JP5311860B2 - Copper alloy plate with Sn plating for PCB male terminals with excellent Pb-free solderability - Google Patents

Copper alloy plate with Sn plating for PCB male terminals with excellent Pb-free solderability Download PDF

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JP5311860B2
JP5311860B2 JP2008087809A JP2008087809A JP5311860B2 JP 5311860 B2 JP5311860 B2 JP 5311860B2 JP 2008087809 A JP2008087809 A JP 2008087809A JP 2008087809 A JP2008087809 A JP 2008087809A JP 5311860 B2 JP5311860 B2 JP 5311860B2
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JP2009242822A (en
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昌泰 西村
洋介 三輪
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Kobe Steel Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To produce a PCB male terminal excellent in Pb-free solderability and having sufficient strength and electric conductivity from a copper alloy plate on both sides of which Sn is plated before blanking. <P>SOLUTION: The copper alloy plate with Sn plating for PCB male terminals for producing the PCB male terminals has Sn plated layers on both surfaces and has shear-cut end faces by press blanking on both end faces. The copper alloy contains 0.05-2.6 mass% Fe, 0.01-0.2 mass% P, and one or two of 0.01-5 mass% Zn and 0.01-2 mass% Ni, and the balance Cu with inevitable impurities. Alternatively, the copper alloy contains 0.01-2 mass% Ni, 0.01-0.2 mass% P, and the balance Cu with inevitable impurities. <P>COPYRIGHT: (C)2010,JPO&amp;INPIT

Description

本発明は、自動車等に搭載されるPCB(プリンティッドサーキットボード)にはんだ付けするPCBオス端子の製造に用いるSnめっき付き銅合金板に関する。   The present invention relates to a copper alloy plate with Sn plating used for manufacturing a PCB male terminal to be soldered to a PCB (printed circuit board) mounted on an automobile or the like.

PCBオス端子は、銅合金板からプレス打抜き加工によって角線材断面(矩形断面)に形成し、必要に応じてプレス加工で適当な塑性変形を加え、PCB(基板)の端子保持穴を貫通して該PCBにはんだ付けされる(特許文献1参照)。PCBのはんだ付けには、溶融はんだ槽にPCBを浸漬する浸漬はんだ付け法、又ははんだ付け箇所にはんだの噴流を供給するジェット噴流はんだ付け法が用いられる。浸漬はんだ付け法は、多数のはんだ付け箇所があるPCBをはんだ付けすることが可能であり、極めて高い経済性を有する。実装密度がより高いPCBのはんだ付けを信頼性よく行う場合には、ジェット噴流はんだ付けが行われる。いずれのはんだ付け法においても、はんだ浴は循環使用されるため、PCBよりの不純物が混入しないように操業上注意が必要になる。また、はんだ付け部の信頼性を高めるには、PCBオス端子及びPCB基板のはんだ付け部がはんだにより均一に濡れ、凝固したはんだのフィレットが適正な形状に形成されることが必要である。
従来、PCBオス端子用銅合金板として、Snめっき付き黄銅板が多く用いられている。黄銅に含まれるZnがはんだ浴に溶け出し、はんだ浴のZn濃度が高くなると、はんだ付け性を阻害する。
The PCB male terminal is formed into a square wire cross section (rectangular cross section) by press punching from a copper alloy plate, and is subjected to appropriate plastic deformation by press processing as necessary, penetrating through the terminal holding hole of the PCB (substrate). It solders to this PCB (refer patent document 1). For the soldering of the PCB, an immersion soldering method in which the PCB is immersed in a molten solder bath, or a jet jet soldering method in which a jet of solder is supplied to a soldering location is used. The immersion soldering method can solder a PCB having a large number of soldering points, and has extremely high economic efficiency. Jet soldering is performed when soldering a PCB having a higher mounting density with high reliability. In any of the soldering methods, since the solder bath is used in a circulating manner, care must be taken in operation so that impurities from the PCB do not enter. Further, in order to increase the reliability of the soldered portion, it is necessary that the soldered portion of the PCB male terminal and the PCB substrate are uniformly wetted by the solder and the solidified solder fillet is formed in an appropriate shape.
Conventionally, a brass plate with Sn plating is often used as a copper alloy plate for a PCB male terminal. When Zn contained in the brass melts into the solder bath and the Zn concentration of the solder bath increases, the solderability is hindered.

特開2000−243495号公報JP 2000-243495 A

PCBオス端子用銅合金板として先めっき材(打抜き加工前に両表面にSnめっきが行われた銅合金板)を用いる場合、プレス打抜き加工を行うと、PCB端子の両端面(せん断切り口面)に銅合金素材が露出する。プレス打抜き加工時、両端面には表面のSnめっき部からのSnダレによるSn被覆部も形成されるが、両端面を完全にSnで被覆することはできない。端面に銅合金素材が露出すると、Pbフリーはんだ付け性が劣化し、PCB端子と基板との接合信頼性が低下する。
なお、環境問題からPbフリー化の要求が高まり、従来のSn−Pb系はんだに代えて、Sn−Ag系、Sn−Ag−Cu系などのPbフリーはんだが使用されるようになってきたが、これらPbフリーはんだは、濡れ性が従来のSn−Pb系はんだより劣ることが問題となっている。
When using a pre-plated material (copper alloy plate with Sn plating on both surfaces before punching) as the copper alloy plate for PCB male terminals, both ends of the PCB terminal (shear cut surface) when press punching is performed The copper alloy material is exposed. At the time of the press punching process, Sn covering portions by Sn sagging from the Sn plating portion on the surface are also formed on both end surfaces, but the both end surfaces cannot be completely covered with Sn. When the copper alloy material is exposed on the end face, the Pb-free solderability deteriorates, and the bonding reliability between the PCB terminal and the substrate decreases.
In addition, Pb-free solders such as Sn-Ag-based and Sn-Ag-Cu-based solders have been used instead of conventional Sn-Pb-based solders due to environmental issues, and the demand for Pb-free soldering has increased. These Pb-free solders have a problem that wettability is inferior to that of conventional Sn-Pb solders.

一方、PCBオス端子用銅合金板として、後めっき材(打抜き加工後にSnめっきが行われた銅合金板)を用いる場合、せん断切り口面を含めてはんだ付け部の全面がSnめっきにより覆われるため、Pbフリーはんだ付け性を維持することができ、PCB端子と基板との接合信頼性が高い。しかし、後めっき材は製造コストが高く、また一般にSnめっきが厚め(概ね2μm前後)で嵌合時の摩擦抵抗が大きいという問題がある。なお、後めっき材は、Snめっき厚さにムラができやすいことから、一部に特にめっき厚さの薄い部位ができてPbフリーはんだによるはんだ付け性が低下するのを防止するため、全体としてSnめっきは厚めに形成している。   On the other hand, when a post-plated material (copper alloy plate on which Sn plating has been performed after punching) is used as the copper alloy plate for PCB male terminals, the entire soldered portion including the shear cut surface is covered with Sn plating. , Pb-free solderability can be maintained, and the bonding reliability between the PCB terminal and the substrate is high. However, the post-plating material is expensive to manufacture, and generally has a problem that the Sn plating is thick (approximately 2 μm) and the frictional resistance during fitting is large. In addition, since the post-plating material is likely to have unevenness in the Sn plating thickness, in order to prevent a portion having a particularly small plating thickness from being formed in a part and lowering the solderability by Pb-free solder, as a whole The Sn plating is formed thicker.

本発明は上記問題に鑑み、PCBにPbフリーはんだ付けするPCBオス端子用銅合金板として製造コスト面で優れた先めっき材を用いることを前提とした上で、Pbフリーはんだ付け性に優れ、同時にPCBオス端子として不足のない強度及び導電率を備えたPCBオス端子を製造することを目的とする。 In view of the above problems, the present invention is based on the premise that a pre-plated material excellent in production cost is used as a copper alloy plate for PCB male terminals to be Pb-free soldered to a PCB, and is excellent in Pb-free solderability. At the same time, an object of the present invention is to manufacture a PCB male terminal having sufficient strength and conductivity as a PCB male terminal.

本発明に係るPbフリーはんだ付け性に優れるPCBオス端子用Snめっき付き銅合金板は、先めっきを前提としたもので、銅合金の組成が、(1)Fe:0.05〜2.6質量%、P:0.01〜0.2質量%、及びZn:0.01〜5質量%とNi:0.01〜2質量%の1種又は2種を含み、残部Cu及び不可避不純物からなり、又は(2)Ni:0.01〜2質量%、P:0.01〜0.2質量%を含み、残部Cu及び不可避不純物からなり、必要に応じてZn:0.01〜5質量%を含む。
上記(1)、(2)の銅合金は、いずれもFe又はNiとPの金属間化合物による析出強化を利用したものであり、Pbフリーはんだ付け性を向上させるため、所定量のZn又はNi(又はその両方)を必ず含む点でも共通の技術的特徴を有する。
The copper alloy plate with Sn plating for PCB male terminals excellent in Pb-free solderability according to the present invention is premised on the pre-plating, and the composition of the copper alloy is (1) Fe: 0.05 to 2.6. Including one or two of mass%, P: 0.01 to 0.2 mass%, Zn: 0.01 to 5 mass% and Ni: 0.01 to 2 mass%, from the remaining Cu and inevitable impurities Or (2) Ni: 0.01-2% by mass, P: 0.01-0.2% by mass, consisting of the balance Cu and unavoidable impurities, if necessary, Zn: 0.01-5% by mass %including.
The copper alloys of the above (1) and (2) utilize precipitation strengthening by Fe or Ni and P intermetallic compounds, and in order to improve Pb-free solderability, a predetermined amount of Zn or Ni It also has common technical features in that it includes (or both).

上記銅合金は、必要に応じて、さらにSn:3質量%以下を含み、その他の副成分として、Al,Co,Cr,Mg,Mn,Si,Ti,Zrの1種又は2種以上を、各元素0.001〜0.2質量%、合計で0.001〜0.6質量%含む。
上記Snめっき付き銅合金板は、先めっきを前提としたものであるから、プレス打抜き加工した際、打抜き端面は銅合金素材が露出したせん断切り口面となる。従って、PCB端子は、両表面にSnめっき層を有し、両端面にプレス打抜き加工によるせん断切り口面を有したものとなる。
なお、本発明においてSnめっき層は純Sn及びSn基合金を含む。
If necessary, the copper alloy further includes Sn: 3 mass% or less, and as other accessory components, one or more of Al, Co, Cr, Mg, Mn, Si, Ti, Zr, Each element is contained in an amount of 0.001 to 0.2% by mass, and 0.001 to 0.6% by mass in total.
Since the Sn-plated copper alloy plate is premised on pre-plating, the punched end surface becomes a shear cut surface where the copper alloy material is exposed when press punching is performed. Therefore, the PCB terminal has Sn plating layers on both surfaces, and has shear cut surfaces by press punching on both end faces.
In the present invention, the Sn plating layer includes pure Sn and an Sn-based alloy.

本発明に係るSnめっき付き銅合金板は、銅合金素材中にZn又はNi若しくはその両者が所定量含有されていることにより、先めっき材であっても、優れたPbフリーはんだ付け性を維持することができる。
また、本発明に係るSnめっき付き銅合金板は、PCBオス端子として不足のない強度及び導電率を備えている。
The Sn-plated copper alloy plate according to the present invention maintains excellent Pb-free solderability even if it is a pre-plated material by containing a predetermined amount of Zn and / or Ni in the copper alloy material. can do.
Moreover, the copper alloy board with Sn plating which concerns on this invention is equipped with the intensity | strength and electrical conductivity which are not insufficient as a PCB male terminal.

本発明に係る銅合金の組成は、基本的にFe−P系又はNi−P系であり、いずれもFe又はNiとPの金属間化合物の析出により強度を向上させ、かつ所定量のZn又はNi若しくはその両方を含むことでPbフリーはんだ付け性を向上させた点に特徴がある。以下、本発明に係る銅合金の組成をFe−P系とNi−P系に分けて説明する。   The composition of the copper alloy according to the present invention is basically an Fe-P system or Ni-P system, both of which improve the strength by precipitation of an intermetallic compound of Fe or Ni and P, and a predetermined amount of Zn or It is characterized in that Pb-free solderability is improved by including Ni or both. Hereinafter, the composition of the copper alloy according to the present invention will be described separately for the Fe-P system and the Ni-P system.

