TWI564232B - A holding device, a holding system, a control method and a conveying device - Google Patents

A holding device, a holding system, a control method and a conveying device Download PDF

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Publication number
TWI564232B
TWI564232B TW103141793A TW103141793A TWI564232B TW I564232 B TWI564232 B TW I564232B TW 103141793 A TW103141793 A TW 103141793A TW 103141793 A TW103141793 A TW 103141793A TW I564232 B TWI564232 B TW I564232B
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Taiwan
Prior art keywords
gas
liquid
flow
holding device
swirling
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TW103141793A
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Chinese (zh)
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TW201540630A (en
Inventor
Hitoshi Iwasaka
Hideyuki Tokunaga
Yuji Kasai
Katsuhiro KOSHIISHI
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Harmotec Co Ltd
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Publication of TW201540630A publication Critical patent/TW201540630A/en
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Publication of TWI564232B publication Critical patent/TWI564232B/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6838Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G47/00Article or material-handling devices associated with conveyors; Methods employing such devices
    • B65G47/74Feeding, transfer, or discharging devices of particular kinds or types
    • B65G47/90Devices for picking-up and depositing articles or materials
    • B65G47/91Devices for picking-up and depositing articles or materials incorporating pneumatic, e.g. suction, grippers
    • B65G47/911Devices for picking-up and depositing articles or materials incorporating pneumatic, e.g. suction, grippers with air blasts producing partial vacuum
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/061Lifting, gripping, or carrying means, for one or more sheets forming independent means of transport, e.g. suction cups, transport frames
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/063Transporting devices for sheet glass
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G2201/00Indexing codes relating to handling devices, e.g. conveyors, characterised by the type of product or load being conveyed or handled
    • B65G2201/02Articles
    • B65G2201/0214Articles of special size, shape or weigh
    • B65G2201/022Flat
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G2249/00Aspects relating to conveying systems for the manufacture of fragile sheets
    • B65G2249/04Arrangements of vacuum systems or suction cups
    • B65G2249/045Details of suction cups suction cups

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Manipulator (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Cyclones (AREA)

Description

保持裝置、保持系統、控制方法及搬送裝置 Holding device, holding system, control method and conveying device

本發明,是關於一種保持裝置、保持系統、控制方法及搬送裝置。 The present invention relates to a holding device, a holding system, a control method, and a conveying device.

近年開發了以非接觸來搬送半導體晶圓、玻璃基板等的板狀的構件用的裝置。例如,在專利文獻1提案有利用柏努利的定律以非接觸地搬送板狀的構件的裝置。在該裝置,是對在裝置下面開口的圓筒室內供給流體來讓旋轉流產生,並藉由該旋轉流的中心部的負壓吸引板狀構件,並藉由從該圓筒室流出的流體在該裝置與板狀構件之間保持一定的距離,而可以非接觸地搬送板狀的構件。專利文獻1也提案有使用液體作為流體。 In recent years, an apparatus for transporting a plate-shaped member such as a semiconductor wafer or a glass substrate without contact has been developed. For example, Patent Document 1 proposes a device that uses a Bernoulli law to convey a plate-shaped member in a non-contact manner. In the apparatus, a fluid is supplied to a cylindrical chamber opened under the apparatus to generate a swirling flow, and the plate-like member is attracted by the negative pressure of the central portion of the swirling flow, and the fluid flows out from the cylindrical chamber. A certain distance is maintained between the device and the plate member, and the plate-like member can be conveyed in a non-contact manner. Patent Document 1 also proposes the use of a liquid as a fluid.

〔先行技術文獻〕 [prior technical literature] 〔專利文獻〕 [Patent Document]

〔專利文獻1〕日本特開2005-51260號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2005-51260

本發明之目的,係在藉由吐出流體讓負壓在被搬送物之間產生來保持該被搬送物的裝置,可使用氣體與液體的兩方作為流體。 An object of the present invention is to provide a device for holding a negative pressure between the objects to be conveyed by discharging a fluid, and both the gas and the liquid can be used as the fluid.

本發明在提供一種保持裝置,其係藉由吐出流體讓負壓在與板狀的構件之間產生來保持該構件的保持裝置,且具備有:柱狀的本體;被形成在前述本體面對前述構件的平板狀的端面;被形成在前述端面的凹部;氣體流形成手段,該手段是在前述凹部內形成氣體的旋轉流、或將氣體吐出到前述凹部內而形成放射流;以及將液體吐出到前述凹部內,而形成液體的旋轉流或放射流的1以上的液體通路。 The present invention provides a holding device which is a holding device for holding a negative pressure in a plate-like member by a discharge fluid, and is provided with a columnar body; a flat end surface of the member; a concave portion formed on the end surface; and a gas flow forming means for forming a swirling flow of gas in the concave portion or discharging a gas into the concave portion to form a radiation flow; and liquid The liquid is discharged into the concave portion to form a liquid flow of one or more of a swirling flow or a radial flow of the liquid.

上述的保持裝置中,前述氣體流形成手段,也可是將氣體吐出到前述凹部內,而形成氣體的旋轉流或放射流的1以上的氣體通路。 In the above-described holding device, the gas flow forming means may be a gas passage that discharges a gas into the concave portion to form a swirling flow or a radial flow of the gas.

上述的保持裝置中,前述1以上的液體通路,也可在前述氣體流形成手段形成前述氣體的旋轉流或放射流的期間,形成前述液體的旋轉流或放射流。 In the above-described holding device, the one or more liquid passages may form a swirling or radial flow of the liquid while the gas flow forming means forms a swirling or radial flow of the gas.

又,本發明在提供一種保持系統,係具備有:保持裝置、與流體切換手段,該保持裝置,係藉由吐出流體讓負壓在與板狀的構件之間產生來保持前述構件的保持裝置,並具備有:柱狀的本體;被形成在前述本體面 對前述構件的平板狀的端面;被形成在前述端面的凹部;以及流體流形成手段,該手段係在前述凹部內形成流體的旋轉流;或將流體吐出到前述凹部內而形成放射流,該流體切換手段,係與前述保持裝置連接,將被供給到前述保持裝置的流體在氣體與液體之間進行切換。 Moreover, the present invention provides a holding system including: a holding device and a fluid switching means, wherein the holding means is a holding means for holding a negative pressure in a plate-like member by discharging a fluid to hold the member. And having: a columnar body; formed on the body surface a flat end surface of the member; a concave portion formed on the end surface; and a fluid flow forming means for forming a swirling flow of the fluid in the concave portion; or discharging the fluid into the concave portion to form a radial flow. The fluid switching means is connected to the holding means to switch the fluid supplied to the holding means between the gas and the liquid.

又,本發明在提供一種控制方法,係控制具備有保持裝置、流體切換手段、與控制手段的保持系統的方法,該保持裝置,係藉由吐出流體讓負壓在與板狀的構件之間產生來保持前述構件的保持裝置,且具備有:柱狀的本體;被形成在前述本體面對前述構件的平板狀的端面;被形成在前述端面的凹部;流體流形成手段,該手段係在前述凹部內形成流體的旋轉流;或將流體吐出到前述凹部內而形成放射流,該流體切換手段,係與前述保持裝置連接,將被供給到前述保持裝置的流體在氣體與液體之間進行切換,該控制手段,係與前述流體切換手段連接來控制前述流體切換手段,其中具備有:前述控制手段控制前述流體切換手段,將氣體供給到前述保持裝置的步驟;以及前述控制手段控制前述流體切換手段,將液體供給到前述保持裝置的步驟。 Further, the present invention provides a control method for controlling a holding system including a holding device, a fluid switching means, and a control means for causing a negative pressure between a plate-like member by discharging a fluid a holding device for holding the member, and comprising: a columnar body; a flat end surface formed on the body facing the member; a concave portion formed on the end surface; and a fluid flow forming means, the means is a swirling flow of the fluid is formed in the concave portion; or a fluid is discharged into the concave portion to form a radial flow, and the fluid switching means is connected to the holding device, and the fluid supplied to the holding device is performed between the gas and the liquid. Switching, the control means is connected to the fluid switching means for controlling the fluid switching means, wherein the control means controls the fluid switching means to supply gas to the holding means; and the control means controls the fluid The switching means supplies the liquid to the holding means.

又,本發明在提供一種搬送裝置,係具備有:第1保持裝置、與第2保持裝置,該第1保持裝置,係藉由吐出氣體讓負壓在與板狀的構件之間產生來保持前述構件的第1保持裝置,且具備有:柱狀的第1本體;被形成在前述第1本體面對前述構件的平板狀的第1端面; 被形成在前述第1端面的第1凹部;以及氣體流形成手段,該手段係在前述第1凹部內形成氣體的旋轉流;或將氣體吐出到前述第1凹部內而形成放射流,該第2保持裝置,係藉由吐出液體讓負壓在與前述構件之間產生來保持前述構件的第2保持裝置,且具備有:柱狀的第2本體;被形成在前述第2本體面對前述構件的平板狀的第2端面;被形成在前述第2端面的第2凹部;以及將液體吐出到前述第2凹部內,而形成液體的旋轉流或放射流的1以上的液體通路。 Moreover, the present invention provides a transport apparatus including: a first holding device and a second holding device that maintains a negative pressure between a plate-shaped member by discharging gas; The first holding device of the member includes a columnar first body; and a flat first end surface formed on the first body facing the member; a first recessed portion formed on the first end surface; and a gas flow forming means for forming a swirling flow of the gas in the first recessed portion or discharging the gas into the first recessed portion to form a radial flow The holding device is a second holding device that holds a negative pressure between the member and the member to hold the member, and includes a columnar second body; the second body is formed to face the second body a flat second end surface of the member; a second recess formed in the second end surface; and a liquid passage that discharges liquid into the second recess to form a swirling or radial flow of the liquid.

