TWI583262B - 驅動器雷射配置、ｅｕｖ輻射產生設備及用於放大脈衝雷射輻射的方法 - Google Patents
驅動器雷射配置、ｅｕｖ輻射產生設備及用於放大脈衝雷射輻射的方法 Download PDFInfo
- Publication number
- TWI583262B TWI583262B TW104122612A TW104122612A TWI583262B TW I583262 B TWI583262 B TW I583262B TW 104122612 A TW104122612 A TW 104122612A TW 104122612 A TW104122612 A TW 104122612A TW I583262 B TWI583262 B TW I583262B
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- Taiwan
- Prior art keywords
- laser
- pulse
- frequency
- laser radiation
- gain
- Prior art date
Links
- 230000005855 radiation Effects 0.000 title claims description 117
- 238000000034 method Methods 0.000 title claims description 13
- 230000003287 optical effect Effects 0.000 claims description 141
- 239000013077 target material Substances 0.000 claims description 20
- 238000004590 computer program Methods 0.000 claims description 4
- 230000036278 prepulse Effects 0.000 description 31
- 230000001419 dependent effect Effects 0.000 description 10
- 230000003321 amplification Effects 0.000 description 9
- 238000003199 nucleic acid amplification method Methods 0.000 description 9
- 239000007787 solid Substances 0.000 description 7
- 230000005284 excitation Effects 0.000 description 6
- 239000013078 crystal Substances 0.000 description 5
- 238000011144 upstream manufacturing Methods 0.000 description 5
- 230000008569 process Effects 0.000 description 4
- 238000000862 absorption spectrum Methods 0.000 description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical class [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 239000006096 absorbing agent Substances 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000010363 phase shift Effects 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 201000009310 astigmatism Diseases 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/10007—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating in optical amplifiers
- H01S3/10023—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating in optical amplifiers by functional association of additional optical elements, e.g. filters, gratings, reflectors
- H01S3/1003—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating in optical amplifiers by functional association of additional optical elements, e.g. filters, gratings, reflectors tunable optical elements, e.g. acousto-optic filters, tunable gratings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/10007—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating in optical amplifiers
- H01S3/10015—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating in optical amplifiers by monitoring or controlling, e.g. attenuating, the input signal
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/10038—Amplitude control
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/2232—Carbon dioxide (CO2) or monoxide [CO]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
- H01S3/2308—Amplifier arrangements, e.g. MOPA
- H01S3/2316—Cascaded amplifiers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
- H01S3/2383—Parallel arrangements
- H01S3/2391—Parallel arrangements emitting at different wavelengths
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—Production of X-ray radiation generated from plasma
- H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
- H05G2/0082—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam
- H05G2/0086—Optical arrangements for conveying the laser beam to the plasma generation location
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
- H01S3/0078—Frequency filtering
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Lasers (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/EP2014/064958 WO2016005006A1 (de) | 2014-07-11 | 2014-07-11 | Treiberlaseranordnung, euv-strahlungserzeugsvorrichtung und verfahren zum verstärken von gepulster laserstrahlung |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201611664A TW201611664A (zh) | 2016-03-16 |
| TWI583262B true TWI583262B (zh) | 2017-05-11 |
Family
ID=51178918
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW104122612A TWI583262B (zh) | 2014-07-11 | 2015-07-13 | 驅動器雷射配置、ｅｕｖ輻射產生設備及用於放大脈衝雷射輻射的方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US10186827B2 (de) |
| EP (1) | EP3167693B1 (de) |
| KR (1) | KR101909842B1 (de) |
| TW (1) | TWI583262B (de) |
| WO (1) | WO2016005006A1 (de) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2016005006A1 (de) | 2014-07-11 | 2016-01-14 | Trumpf Lasersystems For Semiconductor Manufacturing Gmbh | Treiberlaseranordnung, euv-strahlungserzeugsvorrichtung und verfahren zum verstärken von gepulster laserstrahlung |
| EP3381244B1 (de) | 2015-11-27 | 2022-06-08 | TRUMPF Lasersystems for Semiconductor Manufacturing GmbH | Treiberlaseranordnung, euv-strahlungserzeugungsvorrichtung und verfahren zum verstärken von laserpulsen |
| US10524345B2 (en) * | 2017-04-28 | 2019-12-31 | Taiwan Semiconductor Manufacturing Co., Ltd. | Residual gain monitoring and reduction for EUV drive laser |
| CN110869825B (zh) * | 2017-07-12 | 2021-12-24 | 通快激光系统半导体制造有限公司 | 偏振器装置以及具有偏振器装置的euv辐射产生设备 |
| DE102018200811B4 (de) * | 2018-01-18 | 2020-02-20 | Trumpf Laser Gmbh | Verfahren und Lasersystem zum Erzeugen verstärkter Pulse on Demand-Ausgangslaserpulse |
| CN111048982A (zh) * | 2019-11-28 | 2020-04-21 | 北京科益虹源光电技术有限公司 | 一种355nm紫外光的输出方法及系统 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0674374B1 (de) * | 1994-03-21 | 1998-11-11 | Hughes Aircraft Company | Vorrichtung zur Unterdrückung von optischen Rückkopplungen |
| US20060192152A1 (en) * | 2005-02-28 | 2006-08-31 | Cymer, Inc. | LPP EUV light source drive laser system |
| US20090095925A1 (en) * | 2005-06-29 | 2009-04-16 | Cymer, Inc. | LPP EUV light source drive laser system |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4127407A1 (de) | 1991-08-19 | 1993-02-25 | Hans Amler | Anordnung zum einkoppeln eines injection-seeding-laserstrahls in den resonator eines guetegeschalteten festkoerper-lasers |
| DE4410650A1 (de) | 1994-03-26 | 1995-09-28 | Abb Patent Gmbh | Lösbare Kupplungsvorrichtung zwischen zwei miteinander fluchtenden elektrischen Leitern |
| US7928416B2 (en) | 2006-12-22 | 2011-04-19 | Cymer, Inc. | Laser produced plasma EUV light source |
| US8654438B2 (en) | 2010-06-24 | 2014-02-18 | Cymer, Llc | Master oscillator-power amplifier drive laser with pre-pulse for EUV light source |
| WO2011162093A1 (ja) | 2010-06-23 | 2011-12-29 | 学校法人神奈川大学 | 乳化物製造用親水性ナノ粒子の製造方法 |
| JP5864949B2 (ja) | 2010-11-29 | 2016-02-17 | ギガフォトン株式会社 | 極端紫外光生成システム |
| JP6168760B2 (ja) | 2012-01-11 | 2017-07-26 | ギガフォトン株式会社 | レーザビーム制御装置及び極端紫外光生成装置 |
| WO2016005006A1 (de) | 2014-07-11 | 2016-01-14 | Trumpf Lasersystems For Semiconductor Manufacturing Gmbh | Treiberlaseranordnung, euv-strahlungserzeugsvorrichtung und verfahren zum verstärken von gepulster laserstrahlung |
-
2014
- 2014-07-11 WO PCT/EP2014/064958 patent/WO2016005006A1/de not_active Ceased
- 2014-07-11 EP EP14739145.2A patent/EP3167693B1/de active Active
- 2014-07-11 KR KR1020177003111A patent/KR101909842B1/ko active Active
-
2015
- 2015-07-13 TW TW104122612A patent/TWI583262B/zh active
-
2017
- 2017-01-10 US US15/402,368 patent/US10186827B2/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0674374B1 (de) * | 1994-03-21 | 1998-11-11 | Hughes Aircraft Company | Vorrichtung zur Unterdrückung von optischen Rückkopplungen |
| US20060192152A1 (en) * | 2005-02-28 | 2006-08-31 | Cymer, Inc. | LPP EUV light source drive laser system |
| US20090095925A1 (en) * | 2005-06-29 | 2009-04-16 | Cymer, Inc. | LPP EUV light source drive laser system |
Also Published As
| Publication number | Publication date |
|---|---|
| EP3167693A1 (de) | 2017-05-17 |
| US10186827B2 (en) | 2019-01-22 |
| US20170149202A1 (en) | 2017-05-25 |
| EP3167693B1 (de) | 2021-11-03 |
| KR101909842B1 (ko) | 2018-10-18 |
| KR20170031709A (ko) | 2017-03-21 |
| TW201611664A (zh) | 2016-03-16 |
| WO2016005006A1 (de) | 2016-01-14 |
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