TWI551458B - Release film for producing green sheet and method of producing release film for producing green sheet - Google Patents
Release film for producing green sheet and method of producing release film for producing green sheet Download PDFInfo
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- TWI551458B TWI551458B TW103108759A TW103108759A TWI551458B TW I551458 B TWI551458 B TW I551458B TW 103108759 A TW103108759 A TW 103108759A TW 103108759 A TW103108759 A TW 103108759A TW I551458 B TWI551458 B TW I551458B
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28B—SHAPING CLAY OR OTHER CERAMIC COMPOSITIONS; SHAPING SLAG; SHAPING MIXTURES CONTAINING CEMENTITIOUS MATERIAL, e.g. PLASTER
- B28B1/00—Producing shaped prefabricated articles from the material
- B28B1/30—Producing shaped prefabricated articles from the material by applying the material on to a core or other moulding surface to form a layer thereon
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B27/08—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/16—Layered products comprising a layer of synthetic resin specially treated, e.g. irradiated
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/04—Interconnection of layers
- B32B7/06—Interconnection of layers permitting easy separation
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/50—Properties of the layers or laminate having particular mechanical properties
- B32B2307/538—Roughness
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/70—Other properties
- B32B2307/748—Releasability
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2457/00—Electrical equipment
- B32B2457/16—Capacitors
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- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Mechanical Engineering (AREA)
- Laminated Bodies (AREA)
- Producing Shaped Articles From Materials (AREA)
Description
本發明係關於一種生坯片(green sheet)製造用離形膜及生坯片製造用離形膜之製造方法。 The present invention relates to a release film for producing a green sheet and a method for producing a release film for producing a green sheet.
關於陶瓷電容器(ceramic condenser)之製造中,為了形成生坯片而使用著生坯片製造用離形膜。 In the production of a ceramic capacitor, a release film for producing a green sheet is used in order to form a green sheet.
一般而言,生坯片製造用離形膜係由基材及離形劑層構成。於如此之生坯片製造用離形膜上塗覆陶瓷漿料並將其乾燥而製造出生坯片,陶瓷漿料係於有機溶劑中分散、溶解陶瓷粒子與黏合劑樹脂。接著,所製造出之生坯片係從生坯片製造用離形膜剝離下來而用於陶瓷電容器之製造。 In general, a release film for producing a green sheet is composed of a substrate and a release agent layer. The ceramic slurry is coated on the release film for producing a green sheet and dried to produce a green sheet which is dispersed and dissolved in an organic solvent to dissolve the ceramic particles and the binder resin. Next, the produced green sheet was peeled off from the release film for green sheet production and used for the production of a ceramic capacitor.
使用習知之生坯片製造用離形膜製造生坯片的過程中,生坯片製造用離形膜之表面凹凸狀態會轉印至生坯片,而使得生坯片之表面產生針孔等問題。如此之結果,堆疊如此之生坯片而製造出的陶瓷電容器中,會產生因短路所導致之故障問題。為了解決這樣的問題,必須對於生坯片製造用離形膜之表面(鑄 造表面)要求非常高的平滑性。 In the process of manufacturing a green sheet using a release film by the conventional green sheet manufacturing, the surface unevenness state of the release film for producing a green sheet is transferred to the green sheet, and pinholes are formed on the surface of the green sheet. problem. As a result, in the ceramic capacitor manufactured by stacking such a green sheet, a problem of malfunction due to a short circuit occurs. In order to solve such a problem, it is necessary to mold the surface of the release film for green sheet production (casting) Surface preparation) requires very high smoothness.
因此,有人提出表面平滑之生坯片製造用離形膜之製造方法,此離形膜係於具有表面微細凹凸狀態的基材板之一個表面上,藉由塗布熱硬化樹脂液並對其加熱、硬化而設置熱硬化樹脂層,且於熱硬化樹脂層上塗布離形劑而形成離形劑層(例如參照專利文獻1,日本專利公開案2007-069360號公報)。 Therefore, there has been proposed a method for producing a release film for producing a green sheet having a smooth surface which is attached to one surface of a substrate sheet having a fine uneven state on the surface by applying a heat-hardening resin liquid and heating the same A thermosetting resin layer is provided to be hardened, and a release agent is applied to the thermosetting resin layer to form a release agent layer (see, for example, Patent Document 1, Japanese Patent Laid-Open Publication No. 2007-069360).
再者,近年隨著陶瓷電容器的小型化及高密度化,人們要求生坯片必須更加薄膜化。然而,使用習知之生坯片製造用離形膜製造薄的生坯片時,便會在生坯片之表面產生針孔,而難以得到高信賴度的生坯片。 Furthermore, in recent years, with the miniaturization and high density of ceramic capacitors, it has been demanded that green sheets must be more thinned. However, when a thin green sheet is produced by using a conventional release film for producing a green sheet, pinholes are formed on the surface of the green sheet, and it is difficult to obtain a green sheet of high reliability.
本發明之目的在於提供生坯片製造用離形膜,其能夠防止生坯片之表面發生針孔或部分過厚之不均等情形,而能夠製造高信賴度之生坯片。再者,本發明之另一目的在於提供生坯片製造用離形膜之製造方法,其能夠防止生坯片之表面發生針孔或部分過厚之不均等情形。 An object of the present invention is to provide a release film for producing a green sheet which can prevent pinholes or partial thickness from being uneven on the surface of the green sheet, and can produce a green sheet of high reliability. Further, another object of the present invention is to provide a method for producing a release film for producing a green sheet which can prevent pinholes or partial unevenness from occurring on the surface of the green sheet.
藉由下述(1)~(8)之本發明達成所述目的。 The object is achieved by the present invention (1) to (8) below.
(1)一種生坯片製造用離形膜,包括一基材、一平滑化層及一離形劑層。基材具有一第一表面及一第二表面。平滑化層設置於前述基材之前述第一表面。離形劑層設置於前述平滑化層之相反於前述基材之一表面位置。前述平滑化層係藉由以一活性能量射線(active energy ray)照射並硬化含有一活性能量射 線硬化型化合物之一平滑化層形成用組成物而形成。前述離形劑層之一外表面之一算數平均粗糙度Ra1為8nm以下,且前述離形劑層之前述外表面之一最大突起高度Rp1為50nm以下。 (1) A release film for producing a green sheet, comprising a substrate, a smoothing layer, and a release agent layer. The substrate has a first surface and a second surface. The smoothing layer is disposed on the aforementioned first surface of the substrate. The release agent layer is disposed on a surface of the smoothing layer opposite to a surface of the substrate. The smoothing layer is formed by irradiating an active energy ray and hardening a composition for forming a smoothing layer containing one active energy ray-curable compound. From one of the outer surface of one layer form an arithmetic average roughness Ra 1 of 8nm or less and the layer formed from the outer surface of one of the maximum projection height Rp 1 is 50nm or less.
(2)如上述(1)所述之生坯片製造用離形膜,其中前述第一表面之一算數平均粗糙度Ra2為10~200nm,且前述第一表面之一最大突起高度Rp2為80~1000nm。 (2) The release film for producing a green sheet according to the above (1), wherein the first surface has an arithmetic mean roughness Ra 2 of 10 to 200 nm, and one of the first surfaces has a maximum protrusion height Rp 2 It is 80~1000nm.
(3)如上述(1)或(2)之其中之一所述之生坯片製造用離形膜,其中前述活性能量射線硬化型化合物為質量平均分子量為950以下之化合物。 (3) The release film for producing a green sheet according to any one of the above (1), wherein the active energy ray-curable compound is a compound having a mass average molecular weight of 950 or less.
(4)如上述(1)至(3)之其中之一所述之生坯片製造用離形膜,其中前述活性能量射線硬化型化合物為紫外線硬化型化合物,前述活性能量射線為紫外線。 (4) The release film for producing a green sheet according to any one of the above aspects, wherein the active energy ray-curable compound is an ultraviolet curable compound, and the active energy ray is ultraviolet light.
(5)如上述(1)至(4)所述之生坯片製造用離形膜,其中前述平滑化層之一平均膜厚為0.2~10μm。 (5) The release film for producing a green sheet according to the above (1) to (4), wherein one of the smoothing layers has an average film thickness of 0.2 to 10 μm.
(6)如上述(1)至(5)之其中之一所述之生坯片製造用離形膜,其中前述平滑化層具有相反於前述基材之一表面,前述平滑化層之相反於前述基材之前述表面之一算數平均粗糙度Ra4為8nm以下,且前述平滑化層之相反於前述基材之前述表面之一最大突起高度Rp4為50nm以下。 (6) The release film for green sheet production according to any one of (1) to (5), wherein the smoothing layer has a surface opposite to the surface of the substrate, and the smoothing layer is opposite to The arithmetic mean roughness Ra 4 of the surface of the substrate is 8 nm or less, and the maximum protrusion height Rp 4 of the smoothing layer opposite to the surface of the substrate is 50 nm or less.
(7)如上述(1)至(6)之其中之一所述之生坯片製造用離形膜,其中前述第二表面之一算數平均粗糙度Ra3為10~200nm,且前述第二表面之一最大突起高度Rp3為80~1000 nm。 (7) The release film for producing a green sheet according to any one of the above (1), wherein the second surface has an arithmetic mean roughness Ra 3 of 10 to 200 nm, and the second One of the surfaces has a maximum protrusion height Rp 3 of 80 to 1000 nm.
(8)如上述(1)至(7)之其中之一所述之生坯片製造用離形膜之製造方法,包括一基材準備製程、一塗布層形成製程、一平滑化層形成製程及一離形劑層形成製程。基材準備製程係製備前述基材,前述基材具有前述第一表面及前述第二表面。塗布層形成製程係藉由將含有前述活性能量射線硬化型化合物之前述平滑化層形成用組成物塗布於前述基材之前述第一表面位置而形成一塗布層。平滑化層形成製程係藉由以前述活性能量射線照射並硬化前述塗布層而形成前述平滑化層。離形劑層形成製程係於前述平滑化層之相反於前述基材之前述表面位置形成前述離形劑層。其中,前述離形劑層之前述外表面之前述算數平均粗糙度Ra1為8nm以下,且前述離形劑層之前述外表面之前述最大突起高度Rp1為50nm以下。 (8) The method for producing a release film for producing a green sheet according to any one of the above (1) to (7), comprising a substrate preparation process, a coating layer formation process, and a smoothing layer formation process And a release agent layer forming process. The substrate preparation process is to prepare the substrate, and the substrate has the first surface and the second surface. The coating layer forming process forms a coating layer by applying the composition for forming a smoothing layer containing the active energy ray-curable compound to the first surface position of the substrate. The smoothing layer forming process forms the smoothing layer by irradiating and hardening the coating layer with the active energy ray. The release agent layer forming process is performed on the surface of the smoothing layer opposite to the surface of the substrate to form the release agent layer. The arithmetic mean roughness Ra 1 of the outer surface of the release agent layer is 8 nm or less, and the maximum protrusion height Rp 1 of the outer surface of the release agent layer is 50 nm or less.
藉由本發明,能夠提供生坯片製造用離形膜,其能夠防止生坯片之表面發生針孔或部分過厚之不均等情形,而能夠製造高信賴度之生坯片。尤其,即使使用表面粗糙度較大的基材做為構成生坯片製造用離形膜的基材,亦能夠提供外表面平滑性優良之生坯片製造用離形膜。若使用如此之生坯片製造用離形膜,便能夠防止生坯片之表面發生針孔或部分過厚之不均等情形。如此之結果,於堆疊生坯片以製作電容器時,能防止因短路所導致之故障問題。再者,藉由本發明,能夠易於確實製造出生坯片製造用離形膜,其能夠製造表面平滑性優良之生坯片。 According to the present invention, it is possible to provide a release film for producing a green sheet which can prevent pinholes or partial thickness from being uneven on the surface of the green sheet, and can produce a green sheet of high reliability. In particular, even if a substrate having a large surface roughness is used as a substrate constituting a release film for producing a green sheet, it is possible to provide a release film for producing a green sheet having excellent outer surface smoothness. When such a release film for producing a green sheet is used, it is possible to prevent pinholes or partial thickness from being uneven on the surface of the green sheet. As a result, when the green sheets are stacked to form a capacitor, the problem of malfunction due to the short circuit can be prevented. According to the present invention, it is possible to easily produce a release film for producing a green sheet, which is capable of producing a green sheet having excellent surface smoothness.
1‧‧‧生坯片製造用離形膜 1‧‧‧Folding film for green sheet manufacturing
11‧‧‧基材 11‧‧‧Substrate
111‧‧‧基材之第一表面 111‧‧‧The first surface of the substrate
112‧‧‧基材之第二表面 112‧‧‧Second surface of the substrate
12‧‧‧平滑化層 12‧‧‧Smoothing layer
121‧‧‧表面(第三表面) 121‧‧‧ surface (third surface)
13‧‧‧離形劑層 13‧‧‧ release agent layer
131‧‧‧離形劑層之外表面 131‧‧‧Outer surface of the release agent layer
第1圖繪示本發明之生坯片製造用離形膜之側視剖面圖。 Fig. 1 is a side sectional view showing a release film for producing a green sheet of the present invention.
以下將參照優選實施型態而詳細說明本發明。 The invention will be described in detail below with reference to preferred embodiments.
以下將描述生坯片製造用離形膜。 The release film for green sheet production will be described below.
本發明之生坯片製造用離形膜係用來製造生坯片。而且,所製造出之生坯片係例如用於陶瓷電容器等物之製造。 The release film for producing a green sheet of the present invention is used to produce a green sheet. Moreover, the green sheets produced are used, for example, for the manufacture of ceramic capacitors and the like.
第1圖繪示本發明之生坯片製造用離形膜之側視剖面圖。而且,於以下說明中,第1圖之上側以「上」表示,下側以「下」表示。 Fig. 1 is a side sectional view showing a release film for producing a green sheet of the present invention. Further, in the following description, the upper side of the first drawing is indicated by "upper" and the lower side is indicated by "lower".
如第1圖所示,生坯片製造用離形膜1具有一基材11、一平滑化層12及一離形劑層13。基材11具有一第一表面111及一第二表面112。平滑化層12設置於基材11之第一表面111上。離形劑層13設置於平滑化層12之相反於基材11之一表面121之位置。換言之,如第1圖所示,生坯片製造用離形膜1為基材11、平滑化層12及離形劑層13以依序相互接合之方式堆疊而成的三層構造。 As shown in Fig. 1, the release film 1 for green sheet production has a substrate 11, a smoothing layer 12, and a release agent layer 13. The substrate 11 has a first surface 111 and a second surface 112. The smoothing layer 12 is disposed on the first surface 111 of the substrate 11. The release agent layer 13 is disposed at a position opposite to the surface 121 of the substrate 11 of the smoothing layer 12. In other words, as shown in Fig. 1, the release film 1 for producing a green sheet is a three-layer structure in which the base material 11, the smoothing layer 12, and the release agent layer 13 are stacked in this order.