上述的搬送裝置中,前述氣體流形成手段,也可是將氣體吐出到前述第1凹部內,而形成氣體的旋轉流或放射流的1以上的氣體通路。 In the above-described conveying apparatus, the gas flow forming means may be configured to discharge a gas into the first concave portion to form a gas passage of one or more of a swirling or radial flow of the gas.

上述的搬送裝置中,前述1以上的液體通路,也可在前述氣體流形成手段形成前述氣體的旋轉流或放射流的期間,形成前述液體的旋轉流或放射流。 In the above-described transfer device, the liquid flow path may have a swirling or radial flow of the liquid while the gas flow forming means forms a swirling or radial flow of the gas.

根據本發明,在藉由吐出流體讓負壓在被搬送物之間產生來保持該被搬送物的裝置,可使用氣體與液體的兩方作為流體。 According to the invention, it is possible to use both the gas and the liquid as the fluid by causing the negative pressure to be generated between the objects to be conveyed by the discharge fluid.

1‧‧‧旋轉流形成體 1‧‧‧Rotating flow forming body

3‧‧‧液體供給泵 3‧‧‧Liquid supply pump

4‧‧‧氣體供給泵 4‧‧‧ gas supply pump

5‧‧‧旋轉流形成體 5‧‧‧Rotating flow forming body

6‧‧‧放射流形成體 6‧‧‧radiation flow formation

7‧‧‧微電腦 7‧‧‧Microcomputer

10‧‧‧搬送裝置 10‧‧‧Transporting device

11‧‧‧本體 11‧‧‧Ontology

12‧‧‧凹部 12‧‧‧ recess

13‧‧‧端面 13‧‧‧ end face

14‧‧‧噴出口 14‧‧‧Spray outlet

15‧‧‧傾斜面 15‧‧‧Sloping surface

16‧‧‧導入口 16‧‧‧Import

17‧‧‧導入路 17‧‧‧Introduction

18‧‧‧凸部 18‧‧‧ convex

20‧‧‧搬送裝置 20‧‧‧Transporting device

51‧‧‧本體 51‧‧‧Ontology

52‧‧‧凹部 52‧‧‧ recess

53‧‧‧端面 53‧‧‧ end face

54‧‧‧噴出口 54‧‧‧Spray outlet

55‧‧‧傾斜面 55‧‧‧Sloping surface

56‧‧‧供給口 56‧‧‧ supply port

57‧‧‧環狀通路 57‧‧‧Circular access

58‧‧‧連通路 58‧‧‧Connected Road

59‧‧‧供給路 59‧‧‧Supply road

61‧‧‧本體 61‧‧‧Ontology

62‧‧‧環狀凹部 62‧‧‧ annular recess

63‧‧‧端面 63‧‧‧ end face

64‧‧‧對置面 64‧‧‧ facing

65‧‧‧傾斜面 65‧‧‧Sloping surface

66‧‧‧噴孔 66‧‧‧ orifice

67‧‧‧導入口 67‧‧‧Import

68‧‧‧導入路 68‧‧‧Introduction

69‧‧‧環狀通路 69‧‧‧Circular access

70‧‧‧連通路 70‧‧‧Connected Road

100‧‧‧搬送系統 100‧‧‧Transportation system

101‧‧‧基體 101‧‧‧ base

102‧‧‧摩擦構件 102‧‧‧ Friction members

103‧‧‧孔部 103‧‧‧ Hole Department

200‧‧‧搬送系統 200‧‧‧Transportation system

201‧‧‧基體 201‧‧‧ base

2011‧‧‧把持部 2011‧‧‧Control Department

2012‧‧‧腕部 2012‧‧‧ wrist

〔圖1〕表示旋轉流形成體1的一例的立體圖。 FIG. 1 is a perspective view showing an example of the swirling flow forming body 1.

〔圖2〕為圖1的A-A線剖視圖。 Fig. 2 is a cross-sectional view taken along line A-A of Fig. 1.

〔圖3〕為圖1的B-B線剖視圖。 Fig. 3 is a cross-sectional view taken along line B-B of Fig. 1.

〔圖4〕是包含旋轉流形成體1的搬送系統100的電路構成圖。 FIG. 4 is a circuit configuration diagram of the transport system 100 including the swirling flow forming body 1.

〔圖5〕表示旋轉流形成體5的一例的立體圖。 FIG. 5 is a perspective view showing an example of the swirling flow forming body 5.

〔圖6〕為圖5的C-C線剖視圖。 Fig. 6 is a cross-sectional view taken along line C-C of Fig. 5 .

〔圖7〕為圖5的D-D線剖視圖。 Fig. 7 is a cross-sectional view taken along line D-D of Fig. 5 .

〔圖8〕是包含旋轉流形成體5的搬送系統200的電路構成圖。 FIG. 8 is a circuit configuration diagram of the transport system 200 including the swirling flow forming body 5.

〔圖9〕表示搬送裝置10的構造的一例的圖。 FIG. 9 is a view showing an example of the structure of the transport device 10.

〔圖10〕表示搬送裝置20的構造的一例的圖。 FIG. 10 is a view showing an example of the structure of the transport device 20.

〔圖11〕表示放射流形成體6的一例的立體圖。 FIG. 11 is a perspective view showing an example of the radiation flow forming body 6.

〔圖12〕是放射流形成體6的底面圖。 FIG. 12 is a bottom view of the radiation flow forming body 6.

〔圖13〕為圖11的E-E線剖視圖。 Fig. 13 is a cross-sectional view taken along line E-E of Fig. 11 .

〔圖14〕表示旋轉流形成體1A的一例的底面圖。 FIG. 14 is a bottom view showing an example of the swirling flow forming body 1A.

〔圖15〕為圖14的F-F線剖視圖。 FIG. 15 is a cross-sectional view taken along line F-F of FIG. 14.

〔實施發明用的形態〕 [Formation for carrying out the invention]

以下,一邊參照圖面一邊針對本發明的實施的形態進行說明。 Hereinafter, embodiments of the present invention will be described with reference to the drawings.

1.(第1實施形態) 1. (First embodiment)

圖1表示本發明的第1實施形態的旋轉流形成體1的 一例的立體圖。圖2為圖1的A-A線剖視圖。圖3為圖1的B-B線剖視圖。旋轉流形成體1,是保持半導體晶圓、玻璃基板等的板狀構件W進行搬送用的裝置。旋轉流形成體1,是藉由吐出流體讓負壓在與板狀構件W之間產生來保持該構件。於此流體是指:例如壓縮空氣等的氣體、純水、氣泡水等的液體。旋轉流形成體1的材質,是例如鋁合金。該旋轉流形成體1,是本發明的「保持裝置」的一例。 Fig. 1 shows a swirling flow forming body 1 according to a first embodiment of the present invention. A perspective view of an example. Fig. 2 is a cross-sectional view taken along line A-A of Fig. 1; Fig. 3 is a cross-sectional view taken along line B-B of Fig. 1; The swirling flow forming body 1 is a device for holding a plate-shaped member W such as a semiconductor wafer or a glass substrate. The swirling flow forming body 1 holds the negative pressure between the plate-like member W by the discharge fluid to hold the member. The fluid refers to, for example, a gas such as compressed air, pure water, or bubble water. The material of the swirling flow forming body 1 is, for example, an aluminum alloy. This swirling flow forming body 1 is an example of the "holding device" of the present invention.

旋轉流形成體1,是如圖1至圖3所示,具備本體11、凹部12、端面13、4個噴出口14a、14b、14c及14d(以下,總稱「噴出口14」)、傾斜面15、4個導入口16a、16b、16c及16d(以下,總稱「導入口16」。)、以及4條的導入路17a、17b、17c及17d(以下,總稱「導入路17」。)。 As shown in FIGS. 1 to 3, the swirling flow forming body 1 includes a main body 11, a recess 12, an end surface 13, four discharge ports 14a, 14b, 14c, and 14d (hereinafter collectively referred to as "discharge port 14") and inclined surfaces. 15. Four inlet ports 16a, 16b, 16c, and 16d (hereinafter, collectively referred to as "introduction port 16"), and four inlet paths 17a, 17b, 17c, and 17d (hereinafter collectively referred to as "introduction path 17").

本體11具有圓柱形狀。端面13,是在本體11的一面(具體而言,面對作為被搬送物的板狀構件W的面)(以下稱為「底面」)形成平坦狀。凹部12具有圓柱形狀,且被形成在端面13。凹部12是與本體11呈同軸被形成。 The body 11 has a cylindrical shape. The end surface 13 is formed in a flat shape on one surface of the main body 11 (specifically, a surface facing the plate-like member W as a conveyed object) (hereinafter referred to as "bottom surface"). The recess 12 has a cylindrical shape and is formed at the end face 13. The recess 12 is formed coaxially with the body 11.

4個噴出口14,是被形成在本體11的面對凹部12的內周側面,且分別具有圓形狀。4個噴出口14等間隔被配置在該內周側面的軸向中央部。噴出口14a及14c,是被配置成互相對置。具體而言,是以本體11或凹部12的中心軸的軸心為中心被配置成點對稱。噴出口 14b及14d,是被配置成互相對置。具體而言,是以本體11或凹部12的中心軸的軸心為中心被配置成點對稱。被供給到旋轉流形成體1的流體是經由各噴出口14被吐出到凹部12內。從噴出口14a及14c是吐出液體,從噴出口14b及14d是吐出氣體。 The four discharge ports 14 are formed on the inner peripheral side surface of the body 11 facing the recess 12, and each have a circular shape. The four discharge ports 14 are disposed at equal intervals in the axial center portion of the inner peripheral side surface. The discharge ports 14a and 14c are disposed to face each other. Specifically, it is arranged in point symmetry about the axis of the central axis of the body 11 or the recess 12 . Spray outlet 14b and 14d are configured to oppose each other. Specifically, it is arranged in point symmetry about the axis of the central axis of the body 11 or the recess 12 . The fluid supplied to the swirling flow forming body 1 is discharged into the concave portion 12 via the respective discharge ports 14. The discharge ports 14a and 14c discharge the liquid, and the discharge ports 14b and 14d discharge the gas.

