TWI621594B - Optical element and method of manufacturing the same - Google Patents
Optical element and method of manufacturing the same Download PDFInfo
- Publication number
- TWI621594B TWI621594B TW103133875A TW103133875A TWI621594B TW I621594 B TWI621594 B TW I621594B TW 103133875 A TW103133875 A TW 103133875A TW 103133875 A TW103133875 A TW 103133875A TW I621594 B TWI621594 B TW I621594B
- Authority
- TW
- Taiwan
- Prior art keywords
- glass
- molding
- film
- oxide
- metal
- Prior art date
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 73
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 28
- 239000011521 glass Substances 0.000 claims abstract description 195
- 238000000576 coating method Methods 0.000 claims abstract description 80
- 239000000075 oxide glass Substances 0.000 claims abstract description 80
- 239000011248 coating agent Substances 0.000 claims abstract description 79
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 66
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 66
- 229910052751 metal Inorganic materials 0.000 claims abstract description 54
- 239000002184 metal Substances 0.000 claims abstract description 54
- 125000004430 oxygen atom Chemical group O* 0.000 claims abstract description 35
- 125000004429 atom Chemical group 0.000 claims abstract description 28
- 230000009477 glass transition Effects 0.000 claims abstract description 27
- 238000000465 moulding Methods 0.000 claims description 217
- 239000000463 material Substances 0.000 claims description 71
- 229910052760 oxygen Inorganic materials 0.000 claims description 43
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 40
- 239000001301 oxygen Substances 0.000 claims description 40
- 239000000203 mixture Substances 0.000 claims description 37
- 238000009792 diffusion process Methods 0.000 claims description 19
- 230000002950 deficient Effects 0.000 claims description 12
- 239000010936 titanium Substances 0.000 claims description 12
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 10
- 229910052726 zirconium Inorganic materials 0.000 claims description 10
- 229910052715 tantalum Inorganic materials 0.000 claims description 6
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 5
- 229910052735 hafnium Inorganic materials 0.000 claims description 5
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims description 5
- 229910052719 titanium Inorganic materials 0.000 claims description 5
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 5
- 229910052721 tungsten Inorganic materials 0.000 claims description 5
- 239000010937 tungsten Substances 0.000 claims description 5
- 230000007812 deficiency Effects 0.000 claims description 4
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 4
- 238000000034 method Methods 0.000 abstract description 31
- 206010021143 Hypoxia Diseases 0.000 abstract description 6
- 150000002500 ions Chemical group 0.000 description 29
- 230000000052 comparative effect Effects 0.000 description 25
- 238000005011 time of flight secondary ion mass spectroscopy Methods 0.000 description 17
- 238000002042 time-of-flight secondary ion mass spectrometry Methods 0.000 description 17
- 238000004458 analytical method Methods 0.000 description 15
- 239000005304 optical glass Substances 0.000 description 15
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 14
- 229910052799 carbon Inorganic materials 0.000 description 14
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical group [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 14
- 229910001928 zirconium oxide Inorganic materials 0.000 description 14
- 229910004298 SiO 2 Inorganic materials 0.000 description 13
- 230000015572 biosynthetic process Effects 0.000 description 12
- 229910018068 Li 2 O Inorganic materials 0.000 description 10
- 229910010413 TiO 2 Inorganic materials 0.000 description 10
- 238000010438 heat treatment Methods 0.000 description 9
- 238000004544 sputter deposition Methods 0.000 description 9
- 239000012298 atmosphere Substances 0.000 description 8
- 238000005187 foaming Methods 0.000 description 8
