TWI612851B - 用於極紫外線光源的系統、將自極紫外光系統產生之照射放大光束相對於標靶材料對準的方法及極紫外光系統 - Google Patents

用於極紫外線光源的系統、將自極紫外光系統產生之照射放大光束相對於標靶材料對準的方法及極紫外光系統 Download PDF

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Publication number
TWI612851B
TWI612851B TW103109580A TW103109580A TWI612851B TW I612851 B TWI612851 B TW I612851B TW 103109580 A TW103109580 A TW 103109580A TW 103109580 A TW103109580 A TW 103109580A TW I612851 B TWI612851 B TW I612851B
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Taiwan
Prior art keywords
amplified
illumination
target material
location
sensor
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TW103109580A
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English (en)
Chinese (zh)
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TW201444418A (zh
Inventor
弗拉迪米爾Ｂ 弗魯羅夫
伊格爾Ｖ 佛蒙柯維
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Ａｓｍｌ荷蘭公司
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Publication date
Priority claimed from US14/035,847 external-priority patent/US8872144B1/en
Priority claimed from US14/184,777 external-priority patent/US9000405B2/en
Application filed by Ａｓｍｌ荷蘭公司 filed Critical Ａｓｍｌ荷蘭公司
Publication of TW201444418A publication Critical patent/TW201444418A/zh
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Publication of TWI612851B publication Critical patent/TWI612851B/zh

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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
    • H05G2/0082—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam
    • H05G2/0086—Optical arrangements for conveying the laser beam to the plasma generation location

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW103109580A 2013-03-15 2014-03-14 用於極紫外線光源的系統、將自極紫外光系統產生之照射放大光束相對於標靶材料對準的方法及極紫外光系統 TWI612851B (zh)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US201361787228P 2013-03-15 2013-03-15
US61/787,228 2013-03-15
US14/035,847 2013-09-24
US14/035,847 US8872144B1 (en) 2013-09-24 2013-09-24 System and method for laser beam focus control for extreme ultraviolet laser produced plasma source
US14/184,777 2014-02-20
US14/184,777 US9000405B2 (en) 2013-03-15 2014-02-20 Beam position control for an extreme ultraviolet light source

Publications (2)

Publication Number Publication Date
TW201444418A TW201444418A (zh) 2014-11-16
TWI612851B true TWI612851B (zh) 2018-01-21

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
TW103109580A TWI612851B (zh) 2013-03-15 2014-03-14 用於極紫外線光源的系統、將自極紫外光系統產生之照射放大光束相對於標靶材料對準的方法及極紫外光系統

Country Status (4)

Country Link
JP (1) JP6374481B2 (enExample)
KR (1) KR102214861B1 (enExample)
TW (1) TWI612851B (enExample)
WO (1) WO2014149435A1 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI739755B (zh) * 2015-08-12 2021-09-21 荷蘭商Ａｓｍｌ荷蘭公司 極紫外線光源中之目標擴張率控制
US9820368B2 (en) 2015-08-12 2017-11-14 Asml Netherlands B.V. Target expansion rate control in an extreme ultraviolet light source
US10663866B2 (en) * 2016-09-20 2020-05-26 Asml Netherlands B.V. Wavelength-based optical filtering
US10935720B2 (en) * 2019-04-29 2021-03-02 Ii-Vi Delaware, Inc. Laser beam product parameter adjustments
JP2023506415A (ja) * 2019-12-20 2023-02-16 エーエスエムエル ネザーランズ ビー．ブイ． 極端紫外線光源の較正システム
WO2021239357A1 (en) * 2020-05-28 2021-12-02 Asml Netherlands B.V. Alignment of extreme ultraviolet light source
TWI867150B (zh) 2020-06-09 2024-12-21 南韓商三星電子股份有限公司 半導體製造裝置以及其操作方法
JP7673097B2 (ja) * 2020-07-30 2025-05-08 エーエスエムエル ネザーランズ ビー．ブイ． Ｅｕｖ光源のターゲット計測

Citations (4)

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Publication number Priority date Publication date Assignee Title
US20110141865A1 (en) * 2009-12-15 2011-06-16 Cymer Inc. Metrology for Extreme Ultraviolet Light Source
US20120019826A1 (en) * 2010-07-22 2012-01-26 Cymer, Inc. Alignment of light source focus
US8173985B2 (en) * 2009-12-15 2012-05-08 Cymer, Inc. Beam transport system for extreme ultraviolet light source
US20130020511A1 (en) * 2010-10-08 2013-01-24 Gigaphoton Inc Mirror, mirror device, laser apparatus, and extreme ultraviolet light generation apparatus

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Publication number Priority date Publication date Assignee Title
JP3256984B2 (ja) * 1991-06-13 2002-02-18 ソニー・プレシジョン・テクノロジー株式会社 変位検出装置
US7598509B2 (en) * 2004-11-01 2009-10-06 Cymer, Inc. Laser produced plasma EUV light source
US7087914B2 (en) * 2004-03-17 2006-08-08 Cymer, Inc High repetition rate laser produced plasma EUV light source
JP5368261B2 (ja) * 2008-11-06 2013-12-18 ギガフォトン株式会社 極端紫外光源装置、極端紫外光源装置の制御方法
US8283643B2 (en) * 2008-11-24 2012-10-09 Cymer, Inc. Systems and methods for drive laser beam delivery in an EUV light source

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110141865A1 (en) * 2009-12-15 2011-06-16 Cymer Inc. Metrology for Extreme Ultraviolet Light Source
US8173985B2 (en) * 2009-12-15 2012-05-08 Cymer, Inc. Beam transport system for extreme ultraviolet light source
US20120019826A1 (en) * 2010-07-22 2012-01-26 Cymer, Inc. Alignment of light source focus
US20130020511A1 (en) * 2010-10-08 2013-01-24 Gigaphoton Inc Mirror, mirror device, laser apparatus, and extreme ultraviolet light generation apparatus

Also Published As

Publication number Publication date
TW201444418A (zh) 2014-11-16
JP6374481B2 (ja) 2018-08-15
KR102214861B1 (ko) 2021-02-10
KR20150130440A (ko) 2015-11-23
JP2016512383A (ja) 2016-04-25
WO2014149435A1 (en) 2014-09-25

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