傾斜面15被形成在凹部12的開口部。4個導入口16,是被形成在本體11的外周側面,且分別具有圓形狀。4個導入口16之中,導入口16a及16c是例如經由管件與後述的液體供給泵3連接,而經由該導入口16a及16c對本體11內供給液體。導入口16a及16c,是例如經由管件與後述的氣體供給泵4連接,而經由該導入口16b及16d對本體11內供給氣體。 The inclined surface 15 is formed in the opening of the recess 12 . The four introduction ports 16 are formed on the outer peripheral side surface of the body 11, and each has a circular shape. Among the four introduction ports 16, the introduction ports 16a and 16c are connected to a liquid supply pump 3, which will be described later, via a pipe, and the liquid is supplied into the body 11 via the introduction ports 16a and 16c. The inlets 16a and 16c are connected to a gas supply pump 4, which will be described later, via a pipe, and gas is supplied into the body 11 through the inlets 16b and 16d.

4條的導入路17,是形成相對於端面13形成大致平行,且相對於凹部12的外周形成朝切線方向延伸。各導入路17,是連結噴出口14與導入口16。具體而言,導入路17a是連結噴出口14a與導入口16a,導入路17b是連結噴出口14b與導入口16b,導入路17c是連結噴出口14c與導入口16c,導入路17d是連結噴出口14d與導入口16d。 The four introduction paths 17 are formed substantially parallel to the end surface 13 and extend in the tangential direction with respect to the outer circumference of the concave portion 12. Each of the introduction paths 17 is a connection discharge port 14 and an introduction port 16. Specifically, the introduction path 17a is a connection discharge port 14a and an introduction port 16a, the introduction path 17b is a connection discharge port 14b and an introduction port 16b, the introduction path 17c is a connection discharge port 14c and an introduction port 16c, and the introduction path 17d is a connection discharge port. 14d and the inlet 16d.

導入路17a及17c,是互相平行延伸,將液體吐出到凹部12內而在該凹部12內形成旋轉流。導入路17b及17d,是互相平行延伸,且在凹部12內形成氣體的旋轉流。具體而言,導入路17b及17d,是將氣體吐出到凹部12內,而形成氣體的旋轉流。導入路17a及17c是 本發明的「液體通路」的一例。導入路17b及17d,是本發明的「氣體流形成手段」及「氣體通路」的一例。 The introduction paths 17a and 17c extend parallel to each other, and discharge the liquid into the concave portion 12 to form a swirling flow in the concave portion 12. The introduction paths 17b and 17d are parallel flows extending in parallel with each other, and a swirling flow of gas is formed in the concave portion 12. Specifically, the introduction paths 17b and 17d discharge gas into the concave portion 12 to form a swirling flow of the gas. The introduction paths 17a and 17c are An example of the "liquid passage" of the present invention. The introduction paths 17b and 17d are examples of the "gas flow forming means" and the "gas passage" of the present invention.

經由導入口16對以上說明的旋轉流形成體1供給流體時,其流體通過導入路17從噴出口14被吐出到凹部12內。被吐出到凹部12的流體,在凹部12內形成旋轉流而被整流之後從凹部12的開口部流出。此時,板狀構件W和端面13對置存在時,限制外部流體(例如空氣、水)往凹部12內的流入,並藉由旋轉流的離心力與吸引效果,使旋轉流中心部的每單位體積的流體分子的密度變小,而產生負壓。此結果,板狀構件W藉由周圍的流體被按壓而被拉到端面13側。另一方面,隨著端面13與板狀構件W的距離的接近,限制了從凹部12內流出的流體的量,使得從噴出口14朝凹部12內被吐出的流體的速度變慢,而使旋轉流中心部的壓力上昇。此結果,板狀構件W沒有與端面13接觸,而在板狀構件W與端面13之間保有一定的距離。 When the fluid is supplied to the swirling flow forming body 1 described above via the introduction port 16, the fluid is discharged from the discharge port 14 into the recessed portion 12 through the introduction path 17. The fluid discharged into the concave portion 12 forms a swirling flow in the concave portion 12 and is rectified, and then flows out from the opening portion of the concave portion 12. At this time, when the plate-shaped member W and the end surface 13 are opposed to each other, the inflow of the external fluid (for example, air or water) into the concave portion 12 is restricted, and the centrifugal force and the suction effect of the swirling flow cause each unit of the central portion of the swirling flow. The density of the fluid molecules of the volume becomes smaller, and a negative pressure is generated. As a result, the plate member W is pulled to the end face 13 side by the surrounding fluid being pressed. On the other hand, as the distance between the end surface 13 and the plate-like member W approaches, the amount of fluid flowing out of the recess 12 is restricted, so that the velocity of the fluid discharged from the discharge port 14 into the recess 12 becomes slow, and The pressure at the center of the swirling flow rises. As a result, the plate member W is not in contact with the end face 13, but a certain distance is maintained between the plate member W and the end face 13.

圖4是包含旋轉流形成體1的搬送系統100的電路構成圖。如圖4所示,旋轉流形成體1的導入口16a及16c,是藉由管件經電磁閥2a和液體供給泵3連接。另一方面,導入口16b及16d,是藉由管件經電磁閥2b和氣體供給泵4連接。電磁閥2a及2b分別與微電腦7連接。電磁閥2a,是依據從微電腦7所輸出的開關控制訊號,允許從液體供給泵3所供給的液體的通過或遮斷。另一方面,電磁閥2b,是依據從微電腦7所輸出的開關 控制訊號,允許從氣體供給泵4所供給的氣體的通過或遮斷。微電腦7,是依照預定的程式,對電磁閥2a及2b輸出開關控制訊號。 FIG. 4 is a circuit configuration diagram of the transport system 100 including the swirling flow forming body 1. As shown in Fig. 4, the inlets 16a and 16c of the swirling flow forming body 1 are connected to the liquid supply pump 3 via a solenoid valve 2a. On the other hand, the introduction ports 16b and 16d are connected to the gas supply pump 4 via the solenoid valve 2b via the tube. The solenoid valves 2a and 2b are connected to the microcomputer 7, respectively. The solenoid valve 2a allows the passage or interruption of the liquid supplied from the liquid supply pump 3 in accordance with the switch control signal output from the microcomputer 7. On the other hand, the solenoid valve 2b is based on the switch output from the microcomputer 7. The control signal allows passage or interruption of gas supplied from the gas supply pump 4. The microcomputer 7 outputs switching control signals to the solenoid valves 2a and 2b in accordance with a predetermined program.

在該搬送系統100,微電腦7對電磁閥2a輸出接通控制訊號,對電磁閥2b輸出關閉控制訊號時,僅在旋轉流形成體1的導入口16a及16c供給液體。其結果,在旋轉流形成體1的凹部12形成液體的旋轉流。相反的,微電腦7對電磁閥2a輸出關閉控制訊號,對電磁閥2b輸出接通控制訊號時,僅在旋轉流形成體1的導入口16b及16d供給氣體。其結果,在旋轉流形成體1的凹部12形成氣體的旋轉流。如此根據本實施形態的搬送系統100,可將使用流體在液體與氣體之間分開使用。因此,例如旋轉流形成體1在液體中搬送板狀構件W時,是使用液體,旋轉流形成體1在氣體中搬送板狀構件W時,是使用氣體。 In the transport system 100, when the microcomputer 7 outputs a turn-on control signal to the solenoid valve 2a and outputs a close control signal to the solenoid valve 2b, the liquid is supplied only to the inlets 16a and 16c of the swirling flow forming body 1. As a result, a swirling flow of the liquid is formed in the concave portion 12 of the swirling flow forming body 1. On the other hand, when the microcomputer 7 outputs a closing control signal to the solenoid valve 2a and outputs a closing control signal to the solenoid valve 2b, the gas is supplied only to the inlets 16b and 16d of the swirling flow forming body 1. As a result, a swirling flow of gas is formed in the concave portion 12 of the swirling flow forming body 1. As described above, according to the transport system 100 of the present embodiment, the use fluid can be used separately between the liquid and the gas. Therefore, for example, when the swirling flow forming body 1 transports the plate-shaped member W in the liquid, the liquid is used, and when the swirling flow forming body 1 transports the plate-shaped member W in the gas, the gas is used.

此外,微電腦7對電磁閥2a與電磁閥2b兩方輸出接通控制訊號時,在旋轉流形成體1的導入口16a及16c供給液體,且在導入口16b及16d供給氣體,其結果,在旋轉流形成體1的凹部12形成有液體與氣體混合的旋轉流。此時,導入路17b及17d,是在導入路17a及17c形成有氣體的旋轉流的期間,形成液體的旋轉流。 Further, when the microcomputer 7 outputs a control signal to both the electromagnetic valve 2a and the electromagnetic valve 2b, the liquid is supplied to the inlets 16a and 16c of the swirling flow forming body 1, and the gas is supplied to the inlets 16b and 16d. As a result, The concave portion 12 of the swirling flow forming body 1 is formed with a swirling flow in which a liquid and a gas are mixed. At this time, the introduction paths 17b and 17d form a swirling flow of the liquid while the introduction paths 17a and 17c are formed with the swirling flow of the gas.

2.(第2實施形態) 2. (Second Embodiment)

圖5表示本發明的第2實施形態的旋轉流形成體5的 一例的立體圖。圖6為圖5的C-C線剖視圖。圖7為圖5的D-D線剖視圖。旋轉流形成體5,是保持半導體晶圓、玻璃基板等的板狀構件W進行搬送用的裝置。旋轉流形成體5,是藉由吐出流體讓負壓在與板狀構件W之間產生來保持該構件。於此流體是指:例如壓縮空氣等的氣體、純水、氣泡水等的液體。旋轉流形成體5的材質,是例如鋁合金。該旋轉流形成體5,是本發明的「保持裝置」的一例。 Fig. 5 shows a swirling flow forming body 5 according to a second embodiment of the present invention. A perspective view of an example. Fig. 6 is a cross-sectional view taken along line C-C of Fig. 5; Fig. 7 is a sectional view taken along line D-D of Fig. 5; The swirling flow forming body 5 is a device for holding a plate-shaped member W such as a semiconductor wafer or a glass substrate. The swirling flow forming body 5 holds the negative pressure between the plate-like member W by the discharge fluid to hold the member. The fluid refers to, for example, a gas such as compressed air, pure water, or bubble water. The material of the swirling flow forming body 5 is, for example, an aluminum alloy. This swirling flow forming body 5 is an example of the "holding device" of the present invention.

