TWI521073B - Copper alloy plate, and with its high current with electronic components and thermal electronic components - Google Patents

Copper alloy plate, and with its high current with electronic components and thermal electronic components Download PDF

Info

Publication number
TWI521073B
TWI521073B TW103128762A TW103128762A TWI521073B TW I521073 B TWI521073 B TW I521073B TW 103128762 A TW103128762 A TW 103128762A TW 103128762 A TW103128762 A TW 103128762A TW I521073 B TWI521073 B TW I521073B
Authority
TW
Taiwan
Prior art keywords
copper alloy
mass
mpa
thickness
annealing
Prior art date
Application number
TW103128762A
Other languages
Chinese (zh)
Other versions
TW201522671A (en
Inventor
Akihiro Kakitani
Original Assignee
Jx Nippon Mining & Metals Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jx Nippon Mining & Metals Corp filed Critical Jx Nippon Mining & Metals Corp
Publication of TW201522671A publication Critical patent/TW201522671A/en
Application granted granted Critical
Publication of TWI521073B publication Critical patent/TWI521073B/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C9/00Alloys based on copper
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/02Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of metals or alloys
    • H01B1/026Alloys based on copper
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C9/00Alloys based on copper
    • C22C9/04Alloys based on copper with zinc as the next major constituent
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22FCHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/08Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of copper or alloys based thereon
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/34Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
    • H01L23/36Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/34Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
    • H01L23/36Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
    • H01L23/373Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
    • H01L23/3736Metallic materials
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Thermal Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Conductive Materials (AREA)
  • Non-Insulated Conductors (AREA)

Description

銅合金板、以及具備其之大電流用電子零件及散熱用電子零件 Copper alloy plate, electronic component with high current and electronic component for heat dissipation

本發明係關於一種散熱性、導電性、彎曲加工性及拉延加工性優異之銅合金板,詳細而言係關於一種適合於端子、連接器、繼電器、開關、插座、匯流排、引線框架等電子零件用途、尤其是智慧手機或個人電腦等所使用之散熱性零件及電動車或油電混合車等所使用之高電流零件之用途的銅合金板。 The present invention relates to a copper alloy sheet excellent in heat dissipation, electrical conductivity, bending workability and drawing processability, and more particularly to a terminal, a connector, a relay, a switch, a socket, a bus bar, a lead frame, etc. A copper alloy plate for use in electronic components, especially for heat-dissipating components used in smart phones or personal computers, and for high-current components used in electric vehicles or hybrid vehicles.

於智慧手機、平板電腦及個人電腦等電性/電子機器等中,組裝有用於獲得端子、連接器、開關、插座、繼電器、匯流排、引線框架等之電性連接的零件及用於使機器所產生之熱發散的零件。 For electrical/electronic equipment such as smart phones, tablets, and personal computers, components for obtaining electrical connections for terminals, connectors, switches, sockets, relays, bus bars, lead frames, etc., and for making machines The heat-dissipating parts produced.

近年來,隨著智慧手機、平板電腦及個人電腦之小型化,有對電性/電子機器內之液晶零件或IC晶片等通電時之蓄熱增大之傾向。蓄熱多之狀態由於對IC晶片或基板之熱損傷大,故而散熱零件之散熱性成為問題。 In recent years, with the miniaturization of smart phones, tablet computers, and personal computers, there is a tendency for heat storage during power-on of liquid crystal components or IC chips in an electric/electronic device. Since the state of heat storage is large, thermal damage to the IC chip or the substrate is large, and heat dissipation of the heat dissipating component becomes a problem.

先前,智慧手機、平板電腦及個人電腦等電性/電子機器內之散熱零件一直主要使用沃斯田鐵系不鏽鋼(SUS304)及純鋁等。對於例如智慧手機或平板電腦之液晶所附帶之散熱零件(液晶框架),除要求較高之散熱性以外,要求作為構造體之強度及固定於液晶所需之彎曲加工性或 拉延加工性。又,亦有根據所使用之散熱零件而僅需要彎曲加工性或拉延加工性之情形。 Previously, heat-dissipating parts in electric/electronic machines such as smart phones, tablets, and personal computers have been mainly used in Worthite iron-based stainless steel (SUS304) and pure aluminum. For a heat dissipating component (liquid crystal frame) attached to a liquid crystal such as a smart phone or a tablet computer, in addition to requiring high heat dissipation, it is required as the strength of the structure and the bending workability required for fixing to the liquid crystal or Drawing processability. Further, there is a case where only the bending workability or the drawing workability is required depending on the heat dissipating component to be used.

沃斯田鐵系不鏽鋼(SUS304)雖然彎曲性及拉延加工性良好,但導熱性低,為了彌補此缺點而併用昂貴之導熱片材等。因此,散熱零件之單價增高。另一方面,純鋁及鋁合金雖然彎曲性及拉延加工性良好,但導熱性及作為構造體之強度不足。 In the Worstian Iron-based Stainless Steel (SUS304), although the flexibility and the drawability are good, the thermal conductivity is low, and an expensive heat conductive sheet or the like is used in order to compensate for this disadvantage. Therefore, the unit price of the heat dissipating component is increased. On the other hand, although pure aluminum and aluminum alloy are excellent in bending property and drawing workability, thermal conductivity and strength as a structure are insufficient.

又,於端子、連接器等通電零件中,有通電部中之銅合金的剖面積變小之傾向。若剖面積變小,則由通電時之銅合金所產生之熱變大。特別是,顯著成長之電動車或油電混合車中所使用之電子零件中,具有電池部之連接器等流通顯著高電流之零件,於通電時銅合金之發熱成為問題。因此,為了減少發熱量,對於通電材料要求導電性優異,進一步,為了可對應於零件之小型化或高功能化,亦要求優異之彎曲加工性或拉延加工性。 Further, in an energized component such as a terminal or a connector, the cross-sectional area of the copper alloy in the current-carrying portion tends to be small. When the cross-sectional area is small, the heat generated by the copper alloy at the time of energization becomes large. In particular, among the electronic components used in the electric vehicle or the hybrid electric vehicle that has been significantly grown, there is a component that flows a significant high current such as a connector of the battery unit, and the heat generation of the copper alloy at the time of energization becomes a problem. Therefore, in order to reduce the amount of heat generation, electrical conductivity is required to be excellent, and further, in order to cope with the miniaturization or high functionality of the components, excellent bending workability or drawing workability is required.

