TWI531285B - Circuit board and method for manufacturing same - Google Patents

Circuit board and method for manufacturing same Download PDF

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TWI531285B
TWI531285B TW102128959A TW102128959A TWI531285B TW I531285 B TWI531285 B TW I531285B TW 102128959 A TW102128959 A TW 102128959A TW 102128959 A TW102128959 A TW 102128959A TW I531285 B TWI531285 B TW I531285B
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conductive
circuit board
conductive polymer
substrate
polymer monomer
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TW102128959A
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Chinese (zh)
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TW201515535A (en
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黃黎明
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臻鼎科技股份有限公司
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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/09Use of materials for the conductive, e.g. metallic pattern
    • H05K1/092Dispersed materials, e.g. conductive pastes or inks
    • H05K1/095Dispersed materials, e.g. conductive pastes or inks for polymer thick films, i.e. having a permanent organic polymeric binder
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/12Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
    • H05K3/1216Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by screen printing or stencil printing
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/03Conductive materials
    • H05K2201/0332Structure of the conductor
    • H05K2201/0335Layered conductors or foils
    • H05K2201/0338Layered conductor, e.g. layered metal substrate, layered finish layer, layered thin film adhesion layer
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0703Plating
    • H05K2203/0713Plating poison, e.g. for selective plating or for preventing plating on resist

Description

電路板及其製作方法 Circuit board and manufacturing method thereof

本發明涉及電路板製作技術,尤其涉及一種電路板及其製作方法。 The invention relates to a circuit board manufacturing technology, in particular to a circuit board and a manufacturing method thereof.

隨著電子產品往小型化、高速化方向的發展,電路板也從單面電路板、雙面電路板往多層電路板方向發展。多層電路板是指具有多層導電線路的電路板,其具有較多的佈線面積、較高互連密度,因而得到廣泛的應用,參見文獻Takahashi,A.Ooki,N.Nagai,A.Akahoshi,H.Mukoh,A.Wajima,M.Res.Lab.,High density multilayer printed circuit board for HITAC M-880,IEEE Trans.on Components,Packaging,and Manufacturing Technology,1992,15(4):418-425。 With the development of electronic products in the direction of miniaturization and high speed, circuit boards have also evolved from single-sided circuit boards and double-sided circuit boards to multilayer circuit boards. A multi-layer circuit board refers to a circuit board having a plurality of layers of conductive lines, which has a large wiring area and a high interconnection density, and thus is widely used, see the literature Takahashi, A. Ooki, N. Nagai, A. Akahoshi, H. Mukoh, A. Wajima, M. Res. Lab., High density multilayer printed circuit board for HITAC M-880, IEEE Trans. on Components, Packaging, and Manufacturing Technology, 1992, 15(4): 418-425.

具有細化導電線路的印刷電路板製作通常採用如下方法:提供絕緣基板;在絕緣基板的表面形成導電層;在導電層的表面形成光致抗蝕劑層;對所述光致抗蝕劑層進行曝光及顯影;對所述導電層進行蝕刻,得到導電線路;以及將所述光致抗蝕劑層去除。在上述的製作方法中,需要採用光致抗蝕劑及整片的導電層,並且,在曝光、顯影及蝕刻等處理過程中,需要對應的化學試劑及需要大量的水資源以進行清洗。從而,現有技術中的製作方法對環境具有較嚴重的污染,並且,電路板的生產成本較高。 A printed circuit board having a refinement conductive line is generally produced by providing an insulating substrate; forming a conductive layer on the surface of the insulating substrate; forming a photoresist layer on the surface of the conductive layer; and applying the photoresist layer to the photoresist layer Exposure and development are performed; the conductive layer is etched to obtain a conductive line; and the photoresist layer is removed. In the above manufacturing method, it is necessary to use a photoresist and a whole conductive layer, and in the process of exposure, development, etching, etc., a corresponding chemical reagent is required and a large amount of water is required for cleaning. Therefore, the manufacturing method in the prior art has serious pollution to the environment, and the production cost of the circuit board is high.

因此,有必要提供一種能夠減少對環境產生污染的電路板製作方法及制得的電路板。 Therefore, it is necessary to provide a circuit board manufacturing method and a circuit board which can reduce environmental pollution.