(Fe−P系)
Fe−P系銅合金の組成は、Fe:0.05〜2.6質量%、P:0.01〜0.2質量%を含み、さらにZn:0.01〜5質量%とNi:0.01〜2質量%の1種又は2種を含み、残部Cu及び不可避不純物からなり、必要に応じて、さらにSn:3質量%以下を含み、その他の副成分として、Al,Co,Cr,Mg,Mn,Si,Ti,Zrの1種又は2種以上を、各元素0.001〜0.2質量%、合計で0.001〜0.6質量%含む。
(Fe-P system)
The composition of the Fe-P based copper alloy includes Fe: 0.05 to 2.6 mass%, P: 0.01 to 0.2 mass%, and Zn: 0.01 to 5 mass%, and Ni: 0. .01 to 2% by mass of 1 or 2%, consisting of the balance Cu and inevitable impurities, and if necessary, Sn: 3% by mass or less, and other subcomponents such as Al, Co, Cr, One or more of Mg, Mn, Si, Ti, and Zr are contained in an amount of 0.001 to 0.2% by mass for each element, and 0.001 to 0.6% by mass in total.

この組成において、FeはFe又はFe−P金属間化合物として析出し、銅合金板の強度や耐熱性を向上させる。Fe含有量が0.05質量%未満では析出量が少なく、強度を確保し難く、一方、Feが2.6質量%を越えると、Fe又はFe−Pの粗大晶析出物粒子が生成し、曲げ加工性等を損なう恐れがある。なお、強度はオス端子として基板に挿入する際に変形しないよう、また挿入後の取り扱い中の変形を防止するため、硬さにして130MHv(マイクロビッカース硬さ)以上は必要である。従って、Fe含有量は0.05〜2.6質量%、望ましくは0.07〜2.4質量%とする。   In this composition, Fe precipitates as Fe or Fe—P intermetallic compounds, and improves the strength and heat resistance of the copper alloy plate. When the Fe content is less than 0.05% by mass, the amount of precipitation is small and it is difficult to ensure the strength. On the other hand, when Fe exceeds 2.6% by mass, coarse crystal precipitate particles of Fe or Fe-P are generated, There is a risk of bending workability being impaired. It should be noted that the strength is required to be 130 MHv (micro Vickers hardness) or more so as not to be deformed when inserted into the substrate as a male terminal and to prevent deformation during handling after insertion. Therefore, the Fe content is set to 0.05 to 2.6% by mass, desirably 0.07 to 2.4% by mass.

Pは脱酸効果があるほか、Feと金属間化合物を形成して、強度や耐熱性を向上させる。Pが0.01質量%未満であると析出量が少なく、強度を確保し難く、一方、Pが0.2質量%を越えると、熱間加工性が劣るとともに、Fe−Pの粗大析出物粒子が生成し、加工性等を劣化させる可能性がある。従って、P含有量は0.01〜0.2質量%、望ましくは0.02〜0.18質量%、さらに望ましくは0.025〜0.15質量%とする。   P has a deoxidizing effect and forms an intermetallic compound with Fe to improve strength and heat resistance. When P is less than 0.01% by mass, the amount of precipitation is small and it is difficult to ensure the strength. On the other hand, when P exceeds 0.2% by mass, hot workability is inferior and Fe—P coarse precipitates are present. There is a possibility that particles are formed and the workability and the like are deteriorated. Therefore, the P content is 0.01 to 0.2% by mass, preferably 0.02 to 0.18% by mass, and more preferably 0.025 to 0.15% by mass.

Ni及びZnは、打抜き端面において経時によるCuの酸化を抑制し、優れたPbフリーはんだ付け性を維持する作用がある。
Znは、含有量が0.01質量%未満であると,経時により打抜き端面に露出した銅合金素材のCuの酸化が進行し、PCB端子を基板にはんだ付けする際、フラックスで酸化膜を除去しきれず、酸化抑制効果が発現し難い。逆に5質量%を超えると、はんだ付けの際、PCB端子を覆うPbフリーはんだ中に溶け出すZnの量が多くなる。Pbフリーはんだ中のZnの含有量が多くなると、はんだの粘性が低下し、はんだが凝固するまでの間にはんだ付け部に保持されるはんだの量が減少したり、凝固したはんだの形状が適切でなく、はんだ付け部の信頼性が低下してしまう。また、はんだ付け槽に浸入するZnの量が多くなり、はんだ浴の更新時間が短くなる。従って、Zn含有量は0.01〜5質量%、望ましくは0.03〜3.0質量%、さらに望ましくは0.05〜2.5質量%とする。
Ni and Zn have the effect of suppressing Cu oxidation over time at the punched end face and maintaining excellent Pb-free solderability.
When the Zn content is less than 0.01% by mass, oxidation of Cu of the copper alloy material exposed to the punched end surface progresses with time, and when soldering the PCB terminal to the substrate, the oxide film is removed by flux. It is difficult to develop an oxidation inhibiting effect. On the other hand, if it exceeds 5% by mass, the amount of Zn that dissolves into the Pb-free solder covering the PCB terminal during soldering increases. If the Zn content in the Pb-free solder increases, the solder viscosity decreases, the amount of solder held in the soldering part before the solder solidifies, and the shape of the solidified solder is appropriate In addition, the reliability of the soldered portion is lowered. In addition, the amount of Zn entering the soldering bath increases, and the renewal time of the solder bath is shortened. Therefore, the Zn content is 0.01 to 5% by mass, preferably 0.03 to 3.0% by mass, and more preferably 0.05 to 2.5% by mass.

Niは、含有量が0.01質量%未満であると、Znと同様に、経時による酸化抑制効果が発現し難い。逆にNi含有量が2質量%を超えると、酸化抑制効果によるPbフリーはんだ付け性の向上には寄与するが、銅合金の導電率を確保し難い。この導電率は、従来より用いられる黄銅材(Cu−30wt%Zn)よりも高いことが望ましく、30%IACS以上は必要である。さらにNiは、PやFeとNi−P,Ni−Fe−P金属間化合物として析出し、銅合金板の強度の向上に寄与する。従って、Ni含有量は0.01〜2質量%、望ましくは0.025〜1.5質量%とする。   When the content of Ni is less than 0.01% by mass, the effect of suppressing oxidation over time is hardly exhibited as in the case of Zn. Conversely, if the Ni content exceeds 2% by mass, it contributes to the improvement of Pb-free solderability due to the oxidation inhibiting effect, but it is difficult to ensure the conductivity of the copper alloy. This conductivity is preferably higher than that of a conventionally used brass material (Cu-30 wt% Zn), and 30% IACS or more is necessary. Furthermore, Ni precipitates as P or Fe and Ni—P, Ni—Fe—P intermetallic compounds, and contributes to the improvement of the strength of the copper alloy sheet. Therefore, the Ni content is 0.01 to 2% by mass, preferably 0.025 to 1.5% by mass.

