TWI564066B - Plasma reactor for purifying exhaust gas of the process facility - Google Patents

Description

Plasma reactor for purifying exhaust gas from process equipment 【0001】

The invention relates to a plasma reactor, in particular to a plasma reactor capable of decomposing exhaust gas discharged from a process chamber, which can detect whether an abnormality occurs in the exhaust gas, reduce a discharge current, and thereby reduce power consumption and The direction in which the exhaust gas flows in the surrounding surface of the pipe that will form a vortex is reduced.

【0002】

Processes, such as the formation of functional thin layers and dry etching, are used in the fabrication of semiconductors, display devices, or solar cells, and these processes are typically performed in a vacuum chamber. A variety of different metal and non-metal precursors are used as process gases in the formation of functional thin layers, and various etching gases are used for dry etching.

[0003]

A system for exhausting air in a process chamber, including a process chamber, a vacuum pump, and a scrubber, is connected to each other through an exhaust line. Under this condition, the gas discharged from the process chamber may contain gaseous molecules or non-reactive precursors and solid crystal seeds in a mist state, even if they vary depending on the process. This gas is more likely to contain an inert gas as a carrier gas. The exhaust gas is guided to the vacuum pump along the exhaust line. In the vacuum pump, since the exhaust gas is compressed at a high temperature of 100 ° C or higher, the exhaust gas is easily changed in phase, so that solid by-products are easily formed and accumulated. Corrosive gases that corrode these by-products in vacuum pumps, containing fluorine (F) and chlorine (Cl), can cause problems with the vacuum pump.

[0004]

The conventional method for improving the problem of the vacuum pump caused by the exhaust gas includes injecting a washing gas into the vacuum pump to suction the exhaust gas, thereby reducing the partial pressure generated by the solid by-products which may constitute the exhaust gas, and suppressing the formation of the by-product. The most commonly used scrubbing gas is dry air or nitrogen.

[0005]

In order to solve the problem of solid particles accumulating in the vacuum pump due to exhaust gas, a more effective method is to install a hot trap or a cold trap in the exhaust line, however, this method has high energy. Constraints on consumption and low purification efficiency. In order to improve this problem together, the entire exhaust system is reconfigured in the form of a main equipment - low pressure plasma device - vacuum pump - scrubber by adding a low pressure plasma device at the front end of the vacuum pump to take advantage of this attempt to obtain better effect. Korean Patent Registration No. 1065013 discloses a technique of a plasma reactor in which an alternating current driving voltage is applied to a plasma reactor to cause a barrier of the pipeline to be discharged to decompose the exhaust gas.

[0006]

However, in the previous case, a leakage problem occurs, and the leakage occurs at a gap position where the plasma reactor is connected to the pipeline or a gap where the pipeline and the electrode are connected to each other, which means that when the plasma reactor operates At the time, these gaps are widened due to vibration, heat shrinkage or thermal expansion, so that the possibility of exhaust gas leakage may occur. In addition, as the temperature of the plasma reactor increases, the corrosion rate of corrosive process gases containing fluorine and chlorine also increases, causing cracks in the plasma reactor.

【0007】

The present invention provides a plasma reactor for decomposing exhaust gas discharged from a process chamber, which is capable of detecting an abnormality in the exhaust gas to reduce a discharge current, thereby reducing power consumption and reducing exhaust gas flow to form a vortex. The direction of the surrounding surface inside the pipe.

[0008]

According to an aspect of the invention, a plasma reactor is provided between a process chamber and a vacuum pump for decomposing an exhaust gas discharged from the process chamber, the plasma reactor comprising: a piping system The exhaust gas flows; a plasma generating unit is disposed on the pipeline, and generates a plasma discharge to decompose the exhaust gas; a casing surrounds the pipeline, and a separation is formed between the casing and the peripheral surface outside the pipeline Space; a detection unit detects the environmental condition of the pipeline or the separation space; and a controller receives information about the environmental condition from the detection unit to determine the state of the pipeline or the separation space.

【0009】

According to the present invention, a plasma reactor has the following effects.

[0010]

First, a detection unit is mounted in a housing that surrounds a conduit, using the environmental conditions of the separation space between the conduit and the housing to detect an abnormality in the plasma reactor. In particular, a temperature sensor or a gas sensor is used as a detecting unit for detecting information about the environmental condition of the separation space in the pipeline or the casing in a short time, so that the detection can be detected more quickly. Whether there is an abnormality in the plasma reactor.

[0011]

Second, when a controller detects whether there is an abnormality in the separation space in the pipeline or the casing, using the information received from the detection unit, an alarm is issued or the operation of the plasma reactor is stopped to avoid the flow outside the exhaust gas. A security incident that occurred. In particular, it is set so that when the controller detects that there is an abnormality in the space inside the pipe or the casing, the power of the plasma reactor is automatically cut off, so that it can be cut off after a worker has an alarm. The power of the slurry reactor also has a faster response, so it can achieve the effect of avoiding fire explosions or casualties.

[0012]

Third, a slit or an opening is formed in at least one of the first electrode portion and the second electrode portion to reduce a region of at least one of the first electrode portion and the second electrode portion. Therefore, the amount of discharge current can be reduced during plasma discharge, so that power consumption can be reduced, and the energy efficiency of the plasma reactor can be improved.

[0013]

Fourth, a region of at least one of the first electrode portion and the second electrode portion may be formed by a size or a number of slits or openings formed on at least one of the first electrode portion and the second electrode portion. Adjusted to maintain power consumption at a low level while preventing degradation of exhaust gas decomposition efficiency.

[0014]

Fifth, a reactive gas is injected so that the exhaust gas can be converted into a vortex and can flow in the pipeline. This vortex form can cause a greater amount of exhaust gas to approach the area where the plasma discharge is concentrated, so that the vortex form can be more in contact with the plasma discharge, and a larger amount of exhaust gas can be decomposed. In particular, since the reaction gas system is injected in the direction in which the exhaust gas is generated, the reaction gas is introduced into the piping to push the exhaust gas and to keep the exhaust gas in the pipeline for a certain period of time, so that the decomposition efficiency of the exhaust gas can be further improved.

[0086]

10‧‧‧Processing chamber

30‧‧‧vacuum pump

50‧‧‧ scrubber

100, 100a, 100b, 100c, 200, 200a, 200b, 200c, 200d, 200e, 300, 300a, 300b, 300c, 300d, 300e‧‧‧ plasma reactor

110, 310‧‧‧ pipeline

120, 220, 220a, 220b, 220c, 220d, 220e, 320, 320a, 320b, 320c, 320d, 320e‧‧‧ first electrode

120a‧‧‧ coil part

120b‧‧‧Magnetic field generating unit

130, 230, 230a, 230b, 230c, 230d, 230e, 330, 330a, 330b, 330c, 330d, 330e‧‧‧ second electrode

131,331‧‧‧Exhaust gas inlet

132, 332‧‧ ‧ exhaust gas export

140, 340‧‧‧ housing

150‧‧‧Detection unit

221, 221a, 321, 321a, 321c‧‧‧ first surrounding

222, 222a, 322, 322a‧‧‧ second surrounding

223, 223a, 323, 323a‧‧‧ first connection

224, 224a, 324‧ ‧ second connection

225, 225a, 325, 325a‧‧

221e, 321e‧‧‧ discharge parts of unit electrodes

222e, 322e‧‧‧Front of the unit electrode

223e, 323e‧‧‧ conductive connecting elements

222c, 322c‧‧‧ first slit

232c, 332c‧‧‧ second slit

223d, 233d, 323d, 333d‧‧‧Ignition electrodes

240‧‧‧ gas injection line

[0015]

Figure 1 is a schematic diagram showing the connection relationship between a process chamber, a vacuum chamber, a scrubber and a plasma reactor.

