TWI599665B - LED lead frame with copper alloy strip - Google Patents

LED lead frame with copper alloy strip Download PDF

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TWI599665B
TWI599665B TW105105128A TW105105128A TWI599665B TW I599665 B TWI599665 B TW I599665B TW 105105128 A TW105105128 A TW 105105128A TW 105105128 A TW105105128 A TW 105105128A TW I599665 B TWI599665 B TW I599665B
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copper alloy
roughness
alloy strip
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lead frame
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TW201638347A (en
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西村昌泰
真砂靖
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神戶製鋼所股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C9/00Alloys based on copper
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/62Arrangements for conducting electric current to or from the semiconductor body, e.g. lead-frames, wire-bonds or solder balls

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  • Microelectronics & Electronic Packaging (AREA)
  • Chemical & Material Sciences (AREA)
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  • Organic Chemistry (AREA)
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Description

LED的引線框用銅合金板條 Copper lead strip for LED lead frame

本發明係關於例如:作為LED的引線框使用的銅合金板條(板和條)以及具有鍍Ag覆膜的銅合金板條。 The present invention relates to, for example, copper alloy slats (plates and strips) used as lead frames for LEDs and copper alloy slats having Ag-coated films.

近年來,以發光二極體(LED:Light Emitting Diode)作為光源的發光裝置,由於節能且長壽命,所以已經普及在廣泛的領域中。LED元件被固定在導熱性和導電性優異的銅合金引線框上,組裝在封裝體中。為了高效率地取出從LED元件發出的光,在銅合金引線框的表面形成有鍍Ag覆膜來作為反射膜。由於LED封裝體被作為照明及個人電腦和行動電話等的背光使用,所以需要照明和畫面更為明亮,LED封裝體的高亮度化的需求也愈發提昇。 In recent years, a light-emitting device using a light-emitting diode (LED) as a light source has been widely used in a wide range of fields due to energy saving and long life. The LED element is fixed to a copper alloy lead frame excellent in thermal conductivity and electrical conductivity, and assembled in a package. In order to efficiently extract light emitted from the LED element, an Ag plating film is formed on the surface of the copper alloy lead frame as a reflection film. Since the LED package is used as a backlight for illumination and personal computers and mobile phones, illumination and a brighter picture are required, and the demand for higher brightness of the LED package is also increasing.

為了使LED封裝體高亮度化,係有:使LED元件本身高亮度化的方法和使鍍Ag覆膜高品質化(高反射率化)的方法。但是,LED元件的高亮度化已經接近極限,只是稍微使之更高亮度化就會導致元件成本大幅上升。因此近年來,對鍍Ag覆膜的高反射率化的要求也更強烈。 作為實施鍍Ag處理的引線框用銅合金,一直以來,使用的是算術平均粗糙度Ra為0.08μm左右的研磨拋光品,和算術平均粗糙度Ra為0.06μm左右的精製輥軋品。但是,鍍Ag處理後的反射率至多不過為91%左右,仍然被要求需要有更高的反射率。 In order to increase the brightness of the LED package, there is a method of increasing the luminance of the LED element itself and a method of improving the quality of the Ag plating film (high reflectance). However, the high luminance of LED elements is approaching the limit, but a slight increase in brightness will result in a significant increase in component cost. Therefore, in recent years, the demand for high reflectance of the Ag plating film is also stronger. As a copper alloy for a lead frame which is subjected to an Ag plating treatment, a polishing and polishing product having an arithmetic mean roughness Ra of about 0.08 μm and a purified rolled product having an arithmetic mean roughness Ra of about 0.06 μm have been conventionally used. However, the reflectance after the Ag plating treatment is at most about 91%, and it is still required to have a higher reflectance.

另一方面,主要作為照明用的高亮度LED,其散發的熱量係意想不到地大,該散發熱量會使LED元件本身和周圍的樹脂劣化,為了不要損及LED之長壽命的特點,因此要特別重視LED元件的散熱對策。作為LED的引線框用銅合金,大多使用的是強度:450MPa,導電率:70%IACS左右的C194(請參考專利文獻1、2)。 On the other hand, the high-intensity LED, which is mainly used for illumination, is unexpectedly large in heat, which dissipates the LED element itself and the surrounding resin, so that it does not damage the long life of the LED. Special attention is paid to the heat dissipation measures of LED components. As a copper alloy for a lead frame of an LED, C194 having a strength of 450 MPa and a conductivity of about 70% IACS is often used (refer to Patent Documents 1 and 2).

〔先前技術文獻〕 [Previous Technical Literature]

專利文獻 Patent literature

專利文獻1:日本特開2011-252215號公報 Patent Document 1: Japanese Laid-Open Patent Publication No. 2011-252215

專利文獻2:日本特開2012-89638號公報(段落0058) Patent Document 2: Japanese Laid-Open Patent Publication No. 2012-89638 (paragraph 0058)

本發明之目的係在於:在大多被當作LED的引線框用銅合金來使用的C194的板條中,使形成於表面的鍍Ag反射膜的反射率提高,以實現LED封裝體的高亮度化。 An object of the present invention is to improve the reflectance of an Ag-plated reflective film formed on a surface of a C194 slat which is mostly used as a copper alloy for a lead frame of an LED to achieve high brightness of the LED package. Chemical.

為了使鍍Ag反射膜的反射率提高,考慮到減小引線框素材也就是銅合金板條的表面粗糙度,但只是這樣做的話,還是無法提高鍍Ag反射膜的反射率。根據本發明人等的創見,在銅合金板條的表面,冷軋的過程中會形成油坑和條狀紋路之類的細微缺陷,或者由於研磨拋光加工而形成加工變質層,這些都會對鍍Ag反射膜的表面粗糙度、晶粒直徑等造成影響,而妨礙了鍍Ag反射膜的反射率的提高。本發明係基於這種創見而開發完成的。 In order to improve the reflectance of the Ag-plated reflective film, it is considered to reduce the surface roughness of the lead frame material, that is, the copper alloy strip, but only by doing so, the reflectance of the Ag-plated reflective film cannot be improved. According to the inventors' inventors, fine defects such as oil pits and strip-like lines are formed on the surface of the copper alloy strip during cold rolling, or a work-affected layer is formed by grinding and polishing, which is to be plated. The surface roughness, crystal grain diameter, and the like of the Ag reflective film affect the reflectance of the Ag-plated reflective film. The present invention has been developed based on this novelty.

本發明的LED的引線框用銅合金板條(板和條),是含有Fe:1.8~2.6質量%、P:0.005~0.20質量%、Zn:0.01~0.50質量%,其餘部分由Cu和不可避免的雜質構成的Cu-Fe系銅合金板條,因應需要含有合計0.02~0.3質量%的Sn、Co、Al、Cr、Mg、Mn、Ca、Pb、Ni、Ti、Zr中的一種或兩種以上。該銅合金板條,輥軋垂直方向的表面粗糙度為,算術平均粗糙度Ra低於0.06μm,十點平均粗糙度RzJIS低於0.5μm,由原子力顯微鏡(AFM:Atomic Force Microscope)在輥軋垂直方向上測量而取得的粗糙度曲線(AFM輪廓)中的長度50μm的範圍的波谷部面積為1.3μm2以下,表面之由細微晶粒構成的加工變質層的厚度為0.5μm以下。 The copper alloy strip (plate and strip) for the lead frame of the LED of the present invention contains Fe: 1.8 to 2.6% by mass, P: 0.005 to 0.20% by mass, Zn: 0.01 to 0.50% by mass, and the rest is Cu and not Cu-Fe-based copper alloy slab composed of impurities to be avoided, if necessary, contains 0.02 to 0.3% by mass of one or two of Sn, Co, Al, Cr, Mg, Mn, Ca, Pb, Ni, Ti, and Zr. More than one species. The copper alloy strip has a surface roughness in the vertical direction of the rolling, an arithmetic average roughness Ra of less than 0.06 μm, a ten-point average roughness R zJIS of less than 0.5 μm, and an atomic force microscope (AFM: Atomic Force Microscope) on the roll. The area of the trough portion in the range of 50 μm in the roughness curve (AFM profile) obtained by rolling in the vertical direction is 1.3 μm 2 or less, and the thickness of the work-affected layer composed of fine crystal grains on the surface is 0.5 μm or less.

本發明的銅合金板條,能夠使形成於表面的鍍Ag反射膜的表面粗糙度為,十點平均粗糙度RzJIS:0.3μm以 下,其結果是,可使鍍Ag反射膜的反射率提高到92%以上,能夠實現LED封裝體的高亮度化。 In the copper alloy strip of the present invention, the surface roughness of the Ag-plated reflective film formed on the surface can be ten points average roughness R zJIS : 0.3 μm or less, and as a result, the reflectance of the Ag-plated reflective film can be improved. When it is 92% or more, the brightness of the LED package can be increased.

第1圖是顯示的試驗No.1的銅合金板條的表面狀態的AFM輪廓(AFM profile)。 Fig. 1 is an AFM profile (AFM profile) showing the surface state of the copper alloy strip of Test No. 1.

第2圖是顯示實施例的試驗No.15的銅合金板條的表面狀態的AFM輪廓。 Fig. 2 is an AFM profile showing the surface state of the copper alloy strip of Test No. 15 of the Example.

接下來,對於本發明更具體地加以說明。 Next, the present invention will be more specifically described.

(銅合金的化學組成) (Chemical composition of copper alloy)

本發明的銅合金,含有Fe:1.8~2.6質量%、P:0.005~0.20質量%、Zn:0.01~0.50質量%,其餘部分由Cu和不可避免的雜質構成,因應需要含有合計0.02~0.3質量%以下的Sn、Co、Al、Cr、Mg、Mn、Ca、Pb、Ni、Ti、Zr的一種或兩種以上。 The copper alloy of the present invention contains Fe: 1.8 to 2.6% by mass, P: 0.005 to 0.20% by mass, and Zn: 0.01 to 0.50% by mass, and the balance is composed of Cu and unavoidable impurities, and contains 0.02 to 0.3 mass in total as needed. One or two or more of Sn, Co, Al, Cr, Mg, Mn, Ca, Pb, Ni, Ti, and Zr.

在上述銅合金中,Fe與P形成化合物,具有提高強度和導電率特性的作用。但是,若Fe的含量高於2.6質量%,則熔化時沒有完全固溶的Fe作為析出物殘存下來,該析出物之較大的粒徑也達數十μm以上,其在銅合金板條的表面露出,成為鍍Ag膜發生缺陷的原因。另外,Fe的含量低於1.8質量%的話,無法獲得作為LED用 引線框所需的強度。另一方面,若P的含量高於0.2質量%的話,則會使LED用引線框的導熱性和導電性劣化,若低於0.005質量%的話,則無法獲得作為LED用框架所需的強度。因此,Fe的含量設定為1.8~2.6質量%,P的含量設定為0.005~0.20質量%。 In the above copper alloy, Fe forms a compound with P, and has an effect of improving strength and electrical conductivity characteristics. However, when the content of Fe is more than 2.6% by mass, Fe which is not completely dissolved at the time of melting remains as a precipitate, and the larger particle diameter of the precipitate is also several tens of μm or more, which is in the copper alloy strip. The surface is exposed, which causes a defect in the Ag plating film. In addition, when the content of Fe is less than 1.8% by mass, it cannot be obtained as an LED. The required strength of the lead frame. On the other hand, when the content of P is more than 0.2% by mass, the thermal conductivity and electrical conductivity of the lead frame for LEDs are deteriorated. When the content is less than 0.005% by mass, the strength required for the frame for LEDs cannot be obtained. Therefore, the content of Fe is set to 1.8 to 2.6% by mass, and the content of P is set to be 0.005 to 0.20% by mass.

Zn具有可提高焊料的耐熱剝離性的作用,具有將LED封裝體組裝到底座上時能夠維持焊料接合可靠性的功能。但是,Zn的含量低於0.01質量%的話,不足以符合焊料的耐熱剝離性的需求,若高於0.50質量%的話,則會使銅合金的導電率和導熱率劣化。 Zn has an effect of improving the heat-resistant peeling property of the solder, and has a function of maintaining solder joint reliability when the LED package is assembled to the chassis. However, when the content of Zn is less than 0.01% by mass, it is not sufficient to meet the heat-resistant peeling resistance of the solder, and if it is more than 0.50% by mass, the electrical conductivity and thermal conductivity of the copper alloy are deteriorated.

作為副成分,因應需要而添加的Sn、Co、Al、Cr、Mg、Mn、Ca、Pb、Ni、Ti、Zr,也可提高銅合金的強度、耐熱性,此外也有提高製造時的熱軋性的作用。為了將這些元素添加到銅合金中而獲得前述的作用,係以含有0.02質量%以上為宜。但是,若這些成分合計含有高於0.3質量%的話,將會使導熱性和導電率劣化。因此,在添加這些副成分時,將其含量設定為合計是0.02~0.3質量%。 As an accessory component, Sn, Co, Al, Cr, Mg, Mn, Ca, Pb, Ni, Ti, and Zr added as needed may also improve the strength and heat resistance of the copper alloy, and may also improve hot rolling during production. The role of sex. In order to obtain the aforementioned effects by adding these elements to the copper alloy, it is preferred to contain 0.02% by mass or more. However, if these components are contained in a total amount of more than 0.3% by mass, the thermal conductivity and the electrical conductivity are deteriorated. Therefore, when these subcomponents are added, the content thereof is set to be 0.02 to 0.3% by mass in total.

(銅合金板條的表面性狀) (surface properties of copper alloy strips)

作為被鍍覆素材也就是銅合金板狀的表面性狀,具體來說,就是表面粗糙度與粗糙度曲線中的波谷部面積,和形成於表面的加工變質層的厚度,都會影響到鍍Ag反射膜的反射特性。 As the material to be plated, that is, the surface property of the copper alloy plate, specifically, the area of the valley in the surface roughness and roughness curve, and the thickness of the work-affected layer formed on the surface, all affect the Ag-plated reflection. The reflective properties of the film.

銅合金板條的表面粗糙度係設定為:在表面粗糙度達到最大的方向(通常是輥軋垂直方向)的算術平均粗糙度Ra:低於0.06μm,十點平均粗糙度RzJIS:低於0.5μm。算術平均粗糙度Ra和十點平均粗糙度RzJIS,係根據日本工業規格JIS B0601:2001所規定的方法測得的。若算術平均粗糙度Ra為0.06μm以上,或十點平均粗糙度RzJIS高於0.5μm的話,則鍍Ag反射膜的表面粗糙度增大,無法使得鍍Ag反射膜的反射率達到92%以上。算術平均粗糙度Ra和十點平均粗糙度RzJIS,係根據由原子力顯微鏡(AFM)在輥軋垂直方向上測量所得到的粗糙度曲線(AFM輪廓)而求得的。 The surface roughness of the copper alloy strip is set to: the arithmetic mean roughness Ra in the direction in which the surface roughness is maximized (usually the vertical direction of the rolling): less than 0.06 μm, ten-point average roughness R zJIS : lower than 0.5 μm. The arithmetic mean roughness Ra and the ten point average roughness R zJIS were measured according to the method specified in Japanese Industrial Standard JIS B0601:2001. When the arithmetic mean roughness Ra is 0.06 μm or more, or the ten-point average roughness R zJIS is higher than 0.5 μm, the surface roughness of the Ag-plated reflective film is increased, and the reflectance of the Ag-plated reflective film cannot be made 92% or more. . The arithmetic mean roughness Ra and the ten point average roughness R zJIS were obtained from the roughness curve (AFM profile) obtained by atomic force microscopy (AFM) measurement in the vertical direction of the rolling.

