TWI537435B - Gravure roll and method of manufaturing the same - Google Patents

Gravure roll and method of manufaturing the same Download PDF

Info

Publication number
TWI537435B
TWI537435B TW101102771A TW101102771A TWI537435B TW I537435 B TWI537435 B TW I537435B TW 101102771 A TW101102771 A TW 101102771A TW 101102771 A TW101102771 A TW 101102771A TW I537435 B TWI537435 B TW I537435B
Authority
TW
Taiwan
Prior art keywords
gravure roll
nickel
copper plating
phosphorus alloy
layer
Prior art date
Application number
TW101102771A
Other languages
Chinese (zh)
Other versions
TW201239140A (en
Inventor
李東烈
蔡京勳
柳永先
李勇真
盧泳辰
李善榮
Original Assignee
Lg伊諾特股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lg伊諾特股份有限公司 filed Critical Lg伊諾特股份有限公司
Publication of TW201239140A publication Critical patent/TW201239140A/en
Application granted granted Critical
Publication of TWI537435B publication Critical patent/TWI537435B/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41FPRINTING MACHINES OR PRESSES
    • B41F13/00Common details of rotary presses or machines
    • B41F13/08Cylinders
    • B41F13/10Forme cylinders
    • B41F13/11Gravure cylinders
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41NPRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00Printing plates or foils; Materials therefor
    • B41N1/16Curved printing plates, especially cylinders
    • B41N1/20Curved printing plates, especially cylinders made of metal or similar inorganic compounds, e.g. plasma coated ceramics, carbides
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/12Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
    • H05K3/1275Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by other printing techniques, e.g. letterpress printing, intaglio printing, lithographic printing, offset printing
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00Forme preparation
    • B41C1/02Engraving; Heads therefor
    • B41C1/025Engraving; Heads therefor characterised by means for the liquid etching of substrates for the manufacturing of relief or intaglio printing forms, already provided with resist pattern
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00Forme preparation
    • B41C1/02Engraving; Heads therefor
    • B41C1/04Engraving; Heads therefor using heads controlled by an electric information signal
    • B41C1/045Mechanical engraving heads

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Inking, Control Or Cleaning Of Printing Machines (AREA)

Description

凹版輥及其製造方法 Gravure roll and manufacturing method thereof

本發明係主張關於2011年01月27日申請之韓國專利案號10-2011-0008483之優先權。藉以引用的方式併入本文用作參考。 The present invention claims priority to Korean Patent Application No. 10-2011-0008483, filed on Jan. 27, 2011. This is incorporated herein by reference.

本發明係有關一種凹版輥及其製造方法。 The present invention relates to a gravure roll and a method of manufacturing the same.

直接圖案印刷裝置(direct pattern printing apparatuses)所使用之技術係被發展以製造電子裝置如顯示器與行動裝置等。在一印刷裝置中,係以一刮刀(doctor blade)將一印刷漿料(paste)填入於一凹版輥之一圖案溝槽(pattern groove)內,然後該印刷漿料係被轉印至一基板之上,以將一預設圖案印刷於該基板之上。 The technology used in direct pattern printing apparatuses has been developed to manufacture electronic devices such as displays and mobile devices. In a printing apparatus, a printing paste is filled in a pattern groove of a gravure roll by a doctor blade, and then the printing paste is transferred to a pattern. Above the substrate, a predetermined pattern is printed on the substrate.

用作為一表面強化塗覆層(surface enhanced coating layer)之一鍍鉻層(chrome 1ayer)係形成在用於印刷裝置中之凹版輥之上。然而,該鍍鉻層係具有毒性,會造成環境污染。 A chrome layer formed as a surface enhanced coating layer is formed on a gravure roll used in a printing apparatus. However, the chrome plating layer is toxic and causes environmental pollution.

本發明實施例係提供一種凹版輥及其製造方法,該凹版輥係具有足夠的強度,足以取代一鍍鉻層,而不會污染環境。 Embodiments of the present invention provide a gravure roll having a sufficient strength to replace a chrome plating layer without damaging the environment, and a method of manufacturing the same.

根據本發明實施例之一種凹版輥係包括:一基輥(base roll);一銅電鍍層(copper plating layer),提供於該基輥之上,且其一表面上係形成有複數個溝槽(grooves);以及一鎳磷合金層 (nickel-phosphorus(Ni-P)alloy layer),於該銅電鍍層之上。 A gravure roll system according to an embodiment of the present invention includes: a base roll; a copper plating layer provided on the base roll and having a plurality of grooves formed on one surface thereof (grooves); and a nickel-phosphorus alloy layer (nickel-phosphorus (Ni-P) alloy layer) above the copper plating layer.

根據本發明實施例之凹版輥中,因鎳磷合金層係直接取代一鍍鉻層而形成,故該凹版輥不具毒性,進而可避免對環境造成污染。又,其並不需要一額外的金屬層,故可簡化製造流程,並降低製造成本。 In the gravure roll according to the embodiment of the present invention, since the nickel-phosphorus alloy layer is directly formed by replacing a chrome plating layer, the gravure roll is not toxic, thereby avoiding environmental pollution. Moreover, it does not require an additional metal layer, which simplifies the manufacturing process and reduces manufacturing costs.

根據本發明實施例之凹版輥製造方法係可提供具有上述結構之凹版輥。 The gravure roll manufacturing method according to an embodiment of the present invention can provide a gravure roll having the above structure.

在實施例的描述中,應予理解,當提及一層(膜)、一區域、一圖案、或一結構是在另一層(膜)、另一區域、另一電極墊、或另一圖案「之上/下」或「之上方/下方」時,用語「之上/下」、「之上方/下方」係包括「直接地」或「間接地」位於其它層(膜)、區域、電極墊或圖案之上,或一或多中間層也可存在其中。如此之層位置已藉圖式說明。 In the description of the embodiments, it is to be understood that when a layer (film), a region, a pattern, or a structure is referred to as another layer (film), another region, another electrode pad, or another pattern" Above/below or "above/below", the terms "above/below" and "above/below" include "directly" or "indirectly" in other layers (film), regions, electrode pads. Above the pattern, or one or more intermediate layers may also be present. Such a layer location has been illustrated by a diagram.

圖式中之每一層之厚度與大小可能有被放大、省略或僅示意說明,以確保圖式之清晰或方便。此外,元件之大小並不完全反應其實體之大小。 The thickness and size of each layer in the drawings may be exaggerated, omitted, or merely illustrated to ensure that the drawings are clear or convenient. In addition, the size of the component does not fully reflect the size of its entity.

在下文中,將配合所附圖式來詳細說明本發明之實施例。 Hereinafter, embodiments of the present invention will be described in detail in conjunction with the drawings.

首先,將配合圖1,詳細說明一種印刷裝置。圖1係繪示有該印刷裝置之一立體示意圖。 First, a printing apparatus will be described in detail with reference to FIG. Figure 1 is a perspective view showing one of the printing devices.

參閱圖1,該印刷裝置係包括:一凹版輥100,其係具有一溝槽500,以容納一印刷漿料110;以及一刮刀200,相鄰於凹版輥100,以將印刷漿料110填入於溝槽500中。此外,該印刷裝置可包括:一覆蓋輥300(blanket roll),其係承接凹版輥100之溝槽500中之印刷漿料110,並將印刷漿料110轉印至(transfers onto)一基板400之上。 Referring to FIG. 1, the printing apparatus includes: a gravure roll 100 having a groove 500 for accommodating a printing paste 110; and a doctor blade 200 adjacent to the gravure roll 100 for filling the printing paste 110 Into the trench 500. In addition, the printing apparatus may include: a blanket roll 300 that receives the printing paste 110 in the groove 500 of the gravure roll 100 and transfers the printing paste 110 to a substrate 400. Above.

在上述印刷裝置中,刮刀200係將印刷漿料110填入於溝槽500中,然後印刷漿料110係被移至覆蓋輥300,接著印刷漿料110係被轉印至基板400之上,以形成一圖案410。 In the above printing apparatus, the doctor blade 200 fills the printing paste 110 in the groove 500, and then the printing paste 110 is transferred to the cover roll 300, and then the printing paste 110 is transferred onto the substrate 400. To form a pattern 410.

在下文中,將配合圖2,詳細說明印刷裝置之凹版輥100。 Hereinafter, the gravure roll 100 of the printing apparatus will be described in detail with reference to FIG.

圖2係根據本發明第一實施例,繪示有一凹版輥之一剖面圖。 Figure 2 is a cross-sectional view of a gravure roll in accordance with a first embodiment of the present invention.

參閱圖2,本發明第一實施例之凹版輥101係包括:一基輥10;一銅電鍍層20,提供於基輥10之上,且係具有溝槽20a;以及一鎳磷合金層30,形成於銅電鍍層20之上。 Referring to FIG. 2, the gravure roll 101 of the first embodiment of the present invention comprises: a base roll 10; a copper plating layer 20 provided on the base roll 10 and having grooves 20a; and a nickel-phosphorus alloy layer 30. Formed on the copper plating layer 20.

基輥10可具有一圓柱形狀,以使基輥10可以轉動,但本發明並不限制於此。舉例而言,基輥10可具有一平板形狀。在此情況下,基輥10無法旋轉。基輥10可使用各種針對重複性印刷製程具有耐久度之材料來形成。舉例而言,基輥10可由使用一金屬來形成。 The base roller 10 may have a cylindrical shape to allow the base roller 10 to rotate, but the present invention is not limited thereto. For example, the base roller 10 may have a flat plate shape. In this case, the base roller 10 cannot be rotated. The base roll 10 can be formed using a variety of materials that are durable for repetitive printing processes. For example, the base roll 10 can be formed using a metal.

銅電鍍層20可藉由將銅電鍍於基輥10之上,來形成於基輥 10之上。銅電鍍層20可強化凹版輥101之硬度,以使凹版輥101可達到凹版印刷製程所需要之硬度。此外,可經由形成一凹版圖案於銅電鍍層20之上,來形成一印刷圖案。 The copper plating layer 20 can be formed on the base roller by electroplating copper on the base roller 10. Above 10. The copper plating layer 20 can reinforce the hardness of the gravure roll 101 so that the gravure roll 101 can reach the hardness required for the gravure printing process. Further, a printed pattern can be formed by forming a gravure pattern over the copper plating layer 20.

複數個溝槽20a係形成於銅電鍍層20之一表面上。如上所述,印刷漿料110(見圖1)係被填入於溝槽20a中,以便稍後進行印刷製程。銅電鍍層20之厚度可落在約50 μm至約200 μm之範圍內。 A plurality of trenches 20a are formed on one surface of the copper plating layer 20. As described above, the printing paste 110 (see Fig. 1) is filled in the groove 20a for later printing. The thickness of the copper plating layer 20 may fall within the range of from about 50 μm to about 200 μm.

然後,鎳磷合金層30係形成於銅電鍍層20之上。 Then, a nickel-phosphorus alloy layer 30 is formed on the copper plating layer 20.

鎳磷合金層30係包括鎳(Ni)及磷(P)。鎳磷合金層30係具有硬度為約700Hv或以上,並具有絕佳的抗蝕(corrosion-resistant)與表面光澤(surface-glossing)特性。 The nickel-phosphorus alloy layer 30 includes nickel (Ni) and phosphorus (P). The nickel-phosphorus alloy layer 30 has a hardness of about 700 Hv or more and has excellent corrosion-resistant and surface-glossing characteristics.

詳細來說,鎳磷合金層30中,磷之含量為約10 wt%至約20 wt%。若磷之含量低於10 wt%,則鎳磷合金層30可能無法具有與習知鍍鉻層相近之強度,因而使鎳磷合金層30無法被用作為一表面強化塗覆層。相反的,若鎳磷合金層30中,磷之含量大於20 wt%的話,由於所需時間之因素,電鍍效果會變差。 In detail, in the nickel-phosphorus alloy layer 30, the phosphorus content is from about 10% by weight to about 20% by weight. If the phosphorus content is less than 10% by weight, the nickel-phosphorus alloy layer 30 may not have a strength close to that of the conventional chrome plating layer, so that the nickel-phosphorus alloy layer 30 cannot be used as a surface-strengthening coating layer. On the contrary, if the content of phosphorus in the nickel-phosphorus alloy layer 30 is more than 20% by weight, the plating effect may be deteriorated due to the time required.

當磷之含量約等於15 wt%或以上時,鎳磷合金可表現出非晶態(amorphous property),且係在高硬度下具有穩定的化學特性。因非晶態之故,其他藥物無法穿透進入鎳磷合金之中。就這一點而言,較佳地,磷之含量應落在15 wt%至20 wt%之範圍內。 然而,本發明實施例並不限制於此。舉例而言,鎳磷合金層30除了鎳、磷以外,尚可包括鎢(tungsten,W)。在此情況下,磷之含量係落在10 wt%至20 wt%之範圍內,而鎢之含量係落在1 wt%至20 wt%之範圍內。若鎳磷合金層30進一步包括鎢,則其抗蝕性與硬度均可進一步地被提升。然而,若鎢之含量超過20 wt%,由於所需時間之因素,電鍍效果會變差。 When the phosphorus content is about 15 wt% or more, the nickel-phosphorus alloy can exhibit an amorphous property and has stable chemical characteristics at a high hardness. Due to the amorphous state, other drugs cannot penetrate into the nickel-phosphorus alloy. In this regard, preferably, the phosphorus content should fall within the range of 15 wt% to 20 wt%. However, embodiments of the invention are not limited thereto. For example, the nickel-phosphorus alloy layer 30 may include tungsten (tungsten, W) in addition to nickel and phosphorus. In this case, the content of phosphorus falls within the range of 10 wt% to 20 wt%, and the content of tungsten falls within the range of 1 wt% to 20 wt%. If the nickel-phosphorus alloy layer 30 further includes tungsten, its corrosion resistance and hardness can be further improved. However, if the content of tungsten exceeds 20% by weight, the plating effect may be deteriorated due to the time required.

鎳磷合金層30係對印刷製程有正面的影響。詳細來說,在印刷製程中,當印刷漿料110被填入於凹版輥之溝槽20a中時,刮刀200(見圖1)可移動並與凹版輥101之表面相接觸。當刮刀200與凹版輥101之接觸頻度提高時,凹版輥101之表面可能會損壞,進而使凹版輥101之使用壽命變短。在這一點上,具有高強度之鎳磷合金層30係被提供,以強化凹版輥101之表面。此外,鎳磷合金層30可代替會造成環境污染之鍍鉻層,以避免污染環境。 The nickel-phosphorus alloy layer 30 has a positive influence on the printing process. In detail, in the printing process, when the printing paste 110 is filled in the groove 20a of the gravure roll, the blade 200 (see FIG. 1) is movable and comes into contact with the surface of the gravure roll 101. When the contact frequency of the doctor blade 200 with the gravure roll 101 is increased, the surface of the gravure roll 101 may be damaged, thereby shortening the service life of the gravure roll 101. At this point, a nickel-phosphorus alloy layer 30 having a high strength is provided to reinforce the surface of the gravure roll 101. In addition, the nickel-phosphorus alloy layer 30 can replace the chrome plating layer which causes environmental pollution to avoid polluting the environment.

此外,因為鎳磷合金層30係與銅電鍍層20有直接的接觸,而無須額外形成一金屬層或一碳酸化金屬梯度層(carbonated metal gradient layer)於鎳磷合金層30與銅電鍍層20之間,故可縮小凹版輥101之厚度。又,可進一步地減少凹版輥101之製造步驟及製造成本。 In addition, since the nickel-phosphorus alloy layer 30 is in direct contact with the copper plating layer 20, it is not necessary to additionally form a metal layer or a carbonated metal gradient layer on the nickel-phosphorus alloy layer 30 and the copper plating layer 20. Therefore, the thickness of the gravure roll 101 can be reduced. Further, the manufacturing steps and manufacturing costs of the gravure roll 101 can be further reduced.

鎳磷合金層30之厚度可落在約1 μm至約200 μm之範圍內。若鎳磷合金層30之厚度小於1 μm,則鎳磷合金層30可能無法被用 作為一表面強化塗覆層。此外,若鎳磷合金層30之厚度大於200 μm,則因內部應力(internal stress)之故,鎳磷合金層30可能會脫層(delaminated)。又,若鎳磷合金層30之厚度大於200 μm,則凹版輥101所需之深度及寬度可降低,進而使其在使用凹版輥101來進行印刷製程時,可能無法獲取所需之圖案。 The thickness of the nickel-phosphorus alloy layer 30 may fall within the range of from about 1 μm to about 200 μm. If the thickness of the nickel-phosphorus alloy layer 30 is less than 1 μm, the nickel-phosphorus alloy layer 30 may not be used. As a surface strengthening coating. Further, if the thickness of the nickel phosphorus alloy layer 30 is more than 200 μm, the nickel phosphorus alloy layer 30 may be delaminated due to internal stress. Further, if the thickness of the nickel-phosphorus alloy layer 30 is more than 200 μm, the depth and width required for the gravure roll 101 can be lowered, and further, when the gravure roll 101 is used for the printing process, the desired pattern may not be obtained.

在下文中,將配合圖3、4,詳細說明根據本發明第二實施例之一種凹版輥。為求說明之清晰與便利,以下與第一實施例所述者相同之元件及結構可被省略,而專注在說明相異的部分。 Hereinafter, a gravure roll according to a second embodiment of the present invention will be described in detail with reference to Figs. For the sake of clarity and convenience of description, the same elements and structures as those described in the first embodiment may be omitted, and the description will be directed to the different parts.

圖3係根據本發明第二實施例,繪示有凹版輥之一剖面圖;圖4係繪示有圖3中一A部分之一放大剖面圖。 3 is a cross-sectional view showing a gravure roll according to a second embodiment of the present invention; and FIG. 4 is an enlarged cross-sectional view showing a portion A of FIG.

參閱圖3、4,根據本發明第二實施例之凹版輥102中,一凹凸部分20b係形成於被提供在基輥10上之銅電鍍層20之表面上。凹凸部分20b可增強銅電鍍層20以及直接與銅電鍍層20相接觸之鎳磷合金層30之間的接觸力強度。詳細來說,因微小的凹凸部分20b之故,可提高銅電鍍層20與鎳磷合金層30之間的摩擦力,以使鎳磷合金層30得以穩固地接觸銅電鍍層20,而無須存在額外的金屬層。凹凸部分20b之表面粗糙度(surface roughness)係落在10nm至100nm之範圍內;且較佳地,係落在10nm至45nm之範圍內。若凹凸部分20b之表面粗糙度小於10nm,則會降低銅電鍍層20與鎳磷合金層30之間的黏著力。若凹凸部分20b之表面粗 糙度超過100nm,則印刷製程中可能會形成不需要的圖案。 Referring to Figures 3 and 4, in the gravure roll 102 according to the second embodiment of the present invention, a concavo-convex portion 20b is formed on the surface of the copper plating layer 20 provided on the base roll 10. The concavo-convex portion 20b enhances the strength of the contact force between the copper plating layer 20 and the nickel-phosphorus alloy layer 30 directly contacting the copper plating layer 20. In detail, due to the minute uneven portion 20b, the friction between the copper plating layer 20 and the nickel-phosphorus alloy layer 30 can be improved, so that the nickel-phosphorus alloy layer 30 can stably contact the copper plating layer 20 without being present. Additional metal layer. The surface roughness of the concavo-convex portion 20b falls within the range of 10 nm to 100 nm; and preferably, it falls within the range of 10 nm to 45 nm. If the surface roughness of the uneven portion 20b is less than 10 nm, the adhesion between the copper plating layer 20 and the nickel-phosphorus alloy layer 30 is lowered. If the surface of the concave and convex portion 20b is thick When the roughness exceeds 100 nm, an unnecessary pattern may be formed in the printing process.

在下文中,將配合圖5至9,詳細說明根據本發明實施例之一種凹版輥製造方法。 Hereinafter, a method of manufacturing a gravure roll according to an embodiment of the present invention will be described in detail with reference to Figs.

圖5至9係根據本發明實施例,繪示有凹版輥製造方法之剖面圖。 5 to 9 are cross-sectional views showing a method of manufacturing a gravure roll, in accordance with an embodiment of the present invention.

首先,如圖5所示,提供用於凹版輥之基輥10。 First, as shown in Fig. 5, a base roll 10 for a gravure roll is provided.

然後,如圖6所示,將銅電鍍於基輥10上,以形成銅電鍍層20。 Then, as shown in FIG. 6, copper is electroplated on the base roll 10 to form a copper plating layer 20.

如圖7所示,至少一溝槽20a係形成於該銅電鍍層之上。溝槽20a可由熟習此項技藝者所熟知之各種不同方法來形成,如蝕刻方法(etching)或電子雕刻方法(electronic engraving)等。詳細來說,蝕刻方法係為:塗覆一光阻(photoresist),然後將其直接地印刷於一銅板上,接著蝕刻之,以形成溝槽20a。而電子雕刻方法係為:一鑽石雕刻針(diamond engraving needle)係根據數位訊號來進行機械式運作,以形成溝槽20a於銅電鍍層20之表面上。 As shown in FIG. 7, at least one trench 20a is formed over the copper plating layer. The trench 20a can be formed by a variety of different methods well known to those skilled in the art, such as etching or electronic engraving. In detail, the etching method is to apply a photoresist and then directly print it on a copper plate, followed by etching to form the trench 20a. The electronic engraving method is: a diamond engraving needle is mechanically operated according to a digital signal to form a groove 20a on the surface of the copper plating layer 20.

接著,如圖8所示,凹凸部分20b係形成於銅電鍍層20之表面上。形成凹凸部分20b之程序可被省略,以提供不具有凹凸部分20b之銅電鍍層20,如根據第一實施例之凹版輥101(見圖2)。凹凸部分20b可由電漿蝕刻方法(plasma etching)來形成,以使 凹凸部分20b得以具有微小的表面粗糙度。可由自由基(radicals)的表面擴散(surface diffusion),以化學方式進行該電漿蝕刻方法;或由使用一電極來造成離子撞擊(ion bombardment),以物理方式進行該電漿蝕刻方法。在需要微小且精準的蝕刻時,可應用該電漿蝕刻方法。 Next, as shown in FIG. 8, the uneven portion 20b is formed on the surface of the copper plating layer 20. The procedure of forming the uneven portion 20b can be omitted to provide the copper plating layer 20 having no uneven portion 20b, such as the gravure roll 101 (see Fig. 2) according to the first embodiment. The uneven portion 20b may be formed by plasma etching so that The uneven portion 20b is provided with a slight surface roughness. The plasma etching method may be performed chemically by surface diffusion of radicals; or by an ion bombardment using an electrode to physically perform the plasma etching method. This plasma etching method can be applied when a small and precise etching is required.

此後,如圖9所示,鎳磷合金層30係形成於銅電鍍層20之上。鎳磷合金層30可由電鍍方法(electroplating)或無電鍍方法(electroless plating)形成。 Thereafter, as shown in FIG. 9, a nickel-phosphorus alloy layer 30 is formed on the copper plating layer 20. The nickel-phosphorus alloy layer 30 may be formed by electroplating or electroless plating.

該電鍍方法係運用電解(electrolysis)之原理。為了電鍍出根據本實施例之鎳磷合金層30,可應用一含亞磷酸鹽之溶液(phosphite-containing solution)。 This plating method uses the principle of electrolysis. In order to electroplate the nickel-phosphorus alloy layer 30 according to the present embodiment, a phosphite-containing solution can be applied.

該無電鍍方法係運用化學反應,而無需使用電力。也就是說,一還原劑(reducing agent)係被包含於一電鍍溶液中,以塗覆被該還原劑所還原之金屬。為了電鍍出根據本實施例之鎳磷合金層30,可應用次亞磷酸鹽(hypophosphite)。 This electroless plating method uses a chemical reaction without using electricity. That is, a reducing agent is contained in a plating solution to coat the metal reduced by the reducing agent. In order to electroplate the nickel-phosphorus alloy layer 30 according to the present embodiment, hypophosphite may be applied.

在本說明書中所提到的“一實施例”、“實施例”、“範例實施例”等任何的引用,代表本發明之至少一實施例中包括關於該實施例的一特定特徵、結構或特性。此類用語出現在文中多處但不盡然要參考相同的實施例。此外,在特定特徵、結構或特性的描述關係到任何實施例中,皆認為在熟習此技藝者之智識範圍 內其利用如此的其他特徵、結構或特徵來實現其它實施例。 Any reference to "an embodiment", "an embodiment", "an example embodiment" or the like in this specification means that a particular feature, structure or structure of the embodiment is included in at least one embodiment of the invention. characteristic. Such terms appear in many places in the text but do not necessarily refer to the same embodiment. In addition, descriptions of specific features, structures, or characteristics are considered to be within the scope of the skilled artisan. Other embodiments are implemented using such other features, structures, or characteristics.

雖然參考實施例之許多說明性實施例來描述實施例,但應理解,熟習此項技藝者可想出將落入本發明之原理的精神及範疇內的眾多其他修改及實施例。更特定言之,在本發明、圖式及所附申請專利範圍之範疇內,所主張組合配置之零部件及/或配置的各種變化及修改為可能的。對於熟悉此項技術者而言,除了零部件及/或配置之變化及修改外,替代用途亦將顯而易見。 While the invention has been described with respect to the embodiments of the embodiments of the present invention More particularly, various variations and modifications are possible in the component parts and/or arrangements of the claimed combinations. For those skilled in the art, alternative uses will be apparent in addition to variations and modifications in parts and/or configurations.

100、101、102‧‧‧凹版輥 100, 101, 102‧‧‧ gravure rolls

110‧‧‧印刷漿料 110‧‧‧Printing paste

200‧‧‧刮刀 200‧‧‧ scraper

300‧‧‧覆蓋輥 300‧‧‧ Cover Roller

400‧‧‧基板 400‧‧‧Substrate

410‧‧‧圖案 410‧‧‧ pattern

500‧‧‧溝槽 500‧‧‧ trench

10‧‧‧基輥 10‧‧‧Base roller

20‧‧‧銅電鍍層 20‧‧‧ copper plating

20a‧‧‧溝槽 20a‧‧‧ trench

20b‧‧‧凹凸部分 20b‧‧‧ concave part

30‧‧‧鎳磷合金層 30‧‧‧Ni-phosphorus alloy layer

A‧‧‧部分 Part A‧‧‧

圖1係繪示有一印刷裝置之一立體示意圖;圖2係根據本發明第一實施例,繪示有一凹版輥之一剖面圖;圖3係根據本發明第二實施例,繪示有一凹版輥之一剖面圖;圖4係繪示有圖3中一A部分之一放大剖面圖;以及圖5至9係根據本發明實施例,繪示有凹版輥製造方法步驟之剖面圖。 1 is a perspective view showing a printing apparatus; FIG. 2 is a cross-sectional view showing a gravure roll according to a first embodiment of the present invention; and FIG. 3 is a gravure roll according to a second embodiment of the present invention. FIG. 4 is an enlarged cross-sectional view showing a portion A of FIG. 3; and FIGS. 5 to 9 are cross-sectional views showing steps of a method for manufacturing a gravure roll according to an embodiment of the present invention.

100、101、102‧‧‧凹版輥 100, 101, 102‧‧‧ gravure rolls

110‧‧‧印刷漿料 110‧‧‧Printing paste

200‧‧‧刮刀 200‧‧‧ scraper

300‧‧‧覆蓋輥 300‧‧‧ Cover Roller

400‧‧‧基板 400‧‧‧Substrate

410‧‧‧圖案 410‧‧‧ pattern

500‧‧‧溝槽 500‧‧‧ trench

Claims (7)

一種凹版輥,包括:一基輥;一銅電鍍層,提供於該基輥之上,且其一表面上係形成有複數個溝槽;以及一鎳磷合金層,於該銅電鍍層之上,其中磷之含量係落在15wt%至20wt%之範圍內,其中該鎳磷合金為非晶態,其中該銅電鍍層之表面上形成有凹凸部分。 A gravure roll comprising: a base roll; a copper plating layer provided on the base roll and having a plurality of grooves formed on one surface thereof; and a nickel-phosphorus alloy layer on the copper plating layer Wherein the content of phosphorus falls within a range of 15% by weight to 20% by weight, wherein the nickel-phosphorus alloy is amorphous, wherein the surface of the copper plating layer is formed with a concavo-convex portion. 如申請專利範圍第1項所述之凹版輥,其中該鎳磷合金層係包括鎢。 The gravure roll of claim 1, wherein the nickel-phosphorus alloy layer comprises tungsten. 如申請專利範圍第2項所述之凹版輥,其中鎢之一含量係落在1wt%至20wt%之範圍內。 The gravure roll of claim 2, wherein one of the tungsten content falls within the range of 1 wt% to 20 wt%. 如申請專利範圍第1項所述之凹版輥,其中該銅電鍍層係具有一厚度落在50μm至200μm之範圍內。 The gravure roll according to claim 1, wherein the copper plating layer has a thickness falling within a range of 50 μm to 200 μm. 如申請專利範圍第1項所述之凹版輥,其中該鎳磷合金層係具有一厚度落在1μm至200μm之範圍內。 The gravure roll according to claim 1, wherein the nickel-phosphorus alloy layer has a thickness falling within a range of from 1 μm to 200 μm. 如申請專利範圍第1項所述之凹版輥,其中該銅電鍍層之一表面粗糙度係落在10nm至100nm之範圍內。 The gravure roll according to claim 1, wherein a surface roughness of one of the copper plating layers falls within a range of 10 nm to 100 nm. 如申請專利範圍第1項所述之凹版輥,其中該銅電鍍層之一表 面粗糙度係落在10nm至45nm之範圍內。 The gravure roll according to claim 1, wherein one of the copper plating layers is The surface roughness is in the range of 10 nm to 45 nm.
TW101102771A 2011-01-27 2012-01-30 Gravure roll and method of manufaturing the same TWI537435B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020110008483A KR101776303B1 (en) 2011-01-27 2011-01-27 Gravure roll and manufacturing the same

Publications (2)

Publication Number Publication Date
TW201239140A TW201239140A (en) 2012-10-01
TWI537435B true TWI537435B (en) 2016-06-11

Family

ID=46581298

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101102771A TWI537435B (en) 2011-01-27 2012-01-30 Gravure roll and method of manufaturing the same

Country Status (4)

Country Link
KR (1) KR101776303B1 (en)
CN (1) CN103347694B (en)
TW (1) TWI537435B (en)
WO (1) WO2012102565A2 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107111401B (en) * 2015-02-02 2020-06-02 柯达公司 Anilox roll with low surface energy regions
CN106827806A (en) * 2017-01-20 2017-06-13 湖南福瑞印刷有限公司 A kind of optically variable anti-counterfeiting ink offset printing anilox roll
CN111347759A (en) * 2020-03-11 2020-06-30 山西运城制版集团(上海)企业发展有限公司 Gravure printing roller containing electroplated nickel-tungsten-phosphorus layer and manufacturing method thereof
CN111284118A (en) * 2020-03-11 2020-06-16 山西运城制版集团(上海)企业发展有限公司 Gravure printing roller and manufacturing method thereof
CN111411379B (en) * 2020-05-15 2021-09-21 常州华威新材料有限公司 Low-stress nickel-phosphorus alloy roller for microstructure machining and electroplating process thereof

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1041641C (en) * 1993-06-29 1999-01-13 日本钢管株式会社 Surface treated steel sheet and method therefor
US6200450B1 (en) * 1998-03-30 2001-03-13 Wen Hua Hui Method and apparatus for depositing Ni-Fe-W-P alloys
KR100366248B1 (en) * 1998-08-03 2002-12-31 시티즌 도케이 가부시키가이샤 Accessory having colored coating and manufacturing method thereof
EP1232861A1 (en) * 1999-10-29 2002-08-21 Isle Coat Limited Engraved shaft and method for manufacturing thereof
EP1938970A1 (en) * 2005-09-30 2008-07-02 Think Laboratory Co., Ltd. Photogravure engraving roll and production method thereof
WO2008047581A1 (en) * 2006-10-02 2008-04-24 Fuji Tokushu Shigyo Co., Ltd. Laminated flexible packaging material and method for manufacturing the same
EP2103712B1 (en) * 2008-03-20 2019-02-13 ATOTECH Deutschland GmbH Ni-P layer system and process for its preparation

Also Published As

Publication number Publication date
WO2012102565A3 (en) 2012-12-06
WO2012102565A2 (en) 2012-08-02
KR20120087044A (en) 2012-08-06
TW201239140A (en) 2012-10-01
KR101776303B1 (en) 2017-09-07
CN103347694B (en) 2015-12-09
CN103347694A (en) 2013-10-09

Similar Documents

Publication Publication Date Title
TWI537435B (en) Gravure roll and method of manufaturing the same
US9674956B2 (en) Method of manufacturing an intermediate product for an interposer and intermediate product for an interposer
JP2009167523A (en) Conductive substrate for plating, method for manufacturing the same, conductive layer pattern using the same, and method for manufacturing substrate with conductive layer pattern, substrate with conductive layer pattern, and translucent electromagnetic wave shielding member
JP6307281B2 (en) Roll mold
EP3284610A1 (en) Gravure cylinder and manufacturing method thereof
JP2014081489A (en) Platemaking roll for gravure printing and method for manufacturing the same
JP2004025709A (en) Screen printing plate and method for manufacturing it
JP5286532B2 (en) Paste printing plate
KR20180028868A (en) Mother plate and producing method of the same, and producing method of the same
CN114990503B (en) Coating method, coating equipment and electronic equipment
TW200606036A (en) Thin metal sheet having a pattern and manufacturing method therefor
JP2010105245A (en) Gravure platemaking roll
US20220061164A1 (en) Pattern plate for plating and wiring board manufacturing method
CN100402310C (en) Blanket for printing roll
JP2012092436A (en) Doctor blade for gravure printing machine, method of manufacturing the same, and gravure printing machine
JP6437070B2 (en) Coating equipment
JP2015205452A (en) Method for producing functional element, printing device
KR20140030948A (en) High definition printing plate and manufacturing method for the same
JP2008290450A (en) Mask, and method of manufacturing the same
KR100645641B1 (en) Imprint mold for printed circuit board using ptfe and manufacturing method thereof
JPWO2013176029A1 (en) Patterned roll and method for producing the same
JP5261910B2 (en) Letterpress, printing machine, organic electronic device manufacturing method, and letterpress manufacturing method
JP6549408B2 (en) Printing plate and method for manufacturing the same
TW201124014A (en) Method for fabricating wiring structure of wiring board
KR20120078262A (en) Gravure roll and manufacturing the same

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees