KR101732048B1 - Facility for purifying exhaust gas which is generated in processing plasma reactor - Google Patents
Facility for purifying exhaust gas which is generated in processing plasma reactor Download PDFInfo
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- KR101732048B1 KR101732048B1 KR1020150096306A KR20150096306A KR101732048B1 KR 101732048 B1 KR101732048 B1 KR 101732048B1 KR 1020150096306 A KR1020150096306 A KR 1020150096306A KR 20150096306 A KR20150096306 A KR 20150096306A KR 101732048 B1 KR101732048 B1 KR 101732048B1
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- KR
- South Korea
- Prior art keywords
- conduit
- module
- exhaust gas
- electrode
- electrode unit
- Prior art date
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/32—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
Abstract
The present invention relates to an exhaust gas treatment plasma reactor generated in a process facility, which is disposed between the process chamber and the vacuum pump, so that the exhaust gas introduced from the process chamber can be discharged to the vacuum pump A conduit in which an internal space is formed; An inner module disposed in the inner space and forming a space in which a plasma discharge occurs between the inner space and the inner space, the inner module extending in a direction intersecting a direction in which the exhaust gas flows in the inner space; And a first electrode unit installed in the internal module and generating a plasma discharge in a space where the plasma discharge occurs.
Description
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a plasma reactor, and more particularly, to a plasma reactor capable of providing a plasma discharge within electrode conduits and treating a large amount of exhaust gas.
Processes such as functional thin film formation, dry etching, and the like are applied to manufacturing processes of semiconductors, display devices, and solar cells. Such a process is generally performed in a vacuum chamber, and various kinds of metals and nonmetal precursors are used as a process gas for the formation of a functional thin film, and various kinds of etching gases are also used for dry etching.
A system for evacuating a process chamber includes components such as a process chamber, a vacuum pump, a scrubber, etc. connected to each other through an exhaust line. At this time, although the gas exhausted from the process chamber differs depending on the process, it may include an unreacted precursor in a gas molecule or an aerosol state, a solid seed crystal, and the like. . These exhaust gases flow into the vacuum pump along the exhaust line. In the vacuum pump, the exhaust gases are compressed at a high temperature of 100 ° C or more. Therefore, the phase of the exhaust gases is easily generated, It is easily formed and accumulated, and it is corroded by harmful substances of corrosive gas including F, Cl and the like, which causes failure of the vacuum pump.
In a conventional method for improving the failure of a vacuum pump due to exhaust gas, a purging gas is injected into a vacuum pump for pumping the exhaust gas to generate a partial pressure of a component capable of forming a solid harmful substance in the exhaust gas To minimize the formation of harmful substances. The most commonly used purging gas is dry air (dryair) or nitrogen.
A more active method for solving the problem of accumulating solid particles in the vacuum pump due to the exhaust gas is to install a hot trap or a cold trap in the exhaust line. However, this method has limitations with high energy consumption and low processing efficiency. In order to improve these problems in general, a new approach of reconfiguring the entire exhaust system in the form of a main unit-low-pressure plasma unit-vacuum pump-scrubber by adding a low-pressure plasma unit to the front end of the vacuum pump has been obtained. Korean Patent No. 1065013 discloses a plasma reactor technology for decomposing exhaust gas by applying an AC driving voltage to discharge a conduit barrier.
SUMMARY OF THE INVENTION It is an object of the present invention to provide a plasma reactor capable of providing a plasma discharge within the conduit and capable of treating a large amount of exhaust gas.
The present invention relates to a plasma reactor for decomposing harmful substances in exhaust gas discharged from one or a plurality of process chambers by one or a plurality of vacuum pumps, the plasma reactor being arranged between the process chamber and the vacuum pump, A conduit in which an inner space is formed to allow the introduced exhaust gas to flow to be discharged to the vacuum pump; An inner module disposed in the inner space and forming a space in which a plasma discharge occurs between the inner space and the inner space, the inner module extending in a direction intersecting a direction in which the exhaust gas flows in the inner space; And a first electrode unit installed in the internal module and generating a plasma discharge in a space where the plasma discharge occurs.
The plasma reactor according to the present invention has the following effects.
First, a plasma reactor having a simple structure and a large capacity can be manufactured by providing a first electrode unit having an internal module and causing a plasma discharge to be inserted into an internal module. In addition, when the first electrode portion and the second electrode portion are provided so as to be extrapolated on the outer circumferential surface of the inner module, the insulating portion may be provided to prevent the first electrode portion and the second electrode portion from being damaged and to cause stable plasma discharge.