粗糙度曲線中的波谷部面積,更具體地說,是夾介在沿輥軋垂直方向測量而取得的AFM輪廓的X軸(平均線)與位於該X軸下側的曲線之間的部位的面積。根據本發明人等的創見,由AFM輪廓求得的前述波谷部面積、與形成於銅合金板的表面的鍍Ag的反射膜的反射率係具有相關性。在本發明中,AFM輪廓的長度50μm(X軸長度)的範圍的波谷部面積,係設定為1.3μm2以下。若波谷部面積高於1.3μm2,則鍍Ag的反射膜容易發生凹陷等,無法使得鍍Ag反射膜的反射率達到92%以上。其原因被推測是因為:若銅合金板條的表面的粗糙度曲線的波谷部面積變大的話,則鍍Ag的反射膜容易發生凹凸。AFM輪廓的長度50μm的範圍的波谷部面積為1.0μm2以下更好。另外,該波谷部面積,藉由採用後述的製造方 法,能夠減小至0.5μm2左右。還有,藉由使用原子力顯微鏡(AFM),與通常的觸針式粗糙度計進行的測量相較,係可測得更細微的表面形態。 The area of the trough portion in the roughness curve, more specifically, the area of the portion between the X-axis (average line) of the AFM profile obtained by measuring in the vertical direction of the roll and the curve located on the lower side of the X-axis. . According to the inventors of the present invention, the area of the trough portion obtained from the AFM profile has a correlation with the reflectance of the Ag-plated reflective film formed on the surface of the copper alloy sheet. In the present invention, the area of the trough portion in the range of 50 μm (X-axis length) of the AFM profile is set to 1.3 μm 2 or less. When the area of the trough portion is higher than 1.3 μm 2 , the Ag-plated reflective film is likely to be recessed or the like, and the reflectance of the Ag-plated reflective film cannot be made 92% or more. The reason for this is presumed to be that if the area of the valley portion of the roughness curve of the surface of the copper alloy strip is increased, the Ag-plated reflective film is likely to have irregularities. The length of the trough portion 50μm area range of the AFM profile of 1.0μm 2 or less is better. Further, the area of the trough portion can be reduced to about 0.5 μm 2 by using a production method to be described later. Also, by using an atomic force microscope (AFM), a finer surface morphology can be measured as compared with the measurement by a conventional stylus type roughness meter.

在經冷軋後的銅合金板條的表面,從表面起依序形成有:(1)非晶質的貝而必層(Beilby layer);(2)纖維暨細微化層(細微晶粒層);(3)彈性應變層。一般而言,這三層合在一起被稱為加工變質層。另一方面,在本發明中,特別是將前述(1)和(2)合稱為“由細微晶粒構成的加工變質層”。前述(1)和(2)的層、與前述(3)的層和母材,因為晶粒組織明顯不同,所以很容易識別。加工變質層對鍍Ag反射膜的性狀造成影響,若前述由細微晶粒構成的加工變質層(前述(1)和(2)的層)的合計厚度高於0.5μm的話,則鍍Ag反射膜的表面粗糙度將會增大,無法使得鍍Ag反射膜的反射率達到92%以上。因此,將由細微晶粒構成的加工變質層的厚度設定為0.5μm以下。該加工變質層的厚度為0.3μm以下更好。還有,在最終冷軋後又經過了研磨的銅合金板條中,由細微晶粒構成的加工變質層的厚度高於0.5μm的情況很多。 On the surface of the cold-rolled copper alloy strip, sequentially formed from the surface are: (1) amorphous Beilby layer; (2) fiber and fine layer (fine grain layer (3) elastic strain layer. In general, these three layers are collectively referred to as a processing metamorphic layer. On the other hand, in the present invention, in particular, the above (1) and (2) are collectively referred to as "a work-affected layer composed of fine crystal grains". The layers of the above (1) and (2), and the layer and the base material of the above (3) are easily recognized because the grain structure is significantly different. The affected layer affects the properties of the Ag-plated reflective film. If the total thickness of the processed metamorphic layer composed of the fine crystal grains (the layers of the above (1) and (2)) is higher than 0.5 μm, the Ag-reflected film is plated. The surface roughness will increase, and the reflectance of the Ag-plated reflective film cannot be made 92% or more. Therefore, the thickness of the work-affected layer composed of fine crystal grains is set to 0.5 μm or less. The thickness of the work-affected layer is preferably 0.3 μm or less. Further, in the copper alloy slab which has been subjected to grinding after the final cold rolling, the thickness of the work-affected layer composed of fine crystal grains is much higher than 0.5 μm.

(鍍Ag反射膜) (Ag plating film)

鍍Ag反射膜的表面形態,很大程度係受到作為素材的銅合金板條的表面性狀的影響。銅合金板條的表面性狀(表面粗糙度,粗糙度曲線中的波谷部面積,形成於表面 的加工變質層的厚度)落在上述的範圍內時,能夠使鍍Ag反射膜的表面粗糙度之十點平均粗糙度,落在RzJIS:0.3μm以下。鍍Ag反射膜的反射率,一般係被認為會受到鍍Ag反射膜的晶粒直徑和鍍膜定向性的影響。將鍍Ag反射膜的表面粗糙度設定為十點平均粗糙度RzJIS:0.3μm以下時,能夠使鍍Ag反射膜的晶粒直徑為13μm以上,且鍍膜定向性((001)定向)為0.4以上,可使鍍Ag反射膜的反射率提高到92%以上。另一方面,鍍Ag反射膜的十點平均粗糙度RzJIS高於0.3μm時,就無法使得鍍Ag反射膜的晶粒直徑為13μm以上,或使鍍膜定向性((001)定向)為0.4以上,無法使得鍍Ag反射膜的反射率提高到92%以上。 The surface morphology of the Ag-plated reflective film is largely affected by the surface properties of the copper alloy strip as a material. When the surface properties of the copper alloy strip (surface roughness, the area of the trough portion in the roughness curve, and the thickness of the work-affected layer formed on the surface) fall within the above range, the surface roughness of the Ag-plated reflective film can be made. Ten point average roughness, falling below R zJIS : 0.3 μm. The reflectance of the Ag-plated reflective film is generally considered to be affected by the grain diameter of the Ag-plated reflective film and the orientation of the coating. When the surface roughness of the Ag-plated reflective film is set to ten-point average roughness R zJIS : 0.3 μm or less, the crystal grain diameter of the Ag-plated reflective film can be 13 μm or more, and the coating orientation ((001) orientation) is 0.4. As described above, the reflectance of the Ag-plated reflective film can be increased to 92% or more. On the other hand, when the ten-point average roughness R zJIS of the Ag-plated reflective film is higher than 0.3 μm, the crystal grain diameter of the Ag-plated reflective film cannot be 13 μm or more, or the orientation of the coating film ((001) orientation) is 0.4. As described above, the reflectance of the Ag-plated reflective film cannot be increased to 92% or more.

(銅合金板條的製造方法) (Manufacturing method of copper alloy strip)

C194銅合金板條,通常是對於鑄塊進行表面車削後,實施熱軋,熱軋後進行急冷或進行固溶處理,接著進行冷軋和析出退火,然後再進行最終冷軋而製造的。冷軋和析出退火係因應需要而反覆進行,最終冷軋後,因應需要來進行低溫退火。在本發明的銅合金板條的情況下,並不需要大幅變更該製造工序本身。另一方面,粗大的Fe、Fe-P、Fe-P-O粒子,主要係在熔融鑄造時和熱軋時形成,成為銅合金板條製品的表面的粗糙度曲線中的波谷部面積增大的原因,因此需要選擇適當的熔融鑄造和熱軋的條件。具體來說,如下所述。 The C194 copper alloy strip is usually produced by subjecting the ingot to surface turning, hot rolling, hot rolling, quenching or solution treatment, followed by cold rolling and precipitation annealing, followed by final cold rolling. The cold rolling and precipitation annealing are repeated as needed, and after the final cold rolling, low temperature annealing is performed as needed. In the case of the copper alloy slab of the present invention, it is not necessary to significantly change the manufacturing process itself. On the other hand, coarse Fe, Fe-P, and Fe-PO particles are mainly formed during melt casting and hot rolling, and cause the increase in the area of the valley portion in the roughness curve of the surface of the copper alloy strip product. Therefore, it is necessary to select suitable conditions for melt casting and hot rolling. Specifically, it is as follows.