旋轉流形成體5,是如圖5至圖7所示,具備本體51、凹部52、端面53、2個噴出口54、以及傾斜面55。本體51具有圓柱形狀。端面53,是在本體51的一面(具體而言,面對作為被搬送物的板狀構件W的面)(以下稱為「底面」)形成平坦狀。凹部52具有圓柱形狀,且被形成在端面53。凹部52是與本體51呈同軸被形成。 As shown in FIGS. 5 to 7, the swirling flow forming body 5 includes a main body 51, a concave portion 52, an end surface 53, two discharge ports 54, and an inclined surface 55. The body 51 has a cylindrical shape. The end surface 53 is formed in a flat shape on one surface of the main body 51 (specifically, a surface facing the plate-like member W as the object to be conveyed) (hereinafter referred to as "bottom surface"). The recess 52 has a cylindrical shape and is formed at the end face 53. The recess 52 is formed coaxially with the body 51.

2個噴出口54,是被形成在本體51的面對凹部52的內周側面。2個噴出口54,是被配置在該內周側面的軸向中央部。2個噴出口54,是被配置成互相對置。具體而言,是以本體51或凹部52的中心軸的軸心為中心被配置成點對稱。被供給到旋轉流形成體5的流體是經由各噴出口54被吐出到凹部52內。傾斜面55被形成在凹部52的開口部。 The two discharge ports 54 are formed on the inner peripheral side surface of the body 51 facing the recess 52. The two discharge ports 54 are disposed at the central portion in the axial direction of the inner peripheral side surface. The two discharge ports 54 are arranged to face each other. Specifically, it is arranged in point symmetry about the axis of the central axis of the body 51 or the recess 52. The fluid supplied to the swirling flow forming body 5 is discharged into the concave portion 52 through the respective discharge ports 54. The inclined surface 55 is formed in the opening of the recess 52.

旋轉流形成體5又如圖6及圖7所示,具備:供給口56、環狀通路57、連通路58、以及2根的供 給路59。供給口56,是被設在本體51的上面(亦即,與底面相反的面)的中央且具有圓形狀。供給口56,是例如經由管件和後述的液體供給泵3及氣體供給泵4連接。經由該供給口56對本體51內供給流體。環狀通路57,是以圍繞凹部52的方式被形成在本體51的內部且具有圓筒形狀。環狀通路57是與凹部52呈同軸被形成。環狀通路57,是將從連通路58所供給的流體供給到供給路59。連通路58,是被設在本體51的內部,且朝本體51的底面或上面的半徑方向呈直線狀延伸。 As shown in FIGS. 6 and 7, the swirling flow forming body 5 includes a supply port 56, an annular passage 57, a communication passage 58, and two supplies. Give way 59. The supply port 56 is provided at the center of the upper surface of the body 51 (that is, the surface opposite to the bottom surface) and has a circular shape. The supply port 56 is connected to the gas supply pump 3 and the gas supply pump 4 which will be described later, for example, via a pipe. The fluid is supplied into the body 51 via the supply port 56. The annular passage 57 is formed inside the body 51 so as to surround the recess 52 and has a cylindrical shape. The annular passage 57 is formed coaxially with the recess 52. The annular passage 57 supplies the fluid supplied from the communication passage 58 to the supply passage 59. The communication path 58 is provided inside the main body 51 and extends linearly in the radial direction of the bottom surface or the upper surface of the main body 51.

連通路58,在其兩端部與環狀通路57連通。連通路58,是將經由供給口56被供給到本體51內的流體供給到環狀通路57。2條的供給路59,是相對於端面53形成大致平行,且相對於凹部52的外周形成朝切線方向延伸。2條供給路59是互相平行延伸。各供給路59,其一端與環狀通路57連通,另一端與噴出口54連通。各供給路59,是在凹部52內形成流體的旋轉流。各供給路59是本發明的「流體流形成手段」的一例。 The communication path 58 communicates with the annular passage 57 at both end portions thereof. The communication passage 58 supplies the fluid supplied into the main body 51 via the supply port 56 to the annular passage 57. The two supply passages 59 are formed substantially parallel to the end surface 53 and formed toward the outer periphery of the recess 52. The tangential direction extends. The two supply paths 59 extend parallel to each other. Each of the supply passages 59 has one end that communicates with the annular passage 57 and the other end that communicates with the discharge port 54. Each supply path 59 is a swirling flow in which a fluid is formed in the recess 52. Each supply path 59 is an example of the "fluid flow forming means" of the present invention.

經由供給口56對上述所說明的旋轉流形成體5供給流體時,其流體通過連通路58、環狀通路57及供給路59從噴出口54被吐出到凹部52內。被吐出到凹部52的流體,在凹部52內形成旋轉流而被整流之後從凹部52的開口部流出。此時,板狀構件W和端面53對置存在時,限制外部流體(例如空氣、水)往凹部52的流入,並藉由旋轉流的離心力與吸引效果,使旋轉流中心部的每 單位體積的流體分子的密度變小,而在旋轉流形成體5與板狀構件W之間產生負壓。此結果,板狀構件W藉由周圍的流體被按壓而被拉到端面53側。另一方面,隨著端面53與板狀構件W的距離的接近,限制了從凹部52內流出的流體的量,使得從噴出口54朝凹部52內被吐出的流體的速度變慢,而使旋轉流中心部的壓力上昇。此結果,板狀構件W沒有與端面53接觸,而在板狀構件W與端面53之間保有一定的距離。 When the fluid is supplied to the swirling flow forming body 5 described above via the supply port 56, the fluid is discharged from the discharge port 54 into the recess 52 through the communication passage 58, the annular passage 57, and the supply passage 59. The fluid discharged into the concave portion 52 forms a swirling flow in the concave portion 52 and is rectified, and then flows out from the opening portion of the concave portion 52. At this time, when the plate-like member W and the end surface 53 are opposed to each other, the inflow of the external fluid (for example, air or water) to the concave portion 52 is restricted, and the centrifugal force and the suction effect of the swirling flow cause each of the central portions of the swirling flow. The density of the fluid molecules per unit volume becomes small, and a negative pressure is generated between the swirling flow forming body 5 and the plate-like member W. As a result, the plate-like member W is pulled to the end face 53 side by the surrounding fluid being pressed. On the other hand, as the distance between the end surface 53 and the plate-like member W approaches, the amount of the fluid flowing out of the recess 52 is restricted, so that the velocity of the fluid discharged from the discharge port 54 into the recess 52 becomes slow. The pressure at the center of the swirling flow rises. As a result, the plate member W is not in contact with the end face 53, but a certain distance is maintained between the plate member W and the end face 53.

圖8是包含旋轉流形成體5的搬送系統200的電路構成圖。該搬送裝置200,是本發明的「保持系統」的一例。如圖8所示,旋轉流形成體5的供給口56,是例如藉由管件經電磁閥2a和液體供給泵3連接,並且,例如藉由管件經電磁閥2b和氣體供給泵4連接。電磁閥2a及2b分別與微電腦7連接。 FIG. 8 is a circuit configuration diagram of the transport system 200 including the swirling flow forming body 5. This conveying device 200 is an example of the "holding system" of the present invention. As shown in Fig. 8, the supply port 56 of the swirling flow forming body 5 is connected to the liquid supply pump 3 via a solenoid valve 2a, for example, by a pipe, and is connected to the gas supply pump 4 via a solenoid valve 2b, for example. The solenoid valves 2a and 2b are connected to the microcomputer 7, respectively.

電磁閥2a,是依據從微電腦7所輸出的開關控制訊號,允許從液體供給泵3所供給的液體的通過或遮斷。另一方面,電磁閥2b,是依據從微電腦7所輸出的開關控制訊號,允許從氣體供給泵4所供給的氣體的通過或遮斷。電磁閥2a及2b,是具有將被供給到旋轉流形成體5的流體在氣體與液體之間進行切換的功能,且是本發明的「流體切換手段」的一例。微電腦7,是依照預定的程式,對電磁閥2a及2b輸出開關控制訊號。微電腦7,是本發明的「控制手段」的一例。 The solenoid valve 2a allows the passage or interruption of the liquid supplied from the liquid supply pump 3 in accordance with the switch control signal output from the microcomputer 7. On the other hand, the solenoid valve 2b allows the passage or interruption of the gas supplied from the gas supply pump 4 in accordance with the switching control signal output from the microcomputer 7. The solenoid valves 2a and 2b have a function of switching the gas supplied to the swirling flow forming body 5 between the gas and the liquid, and are examples of the "fluid switching means" of the present invention. The microcomputer 7 outputs switching control signals to the solenoid valves 2a and 2b in accordance with a predetermined program. The microcomputer 7 is an example of the "control means" of the present invention.

