metal or an alloy. The resin layer 20 can be formed by a press-bonding method. However, the present invention is not limited thereto, and other methods such as coating and spraying can be used. In particular, the resin layer 20 is a resin substrate comprising an epoxy resin, FR4, FR5, Modified FR4) Silicon, BT resin, polyphenylene ether resin (PPO), polyimine (PI) ), ABF (Ajinomoto build-up film), polypropylene or Photoimageable Dielectric Material (PIDM), and the surface of the resin layer 20 has a roughness of Ra=0~1um and Rz=0~10um. .

Next, proceeding to step S20, as shown in FIG. 2B, at least one via hole 30 is formed through the resin layer 20 by laser drilling and/or mechanical drilling, wherein the via hole 30 is blind through the bottom of the substrate 10. The holes stop at the blocking layer 12 without entering the blocking layer 12. That is, the blocking layer 12 is for preventing the via hole 30 from entering. The via hole 30 can be directly formed by the laser drilling method of the laser beam. However, the present invention is not limited thereto. For example, the photoresist layer having a specific pattern may be formed on the resin layer 20 (not shown). The laser hole is laser-etched by using the photoresist layer as a mask to form at least one via hole 30 as needed.

Then, in step S30, as shown in FIG. 2C, a sputtering process is performed, and a first metal layer 40 is formed on the resin layer 20, and the first metal layer 40 covers the surface of the via hole 30.

Step S40 is performed. As shown in FIG. 2D, a chemical plating treatment or an electroless plating treatment is performed to form a second metal layer 50, wherein the second metal layer 50 covers the surface of the first metal layer 40.

In step S50, as shown in the second E diagram, on the second metal layer 50, a third metal layer 60 is formed by a plating process, wherein the third metal layer 60 has a wiring pattern to expose a portion of the second metal layer. 50, and filling the via holes 30, so that the first metal layer 40, the second metal layer 50, and the third metal layer 60 can be electrically connected to each other.

Finally, in step S60, as shown in the second F diagram, the exposed second metal layer 50 is line etched, and the underlying first metal layer 40 is further etched, thereby exposing a portion of the underlying resin layer 20, thereby completing the desired Circuit board production.

The above resin layer 20 may further comprise a reinforcing material (not shown) uniformly distributed in the resin substrate, and the reinforcing material may comprise a plurality of glass fibers or carbon fibers for increasing the flexibility and strengthening the overall structure. Mechanical strength to avoid deflection and deformation.

Further, in the step S10 of preparing the substrate 10, the upper surface of the resin layer 20 of the substrate 10 may be covered with a copper foil layer (not shown), and therefore, in the step S20 of forming the via hole 30, The copper foil layer is pre-treated, for example, including the copper foil layer for blackening or browning to oxidize the surface of the copper foil layer, and then subjected to laser etching treatment to form at least one via hole 30 required. .

Furthermore, the upper surface of the substrate 10 and /or the lower surface may have inner layer lines (not shown), which are made of a conductive metal material and may further have an electrical pattern.

More specifically, the first metal layer 40 may further include an upper metal layer and a lower metal layer (not shown), wherein the upper metal layer is stacked on the lower metal layer, and the lower metal layer is stacked on the substrate 10. The exposed portion of the inner wiring layer is exposed to a portion of the inner wiring layer because the via hole 30 formed in step S20 is exposed. Further, the upper metal layer contains copper (Cu), and the lower metal layer contains titanium (Ti), chromium (Cr) or tantalum (Ta), and the second metal layer 50 and the third metal layer 60 may contain copper.

Furthermore, the first metal layer 40 may further comprise a bottom metal layer (not shown) located below the lower metal layer and contacting the exposed portion of the inner wiring layer, wherein the bottom metal layer may comprise titanium nitride (TiN).

In addition, the second embodiment of the present invention is another method for manufacturing a circuit board, wherein the operation flowchart of the manufacturing method of the second embodiment is still as shown in the first figure, and includes steps S10, S20, S24, S30, S40, and S50. And S60, for making a circuit board which is easy to form a thin line width/line line, and the second embodiment is similar to the first embodiment, but for further understanding of the features of the embodiment, please cooperate with the third A to the Schematic diagram of the three F map.

First, the operation of step S10 is performed to prepare the substrate 10, wherein the upper surface and the lower surface of the substrate 10 have resin layers 20, respectively, as shown in FIG. Next, proceeding to step S20, the substrate 10 and the resin layer 20 on the upper and lower surfaces of the substrate 10 are penetrated by laser drilling and/or mechanical drilling to form at least one via hole 30, and the at least one via hole 30 is formed. Essentially a through hole, as shown in Figure 3B.