在熔融鑄造中,在1200℃以上的銅合金熔液中添加Fe進行熔化,以後仍將熔液溫度保持在1200℃以上來進行鑄造。為了使粗大Fe粒子和Fe系夾雜物粒子不進入鑄塊,有效的作法,是將所添加的Fe完全熔化,藉由控制熔化時的氣相氛圍來防止鐵的氧化,以及將鑄造時的熔液過濾。鑄塊的冷卻,在凝固時(固液共存時)和凝固後,都是以1℃/秒以上的冷卻速度來進行。為此,在進行連續鑄造或半連續鑄造時,需要使鑄模內的一次冷卻、鑄模正下方的二次冷卻充分發揮作用。熱軋中,均質化處理是在900℃以上,更好是在950℃以上的溫度進行,以該溫度開始熱軋,熱軋結束溫度設定為650℃以上,更好是700℃以上,熱軋結束後立即用大量的水進行急速冷卻至300℃以下。 In the melt casting, Fe is added to a molten copper alloy of 1200 ° C or higher to be melted, and thereafter, the temperature of the melt is maintained at 1200 ° C or higher to carry out casting. In order to prevent coarse Fe particles and Fe-based inclusion particles from entering the ingot, it is effective to completely melt the added Fe, prevent oxidation of iron by controlling the gas phase atmosphere during melting, and melt the casting. Liquid filtration. The cooling of the ingot is carried out at a cooling rate of 1 ° C /sec or more during solidification (when solid-liquid coexisting) and after solidification. For this reason, in the case of continuous casting or semi-continuous casting, it is necessary to sufficiently cool the primary cooling in the casting mold and the secondary cooling directly under the casting mold. In the hot rolling, the homogenization treatment is carried out at 900 ° C or higher, more preferably at a temperature of 950 ° C or higher, and hot rolling is started at this temperature, and the hot rolling end temperature is set to 650 ° C or higher, more preferably 700 ° C or higher, hot rolling. Immediately after the completion, the water was rapidly cooled to 300 ° C or less with a large amount of water.

析出退火後,為了除去形成在素材表面上的氧化物,一般是對於素材表面進行機械性研磨。這時候,條紋狀的凹凸(研磨痕)被導入素材表面,繼而再進行最終冷軋時,前述凹凸會被壓壞,在製品(銅合金板條)上容易殘留下前述的條狀紋路。由於該條狀紋路,將會導致無法符合銅合金板條的前述表面粗糙度和在表面的粗糙度曲線中的波谷部面積的規定,因此,最好是在析出退火後不進行機械性研磨為宜。在還原氣相氛圍中進行析出退火,以便在退火時,不會使素材表面發生氧化膜,從而能夠省略掉在析出退火後實施的機械性研磨。 After the precipitation annealing, in order to remove the oxide formed on the surface of the material, the surface of the material is generally mechanically polished. At this time, when the stripe-shaped unevenness (abrasive mark) is introduced into the surface of the material, and then the final cold rolling is performed, the unevenness is crushed, and the strip-like grain is likely to remain on the product (copper alloy strip). Due to the strip-like texture, the above-mentioned surface roughness of the copper alloy strip and the area of the trough portion in the roughness curve of the surface cannot be met. Therefore, it is preferable that the mechanical polishing is not performed after the precipitation annealing. should. Precipitation annealing is performed in a reducing gas phase atmosphere so that an oxide film is not formed on the surface of the material during annealing, and mechanical polishing performed after precipitation annealing can be omitted.

銅合金板條的表面粗糙度,是由於在最終冷軋中,將 軋輥的表面形狀轉印到素材表面而形成。因為本發明的銅合金板條的表面粗糙度(算術平均粗糙度Ra和十點平均粗糙度RzJIS)極小,因此最終冷軋的軋輥,需要對應作為目標的銅合金板條的表面粗糙度而進行鏡面拋光加工。作為該軋輥,係使用由超級鋼構成的高速鋼軋輥,或賽隆陶瓷(SIALON)等的氮化矽系的軋輥為宜。其中的賽隆陶瓷軋輥,其維氏硬度為1600左右,能夠將軋輥的表面形態穩定地轉印到素材表面。還有,最終冷軋前的銅合金板表面的表面粗糙度(算術平均粗糙度Ra)係以0.20μm以下為宜。 The surface roughness of the copper alloy strip is formed by transferring the surface shape of the roll to the surface of the material in the final cold rolling. Since the surface roughness (arithmetic mean roughness Ra and ten point average roughness R zJIS ) of the copper alloy strip of the present invention is extremely small, the final cold rolled roll needs to correspond to the surface roughness of the target copper alloy strip. Mirror polishing. As the roll, a high speed steel roll made of super steel or a tantalum nitride type roll such as SIALON is preferably used. Among them, the Sialon ceramic roll has a Vickers hardness of about 1600, and can stably transfer the surface morphology of the roll to the surface of the material. Further, the surface roughness (arithmetic mean roughness Ra) of the surface of the copper alloy sheet before the final cold rolling is preferably 0.20 μm or less.

作為最終冷軋的輥軋條件,需要適當地組合:潤滑油、軋輥的轉速、軋縮率、拉伸張力(軋輥出口側的張力),藉由依照下列的條件進行最終冷軋,能夠製造出具有合乎期望的表面性狀(表面粗糙度、粗糙度曲線中的波谷部面積、加工變質層)的銅合金板條。 As the rolling conditions for the final cold rolling, it is necessary to appropriately combine: the lubricating oil, the number of revolutions of the rolls, the rolling reduction ratio, and the tensile tension (tension at the outlet side of the roll), and can be produced by performing the final cold rolling in accordance with the following conditions. A copper alloy strip having a desired surface property (surface roughness, trough area in a roughness curve, and a work-affected layer).

作為最終冷軋的潤滑油,係使用對於波長550nm的入射光的透光度為90%以上的石蠟系的潤滑油,並且是以40℃左右的溫度進行輥軋為宜。還有,該透光度係指:假設二甲苯之對於波長550nm的入射光的透光度為100%時之上述潤滑油的相對性的透光度。藉由使用該潤滑油,能夠抑制前述油坑的生成。 As the lubricating oil to be finally cold-rolled, a paraffin-based lubricating oil having a light transmittance of 90% or more with respect to incident light having a wavelength of 550 nm is used, and it is preferable to carry out rolling at a temperature of about 40 °C. In addition, the transmittance refers to the relative transmittance of the lubricating oil when the transmittance of xylene to incident light having a wavelength of 550 nm is 100%. By using the lubricating oil, the formation of the oil sump can be suppressed.

最終冷軋中,使用軋輥直徑為20~100mm左右的軋輥,將軋輥的轉速設定為200~700mpm,將拉伸張力(出口側張力)設定為50~200N/mm2左右,進行單道次或多 道次的通板,而且合計加工率為20~70%的冷軋。最終冷軋若是進行多道次的通板的話,最好是將第2道次以後的軋輥的粗度,設定成較之第1道次的軋輥的粗度更細,將第2道次以後的輥軋速度,設定成較之第1道次的輥軋速度更慢。軋輥的轉速慢、拉伸張力小、軋縮率大的作法,比較能夠對於素材表面良好地進行軋輥的轉印,能夠在銅合金板條上確保既小又穩定的表面粗糙度,粗糙度曲線中的波谷部面積也減少。但是,軋縮率較大的話,則容易形成加工變質層。另一方面,軋輥的轉速快,拉伸張力大,軋縮率小的作法,則會顯示出相反的傾向。最終冷軋的加工率,係依據作為目標的機械性質來決定即可。 Final cold rolling, a roll diameter of about 20 ~ 100mm rolls, the rotational speed is set roll was 200 ~ 700mpm, the drawing tension (outlet-side tension) is set to 50 ~ 200N / mm is about 2, single pass or Multi-pass pass, and the total processing rate is 20~70% cold rolling. In the final cold rolling, if the pass is performed in multiple passes, it is preferable to set the thickness of the roll after the second pass to be smaller than the thickness of the roll of the first pass, and after the second pass. The rolling speed is set to be slower than the rolling speed of the first pass. The method has the advantages of slow rotation speed, small tensile tension and large rolling reduction, and it is possible to transfer the roll well to the surface of the material, and to ensure a small and stable surface roughness and roughness curve on the copper alloy strip. The area of the trough is also reduced. However, if the rolling reduction ratio is large, it is easy to form a work-affected layer. On the other hand, the rotation speed of the rolls is fast, the tensile tension is large, and the reduction ratio is small, which tends to be opposite. The processing rate of the final cold rolling is determined according to the mechanical properties as the target.

(LED用引線框的製造) (Manufacture of lead frame for LED)

LED用引線框,是在對於最終冷軋後的銅合金板條(製品板條)進行鍍Ag處理後,藉由沖孔加工形成引線框圖案來製造的。或者,是藉由對於最終冷軋後的銅合金板條(製品板條)進行沖孔加工或蝕刻加工而形成引線框圖案之後,再實施鍍Ag處理而製造的。 The lead frame for LEDs is produced by subjecting copper alloy strips (product strips) after final cold rolling to Ag plating, and then forming a lead frame pattern by punching. Alternatively, the lead frame pattern is formed by punching or etching the copper alloy strip (product strip) after the final cold rolling, and then an Ag plating treatment is performed.

〔實施例1〕 [Example 1]

使用小型電爐,在大氣中,在木炭的覆蓋下,將表1、2所示的組成分的銅合金(合金No.1~24)進行熔解,熔製成厚50mm、寬80mm、長180mm的鑄塊。對於所製作的上述鑄塊的表面、背面各進行5mm的表面車削 後,以950℃進行1小時的均質化處理,接著進行熱軋,作成厚12mmt的板材,從750℃以上的溫度起進行急速冷卻。對於該板材的表面、背面分別進行約1mm的表面車削。對於這些板材,反覆進行冷軋和500~550℃×2~5小時的析出退火後,使用進行了鏡面拋光加工後的直徑50mm的賽隆陶瓷軋輥,以40%的加工率進行最終冷軋,製作成厚度0.2mm的銅合金條。在最終冷軋中,使用前述潤滑油,軋輥的轉速和拉伸張力都落在前述範圍內。 Using a small electric furnace, the copper alloy (alloy No. 1 to 24) of the composition shown in Tables 1 and 2 was melted in the atmosphere under the cover of charcoal, and melted to a thickness of 50 mm, a width of 80 mm, and a length of 180 mm. Ingot. 5 mm surface turning for each of the surface and the back surface of the ingot to be produced Thereafter, the mixture was homogenized at 950 ° C for 1 hour, and then hot rolled to form a sheet having a thickness of 12 mm, and was rapidly cooled from a temperature of 750 ° C or higher. Surface turning of about 1 mm was performed on the front and back surfaces of the sheet. These sheets were repeatedly cold rolled and subjected to precipitation annealing at 500 to 550 ° C for 2 to 5 hours, and then a 50 mm diameter Sialon ceramic roll after mirror polishing was used to carry out final cold rolling at a processing rate of 40%. A copper alloy strip having a thickness of 0.2 mm was produced. In the final cold rolling, the aforementioned lubricating oil is used, and the rotational speed and tensile tension of the rolls fall within the aforementioned ranges.

從製作成的各合金板採取出試驗材,依照下述要領進行抗拉強度、導電率、和焊料耐熱剝離性的各種測定試驗。將測定結果顯示在表1、2中。 Test materials were taken from each of the produced alloy sheets, and various measurement tests of tensile strength, electrical conductivity, and solder heat-resistant peelability were carried out in accordance with the following procedures. The measurement results are shown in Tables 1 and 2.

(抗拉強度的測定) (Measurement of tensile strength)

從供試材採取出縱長方向與輥軋方向平行的日本工業規格JIS 5號試驗片,依據日本工業規格JIS Z2241的規定進行拉伸試驗,測定其抗拉強度。抗拉強度在400MPa以上者為合格。 A Japanese Industrial Standard JIS No. 5 test piece having a longitudinal direction parallel to the rolling direction was taken from the test piece, and a tensile test was carried out in accordance with the specifications of Japanese Industrial Standard JIS Z2241, and the tensile strength was measured. Those with tensile strength above 400 MPa are acceptable.

(導電率的測定) (Measurement of conductivity)

導電率,係依據日本工業規格JIS H0505的規定來進行測定。導電率在65%IACS以上者為合格。 The electrical conductivity was measured in accordance with the regulations of Japanese Industrial Standard JIS H0505. Conductivity above 65% IACS is acceptable.

(焊料耐熱剝離性的測定) (Measurement of solder heat-resistant peelability)

錫焊的作法,是將市售的Sn-3質量%Ag-0.5質量%Cu焊料,保持在260℃下使該焊料保持熔融狀態,再將表面潔淨化後的10mm寬×35mm長的各個試驗片,以浸泡速度25mm/秒、浸泡深度12mm、浸泡時間5秒的條件,浸泡於熔融焊料中。作為錫焊裝置,係使用錫焊機(Solder checker)(SAT5100型)。助焊劑係使用活性助焊劑。對於進行了錫焊後的試驗片,以175℃在大氣中進行了72小時的加熱試驗。此外,對於這些加熱試驗片,在常溫下進行折彎和反向折回試驗。在反向折回部,貼上市售的黏 膠帶之後,再一口氣從試驗片上剝離膠帶。目視觀察剝離後的膠帶,未確認到有焊料剝離的,就予以評價為合格(○),確認到有焊料剝離的,就評價為不合格(×)。 The soldering method is a test in which a commercially available Sn-3 mass% Ag-0.5 mass% Cu solder is kept at 260 ° C to keep the solder in a molten state, and then the surface is cleaned to a length of 10 mm × 35 mm. The sheet was immersed in molten solder under the conditions of a soaking speed of 25 mm/sec, a soaking depth of 12 mm, and a soaking time of 5 seconds. As the soldering device, a solderer (type SAT5100) was used. Flux uses an active flux. The test piece after the soldering was subjected to a heating test at 175 ° C for 72 hours in the air. Further, for these heated test pieces, the bending and reverse folding test were performed at normal temperature. In the reverse foldback section, the sticker sold on the market After the tape, the tape was peeled off from the test piece. The tape after the peeling was visually observed, and if it was not confirmed that the solder was peeled off, it was evaluated as pass (○), and when it was confirmed that the solder was peeled off, it was evaluated as unacceptable (×).

如表1所示,合金No.1~13的合金組成分係符合本發明的規定,抗拉強度大,導電率高,焊料耐熱剝離性優異,適合作為LED的引線框用的銅合金來使用。 As shown in Table 1, the alloy composition of Alloy Nos. 1 to 13 conforms to the regulations of the present invention, and has high tensile strength, high electrical conductivity, and excellent heat resistance and peelability of the solder, and is suitable for use as a copper alloy for lead frames of LEDs. .

另一方面,如表2所示,Fe、P、Zn或副成分中的任一種成分的含量脫離本發明的規定的合金No.14~24,抗拉強度、導電率和焊料耐熱剝離性的其中一種或兩種以上的特性較差。合金No.14、20的Fe含量,合金No.16的P含量,合金No.18的Zn含量,合金No.22~24的副成分的合計含量分別都過剩,導電率都很低。合金No.15的Fe含量,No.21的Fe和P含量分別都很少,抗拉強度都不足。No.17的P含量少,導電率差。合金No.19的Zn含量少,焊料耐熱剝離性較差。 On the other hand, as shown in Table 2, the content of any one of Fe, P, Zn or a subcomponent is deviated from the alloy Nos. 14 to 24 specified in the present invention, and the tensile strength, electrical conductivity, and solder heat-resistant peelability are One or more of the characteristics are poor. The Fe content of Alloy Nos. 14 and 20, the P content of Alloy No. 16, the Zn content of Alloy No. 18, and the total content of the subcomponents of Alloy Nos. 22 to 24 were all excessive, and the electrical conductivity was low. The Fe content of Alloy No. 15 and the Fe and P contents of No. 21 were small, respectively, and the tensile strength was insufficient. No. 17 has a small P content and a poor electrical conductivity. Alloy No. 19 has a small Zn content and is inferior in solder heat-resistant peelability.

〔實施例2〕 [Example 2]

使用小型電爐,在大氣中,在木炭的覆蓋下,將表1所示的組成分的銅合金(合金No.1)進行熔解,熔製成厚50mm、寬80mm、長180mm的鑄塊。對於所製作的上述鑄塊的表面、背面各進行5mm的表面車削後,以950℃進行1小時的均質化處理,接著進行熱軋,作成厚12mmt的板材,從750℃以上的溫度起進行急速冷卻。再對於板材的表面、背面分別進行表面車削約1mm。對於這些板 材,反覆進行冷軋和500~550℃×2~5小時的析出退火,再對於板表面進行機械性研磨(試驗No.1~5)或不進行研磨(試驗No.6、7),加工成具有如表3所示的表面粗糙度(算術平均粗糙度Ra)的銅合金條。 A copper alloy (alloy No. 1) having the composition shown in Table 1 was melted in a small electric furnace under the cover of charcoal in the atmosphere, and melted to obtain an ingot having a thickness of 50 mm, a width of 80 mm, and a length of 180 mm. The surface and the back surface of the produced ingot were subjected to surface turning of 5 mm, and then homogenized at 950 ° C for 1 hour, followed by hot rolling to form a sheet having a thickness of 12 mm, and the temperature was rapidly increased from 750 ° C or higher. cool down. Further, the surface of the sheet and the back surface were separately turned by about 1 mm. For these boards The material is repeatedly subjected to cold rolling and precipitation annealing at 500 to 550 ° C for 2 to 5 hours, and then the surface of the plate is mechanically ground (test No. 1 to 5) or not polished (test No. 6, 7). A copper alloy strip having a surface roughness (arithmetic average roughness Ra) as shown in Table 3 was obtained.

根據下述的要領進行該銅合金條(最終冷軋前)的表面粗糙度(算術平均粗糙度Ra)的測定試驗。將其結果顯示在表3中。 The measurement of the surface roughness (arithmetic mean roughness Ra) of the copper alloy strip (before final cold rolling) was carried out in accordance with the following procedure. The results are shown in Table 3.

(表面粗糙度的測定) (Measurement of surface roughness)

使用從最終冷軋前(No.1~5是使用研磨後)的銅合金條採取的試驗材,使用原子力顯微鏡(AFM)沿輥軋垂直方向觀察前述試驗材的表面狀態,求得粗糙度曲線(AFM輪廓),由該AFM輪廓求得算術平均粗糙度Ra。 The surface of the test material was observed in the vertical direction of the roll using an atomic force microscope (AFM) using a test material taken from a copper alloy strip before final cold rolling (No. 1 to 5 was after grinding) to obtain a roughness curve. (AFM profile), the arithmetic mean roughness Ra is obtained from the AFM profile.

接著,使用鏡面拋光加工成各種表面粗糙度之直徑為50mm的3個賽隆陶瓷軋輥(輥A、輥B、輥C)中的任意一個或多個,以1道次或多道次進行最終冷軋,製作成厚度0.2mm的銅合金條。在實施多道次輥軋的情況下,依序地將第1道次使用輥A,第2道次使用輥B,第3道次使用輥C。最終冷軋的各道次所使用的賽隆陶瓷軋輥,在表3中係以○記號來顯示。另外,表3中還顯示了最終冷軋的總加工率和潤滑油的種類。軋輥的轉速和拉伸張力,以及潤滑油的透光度都落在前述範圍內。還有,3個賽隆陶瓷軋輥的表面粗糙度(輥軸方向的算術平均粗糙度Ra),係依照按輥A、輥B、輥C的順序減小,而且全部都較之最終冷軋前的板的表面粗糙度(算術平均粗糙度Ra)更小。 Next, any one or more of three Sialon ceramic rolls (roll A, roll B, and roll C) having a surface roughness of 50 mm having various surface roughnesses are processed by mirror polishing in one or more passes. Cold rolling was carried out to prepare a copper alloy strip having a thickness of 0.2 mm. In the case of performing multi-pass rolling, the roller A is used in the first pass, the roller B is used in the second pass, and the roller C is used in the third pass. The Sialon ceramic rolls used in the final cold rolling were indicated by ○ marks in Table 3. In addition, Table 3 also shows the total processing rate of the final cold rolling and the type of lubricating oil. The rotational speed and tensile tension of the rolls, as well as the transmittance of the lubricating oil, fall within the aforementioned ranges. Further, the surface roughness (arithmetic average roughness Ra of the roll axis direction) of the three Sialon ceramic rolls is reduced in the order of the rolls A, B, and C, and all of them are compared with the final cold rolling. The surface roughness (arithmetic mean roughness Ra) of the plate is smaller.

按照下述要領,進行最終冷軋後的銅合金條的表面粗糙度(算術平均粗糙度Ra和十點平均粗糙度RzJIS),以及粗糙度曲線(AFM輪廓)中的長度50μm的範圍的波谷部面積的測定試驗。將這些結果一併顯示在表3中。 The surface roughness (arithmetic mean roughness Ra and ten point average roughness R zJIS ) of the copper alloy strip after the final cold rolling, and the valley of the range of 50 μm in the roughness curve (AFM profile) were carried out in the following manner. Measurement test of the area. These results are shown together in Table 3.

(表面粗糙度的測定) (Measurement of surface roughness)

使用從最終冷軋後的銅合金條採取的試驗材,使用原子力顯微鏡(AFM)沿輥軋垂直方向觀察供試材的表面狀態,求得粗糙度曲線(AFM輪廓),由該AFM輪廓求得算術平均粗糙度Ra和十點平均粗糙度RzJISUsing the test piece taken from the copper alloy strip after the final cold rolling, the surface state of the test piece was observed in the vertical direction of the roll using an atomic force microscope (AFM), and a roughness curve (AFM profile) was obtained, which was obtained from the AFM profile. Arithmetic mean roughness Ra and ten point average roughness R zJIS .

(波谷部面積的測定) (measurement of the area of the trough)

根據由表面粗糙度的測得的AFM輪廓,測得該AFM輪廓的X軸(平均線)的長度50μm的範圍的波谷部面積。所謂波谷部面積,係指:夾介在AFM輪廓的X軸(平均線)與該X軸下側的曲線之間的部位的面積。將試驗No.1的AFM輪廓顯示在第1圖中。 The area of the trough portion in the range of 50 μm in length of the X-axis (average line) of the AFM profile was measured based on the measured AFM profile of the surface roughness. The area of the trough portion refers to the area of the portion between the X-axis (average line) of the AFM profile and the curve on the lower side of the X-axis. The AFM outline of Test No. 1 is shown in Fig. 1.

如表3所示,No.1、2、4、6的銅合金板中,最終冷軋前的表面粗糙度比較小(算術平均粗糙度Ra≦0.20μm),且最終冷軋的總加工率比較大(加工率≧20%)。該No.1、2、4、6的銅合金板,其表面粗糙度(算術平均粗糙度Ra和十點平均粗糙度RzJIS)以及波谷部面積係符合本發明的規定。 As shown in Table 3, in the copper alloy sheets of No. 1, 2, 4, and 6, the surface roughness before the final cold rolling was relatively small (arithmetic average roughness Ra ≦ 0.20 μm), and the total processing rate of the final cold rolling was as follows. Larger (processing rate ≧ 20%). The copper alloy sheets of Nos. 1, 2, 4, and 6 have surface roughness (arithmetic average roughness Ra and ten point average roughness R zJIS ) and a trough portion area in accordance with the regulations of the present invention.

另一方面,No.3、7的銅合金板,最終冷軋的總加工率小(加工率<20%),No.5的銅合金板,最終冷軋前的表面粗糙度比較大(算術平均粗糙度Ra>0.20μm)。該No.3、5、7的銅合金板,表面粗糙度(算術平均粗糙度Ra和十點平均粗糙度RzJIS)及波谷部面積係大於本發明的規定。 On the other hand, in the copper alloy sheets of No. 3 and 7, the total processing rate of the final cold rolling is small (processing rate < 20%), and the copper alloy sheet of No. 5 has a relatively large surface roughness before final cold rolling (arithmetic The average roughness Ra>0.20 μm). In the copper alloy sheets of Nos. 3, 5, and 7, the surface roughness (arithmetic average roughness Ra and ten point average roughness R zJIS ) and the area of the trough portion are larger than the specifications of the present invention.

〔實施例3〕 [Example 3]

使用小型電爐,在大氣中,在木炭的覆蓋下,將表1、2所示的組成分的銅合金(合金No.1、2、3、12、15、24)進行熔解,熔製成厚50mm、寬80mm、長180mm的鑄塊。對於所製作的上述鑄塊的表面、背面各進 行5mm的表面車削後,以950℃進行1小時的均質化處理,接著進行熱軋,作成厚12mmt的板材,從750℃以上的溫度起進行急速冷卻。對於該板材的表面、背面分別進行約1mm的表面車削。對於這些板材,反覆進行冷軋和500~550℃×2~5小時的析出退火後,使用進行了鏡面拋光加工後的直徑50mm的賽隆陶瓷軋輥,以40%的加工率進行最終冷軋,製作成厚度0.2mm的銅合金條作為供試材。在最終冷軋中,調整通板道次數,最終及中間的各道次中的賽隆陶瓷軋輥的表面粗糙度及軋輥的轉速,獲得具有各種表面粗糙度的銅合金條(表4中的試驗No.8~28)。此外,只有針對於試驗No.15,在最終冷軋後,將銅合金板表面進行了機械性研磨。 Using a small electric furnace, in the atmosphere, under the cover of charcoal, the copper alloys (alloy No. 1, 2, 3, 12, 15, 24) of the compositions shown in Tables 1 and 2 are melted and melted to a thickness. Ingot of 50mm, width 80mm and length 180mm. For the surface and back of each of the above-mentioned ingots produced After 5 mm surface turning, the mixture was homogenized at 950 ° C for 1 hour, and then hot rolled to form a sheet having a thickness of 12 mm, and was rapidly cooled from a temperature of 750 ° C or higher. Surface turning of about 1 mm was performed on the front and back surfaces of the sheet. These sheets were repeatedly cold rolled and subjected to precipitation annealing at 500 to 550 ° C for 2 to 5 hours, and then a 50 mm diameter Sialon ceramic roll after mirror polishing was used to carry out final cold rolling at a processing rate of 40%. A copper alloy strip having a thickness of 0.2 mm was prepared as a test material. In the final cold rolling, the number of passes, the surface roughness of the Sialon ceramic rolls in the final and intermediate passes, and the rotational speed of the rolls were obtained to obtain copper alloy strips with various surface roughness (test in Table 4). No.8~28). Further, only for Test No. 15, the surface of the copper alloy sheet was mechanically polished after the final cold rolling.

從製作成的各銅合金條採取試驗材,依據前述〔實施例2〕所述的要領,進行表面粗糙度(Ra、RzJIS)及波谷部面積的測定試驗。將試驗No.15的AFM輪廓顯示在第2圖中。另外,按照下述要領進行了加工變質層厚度的測定試驗。將這些測定結果顯示在表4中。 A test material was taken from each of the prepared copper alloy strips, and the surface roughness (Ra, R zJIS ) and the measurement of the area of the trough portion were carried out in accordance with the method described in the above [Example 2]. The AFM outline of Test No. 15 is shown in Fig. 2. Further, a test for measuring the thickness of the affected layer was carried out in accordance with the following procedure. The results of these measurements are shown in Table 4.

(加工變質層厚度的測定) (Measurement of thickness of processing metamorphic layer)

從各供試材裁切下與輥軋方向以及板厚方向平行的截面(長度為20mm),作為觀察試料。對於各觀察試料,以40000倍的倍率對於前述截面進行SEM(掃描型電子顯微鏡)觀察,求得各個觀察部位之由細微晶粒構成的加工變質層厚度的最大值,將其視為該試料的“由細微晶粒構成的”加工變質層厚度。此外,該加工變質層厚度為0.1μm左右或較之更薄時,因為不能準確地測量厚度,所以在表4的加工變質層厚度一欄中係以“-”來表示。 A cross section (length: 20 mm) parallel to the rolling direction and the thickness direction was cut out from each of the test materials as an observation sample. With respect to each of the observation samples, the cross section was observed by SEM (scanning electron microscope) at a magnification of 40,000 times, and the maximum value of the thickness of the work-affected layer composed of fine crystal grains at each observation portion was determined, and this was regarded as the sample. The thickness of the processed metamorphic layer consists of "fine grains". Further, when the thickness of the work-affected layer is about 0.1 μm or less, since the thickness cannot be accurately measured, it is indicated by "-" in the column of the thickness of the work-affected layer in Table 4.

接著,對於所製作的銅合金條按照下述條件進行鍍Ag處理,對於該鍍Ag材,依照下述要領進行:表面粗糙度、鍍Ag覆膜定向性、鍍Ag覆膜的粒徑、反射率、封裝組裝後的亮度的測定試驗。將測定結果顯示在表4中。 Next, the prepared copper alloy strip was subjected to Ag plating treatment under the following conditions, and the Ag plating material was subjected to the following methods: surface roughness, Ag plating orientation, Ag coating diameter, and reflection. Rate, measurement test of brightness after packaging and assembly. The measurement results are shown in Table 4.

(鍍Ag處理條件) (Ag plating conditions)

對於各銅合金條,進行電解脫脂(5Adm2×60秒)、酸洗(20質量%硫酸×5秒),進行0.1~0.2μm厚的Cu閃鍍後,進行厚度2.5μm的鍍Ag處理。鍍Ag液的組成 分如下。Ag濃度:80g/L,游離KCN濃度:120g/L,碳酸鉀濃度:15g/L,添加劑(商品名:Ag20-10T(美泰樂科技公司製造)):20ml/L。 Each copper alloy strip was subjected to electrolytic degreasing (5 Adm 2 × 60 seconds), pickling (20% by mass sulfuric acid × 5 seconds), and after 0.1 to 0.2 μm thick Cu flash plating, an Ag plating treatment having a thickness of 2.5 μm was performed. The composition of the Ag plating solution is as follows. Ag concentration: 80 g/L, free KCN concentration: 120 g/L, potassium carbonate concentration: 15 g/L, additive (trade name: Ag20-10T (manufactured by Metalor Technology Co., Ltd.)): 20 ml/L.

(鍍Ag材的表面粗糙度的測量) (Measurement of surface roughness of Ag plated material)

使用所製作的鍍Ag材,使用AFM沿輥軋垂直方向觀察供試材的表面狀態,求得表面粗糙度曲線(AFM輪廓),由該AFM輪廓求得十點平均粗糙度RzJISUsing the produced Ag-plated material, the surface state of the test piece was observed in the vertical direction by rolling using AFM, and a surface roughness curve (AFM profile) was obtained, and a ten-point average roughness R zJIS was obtained from the AFM profile.

(鍍Ag覆膜定向性、鍍Ag覆膜的粒徑之測定) (Measurement of the orientation of the Ag-coated film and the particle size of the Ag-coated film)

使用所製作的鍍Ag材,藉由EBSD(Electron Backscatter Diffraction:電子背散射衍射)分析,測定鍍Ag覆膜定向性和鍍Ag覆膜的粒徑。EBSD分析,係使用TSL社製造的MSC-2200,以測量梯級:0.2μm,測量區域:60×60μm的條件來進行。此外,在求得鍍Ag覆膜的平均粒徑(當量圓直徑),相鄰的測量點之間的定向差為5°以上的情況,視為鍍Ag覆膜的晶界,由該晶界完全包圍的區域為晶粒。 The orientation of the Ag plating film and the particle size of the Ag plating film were measured by EBSD (Electron Backscatter Diffraction) analysis using the prepared Ag plating material. The EBSD analysis was carried out using MSC-2200 manufactured by TSL Corporation to measure steps: 0.2 μm, measurement area: 60 × 60 μm. Further, when the average particle diameter (equivalent circle diameter) of the Ag plating film is obtained, and the difference in orientation between adjacent measurement points is 5 or more, it is regarded as a grain boundary of the Ag plating film, and the grain boundary is The completely enclosed area is a grain.

