TWI518356B - Optical device - Google Patents

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TWI518356B
TWI518356B TW103110029A TW103110029A TWI518356B TW I518356 B TWI518356 B TW I518356B TW 103110029 A TW103110029 A TW 103110029A TW 103110029 A TW103110029 A TW 103110029A TW I518356 B TWI518356 B TW I518356B
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refractive index
layer
index layer
optical device
visible light
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TW103110029A
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TW201443470A (en
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Yuichi Kamo
Manabu Ohnishi
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Daishinku Corp
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14Protective coatings, e.g. hard coatings
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11Anti-reflection coatings
    • G02B1/113Anti-reflection coatings using inorganic layer materials only
    • G02B1/115Multilayers
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B2207/00Coding scheme for general features or characteristics of optical elements and systems of subclass G02B, but not including elements and systems which would be classified in G02B6/00 and subgroups
    • G02B2207/101Nanooptics

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Laminated Bodies (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Optical Filters (AREA)
  • Surface Treatment Of Glass (AREA)

Description

光學裝置 Optical device

本發明關於一種光學裝置,其係於紅外線吸收玻璃等可見光穿透性基板的面上形成有抗反射膜(AR膜:Anti Reflection)者。再者,本說明書中所稱之折射率係於大氣中之折射率。 The present invention relates to an optical device in which an antireflection film (AR film: Anti Reflection) is formed on a surface of a visible light transmissive substrate such as infrared absorbing glass. Furthermore, the refractive index referred to in this specification is the refractive index in the atmosphere.

數位相機等中所使用之CCD、CMOS等攝影元件的分光感度係從可見光之區域跨至紅外光之區域。攝影元件正前方之光學系統中,使用有例如紅外線吸收玻璃作為上述可見光穿透性基板者中,入射至攝影元件的光中,紅外光會經紅外線吸收玻璃吸收,使得攝影元件可以對可見光受光,使攝影影像近似於人類的視感度。然後藉由於此紅外線吸收玻璃等可見光穿透性基板之表面成膜抗反射膜,減少了可見光之反射損失,提高了穿透率。 The spectral sensitivity of a photographic element such as a CCD or a CMOS used in a digital camera or the like extends from a region of visible light to a region of infrared light. In the optical system directly in front of the photographic element, for example, an infrared absorbing glass is used as the visible light penetrating substrate, and the infrared light is absorbed by the infrared absorbing glass so that the photographic element can receive the visible light. The photographic image is approximated to the human visual sensation. Then, by forming an anti-reflection film on the surface of the visible light-transmitting substrate such as the infrared absorbing glass, the reflection loss of visible light is reduced, and the transmittance is improved.

此種於可見光穿透性基板表面經成膜抗反射膜之光學裝置中,若上述之抗反射膜為單層,則任意波長以外抗反射效果不足。專利文獻1中亦提出了一種由折射率不同之3層構成之抗反射膜的技術,可防止可見光區域整體即400nm~700nm光譜的反射。 In such an optical device in which the antireflection film is formed on the surface of the visible light-transmissive substrate, if the antireflection film is a single layer, the antireflection effect is not sufficient at any wavelength. Patent Document 1 also proposes a technique of an antireflection film composed of three layers having different refractive indices, and can prevent reflection of a spectrum of 400 nm to 700 nm as a whole in a visible light region.

專利文獻1:日本特開平5-2101號公報 Patent Document 1: Japanese Patent Laid-Open No. 5-2101

然而,攝影機的使用環境亦有高溫高濕之環境,而組裝至此 種攝影機光學系統之光學裝置期望在高溫高濕之環境下其光學特性亦不會受損。本發明人對於光學裝置實施長時間放置在高溫高濕環境下之試驗,結果,試驗前可見光穿透率良好之光學裝置在試驗後,水分侵入基板內部,使基板溶解而造成光散射,因而發生整體看起來呈白濁之現象,可見光的穿透率極度地下降。因此,本發明人針對上述白濁現象之發生原因進行努力研究之結果,從而完成了本發明。 However, the environment in which the camera is used also has a high temperature and high humidity environment, and the assembly is here. The optical device of the camera optical system is expected to have no optical damage in an environment of high temperature and high humidity. The present inventors conducted an experiment in which an optical device was placed in a high-temperature and high-humidity environment for a long period of time. As a result, after the test, the optical device having a good visible light transmittance before the test, the moisture intruded into the inside of the substrate, and the substrate was dissolved to cause light scattering, thereby occurring. The overall appearance is white and cloudy, and the transmittance of visible light is extremely lowered. Therefore, the inventors of the present invention completed the present invention by conducting an effort to study the cause of the above-mentioned white turbidity phenomenon.

亦即,本發明係鑒於上述情況而完成的,目的在於提供一種光學裝置,其係於紅外線吸收玻璃等可見光穿透性基板之面上設有由折射率相異之複數積層膜構成的抗反射膜而成之光學裝置,即使在高溫高濕環境下長時間放置,上述白濁現象之發生能被防止,穿透性維持與試驗前相同,耐候性優異。 That is, the present invention has been made in view of the above circumstances, and an object thereof is to provide an optical device which is provided with an antireflection composed of a plurality of laminated films having different refractive indices on a surface of a visible light transmitting substrate such as an infrared absorbing glass. The film-formed optical device can prevent the occurrence of the above-mentioned white turbidity phenomenon even when placed in a high-temperature and high-humidity environment for a long time, and the penetration property is maintained as in the case of the test, and the weather resistance is excellent.

(1)為了達成上述目的,本發明之光學裝置係於可見光穿透性基板之至少1面上具備防止可見光反射之抗反射膜者,其特徵在於:上述抗反射膜係折射率相異之至少2層以上之折射率層積層所構成,並且上述至少2層以上之折射率層之中,折射率低之折射率層以外的至少1層以上的折射率層,至少含有Al2O3或ZrO2或該等之混合物作為其材料,且於上述抗反射膜之上面的粒子平均粒徑未達25nm。 (1) In order to achieve the above object, the optical device of the present invention is provided with an antireflection film for preventing visible light reflection on at least one surface of a visible light transmissive substrate, wherein the antireflection film has a refractive index different from each other. The refractive index layer of two or more layers is formed, and at least one or more refractive index layers other than the refractive index layer having a low refractive index among the at least two or more refractive index layers contain at least Al 2 O 3 or ZrO. 2 or a mixture of the materials as the material thereof, and the average particle diameter of the particles above the anti-reflection film is less than 25 nm.