In step S30, as shown in FIG. 3C, a sputtering process is performed to mainly form the first metal layer 40 on the resin layer 20, and the first metal layer 40 covers the surface of the via hole 30. Step S40 is performed. As shown in FIG. 3D, a chemical plating treatment or an electroless plating treatment is performed to form a second metal layer 50, wherein the second metal layer 50 covers the surface of the first metal layer 40. Then, proceeding to step S50, as shown in FIG. 3E, a third metal layer 60 is formed on the second metal layer 50 by a plating process, wherein the third metal layer 60 has a line pattern and has a line pattern on the line pattern. An opening 62 corresponding to the exposed second metal layer 50 and filling the via hole 30, so that the first metal layer 40, the second metal layer 50 and the third metal layer 60 are electrically connected to each other, thereby completing the The production of the required circuit board.

Finally at step S60, as shown in the third F-figure, the exposed second metal layer 50 The line is etched and the underlying first metal layer 40 is further etched to expose a portion of the underlying resin layer 20 to complete the desired circuit board fabrication.

The remaining components of the second embodiment are like the first embodiment, and are not described herein again.

In summary, the main feature of the manufacturing method of the present embodiment is that a first metal layer having high adhesion is formed on the resin layer by sputtering, and a second metal is formed on the first metal layer by chemical skin plating. Layer, then forming a third metal layer by electroplating to cover the second metal layer and filling the blind holes, and the second metal layer and the third metal layer are more stable because the first metal layer provides better surface characteristics, and After the line is etched, a line having a line width/line spacing of less than 10 um can be formed, thereby reliably meeting the requirements of the thin line width/line spacing of the circuit board for electronic component packaging and electronic application products.

In particular, the first metal layer comprises an upper metal layer composed of copper or aluminum which is easily oxidized, and a lower metal layer composed of titanium, chromium or ruthenium for enhancing activity, which improves the processability of the subsequent treatment and quality. In addition, the first metal layer may further comprise a bottom metal layer composed of titanium nitride under the lower metal layer for contacting the inner circuit layer such that the overall material strength of the first metal layer and the inner layer layer The bond between them has been greatly improved. Furthermore, the second metal layer can be used as an interlayer conduction layer, and the third metal layer can be used to increase the overall thickness of the metal layer while filling the via holes with the metal.

Therefore, the circuit board produced by the method of the invention has high operational stability and reliability, and effectively solves the shortcomings of the conventional technology.

Since the technology of the present invention is not found in published publications, periodicals, magazines, media, exhibition venues, and thus is novel, and can be implemented by breaking through the current technical bottlenecks, it is indeed progressive. In addition, the present invention can solve the problems of the conventional technology, improve the overall use efficiency, and can achieve the value of industrial utilization.

The above is only a preferred embodiment for explaining the present invention, and is not intended to limit the present invention in any way, and any modifications or alterations to the present invention made in the spirit of the same invention. All should still be included in the scope of the intention of the present invention.

Claims (18)

A manufacturing method of a circuit board, comprising: preparing a substrate, wherein the substrate has a blocking layer and a resin layer, wherein the resin layer is on the blocking layer, and the resin layer is located on a surface of the substrate, and The blocking layer has a pattern, and the blocking layer is made of a metal or an alloy; a laser drilling and/or a mechanical drilling is used to form at least one via hole and penetrate the resin layer, and the at least one via hole Not entering the blocking layer but stopping on the surface of the blocking layer, thereby exposing the portion of the blocking layer at the at least one via hole, and the at least one via hole is a blind hole; the exposed portion of the resin layer and the blocking layer Forming a first metal layer by a sputtering process; forming a second metal layer on the first metal layer by a chemical plating process or an electroless plating process; and using the second metal layer on the second metal layer Forming a third metal layer by electroplating, and the third metal layer has a line pattern to expose a portion of the second metal layer and filling the at least one via hole to electrically connect the first metal layer a second metal layer and the third metal layer; and etching the exposed second metal layer, and further etching the underlying first metal layer, thereby exposing the underlying portion of the resin layer, thereby completing a circuit board Production. According to the method of manufacturing the circuit board of claim 1, wherein the at least one via hole is formed by laser drilling directly using a laser beam. According to the method of manufacturing the circuit board of claim 1, wherein the at least one via hole is formed on the resin layer to form a photoresist layer having a specific pattern, and the photoresist layer is used as a light. A laser drilling of a laser etch process is performed to form the at least one via hole. According to the method of manufacturing the circuit board of claim 1, wherein an upper surface of the resin layer covers a copper foil layer, and the at least one via hole is formed by pre-treating the copper foil layer, including Performing a blackening treatment or a browning treatment on the copper foil layer, and the blackening treatment or the browning treatment is for oxidizing the surface of the copper foil layer, followed by performing a laser etching treatment to form the at least a through hole. A method of manufacturing a circuit board according to the first aspect of the invention, wherein the resin layer comprises a resin substrate comprising epoxy resin, FR4, FR5, Modified FR4) silicone, BT resin, Polyphenylene ether resin (PPO), polyimine (PI), Ajinomoto build-up film (ABF), polypropylene or Photo Imageable Dielectric Material (PIDM), and The surface of the resin layer has a roughness of Ra = 0 to 1 um and Rz = 0 to 10 um. A method of fabricating a circuit board according to the first aspect of the invention, wherein the substrate has an inner layer on an upper surface and/or a lower surface. The method for fabricating a circuit board according to claim 6, wherein the first metal layer comprises an upper metal layer and a lower metal layer, and the upper metal layer is stacked on the lower metal layer, and the lower metal layer Stacked on the exposed portion of the inner wiring layer, the upper metal layer comprising copper (Cu), and the lower metal layer comprising titanium (Ti), chromium (Cr) or tantalum (Ta), the second metal layer and The third metal layer comprises copper. The method of fabricating a circuit board according to claim 6, wherein the first metal layer further comprises a bottom metal layer under the lower metal layer and contacting the exposed portion of the inner circuit layer, and the bottom portion The metal layer contains titanium nitride (TiN). A method of manufacturing a wiring board according to the first aspect of the invention, wherein the resin layer further comprises a reinforcing material uniformly distributed in the resin substrate, and the reinforcing material comprises a plurality of glass fibers or carbon fibers. A method for manufacturing a circuit board, comprising: drilling a substrate and a resin layer by a laser drilling and/or a mechanical drilling, and forming a via hole in the substrate and the resin layer, wherein an upper surface of the substrate And having a resin layer on the surface; sputtering a surface of the resin layer, and forming a first metal layer on the surface of the resin layer; chemically plating or electroless plating the first metal layer, and Forming a second metal layer on the surface of the first metal layer; plating the second metal layer, and forming a third metal layer on the surface of the second metal layer, and the third metal layer has a line pattern, and Having an opening in the line pattern corresponding to the exposed second metal layer; filling the via hole to electrically connect the first metal layer, the second metal layer and the third metal layer; and etching The exposed second metal layer further etches the underlying first metal layer to expose the underlying portion of the resin layer to complete the fabrication of a circuit board. The method for manufacturing a circuit board according to claim 10, wherein the at least one via hole Formation is achieved by means of laser drilling directly with a laser beam. According to the manufacturing method of the circuit board of claim 10, the at least one via hole is formed on the resin layer to form a photoresist layer having a specific pattern, and the photoresist layer is used as a light. A laser drilling of a laser etch process is performed to form the at least one via hole. The method of manufacturing a circuit board according to claim 10, wherein an upper surface of the resin layer covers a copper foil layer, and the at least one via hole is formed by pre-treating the copper foil layer, including Performing a blackening treatment or a browning treatment on the copper foil layer, and the blackening treatment or the browning treatment is for oxidizing the surface of the copper foil layer, followed by performing a laser etching treatment to form the at least a through hole. A method of manufacturing a circuit board according to claim 10, wherein the resin layer comprises a resin substrate comprising epoxy resin, FR4, FR5, Modified FR4) silicone, BT resin, Polyphenylene ether resin (PPO), polyimine (PI), ABF, polypropylene or photoimageable dielectric material (PIDM), and the surface of the resin layer has Ra=0~1um and Rz=0~10um A roughness. The method of fabricating a circuit board according to claim 10, wherein the substrate has an inner layer on an upper surface and/or a lower surface. The method of fabricating a circuit board according to claim 15 , wherein the first metal layer comprises an upper metal layer and a lower metal layer, and the upper metal layer is stacked on the lower metal layer And the lower metal layer is stacked on the exposed portion of the inner wiring layer, the upper metal layer comprises copper (Cu), and the lower metal layer comprises titanium (Ti), chromium (Cr) or tantalum (Ta) The second metal layer and the third metal layer comprise copper. The method of fabricating a circuit board according to claim 16, wherein the first metal layer further comprises a bottom metal layer under the lower metal layer and contacting the exposed portion of the inner circuit layer, and the bottom portion The metal layer contains titanium nitride (TiN). A method of manufacturing a wiring board according to claim 10, wherein the resin layer further comprises a reinforcing material uniformly distributed in the resin substrate, and the reinforcing material comprises a plurality of glass fibers or carbon fibers.