TWI546852B - Laser processing method - Google Patents
Laser processing method Download PDFInfo
- Publication number
- TWI546852B TWI546852B TW101100603A TW101100603A TWI546852B TW I546852 B TWI546852 B TW I546852B TW 101100603 A TW101100603 A TW 101100603A TW 101100603 A TW101100603 A TW 101100603A TW I546852 B TWI546852 B TW I546852B
- Authority
- TW
- Taiwan
- Prior art keywords
- cut
- line
- sic substrate
- modified region
- along
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/0006—Working by laser beam, e.g. welding, cutting or boring taking account of the properties of the material involved
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/083—Devices involving movement of the workpiece in at least one axial direction
- B23K26/0853—Devices involving movement of the workpiece in at least in two axial directions, e.g. in a plane
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/50—Working by transmitting the laser beam through or within the workpiece
- B23K26/53—Working by transmitting the laser beam through or within the workpiece for modifying or reforming the material inside the workpiece, e.g. for producing break initiation cracks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/18—Sheet panels
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/36—Electric or electronic devices
- B23K2101/40—Semiconductor devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Dicing (AREA)
- Processing Of Stones Or Stones Resemblance Materials (AREA)
- Laser Beam Processing (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011005184A JP5775312B2 (ja) | 2011-01-13 | 2011-01-13 | レーザ加工方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201246331A TW201246331A (en) | 2012-11-16 |
TWI546852B true TWI546852B (zh) | 2016-08-21 |
Family
ID=46507006
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW101100603A TWI546852B (zh) | 2011-01-13 | 2012-01-06 | Laser processing method |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP5775312B2 (ja) |
TW (1) | TWI546852B (ja) |
WO (1) | WO2012096093A1 (ja) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6358941B2 (ja) * | 2014-12-04 | 2018-07-18 | 株式会社ディスコ | ウエーハの生成方法 |
JP6399913B2 (ja) * | 2014-12-04 | 2018-10-03 | 株式会社ディスコ | ウエーハの生成方法 |
JP6563093B1 (ja) | 2018-08-10 | 2019-08-21 | ローム株式会社 | SiC半導体装置 |
US10562130B1 (en) | 2018-12-29 | 2020-02-18 | Cree, Inc. | Laser-assisted method for parting crystalline material |
US10576585B1 (en) | 2018-12-29 | 2020-03-03 | Cree, Inc. | Laser-assisted method for parting crystalline material |
US11024501B2 (en) | 2018-12-29 | 2021-06-01 | Cree, Inc. | Carrier-assisted method for parting crystalline material along laser damage region |
US10611052B1 (en) | 2019-05-17 | 2020-04-07 | Cree, Inc. | Silicon carbide wafers with relaxed positive bow and related methods |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20080070380A1 (en) * | 2004-06-11 | 2008-03-20 | Showda Denko K.K. | Production Method of Compound Semiconductor Device Wafer |
JP5151444B2 (ja) * | 2007-12-14 | 2013-02-27 | 株式会社デンソー | 半導体チップ及びその製造方法 |
JP5493275B2 (ja) * | 2008-02-27 | 2014-05-14 | 富士電機株式会社 | 半導体装置の製造方法 |
JP5377016B2 (ja) * | 2009-03-23 | 2013-12-25 | スタンレー電気株式会社 | 半導体装置の製造方法 |
JP5148575B2 (ja) * | 2009-09-15 | 2013-02-20 | 浜松ホトニクス株式会社 | レーザ加工方法、及び、レーザ加工装置 |
JP5625521B2 (ja) * | 2010-06-16 | 2014-11-19 | 豊田合成株式会社 | レーザ加工方法 |
-
2011
- 2011-01-13 JP JP2011005184A patent/JP5775312B2/ja active Active
- 2011-12-15 WO PCT/JP2011/079051 patent/WO2012096093A1/ja active Application Filing
-
2012
- 2012-01-06 TW TW101100603A patent/TWI546852B/zh active
Also Published As
Publication number | Publication date |
---|---|
JP2012146875A (ja) | 2012-08-02 |
TW201246331A (en) | 2012-11-16 |
WO2012096093A1 (ja) | 2012-07-19 |
JP5775312B2 (ja) | 2015-09-09 |
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