TWI529133B - Method for producing magnesium hydroxide microparticle and magnesium oxide microparticle - Google Patents

Method for producing magnesium hydroxide microparticle and magnesium oxide microparticle Download PDF

Info

Publication number
TWI529133B
TWI529133B TW100134937A TW100134937A TWI529133B TW I529133 B TWI529133 B TW I529133B TW 100134937 A TW100134937 A TW 100134937A TW 100134937 A TW100134937 A TW 100134937A TW I529133 B TWI529133 B TW I529133B
Authority
TW
Taiwan
Prior art keywords
magnesium hydroxide
magnesium
fine particles
mass
purity
Prior art date
Application number
TW100134937A
Other languages
Chinese (zh)
Other versions
TW201219307A (en
Inventor
大崎善久
Original Assignee
達泰豪化學工業股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=45893003&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=TWI529133(B) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by 達泰豪化學工業股份有限公司 filed Critical 達泰豪化學工業股份有限公司
Publication of TW201219307A publication Critical patent/TW201219307A/en
Application granted granted Critical
Publication of TWI529133B publication Critical patent/TWI529133B/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01FCOMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
    • C01F5/00Compounds of magnesium
    • C01F5/02Magnesia
    • C01F5/06Magnesia by thermal decomposition of magnesium compounds
    • C01F5/08Magnesia by thermal decomposition of magnesium compounds by calcining magnesium hydroxide
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01FCOMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
    • C01F5/00Compounds of magnesium
    • C01F5/02Magnesia
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01FCOMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
    • C01F5/00Compounds of magnesium
    • C01F5/14Magnesium hydroxide
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01FCOMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
    • C01F5/00Compounds of magnesium
    • C01F5/14Magnesium hydroxide
    • C01F5/22Magnesium hydroxide from magnesium compounds with alkali hydroxides or alkaline- earth oxides or hydroxides
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/51Particles with a specific particle size distribution
    • C01P2004/52Particles with a specific particle size distribution highly monodisperse size distribution
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/12Surface area

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geology (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)

Description

氫氧化鎂微粒子及氧化鎂微粒子之製造方法 Method for producing magnesium hydroxide microparticles and magnesium oxide microparticles

本發明是關於粒徑小且均勻的高純度氫氧化鎂微粒子及高純度氧化鎂微粒子,以及該等微粒子的製造方法。The present invention relates to high-purity magnesium hydroxide fine particles and high-purity magnesium oxide fine particles having a small particle size and uniformity, and a method for producing the fine particles.

氫氧化鎂及氧化鎂是在各種的領域被使用的無機材料,以前者的用途而言,可舉添加劑、樹脂填充料、高功能性材料、及觸媒等,以後者的用途而言,可舉耐火物、添加劑、樹脂填充料、高功能性材料、電磁鋼板材料、及觸媒等。包含該等的用途,對氫氧化鎂及氧化鎂的要求:純度高,粒徑小,並且均勻的微粒子形態。Magnesium hydroxide and magnesium oxide are inorganic materials used in various fields, and the use of the former may be an additive, a resin filler, a highly functional material, a catalyst, etc., and the latter may be used. Refractories, additives, resin fillers, highly functional materials, electromagnetic steel sheet materials, and catalysts. Including such applications, requirements for magnesium hydroxide and magnesium oxide are high purity, small particle size, and uniform microparticle morphology.

就製造粒徑小且均勻的氫氧化鎂的方法而言,提案有:在含有氫氧化鎂的水溶液中,添加鹼物質,繼而添加界面活性劑,而藉此調製10nm至1000nm的氫氧化鎂微粒子的方法(參照專利文獻1)。但在具體例中鹼添加量多,由高壓釜容器溶出不純物,而有不純物混入的問題。In the method of producing magnesium hydroxide having a small particle size and uniformity, it is proposed to add an alkali substance in an aqueous solution containing magnesium hydroxide, followed by addition of a surfactant, thereby preparing magnesium hydroxide fine particles of 10 nm to 1000 nm. Method (refer to Patent Document 1). However, in a specific example, the amount of alkali added is large, and the impurities are eluted from the autoclave container, and there is a problem that impurities are mixed.

又,也提案有:於使氯化鎂與鹼物質在水性媒體中進行水熱反應(hydrothermal reaction)製造氫氧化鎂的方法中,添加硼酸、矽酸或該等的水可溶性鹽,而任意控制所得的氫氧化鎂的縱橫比的方法(參照專利文獻2),但是,在該方法中,有控制粒徑困難,無法得到均勻之粒徑的微粒子之問題。Further, it is also proposed to add boric acid, citric acid or such water-soluble salts to a method for producing magnesium hydroxide by hydrothermal reaction of magnesium chloride and an alkali substance in an aqueous medium, and arbitrarily control the obtained A method of an aspect ratio of magnesium hydroxide (see Patent Document 2). However, in this method, there is a problem that it is difficult to control the particle diameter, and it is impossible to obtain fine particles having a uniform particle diameter.

(先前技術文獻)(previous technical literature) (專利文獻)(Patent Literature)

(專利文獻1)日本特開2009-62214號公報(Patent Document 1) Japanese Patent Laid-Open Publication No. 2009-62214

(專利文獻2)日本特開2005-200300號公報(Patent Document 2) Japanese Patent Laid-Open Publication No. 2005-200300

本發明的目的是在解決上述問題,而提供粒徑小且均勻的高純度氫氧化鎂微粒子及高純度氧化鎂微粒子,以及該等微粒子的製造方法。An object of the present invention is to provide a high-purity magnesium hydroxide fine particle and a high-purity magnesium oxide fine particle having a small particle size and uniformity, and a method for producing the fine particle.

本發明是關於一種氫氧化鎂微粒子,其BET比表面積在5m2/g以上,雷射繞射散射式粒度分佈測定法所得的體積基準所得的累積50%粒徑(D50)在0.1至0.5μm,雷射繞射散射式粒度分佈測定法所得的體積基準的累積10%粒徑(D10)與體積基準的累積90%粒徑(D90)的比D90/D10為10以下,純度在99.5質量%以上者。The present invention relates to a magnesium hydroxide microparticle having a BET specific surface area of 5 m 2 /g or more, and a cumulative 50% particle diameter (D 50 ) obtained by a volumetric reference obtained by a laser diffraction scattering particle size distribution measurement of 0.1 to 0.5. [mu] m, a laser diffraction scattering particle size distribution measurement based on volume of the resulting cumulative 10% particle size (D 10) and the volume-based cumulative 90% particle size (D 90) of the ratio of D 90 / D 10 of 10 or less, The purity is 99.5 mass% or more.

又,本發明是關於一種氧化鎂微粒子,其BET比表面積在5m2/g以上,雷射繞射散射式粒度分佈測定法所得的體積基準的累積50%粒徑(D50)為0.1至0.5μm,雷射繞射散射式粒度分佈測定法所得的體積基準的累積10%粒徑(D10)與體積基準的累積90%粒徑(D90)的比D90/D10在10以下,純度在99.5質量%以上者。Further, the present invention relates to a magnesium oxide fine particle having a BET specific surface area of 5 m 2 /g or more, and a cumulative 50% particle diameter (D 50 ) of a volume basis obtained by a laser diffraction scattering particle size distribution measuring method of 0.1 to 0.5. [mu] m, a laser diffraction scattering particle size distribution measurement based on volume of the resulting cumulative 10% particle size (D 10) and the volume-based cumulative 90% particle size (D 90) of the ratio of D 90 / D 10 of 10 or less, The purity is 99.5 mass% or more.

再者,本發明是關於含有下列步驟的氫氧化鎂微粒子的製造方法:準備氯化鎂水溶液的步驟(A);使氯化鎂水溶液與1至18N的鹼性水溶液,以反應率101至210莫耳%反應,而獲得氫氧化鎂泥漿的步驟(B);將氫氧化鎂泥漿一面攪拌一面保持於101至200℃的溫度,獲得經水熱處理過的氫氧化鎂泥漿的步驟(C);以及將經水熱處理過的氫氧化鎂泥漿過濾、水洗及乾燥,而獲得氫氧化鎂微粒子的步驟(D)。Furthermore, the present invention relates to a process for producing magnesium hydroxide fine particles comprising the following steps: a step (A) of preparing an aqueous magnesium chloride solution; and reacting an aqueous magnesium chloride solution with an alkaline aqueous solution of 1 to 18 N at a reaction rate of 101 to 210 mol%. And obtaining the step (B) of the magnesium hydroxide slurry; maintaining the temperature of the magnesium hydroxide slurry at a temperature of 101 to 200 ° C while stirring, obtaining the step (C) of the hydrothermally treated magnesium hydroxide slurry; and passing the water The heat-treated magnesium hydroxide slurry is filtered, washed with water and dried to obtain a step (D) of magnesium hydroxide fine particles.

之外,本發明是關於含有下述步驟的氧化鎂微粒子的製造方法:將上述氫氧化鎂微粒子或由上述製造方法所獲得的氫氧化鎂微粒子,在大氣環境中,以500至1500℃煅燒的步驟(E)。In addition, the present invention relates to a method for producing magnesium oxide fine particles comprising the steps described above, wherein the magnesium hydroxide fine particles or the magnesium hydroxide fine particles obtained by the above production method are calcined at 500 to 1500 ° C in an atmospheric environment. Step (E).

本發明的氫氧化鎂微粒子及氧化鎂微粒子是高純度,粒徑小,且均勻,在各式各樣的領域中的有用性高。又,依本發明的製造方法可容易調製如上述的微粒子,便利性高。The magnesium hydroxide fine particles and the magnesium oxide fine particles of the present invention are high in purity, small in particle diameter, and uniform, and have high usefulness in various fields. Further, according to the production method of the present invention, the fine particles as described above can be easily prepared, and the convenience is high.

本發明的氫氧化鎂微粒子是BET比表面積在5m2/g以上,雷射繞射散射式粒度分佈測定的體積基準的累積50%粒徑(D50)為0.1至0.5μm,雷射繞射散射式粒度分佈測定的體積基準的累積10%粒徑(D10)與體積基準的累積90%粒徑(D90)的比D90/D10在10以下。如此的氫氧化鎂微粒子是粒子形狀小,有優異的反應牲,故適於添加劑,樹脂填充料,及觸媒等,又,粒子形狀小,粒度的變異少,有優異的分散性,所以對高功能性材料等也可適合使用。本發明的氫氧化鎂微粒子的BET比表面積較佳是10m2/g以上,D50較佳是0.2至0.5μm,D90/D10較佳是5以下。The magnesium hydroxide fine particles of the present invention have a BET specific surface area of 5 m 2 /g or more, and a cumulative 50% particle diameter (D 50 ) of a volume-based measurement by a laser diffraction scattering particle size distribution of 0.1 to 0.5 μm, laser diffraction scattering particle size distribution measurement of the volume-based cumulative 10% particle size (D 10) and the volume-based cumulative 90% particle size (D 90) of the ratio of D 90 / D 10 of 10 or less. Such magnesium hydroxide fine particles have a small particle shape and are excellent in reaction, so they are suitable for additives, resin fillers, catalysts, etc., and have small particle shapes, small variations in particle size, and excellent dispersibility. Highly functional materials and the like are also suitable for use. The magnesium hydroxide fine particles of the present invention preferably have a BET specific surface area of 10 m 2 /g or more, D 50 is preferably 0.2 to 0.5 μm, and D 90 /D 10 is preferably 5 or less.

本發明的氫氧化鎂微粒子的純度是在99.5質量%以上。若在該範圍,則極可抑制不純物的溶出,可適合使用於高功能性材料。本發明的氫氧化鎂微粒子的純度較佳是在99.9質量%以上。The purity of the magnesium hydroxide fine particles of the present invention is 99.5% by mass or more. When it is in this range, the elution of impurities can be suppressed extremely, and it can be suitably used for a highly functional material. The purity of the magnesium hydroxide fine particles of the present invention is preferably 99.9% by mass or more.

本說明書中,純度是設為測定對象微粒子中的不純物元素(Ag,Al,B,Ba,Bi,Cd,Cl,Co,Cr,Cu,Fe,Ga,In,K,Li,Mn,Mo,Na,Ni,P,Pb,S,Si,Sr,Tl,V,Zn,Ti及Zr)的含有量,並將該等的合計含有量由100質量%扣除的值。本說明書中,高純度是指以如上述方式算出的純度在99.5質量%以上者。In the present specification, the purity is an impurity element (Ag, Al, B, Ba, Bi, Cd, Cl, Co, Cr, Cu, Fe, Ga, In, K, Li, Mn, Mo, which is a particle to be measured). The content of Na, Ni, P, Pb, S, Si, Sr, Tl, V, Zn, Ti and Zr), and the total content of these is deducted from 100% by mass. In the present specification, the high purity means that the purity calculated as described above is 99.5% by mass or more.

做為測定對象的不純物元素(Ag,Al,B,Ba,Bi,Cd,Co,Cr,Cu,Fe,Ga,In,K,Li,Mn,Mo,Na,Ni,P,Pb,S,Si,Sr,Tl,V,Zn,Ti及Zr)是使用ICP發光分析裝置,將試料溶解於酸後,測定質量,Cl量是使用分光光度計,將試料溶解於酸後,測定質量的值。As the impurity element (Ag, Al, B, Ba, Bi, Cd, Co, Cr, Cu, Fe, Ga, In, K, Li, Mn, Mo, Na, Ni, P, Pb, S, which is the object of measurement) Si, Sr, Tl, V, Zn, Ti, and Zr) are obtained by dissolving a sample in an acid using an ICP emission spectrometer, and measuring the mass. The amount of Cl is measured by dissolving the sample in an acid using a spectrophotometer. .

本發明的氫氧化鎂微粒子是Fe,Ti,Ni,Cr,Mo及Mn的合計含有量在500質量ppm以下為較佳。該等的合計含有量在500質量ppm以下時,金屬不純物的溶出極受抑制,可適合使用於添加劑、樹脂填充料、高功能性材料。合計含有量較佳是在450質量ppm以下。The magnesium hydroxide fine particles of the present invention preferably have a total content of Fe, Ti, Ni, Cr, Mo, and Mn of 500 ppm by mass or less. When the total content of these is 500 ppm by mass or less, the elution electrode of the metal impurities is suppressed, and it can be suitably used for an additive, a resin filler, or a highly functional material. The total content is preferably 450 ppm by mass or less.

本發明的氫氧化鎂微粒子較佳是,氯的含有量在500質量ppm以下。當其含有量在500質量ppm以下時,則在藉煅燒而獲得氧化鎂微粒子時粒子成長極受抑制,而可獲得微細的氧化鎂粉末。含有量更佳是在450質量ppm以下。The magnesium hydroxide fine particles of the present invention preferably have a chlorine content of 500 ppm by mass or less. When the content is 500 ppm by mass or less, the particle growth is extremely suppressed when the magnesium oxide fine particles are obtained by calcination, and fine magnesium oxide powder can be obtained. The content is more preferably 450 mass ppm or less.

本發明的氫氧化鎂微粒子較佳是,體積基準平均粒徑(Dv)與個數基準的平均粒徑(Dn)之比Dv/Dn在1至10。當該Dv/Dn在1至10時,使用於印墨定影劑用途時有優異的印墨定影性,添加於樹脂等時的耐熱性、難燃性、彎曲性功能、及觸媒功能佳,且耐酸性,耐濕性良好。Dv/Dn更佳是在1至8。The magnesium hydroxide fine particles of the present invention preferably have a ratio Dv/Dn of a volume-based average particle diameter (Dv) to a number-based average particle diameter (Dn) of from 1 to 10. When the Dv/Dn is from 1 to 10, it has excellent ink fixing property when used for an ink fixing agent, and is excellent in heat resistance, flame retardancy, flexibility, and catalytic function when added to a resin or the like. It is also resistant to acid and has good moisture resistance. Dv/Dn is preferably from 1 to 8.

本發明的氧化鎂微粒子的BET比表面積在5m2/g以上,雷射繞射散射式粒度分佈測定所得的體積基準的累積50%粒徑(D50)為0.1至0.5μm,雷射繞射散射式粒度分佈測定所得的體積基準的累積10%粒徑(D10)與體積基準的累積90%粒徑(D90)之比D90/D10在10以下。如此的氧化鎂微粒子因粒子形狀小,且有優異的反應性,所以適於做為耐火物、添加劑、樹脂填充料、電磁鋼板材料、及觸媒等,又,由於粒子形狀小,粒度的變異少,有優異的分散性,所以可適合使用於高功能性材料等。The magnesium oxide fine particles of the present invention have a BET specific surface area of 5 m 2 /g or more, and a cumulative 50% particle diameter (D 50 ) of a volume basis obtained by laser diffraction scattering particle size distribution measurement is 0.1 to 0.5 μm, and laser diffraction The ratio of the cumulative 10% particle diameter (D 10 ) of the volume basis obtained by the scattering particle size distribution measurement to the cumulative 90% particle diameter (D 90 ) of the volume basis is D 90 /D 10 of 10 or less. Since such a magnesium oxide fine particle has a small particle shape and excellent reactivity, it is suitable as a refractory, an additive, a resin filler, an electromagnetic steel sheet material, a catalyst, etc., and also has a small particle size and a variation in particle size. It has few dispersibility and is suitable for use in highly functional materials.

本發明的氧化鎂微粒子的BET比表面積較佳是在20m2/g以上,更佳是在40m2/g以上,D50較佳是0.2至0.4μm,D90/D10較佳是在5以下。The Mn specific surface area of the magnesium oxide fine particles of the present invention is preferably 20 m 2 /g or more, more preferably 40 m 2 /g or more, D 50 is preferably 0.2 to 0.4 μm, and D 90 /D 10 is preferably 5 the following.

本發明的氧化鎂微粒子的純度在99.5質量%以上。在該範圍,則不純物的溶出將會極受抑制,可適合使用於高功能性材料。本發明的氧化鎂微粒子的純度較佳是在99.9質量%以上。The purity of the magnesium oxide fine particles of the present invention is 99.5% by mass or more. Within this range, the dissolution of impurities is extremely suppressed, and it is suitable for use in highly functional materials. The purity of the magnesium oxide fine particles of the present invention is preferably 99.9% by mass or more.

本發明的氧化鎂微粒子較佳是,Fe,Ti,Ni,Cr,Mo及Mn的合計含有量在500質量ppm以下。該等的合計含有量在500質量ppm以下時,則金屬不純物溶出會極受抑制,可適合使用於添加劑、樹脂填充料、高功能性材料。合計含有量較理想是在450質量ppm以下。The magnesium oxide fine particles of the present invention preferably have a total content of Fe, Ti, Ni, Cr, Mo, and Mn of 500 ppm by mass or less. When the total content of these is 500 ppm by mass or less, the elution of the metal impurities is extremely suppressed, and it can be suitably used for an additive, a resin filler, or a highly functional material. The total content is preferably 450 ppm by mass or less.

本發明的氧化鎂微粒子較佳是,氯的含有量在500質量ppm以下。該含有量在500質量ppm以下時則氯的溶出會極受抑制,可適合使用於添加劑、樹脂填充料、高功能性材料。含有量更佳是在450質量ppm以下。The magnesium oxide fine particles of the present invention preferably have a chlorine content of 500 ppm by mass or less. When the content is 500 ppm by mass or less, the elution of chlorine is extremely suppressed, and it can be suitably used for an additive, a resin filler, or a highly functional material. The content is more preferably 450 mass ppm or less.

本發明的氧化鎂微粒子較佳是,體積基準的平均粒徑(Dv)與個數基準的平均粒徑(Dn)之比Dv/Dn在1至10。該Dv/Dn在1至10時,則使用於印墨的定影劑用途時印墨的定影性,添加於樹脂等時有優異的耐熱性、難燃性、彎曲性功能、光的擴散效果、及觸媒效果佳,且耐酸性、耐濕性良好,更佳是1至8。The magnesium oxide fine particles of the present invention preferably have a ratio Dv/Dn of a volume-based average particle diameter (Dv) to a number-based average particle diameter (Dn) of from 1 to 10. When the Dv/Dn is from 1 to 10, the fixing property of the ink used in the fixing agent application of the ink is excellent, and when it is added to a resin or the like, it has excellent heat resistance, flame retardancy, flexibility, light diffusion effect, and It has good catalytic effect and good acid resistance and moisture resistance, and more preferably 1 to 8.

本發明的氧化鎂微粒子較佳是,檸檬酸活性度(最終反應率40%,20.0℃)在20至2000秒。該檸檬酸活性度在20至2000秒時,則與鐵的反應性優異,做為電磁鋼板材料,則可適合使用於電磁鋼板用絕緣材及壓粉鐵心用絕緣被膜材。檸檬酸活性度較佳是在20至500秒。本發明的氫氧化鎂微粒子是,藉由含有下述的步驟而可得:準備氯化鎂水溶液的步驟(A);使氯化鎂水溶液與1至18N的鹼性水溶液,以反應率101至210mol%反應,而獲得氫氧化鎂泥漿的步驟(B);將氫氧化鎂泥漿在攪拌中保持在101至200℃的溫度,而獲得經水熱處理過的氫氧化鎂泥漿的步驟(C);以及將經水熱處理過的氫氧化鎂泥漿過濾、水洗及乾燥,而獲得氫氧化鎂微粒子的步驟(D)。The magnesium oxide fine particles of the present invention preferably have a citric acid activity (final reaction rate of 40%, 20.0 ° C) of from 20 to 2000 seconds. When the citric acid activity is 20 to 2000 seconds, the reactivity with iron is excellent. When it is made of an electromagnetic steel sheet material, it can be suitably used for an insulating material for an electromagnetic steel sheet and an insulating coating material for a dust core. The citric acid activity is preferably from 20 to 500 seconds. The magnesium hydroxide fine particles of the present invention are obtained by the steps of: preparing a step (A) of preparing an aqueous magnesium chloride solution; and reacting an aqueous magnesium chloride solution with an aqueous alkaline solution of 1 to 18 N at a reaction rate of 101 to 210 mol%; And obtaining the step (B) of the magnesium hydroxide slurry; maintaining the magnesium hydroxide slurry at a temperature of 101 to 200 ° C under stirring to obtain the step (C) of the hydrothermally treated magnesium hydroxide slurry; and passing the water The heat-treated magnesium hydroxide slurry is filtered, washed with water and dried to obtain a step (D) of magnesium hydroxide fine particles.

步驟(A)是準備氯化鎂水溶液的步驟。氯化鎂水溶液較佳是濃度在0.1至10mol/L。當濃度未達0.1mol/L時,則生產效率不好。又,濃度比10mol/L高時則氫氧化鎂泥漿的粘度變高,操作性不好。氯化鎂水溶液的濃度較佳是0.5至5mol/L。Step (A) is a step of preparing an aqueous solution of magnesium chloride. The aqueous magnesium chloride solution is preferably present in a concentration of from 0.1 to 10 mol/L. When the concentration is less than 0.1 mol/L, the production efficiency is not good. Further, when the concentration is higher than 10 mol/L, the viscosity of the magnesium hydroxide slurry becomes high, and workability is not good. The concentration of the aqueous magnesium chloride solution is preferably from 0.5 to 5 mol/L.

步驟(A)是例如可含有下述的步驟:準備粗氯化鎂水溶液的步驟(A-1);使粗氯化鎂水溶液與1至18N的鹼性水溶液,以反應率1至30mol%反應,而獲得粗氫氧化鎂泥漿步驟(A-2);及在粗氫氧化鎂泥漿添加凝集劑後,將氫氧化鎂過濾,作為濾液而獲得氯化鎂溶液,或添加凝集劑使氫氧化鎂凝集沉澱,而作為上澄液獲得氯化鎂水溶液的步驟(A-3)。The step (A) is, for example, a step comprising the steps of: preparing a crude magnesium chloride aqueous solution (A-1); and reacting the crude magnesium chloride aqueous solution with an aqueous solution of 1 to 18 N at a reaction rate of 1 to 30 mol% to obtain a crude Magnesium hydroxide slurry step (A-2); and after adding a flocculating agent to the coarse magnesium hydroxide slurry, filtering magnesium hydroxide to obtain a magnesium chloride solution as a filtrate, or adding a coagulant to agglomerate and precipitate magnesium hydroxide, and The step (A-3) of obtaining an aqueous solution of magnesium chloride from the clear liquid.

步驟(A-1)是準備粗氯化鎂溶液的步驟。例如,在氯化鎂(以氯化鎂而言,可使用氯化鎂6水和物或無水氯化鎂,或,海水、鹼水、或苦汁)添加純水(通過離子交換樹脂而精製到電導度在0.1μS/cm以下的水)而藉此可製成粗氯化鎂水溶液。粗氯化鎂水溶液可作到濃度0.5至10mol/L,較佳是1至5mol/L,更佳是2至4mol/L。Step (A-1) is a step of preparing a crude magnesium chloride solution. For example, in magnesium chloride (in the case of magnesium chloride, magnesium chloride 6 water or anhydrous magnesium chloride, or sea water, alkaline water, or bitter juice) may be added with pure water (purified by ion exchange resin to have an electrical conductivity of 0.1 μS/cm or less). The water) can thereby be used to prepare a crude aqueous solution of magnesium chloride. The crude magnesium chloride aqueous solution can be used in a concentration of 0.5 to 10 mol/L, preferably 1 to 5 mol/L, more preferably 2 to 4 mol/L.

步驟(A-2)是對粗氯化鎂水溶液,使反應率成為1至30mol%之方式,與1至18N的鹼性水溶液反應,而獲得粗氫氧化鎂泥漿的步驟。反應率是指全部氯化鎂成為氫氧化鎂所需要的鹼量做為100mol%而算出的值。例如,200mol%是指2倍當量的鹼量之意。The step (A-2) is a step of obtaining a crude magnesium hydroxide slurry by reacting a crude magnesium chloride aqueous solution to a reaction rate of 1 to 30 mol% in an aqueous solution of 1 to 18 N. The reaction rate is a value calculated by making the amount of alkali required for all magnesium chloride to be magnesium hydroxide to be 100 mol%. For example, 200 mol% means 2 times the equivalent amount of alkali.

以鹼性水溶液而言,可使用氫氧化鈉水溶液,濃度可設在1至18mol/L,較佳是5至18mol/L,更佳是10至18mol/L。As the aqueous alkaline solution, an aqueous sodium hydroxide solution may be used, and the concentration may be set to 1 to 18 mol/L, preferably 5 to 18 mol/L, more preferably 10 to 18 mol/L.

步驟(A-3)是在粗氫氧化鎂泥漿添加凝集劑後,將氫氧化鎂過濾,做為濾液而獲得氯化鎂溶液,或添加凝集劑,使氫氧化鎂凝集沈澱,而做為上澄液而獲得氯化鎂水溶液的步驟。Step (A-3) is: after adding a flocculating agent to the coarse magnesium hydroxide slurry, filtering the magnesium hydroxide to obtain a magnesium chloride solution as a filtrate, or adding a flocculating agent to cause the magnesium hydroxide to aggregate and precipitate, and as a supernatant liquid And a step of obtaining an aqueous solution of magnesium chloride.

以凝集劑而言,可適宜選擇主成分為丙烯醯胺‧丙烯酸鈉共聚物,丙烯醯胺‧丙烯醯胺-2-甲基丙磺酸鈉共聚物,聚丙烯醯胺,烷胺基甲基丙烯酸第4級銨鹽聚合物,烷胺基丙烯酸第4級銨鹽‧丙烯醯胺共聚物,聚脒(polyamidine)鹽酸鹽等的凝集劑而使用,較佳為丙烯醯胺‧丙烯酸鈉共聚物。凝集劑的添加量是可設為對粗氫氧化鎂泥漿中的乾燥氫氧化鎂量的100至1000質量ppm。In the case of an aggregating agent, the main component is acrylamide, sodium acrylate copolymer, acrylamide, acrylamide-methyl 2-methylpropane sulfonate copolymer, polypropylene decylamine, alkylaminomethyl A fourth-stage ammonium salt polymer of acrylic acid, an alkylamino acrylate fourth-grade ammonium salt, an acrylamide copolymer, a polyamidine hydrochloride or the like, preferably a acrylamide/sodium acrylate copolymer. Things. The amount of the aggregating agent added may be set to 100 to 1000 ppm by mass based on the amount of dry magnesium hydroxide in the coarse magnesium hydroxide slurry.

將如此方式而獲得的氯化鎂水溶液的濃度予以調整,而可作成濃度0.1至10.0mol/L的氯化鎂水溶液。The concentration of the aqueous magnesium chloride solution obtained in this manner is adjusted to prepare an aqueous magnesium chloride solution having a concentration of 0.1 to 10.0 mol/L.

步驟(B)是使氯化鎂水溶液與1至18N的鹼性水溶液,以反應率101至210mol%反應,而獲得氫氧化鎂泥漿的步驟。當反應率未達101mol%時,則在氫氧化鎂泥漿的水熱處理中結晶成長過度,粒徑會變過大。又,當反應率比210mol%高時,則由高壓釜容器有特定元素(Fe,Ti,Ni,Cr,Mo及Mn)溶出而容易有不純物的混入。反應率較佳是103至200mol%,更佳是105至180mol%。The step (B) is a step of obtaining a magnesium hydroxide slurry by reacting an aqueous magnesium chloride solution with an alkaline aqueous solution of 1 to 18 N at a reaction rate of 101 to 210 mol%. When the reaction rate is less than 101 mol%, the crystal growth is excessive in the hydrothermal treatment of the magnesium hydroxide slurry, and the particle diameter becomes excessive. In addition, when the reaction rate is higher than 210 mol%, specific elements (Fe, Ti, Ni, Cr, Mo, and Mn) are eluted from the autoclave container, and impurities are likely to be mixed. The reaction rate is preferably from 103 to 200 mol%, more preferably from 105 to 180 mol%.

鹼性水溶液較佳是濃度1至18 mol/L的氫氧化鈉水溶液。當氫氧化鈉水溶液的濃度未達1mol/L時,則生產效率不好。又,濃度比18mol/L高時,則氫氧化鎂泥漿的粘度變高,操作性不好。氫氧化鈉水溶液的濃度較佳是,4至16mol/L。The alkaline aqueous solution is preferably an aqueous sodium hydroxide solution having a concentration of 1 to 18 mol/L. When the concentration of the aqueous sodium hydroxide solution is less than 1 mol/L, the production efficiency is not good. Further, when the concentration is higher than 18 mol/L, the viscosity of the magnesium hydroxide slurry becomes high, and workability is not good. The concentration of the aqueous sodium hydroxide solution is preferably 4 to 16 mol/L.

步驟(C)是將氫氧化鎂泥漿攪拌中,保持在101至200℃的溫度,而獲得經水熱處理過的氫氧化鎂泥漿的步驟。The step (C) is a step of obtaining a hydrothermally treated magnesium hydroxide slurry by stirring the magnesium hydroxide slurry at a temperature of from 101 to 200 °C.

水熱處理是將氫氧化鎂泥漿,例如可使用高壓釜,在101℃至200℃下,在攪拌中保持而實施。當水熱處理溫度比101℃低時則結晶不成長,生成凝集粒子而分散不好。又水熱處理溫度比200℃高時則結晶過度成長,粒徑有變過大的傾向。水熱處理溫度較佳是在105至150℃。水熱處理時間可設在0.5至3小時。當水熱處理時間在此範圍時,則可將結晶成長及粒徑控制在適切的範圍。水熱處理時間較佳是1至2小時。The hydrothermal treatment is carried out by holding a magnesium hydroxide slurry, for example, using an autoclave at 101 ° C to 200 ° C while stirring. When the hydrothermal treatment temperature is lower than 101 ° C, the crystal does not grow, and aggregated particles are formed and the dispersion is not good. When the hydrothermal treatment temperature is higher than 200 ° C, the crystal growth excessively increases, and the particle diameter tends to become excessively large. The hydrothermal treatment temperature is preferably from 105 to 150 °C. The hydrothermal treatment time can be set at 0.5 to 3 hours. When the hydrothermal treatment time is within this range, the crystal growth and the particle diameter can be controlled within an appropriate range. The hydrothermal treatment time is preferably from 1 to 2 hours.

為了要得到具有均勻的粒徑之穩定的微粒子,若有需要則亦可投入純水而將賦予水熱處理的氫氧化鎂泥漿的濃度調節在30g/L至150g/L即可。In order to obtain stable fine particles having a uniform particle diameter, pure water may be added if necessary, and the concentration of the magnesium hydroxide slurry to be hydrothermally treated may be adjusted to 30 g/L to 150 g/L.

步驟(D)是將水熱處理過的氫氧化鎂泥漿過濾、水洗,及乾燥,而獲得氫氧化鎂微粒子的步驟。The step (D) is a step of filtering the hydrothermally treated magnesium hydroxide slurry, washing with water, and drying to obtain magnesium hydroxide fine particles.

步驟(D)是可含有例如:將水熱處理過的氫氧化鎂泥漿過濾、水洗,而獲得第一的氫氧化鎂泥餅(cake)的步驟(D-1);在第一的氫氧化鎂泥餅,加入對於乾燥氫氧化鎂質量基準量為5至100倍的純水,攪拌後,過濾、水洗而獲得第二的氫氧化鎂泥餅的步驟(D-2);代替第一的氫氧化鎂泥餅,而對第二的氫氧化鎂泥餅,將步驟(D-2)反覆1至20次,獲得高純度氫氧化鎂泥餅的步驟(D-3);及將高純度氫氧化鎂泥餅乾燥,而獲得氫氧化鎂微粒子的步驟(D-4)。The step (D) is a step (D-1) which may contain, for example, filtering and water-washing the hydrothermally treated magnesium hydroxide slurry to obtain a first magnesium hydroxide cake; the first magnesium hydroxide a mud cake, which is added to the pure magnesium hydroxide mass reference amount of 5 to 100 times, stirred, filtered, washed with water to obtain a second magnesium hydroxide cake (D-2); instead of the first hydrogen a magnesium oxide mud cake, and the second magnesium magnesium mud cake, step (D-2) is repeated 1 to 20 times to obtain a high-purity magnesium hydroxide mud cake step (D-3); and high-purity hydrogen The step (D-4) of drying the magnesium oxide cake to obtain magnesium hydroxide fine particles.

步驟(D-1)是將水熱處理過的氫氧化鎂泥漿過濾、水洗,藉此而獲得第一的氫氧化鎂泥餅的步驟。水洗是在過濾後對乾燥氫氧化鎂投入其質量基準的5至100倍,較佳是20至50倍的純水而實施。The step (D-1) is a step of obtaining a first magnesium hydroxide cake by filtering and washing the hydrothermally treated magnesium hydroxide slurry. The water washing is carried out by filtering the dried magnesium hydroxide into 5 to 100 times, preferably 20 to 50 times, the pure water based on the mass basis.

步驟(D-2)是在第一的氫氧化鎂泥餅,加入對於乾燥氫氧化鎂質量基準量的5至100倍的純水,攪拌後、過濾、水洗,而獲得第二的氫氧化鎂泥餅的步驟,是碎漿(repulping)洗浄的步驟。在該步驟中,例如,對第一的氫氧化鎂泥餅投入以乾燥氫氧化鎂質量基準計為5至100倍的純水,獲得第二的氫氧化鎂泥漿,將該第二的氫氧化鎂泥漿,攪拌後,過濾、水洗,而獲得第二的氫氧化鎂泥餅。攪拌是,例如,可在10至50℃,以100至800rpm的旋轉速度實施0.5至5小時。攪拌結束後,過濾是可使用濾紙等而實施,水洗是可投入對於乾燥氫氧化鎂質量基準之5至100倍的純水而實施。Step (D-2) is the first magnesium hydroxide mud cake, adding 5 to 100 times of pure water for the dry magnesium hydroxide mass basis amount, stirring, filtering, and washing with water to obtain a second magnesium hydroxide. The step of the mud cake is the step of repulping the washing. In this step, for example, the first magnesium hydroxide cake is put into pure water of 5 to 100 times based on the mass of the dry magnesium hydroxide to obtain a second magnesium hydroxide slurry, and the second hydrogen peroxide is obtained. The magnesium slurry was stirred, filtered, and washed with water to obtain a second magnesium hydroxide cake. The stirring is, for example, carried out at 10 to 50 ° C for 0.5 to 5 hours at a rotational speed of 100 to 800 rpm. After the completion of the stirring, the filtration can be carried out using a filter paper or the like, and the water washing can be carried out by adding pure water of 5 to 100 times the mass of the dried magnesium hydroxide.

步驟(D-3)是代替第一的氫氧化鎂泥餅,而對第二的氫氧化鎂泥餅,將步驟(D-2)的碎漿清洗做為1次,而將此反覆1至20次,而獲得高純度氫氧化鎂泥餅的步驟。Step (D-3) is to replace the first magnesium hydroxide cake, and for the second magnesium hydroxide cake, the pulp of step (D-2) is washed once, and this is repeated 1 to 20 steps to obtain a high-purity magnesium hydroxide cake.

步驟(D-4)是將高純度氫氧化鎂泥餅乾燥,而獲得氫氧化鎂微粒子的步驟。The step (D-4) is a step of drying a high-purity magnesium hydroxide cake to obtain magnesium hydroxide fine particles.

如此,可獲得本發明的氫氧化鎂粒子。Thus, the magnesium hydroxide particles of the present invention can be obtained.

本發明的氧化鎂微粒子是,在步驟(E)中將本發明的氫氧化鎂徵粒子,在大氣環境中,以500至1200℃煅燒而獲得。The magnesium oxide fine particles of the present invention are obtained by calcining the magnesium hydroxide particles of the present invention in an air atmosphere at 500 to 1200 ° C in the step (E).

在該步驟中,例如,將氫氧化鎂微粒子在大氣環境中,以昇溫速度1至20℃/分(較佳是3至10℃/分,更佳是6℃/分)昇溫到500℃至1120℃,較佳是到600℃至800℃,昇溫後,在500℃至1200℃,較佳是在600至800℃煅燒0.1至5小時,藉此而可獲得本發明的氧化鎂微粒子。又,將在步驟(D-3)所獲得的高純度氫氧化鎂泥餅乾燥,輕輕地解鬆後,再做上述的煅燒處理也可以。In this step, for example, the magnesium hydroxide fine particles are heated to 500 ° C in an atmosphere at a temperature increase rate of 1 to 20 ° C / min (preferably 3 to 10 ° C / min, more preferably 6 ° C / min). The magnesium oxide fine particles of the present invention can be obtained at 1120 ° C, preferably at 600 ° C to 800 ° C, after heating, at 500 ° C to 1200 ° C, preferably at 600 to 800 ° C for 0.1 to 5 hours. Further, the high-purity magnesium hydroxide mud cake obtained in the step (D-3) is dried, gently loosened, and then subjected to the above calcination treatment.

如此,容易調製高純度而粒徑小,且均勻的氫氧化鎂微粒子及氧化鎂微粒子。Thus, it is easy to prepare magnesium hydroxide fine particles and magnesium oxide fine particles having high purity and small particle diameter and uniformity.

本發明的氫氧化鎂徵粒子及氧化鎂微粒子是,在各式各樣的領域中的有用性高。例如就氫氧化鎂微粒子的用途而言,可列舉:做為添加劑,可用在噴墨用紙的印墨定影劑等,做為樹脂填充料,可用在二次電池用的分隔耐熱層的原料、難燃劑、膜薄片的改質劑(耐熱性、彎曲性提升)等,做為高功能性材料,可用在燃料電池用陶瓷的原料、螢光體原料、超傳導薄膜底材用的原料,穿隧磁阻(TMR,tunnel magnetoresistance)元件用的隧道屏障(tunnel barrier)原料等,做為觸媒,可使用在排水處理,及排氣處理等。又,就氧化鎂微粒子的用途而言,可舉高功能性材料、及觸媒等。又,氧化鎂微粒子在活用其高活性之情形下,做為耐火物,可用在陶瓷燒結助劑等,做為添加劑,可用在噴墨用紙的印墨定影劑等,做為樹脂填充料,可用在二次電池用的分隔耐熱層的原料、膜薄片的改質劑(耐熱性,彎曲性提升)等,做為高功能性村料,可用在LED密封樹脂的折射率調整劑、光擴散劑、燃料電池用陶瓷的原料、螢光體原料、超傳導薄膜底材用的原料、穿隧磁阻元件(TMR element)用的隧道屏障原料等,做為電磁鋼板材料,可用在電磁鋼板用絕緣材的原料、壓粉鐵心用絕緣被膜材等,做為觸媒,可用在排水處理,及排氣處理等用。The magnesium hydroxide particles and magnesium oxide fine particles of the present invention have high usefulness in various fields. For example, as the use of the magnesium hydroxide fine particles, an ink fixing agent which can be used as an additive for inkjet paper can be used as a resin filler, and it can be used as a raw material for separating a heat-resistant layer for a secondary battery. As a highly functional material, it can be used as a material for ceramics for fuel cells, a raw material for phosphors, and a material for superconducting film substrates. The tunnel barrier material used for the TMR (tunnel magnetoresistance) component can be used as a catalyst for drainage treatment and exhaust treatment. Moreover, as for the use of the magnesium oxide fine particles, a highly functional material, a catalyst, etc. are mentioned. Further, the magnesium oxide fine particles can be used as a refractory in the case of utilizing their high activity, and can be used as a ceramic sintering aid or the like as an additive, and can be used as an ink filling agent for inkjet paper as a resin filler. The raw material for separating the heat-resistant layer for the secondary battery, the modifier (heat resistance, and improved flexibility) of the film sheet, etc., as a highly functional village material, can be used as a refractive index adjuster and a light diffusing agent for the LED sealing resin. , raw materials for ceramics for fuel cells, raw materials for phosphors, raw materials for superconducting thin film substrates, tunnel barrier materials for tunneling magnetoresistive elements (TMR elements), etc., as electromagnetic steel sheet materials, can be used for insulation of electromagnetic steel sheets. The raw material of the material, the insulating coating material for the powdered iron core, etc., can be used as a catalyst for drainage treatment and exhaust treatment.

[實施例][Examples]

以下,就本發明,藉實施例更詳細說明。但本發明是不受這些實施例所限定。Hereinafter, the present invention will be described in more detail by way of examples. However, the invention is not limited by these examples.

所獲得的氫氧化鎂微粒子及氧化鎂微粒子的粒徑、比表面積、純度及活性度是以下述的方法測定。The particle diameter, specific surface area, purity, and activity of the obtained magnesium hydroxide fine particles and magnesium oxide fine particles were measured by the following methods.

(1)雷射繞射散射式粒度分佈測定(1) Laser diffraction scattering particle size distribution measurement

使用雷射繞射散射式粒度分佈測定裝置(商品名:MT3300,日機裝公司製),測定體積基準的累積10%粒徑(D10),體積基準的累積50%粒徑(D50)及體積基準的累積90%粒徑(D90)。體積基準的平均粒徑(Dv)及個數基準的平均粒徑(Dn)也同樣以上述裝置測定。Using a laser diffraction scattering type particle size distribution measuring apparatus (trade name: MT3300, manufactured by Nikkiso Co., Ltd.), the cumulative 10% particle diameter (D 10 ) of the volume basis was measured, and the cumulative 50% particle diameter (D 50 ) of the volume basis was measured. And cumulative volume 90% particle size (D 90 ). The volume-based average particle diameter (Dv) and the number-based average particle diameter (Dn) were also measured by the above apparatus.

(2)BET比表面積測定法(2) BET specific surface area measurement method

使用比表面積測定裝置(商品名:Macsorb1210,<Mounteck公司製),以氣體吸附法的BET法測定比表面積。The specific surface area was measured by a BET method by a gas adsorption method using a specific surface area measuring device (trade name: Macsorb 1210, manufactured by Mounteck Co., Ltd.).

(3)氫氧化鎂及氧化鎂不純物元素的質量測定法(3) Determination of the impurities of magnesium hydroxide and magnesium oxide impurities

測定對象的不純物元素(Ag,Al,B,Ba,Bi,Cd,Co,Cr,Cu,Fe,Ga,In,K,Li,Mn,Mo,Na,Ni,P,Pb,S,Si,Sr,Tl,V,Zn,Ti及Zr)是使用ICP發光分析裝置(商品名:SPS-5100,Seiko Instruments公司製),將試料溶解於酸後,測定質量。Determination of impurity elements (Ag, Al, B, Ba, Bi, Cd, Co, Cr, Cu, Fe, Ga, In, K, Li, Mn, Mo, Na, Ni, P, Pb, S, Si, Sr, Tl, V, Zn, Ti and Zr) were measured by dissolving the sample in an acid using an ICP emission spectrometer (trade name: SPS-5100, manufactured by Seiko Instruments Co., Ltd.).

Cl量是使用分光光度計(商品名:UV-2550,島津製作所公司製),將試料溶解於酸後,測定質量。The amount of Cl was measured by dissolving a sample in an acid using a spectrophotometer (trade name: UV-2550, manufactured by Shimadzu Corporation).

(4)純度測定法(4) Purity determination method

氫氧化鎂及氧化鎂微粒子的純度是,由100質量%減去以上述的「氫氧化鎂及氧化鎂不純物量測定法」所測定的不純物元素的質量的合計做為測定值而算出。The purity of the magnesium hydroxide and the magnesium oxide fine particles is calculated by subtracting the total mass of the impurity element measured by the above-described "measurement method of magnesium hydroxide and magnesium oxide impurities" by 100% by mass.

(5)檸檬酸活性度(40%)測定方法(5) Method for determining citric acid activity (40%)

以0.4N檸檬酸水溶液100ml相當於氧化鎂的中和量之40%的方式秤取氧化鎂微粒子2.02 g,在30℃下攪拌該檸檬酸水溶液中,加入該氧化鎂微粒子,測定全部檸檬酸與氧化鎂反應的時間,即測定超過pH7所需的時間。2.02 g of magnesium oxide fine particles were weighed in such a manner that 100 ml of 0.4 N aqueous citric acid solution corresponded to 40% of the neutralization amount of magnesium oxide, and the citric acid aqueous solution was stirred at 30 ° C, and the magnesium oxide fine particles were added to measure all citric acid and The time during which the magnesium oxide reacts, i.e., the time required to exceed pH 7.

(實施例1)(Example 1)

做為粗氯化鎂水溶液,而準備純度90質量%以上,濃度3.5mol/L的水溶液。在該氯化鎂水溶液添加純水(透過離子交換樹脂而精製成電導率在0.1μS/cm以下的水)而調整濃度,成為濃度2.0 mol/L的粗氯化鎂水溶液。As a crude magnesium chloride aqueous solution, an aqueous solution having a purity of 90% by mass or more and a concentration of 3.5 mol/L was prepared. Pure water (purified by ion exchange resin to obtain water having an electric conductivity of 0.1 μS/cm or less) was added to the aqueous magnesium chloride solution to adjust the concentration to obtain a crude magnesium chloride aqueous solution having a concentration of 2.0 mol/L.

其次,對濃度2.0 mol/L的粗氯化鎂水溶液,添加濃度17.84mol/L的氫氧化鈉水溶液俾使反應率為20mol%而反應,再者,做為凝集劑將丙烯醯胺‧丙烯酸鈉共聚物,對生成氫氧化鎂添加500質量ppm,使氫氧化鎂凝集沈澱,取出上澄液,藉此而獲得氯化鎂水溶液。Next, a solution of a crude magnesium chloride solution having a concentration of 2.0 mol/L was added to a sodium hydroxide aqueous solution having a concentration of 17.84 mol/L to cause a reaction rate of 20 mol%, and further, as a coagulant, a propylene amide amine/sodium acrylate copolymer was used. 500 ppm by mass of magnesium hydroxide was formed, and magnesium hydroxide was agglomerated and precipitated, and the supernatant liquid was taken out, thereby obtaining an aqueous magnesium chloride solution.

調整所獲得的氯化鎂水溶液的濃度,作成為濃度2.0 mol/L的氯化鎂水溶液。將該氯化鎂水溶液,與濃度17.84mol/L的氫氧化鈉水溶液反應,俾使反應率成為200mol%,調製濃度100g/L的氫氧化鎂泥漿。The concentration of the obtained aqueous magnesium chloride solution was adjusted to obtain a magnesium chloride aqueous solution having a concentration of 2.0 mol/L. The aqueous magnesium chloride solution was reacted with an aqueous sodium hydroxide solution having a concentration of 17.84 mol/L, and the reaction rate was made 200 mol% to prepare a magnesium hydroxide slurry having a concentration of 100 g/L.

將所獲得的氫氧化鎂泥漿使用高壓釜在保持150℃下攪拌1小時,實施水熱處理(加熱攪拌處理)。將水熱處理過的第一的氫氧化鎂泥漿過濾,水洗而藉此獲得第一的氫氧化鎂泥餅。水洗是在過濾之後,投入相對於乾燥氫氧化鎂以質量基準計為40倍的純水而實施。The obtained magnesium hydroxide slurry was stirred at 150 ° C for 1 hour using an autoclave, and subjected to hydrothermal treatment (heating and stirring treatment). The hydrothermally treated first magnesium hydroxide slurry was filtered and washed with water to obtain a first magnesium hydroxide cake. The water washing was carried out by adding pure water which was 40 times by mass based on the mass of the dry magnesium hydroxide after the filtration.

其次,對所獲得的第一的氫氧化鎂泥餅實施碎漿清洗。在碎漿清洗中,首先,投入相對於第一的氫氧化鎂泥餅的乾燥氫氧化鎂以質量基準計為40倍的純水,而獲得第二的氫氧化鎂泥漿。其次,將該第二的氫氧化鎂泥漿,在常溫下使用攪拌裝置,以500rpm的旋轉速度攪拌1小時,再將攪拌結束後的第二的氫氧化鎂泥漿,使用濾紙過濾,將相對於乾燥氫氧化鎂以質量基準計為20倍的純水,在過濾後予以投入,水洗,而獲得第二的氫氧化鎂泥餅。將上述的碎漿清洗作為1次,再將碎漿清洗反覆10次,藉此獲得高純度氫氧化鎂泥餅。將高純度氫氧化鎂泥餅乾燥,獲得高純度氫氧化鎂微粒子。Next, the first magnesium hydroxide cake obtained was subjected to pulp washing. In the pulp washing, first, 40 parts of pure water based on the mass of the dry magnesium hydroxide relative to the first magnesium hydroxide cake was charged to obtain a second magnesium hydroxide slurry. Next, the second magnesium hydroxide slurry was stirred at a rotation speed of 500 rpm for 1 hour at a normal temperature using a stirring device, and the second magnesium hydroxide slurry after the completion of the stirring was filtered using a filter paper to be dried. Magnesium hydroxide was purified by 20 times of pure water on a mass basis, and after filtration, it was put into water and washed to obtain a second magnesium hydroxide cake. The above-mentioned pulp was washed once, and the pulp was washed 10 times to thereby obtain a high-purity magnesium hydroxide cake. The high-purity magnesium hydroxide mud cake is dried to obtain high-purity magnesium hydroxide microparticles.

(實施例2)(Example 2)

氯化鎂水溶液與氫氧化鈉水溶液的反應中的反應率改為120mol%,水熱處理時間改為0.5小時以外,與實施例1同樣實施。The reaction rate in the reaction between the aqueous magnesium chloride solution and the aqueous sodium hydroxide solution was changed to 120 mol%, and the hydrothermal treatment time was changed to 0.5 hour, and the same procedure as in Example 1 was carried out.

(實施例3)(Example 3)

氯化鎂水溶液與氫氧化鈉水溶液的反應中的反應率改為105mol%,水熱處理時間改為3小時以外,與實施例1同樣實施。The reaction rate in the reaction between the aqueous magnesium chloride solution and the aqueous sodium hydroxide solution was changed to 105 mol%, and the hydrothermal treatment time was changed to 3 hours, and the same procedure as in Example 1 was carried out.

(實施例4)(Example 4)

水熱處理溫度改為130℃,氫氧化鈉水溶液以純水稀釋為8.92mol/L以外,與實施例1同樣實施。The hydrothermal treatment temperature was changed to 130 ° C, and the aqueous sodium hydroxide solution was diluted to 8.92 mol/L with pure water, and was carried out in the same manner as in Example 1.

(實施例5)(Example 5)

水熱處理溫度改為105℃,將要做水熱處理的氫氧化鎂泥漿改為130g/L以外,與實施例1同樣實施。The hydrothermal treatment temperature was changed to 105 ° C, and the magnesium hydroxide slurry to be hydrothermally treated was changed to 130 g/L, and the same procedure as in Example 1 was carried out.

(實施例6)(Example 6)

將氫氧化鈉水溶液以純水稀釋為4.96mol/L以外,與實施例1同樣實施。The same procedure as in Example 1 was carried out except that the aqueous sodium hydroxide solution was diluted to 4.96 mol/L with pure water.

(實施例7)(Example 7)

將要做水熱處理的氫氧化鎂泥漿以純水稀釋,作成為50g/L以外,與實施例1同樣實施。The magnesium hydroxide slurry to be hydrothermally treated was diluted with pure water to obtain 50 g/L, and was carried out in the same manner as in Example 1.

(比較例1)(Comparative Example 1)

氯化鎂水溶液與氫氧化鈉水溶液的反應中的反應率改為250 mol%以外,與實施例1同樣實施。The reaction rate in the reaction between the aqueous magnesium chloride solution and the aqueous sodium hydroxide solution was changed to 250 mol%, and the same procedure as in Example 1 was carried out.

(比較例2)(Comparative Example 2)

氯化鎂水溶液與氫氧化鈉水溶液的反應中的反應率改為90mol%以外,與實施例1同樣實施。The reaction rate in the reaction between the aqueous magnesium chloride solution and the aqueous sodium hydroxide solution was changed to 90 mol%, and the same procedure as in Example 1 was carried out.

(比較例3)(Comparative Example 3)

氯化鎂水溶液與氫氧化鈉水溶液的反應中的反應率改為105mol%,沒有實施水熱處理以外,與實施例1同樣實施。The reaction rate in the reaction between the aqueous magnesium chloride solution and the aqueous sodium hydroxide solution was changed to 105 mol%, and the same procedure as in Example 1 was carried out except that the hydrothermal treatment was not carried out.

(比較例4)(Comparative Example 4)

將氫氧化鈉水溶液以純水作成為21mol/L以外,與實施例1同樣實施。The same procedure as in Example 1 was carried out except that the aqueous sodium hydroxide solution was 21 mol/L in pure water.

(實施例8)(Example 8)

將在實施例1作成的氫氧化鎂微粒子,在大氣環境中,以1000℃煅燒1小時,藉此而獲得氧化鎂微粒子。The magnesium hydroxide fine particles prepared in Example 1 were calcined at 1000 ° C for 1 hour in an air atmosphere to obtain magnesium oxide fine particles.

(實施例9)(Example 9)

將在實施例3作成的氫氧化鎂微粒子,在大氣環境中,以600℃煅燒1小時,藉此而獲得氧化鎂微粒子。The magnesium hydroxide fine particles prepared in Example 3 were calcined at 600 ° C for 1 hour in an air atmosphere to obtain magnesium oxide fine particles.

(比較例5)(Comparative Example 5)

將實施例1作成的氫氧化鎂微粒子,在大氣環境中,以1400℃煅燒1小時,藉此而獲得氧化鎂微粒子。The magnesium hydroxide fine particles prepared in Example 1 were calcined at 1400 ° C for 1 hour in an air atmosphere to obtain magnesium oxide fine particles.

藉由以上的實施例及比較例所獲得的關於氫氧化鎂微粒子的測定結果示於第1表,將關於氧化鎂微粒子的測定結束,示於第2表。The measurement results of the magnesium hydroxide fine particles obtained by the above examples and comparative examples are shown in the first table, and the measurement of the magnesium oxide fine particles was completed, and it is shown in the second table.

實施例的氫氧化鎂微粒子及氧化鎂微粒子,均是純度在99.9質量%以上,粒徑小,且均勻。The magnesium hydroxide fine particles and the magnesium oxide fine particles of the examples all had a purity of 99.9% by mass or more, and the particle diameter was small and uniform.

(產業上的利用可能性)(industrial use possibility)

本發明的氫氧化鎂微粒子及氧化鎂微粒子是高純度,粒徑小,且均勻,分散性好(粒度分佈窄小(sharp)),故在各式各樣的領域中的有用性高。又,依本發明的製造法,可容易調製如上述的微粒子,便利性高。例如以氫氧化鎂微粒子的用途而言,可舉添加劑、樹脂填充料、高功能性材料,及觸媒等。The magnesium hydroxide fine particles and the magnesium oxide fine particles of the present invention have high purity, are small in particle size, are uniform, and have good dispersibility (sharp shape distribution), and thus have high usefulness in various fields. Further, according to the production method of the present invention, the fine particles as described above can be easily prepared, and the convenience is high. For example, examples of the use of the magnesium hydroxide fine particles include additives, resin fillers, highly functional materials, and catalysts.

具體而言,可使用於:做為添加劑,有噴墨用紙的印墨定影劑等;做為樹脂填充料,有二次電池用的分隔耐熱層的原料、難燃劑、膜薄片的改質劑(耐熱性,彎曲性提升)等;做為高功能性材料,有燃料電池用陶瓷的原料、螢光體原料、超傳導薄膜底材用的原料、穿隧磁阻元件(TMR元件)用的隧道屏障原料等,做為觸媒,有排水處理、及排氣處理等的用途。Specifically, it can be used as an additive, an ink fixing agent for inkjet paper, etc.; as a resin filler, there is a material for separating a heat-resistant layer for a secondary battery, a flame retardant, and a film sheet. For the high-performance materials, there are raw materials for ceramics for fuel cells, raw materials for fluorescent materials, raw materials for superconducting thin film substrates, and devices for tunneling magnetoresistive elements (TMR elements). The use of the tunnel barrier material, etc., as a catalyst, drainage treatment, and exhaust treatment.

又,以氧化鎂微粒子的用途而言,可舉:耐火物、添加劑、樹脂填充料、高功能性材料、電磁鋼板材料及觸媒等。Further, examples of the use of the magnesium oxide fine particles include refractories, additives, resin fillers, highly functional materials, electromagnetic steel sheet materials, and catalysts.

具體而言,可使用於:做為耐火物,有陶瓷燒結助劑等,做為添加劑,有噴墨用紙的印墨定影劑等;做為樹脂填充劑,有二次電池用的分隔耐熱層的原料、膜薄片的改質劑(耐熱性,彎曲性提升)等;做為高功能性材料,有LED密封樹脂的折射率調整劑、光擴散劑、燃料電池用陶瓷的原料、螢光體原料、超傳導薄膜底材用的原料、穿隧磁阻元件(TMR元件)用的隧道屏障原料等;做為電磁鋼板材料,有電磁鋼板用絕緣材的原料、壓粉鐵心用絕緣被膜材等,做為觸媒,有排水處理、及排氣處理等的用途。Specifically, it can be used as a refractory, a ceramic sintering aid, etc., as an additive, an ink fixing agent for inkjet paper, etc.; as a resin filler, a heat-resistant layer for a secondary battery Raw material, film sheet modifier (heat resistance, improved flexibility), etc.; as a highly functional material, there are LED sealing resin refractive index modifier, light diffusing agent, fuel cell ceramic raw material, phosphor Raw material, raw material for superconducting film substrate, tunnel barrier material for tunneling magnetoresistive element (TMR element), etc.; as material for electromagnetic steel sheet, raw material for insulating material for electromagnetic steel sheet, insulating coating for powdered iron core, etc. As a catalyst, it has applications such as drainage treatment and exhaust treatment.

Claims (13)

一種氫氧化鎂微粒子的製造方法,係包含如下的步驟:準備氯化鎂水溶液的步驟(A);使氯化鎂水溶液與1至18N的鹼性水溶液,以反應率101至210mol%反應,而獲得氫氧化鎂泥漿的步驟(B);將氫氧化鎂泥漿一面攪拌一面保持於101至200℃的溫度,獲得水熱處理過的氫氧化鎂泥漿的步驟(C);以及將水熱處理過的氫氧化鎂泥漿過濾、水洗及乾燥,而獲得氫氧化鎂微粒子的步驟(D),其中,步驟(A)係含有如下述的步驟:準備粗氯化鎂水溶液的步驟(A-1);使粗氯化鎂水溶液與1至18N的鹼性水溶液,以反應率1至30mol%反應,而獲得粗氫氧化鎂泥漿的步驟(A-2);及在粗氫氧化鎂泥漿添加凝集劑後,將氫氧化鎂過濾,作為濾液而獲得氯化鎂溶液,或添加凝集劑,使氫氧化鎂凝集沉澱,而作為上澄液獲得氯化鎂水溶液的步驟(A-3),其中,步驟(D)含有如下步驟:將水熱處理過的氫氧化鎂泥漿過濾、水洗,而獲得第一的氫氧化鎂泥餅的步驟(D-1);在第一的氫氧化鎂泥餅中,添加相對於乾燥氫氧 化鎂質量基準量為5至100倍的純水,攪拌後,過濾、水洗而獲得第二的氫氧化鎂泥餅的步驟(D-2);代替第一的氫氧化鎂泥餅,而對第二的氫氧化鎂泥餅,將步驟(D-2)反覆1至20次,獲得高純度氫氧化鎂泥餅的步驟(D-3);及將高純度氫氧化鎂泥餅乾燥,而獲得氫氧化鎂微粒子的步驟(D-4)。 A method for producing magnesium hydroxide fine particles, comprising the steps of: preparing a magnesium chloride aqueous solution (A); and reacting an aqueous magnesium chloride solution with an alkaline aqueous solution of 1 to 18 N at a reaction rate of 101 to 210 mol% to obtain magnesium hydroxide. a slurry step (B); a step (C) of obtaining a hydrothermally treated magnesium hydroxide slurry by maintaining a magnesium hydroxide slurry while maintaining a temperature of 101 to 200 ° C; and filtering the hydrothermally treated magnesium hydroxide slurry And washing and drying to obtain magnesium hydroxide fine particles in the step (D), wherein the step (A) comprises the steps of: preparing the crude magnesium chloride aqueous solution (A-1); and making the crude magnesium chloride aqueous solution and 1 to 18N The alkaline aqueous solution is reacted at a reaction rate of 1 to 30 mol% to obtain a step (A-2) of the crude magnesium hydroxide slurry; and after the addition of the aggregating agent to the coarse magnesium hydroxide slurry, the magnesium hydroxide is filtered to serve as a filtrate. Obtaining a magnesium chloride solution, or adding a coagulant to agglomerate the magnesium hydroxide, and obtaining a magnesium chloride aqueous solution as a supernatant liquid (A-3), wherein the step (D) comprises the following steps: hydrothermally treating the hydroxide The magnesium mud slurry is filtered and washed to obtain the first magnesium hydroxide mud cake step (D-1); in the first magnesium hydroxide mud cake, added with respect to the dry hydrogen oxide a magnesium-based mass reference amount of 5 to 100 times pure water, after stirring, filtering, washing with water to obtain a second magnesium hydroxide cake (D-2); instead of the first magnesium hydroxide cake, a second magnesium hydroxide cake, the step (D-2) is repeated 1 to 20 times to obtain a high-purity magnesium hydroxide cake (D-3); and the high-purity magnesium hydroxide cake is dried, and The step (D-4) of obtaining magnesium hydroxide fine particles. 如申請專利範圍第1項所述的製造方法,係得到其BET比表面積在5m2/g以上,雷射繞射散射式粒度分佈測定法所得的體積基準的累積50%粒徑(D50)在0.1至0.5μm,雷射繞射散射式粒度分佈測定法所得的體積基準的累積10%粒徑(D10)與體積基準的累積90%粒徑(D90)的比D90/D10為10以下,純度99.5質量%以上之氫氧化鎂微粒子。 The manufacturing method according to the first aspect of the patent application is to obtain a cumulative 50% particle diameter (D 50 ) of a volume basis obtained by a laser diffraction scattering particle size distribution measurement method having a BET specific surface area of 5 m 2 /g or more. The ratio of the cumulative 10% particle size (D 10 ) of the volume basis obtained by the laser diffraction scattering particle size distribution measurement to the cumulative 90% particle size (D 90 ) of the volume basis at 0.1 to 0.5 μm D 90 /D 10 It is 10 or less, and the magnesium hydroxide fine particles having a purity of 99.5% by mass or more. 如申請專利範圍第2項所述的製造方法,其中,氫氧化鎂微粒子之純度在99.9質量%以上。 The production method according to claim 2, wherein the magnesium hydroxide fine particles have a purity of 99.9% by mass or more. 如申請專利範圍第2項或第3項所述的製造方法,其中,氫氧化鎂微粒子之Fe、Ti、Ni、Cr、Mo及Mn的合計含有量在500質量ppm以下。 The production method according to the second or third aspect of the invention, wherein the total content of Fe, Ti, Ni, Cr, Mo, and Mn of the magnesium hydroxide fine particles is 500 ppm by mass or less. 如申請專利範圍第2項或第3項所述的製造方法,其中,氫氧化鎂微粒子之氯含有量在500質量ppm以下。 The production method according to the second or third aspect of the invention, wherein the magnesium hydroxide fine particles have a chlorine content of 500 ppm by mass or less. 如申請專利範圍第2項或第3項所述的製造方法,其中,氫氧化鎂微粒子之體積基準的平均粒徑(Dv)與個數基準的平均粒徑(Dn)的比Dv/Dn是1至10。 The manufacturing method according to the second or third aspect of the invention, wherein a ratio Dv/Dn of a volume-based average particle diameter (Dv) of the magnesium hydroxide fine particles to a number-based average particle diameter (Dn) is 1 to 10. 一種氧化鎂微粒子的製造方法,其含有:將以申請專利範圍第1項所述的製造方法所獲得的氫氧化鎂微粒子,在大氣環境中,在500至1500℃下煅燒的步驟(E)。 A method for producing magnesium oxide fine particles, which comprises the step (E) of calcining magnesium hydroxide fine particles obtained by the production method according to the first aspect of the invention, which is calcined at 500 to 1500 ° C in an air atmosphere. 如申請專利範圍第7項所述的製造方法,係得到其BET比表面積在5m2/g以上,雷射繞射散射式粒度分佈測定法所得的體積基準的累積50%粒徑(D50)為0.1至0.5μm,雷射繞射散射式粒度分佈測定法所得的體積基準的累積10%粒徑(D10)與體積基準的累積90%粒徑(D90)的比D90/D10在10以下,純度99.5質量%以上的氧化鎂微粒子。 The manufacturing method according to item 7 of the patent application is to obtain a cumulative 50% particle diameter (D 50 ) of a volume basis obtained by a laser diffraction scattering particle size distribution measuring method with a BET specific surface area of 5 m 2 /g or more. The ratio of the cumulative 10% particle size (D 10 ) of the volume basis obtained by the laser diffraction scattering particle size distribution measurement to the cumulative 90% particle diameter (D 90 ) of the volume basis of 0.1 to 0.5 μm D 90 /D 10 Magnesium oxide fine particles having a purity of 99.5 mass% or more at 10 or less. 如申請專利範圍第8項所述製造方法,其中,氧化鎂微粒子之純度在99.9質量%以上。 The production method according to Item 8, wherein the magnesium oxide fine particles have a purity of 99.9% by mass or more. 如申請專利範圍第8項或第9項所述的製造方法,其中,氧化鎂微粒子之Fe、Ti、Ni、Cr、Mo及Mn的合計含有量在500質量ppm以下。 The production method according to the above-mentioned item, wherein the total content of Fe, Ti, Ni, Cr, Mo, and Mn of the magnesium oxide fine particles is 500 ppm by mass or less. 如申請專利範圍第8項或第9項所述的製造方法,其中,氧化鎂微粒子之氯含有量在500質量ppm以下。 The production method according to Item 8 or 9, wherein the magnesium oxide fine particles have a chlorine content of 500 ppm by mass or less. 如申請專利範圍第8項或第9項所述的製造方法,其中,氧化鎂微粒子之檸檬酸活性度(40%)在20至2000秒。 The manufacturing method according to claim 8 or 9, wherein the magnesium oxide fine particles have a citric acid activity (40%) of 20 to 2000 seconds. 如申請專利範圍第8項或第9項所述的製造方法,其中,氧化鎂微粒子之體積基準的平均粒徑(Dv)與個數基準的平均粒徑(Dn)的比Dv/Dn是1至10。The manufacturing method according to claim 8 or 9, wherein the ratio Dv/Dn of the volume-based average particle diameter (Dv) of the magnesium oxide fine particles to the number-based average particle diameter (Dn) is 1 To 10.
TW100134937A 2010-09-28 2011-09-28 Method for producing magnesium hydroxide microparticle and magnesium oxide microparticle TWI529133B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010217166A JP5686563B2 (en) 2010-09-28 2010-09-28 Magnesium hydroxide fine particles and magnesium oxide fine particles, and methods for producing them

Publications (2)

Publication Number Publication Date
TW201219307A TW201219307A (en) 2012-05-16
TWI529133B true TWI529133B (en) 2016-04-11

Family

ID=45893003

Family Applications (1)

Application Number Title Priority Date Filing Date
TW100134937A TWI529133B (en) 2010-09-28 2011-09-28 Method for producing magnesium hydroxide microparticle and magnesium oxide microparticle

Country Status (5)

Country Link
JP (1) JP5686563B2 (en)
KR (1) KR101495777B1 (en)
CN (1) CN103140446A (en)
TW (1) TWI529133B (en)
WO (1) WO2012043564A1 (en)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104603058A (en) * 2012-09-13 2015-05-06 协和化学工业株式会社 Loosely aggregated thin film magnesium oxide particles
KR102044590B1 (en) * 2012-10-31 2019-11-13 우베 마테리알즈 가부시키가이샤 Magnesium oxide powder
JP2016106160A (en) * 2013-03-25 2016-06-16 神島化学工業株式会社 Magnesium oxide particle, resin composition, rubber composition and molding
JP5846392B2 (en) * 2013-03-29 2016-01-20 Jfeスチール株式会社 MgO for annealing separator and method for producing the same
JP6300020B2 (en) * 2014-06-16 2018-03-28 パナソニックIpマネジメント株式会社 Resin composition for printed wiring board, prepreg for printed wiring board, laminate, metal-clad laminate, printed wiring board, and magnesium oxide
JP6168173B2 (en) * 2015-01-30 2017-07-26 Jfeスチール株式会社 Oriented electrical steel sheet and manufacturing method thereof
JP2016199460A (en) * 2015-04-10 2016-12-01 協和化学工業株式会社 Separation agent for annealing for grain oriented silicon steel sheet
JP6472767B2 (en) 2016-03-30 2019-02-20 タテホ化学工業株式会社 Magnesium oxide and grain-oriented electrical steel sheet for annealing separator
JP6494865B2 (en) 2016-03-30 2019-04-03 タテホ化学工業株式会社 Magnesium oxide and grain-oriented electrical steel sheet for annealing separator
JP6494555B2 (en) 2016-03-30 2019-04-03 タテホ化学工業株式会社 Magnesium oxide and grain-oriented electrical steel sheet for annealing separator
KR102082873B1 (en) * 2017-02-28 2020-02-28 전남대학교산학협력단 Method for manufacturing magnesium hydroxide
WO2018159986A1 (en) * 2017-02-28 2018-09-07 전남대학교산학협력단 Method for preparing high-purity magnesium hydroxide
US20200194762A1 (en) * 2017-06-02 2020-06-18 Kyowa Chemical Industry Co., Ltd. Magnesium hydroxide used for nonaqueous secondary battery separator, nonaqueous secondary battery separator, and nonaqueous secondary battery
CN107344727A (en) * 2017-06-09 2017-11-14 苏州市泽镁新材料科技有限公司 A kind of preparation method of hexagonal plate nano-sized magnesium hydroxide material
JP7454334B2 (en) * 2018-03-28 2024-03-22 タテホ化学工業株式会社 Method for manufacturing magnesium oxide and grain-oriented electrical steel sheet for annealing separator
JP7454335B2 (en) * 2018-03-28 2024-03-22 タテホ化学工業株式会社 Method for manufacturing magnesium oxide and grain-oriented electrical steel sheet for annealing separator
MX2021001571A (en) * 2018-08-09 2021-07-15 Joint Stock Company Kaustik Active highly pure magnesium oxide and method for the production thereof.
CN109775733B (en) * 2019-03-28 2021-05-04 青海大学 Preparation method of nano molybdenum oxide hybrid magnesium hydroxide flame retardant
CN112098257A (en) * 2019-06-17 2020-12-18 南京倍立达欧陆装饰艺术工程有限公司 Magnesium oxide activity detection method
CN110498435B (en) * 2019-09-29 2021-08-31 北京镁德百世科技有限公司 Method for purifying magnesium hydroxide and method for recovering magnesium hydroxide from magnesium air battery and preparing magnesium oxide therefrom
JP2022186528A (en) * 2021-06-04 2022-12-15 セトラスホールディングス株式会社 Bactericidal composition containing magnesium hydroxide fine particle and osteoclast differentiation inhibitory composition
CN113388725B (en) * 2021-06-18 2022-12-02 协和化学工业株式会社 Method for producing annealing separator, and grain-oriented electromagnetic steel sheet
EP4410744A1 (en) * 2021-09-27 2024-08-07 Ube Material Industries, Ltd. Magnesium oxide powder, vulcanizer composition for rubber, rubber composition, method for producing magnesium oxide powder
CN114804163B (en) * 2022-05-16 2024-02-13 安徽大学绿色产业创新研究院 Method for preparing flame retardant magnesium hydroxide by wet dechlorination of industrial magnesium hydroxide

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000035808A1 (en) * 1998-12-14 2000-06-22 Kyowa Chemical Industry Co., Ltd. Magnesium hydroxide particles, process for producing the same, and resin composition containing the particles
JP3965270B2 (en) * 2000-04-19 2007-08-29 宇部マテリアルズ株式会社 Highly dispersible high purity magnesium hydroxide powder, method for producing the same, and magnesium hydroxide slurry
CN1332116A (en) * 2001-08-20 2002-01-23 杜以波 Homogeneous fluid process of preparing nanometer magnesium hydroxide
JP4849807B2 (en) * 2005-02-21 2012-01-11 宇部マテリアルズ株式会社 Magnesium oxide fine particle dispersion
JP4698448B2 (en) * 2006-03-13 2011-06-08 新日本製鐵株式会社 MgO for grain-oriented electrical steel sheet and method for producing grain-oriented electrical steel sheet with excellent magnetic properties and glass coating properties using the same
JP5016993B2 (en) * 2007-06-27 2012-09-05 タテホ化学工業株式会社 Magnesium oxide particle aggregate and method for producing the same
JP5125258B2 (en) * 2007-06-29 2013-01-23 堺化学工業株式会社 Spherical magnesium oxide particles and method for producing the same
JP5128882B2 (en) * 2007-09-05 2013-01-23 関東電化工業株式会社 Magnesium hydroxide fine particles and method for producing the same
CN101475197B (en) * 2009-01-09 2011-05-25 中国科学院青海盐湖研究所 Method for preparing ultra-fine high dispersing magnesium hydrate flame retardant from saline lake bittern or bischofite

Also Published As

Publication number Publication date
WO2012043564A1 (en) 2012-04-05
KR20130081293A (en) 2013-07-16
CN103140446A (en) 2013-06-05
TW201219307A (en) 2012-05-16
KR101495777B1 (en) 2015-02-25
JP5686563B2 (en) 2015-03-18
JP2012072004A (en) 2012-04-12

Similar Documents

Publication Publication Date Title
TWI529133B (en) Method for producing magnesium hydroxide microparticle and magnesium oxide microparticle
JP5415215B2 (en) Magnesium oxide powder having excellent dispersibility and method for producing the same
JP5016993B2 (en) Magnesium oxide particle aggregate and method for producing the same
JP4992003B2 (en) Method for producing metal oxide fine particles
JP5069865B2 (en) High purity magnesium hydroxide powder and method for producing the same
JP6449903B2 (en) Plate-like aluminum oxide and method for producing the same
JP5464840B2 (en) Method for producing zirconia fine particles
KR101173728B1 (en) Cubic magnesium oxide powder and method for producing the same
TWI732445B (en) Iron-based oxide magnetic powder and method for producing the same
JP5296993B2 (en) Yttrium oxide powder
KR101469298B1 (en) magnesium oxide powder
JP2011102229A (en) Minute ito powder with high crystallinity and application thereof, and method for producing the same
JP6986149B2 (en) Zinc oxide powder and zinc oxide sintered body for producing zinc oxide sintered body, and a method for producing these.
Kim et al. Effects of negative ions in aqueous Ti solution on formation of ultrafine TiO2 powder by low temperature homogeneous precipitation
CN114728807A (en) Moderately dispersed Dy2O3Granules
JPWO2019235532A1 (en) Zinc oxide powder and zinc oxide sintered body for producing zinc oxide sintered body, and a method for producing these.
JP2003064534A (en) Method for manufacturing short fiber of metal oxide
KR101324130B1 (en) Indium tin oxide powder and manufacturing method of producing the same
JP2022135542A (en) Method for manufacturing iron-based oxide magnetic powder
JPS62212224A (en) Production of zirconia solid solution crystal fine powder
JP2002255656A (en) Method for producing nano-crystal grain dense sintered body