在搬送系統200,微電腦7對電磁閥2a輸出 接通控制訊號,對電磁閥2b輸出關閉控制訊號時,在旋轉流形成體1的供給口56供給液體。其結果,在旋轉流形成體5的凹部52形成液體的旋轉流。相反的,微電腦7對電磁閥2a輸出關閉控制訊號,對電磁閥2b輸出接通控制訊號時,在旋轉流形成體1的供給口56供給氣體。其結果,在旋轉流形成體5的凹部52形成氣體的旋轉流。如此根據本實施形態的搬送系統200,可將使用流體在液體與氣體之間分開使用。因此,例如旋轉流形成體5在液體中搬送板狀構件W時,是使用液體,旋轉流形成體5在氣體中搬送板狀構件W時,是使用氣體。 In the transport system 200, the microcomputer 7 outputs the solenoid valve 2a When the control signal is turned on and the closing control signal is output to the electromagnetic valve 2b, the liquid is supplied to the supply port 56 of the swirling flow forming body 1. As a result, a swirling flow of the liquid is formed in the concave portion 52 of the swirling flow forming body 5. On the other hand, when the microcomputer 7 outputs a closing control signal to the solenoid valve 2a and outputs a closing control signal to the solenoid valve 2b, the gas is supplied to the supply port 56 of the rotary flow forming body 1. As a result, a swirling flow of the gas is formed in the concave portion 52 of the swirling flow forming body 5. As described above, according to the transport system 200 of the present embodiment, the use fluid can be used separately between the liquid and the gas. Therefore, for example, when the swirling flow forming body 5 transports the plate-shaped member W in the liquid, the liquid is used, and when the swirling flow forming body 5 transports the plate-shaped member W in the gas, the gas is used.

3.變形例 3. Modifications

上述的實施形態,也可如以下的方式進行變形。又,以下的2以上的變形例,也可互相組合。 The above embodiment can be modified as follows. Further, the following two or more modifications may be combined with each other.

3-1.變形例1 3-1. Modification 1

上述的第1實施形態的旋轉流形成體1依據板狀構件W的尺寸也可在板狀的框架安裝複數個被使用。圖9表示本變形例的搬送裝置10的構造的一例的圖。具體而言,圖9(a)是搬送裝置10的底面圖,圖9(b)是搬送裝置10的側視圖。搬送裝置10,是如圖9所示具備有:基體101、12個旋轉流形成體1、12個摩擦構件102、以及6個孔部103。 The swirling flow forming body 1 of the above-described first embodiment can be used in a plurality of plate-shaped frames depending on the size of the plate-like member W. FIG. 9 is a view showing an example of the structure of the conveying device 10 of the present modification. Specifically, FIG. 9( a ) is a bottom view of the conveying device 10 , and FIG. 9( b ) is a side view of the conveying device 10 . As shown in FIG. 9, the conveyance device 10 is provided with a base body 101, twelve swirling flow forming bodies 1, twelve friction members 102, and six hole portions 103.

基體101具有圓柱形狀。基體101的材質, 是例如鋁合金。12個旋轉流形成體1是被設在基體101的一面(具體而言,被設在與作為被搬送物的板狀構件W對置的面)(以下稱「底面」。)。12個旋轉流形成體1,是在該底面被配置在相同的圓的周上。12個旋轉流形成體1,是延著基體101的外周呈等間隔被配置。 The base 101 has a cylindrical shape. The material of the base 101, It is for example an aluminum alloy. The twelve swirling flow forming bodies 1 are provided on one surface of the base body 101 (specifically, a surface that faces the plate-like member W as the object to be conveyed) (hereinafter referred to as "bottom surface"). The twelve swirling flow forming bodies 1 are arranged on the circumference of the same circle on the bottom surface. The twelve swirling flow forming bodies 1 are arranged at equal intervals along the outer circumference of the base body 101.

12個摩擦構件102是被設在基體101的底面,且分別具有圓柱形狀。12個摩擦構件102,是在該底面,等間隔被配置在與配置有旋轉流形成體1相同的圓的圓上。在2個旋轉流形成體1之間配置有1個摩擦構件102。各摩擦構件102,是與作為被搬送物的板狀構件W的表面接觸,並藉由與該表面之間產生的摩擦力防止板狀構件W的移動的構件。各摩擦構件102的材質,是例如氟橡膠。6個孔部103,是被設在基體101的大致圓角長方形的貫穿孔。6個孔部103在基體101等間隔被配置在相同的圓的周上。在其周上配置有孔部103的圓,是與在其周上配置有旋轉流形成體1的圓同心。孔部103是被配置在比旋轉流形成體1更靠基體101表面的中心。 The twelve friction members 102 are provided on the bottom surface of the base 101 and have cylindrical shapes, respectively. The twelve friction members 102 are disposed on the bottom surface at equal intervals on a circle similar to the circle in which the swirling flow forming body 1 is disposed. One friction member 102 is disposed between the two swirling flow forming bodies 1. Each of the friction members 102 is a member that comes into contact with the surface of the plate-like member W as the object to be conveyed, and prevents the movement of the plate-like member W by the frictional force generated between the friction members 102. The material of each friction member 102 is, for example, fluororubber. The six hole portions 103 are through holes that are substantially rounded and rectangular in the base body 101. The six hole portions 103 are arranged on the circumference of the same circle at equal intervals in the base body 101. A circle in which the hole portion 103 is disposed on the circumference thereof is concentric with a circle in which the swirling flow forming body 1 is disposed on the circumference thereof. The hole portion 103 is disposed at the center of the surface of the base body 101 than the swirling flow forming body 1.

採用本變形例時,被安裝在搬送裝置10的旋轉流形成體1,分別也可僅與液體供給泵3和氣體供給泵4之中的任一方連接。而且,被連接在液體供給泵3的旋轉流形成體1、與被連接在氣體供給泵4的旋轉流形成體1,也可在搬送裝置10交替被配置。此時,例如搬送裝置10在液體中搬送板狀構件W時,也可僅在連接於液體供給泵3的旋轉流形成體1供給液體,搬送裝置10在氣體 中搬送板狀構件W時,也可僅在連接於氣體供給泵4的旋轉流形成體1供給氣體。 According to the present modification, the swirling flow forming body 1 attached to the conveying device 10 may be connected to only one of the liquid supply pump 3 and the gas supply pump 4, respectively. Further, the swirling flow forming body 1 connected to the liquid supply pump 3 and the swirling flow forming body 1 connected to the gas supply pump 4 may be alternately arranged in the conveying device 10. In this case, for example, when the conveying device 10 conveys the plate-shaped member W in the liquid, the liquid can be supplied only to the swirling flow forming body 1 connected to the liquid supply pump 3, and the conveying device 10 is in the gas. When the plate-shaped member W is conveyed in the middle, the gas may be supplied only to the swirling flow forming body 1 connected to the gas supply pump 4.

在本例,連接於液體供給泵3的旋轉流形成體1,是本發明的「第2保持裝置」的一例。具備該旋轉流形成體1的導入路17a及17c是本發明的「液體通路」的一例。另一方面,連接於氣體供給泵4的旋轉流形成體1,是本發明的「第1保持裝置」的一例。具備該旋轉流形成體1的導入路17b及17d是本發明的「氣體流形成手段」的一例。 In this example, the swirling flow forming body 1 connected to the liquid supply pump 3 is an example of the "second holding device" of the present invention. The introduction paths 17a and 17c including the swirling flow forming body 1 are examples of the "liquid passage" of the present invention. On the other hand, the swirling flow forming body 1 connected to the gas supply pump 4 is an example of the "first holding means" of the present invention. The introduction paths 17b and 17d including the swirling flow forming body 1 are examples of the "gas flow forming means" of the present invention.

此外,在搬送裝置10,將液體供給到連接於液體供給泵3的旋轉流形成體1的同時,也可將氣體供給到連接於氣體供給泵4的旋轉流形成體1。此時,連接於液體供給泵3的旋轉流形成體1(具體而言,是導入路17a及17c),是在連接於氣體供給泵4的旋轉流形成體1(具體而言,是導入路17b及17d)形成氣體的旋轉流的期間,形成液體的旋轉流。 Further, in the conveying device 10, the liquid is supplied to the swirling flow forming body 1 connected to the liquid supply pump 3, and the gas may be supplied to the swirling flow forming body 1 connected to the gas supply pump 4. At this time, the swirling flow forming body 1 (specifically, the introduction paths 17a and 17c) connected to the liquid supply pump 3 is the swirling flow forming body 1 connected to the gas supply pump 4 (specifically, the introduction path) 17b and 17d) form a swirling flow of the liquid during the formation of the swirling flow of the gas.

此外,在搬送裝置10也可安裝第2實施形態的旋轉流形成體5取代旋轉流形成體1。 Further, the rotary flow forming body 5 of the second embodiment may be attached to the conveying device 10 instead of the swirling flow forming body 1.

3-2.變形例2 3-2. Modification 2

在上述的變形例1,搬送裝置10的形狀也可被變更。圖10表示本變形例的搬送裝置20的構造的一例的圖。具體而言,圖10(a)是搬送裝置20的底面圖,圖10(b)是搬送裝置20的側視圖。搬送裝置20,是如圖 10所示具備有:基體201、10個旋轉流形成體1、以及12個摩擦構件102A。 In the first modification described above, the shape of the conveying device 10 can also be changed. FIG. 10 is a view showing an example of the structure of the conveying device 20 of the present modification. Specifically, FIG. 10( a ) is a bottom view of the conveying device 20 , and FIG. 10( b ) is a side view of the conveying device 20 . The conveying device 20 is as shown in the figure 10 is provided with a base body 201, ten swirling flow forming bodies 1, and twelve friction members 102A.

基體201,是雙叉的叉子形狀的板狀構件,且是由矩形的把持部2011、從把持部2011分歧的2個腕部2012形成。基體201的材質,是例如鋁合金。10個旋轉流形成體1是被設在構成基體201的2個腕部2012的一面(具體而言,被設在與作為被搬送物的板狀構件W對置的面)(以下稱「底面」。)。10個旋轉流形成體1,是在2個腕部2012被配置在相同的圓的周上。按各腕部2012等間隔配置有5個旋轉流形成體2。 The base 201 is a bifurcated fork-shaped plate-like member, and is formed by a rectangular grip portion 2011 and two wrist portions 2012 that are branched from the grip portion 2011. The material of the base 201 is, for example, an aluminum alloy. The ten swirling flow forming bodies 1 are provided on one surface of the two wrist portions 2012 constituting the base body 201 (specifically, they are provided on a surface facing the plate-shaped member W as the object to be conveyed) (hereinafter referred to as "bottom surface"). ".). The ten swirling flow forming bodies 1 are arranged on the circumference of the same circle in the two wrist portions 2012. Five swirling flow forming bodies 2 are disposed at equal intervals of the respective wrist portions 2012.