再者,於本說明書中,使用生坯片製造用離形膜1製造生坯片的場合下,生坯片例如以於離形劑層13之外表面131上塗覆經溶解之陶瓷漿料之方式形成。 Further, in the present specification, in the case where a green sheet is produced using the release film 1 for green sheet production, the green sheet is coated with a dissolved ceramic slurry, for example, on the outer surface 131 of the release agent layer 13. The way is formed.
於本發明中,生坯片製造用離形膜1具有基材11、 離形劑層13及位於二者之間的平滑化層12。而且,本發明之生坯片製造用離形膜1具有下述特徵,平滑化層12係藉由以一活性能量射線照射並硬化含有一活性能量射線硬化型化合物之一平滑化層形成用組成物而形成,離形劑層13之外表面131之一算數平均粗糙度Ra1為8nm以下,且離形劑層13之外表面131之一最大突起高度Rp1為50nm以下。 In the present invention, the release film 1 for producing a green sheet has a substrate 11, a release agent layer 13, and a smoothing layer 12 interposed therebetween. Further, the release film 1 for producing a green sheet of the present invention has the following feature, and the smoothing layer 12 is formed by irradiating an active energy ray and hardening a composition for forming a smoothing layer containing an active energy ray-curable compound. material is formed from one of 131 arithmetic average roughness Ra than 13 formed on the surface layer 1 of 8nm or less and the releasing agent layer 13 than the surface of one 131 maximum projection height Rp of 1 to 50nm or less.
藉由如此之特徵,能夠提升離形劑層13之外表面131之平滑性,還能夠得到離形性優良之生坯片製造用離形膜1。若使用此生坯片製造用離形膜1製造生坯片,能夠防止生坯片之表面發生針孔或部分過厚之不均等情形,而能夠製造高信賴度之生坯片。如此之結果,於堆疊生坯片以製作電容器時,能防止因短路所導致之故障問題。 According to such a feature, the smoothness of the outer surface 131 of the release agent layer 13 can be improved, and the release film 1 for producing a green sheet excellent in release property can be obtained. When the green sheet is produced by using the release film 1 for green sheet production, it is possible to prevent pinholes or partial thickness from being uneven on the surface of the green sheet, and it is possible to manufacture a green sheet of high reliability. As a result, when the green sheets are stacked to form a capacitor, the problem of malfunction due to the short circuit can be prevented.
附帶一提,用以做為基材11之膜體,能夠具有各種表面粗糙度。往往廉價的膜體之表面粗糙度具有比較粗糙的傾向。即使使用如此表面粗糙度比較粗糙的基材形成生坯片製造用離形膜的場合下,藉由於基材的表面設置具有前述特徵之平滑化層,亦能夠確實填入(消除)基材表面之凹凸狀態。如此之結果,平滑化層之相反於基材之表面能夠變得平滑。藉此,能夠防止基材表面之凹凸狀態影響形成於平滑化層之上之離形劑層之外表面,而能夠得到離形劑層之外表面平滑性優良之生坯片製造用離形膜。 Incidentally, as the film body of the substrate 11, it is possible to have various surface roughnesses. The surface roughness of an inexpensive film body tends to be rough. Even when a release film having a rough surface roughness is used to form a release film for producing a green sheet, it is possible to surely fill (eliminate) the surface of the substrate by providing a smoothing layer having the above-described characteristics on the surface of the substrate. The bump state. As a result, the surface of the smoothing layer opposite to the substrate can be made smooth. Thereby, it is possible to prevent the uneven state of the surface of the substrate from affecting the outer surface of the release agent layer formed on the smoothing layer, and to obtain a release film for producing a green sheet excellent in surface smoothness other than the release agent layer. .
以下,將依序說明關於本實施型態之構成生坯片製 造用離形膜之各層。 Hereinafter, the constituent green sheet system of the present embodiment will be described in order. The layers of the release film are used.
以下將說明基材11。 The substrate 11 will be explained below.
基材11係具有將剛性、可撓性等物理強度賦予生坯片製造用離形膜1(以下有時亦僅稱為「離形膜1」)之功能。 The base material 11 has a function of imparting physical strength such as rigidity and flexibility to the release film 1 for producing a green sheet (hereinafter sometimes referred to simply as "release film 1").
基材11如第1圖所示,具有第一表面111及第二表面112。 As shown in FIG. 1, the substrate 11 has a first surface 111 and a second surface 112.
構成基材11之材料並未特別受限,舉例而言,可為如聚對苯二甲酸丁二酯(polybutylene terephthalate,PBT)樹脂、聚對苯二甲酸乙二酯(polyethylene terephthalate,PET)樹脂及聚萘二甲酸乙二醇酯(polyethylene naphthalate,PEN)樹脂等之聚酯(polyester)樹脂、如聚丙烯(polypropylene,PP)樹脂及聚甲基戊烯(polymethylpentene,PMP)樹脂等之聚烯烴(polyolefin)樹脂及聚碳酸酯(Polycarbonate,PC)樹脂等之塑膠製之膜材。基材11能為單層膜材,亦能為同種或不同種之二層以上的多層膜材。其中特別以聚酯膜為佳,以聚對苯二甲酸乙二酯膜為較佳,更甚者以雙軸延伸之聚對苯二甲酸乙二酯膜為佳。尤其聚酯膜於加工時及使用時之過程中不易產生粉塵。為此,舉例而言,使用以聚酯樹脂所製造之離形膜1製造生坯片之場合中,能夠有效防止因粉塵所導致之陶瓷漿料塗覆不良。如此之結果,能夠製造較少針孔之生坯片。 The material constituting the substrate 11 is not particularly limited, and may be, for example, a polybutylene terephthalate (PBT) resin or a polyethylene terephthalate (PET) resin. Polyester resin such as polyethylene naphthalate (PEN) resin, polyolefin such as polypropylene (PP) resin and polymethylpentene (PMP) resin (polyolefin) resin and polycarbonate (Polycarbonate, PC) resin and other plastic film. The substrate 11 can be a single layer film or a multilayer film of two or more layers of the same type or different types. Among them, a polyester film is preferred, a polyethylene terephthalate film is preferred, and a biaxially stretched polyethylene terephthalate film is preferred. In particular, the polyester film is less prone to dust during processing and during use. For this reason, for example, in the case of producing a green sheet using the release film 1 made of a polyester resin, it is possible to effectively prevent coating failure of the ceramic slurry due to dust. As a result, a green sheet having fewer pinholes can be produced.
此外,基材11除了前述材料以外,亦能含有填充物等物。填充物能夠使用二氧化矽(silica)、二氧化鈦、碳酸鈣、 高嶺土及氧化鋁等之其中一種或組合二種以上之材料。藉由包含如此之填充物,能同時將機械強度賦予基材11,提升基材11之表面及背面的平滑度,還能抑制結塊現象(blocking)。 Further, the substrate 11 may contain a filler or the like in addition to the above materials. The filler can use silica, titania, calcium carbonate, One or a combination of two or more of kaolin and alumina. By including such a filler, mechanical strength can be simultaneously imparted to the substrate 11, and the smoothness of the surface and the back surface of the substrate 11 can be improved, and blocking can be suppressed.
另外,基材11之第一表面111之算數平均粗糙度Ra2以10~200nm為佳,且其最大突起高度Rp2以80~1000nm為佳。 Further, the arithmetic mean roughness Ra 2 of the first surface 111 of the substrate 11 is preferably 10 to 200 nm, and the maximum protrusion height Rp 2 is preferably 80 to 1000 nm.
更甚者,第一表面111之算數平均粗糙度Ra2以15~100nm為較佳,第一表面111之算數平均粗糙度Ra2以20~50nm為更佳。再者,第一表面111之最大突起高度Rp2以90~800nm為較佳,第一表面111之最大突起高度Rp2以100~600nm為更佳。 Furthermore, the arithmetic mean roughness Ra 2 of the first surface 111 is preferably 15 to 100 nm, and the arithmetic mean roughness Ra 2 of the first surface 111 is preferably 20 to 50 nm. Further, the maximum protrusion height Rp 2 of the first surface 111 is preferably 90 to 800 nm, and the maximum protrusion height Rp 2 of the first surface 111 is preferably 100 to 600 nm.
若第一表面111之算數平均粗糙度Ra2及最大突起高度Rp2落於前述範圍內,即使後述之平滑化層12之膜厚比較薄,亦能夠更確實地填入基材11之第一表面111之凹凸狀態,而能夠使平滑化層12之相反於基材11之表面121變得更加平滑。如此之結果,能夠更確實地防止基材11之第一表面111之凹凸狀態影響到形成於平滑化層12上之離形劑層13之外表面131。 When the arithmetic mean roughness Ra 2 and the maximum protrusion height Rp 2 of the first surface 111 fall within the above range, even if the film thickness of the smoothing layer 12 to be described later is relatively thin, the first substrate 11 can be more reliably filled. The uneven state of the surface 111 makes it possible to make the surface 121 of the smoothing layer 12 opposite to the substrate 11 smoother. As a result, it is possible to more reliably prevent the uneven state of the first surface 111 of the substrate 11 from affecting the outer surface 131 of the release agent layer 13 formed on the smoothing layer 12.
再者,第一表面111之算數平均粗糙度Ra2及其最大突起高度Rp2落於前述範圍內之基材11係易於以較便宜的價格取得。 Further, the substrate 11 having the arithmetic mean roughness Ra 2 of the first surface 111 and its maximum protrusion height Rp 2 falling within the above range is easily obtained at a relatively low price.
對此,若第一表面111之算數平均粗糙度Ra2及最大突起高度Rp2超過前述之上限值,根據平滑化層形成用組成物 之構成材料,由於難以使其充分填進第一表面111之凹凸狀態中,而有必須使離形劑層13之膜厚變得較厚的情形發生。 On the other hand, when the arithmetic mean roughness Ra 2 and the maximum protrusion height Rp 2 of the first surface 111 exceed the above upper limit, it is difficult to sufficiently fill the first surface according to the constituent material of the composition for forming a smoothing layer. In the uneven state of 111, it is necessary to make the film thickness of the release agent layer 13 thick.
而且,於本說明書中,基材11之第一表面111之算數平均粗糙度Ra2及最大突起高度Rp2為依照日本工業標準(Japanese Industrial Standards,JIS)B0601-1994使用三豐(Mitutoyo)社製造之表面粗糙度測定機SV3000S4(觸針式)測定而求得之數值。此外,於本說明書中,除非另有規定,「算數平均粗糙度及最大突起高度」所指的是以前述方式測定而得到的數值。 Further, in the present specification, the arithmetic mean roughness Ra 2 and the maximum protrusion height Rp 2 of the first surface 111 of the substrate 11 are Mitutoyo according to Japanese Industrial Standards (JIS) B0601-1994. The value obtained by measuring the manufactured surface roughness measuring machine SV3000S4 (stylus type). In addition, in the present specification, unless otherwise specified, "arithmetic average roughness and maximum protrusion height" refer to values obtained by the above-described methods.
另外,基材11之第二表面112之算數平均粗糙度Ra3以10~200nm為佳,且其最大突起高度Rp3以80~1000nm為佳。更甚者,第二表面112之算數平均粗糙度Ra3以15~100nm為較佳,第二表面112之算數平均粗糙度Ra3以20~50nm為更佳。再者,第二表面112之最大突起高度Rp3以90~800nm為較佳,第二表面112之最大突起高度Rp3以100~600nm為更佳。 Further, the arithmetic mean roughness Ra 3 of the second surface 112 of the substrate 11 is preferably 10 to 200 nm, and the maximum protrusion height Rp 3 is preferably 80 to 1000 nm. Furthermore, the arithmetic mean roughness Ra 3 of the second surface 112 is preferably 15 to 100 nm, and the arithmetic average roughness Ra 3 of the second surface 112 is preferably 20 to 50 nm. Further, the maximum protrusion height Rp 3 of the second surface 112 is preferably 90 to 800 nm, and the maximum protrusion height Rp 3 of the second surface 112 is preferably 100 to 600 nm.
若第二表面112之算數平均粗糙度Ra3及最大突起高度Rp3落於前述範圍內,能夠適當地防止將離形膜1捲繞成滾筒狀時發生捲曲滑移的情形。另外,還能夠防止將離形膜1捲繞成滾筒狀以茲存放時發生結塊現象。具體而言,離形膜1能根據需求而以離形劑層13朝內側之方式捲繞於紙製、塑膠製或金屬製等之核心材而呈滾筒狀以茲存放。此時,若第二表面112之算數平均粗糙度Ra3及最大突起高度Rp3落於前述範圍內,則能夠 於離形膜1捲繞成滾筒狀時充分排除空氣,而有效抑制捲曲滑移的情形。因此,離形膜1捲繞成滾筒狀時,不必提高捲繞的張力,而能夠抑制因捲繞的張力所導致之卷芯部分的變形。再者,於捲筒狀之離形膜1中,若第二表面112之算數平均粗糙度Ra3及最大突起高度Rp3落於前述範圍內,能夠更有效地防止因離形劑層13與基材11之第二表面112彼此黏合而發生的結塊現象。因此,能夠易於展開捲筒狀之離形膜1。 When the arithmetic mean roughness Ra 3 and the maximum protrusion height Rp 3 of the second surface 112 fall within the above range, it is possible to appropriately prevent the occurrence of curl slip when the release film 1 is wound into a roll shape. Further, it is also possible to prevent the occurrence of agglomeration when the release film 1 is wound into a roll shape to be stored. Specifically, the release film 1 can be wound around a core material such as paper, plastic, or metal so that the release agent layer 13 faces inward as needed, and is stored in a roll shape. At this time, if the arithmetic mean roughness Ra 3 and the maximum protrusion height Rp 3 of the second surface 112 fall within the above range, the air can be sufficiently removed when the release film 1 is wound into a roll shape, and the curl slip can be effectively suppressed. The situation. Therefore, when the release film 1 is wound into a roll shape, it is not necessary to increase the tension of the winding, and deformation of the core portion due to the tension of the winding can be suppressed. Further, in the roll-shaped release film 1, if the arithmetic mean roughness Ra 3 and the maximum protrusion height Rp 3 of the second surface 112 fall within the above range, the release agent layer 13 can be more effectively prevented. The agglomeration phenomenon occurs when the second surface 112 of the substrate 11 is bonded to each other. Therefore, the roll-shaped release film 1 can be easily unwound.