Second, since the internal module is disposed inside the conduit with a concentric axis, the plasma discharge takes place in the same manner as the counter discharge in the entire space between the internal module and the conduit, so that more harmful substances in the exhaust gas can be decomposed So that the decomposition efficiency can be improved.
Thirdly, partition walls that are sandwiched between the inner circumferential surface of the conduit and the outer circumferential surface of the inner module may be provided to divide the space between the conduit and the inner module so that the flow rate can be distributed to each of the plurality of vacuum pumps. .
Fourth, since the conduit is formed of a conductive material, a plasma discharge can be generated between the conduit and the conduit by using only one electrode portion, so that the structure of the plasma reactor is simplified and the manufacturing cost of the plasma reactor is reduced .
1 is a block diagram showing a connection relationship between a process chamber, a plasma reactor, and a vacuum pump.
2 is a longitudinal sectional view of a plasma reactor according to an embodiment of the present invention.
3 is a cross-sectional view taken along line AA 'in Fig.
4 is a longitudinal sectional view of a plasma reactor according to another embodiment of the present invention.
5 is a cross-sectional view in the direction BB 'of FIG.
6 is a longitudinal sectional view of a plasma reactor according to another embodiment of the present invention.
7 is a longitudinal sectional view of a plasma reactor according to another embodiment of the present invention.
8 is a longitudinal sectional view of a plasma reactor according to another embodiment of the present invention.
FIG. 9 illustrates a connection relationship between a process chamber, a plasma reactor, and vacuum pumps according to another embodiment of the present invention.
FIG. 10 is a layout diagram showing the arrangement of the plasma reactor and the vacuum pumps viewed in the direction of dd 'in FIG.
11 is a longitudinal sectional view of a plasma reactor according to another embodiment of the present invention.
12 is a partial perspective view of the plasma reactor viewed in the direction of cc 'in Fig.
13 is a longitudinal sectional view showing a modified example of the plasma reactor shown in FIG.
FIG. 14 is a schematic view showing a connection relationship between the plasma reactor shown in FIG. 11 and a plurality of vacuum pumps.
15 is a longitudinal sectional view of another plasma reactor according to another embodiment of the present invention.
16 is a longitudinal sectional view showing a modified example of the plasma reactor shown in Fig.
17 to 20 are conceptual diagrams showing the connection relationship between the plasma reactor, the process chambers, and the vacuum pumps according to another embodiment of the present invention.
FIG. 21 is a sectional view showing a plasma reactor applied to FIGS. 17 to 20. FIG.
22 is a cross-sectional view showing another embodiment of the plasma reactor according to FIG.
23 is a right side view showing the right side of the plasma reactor shown in Fig.
Fig. 24 is a cross-sectional view showing another embodiment of the plasma reactor applied to Figs. 17 to 20. Fig.
25 and 26 are cross-sectional views of a plasma reactor according to another embodiment of the present invention applied to Figs. 17 to 20. Fig.
Before describing the
1, the
The inside of the
(Not shown) of the vacuum pump 150 when the unreacted metallic precursor molecules are decomposed to form a metallic byproduct or unreacted nonmetal precursor molecules are decomposed to form nonmetal byproducts, Resulting in many problems. The reactive gas induces the unreacted metallic precursor molecules or the unreacted nonmetal precursor molecules to form a metal oxide or nonmetal oxide of the fine particles without forming metallic byproducts or nonmetal byproducts after decomposition. In addition, when unreacted process gas containing F atoms or Cl atoms and unreacted cleaning gas molecules are decomposed and reacted with the metal surface formed on the inner surface of the vacuum pump 150 upon entering the vacuum pump 150, / Activated F- or Cl- causing etch can be converted to an amorphous alloy form including HF, HCl, metal atom-F-O, metal atom-Cl-O or metal atom-F-Cl-O have.