Figure 2 is a schematic illustration of the structure of a plasma reactor in accordance with an embodiment of the present invention.

Figure 3 is a perspective view of the structure of the plasma reactor shown in Figure 2.

Figure 4 is a cross-sectional view showing the structure of a plasma reactor in accordance with another embodiment of the present invention.

Figure 5 is a cross-sectional view showing the structure of a plasma reactor in accordance with still another embodiment of the present invention.

Figure 6 is a perspective view showing the structure of a plasma reactor in accordance with still another embodiment of the present invention.

7 through 9 are perspective views, respectively, of a plasma reactor structure in accordance with still another embodiment of the present invention.

Figure 10 is a perspective view showing the structure of a plasma reactor in accordance with still another embodiment of the present invention.

Figure 11 is a perspective view showing the structure of a plasma reactor in accordance with still another embodiment of the present invention.

Figure 12 is a perspective view showing the structure of a plasma reactor in accordance with still another embodiment of the present invention.

Figure 13 is a perspective view showing the structure of a plasma reactor in accordance with still another embodiment of the present invention.

Figure 14 is a perspective view showing the structure of a plasma reactor in accordance with still another embodiment of the present invention.

15 and 16 are perspective views of the structure of a plasma reactor in accordance with still another embodiment of the present invention.

Figure 17 is a perspective view showing the structure of a plasma reactor in accordance with still another embodiment of the present invention.

Figure 18 is a perspective view showing the structure of a plasma reactor in accordance with still another embodiment of the present invention.

Figure 19 is a perspective view showing the structure of a plasma reactor in accordance with still another embodiment of the present invention.

Figure 20 is a perspective view showing the structure of a plasma reactor in accordance with still another embodiment of the present invention.

Figure 21 is a perspective view showing the structure of a plasma reactor in accordance with still another embodiment of the present invention.

[0016]

First, a configuration of a plasma reactor is described in detail according to an embodiment of the present invention. A plasma reactor 100 is disposed between a process chamber 10 and a vacuum pump 30 to decompose an exhaust gas. The metal precursor, the non-metallic precursor, and the by-products of the process gas and the cleaning gas discharged from the process chamber 10 are as shown in Fig. 1(a). When the exhaust gas inside the process chamber 10 is discharged by the vacuum pump 30, the exhaust gas is decomposed by the plasma reactor 100, purified, and then flows into the vacuum pump 30. However, the plasma reactor 100 does not have to be disposed between the process chamber 10 and the vacuum pump 30. As shown in FIG. 1(b), the plasma reactor 100 can also be disposed between the vacuum pump 30 and a scrubber 50. Further, a plurality of plasma reactors 100 may be installed, and the exhaust gas decomposition and purification process is repeatedly performed. The process chamber 10, the plasma reactor 100, the vacuum pump 30, and the scrubber 50 are connected to each other through an exhaust line.

[0017]

The interior of the process chamber 10 is configured as a vacuum environment, and a plurality of processes, such as ashing, depositing, etching, lithography, purification, and nitrification, are performed in the process chamber 10. In the embodiment of the present invention, the formation of a thin layer or dry etching is performed in the process chamber 10.

[0018]

When a non-reactive metal precursor molecule is decomposed, then a metal by-product or a non-reactive non-metal precursor molecule is decomposed, and then a non-metallic by-product, a non-reactive metal precursor molecule, and a non-reactive non-metal precursor are formed. The molecules are concentrated on the inner surface of one of the vacuum pumps 30 or the inner surface of the scrubber 50, causing many problems to occur. A reactive gas causes the non-reactive metal precursor molecules or non-reactive non-metal precursors to be subsequently decomposed to form fine particles such as metal oxides or non-metal oxides without forming metal by-products or non-metal by-products . In addition, when a non-reactive process gas and a non-reactive cleaning gas particle contain fluorine atoms and chlorine atoms are decomposed, a reactive gas may be generated, and when the reactive gas is referred to the vacuum pump 30, the activation may be changed. F- or Cl-, which causes corrosion or etching to react with a metal surface formed on the inner surface of the vacuum pump 30, and is changed to an amorphous alloy containing HF, HCl, metal atom-F-0, metal atom-Cl -0 or a metal atom - F-Cl-0.

[0019]

2 and 3 are schematic views of a plasma reactor 100 in accordance with an embodiment of the present invention. Referring to Figures 2 and 3, in accordance with an embodiment of the present invention, a plasma reactor 100 includes a conduit 110, a plasma generating unit, a buffer unit (not shown), and a housing 140. a detecting unit 150 and a controller (not shown). First, the pipeline 110 of the plasma reactor 100 is a flow path for providing exhaust gas flow. The pipeline 110 of the plasma reactor 100 is formed into a cylindrical shape, and the inside of the pipeline 110 is along the longitudinal direction of the pipeline. Throughout, the conduit 110 is formed of a high dielectric material such as alumina, zirconia (ZrO ₂ ), yttria (Y ₂ O ₃ ), sapphire, quartz tubing or glass tubing. In particular, the etching resistance of the tube 110 can be improved by sintering alumina and yttrium oxide powder mixed with each other or by thermal spraying of cerium oxide having excellent anti-sputtering on the surface of the alumina material.

[0020]

This plasma generating unit is disposed on the line 110 and causes plasma discharge so that the exhaust gas entering the line 110 can be decomposed. In the embodiment of the present invention, the plasma generating unit includes the first electrode portion 120 disposed on the pipeline 110, and the second electrode portion 130 disposed at a position spaced apart from the first electrode portion 120, and at the second electrode portion 130. A plasma discharge is generated between the first electrode portion 120 to decompose the exhaust gas.

[0021]

The first electrode portion 120 is mounted to match and surround the peripheral surface outside the tube 110, and therefore, the first electrode portion 120 is formed into a tubular form. An alternating current (AC) voltage is applied to the first electrode portion 120, and the first electrode portion 120 is used as a driving electrode. Referring to FIGS. 2 and 3, the first electrode portion 120 is formed to have a large length to extend along the longitudinal direction of the tube 110, however, the embodiment of the present invention is not limited to this length direction. The buffer unit (not shown) has a tubular structure interposed between the pipeline 110 and each of the first electrode portions 120, and the buffer unit (not shown) is made of a material having a conductive or dielectric substance. It is constructed and has elasticity such that the pipe 110 and the first electrode portion 120 can be in close contact with each other.

[0022]

The second electrode portion 130 is connected to one or both ends of the pipe 110 to be electrically connected to the pipe 110. In the embodiment of the present invention, as shown in FIGS. 2 and 3, the second electrode portion 130 is connected to both ends of the pipeline 110 so as to be electrically connected to the conduit 110, and the second electrode portion 130 is attached to the second electrode. A plasma discharge is generated between the portion 130 and the first electrode portion 120. In order to generate a plasma discharge, there should be a voltage difference between the first electrode portion 120 and the second electrode portion 130. Since the AC voltage is applied to the first electrode portion 120, as described above, the second electrode portion 130 needs to be The ground electrode has a voltage difference between the second electrode portion 130 and the first electrode portion 120. Therefore, the second electrode portion 130 is made of metal. Referring to FIGS. 2 and 3, the second electrode portion 130 has a cross-section that gradually decreases along the longitudinal direction of the tube 110. However, embodiments of the present invention are not limited thereto. The two electrode portions 130 may also have a cross section that is uniform along the longitudinal direction of the tube 110.