Snは、強度向上に寄与する元素であり、適宜添加されるが、3質量%を超えると導電率を確保し難いため、3質量%以下の範囲で選択添加する。強度向上のためには0.01質量%以上の添加が望ましい。望ましい添加量は0.03〜2.5質量%であり、さらに望ましくは0.03〜2.3質量%である。
Al,Co,Cr,Mg,Mn,Si,Ti,Zrは、強度及び耐熱性の向上に寄与する元素であり、はんだ付け性を阻害しない範囲で必要に応じて添加する。含有量が各元素0.001質量%未満であると強度及び耐熱性の向上効果が小さく、逆に0.2質量%を超えるとはんだ付け性を低下させる。また、これらの元素を2種以上添加する場合、その合計含有量が0.001質量%未満であると、強度及び耐熱性の向上効果が小さく、0.6質量%を超えるとPbフリーはんだ付け性を劣化させる。従って、これらの元素の含有量は、各元素0.001〜0.2質量%、2種以上含む場合は合計で0.001〜0.6質量%とする。望ましくはそれぞれ、0.005〜0.1質量%、0.005〜0.4質量%である。
Sn is an element that contributes to strength improvement, and is added as appropriate. However, if it exceeds 3% by mass, it is difficult to ensure conductivity, so it is selectively added in a range of 3% by mass or less. In order to improve the strength, addition of 0.01% by mass or more is desirable. A desirable addition amount is 0.03 to 2.5% by mass, and more desirably 0.03 to 2.3% by mass.
Al, Co, Cr, Mg, Mn, Si, Ti, and Zr are elements that contribute to improvement in strength and heat resistance, and are added as necessary within a range that does not impair solderability. When the content is less than 0.001% by mass of each element, the effect of improving the strength and heat resistance is small, and when it exceeds 0.2% by mass, the solderability is deteriorated. Further, when two or more of these elements are added, if the total content is less than 0.001% by mass, the effect of improving strength and heat resistance is small, and if it exceeds 0.6% by mass, Pb-free soldering is performed. Deteriorate the sex. Accordingly, the content of these elements is 0.001 to 0.2% by mass in the case where two or more elements are included, and 0.001 to 0.6% by mass in total. Desirably, they are 0.005-0.1 mass% and 0.005-0.4 mass%, respectively.

(Ni−P系)
Ni−P系銅合金の組成は、Ni:0.05〜2質量%、P:0.01〜0.2質量%を含み、残部Cu及び不可避不純物からなり、必要に応じて、さらにZn:0.01〜5質量%又は/及びSn:0.01〜3質量%を含み、その他の副成分として、Al,Co,Cr,Mg,Mn,Si,Ti,Zrの1種又は2種以上を、各元素0.001〜0.2質量%、合計で0.001〜0.6質量%含む。
(Ni-P series)
The composition of the Ni-P-based copper alloy includes Ni: 0.05-2% by mass, P: 0.01-0.2% by mass, and consists of the balance Cu and inevitable impurities. If necessary, Zn: 0.01-5% by mass or / and Sn: 0.01-3% by mass, as other subcomponents, one or more of Al, Co, Cr, Mg, Mn, Si, Ti, Zr Each element is contained in an amount of 0.001 to 0.2% by mass, and 0.001 to 0.6% by mass in total.

この組成において、NiはNi−P金属間化合物として析出し、銅合金板の強度の向上に寄与するとともに、打抜き端面において経時によるCuの酸化を抑制し、優れたPbフリーはんだ付け性を維持する作用を有する。含有量を0.05〜2質量%に規定した理由は前記Fe−P系と同様であり、望ましい含有量の範囲も同様に0.025〜1.5質量%である。
P,Zn,Sn,及びAl,Co,Cr,Mg,Mn,Si,Ti,Zrに関しても、作用効果は前記Fe−P系と同様であり、含有量の範囲(望ましい範囲も)及びそのように規定した理由も同様である。
In this composition, Ni precipitates as a Ni-P intermetallic compound, contributes to improving the strength of the copper alloy plate, suppresses Cu oxidation over time at the punched end face, and maintains excellent Pb-free solderability. Has an effect. The reason why the content is specified to be 0.05 to 2% by mass is the same as that of the Fe-P system, and the desirable content range is also 0.025 to 1.5% by mass.
Regarding P, Zn, Sn, and Al, Co, Cr, Mg, Mn, Si, Ti, and Zr, the effect is the same as that of the Fe-P system, and the content range (also desirable range) and so on. The reason specified in is also the same.

銅合金板表面のSnめっきは、Pbフリーはんだ付け性及び経時後の電気的信頼性(低い接触抵抗の維持)を向上させる作用がある。Snめっきとして、リフローSnめっき、溶融Snめっき、電気光沢Snめっき等がいずれも利用できる。また、本発明でいうSnめっきはSn基合金めっきを含み、例えばSn−Cu合金めっき、Sn−Bi合金めっき、Sn−Zn合金めっき、Sn−Ag合金めっき等、2元系や3元系のSn基合金めっきを含む。   Sn plating on the surface of the copper alloy plate has an effect of improving Pb-free solderability and electrical reliability after time (maintaining low contact resistance). As the Sn plating, any of reflow Sn plating, molten Sn plating, electro-gloss Sn plating, and the like can be used. In addition, Sn plating referred to in the present invention includes Sn-based alloy plating, such as Sn-Cu alloy plating, Sn-Bi alloy plating, Sn-Zn alloy plating, Sn-Ag alloy plating, etc. Includes Sn-based alloy plating.

本発明に係るSnめっき付き銅合金板の表面被覆層構造は、Snめっき層の下地に他の表面被覆層を有していてもよい。銅合金板素材にSnめっきを行った場合、そのめっき構成は、通常、上表層よりSn層、Cu−Sn金属間化合物層の順で構成される(特開2002−298963号公報参照)が、そのほか、表層よりSn層、Cu−Sn金属間化合物層、Ni層の順で構成される表面被覆層構造(特開2004−68026号公報、特開2005−226097号公報参照)を有していてもよい。各被覆層の厚さは、Sn層が0.01〜2μm、望ましくは0.02〜1μm、Cu−Sn金属間化合物層が0.01〜1μm、Ni層が1μm以下(ゼロを含む)が望ましい。   The surface coating layer structure of the copper alloy plate with Sn plating according to the present invention may have another surface coating layer on the base of the Sn plating layer. When Sn plating is performed on a copper alloy plate material, the plating structure is usually composed of an Sn layer and a Cu-Sn intermetallic compound layer in this order from the upper surface layer (see JP 2002-298963 A). In addition, it has a surface coating layer structure (see Japanese Patent Application Laid-Open Nos. 2004-68026 and 2005-226097) composed of a Sn layer, a Cu—Sn intermetallic compound layer, and a Ni layer in this order from the surface layer. Also good. The thickness of each coating layer is 0.01 to 2 μm for the Sn layer, desirably 0.02 to 1 μm, 0.01 to 1 μm for the Cu—Sn intermetallic compound layer, and 1 μm or less (including zero) for the Ni layer. desirable.

また、本発明に係るSnめっき付き銅合金板の母材として、特開2006−77307号公報、特開2006-183068号公報、特開2007-258156号公報等に開示された、特徴的な表面形態を有する(ダル圧延等により表面粗さ(凹凸)を通常より大きくした)銅合金板を使用することもできる。この場合、銅合金板表面に、必要に応じてNiめっきを行った後、Cuめっき及びSnめっきを行い、リフロー処理後、必要に応じてさらにSnフラッシュめっきを行う。これにより、Sn層、Cu−Sn金属間化合物層、さらにNi層(Niめっきを行った場合)からなる表面被覆層が形成される。   Further, as a base material of the Sn-plated copper alloy plate according to the present invention, a characteristic surface disclosed in JP 2006-77307 A, JP 2006-183068 A, JP 2007-258156 A, etc. A copper alloy plate having a form (surface roughness (unevenness) larger than usual by dull rolling or the like) can also be used. In this case, the surface of the copper alloy plate is subjected to Ni plating as necessary, followed by Cu plating and Sn plating, and after reflow treatment, Sn flash plating is further performed as necessary. Thereby, the surface coating layer which consists of Sn layer, Cu-Sn intermetallic compound layer, and also Ni layer (when Ni plating is performed) is formed.

本発明に係るSnめっき付き銅合金板は、Snめっき層の下地にCu−Sn金属間化合物層を有し、あるいはさらにNi層を有することにより、課題であるPbフリーはんだ付け性の維持だけでなく、経時後の電気的信頼性、耐熱剥離性、低挿入力化も付与でき、PCBオス端子用材料としてより好適なものとなる。前記特徴的な表面形態を有する銅合金板を用いる場合、さらに低挿入力化が実現できる。   The copper alloy plate with Sn plating according to the present invention has a Cu-Sn intermetallic compound layer as an underlayer of the Sn plating layer, or further has a Ni layer, so that only Pb-free solderability that is a problem is maintained. In addition, electrical reliability after the passage of time, heat-resistant peelability, and low insertion force can be imparted, which is more suitable as a material for PCB male terminals. When a copper alloy plate having the characteristic surface form is used, a lower insertion force can be realized.

表1に示すNo.1〜30の組成の銅合金を小型電気炉で大気中にて木炭皮膜下で溶解し、厚さ50mm、幅80mm、長さ180mmの鋳塊を溶製した。作製した上記鋳塊の表裏面を各5mm面削した後、930℃で熱間圧延を行い、厚さ12mmtの板材とした。さらに、板材の表裏面をそれぞれ約1mm面削した。なお、No.20,24は熱間割れが発生したため、熱間圧延以降の工程は取り止めた。   No. shown in Table 1. A copper alloy having a composition of 1 to 30 was melted under a charcoal coating in the air in a small electric furnace to produce an ingot having a thickness of 50 mm, a width of 80 mm, and a length of 180 mm. The front and back surfaces of the produced ingot were each cut by 5 mm, and then hot rolled at 930 ° C. to obtain a plate material having a thickness of 12 mmt. Further, the front and back surfaces of the plate material were each cut by about 1 mm. In addition, No. Since 20 and 24 had hot cracking, the process after hot rolling was canceled.

Figure 0005311860
Figure 0005311860

これらの板材について、冷間圧延を行った後、焼鈍を行い、続いて冷間圧延及び焼鈍を適宜行い、最終の仕上げ冷間圧延により板厚を0.64mmtとした。焼鈍はいずれも、200℃〜600℃×0.5〜10時間の範囲内で、Fe−P,Ni−P化合物等が析出し(Fe−P系又はNi−P系の場合)、焼鈍後の再結晶粒の平均粒径が50μm以下、又は再結晶しない条件を選択した。
仕上げ冷間圧延後の板材について、20〜300秒程度の範囲で低温焼鈍を行った。このときの焼鈍条件は、仕上げ低温焼鈍前の硬さに対し低温焼鈍後の硬さが65%〜95%となるように選択した。
These plate materials were cold-rolled and then annealed, followed by appropriate cold-rolling and annealing, and the final finish cold-rolling to a thickness of 0.64 mm. Any annealing is performed within the range of 200 ° C. to 600 ° C. × 0.5 to 10 hours, and Fe—P, Ni—P compounds, etc. are deposited (in the case of Fe—P or Ni—P), and after annealing. The average particle size of the recrystallized grains was selected to be 50 μm or less, or the conditions for not recrystallizing.
The plate material after finish cold rolling was subjected to low temperature annealing in the range of about 20 to 300 seconds. The annealing conditions at this time were selected such that the hardness after low-temperature annealing was 65% to 95% with respect to the hardness before finishing low-temperature annealing.