一種電路板的製作方法,包括步驟:提供導電性高分子單體及可溶性金屬鹽溶液;將所述導電性高分子單體及可溶性金屬鹽溶液均勻混合得到前驅體;提供基板;將所述前驅體塗布於在基板的表面形成導電線路圖案;採用紫外光照射所述導電線路圖案以使其硬化,使得所述導電性高分子單體聚合得到導電性高分子,所述金屬鹽的金屬離子被還原為金屬單質,得到導電線路薄膜;以及在所述導電線路薄膜表面形成電鍍金屬層,所述電鍍金屬層與導電線路薄膜通過構成導電線路。 A method for manufacturing a circuit board, comprising the steps of: providing a conductive polymer monomer and a soluble metal salt solution; uniformly mixing the conductive polymer monomer and a soluble metal salt solution to obtain a precursor; providing a substrate; and using the precursor The body is coated on the surface of the substrate to form a conductive line pattern; the conductive line pattern is irradiated with ultraviolet light to harden it, and the conductive polymer monomer is polymerized to obtain a conductive polymer, and the metal ion of the metal salt is Reducing to a simple metal material to obtain a conductive wiring film; and forming a plating metal layer on the surface of the conductive wiring film, the plating metal layer and the conductive wiring film forming a conductive path.

本技術方案提供的電路板及其製作方法,將導電性高分子的單體及包括金屬離子的前驅物塗布基板的表面,並採用紫外光照射後硬化成為導電線路薄膜。所述導電線路薄膜包括導電性高分子材料及金屬單質,具有良好的導電性,能夠作為後續直接在其表面形成電鍍金屬層。因此,本技術方案提供的電路板的製作方法,在製作導電線路時,不需要進行曝光、顯影及蝕刻等處理,從而避免使用大量的化學試劑及需要大量的水資源。從而,本技術方案提供的電路板製作方法能夠減少對環境產生的污染,並降低電路板的生產成本。進一步地,本技術方案中導電線路薄膜形成僅需採用紫外光照射,而不需要高溫烘烤處理,從而可以避免高溫烘烤時造成基板中的絕緣層的損壞。 According to the circuit board and the manufacturing method thereof, the monomer of the conductive polymer and the precursor including the metal ion are coated on the surface of the substrate, and are irradiated with ultraviolet light to be cured into a conductive line film. The conductive line film comprises a conductive polymer material and a metal element, and has good electrical conductivity, and can form a plated metal layer directly on the surface thereof as a subsequent step. Therefore, the manufacturing method of the circuit board provided by the technical solution does not require exposure, development, and etching when manufacturing the conductive line, thereby avoiding the use of a large amount of chemical reagents and requiring a large amount of water resources. Therefore, the circuit board manufacturing method provided by the technical solution can reduce environmental pollution and reduce the production cost of the circuit board. Further, in the technical solution, the formation of the conductive line film only needs to be irradiated with ultraviolet light, and does not require high-temperature baking treatment, thereby avoiding damage of the insulating layer in the substrate during high-temperature baking.

110‧‧‧基板 110‧‧‧Substrate

120‧‧‧導電線路圖案 120‧‧‧ conductive circuit pattern

121‧‧‧導電線路薄膜 121‧‧‧ Conductive film

150‧‧‧電鍍阻擋層 150‧‧‧ plating barrier

151‧‧‧開口 151‧‧‧ openings

130‧‧‧電鍍金屬層 130‧‧‧Electroplated metal layer

140‧‧‧導電線路 140‧‧‧Electrical circuit

100‧‧‧電路板 100‧‧‧ boards

圖1是本技術方案實施例提供的基板的剖面示意圖。 1 is a schematic cross-sectional view of a substrate provided by an embodiment of the present technical solution.

圖2是圖1的基板表面形成導電線路圖案後的剖面示意圖。 2 is a schematic cross-sectional view showing the surface of the substrate of FIG. 1 after forming a conductive line pattern.

圖3是圖2的導電線路圖案被紫外光照射後硬化得到導電線路薄膜後的剖面示意圖。 3 is a schematic cross-sectional view showing the conductive circuit pattern of FIG. 2 after being irradiated with ultraviolet light to obtain a conductive line film.

圖4是圖3的基板表面形成電鍍阻擋層後的剖面示意圖。 4 is a schematic cross-sectional view showing the surface of the substrate of FIG. 3 after forming a plating barrier layer.

圖5是圖4的導電線路薄膜表面形成電鍍金屬層後的剖面示意圖。 FIG. 5 is a schematic cross-sectional view showing the surface of the conductive wiring film of FIG. 4 after forming a plated metal layer.

圖6是本技術方案製作的電路板的剖面示意圖。 6 is a schematic cross-sectional view of a circuit board fabricated by the present technical solution.

下面將結合附圖及實施例對本技術方案提供的電路板及其製作方法作進一步的詳細說明。 The circuit board provided by the technical solution and the manufacturing method thereof will be further described in detail below with reference to the accompanying drawings and embodiments.

本技術方案實施例提供的電路板的製作方法包括以下步驟: The manufacturing method of the circuit board provided by the embodiment of the technical solution includes the following steps:

第一步,提供導電性高分子單體及可溶性金屬鹽溶液。 In the first step, a conductive polymer monomer and a soluble metal salt solution are provided.

所述導電性高分子單體為聚合後形成的高分子具有導電性的單體。所述導電性高分子單體具體可以為苯胺、吡咯或噻吩等,也可以為苯胺的衍生物、吡咯衍生物或者噻吩衍生物等,如3,4-乙撐噻吩、2,5-二甲氧苯胺等。導電性高分子單體通常為液體。 The conductive polymer monomer is a monomer having conductivity in a polymer formed after polymerization. The conductive polymer monomer may specifically be aniline, pyrrole or thiophene, or may be a derivative of aniline, a pyrrole derivative or a thiophene derivative, such as 3,4-ethylenethiophene or 2,5-dimethylene. Oxyaniline and the like. The conductive polymer monomer is usually a liquid.

可溶性金屬鹽溶液可以為可溶性銅鹽溶液、可溶性銀鹽溶液或者可溶性鈀鹽溶液等。本實施例中,以硫酸銅溶液為例來進行說明。 The soluble metal salt solution may be a soluble copper salt solution, a soluble silver salt solution or a soluble palladium salt solution or the like. In the present embodiment, a copper sulfate solution will be described as an example.

第二步,將所述導電性高分子單體及可溶性金屬鹽溶液均勻混合得到前驅體。 In the second step, the conductive polymer monomer and the soluble metal salt solution are uniformly mixed to obtain a precursor.

本步驟中,可以採用機械攪拌或者其他方式,使得導電性高分子 單體及可溶性金屬鹽溶液均勻混合。 In this step, mechanical stirring or other means may be used to make the conductive polymer The monomer and the soluble metal salt solution are uniformly mixed.

第三步,請參閱圖1,提供基板110。 In the third step, referring to FIG. 1, a substrate 110 is provided.

所述基板110可以為絕緣基材,也可以為已經形成有導電線路的電路基板,所述電路基板的一側為絕緣基材。所述絕緣基材的材料可以為電路板製作過程中通常用於製作絕緣層的材料,如聚醯亞胺等。本實施例中,基板110是絕緣基材為例來進行說明。 The substrate 110 may be an insulating substrate or a circuit substrate on which a conductive line has been formed, and one side of the circuit substrate is an insulating substrate. The material of the insulating substrate may be a material commonly used for making an insulating layer in a circuit board manufacturing process, such as polyimide or the like. In the present embodiment, the substrate 110 is an insulating substrate as an example.

第四步,請參閱圖2,將所述前驅體塗布於在基板110的表面形成導電線路圖案120。 In the fourth step, referring to FIG. 2, the precursor is coated on the surface of the substrate 110 to form a conductive line pattern 120.

本步驟中,可以採用網版印刷、噴墨列印或者旋轉塗布的方式將所述前驅體塗布於在基板110的表面形成導電線路圖案120。所述導電線路圖案120的形狀及分佈與欲形成的導電線路的分佈及形狀相同。 In this step, the precursor may be applied to form a conductive line pattern 120 on the surface of the substrate 110 by screen printing, inkjet printing or spin coating. The shape and distribution of the conductive trace pattern 120 are the same as the distribution and shape of the conductive trace to be formed.

第五步,請參閱圖3,採用紫外光照射所述導電線路圖案120硬化,得到導電線路薄膜121。 In the fifth step, referring to FIG. 3, the conductive line pattern 120 is hardened by ultraviolet light to obtain a conductive line film 121.

通過採用紫外光進行照射,使得所述導電線路圖案120內的前驅體中的所述導電性高分子單體發生聚合反應,成為導電性高分子,與基板110的表面緊密結台。在所述導電性高分子單體進行聚合的過程中,可以產生自由電子,所述導電線路圖案120內的前驅體中的可溶性金屬鹽溶液的金屬離子與所述自由電子結合,被還原為金屬單質,從而得到的導電線路薄膜121中的金屬單質原子相互連接,進一步增加硬化後的導電線路圖案120的導電性能。 By irradiating with ultraviolet light, the conductive polymer monomer in the precursor in the conductive wiring pattern 120 is polymerized to form a conductive polymer, and is closely bonded to the surface of the substrate 110. During the polymerization of the conductive polymer monomer, free electrons may be generated, and metal ions of the soluble metal salt solution in the precursor in the conductive line pattern 120 are combined with the free electrons and reduced to metal. The elemental substance is such that the metal element atoms in the conductive wiring film 121 are connected to each other to further increase the electrical conductivity of the hardened conductive line pattern 120.

進一步地,本實施例中,採用的紫外光的波長範圍為330納米至 400納米。優選為365納米。當採用苯胺的衍生物、吡咯衍生物或者噻吩衍生物作為導電性高分子單體時,如果單體的環狀結構中連接有斥電子基,如甲氧基等,能夠更加有助於單體在聚合時提供電子給金屬鹽的金屬離子,以便於金屬離子還原為金屬單質。例如,當導電性高分子單體為2,5-二甲氧苯胺時,其苯環的2及5位置上分別連接有甲氧基,由於甲氧基具有斥電子性,從而加速單體在聚合時提供電子給金屬鹽的金屬離子,以便於金屬離子還原為金屬單質。 Further, in this embodiment, the ultraviolet light is used in the wavelength range of 330 nm to 400 nm. It is preferably 365 nm. When a derivative of aniline, a pyrrole derivative or a thiophene derivative is used as the conductive polymer monomer, if an electron-repellent group such as a methoxy group is attached to the ring structure of the monomer, the monomer can be more favored. The metal ions of the electrons are supplied to the metal salt during the polymerization to facilitate the reduction of the metal ions to the metal element. For example, when the conductive polymer monomer is 2,5-dimethoxyaniline, a methoxy group is bonded to the 2 and 5 positions of the benzene ring, and since the methoxy group has electron-repellency, the monomer is accelerated. The metal ions of the metal salt are supplied during the polymerization to facilitate the reduction of the metal ions to the metal element.

另外,由於聚合後得到的導電性高分子具有氧化/還原狀態轉化的特性,在所述導電性高分子氧化/還原狀態轉化過程中,可以釋放出自由電子,從而可以進一步加速金屬離子被還原為金屬單質。 In addition, since the conductive polymer obtained after the polymerization has an oxidation/reduction state conversion property, free electrons can be released during the oxidation/reduction state conversion of the conductive polymer, thereby further accelerating the reduction of the metal ions to Metal element.

導電線路薄膜121中得到的導電性高分子可以為聚苯胺、聚吡咯或聚噻吩。或者苯胺的衍生物、吡咯衍生物或者噻吩衍生物的聚合物。如聚乙撐二氧噻吩或者聚2,5-二甲氧苯胺等。所述金屬單質可以為銅、銀或者鈀等。 The conductive polymer obtained in the conductive wiring film 121 may be polyaniline, polypyrrole or polythiophene. Or a derivative of an aniline derivative, a pyrrole derivative or a thiophene derivative. Such as polyethylene dioxythiophene or poly 2,5-dimethoxyaniline. The metal element may be copper, silver or palladium or the like.

第六步,請一併參閱圖4至圖6,採用電鍍的方式,在導電線路薄膜121的表面形成電鍍金屬層130,所述電鍍金屬層130與導電線路薄膜121共同構成導電線路140,得到電路板100。 In the sixth step, referring to FIG. 4 to FIG. 6 , an electroplated metal layer 130 is formed on the surface of the conductive trace film 121 by electroplating. The electroplated metal layer 130 and the conductive trace film 121 together form the conductive trace 140. Circuit board 100.

具體的,可以先在基板110的表面形成電鍍阻擋層150,所述電鍍阻擋層150內形成有與導電線路薄膜121對應的開口151,使得導電線路薄膜121從所述開口151露出。所述電鍍阻擋層150可以採用印刷光致抗蝕劑的方式形成。然後,採用電鍍的方式,在硬化後的導電線路薄膜121表面形成電鍍金屬層130。由於硬化後的導 電線路薄膜121具有導電性,從而可以硬化後的導電線路薄膜121進行電鍍金屬,形成電鍍金屬層130。最後,去除所述電鍍阻擋層150。所述電鍍金屬層130可以為金屬銅層。 Specifically, a plating barrier layer 150 may be formed on the surface of the substrate 110, and an opening 151 corresponding to the conductive wiring film 121 is formed in the plating barrier layer 150 such that the conductive wiring film 121 is exposed from the opening 151. The plating barrier layer 150 may be formed by printing a photoresist. Then, a plating metal layer 130 is formed on the surface of the hardened conductive wiring film 121 by electroplating. Due to the hardening guide The electric wiring film 121 has electrical conductivity, so that the hardened conductive wiring film 121 is plated with metal to form the electroplated metal layer 130. Finally, the plating barrier layer 150 is removed. The plated metal layer 130 may be a metal copper layer.

本步驟之後,還可以進一步包括在電路板100的表面形成防焊層的步驟。 After this step, the step of forming a solder resist layer on the surface of the circuit board 100 may be further included.

請參閱圖6,本技術方案還提供一種電路板100,其包括基板110及形成於基板110表面的導電線路140。所述導電線路140包括導電線路薄膜121及電鍍金屬層130。所述導電線路薄膜121形成於基板110與電鍍金屬層130之間,所述導電線路薄膜121包括導電性高分子材料及金屬單質。所述金屬單質均勻分散於所述導電性高分子材料內。所述導電性高分子採用用於承載金屬單質,並使得導電線路薄膜121與基板110緊密結合。所述導電性高分子可以為聚苯胺、聚吡咯或聚噻吩。或者苯胺的衍生物、吡咯衍生物或者噻吩衍生物的聚合物。如聚乙撐二氧噻吩或者聚2,5-二甲氧苯胺等。所述金屬單質可以為銅、銀或者鈀等。 Referring to FIG. 6 , the technical solution further provides a circuit board 100 including a substrate 110 and a conductive line 140 formed on the surface of the substrate 110 . The conductive line 140 includes a conductive line film 121 and a plated metal layer 130. The conductive line film 121 is formed between the substrate 110 and the plated metal layer 130. The conductive line film 121 includes a conductive polymer material and a metal element. The metal element is uniformly dispersed in the conductive polymer material. The conductive polymer is used to carry a metal element and the conductive line film 121 is tightly bonded to the substrate 110. The conductive polymer may be polyaniline, polypyrrole or polythiophene. Or a derivative of an aniline derivative, a pyrrole derivative or a thiophene derivative. Such as polyethylene dioxythiophene or poly 2,5-dimethoxyaniline. The metal element may be copper, silver or palladium or the like.

可以理解的是,本技術方案提供的電路板製作方法也可以應用於多層電路板的製作,只需要在導電線路140一側壓合絕緣層,然後,按照製作導電線路140的方法,在絕緣層的表面製作導電線路即可。 It can be understood that the circuit board manufacturing method provided by the technical solution can also be applied to the fabrication of a multi-layer circuit board, and only needs to press the insulating layer on one side of the conductive line 140, and then, in the insulating layer according to the method of manufacturing the conductive line 140. The surface can be made of conductive lines.

本技術方案提供的電路板及其製作方法,將導電性高分子的單體及包括金屬離子的前驅物塗布基板的表面,並採用紫外光照射後硬化成為導電線路薄膜。所述導電線路薄膜包括導電性高分子材料及金屬單質,具有良好的導電性,能夠作為後續直接在其表面形成電鍍金屬層。因此,本技術方案提供的電路板的製作方法, 在製作導電線路時,不需要進行曝光、顯影及蝕刻等處理,從而避免使用大量的化學試劑及需要大量的水資源。從而,本技術方案提供的電路板製作方法能夠減少對環境產生的污染,並降低電路板的生產成本。 According to the circuit board and the manufacturing method thereof, the monomer of the conductive polymer and the precursor including the metal ion are coated on the surface of the substrate, and are irradiated with ultraviolet light to be cured into a conductive line film. The conductive line film comprises a conductive polymer material and a metal element, and has good electrical conductivity, and can form a plated metal layer directly on the surface thereof as a subsequent step. Therefore, the manufacturing method of the circuit board provided by the technical solution, When making conductive lines, exposure, development, and etching are not required, thereby avoiding the use of a large amount of chemical reagents and requiring a large amount of water resources. Therefore, the circuit board manufacturing method provided by the technical solution can reduce environmental pollution and reduce the production cost of the circuit board.

進一步地,本技術方案中導電線路薄膜形成僅需採用紫外光照射,而不需要高溫烘烤處理,從而可以避免高溫烘烤時造成基板中的絕緣層的損壞。綜上所述,本發明符合發明專利要件,爰依法提出專利申請。惟,以上所述者僅為本發明之較佳實施例,舉凡熟悉本案技藝之人士,於爰依本發明精神所作之等效修飾或變化,皆應涵蓋於以下之申請專利範圍內。 Further, in the technical solution, the formation of the conductive line film only needs to be irradiated with ultraviolet light, and does not require high-temperature baking treatment, thereby avoiding damage of the insulating layer in the substrate during high-temperature baking. In summary, the present invention complies with the requirements of the invention patent and submits a patent application according to law. However, the above description is only the preferred embodiment of the present invention, and equivalent modifications or variations made by those skilled in the art will be covered by the following claims.

110‧‧‧基板 110‧‧‧Substrate

121‧‧‧導電線路薄膜 121‧‧‧ Conductive film

130‧‧‧電鍍金屬層 130‧‧‧Electroplated metal layer

140‧‧‧導電線路 140‧‧‧Electrical circuit

100‧‧‧電路板 100‧‧‧ boards

Claims (5)

一種電路板的製作方法,包括步驟:提供導電性高分子單體及可溶性金屬鹽溶液;將所述導電性高分子單體及可溶性金屬鹽溶液均勻混合得到前驅體;提供基板;將所述前驅體塗布於在基板的表面形成導電線路圖案;採用紫外光照射所述導電線路圖案以使其硬化,使得所述導電性高分子單體聚合得到導電性高分子,所述金屬鹽的金屬離子被還原為金屬單質,得到導電線路薄膜;以及在所述導電線路薄膜表面形成電鍍金屬層,所述電鍍金屬層與導電線路薄膜通過構成導電線路。 A method for manufacturing a circuit board, comprising the steps of: providing a conductive polymer monomer and a soluble metal salt solution; uniformly mixing the conductive polymer monomer and a soluble metal salt solution to obtain a precursor; providing a substrate; and using the precursor The body is coated on the surface of the substrate to form a conductive line pattern; the conductive line pattern is irradiated with ultraviolet light to harden it, and the conductive polymer monomer is polymerized to obtain a conductive polymer, and the metal ion of the metal salt is Reducing to a simple metal material to obtain a conductive wiring film; and forming a plating metal layer on the surface of the conductive wiring film, the plating metal layer and the conductive wiring film forming a conductive path. 如申請專利範圍第1項所述的電路板的製作方法,其中,所述導電性高分子單體為苯胺、吡咯、噻吩、苯胺的衍生物、吡咯衍生物或者噻吩衍生物。 The method for producing a circuit board according to the first aspect of the invention, wherein the conductive polymer monomer is a derivative of aniline, pyrrole, thiophene or aniline, a pyrrole derivative or a thiophene derivative. 如申請專利範圍第1項所述的電路板的製作方法,其中,所述導電性高分子單體為3,4-乙撐噻吩或2,5-二甲氧苯胺。 The method for producing a circuit board according to the first aspect of the invention, wherein the conductive polymer monomer is 3,4-ethylenethiophene or 2,5-dimethoxyaniline. 如申請專利範圍第1項所述的電路板的製作方法,其中,所述紫外光的波長範圍為330納米至400納米。 The method of fabricating a circuit board according to claim 1, wherein the ultraviolet light has a wavelength ranging from 330 nm to 400 nm. 如申請專利範圍第1項所述的電路板的製作方法,其中,所述前驅體通過網版印刷、噴墨列印或者旋轉塗布的方式塗布於在基板的表面。 The method of manufacturing a circuit board according to the first aspect of the invention, wherein the precursor is applied to a surface of the substrate by screen printing, inkjet printing or spin coating.
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