TWI569104B - An illumination optical system, an exposure apparatus, a manufacturing method of an element, and an optical element - Google Patents

An illumination optical system, an exposure apparatus, a manufacturing method of an element, and an optical element Download PDF

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Publication number
TWI569104B
TWI569104B TW103103205A TW103103205A TWI569104B TW I569104 B TWI569104 B TW I569104B TW 103103205 A TW103103205 A TW 103103205A TW 103103205 A TW103103205 A TW 103103205A TW I569104 B TWI569104 B TW I569104B
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TW
Taiwan
Prior art keywords
light
reflecting surface
optical system
incident
shape
Prior art date
Application number
TW103103205A
Other languages
English (en)
Chinese (zh)
Other versions
TW201433885A (zh
Inventor
大阪昇
福岡亮介
吉岡均
Original Assignee
佳能股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 佳能股份有限公司 filed Critical 佳能股份有限公司
Publication of TW201433885A publication Critical patent/TW201433885A/zh
Application granted granted Critical
Publication of TWI569104B publication Critical patent/TWI569104B/zh

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Elements Other Than Lenses (AREA)
TW103103205A 2013-02-28 2014-01-28 An illumination optical system, an exposure apparatus, a manufacturing method of an element, and an optical element TWI569104B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013040033A JP6178588B2 (ja) 2013-02-28 2013-02-28 照明光学系、露光装置、デバイスの製造方法及び光学素子

Publications (2)

Publication Number Publication Date
TW201433885A TW201433885A (zh) 2014-09-01
TWI569104B true TWI569104B (zh) 2017-02-01

Family

ID=51617573

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103103205A TWI569104B (zh) 2013-02-28 2014-01-28 An illumination optical system, an exposure apparatus, a manufacturing method of an element, and an optical element

Country Status (3)

Country Link
JP (1) JP6178588B2 (enExample)
KR (2) KR101707277B1 (enExample)
TW (1) TWI569104B (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5843905B2 (ja) * 2013-04-23 2016-01-13 キヤノン株式会社 照明光学系、露光装置及びデバイス製造方法
CN114677441B (zh) * 2021-11-20 2025-08-12 余姚舜宇智能光学技术有限公司 光心测试方法、光心测试装置及电子设备
KR20250021430A (ko) 2022-06-22 2025-02-13 가부시키가이샤 와코무 전자 펜

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6335786B1 (en) * 1997-11-10 2002-01-01 Nikon Corporation Exposure apparatus
TW201237566A (en) * 2011-02-22 2012-09-16 Canon Kk Illumination optical system, exposure apparatus, and method of manufacturing device

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT1182639B (it) * 1985-10-29 1987-10-05 Cselt Centro Studi Lab Telecom Procedimento per la fabbricazione di fibre ottiche con nucleo a sezione non circolare
JP3517573B2 (ja) * 1997-11-27 2004-04-12 キヤノン株式会社 照明装置及びそれを用いた投影露光装置
DE19856575A1 (de) * 1998-12-08 2000-09-14 Zeiss Carl Fa Projektions-Mikrolithographiegerät
JP2001324762A (ja) * 2000-05-17 2001-11-22 Minolta Co Ltd 単板式液晶プロジェクタの照明光学系
JP4659223B2 (ja) * 2001-01-15 2011-03-30 キヤノン株式会社 照明装置及びこれに用いる投影露光装置並びにデバイスの製造方法
US7215863B1 (en) 2006-04-27 2007-05-08 International Business Machines Corporation Light pipe optical coupling utilizing convex-shaped light pipe end
DE102010026252B4 (de) * 2010-07-01 2012-08-02 Jenoptik Optical Systems Gmbh Lichtintegrator für rechteckige Strahlquerschnitte unterschiedlicher Abmessungen

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6335786B1 (en) * 1997-11-10 2002-01-01 Nikon Corporation Exposure apparatus
TW201237566A (en) * 2011-02-22 2012-09-16 Canon Kk Illumination optical system, exposure apparatus, and method of manufacturing device

Also Published As

Publication number Publication date
TW201433885A (zh) 2014-09-01
JP2014168022A (ja) 2014-09-11
JP6178588B2 (ja) 2017-08-09
KR101831552B1 (ko) 2018-02-22
KR101707277B1 (ko) 2017-02-27
KR20140108125A (ko) 2014-09-05
KR20170010336A (ko) 2017-01-26

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