12個摩擦構件102A,是被設在2個腕部2012的底面,且為板狀的構件。12個摩擦構件102A在該底面,等間隔被配置在與配置有旋轉流形成體1相同的圓的圓上。在各腕部2012,配置成藉由2個摩擦構件102A夾著1個旋轉流形成體1。各摩擦構件102A,是與作為被搬送物的板狀構件W的表面接觸,並藉由在與該表面之間產生的摩擦力防止板狀構件的移動。各摩擦構件102A的材質,是例如氟橡膠。 The twelve friction members 102A are members that are provided on the bottom surface of the two wrist portions 2012 and have a plate shape. The twelve friction members 102A are disposed on the bottom surface at equal intervals on a circle having the same circle as the swirling flow forming body 1. In each of the wrist portions 2012, one rotating flow forming body 1 is placed between the two friction members 102A. Each of the friction members 102A is in contact with the surface of the plate-like member W as the object to be conveyed, and the movement of the plate-like member is prevented by the frictional force generated between the friction members 102A. The material of each friction member 102A is, for example, fluororubber.

3-3.變形例3 3-3. Modification 3

在上述的第2實施形態,雖採用形成旋轉流的旋轉流形成體5,可是也可採用形成放射流的放射流形成體取代這個。圖11表示本變形例的放射流形成體6的一例的立體圖。旋轉流形成體6,是藉由吐出流體讓負壓在與作為 被搬送物的板狀構件W之間產生來保持該板狀構件W。 In the second embodiment described above, the swirling flow forming body 5 that forms the swirling flow is used instead of the radial flow forming body that forms the radial flow. FIG. 11 is a perspective view showing an example of the radiation flow forming body 6 of the present modification. The swirling flow forming body 6 is made by discharging a fluid to cause a negative pressure The plate-shaped member W is held between the plate-like members W of the object to be conveyed.

放射流形成體6是如圖11所示,具備有:本體61、環狀凹部62、端面63、對置面64、以及傾斜面65。本體61具有圓柱形狀。端面63,是在本體61的一面(具體而言,面對作為被搬送物的板狀構件W的面)(以下稱為「底面」)形成平坦狀。環狀凹部62被形成在端面63。環狀凹部62是與本體61的外周呈同心圓狀被形成。對置面64在本體61的底面被形成平坦狀。對置面64,是周圍被環狀凹部62所圍繞,且是與作為被搬送物的板狀構件W對置的面。對置面64在本體61的底面形成對端面63凹陷。傾斜面65,是被形成在環狀凹部62的開口部(具體而言,被形成在其外周緣)。 As shown in FIG. 11, the radiation flow forming body 6 includes a main body 61, an annular concave portion 62, an end surface 63, an opposing surface 64, and an inclined surface 65. The body 61 has a cylindrical shape. The end surface 63 is formed in a flat shape on one surface of the main body 61 (specifically, a surface facing the plate-like member W as the object to be conveyed) (hereinafter referred to as "bottom surface"). An annular recess 62 is formed at the end surface 63. The annular recessed portion 62 is formed concentrically with the outer circumference of the body 61. The opposing surface 64 is formed in a flat shape on the bottom surface of the body 61. The opposing surface 64 is a surface surrounded by the annular recessed portion 62 and opposed to the plate-shaped member W as the object to be conveyed. The opposing surface 64 is recessed toward the end surface 63 on the bottom surface of the body 61. The inclined surface 65 is an opening formed in the annular recess 62 (specifically, formed on the outer periphery thereof).

圖12是放射流形成體6的底面圖。圖13為圖11的E-E線剖視圖。如圖12及圖13所示,放射流形成體6進一步具備有:6根的噴孔66、導入路67、導入口68、環狀通路69、以及連通路70。導入口67,是被設在本體61的上面(亦即,與底面相反的面)的中央且具有圓形狀。導入口67,是例如經由管件和圖4所示的液體供給泵3及氣體供給泵4連接。導入路68,是被設在本體61的內部,且沿著本體61的中心軸呈直線狀延伸。導入路68,其一端與導入口67連通,另一端與連通路70連通。導入路68,是將經由導入口67將被供給到本體61內的流體供給到環狀通路70。 FIG. 12 is a bottom view of the radiation flow forming body 6. Fig. 13 is a sectional view taken along line E-E of Fig. 11; As shown in FIGS. 12 and 13, the radiation flow forming body 6 further includes six injection holes 66, an introduction path 67, an introduction port 68, an annular passage 69, and a communication path 70. The inlet 67 is provided at the center of the upper surface of the body 61 (that is, the surface opposite to the bottom surface) and has a circular shape. The inlet port 67 is connected to the gas supply pump 3 and the gas supply pump 4 shown in Fig. 4, for example, via a pipe. The introduction path 68 is provided inside the body 61 and extends linearly along the central axis of the body 61. The introduction path 68 has one end that communicates with the introduction port 67 and the other end that communicates with the communication path 70. The introduction path 68 supplies the fluid supplied into the body 61 through the introduction port 67 to the annular passage 70.

連通路70,是被設在本體61的內部,且朝環 狀通路69的半徑方向呈直線狀延伸。連通路70,在其軸向中央部與導入路68連通,在其兩端部與環狀通路69連通。連通路70,是將從導入路68所供給的流體供給到環狀通路69。環狀通路69,是被設在本體61的內部且具有圓筒形狀。環狀通路69是與本體61呈同軸被形成。環狀通路69,是將從連通路70所供給的流體供給到噴孔66。 The communication path 70 is disposed inside the body 61 and faces the ring The radial direction of the passage 69 extends linearly. The communication passage 70 communicates with the introduction passage 68 at the central portion in the axial direction, and communicates with the annular passage 69 at both end portions thereof. The communication passage 70 supplies the fluid supplied from the introduction path 68 to the annular passage 69. The annular passage 69 is provided inside the body 61 and has a cylindrical shape. The annular passage 69 is formed coaxially with the body 61. The annular passage 69 supplies the fluid supplied from the communication passage 70 to the injection hole 66.

6根噴孔66,分別相對於端面63或對置面64大致平行,且形成朝本體61的底面或上面的半徑方向呈直線延伸,而其一端是與環狀通路69連通,另一端是與環狀凹部62連通。6根的噴孔66,是以相鄰的噴孔66彼此形成大致45度的角度地被配置在同一平面上。各噴孔66,是將氣體等的流體吐出到環狀凹部62內而形成放射流。各噴孔66是本發明的「流體流形成手段」的一例。 The six injection holes 66 are substantially parallel with respect to the end surface 63 or the opposite surface 64, respectively, and are formed to extend in a straight line toward the bottom surface or the upper surface of the body 61, and one end thereof is in communication with the annular passage 69, and the other end is The annular recesses 62 are in communication. The six injection holes 66 are disposed on the same plane with the adjacent injection holes 66 formed at an angle of substantially 45 degrees to each other. Each of the injection holes 66 discharges a fluid such as a gas into the annular recessed portion 62 to form a radial flow. Each of the injection holes 66 is an example of the "fluid flow forming means" of the present invention.

經由導入口67對上述所說明的放射流形成體6供給流體時,其流體通過導入路68、連通路70及環狀通路69從噴孔66被吐出到環狀凹部62內。被吐出到環狀凹部62的流體,是從環狀凹部62的開口部流出。此時,板狀構件W和對置面64對置存在時,限制外部流體(例如空氣、水)往對置面64與板狀構件W之間的空間的流入,並藉由放射流的吸引效果,使該空間的每單位體積的流體分子的密度變小,而使產生負壓。此結果,板狀構件W藉由周圍的流體被按壓而被拉到端面63側。另一方面,隨著端面63與板狀構件W的距離的接近,限制了從環狀凹部62內流出的流體的量,使得從噴孔66朝環狀 凹部62內被吐出的流體的速度變慢,而使該空間的壓力上昇。此結果,板狀構件W沒有與端面63接觸,而在板狀構件W與端面63之間保有一定的距離。 When the fluid is supplied to the radiation flow forming body 6 described above via the introduction port 67, the fluid is discharged from the injection hole 66 into the annular concave portion 62 through the introduction path 68, the communication path 70, and the annular passage 69. The fluid discharged into the annular recess 62 flows out from the opening of the annular recess 62. At this time, when the plate-like member W and the opposing surface 64 are opposed to each other, the inflow of the external fluid (for example, air or water) to the space between the opposing surface 64 and the plate-like member W is restricted, and the attraction by the radiation flow is attracted. The effect is to make the density of fluid molecules per unit volume of the space small, so that a negative pressure is generated. As a result, the plate member W is pulled to the end face 63 side by the surrounding fluid being pressed. On the other hand, as the distance between the end surface 63 and the plate-like member W is close, the amount of fluid flowing out from the annular recess 62 is restricted so that it is annular from the orifice 66 The velocity of the fluid discharged in the recess 62 is slowed, and the pressure in the space is increased. As a result, the plate member W is not in contact with the end surface 63, and a certain distance is maintained between the plate member W and the end surface 63.

此外,放射流形成體6的構造(尤其,噴孔66的數量、與本體61內的流體流路的構造)並不限於本變形例所示的例子。該構造是依照利用放射流形成體6被搬送的板狀構件W的尺寸、形狀及材質決定即可。 Further, the configuration of the radiation flow forming body 6 (in particular, the number of the injection holes 66 and the configuration of the fluid flow path in the body 61) is not limited to the example shown in the present modification. This structure may be determined in accordance with the size, shape, and material of the plate-like member W that is transported by the radiation flow forming body 6.