得られた銅合金板から試験片を採取し、曲げ加工性試験、硬さ測定、導電率測定を下記要領で行った。その結果を下記表3に示す。ただし、曲げ加工試験で不良と評価されたNo.18(No.18以外は全て良と評価)は、その他の試験を取り止めた。
[曲げ加工性]
長さ方向が板材の圧延方向に対し平行方向(LD)及び直角方向(TD)になるように幅10mm、長さ30mmの供試材を切り出し、曲げ線が長さ方向に垂直になるように、CESM0002金属材料W曲げ試験に規定されているB型曲げ治具を用いてはさみ、島津製作所製万能試験機RH−30を使用して1tの荷重でR/t=2(R:曲げ半径、t:板厚)にて90°W曲げ加工を行った後、曲げ部の割れの有無を観察し、割れのないものを良、割れが発生したものを不良と評価した。
[硬さ測定]
マイクロビッカース硬さ硬度計を用い、JISZ2244の規定に基づき、500gfでの硬さを測定した。
[導電率測定]
導電率はJISH0505に基づいて測定した。
Test pieces were collected from the obtained copper alloy plate, and subjected to bending workability test, hardness measurement, and conductivity measurement in the following manner. The results are shown in Table 3 below. However, No. evaluated as defective in the bending test. 18 (all other than No. 18 evaluated as good) canceled the other tests.
[Bending workability]
A specimen having a width of 10 mm and a length of 30 mm is cut out so that the length direction is parallel to the rolling direction of the plate material (LD) and perpendicular direction (TD), and the bending line is perpendicular to the length direction. Scissors using a B-type bending jig defined in the CESM0002 metal material W bending test, and using a universal testing machine RH-30 manufactured by Shimadzu Corporation, R / t = 2 (R: bending radius, After 90 ° W bending was performed at t: plate thickness), the presence or absence of cracks in the bent portion was observed, and those without cracks were evaluated as good and those with cracks were evaluated as defective.
[Hardness measurement]
Using a micro Vickers hardness tester, the hardness at 500 gf was measured based on the provisions of JISZ2244.
[Conductivity measurement]
The conductivity was measured based on JISH0505.

次に、No.18,20,24以外の銅合金板について、表2に示す条件にて、Cuめっき及びリフローSnめっき(Snめっき及びリフロー処理)を行い、平均厚さ0.5μmの純Sn層、平均厚さ0.4μmのCu−Sn金属間化合物層からなる表面被覆層を有するSnめっき付き銅合金板を製造した。純Sn層厚さ及びCu−Sn金属間化合物層厚さの測定方法を下記に示す。
[純Sn層厚さ測定]
蛍光X線膜厚計を用いてSnめっき厚さを測定する。その後、p−ニトロフェノール及び苛性ソーダを主成分とする剥離液に10分間浸漬し、純Sn層を剥離後、蛍光X線膜厚計を用いて、Cu−Sn金属間化合物層中のSn量を測定する。Snめっき厚さからCu−Sn金属間化合物層中のSn量を引くことにより、純Sn層厚さを算出した。
[Cu−Sn金属間化合物層厚さ測定]
Cu−Sn金属間化合物層厚さの測定は、板材断面をミクロトームにより切断し、その切断面をSEM観察により測定した。
Next, no. For copper alloy plates other than 18, 20, and 24, Cu plating and reflow Sn plating (Sn plating and reflow treatment) were performed under the conditions shown in Table 2, and a pure Sn layer having an average thickness of 0.5 μm and an average thickness A copper alloy plate with Sn plating having a surface coating layer composed of a 0.4 μm Cu—Sn intermetallic compound layer was produced. The measuring method of pure Sn layer thickness and Cu-Sn intermetallic compound layer thickness is shown below.
[Measurement of pure Sn layer thickness]
The Sn plating thickness is measured using a fluorescent X-ray film thickness meter. Then, after dipping in a stripping solution containing p-nitrophenol and caustic soda as main components for 10 minutes and stripping the pure Sn layer, the amount of Sn in the Cu-Sn intermetallic compound layer is measured using a fluorescent X-ray film thickness meter. taking measurement. The pure Sn layer thickness was calculated by subtracting the amount of Sn in the Cu—Sn intermetallic compound layer from the Sn plating thickness.
[Cu-Sn intermetallic compound layer thickness measurement]
The Cu-Sn intermetallic compound layer thickness was measured by cutting the cross section of the plate with a microtome and measuring the cut surface with SEM observation.

Figure 0005311860
Figure 0005311860

続いて、各Snめっき付き銅合金板から試験片を採取し、Pbフリーはんだ付け性評価を下記要領で行った。その結果を表3に示す。
[Pbフリーはんだ付け性評価]
0.64mmw×30mmlの試験片を打抜き加工し、湿潤試験機にて湿潤経時させた(経時条件:85℃×85%RH×48Hr)試験片(経時試験片)と、湿潤経時させていない打抜き直後の試験片(非経時試験片)について、はんだ付け性の評価を行った。
はんだ付け条件は、市販のSn−3質量%Ag−0.5質量%Cuはんだを260±5℃に保持し溶融させ、各試験片を浸漬速度25mm/sec、浸漬深さ12mm、浸漬時間5secにて溶融はんだ中に浸漬させた。はんだ付け装置として、ソルダーチェッカー((株)レスカ製;SAT5100型)を用いた。フラックスには非活性フラックス(α100;株式会社日本アルファメタルズ)を使用し、経時試験片及び非経時試験片について濡れ時間を測定した。はんだ付け性は、濡れ時間2sec未満の場合は○(良)、2sec以上の場合を×(不良)と評価した。外観評価は、湿潤経時試験片の端面及びめっき面について行い、端面については、はんだ付着面積率が70%未満を×(不良)、70%以上を○(良)、95%以上を◎(優)と評価し、めっき面については、ディウェットやピットが観察される場合を×(不良)、はんだ表面の荒れが観察されるものを△(やや不良)、見られない場合を○(良)と評価した。
Then, the test piece was extract | collected from each copper plating plate with Sn plating, and Pb free solderability evaluation was performed in the following way. The results are shown in Table 3.
[Pb-free solderability evaluation]
A test piece (0.64 mmw × 30 mml) was punched and subjected to wet aging with a wet tester (aging condition: 85 ° C. × 85% RH × 48 Hr), and a test piece (temporal test piece) was punched without wet aging. The immediately following test piece (non-aging test piece) was evaluated for solderability.
The soldering conditions were: commercially available Sn-3 mass% Ag-0.5 mass% Cu solder was held at 260 ± 5 ° C. and melted, and each test piece was immersed at a rate of 25 mm / sec, an immersion depth of 12 mm, and an immersion time of 5 sec. Soaked in molten solder. A solder checker (manufactured by Resuka Co., Ltd .; SAT5100 type) was used as a soldering apparatus. An inactive flux (α100; Nippon Alpha Metals Co., Ltd.) was used as the flux, and the wetting time was measured for the time-lapse test pieces and the non-time-lapse test pieces. The solderability was evaluated as ◯ (good) when the wetting time was less than 2 sec, and x (defective) when it was 2 sec or longer. Appearance evaluation is performed on the end surface and the plating surface of the wet aging test piece. For the end surface, the solder adhesion area ratio is less than 70% x (defect), 70% or more ○ (good), 95% or more ◎ (excellent). ), With respect to the plated surface, x (defect) is observed when dewetting or pits are observed, △ (slightly defective) is observed when the solder surface is rough, and ○ (good) when it is not observed. It was evaluated.