(鍍Ag材的反射率的測量) (Measurement of reflectance of Ag plated material)

使用柯尼卡美能達公司製造的分光測色計CM-600d,測量所製作的鍍Ag材的全反射率(正反射率+擴散反射率)。全反射率在92%以上者視為合格。 The total reflectance (positive reflectance + diffuse reflectance) of the produced Ag-plated material was measured using a spectrophotometer CM-600d manufactured by Konica Minolta. Those with a total reflectance of 92% or more are considered qualified.

(封裝組裝後的亮度的測量) (Measurement of brightness after package assembly)

使用所製作的鍍Ag材組裝LED封裝體,將該LED封裝體設置在小型積分球內,進行總光通量測量。小型積分球的規格為:光譜股份有限公司製造的型號:SLM系列,尺寸10英寸。封裝組裝後的亮度在2.05lm以上者視為合格。 The LED package was assembled using the produced Ag plating material, and the LED package was placed in a small integrating sphere to measure the total luminous flux. The size of the small integrating sphere is: Model made by Spectra Co., Ltd.: SLM series, size 10 inches. The brightness after packaging and assembly is 2.05 lm or more.

如表4所示,試驗No.8~14、20、22、24,其合金組成、銅合金板的表面粗糙度(Ra,RzJIS)、加工變質層厚度、及凹部的面積符合本發明的規定,鍍Ag後的反射率均為92%以上,封裝組裝後的亮度(總光通量)為2.05lm以上。其鍍Ag材的表面粗糙度RzJIS均為0.3μm以下,鍍Ag覆膜定向性((001)定向)為0.4以上,鍍Ag覆膜的晶粒直徑為13μm以上。 As shown in Table 4, Test Nos. 8 to 14, 20, 22, and 24, the alloy composition, the surface roughness (Ra, R zJIS ) of the copper alloy sheet, the thickness of the work-affected layer, and the area of the concave portion are in accordance with the present invention. It is prescribed that the reflectance after Ag plating is 92% or more, and the brightness (total luminous flux) after package assembly is 2.05 lm or more. Ag plating material which surface roughness R zJIS are 0.3μm or less, Ag plating film orientation ((001) orientation) of 0.4 or more, the crystal grain size of the Ag plating film of 13μm or more.

另一方面,合金組成分符合本發明的規定,但銅合金板的表面粗糙度(Ra,RzJIS)、加工變質層厚度、及波谷部面積的其中一項不符合本發明的規定的試驗No.15~19、21、23、25,其鍍Ag後的反射率及封裝組裝後的亮度(總光通量)較差。其鍍Ag材的表面粗糙度RzJIS均高於0.3μm,鍍Ag覆膜定向性((001)定向)低於0.4,鍍Ag覆膜的晶粒直徑低於13μm。 On the other hand, the alloy composition is in accordance with the provisions of the present invention, but one of the surface roughness (Ra, R zJIS ), the thickness of the work-affected layer, and the area of the trough portion of the copper alloy sheet does not conform to the test No. specified in the present invention. .15~19, 21, 23, 25, the reflectance after Ag plating and the brightness (total luminous flux) after package assembly are poor. The surface roughness R zJIS of the Ag-plated material is higher than 0.3 μm, the orientation of the Ag-coated film ((001) orientation is less than 0.4, and the grain diameter of the Ag-coated film is less than 13 μm.

合金組成分不符合本發明的規定,但銅合金板的表面粗糙度(Ra,RzJIS)、加工變質層厚度、及波谷部面積符合本發明的規定的試驗No.26、28,其鍍Ag後的反射率為92%以上,封裝組裝後的亮度(總光通量)為2.05lm 以上。其鍍Ag材的表面粗糙度RzJIS均為0.3μm以下,鍍Ag覆膜定向性((001)定向)為0.4以上,鍍Ag覆膜的晶粒直徑為13μm以上。 The alloy composition does not conform to the provisions of the present invention, but the surface roughness (Ra, R zJIS ) of the copper alloy sheet, the thickness of the work-affected layer, and the area of the trough portion conform to the test No. 26 and 28 of the present invention, and the Ag plating is performed. The reflectance after that was 92% or more, and the brightness (total luminous flux) after package assembly was 2.05 lm or more. The surface roughness R zJIS of the Ag plating material is 0.3 μm or less, the orientation of the Ag plating film ((001) orientation) is 0.4 or more, and the crystal grain diameter of the Ag plating film is 13 μm or more.

合金組成分和銅合金板的表面粗糙度(Ra,RzJIS)不符合本發明的規定的試驗No.27,鍍Ag後的反射率及封裝組裝後的亮度(總光通量)較差。另外,試驗No.27的鍍Ag材的表面粗糙度RzJIS高於0.3μm,鍍Ag覆膜定向性((001)定向)低於0.4,鍍Ag覆膜的晶粒直徑低於13μm。 The alloy composition and the surface roughness (Ra, R zJIS) of the copper alloy sheet did not conform to Test No. 27 of the present invention, and the reflectance after Ag plating and the brightness (total luminous flux) after package assembly were inferior. In addition, Ag plating a surface roughness R zJIS material is higher than 0.3 m Test No.27, Ag plating film orientation ((001) orientation) is less than 0.4, Ag-plated film grain diameter of less than 13μm.

Claims (5)

一種LED的引線框用銅合金板條,其特徵在於,含有Fe:1.8~2.6質量%、P:0.005~0.20質量%、Zn:0.01~0.5質量%,其餘部分由Cu和不可避免的雜質構成,表面粗糙度為:算術平均粗糙度Ra低於0.06μm,十點平均粗糙度RzJIS低於0.5μm,利用原子力顯微鏡沿輥軋垂直方向測量所取得的粗糙度曲線中的長度50μm的範圍的波谷部面積為1.3μm2以下,表面之由細微晶粒構成的加工變質層的厚度為0.5μm以下。 A copper alloy strip for a lead frame of an LED, characterized in that it contains Fe: 1.8 to 2.6% by mass, P: 0.005 to 0.20% by mass, Zn: 0.01 to 0.5% by mass, and the balance is composed of Cu and unavoidable impurities. The surface roughness is: the arithmetic mean roughness Ra is less than 0.06 μm, the ten-point average roughness R zJIS is less than 0.5 μm, and the length of the obtained roughness curve is measured in the range of 50 μm in the vertical direction by the atomic force microscope. The area of the trough portion is 1.3 μm 2 or less, and the thickness of the work-affected layer composed of fine crystal grains on the surface is 0.5 μm or less. 如請求項1所述之LED的引線框用銅合金板條,其中,又含有合計0.02~0.3質量%的Sn、Co、Al、Cr、Mg、Mn、Ca、Pb、Ni、Ti、Zr中的一種或兩種以上。 A copper alloy strip for a lead frame of the LED according to claim 1, wherein the total of 0.02 to 0.3% by mass of Sn, Co, Al, Cr, Mg, Mn, Ca, Pb, Ni, Ti, and Zr is contained. One or two or more. 一種具有鍍Ag覆膜的銅合金板條,其特徵在於,對於請求項1或2所述的銅合金板條的表面實施鍍Ag處理,在前述銅合金板條的輥軋垂直方向上測得的表面粗糙度為:十點平均粗糙度RzJIS為0.3μm以下。 A copper alloy strip having an Ag-plated coating, characterized in that the surface of the copper alloy strip according to claim 1 or 2 is subjected to an Ag plating treatment, and is measured in the vertical direction of the rolling of the copper alloy strip. The surface roughness is: ten point average roughness R zJIS is 0.3 μm or less. 一種LED用引線框,係對於請求項3所述的具有鍍Ag覆膜的銅合金板條進行沖孔加工製作而成的。 A lead frame for LEDs is produced by punching a copper alloy strip having an Ag-plated film according to claim 3. 一種LED用引線框,係對於請求項1或2所述的銅合金板條進行沖孔加工或蝕刻加工,再實施鍍Ag處理製作而成的,沿前述銅合金板條的輥軋垂直方向測得的表面粗糙度為:十點平均粗糙度RzJIS為0.3μm以下。 A lead frame for LEDs is produced by punching or etching a copper alloy strip according to claim 1 or 2, and then performing an Ag plating process, and measuring the vertical direction of the rolled copper alloy strip. have a surface roughness: R zJIS ten point average roughness of 0.3μm or less.
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