TWI614558B - 深紫外光連續波雷射及產生深紫外光連續波雷射輻射之方法 - Google Patents
深紫外光連續波雷射及產生深紫外光連續波雷射輻射之方法 Download PDFInfo
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- TWI614558B TWI614558B TW103120220A TW103120220A TWI614558B TW I614558 B TWI614558 B TW I614558B TW 103120220 A TW103120220 A TW 103120220A TW 103120220 A TW103120220 A TW 103120220A TW I614558 B TWI614558 B TW I614558B
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Links
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
- H01S3/108—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using non-linear optical devices, e.g. exhibiting Brillouin or Raman scattering
- H01S3/109—Frequency multiplication, e.g. harmonic generation
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/35—Non-linear optics
- G02F1/3501—Constructional details or arrangements of non-linear optical devices, e.g. shape of non-linear crystals
- G02F1/3507—Arrangements comprising two or more nonlinear optical devices
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/35—Non-linear optics
- G02F1/353—Frequency conversion, i.e. wherein a light beam is generated with frequency components different from those of the incident light beams
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/35—Non-linear optics
- G02F1/353—Frequency conversion, i.e. wherein a light beam is generated with frequency components different from those of the incident light beams
- G02F1/3534—Three-wave interaction, e.g. sum-difference frequency generation
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/35—Non-linear optics
- G02F1/353—Frequency conversion, i.e. wherein a light beam is generated with frequency components different from those of the incident light beams
- G02F1/354—Third or higher harmonic generation
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/35—Non-linear optics
- G02F1/355—Non-linear optics characterised by the materials used
- G02F1/3558—Poled materials, e.g. with periodic poling; Fabrication of domain inverted structures, e.g. for quasi-phase-matching [QPM]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
- H01S3/0092—Nonlinear frequency conversion, e.g. second harmonic generation [SHG] or sum- or difference-frequency generation outside the laser cavity
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
- G02F2201/17—Multi-pass arrangements, i.e. arrangements to pass light a plurality of times through the same element, e.g. by using an enhancement cavity
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2203/00—Function characteristic
- G02F2203/15—Function characteristic involving resonance effects, e.g. resonantly enhanced interaction
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
- Lasers (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201361833716P | 2013-06-11 | 2013-06-11 | |
| US61/833,716 | 2013-06-11 | ||
| US14/294,019 | 2014-06-02 | ||
| US14/294,019 US9509112B2 (en) | 2013-06-11 | 2014-06-02 | CW DUV laser with improved stability |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201504739A TW201504739A (zh) | 2015-02-01 |
| TWI614558B true TWI614558B (zh) | 2018-02-11 |
Family
ID=52005442
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW103120220A TWI614558B (zh) | 2013-06-11 | 2014-06-11 | 深紫外光連續波雷射及產生深紫外光連續波雷射輻射之方法 |
Country Status (8)
| Country | Link |
|---|---|
| US (2) | US9509112B2 (enExample) |
| EP (1) | EP3008779B1 (enExample) |
| JP (2) | JP6211180B2 (enExample) |
| KR (2) | KR102117566B1 (enExample) |
| CN (2) | CN114389139A (enExample) |
| IL (1) | IL264501B (enExample) |
| TW (1) | TWI614558B (enExample) |
| WO (1) | WO2014201152A1 (enExample) |
Families Citing this family (38)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9509112B2 (en) * | 2013-06-11 | 2016-11-29 | Kla-Tencor Corporation | CW DUV laser with improved stability |
| EP2947509B1 (en) * | 2014-05-22 | 2022-04-13 | Lumentum Operations LLC | Cascaded optical harmonic generation |
| US9568803B2 (en) | 2014-05-22 | 2017-02-14 | Lumentum Operations Llc | Cascaded optical harmonic generation |
| US10228607B2 (en) | 2014-05-22 | 2019-03-12 | Lumentum Operations Llc | Second harmonic generation |
| US9748729B2 (en) * | 2014-10-03 | 2017-08-29 | Kla-Tencor Corporation | 183NM laser and inspection system |
| US10436720B2 (en) * | 2015-09-18 | 2019-10-08 | KLA-Tenfor Corp. | Adaptive automatic defect classification |
| US10458904B2 (en) | 2015-09-28 | 2019-10-29 | Ball Aerospace & Technologies Corp. | Differential absorption lidar |
| JPWO2018008142A1 (ja) | 2016-07-08 | 2019-04-18 | ギガフォトン株式会社 | 波長変換装置 |
| CN106025777B (zh) * | 2016-08-01 | 2019-02-05 | 苏州艾思兰光电有限公司 | 一种半导体泵浦激光清洗机的激光光路系统 |