- 239000007789 gas Substances 0.000 description 8
- 229910021193 La 2 O 3 Inorganic materials 0.000 description 7
- 239000010955 niobium Substances 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 6
- 239000000126 substance Substances 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- 238000007740 vapor deposition Methods 0.000 description 5
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 4
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 4
- 150000001768 cations Chemical class 0.000 description 4
- 238000005229 chemical vapour deposition Methods 0.000 description 4
- 229910052744 lithium Inorganic materials 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- 230000001590 oxidative effect Effects 0.000 description 4
- 239000002344 surface layer Substances 0.000 description 4
- 230000007704 transition Effects 0.000 description 4
- 238000012790 confirmation Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000005499 meniscus Effects 0.000 description 3
- 238000000879 optical micrograph Methods 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- 229910052688 Gadolinium Inorganic materials 0.000 description 2
- 229910003134 ZrOx Inorganic materials 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 239000012467 final product Substances 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 238000007733 ion plating Methods 0.000 description 2
- 238000004949 mass spectrometry Methods 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 2
- 238000010583 slow cooling Methods 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 229910001936 tantalum oxide Inorganic materials 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 238000004017 vitrification Methods 0.000 description 2
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 description 1
- 229910005191 Ga 2 O 3 Inorganic materials 0.000 description 1
- 229910005793 GeO 2 Inorganic materials 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 229910052769 Ytterbium Inorganic materials 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 239000005287 barium borate glass Substances 0.000 description 1
- 229910052792 caesium Inorganic materials 0.000 description 1
- 239000003575 carbonaceous material Substances 0.000 description 1
- -1 cesium alkane Chemical class 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000008034 disappearance Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000007496 glass forming Methods 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- NFFIWVVINABMKP-UHFFFAOYSA-N methylidynetantalum Chemical compound [Ta]#C NFFIWVVINABMKP-UHFFFAOYSA-N 0.000 description 1
- 239000012778 molding material Substances 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 238000000399 optical microscopy Methods 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 239000005365 phosphate glass Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 229910001925 ruthenium oxide Inorganic materials 0.000 description 1
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- VSZWPYCFIRKVQL-UHFFFAOYSA-N selanylidenegallium;selenium Chemical compound [Se].[Se]=[Ga].[Se]=[Ga] VSZWPYCFIRKVQL-UHFFFAOYSA-N 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229910003468 tantalcarbide Inorganic materials 0.000 description 1
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 230000000930 thermomechanical effect Effects 0.000 description 1
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 1
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B11/00—Pressing molten glass or performed glass reheated to equivalent low viscosity without blowing
- C03B11/06—Construction of plunger or mould
- C03B11/08—Construction of plunger or mould for making solid articles, e.g. lenses
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/062—Glass compositions containing silica with less than 40% silica by weight
- C03C3/064—Glass compositions containing silica with less than 40% silica by weight containing boron
- C03C3/068—Glass compositions containing silica with less than 40% silica by weight containing boron containing rare earths