[0023]

The exhaust gas discharged from the process chamber 110 is introduced into the second electrode portion 130, flows, decomposes in the pipe 110, and is discharged from the other end of the second electrode portion 130. Referring to FIGS. 2 and 3, the exhaust gas is introduced to the upper second electrode portion 130, so that the exhaust gas inlet 131 is formed on the upper second electrode portion 130, and the exhaust gas can be discharged from the lower second electrode portion 130. Therefore, the exhaust gas outlet 132 is formed in the lower second electrode portion 130.

[0024]

Exhaust gas is introduced into the exhaust gas inlet 131, flows within the conduit 110, and the exhaust gas has a certain pressure present in the conduit 110. In this case, when an alternating voltage is applied to the first electrode portion 120 as a driving voltage, electrons start to move between the first electrode portion 120 and the second electrode portion 130 as a ground electrode, and plasma discharge occurs, so that plasma discharge occurs. The plasma reactor 100 can decompose the exhaust gas.

[0025]

The housing 140 surrounds the conduit 110 to protect the outer surface of the conduit 110 and the first electrode portion 120 at a peripheral surface outside the conduit 110. The housing 140 forms a separation space between the housing 140 and the outer surface of the conduit 110.

[0026]

The detecting unit 150 is installed in the housing 140, that is, on the outer surface of the pipeline 110, and the detecting unit 150 is used to detect the environmental condition of the pipeline 110 or the separation space. In detail, the detecting unit 150 detects when the surface temperature of the pipeline 110 or the temperature of the separation space is equal to or higher than a preset temperature or detects the environmental condition of the separation space. When the detecting unit 150 detects information about the environmental condition of the pipeline 110 or the separation space, the controller (not shown) can receive the information to determine whether an abnormality occurs in the pipeline 110 or the separation space, and an alarm is issued. Or stop the plasma discharge. Therefore, the controller includes one or more alarms (not shown) that can issue an alarm and a power switch (not shown) that can lock the plasma generating unit to stop the plasma discharge.

[0027]

If the environmental condition is the temperature of the pipeline 110 or the separation space, the detecting unit 150 is a temperature sensor; if the environmental condition is a specific gas, the system is set and exists in the separation space, and the detection The measuring unit 150 is a gas sensor.

[0028]

First, when the detecting unit 150 is a temperature sensor, the detecting unit 150 detects whether the temperature of the pipeline 110 or the separation space is equal to or greater than a preset temperature. After the plasma reactor decomposes the exhaust gas for a long period of time, the exhaust gas may leak from the gap between the portion where the pipe 110 and the second electrode portion 130 are connected to each other, and the exhaust gas may be introduced into the separation space. Alternatively, when the line 110 is overheated, a crack is generated in the line 110, at which time the exhaust gas may leak from the crack.

[0029]

At the same time, the exhaust gas is introduced into the separation space and fills the separation space, and the plasma discharge required for decomposing the exhaust gas has a very high temperature, so that the temperature of the leakage exhaust gas filled in the separation space rises, and therefore, when the temperature sensor 150 detects that the temperature of the separation space gradually rises and is equal to or greater than the preset temperature, the temperature sensor transmits the detection information to the controller, thereby preventing a safety accident caused by the outflow of the exhaust gas.

[0030]

In addition, the detecting unit 150 can detect whether the surface temperature of the pipeline is equal to or greater than a preset temperature, and can also detect whether the pipeline 110 is overheated. As described above, even if the exhaust gas does not leak, the plasma reactor is excessively overheated when the exhaust gas is decomposed for a long period of time. Therefore, when the detecting unit 150 detects that the surface temperature of the pipeline 110 is equal to or greater than At a preset temperature, the operation of the plasma reactor 100 can be stopped to prevent a safety accident caused by damage to the superheated line 110 and gas leakage.

[0031]

When the detecting unit 150 is a gas sensor, the gas sensor detects whether a specific gas disposed in the separation space exists in the exhaust gas. When the plasma discharge in the pipe 110 continues to decompose the exhaust gas, the portion where the pipe 110 and the second electrode portion 130 are connected to each other may become slack due to microvibration and thermal deformation, so that the exhaust gas may be from the pipe 110 and The gap of the second electrode portion 130 connected to each other leaks, and exhaust gas may be introduced into this separation space.

[0032]

When the exhaust gas leaks from the gap of the portion where the pipe 110 and the second electrode portion 130 are connected to each other, the separation space is filled with the exhaust gas. Different gases are mixed with the exhaust gases. In this case, the gas sensor 150 is installed in the separation space to detect whether a predetermined specific gas exists in the exhaust gas leaking into the separation space, and when the gas sensor 150 detects the exhaust gas, an alarm is issued or The operation of the plasma reactor 100 is stopped to further prevent a safety accident caused by damage caused by cracks in the line 110.

[0033]

Referring to FIG. 4, according to an embodiment of the plasma generating unit, the plasma reactor 100a is different from the plasma reactor 100. Even in this embodiment, the plasma generating unit includes a plurality of first electrode portions. 120 and a plurality of second electrode portions 130a. However, in the present embodiment, both the first electrode portion 120 and the second electrode portion 130a are simultaneously mounted on the pipe 110. In addition, in the present embodiment, the length of each of the first electrode portions 120 is smaller than that in the embodiment to mount the second electrode portion 130a on the pipe 110.

[0034]

As described above, the second electrode portion 130a is mounted on the pipe 110 to surround the outer peripheral surface of one of the pipes 110. Therefore, each of the second electrode portions 130a is formed in a tubular form, and the first electrode portion 120 and the second electrode portion 130a are both mounted on the pipe 110 and spaced apart from each other. As described above, in order to generate plasma discharge in the first electrode portion 120 and the second electrode portion 130a, there should be a voltage difference between the first electrode portion 120 and the second electrode portion 130a. The first electrode portion 120 and the second electrode portion 130a have different implementation shapes, which are a non-driving electrode and a ground electrode.

[0035]

In the present embodiment, a relative positive (+) voltage is applied to one of each of the first electrode portion 120 and each of the second electrode portions 130a, and a relatively negative (-) voltage is applied to the other. . Even if the first electrode portion 120 and the second electrode portion 130a are not provided as the driving electrode and the ground electrode, when the opposing positive (+) voltage and the opposite negative (-) voltage are applied to the first electrode portion 120 and the second electrode In the portion 130a, as described above, a voltage difference is generated between the first electrode portion 120 and the second electrode portion 130a to cause plasma discharge.

[0036]

Meanwhile, in the present embodiment, since the second electrode portion 130a is mounted on the pipe 110, as shown in FIG. 4, a flange (not shown) is formed at both ends of the pipe 100 to The plasma reactor 100a is coupled to the discharge line such that the process chamber 10 and the vacuum pump 30 can be coupled together. An exhaust gas inlet 131 and an exhaust gas outlet 132 are formed on the flange (not shown).

[0037]

Figure 5 is a schematic view of a plasma reactor 110b according to still another embodiment of the present invention, and a plasma generating unit for generating a plasma discharge of the plasma reactor 100b is different from the second, third and fourth views. The form of the embodiment shown. In the present embodiment, the plasma generating unit includes a coil portion 120a which is spirally mounted on a peripheral surface surrounding the tube 110, and when a current is applied from the outside to the coil portion 120a, The radio frequency (RF) plasma discharge occurs in the coil portion 120a so that the exhaust gas flowing into the line 110 can be decomposed. In the present embodiment, the line 110 in which RF plasma is generated is composed of a dielectric substance.

[0038]

Fig. 6 is a schematic view of a plasma reactor 110c according to still another embodiment of the present invention, and the magnetic field generating unit 120b of the present embodiment is further included in the plasma reactor 100 as shown in Figs. 2 and 3.

[0039]

The plasma discharge occurs because the first electrode portion 120 and the second electrode portion 130. In this case, since the process of decomposing the exhaust gas is introduced into the line 110 due to the continuous operation of the plasma discharge, the temperature of the plasma reactor 100c rises, and the by-product of the corrosive gas containing F and Cl continuously collides with the tube. The inner surface of the road 110, therefore, may have erosion on the inner surface of the pipe 110.

[0040]

The magnetic field generating unit 120b is for solving the problem of erosion with respect to the inner surface of the pipe 110, and the magnetic field generating unit 120 is installed outside the pipe 110 and is constituted by a coil or a permanent magnet. Since the plasma region where the plasma discharge is generated by the second electrode portion 130 and the first electrode portion 120 causes a magnetic field, the movement trajectory of the charged particles in the plasma is changed. By adjusting the direction of the formed magnetic field to the direction of the longitudinal direction of the parallel line 110, most of the incident angle of ions incident on the surface of the line 110 can be effectively reduced.

[0041]

The magnetic field generating unit 120b may include spiral coils 120 formed on the outer side portion surrounding the first electrode portion 120, and the number of coils of the spiral coil 120b or the region formed by the spiral coil 120b The area of the first electrode portion 120 and the diameter of the discharge line can be adjusted, so that the current intensity flowing through the spiral coil 120b can also be adjusted.

[0042]

The spiral tube coil 120b may be mounted around the entire tube 110 to extend beyond the area of the tube 110 or in a form that allows the plurality of coiled tubing coils 120b to be connected to each other or spaced apart from each other. Further, the spiral coil 120b may be in contact with the first electrode portion 120 in such a manner that the insulating layer is coated on the electric wire, or may be spaced apart from the first electrode portion 120 by using the separating unit. When a current flows through the spiral coil 120b, a magnetic field is formed in the longitudinal direction of the pipeline 110. Since the spiral coil coil 120b is surrounded and protected by the casing 140, electromagnetic waves generated in the coil coil 120b can be blocked. outside.

[0043]

In another embodiment, the magnetic field generating unit 120b may be Helmholtz coils, and the plurality of Helmholtz coils are spaced apart from each other by a distance of half the diameter of the corresponding pipe 110, and are installed in the plasma reactor. The upper and lower coils of the 100c are respectively mounted at the top end and the bottom end of the pipe 110, and are spaced apart from each other by a distance of half the diameter of the corresponding pipe 110. The Helmholtz coil can generate a magnetic field in the pipeline 110, and the magnetic field formed in the longitudinal direction of the pipeline 110 changes the movement trajectory of the charged particles in the plasma and reduces the charged particles on the inner surface of the collision pipeline 110. Angle of incidence. The configuration of the Helmholtz coil takes into account the length and diameter of the conduit 110, as well as the form and voltage of the first electrode portion 120, as well as the number of Helmholtz coils, the number of coils of the Helmholtz coil, and the flow through The current intensity of the Mhoz coil can be adjusted.

[0044]

In still another embodiment, a permanent magnet can be used as the magnetic field generating unit 120b. The permanent magnet is formed in a cylindrical shape so that the permanent magnet can pass through the inside of the pipe 110 and its longitudinal direction, and the permanent magnet is mounted on the pipe. The outer side of the road is surrounded by a peripheral surface outside the first electrode portion 120. The permanent magnet can generate a magnetic field in the pipeline 110, and the magnetic field formed in the longitudinal direction of the pipeline 110 changes the movement trajectory of the charged particles in the plasma and reduces the incidence of charged particles on the inner surface of the collision pipeline 110. angle. The magnetic flux of the permanent magnet is considered to take into account the length and diameter of the pipe 110 and the form and voltage of the first electrode portion 120.

[0045]

At the same time, the permanent magnet may not provide a cylindrical shape as described above, but may provide a plurality of annular structures. A permanent magnet having a plurality of annular structures can perform the same function as a permanent magnet of a cylindrical form, except for a slight difference that a permanent magnet having a plurality of annular structures surrounds the outer surface of the first electrode portion 120. And installed outside the pipeline 110.

[0046]

This magnetic field generating unit 120b affects the life of the plasma reactor 100c, and the plasma formed in the line 110 contains highly reactive free radicals, ions, and or active substances. The magnetic field generated by the magnetic field generating unit 120b is parallel to the axial direction of the pipeline 110. Therefore, the incident angle of the ions on the inner surface of the collision pipeline 110 is greatly changed from near normal incidence to non-perpendicular to greatly reduce the inner surface of the pipeline 110. erosion.

[0047]

7 through 9 are schematic views of a plasma reactor 200 in accordance with still another embodiment of the present invention. The plasma generating unit of the plasma reactor 200 as shown in FIGS. 7 to 9 includes a first electrode portion 220 and a second electrode portion 130', and the first electrode portion 220 and the second electrode portion 130' At least one of them has a structure in which a region of at least one of the first electrode portion 220 and the second electrode portion 130' is reduced to reduce power consumption by reducing a discharge current during plasma discharge. . In the present embodiment, a slit or opening 225 may be formed in order to reduce the area of the first electrode portion 220.

[0048]

Referring to FIGS. 7 to 9, the first electrode portion 220 is formed with a plurality of openings 225, and the structure of the first electrode portion 220 will be described in more detail. Each of the first electrode portions 220 includes a first peripheral portion 221 formed along the circumferential direction of the pipeline 110; a second peripheral portion 222 is spaced apart from the first peripheral portion 221 along the longitudinal direction of the conduit 110 And disposed along the longitudinal direction of the pipeline 110, like the first peripheral portion 221; the plurality of first connecting portions 223 are electrically connected to the first surrounding portion 221 and the second surrounding portion 222, and along the tube The circumferential directions of the roads are spaced apart from each other; and a plurality of second connecting portions 224 are formed between the first peripheral portion 221 and the second peripheral portion 222 and spaced apart from each other along the longitudinal direction of the pipe 110. Therefore, the plurality of openings 225 can be formed by the first peripheral portion 221, the second peripheral portion 222, the plurality of first connecting portions 223, and the plurality of second connecting portions 224.

[0049]

That is, referring to FIGS. 7 to 9, one of the plurality of openings 225 utilizes a pair of first connecting portions 223 facing each other and facing the pair of first connecting portions 223 and the pair A pair of second connecting portions 224 that are connected by a connecting portion 223 are formed. The other opening 225 is formed by a first connecting portion 223 passing through the pair of second connecting portions 224 facing each other and a second surrounding portion 222 facing the first surrounding portion 221. The openings 225 are arranged in a matrix. As shown in FIG. 2, the openings 225 are formed in a rectangular shape. However, the shape of each opening 225 is not limited to the rectangular shape, and each opening 225 may be formed in various shapes. shape.

[0050]

Meanwhile, the width of the first surrounding portion 221 and the width of the second surrounding portion 222 may be the same or different from each other, and the width of the first connecting portion 223 and the width of the second connecting portion 224 may be the same or different from each other. The widths of the first surrounding portion 221 and the second surrounding portion 222 and the widths of the first connecting portion 223 and the second connecting portion 224 may be in different formats according to the manufacturer, without necessarily limiting to form the same format, so in the plasma During discharge, power consumption and discharge current can be minimized, but the widths of the first peripheral portion 221 and the second peripheral portion 222 can be formed identically to improve plasma discharge efficiency.

[0051]

The plasma reactor 200 further includes a gas injection line 240 to thereby inject a reaction gas into the line 110 as shown in Figs. 7 to 9. When the reaction gas is injected into the line 110 through the gas injection line 240, the exhaust gas is mixed with the reaction gas and changed into a vortex form. However, the reaction gas injected through the gas injection line 240 is not limited to be changed into a vortex form. A plurality of nozzles for injecting the exhaust gas in multiple directions may be formed at the end of the gas injection line, as shown in Figs. 7 to 9, so that the exhaust gas is made according to the direction of the plurality of nozzles or different speed components from the exhaust gases. There may be eddy currents, and the exhaust gas of the mixed reaction gas may be changed to various forms and flow in the line 110.

[0052]

A hole (not shown) is formed in the second electrode portion 130' to be inserted into and coupled to the gas injection line 240 of the plasma reactor 200, and a hole or a plurality of holes are along the second electrode portion 130'. Provided in a circumferential direction, the holes are formed with a gradient corresponding to a predetermined angle with respect to a virtual tangent to the peripheral surface of the second electrode portion 130', the holes being formed on the upstream side of the second electrode portion 130' instead of The area where the plasma discharge is concentrated. Therefore, referring to Fig. 9, a hole is formed in the upper second electrode portion 130' interposed between the two second electrode portions 130', and the gas injection pipe 240 is coupled to the holes. After the reaction gas passes through the gas injection line 240 and the exhaust gas is first mixed with the exhaust gas, the mixed reaction gas and the exhaust gas system are changed into a vortex form and flow in the line 110.

[0053]

If the gas injection line 240 is formed with a gradient corresponding to a predetermined angle with respect to the virtual tangent of the peripheral surface of the second electrode portion 130', the reaction gas system injected through the gas injection line 240 is along the second electrode portion 130'. The inner peripheral surface flows and may mix with the exhaust gas and may convert the exhaust gas into a vortex form. In addition, a part of the reaction gas supplied through the gas injection line 240 is injected into the exhaust gas inlet 131 of the second electrode portion 130'. Since the velocity component of the reaction gas is opposite to the velocity component of the flow direction of the exhaust gas, the reaction gas pushes the exhaust gas. The time during which the exhaust gas flows in the direction of the second electrode portion 130' where the exhaust gas outlet is located may be delayed, and the time during which the exhaust gas stays in the conduit 110 may increase.

[0054]

Therefore, the exhaust gas is changed into a vortex form to be closer to the region where the plasma discharge is concentrated, and flows again, and the time during which the exhaust gas stays in the conduit 110 increases due to the reaction gas, and a larger amount of exhaust gas is exposed to the first electrode portion 220 and the first The plasma discharge occurring between the two electrode portions 130' allows a larger amount of exhaust gas to be decomposed and can increase the decomposition efficiency of the exhaust gas.

[0055]

Figure 10 is a perspective view showing the structure of a plasma reactor 200a according to still another embodiment of the present invention. The plasma reactor 200a shown in Fig. 10 has only a little difference from the plasma reactor 200 shown in Figs. 7 to 9, which is the configuration of the first electrode portion 220a of the plasma generating unit, and therefore, Only the first electrode portion 220a will be described.

[0056]

The openings of the first electrode portion 220s according to the present embodiment are not arranged in a matrix as shown in FIGS. 7 to 9. In the present embodiment, the openings 225a are spaced apart from each other along the circumferential direction of the pipe 110. . Referring to FIG. 10, each of the first electrode portions 220a includes a first peripheral portion 221a, a second peripheral portion 222a, and a connecting portion 223a. The first peripheral portion 221a is along the circumferential direction of the tube 110. In the former, the second peripheral portion 222a is spaced apart from the first peripheral portion 221a along the longitudinal direction of the conduit 110 and formed along the circumferential direction of the conduit 110, like the first peripheral portion 221a. The connecting portion 223a connects the first peripheral portion 221a and the second peripheral portion 222a, and the plurality of connecting portions 223a are formed to be spaced apart from each other along the circumferential direction of the pipe 110.

[0057]

Therefore, in the present embodiment, the two openings 225a utilize the first peripheral portion 221a and the second peripheral portion 222a that face each other and are electrically connected to the first surrounding portion 221a and the second surrounding portion 222a and face each other. A pair of connecting portions 223a are formed. The opening 225a is formed in a rectangular shape, however, the opening is not limited to be formed in a rectangular shape, and other shapes may be formed. Even in the present embodiment, as described above, the widths of the first peripheral portion 221a, the second peripheral portion 222a, and the connecting portion 223a may be the same or different from each other, and the width may be modified within a certain range in various ways to make the exhaust gas The decomposition efficiency can be maintained, and the number of discharge currents generated by the plasma discharge occurring between the first electrode portion 220a and the second electrode portion 130' can be reduced.

[0058]

Figure 11 is a schematic view of a plasma reactor 200b according to still another embodiment of the present invention. In the present embodiment, the second electrode portion 230b is mounted at a suitable position of the conduit 110, just like the first electrode portion 220b. Similarly, the second electrode portion 230b is spaced apart from the first electrode portion 220b by a predetermined distance. In the present embodiment, the shapes of the first electrode portion 220b and the second electrode portion 230b are the same as those of the first electrode portion 220a shown in FIG.

[0059]

Figure 12 is a schematic view of a plasma reactor 220c according to still another embodiment of the present invention. In this embodiment, as in the plasma reactor 200b shown in Fig. 11, the first electrode portion 220c and the second electrode portion 230c is disposed on the line 110. However, the plasma reactor 200c of Fig. 12 differs from the plasma reactor 200b of Fig. 11 in the shape of the first electrode portion 220c and the second electrode portion 230c.

[0060]

Referring to FIG. 12, the first slit 222c and the second slit 232c are formed at end points of the first electrode portion 220c and the second electrode portion 230c away from each other. In detail, the first slit 222c is formed at There is no end point of the first peripheral portion 221c formed in the circumferential direction of the tube 110 of the first electrode portion 220c of the second electrode portion 230c; the second slit 232c is formed not to face the first electrode portion 220c The first slit 222c and the second slit 232c formed at the end of the first peripheral portion 221c formed in the circumferential direction of the tube 110 of the second electrode portion 230c are as shown in Fig. 12 because there is no slit or opening The portion where the first electrode portion 220c and the second electrode portion 230c are close to each other is formed, so in order to reduce the discharge voltage, the slit and the opening are formed in portions where the first electrode portion 220c and the second electrode portion 230c are apart from each other to reduce discharge. Current.

[0061]

Figure 13 is a schematic view of a plasma reactor 200d according to still another embodiment of the present invention, and Figure 13 is a view showing a modification of the first electrode portion 220c and the second electrode of the plasma reactor 200c shown in Figure 12 The portion 230c, according to the present embodiment, each of the first electrode portion 220d and the second electrode portion 230d further includes ignition electrodes 223d and 233d formed on the first electrode portion 220d and the second electrode portion 230d. To reduce the discharge starting voltage. Meanwhile, the ignition electrodes 223d and 233d may be simultaneously formed on the first electrode portion 220d and the second electrode portion 230d as shown in FIG. 13, but may be formed in one of the first electrode portion 220d and the second electrode portion 230d.

[0062]

In the plasma reactors 200c and 200d shown in Figs. 12 and 13, the plasma discharge can be smoothly performed between the first electrode portions 220c and 220d and the second electrode portions 230c and 230d even at a low level. The discharge voltage, and the portion formed at the first slit 222c and the second slit 232c, can reduce the discharge current to improve energy efficiency.

[0063]

Figure 14 is a schematic illustration of a plasma reactor 200e in accordance with yet another embodiment of the present invention. In the present embodiment, the second electrode portion 130e is disposed at both ends of the conduit 110 as in the previous embodiment. In the present embodiment, the first electrode portion 220e includes a plurality of unit electrodes 221e and 222e which are spaced apart along the longitudinal direction of the tube 110, and a conductive connecting member 223e electrically connected to the plurality of unit electrodes 221e and 222e. The structure of the unit electrodes 221e and 222e will be described in more detail. The unit electrodes 221e and 222e include a discharge portion 221e having an open end at one end and a ring structure at the other end, and a flange portion 222e extending and formed at This open end. In the present embodiment, the ring structure of the discharge portion 221e may have a different shape, such as a circular shape or a polygonal shape, and is formed to correspond to the shape of the pipe 110.

[0064]

The conductive connecting member 223e is coupled to the flange portion 222e of the unit electrodes 221e and 222e, for example, a bolt, in which a conductive connecting member 223e is interposed in the flange portion 222e of the unit electrodes 221e and 222e. The conductive connecting member 223e is coupled to the conduit 110, and the unit electrodes 221e and 222e may be electrically connected to each other. However, the conductive connecting member 223e does not limit the flange portion 222e to be coupled to the unit electrodes 221e and 222e using the locking member. It can also be connected to the line 110 using a weld. With this coupling structure, the electrode portions can be easily connected to each other, so the plasma reactor 200e can be easily mounted. The first electrode portion 220e connected to each other in this manner may generate a plasma discharge between the first electrode portion 220e and the second electrode portion 130 connected to both ends of the tube 110.

[0065]

15 and 16 are schematic views of a plasma reactor 300 according to still another embodiment of the present invention. The plasma reactor 300 according to the present embodiment includes a tube 310, a first electrode portion 320, and a second electrode. The portion 330 and a housing 340. First, the line 310 of the plasma reactor 300 is a flow path through which the discharge gas flows, and is formed in a cylindrical shape to penetrate in the longitudinal direction of the line 310. The conduit 310 is comprised of a dielectric material comprising a high dielectric species such as alumina, zirconia (ZrO ₂ ), yttria (Y ₂ O ₃ ), sapphire, quartz tubing or glass tubing.

[0066]

The first electrode portion 320 is mounted on the outer peripheral surface of the pipe 310 so as to surround the outer peripheral surface of the pipe 310 and spaced apart from the second electrode portion 330, so that the first electrode portion 320 and the second electrode portion are A plasma discharge is generated between 330. The first electrode portion 320 is formed in a tubular form to surround the outer peripheral surface of the tube 310. Generally, the first electrode portion 320 serves as a driving electrode, and the plasma discharge can be performed at the first electrode portion 320 and the second portion. The electrode portion 330 occurs between the electrodes, and therefore, the AC voltage is applied to the first electrode portion 320. Referring to Fig. 15, the first electrode portion 320 is formed to have a large length to follow the longitudinal direction of the pipe 320, but is not limited thereto. A buffer unit (not shown) has a tubular structure interposed between the pipe 310 and the first electrode portion 320. The buffer unit is made of a material having a conductive or dielectric substance and has elasticity. The tube 310 and the first electrode portion 320 may be in close contact with each other.

[0067]

In the embodiment shown in Figures 15 and 16, the second electrode portion 330 is connected to one or both ends of the conduit 310 for conduction with the conduit 310. In the present embodiment, as shown in FIGS. 15 and 16, the second electrode portion 330 is connected to both ends of the tube 310 to be electrically connected to the tube 310. As described above, the first electrode portion 320 is As the drive electrode, the AC voltage is applied, and the second electrode portion 330 serves as a ground electrode to generate a plasma discharge between the first electrode portion 320 and the second electrode portion 330. Therefore, the second electrode portion is made of metal.

[0068]

In FIGS. 15 and 16, the cross section of the second electrode portion 330 gradually decreases along the longitudinal direction of the tube 310. However, the embodiment of the present invention is not limited thereto, and the second electrode portion 330 The cross section may also be the same consistency along the lengthwise direction of the conduit 310. An exhaust gas inlet 331 or an exhaust gas outlet 332 may be formed at each of the second electrode portions 330 according to a position at which the second electrode portion 330 is connected to the pipe 310, in the present embodiment, as shown in FIGS. 15 and 16. An exhaust gas inlet 331 and an exhaust gas outlet 332 are formed on each of the second electrode portions 330.

[0069]

Referring to FIGS. 18 to 20 together, the second electrode portions 330b, 330c, and 330d are mounted on the outer peripheral surface of the pipe 310, in which case the second electrode portions 330b, 330c, and 330d are mounted and The first electrode portions 320b, 320c, and 320d are spaced apart by a predetermined distance. As described above, the first electrode portions 320b, 320c, and 320d are driving electrodes to apply an AC voltage, and the second electrode portions 330b, 330c, and 330d are The ground voltage is applied to generate a plasma discharge between the second electrode portions 330b, 330c, and 330d and the first electrode portions 320b, 320c, and 320d. However, embodiments of the present invention are not limited thereto, and for example, an AC voltage may be applied to the first electrode portions 320b, 320c, and 320d and the second electrode portions 330b, 330c, and 330d, wherein one of the opposite positive (+) voltage systems Applied to one of the first electrode portion and the second electrode portion, a relatively negative (-) voltage is applied to the other to cause a voltage difference between the two electrode portions, and this causes a plasma discharge.

[0070]

Exhaust gas is introduced into the exhaust gas inlet 331 and flows within the conduit 310, and the exhaust gas has a certain pressure present in the conduit 310. In this case, if an AC voltage is applied to the first electrode portions 320b, 320c, and 320d as driving voltages, electrons start at the first electrode portions 320b, 320c, and 320d and the second electrode portions 330b, 330c as ground electrodes and The 330d moves between and the plasma discharge occurs, so the exhaust gas can be decomposed.

[0071]

Referring back to FIGS. 15 and 16, the housing 340 is wrapped around the tube 310 to protect the outer surface of the tube 310 and the first electrode portion 320 located on the outer surface of the tube 310. The housing 340 forms a separation space between the housing 340 and the outer surface of the conduit 310.

[0072]

In the present invention, at least one of the first electrode portion 320 and the second electrode portion 330 has a structure, that is, a structure in which at least one of the first electrode portion 320 and the second electrode portion 330 is reduced. To reduce power consumption by reducing the discharge current during plasma discharge, that is, a slit or opening 325 may be formed to reduce the area of the first electrode portion 320.

[0073]

Referring to FIGS. 15 and 16, the first electrode portion 320 is formed with a plurality of openings 325, and the structure of the first electrode portion 320 will be described in more detail. Each of the first electrode portions 320 includes a first peripheral portion 321 formed along the circumferential direction of the pipeline 310; a second peripheral portion 322 is spaced apart from the first peripheral portion 321 along the longitudinal direction of the conduit 310. And disposed along the longitudinal direction of the pipeline 310, like the first peripheral portion 321; the plurality of first connecting portions 323 are electrically connected to the first surrounding portion 321 and the second surrounding portion 322, and along the tube The circumferential direction of the road 310 is spaced apart from each other; and a plurality of second connecting portions 324 are formed between the first surrounding portion 321 and the second surrounding portion 322 and spaced apart from each other along the longitudinal direction of the pipe 310. Therefore, the plurality of openings 325 can be formed by the first peripheral portion 321 , the second peripheral portion 322 , the plurality of first connecting portions 323 , and the plurality of second connecting portions 324 .

[0074]

That is, referring to FIG. 15, one of the plurality of openings 325 utilizes a pair of first connecting portions 323 facing each other and faces the pair of first connecting portions 323 and the pair of first connecting portions 323 A pair of intersecting second connecting portions 324 are formed. The other opening 325 is formed by a first connecting portion 323 passing through the pair of second connecting portions 324 facing each other and a second surrounding portion 322 facing the first surrounding portion 321. The openings 325 are arranged in a matrix. As shown in FIG. 15, the openings 325 are formed in a rectangular shape. However, the shape of each opening 325 is not limited to the rectangular shape, and each opening 225 can be formed into various shapes. shape.

[0075]

Meanwhile, the width of the first surrounding portion 321 and the width of the second surrounding portion 322 may be the same or different from each other, and the width of the first connecting portion 323 and the width of the second connecting portion 324 may be the same or different from each other. The widths of the first surrounding portion 321 and the second surrounding portion 322 and the widths of the first connecting portion 323 and the second connecting portion 324 may be in different formats according to the manufacturer, without necessarily limiting to form the same format, so in the plasma During discharge, power consumption and discharge current can be minimized, but the widths of the first surrounding portion 321 and the second surrounding portion 322 can be formed identically to improve plasma discharge efficiency.

[0076]

Fig. 17 shows an opening 325a according to another embodiment of the present invention. As shown in Fig. 17, the first electrode portions 325a are not arranged in a matrix arrangement as the openings 325 of the previously described embodiment. In the present embodiment, the openings 325a are spaced apart from each other along the circumferential direction of the tube 310, and the first electrode portion 320a will be described in more detail with reference to FIG. 17, each of the first electrode portions 320a including a first peripheral portion. 321a, a second peripheral portion 322a, and a connecting portion 323a. The first peripheral portion 321a is formed along the circumferential direction of the pipe 310, and the second peripheral portion 322a is along the longitudinal direction of the pipe 310 and the first portion. The peripheral portion 321a is spaced apart and formed along the circumferential direction of the pipe 310 as the first peripheral portion 321a. The connecting portion 323a connects the first peripheral portion 321a and the second peripheral portion 322a, and the plurality of connecting portions 323a are formed to be spaced apart from each other along the circumferential direction of the conduit 310.

[0077]

Therefore, in the present embodiment, the two openings 325a utilize the first peripheral portion 321a and the second peripheral portion 322a that face each other and are electrically connected to the first surrounding portion 321a and the second surrounding portion 322a and face each other. A pair of connecting portions 323a are formed. The opening 325a is formed in a rectangular shape.

[0078]

However, even in the present embodiment, the opening 325a is not limited to be formed in a rectangular shape, and other different shapes may be formed. Even in the present embodiment, as described above, the widths of the first peripheral portion 321a, the second peripheral portion 322a, and the connecting portion 323a may be the same or different from each other, and the width may be modified within a certain range in various ways to make the exhaust gas The decomposition efficiency can be maintained, and the amount of discharge current generated by the plasma discharge occurring between the first electrode portion 320a and the second electrode portion 330 can be reduced.

[0079]

Figure 18 is a schematic view of a plasma reactor 300b according to still another embodiment of the present invention, such as the plasma reactor 300b shown in Figure 18, which is different from the foregoing embodiment in that the second electrode portion 330b is mounted on The outer peripheral surface of the pipe 310 is spaced apart from the first electrode portion 320b. In the present embodiment, as shown in FIG. 18, the first electrode portion 320b and the second electrode portion 330b are formed in the same shape as the first electrode portion 320a shown in Fig. 17, and therefore, according to the present embodiment, The detailed description of the shapes of the first electrode portion 320b and the second electrode portion 330b will be omitted. However, the shapes of the first electrode portion 320b and the second electrode portion 330b are not limited to those shown in Fig. 18, and may be formed into shapes as shown in Figs. 15 and 16.

[0080]

According to still another embodiment of the present invention, Fig. 19 is a perspective view of the first electrode portion 320b and the second electrode portion 330b of the plasma reactor 300b shown in Fig. 18. Referring to FIG. 19, a first slit 322c and a second slit 332c are formed at end points of the first electrode portion 320c and the second electrode portion 330c away from each other. In detail, the first slit 322c An end point of the first peripheral portion 321c formed in the circumferential direction of the tube 310 not facing the first electrode portion 320c of the second electrode portion 330c; the second slit 332c is formed not to face the first electrode The first slit 322c and the second slit 332c formed at the end of the first peripheral portion 321c formed in the circumferential direction of the tube 310 of the second electrode portion 330c of the portion 320c are as shown in Fig. 19, because there is no narrow The slit or the opening is formed in a portion where the first electrode portion 320c and the second electrode portion 330c are close to each other, so in order to reduce the discharge voltage, the slit or the opening is formed in a portion where the first electrode portion 320c and the second electrode portion 330c are apart from each other, To reduce the discharge current.

[0081]

Meanwhile, according to still another embodiment of the present invention, Fig. 20 is a perspective view of the first electrode portion 320d and the second electrode portion 330d of the plasma reactor 300d shown in Fig. 19. Here, the plasma reactor 300d shown in Fig. 20 further includes ignition electrodes 323d and 333d formed on each of the first electrode portion 320d and the second electrode portion 330d, and the ignition electrodes 323d and 333d are formed. Between the first electrode portion 320d and the second electrode portion 330d to reduce the discharge starting voltage. In the present embodiment, the ignition electrodes 323d and 333d may be formed in one of the first electrode portion 320d and the second electrode portion 330d as shown in FIG.

[0082]

Therefore, in the plasma reactors 300c and 300d shown in Figs. 19 and 20, the plasma discharge can smoothly occur between the first electrode portions 320c and 320d and the second electrode portions 330c and 330d even if A low discharge voltage, and a portion formed at the first slit 322c and the second slit 332c can reduce the discharge current to improve energy efficiency.

[0083]

Figure 21 is a schematic view of a plasma reactor 300e in accordance with yet another embodiment of the present invention. As shown in Fig. 21, the electrode reactor 320e includes a plurality of unit electrodes 321e and 322e spaced apart along the longitudinal direction of the pipe 310, and a conductive connecting member 323e. The plurality of unit electrodes 321e and 322e are electrically connected. The structure of the unit electrodes 321e and 322e will be explained in more detail. The unit electrodes 321e and 322e include a discharge portion 321e having an open end at one end and a ring structure at the other end, and a flange portion 322e extending and formed at the open end.

[0084]

The conductive connecting member 323e is coupled to the flange portion 322e of the unit electrodes 321e and 322e, such as a bolt, using a locking member, in which state the conductive connecting member 323e is interposed in the flange portion 322e of the unit electrodes 321e and 322e, And the conductive connection member 323e is electrically connected to the unit electrodes 321e and 322e. However, the conductive connecting member 323e does not restrict the flange portion 322e to be coupled to the unit electrodes 321e and 322e using the locking member, and may be welded to the flange portion 322e of the unit electrodes 321e and 322e. With this coupling structure, the electrode portions can be easily connected to each other, so the plasma reactor 300e can be easily mounted. The first electrode portion 320e connected to each other in this manner may generate a plasma discharge between the first electrode portion 320e and the second electrode portion 330 connected to both ends of the tube 310. Meanwhile, the ring structure of the discharge portion 321e described above may have a different shape such as a circular shape or a polygonal shape.

[0085]

The embodiments described above are merely illustrative of the technical spirit and the features of the present invention, and those skilled in the art can understand the contents of the present invention and implement them. That is, the equivalent variations or modifications made by the spirit of the present invention should still be included in the scope of the present invention.