Figure 0005311860
Figure 0005311860

表3に示すように、No.1〜12は、打抜き直後及び湿潤経時後のはんだ濡れ性に優れ、打抜き端面のはんだ付着面積率が高く、Pbフリーはんだ付け性に優れている。また、硬さは130MHv以上で強度が高く、導電率も30%IACS以上が得られている。
これに対し、No.14,15,23,29,30は、Zn又はNiを含まないか、含有量が本発明の規定より少ないため、Pbフリーはんだ付け性が劣る。No.16はZn含有量が過剰なため、Pbフリーはんだ付け性が劣り、No.27,28はさらに導電率が劣る。No.17,19,23,25は、Fe,Ni又はPの含有量が本発明の規定より少ないため、硬さが低く、十分な強度が得られていない。No.13,21,22,26はNi又はSnが過剰なため、導電率が低い。
As shown in Table 3, no . Nos. 1 to 12 have excellent solder wettability immediately after punching and after wet aging, have a high solder adhesion area ratio at the punched end face, and are excellent in Pb-free solderability. Further, the hardness is 130 MHv or higher, the strength is high, and the conductivity is 30% IACS or higher.
In contrast, no. Since 14, 15, 23, 29, and 30 do not contain Zn or Ni, or the content is less than that of the present invention, Pb-free solderability is inferior. No. No. 16 is inferior in Pb-free solderability due to excessive Zn content. 27 and 28 are further inferior in electrical conductivity. No. Nos. 17, 19, 23, and 25 have Fe, Ni, or P content less than that of the present invention, so that the hardness is low and sufficient strength is not obtained. No. 13, 21, 22, and 26 have a low electrical conductivity because of excessive Ni or Sn.

実施例1のNo.1の組成の銅合金を用い、実施例1と同じ方法で、板厚0.64mmtの銅合金板を得た。表4のNo.33,34は、特開2007-258156号公報の開示に従い、ダルロールで調質圧延して銅合金板表面を粗面化(凹凸)した。
続いて、表2に示す条件にてNiめっきを行い(あるいは行わず)、Cuめっきを行い(あるいは行わず)、さらにSnめっき(ただし、No.36は溶融Snめっき)を行い、No.35,36を除いてさらにリフロー処理を行った。No.33は、特開2007-258156号公報の開示に従い、さらにSnフラッシュめっき(0.05μm)を行った。
No. of Example 1 A copper alloy plate having a thickness of 0.64 mmt was obtained in the same manner as in Example 1 using a copper alloy having a composition of 1. No. in Table 4 Nos. 33 and 34 were subjected to temper rolling with a dull roll in accordance with the disclosure of Japanese Patent Application Laid-Open No. 2007-258156 to roughen (uneven) the copper alloy sheet surface.
Subsequently, Ni plating is performed (or not performed) under the conditions shown in Table 2, Cu plating is (or is not performed), Sn plating (however, No. 36 is molten Sn plating) is performed. Reflow processing was further performed except for 35 and 36. No. No. 33 was further subjected to Sn flash plating (0.05 μm) in accordance with the disclosure of Japanese Patent Application Laid-Open No. 2007-258156.

次に、得られたSnめっき付き銅合金板について、純Sn層、Cu−Sn合金層、Ni層及びNi−Sn層の厚さを前記及び下記要領で測定し、Pbフリーはんだ付け性、接触信頼性、はんだ耐熱剥離性及び摩擦係数の試験を前記及び下記要領で行い、表4に示す結果を得た。
なお、備考欄に後めっき相当と記載されたNo.37,38は、他の実施例と同様に先めっき材であるが、Snめっき厚さを従来の後めっき材と同等の厚さとしたものである。
Next, with respect to the obtained copper alloy plate with Sn plating, the thicknesses of the pure Sn layer, the Cu—Sn alloy layer, the Ni layer and the Ni—Sn layer were measured as described above and below, and Pb-free solderability, contact Tests of reliability, heat resistance peelability and friction coefficient were conducted as described above and below, and the results shown in Table 4 were obtained.
In addition, No. described in the remarks column as equivalent to post-plating. 37 and 38 are pre-plated materials as in the other embodiments, but the Sn plating thickness is equivalent to that of the conventional post-plated material.

[Ni層厚さ測定]
Ni層厚さは蛍光X線膜厚計を用いて測定した。
[Ni−Sn層厚さ測定]
Ni−Sn金属間化合物層厚さの測定は、板材断面をミクロトームにより切断し、その切断面をSEM観察により測定した。
[耐熱剥離性評価]
耐熱剥離性評価は、はんだ付け試験した短冊状の試験片を180℃で48Hr大気中にて加熱を行った後、180°の曲げ戻しを行い、曲げ戻し部のテープ剥離試験にて評価した。剥離が生じた場合を×(不良)、生じなかった場合を○(良)とした。
[Ni layer thickness measurement]
The Ni layer thickness was measured using a fluorescent X-ray film thickness meter.
[Ni-Sn layer thickness measurement]
The Ni—Sn intermetallic compound layer thickness was measured by cutting the cross section of the plate with a microtome and measuring the cut surface with SEM observation.
[Heat-resistant peelability evaluation]
The heat-resistant peelability evaluation was performed by heating a strip-shaped test piece subjected to soldering test at 180 ° C. in the atmosphere for 48 hours, then bending back at 180 °, and evaluating by a tape peeling test at the bent back portion. The case where peeling occurred was marked as x (defect), and the case where peeling did not occur was marked as o (good).

