TWI544847B - Chemical plating product and method forming thereof - Google Patents

Chemical plating product and method forming thereof Download PDF

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Publication number
TWI544847B
TWI544847B TW102138011A TW102138011A TWI544847B TW I544847 B TWI544847 B TW I544847B TW 102138011 A TW102138011 A TW 102138011A TW 102138011 A TW102138011 A TW 102138011A TW I544847 B TWI544847 B TW I544847B
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Taiwan
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plating
electroless
copper
insulating member
nickel
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TW102138011A
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Chinese (zh)
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TW201517721A (en
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張俊毅
蘇偉豪
李錦旺
陳政龍
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鴻騰精密科技股份有限公司
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Priority to TW102138011A priority Critical patent/TWI544847B/en
Priority to US14/337,083 priority patent/US20150111047A1/en
Publication of TW201517721A publication Critical patent/TW201517721A/en
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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/38Electroplating: Baths therefor from solutions of copper
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1603Process or apparatus coating on selected surface areas
    • C23C18/1607Process or apparatus coating on selected surface areas by direct patterning
    • C23C18/1608Process or apparatus coating on selected surface areas by direct patterning from pretreatment step, i.e. selective pre-treatment
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1633Process of electroless plating
    • C23C18/1646Characteristics of the product obtained
    • C23C18/165Multilayered product
    • C23C18/1651Two or more layers only obtained by electroless plating
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1633Process of electroless plating
    • C23C18/1646Characteristics of the product obtained
    • C23C18/165Multilayered product
    • C23C18/1653Two or more layers with at least one layer obtained by electroless plating and one layer obtained by electroplating
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/22Roughening, e.g. by etching
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/28Sensitising or activating
    • C23C18/30Activating or accelerating or sensitising with palladium or other noble metal
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/32Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/38Coating with copper
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/42Coating with noble metals
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02Electroplating of selected surface areas
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31678Of metal

Description

化學鍍產品及其成型方法 Electroless plating product and molding method thereof

本發明是關於一種化學鍍產品及其成型方法,尤指一種電子產品上的化學鍍產品及其成型方法。 The invention relates to an electroless plating product and a molding method thereof, in particular to an electroless plating product on an electronic product and a molding method thereof.

通常電子產品需要通過無線部件做通話、上網等功能,其主要藉由安裝在電子產品上之天線做發射及接收無線資料進行傳輸,目前在電子產品上安裝天線有很多方式,如最初將衝壓成型後的立體金屬天線通過螺釘固持在絕緣本體上,其後演變成在絕緣本體直接通過鐳雕方式成型有三維天線。 Usually, electronic products need to make functions such as talking and surfing through wireless components. They mainly transmit and receive wireless data through antennas mounted on electronic products. Currently, there are many ways to install antennas on electronic products, such as initial stamping. The rear three-dimensional metal antenna is held on the insulating body by screws, and then evolved to form a three-dimensional antenna directly by the laser engraving in the insulating body.

鐳雕技術係利用雷射器發射的高強度聚焦雷射光束在焦點處使材料氧化因而對其進行加工的鐳射加工原理,該部分技術可請參閱2004年1月28日公告的中國發明專利申請第02127135.6號,其公開了塑膠表面鐳射雕刻電鍍的方法,具有透明之塑膠材料,並在該塑膠材料的背面塗覆以透光性防鍍油墨印及塑膠材料的正面施以金屬膜塗覆的前處理;最後對該經金屬膜塗覆前處理的塑膠材料上施以鐳射雕刻以定出所需的圖樣。惟,該製造天線模組的方法需要鐳射設備,增加了天線的製造成本。 The laser engraving technology is a laser processing principle that uses a high-intensity focused laser beam emitted from a laser to oxidize the material at the focal point and thus processes it. For this part of the technology, please refer to the Chinese invention patent application filed on January 28, 2004. No. 02127135.6, which discloses a method for laser engraving and plating of plastic surface, which has a transparent plastic material, and is coated on the back side of the plastic material with a light-transmitting anti-plating ink mark and a front surface of the plastic material coated with a metal film. Pre-treatment; finally, the metal film pre-treated with the metal film is subjected to laser engraving to determine the desired pattern. However, the method of manufacturing the antenna module requires a laser device, which increases the manufacturing cost of the antenna.

另外,該傳統雷雕鍍制程,需使用添加金屬化合物的特殊塑膠進行塑膠射出成型,再透過雷射進行雷雕將欲鍍的塑膠表面活化, 在表面產生金屬核,之後再進行塑膠化鍍將金屬鍍上雷射活化過的區域,藉此達到控制被鍍圖形或範圍的目的。此方法的缺點為:(1)需使用添加金屬化合物之塑膠,成本較一般塑膠高,(2)需以昂貴的雷射設備進行雷雕,設備成本及量產成本皆很高。 In addition, the conventional laser engraving process requires plastic injection molding using a special plastic added with a metal compound, and then the laser is used to activate the surface of the plastic to be plated by laser. A metal core is produced on the surface, and then plasticized plating is performed to plate the metal with the laser-activated region, thereby achieving the purpose of controlling the pattern or range to be plated. The disadvantages of this method are as follows: (1) plastics with added metal compounds are required, and the cost is higher than that of ordinary plastics. (2) Thunder carvings are required with expensive laser equipment, and the equipment cost and mass production cost are high.

因此,確有必要提供一種改進的成型方法及其產品以改善先前技術中的上述缺陷。 Therefore, it is indeed necessary to provide an improved molding method and its products to improve the above-mentioned drawbacks in the prior art.

本發明的目的係提供一種可控制被鍍圖案的化學鍍產品及其成型方法。 It is an object of the present invention to provide an electroless plated product capable of controlling a pattern to be plated and a method of forming the same.

本發明電鍍產品可通過以下技術方案實現:一種化學鍍產品,通過化學方法成型,所述化學鍍產品包括絕緣件及位於絕緣件上的金屬鍍層,金屬鍍層包括通過塗布觸媒形成有預鍍範圍及覆蓋在塗布觸媒上的化學銅。 The electroplating product of the present invention can be realized by the following technical solutions: an electroless plating product, which is formed by a chemical method, the electroless plating product comprising an insulating member and a metal plating layer on the insulating member, and the metal plating layer comprises a pre-plating range formed by coating the catalyst. And chemical copper covering the coating catalyst.

本發明也可通過如下方式實現:一種成型如權利要求1所述化學鍍產品的成型方法,其中主要在於具有如下步驟:a.提供絕緣件;b.將上述絕緣件放入化學溶液作化學脫膜,之後對絕緣件作化學粗化;c.在絕緣件上作塗布觸媒確認預鍍範圍;d.在塗布觸媒上作化學鍍銅。 The present invention can also be achieved by a method of molding the electroless plated product according to claim 1, wherein the method comprises the steps of: a. providing an insulating member; b. placing the insulating member in a chemical solution for chemical removal. Film, then chemically roughening the insulating member; c. confirming the pre-plating range on the insulating member as a coating catalyst; d. performing electroless copper plating on the coating catalyst.

相較於現有技術,本發明藉由在絕緣件上作塗布觸媒確認預鍍範圍,相對現有的鐳雕技術,可減少鐳雕設備,降低製造成本,且 塗佈觸媒也可便於準確確定控制預鍍產品的結構。 Compared with the prior art, the invention confirms the pre-plating range by using a coating catalyst on the insulating member, and can reduce the laser engraving equipment and reduce the manufacturing cost compared with the existing laser engraving technology, and The coating catalyst can also facilitate accurate determination of the structure of the control pre-plated product.

1‧‧‧絕緣件 1‧‧‧Insulation

2‧‧‧預鍍範圍 2‧‧‧Pre-plating range

3‧‧‧化學鍍銅 3‧‧‧Electrochemical copper plating

第一圖係本發明化學鍍產品的絕緣件之平面示意圖;第二圖係本發明化學鍍產品的絕緣件作塗佈後之平面示意圖;第三圖是本發明化學鍍產品的半成品之平面示意圖。 The first drawing is a schematic plan view of the insulating member of the electroless plating product of the present invention; the second drawing is a schematic plan view of the insulating member of the electroless plating product of the present invention after coating; the third drawing is a plan view of the semi-finished product of the electroless plating product of the present invention. .

請參閱第一圖至第三圖所示,本發明的化學鍍成型方法,主要在於具有如下步驟: Referring to the first to third figures, the electroless plating method of the present invention mainly has the following steps:

a.提供絕緣件1(參第一圖所示); a. Providing insulation 1 (refer to the first figure);

b.將上述絕緣件放入化學溶液作化學脫膜,之後對絕緣件作化學粗化; b. The above insulating member is placed in a chemical solution for chemical stripping, and then the insulating member is chemically roughened;

c.在絕緣件上作塗布觸媒確認預鍍範圍2(參第二圖所示),在本實施方式中,預鍍範圍以“十”字架為例; c. The coating catalyst is used as the coating catalyst on the insulating member to confirm the pre-plating range 2 (refer to the second figure). In the present embodiment, the pre-plating range is taken as an example of the "ten" frame;

d.在塗布觸媒處作化學鍍銅3,形成半成品(參第三圖所示)。 d. Electroless copper plating 3 at the coating catalyst to form a semi-finished product (see the third figure).

e.在c步驟的塗布觸媒成型平面結構的奈米有機鈀金屬導電層。 e. A nano-organo-palladium metal conductive layer of a planar structure formed by coating a catalyst in the step c.

f.在c步驟的塗布觸媒成型立體結構的奈米有機鈀金屬導電層。 f. The coating catalyst in step c forms a nanostructured palladium metal conductive layer of a stereostructure.

g.在d步驟的化學鍍銅上可以依次做厚化鍍銅、化學鍍鎳及化學鍍金等步驟,形成成品。 g. On the electroless copper plating in step d, steps such as thick copper plating, electroless nickel plating, and electroless gold plating may be sequentially performed to form a finished product.

h.在d步驟的化學鍍銅上可以依次做電鍍銅、電鍍鎳及電鍍金等步驟,形成成品。 h. On the electroless copper plating in step d, steps such as electroplating copper, electroplating nickel, and electroplating gold may be sequentially performed to form a finished product.

i.在d步驟的化學鍍銅上可以依次做電鍍銅、電鍍鎳等步驟。 i. Steps of electroplating copper, electroplating nickel, etc. may be sequentially performed on the electroless copper plating in step d.

j.在i步驟上進一步作電鍍黑鎳等金屬。 j. Further electroplating a metal such as black nickel on the i step.

k.在i步驟上進一步作電鍍金等金屬。 k. Further electroplating gold or the like on the i step.

其中,化學粗化係使絕緣件的表面上形成微觀粗糙之結構,以提高後續金屬鍍層與絕緣件之間結合力。而在g至k步驟時,因在絕緣件未做塗布觸媒的部分不會鍍上金屬元件,所以在塗布觸媒過程中可有效控制後面的金屬鍍的被鍍範圍,相對現有技術無需通過鐳雕設備確定預鍍範圍,有效降低製造成本。 Among them, the chemical roughening system forms a microscopic rough structure on the surface of the insulating member to improve the bonding force between the subsequent metal plating layer and the insulating member. In the step g to k, since the metal element is not plated on the portion of the insulating member where the catalyst is not coated, the plating range of the subsequent metal plating can be effectively controlled during the coating of the catalyst, and the prior art does not need to pass. The laser engraving equipment determines the pre-plating range and effectively reduces the manufacturing cost.

請再參第一圖至第三圖所示,本發明藉由化學方法成型的一種化學鍍產品,包括絕緣件1及位於絕緣件上的金屬鍍層,金屬鍍層包括通過塗布觸媒形成有預鍍範圍2及覆蓋在塗布觸媒上的化學銅3。並在所述絕緣件至少在預鍍範圍區域有作化學粗化。 Referring to FIG. 1 to FIG. 3 again, an electroless plating product formed by the chemical method of the present invention comprises an insulating member 1 and a metal plating layer on the insulating member, and the metal plating layer comprises a pre-plating formed by coating the catalyst. Range 2 and chemical copper 3 overlying the coating catalyst. And the insulating member is chemically roughened at least in the pre-plating range region.

本發明可以在所述塗布觸媒為平面噴塗方式成型的奈米有機鈀或者在所述塗布觸媒為立體噴塗方式成型的奈米有機鈀。 In the present invention, the nano-organo palladium formed by the planar coating method in the coating catalyst or the nano-organo-palladium formed by the three-dimensional spraying method in the coating catalyst may be used.

在本發明的第一種實施方式中,可以在所述化學銅的上層依次覆蓋有化學鎳及化學金。 In the first embodiment of the present invention, chemical nickel and chemical gold may be sequentially coated on the upper layer of the chemical copper.

在本發明的第二種實施方式中,可以在所述化學銅的上層依次覆蓋有電鍍銅、電鍍鎳及電鍍金,因電鍍鎳有利於防止氧化。 In the second embodiment of the present invention, the upper layer of the chemical copper may be sequentially covered with electroplated copper, electroplated nickel, and electroplated gold, and nickel plating is advantageous for preventing oxidation.

在本發明的第三種實施方式中,可以在所述化學銅的上層依次覆蓋有電鍍銅、電鍍鎳及電鍍黑鎳,因電鍍黑鎳可增加產品的射頻。 In the third embodiment of the present invention, the upper layer of the chemical copper may be sequentially covered with electroplated copper, electroplated nickel, and electroplated black nickel, and the radio frequency of the product may be increased by electroplating black nickel.

在本發明的第四種實施方式中,可以在所述化學銅的上層依次覆蓋有電鍍銅、電鍍鎳及電鍍金,增加產品的焊接功能。 In the fourth embodiment of the present invention, the upper layer of the chemical copper may be sequentially covered with electroplated copper, electroplated nickel, and electroplated gold to increase the soldering function of the product.

綜上前述,本創作確已符合發明專利之要件,爰依法提出專利申請。惟,以上所述者僅係本發明之較佳實施方式,本發明之範圍並不以上述實施方式為限,舉凡熟習本案技藝之人士援依本發明之精神所作之等效修飾或變化,皆應涵蓋於以下申請專利範圍內。 In summary, the creation has indeed met the requirements of the invention patent, and the patent application was filed according to law. However, the above-mentioned embodiments are merely preferred embodiments of the present invention, and the scope of the present invention is not limited to the above-described embodiments, and those skilled in the art will be able to make equivalent modifications or variations in accordance with the spirit of the present invention. It should be covered by the following patent application.

1‧‧‧絕緣件 1‧‧‧Insulation

3‧‧‧化學鍍銅 3‧‧‧Electrochemical copper plating

Claims (14)

一種化學鍍產品,通過化學方法成型,其中,所述化學鍍產品包括化學脫模過的絕緣件及位於絕緣件上的金屬鍍層,所述絕緣件作化學粗化以在絕緣件的表面形成微觀粗糙之結構,前述金屬鍍層包括通過一塗布觸媒於所述微觀粗糙之結構上而形成之預鍍範圍及覆蓋在所述觸媒上的化學銅。 An electroless plating product formed by a chemical method, wherein the electroless plating product comprises a chemically demolded insulating member and a metal plating layer on the insulating member, the insulating member being chemically roughened to form a microscopic surface on the insulating member In the rough structure, the metal plating layer includes a pre-plating range formed by coating a catalyst on the micro-rough structure and chemical copper covering the catalyst. 如申請專利範圍第1項所述的化學鍍產品,其中所述化學銅的上層依次覆蓋有化學鎳及化學金。 The electroless plated product according to claim 1, wherein the upper layer of the chemical copper is sequentially covered with chemical nickel and chemical gold. 如申請專利範圍第1項所述的化學鍍產品,其中所述化學銅的上層依次覆蓋有電鍍銅、電鍍鎳及電鍍金。 The electroless plating product according to claim 1, wherein the upper layer of the chemical copper is sequentially covered with electroplated copper, electroplated nickel, and electroplated gold. 如申請專利範圍第1項所述的化學鍍產品,其中所述化學銅的上層依次覆蓋有電鍍銅、電鍍鎳。 The electroless plated product according to claim 1, wherein the upper layer of the chemical copper is sequentially covered with electroplated copper or electroplated nickel. 如申請專利範圍第4項所述的化學鍍產品,其中所述電鍍鎳上進一步覆蓋有電鍍黑鎳。 The electroless plated product of claim 4, wherein the electroplated nickel is further covered with electroplated black nickel. 如申請專利範圍第1項至第5項中任一項所述的化學鍍產品,其中所述塗布觸媒為平面噴塗方式成型的奈米有機鈀。 The electroless plating product according to any one of claims 1 to 5, wherein the coating catalyst is a nano-palladium formed by a planar spray method. 如申請專利範圍第1項至第5項中任一項所述的化學鍍產品,其中所述塗布觸媒為立體噴塗方式成型的奈米有機鈀。 The electroless plated product according to any one of claims 1 to 5, wherein the coating catalyst is a stereoscopic spray-formed nanoorgano palladium. 一種化學鍍產品的成型方法,其中主要在於具有如下步驟:a.提供絕緣件;b.將上述絕緣件放入化學溶液作化學脫膜,之後對絕緣件作化學粗化以在絕緣件的表面形成微觀粗糙之結構;c.在所述微觀粗糙之結構上作塗布觸媒以形成預鍍範圍; d.在所述觸媒上作化學鍍銅。 A method for forming an electroless plating product, which mainly comprises the steps of: a. providing an insulating member; b. placing the insulating member in a chemical solution for chemical stripping, and then chemically roughening the insulating member to surface on the insulating member Forming a microscopically rough structure; c. coating a catalyst on the microscopically rough structure to form a pre-plating range; d. Electroless copper plating on the catalyst. 如申請專利範圍第8項所述的成型方法,其中在c步驟的塗布觸媒係成型平面的奈米有機鈀金屬導電層。 The molding method according to claim 8, wherein the coating catalyst in the step c forms a planar nano-palladium metal conductive layer. 如申請專利範圍第8項所述的成型方法,其中在c步驟的塗布觸媒係成型立體結構的奈米有機鈀金屬導電層。 The molding method according to claim 8, wherein the coating catalyst in the step c forms a nano organic palladium metal conductive layer of a three-dimensional structure. 如申請專利範圍第9項或第10項所述的成型方法,其中在d步驟的化學鍍銅上可以依次做厚化鍍銅、化學鍍鎳及化學鍍金等步驟。 The molding method according to claim 9 or claim 10, wherein the step of electroless copper plating in the step d is performed by steps of thickening copper plating, electroless nickel plating, and electroless gold plating. 如申請專利範圍第9項或第10項所述的成型方法,其中在d步驟的化學鍍銅上可以依次做電鍍銅、電鍍鎳等步驟。 The molding method according to claim 9 or claim 10, wherein the electroless copper plating in the step d is performed by sequentially performing steps such as electroplating copper and electroplating nickel. 如申請專利範圍第12項所述的成型方法,其中在電鍍鎳上進一步作電鍍黑鎳等金屬。 The molding method according to claim 12, wherein the electroplated nickel is further plated with a metal such as black nickel. 如申請專利範圍第12項所述的成型方法,其中在電鍍鎳上進一步作電鍍金等金屬。 The molding method according to claim 12, wherein the electroplated nickel is further plated with a metal such as gold.
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