此外,上述的變形例1的搬送裝置10也可安裝放射流形成體6取代旋轉流形成體1。此時,被安裝在搬送裝置10的放射流形成體6,分別也可僅與液體供給泵3和氣體供給泵4之中的任一方連接。而且,被連接在液體供給泵3的放射流形成體6、與被連接在氣體供給泵4的放射流形成體6,也可在搬送裝置10交替被配置。在本例,連接於液體供給泵3的放射流形成體6,是本發明的「第2保持裝置」的一例。具備該旋轉流形成體6的噴孔66是本發明的「液體通路」的一例。另一方面,連接於氣體供給泵4的放射流形成體6,是本發明的「第1保持裝置」的一例。具備該放射流形成體6的噴孔66是本發明的「氣體流形成手段」及「氣體通路」的一例。 Further, in the conveying device 10 of the above-described modification 1, the radial flow forming body 6 may be attached to the rotating flow forming body 1. At this time, the radiation flow forming bodies 6 attached to the conveying device 10 may be connected to only one of the liquid supply pump 3 and the gas supply pump 4, respectively. Further, the radiation flow forming body 6 connected to the liquid supply pump 3 and the radiation flow forming body 6 connected to the gas supply pump 4 may be alternately arranged in the conveying device 10. In this example, the radiation flow forming body 6 connected to the liquid supply pump 3 is an example of the "second holding device" of the present invention. The injection hole 66 including the swirling flow forming body 6 is an example of the "liquid passage" of the present invention. On the other hand, the radiation flow forming body 6 connected to the gas supply pump 4 is an example of the "first holding device" of the present invention. The injection hole 66 including the radiation flow forming body 6 is an example of the "gas flow forming means" and the "gas passage" of the present invention.

此外,在放射流形成體6,與第1實施形態的旋轉流形成體1的導入路17同樣也可讓各噴孔66所吐出的流體不同。在本例,將氣體吐出到環狀凹部62形成放射流的噴孔66,是本發明的「氣體流形成手段」的一例。又,將液體吐出到環狀凹部62形成液體的放射流的 噴孔66,是本發明的「液體通路」的一例。 Further, in the radiation flow forming body 6, the fluid discharged from each of the injection holes 66 can be made different as in the introduction path 17 of the rotary flow forming body 1 of the first embodiment. In this example, the gas injection hole 66 which discharges the gas into the annular recessed portion 62 to form a radial flow is an example of the "gas flow forming means" of the present invention. Further, the liquid is discharged to the annular recess 62 to form a discharge of the liquid. The injection hole 66 is an example of the "liquid passage" of the present invention.

3-4.變形例4 3-4. Modification 4

上述的第1實施形態的旋轉流形成體1的形狀也可被變更。圖14表示本變形例的旋轉流形成體1A的一例的底面圖。圖15為圖14的F-F線剖視圖。如圖14及15所示,旋轉流形成體1A與旋轉流形成體1比較進一步具備有凸部18。凸部18,是形成從凹部12的底部延伸而具有圓柱形狀。凸部18是與本體11或凹部12呈同軸被形成。凸部18的上面(具體而言,是與作為被搬送物的板狀構件W對置的面),是相對於端面13形成凹陷。凸部18,是在其外周側面、與本體11的內周側面之間形成液體流路,被吐出到凹部12內的液體,是藉由在該液體流路流動而形成旋轉流。 The shape of the swirling flow forming body 1 of the above-described first embodiment can also be changed. FIG. 14 is a bottom view showing an example of the swirling flow forming body 1A of the present modification. Fig. 15 is a sectional view taken along line F-F of Fig. 14; As shown in FIGS. 14 and 15, the swirling flow forming body 1A further includes a convex portion 18 as compared with the swirling flow forming body 1. The convex portion 18 is formed to extend from the bottom of the concave portion 12 to have a cylindrical shape. The convex portion 18 is formed coaxially with the body 11 or the concave portion 12. The upper surface of the convex portion 18 (specifically, the surface facing the plate-shaped member W as the object to be conveyed) is recessed with respect to the end surface 13. The convex portion 18 has a liquid flow path formed between the outer peripheral side surface and the inner peripheral side surface of the main body 11, and the liquid discharged into the concave portion 12 flows in the liquid flow path to form a swirling flow.

此外,凸部18的上面也可與端面13被形成在同一平面上。又,凸部18的上面的端部也可被形成倒角。 Further, the upper surface of the convex portion 18 may be formed on the same plane as the end surface 13. Further, the upper end portion of the convex portion 18 can also be chamfered.

又,與凸部18同樣的凸部,也可被設在第2實施形態的旋轉流形成體5的凹部52底面。 Further, the convex portion similar to the convex portion 18 may be provided on the bottom surface of the concave portion 52 of the swirling flow forming body 5 of the second embodiment.

3-5.變形例5 3-5. Modification 5

在上述的第1實施形態的旋轉流形成體1,也可採用周知的電動風扇取代導入路17b及17d(例如參閱日本特開2011-138948號公報)。具體而言,也可在旋轉流形成 體1的本體11設置吸氣口,並且設置風扇,該風扇是被設在凹部12內,藉由其旋轉從吸氣口將氣體吸入凹部12內,讓旋轉流在凹部12內產生。各風扇是本發明的「氣體流形成手段」的一例。該風扇,也可是從導入路17a及17c吐出液體而在凹部12形成液體的旋轉流時,利用電動進行旋轉,也可部旋轉。 In the swirling flow forming body 1 of the above-described first embodiment, a known electric fan may be used instead of the introduction paths 17b and 17d (see, for example, Japanese Laid-Open Patent Publication No. 2011-138948). Specifically, it can also be formed in a rotating stream The body 11 of the body 1 is provided with an intake port, and a fan is provided. The fan is disposed in the recess 12, and the gas is sucked into the recess 12 from the intake port by the rotation thereof, and the swirling flow is generated in the recess 12. Each fan is an example of the "gas flow forming means" of the present invention. The fan may be rotated by electric rotation when the liquid is discharged from the introduction paths 17a and 17c and the liquid is formed in the concave portion 12, and may be rotated.

同樣的電動風扇,也可設在第2實施形態的旋轉流形成體5。具體而言,也可在旋轉流形成體5的本體51設置吸氣口,並且設置風扇,該風扇是被設在凹部52內,藉由其旋轉從吸氣口將氣體吸入凹部52內,讓旋轉流在凹部52內產生。各風扇是本發明的「流體流形成手段」的一例。在旋轉流形成體5採用電動風扇時,搬送系統200的微電腦7,也可在凹部52形成液體的旋轉流時,對電磁閥2a輸出接通控制訊號,在凹部52形成氣體的旋轉流的時候,對電動風扇輸出控制訊號。此外,電動風扇也可在凹部52形成有液體的旋轉流時,進行旋轉。 The same electric fan may be provided in the swirling flow forming body 5 of the second embodiment. Specifically, a suction port may be provided in the body 51 of the swirling flow forming body 5, and a fan may be provided. The fan is disposed in the recess 52, and the gas is sucked into the recess 52 from the air inlet by the rotation thereof. The swirling flow is generated in the recess 52. Each fan is an example of the "fluid flow forming means" of the present invention. When the rotary current forming body 5 is an electric fan, the microcomputer 7 of the transport system 200 can output a control signal to the electromagnetic valve 2a when the concave portion 52 forms a swirling flow of the liquid, and a swirling flow of the gas is formed in the concave portion 52. , output control signal to the electric fan. Further, the electric fan may be rotated when the concave portion 52 is formed with a swirling flow of the liquid.

3-6.變形例6 3-6. Modification 6

上述的搬送裝置10的基體101的構造不限於上述的變形例1所示的例子。又,被設置在搬送裝置10的基體101的摩擦構件102及孔部103的數量、形狀及配置不限於上述的變形例1所示的例子。該等的要素,是依照利用搬送裝置10被搬送的板狀構件W的尺寸、形狀及材質決定即可。摩擦構件102及孔部103本來也可部被設在搬送 裝置10的基體101。摩擦構件102沒有被設在搬送裝置10的基體101時,在基體101為了進行板狀構件W的定位,也可設置周知的定心導件(例如參閱日本特開2005-51260號公報)。同樣,上述的搬送裝置20的基體201的構造也不限於上述的變形例2所示的例子。 The structure of the base 101 of the above-described conveying device 10 is not limited to the example shown in the above-described modification 1. Moreover, the number, shape, and arrangement of the friction member 102 and the hole portion 103 provided in the base 101 of the conveying device 10 are not limited to the examples shown in the above-described first modification. These elements may be determined in accordance with the size, shape, and material of the plate-shaped member W conveyed by the conveying device 10. The friction member 102 and the hole portion 103 may be originally provided for transportation. The base 101 of the device 10. When the friction member 102 is not provided in the base 101 of the conveying device 10, a well-known centering guide can be provided in the base 101 for positioning the plate-shaped member W (for example, see JP-A-2005-51260). Similarly, the structure of the base 201 of the above-described conveying device 20 is not limited to the example shown in the second modification described above.

3-7.變形例7 3-7. Modification 7

被設置在上述的搬送裝置10的基體101的旋轉流形成體1的數量、構造及配置不限於上述的變形例1所示的例子。該等的要素,是依照利用搬送裝置10被搬送的板狀構件W的尺寸、形狀及材質決定即可。例如旋轉流形成體1的數量也可不足12個也可13個以上。又,旋轉流形成體1也可沿著基體1的外周排列2列以上。同樣,被設置在上述的搬送裝置20的基體201的旋轉流形成體5的數量、構造及配置不限於上述的變形例2所示的例子。 The number, structure, and arrangement of the swirling flow forming bodies 1 provided in the base body 101 of the above-described conveying device 10 are not limited to the examples shown in the above-described first modification. These elements may be determined in accordance with the size, shape, and material of the plate-shaped member W conveyed by the conveying device 10. For example, the number of the swirling flow forming bodies 1 may be less than 12 or 13 or more. Further, the swirling flow forming body 1 may be arranged in two or more rows along the outer circumference of the base body 1. Similarly, the number, structure, and arrangement of the swirling flow forming bodies 5 provided in the base body 201 of the above-described conveying device 20 are not limited to the examples shown in the above-described second modification.

