TWI514019B - Optical waveguide and electronic device - Google Patents
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- G—PHYSICS
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- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
- G02B6/1221—Basic optical elements, e.g. light-guiding paths made from organic materials
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/13—Integrated optical circuits characterised by the manufacturing method
- G02B6/138—Integrated optical circuits characterised by the manufacturing method by using polymerisation
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Description
本發明係關於光導波路及電子機器。The present invention relates to optical waveguides and electronic devices.
近年來,關於使用光載波移送資料的光通信技術,作為用於將光載波由一地點導送至另一地點的手段,光導波路正普及中。光導波路係具有線狀之核心部、與設置成被覆其周圍的包覆部。In recent years, optical communication technology using optical carrier transfer data has become popular as a means for guiding optical carriers from one location to another. The optical waveguide system has a linear core portion and a cladding portion provided to cover the periphery thereof.
作為光導波路,可舉例如專利文獻1所記載者。專利文獻1中,記載有藉由使折射率調整劑擴散至聚合物基體中,而使得於橫剖面,核心部之折射率分佈呈同心圓狀的光導波路。另一方面,其記載有被覆核心部周圍之包覆部的折射率係呈一定。核心部係由對光載波之光實質上呈透明的材料所構成,包覆部係由折射率低於核心部之材料所構成。As an optical waveguide, the patent document 1 is mentioned, for example. Patent Document 1 describes an optical waveguide in which a refractive index distribution of a core portion is concentrically formed in a cross section by diffusing a refractive index adjusting agent into a polymer matrix. On the other hand, it is described that the refractive index of the coating portion around the core portion is constant. The core portion is composed of a material that is substantially transparent to light of the optical carrier, and the cladding portion is composed of a material having a lower refractive index than the core portion.
專利文獻1:日本專利特開2006-276735號公報Patent Document 1: Japanese Patent Laid-Open No. 2006-276735
上述技術中,在形成有複數核心部的情況,有時於鄰接之核心部之間會發生互擾(crosstalk)。In the above technique, when a plurality of core portions are formed, crosstalk may occur between adjacent core portions.
本發明包括以下者。The invention includes the following.
[1]一種光導波路,其具備:第1包覆層;核心層,係設於上述第1包覆層上,且依序具有設於層內方向上的包覆部、第1核心部、包覆部、第2核心部及包覆部;以及第2包覆層,係設於上述核心層上;上述核心層中,涵括上述第1核心部及上述包覆部之部分的層內方向之折射率分佈W係呈連續變化,且具有依第1凸部、第1凹部及第2凸部之順序排列的區域;位於上述第1核心部之上述折射率分佈W係具有上述第1凸部;位於上述包覆部之上述折射率分佈W係具有折射率最大值小於上述第1凸部的上述第2凸部;涵括上述第1包覆層、上述包覆部及第2包覆層之部分的層間方向之折射率分佈P,係在位於上述第1包覆層之部分與位於上述包覆部之部分呈相異。[1] An optical waveguide comprising: a first cladding layer; the core layer is provided on the first cladding layer, and has a cladding portion and a first core portion provided in the in-layer direction, and a cladding portion, a second core portion, and a cladding portion; and a second cladding layer is disposed on the core layer; and the core layer includes a layer of the first core portion and the cladding portion The refractive index distribution W in the direction is continuously changed, and has a region in which the first convex portion, the first concave portion, and the second convex portion are arranged in this order; and the refractive index distribution W located in the first core portion has the first portion a convex portion; the refractive index distribution W located in the coating portion has the second convex portion having a refractive index maximum value smaller than the first convex portion; and the first cladding layer, the coating portion, and the second package The refractive index distribution P in the interlayer direction of the portion of the cladding layer is different between the portion located in the first cladding layer and the portion located in the cladding portion.
[2]如[1]之光導波路,其中,涵括上述第1包覆層、上述第1核心部之部分的層間方向之折射率分佈T,係與上述折射率分佈W相異。[2] The optical waveguide of [1], wherein the refractive index distribution T in the interlayer direction of the portion including the first cladding layer and the first core portion is different from the refractive index distribution W.
[3]如[1]或[2]之光導波路,其中,上述第1核心部之折射率最大值與上述第1包覆層之折射率最大值的折射率差,係大於第1核心部之折射率最大值與上述包覆部之折射率最大值的折射率差。[3] The optical waveguide of [1] or [2], wherein a refractive index difference between a maximum refractive index of the first core portion and a maximum refractive index of the first cladding layer is greater than a first core portion The refractive index difference between the maximum value of the refractive index and the maximum refractive index of the coating portion.
[4]如[1]至[3]中任一項之光導波路,其中,具備設於上述第2包覆層上,且與上述核心層為不同構件的第2核心層;上述第2核心層係具有位於上述第1核心部之層間方向上的第3核心部。[4] The optical waveguide of any one of [1] to [3], comprising: a second core layer provided on the second cladding layer and different from the core layer; the second core The layer system has a third core portion located in the interlayer direction of the first core portion.
[5]如[1]至[4]中任一項之光導波路,其中,上述第1凹部之頂部的折射率,係小於上述包覆部中之平均折射率。[5] The optical waveguide of any one of [1] to [4], wherein a refractive index of a top portion of the first concave portion is smaller than an average refractive index of the coating portion.
[6]如[1]至[5]中任一項之光導波路,其中,上述折射率分佈W,係於上述第1核心部與上述包覆部之界面附近以外具有上述第2凸部的頂部。[6] The optical waveguide of any one of [1] to [5] wherein the refractive index distribution W is the second convex portion other than the vicinity of the interface between the first core portion and the coating portion. top.
[7]如[1]至[6]中任一項之光導波路,其中,上述折射率分佈W係於上述包覆部之中心部具有上述第2凸部的頂部,並自上述第2凸部之上述頂部起朝向上述第1凹部具有折射率呈連續性降低的區域。[7] The optical waveguide according to any one of [1] to [6] wherein the refractive index distribution W is provided at a center portion of the covering portion and has a top portion of the second convex portion, and is formed from the second convex portion The top portion of the portion has a region in which the refractive index is continuously reduced toward the first concave portion.
[8]如[1]至[7]中任一項之光導波路,其中,上述第1凹部之頂部之折射率與上述包覆部中之平均折射率的差,係上述第1凹部之頂部之折射率與上述第1凸部之頂部之折射率的差的3~80%。[8] The optical waveguide of any one of [1] to [7] wherein a difference between a refractive index of a top portion of the first concave portion and an average refractive index of the coating portion is a top portion of the first concave portion The difference between the refractive index and the refractive index of the top of the first convex portion is 3 to 80%.
[9]如[1]至[8]中任一項之光導波路,其中,上述第1凹部之頂部之折射率與上述第1凸部之頂部之折射率的折射率差為0.005~0.07。[9] The optical waveguide of any one of [1] to [8], wherein a refractive index difference between a refractive index of a top portion of the first concave portion and a refractive index of a top portion of the first convex portion is 0.005 to 0.07.
[10]如[1]至[9]中任一項之光導波路,其中,上述折射率分佈W中,將上述第1凸部之折射率具有上述包覆部中之平均折射率以上之值的部分的寬度設為a[μm],並將上述第1凹部之折射率具有未滿上述包覆部中之平均折射率之值的寬度設為b[μm]時,b為0.01a~1.2a。[10] The optical waveguide according to any one of [1] to [9] wherein, in the refractive index distribution W, a refractive index of the first convex portion has a value equal to or greater than an average refractive index of the coating portion. When the width of the portion is set to a [μm], and the refractive index of the first concave portion is less than the value of the average refractive index in the coating portion, b [μm], b is 0.01 a to 1.2. a.
[11]一種光導波路,係具有核心部、及與該核心部之至少兩側面鄰接之包覆部者,其特徵為,該光導波路之橫剖面之折射率分佈,係具有至少2個極小值、至少1個第1極大值、與小於上述第1極大值之至少2個第2極大值,且具有此等係依第2極大值、極小值、第1極大值、極小值、第2極大值之順序排列的區域;此區域中,包括上述第1極大值而由上述2個極小值所挾持的區域為上述核心部,自上述各極小值起至上述第2極大值側的區域為上述包覆部;上述各極小值係未滿上述包覆部中之平均折射率,且於上述折射率分佈整體中折射率呈連續性變化。[11] An optical waveguide comprising a core portion and a cladding portion adjacent to at least two side surfaces of the core portion, wherein the refractive index distribution of the optical waveguide has a minimum refractive index distribution of at least two minimum values. At least one first maximum value and at least two second maximum values smaller than the first maximum value, and having the second maximum value, the minimum value, the first maximum value, the minimum value, and the second maximum a region in which the values are sequentially arranged; wherein the region including the first maximum value and held by the two minimum values is the core portion, and the region from the minimum value to the second maximum value side is The coating portion; each of the minimum values is less than an average refractive index in the coating portion, and the refractive index changes continuously in the entire refractive index distribution.
[12]一種電子機器,其特徵為,具備[1]至[11]中任一項之光導波路。[12] An electronic device comprising the optical waveguide of any one of [1] to [11].
根據本發明,可抑制鄰接之核心部間的互擾。According to the present invention, mutual interference between adjacent core portions can be suppressed.
以下,針對本發明之光導波路及電子機器,根據所附圖式所示之較佳實施形態進行詳細說明。Hereinafter, the optical waveguide and the electronic device of the present invention will be described in detail based on preferred embodiments shown in the drawings.