100‧‧‧ plasma reactor

110‧‧‧pipe

120‧‧‧First electrode section

130‧‧‧Second electrode

131‧‧‧Exhaust gas inlet

132‧‧‧Exhaust gas outlet

140‧‧‧shell

150‧‧‧Detection unit

Claims (24)

A plasma reactor is disposed between a process chamber and a vacuum pump to decompose exhaust gas discharged from the process chamber, the plasma reactor comprising: a pipeline for flowing the exhaust gas; a slurry generating unit disposed on the pipeline and generating a plasma discharge to decompose the exhaust gas; and a casing surrounding the pipeline and forming between the casing and a peripheral surface outside the pipeline a separation space; wherein the plasma generating unit further comprises: a first electrode portion disposed on the pipeline, wherein a slit or an opening is formed in the first electrode portion to reduce one during the plasma discharge a discharge current; and a second electrode portion disposed at a position spaced apart from the first electrode portion, and a plasma discharge is generated between the second electrode portion and the first electrode portion to decompose the exhaust gas. A plasma reactor is disposed between a process chamber and a vacuum pump to decompose exhaust gas discharged from the process chamber, the plasma reactor comprising: a pipeline for flowing the exhaust gas; a slurry generating unit disposed on the pipeline and generating a plasma discharge to decompose the exhaust gas; and a casing surrounding the pipeline and forming between the casing and a peripheral surface outside the pipeline a separation space; wherein the plasma generation unit further comprises: a first electrode portion disposed on the pipeline; and a second electrode portion disposed at a position spaced apart from the first electrode portion and generating a plasma discharge between the second electrode portion and the first electrode portion Decomposing the exhaust gas; wherein the first electrode portion comprises: a first peripheral portion formed along a circumferential direction of the pipeline; and a second peripheral portion extending along the length of the conduit The direction is spaced apart from the first peripheral portion and formed along the circumferential direction; and a first connecting portion electrically connecting the first surrounding portion and the second surrounding portion. A plasma reactor is disposed between a process chamber and a vacuum pump to decompose exhaust gas discharged from the process chamber, the plasma reactor comprising: a pipeline for flowing the exhaust gas; a slurry generating unit disposed on the pipeline and generating a plasma discharge to decompose the exhaust gas; and a casing surrounding the pipeline and forming between the casing and a peripheral surface outside the pipeline a separation space; wherein the plasma generating unit further comprises: a first electrode portion disposed on the pipeline; and a second electrode portion disposed at a position spaced apart from the first electrode portion, and at the second a plasma discharge is generated between the electrode portion and the first electrode portion to decompose the exhaust gas; wherein the second electrode portion includes: a first peripheral portion formed along a circumferential direction of the pipeline; a second peripheral portion spaced apart from the first peripheral portion along the longitudinal direction of the conduit and formed along the circumferential direction; and a first connecting portion electrically connected to the first surrounding portion And the second surrounding portion. A plasma reactor is disposed between a process chamber and a vacuum pump to decompose exhaust gas discharged from the process chamber, the plasma reactor comprising: a pipeline for flowing the exhaust gas; a slurry generating unit disposed on the pipeline and generating a plasma discharge to decompose the exhaust gas; and a casing surrounding the pipeline and forming between the casing and a peripheral surface outside the pipeline a separation space; wherein the plasma generating unit further comprises: a first electrode portion disposed on the pipeline; and a second electrode portion disposed at a position spaced apart from the first electrode portion, and at the second a plasma discharge is generated between the electrode portion and the first electrode portion to decompose the exhaust gas; wherein the first electrode portion and the second electrode portion are disposed on an outer peripheral surface of the pipeline, and are spaced apart from each other a predetermined distance; and a first slit and a second slit formed apart from each other at an end of the first electrode portion and the second electrode portion. A plasma reactor is disposed between a process chamber and a vacuum pump to decompose exhaust gas discharged from the process chamber, the plasma reactor comprising: a pipeline for flowing the exhaust gas; a plasma generating unit disposed on the pipeline and generating a plasma discharge to decompose the exhaust gas; and a casing surrounding the pipeline and surrounding the casing and the outer surface of the pipeline Forming a separation space; wherein the plasma generating unit includes a first electrode portion disposed on the pipeline and shielded by a space inside the conduit, and the first electrode portion includes: a plurality of unit electrodes, They are spaced apart from each other along the longitudinal direction of the tube; and a conductive connecting member electrically connected to the unit electrodes. A plasma reactor according to claim 1, 2, 3, 4 or 5, wherein the first electrode portion is formed in a tubular form to be fitted to an outer peripheral surface of one of the pipes. A plasma reactor according to claim 1, 2, 3, 4 or 5, wherein the second electrode portion is connected to one or both ends of the pipe to be electrically connected to the pipe. The plasma reactor of claim 1, 2, 3, 4 or 5, further comprising: a detecting unit that detects an environmental condition of the pipeline or the separation space; and a controller Receiving information about the environmental condition from the detecting unit to determine the state of the pipeline or the separation space; wherein the environmental condition is a surface temperature of the pipeline, a surface temperature of the casing, or a temperature of the separation space, And the detecting unit is a temperature sensor. The plasma reactor of claim 8, wherein when the detecting unit is a temperature sensor, the controller determines whether the temperature of the pipeline or the separation space is equal to or greater than a preset temperature. The plasma reactor of claim 1, 2, 3, 4 or 5, further comprising: a detecting unit that detects an environmental condition of the pipeline or the separation space; and a controller Receiving information about the environmental condition from the detecting unit to determine the state of the pipeline or the separation space; wherein the environmental condition is a specific gas, which is set and exists in the separation space, and the detection The unit is a gas sensor. The plasma reactor of claim 10, wherein the detecting unit is a gas sensor, the controller determines that the exhaust gas leaks from the pipeline according to detecting the specific gas disposed in the separation space. The plasma reactor of claim 1, 2, 3, 4 or 5, further comprising: a detecting unit that detects an environmental condition of the pipeline or the separation space; and a controller Receiving information about the environmental condition from the detecting unit to determine the state of the pipeline or the separation space; wherein the controller uses the detecting unit to determine whether the exhaust gas leaks from the pipeline, and if the controller It is determined that the exhaust gas leaks from the pipeline, and the controller issues an alarm or locks the plasma generating unit. A plasma reactor according to claim 1, 2, 3, 4 or 5, further comprising a magnetic field generating unit disposed in the separation space and surrounding the outer peripheral surface of the pipe. The plasma reactor of claim 13, wherein the magnetic field generating unit comprises one of a solenoid coil, a Helmholtz coil, and a permanent magnet. A plasma reactor as claimed in claim 13 wherein the magnetic field generating unit forms a magnetic field in a direction substantially parallel to the longitudinal direction of the conduit. The plasma reactor according to claim 1, wherein the second electrode portion is mounted on the pipe in a state in which the second electrode portion is along the longitudinal direction of the pipe and the first electrode The portion is spaced apart, and a slit or an opening is formed in the second electrode portion to reduce a discharge current during the plasma discharge. The plasma reactor according to claim 1, wherein the plurality of slits formed in the first electrode portion are arranged in a matrix. The plasma reactor of claim 4, wherein the first electrode portion and the second electrode portion further comprise a plurality of ignition electrodes formed between the first electrode portion and the second electrode portion to The discharge starting voltage is reduced, and one or both of the first electrode portion and the second electrode portion are formed. The plasma reactor according to claim 5, wherein the unit electrode comprises: a discharge portion having an open end at one end and a ring structure at the other end; and a flange portion extending and formed at the same The open end, and the electrically conductive connecting element is coupled to the flange portion of the unit electrodes using a locking element. The plasma reactor according to claim 1, 2, 3, 4 or 5, further comprising a gas injection line for injecting a reaction gas to mix the exhaust gas to convert the exhaust gas into a vortex form and to flow. The plasma reactor of claim 20, wherein the gas injection line is comprised of a dielectric material. A plasma reactor according to claim 20, wherein the velocity component of the reaction gas is a velocity component or a vertical velocity component with respect to the flow direction of the exhaust gas. The plasma reactor according to claim 20, wherein a plurality of holes are formed in the second electrode portion to be inserted into the gas injection line, and the holes are disposed on an upstream side instead of a region where the plasma discharge is concentrated. . The plasma reactor of claim 20, wherein the gas injection line is mounted on an upstream side rather than at the first electrode portion.