JP6374481B2 - 極端紫外線光源のビーム位置制御を行うシステム又は方法 - Google Patents

極端紫外線光源のビーム位置制御を行うシステム又は方法 Download PDF

Info

Publication number
JP6374481B2
JP6374481B2 JP2016500393A JP2016500393A JP6374481B2 JP 6374481 B2 JP6374481 B2 JP 6374481B2 JP 2016500393 A JP2016500393 A JP 2016500393A JP 2016500393 A JP2016500393 A JP 2016500393A JP 6374481 B2 JP6374481 B2 JP 6374481B2
Authority
JP
Japan
Prior art keywords
light beam
amplified light
sensor
target material
location
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2016500393A
Other languages
English (en)
Japanese (ja)
Other versions
JP2016512383A5 (enExample
JP2016512383A (ja
Inventor
ボリソヴィチ フルーロフ，ウラジミール
ボリソヴィチ フルーロフ，ウラジミール
ウラジーミロヴィチ フォメンコフ，イゴール
ウラジーミロヴィチ フォメンコフ，イゴール
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US14/035,847 external-priority patent/US8872144B1/en
Priority claimed from US14/184,777 external-priority patent/US9000405B2/en
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Publication of JP2016512383A publication Critical patent/JP2016512383A/ja
Publication of JP2016512383A5 publication Critical patent/JP2016512383A5/ja
Application granted granted Critical
Publication of JP6374481B2 publication Critical patent/JP6374481B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
    • H05G2/0082—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam
    • H05G2/0086—Optical arrangements for conveying the laser beam to the plasma generation location

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2016500393A 2013-03-15 2014-02-25 極端紫外線光源のビーム位置制御を行うシステム又は方法 Active JP6374481B2 (ja)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US201361787228P 2013-03-15 2013-03-15
US61/787,228 2013-03-15
US14/035,847 2013-09-24
US14/035,847 US8872144B1 (en) 2013-09-24 2013-09-24 System and method for laser beam focus control for extreme ultraviolet laser produced plasma source
US14/184,777 2014-02-20
US14/184,777 US9000405B2 (en) 2013-03-15 2014-02-20 Beam position control for an extreme ultraviolet light source
PCT/US2014/018419 WO2014149435A1 (en) 2013-03-15 2014-02-25 Beam position control for an extreme ultraviolet light source

Publications (3)

Publication Number Publication Date
JP2016512383A JP2016512383A (ja) 2016-04-25
JP2016512383A5 JP2016512383A5 (enExample) 2017-03-09
JP6374481B2 true JP6374481B2 (ja) 2018-08-15

Family

ID=51580614

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016500393A Active JP6374481B2 (ja) 2013-03-15 2014-02-25 極端紫外線光源のビーム位置制御を行うシステム又は方法

Country Status (4)

Country Link
JP (1) JP6374481B2 (enExample)
KR (1) KR102214861B1 (enExample)
TW (1) TWI612851B (enExample)
WO (1) WO2014149435A1 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI739755B (zh) * 2015-08-12 2021-09-21 荷蘭商Ａｓｍｌ荷蘭公司 極紫外線光源中之目標擴張率控制
US9820368B2 (en) 2015-08-12 2017-11-14 Asml Netherlands B.V. Target expansion rate control in an extreme ultraviolet light source
US10663866B2 (en) * 2016-09-20 2020-05-26 Asml Netherlands B.V. Wavelength-based optical filtering
US10935720B2 (en) * 2019-04-29 2021-03-02 Ii-Vi Delaware, Inc. Laser beam product parameter adjustments
JP2023506415A (ja) * 2019-12-20 2023-02-16 エーエスエムエル ネザーランズ ビー．ブイ． 極端紫外線光源の較正システム
WO2021239357A1 (en) * 2020-05-28 2021-12-02 Asml Netherlands B.V. Alignment of extreme ultraviolet light source
TWI867150B (zh) 2020-06-09 2024-12-21 南韓商三星電子股份有限公司 半導體製造裝置以及其操作方法
JP7673097B2 (ja) * 2020-07-30 2025-05-08 エーエスエムエル ネザーランズ ビー．ブイ． Ｅｕｖ光源のターゲット計測

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3256984B2 (ja) * 1991-06-13 2002-02-18 ソニー・プレシジョン・テクノロジー株式会社 変位検出装置
US7598509B2 (en) * 2004-11-01 2009-10-06 Cymer, Inc. Laser produced plasma EUV light source
US7087914B2 (en) * 2004-03-17 2006-08-08 Cymer, Inc High repetition rate laser produced plasma EUV light source
JP5368261B2 (ja) * 2008-11-06 2013-12-18 ギガフォトン株式会社 極端紫外光源装置、極端紫外光源装置の制御方法
US8283643B2 (en) * 2008-11-24 2012-10-09 Cymer, Inc. Systems and methods for drive laser beam delivery in an EUV light source
US8000212B2 (en) * 2009-12-15 2011-08-16 Cymer, Inc. Metrology for extreme ultraviolet light source
US8173985B2 (en) * 2009-12-15 2012-05-08 Cymer, Inc. Beam transport system for extreme ultraviolet light source
US8648999B2 (en) * 2010-07-22 2014-02-11 Cymer, Llc Alignment of light source focus
JP5946612B2 (ja) * 2010-10-08 2016-07-06 ギガフォトン株式会社 ミラー、ミラー装置、レーザ装置および極端紫外光生成装置

Also Published As

Publication number Publication date
TW201444418A (zh) 2014-11-16
KR102214861B1 (ko) 2021-02-10
KR20150130440A (ko) 2015-11-23
TWI612851B (zh) 2018-01-21
JP2016512383A (ja) 2016-04-25
WO2014149435A1 (en) 2014-09-25

Similar Documents

Publication Publication Date Title
US9167679B2 (en) Beam position control for an extreme ultraviolet light source
JP6374481B2 (ja) 極端紫外線光源のビーム位置制御を行うシステム又は方法
US12245350B2 (en) Optical isolation module
JP5952274B2 (ja) 光源焦点のアラインメント
US9497840B2 (en) System and method for creating and utilizing dual laser curtains from a single laser in an LPP EUV light source
CN110431391B (zh) 针对极紫外光源的量测系统
JP6250067B2 (ja) 極端紫外線光源内の光学素子に対する増幅光ビームの位置調整方法
US9241395B2 (en) System and method for controlling droplet timing in an LPP EUV light source
TW202032278A (zh) 監控光發射
CN115669232A (zh) 极紫外光源的对准
WO2017059314A1 (en) Optical isolation module

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20170131

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20170131

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20170828

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20170831

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20171117

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20180226

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20180515

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20180625

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20180719

R150 Certificate of patent or registration of utility model

Ref document number: 6374481

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250