[接触信頼性評価]
接触信頼性は、4端子法により、解放電圧20mV、電流10mAで金プローブ(1.0mmφ)を用いて測定した。測定荷重は300gf(摺動状態)である。評価は、接触抵抗1mΩ以下を◎(優)、接触抵抗3mΩ以下を○(良)、3mΩを越えた場合は×(不良)と評価した。
[摩擦係数評価]
摩擦係数は錫めっき材を半径(内径)1.5mmで張り出し加工したメス側舌片とオス側舌片の錫めっき板材を接触させ、オス側舌片を水平に引っ張るようにして、オートグラフにて測定した。この際、接圧力はメス側舌片を取り付けた軸にかけた荷重(N=300gf)であり、オス側舌片を引っ張る速度は80m/minとした。摩擦係数値(μ)は次式のように、ロードセルによって測定した水平方向にかかる力(F)を荷重(N)で割ったものである。
μ=F/N
摩擦係数μが0.6未満を○(良)、0.6以上を×(不良)と評価した。
[Contact reliability evaluation]
The contact reliability was measured by a four probe method using a gold probe (1.0 mmφ) at a release voltage of 20 mV and a current of 10 mA. The measurement load is 300 gf (sliding state). In the evaluation, a contact resistance of 1 mΩ or less was evaluated as ◎ (excellent), a contact resistance of 3 mΩ or less was evaluated as ◯ (good), and 3 mΩ was evaluated as x (defect).
[Friction coefficient evaluation]
The friction coefficient is an autograph that is obtained by contacting the tin plate of the female side tongue and the male side tongue piece, which has been tinned with a radius (inner diameter) of 1.5 mm, and pulling the male side tongue piece horizontally. Measured. At this time, the contact pressure was a load (N = 300 gf) applied to the shaft to which the female tongue piece was attached, and the pulling speed of the male tongue piece was 80 m / min. The coefficient of friction (μ) is obtained by dividing the force (F) applied in the horizontal direction measured by the load cell by the load (N) as in the following equation.
μ = F / N
A friction coefficient μ of less than 0.6 was evaluated as ○ (good), and 0.6 or more was evaluated as × (bad).

Figure 0005311860
Figure 0005311860

表4より、No.31〜36は、課題である打抜き直後及び湿潤経時後のPbフリーはんだ付け性に優れている。また、経時後の接触信頼性、はんだ耐熱剥離性及び低挿入力化(摩擦係数)が実現されている。
一方、No.37〜40も、課題である打抜き直後及び湿潤経時後のPbフリーはんだ付け性と、はんだ耐熱剥離性が優れている。しかし、No.37は後めっき材と同等の純Sn層厚さを有するため摩擦係数が大きく、No.38はCu−Sn合金層がバリア層として存在しない(Ni−Sn層が形成されている)ため、さらに接触信頼性が劣る。No.39もCu−Sn合金層がバリア層として存在しないため、接触信頼性が劣る。No.40はCu−Sn合金層の厚さが0.01μm未満と薄いため、接触信頼性が劣る。
このように、適切なめっき構成(それ自体公知)を選択することにより、課題であるPbフリーはんだ付け性だけでなく、経時後の接触信頼性及びはんだ耐熱剥離性の向上及び低挿入力化(摩擦係数)を実現することができる。
From Table 4, No. Nos. 31 to 36 are excellent in Pb-free solderability immediately after punching, which is a problem, and after wet aging. In addition, contact reliability after a lapse of time, solder heat resistance peelability, and low insertion force (friction coefficient) are realized.
On the other hand, no. Nos. 37 to 40 also have excellent Pb-free solderability immediately after punching and after wet aging, as well as excellent solder heat release properties. However, no. No. 37 has a pure Sn layer thickness equivalent to that of the post-plating material, and therefore has a large friction coefficient. In No. 38, since the Cu—Sn alloy layer does not exist as a barrier layer (Ni—Sn layer is formed), the contact reliability is further inferior. No. 39 also has poor contact reliability because the Cu—Sn alloy layer does not exist as a barrier layer. No. No. 40 is inferior in contact reliability because the Cu—Sn alloy layer is as thin as less than 0.01 μm.
In this way, by selecting an appropriate plating configuration (known per se), not only Pb-free solderability, which is a problem, but also improvement in contact reliability and solder heat resistance peelability after aging and low insertion force ( Friction coefficient) can be realized.

Claims (4)

両表面にSnめっき層を有し両端面にプレス打抜き加工によるせん断切り口面を有し、PCBにPbフリーはんだ付けするPCBオス端子を製造するためのPCBオス端子用Snめっき付き銅合金板において、銅合金がFe:0.05〜2.6質量%、P:0.01〜0.2質量%、及びZn:0.01〜5質量%とNi:0.01〜2質量%の1種又は2種を含み、残部Cu及び不可避不純物からなることを特徴とするPbフリーはんだ付け性に優れるPCBオス端子用Snめっき付き銅合金板。 Have a shear cut surface by press stamping to both end surfaces having a Sn plating layer on both surfaces, the PCB male Sn-plated copper alloy sheet with terminals for producing PCB male terminal to attach Pb-free solder in PCB, Copper alloy is Fe: 0.05-2.6% by mass, P: 0.01-0.2% by mass, Zn: 0.01-5% by mass and Ni: 0.01-2% by mass Or the copper alloy board with Sn plating for PCB male terminals which is excellent in Pb-free solderability characterized by including 2 types and remainder Cu and an unavoidable impurity. 両表面にSnめっき層を有し両端面にプレス打抜き加工によるせん断切り口面を有し、PCBにPbフリーはんだ付けするPCBオス端子を製造するためのPCBオス端子用Snめっき付き銅合金板において、銅合金がNi:0.01〜2質量%、P:0.01〜0.2質量%を含み、残部Cu及び不可避不純物からなることを特徴とするPbフリーはんだ付け性に優れるPCBオス端子用Snめっき付き銅合金板。 Have a shear cut surface by press stamping to both end surfaces having a Sn plating layer on both surfaces, the PCB male Sn-plated copper alloy sheet with terminals for producing PCB male terminal to attach Pb-free solder in PCB, For PCB male terminal excellent in Pb-free solderability, characterized in that the copper alloy contains Ni: 0.01-2 mass%, P: 0.01-0.2 mass%, and consists of the balance Cu and inevitable impurities Copper alloy plate with Sn plating. さらにZn:0.01〜5質量%を含むことを特徴とする請求項2に記載されたPbフリーはんだ付け性に優れるPCBオス端子用Snめっき付き銅合金板。 Furthermore, Zn: 0.01-5 mass% is contained, The copper alloy board with Sn plating for PCB male terminals excellent in Pb free solderability described in Claim 2 characterized by the above-mentioned. さらにCo,Mn,Siの1種又は2種以上を、各元素0.001〜0.2質量%、合計で0.001〜0.6質量%含むことを特徴とする請求項1〜3のいずれかに記載されたPbフリーはんだ付け性に優れるPCBオス端子用Snめっき付き銅合金板。 Further Co, Mn, 1 or two or more of Si, the elements 0.001 to 0.2 wt%, of the preceding claims, characterized in that it comprises 0.001 to 0.6 mass% in total The copper alloy board with Sn plating for PCB male terminals excellent in Pb free solderability described in any one.
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