3-8.變形例8 3-8. Modification 8

上述的第1實施形態的旋轉流形成體1的本體11的形狀不限於圓柱也可為角柱、橢圓柱。又,被設在旋轉流形成體1的導入路17的數量不限於4條,也可為3條以下也可為5條以上。又,傾斜面15不設置亦可(亦及,端面13的端部不是倒角亦可)。以上所述的變形,也可採用在旋轉流形成體5。 The shape of the main body 11 of the swirling flow forming body 1 of the above-described first embodiment is not limited to a cylindrical shape, and may be a corner post or an elliptical cylinder. Moreover, the number of the introduction paths 17 provided in the swirling flow forming body 1 is not limited to four, and may be three or less or five or more. Further, the inclined surface 15 may not be provided (it is also possible that the end portion of the end surface 13 is not chamfered). The above-described deformation can also be employed in the swirling flow forming body 5.

1‧‧‧旋轉流形成體 1‧‧‧Rotating flow forming body

11‧‧‧本體 11‧‧‧Ontology

12‧‧‧凹部 12‧‧‧ recess

14a‧‧‧噴出口 14a‧‧‧Spray outlet

14b‧‧‧噴出口 14b‧‧‧Spray outlet

14c‧‧‧噴出口 14c‧‧‧Spray outlet

14d‧‧‧噴出口 14d‧‧‧Spray outlet

16a‧‧‧導入口 16a‧‧‧Import

16b‧‧‧導入口 16b‧‧‧Import

16c‧‧‧導入口 16c‧‧‧Import

16d‧‧‧導入口 16d‧‧‧Import

17a‧‧‧導入路 17a‧‧‧Introduction

17b‧‧‧導入路 17b‧‧‧Introduction

17c‧‧‧導入路 17c‧‧‧Introduction

17d‧‧‧導入路 17d‧‧‧Introduction

Claims (7)

一種保持裝置,係藉由吐出流體讓負壓在與板狀的構件之間產生來保持該構件的保持裝置,其中具備有:柱狀的本體;被形成在前述本體面對前述構件的平板狀的端面;被形成在前述端面的凹部;氣體流形成手段,該手段係在前述凹部內形成氣體的旋轉流;或將氣體吐出到前述凹部內而形成放射流;以及對前述凹部內吐出液體,而形成液體的旋轉流或放射流的1以上的液體通路,前述氣體流形成手段,是將氣體吐出到前述凹部內,而形成氣體的旋轉流或放射流的1以上的氣體通路,前述液體通路與前述氣體通路為個別的通路。 A holding device is a holding device that holds a negative pressure between a member and a plate-like member to hold the member, and is provided with a columnar body; a flat plate formed on the body facing the member a concave portion formed on the end surface; a gas flow forming means for forming a swirling flow of gas in the concave portion; or discharging a gas into the concave portion to form a radial flow; and discharging a liquid into the concave portion; Further, one or more liquid passages for forming a swirling flow or a radial flow of the liquid, wherein the gas flow forming means discharges the gas into the concave portion to form one or more gas passages of a swirling or radial flow of the gas, and the liquid passage The gas passages are separate passages. 如申請專利範圍第1項記載的保持裝置,其中,前述1以上的液體通路,是在前述氣體流形成手段形成前述氣體的旋轉流或放射流的期間,形成前述液體的旋轉流或放射流。 The holding device according to the first aspect of the invention, wherein the one or more liquid passages are formed by forming a swirling or radial flow of the liquid while the gas flow forming means forms a swirling or radial flow of the gas. 一種保持系統,係具備有:保持裝置、與流體切換手段,該保持裝置,係藉由吐出流體讓負壓在與板狀的構件之間產生來保持前述構件的保持裝置,且具備有:柱狀的本體;被形成在前述本體面對前述構件的平板狀的端面;被形成在前述端面的凹部;氣體流形成手段,該手段係在前述凹部內形成氣體的 旋轉流;或將氣體吐出到前述凹部內而形成放射流;以及1以上的液體通路,該液體通路係將液體吐出至前述凹部內,而形成液體的旋轉流或放射流,前述氣體流形成手段,是將氣體吐出到前述凹部內,而形成氣體的旋轉流或放射流的1以上的氣體通路,前述液體通路與前述氣體通路為個別的通路,該流體切換手段,係與前述保持裝置連接,將被供給到前述保持裝置的流體在氣體與液體之間進行切換。 A holding system includes: a holding device and a fluid switching means, wherein the holding device is a holding device that holds a negative pressure between a member and a plate-like member to hold the member, and is provided with a column a body formed on the flat end surface of the body facing the member; a recess formed in the end surface; a gas flow forming means for forming a gas in the recess Rotating the flow; or discharging the gas into the recess to form a radial flow; and 1 or more liquid passages for discharging the liquid into the recess to form a swirling or radiating flow of the liquid, the gas flow forming means Discharging a gas into the concave portion to form a gas flow of one or more of a swirling flow or a radial flow of the gas, wherein the liquid passage and the gas passage are separate passages, and the fluid switching means is connected to the holding device. The fluid to be supplied to the aforementioned holding device is switched between the gas and the liquid. 一種控制方法,係控制具備有保持裝置、流體切換手段、與控制手段的保持系統的方法,該保持裝置,係藉由吐出流體讓負壓在與板狀的構件之間產生來保持前述構件的保持裝置,且具備有:柱狀的本體;被形成在前述本體面對前述構件的平板狀的端面;被形成在前述端面的凹部;氣體流形成手段,該手段係在前述凹部內形成氣體的旋轉流;或將氣體吐出到前述凹部內而形成放射流;以及1以上的液體通路,該液體通路係將液體吐出至前述凹部內,而形成液體的旋轉流或放射流,前述氣體流形成手段,是將氣體吐出到前述凹部內,而形成氣體的旋轉流或放射流的1以上的氣體通路,前述液體通路與前述氣體通路為個別的通路,該流體切換手段,係與前述保持裝置連接,將被供給到前述保持裝置的流體在氣體與液體之間進行切換, 該控制手段,係與前述流體切換手段連接來控制前述流體切換手段,其中具備有:前述控制手段控制前述流體切換手段,將氣體供給到前述保持裝置的步驟;以及前述控制手段控制前述流體切換手段,將液體供給到前述保持裝置的步驟。 A control method for controlling a holding system including a holding device, a fluid switching means, and a control means for holding a negative pressure in a plate-like member by discharging a fluid to hold the member The holding device further includes: a columnar body; a flat end surface formed on the body facing the member; a recess formed in the end surface; and a gas flow forming means for forming a gas in the recess Rotating the flow; or discharging the gas into the recess to form a radial flow; and 1 or more liquid passages for discharging the liquid into the recess to form a swirling or radiating flow of the liquid, the gas flow forming means Discharging a gas into the concave portion to form a gas flow of one or more of a swirling flow or a radial flow of the gas, wherein the liquid passage and the gas passage are separate passages, and the fluid switching means is connected to the holding device. The fluid to be supplied to the aforementioned holding device is switched between the gas and the liquid, The control means is connected to the fluid switching means for controlling the fluid switching means, wherein the control means controls the fluid switching means to supply gas to the holding means; and the control means controls the fluid switching means a step of supplying a liquid to the aforementioned holding means. 一種搬送裝置,係具備有:第1保持裝置、與第2保持裝置,該第1保持裝置,係藉由吐出氣體讓負壓在與板狀的構件之間產生來保持前述構件的第1保持裝置,且具備有:柱狀的第1本體;被形成在前述第1本體面對前述構件的平板狀的第1端面;被形成在前述第1端面的第1凹部;以及氣體流形成手段,該手段係在前述第1凹部內形成氣體的旋轉流;或將氣體吐出到前述第1凹部內而形成放射流,該第2保持裝置,係藉由吐出液體讓負壓在與前述構件之間產生來保持前述構件的第2保持裝置,且具備有:柱狀的第2本體;被形成在前述第2本體面對前述構件的平板狀的第2端面;被形成在前述第2端面的第2凹部;以及 將液體吐出到前述第2凹部內,而形成液體的旋轉流或放射流的1以上的液體通路。 A conveying device includes: a first holding device and a second holding device that holds a negative pressure between a plate-shaped member and a first holding device to hold the first holding of the member The apparatus includes: a columnar first body; a first end surface formed in a flat shape in which the first body faces the member; a first recess formed in the first end surface; and a gas flow forming means; In this method, a swirling flow of gas is formed in the first recessed portion, or a gas is discharged into the first recessed portion to form a radial flow, and the second holding device causes a negative pressure between the member and the member by discharging the liquid. a second holding device that holds the member, and includes a columnar second body; a second end surface formed in a flat shape in which the second body faces the member; and a second end surface formed on the second end surface 2 recesses; The liquid is discharged into the second concave portion to form one or more liquid passages of the swirling flow or the radial flow of the liquid. 如申請專利範圍第5項記載的搬送裝置,其中,前述氣體流形成手段,是將氣體吐出到前述第1凹部內,而形成氣體的旋轉流或放射流的1以上的氣體通路。 In the conveying apparatus according to the fifth aspect of the invention, the gas flow forming means is a gas passage that discharges a gas into the first concave portion to form a swirling or radial flow of the gas. 如申請專利範圍第5項或第6項記載的搬送裝置,其中,前述1以上的液體通路,是在前述氣體流形成手段形成前述氣體的旋轉流或放射流的期間,形成前述液體的旋轉流或放射流。 In the above-described one or more liquid passages, the liquid passage forming means rotates the swirling flow or the radial flow of the gas while the gas flow forming means forms the swirling flow of the liquid. Or radiation flow.
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