上述抗反射膜可設於上述可見光穿透性基板之單面,亦可設於雙面,任一情況皆包含於本發明中。上述抗反射膜,其成膜方法並不限定,較佳為利用真空蒸鍍法等物理蒸鍍法來形成。只要於上述抗反射膜之上面的粒子平均粒徑未達25nm,則任何平均粒徑皆可,適當地選擇平均粒徑即可。 The antireflection film may be provided on one surface of the visible light transmissive substrate or may be provided on both sides, and any of the cases may be included in the present invention. The film formation method of the antireflection film is not limited, and it is preferably formed by a physical vapor deposition method such as a vacuum deposition method. As long as the average particle diameter of the particles on the upper surface of the antireflection film is less than 25 nm, any average particle diameter may be sufficient, and the average particle diameter may be appropriately selected.

本發明中,藉由於上述抗反射膜之上面的粒子平均粒徑未達25nm,可使得即使於高溫高濕之環境下長時間放置,亦可防止水份輕易地浸入抗反射膜中,結果防止了白濁情況,可維持可見光的穿透性。當將本發明之光學裝置配置於攝影機攝影元件正前方的情況時,可提供一種能長期維持良好之攝影影像,耐候性優異之攝影機。 In the present invention, since the average particle diameter of the particles on the upper surface of the anti-reflection film is less than 25 nm, it is possible to prevent moisture from easily immersing in the anti-reflection film even when placed in a high-temperature and high-humidity environment for a long time, and as a result, it is prevented. In the case of white turbidity, the penetration of visible light can be maintained. When the optical device of the present invention is disposed directly in front of the camera imaging element, it is possible to provide a camera capable of maintaining a good photographic image for a long period of time and having excellent weather resistance.

再者,可見光穿透性基板只要是可使可見光穿透者即可,並不特別限定。 In addition, the visible light transmissive substrate is not particularly limited as long as it can penetrate visible light.

(2)本發明之上述(1)中較佳之實施態様如下:上述折射率相異之至少2層以上之折射率層係積層於上述可見光穿透性基板的面上所構成,並且至少從可見光穿透性基板起算第1層之折射率層至少含有Al2O3或ZrO2或該等之混合物作為其材料。 (2) The preferred embodiment of the above (1) of the present invention is characterized in that at least two or more refractive index layer layers having different refractive indices are formed on the surface of the visible light-transmitting substrate, and at least from visible light The refractive index layer of the first layer from the penetrating substrate contains at least Al 2 O 3 or ZrO 2 or a mixture thereof as its material.

此情況時,藉由至少從可見光穿透性基板起算第1層之折射率層的材料以至少含有Al2O3或ZrO2或該等之混合物者來構成,而折射率位於1.6~1.7之範圍的Al2O3會形成為中折射率層、或者折射率位於2.0~2.4之範圍的ZrO2會形成為高折射率層,故有易於進行由多數層構成之抗反射膜之設計的優點。結果可獲得於可見光區域整體具有抗反射效果之分光特性。然而,至少從可見光穿透性基板起算第1層之折射率層的材料若至少含有Al2O3或ZrO2或該等之混合物,則當水分浸入之際,會有易於使基板溶解之作用,以往之問題點將更容易顯著地產生。對於此,藉由與上述構成相組合,可防止水分易於浸入抗反射膜中,並防止白濁情況,可維持可見光之穿透性。 In this case, the material of the refractive index layer of the first layer is at least composed of at least Al 2 O 3 or ZrO 2 or a mixture thereof from at least the visible light-transmitting substrate, and the refractive index is in the range of 1.6 to 1.7. The range of Al 2 O 3 is formed as a medium refractive index layer, or ZrO 2 having a refractive index in the range of 2.0 to 2.4 is formed into a high refractive index layer, so that there is an advantage that it is easy to design an antireflection film composed of a plurality of layers. . As a result, the spectral characteristics of the entire visible light region having an antireflection effect can be obtained. However, if at least the material of the refractive index layer of the first layer from the visible light-permeable substrate contains at least Al 2 O 3 or ZrO 2 or a mixture of the above, when the moisture is immersed, there is a possibility that the substrate is easily dissolved. The past problems will be more likely to occur significantly. With this configuration, in combination with the above configuration, it is possible to prevent moisture from easily entering the antireflection film and to prevent white turbidity, and to maintain the visibility of visible light.

(3)本發明之上述(1)中較佳之實施態様如下:上述可見 光穿透性基板之材料為含有銅離子之氟磷酸鹽系玻璃或者是磷酸鹽系玻璃。 (3) The preferred embodiment of the above (1) of the present invention is as follows: The material of the light-transmitting substrate is a fluorophosphate-based glass containing copper ions or a phosphate-based glass.

此情況時,若可見光穿透性基板之材料為含有銅離子之氟磷酸鹽系玻璃或者是磷酸鹽系玻璃,則可在紅外線吸收效果高之狀態下使攝影元件對可見光受光,可使得攝影影像近似於人類的視感度。又,可減少虛像(ghost)、光斑(flare)之原因。然而,可見光穿透性基板之材料若為含有銅離子之氟磷酸鹽系玻璃或者是磷酸鹽系玻璃,則有時當水分浸入之際會發生溶解,以往之問題點將更容易顯著地發生。對於此,藉由與上述構成相組合,可防止水分易於浸入抗反射膜中,並防止白濁情況,可維持可見光之穿透性。 In this case, when the material of the visible light-transmissive substrate is a fluorophosphate-based glass containing copper ions or a phosphate-based glass, the photographic element can be exposed to visible light in a state where the infrared absorbing effect is high, and the photographic image can be made. It approximates the human visual sensitivity. Moreover, the cause of the ghost and the flare can be reduced. However, when the material of the visible light-transmissive substrate is a fluorophosphate-based glass containing copper ions or a phosphate-based glass, dissolution may occur when moisture is immersed, and the conventional problem is more likely to occur remarkably. With this configuration, in combination with the above configuration, it is possible to prevent moisture from easily entering the antireflection film and to prevent white turbidity, and to maintain the visibility of visible light.

本發明之光學裝置即使於高溫高濕之環境下長時間放置亦可防止白濁現象之發生,故係可長期維持初期光學特性之耐候性優異者。 The optical device of the present invention can prevent the occurrence of white turbidity even when left in an environment of high temperature and high humidity for a long period of time, so that the weather resistance of the initial optical characteristics can be maintained for a long period of time.

1,1a,1b,1c‧‧‧光學裝置 1,1a,1b,1c‧‧‧optical devices

2‧‧‧紅外線吸收玻璃 2‧‧‧Infrared absorption glass

3‧‧‧抗反射膜 3‧‧‧Anti-reflective film

3a‧‧‧第1層之中折射率層 3a‧‧‧The first layer of the refractive index layer

3b‧‧‧第2層之高折射率層 3b‧‧‧2nd layer of high refractive index layer

3c‧‧‧第3層之低折射率層 3c‧‧‧Layer 3 low refractive index layer

3d‧‧‧第1層之高折射率層 3d‧‧‧1st layer of high refractive index layer

3e‧‧‧第2層之低折射率層 3e‧‧‧2nd layer of low refractive index layer

3f‧‧‧第1層之中折射率層 3f‧‧‧The first layer of the refractive index layer

3g‧‧‧第2層之低折射率層 3g‧‧‧2nd layer of low refractive index layer

3h‧‧‧第1層之高折射率層 3h‧‧‧1st layer of high refractive index layer

3i‧‧‧第2層之低折射率層 3i‧‧‧2nd layer of low refractive index layer

3j‧‧‧第3層之高折射率層 3j‧‧‧3rd layer of high refractive index layer

3k‧‧‧第4層之低折射率層 3k‧‧‧4th layer of low refractive index layer

圖1係本發明實施型態之光學裝置的截面圖。 BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a cross-sectional view showing an optical device according to an embodiment of the present invention.

圖2係上述光學裝置之波長對反射率特性圖。 Fig. 2 is a graph showing the wavelength versus reflectance characteristics of the above optical device.

圖3(a)係於比較例之表面的粒子狀態示意圖、圖3(b)係於實施型態之表面的粒子狀態示意圖。 Fig. 3(a) is a schematic view showing the state of the particles on the surface of the comparative example, and Fig. 3(b) is a schematic view showing the state of the particles on the surface of the embodiment.

圖4係本發明其他實施型態之光學裝置的截面圖。 Figure 4 is a cross-sectional view showing an optical device according to another embodiment of the present invention.

圖5係本發明另外其他實施型態之光學裝置的截面圖。 Figure 5 is a cross-sectional view showing an optical device according to still another embodiment of the present invention.

圖6係本發明另外其他實施型態之光學裝置的截面圖。 Figure 6 is a cross-sectional view showing an optical device according to still another embodiment of the present invention.

圖7(a)係表示於適當溫度製作之光學裝置中的抗反射膜上面之粒子 狀態的SEM像(掃描型電子顯微鏡照片像)、圖7(b)係表示於超出溫度製作之光學裝置中的抗反射膜上面之粒子狀態的SEM像。 Figure 7 (a) shows the particles on the anti-reflection film in an optical device fabricated at an appropriate temperature. The SEM image (scanning electron microscope image) of the state and FIG. 7(b) show the SEM image of the particle state on the surface of the antireflection film in the optical device manufactured by the temperature.

圖8(a)係從比較例中高溫高濕試驗前後之與光照射面相反側所拍攝的攝影照片、圖8(b)係從實施型態中高溫高濕試驗前後之與光照射面相反側所拍攝之攝影照片。 Fig. 8(a) is a photograph taken from the side opposite to the light irradiation surface before and after the high temperature and high humidity test in the comparative example, and Fig. 8(b) is the opposite to the light irradiation surface before and after the high temperature and high humidity test in the embodiment. Photographs taken on the side.

以下參照所附之圖式詳細地說明本發明之實施型態。 Embodiments of the present invention will be described in detail below with reference to the accompanying drawings.

圖1係本發明實施型態之光學裝置的截面圖。參照圖1,光學裝置1具備紅外線吸收玻璃2、與設於此紅外線吸收玻璃2之面上的抗反射膜3。 BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a cross-sectional view showing an optical device according to an embodiment of the present invention. Referring to Fig. 1, an optical device 1 includes an infrared absorbing glass 2 and an antireflection film 3 provided on a surface of the infrared absorbing glass 2.

紅外線吸收玻璃2,就可見光穿透性基板之一例而言,只要是會使可見光穿透並且可吸收紅外光者,即不對其玻璃素材特別地限制,但可例舉含有銅離子之氟磷酸鹽系玻璃或者含有銅離子之磷酸鹽系玻璃等。 In the case of the infrared absorbing glass 2, as long as it is a light-transmitting substrate, as long as it transmits visible light and absorbs infrared light, it is not particularly limited to the glass material, but a fluorophosphate containing copper ions is exemplified. Glass or phosphate glass containing copper ions.

抗反射膜3係由積層膜構成,該積層膜係於紅外線吸收玻璃2之面上,依順序積層第1層、第2層及第3層成為3層而成者。 The antireflection film 3 is composed of a laminated film which is formed on the surface of the infrared absorbing glass 2, and is formed by laminating the first layer, the second layer, and the third layer in three layers.

抗反射膜3中,從紅外線吸收玻璃2起算第1層是折射率為上述3層中的中間之層即中折射率層3a,從紅外線吸收玻璃2起算第2層是折射率為上述3層中的最高之層即高折射率層3b,從紅外線吸收玻璃2起算第3層是折射率為上述3層中的最低之層即低折射率層3c。 In the anti-reflection film 3, the first layer is the medium refractive index layer 3a having a refractive index of the middle of the three layers from the infrared absorbing glass 2, and the second layer is the above three layers from the infrared absorbing glass 2. The highest layer in the middle, that is, the high refractive index layer 3b, the third layer from the infrared absorbing glass 2 is a low refractive index layer 3c having a refractive index of the lowest of the above three layers.