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Manufacturing & Machinery (AREA)
- Glass Compositions (AREA)
- Surface Treatment Of Glass (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013205497A JP6218536B2 (ja) | 2013-09-30 | 2013-09-30 | 光学素子およびその製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201527229A TW201527229A (zh) | 2015-07-16 |
| TWI621594B true TWI621594B (zh) | 2018-04-21 |
Family
ID=52743632
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW103133875A TWI621594B (zh) | 2013-09-30 | 2014-09-30 | Optical element and method of manufacturing the same |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP6218536B2 (enExample) |
| KR (1) | KR102219149B1 (enExample) |
| CN (1) | CN105579412B (enExample) |
| TW (1) | TWI621594B (enExample) |
| WO (1) | WO2015046509A1 (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI610074B (zh) * | 2016-12-16 | 2018-01-01 | 由田新技股份有限公司 | 曲面待測物表面瑕疵檢測系統 |
| CN106772716A (zh) * | 2017-02-07 | 2017-05-31 | 长沙青波光电科技有限公司 | 大na非球面柱透镜的制备方法 |
| US12515982B2 (en) | 2021-03-19 | 2026-01-06 | Corning Incorporated | High-index borate glasses |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004091322A (ja) * | 2002-08-29 | 2004-03-25 | Eastman Kodak Co | 注入された精密ガラス成型ツールを用いたガラスレンズの成型メカニズム |
| JP2012091951A (ja) * | 2010-10-26 | 2012-05-17 | Asahi Glass Co Ltd | 光学素材の処理方法及び光学素子の成形方法 |
| CN102849939A (zh) * | 2011-06-27 | 2013-01-02 | Hoya株式会社 | 压制成型用玻璃材料、其制造方法及光学元件制造方法 |
| CN102862347A (zh) * | 2009-05-20 | 2013-01-09 | Hoya株式会社 | 压制成型用玻璃材料、以及使用该玻璃材料的玻璃光学元件的制造方法、以及玻璃光学元件 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4373688B2 (ja) * | 2002-03-14 | 2009-11-25 | Ｈｏｙａ株式会社 | 光学ガラス、精密プレス成形用プリフォーム、及び光学素子 |
| JP4255292B2 (ja) | 2003-02-21 | 2009-04-15 | Ｈｏｙａ株式会社 | 光学素子成形用ガラス素材および光学素子の製造方法 |
| CA2556730C (en) * | 2004-02-25 | 2013-12-24 | Afg Industries, Inc. | Heat stabilized sub-stoichiometric dielectrics |
| JP4231967B2 (ja) | 2006-10-06 | 2009-03-04 | 住友金属鉱山株式会社 | 酸化物焼結体、その製造方法、透明導電膜、およびそれを用いて得られる太陽電池 |
| JP5134893B2 (ja) * | 2007-09-07 | 2013-01-30 | キヤノンオプトロン株式会社 | 光学薄膜の形成材料および光学薄膜の形成方法 |
| JP5364568B2 (ja) * | 2009-12-28 | 2013-12-11 | Ｈｏｙａ株式会社 | プレス成形用ガラス素材、プレス成形用ガラス素材の製造方法、および光学素子の製造方法 |
| JP2013127118A (ja) | 2011-09-06 | 2013-06-27 | Idemitsu Kosan Co Ltd | スパッタリングターゲット |
-
2013
- 2013-09-30 JP JP2013205497A patent/JP6218536B2/ja active Active
-
2014
- 2014-09-29 KR KR1020167004994A patent/KR102219149B1/ko not_active Expired - Fee Related
- 2014-09-29 WO PCT/JP2014/075887 patent/WO2015046509A1/ja not_active Ceased
- 2014-09-29 CN CN201480053466.6A patent/CN105579412B/zh active Active
- 2014-09-30 TW TW103133875A patent/TWI621594B/zh not_active IP Right Cessation
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004091322A (ja) * | 2002-08-29 | 2004-03-25 | Eastman Kodak Co | 注入された精密ガラス成型ツールを用いたガラスレンズの成型メカニズム |
| CN102862347A (zh) * | 2009-05-20 | 2013-01-09 | Hoya株式会社 | 压制成型用玻璃材料、以及使用该玻璃材料的玻璃光学元件的制造方法、以及玻璃光学元件 |
| JP2012091951A (ja) * | 2010-10-26 | 2012-05-17 | Asahi Glass Co Ltd | 光学素材の処理方法及び光学素子の成形方法 |
| CN102849939A (zh) * | 2011-06-27 | 2013-01-02 | Hoya株式会社 | 压制成型用玻璃材料、其制造方法及光学元件制造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR102219149B1 (ko) | 2021-02-22 |
| WO2015046509A1 (ja) | 2015-04-02 |
| CN105579412A (zh) | 2016-05-11 |
| KR20160065080A (ko) | 2016-06-08 |
| JP6218536B2 (ja) | 2017-10-25 |
| JP2015067525A (ja) | 2015-04-13 |
| TW201527229A (zh) | 2015-07-16 |
| CN105579412B (zh) | 2018-09-14 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN102428045B (zh) | 压制成型用玻璃材料、以及使用该玻璃材料的玻璃光学元件的制造方法、以及玻璃光学元件 | |
| CN102428048B (zh) | 压制成型用玻璃材料、使用该玻璃材料的玻璃光学元件的制造方法、以及玻璃光学元件 | |
| JP5364568B2 (ja) | プレス成形用ガラス素材、プレス成形用ガラス素材の製造方法、および光学素子の製造方法 | |
| JP2007269613A (ja) | ガラス光学素子の製造方法 | |
| TWI621594B (zh) | Optical element and method of manufacturing the same | |
| TWI725020B (zh) | 壓製成型用玻璃素材、玻璃光學元件及其製造方法 | |
| JP2012041195A (ja) | 光学素子成形素材及びその製造方法 | |
| JP5756769B2 (ja) | プレス成形用ガラス素材の製造方法およびガラス光学素子の製造方法 | |
| JP5442420B2 (ja) | 精密プレス成形用ガラス素材の肉厚決定方法および製造方法、ならびにガラス光学素子の製造方法 | |
| WO2016159055A1 (ja) | プレス成形用ガラス素材、ガラス光学素子およびその製造方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |