TWI575330B - 光罩搬送裝置、光罩保持裝置、基板處理裝置、及元件製造方法 - Google Patents

光罩搬送裝置、光罩保持裝置、基板處理裝置、及元件製造方法 Download PDF

Info

Publication number
TWI575330B
TWI575330B TW102100682A TW102100682A TWI575330B TW I575330 B TWI575330 B TW I575330B TW 102100682 A TW102100682 A TW 102100682A TW 102100682 A TW102100682 A TW 102100682A TW I575330 B TWI575330 B TW I575330B
Authority
TW
Taiwan
Prior art keywords
mask
substrate
reticle
adsorption
cylindrical surface
Prior art date
Application number
TW102100682A
Other languages
English (en)
Chinese (zh)
Other versions
TW201339766A (zh
Inventor
福井達雄
Original Assignee
尼康股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 尼康股份有限公司 filed Critical 尼康股份有限公司
Publication of TW201339766A publication Critical patent/TW201339766A/zh
Application granted granted Critical
Publication of TWI575330B publication Critical patent/TWI575330B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Controlling Sheets Or Webs (AREA)
  • Feeding Of Articles By Means Other Than Belts Or Rollers (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Electroluminescent Light Sources (AREA)
TW102100682A 2012-03-27 2013-01-09 光罩搬送裝置、光罩保持裝置、基板處理裝置、及元件製造方法 TWI575330B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012071056 2012-03-27

Publications (2)

Publication Number Publication Date
TW201339766A TW201339766A (zh) 2013-10-01
TWI575330B true TWI575330B (zh) 2017-03-21

Family

ID=49259086

Family Applications (1)

Application Number Title Priority Date Filing Date
TW102100682A TWI575330B (zh) 2012-03-27 2013-01-09 光罩搬送裝置、光罩保持裝置、基板處理裝置、及元件製造方法

Country Status (3)

Country Link
JP (5) JP6048493B2 (ja)
TW (1) TWI575330B (ja)
WO (1) WO2013145800A1 (ja)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107615472B (zh) * 2015-05-29 2020-10-02 株式会社爱发科 带静电卡盘的运输机器人的控制系统
JP6702332B2 (ja) * 2015-09-29 2020-06-03 株式会社ニコン 製造システム
JP2017155263A (ja) 2016-02-29 2017-09-07 株式会社ジャパンディスプレイ 成膜システム及び表示装置の製造方法
KR20190100980A (ko) * 2017-12-27 2019-08-30 캐논 톡키 가부시키가이샤 정전척, 성막장치, 기판흡착방법, 성막방법, 및 전자 디바이스의 제조방법
JP7347386B2 (ja) * 2020-09-25 2023-09-20 株式会社村田製作所 静電誘導吸着式搬送体および静電誘導吸着式搬送装置
JP7191922B2 (ja) * 2020-11-30 2022-12-19 キヤノントッキ株式会社 搬送装置、成膜装置、成膜方法および電子デバイスの製造方法
KR20240012308A (ko) 2022-07-20 2024-01-29 도쿄엘렉트론가부시키가이샤 기판 처리 장치, 기판 보유 지지 장치 및 기판 보유지지 방법

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6411362B2 (en) * 1999-01-04 2002-06-25 International Business Machines Corporation Rotational mask scanning exposure method and apparatus
JP2003131387A (ja) * 2001-10-22 2003-05-09 Hitachi Electronics Eng Co Ltd マスクと露光対象基板との搬送に兼用できる搬送アーム及びそれを備えた露光装置
JP2004335513A (ja) * 2003-04-30 2004-11-25 Nikon Corp レチクルの保持方法、保持装置及び露光装置
TW200830057A (en) * 2006-09-08 2008-07-16 Nikon Corp Mask, exposure apparatus and device manufacturing method
JP2008171998A (ja) * 2007-01-11 2008-07-24 Nikon Corp レチクルチャック、レチクル、レチクルの吸着構造および露光装置
JP2011203311A (ja) * 2010-03-24 2011-10-13 Nikon Corp マスクホルダ、円筒型マスク、露光装置、基板処理装置及びデバイス製造方法

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4262594A (en) * 1978-12-22 1981-04-21 Logescan Systems, Inc. Method and apparatus for manipulating and transporting image media
JPS59200419A (ja) * 1983-04-28 1984-11-13 Toshiba Corp 大面積露光装置
US6018383A (en) * 1997-08-20 2000-01-25 Anvik Corporation Very large area patterning system for flexible substrates
JP3776577B2 (ja) * 1997-11-13 2006-05-17 大和製罐株式会社 ラベル貼着方法および装置
JP2000275865A (ja) * 1999-03-24 2000-10-06 Hitachi Chem Co Ltd ドラム状露光装置とその装置を用いたプリント配線板の製造法
JP4030350B2 (ja) * 2002-05-28 2008-01-09 株式会社アルバック 分割型静電吸着装置
JP2004185870A (ja) * 2002-11-29 2004-07-02 Toyota Motor Corp 薄膜積層システム
JP4885483B2 (ja) * 2005-06-06 2012-02-29 リンテック株式会社 転写装置とその方法、剥離装置とその方法、貼付装置とその方法
US20070202442A1 (en) * 2006-02-24 2007-08-30 Eastman Kodak Company Method and apparatus for merging a mask and a printing plate
JP2008015085A (ja) * 2006-07-04 2008-01-24 Asahi Kasei Chemicals Corp 円筒状マスク構成体
JP2008116514A (ja) * 2006-10-31 2008-05-22 Mitsubishi Paper Mills Ltd 連続露光装置
JP2009093027A (ja) * 2007-10-10 2009-04-30 Csun Mfg Ltd マスクパターンフィルム圧着機の圧着構造及びその圧着方法
JP2009175287A (ja) * 2008-01-23 2009-08-06 Mitsubishi Paper Mills Ltd 露光装置
JP2009237305A (ja) * 2008-03-27 2009-10-15 Mitsubishi Paper Mills Ltd マスクパターンフィルムの巻き付け機構及び露光装置
US8034540B2 (en) * 2008-07-31 2011-10-11 Eastman Kodak Company System and method employing secondary back exposure of flexographic plate
JP5329191B2 (ja) * 2008-11-27 2013-10-30 日置電機株式会社 吸着装置および検査装置
JP5708179B2 (ja) * 2010-04-13 2015-04-30 株式会社ニコン 露光装置、基板処理装置及びデバイス製造方法
CN103477286A (zh) * 2011-09-07 2013-12-25 株式会社尼康 基板处理装置

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6411362B2 (en) * 1999-01-04 2002-06-25 International Business Machines Corporation Rotational mask scanning exposure method and apparatus
JP2003131387A (ja) * 2001-10-22 2003-05-09 Hitachi Electronics Eng Co Ltd マスクと露光対象基板との搬送に兼用できる搬送アーム及びそれを備えた露光装置
JP2004335513A (ja) * 2003-04-30 2004-11-25 Nikon Corp レチクルの保持方法、保持装置及び露光装置
TW200830057A (en) * 2006-09-08 2008-07-16 Nikon Corp Mask, exposure apparatus and device manufacturing method
JP2008171998A (ja) * 2007-01-11 2008-07-24 Nikon Corp レチクルチャック、レチクル、レチクルの吸着構造および露光装置
JP2011203311A (ja) * 2010-03-24 2011-10-13 Nikon Corp マスクホルダ、円筒型マスク、露光装置、基板処理装置及びデバイス製造方法

Also Published As

Publication number Publication date
JP2016181007A (ja) 2016-10-13
JP2017139493A (ja) 2017-08-10
TW201339766A (zh) 2013-10-01
JPWO2013145800A1 (ja) 2015-12-10
JP6323592B2 (ja) 2018-05-16
WO2013145800A1 (ja) 2013-10-03
JP6292284B2 (ja) 2018-03-14
JP6048493B2 (ja) 2016-12-21
JP6132060B2 (ja) 2017-05-24
JP2018148217A (ja) 2018-09-20
JP2017045067A (ja) 2017-03-02
JP6485575B2 (ja) 2019-03-20

Similar Documents

Publication Publication Date Title
JP6485575B2 (ja) マスク保持装置
JP5605044B2 (ja) パターン形成装置及びパターン形成方法、並びにデバイス製造方法
TWI503632B (zh) A conveyance method and apparatus, and an exposure method and apparatus
TWI627510B (zh) Substrate processing device
CN108710263A (zh) 扫描曝光装置
TWI718730B (zh) 曝光裝置
JP2018189986A (ja) パターン露光方法、及びパターン形成方法
WO2013150898A1 (ja) マスク移動装置、マスク保持装置、露光装置及び基板処理装置
TWI672258B (zh) 曝光裝置
JP6562129B2 (ja) 露光装置