| US10395358B2 (en) * | 2016-11-10 | 2019-08-27 | Kla-Tencor Corp. | High sensitivity repeater defect detection |
| US10175555B2 (en) * | 2017-01-03 | 2019-01-08 | KLA—Tencor Corporation | 183 nm CW laser and inspection system |
| CN110050229B (zh) * | 2017-05-17 | 2020-06-09 | 三菱电机株式会社 | 波长转换装置 |
| US10840666B2 (en) * | 2017-06-20 | 2020-11-17 | Boston Scientific Scimed, Inc. | Laser systems and methods |
| DE102017212465A1 (de) | 2017-07-20 | 2017-09-14 | Carl Zeiss Smt Gmbh | Messsystem und Messverfahren für fotolithographische Anwendungen |
| KR102083936B1 (ko) * | 2018-03-08 | 2020-03-03 | 주식회사 이오테크닉스 | 주파수 변환 시스템 |
| US10921245B2 (en) | 2018-06-08 | 2021-02-16 | Ball Aerospace & Technologies Corp. | Method and systems for remote emission detection and rate determination |
| JP7088470B2 (ja) * | 2018-07-13 | 2022-06-21 | 住友電工デバイス・イノベーション株式会社 | 光源調整方法 |
| CN109617545B (zh) * | 2018-12-12 | 2021-03-12 | 汕头大学 | 具有两种三次谐波增强以及光电开关功能的装置及方法 |
| EP4462182B1 (en) * | 2018-12-18 | 2026-07-22 | IPG Photonics Corporation | Method for manufacturing of patterned srb4bo7 and pbb407 crystalls |
| CN113196596B (zh) * | 2018-12-18 | 2024-08-20 | Ipg光子公司 | 基于图案化srb4bo7或pbb4o7晶体的高功率激光转换器 |
| US11340284B2 (en) * | 2019-07-23 | 2022-05-24 | Kla Corporation | Combined transmitted and reflected light imaging of internal cracks in semiconductor devices |
| US11005227B2 (en) * | 2019-09-05 | 2021-05-11 | Nufern | Multi-wavelength adjustable-radial-mode fiber laser |
| CN111106521A (zh) * | 2019-12-24 | 2020-05-05 | 北京科益虹源光电技术有限公司 | 一种和频装置和激光器 |
| CN111129935A (zh) * | 2019-12-24 | 2020-05-08 | 北京科益虹源光电技术有限公司 | 一种和频方法 |
| KR102887811B1 (ko) | 2020-05-25 | 2025-11-17 | 주식회사 엘지에너지솔루션 | 양극 스크랩을 이용한 활물질 재사용 방법 |
| CN113759644B (zh) | 2020-06-02 | 2022-12-27 | 华为技术有限公司 | 光源系统以及激光投影显示设备 |
| US11237455B2 (en) * | 2020-06-12 | 2022-02-01 | Kla Corporation | Frequency conversion using stacked strontium tetraborate plates |
| US11448939B2 (en) * | 2020-09-24 | 2022-09-20 | Massachusetts Institute Of Technology | Efficient spectrum-spanning terahertz frequency synthesis via dielectric structure with nonlinear medium |
| CN112234424A (zh) * | 2020-10-20 | 2021-01-15 | 山东大学 | 一种基于Nd:YAG和Er:YAG激光器和频产生的248nm高功率深紫外激光器 |
| CN112490841A (zh) * | 2020-11-27 | 2021-03-12 | 北京科益虹源光电技术有限公司 | 一种调控213nm激光输出功率的方法及其装置 |
| KR102374247B1 (ko) * | 2021-05-12 | 2022-03-15 | (재)한국나노기술원 | 고효율 uv-c 발광 장치 |
| US12379642B2 (en) | 2021-06-11 | 2025-08-05 | Kla Corporation | Tunable DUV laser assembly |
| US11567391B1 (en) | 2021-11-24 | 2023-01-31 | Kla Corporation | Frequency conversion using interdigitated nonlinear crystal gratings |
| US11899338B2 (en) * | 2021-12-11 | 2024-02-13 | Kla Corporation | Deep ultraviolet laser using strontium tetraborate for frequency conversion |
| JP7132455B1 (ja) * | 2022-06-28 | 2022-09-06 | レーザーテック株式会社 | 光源装置、検査装置、および調整方法 |
| KR20240109032A (ko) | 2023-01-03 | 2024-07-10 | 삼성전자주식회사 | 광학 계측 설비, 그를 이용한 광학 계측 방법 및 그를 이용한 반도체 장치의 제조 방법 |
| US20250084557A1 (en) | 2023-09-11 | 2025-03-13 | Kla Corporation | Growth of strontium tetraborate crystals |
| CN121566259B (zh) * | 2026-01-21 | 2026-03-31 | 山东大学 | 一种连续波深紫外激光器及方法 |
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| CN202167755U (zh) * | 2011-06-27 | 2012-03-14 | 中国电子科技集团公司第三十四研究所 | 腔外谐振紫外激光产生装置 |
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| JP3564705B2 (ja) | 1992-03-02 | 2004-09-15 | ソニー株式会社 | レーザ光発生装置 |
| JPH07254744A (ja) | 1994-03-15 | 1995-10-03 | Sony Corp | レーザ光発生装置 |
| US6271916B1 (en) | 1994-03-24 | 2001-08-07 | Kla-Tencor Corporation | Process and assembly for non-destructive surface inspections |
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2016
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| EP3008779A1 (en) | 2016-04-20 |
| CN105379032B (zh) | 2022-03-15 |
| JP6382417B2 (ja) | 2018-08-29 |
| KR102117566B1 (ko) | 2020-06-01 |
| KR20160018768A (ko) | 2016-02-17 |
| EP3008779B1 (en) | 2019-12-18 |
| JP2017219870A (ja) | 2017-12-14 |
| US9509112B2 (en) | 2016-11-29 |
| JP2016526699A (ja) | 2016-09-05 |
| JP6211180B2 (ja) | 2017-10-11 |
| US20140362880A1 (en) | 2014-12-11 |
| KR20200062371A (ko) | 2020-06-03 |
| US10044166B2 (en) | 2018-08-07 |
| WO2014201152A1 (en) | 2014-12-18 |
| TW201504739A (zh) | 2015-02-01 |
| EP3008779A4 (en) | 2017-01-18 |
| CN114389139A (zh) | 2022-04-22 |
| IL264501A (en) | 2019-02-28 |
| US20170070025A1 (en) | 2017-03-09 |
| KR102257267B1 (ko) | 2021-05-26 |
| CN105379032A (zh) | 2016-03-02 |
| IL264501B (en) | 2021-08-31 |
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