Also, the
Referring to FIGS. 2 and 3, the
Meanwhile, according to the above description, the
The
The
The structure of the
As described above, the
The fixing means 250 is inserted into the
The size of the inner circumferential surface of the hollow is formed to be equal to or smaller than the size of the outer circumferential surface of the
The connecting
In this embodiment, as shown in FIG. 2, the two fixing
4 and 5 illustrate the plasma reactor 200 'according to another embodiment of the present invention. The plasma reactor 200 'shown in FIGS. 4 and 5 differs from the
The plasma reactor 200 'according to the present embodiment differs from the
4, when the
6 shows the
Referring to FIG. 6, the positions of the
When the
7 shows the
The
The
The
8 and 9, when the plurality of
Fig. 10 shows the
In the
11 shows a
More specifically, the
The
The
The
The
A plasma discharge is generated between the
When the exhaust gas leaks into the space between the
12 and 13 illustrate another embodiment of the plasma reactor shown in FIG. 11, wherein the
A
FIG. 14 shows a structure in which a plurality of
FIG. 15 shows a plasma reactor 300 'according to a modification of the above-described embodiment with reference to FIG. Referring to FIG. 15, the plasma reactor 300 'further includes a second electrode unit 350' unlike the
A plasma discharge is generated in the
When the
FIG. 16 shows a modification of the plasma reactor 300 'shown in FIG. The plasma reactor 300 'a shown in FIG. 16 is a structure in which a dielectric layer is omitted in the plasma reactor 300' shown in FIG. As described above, among the molecular particles of the exhaust gas decomposed in the plasma reactor, the dielectric layer may be damaged. Therefore, a plasma reactor having a dielectric layer formed thereon and a plasma reactor having no dielectric layer can be manufactured and a plasma reactor can be selectively provided according to the type of exhaust gas to be decomposed. In addition, if the dielectric layer is not formed in the plasma reactor, the plasma reactor can be manufactured more easily and the cost can be further reduced.
17 to 20 are conceptual diagrams showing the connection relationship between the plasma reactor, the process chambers, and the vacuum pumps according to still another embodiment of the present invention to be described later. The plasma reactor according to the embodiments described below is capable of decomposing harmful substances in a large amount of exhaust gas. As shown in FIGS. 17 to 20, a plurality of process chambers are connected to the plasma reactor, A process chamber is connected. Further, a plurality of vacuum pumps may be connected to the plasma reactor, or a vacuum pump of a large capacity may be connected.
17-20 illustrate that three process chambers are provided, but three vacuum pumps are provided. 17 and 18, three process chambers are provided. As shown in FIG. 17, each of the
19 shows an embodiment in which three
The vacuum pumps 130 are installed in the
Figs. 21 to 26 show a plasma reactor according to another embodiment of the present invention, which is applied to Figs. 17 to 20. Referring to FIGS. 21 to 23, the
The
The
The
The
The
The
The plasma discharge occurs between the
Since the plasma discharge is generated in all the regions inside the
Particularly, since the
In the foregoing description, it is assumed that the
Referring to the
On one side of the
The
Like the
The
A
In addition to the
The fastening member 1 for fastening the
On the other hand, Fig. 22 shows another embodiment of the plasma reactor shown in Fig. The body portion 412 'of the plasma reactor 400' shown in FIG. 22 is formed by opening one side, and a flange 412 'a is formed similarly to the other side. The first shielding cover 415 'is formed in the same shape as the
23, the
The
In the above description, the one
One end of the
The
When the
If the temperature and pressure inside the
FIG. 24 shows a plasma reactor according to another embodiment of the present invention, and the same reference numerals as those in FIG. 21 are used for the same components, and a detailed description thereof will be omitted. In this embodiment, the
Like the
Since the
As described above, when the exhaust gas flows into the
25 and 26 show an embodiment in which the plasma reactor shown in Fig. 24 is operated in a manner different from that of Fig. The
The
25, the
Since the
While the present invention has been described with reference to exemplary embodiments, it is to be understood that the invention is not limited to the disclosed exemplary embodiments, but, on the contrary, is intended to cover various modifications and equivalent arrangements included within the spirit and scope of the appended claims. Accordingly, the true scope of the present invention should be determined by the technical idea of the appended claims.
110: process chamber 120: exhaust line
130: Vacuum pump
200, 200`, 200a, 200b: plasma reactor
201: Exhaust gas inlet
202; Exhaust gas outlet
210: conduit 220: internal module
230: first electrode part 240: second electrode part
250, 250`: fixing means 260: insulating part
270:
300, 300 ': plasma reactor 310: conduit
320:
340: dielectric layer 350 ': second electrode part
400, 400a, 400b, 400c: plasma reactor
410: conduit 411: first flange portion
412: Body part 413: Second flange part
415: first shielding
415b: sealing member
417: second shielding
417b: sealing
420: internal module 430: first electrode portion
440: second electrode portion
Claims (27)
A conduit disposed between the process chamber and the vacuum pump, the conduit having an internal space formed therein to allow the exhaust gas flowing from the process chamber to flow through the vacuum pump;
An inner module disposed in the inner space and forming a space in which a plasma discharge occurs between the inner space and the inner space, the inner module extending in a direction intersecting a direction in which the exhaust gas flows in the inner space; And
And a first electrode unit installed in the internal module and generating a plasma discharge in a space where the plasma discharge occurs,
The conduit,
A body portion having a long side extending in a direction intersecting with a direction in which the exhaust gas flows and having one side opened;
And a first shielding cover coupled to the body portion to shield an opened side of the body portion, the first shielding cover supporting the internal module in the internal space.
A conduit disposed between the process chamber and the vacuum pump, the conduit having an internal space formed therein to allow the exhaust gas flowing from the process chamber to flow through the vacuum pump;
An inner module disposed in the inner space and forming a space in which a plasma discharge occurs between the inner space and the inner space, the inner module extending in a direction intersecting a direction in which the exhaust gas flows in the inner space; And
And a first electrode unit installed in the internal module and generating a plasma discharge in a space where the plasma discharge occurs,
The conduit,
A body portion which forms the internal space and which is elongated in a direction intersecting with a direction in which the exhaust gas flows, and the other end of which opens to allow the internal module to be inserted into the internal space; And
And a second shield cover coupled with a flange extending along the circumferential direction from the other side of the body portion to shield the other open side.
Wherein the first electrode unit is installed inside the inner module so as not to be exposed to the space where the plasma discharge occurs.
The inner module has a hollow tube structure,
Wherein the first electrode portion is installed to be inserted into the inner module.
Wherein the conduit and the inner module are formed in a cylindrical shape,
Wherein the inner module is disposed to have a concentric axis with the conduit.
Wherein the first electrode portion is formed in a tubular shape or a circular column shape having a circular cross section.
Wherein the inner module is formed of a dielectric material to protect the first electrode portion.
Wherein the inner portion of the inner module covers the first electrode portion with a dielectric to protect the first electrode portion.
Wherein the plasma reactor comprises:
And a second electrode part spaced apart from the first electrode part and generating the plasma discharge with the first electrode part.
Wherein the first electrode unit and the second electrode unit are installed inside the inner module so as not to be exposed to the space where the plasma discharge occurs.
The inner module has a hollow tube structure,
Wherein the first electrode portion and the second electrode portion are installed to be inserted into the inner module.
Wherein the conduit and the inner module are formed in a cylindrical shape,
Wherein the inner module is disposed to have a concentric axis with the conduit.
Wherein the first electrode portion and the second electrode portion are formed in a tubular shape or a circular column shape having a circular cross section.
Wherein the inner module is formed of a dielectric material to protect the first electrode portion and the second electrode portion.
Wherein the inner part of the inner module covers the first electrode part and the second electrode part with a dielectric to protect the first electrode part and the second electrode part.
Wherein the first shielding cover and the body portion are integrally formed.
Wherein the inner module is coupled to one side of the first shielding cover and is secured within the conduit.
The first shielding cover has a plate structure so as to be coupled with a flange extending in a circumferential direction from a side of the body portion. And a first inserting groove is formed on one surface of the first shield cover so that one side of the inner module is inserted and coupled.
The conduit,
Further comprising a sealing member disposed in the first insertion groove and sealing the flange and the first shield cover between the inner module and the first shield cover,
Wherein the first shielding cover further has a third insertion groove facing the flange and fitted with the sealing member.
Wherein the inner module is coupled to the second shielding cover on the other side and fixed inside the conduit.
Wherein the second shielding cover has a plate structure and a second insertion groove is formed on one surface of the second shielding cover so that the other side of the inner module is inserted and coupled.
The conduit,
Further comprising a sealing member disposed in the second insertion groove and sealing the flange and the second shielding cover between the inner module and the second shielding cover,
Wherein the second shielding cover further has a fourth insertion groove facing the flange and fitted with the sealing member.
The conduit,
A first flange connecting the pipe connected to the process chamber and the body so that the exhaust gas flows into the internal space of the body from the process chamber; And
Further comprising a second flange portion that connects the pipe connected to the vacuum pump and the body portion so that the exhaust gas, in which the harmful substance is decomposed in the internal space, is discharged to the vacuum pump,
Sectional area of the body portion is larger than a size of the flow cross-sectional area of the first flange.
Wherein the first flange portion, the body portion, and the second flange portion are integrally formed.
Wherein the conduit is partly or entirely formed of a conductive material, and a portion formed of the conductive material is grounded.
Wherein the plasma reactor comprises:
A temperature sensor installed in the internal module and detecting a change in internal temperature of the internal module when the exhaust gas flows into the internal module due to leakage; And
Further comprising a pressure sensor installed in the internal module and sensing a change in internal pressure of the internal module when the exhaust gas flows into the internal module due to leakage.
Priority Applications (2)
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KR1020150096306A KR101732048B1 (en) | 2015-07-07 | 2015-07-07 | Facility for purifying exhaust gas which is generated in processing plasma reactor |
PCT/KR2015/007778 WO2017007059A1 (en) | 2015-07-07 | 2015-07-27 | Plasma reactor for treating exhaust gas produced in process equipment |
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KR1020150096306A KR101732048B1 (en) | 2015-07-07 | 2015-07-07 | Facility for purifying exhaust gas which is generated in processing plasma reactor |
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KR101732048B1 true KR101732048B1 (en) | 2017-05-02 |
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WO (1) | WO2017007059A1 (en) |
Cited By (1)
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KR102256161B1 (en) * | 2020-02-03 | 2021-05-26 | (주)엘오티씨이에스 | Gas exhausting equipment and method for inhibiting deposition of powder in exhaust pipe for semiconductor production facility |
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KR20180095216A (en) | 2017-02-17 | 2018-08-27 | 최종용 | High voltage vacuum plasma reactor for treating unreacted gas |
CN112913334A (en) * | 2018-10-29 | 2021-06-04 | Eq全球株式会社 | Plasma reactor with multiple electrode assemblies or injected gases |
KR102052280B1 (en) * | 2018-10-29 | 2019-12-04 | (주)이큐글로벌 | Plasma reactor for preventing blockage by using ground |
KR102052279B1 (en) * | 2018-10-29 | 2019-12-04 | (주)이큐글로벌 | Plasma reactor having plural electrode assemblies |
WO2020091325A1 (en) * | 2018-10-29 | 2020-05-07 | (주)이큐글로벌 | Plasma reactor capable of preventing clogging by using ground and performing plurality of plasma reaction processes |
US10832893B2 (en) | 2019-03-25 | 2020-11-10 | Recarbon, Inc. | Plasma reactor for processing gas |
US20200312629A1 (en) | 2019-03-25 | 2020-10-01 | Recarbon, Inc. | Controlling exhaust gas pressure of a plasma reactor for plasma stability |
KR102281236B1 (en) * | 2019-12-27 | 2021-07-23 | 한국기계연구원 | Plasmsa cleaning appratus and semiconductor process equipment with the same |
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JP2002239344A (en) * | 2001-02-19 | 2002-08-27 | Fujitsu Ltd | Device and method for treating gas |
KR100645556B1 (en) * | 2004-11-24 | 2006-11-15 | 현대자동차주식회사 | Plasma reactor for purifying exhaust emissions and apparatus for purifying exhaust emmissions by using plasma reactor |
KR100713707B1 (en) * | 2006-05-04 | 2007-05-04 | 한국기계연구원 | Strip vapor system for photo resist of semiconductor wafer and method thereof |
KR101065013B1 (en) | 2009-10-16 | 2011-09-15 | 한국기계연구원 | Plasma reactor for abatement of hazardous material and driving method thereof |
KR101230513B1 (en) * | 2010-12-27 | 2013-02-06 | (주)엘오티베큠 | Treatment apparatus for discharging fluid |
KR101226603B1 (en) * | 2011-05-27 | 2013-01-25 | 주식회사 에이피시스 | Apparatus for treating hazardous gas using counterflow of plasma and hazardous gas, method for treating hazardous gas using the same |
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2015
- 2015-07-07 KR KR1020150096306A patent/KR101732048B1/en active IP Right Grant
- 2015-07-27 WO PCT/KR2015/007778 patent/WO2017007059A1/en active Application Filing
Cited By (1)
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KR102256161B1 (en) * | 2020-02-03 | 2021-05-26 | (주)엘오티씨이에스 | Gas exhausting equipment and method for inhibiting deposition of powder in exhaust pipe for semiconductor production facility |
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WO2017007059A1 (en) | 2017-01-12 |
KR20170006007A (en) | 2017-01-17 |
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