已知導熱性與導電性處於比例關係,作為具有相對較高之導電率與強度之合金,已知有對Cu添加有Zr或Ti之材料。作為導電率高且具有相對較高之強度的材料,例如於CDA(Copper Development Association,美國銅發展協會)登記有C15100(0.1質量%Zr-剩餘Cu)、C15150(0.02質量%Zr-剩餘Cu)、C18140(0.1質量%Zr-0.3質量%Cr-0.02質量%Si-剩餘Cu)、C18145(0.1質量%Zr-0.2質量%Cr-0.2質量%Zn-剩餘Cu)、C18070(0.1質量%Ti-0.3質量%Cr-0.02質量%Si-剩餘Cu)、C18080(0.06質量%Ti-0.5質量%Cr-0.1質量%Ag-0.08質量%Fe-0.06質量%Si-剩餘Cu)等合金。 It is known that thermal conductivity is proportional to electrical conductivity, and as an alloy having a relatively high electrical conductivity and strength, a material in which Zr or Ti is added to Cu is known. As a material having high conductivity and relatively high strength, for example, CDA (Copper Development Association) is registered with C15100 (0.1% by mass Zr-remaining Cu), C15150 (0.02% by mass Zr-remaining Cu). , C18140 (0.1% by mass Zr-0.3% by mass Cr-0.02% by mass Si-remaining Cu), C18145 (0.1% by mass Zr-0.2% by mass Cr-0.2% by mass Zn-remaining Cu), C18070 (0.1% by mass Ti-) An alloy such as 0.3 mass% Cr-0.02 mass% Si-remaining Cu), C18080 (0.06 mass% Ti-0.5 mass% Cr-0.1 mass% Ag-0.08 mass% Fe-0.06 mass% Si-remaining Cu).

但是,以往之對Cu添加有Zr或Ti之銅合金(稱為Cu-Zr-Ti系合金)雖然強度及熱傳導特性高,但不滿足所要求之彎曲加工性或拉延加工性,有時兩者均不滿足。 However, in the past, a copper alloy (referred to as a Cu-Zr-Ti alloy) in which Zr or Ti is added to Cu has high strength and heat conduction characteristics, but does not satisfy the required bending workability or drawing processability, and sometimes two None of them are satisfied.

因此,在維持Cu-Zr-Ti系合金中所要求之高強度及導電率之情況下改善彎曲加工性及拉延加工性,則可謂於工業上意義極深遠。 Therefore, it is industrially significant to improve the bending workability and the drawability while maintaining the high strength and electrical conductivity required for the Cu-Zr-Ti alloy.

因此,本發明之目的在於提供一種銅合金板,其兼具高強度、導電性以及優異之彎曲加工性及拉延加工性,以及具備其之大電流用電子零件及散熱用電子零件,具體而言,本發明之課題在於改善便宜且導電性及強度優異之Cu-Zr-Ti系合金之拉延加工性。 Accordingly, an object of the present invention is to provide a copper alloy sheet which has high strength, electrical conductivity, excellent bending workability and drawing processability, and electronic components for high current and electronic components for heat dissipation, specifically In view of the above, an object of the present invention is to improve the drawability of a Cu-Zr-Ti alloy which is inexpensive and excellent in electrical conductivity and strength.

本發明人發現於Cu-Zr-Ti系合金中,藉由以延伸率為指標調整金屬組織,及控制取向於壓延面之晶粒的方位,來提高彎曲加工性及拉延加工性。然後,以上述見解為背景,完成以下發明。 The present inventors have found that in the Cu-Zr-Ti alloy, the metal structure is adjusted by the elongation index, and the orientation of the crystal grains oriented on the rolling surface is controlled to improve the bending workability and the drawing workability. Then, with the above findings in mind, the following invention was completed.

本發明之銅合金板,含有合計0.01~0.50質量%之Zr及Ti中之一種或兩種,更佳為含有0.015~0.3質量%,剩餘部分由銅及不可避免之雜質構成,具有70%IACS以上之導電率及350MPa以上之0.2%保證應力,且0.2%保證應力σ(MPa)與延伸率L(%)滿足σ/L≦150之關係。 The copper alloy sheet of the present invention contains a total of 0.01 to 0.50% by mass of one or both of Zr and Ti, more preferably 0.015 to 0.3% by mass, and the balance is composed of copper and unavoidable impurities, and has 70% IACS. The above conductivity and the 0.2% guaranteed stress of 350 MPa or more, and the relationship between the 0.2% proof stress σ (MPa) and the elongation L (%) satisfy σ/L ≦ 150.

本發明之銅合金板中,將使用X射線繞射法在壓延面中於厚度方向求得之{220}面之X射線繞射積分強度設為I{220},將純銅粉末標準試樣之自{220}面之X射線繞射積分強度設為I0{220},此時,較佳為I{220}/I0{220}≧4.0。 In the copper alloy sheet of the present invention, the X-ray diffraction integral intensity of the {220} plane obtained by the X-ray diffraction method in the thickness direction in the rolling plane is set to I{220}, and the pure copper powder standard sample is used. The X-ray diffraction integral intensity from the {220} plane is set to I 0 {220}, and at this time, I{220}/I 0 {220}≧4.0 is preferable.

又,較佳為本發明之銅合金板中,W彎曲試驗中之壓延平 行方向(GW方向)及壓延垂直方向(BW方向)的最小彎曲半徑(MBR)與板厚(t)之比率可表述為MBR/t≦2.0。 Further, preferably, in the copper alloy sheet of the present invention, the calendering in the W bending test is flat. The ratio of the minimum bending radius (MBR) to the sheet thickness (t) in the row direction (GW direction) and the rolling vertical direction (BW direction) can be expressed as MBR/t ≦ 2.0.

再者,本發明之銅合金板中,較佳為依契遜試驗(Erichsen test)中之依契遜值/板厚可表述為0.5以上。 Further, in the copper alloy sheet of the present invention, it is preferable that the Echsen value/plate thickness in the Erichsen test can be expressed as 0.5 or more.

本發明之大電流用電子零件具備上述任一個銅合金板。又,本發明之散熱用電子零件具備上述任一個銅合金板。 The high-current electronic component of the present invention includes any of the above-described copper alloy sheets. Moreover, the electronic component for heat dissipation of the present invention includes any one of the above copper alloy sheets.

根據本發明,可提供兼具高強度、高導電性、優異之彎曲加工性及拉延加工性的銅合金板。該銅合金板係關於可適宜地用作端子、連接器、開關、插座、繼電器、匯流排、引線框架、散熱板等電子零件之原材料,適合於智慧手機或個人電腦等所使用之散熱性零件及電動車或油電混合車等所使用之大電流零件之用途的銅合金板。 According to the present invention, it is possible to provide a copper alloy sheet having high strength, high electrical conductivity, excellent bending workability, and drawing workability. The copper alloy plate is a raw material suitable for use as an electronic component such as a terminal, a connector, a switch, a socket, a relay, a bus bar, a lead frame, a heat sink, etc., and is suitable for a heat dissipating component used in a smart phone or a personal computer. Copper alloy sheets for use in high-current parts used in electric vehicles or hybrid vehicles.

以下,對本發明之實施形態進行詳細說明。 Hereinafter, embodiments of the present invention will be described in detail.

(特性) (characteristic)

本發明之一實施形態之銅合金板,將此銅合金板之導電率設為70%IACS以上、將0.2%保證應力設為350MPa以上,且將0.2%保證應力/延伸率(σ/L)設為150以下。兼具此種特性之銅合金板適合於散熱用電子 零件之用途。 A copper alloy sheet according to an embodiment of the present invention has a conductivity of 70% IACS or more, a 0.2% proof stress of 350 MPa or more, and a 0.2% proof stress/elongation ratio (σ/L). Set to 150 or less. A copper alloy plate having such characteristics is suitable for heat dissipation electrons The purpose of the part.

(合金成分濃度) (alloy concentration)

本發明之實施形態之Cu-Zr-Ti系合金板,含有合計0.01~0.50質量%之Zr及Ti中之一種或兩種,該Zr與Ti之總含量較佳設為0.015~0.3質量%,更佳為0.02~0.20質量%。若Zr及Ti中之一種或兩種之合計未達0.01質量%,則會變得難以獲得350MPa以上之拉伸強度。若Zr及Ti中之一種或兩種之合計超過0.5質量%,則會因熱壓延龜裂等而變得難以製造合金。於添加Zr之情形時,較佳為將其添加量調整為0.01~0.45質量%,於添加Ti之情形時,較佳為將其添加量調整為0.01~0.20質量%。若添加量低於下限值,則0.2%保證應力會未達350MPa,若添加量超過上限值,則有導致導電率或製造性變差之情況。 The Cu-Zr-Ti alloy plate according to the embodiment of the present invention contains one or two of Zr and Ti in a total amount of 0.01 to 0.50% by mass, and the total content of Zr and Ti is preferably set to 0.015 to 0.3% by mass. More preferably, it is 0.02 to 0.20% by mass. When the total of one or both of Zr and Ti is less than 0.01% by mass, it becomes difficult to obtain a tensile strength of 350 MPa or more. When the total of one or both of Zr and Ti exceeds 0.5% by mass, it becomes difficult to produce an alloy due to hot rolling cracking or the like. When Zr is added, it is preferable to adjust the addition amount to 0.01 to 0.45 mass%, and when Ti is added, it is preferable to adjust the addition amount to 0.01 to 0.20 mass%. When the amount added is less than the lower limit, the 0.2% proof stress may not reach 350 MPa, and if the amount exceeds the upper limit, the conductivity or the manufacturability may be deteriorated.

為了改善強度或耐熱性,亦可使Cu-Zr-Ti系合金板中含有合計2.0%質量以下之Ag、Co、Ni、Cr、Mn、Zn、Mg、Si、Fe、Sn及B中之一種以上。但是,若添加量過多,則會有導電率降低而低於70%IACS,或合金之製造性變差之情況,因此使添加量以總量計在1.0質量%以下為較佳,更佳在0.5質量%以下。又,為了獲得由添加所產生之效果,較佳為將添加量以總量計設為0.001質量%以上。 In order to improve the strength or the heat resistance, the Cu-Zr-Ti alloy plate may contain a total of 2.0% by mass or less of Ag, Co, Ni, Cr, Mn, Zn, Mg, Si, Fe, Sn, and B. the above. However, if the amount of addition is too large, the electrical conductivity may be lowered to less than 70% IACS, or the manufacturability of the alloy may be deteriorated. Therefore, the addition amount is preferably 1.0% by mass or less based on the total amount, more preferably 0.5% by mass or less. Moreover, in order to obtain the effect by addition, it is preferable to set the addition amount to 0.001 mass % or more in total amount.

(厚度) (thickness)

製品之厚度(亦即板厚(t))較佳為0.05~2.0mm。若厚度過小,則變得無法獲得充分之散熱性,因而不適合作為散熱用電子零件之原材料。另一方面,若厚度過大,則彎曲加工及拉延加工變得困難。就此種觀點而言,更佳之厚度為0.08~1.5mm。藉由使厚度成為上述範圍,可製成抑制蓄熱且 彎曲加工性及拉延加工性良好者。 The thickness of the product (i.e., the sheet thickness (t)) is preferably from 0.05 to 2.0 mm. If the thickness is too small, sufficient heat dissipation cannot be obtained, and thus it is not suitable as a raw material for electronic components for heat dissipation. On the other hand, if the thickness is too large, bending and drawing processing become difficult. In this regard, the preferred thickness is 0.08 to 1.5 mm. By making the thickness into the above range, it is possible to suppress heat storage and Good bending workability and drawing processability.

(導電率) (Conductivity)

本發明中,將根據JIS H0505所測得之導電率設為70%IACS以上。若導電率為70%IACS以上,則導熱率良好,可確保良好的散熱性。更佳為設為75%IACS以上。 In the present invention, the conductivity measured according to JIS H0505 is set to 70% IACS or more. When the electrical conductivity is 70% IACS or more, the thermal conductivity is good, and good heat dissipation can be ensured. More preferably, it is set to 75% IACS or more.

(0.2%保證應力) (0.2% guaranteed stress)

本發明中,將銅合金板之0.2%保證應力設為350MPa以上,藉此,銅合金板可說是具有作為結構材料之原材料的必要強度。 In the present invention, the 0.2% proof stress of the copper alloy sheet is set to 350 MPa or more, whereby the copper alloy sheet can be said to have the necessary strength as a raw material of the structural material.

(延伸率) (elongation)

將製品的延伸率(El)設為L(%)、0.2%保證應力(YS)設為σ(MPa)時,藉由調整成滿足σ/L≦150之關係、更佳為滿足σ/L≦100之關係,拉延加工性及彎曲性提高。若0.2%保證應力/延伸率在150以下,則可謂具有必需之拉延加工性。σ/L>150之情形時,拉延加工性及彎曲性惡化。另一方面,σ/L之下限值較佳為設為30。若σ/L小,則有0.2%保證應力不滿350MPa之虞。延伸率L之上限值無特別限制,通常若為超過15%之值,則強度降低,視情形有可能0.2%保證應力會低於350MPa。因此,較佳之實施形態中,延伸率L為15%以下。 When the elongation (El) of the product is L (%) and the guaranteed stress (YS) of 0.2% is σ (MPa), it is adjusted to satisfy the relationship of σ/L ≦ 150, and more preferably σ/L. ≦100 relationship, drawing processability and flexibility are improved. If the 0.2% proof stress/elongation ratio is 150 or less, it is necessary to have the necessary drawability. When σ/L>150, the drawability and the bendability deteriorate. On the other hand, the lower limit of σ/L is preferably set to 30. If σ/L is small, there is a 0.2% guaranteed stress less than 350 MPa. The upper limit of the elongation L is not particularly limited, and if it is more than 15%, the strength is lowered, and as the case may be 0.2%, the stress is lower than 350 MPa. Therefore, in a preferred embodiment, the elongation L is 15% or less.

此處所謂之「延伸率」,係指根據JIS Z2241所定義之「斷裂延伸率」,又,「延伸率」及「0.2%保證應力」係設為藉由根據JIS Z2241,將試驗片之壓延方向設為與拉伸方向平行之拉伸試驗來進行測定者。 The term "elongation" as used herein refers to the "elongation at break" defined in JIS Z2241, and the "elongation" and "0.2% guaranteed stress" are determined by calendering the test piece according to JIS Z2241. The direction is set to a tensile test in parallel with the stretching direction to perform measurement.

(彎曲加工性) (bending workability)

本發明之彎曲加工性之評價係藉由使用有寬度10mm×長度30mm之短 帶狀試驗片的W彎曲試驗(JIS H3130)來進行。試驗片採取方向設為壓延平行方向(GW)及壓延垂直方向(BW),以不產生龜裂之最小彎曲半徑MBR(Minimum Bend Radius)與板厚t之比MBR/t來進行評價。由確保良好之彎曲性的觀點而言,此最小彎曲半徑(MBR)之比率(MBR/t)設為2.0以下為較佳。MBR/t之更適合的範圍為1.8以下。 The bending workability of the present invention is evaluated by using a width of 10 mm × a length of 30 mm. The W test of the strip test piece (JIS H3130) was carried out. The direction in which the test piece was taken was set in the rolling parallel direction (GW) and the rolling vertical direction (BW), and the ratio of the minimum bending radius MBR (Minimum Bend Radius) and the sheet thickness t MBR/t without generating cracks was evaluated. From the viewpoint of ensuring good bendability, the ratio (MBR/t) of the minimum bending radius (MBR) is preferably 2.0 or less. A more suitable range of MBR/t is 1.8 or less.

(拉延加工性) (drawing processability)

本發明之銅合金板較佳為利用根據JIS Z2247之依契遜試驗所測得之依契遜值相對於板厚之比率為0.5以上。若依契遜值/板厚為0.5以上,則拉延加工性於實用上沒有問題。另一方面,此依契遜值/板厚較佳為設為1.5以下。其原因在於,若超過1.5,則0.2%保證應力有可能未達350MPa。更佳為依契遜值/板厚設為0.5~1.2之範圍。 The copper alloy sheet of the present invention preferably has a ratio of the Ichison value to the sheet thickness measured by the Icheson test according to JIS Z2247 of 0.5 or more. If the Icixon value/plate thickness is 0.5 or more, the drawing processability is practically no problem. On the other hand, the Icixon value/plate thickness is preferably set to 1.5 or less. The reason is that if it exceeds 1.5, the 0.2% proof stress may not reach 350 MPa. More preferably, the Ichison value/plate thickness is set in the range of 0.5 to 1.2.

(結晶方位) (crystal orientation)

將使用X射線繞射法,在壓延面中於厚度方向求出之{220}面之X射線繞射積分強度設為I{220},將純銅粉末標準試樣之由{220}面得到之X射線繞射積分強度設為I0{220},此時,I{220}/I0{220}為4.0以上之情形時,拉延加工性提高。於I{220}/I0{220}未達4.0之情形時,由於織構(texture)之擴展小,因此拉延加工性惡化。並未特別設定上限,更佳為設為I{220}/I0{220}為4.0~7.0。再者,純銅粉末標準試樣係以325網孔(JIS Z8801)之純度99.5%的銅粉末來定義者。 The X-ray diffraction method is used, and the integrated intensity of the X-ray diffraction of the {220} plane obtained in the thickness direction in the rolling plane is set to I{220}, and the standard sample of the pure copper powder is obtained from the {220} plane. The X-ray diffraction integral intensity is set to I 0 {220}, and in the case where I{220}/I 0 {220} is 4.0 or more, the drawability is improved. In the case where I{220}/I 0 {220} is less than 4.0, since the texture is small in expansion, the drawing processability is deteriorated. The upper limit is not particularly set, and it is more preferable to set it to I{220}/I 0 {220} to 4.0 to 7.0. Further, the pure copper powder standard sample was defined by a copper powder having a purity of 99.5% of 325 mesh (JIS Z8801).

以下,對本發明之銅合金板之適宜製造方法之一例進行說明。 Hereinafter, an example of a suitable method for producing a copper alloy sheet of the present invention will be described.

將作為純銅原料之電解銅等熔解,添加Zr、Ti及視需要之 其他的合金元素,鑄造成厚度為30~300mm左右之鑄錠。藉由例如800~1000℃的熱壓延將該鑄錠製成厚度為3~30mm左右之板後,反覆進行冷壓延與再結晶退火,藉由最終之冷壓延而最後加工成既定之製品厚度,最後實施弛力退火。最終之冷壓延後的延伸率雖然低至不滿足2%之程度,但藉由其後之弛力退火來提高。 Melting electrolytic copper or the like as a pure copper material, adding Zr, Ti, and optionally Other alloying elements are cast into ingots having a thickness of about 30 to 300 mm. The ingot is formed into a plate having a thickness of about 3 to 30 mm by hot rolling at, for example, 800 to 1000 ° C, and then subjected to cold rolling and recrystallization annealing, and finally processed into a predetermined product thickness by final cold rolling. Finally, the relaxation annealing is performed. Although the elongation after the final cold rolling is as low as 2%, it is improved by the subsequent relaxation annealing.

於再結晶退火中,使壓延組織之一部分或全部再結晶化。又,藉由於適當條件下進行退火,使Zr、Ti等析出,合金之導電率上升。於最終冷壓延前之再結晶退火中,將銅合金板之平均結晶粒徑調整為50μm以下。若平均結晶粒徑過大,則變得難以將0.2%保證應力調整為350MPa以上。 In the recrystallization annealing, part or all of the rolled structure is recrystallized. Further, by annealing under appropriate conditions, Zr, Ti, and the like are precipitated, and the electrical conductivity of the alloy is increased. In the recrystallization annealing before the final cold rolling, the average crystal grain size of the copper alloy sheet was adjusted to 50 μm or less. When the average crystal grain size is too large, it becomes difficult to adjust the 0.2% proof stress to 350 MPa or more.

最終冷壓延前之再結晶退火之條件係基於目標之退火後結晶粒徑及目標之製品導電率而決定。具體而言,使用批次爐或連續退火爐,將爐內溫度設為350~800℃進行退火即可。對於批次爐,於350~600℃之爐內溫度下,在30分鐘至30小時之範圍適宜調整加熱時間即可。對於連續退火爐,於450~800℃之爐內溫度下,在5秒鐘至10分鐘之範圍適宜調整加熱時間即可。一般而言,若於更低溫度下以更長時間之條件進行退火,則可以相同結晶粒徑獲得更高之導電率。 The conditions of the recrystallization annealing before the final cold rolling are determined based on the target crystal grain size after annealing and the target product conductivity. Specifically, the batch furnace or the continuous annealing furnace may be used, and the furnace temperature may be 350 to 800 ° C for annealing. For the batch furnace, it is advisable to adjust the heating time in the range of 30 minutes to 30 hours at a furnace temperature of 350 to 600 °C. For the continuous annealing furnace, the heating time can be appropriately adjusted in the range of 5 seconds to 10 minutes at an oven temperature of 450 to 800 °C. In general, if annealing is performed at a lower temperature for a longer period of time, a higher conductivity can be obtained with the same crystal grain size.

於最終冷壓延中,使材料反覆通過一對壓延輥間,而逐步最後加工成目標板厚。此處,對最終冷壓延之總加工度與每一道次之加工度加以控制。 In the final cold rolling, the material is passed through a pair of calender rolls and gradually processed into a target thickness. Here, the total degree of processing of the final cold rolling and the degree of processing of each pass are controlled.

總加工度R(%)可由R=(t0-t)/t0×100(t0:最終冷壓延前之板厚,t:最終冷壓延後之板厚)求得。又,每一道次之加工度r(%)係指通過壓 延輥1次時之板厚減少率,其可由r=(T0-T)/T0×100(T0:通過壓延輥前之厚度、T:通過壓延輥後之厚度)求得。 The total degree of work R (%) can be obtained from R = (t 0 - t) / t 0 × 100 (t 0 : plate thickness before final cold rolling, t: plate thickness after final cold rolling). Further, the degree of processing r (%) per pass refers to the plate thickness reduction rate when passing through the calender roll once, which can be obtained by r = (T 0 - T) / T 0 × 100 (T 0 : before passing through the calender roll The thickness, T: the thickness after rolling the roll) was determined.

總加工度R設為40~99%,較佳為45~98.5%,更佳為50 ~98%。若R過小,則難以將0.2%保證應力調整為350MPa以上,變得難以將I{220}/I0{220}調整為4.0以上。若總加工度R過大,則有壓延材之邊緣發生龜裂之情況。 The total processing degree R is set to 40 to 99%, preferably 45 to 98.5%, more preferably 50 to 98%. If R is too small, it is difficult to adjust the 0.2% proof stress to 350 MPa or more, and it becomes difficult to adjust I{220}/I 0 {220} to 4.0 or more. If the total workability R is too large, cracks may occur at the edges of the rolled material.

將每一道次之加工度r設為15%以上。若加工度r過小,則I{220}/I0{220}減小,於全部道次中只要含有一個加工度r未達15%之道次,就難以將I{220}/I0{220}調整於4.0以上。加工度r之上限並無特別限制,但若考慮壓延所致之板厚精確度的控制,則較理想為未達40%。 The degree of processing r per pass is set to 15% or more. If the processing degree r is too small, I{220}/I 0 {220} is reduced, and it is difficult to set I{220}/I 0 { as long as the processing degree r is less than 15% in all passes. 220} Adjusted to 4.0 or above. The upper limit of the degree of processing r is not particularly limited, but it is preferably less than 40% in consideration of the control of the sheet thickness accuracy by calendering.

本發明之弛力退火係使用可於爐內將銅合金板保持在平板狀的連續退火爐而進行。於採用批次爐之情形時,由於在捲取為線圈狀之狀態下加熱材料,故而於加熱中材料會發生塑性變形而於材料產生翹曲。因此,批次爐不適合於本發明之弛力退火。 The relaxation annealing of the present invention is carried out using a continuous annealing furnace in which a copper alloy sheet is held in a flat shape in a furnace. In the case of using a batch furnace, since the material is heated in a state in which it is wound in a coil shape, the material is plastically deformed during heating to cause warpage of the material. Therefore, the batch furnace is not suitable for the relaxation annealing of the present invention.

於連續退火爐中,將爐內溫度設為300~700℃,較佳為設為350~650℃,適當地調整加熱時間為5秒鐘至10分鐘之範圍內,將弛力退火後之0.2%保證應力(σ)調整成比弛力退火前之0.2%保證應力(σ0)低10~50MPa之值,更佳為調整成低15~45MPa之值。藉此,最終冷壓延結束時,下降之延伸率提高且彎曲加工性改善。 In the continuous annealing furnace, the temperature in the furnace is set to 300 to 700 ° C, preferably 350 to 650 ° C, and the heating time is appropriately adjusted in the range of 5 seconds to 10 minutes, and 0.2 after annealing is relaxed. The % guaranteed stress (σ) is adjusted to be 10 to 50 MPa lower than the 0.2% proof stress (σ 0 ) before the relaxation force annealing, and more preferably adjusted to a value lower by 15 to 45 MPa. Thereby, at the end of the final cold rolling, the elongation of the decrease is improved and the bending workability is improved.

進一步,於連續退火爐內,針對材料例如於與壓延方向平行之方向賦予張力,將此處所附加之張力調整為5MPa以下,較佳為1~5MPa,更佳為2~4MPa。若張力過大,則難以將σ/L調整至150以下。又,有延 伸率之上升變得不足之傾向。另一方面,若張力過小,則通板中之材料會與退火爐之爐壁接觸,而傷害到材料表面或邊緣。 Further, in the continuous annealing furnace, the tension is applied to the material in a direction parallel to the rolling direction, and the tension added thereto is adjusted to 5 MPa or less, preferably 1 to 5 MPa, more preferably 2 to 4 MPa. If the tension is too large, it is difficult to adjust σ/L to 150 or less. Again, there is delay The rise in the rate of elongation has become insufficient. On the other hand, if the tension is too small, the material in the through sheet will come into contact with the furnace wall of the annealing furnace, which will damage the surface or edge of the material.

本發明之一實施形態係以「藉由對Cu-Zr-Ti系合金賦予σ/L≦150之技術特徵、及I{220}/I0{220}≧4.0之特徵,來改善拉延加工性及彎曲加工性」此為一技術特徵;若將用以實現其之製造條件整理表示,則如下:(1)為了使σ/L≦150,a.於弛力退火中,調整為(σ0-σ)=10~50MPa。 An embodiment of the present invention improves the drawing process by imparting the technical characteristics of σ/L ≦ 150 to the Cu-Zr-Ti alloy and the characteristics of I{220}/I 0 {220} ≧ 4.0. Sexuality and bending workability" This is a technical feature; if it is used to achieve the manufacturing conditions, it is as follows: (1) In order to make σ / L ≦ 150, a. in the relaxation annealing, adjust to (σ 0 - σ) = 10~50MPa.

b.將弛力退火時之爐內張力調整為5MPa以下。 b. Adjust the internal tension of the furnace during relaxation annealing to 5 MPa or less.

(2)為了使I{220}/I0{220}≧4.0,a.於最終冷壓延中,將每一道次之加工度調整成15%以上。 (2) In order to make I{220}/I 0 {220}≧4.0, a. in the final cold rolling, the processing degree of each pass is adjusted to 15% or more.

b.將最終冷壓延之總加工度設為40~99%。 b. Set the total processing degree of the final cold rolling to 40~99%.

以上述方式製得之銅合金板,可加工成各式各樣之板厚的伸銅品,例如可用作智慧手機、平板電腦及個人電腦等電性/電子機器內之散熱用電子零件等。 The copper alloy sheet obtained in the above manner can be processed into various kinds of copper-thickness products, for example, for use as electronic components for heat dissipation in electric/electronic machines such as smart phones, tablet computers, and personal computers. .

[實施例] [Examples]

以下,表示本發明之實施例,但該等實施例係為了更好地理解本發明及其優點而提供者,並非意欲限定本發明。 The embodiments of the present invention are shown below, but are provided to provide a better understanding of the present invention and its advantages, and are not intended to limit the present invention.

於熔銅中添加合金元素後,鑄造成厚度為200mm之鑄錠。以950℃將鑄錠加熱3小時,以950℃進行熱壓延,而製成厚度為15mm之板。利用研磨機(grinder)研削、去除熱壓延板表面之氧化皮後,反覆進行退火與冷壓延,於最終之冷壓延中精加工成既定之製品厚度。最後,使用連續退火爐 進行弛力退火。 After adding an alloying element to the molten copper, it was cast into an ingot having a thickness of 200 mm. The ingot was heated at 950 ° C for 3 hours, and hot rolled at 950 ° C to form a plate having a thickness of 15 mm. After grinding and removing the scale on the surface of the hot rolled plate by a grinder, annealing and cold rolling are repeatedly performed, and finished into a predetermined product thickness in the final cold rolling. Finally, use a continuous annealing furnace Relaxation annealing is performed.

關於最終冷壓延前之退火(最終再結晶退火),使用批次爐, 將加熱時間設為5小時,將爐內溫度在300~700℃之範圍進行調整,而使退火後之結晶粒徑與導電率產生變化。關於退火後之結晶粒徑之測定,對與壓延方向垂直之剖面進行鏡面研磨後進行化學腐蝕,並藉由切斷法(JIS H0501(1999年))求出平均結晶粒徑。 For the final cold rolling pre-anneal (final recrystallization annealing), use a batch furnace, The heating time was set to 5 hours, and the furnace temperature was adjusted in the range of 300 to 700 ° C to change the crystal grain size and electrical conductivity after annealing. For the measurement of the crystal grain size after annealing, the cross section perpendicular to the rolling direction was subjected to mirror polishing, chemical etching, and the average crystal grain size was determined by a cutting method (JIS H0501 (1999)).

於最終冷壓延中,對總加工度及每一道次之加工度加以控 制。又,求出最終冷壓延後材料之0.2%保證應力。 Control the total processing degree and the processing degree of each pass in the final cold rolling system. Further, the 0.2% proof stress of the final cold rolled material was determined.

於使用有連續退火爐之弛力退火中,將爐內溫度設為500℃,將加熱時間調整在1秒鐘至15分鐘之間,而使退火後之0.2%保證應力產生各種變化。又,使於爐內對材料所施加之張力產生各種變化。再者,對於一部分材料,省略弛力退火。 In the relaxation annealing using a continuous annealing furnace, the furnace temperature was set to 500 ° C, and the heating time was adjusted between 1 second and 15 minutes, and the 0.2% proof stress after annealing was varied. Moreover, various changes in the tension applied to the material in the furnace are caused. Furthermore, for some materials, the relaxation annealing is omitted.

實施例之製造條件連發明例及比較例皆示於表1、2。此處, 於最終冷壓延中雖然實施了多個道次,但顯示該等各道次之加工度中之最小值。又,於表1中所示之最終再結晶退火後之結晶粒徑中之「<5μm」之表述,係表示僅壓延組織之一部份再結晶化之情形。 The manufacturing conditions of the examples are shown in Tables 1 and 2, together with the invention examples and comparative examples. Here, Although a plurality of passes were performed in the final cold rolling, the minimum of the processing degrees of the respective passes was shown. Further, the expression "<5 μm" in the crystal grain size after the final recrystallization annealing shown in Table 1 indicates that only one portion of the rolled structure was recrystallized.

針對製造過程中之材料及弛力退火後之材料進行以下測定。 The following measurements were made for the materials in the manufacturing process and the materials after the relaxation annealing.

(成分) (ingredient)

藉由ICP-質譜分析法來分析弛力退火後材料之合金元素濃度。 The alloying element concentration of the material after relaxation annealing was analyzed by ICP-mass spectrometry.

(0.2%保證應力) (0.2% guaranteed stress)

針對最終冷壓延後及弛力退火後之材料,以拉伸方向與壓延方向平行之方式採取JIS Z2241所規定之13B號試驗片,依據JIS Z2241,與壓延方向 平行地進行拉伸試驗,而求出0.2%保證應力。 For the material after the final cold rolling and the relaxation annealing, the test piece No. 13B specified in JIS Z2241 is used in parallel with the rolling direction in the direction of stretching, according to JIS Z2241, and the rolling direction. The tensile test was carried out in parallel to obtain a 0.2% proof stress.

(延伸率) (elongation)

自弛力退火後之材料以拉伸方向與壓延方向平行之方式採取JIS Z2241所規定之13B號試驗片,將標距設為50mm,從而測定延伸率。 The material after the relaxation annealing was subjected to the test piece No. 13B prescribed in JIS Z2241 in such a manner that the stretching direction was parallel to the rolling direction, and the gauge length was set to 50 mm to measure the elongation.

(導電率) (Conductivity)

自弛力退火後之材料,以試驗片之長度方向與壓延方向平行之方式採取試驗片,依據JIS H0505,藉由四端子法來測定20℃之導電率。 The material after the self-relaxation annealing was subjected to a test piece in such a manner that the longitudinal direction of the test piece was parallel to the rolling direction, and the electrical conductivity at 20 ° C was measured by a four-terminal method in accordance with JIS H0505.

(結晶方位) (crystal orientation)

針對弛力退火後之材料的表面於厚度方向測定{220}面之X射線繞射積分強度。同樣地對純銅粉末標準試樣亦測定{220}面之X射線繞射積分強度。X射線繞射裝置係使用Rigaku股份有限公司製造之RINT2500,利用Cu管球,以管電壓25kV、管電流20mA來進行測定。 The X-ray diffraction integral intensity of the {220} plane is measured in the thickness direction for the surface of the material after the relaxation annealing. Similarly, the integral intensity of the X-ray diffraction of the {220} plane was also measured for the pure copper powder standard sample. The X-ray diffraction apparatus was measured using a RINT 2500 manufactured by Rigaku Co., Ltd. using a Cu bulb, with a tube voltage of 25 kV and a tube current of 20 mA.

(依契遜值) (Ichsen value)

針對弛力退火後之材料,使用依契遜(Erichsen)公司製造之試驗機,以試樣形狀Φ90mm、潤滑劑:脂膏、衝床之擠壓速度5mm/min之條件進行試驗,求得依契遜值。將評價結果示於表2。 For the material after the relaxation annealing, a test machine manufactured by Erichsen was used to test the sample shape of Φ90 mm, lubricant: grease, and press speed of 5 mm/min. value. The evaluation results are shown in Table 2.

(MBR/t) (MBR/t)

根據JIS H3130,分別進行彎曲軸與壓延方向垂直之方向即GW(Goodway)方向之W彎曲試驗及彎曲軸與壓延方向為相同方向即BW(Badway)方向之W彎曲試驗,使用W字型之金屬模具,改變彎曲半徑,求得不產生龜裂之最小彎曲半徑(MBR)與厚度(t)之比(MBR/t)。 According to JIS H3130, the W bending test in the direction of the bending axis perpendicular to the rolling direction, that is, the GW (Goodway) direction, and the W bending test in the BW (Badway) direction in which the bending axis and the rolling direction are the same direction are respectively used, and the W-shaped metal is used. The mold, changing the bending radius, finds the ratio of the minimum bending radius (MBR) to the thickness (t) without generating cracks (MBR/t).

由表1、2所示之內容可得知,發明例1~11中,含有合計 0.01~0.50質量%之Zr及Ti中之一種或兩種,於最終冷壓延前之再結晶退火中將結晶粒徑調整為50μm以下,於最終冷壓延時,將總加工度調整為40~99%,於弛力退火中,於連續退火爐以1~5MPa之張力使材料通板而使0.2%保證應力降低10~50MPa。藉此,發明例1~11之銅合金板可得到σ/L≦150之關係,可達成70%IACS以上之導電率、350MPa以上之0.2%保證應力、MBR/t≦2.0之W彎曲性。再者,於發明例5、7中,由於最終冷壓延中之每一道次之加工度未達15%,因此I{220}/I0{220}未達4.0,又,該等依契遜值/板厚未達0.5,然將每一道次之此加工度設為15%以上之發明例1~4、6、8~11滿足I{220}/I0{220}≧4.0之關係及依契遜值/板厚≧0.5之關係。 As can be seen from the contents shown in Tables 1 and 2, in Examples 1 to 11, a total of 0.01 to 0.50% by mass of one or both of Zr and Ti is contained, and crystallizing is performed in the recrystallization annealing before the final cold rolling. The particle size is adjusted to 50μm or less. In the final cold pressing delay, the total processing degree is adjusted to 40~99%. In the relaxation annealing, the material is passed through the continuous annealing furnace with a tension of 1~5MPa to make the 0.2% guaranteed stress. Reduce 10~50MPa. Thereby, the copper alloy sheets of Inventive Examples 1 to 11 can obtain a relationship of σ/L ≦ 150, and can achieve a conductivity of 70% IACS or more, a 0.2% proof stress of 350 MPa or more, and a W bendability of MBR/t ≦ 2.0. Furthermore, in Inventive Examples 5 and 7, since the processing degree of each pass in the final cold rolling is less than 15%, I{220}/I 0 {220} is less than 4.0, and again, these Ixon The value/plate thickness is less than 0.5, and the invention examples 1 to 4, 6, and 8 to 11 each having a degree of processing of 15% or more satisfy the relationship of I{220}/I 0 {220}≧4.0 and The relationship between the value of Ichison/plate thickness ≧0.5.

另一方面,比較例1、2未進行弛力退火,σ/L超過200, 彎曲性及拉延加工性差。 On the other hand, Comparative Examples 1 and 2 did not perform relaxation annealing, and σ/L exceeded 200. Bending and drawing workability are poor.

比較例3~6中,雖然進行弛力退火,但由於在爐內之材料張力超過5MPa,因此σ/L為150以上,特別是在張力較高之比較例5中,σ/L變得比200還要大,比較例3~6之彎曲性及拉延加工性差。 In Comparative Examples 3 to 6, although the relaxation annealing was performed, since the material tension in the furnace exceeded 5 MPa, σ/L was 150 or more, and particularly in Comparative Example 5 in which the tension was high, σ/L became a ratio. 200 is even larger, and the bending properties and drawing workability of Comparative Examples 3 to 6 are poor.

比較例7、8其弛力退火中之0.2%保證應力之降低量過小,(σ0-σ)不在10~50MPa之範圍。因此,σ/L超過150,拉延加工性及彎曲性差。 In Comparative Examples 7 and 8, 0.2% of the relaxation annealing was used to ensure that the amount of decrease in stress was too small, and (σ 0 - σ) was not in the range of 10 to 50 MPa. Therefore, σ/L exceeds 150, and the drawability and the bendability are inferior.

於比較例9中,由於弛力退火之強度降低較大,因此弛力退火後之0.2%保證應力未滿足350MPa。 In Comparative Example 9, since the strength of the relaxation annealing was largely lowered, the 0.2% proof stress after the relaxation annealing did not satisfy 350 MPa.

比較例10中,由於Zr及Ti中之一種或兩種合計未達0.01質量%,因此弛力退火後之0.2%保證應力未滿足350MPa。 In Comparative Example 10, since the total of one or both of Zr and Ti was less than 0.01% by mass, the 0.2% proof stress after the relaxation annealing did not satisfy 350 MPa.

比較例11中,由於Zr及Ti中之一種或兩種合計超過0.5質量%,因此導電率未滿足70%IACS。 In Comparative Example 11, since one or both of Zr and Ti totaled more than 0.5% by mass, the electrical conductivity did not satisfy 70% IACS.

於比較例12中,由於最終冷壓延前之再結晶退火結束時之結晶粒徑超過50μm,於比較例13中由於最終冷壓延時之總加工度未滿足40%,因此弛力退火後之0.2%保證應力未滿足350MPa。 In Comparative Example 12, since the crystal grain size at the end of the recrystallization annealing before the final cold rolling exceeded 50 μm, the total processing degree due to the final cold pressing delay did not satisfy 40% in Comparative Example 13, and therefore 0.2 after the relaxation annealing. % guaranteed stress does not meet 350 MPa.

由以上結果可知,藉由本發明,則可提供兼具高強度及導電性,且優異之拉延加工性及彎曲加工性的銅合金板,以及具備其之大電流用電子零件及散熱用電子零件。 As a result of the above, it is possible to provide a copper alloy sheet having both high strength and electrical conductivity, excellent drawability and bending workability, and electronic components for high current and electronic components for heat dissipation. .

Claims (6)

一種銅合金板,含有合計0.01~0.50質量%之Zr及Ti中一種或兩種,剩餘部分由銅及不可避免之雜質構成,具有70%IACS以上之導電率、及350MPa以上之0.2%保證應力,且0.2%保證應力σ(MPa)與延伸率L(%)滿足σ/L≦150之關係;將使用X射線繞射法在壓延面中於厚度方向求得之{220}面之X射線繞射積分強度設為I{220},將純銅粉末標準試樣之自{220}面之X射線繞射積分強度設為I0{220},此時,I{220}/I0{220}≧4.0。 A copper alloy plate containing a total of 0.01 to 0.50% by mass of one or two of Zr and Ti, the remainder being composed of copper and unavoidable impurities, having a conductivity of 70% IACS or more, and a 0.2% guaranteed stress of 350 MPa or more And the 0.2% guaranteed stress σ (MPa) and the elongation L (%) satisfy the relationship of σ/L ≦ 150; the X-ray diffraction method is used to determine the X-ray of the {220} plane in the thickness direction in the rolling surface. The diffraction integral intensity is set to I{220}, and the X-ray diffraction integral intensity from the {220} plane of the pure copper powder standard sample is set to I 0 {220}, at this time, I{220}/I 0 {220 }≧4.0. 如申請專利範圍第1項之銅合金板,其含有合計0.015~0.3質量%之Zr及Ti中一種或兩種。 A copper alloy sheet according to claim 1 which contains one or both of Zr and Ti in a total amount of 0.015 to 0.3% by mass. 如申請專利範圍第1或2項之銅合金板,其中,W彎曲試驗中之壓延平行方向(GW方向)及壓延垂直方向(BW方向)的最小彎曲半徑/板厚(MBR/t)表述為MBR/t≦2.0。 The copper alloy sheet according to claim 1 or 2, wherein the minimum bending radius/plate thickness (MBR/t) of the rolling parallel direction (GW direction) and the rolling vertical direction (BW direction) in the W bending test is expressed as MBR/t≦2.0. 如申請專利範圍第1或2項之銅合金板,其中,依契遜試驗(Erichsen test)中之依契遜值/板厚為0.5以上。 For example, the copper alloy sheet of claim 1 or 2, wherein the Erichsen test has an Echsen value/plate thickness of 0.5 or more. 一種大電流用電子零件,具備申請專利範圍第1或2項之銅合金板。 A high-current electronic component having a copper alloy plate of the first or second patent application scope. 一種散熱用電子零件,具備申請專利範圍第1或2項之銅合金板。 A heat-dissipating electronic component having a copper alloy plate of the first or second patent application scope.
TW103128762A 2013-11-19 2014-08-21 Copper alloy plate, and with its high current with electronic components and thermal electronic components TWI521073B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013239197A JP5632063B1 (en) 2013-11-19 2013-11-19 Copper alloy plate, high-current electronic component and heat dissipation electronic component including the same

Publications (2)

Publication Number Publication Date
TW201522671A TW201522671A (en) 2015-06-16
TWI521073B true TWI521073B (en) 2016-02-11

Family

ID=52145011

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103128762A TWI521073B (en) 2013-11-19 2014-08-21 Copper alloy plate, and with its high current with electronic components and thermal electronic components

Country Status (5)

Country Link
JP (1) JP5632063B1 (en)
KR (1) KR101788497B1 (en)
CN (1) CN105765093A (en)
TW (1) TWI521073B (en)
WO (1) WO2015075990A1 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6464740B2 (en) * 2014-12-26 2019-02-06 三菱マテリアル株式会社 Copper alloy for electronic and electrical equipment, copper alloy sheet for electronic and electrical equipment, parts for electronic and electrical equipment, terminals and bus bars
JP6464741B2 (en) * 2014-12-26 2019-02-06 三菱マテリアル株式会社 Copper alloy for electronic and electrical equipment, copper alloy sheet for electronic and electrical equipment, parts for electronic and electrical equipment, terminals and bus bars
JP6464742B2 (en) * 2014-12-26 2019-02-06 三菱マテリアル株式会社 Copper alloy for electronic and electrical equipment, copper alloy sheet for electronic and electrical equipment, parts for electronic and electrical equipment, terminals and bus bars
JP6749121B2 (en) * 2016-03-30 2020-09-02 Jx金属株式会社 Copper alloy plate with excellent strength and conductivity
TWI674326B (en) * 2018-11-19 2019-10-11 財團法人工業技術研究院 Copper zirconium alloy heat dissipation element and method of manufacturing copper zirconium alloy housing
CN110592421B (en) * 2019-10-29 2020-07-07 吉林大学 Copper alloy, copper alloy sheet material, and preparation method and application thereof
CN112281023B (en) * 2020-11-23 2021-08-31 宁波博威合金材料股份有限公司 Copper alloy material with excellent bending property and preparation method and application thereof

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005133185A (en) * 2003-10-31 2005-05-26 Nippon Mining & Metals Co Ltd Deposition type copper alloy heat treatment method, deposition type copper alloy, and raw material thereof
JP4157899B2 (en) 2006-11-17 2008-10-01 株式会社神戸製鋼所 High strength copper alloy sheet with excellent bending workability
CN100532599C (en) * 2007-08-01 2009-08-26 苏州有色金属研究院有限公司 Fatigue resistant Cu-Ti alloy and producing method thereof
JP5312920B2 (en) 2008-11-28 2013-10-09 Jx日鉱日石金属株式会社 Copper alloy plate or strip for electronic materials
KR101521408B1 (en) * 2009-01-26 2015-05-18 후루카와 덴키 고교 가부시키가이샤 Electrical wire conductor for wiring, method for producing electrical wire conductor for wiring, electrical wire for wiring, and copper alloy wire
JP4550148B1 (en) * 2009-03-13 2010-09-22 三菱伸銅株式会社 Copper alloy and manufacturing method thereof
JP4642119B2 (en) * 2009-03-23 2011-03-02 三菱伸銅株式会社 Copper alloy and method for producing the same
JP5170916B2 (en) * 2010-08-27 2013-03-27 古河電気工業株式会社 Copper alloy sheet and manufacturing method thereof
JP5060625B2 (en) * 2011-02-18 2012-10-31 三菱伸銅株式会社 Cu-Zr-based copper alloy plate and manufacturing method thereof
JP5461467B2 (en) * 2011-03-29 2014-04-02 Jx日鉱日石金属株式会社 Titanium copper excellent in strength, electrical conductivity and bending workability and its manufacturing method
JP5432201B2 (en) 2011-03-30 2014-03-05 Jx日鉱日石金属株式会社 Copper alloy sheet with excellent heat dissipation and repeated bending workability
JP6188273B2 (en) 2011-11-18 2017-08-30 Jx金属株式会社 Copper alloy sheet with excellent heat dissipation and repeated bending workability
JP5847787B2 (en) 2013-11-26 2016-01-27 Jx日鉱日石金属株式会社 Copper alloy sheet with excellent conductivity and stress relaxation properties

Also Published As

Publication number Publication date
JP5632063B1 (en) 2014-11-26
CN105765093A (en) 2016-07-13
KR20160088379A (en) 2016-07-25
WO2015075990A1 (en) 2015-05-28
JP2015098628A (en) 2015-05-28
TW201522671A (en) 2015-06-16
KR101788497B1 (en) 2017-10-19

Similar Documents

Publication Publication Date Title
TWI521073B (en) Copper alloy plate, and with its high current with electronic components and thermal electronic components
TWI521071B (en) Conductive and stress relief characteristics of excellent copper alloy plate
JP6270417B2 (en) Copper alloy sheet with excellent conductivity and stress relaxation properties
JP5427971B1 (en) Copper alloy sheet with excellent conductivity and bending deflection coefficient
TWI471428B (en) Conductive and stress relief characteristics of excellent copper alloy plate
JP5467163B1 (en) Copper alloy plate, heat dissipating electronic component comprising the same, and method for producing copper alloy plate
JP6328380B2 (en) Copper alloy sheet with excellent conductivity and bending deflection coefficient
JP2015048521A (en) Copper alloy sheet excellent in conductivity and bending deflection coefficient
JP2017155340A (en) Copper alloy sheet excellent in conductivity and stress relaxation characteristic
JP2017002407A (en) Copper alloy sheet excellent in conductivity and stress relaxation characteristic
TWI589715B (en) Copper alloy strip and with its high-current electronic components and cooling electronic components
TWI509090B (en) Copper alloy plate, and with its high current with electronic components and thermal electronic components
JP5449595B1 (en) Copper alloy sheet with excellent conductivity and bending deflection coefficient
JP6222971B2 (en) Copper alloy sheet with excellent conductivity and stress relaxation properties
TW201413013A (en) Copper alloy plate having excellent electroconductive properties and stress relaxation properties
JP5427968B1 (en) Copper alloy plate and heat dissipating electronic component including the same
JP2014055347A (en) Copper alloy sheet excellent in conductivity and stress relief properties
JP6140555B2 (en) Cu-Zr-Ti copper alloy strip