對此,若第二表面112之算數平均粗糙度Ra3及最大突起高度Rp3未達前述之下限值,將離形膜1捲繞成滾筒狀時,離形膜1之表面及背面(基材11之第二表面112及離形劑層13之外表面131)恐易於發生結塊現象。另外,基材11之平均膜厚雖並未特別受限,但以10~300μm為佳,以15~200μm為較佳。藉此,離形膜1能具有適度的可撓性,也同時具有特別優良的耐撕裂性及耐破斷性。 On the other hand, if the arithmetic mean roughness Ra 3 and the maximum protrusion height Rp 3 of the second surface 112 do not reach the aforementioned lower limit value, when the release film 1 is wound into a roll shape, the surface and the back surface of the release film 1 ( The second surface 112 of the substrate 11 and the outer surface 131 of the release agent layer 13 may be prone to agglomeration. Further, the average film thickness of the substrate 11 is not particularly limited, but is preferably 10 to 300 μm, and more preferably 15 to 200 μm. Thereby, the release film 1 can have moderate flexibility, and at the same time has particularly excellent tear resistance and breakage resistance.
以下將說明平滑化層12。 The smoothing layer 12 will be explained below.
平滑化層12係相反於離形劑層13之外表面131,且具有減緩基材11之第一表面111之凹凸狀態影響的功能。 The smoothing layer 12 is opposite to the outer surface 131 of the release agent layer 13 and has a function of slowing down the influence of the uneven state of the first surface 111 of the substrate 11.
如第1圖所示,平滑化層12係設置於基材11之第一表面111上。 As shown in FIG. 1, the smoothing layer 12 is provided on the first surface 111 of the substrate 11.
平滑化層12係藉由將平滑化層形成用組成物塗布於基材11之第一表面111上,並以活性能量射線照射並硬化所得到之塗布層而形成。 The smoothing layer 12 is formed by applying a smoothing layer forming composition onto the first surface 111 of the substrate 11 and irradiating with an active energy ray to cure the obtained coating layer.
平滑化層形成用組成物含有藉由照射活性能量射線而硬化之活性能量射線硬化型化合物。 The composition for forming a smoothing layer contains an active energy ray-curable compound which is cured by irradiation with an active energy ray.
而且,照射活性能量射線前之平滑化層形成用組成物,於室溫下係以未硬化的狀態或半硬化的狀態的方式存在。 Further, the composition for forming a smoothing layer before the irradiation of the active energy ray is present in an unhardened state or a semi-hardened state at room temperature.
再者,如此之平滑化層形成用組成物塗布於基材11之第一表面111上時具有適度的流動性。因此,若使用如此之平滑化層形成用組成物,能夠易於填入基材11之第一表面111之凹凸狀態,也能夠確實保持此填入狀態。如此之結果,能夠防止基材11之凹凸狀態對於平滑化層12之相反於基材11之一表面121(以下有時亦稱為「第三表面121」)之位置產生影響,而能夠使平滑化層12之第三表面121變得平滑。因此,能夠使形成於平滑化層12之第三表面121上之離形劑層13之外表面131變得更為平滑。 Further, when such a composition for forming a smoothing layer is applied onto the first surface 111 of the substrate 11, it has a moderate fluidity. Therefore, when such a composition for forming a smoothing layer is used, it is possible to easily fill the uneven state of the first surface 111 of the substrate 11, and it is possible to surely maintain the filled state. As a result, it is possible to prevent the uneven state of the substrate 11 from affecting the position of the smoothing layer 12 opposite to the surface 121 of the substrate 11 (hereinafter sometimes referred to as the "third surface 121"), and it is possible to smooth The third surface 121 of the layer 12 becomes smooth. Therefore, the outer surface 131 of the release agent layer 13 formed on the third surface 121 of the smoothing layer 12 can be made smoother.
另舉例而言,活性能量射線硬化型化合物可為藉由照射紫外線而硬化之紫外線硬化型化合物、藉由照射紅外線而硬化之紅外線硬化型化合物、藉由照射X射線而硬化之X射線硬化型化合物、藉由照射電子束而硬化之電子束硬化型化合物以及藉由照射可見光而硬化之可見光硬化型化合物。其中特別以紫外線硬化型化合物為佳。紫外線硬化型化合物具有適度的流動性。藉此,能夠以將平滑化層形成用組成物塗布於基材11之第一表面111上之方式形成平滑表面狀態。因此,即使平滑化層12形成得比較薄,亦能夠確實地填入基材11之第一表面111之凹凸狀態。 如此之結果,能夠更易於確實使平滑化層12之第三表面121變得平滑。 In another example, the active energy ray-curable compound may be an ultraviolet curable compound which is cured by irradiation with ultraviolet rays, an infrared curable compound which is cured by irradiation of infrared rays, and an X-ray hardening compound which is hardened by irradiation of X-rays. An electron beam curing type compound which is cured by irradiation with an electron beam and a visible light curing type compound which is cured by irradiation with visible light. Among them, an ultraviolet curable compound is particularly preferred. The ultraviolet curable compound has moderate fluidity. Thereby, a smooth surface state can be formed in such a manner that the composition for forming a smoothing layer is applied onto the first surface 111 of the substrate 11. Therefore, even if the smoothing layer 12 is formed to be relatively thin, it is possible to surely fill the uneven state of the first surface 111 of the substrate 11. As a result, it is possible to more easily make the third surface 121 of the smoothing layer 12 smooth.
藉由照射紫外線或電子束等之活性能量射線而能夠硬化的活性能量射線硬化型化合物,能夠使用分子內具有二個以上聚合性不飽和基的化合物。舉例而言,可為胺基甲酸酯丙烯酸酯(urethane acrylate)系化合物、多官能丙烯酸酯(acrylate)系化合物、聚酯丙烯酸酯(polyester acrylate)系化合物、環氧丙烯酸酯(epoxy acrylate)系化合物、多元醇丙烯酸酯(polyol acrylate)系化合物等化合物。其中以胺基甲酸酯丙烯酸酯系化合物為佳。 The active energy ray-curable compound which can be cured by irradiation with an active energy ray such as an ultraviolet ray or an electron beam can use a compound having two or more polymerizable unsaturated groups in the molecule. For example, it may be a urethane acrylate compound, a polyfunctional acrylate compound, a polyester acrylate compound, or an epoxy acrylate system. A compound, a compound such as a polyol acrylate compound. Among them, a urethane acrylate compound is preferred.
舉例而言,胺基甲酸酯丙烯酸酯系化合物能藉由聚醚多元醇(polyether polyol)或聚酯多元醇(polyester polyol)與聚異氰酸酯(polyisocyanate)反應所得之聚胺基甲酸酯寡聚物(polyurethane oligomer)以(甲基)丙烯酸((metha)acrylic acid)進行酯化反應而得到。具體而言,可為苯基環氧丙基醚丙烯酸酯六亞甲基二異氰酸酯胺基甲酸酯(Phenyl glycidyl ether acrylate hexamethylene diisocyanate urethane)預聚物(prepolymer)、季戊四醇三丙烯酸酯六亞甲基二異氰酸酯胺基甲酸酯預聚物(pentaerythritol triacrylate hexamethylene diisocyanate urethane)預聚物、季戊四醇三丙烯酸酯甲苯二異氰酸酯胺基甲酸酯(pentaerythritol triacrylate toluene diisocyanate urethane)預聚物、季戊四醇三丙烯酸酯異佛爾酮二異氰酸酯胺基甲酸酯 (pentaerythritol triacrylate isophorone diisocyanate urethane)預聚物、二季戊四醇五丙烯酸酯六亞甲基二異氰酸酯胺基甲酸酯(dipentaerythritol pentaacrylate hexamethylene diisocyanate urethane)預聚物等化合物。 For example, a urethane acrylate compound can be oligomerized by a polyether polyol or a polyester polyol and a polyisocyanate. The polyurethane oligomer is obtained by esterification reaction with (meth)acrylic acid. Specifically, it may be a Phenyl glycidyl ether acrylate hexamethylene diisocyanate urethane prepolymer or a pentaerythritol triacrylate hexamethylene group. Pentaerythritol triacrylate hexamethylene diisocyanate urethane prepolymer, pentaerythritol triacrylate toluene diisocyanate urethane prepolymer, pentaerythritol triacrylate Ketone diisocyanate urethane (pentaerythritol triacrylate isophorone diisocyanate urethane) prepolymer, dipentaerythritol pentaacrylate hexamethylene diisocyanate urethane prepolymer and the like.
舉例而言,多官能丙烯酸酯系化合物可為1,4-丁二醇二(甲基)丙烯酸酯(1,4-butanediol di(metha)acrylate)、1,6-己二醇二(甲基)丙烯酸酯(1,6-hexanediol di(metha)acrylate)、新戊二醇二(甲基)丙烯酸酯(neopentylglycol di(metha)acrylate)、聚乙二醇二(甲基)丙烯酸酯(polyethylene glycol di(metha)acrylate)、新戊二醇己二酸酯二(甲基)丙烯酸酯(neopentylglycol adipate di(metha)acrylate)、二環戊基二(甲基)丙烯酸酯(dicyclopentanyl di(metha)acrylate)、烯丙基化環己基二(甲基)丙烯酸酯(allyl cyclohexyl di(metha)acrylate)、異氰脲酸酯二(甲基)丙烯酸酯(isocyanurate di(metha)acrylate)三羥甲基丙烷三(甲基)丙烯酸酯(trimethylol propane tri(metha)acrylate)、二季戊四醇三(甲基)丙烯酸酯(dipentaerythritol tri(metha)acrylate)、季戊四醇三(甲基)丙烯酸酯(pentaerythritol tri(metha)acrylate)、三(丙烯醯氧乙基)異氰脲酸酯(tris(acryloxyethyl)isocyanurate)、二季戊四醇六(甲基)丙烯酸酯(dipentaerythritol hexa(metha)acrylate)等化合物。 For example, the polyfunctional acrylate compound may be 1,4-butanediol di(meth)acrylate, 1,6-hexanediol di(methyl) Acetylene (1,6-hexanediol di(metha)acrylate), neopentyllglycol di(meth)acrylate, polyethylene glycol di(meth)acrylate (polyethylene glycol) Di(metha)acrylate), neopentyllgic acid adipate di(meth)acrylate, dicyclopentanyl di(metha)acrylate ), allyl cyclohexyl di (metha) acrylate, isocyanurate di (metha) acrylate trimethylolpropane Trimethylol propane tri(metha)acrylate, dipentaerythritol tri(meth)acrylate, pentaerythritol tri(meth)acrylate ), tris(acryloxyethyl)isocyanurate, dipentaerythritol Yl) acrylate (dipentaerythritol hexa (metha) acrylate) and the like compounds.
舉例而言,聚酯丙烯酸酯系化合物能夠為藉由將多價羧酸與多價醇縮合而得之兩末端具有羥基之聚酯寡聚物 (polyester oligomer)的羥基以(甲基)丙烯酸進行酯化反應所得到的化合物,或者藉由將環氧烷(alkylene oxide)添加至多價羧酸而得之寡聚物(oligomer)的末端的羥基以(甲基)丙烯酸進行酯化反應所得到的化合物。 For example, the polyester acrylate-based compound can be a polyester oligomer having a hydroxyl group at both ends thereof by condensing a polyvalent carboxylic acid with a polyvalent alcohol. a compound obtained by esterification of a hydroxyl group of (polyester oligomer) with (meth)acrylic acid, or a hydroxyl group at the terminal of an oligomer (oligomer) obtained by adding an alkylene oxide to a polyvalent carboxylic acid A compound obtained by esterification reaction with (meth)acrylic acid.
舉例而言,環氧丙烯酸酯系化合物能夠為藉由將(甲基)丙烯酸反應於較低分子量之雙酚(bisphenol)型環氧(epoxy)樹脂或酚醛(novolak)型環氧樹脂的環氧乙烷(oxirane)環以進行酯化反應所得到的化合物。 For example, the epoxy acrylate-based compound can be an epoxy resin obtained by reacting (meth)acrylic acid with a lower molecular weight bisphenol epoxy resin or a novolak epoxy resin. An oxirane ring is a compound obtained by an esterification reaction.
舉例而言,多元醇丙烯酸酯系化合物能夠為藉由聚醚多元醇的羥基以(甲基)丙烯酸進行酯化反應所得到的化合物。 For example, the polyol acrylate-based compound can be a compound obtained by esterification reaction of a hydroxyl group of a polyether polyol with (meth)acrylic acid.
另外,活性能量射線硬化型化合物以質量平均分子量為950以下為佳,以質量平均分子量為300~700為較佳。藉此,塗布於基材11之第一表面111並照射活性能量射線前之平滑化層形成用組成物能夠具有適度的黏度。藉此,平滑化層形成用組成物具有更適度的流動性。藉由使用如此之平滑化層形成用組成物,於基材11之第一表面111之位置形成平滑化層12,而能夠更確實地填入基材11之第一表面111之凹凸狀態。如此之結果,能夠更確實防止基材11之凹凸狀態對於平滑化層12之第三表面121產生影響,而能夠使平滑化層12之第三表面121變得更平滑。因此,特別能夠防止基材11之凹凸狀態對形成於平滑化層12上之離形劑層13之外表面131產生影響,而能夠使離形劑層13之外表面131變得更平滑。 Further, the active energy ray-curable compound preferably has a mass average molecular weight of 950 or less, and preferably has a mass average molecular weight of 300 to 700. Thereby, the composition for forming a smoothing layer before being applied to the first surface 111 of the substrate 11 and irradiated with the active energy ray can have an appropriate viscosity. Thereby, the smoothing layer forming composition has more appropriate fluidity. By using such a composition for forming a smoothing layer, the smoothing layer 12 is formed at the position of the first surface 111 of the substrate 11, and the uneven state of the first surface 111 of the substrate 11 can be more reliably filled. As a result, it is possible to more reliably prevent the uneven state of the substrate 11 from affecting the third surface 121 of the smoothing layer 12, and to make the third surface 121 of the smoothing layer 12 smoother. Therefore, in particular, it is possible to prevent the uneven state of the substrate 11 from affecting the outer surface 131 of the release agent layer 13 formed on the smoothing layer 12, and to make the outer surface 131 of the release agent layer 13 smoother.
尤其是即使在基材11之第一表面111之表面凹凸狀態較大時,因能夠藉由前述平滑化層形成用組成物之作用及效果以適當地填入第一表面111之凹凸狀態,而亦能夠得到離形劑層13之外表面131之平滑性特別優良的離形膜1。 In particular, even when the surface of the first surface 111 of the substrate 11 has a large unevenness state, it is possible to appropriately fill the uneven state of the first surface 111 by the action and effect of the smoothing layer forming composition. It is also possible to obtain the release film 1 which is particularly excellent in the smoothness of the outer surface 131 of the release agent layer 13.
對此,若活性能量射線硬化型化合物之質量平均分子量未達前述之下限值,平滑化層形成用組成物之黏度較低,而可能會有使平滑化層12硬化之時間變得較長的場合。再者,若活性能量射線硬化型化合物之質量平均分子量超過前述之上限值,根據活性能量射線硬化型化合物之的種類等因素,平滑化層形成用組成物之黏度會變得較高,而為了調整黏度,可能會發生必須添加黏度調整劑等物之場合。 On the other hand, if the mass average molecular weight of the active energy ray-curable compound does not reach the above lower limit, the viscosity of the composition for forming a smoothing layer is low, and the time for hardening the smoothing layer 12 may become longer. The occasion. In addition, when the mass average molecular weight of the active energy ray-curable compound exceeds the above upper limit, the viscosity of the composition for forming a smoothing layer becomes higher depending on factors such as the type of the active energy ray-curable compound. In order to adjust the viscosity, it may happen that a viscosity adjuster or the like must be added.
另外,平滑化層形成用組成物除了添加有活性能量射線硬化型化合物,還亦能根據需求而包含溶劑。藉此,能夠易於調整塗布於基材11之第一表面111時之平滑化層形成用組成物之黏度。 Further, the composition for forming a smoothing layer may contain a solvent as needed in addition to the active energy ray-curable compound. Thereby, the viscosity of the composition for forming a smoothing layer applied to the first surface 111 of the substrate 11 can be easily adjusted.
舉例而言,溶劑能夠使用甲苯(toluene)及二甲苯(xylene)等之芳香族烴(aromatic hydrocarbons)、乙酸乙酯(ethyl acetate)及乙酸正丁酯(butyl acetate)等之脂肪酸酯(fatty acid esters)、甲基乙基酮(methyl ethyl ketone,MEK)及甲基異丁基酮(methyl isobutyl ketone,MIBK)等之酮(ketone)類、甲醇(methanol)、乙醇(ethanol)及異丙醇(isopropyl alcohol)等醇類(alcohol)等之有機溶劑之其中一種或組合二種以上者。藉 此,塗布於基材11之第一表面111並照射活性能量射線前之平滑化層形成用組成物變得易於具有適度的黏度。 For example, the solvent can be a fatty acid ester such as aromatic hydrocarbons such as toluene or xylene, ethyl acetate, and butyl acetate. Acid esters), methyl ethyl ketone (MEK) and methyl isobutyl ketone (MIBK), ketones, methanol, ethanol and isopropyl One or a combination of two or more organic solvents such as an alcohol such as isopropyl alcohol. borrow Thus, the composition for forming a smoothing layer before being applied to the first surface 111 of the substrate 11 and irradiated with the active energy ray is likely to have an appropriate viscosity.
而且,平滑化層形成用組成物除了前述成分以外,亦能含有其他成分。其他成分可為交聯劑、光聚合起始劑、黏度調整劑、催化劑、染料、分散劑、抗靜電劑、硬化劑等。此外,於含有前述其他成分的場合下,於平滑化層形成用組成物之中(以固體含量計算),前述其他成分的含量以0.1~10之質量百分比為佳。 Further, the composition for forming a smoothing layer may contain other components in addition to the above components. Other components may be a crosslinking agent, a photopolymerization initiator, a viscosity modifier, a catalyst, a dye, a dispersant, an antistatic agent, a hardener, and the like. Further, in the case where the other components are contained, the content of the other components is preferably 0.1 to 10% by mass in the composition for forming a smoothing layer (calculated as a solid content).
另外,於含有溶劑之平滑化層形成用組成物之中,活性能量射線硬化型化合物之含量雖並未特別受限,但以0.5~60之質量百分比為佳,以1~45之質量百分比為較佳。藉此,平滑化層形成用組成物易於具有適當的黏度。 Further, among the compositions for forming a smoothing layer containing a solvent, the content of the active energy ray-curable compound is not particularly limited, but is preferably 0.5 to 60% by mass, and is 1 to 45% by mass. Preferably. Thereby, the composition for forming a smoothing layer tends to have an appropriate viscosity.
再者,於平滑化層形成用組成物之中(以固體含量計算),活性能量射線硬化型化合物之含量雖並未特別受限,但以90以上之質量百分比為佳,以95以上之質量百分比為較佳。藉此,平滑化層形成用組成物能具有特別優良的硬化性。 Further, among the components for forming a smoothing layer (calculated as a solid content), the content of the active energy ray-curable compound is not particularly limited, but it is preferably 90% or more, and more preferably 95 or more. The percentage is preferred. Thereby, the composition for forming a smoothing layer can have particularly excellent hardenability.
另外,平滑化層12之第三表面121之算數平均粗糙度Ra4以8nm以下為佳,且其最大突起高度Rp4以50nm以下為佳。更甚者,第三表面121之算數平均粗糙度Ra4以6nm以下為較佳。而且,第三表面121之最大突起高度Rp4以40nm以下為較佳。 Further, the arithmetic mean roughness Ra 4 of the third surface 121 of the smoothing layer 12 is preferably 8 nm or less, and the maximum protrusion height Rp 4 is preferably 50 nm or less. Furthermore, the arithmetic mean roughness Ra 4 of the third surface 121 is preferably 6 nm or less. Further, the maximum protrusion height Rp 4 of the third surface 121 is preferably 40 nm or less.
若第三表面121之算數平均粗糙度Ra4及最大突起 高度Rp4落於前述範圍內,能夠更確實地防止基材11之表面凹凸狀態影響到離形劑層13之外表面131。 When the arithmetic mean roughness Ra 4 and the maximum protrusion height Rp 4 of the third surface 121 fall within the above range, it is possible to more reliably prevent the surface unevenness state of the substrate 11 from affecting the outer surface 131 of the release agent layer 13.
對此,若第三表面121之算數平均粗糙度Ra4超過前述之上限值,離形劑層13與平滑化層12之間發生必須要進一步設置新的平滑化層的情況。 On the other hand, when the arithmetic mean roughness Ra 4 of the third surface 121 exceeds the above upper limit value, a new smoothing layer needs to be further provided between the release agent layer 13 and the smoothing layer 12.
另一方面,若第三表面121之最大突起高度Rp4超過前述之上限值,離形劑層13與平滑化層12之間發生必須要進一步設置新的平滑化層的情況。 On the other hand, if the maximum protrusion height Rp 4 of the third surface 121 exceeds the above upper limit value, a situation in which a new smoothing layer needs to be further provided between the release agent layer 13 and the smoothing layer 12 occurs.
另外,平滑化層12之平均膜厚雖並未特別受限,但以0.2~10μm為佳,以0.3~5μm為較佳。藉此,能夠更確實地填入基材11之第一表面111之凹凸狀態,也能夠更加提高離形膜1之外表面之平滑性。尤其是本實施型態之平滑化層形成用組成物因以含有如同前述之活性能量射線硬化型化合物而形成,即使平滑化層12之膜厚比較薄,亦能夠更易於確實地填入基材11之第一表面111之凹凸狀態。而且,平滑化層12能夠具有適度的可撓性。 Further, although the average film thickness of the smoothing layer 12 is not particularly limited, it is preferably 0.2 to 10 μm, more preferably 0.3 to 5 μm. Thereby, the unevenness of the first surface 111 of the substrate 11 can be more reliably filled, and the smoothness of the outer surface of the release film 1 can be further improved. In particular, since the composition for forming a smoothing layer of the present embodiment is formed by containing the active energy ray-curable compound as described above, even if the film thickness of the smoothing layer 12 is relatively thin, it is possible to more easily and reliably fill the substrate. The uneven state of the first surface 111 of 11. Moreover, the smoothing layer 12 can have moderate flexibility.
對此,若平滑化層12之平均膜厚未達前述之下限值,根據構成平滑化層形成用組成物之成分,為了使其能充分填入基材11之第一表面111之凹凸狀態,會發生必須使用第一表面111之表面粗糙度為較小之基材11的情形。另外,若平滑化層12之平均膜厚超過前述之上限值,根據構成平滑化層形成用組成物之成分,係易於因平滑化層12硬化收縮而於離形膜1發生翹曲, 而降低離形膜1之操作性。 On the other hand, when the average film thickness of the smoothing layer 12 is less than the above-described lower limit, the component constituting the smoothing layer forming composition is sufficiently filled in the uneven state of the first surface 111 of the substrate 11 in order to sufficiently fill the composition of the smoothing layer forming composition. There is a case where it is necessary to use the substrate 11 having a small surface roughness of the first surface 111. In addition, when the average thickness of the smoothing layer 12 exceeds the above-described upper limit, it is easy to cause warpage of the release film 1 due to curing and shrinkage of the smoothing layer 12 depending on the composition of the composition for forming the smoothing layer. The operability of the release film 1 is lowered.
以下將說明離形劑層13。 The release agent layer 13 will be described below.
離形劑層13具有將離形性賦予離形膜1之功能。 The release agent layer 13 has a function of imparting a release property to the release film 1.
離形劑層13如第1圖所示,設置於平滑化層12之第三表面121位置。 The release agent layer 13 is provided at the position of the third surface 121 of the smoothing layer 12 as shown in FIG.
離形劑層13係藉由乾燥並硬化塗布於平滑化層12之第三表面121之離形劑層形成用組成物而形成。 The release agent layer 13 is formed by drying and hardening the composition for forming a release agent layer applied to the third surface 121 of the smoothing layer 12.
如此之離形劑層形成用組成物包含離形劑。 Such a composition for forming a release agent layer contains a release agent.
離形劑能夠使用醇酸(alkyd)系化合物、丙烯醯(acryl)系化合物、矽酮(silicone)系化合物、含長鏈烷基(long-chain alkyl group)之化合物、氟化物等之其中一種或組合二種以上之離形劑。其中以使用醇酸系化合物、丙烯醯系化合物、矽酮系化合物、含長鏈烷基之化合物為佳。藉此,在具有適度硬化性的同時,還能夠得到對於生坯片而言有特別優良之離形性的離形劑層13。 As the release agent, one of an alkyd compound, an acryl compound, a silicone compound, a long-chain alkyl group-containing compound, a fluoride, or the like can be used. Or combine two or more release agents. Among them, an alkyd compound, a propylene oxime compound, an fluorenone compound, or a compound containing a long-chain alkyl group is preferably used. Thereby, it is possible to obtain the release agent layer 13 which is particularly excellent in the release property from the green sheet while having moderate hardenability.
具體舉例而言,醇酸系化合物能夠使用長鏈烷變性醇酸化合物、矽酮變性醇酸化合物等之變性物。另外,於使用醇酸系化合物的場合下,離形劑層形成用組成物中,亦能夠另添加交聯劑及催化劑。藉由對如此之離形劑層形成用組成物加熱硬化之方法,而能夠得到具有含交聯結構之醇酸系化合物的離形劑層13。如此之結果,於離形劑13上形成生坯片時,能夠防止具有離形性之醇酸系化合物遷移至生坯片,而能夠防止離形劑層13 之離形性降低。 Specifically, as the alkyd compound, a denatured product such as a long-chain alkyl-modified alkyd compound or an anthrone-modified alkyd compound can be used. Further, when an alkyd compound is used, a crosslinking agent and a catalyst may be additionally added to the composition for forming a release agent layer. The release agent layer 13 having an alkyd compound having a crosslinked structure can be obtained by a method of heat-hardening the composition for forming a release agent layer. As a result, when the green sheet is formed on the release agent 13, the migration of the alkyd compound having the release property to the green sheet can be prevented, and the release agent layer 13 can be prevented. The shape loss is reduced.
再者,具體舉例而言,丙烯醯系化合物能夠使用長鏈烷變性丙烯醯化合物、矽酮變性丙烯醯化合物等之變性物。另外,於離形劑層形成用組成物中含有丙烯醯系化合物的場合下,亦能夠於離形劑層形成用組成物中另添加交聯劑及催化劑。藉由對如此之離形劑層形成用組成物加熱硬化之方法,而能夠得到具有含交聯結構之丙烯醯系化合物的離形劑層13。如此之結果,能夠防止具有離形性之丙烯醯系化合物遷移至平滑化層12,而能夠防止離形劑層13之離形性降低。 Further, as a specific example, the propylene oxime compound can be a denatured product such as a long-chain alkyl acryl ruthenium compound or an fluorenone propylene oxime compound. Further, when the acrylonitrile-based compound is contained in the composition for forming a release agent layer, a crosslinking agent and a catalyst can be additionally added to the composition for forming a release agent layer. The release agent layer 13 having a propylene-based compound having a crosslinked structure can be obtained by a method of heat-hardening the composition for forming a release agent layer. As a result, it is possible to prevent the propylene-based compound having the release property from moving to the smoothing layer 12, and it is possible to prevent the release property of the release agent layer 13 from being lowered.
再者,具體舉例而言,矽酮系化合物係能夠使用含有以聚二甲基矽氧烷(dimethylpolysiloxane)做為基本骨架之矽酮系化合物。矽酮系化合物有加成反應型、縮合反應型、紫外線硬化型、電子束硬化型等類型。加成反應型之矽酮系化合物因反應性高而能優化生產性。與縮合反應型之矽酮系化合物相比,加成反應型之矽酮系化合物因具有於製造後的離形力變化較小及無硬化收縮情形等優點,而有利使用於構成離形劑層13之離形劑。 In addition, as an anthrone-based compound, for example, an anthrone-based compound containing dimethylpolysiloxane as a basic skeleton can be used. The anthrone-based compound has an addition reaction type, a condensation reaction type, an ultraviolet curing type, and an electron beam curing type. The addition reaction type fluorenone compound can optimize productivity due to high reactivity. Compared with the oxime ketone compound of the condensation reaction type, the oxime ketone compound of the addition reaction type is advantageously used for constituting the release agent layer because it has a small change in the release force after production and no hardening and shrinkage. 13 release agent.
具體舉例而言,上述加成反應型之矽酮系化合物能夠為一種有機聚矽氧烷(organopolysiloxane),係於此化合物之分子末端及/或側鏈處接有如乙烯基(vinyl)、烯丙基(allyl)、丙烯基(propenyl)、己烯基(hexenyl)等之碳原子數為2~10個之烯基(alkenyl)中之二個以上烯基。使用如此之加成反應型 之矽酮系化合物時,亦能夠合併使用交聯劑及催化劑。 Specifically, the above-described addition reaction type fluorenone compound can be an organopolysiloxane which is attached to a molecular terminal and/or a side chain of the compound such as vinyl or ally. Two or more alkenyl groups of alkenyl having 2 to 10 carbon atoms, such as allyl, propenyl or hexenyl. Using such an additive reaction type In the case of the fluorenone compound, a crosslinking agent and a catalyst can also be used in combination.
上述之交聯劑例如為具有於一分子中與至少二個矽原子結合之氫原子之有機聚矽氧烷,具體而言,例如為二甲基氫矽烷氧基(dimethyl hydrogen siloxy)封端之二甲基矽氧烷(dimethyl siloxane)-甲基氫矽氧烷(methyl hydrogen siloxane)共聚物、三甲基矽烷氧基(trimethyl siloxy)封端之二甲基矽氧烷-甲基氫矽氧烷共聚物、三甲基矽烷氧基(trimethyl siloxy)封端之甲基氫聚矽氧烷(methyl hydrogen polysiloxane)、聚(氫倍半矽氧烷)(poly(hydrogen silsesquioxane))等物質。 The above cross-linking agent is, for example, an organopolyoxyalkylene having a hydrogen atom bonded to at least two deuterium atoms in one molecule, specifically, for example, dimethyl hydrogen siloxy-terminated Dimethyl siloxane-methyl hydrogen siloxane copolymer, trimethyl siloxy-terminated dimethyl methoxy-methane hydroquinone An alkane copolymer, a trimethyl siloxy-terminated methyl hydrogen polysiloxane, or a poly(hydrogen silsesquioxane).
另外,上述催化劑可為微粒狀白金、吸附於碳粉載體之微粒狀白金、氯鉑酸、醇變性氯鉑酸、氯鉑酸之烯烴(olefin)配合物(complex)、鈀(palladium)、銠(rhodium)等之白金系化合物。藉由使用如此之催化劑,能夠更有效率地進行離形劑層形成用組成物之硬化反應。 Further, the catalyst may be particulate platinum, particulate platinum adsorbed on a carbon powder carrier, chloroplatinic acid, alcohol-modified chloroplatinic acid, olefinic complex of chloroplatinic acid, palladium, ruthenium. A platinum compound such as (rhodium). By using such a catalyst, the hardening reaction of the composition for forming a release agent layer can be performed more efficiently.
再舉例而言,含長鏈烷基之化合物係例如使用於聚乙烯醇(polyvinyl alcohol)系聚合物中反應碳原子數為8~30個之長鏈烷基異氰酸酯(alkyl isocyanate)而得到之聚乙烯氨基甲酸酯(polyvinyl carbamate)及於聚乙烯亞胺(polyethyleneimine)中反應碳原子數為8~30個之長鏈烷基異氰酸酯而得到之烷基脲(urea)衍生物。 Further, for example, the long-chain alkyl group-containing compound is obtained by, for example, using a long-chain alkyl isocyanate having a carbon number of 8 to 30 in a polyvinyl alcohol-based polymer. A vinyl carbamate and a urea urea derivative obtained by reacting a long-chain alkyl isocyanate having 8 to 30 carbon atoms in polyethyleneimine.
另外,具體舉例而言,氟化物能夠使用氟矽酮(fluorine silicone)化合物、氟硼(boron)化合物等化合物。 Further, as a specific example, a compound such as a fluorine silicone compound or a boron compound can be used as the fluoride.
再者,離形劑層形成用組成物中,除了前述之離形劑以外,亦能包含分散劑及溶劑。藉由含有分散劑及溶劑中之至少一者,能夠使塗布於平滑化層12之第三表面121並乾燥前之離形劑層形成用組成物具有適度的黏度。 Further, the release agent layer-forming composition may contain a dispersant and a solvent in addition to the above-mentioned release agent. By containing at least one of a dispersing agent and a solvent, the composition for forming a release agent layer applied to the third surface 121 of the smoothing layer 12 and dried can have an appropriate viscosity.
舉例而言,分散劑或溶劑能夠使用甲苯等之芳香族烴、乙酸乙酯等之脂肪酸酯、甲基乙基酮等之酮類、己烷、庚烷等之脂肪族烴等之有機溶劑之其中一種或組合二種以上者。 For example, an aromatic hydrocarbon such as toluene, a fatty acid ester such as ethyl acetate, a ketone such as methyl ethyl ketone, or an organic solvent such as an aliphatic hydrocarbon such as hexane or heptane can be used as the dispersant or the solvent. One of them or a combination of two or more.
而且,離形劑層形成用組成物除了前述成分以外,亦能含有其他成分。其他成分可例如為催化劑、染料、分散劑、抗靜電劑、硬化劑等。此外,於含有前述其他成分的場合下,於離形劑層形成用組成物之中,前述其他成分的含量以0.1~10之質量百分比為佳。 Further, the composition for forming a release agent layer may contain other components in addition to the above components. Other ingredients may be, for example, catalysts, dyes, dispersants, antistatic agents, hardeners, and the like. Further, in the case where the other components are contained, the content of the other components in the composition for forming a release agent layer is preferably 0.1 to 10% by mass.
另外,於離形劑層形成用組成物之中,離形劑之含量雖並未特別受限,但以0.3~10之質量百分比為佳。 Further, among the compositions for forming a release agent layer, the content of the release agent is not particularly limited, but is preferably 0.3 to 10% by mass.
再者,如同前述,離形劑層13之外表面131之算數平均粗糙度Ra1為8nm以下,且其最大突起高度Rp1為50nm以下。更甚者,離形劑層13之外表面131之算數平均粗糙度Ra1以6nm以下為佳。而且,離形劑層13之外表面131之最大突起高度Rp1以40nm以下為佳。 Further, as described above, the arithmetic mean roughness Ra 1 of the outer surface 131 of the release agent layer 13 is 8 nm or less, and the maximum protrusion height Rp 1 is 50 nm or less. Furthermore, the arithmetic average roughness Ra 1 of the outer surface 131 of the release agent layer 13 is preferably 6 nm or less. Further, the maximum protrusion height Rp 1 of the outer surface 131 of the release agent layer 13 is preferably 40 nm or less.
離形劑層13之外表面131之算數平均粗糙度Ra1及最大突起高度Rp1落於前述範圍內,於形成生坯片時,藉由外表面131之較平滑表面形狀轉印至生坯片,而能夠更適當地防止生 坯片之表面產生針孔等情形。如此之結果,能夠得到表面更為平滑之生坯片。 The arithmetic mean roughness Ra 1 and the maximum protrusion height Rp 1 of the outer surface 131 of the release agent layer 13 fall within the foregoing range, and are transferred to the green body by the smooth surface shape of the outer surface 131 when the green sheet is formed. The sheet can more appropriately prevent the occurrence of pinholes or the like on the surface of the green sheet. As a result, a green sheet having a smoother surface can be obtained.
另外,離形劑層13之平均膜厚以0.01~3μm為佳,以0.03~1μm為較佳。若離形劑層13之厚度未達0.01μm,根據構成離形劑層13之材料,也會有使其無法充分發揮做離形劑層之功能的情況。另一方面,若離形劑層13之厚度超過3μm,將離形膜1捲繞成滾筒狀時,因容易發生結塊現象,而可能產生離形膜1捲繞不良的情形,也可能會於離形膜1捲出時發生高靜電性等問題。 Further, the average thickness of the release agent layer 13 is preferably 0.01 to 3 μm, more preferably 0.03 to 1 μm. If the thickness of the release agent layer 13 is less than 0.01 μm, depending on the material constituting the release agent layer 13, there is a case where the function of the release agent layer cannot be sufficiently exhibited. On the other hand, when the thickness of the release agent layer 13 exceeds 3 μm, when the release film 1 is wound into a roll shape, agglomeration may occur easily, and the release film 1 may be wound poorly, or may be caused. When the release film 1 is unwound, problems such as high static electricity occur.
以下將說明生坯片製造用離形膜之製造方法。 Hereinafter, a method of producing a release film for producing a green sheet will be described.
接下來,將說明關於如同前述之生坯片製造用離形膜1之製造方法之適當的實施型態。 Next, a description will be given of a suitable embodiment regarding the manufacturing method of the release film 1 for producing a green sheet as described above.
本實施型態之離形膜1之製造方法包括一基材準備製程、一塗布層形成製程、一平滑化層形成製程及一離形劑層形成製程。基材準備製程係製備基材11。塗布層形成製程係將含有指定之活性能量射線硬化型化合物之平滑化層形成用組成物塗布於基材11之第一表面111再根據需求將其加以乾燥而形成一塗布層。平滑化層形成製程係藉由以一活性能量射線照射並硬化塗布層而形成平滑化層12。離形劑層形成製程係於平滑化層12之相反於前述基材11之表面121位置形成離形劑層13。 The manufacturing method of the release film 1 of the present embodiment includes a substrate preparation process, a coating layer forming process, a smoothing layer forming process, and a release agent layer forming process. The substrate preparation process prepares the substrate 11. The coating layer forming process applies a composition for forming a smoothing layer containing a specified active energy ray-curable compound to the first surface 111 of the substrate 11, and then drying it as needed to form a coating layer. The smoothing layer forming process forms the smoothing layer 12 by irradiating and hardening the coating layer with an active energy ray. The release agent layer forming process is performed at a position opposite to the surface 121 of the aforementioned substrate 11 of the smoothing layer 12 to form a release agent layer 13.
以下,將詳細說明各個製程。 Hereinafter, each process will be described in detail.
以下將說明基材準備製程。 The substrate preparation process will be described below.
首先,製備基材11。 First, the substrate 11 is prepared.
基材11能夠使用如同前述所構成之基材11。 The substrate 11 can use the substrate 11 as described above.
接著,能夠於基材11之第一表面111進行氧化法等之表面處理或施加底漆(primer)處理。藉此,能夠特別優化基材11與設置於基材11之第一表面111之位置之平滑化層12間之黏著性。 Next, a surface treatment such as an oxidation method or a primer treatment can be performed on the first surface 111 of the substrate 11. Thereby, the adhesion between the substrate 11 and the smoothing layer 12 provided at the position of the first surface 111 of the substrate 11 can be particularly optimized.
氧化法等之表面處理能夠根據基材11之種類而適當地選擇。舉例而言,可為電暈(corona)放電處理、電漿(plasma)放電處理、鉻(chrome)氧化處理(濕式)、火焰處理、熱風處理、臭氧(ozone)處理、紫外線照射處理等。其中從優化與平滑化層12間之黏著性及簡化處理之操作之觀點來看,特別以使用電暈放電處理法為較佳。 The surface treatment such as the oxidation method can be appropriately selected depending on the kind of the substrate 11 . For example, it may be a corona discharge treatment, a plasma discharge treatment, a chrome oxidation treatment (wet), a flame treatment, a hot air treatment, an ozone treatment, an ultraviolet irradiation treatment, or the like. Among them, from the viewpoint of optimizing the adhesion between the smoothing layer 12 and the operation of simplifying the processing, it is preferable to use a corona discharge treatment method in particular.
以下將說明塗布層形成製程。 The coating layer forming process will be described below.
於本製程中,首先製備平滑化層形成用組成物。 In the present process, a composition for forming a smoothing layer is first prepared.
平滑化層形成用組成物能夠單獨使用如同前述之活性能量射線硬化型化合物。除此之外,亦能夠根據需求而使用混合了如同前述之溶劑或其他成分之平滑化層形成用組成物。 The composition for forming a smoothing layer can be used alone as the above-described active energy ray-curable compound. In addition to this, it is also possible to use a composition for forming a smoothing layer in which a solvent or other component as described above is mixed as needed.
接著,於基材11之第一表面111上塗布成為液狀之平滑化層形成用組成物。藉此,得到塗布層。如同前述,由於平滑化層形成用組成物具有適度的流動性,能藉由將平滑化層形成用組成物塗布於基材11之第一表面111上而使其確實填入基材11之第一表面111之凹凸狀態。如此之結果,能夠防止基材11 之凹凸狀態對於平滑化層12之第三表面121產生影響,而能夠使平滑化層12之第三表面121變得平滑。 Next, a liquid-like composition for forming a smoothing layer is applied onto the first surface 111 of the substrate 11. Thereby, a coating layer was obtained. As described above, since the composition for forming a smoothing layer has moderate fluidity, the smoothing layer forming composition can be applied to the first surface 111 of the substrate 11 to be surely filled in the substrate 11 The uneven state of a surface 111. As a result, the substrate 11 can be prevented The uneven state affects the third surface 121 of the smoothing layer 12, and the third surface 121 of the smoothing layer 12 can be made smooth.
另外,於平滑化層形成用組成物含有溶劑之場合下,於基材1之第一表面111上塗布平滑化層形成用組成物之後,藉由乾燥平滑化層形成用組成物而得到塗布層。因此,能夠藉由乾燥平滑化層形成用組成物而去除溶劑。 In addition, when the composition for forming a smoothing layer contains a solvent, a composition for forming a smoothing layer is applied onto the first surface 111 of the substrate 1, and then a coating layer is obtained by drying the composition for forming a smoothing layer. . Therefore, the solvent can be removed by drying the composition for smoothing layer formation.
塗布平滑化層形成用組成物之方法,例如為凹版塗層(gravure coat)法、棒塗(bar coat)法、噴塗(spray coat)法、旋塗(spin coat)法、氣刀塗(air knife coat)法、輥塗(roll coat)法、刮刀(blade coat)法、閘輥塗(gate roll coat)法、模塗(die coat)法。其中特別以凹版塗層法及棒塗法為較佳,以棒塗法為更佳。藉此,能夠易於形成目標厚度的塗布層。 A method of applying a composition for forming a smoothing layer, for example, a gravure coat method, a bar coat method, a spray coat method, a spin coat method, and an air knife coating (air) A knife coat method, a roll coat method, a blade coat method, a gate roll coat method, and a die coat method. Among them, a gravure coating method and a bar coating method are preferable, and a bar coating method is more preferable. Thereby, the coating layer of the target thickness can be easily formed.
另外,於平滑化層形成用組成物含有溶劑之場合下,乾燥平滑化層形成用組成物之方法雖並未特別受限,但可例如為使用熱風乾燥爐等之乾燥方法。 In the case where the smoothing layer forming composition contains a solvent, the method of drying the smoothing layer forming composition is not particularly limited, and may be, for example, a drying method using a hot air drying furnace or the like.
再者,使平滑化層形成用組成物乾燥之場合的乾燥條件並未特別受限。乾燥溫度以攝氏50~100度為佳,乾燥時間以持續5秒~1分鐘為佳。藉此,能夠防止平滑化層12非本意地變質,同時亦能夠特別有效率地形成平滑化層12。如此之結果,能夠提升最終所得到之離形膜1之生產性。而且,若乾燥溫度落於前述範圍內,於平滑化層形成用組成物含有溶劑之場合下,隨著溶劑於乾燥時蒸發,而能夠特別防止平滑化層12發生翹曲及 裂紋。 Further, the drying conditions in the case where the composition for forming a smoothing layer is dried are not particularly limited. The drying temperature is preferably from 50 to 100 degrees Celsius, and the drying time is preferably from 5 seconds to 1 minute. Thereby, it is possible to prevent the smoothing layer 12 from being unintentionally deteriorated, and at the same time, the smoothing layer 12 can be formed particularly efficiently. As a result, the productivity of the finally obtained release film 1 can be improved. In addition, when the drying temperature falls within the above range, when the composition for forming a smoothing layer contains a solvent, warpage of the smoothing layer 12 can be particularly prevented as the solvent evaporates during drying. crack.
以下將說明平滑化層形成製程。 The smoothing layer forming process will be described below.
接著,藉由以活性能量射線照射並硬化由塗布層形成製程得到之塗布層而形成平滑化層12。 Next, the smoothing layer 12 is formed by irradiating and hardening the coating layer obtained by the coating layer forming process with active energy rays.
於本製程中,係以保持外表面平滑性之方式,硬化利用前述塗布層形成製程而確實填入基材11之第一表面111之凹凸狀態之塗布層。如此之結果,能夠得到第三表面121十分平滑的平滑化層12。藉此,能夠更適當地防止基材11之第一表面111之凹凸狀態影響至離形劑層13之外表面131。因此,於後述之離形劑層形成製程中,能夠優化離形劑層13之外表面131之平滑性。 In the present process, the coating layer in the uneven state of the first surface 111 of the substrate 11 is surely filled by the coating layer forming process so as to maintain the smoothness of the outer surface. As a result, the smoothing layer 12 in which the third surface 121 is very smooth can be obtained. Thereby, it is possible to more appropriately prevent the uneven state of the first surface 111 of the substrate 11 from affecting the outer surface 131 of the release agent layer 13. Therefore, the smoothness of the outer surface 131 of the release agent layer 13 can be optimized in the process of forming the release agent layer described later.
舉例而言,用以硬化之活性能量射線雖可根據所使用之平滑化層形成用組成物其含有的材料而適當地選擇,但可為可見光、紫外線、紅外線、X射線、α射線、β射線、γ射線及電子束等。其中以紫外線或可見光為佳。 For example, the active energy ray to be hardened may be appropriately selected depending on the material contained in the composition for forming a smoothing layer to be used, but may be visible light, ultraviolet light, infrared light, X-ray, alpha ray, or beta ray. , gamma rays and electron beams. Among them, ultraviolet light or visible light is preferred.
舉例而言,活性能量射線(紫外線或可見光)之波長雖並未特別受限,但以波長200~600nm為佳,以波長250~450nm為較佳。若活性能量射線之波長落於前述範圍內,在充分縮短硬化塗布層之硬化時間的同時,還能夠均勻地硬化塗布層。 For example, although the wavelength of the active energy ray (ultraviolet light or visible light) is not particularly limited, it is preferably 200 to 600 nm in wavelength and 250 to 450 nm in wavelength. When the wavelength of the active energy ray falls within the above range, the hardening time of the hard coat layer can be sufficiently shortened, and the coating layer can be uniformly cured.
另外,做為照射活性能量射線(紫外線或可見光)之機構並未特別受限,亦能夠利用各種一般的機構。例如能夠使用高壓水銀燈、金屬鹵化物(metal halide)燈及準分子(excimer) 燈等光源燈做為光源。 Further, the mechanism for irradiating the active energy ray (ultraviolet light or visible light) is not particularly limited, and various general mechanisms can be utilized. For example, high-pressure mercury lamps, metal halide lamps, and excimers can be used. A light source such as a lamp is used as a light source.
再者,於照射活性能量射線(紫外線或可見光)之場合中,活性能量射線之照射量以每平方公分50~400毫焦耳(mJ/cm2)為佳,以100~300mJ/cm2為較佳。若活性能量射線之照射量落於前述範圍內,能夠更均勻且確實地硬化塗布層。 Furthermore, in the case of irradiating an active energy ray (ultraviolet or visible light), the amount of active energy ray irradiation is preferably 50 to 400 mJ/cm 2 , and 100 to 300 mJ/cm 2 . good. When the irradiation amount of the active energy ray falls within the above range, the coating layer can be more uniformly and surely cured.
還有,照射活性能量射線之時間雖並未特別受限,但以持續5秒~1分鐘為佳。藉此,能夠特別有效率地形成平滑化層12。如此之結果,能夠提升最終所得到之離形膜1之生產性。 Further, although the time for irradiating the active energy ray is not particularly limited, it is preferably from 5 seconds to 1 minute. Thereby, the smoothing layer 12 can be formed particularly efficiently. As a result, the productivity of the finally obtained release film 1 can be improved.
以下將說明離形劑層形成製程。 The release agent layer forming process will be described below.
接下來,於平滑化層12之相反於基材11之表面121位置形成離形劑層13。 Next, a release agent layer 13 is formed at a position opposite to the surface 121 of the substrate 11 of the smoothing layer 12.
準備混合了如同前述之材料做為構成離形劑層13之離形劑層形成用組成物。 It is prepared to mix a material as described above as a composition for forming a release agent layer constituting the release agent layer 13.
接著,於平滑化層12之相反於基材11之表面121上塗布液狀之離形劑層形成用組成物之後,對其乾燥並硬化。藉此,得到離形劑層13。 Next, after the composition for forming a liquid release agent layer is applied to the surface 121 of the smoothing layer 12 opposite to the substrate 11, it is dried and hardened. Thereby, the release agent layer 13 is obtained.
乾燥方法雖並未特別受限,但可例如為使用熱風乾燥爐等之乾燥方法。 Although the drying method is not particularly limited, it may be, for example, a drying method using a hot air drying furnace or the like.
再者,乾燥條件並未特別受限。乾燥溫度以攝氏80~150度為佳,乾燥時間以持續5秒~1分鐘為佳。藉此,能夠防止離形劑層13非本意地變質,同時亦能夠特別有效率地形成離形劑層13。如此之結果,能夠提升最終所得到之離形膜1之生 產性。 Further, the drying conditions are not particularly limited. The drying temperature is preferably 80 to 150 degrees Celsius, and the drying time is preferably 5 seconds to 1 minute. Thereby, it is possible to prevent the release agent layer 13 from being unintentionally deteriorated, and at the same time, the release agent layer 13 can be formed particularly efficiently. As a result, the resulting release film 1 can be improved. Productivity.
藉由以上之製程,能夠易於確實製造平滑性優良、離形性優良且高信賴度之離形膜1。 According to the above process, the release film 1 which is excellent in smoothness, excellent in release property, and high in reliability can be easily produced.
另外,藉由使用如此之離形膜1製造生坯片,能夠防止生坯片之表面產生針孔等情形。 Further, by using the release film 1 to produce a green sheet, it is possible to prevent pinholes or the like from occurring on the surface of the green sheet.
而且,使用離形膜1製造陶瓷生坯片之方法,能例如為以下方法,此方法包括於離形膜之離形劑層之表面塗布陶瓷粉末分散漿料並加以乾燥,形成生坯片之後,堆疊從離形膜剝離下來之生坯片而得到堆疊體,於燒結此堆疊體而得到之陶瓷片形成電極。藉此,能夠得到陶瓷電容器。因此,藉由使用離形膜1所形成生坯片形成陶瓷電容器,能防止因短路所導致之故障問題而得到高信賴度之陶瓷電容器。 Further, the method of producing a ceramic green sheet using the release film 1 can be, for example, a method comprising applying a ceramic powder dispersion slurry to the surface of the release agent layer of the release film and drying it to form a green sheet. The green sheets peeled off from the release film are stacked to obtain a stacked body, and the ceramic sheets obtained by sintering the stacked body form electrodes. Thereby, a ceramic capacitor can be obtained. Therefore, by forming a ceramic capacitor using the green sheet formed by the release film 1, it is possible to prevent a ceramic capacitor having high reliability due to a problem of malfunction due to a short circuit.
以上基於本發明之優選實施型態之詳細說明,並非用以限定本發明。 The above detailed description of the preferred embodiments of the invention is not intended to limit the invention.
舉例而言,前述之本實施型態中,雖以基材具有單層構造之方式進行說明,但並非限定於此。基材亦能具有同種或不同種之二層以上的多層構造。另外,關於平滑化層及離形劑層亦同樣地以其具有單層構造之方式進行說明,但並非限定於此。平滑化層及離形劑層亦能夠各自具有同種或不同種之二層以上的多層構造。 For example, in the above-described embodiment, the substrate has a single layer structure, but the invention is not limited thereto. The substrate can also have a multilayer structure of two or more layers of the same or different species. Further, the smoothing layer and the release agent layer are similarly described as having a single layer structure, but are not limited thereto. The smoothing layer and the release agent layer can also each have a multilayer structure of two or more layers of the same or different species.
而且,舉例而言,前述之實施型態中,係說明關於將平滑化層設置於基材之第一表面之生坯片製造用離形膜。然 而,生坯片製造用離形膜並非限定於此,而亦可將平滑化層及離形劑層設置於基材之第二表面之位置。 Further, for example, in the above-described embodiment, a release film for producing a green sheet in which a smoothing layer is provided on a first surface of a substrate will be described. Of course Further, the release film for producing a green sheet is not limited thereto, and the smoothing layer and the release agent layer may be provided at a position on the second surface of the substrate.
再者,前述之本實施型態中,雖以生坯片製造用離形膜為依序相互接合之基材、平滑化層及離形劑層並堆疊成三層構造之方式進行說明,但並非限定於此。於平滑化層及離形劑層之間亦可設置中間層。而且,於基材及平滑化層之間亦可設置中間層。如此之中間層能夠提升平滑化層及離形劑層間之黏著性,另外,亦能夠為捲繞生坯片形成前之生坯片製造用離形膜時能夠更加抑制靜電發生的層體。 In the above-described embodiment, the base material, the smoothing layer, and the release agent layer which are bonded to each other in the form of a release film for green sheet production are stacked and formed into a three-layer structure. It is not limited to this. An intermediate layer may also be disposed between the smoothing layer and the release agent layer. Further, an intermediate layer may be provided between the substrate and the smoothing layer. Such an intermediate layer can improve the adhesion between the smoothing layer and the release agent layer, and can also be a layer body capable of suppressing the occurrence of static electricity when the release film for the green sheet before the formation of the green sheet is wound.
再者,本發明之生坯片製造用離形膜之製造方法並非限定於前述之方法,亦可根據需求而追加任何製程。 Further, the method for producing the release film for producing a green sheet of the present invention is not limited to the above method, and any other process may be added as needed.
以下將說明實施例。 The embodiment will be described below.
接下來,雖然將說明關於本發明之生坯片製造用離形膜之具體的實施例,但並非將本發明僅限定於此些實施例。 Next, although specific examples of the release film for producing a green sheet of the present invention will be described, the present invention is not limited to the embodiments.
以下將說明生坯片製造用離形膜之製作。 The production of a release film for producing a green sheet will be described below.
以下將說明實施例1。 Embodiment 1 will be explained below.
首先,準備做為基材之雙軸延伸之聚對苯二甲酸乙二酯膜〔厚度:38μm,第一表面之算數平均粗糙度Ra2:42nm,第一表面之最大突起高度Rp2:619nm,第二表面之算數平均粗糙度Ra3:42nm,第二表面之最大突起高度Rp3:619nm〕。 First, a biaxially stretched polyethylene terephthalate film as a substrate (thickness: 38 μm, arithmetic mean roughness Ra 2 of the first surface: 42 nm, maximum protrusion height Rp 2 of the first surface: 619 nm) The arithmetic mean roughness Ra 3 of the second surface is 42 nm, and the maximum protrusion height Rp 3 of the second surface is 619 nm].
接下來,得到固體含量為20之質量百分比之平滑化層形成用組成物,其混合有100個質量份之做為活性能量射線硬 化型化合物之以胺基甲酸酯丙烯酸酯寡聚物為主成分之紫外線硬化型化合物〔荒川化學工業社製,商品名為「BEAMSET 575CB」,固體含量為100之質量百分比,質量平均分子量為470,含有光聚合起始劑〕、甲苯及甲基乙基酮。 Next, a composition for forming a smoothing layer having a solid content of 20% by mass, which is mixed with 100 parts by mass as an active energy ray hard An ultraviolet curable compound containing a urethane acrylate oligomer as a main component of the chemical compound (product name "BEAMSET 575CB", manufactured by Arakawa Chemical Industry Co., Ltd., a solid content of 100% by mass, and a mass average molecular weight of 470, containing a photopolymerization initiator], toluene and methyl ethyl ketone.
所得到之平滑化層形成用組成物係以四號繞線棒(Meyer bar #4)塗布於基材之第一表面,並以攝氏80度對其持續乾燥1分鐘以得到塗布層。 The resulting composition for forming a smoothing layer was applied to the first surface of the substrate with a No. 4 wire bar (Meyer bar #4), and dried continuously at 80 ° C for 1 minute to obtain a coating layer.
接下來,藉由使用紫外線照射裝置對塗布層照射紫外線(波長:365nm,照射量:200mJ/cm2)而形成平滑化層(厚度1.3μm)。 Next, the coating layer was irradiated with ultraviolet rays (wavelength: 365 nm, irradiation amount: 200 mJ/cm 2 ) by using an ultraviolet irradiation device to form a smoothing layer (thickness: 1.3 μm).
再接著,以甲苯稀釋100個質量份之混合物而得到稀釋液,此混合物〔信越化學工業株式會社製,商品名為「SILICONE KS-847H」,固體含量為30之質量百分比〕混合有做為離形劑之加成反應型矽酮系化合物及交聯劑。於此稀釋液中添加2個質量份之白金催化劑〔信越化學工業株式會社製,商品名為「PL-50T」〕並加以混合而得到固體含量為1.5之質量百分比之離形劑層形成用組成物。以離形劑層形成用組成物乾燥後之厚度為0.1μm之方式,於前述平滑化層之相反於基材之表面均勻塗布離形劑層形成用組成物。之後,於攝氏130度持續1分鐘以乾燥離形劑層形成用組成物而形成離形劑層,而製造出生坯片製造用離形膜。 Then, a mixture of 100 parts by mass was diluted with toluene to obtain a diluted solution, and the mixture (manufactured by Shin-Etsu Chemical Co., Ltd., trade name "SILICONE KS-847H", and a solid content of 30% by mass) was mixed. An addition reaction type anthrone compound and a crosslinking agent. To the diluted solution, two parts by mass of a platinum catalyst (manufactured by Shin-Etsu Chemical Co., Ltd., trade name "PL-50T") was added and mixed to obtain a composition for forming a release agent layer having a solid content of 1.5% by mass. Things. The composition for forming a release agent layer was uniformly coated on the surface of the smoothing layer opposite to the surface of the substrate so that the thickness of the composition for forming the release agent layer was 0.1 μm. Thereafter, the release agent layer was formed by drying the composition for forming a release agent layer at 130 ° C for 1 minute to produce a release film for producing a green sheet.
以下將說明實施例2。 Embodiment 2 will be described below.
除了將實施例1之雙軸延伸之聚對苯二甲酸乙二酯膜變更為雙軸延伸之聚對苯二甲酸乙二酯膜〔厚度:31μm,第一表面之算數平均粗糙度Ra2:29nm,第一表面之最大突起高度Rp2:257nm,第二表面之算數平均粗糙度Ra3:29nm,第二表面之最大突起高度Rp3:257nm〕以外,以其餘皆與實施例1相同之方式製造出生坯片製造用離形膜。 In addition to changing the biaxially stretched polyethylene terephthalate film of Example 1 to a biaxially stretched polyethylene terephthalate film [thickness: 31 μm, the arithmetic mean roughness Ra 2 of the first surface: 29 nm, the maximum protrusion height Rp 2 of the first surface: 257 nm, the arithmetic mean roughness Ra 3 of the second surface: 29 nm, and the maximum protrusion height Rp 3 of the second surface: 257 nm are the same as in the first embodiment. A method is used to manufacture a release film for the production of a green sheet.
以下將說明實施例3。 Embodiment 3 will be explained below.
除了將實施例1之雙軸延伸之聚對苯二甲酸乙二酯膜變更為雙軸延伸之聚對苯二甲酸乙二酯膜〔厚度:31μm,第一表面之算數平均粗糙度Ra2:15nm,第一表面之最大突起高度Rp2:98nm,第二表面之算數平均粗糙度Ra3:15nm,第二表面之最大突起高度Rp3:98nm〕以及將平滑化層之厚度變更為0.4μm以外,以其餘皆與實施例1相同之方式製造出生坯片製造用離形膜。 In addition to changing the biaxially stretched polyethylene terephthalate film of Example 1 to a biaxially stretched polyethylene terephthalate film [thickness: 31 μm, the arithmetic mean roughness Ra 2 of the first surface: 15 nm, the maximum protrusion height Rp 2 of the first surface is: 98 nm, the arithmetic mean roughness Ra 3 of the second surface is 15 nm, the maximum protrusion height of the second surface is Rp 3 : 98 nm, and the thickness of the smoothing layer is changed to 0.4 μm. A release film for producing a green sheet was produced in the same manner as in Example 1 except that the rest was carried out.
以下將說明實施例4。 Embodiment 4 will be explained below.
除了將實施例1之平滑化層之厚度變更為1.8μm以外,以其餘皆與實施例1相同之方式製造出生坯片製造用離形膜。 A release film for producing a green sheet was produced in the same manner as in Example 1 except that the thickness of the smoothing layer of Example 1 was changed to 1.8 μm.
以下將說明實施例5。 Embodiment 5 will be explained below.
除了將實施例1之平滑化層之厚度變更為2.3μm以外,以其餘皆與實施例1相同之方式製造出生坯片製造用離形膜。 A release film for producing a green sheet was produced in the same manner as in Example 1 except that the thickness of the smoothing layer of Example 1 was changed to 2.3 μm.
以下將說明比較例1。 Comparative Example 1 will be described below.
首先,準備做為基材之雙軸延伸之聚對苯二甲酸乙 二酯膜〔厚度:38μm,第一表面之算數平均粗糙度Ra2:42nm,第一表面之最大突起高度Rp2:619nm,第二表面之算數平均粗糙度Ra3:42nm,第二表面之最大突起高度Rp3:619nm〕。 First, a biaxially stretched polyethylene terephthalate film as a substrate (thickness: 38 μm, arithmetic mean roughness Ra 2 of the first surface: 42 nm, maximum protrusion height Rp 2 of the first surface: 619 nm) The arithmetic mean roughness Ra 3 of the second surface is 42 nm, and the maximum protrusion height Rp 3 of the second surface is 619 nm].
接著,以甲苯稀釋100個質量份之混合物而得到稀釋液,此混合物〔信越化學工業株式會社製,商品名為「SILICONE KS-847H」,固體含量為30之質量百分比〕混合有做為離形劑之加成反應型矽酮系化合物及交聯劑。於此稀釋液中添加2個質量份之白金催化劑〔信越化學工業株式會社製,商品名為「PL-50T」〕並加以混合而得到固體含量為1.5之質量百分比之離形劑層形成用組成物。以離形劑層形成用組成物乾燥後之厚度為0.1μm之方式,於前述基材之第一表面上均勻塗布離形劑層形成用組成物。之後,於攝氏130度持續1分鐘以乾燥離形劑層形成用組成物而形成離形劑層,而製造出生坯片製造用離形膜。 Then, a mixture of 100 parts by mass was diluted with toluene to obtain a diluted solution, and the mixture (manufactured by Shin-Etsu Chemical Co., Ltd., trade name "SILICONE KS-847H", and a solid content of 30% by mass) was mixed as a release. Addition reaction type anthrone compound and crosslinking agent. To the diluted solution, two parts by mass of a platinum catalyst (manufactured by Shin-Etsu Chemical Co., Ltd., trade name "PL-50T") was added and mixed to obtain a composition for forming a release agent layer having a solid content of 1.5% by mass. Things. The release agent layer-forming composition was uniformly coated on the first surface of the substrate so that the thickness of the release agent layer-forming composition after drying was 0.1 μm. Thereafter, the release agent layer was formed by drying the composition for forming a release agent layer at 130 ° C for 1 minute to produce a release film for producing a green sheet.
以下將說明比較例2。 Comparative Example 2 will be described below.
首先,準備做為基材之雙軸延伸之聚對苯二甲酸乙二酯膜〔厚度:38μm,第一表面之算數平均粗糙度Ra2:42nm,第一表面之最大突起高度Rp2:619nm,第二表面之算數平均粗糙度Ra3:42nm,第二表面之最大突起高度Rp3:619nm〕。 First, a biaxially stretched polyethylene terephthalate film as a substrate (thickness: 38 μm, arithmetic mean roughness Ra 2 of the first surface: 42 nm, maximum protrusion height Rp 2 of the first surface: 619 nm) The arithmetic mean roughness Ra 3 of the second surface is 42 nm, and the maximum protrusion height Rp 3 of the second surface is 619 nm].
接下來,得到固體含量為20之質量百分比之平滑化層形成用組成物,其混合有100個質量份之做為熱硬化性化合物之硬脂醯(stearyl)變性醇酸化合物及甲基(methyl)化三聚氰胺(melamine)化合物之混合物〔日立化成聚合物株式會社製, 商品名為「TESFINE 303」,固體含量為20之質量百分比,質量平均分子量為15000〕與3個質量份之對甲苯磺酸(p-toluenesulfonic acid)之酸催化劑、甲苯及甲基乙基酮。所得到之平滑化層形成用組成物係以四號繞線棒塗布於基材之第一表面以得到塗布層。 Next, a composition for forming a smoothing layer having a solid content of 20% by mass is obtained, which is mixed with 100 parts by mass of a stearyl denatured alkyd compound and a methyl group as a thermosetting compound. a mixture of melamine compounds [Hitachi Chemicals Co., Ltd., The product name is "TESFINE 303", a solid content of 20% by mass, a mass average molecular weight of 15000] and 3 parts by mass of an acid catalyst of p-toluenesulfonic acid, toluene and methyl ethyl ketone. The obtained composition for forming a smoothing layer was applied to the first surface of the substrate with a No. 4 wire bar to obtain a coating layer.
接下來,藉由以攝氏140度對塗布層持續乾燥並加熱1分鐘而形成平滑化層(厚度1.0μm)。 Next, a smoothing layer (thickness 1.0 μm) was formed by continuously drying and heating the coating layer at 140 ° C for 1 minute.
再接著,以甲苯稀釋100個質量份之混合物而得到稀釋液,此混合物〔信越化學工業株式會社製,商品名為「SILICONE KS-847H」,固體含量為30之質量百分比〕混合有做為離形劑之加成反應型矽酮系化合物及交聯劑。於此稀釋液中添加2個質量份之白金催化劑〔信越化學工業株式會社製,商品名為「PL-50T」〕並加以混合而得到固體含量為1.5之質量百分比之離形劑層形成用組成物。以離形劑層形成用組成物乾燥後之厚度為0.1μm之方式,於前述平滑化層之相反於基材之表面均勻塗布離形劑層形成用組成物。之後,於攝氏130度持續1分鐘以乾燥離形劑層形成用組成物而形成離形劑層,而製造出生坯片製造用離形膜。 Then, a mixture of 100 parts by mass was diluted with toluene to obtain a diluted solution, and the mixture (manufactured by Shin-Etsu Chemical Co., Ltd., trade name "SILICONE KS-847H", and a solid content of 30% by mass) was mixed. An addition reaction type anthrone compound and a crosslinking agent. To the diluted solution, two parts by mass of a platinum catalyst (manufactured by Shin-Etsu Chemical Co., Ltd., trade name "PL-50T") was added and mixed to obtain a composition for forming a release agent layer having a solid content of 1.5% by mass. Things. The composition for forming a release agent layer was uniformly coated on the surface of the smoothing layer opposite to the surface of the substrate so that the thickness of the composition for forming the release agent layer was 0.1 μm. Thereafter, the release agent layer was formed by drying the composition for forming a release agent layer at 130 ° C for 1 minute to produce a release film for producing a green sheet.
以下將說明比較例3。 Comparative Example 3 will be described below.
除了得到固體含量為20之質量百分比之平滑化層形成用組成物,其混合有40個質量份之做為活性能量射線硬化型化合物之以環氧變性矽酮化合物為主成分之陽離子聚合性紫 外線硬化型化合物〔荒川化學工業株式會社製「UVPOLY 200」,固體含量濃度為100之質量百分比,質量平均分子量為20000〕、3個質量份之做為催化劑之硼系陽離子硬化紫外線催化劑〔荒川化學工業株式會社製「UVCATA 211」,固體含量為20百分比〕、甲苯及甲基乙基酮以外,以其餘皆與實施例1相同之方式製造出生坯片製造用離形膜。 In addition to obtaining a composition for forming a smoothing layer having a solid content of 20% by mass, 40 parts by mass of a cationically polymerizable violet containing an epoxy-modified anthrone compound as an active energy ray-curable compound as a main component is mixed. Externally curable compound [UVPOLY 200, manufactured by Arakawa Chemical Co., Ltd., a solid content concentration of 100% by mass, a mass average molecular weight of 20,000], and 3 parts by mass of a boron-based cationic hardening ultraviolet catalyst as a catalyst [Arakawa Chemical Co., Ltd. A release film for producing a green sheet was produced in the same manner as in Example 1 except that "UVCATA 211" manufactured by Industrial Co., Ltd., having a solid content of 20% by weight, toluene and methyl ethyl ketone.
以下將說明比較例4。 Comparative Example 4 will be described below.
首先,準備做為基材之雙軸延伸之聚對苯二甲酸乙二酯膜〔厚度:38μm,第一表面之算數平均粗糙度Ra2:42nm,第一表面之最大突起高度Rp2:619nm,第二表面之算數平均粗糙度Ra3:42nm,第二表面之最大突起高度Rp3:619nm〕。 First, a biaxially stretched polyethylene terephthalate film as a substrate (thickness: 38 μm, arithmetic mean roughness Ra 2 of the first surface: 42 nm, maximum protrusion height Rp 2 of the first surface: 619 nm) The arithmetic mean roughness Ra 3 of the second surface is 42 nm, and the maximum protrusion height Rp 3 of the second surface is 619 nm].
接下來,得到固體含量為20之質量百分比之平滑化層形成用組成物,其混合有80個質量份之做為熱硬化性化合物之聚酯化合物〔東洋紡績(株)製,商品名為「VYLON 20SS」,固體含量為30之質量百分比,質量平均分子量為3000〕、20個質量份之做為交聯劑之甲基化三聚氰胺、3個質量份之對甲苯磺酸之酸催化劑、甲苯及甲基乙基酮。 Next, a composition for forming a smoothing layer having a solid content of 20% by mass, which is obtained by mixing 80 parts by mass of a polyester compound as a thermosetting compound (manufactured by Toyobo Co., Ltd., trade name "" VYLON 20SS", a solid content of 30% by mass, a mass average molecular weight of 3000], 20 parts by mass of methylated melamine as a crosslinking agent, 3 parts by mass of an acid catalyst of p-toluenesulfonic acid, toluene and Methyl ethyl ketone.
所得到之平滑化層形成用組成物係以四號繞線棒塗布於基材之第一表面以得到塗布層。 The obtained composition for forming a smoothing layer was applied to the first surface of the substrate with a No. 4 wire bar to obtain a coating layer.
接下來,藉由以攝氏130度對塗布層持續乾燥並加熱1分鐘而形成平滑化層(厚度1.2μm)。 Next, a smoothing layer (thickness 1.2 μm) was formed by continuously drying and heating the coating layer at 130 ° C for 1 minute.
再接著,以甲苯稀釋100個質量份之混合物而得到 稀釋液,此混合物〔信越化學工業株式會社製,商品名為「SILICONE KS-847H」,固體含量為30之質量百分比〕混合有做為離形劑之加成反應型矽酮系化合物及交聯劑。於此稀釋液中添加2個質量份之白金催化劑〔信越化學工業株式會社製,商品名為「PL-50T」〕並加以混合而得到固體含量為1.5之質量百分比之離形劑層形成用組成物。以離形劑層形成用組成物乾燥後之厚度為0.1μm之方式,於前述平滑化層之相反於基材之表面均勻塗布離形劑層形成用組成物。之後,於攝氏130度持續1分鐘以乾燥離形劑層形成用組成物而形成離形劑層,而製造出生坯片製造用離形膜。 Then, a mixture of 100 parts by mass of toluene is diluted to obtain Diluate, this mixture (manufactured by Shin-Etsu Chemical Co., Ltd., trade name "SILICONE KS-847H", solid content of 30% by mass] mixed with an addition-type anthrone-based compound as a release agent and cross-linking Agent. To the diluted solution, two parts by mass of a platinum catalyst (manufactured by Shin-Etsu Chemical Co., Ltd., trade name "PL-50T") was added and mixed to obtain a composition for forming a release agent layer having a solid content of 1.5% by mass. Things. The composition for forming a release agent layer was uniformly coated on the surface of the smoothing layer opposite to the surface of the substrate so that the thickness of the composition for forming the release agent layer was 0.1 μm. Thereafter, the release agent layer was formed by drying the composition for forming a release agent layer at 130 ° C for 1 minute to produce a release film for producing a green sheet.
以下將說明比較例5。 Comparative Example 5 will be described below.
除了得到固體含量為20之質量百分比之平滑化層形成用組成物,其以甲苯稀釋做為活性能量射線硬化型化合物之以丙烯酸酯寡聚物為主成分之紫外線硬化型化合物〔大成精密化學(fine chemical)株式會社製「8KX-012C」,固體含量濃度為40之質量百分比,質量平均分子量為25000〕以外,以其餘皆與實施例1相同之方式製造出生坯片製造用離形膜。 In addition to obtaining a composition for forming a smoothing layer having a solid content of 20% by mass, which is diluted with toluene as an active energy ray-curable compound, an ultraviolet curing compound containing acrylate oligomer as a main component [Dacheng Precision Chemicals ( A fine film for producing a green sheet was produced in the same manner as in Example 1 except that the solid content was 40% by mass and the mass average molecular weight was 25,000.
表1-1~1-3表示各實施利及各比較例之生坯片製造用離形膜之構成。 Tables 1-1 to 1-3 show the constitution of the release film for producing a green sheet of each comparative example.
而且於表中,做為活性能量射線硬化型化合物之以胺基甲酸酯丙烯酸酯寡聚物為主成分之紫外線硬化型化合物〔荒川化學工業社製,商品名為「BEAMSET 575CB」,固體含量為100之質量百分比,質量平均分子量為470〕表示為「A1」,做為熱硬化性化合物之硬脂醯變性醇酸化合物及甲基化三聚氰胺化合 物之混合物〔日立化成聚合物株式會社製,商品名為「TESFINE 303」,固體含量為20之質量百分比,質量平均分子量為15000〕表示為「A2」,做為活性能量射線硬化型化合物之以環氧變性矽酮化合物為主成分之陽離子聚合性紫外線硬化型化合物〔荒川化學工業株式會社製「UVPOLY 200」,固體含量濃度為100之質量百分比,質量平均分子量為20000〕表示為「A3」,做為熱硬化性化合物之聚酯化合物〔東洋紡績(株)製,商品名為「VYLON 20SS」,固體含量為30之質量百分比,質量平均分子量為3000〕表示為「A4」,做為活性能量射線硬化型化合物之以丙烯酸酯寡聚物為主成分之紫外線硬化型化合物〔大成精密化學(fine chemical)株式會社製「8KX-012C」,固體含量濃度為40之質量百分比,質量平均分子量為25000〕表示為「A5」。 Further, in the table, an ultraviolet curable compound containing a urethane acrylate oligomer as an active energy ray-curable compound (manufactured by Arakawa Chemical Industries Co., Ltd., trade name "BEAMSET 575CB", solid content It is a mass percentage of 100, and the mass average molecular weight is 470], which is expressed as "A1", and is a hard curable compound of a hard curable compound and a methylated melamine compound. A mixture of the products (trade name "TESFINE 303" manufactured by Hitachi Chemical Co., Ltd., a solid content of 20% by mass, and a mass average molecular weight of 15,000) is expressed as "A2" as an active energy ray-curable compound. A cationically polymerizable ultraviolet curable compound (UVPOLY 200, manufactured by Arakawa Chemical Industries Co., Ltd., a solid content concentration of 100% by mass, and a mass average molecular weight of 20,000) is represented by "A3". As a thermosetting compound, a polyester compound (manufactured by Toyobo Co., Ltd., trade name "VYLON 20SS", a solid content of 30% by mass, and a mass average molecular weight of 3000) is expressed as "A4" as an active energy. An ultraviolet curable compound containing an acrylate oligomer as a main component of the ray-curing compound [8KX-012C, manufactured by Daisei Kogyo Co., Ltd.), a solid content concentration of 40% by mass, and a mass average molecular weight of 25,000. ] is indicated as "A5".
再者,各實施例及各比較例之基材、平滑化層及離形劑層之膜厚,係各自以反射式膜厚計「F20」〔FILMETRICS株式會社製〕測定。 In addition, the film thickness of each of the base material, the smoothing layer, and the release agent layer of each of the examples and the comparative examples was measured by a reflection type film thickness meter "F20" (manufactured by FILMETRICS Co., Ltd.).
另外,係依照如下之方式各自測定基材之第一表面之算數平均粗糙度Ra2及最大突起高度Rp2、基材之第二表面之算數平均粗糙度Ra3及最大突起高度Rp3、平滑化層之第三表面之算數平均粗糙度Ra4及最大突起高度Rp4、離形劑層之外表面之算數平均粗糙度Ra1及最大突起高度Rp1。首先,於玻璃板上貼附雙面膠帶。接下來,將利用各實施例及各比較例所得到之生坯片製造用離形膜,以欲測定之算數平均粗糙度及最大突起高度 之位置表面之相反表面朝向玻璃板之方式,固定於雙面膠帶上。藉此,依照日本工業標準JIS B0601-1994使用三豐社製造之表面粗糙度測定機SV3000S4(觸針式)測定前述之算數平均粗糙度Ra2、Ra3、Ra4、Ra1及前述之最大突起高度Rp2、Rp3、Rp4、Rp1。 Further, the arithmetic mean roughness Ra 2 and the maximum protrusion height Rp 2 of the first surface of the substrate, the arithmetic mean roughness Ra 3 and the maximum protrusion height Rp 3 of the second surface of the substrate, and smoothing are each measured in the following manner. The arithmetic mean roughness Ra 4 and the maximum protrusion height Rp 4 of the third surface of the layer, the arithmetic mean roughness Ra 1 of the outer surface of the release agent layer, and the maximum protrusion height Rp 1 . First, attach double-sided tape to the glass. Next, the release film for producing a green sheet obtained by each of the examples and the comparative examples is fixed to the glass plate so that the opposite surface of the positional surface of the arithmetic mean roughness and the maximum protrusion height to be measured is oriented to the glass sheet. On double-sided tape. In this way, the arithmetic mean roughness Ra 2 , Ra 3 , Ra 4 , Ra 1 and the maximum amount described above were measured in accordance with Japanese Industrial Standard JIS B0601-1994 using a surface roughness measuring machine SV3000S4 (stylus type) manufactured by Mitutoyo Corporation. Protrusion heights Rp 2 , Rp 3 , Rp 4 , Rp 1 .
以下將說明各實施例及各比較例之評價。 The evaluation of each of the examples and the comparative examples will be described below.
以下進行關於如上述所得到之生坯片製造用離形膜的評價。 The evaluation of the release film for producing a green sheet obtained as described above was carried out.
以下將說明各實施例及各比較例之結塊性評價。 The cavitability evaluation of each of the examples and the comparative examples will be described below.
利用各實施例及各比較例所得到之生坯片製造用離形膜其寬幅為400mm,長度為5000m,且捲繞成滾筒狀,而得到離形膜滾筒。將此離形膜滾筒於攝氏40度且濕度百分之50以下的環境下存放30日。之後,以目視方式觀察離形膜滾筒的外觀,並以下列判斷基準評價其結塊性。 The release film for producing a green sheet obtained by each of the examples and the comparative examples had a width of 400 mm, a length of 5000 m, and was wound into a roll shape to obtain a release film roll. The release film cylinder was stored in an environment of 40 degrees Celsius and a humidity of 50% or less for 30 days. Thereafter, the appearance of the release film roll was visually observed, and the caking property was evaluated on the following criteria.
A:比較將生坯片製造用離形膜捲繞成滾筒狀而得到之存放前的離形膜滾筒外觀,存放後之離形膜滾筒外觀並未產生變化(無結塊現象)。 A: The appearance of the release film roll before storage was obtained by winding the release film of the green sheet into a roll shape, and the appearance of the release film roll after storage was not changed (no agglomeration phenomenon).
B:於生坯片製造用離形膜滾筒中有局部色調改變的區域(有結塊的傾向但仍可使用)。 B: A region having a local color tone change in the release film roll for green sheet production (the tendency to agglomerate but still usable).
C:於生坯片製造用離形膜滾筒中,大範圍區域之色調改變(有結塊現象)。 C: In the release film roll for producing a green sheet, the color tone of a wide area is changed (the phenomenon of agglomeration).
如同前述基準C,因生坯片製造用離形膜之表面及背面彼此黏著而發生結塊的現象,於離形膜滾筒之大範圍區域之 色調發生變化的場合,為無法正常捲出生坯片製造用離形膜的場合。 As in the above-mentioned reference C, the surface and the back surface of the release film for green sheet production are adhered to each other to cause agglomeration, which is in a large area of the release film cylinder. In the case where the color tone changes, it is not possible to normally roll the release film for the green sheet.
以下將說明各實施例及各比較例之凹部數量評價。 The evaluation of the number of recesses of each of the examples and the comparative examples will be described below.
以乾燥後之厚度為3μm之方式,將於甲苯/乙醇混合溶劑(質量比為6/4)中溶解聚乙烯醇縮丁醛(polyvinyl butyral,PVB)樹脂之塗覆液,塗布於利用各實施例及各比較例而得到之生坯片製造用離形膜之離形劑層上(外表面),而得到塗布層。於攝氏80度持續1分鐘以乾燥塗布層,而形成聚乙烯醇縮丁醛樹脂層。接下來,於其聚乙烯醇縮丁醛樹脂層之表面貼附聚酯膠帶。再接下來,從聚乙烯醇縮丁醛樹脂層剝離生坯片製造用離形膜,而將聚乙烯醇縮丁醛樹脂層轉移至聚酯膠帶。然後,使用光干涉式表面形狀觀察裝置「WYKO-1100」〔株式會社Veeco社製造〕,觀察聚乙烯醇縮丁醛樹脂層之與生坯片製造用離形膜之離形劑層接觸之表面。觀察條件為PSI模式之50倍率。聚乙烯醇縮丁醛樹脂層之表面於91.2×119.8μm之範圍內,於聚乙烯醇縮丁醛樹脂層之表面所發現之凹部的計數。其凹部為離形劑層之形狀所轉印之深度達150nm以上者。以下列判斷基準評價凹部數量。而且,使用評價為下述基準C之聚乙烯醇縮丁醛樹脂層(生坯片)製造出電容器的場合,具有易於發生因崩潰電壓低下而導致短路的傾向。 A coating liquid of polyvinyl butyral (PVB) resin was dissolved in a toluene/ethanol mixed solvent (mass ratio of 6/4) so as to have a thickness of 3 μm after drying. The coating layer was obtained on the release agent layer (outer surface) of the release film for producing a green sheet obtained in each of the comparative examples. The coating layer was dried at 80 ° C for 1 minute to form a polyvinyl butyral resin layer. Next, a polyester tape was attached to the surface of the polyvinyl butyral resin layer. Next, the release film for producing a green sheet was peeled off from the polyvinyl butyral resin layer, and the polyvinyl butyral resin layer was transferred to a polyester tape. Then, the surface of the polyvinyl butyral resin layer in contact with the release agent layer of the release film for producing a green sheet was observed using an optical interference type surface shape observation device "WYKO-1100" (manufactured by Veeco Co., Ltd.). . The observation condition is 50 times the PSI mode. The surface of the polyvinyl butyral resin layer was counted in the range of 91.2 × 119.8 μm, and the number of recesses found on the surface of the polyvinyl butyral resin layer was counted. The concave portion is a depth at which the shape of the release agent layer is transferred to a depth of 150 nm or more. The number of recesses was evaluated on the following criteria. In addition, when a capacitor is produced using a polyvinyl butyral resin layer (green sheet) which is evaluated as the following reference C, there is a tendency that a short circuit is likely to occur due to a breakdown voltage being lowered.
A:凹部數量為0個。 A: The number of recesses is zero.
B:凹部數量為1~5個。 B: The number of recesses is 1 to 5.
C:凹部數量為6個以上。 C: The number of recesses is six or more.
如此之結果如表2所示。 The results are shown in Table 2.
由表2可知,本發明之生坯片製造用離形膜,其外表面具有優良的平滑性。而且,使用本發明之生坯片製造用離形膜而形成之生坯片,幾乎未發現粗大的凹部。再者,藉由使用本發明之生坯片製造用離形膜而形成之生坯片製造陶瓷電容器,並未發現短路等故障之發生。相反地,比較例則無法得到滿意的結果。 As is apparent from Table 2, the release film for producing a green sheet of the present invention has excellent smoothness on the outer surface. Further, the green sheet formed by using the release film of the green sheet of the present invention produced almost no large concave portion. Further, by manufacturing a ceramic capacitor using the green sheet formed by using the green sheet of the present invention to produce a release film, no occurrence of a failure such as a short circuit was observed. On the contrary, the comparative example did not give satisfactory results.
1‧‧‧生坯片製造用離形膜 1‧‧‧Folding film for green sheet manufacturing
11‧‧‧基材 11‧‧‧Substrate
111‧‧‧基材之第一表面 111‧‧‧The first surface of the substrate
112‧‧‧基材之第二表面 112‧‧‧Second surface of the substrate
12‧‧‧平滑化層 12‧‧‧Smoothing layer
121‧‧‧表面(第三表面) 121‧‧‧ surface (third surface)
13‧‧‧離形劑層 13‧‧‧ release agent layer
131‧‧‧離形劑層之外表面 131‧‧‧Outer surface of the release agent layer
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