第1層之中折射率層3a係折射率為1.6~1.7之範圍且光學膜厚約1/4 λ(其中,λ為光波長520nm左右,以下亦同。)之折射率層, 含有Al2O3、ZrO2、Al2O3與ZrO2之混合物中至少任一種作為材料。 In the first layer, the refractive index layer 3a has a refractive index of 1.6 to 1.7 and an optical film thickness of about 1/4 λ (where λ is a wavelength of about 520 nm, the same applies hereinafter), and contains Al 2 . At least one of O 3 , ZrO 2 , a mixture of Al 2 O 3 and ZrO 2 is used as the material.

第2層之高折射率層3b係折射率為2.0~2.4之範圍且光學膜厚約1/2 λ之折射率層,含有Al2O3、ZrO2、Al2O3與ZrO2之混合物中至少任一種作為材料。 The second layer of the high refractive index layer 3b is a refractive index layer having a refractive index of 2.0 to 2.4 and an optical film thickness of about 1/2 λ, and contains a mixture of Al 2 O 3 , ZrO 2 , Al 2 O 3 and ZrO 2 . At least one of them is used as a material.

第3層之低折射率層3c係折射率為1.5以下且光學膜厚約1/4 λ之折射率層,由MgF2、其他材料構成。 The third layer of the low refractive index layer 3c is a refractive index layer having a refractive index of 1.5 or less and an optical film thickness of about 1/4 λ, and is made of MgF 2 or another material.

此種構成之光學裝置1中,如圖2所例示,在可見光之波長區域400~700nm之反射率為1%以下。但此波長區域之範圍會因人而異,故例示作為一例。亦即,人的眼睛於暗處會對400~620nm左右之範圍波長的光線應答,在亮處會對420~700nm左右之範圍波長的光線應答。另一方面,一般的攝影機攝影元件(CCD),會對400~700nm之範圍波長的光線以高感度應答,進而對於未達400nm之波長的光線、或超過700nm之波長(紅外區域)的光線亦會應答。因此,若如圖2般將可見光波長區域400~700nm之反射率設為1%以下,使得此光學裝置1配置於攝影元件正前方的光學系統,則紅外光會被此光學裝置1吸收而不會到達攝影元件。另一方面,因為可見光可以高穿透率到達攝影元件,故便可獲得接近人眼之良好攝影影像。 In the optical device 1 of such a configuration, as illustrated in FIG. 2, the reflectance in the visible light wavelength region of 400 to 700 nm is 1% or less. However, the range of this wavelength region varies from person to person, and is exemplified as an example. That is, the human eye responds to light in the range of about 400 to 620 nm in the dark, and responds to light in the range of about 420 to 700 nm in the bright place. On the other hand, a general camera photographic element (CCD) responds with high sensitivity to light in the range of 400 to 700 nm, and thus to light of wavelengths less than 400 nm or wavelengths of more than 700 nm (infrared). Will answer. Therefore, if the reflectance of the visible light wavelength region of 400 to 700 nm is set to 1% or less as shown in FIG. 2 so that the optical device 1 is disposed in the optical system directly in front of the image pickup element, the infrared light is absorbed by the optical device 1 without Will reach the photographic element. On the other hand, since visible light can reach the photographic element with high transmittance, a good photographic image close to the human eye can be obtained.

實施型態中,特徵在於抗反射膜3之上面的粒子平均粒徑未達25nm。粒子之平均粒徑若為此般極小,則抗反射膜3之上面的粒子間的間隙面積會變小,因此即使於高溫高濕環境下長時間放置,水分亦不易浸入抗反射膜3內部,有效防止了白濁現象的發生。 In the embodiment, the average particle diameter of the particles above the anti-reflection film 3 is less than 25 nm. If the average particle diameter of the particles is extremely small, the gap area between the particles on the upper surface of the anti-reflection film 3 becomes small. Therefore, even if it is left for a long time in a high-temperature and high-humidity environment, moisture does not easily enter the inside of the anti-reflection film 3. Effectively prevent the occurrence of white turbidity.

上述抗反射膜3之上面之粒子平均粒徑若為24nm,則霧值 成為0.3,故平均粒徑較佳為24nm以下,平均粒徑若為21nm,則霧值便未達0.2,故平均粒徑較佳為21nm以下。 If the average particle diameter of the particles above the anti-reflection film 3 is 24 nm, the haze value When it is 0.3, the average particle diameter is preferably 24 nm or less, and if the average particle diameter is 21 nm, the haze value is less than 0.2, so the average particle diameter is preferably 21 nm or less.

再者,所謂粒徑,係每一粒子地以算術雙軸平均徑((長邊+短邊)/2)所測得之值,所謂平均粒徑係針對粒子50個以上測定之粒徑加以平均而得者。 In addition, the particle diameter is a value measured by an arithmetic biaxial average diameter ((long side + short side)/2) for each particle, and the average particle diameter is the particle diameter measured by 50 or more particles. The average winner.

粒徑之測定方法係針對上述抗反射膜3之上面的SEM像所得之特定區域,計測50個粒子以上之長邊及短邊長度來進行。 The method of measuring the particle diameter is performed by measuring the long side and the short side length of 50 or more particles in a specific region obtained by the SEM image of the upper surface of the anti-reflection film 3.

又,所謂抗反射膜3之上面係指抗反射膜3中與大氣相接之面。 Moreover, the upper surface of the anti-reflection film 3 means the surface of the anti-reflection film 3 which is connected to the atmosphere.

針對此情況,參照圖3來說明以往與實施型態各個抗反射膜上面之狀態,即如下:圖3(a)係表示以往之抗反射膜之上面的狀態,圖3(b)係表示實施型態之抗反射膜之上面的狀態。以往的情況,於抗反射膜上面的各粒子4a其直徑有各種大小,因為粒子4a的平均粒徑為25nm以上,故如圖3(a)示意表示般,各粒子4a間的間隙5a之面積變大,因此若於高溫高濕下經過長時間放置,則水分容易從形成抗反射膜上面之各粒子4a間的間隙5a浸入抗反射膜3內部,而發生白濁現象。 In this case, the state of the upper surface of each of the conventional anti-reflection films of the embodiment will be described with reference to Fig. 3, that is, Fig. 3(a) shows the state of the upper surface of the conventional antireflection film, and Fig. 3(b) shows the implementation. The state above the antireflective film of the type. In the conventional case, each of the particles 4a on the antireflection film has various diameters. Since the average particle diameter of the particles 4a is 25 nm or more, the area of the gap 5a between the respective particles 4a is schematically shown in Fig. 3(a). When it is left standing for a long period of time under high temperature and high humidity, moisture easily immerses into the inside of the antireflection film 3 from the gap 5a between the respective particles 4a on the upper surface of the antireflection film, and white turbidity occurs.

相對於此,實施型態中,形成抗反射膜3之上面的各粒子4b其直徑雖有各種大小,但因為粒子4b之平均粒徑未達25nm,故如圖3(b)示意表示般,於抗反射膜3上面之各粒子4b間的間隙面積變小,即使於高溫高濕下經過長時間放置,水分亦不會容易地從抗反射膜3之上面浸入抗反射膜3內部。因此,水分亦不容易浸入構成抗反射膜3之各折射率層3a~3c的交界、或者抗反射膜3與紅外線吸收玻璃2之交界,長期有效 地防止白濁現象之發生。 On the other hand, in the embodiment, the particles 4b on the upper surface of the anti-reflection film 3 have various sizes, but since the average particle diameter of the particles 4b is less than 25 nm, as shown schematically in Fig. 3(b), The gap area between the respective particles 4b on the anti-reflection film 3 is small, and even if it is left standing for a long time under high temperature and high humidity, moisture does not easily enter the inside of the anti-reflection film 3 from the upper surface of the anti-reflection film 3. Therefore, moisture is not easily immersed in the boundary of the respective refractive index layers 3a to 3c constituting the anti-reflection film 3, or the boundary between the anti-reflection film 3 and the infrared absorbing glass 2 is effective for a long period of time. To prevent the occurrence of white turbidity.

圖4係其他實施型態之光學裝置的截面圖。此實施型態中,抗反射膜3由從紅外線吸收玻璃2起算第1層之高折射率層3d、與從紅外線吸收玻璃2起算第2層之低折射率層3e之合計2層構成。 Figure 4 is a cross-sectional view of an optical device of another embodiment. In this embodiment, the antireflection film 3 is composed of a total of two layers of the high refractive index layer 3d of the first layer and the low refractive index layer 3e of the second layer from the infrared absorbing glass 2 from the infrared absorbing glass 2.

第1層之高折射率層3d係折射率為2.0~2.4之範圍且光學膜厚約1/2 λ之折射率層,含有Al2O3、ZrO2、Al2O3與ZrO2之混合物中至少任一種作為材料。 The first layer of the high refractive index layer 3d is a refractive index layer having a refractive index of 2.0 to 2.4 and an optical film thickness of about 1/2 λ, and contains a mixture of Al 2 O 3 , ZrO 2 , Al 2 O 3 and ZrO 2 . At least one of them is used as a material.

第2層之低折射率層3e係折射率為1.5以下且光學膜厚約1/4 λ之折射率層,由MgF2、其他材料所構成。 The second layer of the low refractive index layer 3e is a refractive index layer having a refractive index of 1.5 or less and an optical film thickness of about 1/4 λ, and is composed of MgF 2 or another material.

此實施型態的情況時亦然,抗反射膜3之表面的粒子平均粒徑未達25nm,於抗反射膜之膜表面的各粒子間之面積變小,即使在高溫高濕環境下水分亦不易浸入抗反射膜3內部,防止了白濁現象之發生。 Also in the case of this embodiment, the average particle diameter of the surface of the anti-reflection film 3 is less than 25 nm, and the area between the particles on the surface of the anti-reflection film becomes small, even in a high-temperature and high-humidity environment. It is not easy to be immersed in the interior of the anti-reflection film 3 to prevent the occurrence of white turbidity.

圖5係另外其他實施型態之光學裝置的截面圖。此實施型態中,抗反射膜3係由從紅外線吸收玻璃2起算第1層之中折射率層3f、與從紅外線吸收玻璃2起算第2層之低折射率層3g之合計2層構成。 Figure 5 is a cross-sectional view of another embodiment of an optical device. In this embodiment, the antireflection film 3 is composed of two layers of the refractive index layer 3f in the first layer and the low refractive index layer 3g in the second layer from the infrared absorbing glass 2 from the infrared absorbing glass 2.

第1層之中折射率層3f係折射率為1.6~1.7之範圍且光學膜厚為1/4 λ~1/2 λ之範圍之折射率層,含有Al2O3、ZrO2、Al2O3與ZrO2之混合物中至少任一種。 In the first layer, the refractive index layer 3f is a refractive index layer having a refractive index in the range of 1.6 to 1.7 and an optical film thickness of 1/4 λ to 1/2 λ, and contains Al 2 O 3 , ZrO 2 , and Al 2 . At least any one of a mixture of O 3 and ZrO 2 .

第2層之低折射率層3g係折射率為1.5以下且光學膜厚為約1/4 λ之折射率層,由MgF2、其他材料所構成。 The second layer of the low refractive index layer 3g is a refractive index layer having a refractive index of 1.5 or less and an optical film thickness of about 1/4 λ, and is composed of MgF 2 or another material.

此實施型態的情況亦然,抗反射膜3之表面之粒子平均粒徑未達25nm,於抗反射膜3之上面的各粒子間間隙的面積變小,即使在高溫 高濕環境下水分亦不易浸入抗反射膜3內部,防止了白濁現象之發生。 Also in the case of this embodiment, the average particle diameter of the surface of the anti-reflection film 3 is less than 25 nm, and the area of the gap between the particles above the anti-reflection film 3 becomes small, even at a high temperature. In the high-humidity environment, moisture is also less likely to be immersed in the interior of the anti-reflection film 3, preventing the occurrence of white turbidity.

圖6係另外其他實施型態之光學裝置1c的截面圖。此實施型態中,當抗反射膜3係以從紅外線吸收玻璃2起算奇數層為高折射率層、偶數層為低折射率層的方式交互積層而由n(n=1,2,3,4,…)層構成之抗反射膜時,其一例而言係由從紅外線吸收玻璃2起算第1層之高折射率層3h、第2層之低折射率層3i、第3層之高折射率層3j、以及第4層之低折射率層3k之合計4層構成。 Fig. 6 is a cross-sectional view showing another embodiment of the optical device 1c. In this embodiment, when the anti-reflection film 3 is formed by the infrared absorbing glass 2, the odd-numbered layer is a high-refractive-index layer, and the even-numbered layer is a low-refractive-index layer, and n(n=1, 2, 3, In the case of the antireflection film of the layer 4, the high refractive index layer 3h of the first layer, the low refractive index layer 3i of the second layer, and the high refractive layer of the third layer are obtained from the infrared absorbing glass 2 as an example. The ratio layer 3j and the fourth layer of the low refractive index layer 3k are composed of a total of four layers.

第1層之高折射率層3h係折射率為2.0~2.4之範圍且光學膜厚為約0.13 λ之折射率層,含有Al2O3、ZrO2、Al2O3與ZrO2之混合物中至少任一種作為材料。 The first layer of the high refractive index layer 3h is a refractive index layer having a refractive index of 2.0 to 2.4 and an optical film thickness of about 0.13 λ, and contains a mixture of Al 2 O 3 , ZrO 2 , Al 2 O 3 and ZrO 2 . At least any one is used as a material.

第2層之低折射率層3i係折射率為1.5以下且光學膜厚為約0.08 λ之折射率層,由MgF2、SiO2、其他材料構成。 The second layer of the low refractive index layer 3i is a refractive index layer having a refractive index of 1.5 or less and an optical film thickness of about 0.08 λ, and is made of MgF 2 , SiO 2 or another material.

第3層之高折射率層3j係折射率為2.0~2.4之範圍且光學膜厚為約0.16 λ之折射率層,由ZrO2、TiO2、其他材料作為材料構成。 The third layer of the high refractive index layer 3j is a refractive index layer having a refractive index of 2.0 to 2.4 and an optical film thickness of about 0.16 λ, and is composed of ZrO 2 , TiO 2 , and other materials.

第4層之低折射率層3k係折射率為1.5以下且光學膜厚為約0.25 λ之折射率層,由MgF2、SiO2、其他材料構成。 The fourth layer of the low refractive index layer 3k has a refractive index of 1.5 or less and an optical film thickness of about 0.25 λ, and is made of MgF 2 , SiO 2 or another material.

此實施型態的情況亦然,抗反射膜3表面之粒子的平均粒徑未達25nm,於抗反射膜3之上面的各粒子間間隙的面積變小,即使在高溫高濕環境下水分亦不易浸入抗反射膜3內部,防止了白濁現象之發生。 Also in the case of this embodiment, the average particle diameter of the particles on the surface of the anti-reflection film 3 is less than 25 nm, and the area of the gap between the particles on the anti-reflection film 3 becomes small, even in a high-temperature and high-humidity environment. It is not easy to be immersed in the interior of the anti-reflection film 3 to prevent the occurrence of white turbidity.

(實施例) (Example) <光學裝置之製造方法> <Method of Manufacturing Optical Device>

實施例之光學裝置由紅外線吸收玻璃與抗反射膜構成,抗反射膜與圖1相同地由3層之積層膜(折射率層)構成。紅外線吸收玻璃係使用俯視尺寸為縱橫20mm×30mm左右、厚度0.30mm左右、折射率1.56且含有銅離子之氟磷酸玻璃。 The optical device of the embodiment is composed of an infrared absorbing glass and an antireflection film, and the antireflection film is composed of a three-layer laminated film (refractive index layer) as in Fig. 1 . In the infrared absorbing glass, a fluorophosphate glass containing a copper ion having a cross-sectional dimension of about 20 mm × 30 mm in length and a thickness of about 0.30 mm and a refractive index of 1.56 and containing copper ions was used.

構成抗反射膜之第1層至第3層之俯視尺寸與紅外線吸收玻璃相同,第1層之中折射率層由折射率1.70且光學膜厚為1/4 λ之Al2O3與ZrO2的混合物構成。第2層之高折射率層由折射率2.10且光學膜厚1/2 λ之ZrO2構成。第3層之低折射率層由折射率1.38且光學膜厚1/4 λ之MgF2構成。 The first layer to the third layer constituting the antireflection film have the same plan view as the infrared absorbing glass, and the first layer has a refractive index layer of Al 2 O 3 and ZrO 2 having a refractive index of 1.70 and an optical film thickness of 1/4 λ. The composition of the mixture. The second layer of the high refractive index layer is composed of ZrO 2 having a refractive index of 2.10 and an optical film thickness of 1/2 λ. The low refractive index layer of the third layer is composed of MgF 2 having a refractive index of 1.38 and an optical film thickness of 1/4 λ.

說明各層之形成方法,即將經洗淨之紅外線吸收玻璃設置於真空蒸鍍裝置,於進行真空排氣後開始真空蒸鍍以進行各層之成膜。對真空蒸鍍時之紅外線吸收玻璃的溫度任意地進行變更。各層之光學膜厚係基於光學式膜厚監視法,經由控制監視器玻璃(monitor glass)上之反射率來進行。再者,霧值(濁度)係於高溫高濕試驗前後依循JIS7136來測定。 A method of forming each layer will be described. That is, the washed infrared absorbing glass is placed in a vacuum vapor deposition apparatus, and after vacuum evacuation, vacuum evaporation is started to form a film of each layer. The temperature of the infrared absorbing glass at the time of vacuum vapor deposition is arbitrarily changed. The optical film thickness of each layer is performed by controlling the reflectance on the monitor glass based on the optical film thickness monitoring method. Further, the haze value (turbidity) was measured in accordance with JIS 7136 before and after the high temperature and high humidity test.

表1所示之溫度係成膜抗反射膜各層之際上述真空蒸鍍時之紅外線吸收玻璃的溫度,表1中「低←溫度→高」之中,「低←」係表示溫度朝箭頭方向降低,「→高」係表式溫度朝箭頭方向升高。同樣地,表1 所示之霧值係依循JIS7136所測得之值,是將於高溫高濕試驗後之光學裝置白濁現象數值化所得者。一般而言,霧值0.3以下之模糊程度係被視為相機的攝影影像中可容許的範圍,霧值0.2以下之模糊程度係被視為相機的攝影影像中無影響之範圍。又,表1中,於抗反射膜之上面的粒徑以及霧值來看,(1)-(3)表示適當溫度,(4)、(5)表示容許溫度,(6)、(7)表示超出溫度,例如300℃以上。 The temperature shown in Table 1 is the temperature of the infrared absorbing glass at the time of vacuum vapor deposition in the film-forming antireflection film. In Table 1, "low ← temperature → high", "low ←" means the temperature is in the direction of the arrow. Lower, "→High" is the table temperature rising in the direction of the arrow. Similarly, Table 1 The haze value shown is the value measured by JIS 7136, which is obtained by digitizing the optical turbidity phenomenon of the optical device after the high temperature and high humidity test. In general, a blur degree of fog value of 0.3 or less is regarded as an allowable range in a photographic image of a camera, and a blur degree of a fog value of 0.2 or less is regarded as a range having no influence in a photographic image of a camera. Further, in Table 1, (1)-(3) indicates an appropriate temperature, and (4) and (5) indicate an allowable temperature, (6), (7) in terms of particle diameter and haze value on the upper surface of the antireflection film. Indicates that the temperature is exceeded, for example, above 300 °C.

任一適當溫度(1)、(2)、(3)時,抗反射膜之上面的粒子平均粒徑分別為16nm、17nm、21nm,各粒子間之間隙面積皆變小。又分別之霧值為0.11、0.09、0.16,未見到白濁現象之發生。 At any suitable temperature (1), (2), and (3), the average particle diameter of the particles above the antireflection film is 16 nm, 17 nm, and 21 nm, respectively, and the gap area between the particles becomes small. The fog values were 0.11, 0.09, and 0.16, respectively, and no white turbidity occurred.

又,容許溫度(4)、(5)方面,抗反射膜之上面的粒子平均粒徑分別為22nm、24nm,各粒子間之間隙面積皆大於上述適當溫度(1)、(2)、(3)的情況。又分別之霧值為0.20、0.30,白濁現象雖可確認到些微,但為可容許者。 Further, in terms of allowable temperatures (4) and (5), the average particle diameter of the particles above the antireflection film is 22 nm and 24 nm, respectively, and the gap area between the particles is larger than the above-mentioned appropriate temperatures (1), (2), and (3). )Case. Further, the haze values were 0.20 and 0.30, respectively, although the white turbidity phenomenon was confirmed to be slight, but it was acceptable.

又,超出溫度(6)、(7)方面,抗反射膜之上面的粒子平均粒徑分別為25nm、30nm,各粒子間之間隙面積皆變大。又分別之霧值為0.37、0.66,可清楚確認到白濁現象。 Further, in the case of exceeding the temperatures (6) and (7), the average particle diameter of the particles on the upper surface of the antireflection film is 25 nm and 30 nm, respectively, and the gap area between the respective particles is increased. Further, the fog values were 0.37 and 0.66, respectively, and the white turbidity phenomenon was clearly confirmed.

亦即,粒子之平均粒徑未達25nm時,各粒子間之間隙面積變小,故於高溫高濕試驗後之霧值小。亦即,幾乎沒有光學裝置之白濁現象發生。 That is, when the average particle diameter of the particles is less than 25 nm, the gap area between the particles becomes small, so the haze value after the high-temperature and high-humidity test is small. That is, almost no white turbidity of the optical device occurs.

經製造之光學裝置的抗反射膜之上面的粒子平均粒徑為17nm與30nm,其分別之SEM像表示於圖7。圖7(a)係表示以適當溫度於紅外線吸收玻璃上成膜有抗反射膜之情況之光學裝置的表面狀態。圖7 (b)係表示以超出溫度於紅外線吸收玻璃上成膜有抗反射膜之情況之光學裝置的表面狀態。 The average particle diameter of the particles above the antireflection film of the manufactured optical device was 17 nm and 30 nm, and the SEM images of the respective SEM images are shown in Fig. 7. Fig. 7(a) shows the surface state of an optical device in which an antireflection film is formed on an infrared absorbing glass at an appropriate temperature. Figure 7 (b) shows the surface state of the optical device in which the antireflection film is formed on the infrared absorbing glass beyond the temperature.

將該等SEM像加以比較可明瞭到如圖7(a)般以適當溫度成膜抗反射膜的情況時,抗反射膜之上面的粒子平均粒徑變小,為17nm,於抗反射膜之上面的各粒子間間隙的面積變小。另一方面,如圖7(b)般以超出溫度成膜抗反射膜的情況時,抗反射膜之上面的粒子平均粒徑變大,為30nm,於抗反射膜之上面的各粒子間間隙的面積變大。 When these SEM images are compared, it is understood that when the antireflection film is formed at an appropriate temperature as shown in Fig. 7(a), the average particle diameter of the particles on the upper surface of the antireflection film is reduced to 17 nm, and the antireflection film is used. The area of the gap between the above particles becomes small. On the other hand, when the antireflection film is formed at a temperature exceeding the temperature as shown in Fig. 7(b), the average particle diameter of the particles on the upper surface of the antireflection film is increased to 30 nm, and the interparticle gaps on the upper surface of the antireflection film are obtained. The area becomes larger.

圖8(a)、(b)係表示比較例與實施例之高溫高濕試驗前後白濁現象發生狀態之照片。圖8(a)係於超出溫度製作並且粒子之平均粒徑為30nm的比較例光學裝置,圖8(b)係於適當溫度製作並且粒子之平均粒徑為17nm的實施例光學裝置。圖8(a)、(b)中分別是左側為高溫高濕試驗後、右側為高溫高濕試驗前。光學裝置可從背面使光穿透。 Fig. 8 (a) and (b) are photographs showing the state of occurrence of white turbidity before and after the high temperature and high humidity test of the comparative examples and the examples. Fig. 8(a) shows a comparative optical device which was produced at a temperature exceeding the average particle diameter of the particles of 30 nm, and Fig. 8(b) is an example optical device which was produced at an appropriate temperature and had an average particle diameter of 17 nm. In Fig. 8 (a) and (b), the left side is after the high temperature and high humidity test, and the right side is before the high temperature and high humidity test. The optical device can penetrate light from the back.

針對圖8(a)所示之比較例進行說明,即高溫高濕試驗前係如圖8(a)右側照片所示,光大致穿透而未於光學裝置表面散射,故呈現較暗。然而,高溫高濕試驗後係如圖8(a)左側照片所示,水分浸透至光學裝置內部,基板之一部分溶解之結果,了解到因形成空間造成光散射而整體呈白濁。 The comparative example shown in Fig. 8(a) was explained, that is, as shown in the photograph on the right side of Fig. 8(a) before the high-temperature and high-humidity test, the light was substantially penetrated and was not scattered on the surface of the optical device, so that it was dark. However, after the high-temperature and high-humidity test, as shown in the photograph on the left side of Fig. 8(a), water permeates into the inside of the optical device, and as a result of partial dissolution of the substrate, it is understood that the entire space is white turbid due to light scattering due to the formation space.

相對於此,針對圖8(b)所示之實施例進行說明,即高溫高濕試驗前係如圖8(b)右側照片所示,光大致穿透而未於光學裝置表面反射,故呈現較暗。又,了解到高溫高濕試驗後亦如圖8(b)左側照片所示,水份未浸透至光學裝置內部,故未呈白濁,是透明的。亦即,明顯地,於高溫高濕試驗前後光學裝置中的光穿透性無變化。 On the other hand, the embodiment shown in FIG. 8( b ) is described, that is, as shown in the right photograph of FIG. 8( b ) before the high-temperature and high-humidity test, the light is substantially penetrated and not reflected on the surface of the optical device, so that it is presented. Darker. Further, it was found that after the high-temperature and high-humidity test, as shown in the photo on the left side of Fig. 8(b), the moisture did not permeate into the inside of the optical device, so that it was not cloudy and was transparent. That is, it is apparent that there is no change in light transmittance in the optical device before and after the high temperature and high humidity test.

如上所述,實施例之光學裝置係抗反射膜之上面的粒子平均粒徑未達25nm,因而是即使在高溫高濕之環境下亦不會產生白濁現象,可長期維持作為光學裝置之性能之耐候性優異者。 As described above, the optical device of the embodiment has an average particle diameter of the particles on the anti-reflection film of less than 25 nm, so that white turbidity does not occur even in a high-temperature and high-humidity environment, and the performance as an optical device can be maintained for a long period of time. Excellent weather resistance.

再者,上述之實施型態中,雖然是例舉使用有低折射率層、中折射率層及高折射率層之3層的抗反射膜、使用有高折射率層及低折射率層之2層的抗反射膜、使用有中折射率層及低折射率層之2層的抗反射膜、以及使用有高折射率層及低折射率層之n層的抗反射膜(實施型態中n=4),但抗反射膜之設計並不限定於該等實施型態,亦可為能獲得所要之抗反射特性之各折射率層與層數之組合來構成。 Further, in the above-described embodiment, an antireflection film having three layers of a low refractive index layer, a medium refractive index layer, and a high refractive index layer, and a high refractive index layer and a low refractive index layer are used. a two-layer antireflection film, an antireflection film using two layers of a medium refractive index layer and a low refractive index layer, and an antireflection film using an n layer having a high refractive index layer and a low refractive index layer (in an embodiment) n=4), but the design of the antireflection film is not limited to these embodiments, and may be constituted by a combination of the respective refractive index layers and the number of layers which can obtain desired antireflection characteristics.

本發明可於不脫離其精神或主要特徵的情況下以其他各種形式實施。因此,上述實施型態及實施例在各方面來說只不過為一例示,不可限定解釋。本發明之範圍以申請專利範圍來表示,不受說明書本文任何拘束。進而,屬於申請專利範圍之均等範圍的變形、變更全部皆在本發明之範圍內。 The present invention may be embodied in other various forms without departing from the spirit or essential characteristics thereof. Therefore, the above-described embodiments and examples are merely illustrative in all aspects, and the explanation is not limited. The scope of the present invention is expressed by the scope of the claims, and is not limited by the description herein. Further, all modifications and alterations belonging to the equivalent scope of the claims are within the scope of the invention.

1,1a,1b,1c‧‧‧光學裝置 1,1a,1b,1c‧‧‧optical devices

2‧‧‧紅外線吸收玻璃 2‧‧‧Infrared absorption glass

3‧‧‧抗反射膜 3‧‧‧Anti-reflective film

3a‧‧‧第1層之中折射率層 3a‧‧‧The first layer of the refractive index layer

3b‧‧‧第2層之高折射率層 3b‧‧‧2nd layer of high refractive index layer

3c‧‧‧第3層之低折射率層 3c‧‧‧Layer 3 low refractive index layer

Claims (3)

一種光學裝置,係於可見光穿透性基板之至少1面上具備防止可見光反射之抗反射膜者,其特徵在於:該抗反射膜係折射率相異之至少2層以上之折射率層積層所構成,並且該至少2層以上之折射率層之中,折射率低之折射率層以外的至少1層以上,至少含有Al2O3或ZrO2或該等之混合物作為其材料,且該抗反射膜之上面由該折射率低之折射率層所構成,並且該上面由平均粒徑未達25nm之粒子所構成。 An optical device having an antireflection film for preventing visible light reflection on at least one surface of a visible light transmissive substrate, wherein the antireflection film is a refractive index laminated layer having at least two or more layers having different refractive indices. In the refractive index layer of at least two or more layers, at least one layer or more other than the refractive index layer having a low refractive index contains at least Al 2 O 3 or ZrO 2 or a mixture thereof as a material thereof, and the anti-drug The upper surface of the reflective film is composed of the refractive index layer having a low refractive index, and the upper surface is composed of particles having an average particle diameter of less than 25 nm. 如申請專利範圍第1項之光學裝置,其中,該折射率相異之至少2層以上之折射率層係積層於該可見光穿透性基板的面上所構成,並且至少從可見光穿透性基板起算第1層之折射率層至少含有Al2O3或ZrO2或該等之混合物作為其材料。 The optical device according to claim 1, wherein the refractive index layer having at least two or more layers having different refractive indices is formed on the surface of the visible light transmissive substrate, and at least from the visible light transmissive substrate The refractive index layer of the first layer at least contains Al 2 O 3 or ZrO 2 or a mixture thereof as its material. 如申請專利範圍第1或2項之光學裝置,該可見光穿透性基板之材料係含有銅離子之氟磷酸鹽系玻璃或者是磷酸鹽系玻璃。 The optical device according to claim 1 or 2, wherein the material of the visible light transmissive substrate is a fluorophosphate-based glass containing copper ions or a phosphate-based glass.
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