TWI591845B - Optoelectronic system - Google Patents

Optoelectronic system Download PDF

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TWI591845B
TWI591845B TW105117581A TW105117581A TWI591845B TW I591845 B TWI591845 B TW I591845B TW 105117581 A TW105117581 A TW 105117581A TW 105117581 A TW105117581 A TW 105117581A TW I591845 B TWI591845 B TW I591845B
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photovoltaic
light
system unit
layer
electrical connection
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TW105117581A
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TW201637234A (en
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謝明勳
韓政男
洪盟淵
劉欣茂
李宗憲
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晶元光電股份有限公司
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光電系統Photoelectric system

本發明係關於一種光電系統,尤關於一種具有整合性之發光系統。The present invention relates to an optoelectronic system, and more particularly to an integrated illumination system.

光電元件如發光二極體之封裝結構主要係產自於繁複之單晶片封裝流程。未封裝之光電元件經封裝後,再結合其他電子元件,如電容、電感等,及/或非電子元件,可以形成一光電系統。The package structure of a photovoltaic element such as a light-emitting diode is mainly produced from a complicated single-chip package process. The unpackaged optoelectronic component can be packaged and then combined with other electronic components, such as capacitors, inductors, etc., and/or non-electronic components to form an optoelectronic system.

然而,在電子消費產品小型化與輕薄化的發展趨勢下,光電元件的開發也朝向更小的封裝尺寸。其中,晶片級封裝(Chip-Level Package;CLP)係為半導體以及光電元件封裝設計的期待方式之一。However, under the trend of miniaturization and thinning of electronic consumer products, the development of optoelectronic components has also moved toward smaller package sizes. Among them, Chip-Level Package (CLP) is one of the expected ways of designing semiconductors and optoelectronic components.

本發明揭露一光電系統。光電結構,包含:一光電元件,具有一第一寬度; 一膠材,包覆光電元件且具有一第二寬度,第二寬度大於第一寬度;一螢光粉結構,形成在光電元件與膠材間;以及一透光基板,形成在膠材上。The invention discloses an optoelectronic system. The photoelectric structure comprises: a photoelectric element having a first width; a rubber material covering the photovoltaic element and having a second width, the second width being greater than the first width; and a phosphor powder structure formed on the photovoltaic element and the glue And a transparent substrate formed on the rubber material.

如第2A~第2D圖所例示,依據本發明之一實施例之光電系統100之製造方法簡述如下:二或多個系統單元30係初步配置於一載具10上;利用材料40維持各個系統單元30間之空間關係;使系統單元30與載具10相分離;以及依需求建立系統單元30間之電性連接60。惟上述各步驟之執行順序或選擇並不限於此,使用者當可依實際製造環境或條件安排之。As illustrated in FIGS. 2A-2D, the manufacturing method of the photovoltaic system 100 according to an embodiment of the present invention is briefly described as follows: two or more system units 30 are initially disposed on a carrier 10; The spatial relationship between system units 30; the separation of system unit 30 from carrier 10; and the establishment of electrical connections 60 between system units 30 as desired. However, the order or selection of the above steps is not limited thereto, and the user may arrange according to the actual manufacturing environment or conditions.

詳言之,依據本發明之實施例之光電系統100係包括二或多個系統單元30以形成一光能與電能之傳輸、轉換網絡(network)。系統單元30係位於網絡中,並提供光或電機能至少其一。舉例而言,光電系統100係可接收訊號、電能以輸出光,或接收光以輸出電能、訊號。於應用上,光電系統100可以用於照明、影像顯示、影像辨識、影像重製、電力輸出、資料儲存、機械加工等。In particular, photovoltaic system 100 in accordance with an embodiment of the present invention includes two or more system units 30 to form a transmission, conversion network of light energy and electrical energy. System unit 30 is located in the network and provides at least one of light or motor capability. For example, the optoelectronic system 100 can receive signals, electrical energy to output light, or receive light to output electrical energy, signals. In application, the photoelectric system 100 can be used for illumination, image display, image recognition, image reproduction, power output, data storage, machining, and the like.

具體而言,光電系統100係為發光二極體(LED)、光電二極體(photodiode)、光敏電阻(photoresister)、雷射(laser)、紅外線發射體(infrared emitter)、及太陽能電池(solar cell)等具光電機能之系統單元30中至少其一之集成(integration)、組合、堆疊。此外,光電系統100尚可選擇性地容納電阻、電容、電感、二極體、積體電路等非光電機能之系統單元30。Specifically, the photovoltaic system 100 is a light emitting diode (LED), a photodiode, a photoresist, a laser, an infrared emitter, and a solar cell (solar). Integrating, combining, and stacking at least one of the system units 30 having the optical motor capability. In addition, the photovoltaic system 100 can selectively accommodate non-photovoltaic system units 30 such as resistors, capacitors, inductors, diodes, and integrated circuits.

載具10係為系統單元30提供一成長、承載基礎。候選材料其一係包含但不限於鍺(Ge)、砷化鎵(GaAs)、銦化磷(InP)、藍寶石(Sapphire)、碳化矽(SiC)、矽(Si)、鋁酸鋰(LiAlO2)、氧化鋅(ZnO)、氮化鎵(GaN)、氮化鋁(AlN)、金屬、玻璃、複合材料(Composite)、鑽石、CVD鑽石、與類鑽碳(Diamond-Like Carbon;DLC)等。The carrier 10 provides a growth and bearing basis for the system unit 30. The candidate materials include but are not limited to germanium (Ge), gallium arsenide (GaAs), indium phosphate (InP), sapphire (Sapphire), tantalum carbide (SiC), germanium (Si), lithium aluminate (LiAlO2). Zinc oxide (ZnO), gallium nitride (GaN), aluminum nitride (AlN), metal, glass, composite, diamond, CVD diamond, and diamond-like carbon (DLC).

於本發明之一實施例中,一或二個以上之系統單元30之完整或主要結構係完成於載具10之上。具體而言,載具10係作為此系統單元30之構建基礎。例如,一或二個以上之系統單元30係藉由化學沈積、物理沈積、電鍍、合成、自組裝(self-assembly)等法形成於載具10之上。此外,除上述製造方法外,切割、研磨、拋光、微影、蝕刻、熱處理等亦可選擇性地應用於完成系統單元30之中。In one embodiment of the invention, the complete or primary structure of one or more system units 30 is completed over the carrier 10. Specifically, the carrier 10 is the basis for the construction of this system unit 30. For example, one or more system units 30 are formed on the carrier 10 by chemical deposition, physical deposition, electroplating, synthesis, self-assembly, and the like. Further, in addition to the above manufacturing methods, cutting, grinding, polishing, lithography, etching, heat treatment, and the like may be selectively applied to the completion of the system unit 30.

依據本發明之一實施例之系統單元30係一光電半導體,其形成方式係藉由磊晶成長多層半導體層於一作為載具10之成長基板之上。若二個以上之系統單元30係形成於一共同基板之上,相鄰系統單元30間可藉由形成溝槽或絕緣區以達電性、物理分離。惟系統單元30間之電性佈局(electrical layout)尚可利用內部連接、外部連接、或其二者達成。相關文獻可參見本案申請人之台灣專利第434917號及第I249148號,其並被援引為本案之一部分。The system unit 30 according to an embodiment of the present invention is an optoelectronic semiconductor formed by epitaxially growing a multilayer semiconductor layer on a growth substrate as the carrier 10. If more than two system units 30 are formed on a common substrate, adjacent system units 30 can be electrically and physically separated by forming trenches or insulating regions. However, the electrical layout between system units 30 can be achieved using internal connections, external connections, or both. Related documents can be found in the applicant's Taiwan Patent No. 434917 and No. I249148, which are hereby incorporated by reference.

具體而言,系統單元30最少包含一第一電性層、一轉換部、以及一第二電性層。第一電性層及第二電性層係彼此中至少二個部分之電性、極性或摻雜物相異、或者係分別用以提供電子與電洞之半導體材料單層或多層(「多層」係指二層或二層以上,以下同。),其電性選擇可以為p型、n型、及i型中至少任意二者之組合。轉換部係位於第一電性層及第二電性層之間,為電能與光能可能發生轉換或被誘發轉換之區域。電能轉變或誘發光能者係如發光二極體、液晶顯示器、有機發光二極體;光能轉變或誘發電能者係如太陽能電池、光電二極體。Specifically, the system unit 30 includes at least a first electrical layer, a conversion portion, and a second electrical layer. The first electrical layer and the second electrical layer are different in electrical conductivity, polarity or dopant from each other, or are used to provide electrons and holes, respectively, in a single layer or multiple layers of semiconductor material ("multilayer "" means two or more layers, the same applies hereinafter.), the electrical selection may be a combination of at least any of p-type, n-type, and i-type. The conversion portion is located between the first electrical layer and the second electrical layer, and is a region where electrical energy and light energy may be converted or induced to be converted. Those who convert or induce light energy are such as light-emitting diodes, liquid crystal displays, and organic light-emitting diodes; those that convert or induce light energy are such as solar cells and photodiodes.

依據本發明之另一實施例之系統單元30係一發光二極體,其發光頻譜可以藉由改變半導體單層或多層之物理或化學要素進行調整。常用之材料係如磷化鋁鎵銦(AlGaInP)系列、氮化鋁鎵銦(AlGaInN)系列、氧化鋅(ZnO)系列等。轉換部之結構係如:單異質結構(single heterostructure;SH)、雙異質結構(double heterostructure;DH)、雙側雙異質結構(double-side double heterostructure;DDH)、或多層量子井(multi-quantum well;MQW)。再者,調整量子井之對數亦可以改變發光波長。The system unit 30 according to another embodiment of the present invention is a light-emitting diode whose light-emitting spectrum can be adjusted by changing the physical or chemical elements of the semiconductor single layer or layers. Commonly used materials are such as aluminum gallium indium phosphide (AlGaInP) series, aluminum gallium indium nitride (AlGaInN) series, zinc oxide (ZnO) series and the like. The structure of the conversion unit is as follows: single heterostructure (SH), double heterostructure (DH), double-side double heterostructure (DDH), or multi-quantum (multi-quantum) Well; MQW). Furthermore, adjusting the logarithm of the quantum well can also change the wavelength of the illumination.

於本發明一實施例中,一或二個以上之系統單元30係完成於固定於載具10上之前,亦即,載具10及系統單元30於建立關聯前本係彼此獨立分離。具體而言,載具10係作為此系統單元30之支撐。例如,一或二個以上之系統單元30係藉由膠、金屬、壓力、熱等連接手段固定於載具10之上。相關文獻可參見本案申請人之台灣專利第311287號、第456058號、第474034號、及第493286號,其並被援引為本案之一部分。此外,於建立關連之過程中,可採機械或人工方式將系統單元30放置於載具10之上。In one embodiment of the invention, one or more of the system units 30 are completed prior to being secured to the carrier 10, that is, the carrier 10 and the system unit 30 are separated from each other independently prior to establishing association. Specifically, the carrier 10 is supported by the system unit 30. For example, one or more system units 30 are secured to the carrier 10 by means of bonding means such as glue, metal, pressure, heat, or the like. Related documents can be found in the applicant's Taiwan Patent Nos. 311287, 456058, 474034, and 493286, which are incorporated herein by reference. In addition, the system unit 30 can be placed on the carrier 10 in a mechanical or manual manner during the establishment of the connection.

如第3圖所示,完成或半完成之光電系統100可以選擇性地進一步與一外部體相接。此外部體係可以連接至光電系統100之任一單側或兩側。於數個實施例中,光電系統100係以具有電性連接60之外側與外部體10a相接;光電系統100係以相對於電性連接60之外側與外部體10b相接;或者光電系統100係以具有電性連接60之外側及其相對側二者與外部體10a、10b相接。惟光電系統100與外部體之相接並不限於以上態樣,光電系統100之任一外表面皆可以與適當之外部體相整合。具體而言,外部體係一單元、一構件、一裝置、一系統、一結構、一組成、或上述選擇之任意組合。例如,外部體係一基板,其材料係可選擇如前述載具10者、一電路集成、一光電系統、一主動元件、一被動元件、一電路元件集成、或一治具等。As shown in Figure 3, the completed or semi-finished photovoltaic system 100 can optionally be further coupled to an external body. The external system can be connected to either one or both sides of the photovoltaic system 100. In several embodiments, the optoelectronic system 100 is connected to the outer body 10a with the outer side of the electrical connection 60; the optoelectronic system 100 is connected to the outer body 10b with respect to the outer side of the electrical connection 60; or the optoelectronic system 100 The outer body 10a, 10b is connected to both the outer side having the electrical connection 60 and the opposite side thereof. However, the connection between the optoelectronic system 100 and the external body is not limited to the above, and any outer surface of the optoelectronic system 100 can be integrated with an appropriate external body. Specifically, an external system is a unit, a component, a device, a system, a structure, a component, or any combination of the above. For example, an external system-substrate, the material of which may be selected from the above-mentioned carrier 10, a circuit integration, an optoelectronic system, an active component, a passive component, a circuit component integration, or a fixture.

於本發明之一實施例中,系統單元30與載具10間尚形成有一層或結構20,如第4圖所示。此層或結構20係預期可達短期或長期連接部分或全部系統單元30與載具10之用。在此,「短期」係指時間早於或恰於光電系統100之製造、送達、或解封完成之時點;「長期」係指時間晚於光電系統100之製造、送達、或解封完成之時點,換言之,系統單元30與載具10間並不以相分離為必要。具體而言,此層或結構20係如膠體、膠帶、金屬單層、金屬複層、合金、半導體、夾具、或上述選擇之任意組合。此外,層或結構20除具有連接功能外,更可選擇性地納入反射、抗反射、電流阻障、擴散阻障、應力紓緩、導熱、隔熱等功能。例如,層或結構20中包含一反射面、一位於系統單元30與反射面間之上中介層、及一位於反射面與載具10間之下中介層。上中介層及下中介層係可同時或分別具有除反射功能外之上述其他功能,具體如連接、擴散阻障等功能。In one embodiment of the invention, a layer or structure 20 is formed between the system unit 30 and the carrier 10, as shown in FIG. This layer or structure 20 is intended to connect some or all of the system unit 30 to the carrier 10 for short or long term. Here, "short-term" means that the time is earlier or just before the completion of manufacture, delivery, or de-sealing of the photovoltaic system 100; "long-term" means that the time is later than the manufacture, delivery, or unsealing of the photovoltaic system 100. At this point, in other words, it is not necessary to separate the system unit 30 from the carrier 10. In particular, the layer or structure 20 is a gel, tape, metal monolayer, metal laminate, alloy, semiconductor, fixture, or any combination of the above. In addition, in addition to the connection function, the layer or structure 20 can selectively incorporate functions of reflection, anti-reflection, current blocking, diffusion barrier, stress relief, heat conduction, heat insulation and the like. For example, the layer or structure 20 includes a reflective surface, an interposer between the system unit 30 and the reflective surface, and an interposer between the reflective surface and the carrier 10. The upper interposer and the lower interposer may have the above-mentioned other functions in addition to the reflection function, such as connection, diffusion barrier, and the like.

於本發明另一實施例中,系統單元30及材料40更可以與一次載具50相接合,如第5圖所示。此接合可實施於第2A圖~第2D圖中任一步驟之前或之後。較佳地,此接合係實施於材料40導入製造流程之後,如第2B圖、第2C圖、或第2D圖之步驟之後。若次載體50係於第2B圖之步驟後即與系統單元30及材料40接合,則可以為後續製程提供一個較為可靠之中間結構。次載具50與系統單元30之接合方式可參照前述第4圖之說明,亦可為加壓手段、加熱手段、或其組合。具體而言,一接合層50a係形成於次載體50與系統單元30之間以達成接合其二者之目的。In another embodiment of the invention, the system unit 30 and the material 40 are more engageable with the primary carrier 50, as shown in FIG. This bonding can be performed before or after any of steps 2A-2D. Preferably, the bonding is performed after the material 40 is introduced into the manufacturing process, such as after the steps of FIG. 2B, FIG. 2C, or FIG. 2D. If the secondary carrier 50 is bonded to the system unit 30 and the material 40 after the step of FIG. 2B, a relatively reliable intermediate structure can be provided for subsequent processes. The manner of joining the sub-carrier 50 to the system unit 30 can be referred to the description of FIG. 4 described above, and can also be a pressurizing means, a heating means, or a combination thereof. Specifically, a bonding layer 50a is formed between the sub-carrier 50 and the system unit 30 for the purpose of bonding the two.

此外,接合層50a除具有連接功能外,更可選擇性地納入反射、抗反射、電流阻障、擴散阻障、應力紓緩、導熱、隔熱等功能,然而,該等功能之達成並不以藉由附加元件為必要,亦可以利用調整次載具50本身之成分、幾何形狀、加工方式等手段以達成。例如,於次載具50的至少一個出光面上形成反射、折射、散射、聚光、準直、遮蔽結構。此出光面係如與系統單元30相接之面、與材料40相接之面、與環境介質相接之面。具體而言,反射、折射、散射、聚光、遮蔽結構係如鏡面、規則凹凸面、不規則凹凸面、高折射率差異介面、光子晶體、凹透鏡、凸透鏡、菲涅耳透镜(Fresnel lens)、不透光面中至少其一。In addition, in addition to the connection function, the bonding layer 50a can selectively incorporate functions of reflection, anti-reflection, current blocking, diffusion barrier, stress relief, heat conduction, heat insulation, etc. However, the achievement of these functions is not It is also necessary to adjust the composition, geometry, processing method, and the like of the sub-carrier 50 by means of additional components. For example, reflection, refraction, scattering, concentrating, collimating, and shielding structures are formed on at least one of the light-emitting surfaces of the sub-carrier 50. The light-emitting surface is a surface that is in contact with the system unit 30, a surface that is in contact with the material 40, and a surface that is in contact with the environmental medium. Specifically, the reflection, refraction, scattering, concentrating, and shielding structures are, for example, a mirror surface, a regular uneven surface, an irregular concave surface, a high refractive index difference interface, a photonic crystal, a concave lens, a convex lens, a Fresnel lens, At least one of the opaque surfaces.

第6圖係例示依據本發明一實施例之光電系統100中至少二系統單元30之電連接態樣。於此,系統單元30係具有二個面向同方向之電極301,此結構之具體系統單元30係如一發光二極體,更具體言之,係一形成於一絕緣體,例如藍寶石,上之一發光二極體。圖(a)中,二系統單元30間係藉由導線60a連接正負極形成電性串聯;圖(b)中,二系統單元30間係藉由導線60a連接正極形成電性連接;圖(c)中,二系統單元30間係藉由導線60a連接負極形成電性連接。Figure 6 illustrates an electrical connection of at least two system units 30 in a photovoltaic system 100 in accordance with an embodiment of the present invention. Here, the system unit 30 has two electrodes 301 facing in the same direction. The specific system unit 30 of the structure is a light-emitting diode, and more specifically, is formed on an insulator such as sapphire. Diode. In the figure (a), the two system units 30 are electrically connected in series by connecting the positive and negative electrodes via the wire 60a; in the figure (b), the two system units 30 are electrically connected by connecting the positive electrode via the wire 60a; In the middle, the two system units 30 are electrically connected by connecting the negative electrodes to the wires 60a.

第7圖係例示依據本發明另一實施例之光電系統100中至少二系統單元30之電連接態樣。具體之實施方式可參考第6圖之說明。惟於本實施例中,系統單元30間之電連接係藉由於系統單元30上形成內部連接60b達成。內部連接60b之一種形成方式係於系統單元30之設定區域上形成隔離區60b’後沈積金屬材料。Figure 7 illustrates an electrical connection of at least two system units 30 in a photovoltaic system 100 in accordance with another embodiment of the present invention. For specific implementations, reference may be made to the description of FIG. In the present embodiment, however, the electrical connection between system units 30 is achieved by the formation of internal connections 60b on system unit 30. One form of internal connection 60b is formed by depositing a metal material after forming isolation region 60b' on a set region of system unit 30.

第8圖係例示依據本發明又一實施例之光電系統100中至少二系統單元30之電連接態樣。圖(a)及圖(b)中,系統單元30之電極301係調整或接續至大致相同之位置,如接近於或恰於材料40表面之位置。圖(a)中,二系統單元30間係藉由電性連接60,例如:導線60a或內部連接60b,連接正負極形成電性串聯;圖(b)中,二系統單元30間係藉由電性連接60,例如:導線60a或內部連接60b,連接電極301形成圖左中三種等效電路圖所示之電性連接之一。(c)中,二系統單元30係連接至一電路載體60c而成為一電網絡之一部分。Figure 8 illustrates an electrical connection of at least two system units 30 in a photovoltaic system 100 in accordance with yet another embodiment of the present invention. In Figures (a) and (b), the electrodes 301 of the system unit 30 are adjusted or spliced to substantially the same position, such as near or just to the surface of the material 40. In Figure (a), the two system units 30 are electrically connected in series by an electrical connection 60, such as a wire 60a or an internal connection 60b. In Figure (b), the two system units 30 are connected by The electrical connection 60, such as the wire 60a or the internal connection 60b, forms one of the electrical connections shown in the three equivalent circuit diagrams in the left diagram. In (c), the two system unit 30 is connected to a circuit carrier 60c to become part of an electrical network.

如第9A~第9D圖所例示,依據本發明之另一實施例之光電系統100之製造方法簡述如下:二或多個系統單元30係初步配置於一載具10上並於形成電性連接60於一側;利用材料40維持各個系統單元30間之空間關係;使系統單元30與載具10相分離;以及於系統單元30之另一側形成電性連接60。惟上述各步驟之執行順序或選擇並不限於此,使用者當可依實際製造環境或條件安排之。此外,第9D圖中二系統單元30兩側之電性連接60數量或位置僅為例示而非用以限制本發明之實施方式,使用者當可依照電路之特性安排、調整之。此外,於不顯相衝突之下,前述諸實施例之說明可為本實施例所參考或使用之。As illustrated in FIGS. 9A-9D, the manufacturing method of the photovoltaic system 100 according to another embodiment of the present invention is briefly described as follows: two or more system units 30 are initially disposed on a carrier 10 and are electrically formed. The connection 60 is on one side; the spatial relationship between the various system units 30 is maintained by the material 40; the system unit 30 is separated from the carrier 10; and the electrical connection 60 is formed on the other side of the system unit 30. However, the order or selection of the above steps is not limited thereto, and the user may arrange according to the actual manufacturing environment or conditions. In addition, the number or position of the electrical connections 60 on both sides of the two system units 30 in FIG. 9D is merely illustrative and not intended to limit the embodiments of the present invention, and the user can arrange and adjust according to the characteristics of the circuit. In addition, the description of the foregoing embodiments may be referred to or used in the present embodiments without conflict.

第10圖係例示依據本發明一實施例之光電系統100中至少二系統單元30之電連接態樣。圖(a)中,二系統單元30係同向配置,並藉由電性連接60分別連接正極和負極形成並聯,惟反向配置之系統單元30亦可藉由電性連接60之適當佈局形成並聯;圖(b)中,二系統單元30係反向配置,並藉由電性連接60連接正負極形成反向並聯,惟同向配置之系統單元30亦可藉由電性連接60之適當佈局形成反向並聯。圖(c)中,二系統單元30係連接至一電路載體60c而成為一電網絡之一部分。Figure 10 illustrates an electrical connection of at least two system units 30 in a photovoltaic system 100 in accordance with an embodiment of the present invention. In the figure (a), the two system units 30 are arranged in the same direction, and the positive and negative electrodes are respectively connected in parallel by the electrical connection 60, but the reversely disposed system unit 30 can also be formed by an appropriate layout of the electrical connection 60. In parallel (b), the two system units 30 are reversely arranged, and the positive and negative poles are connected by electrical connection 60 to form an anti-parallel connection. However, the system unit 30 in the same direction can also be electrically connected 60. The layout forms an anti-parallel. In Figure (c), the two system unit 30 is connected to a circuit carrier 60c and becomes part of an electrical network.

於本發明一實施例中,被限制於材料40中之系統單元30群組可進一步被劃分為數量相等或不等之子群組,如第11圖所示,惟圖中系統單元30之個數與連接方式僅為例示,非用以限制本發明之實施方式,本申請案中其他實施例中揭示之系統單元型態於不顯相衝突下皆可為本實施例採納之。此外,子群組中各個系統單元30間之電連接方式可參照本發明其他相關之實施例。劃分子群組之手段可選擇化學式、物理式、或其組合應用。化學式手段係如蝕刻等。物理式手段係如機械切割、研磨、雷射切割、水切、熱劈裂、超音波震動等。相鄰系統單元30間材料40之寬度較佳地係大於劃分手段之加工公差。In an embodiment of the invention, the group of system units 30 that are limited to the material 40 may be further divided into equal or unequal subgroups, as shown in FIG. 11, but the number of system units 30 in the figure. The manner of connection and the manner of connection are only examples, and are not intended to limit the embodiments of the present invention. The system unit types disclosed in other embodiments in the present application may be adopted in this embodiment without any conflict. In addition, the electrical connection between the various system units 30 in the subgroup can refer to other related embodiments of the present invention. The means for dividing the subgroups may be selected from chemical formulas, physical formulas, or a combination thereof. Chemical means are such as etching. Physical means such as mechanical cutting, grinding, laser cutting, water cutting, thermal splitting, ultrasonic vibration, and the like. The width of the material 40 between adjacent system units 30 is preferably greater than the processing tolerance of the dividing means.

依據本發明一實施例之子群組之電性連接架構係如第12圖所示,惟圖式中系統單元之型態僅為例示,非用以限制本發明之實施方式,本申請案中其他實施例中揭示之系統單元型態於不相衝突下皆可為本實施例採納之。圖(a)中,電性連接60b係跨過隔離區60b’架設於系統單元30之電極301及材料40之上。圖(b)中,電性連接60b之一端係電性連接至系統單元30之電極301,另一端係直接架設於材料40之上。圖(c)中,電性連接60b係未經電極301即與系統單元30電性連接,並直接架設於材料40之上。圖(d)中,電性連接60b係未經電極301即與系統單元30電性連接,並跨過隔離區60b’後架設於材料40之上。The electrical connection architecture of a subgroup according to an embodiment of the present invention is as shown in FIG. 12, but the type of the system unit in the drawings is merely an example, and is not intended to limit the embodiments of the present invention. The system unit types disclosed in the embodiments can be adopted in this embodiment without conflict. In Fig. (a), the electrical connection 60b is placed over the electrode 301 and material 40 of the system unit 30 across the isolation region 60b'. In the figure (b), one end of the electrical connection 60b is electrically connected to the electrode 301 of the system unit 30, and the other end is directly mounted on the material 40. In the figure (c), the electrical connection 60b is electrically connected to the system unit 30 without the electrode 301, and is directly mounted on the material 40. In Fig. (d), the electrical connection 60b is electrically connected to the system unit 30 without the electrode 301, and is placed over the material 40 after crossing the isolation region 60b'.

如第13圖所示,於本發明一實施例中,光電系統100係包括二或多個以多維度方式組立之子群組。各個子群組中系統單元之數量及連接方式分別可以相同或相異。例如,子群組100a及100c係與子群組100b上下堆疊,其中,子群組100a中包括四個系統單元30;子群組100b中包括一個系統單元30;子群組100c中包括二個系統單元30。子群組間可以使用焊料、銀膠、或其他適用之導電材料達成電性相連。然而,子群組間非以形成電性連接為必要,單純結構上之組立關係也可成立於其間。惟圖式中系統單元30之型態或數量僅為例示,非用以限制本發明之實施方式,本申請案中其他實施例中揭示之系統單元型態與連接方式於不顯相衝突下皆可為本實施例採納之。As shown in FIG. 13, in an embodiment of the invention, the photovoltaic system 100 includes two or more subgroups that are assembled in a multi-dimensional manner. The number of system units and the connection methods in each subgroup may be the same or different. For example, the subgroups 100a and 100c are stacked on top of and below the subgroup 100b, wherein the subgroup 100a includes four system units 30; the subgroup 100b includes one system unit 30; and the subgroup 100c includes two System unit 30. The subgroups can be electrically connected using solder, silver paste, or other suitable conductive materials. However, it is necessary to form an electrical connection between subgroups, and a simple structural relationship may also be established therebetween. However, the type or the number of the system unit 30 in the drawings are merely exemplary, and are not intended to limit the embodiments of the present invention. The system unit types and connection modes disclosed in other embodiments in the present application are not in conflict. It can be adopted for this embodiment.

第14(a)圖係顯示一子群組及其中單一系統單元30同一邊之寬度L2、L1。L1/L2係定義為X,且0.05≤X≤1,較佳地,0.1≤X≤0.2、0.2≤X≤0.3、0.3≤X≤0.4、0.4≤X≤0.5、0.5≤X≤0.6、0.6≤X≤0.7、0.8≤X≤0.9、及/或0.9≤X≤1。具體而言,L1/L2=260/600、580/1000。第14(b)圖係顯示依據本發明一實施例之一子群組之剖面圖,其輪廓係呈現一梯形。梯形各個尺寸之關係如下:L2>L1、L2>L3。一或多個系統單元30於子群組中之位置如圖所示,惟其相對於材料40邊界之位置係可任意移動之,亦即,系統單元30之至少一個邊界可恰好接觸到或者超過材料40之邊界。例如,系統單元30可接近、接觸、或突出材料40之上緣40a及/或下緣40b。Figure 14(a) shows the width L2, L1 of a subgroup and the same side of a single system unit 30 therein. L1/L2 is defined as X, and 0.05≤X≤1, preferably, 0.1≤X≤0.2, 0.2≤X≤0.3, 0.3≤X≤0.4, 0.4≤X≤0.5, 0.5≤X≤0.6, 0.6 ≤ X ≤ 0.7, 0.8 ≤ X ≤ 0.9, and / or 0.9 ≤ X ≤ 1. Specifically, L1/L2 = 260/600 and 580/1000. Figure 14(b) is a cross-sectional view showing a subgroup of a sub-group according to an embodiment of the present invention, the outline of which presents a trapezoidal shape. The relationship between the dimensions of the trapezoid is as follows: L2>L1, L2>L3. The position of one or more system units 30 in the subgroup is as shown, but its position relative to the boundary of material 40 is arbitrarily movable, i.e., at least one boundary of system unit 30 may just contact or exceed the material. The boundary of 40. For example, system unit 30 can access, contact, or protrude from upper edge 40a and/or lower edge 40b of material 40.

如第15圖所示,於本發明一實施例中,發光系統、子群組、或系統單元(於本實施例中統稱為光源)係可與一波長轉換材料相整合。具體而言,波長轉換材料係可由單獨之材料40a、單獨之材料40b、或材料40a及40b之組合所構成。具體而言,材料40a係為一螢光粉體、一染料、一半導體材料、或一陶瓷粉體等;材料40b係一螢光塊體、一燒結塊體、一陶瓷塊體、一有機膠體、或一無機膠體等。材料40a可於前述光源製程中或之後與材料40、材料40b、或其二者相整合。例如,螢光粉體可先與材料40混合後再覆蓋或填充於系統單元30之上,或者波長轉換材料可利用貼合、點膠、網版印刷、沈積等方式形成於系統單元30之上。圖(a)中,材料40a、材料40b、或材料40a及40b係配置於光源之一出光方向上,較佳地,係覆蓋於光源上。圖(b)中,材料40a係混雜於材料40中。圖(c)中,材料40a及40b之配置方式係為前述(a)及(b)態樣之結合。圖(d)中,材料40a、材料40b、或材料40a及40b係配置於光源之一出光方向上,但卻未與其直接接觸,較佳地,係與材料40相接。As shown in Fig. 15, in an embodiment of the invention, the illumination system, subgroup, or system unit (collectively referred to as a light source in this embodiment) can be integrated with a wavelength converting material. In particular, the wavelength converting material can be comprised of a separate material 40a, a separate material 40b, or a combination of materials 40a and 40b. Specifically, the material 40a is a phosphor powder, a dye, a semiconductor material, or a ceramic powder; the material 40b is a fluorescent block, a sintered block, a ceramic block, and an organic colloid. Or an inorganic colloid. Material 40a can be integrated with material 40, material 40b, or both during or after the aforementioned light source process. For example, the phosphor powder may be first mixed with the material 40 and then overlaid or filled on the system unit 30, or the wavelength converting material may be formed on the system unit 30 by means of lamination, dispensing, screen printing, deposition, or the like. . In Fig. (a), the material 40a, the material 40b, or the materials 40a and 40b are disposed in a light-emitting direction of one of the light sources, preferably over the light source. In Figure (b), material 40a is intermixed in material 40. In the figure (c), the arrangement of the materials 40a and 40b is a combination of the above aspects (a) and (b). In Fig. (d), the material 40a, the material 40b, or the materials 40a and 40b are disposed in the light-emitting direction of one of the light sources, but are not in direct contact with them, and preferably are in contact with the material 40.

如第16圖所示,發光系統、子群組、或系統單元(於本實施例中統稱為光源)係發出藍色光,其上並配置波長轉換材料。波長轉換材料之相關實施方式可參考前述第15圖之說明。圖(a)中,波長轉換材料係可發射綠色光或黃色光。圖(b)中,波長轉換材料係可發射紅色光及黃色光。圖(c)中,一區域之波長轉換材料係發射黃色光,另一區域之波長轉換材料係發射紅色光,且此二區域係彼此不相重疊。較佳地,黃色光區域係大於紅色光區域。圖(d)中,一區域之波長轉換材料係發射黃色光,另一區域之波長轉換材料係發射紅色光,且此二區域係彼此相重疊。較佳地,黃色光區域係較紅色光區域接近光源。具體而言,上述各態樣中,各色光係由相應之螢光粉體或螢光塊體經藍色光激發後產生。As shown in Fig. 16, the illumination system, subgroup, or system unit (collectively referred to as a light source in this embodiment) emits blue light on which a wavelength conversion material is disposed. For a related embodiment of the wavelength converting material, reference may be made to the description of Figure 15 above. In Figure (a), the wavelength converting material can emit green or yellow light. In (b), the wavelength converting material emits red light and yellow light. In Figure (c), the wavelength conversion material of one region emits yellow light, and the wavelength conversion material of the other region emits red light, and the two regions do not overlap each other. Preferably, the yellow light region is larger than the red light region. In (d), the wavelength conversion material of one region emits yellow light, and the wavelength conversion material of the other region emits red light, and the two regions overlap each other. Preferably, the yellow light region is closer to the light source than the red light region. Specifically, in each of the above aspects, each color light is generated by exciting the corresponding phosphor powder or the fluorescent block by blue light.

如第17(a)圖所示,發光系統或子群組中之部分或數個系統單元係發射藍色光,另一部分或數個之系統單元係發射紅色光,材料40中係混雜有綠色或黃色螢光粉體,較佳地,藍色光系統單元之數量係少於紅色光系統單元之數量,例如,藍色光系統單元與紅色光系統單元之數量比係至少為N/1+N(N屬於任意正整數)。或者,藍色光系統單元與紅色光系統單元之功率比係N1/N2(N1及N2屬於任意正整數)。較佳地,藍色光系統單元之功率係大於紅色光系統單元之功率,例如,N1/N2=3.0/1.0、2.5/1.0、2.0/1.0、1.5/1.0、或1.1/1.0。如第17(b)圖所示,發光系統、子群組中之系統單元30係發射藍色光,且材料40中係混雜有紅色及黃色螢光粉體,較佳地,紅色及黃色螢光粉體係均勻地配置於材料40中之一定空間中,然非均勻、漸層、離散、或交錯式分布亦可以選擇性採用之。As shown in Figure 17(a), some or several of the system elements in the illumination system or sub-group emit blue light, and another part or systems of the system emit red light, and the material 40 is mixed with green or Yellow phosphor powder, preferably, the number of blue light system units is less than the number of red light system units, for example, the ratio of the blue light system unit to the red light system unit is at least N/1+N (N Belongs to any positive integer). Alternatively, the power ratio of the blue light system unit to the red light system unit is N1/N2 (N1 and N2 belong to any positive integer). Preferably, the power of the blue light system unit is greater than the power of the red light system unit, for example, N1/N2=3.0/1.0, 2.5/1.0, 2.0/1.0, 1.5/1.0, or 1.1/1.0. As shown in Fig. 17(b), the illumination unit, the system unit 30 in the subgroup emits blue light, and the material 40 is mixed with red and yellow phosphor powder, preferably red and yellow phosphor. The powder system is evenly disposed in a certain space in the material 40, but non-uniform, gradual, discrete, or staggered distributions may also be selectively employed.

如第18(a)圖所示,發光系統或子群組中之一部分系統單元係發射藍色光,另一部分之系統單元係發射紅色光,材料40及40b中係混雜具有相同或相異發射頻譜之黃色螢光粉體。如第18(b)圖所示,發光系統或子群組中之有效或作動之系統單元係發射藍色光,材料40及40b中係混雜有適當比例之紅色及黃色螢光粉體。如第18(c)圖所示,發光系統或子群組中之有效或作動系統單元係發射藍色光,材料40中係混雜有黃色螢光粉體,材料40b中係混雜有紅色螢光粉體。As shown in Figure 18(a), one of the system elements in the illumination system or subgroup emits blue light, the other part of the system unit emits red light, and the materials 40 and 40b are intermixed with the same or different emission spectrum. Yellow fluorescent powder. As shown in Figure 18(b), the active or actuated system elements in the illumination system or subgroup emit blue light, and the materials 40 and 40b are mixed with a suitable proportion of red and yellow phosphor powder. As shown in Figure 18(c), the active or actuating system unit in the illumination system or subgroup emits blue light, the material 40 is mixed with yellow phosphor powder, and the material 40b is mixed with red phosphor powder. body.

如第19(a)圖所示,發光系統或子群組中之一部分系統單元係發射藍色光,一部分之系統單元係發射綠色光,一部分之系統單元係發射紅色光。如第19(b)圖所示,發光系統或子群組中之一部分系統單元係發射藍色光,另一部分之系統單元係發射紅色光,材料40b係配置於此二部分系統單元之上,並混雜有綠色螢光粉體。如第19(c)圖所示,發光系統或子群組中之一部分系統單元係發射藍色光,另一部分之系統單元係發射紅色光,材料40b係配置於藍色光系統單元之上,並混雜有綠色螢光粉體。如第19(d)圖所示,發光系統或子群組中之一部分系統單元係發射藍色光,另一部分之系統單元係發射紅色光,材料40b係配置於部分或局部之藍色光系統單元之上,並混雜有綠色螢光粉體。As shown in Fig. 19(a), one of the system units in the illumination system or subgroup emits blue light, a portion of the system unit emits green light, and a portion of the system unit emits red light. As shown in Fig. 19(b), one of the system units in the illumination system or subgroup emits blue light, and the other part of the system unit emits red light, and the material 40b is disposed on the two part system unit, and Mixed with green fluorescent powder. As shown in Fig. 19(c), one of the system units in the illumination system or subgroup emits blue light, and the other part of the system unit emits red light, and the material 40b is disposed on the blue optical system unit and mixed There are green fluorescent powder. As shown in Fig. 19(d), one of the system units in the illumination system or subgroup emits blue light, the other part of the system unit emits red light, and the material 40b is disposed in part or part of the blue optical system unit. It is mixed with green fluorescent powder.

如第20(a)~20(c)圖所示,發光系統或子群組中之有效或作動系統單元係發射藍色光。圖(a)中,一區域之材料40b係混雜有綠色螢光粉體,另一區域之材料40b係混雜有紅色螢光粉體,較佳地,綠色螢光粉體區域係大於紅色螢光粉體區域。圖(b)中,一區域之材料40b係混雜有綠色螢光粉體,另一區域之材料40b係混雜有紅色螢光粉體,且此二區域係彼此重疊,較佳地,短波長發光區域係較長波長發光區域接近系統單元。圖(c)中,材料40b係混雜有紅色及黃色螢光粉體。如第20(d)圖所示,發光系統或子群組中之有效或作動系統單元係發射人眼無法感知之射線,例如:紫外線。包括藍色、綠色、及紅色螢光粉體之材料40b係分別配置於系統單元之上。此三部分之面積大小可依照相應螢光粉體之效率、衰退特性、厚度調整之。As shown in Figures 20(a) through 20(c), the active or actuating system elements in the illumination system or subgroup emit blue light. In the figure (a), the material 40b in one region is mixed with green phosphor powder, and the material 40b in the other region is mixed with red phosphor powder. Preferably, the green phosphor powder region is larger than red phosphor. Powder area. In the figure (b), the material 40b of one region is mixed with the green phosphor powder, and the material 40b of the other region is mixed with the red phosphor powder, and the two regions overlap each other, preferably, short-wavelength light emission. The longer wavelength illumination area of the area is close to the system unit. In the figure (c), the material 40b is mixed with red and yellow phosphor powder. As shown in Figure 20(d), the active or actuating system elements in the illumination system or subgroup emit radiation that is not perceptible by the human eye, such as ultraviolet light. The materials 40b including blue, green, and red phosphor powders are respectively disposed on the system unit. The size of the three parts can be adjusted according to the efficiency, decay characteristics and thickness of the corresponding phosphor powder.

於以上或後續諸實施例中,應用上,藍色光搭配適當之比例之黃色光可產生冷白光;藍色光搭配適當之比例之黃色光及紅色光可產生暖白光。藍光與紅光功率比約為2:1~5:1,例如:2.5:1、3:1、3.5:1、4:1、4.5:1。綠光與黃光之功率比約為1:4。惟圖式中材料40及40b之大小比例及配置區域僅為例示,非為本發明之唯一實施方式,使用者當可依情況調整、交換之。此外,未有螢光粉體配置於其出光路徑上之系統單元亦可以選擇性地為材料40、材料40b、或其二者所覆蓋。材料40及/或材料40b與螢光粉體搭配方式亦可以為螢光塊體、燒結塊體、陶瓷塊體、染料、或其組合所取代。In the above or subsequent embodiments, in application, blue light with a suitable proportion of yellow light can produce cool white light; blue light with a suitable proportion of yellow light and red light can produce warm white light. The power ratio of blue light to red light is about 2:1 to 5:1, for example, 2.5:1, 3:1, 3.5:1, 4:1, and 4.5:1. The power ratio of green light to yellow light is about 1:4. However, the size ratio and arrangement area of the materials 40 and 40b in the drawings are merely illustrative, and are not the only embodiment of the present invention, and the user can adjust and exchange according to the situation. In addition, the system unit having no phosphor powder disposed on its light exit path may alternatively be covered by material 40, material 40b, or both. The material 40 and/or material 40b may be replaced with a phosphor powder in the form of a fluorescent block, a sintered block, a ceramic block, a dye, or a combination thereof.

光電系統或子群組除包括可發射光線之系統單元30外,更可以包括一或多個積體電路(IC),用以控制全部或部分之系統單元30,或作為全部或部分之系統單元30之電路中繼,如第21(a)圖所示。除積體電路,光電系統或子群組更可以連接系統單元30’。 於一實施例中,系統單元30’係一供電系統,例如,化學電池、太陽能電池、燃料電池等。於一實施例中,系統單元30’係一變壓系統、變頻系統、整流系統。具體而言,系統單元30’係一開關切換式電源(Switched Mode Power Supply;SWMP)、一高頻變壓器。The optoelectronic system or subgroup may include, in addition to the system unit 30 that emits light, one or more integrated circuits (ICs) for controlling all or part of the system unit 30, or as all or part of the system unit. 30 circuit relay, as shown in Figure 21 (a). In addition to the integrated circuit, the optoelectronic system or subgroup can be connected to the system unit 30'. In one embodiment, system unit 30' is a power supply system, such as a chemical battery, solar cell, fuel cell, or the like. In one embodiment, system unit 30' is a transformer system, a frequency conversion system, a rectification system. Specifically, the system unit 30' is a switched-mode power supply (SWMP) and a high-frequency transformer.

第22(a)圖~第22(f)圖係顯示光電系統或子群組之數種配置型態之示意圖,其中,係系統單元30非以皆為發光元件為限,一或二個以上系統單元30可以為非具發光功能之單元,如前述或後續諸實施例中所描述者。22(a) to 22(f) are schematic diagrams showing several configuration types of an optoelectronic system or a subgroup, wherein the system unit 30 is not limited to one of the light emitting elements, one or two or more System unit 30 can be a unit that does not have a lighting function, as described in the foregoing or subsequent embodiments.

如第23A圖所示,於依據本發明之一具體實施例之光電系統之製造方法中,首先係提供一載具10(於本實施例中亦稱為暫時基板),在暫時基板10上以旋轉塗佈、蒸鍍或印刷等方式形成一上下表面具黏性之層或結構20(於本實施例中亦稱為第一連接層),並可以藉由一挑選放置系統(Pick & Place system)將複數個未封裝之系統單元30(於本實施例中亦稱為光電元件)放置並連接在上述第一連接層20之上,並在複數個光電元件30之間隔區域形成複數個走道區304,其中光電元件30放置時之對位精準度主要係由挑選放置系統決定,例如,誤差不超過15μm。其中上述光電元件30可為一發光二極體,其結構可包含一基板303、形成在基板上之半導體磊晶層302與至少一個電極301。上述半導體磊晶層302可包含一第一導電型半導體層、一活性層,以及一第二導電型半導體層。此外,基板303可以選擇性地於製造流程中移除,以縮小系統尺寸。在一較佳實施例中,此光電元件30之至少一個電極301與上述第一連接層20接觸。上述複數個光電元件30可發出具有相同或不同波長之光,其發光範圍可從紫外光至紅外線。As shown in FIG. 23A, in a method of fabricating an optoelectronic system according to an embodiment of the present invention, a carrier 10 (also referred to as a temporary substrate in this embodiment) is first provided on the temporary substrate 10 Spin coating, evaporation or printing, etc. form a layer or structure 20 of the upper surface of the mask (also referred to as the first connecting layer in this embodiment), and can be selected by a picking system (Pick & Place system) A plurality of unpackaged system units 30 (also referred to as optoelectronic elements in this embodiment) are placed and connected over the first connection layer 20, and a plurality of walkway regions are formed in the spaced regions of the plurality of photovoltaic elements 30. 304, wherein the alignment accuracy when the photovoltaic element 30 is placed is mainly determined by the pick and place system, for example, the error does not exceed 15 μm. The photo-electric component 30 can be a light-emitting diode, and the structure can include a substrate 303, a semiconductor epitaxial layer 302 formed on the substrate, and at least one electrode 301. The semiconductor epitaxial layer 302 may include a first conductive semiconductor layer, an active layer, and a second conductive semiconductor layer. Additionally, the substrate 303 can be selectively removed during the manufacturing process to reduce system size. In a preferred embodiment, at least one electrode 301 of the photovoltaic element 30 is in contact with the first connection layer 20 described above. The plurality of photovoltaic elements 30 can emit light having the same or different wavelengths, and the light-emitting range can be from ultraviolet light to infrared light.

上述暫時基板10之材料可選自矽膠(silicone)、玻璃、石英、陶瓷、合金或印刷電路板(PCB);上述第一連接層20的材料可選自膠帶,例如為熱移除膠帶(thermal release tape)、紫外線移除膠帶(UV release tape)、化學移除膠帶(Chemical release tape)、耐熱膠帶或藍膜;上述光電元件30之基板303的材料可選自藍寶石(Sapphire)、碳化矽(SiC)、氧化鋅(ZnO)、氮化鎵(GaN)或矽、玻璃、石英、或陶瓷等高導熱基板;上述光電元件30之第一導電型半導體層、活性層及第二導電型半導體層之材料包含一種或一種以上之物質選自鎵(Ga)、鋁(Al)、銦(In)、砷(As)、磷(P)、氮(N)以及矽(Si)所構成群組。The material of the temporary substrate 10 may be selected from silicone, glass, quartz, ceramic, alloy or printed circuit board (PCB); the material of the first connecting layer 20 may be selected from tape, for example, heat removal tape (thermal Release tape), UV release tape, chemical release tape, heat-resistant tape or blue film; the material of the substrate 303 of the above-mentioned photovoltaic element 30 may be selected from sapphire (sapphire), tantalum carbide ( a highly thermally conductive substrate such as SiC), zinc oxide (ZnO), gallium nitride (GaN) or germanium, glass, quartz, or ceramic; a first conductive semiconductor layer, an active layer, and a second conductive semiconductor layer of the above-described photovoltaic element 30 The material comprises one or more substances selected from the group consisting of gallium (Ga), aluminum (Al), indium (In), arsenic (As), phosphorus (P), nitrogen (N), and cerium (Si).

接著,如第23B圖所示,提供一材料40(於本實施例中係具體為黏性膠材)填滿上述複數個光電元件30之走道區304,並且覆蓋上述複數個光電元件30及未被光電元件覆蓋之第一連接層20表面。其中上述黏性膠材40可以利用旋轉塗佈、印刷或鑄模灌膠等方式形成,且黏性膠材40亦可為一彈性材料,其材料可選自矽膠(silicone rubber)、矽樹脂(silicone resin)、矽膠、彈性PU、多孔PU、丙烯酸橡膠(acrylic rubber)或晶粒切割膠,如藍膜或UV膠。在本實施例中,也可進行一拋光製程(polish process),使上述複數個光電元件30之表面平坦化,並讓上述光電元件30表面不會產生過剩(overflow)或凹陷之黏性膠材40。Next, as shown in FIG. 23B, a material 40 (specifically, a viscous rubber material in this embodiment) is provided to fill the aisle region 304 of the plurality of photovoltaic elements 30, and covers the plurality of photovoltaic elements 30 and The surface of the first connection layer 20 covered by the photovoltaic element. The adhesive adhesive 40 can be formed by spin coating, printing or mold filling, and the adhesive adhesive 40 can also be an elastic material, and the material can be selected from silicone rubber and silicone resin. Resin, silicone, elastic PU, porous PU, acrylic rubber or die cutting glue, such as blue film or UV glue. In this embodiment, a polishing process may be performed to planarize the surface of the plurality of photovoltaic elements 30, and the surface of the photovoltaic element 30 is not allowed to have an excess or recessed adhesive. 40.

隨後,如第23C圖所示,提供一次載具50(於本實施例中亦稱為永久基板),並將之與塗佈黏性膠材40之複數個光電元件30接合,此接合方式可為一熱壓製程。在一較佳實施例中,此永久基板50與上述光電元件30之基板303直接接觸。上述永久基板50之材料可為矽膠(silicone)、玻璃、石英、陶瓷、合金或印刷電路板(PCB)。Subsequently, as shown in FIG. 23C, a carrier 50 (also referred to as a permanent substrate in this embodiment) is provided and bonded to a plurality of photovoltaic elements 30 coated with the adhesive glue 40. For a hot press. In a preferred embodiment, the permanent substrate 50 is in direct contact with the substrate 303 of the optoelectronic component 30. The material of the permanent substrate 50 may be silicone, glass, quartz, ceramic, alloy or printed circuit board (PCB).

接著,如第23D圖所示,可以雷射剝離、加熱分離膠膜圖案、溶解膠膜圖案等方式移除上述暫時基板10、第一連接層20與部分黏性膠材40後裸露出複數個光電元件30之電極301及部分半導體磊晶層302。Then, as shown in FIG. 23D, the temporary substrate 10, the first connecting layer 20 and the partial adhesive material 40 may be removed by laser stripping, heating and separating the film pattern, and the film pattern is dissolved. The electrode 301 of the photovoltaic element 30 and a portion of the semiconductor epitaxial layer 302.

最後,如第23E圖所示,以黃光導線接合、打線接合之方式形成電性連接60(於本實施例中係具體為複數條導線)以連接複數個光電元件之電極301,以串聯此複數個光電元件30。其中上述導線60之材料可為金、鋁、合金或多層金屬,以形成一系統級光電結構。Finally, as shown in FIG. 23E, an electrical connection 60 (specifically, a plurality of wires in this embodiment) is formed by bonding and bonding the yellow wires to connect the electrodes 301 of the plurality of photovoltaic elements to be connected in series. A plurality of photovoltaic elements 30. The material of the wire 60 may be gold, aluminum, alloy or multilayer metal to form a system-level photovoltaic structure.

第24A圖~第24G圖為根據本發明另一具體實施例製造流程之結構示意圖(其中與第23圖之實施例相近或相同之元件將賦予相同之標號,以下同)。如第24A圖所示,提供一暫時基板10,在暫時基板10上以旋轉塗佈、蒸鍍或印刷等方式形成一上下表面具黏性之第一連接層20,並可以藉由挑選放置系統(Pick & Place system)將複數個未封裝之光電元件30放置並連接在上述第一連接層20之上,並在複數個光電元件30之間隔區域形成複數個走道區304,其中光電元件放置時之對位精準度以不超過挑選放置系統之容許誤差為限,例如不超過15μm。其中上述光電元件30可為一發光二極體,其結構可包含一基板303、形成在基板上之半導體磊晶層302與至少一個電極301。上述半導體磊晶層302可包含一第一導電型半導體層、一活性層,以及一第二導電型半導體層。在一較佳實施例中,此光電元件30之至少一個電極301與上述第一連接層20接觸。上述光電元件30可發出具有相同或不同波長之光,其發光範圍可從紫外光至紅外線。24A to 24G are structural diagrams of a manufacturing process according to another embodiment of the present invention (an element similar or identical to the embodiment of Fig. 23 will be given the same reference numerals, the same applies hereinafter). As shown in FIG. 24A, a temporary substrate 10 is provided, and a first connection layer 20 of the upper and lower masks is formed on the temporary substrate 10 by spin coating, evaporation or printing, and can be selected by the placement system. (Pick & Place system) A plurality of unpackaged photovoltaic elements 30 are placed and connected on the first connection layer 20, and a plurality of aisle regions 304 are formed in the spaced regions of the plurality of photovoltaic elements 30, wherein the photovoltaic elements are placed The alignment accuracy is limited to a tolerance of no more than the selected placement system, for example, no more than 15 μm. The photo-electric component 30 can be a light-emitting diode, and the structure can include a substrate 303, a semiconductor epitaxial layer 302 formed on the substrate, and at least one electrode 301. The semiconductor epitaxial layer 302 may include a first conductive semiconductor layer, an active layer, and a second conductive semiconductor layer. In a preferred embodiment, at least one electrode 301 of the photovoltaic element 30 is in contact with the first connection layer 20 described above. The above-mentioned photovoltaic element 30 can emit light having the same or different wavelengths, and the light-emitting range can be from ultraviolet light to infrared light.

上述暫時基板10之材料可選自矽膠(silicone)、玻璃、石英、陶瓷、合金或印刷電路板(PCB);上述第一連接層20的材料可選自膠帶,例如為熱移除膠帶(thermal release tape)、紫外線移除膠帶(UV release tape)、化學移除膠帶(Chemical release tape)、耐熱膠帶、藍膜或金屬;上述光電元件30之基板303的材料可選自藍寶石(Sapphire)、碳化矽(SiC)、氧化鋅(ZnO)、氮化鎵(GaN)或矽、玻璃、石英、GaAs、或陶瓷等高導熱基板;上述光電元件30之第一導電型半導體層、活性層及第二導電型半導體層之材料包含一種或一種以上之物質選自鎵(Ga)、鋁(Al)、銦(In)、砷(As)、磷(P)、氮(N)以及矽(Si)所構成群組。The material of the temporary substrate 10 may be selected from silicone, glass, quartz, ceramic, alloy or printed circuit board (PCB); the material of the first connecting layer 20 may be selected from tape, for example, heat removal tape (thermal Release tape), UV release tape, chemical release tape, heat-resistant tape, blue film or metal; the material of the substrate 303 of the above-mentioned photovoltaic element 30 may be selected from sapphire, carbonized a highly thermally conductive substrate such as bismuth (SiC), zinc oxide (ZnO), gallium nitride (GaN) or germanium, glass, quartz, GaAs, or ceramic; a first conductive semiconductor layer, an active layer, and a second of the above-described photovoltaic element 30 The material of the conductive semiconductor layer comprises one or more substances selected from the group consisting of gallium (Ga), aluminum (Al), indium (In), arsenic (As), phosphorus (P), nitrogen (N), and bismuth (Si). Form a group.

此外,如第24A圖所示,在本發明的系統級光電結構中,也可先以一螢光材料P包覆每個上述光電元件30。藉由螢光材料的平均被覆,可提供一個穩定的白光光源,並減少之後製程上每個光電元件30之白光的差異性。其中上述螢光材料P可以旋轉塗佈、沉積、點膠、刮刀或鑄膜灌膠等方式形成。在另一實施例中,上述複數個光電元件30也可各別包覆不同之螢光材料。在另一實施例中,上述複數個光電元件30也可以選擇性的各別包覆不同之螢光材料,而非所有的光電元件30都包覆,以混合出不同的色光。例如在一實施例中,複數個光電元件30可為藍光發光二極體,並將複數個光電元件30中之三個光電元件30視為一組,其中第一個光電元件包覆之螢光材料P可為紅色螢光粉、第二個光電元件包覆之螢光材料P可為綠色螢光粉,且第三個光電元件可不包覆螢光材料,以混合發出白光。Further, as shown in Fig. 24A, in the system-level photovoltaic structure of the present invention, each of the above-described photovoltaic elements 30 may be first coated with a fluorescent material P. By averaging the phosphor material, a stable white light source can be provided and the white light variability of each of the photovoltaic elements 30 in the subsequent process can be reduced. The fluorescent material P may be formed by spin coating, deposition, dispensing, scraping or casting. In another embodiment, the plurality of photovoltaic elements 30 may each be coated with a different fluorescent material. In another embodiment, the plurality of photovoltaic elements 30 can also be selectively coated with different fluorescent materials, and not all of the photovoltaic elements 30 are coated to mix different colored lights. For example, in an embodiment, the plurality of photovoltaic elements 30 may be blue light emitting diodes, and three of the plurality of photovoltaic elements 30 are regarded as a group, wherein the first photovoltaic element is coated with fluorescent light. The material P may be a red phosphor powder, the second photovoltaic element coated phosphor material P may be a green phosphor powder, and the third photovoltaic element may not be coated with a fluorescent material to be mixed to emit white light.

接著,如第24B圖所示,提供一黏性膠材40填滿上述複數個光電元件30之走道區304,並且覆蓋上述複數個光電元件30及未被光電元件覆蓋之第一連接層20表面。其中上述黏性膠材40可以利用旋轉塗佈、印刷或鑄模灌膠等方式形成,且黏性膠材40可為一彈性材料,其材料可選自矽膠(silicone rubber)、矽樹脂(silicone resin)、矽膠、彈性PU、多孔PU、丙烯酸橡膠(acrylic rubber)或晶粒切割膠,如藍膜或UV膠。在本實施例中,也可進行一拋光製程(polish process),可使上述複數個光電元件30之表面平坦化,並讓上述光電元件30表面不會產生過剩(overflow)或凹陷之黏性膠材40。Next, as shown in FIG. 24B, a viscous adhesive 40 is provided to fill the aisle region 304 of the plurality of photovoltaic elements 30, and covers the surface of the plurality of photovoltaic elements 30 and the first connection layer 20 not covered by the photovoltaic elements. . The adhesive adhesive 40 can be formed by spin coating, printing or mold filling, and the adhesive 40 can be an elastic material, and the material can be selected from silicone rubber and silicone resin. ), silicone, elastic PU, porous PU, acrylic rubber or die cutting glue, such as blue film or UV glue. In this embodiment, a polishing process can also be performed to planarize the surface of the plurality of photovoltaic elements 30, and the surface of the photovoltaic element 30 is not allowed to have excessive or concave adhesive. Material 40.

隨後,如第24C圖所示,提供一永久基板50,並將之與塗佈黏性膠材40之複數個光電元件30接合,此接合方式可為一熱壓製程。在一較佳實施例中,此永久基板50與上述光電元件30之基板303直接接觸。上述永久基板50之材料可為玻璃或石英等高度基板。Subsequently, as shown in Fig. 24C, a permanent substrate 50 is provided and bonded to a plurality of photovoltaic elements 30 coated with a viscous adhesive 40, which may be a hot stamping process. In a preferred embodiment, the permanent substrate 50 is in direct contact with the substrate 303 of the optoelectronic component 30. The material of the permanent substrate 50 may be a height substrate such as glass or quartz.

接著,如第24D圖所示,可以雷射剝離、加熱分離膠膜圖案、溶解膠膜圖案等方式移除上述暫時基板10、第一連接層20與部分黏性膠材40後裸露出複數個光電元件30之電極301及部分半導體磊晶層302。Then, as shown in FIG. 24D, the temporary substrate 10, the first connecting layer 20 and the partial adhesive material 40 may be removed by laser stripping, heating and separating the film pattern, and the film pattern is dissolved. The electrode 301 of the photovoltaic element 30 and a portion of the semiconductor epitaxial layer 302.

然後,如第24E圖所示,以電鍍或蒸鍍之方式,將複數個擴張電極(Fan-out electrode) 305連接在複數個光電元件之電極301之上。其中擴張電極305之面積大於光電元件之電極301,可增加後續封裝的對位容忍度。此外,由於加大擴張電極305的面積,將更可有效把熱源導到後續封裝之金屬或PCB等基板上。上述擴張電極之材料可為金、鋁、合金或多層金屬結構。Then, as shown in Fig. 24E, a plurality of Fan-out electrodes 305 are connected to the electrodes 301 of the plurality of photovoltaic elements by electroplating or evaporation. Wherein the area of the dilation electrode 305 is larger than the electrode 301 of the optoelectronic component, the alignment tolerance of the subsequent package can be increased. In addition, since the area of the expansion electrode 305 is increased, the heat source can be more effectively guided to a substrate such as a metal or a PCB of a subsequent package. The material of the above-mentioned expansion electrode may be gold, aluminum, alloy or a multilayer metal structure.

最後,如第24F~24G圖所示,切割此複數個光電元件,形成各別之晶粒後,藉由至少一焊料(solder)601將之黏接至次載體(submount)60之上,以形成一系統級光電結構。上述之次載體60 可以是導線架(lead frame)或大尺寸鑲嵌基底(mounting substrate),以方便系統級光電結構之電路規劃並提高其散熱效果。Finally, as shown in Figures 24F-24G, the plurality of photovoltaic elements are diced to form respective dies, and then bonded to the submount 60 by at least one solder 601 to A system level photovoltaic structure is formed. The secondary carrier 60 described above may be a lead frame or a large mounting substrate to facilitate circuit planning of the system-level photovoltaic structure and improve its heat dissipation effect.

值得注意的是,上述兩實施例中的製程步驟也可互相參照或組合,如第一實施例中之光電元件也可選擇性的包覆螢光材料,或在第23D圖後也可接續第24E圖之製作擴張電極、切割晶片等後續步驟;同理,第二實施例也可在第24D圖後接續第23E圖之步驟,以導線電連接複數個光電元件。It should be noted that the process steps in the above two embodiments may also be referred to or combined with each other. For example, the photovoltaic element in the first embodiment may also selectively coat the fluorescent material, or may continue after the 23D image. The subsequent steps of making the electrode, cutting the wafer, etc. in Fig. 24E; similarly, the second embodiment can also follow the step of Fig. 23E after the 24D drawing, and electrically connecting the plurality of photovoltaic elements with the wires.

此外,在本發明另一實施例中,接續在第23B或24B圖之後,如第25A圖所示,可提供一永久基板50,並先將此永久基板50接合在一第二連接層70之上後,將之與塗佈黏性膠材40之複數個光電元件30接合,此接合方式可為一熱壓製程。其中上述第二連接層70之材料可為SiOx,SiNx、矽膠(silicone)。在本發明另一實施例中,接續在第23B或24B圖之後,如第25B圖所示,上述第二連接層70也可為一包含複數通道701之第二連接層70’,可增加本系統級光電元件之散熱,並可提升可承受之瓦數。其中上述通道701之材料可為金屬,如銅、鋁、鎳或合金。此外,通道701亦可與第二連接層70’為相同之材質,例如藍寶石、金屬、氮化矽、氧化鋁。In addition, in another embodiment of the present invention, after the 23B or 24B drawing, as shown in FIG. 25A, a permanent substrate 50 may be provided, and the permanent substrate 50 is first bonded to a second connecting layer 70. Afterwards, it is bonded to a plurality of photovoltaic elements 30 coated with a viscous adhesive 40, which may be a hot press. The material of the second connecting layer 70 may be SiOx, SiNx or silicone. In another embodiment of the present invention, after the 23B or 24B drawing, as shown in FIG. 25B, the second connecting layer 70 may also be a second connecting layer 70' including a plurality of channels 701, which may increase System-level optoelectronic components dissipate heat and increase the wattage that can be tolerated. The material of the above channel 701 may be a metal such as copper, aluminum, nickel or an alloy. Further, the channel 701 may be made of the same material as the second connection layer 70', such as sapphire, metal, tantalum nitride, or aluminum oxide.

在本發明另一實施例中,接續在第23B或24B圖之後,如第26圖所示,可提供一永久基板50,並先將此永久基板50利用一中介層(未顯示)先連接一第一反射層80,再接合在一第二連接層70之上後,將之與塗佈黏性膠材40之複數個光電元件30接合,此接合方式可為一熱壓製程。其中,中介層之材料係如SiOx,SiNx、矽膠(silicone)等。上述第一反射層80之材料可為銀、鋁或鉑等金屬,或者為由介電質或半導體組成之分布式布拉格反射器(Distributed Bragg Reflector;DBR)。在本實施例中,藉由此第一反射層80之設計,可增加本系統級光電結構之光取出效率。In another embodiment of the present invention, after the 23B or 24B drawing, as shown in FIG. 26, a permanent substrate 50 may be provided, and the permanent substrate 50 is first connected by an interposer (not shown). After the first reflective layer 80 is bonded to a second connecting layer 70, it is bonded to a plurality of photovoltaic elements 30 coated with the adhesive adhesive 40, which may be a hot pressing process. The material of the interposer is SiOx, SiNx, silicone or the like. The material of the first reflective layer 80 may be a metal such as silver, aluminum or platinum, or a distributed Bragg reflector (DBR) composed of a dielectric or a semiconductor. In this embodiment, by the design of the first reflective layer 80, the light extraction efficiency of the system-level photovoltaic structure can be increased.

為了更進一步避免上述複數個光電元件30若擺放得太近而可能造成側向光損耗及/或光萃取效率降低,在本發明另一實施例中,接續在第23B或24B圖之後,如第27圖所示,可選用一具有微角錐陣列(Micro-pyramid array)之基板50’。其中,本微角錐陣列基板50’可利用半導體蝕刻技術製成,基板上之複數微角錐501之形式可為圓錐、三角錐和四角錐等多角錐結構,其中上述微角錐501之底角可介於20~70度之間。在另一實施例中,上述微角錐陣列基板50’之表面還可披覆具高反射率之第二反射層,例如銀、鋁、鉑等金屬;此外,上述微角錐陣列基板50’之材料可為矽膠(silicone)、玻璃、石英、陶瓷、合金或印刷電路板(PCB),亦可選用高導熱材質以增加元件可靠度,其材料可為銅、鋁、陶瓷、矽。製作時藉由對位(alignment)可將此微角錐陣列基板50’與塗佈黏性膠材40之複數個光電元件30接合,此接合方式可為一熱壓製程。在本實施例中,藉由此微角錐陣列基板50’之設計,可將本系統級光電結構之側向光反射成為正向光以利增加光萃取效率。In order to further prevent the plurality of photovoltaic elements 30 from being placed too close to cause lateral light loss and/or light extraction efficiency degradation, in another embodiment of the present invention, subsequent to the 23B or 24B diagram, As shown in Fig. 27, a substrate 50' having a micro-pyramid array can be selected. The micro-corner array substrate 50' can be fabricated by using a semiconductor etching technique. The plurality of micro-horns 501 on the substrate can be in the form of a polygonal pyramid such as a cone, a triangular pyramid and a quadrangular pyramid. The bottom corner of the micro-horn 501 can be Between 20 and 70 degrees. In another embodiment, the surface of the micro pyramid array substrate 50' may also be coated with a second reflective layer having high reflectivity, such as a metal such as silver, aluminum, or platinum; and the material of the micro pyramid array substrate 50'. It can be silicone, glass, quartz, ceramic, alloy or printed circuit board (PCB). It can also be made of high thermal conductivity material to increase component reliability. The material can be copper, aluminum, ceramic or tantalum. The micro-horn array substrate 50' can be bonded to the plurality of photovoltaic elements 30 of the adhesive adhesive 40 by alignment, which can be a hot stamping process. In this embodiment, by the design of the microhorn array substrate 50', the lateral light of the system-level photovoltaic structure can be reflected into forward light to increase the light extraction efficiency.

以上各圖式與說明雖僅分別對應特定實施例,然而,各個實施例中所說明或揭露之元件、實施方式、設計準則、及技術原理除在彼此顯相衝突、矛盾、或難以共同實施之外,吾人當可依其所需任意參照、交換、搭配、協調、或合併。The above figures and descriptions are only corresponding to specific embodiments, however, the elements, embodiments, design criteria, and technical principles described or disclosed in the various embodiments are inconsistent, contradictory, or difficult to implement together. In addition, we may use any reference, exchange, collocation, coordination, or merger as required.

雖然本發明已說明如上,然其並非用以限制本發明之範圍、實施順序、或使用之材料與製程方法。對於本發明所作之各種修飾與變更,皆不脫本發明之精神與範圍。Although the invention has been described above, it is not intended to limit the scope of the invention, the order of implementation, or the materials and process methods used. Various modifications and variations of the present invention are possible without departing from the spirit and scope of the invention.

10‧‧‧載具、暫時基板
60‧‧‧電性連接
10a‧‧‧外部體
60a‧‧‧導線
10b‧‧‧外部體
60b‧‧‧內部連接
20‧‧‧層、結構、第一連接層
60b’‧‧‧隔離區
30‧‧‧系統單元、光電元件
60c‧‧‧電路載體
301‧‧‧電極
601‧‧‧焊料
302‧‧‧半導體磊晶層
70‧‧‧第二連接層
303‧‧‧基板
70’‧‧‧第二連接層
304‧‧‧走道區
701‧‧‧通道
305‧‧‧擴張電極
80‧‧‧第一反射層
40‧‧‧材料、黏性膠材
100‧‧‧光電系統
50‧‧‧次載具、永久基板
100a‧‧‧子群組
50’‧‧‧基板
100b‧‧‧子群組
50a‧‧‧接合層
100c‧‧‧子群組
501‧‧‧微角錐
200‧‧‧發光二極體封裝結構
10‧‧‧ Vehicles, temporary substrates
60‧‧‧Electrical connection
10a‧‧‧External body
60a‧‧‧Wire
10b‧‧‧External body
60b‧‧‧Internal connection
20‧‧‧layer, structure, first connection layer
60b'‧‧‧Isolated Area
30‧‧‧System unit, optoelectronic components
60c‧‧‧ circuit carrier
301‧‧‧electrode
601‧‧‧ solder
302‧‧‧Semiconductor epitaxial layer
70‧‧‧Second connection layer
303‧‧‧Substrate
70'‧‧‧Second connection layer
304‧‧‧Aisle area
701‧‧‧ channel
305‧‧‧Expanded electrode
80‧‧‧First reflective layer
40‧‧‧Materials, adhesive glue
100‧‧‧Photoelectric system
50‧‧‧ times vehicle, permanent substrate
100a‧‧‧Subgroup
50'‧‧‧Substrate
100b‧‧‧Subgroup
50a‧‧‧ joint layer
100c‧‧‧Subgroup
501‧‧‧Microhorn
200‧‧‧Light emitting diode package structure

第1圖係顯示一發光二極體封裝結構;Figure 1 shows a light emitting diode package structure;

第2A圖至第2D圖係顯示依據本發明一實施例之光電系統之製造方法;2A to 2D are diagrams showing a method of manufacturing a photovoltaic system according to an embodiment of the present invention;

第3圖係顯示依據本發明一實施例之光電系統之示意圖;Figure 3 is a schematic view showing a photovoltaic system in accordance with an embodiment of the present invention;

第4圖係顯示依據本發明一實施例之系統單元與載具之示意圖;4 is a schematic view showing a system unit and a carrier according to an embodiment of the present invention;

第5圖係顯示依據本發明一實施例之系統單元與次載具之示意圖;Figure 5 is a schematic view showing a system unit and a sub-carrier according to an embodiment of the present invention;

第6圖係顯示依據本發明一實施例之光電系統中系統單元之電連接示意圖;Figure 6 is a schematic view showing the electrical connection of the system unit in the photovoltaic system according to an embodiment of the present invention;

第7圖係顯示依據本發明另一實施例之光電系統中系統單元之電連接示意圖;Figure 7 is a schematic view showing the electrical connection of the system unit in the photovoltaic system according to another embodiment of the present invention;

第8圖係顯示依據本發明又一實施例之光電系統中系統單元之電連接示意圖;Figure 8 is a schematic view showing the electrical connection of the system unit in the photovoltaic system according to still another embodiment of the present invention;

第9A圖至第9D圖係顯示依據本發明另一實施例之光電系統之製造方法;9A to 9D are views showing a method of manufacturing a photovoltaic system according to another embodiment of the present invention;

第10圖係顯示依據本發明一實施例之光電系統中系統單元之電連接示意圖;Figure 10 is a schematic view showing the electrical connection of the system unit in the photovoltaic system according to an embodiment of the present invention;

第11圖係顯示依據本發明一實施例之光電系統中子群組之示意圖;Figure 11 is a schematic view showing a subgroup in a photovoltaic system according to an embodiment of the present invention;

第12圖係顯示依據本發明一實施例之子群組之電性連接架構;Figure 12 is a diagram showing an electrical connection architecture of a subgroup according to an embodiment of the present invention;

第13圖係顯示依據本發明另一實施例之子群組之電性連接架構;Figure 13 is a diagram showing an electrical connection architecture of a subgroup according to another embodiment of the present invention;

第14圖係顯示依據本發明一實施例之單一系統單元之尺寸圖;Figure 14 is a plan view showing a single system unit in accordance with an embodiment of the present invention;

第15圖係顯示依據本發明一實施例之光電系統中波長轉換材料之配置方式;Figure 15 is a diagram showing the arrangement of wavelength converting materials in a photovoltaic system according to an embodiment of the present invention;

第16圖係顯示依據本發明另一實施例之光電系統中波長轉換材料之配置方式;Figure 16 is a diagram showing the arrangement of wavelength converting materials in a photovoltaic system according to another embodiment of the present invention;

第17圖係顯示依據本發明又一實施例之光電系統中波長轉換材料之配置方式;Figure 17 is a diagram showing the arrangement of wavelength converting materials in a photovoltaic system according to still another embodiment of the present invention;

第18圖係顯示依據本發明一實施例之光電系統中波長轉換材料之配置方式;Figure 18 is a diagram showing the arrangement of wavelength converting materials in a photovoltaic system according to an embodiment of the present invention;

第19圖係顯示依據本發明另一實施例之光電系統中波長轉換材料之配置方式;Figure 19 is a diagram showing the arrangement of wavelength converting materials in a photovoltaic system according to another embodiment of the present invention;

第20圖係顯示依據本發明又一實施例之光電系統中波長轉換材料之配置方式;Figure 20 is a diagram showing the arrangement of wavelength converting materials in a photovoltaic system according to still another embodiment of the present invention;

第21圖係顯示依據本發明一實施例之光電系統中系統單元之配置示意圖;Figure 21 is a schematic view showing the arrangement of system units in a photovoltaic system according to an embodiment of the present invention;

第22圖係顯示依據本發明一實施例之光電系統或子群組之配置示意圖;Figure 22 is a schematic view showing the configuration of a photovoltaic system or a subgroup according to an embodiment of the present invention;

第23A圖至第23E圖為本發明製造流程結構示意圖;23A to 23E are schematic views showing the structure of a manufacturing process of the present invention;

第24A圖至第24G圖為本發明製造流程結構示意圖;24A to 24G are schematic views showing the structure of a manufacturing process of the present invention;

第25A與25B圖為本發明實施例之製造流程結構示意圖;25A and 25B are schematic diagrams showing the structure of a manufacturing process according to an embodiment of the present invention;

第26圖為本發明實施例之製造流程結構示意圖;及26 is a schematic structural view of a manufacturing process according to an embodiment of the present invention; and

第27圖為本發明實施例之製造流程結構示意圖。Figure 27 is a schematic view showing the structure of a manufacturing process according to an embodiment of the present invention.

no

no

30‧‧‧系統單元 30‧‧‧System Unit

301‧‧‧電極 301‧‧‧electrode

305‧‧‧擴張電極 305‧‧‧Expanded electrode

40‧‧‧材料 40‧‧‧Materials

60‧‧‧電性連接 60‧‧‧Electrical connection

601‧‧‧焊料 601‧‧‧ solder

P‧‧‧螢光材料 P‧‧‧Fluorescent materials

Claims (10)

一種光電系統,包含:                         一第一光電元件,具有一第一電極;                         一第二光電元件;                         一膠材,包含一最外表面,並環繞該第一光電元件與該第二光電元件;以及                         一第一電性連接裝置,連接該第一電極並且往該最外表面方向延伸,但不突出該最外表面。An optoelectronic system comprising: a first optoelectronic component having a first electrode; a second optoelectronic component; a glue comprising an outermost surface surrounding the first optoelectronic component and the second optoelectronic component; The first electrical connection device connects the first electrode and extends toward the outermost surface, but does not protrude from the outermost surface. 如申請專利範圍第1項所述之光電系統,更包含一隔離區位於該第一電性連接裝置與該第一光電元件之間。The photovoltaic system of claim 1, further comprising an isolation region between the first electrical connection device and the first photovoltaic element. 如申請專利範圍第1項所述之光電系統,更包含一隔離區覆蓋該第一光電元件與該第二光電元件。The photovoltaic system of claim 1, further comprising an isolation region covering the first photovoltaic element and the second photovoltaic element. 如申請專利範圍第1項所述之光電系統,其中該第二光電元件更包含一第二電極。The photovoltaic system of claim 1, wherein the second photovoltaic element further comprises a second electrode. 如申請專利範圍第4項所述之光電系統,更包含一第二電性連接裝置,連接該第二電極並往該最外表面方向延伸,但不突出該最外表面。The photovoltaic system of claim 4, further comprising a second electrical connection device connecting the second electrode and extending toward the outermost surface, but not protruding the outermost surface. 如申請專利範圍第5項所述之光電系統,更包含一隔離區位於該第二電性連接裝置與該第二光電元件之間。The photovoltaic system of claim 5, further comprising an isolation region between the second electrical connection device and the second photovoltaic element. 如申請專利範圍第1項所述之光電系統,其中該第一光電元件更包含一第二電極。The photovoltaic system of claim 1, wherein the first photovoltaic element further comprises a second electrode. 如申請專利範圍第7項所述之光電系統,更包含一第二電性連接裝置,連接該第二電極並往遠離該第二光電元件的方向延伸,但不超出該最外表面。The optoelectronic system of claim 7, further comprising a second electrical connection device connecting the second electrode and extending away from the second optoelectronic component, but not exceeding the outermost surface. 如申請專利範圍第8項所述之光電系統,更包含一隔離區位於該第二電性連接裝置與該第一光電元件之間。The photovoltaic system of claim 8, further comprising an isolation region between the second electrical connection device and the first photovoltaic element. 如申請專利範圍第1項所述之光電系統,更包含一走道區位於該第一光電元件與該第二光電元件之間。The photovoltaic system of claim 1, further comprising a walkway region between the first photovoltaic element and the second photovoltaic element.
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