首先,說明本發明之光導波路。First, the optical waveguide of the present invention will be described.
圖1為表示本發明之光導波路之第1實施形態(一部分切除及穿透表示)的斜視圖;圖2為表示圖1所示之X-X線剖面圖中,以核心層厚度之中心線的位置作為橫軸、以折射率作為縱軸時之折射率分佈之一例的圖;圖3為表示光入射至圖1所示之光導波路之核心部之一時,射出光之強度分佈之一例的圖。又,以下說明中,將圖1中之上側稱為「上」,將下側稱為「下」。又,圖1係誇張描繪了層之厚度方向(各圖之上下方向)。BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a perspective view showing a first embodiment (partially cut and penetrated) of an optical waveguide according to the present invention; and Fig. 2 is a view showing a position of a center line of a core layer in a cross-sectional view taken along line XX of Fig. 1. FIG. 3 is a view showing an example of the intensity distribution of the emitted light when the light is incident on one of the core portions of the optical waveguide shown in FIG. 1 as an example of the refractive index distribution on the horizontal axis and the refractive index as the vertical axis. FIG. In the following description, the upper side in FIG. 1 is referred to as "upper" and the lower side is referred to as "lower". Moreover, Fig. 1 exaggerates the thickness direction of the layers (the upper and lower directions of each figure).
以下說明本實施形態之光導波路的概要。The outline of the optical waveguide in the present embodiment will be described below.
第1實施形態之光導波路係具備第1包覆層(包覆層11)、核心層(核心層13)、第2包覆層(包覆層12)。核心層(核心層13)係設於包覆層11上,且依序具有設於層內方向之包覆部、第1核心部(核心部14)、包覆部(包覆部15)、第2核心部(核心部14)及包覆部。第2包覆層係設於核心層上。The optical waveguide system of the first embodiment includes a first cladding layer (cladding layer 11), a core layer (core layer 13), and a second cladding layer (cladding layer 12). The core layer (core layer 13) is provided on the cladding layer 11, and has a cladding portion provided in the in-layer direction, a first core portion (core portion 14), a cladding portion (covering portion 15), and The second core portion (core portion 14) and the cladding portion. The second cladding layer is provided on the core layer.
核心層中,涵括第1核心部(核心部14)及包覆部(包覆部15)之部分的層內方向之折射率分佈W呈連續變化,意味著具有依第1凸部、第1凹部及第2凸部之順序排列的區域。將此種折射率分佈稱為「W型之折射率分佈」。In the core layer, the refractive index distribution W in the in-layer direction of the portion including the first core portion (core portion 14) and the cladding portion (the cladding portion 15) continuously changes, meaning that the first convex portion and the first convex portion are 1 The area in which the concave portion and the second convex portion are arranged in this order. This refractive index distribution is referred to as "W-type refractive index distribution".
位於第1核心部之折射率分佈W係具有第1凸部。位於包覆部之折射率分佈W係具有折射率最大值小於第1凸部的第2凸部。The refractive index distribution W located in the first core portion has a first convex portion. The refractive index distribution W located in the cladding portion has a second convex portion having a refractive index maximum value smaller than that of the first convex portion.
涵括第1包覆層(包覆層11)及第1核心部(核心部14)之部分的層間方向之折射率分佈T,可具有各種折射率分佈。The refractive index distribution T in the interlayer direction of the portion including the first cladding layer (cladding layer 11) and the first core portion (core portion 14) may have various refractive index distributions.
另外,涵括第1包覆層(包覆層11)、包覆部(包覆部15)及第2包覆層(包覆層12)之部分的層間方向之折射率分佈P,係至少在位於第1包覆層之部分與位於包覆部之部分為相異。例如,折射率分佈P可呈連續性變化,亦可呈不連續變化。折射率分佈P例如係具有與折射率分佈T相同的折射率樣式者。亦即,折射率分佈P較佳係位於包覆部之區域具有第5凸部。此外,折射率分佈P更佳係位於第1包覆層之區域具有第6凸部。此時,折射率分佈P係於第5凸部與第6凸部之間具有第3凹部。又,折射率分佈P中,位於包覆部之區域的最大折射率或平均折射率,較佳係高於位於第1包覆層之最大折射率或平均折射率的值。又,本實施形態中,具有折射率分佈P之第1包覆層、核心層之包覆部、第2包覆層之積層構造,可與具有折射率分佈T之第1包覆層、核心層之核心部、第2包覆層之積層構造藉同一步驟予以形成。Further, the refractive index distribution P in the interlayer direction of the portion including the first cladding layer (cladding layer 11), the cladding portion (the cladding portion 15), and the second cladding layer (cladding layer 12) is at least The portion located in the first cladding layer is different from the portion located in the cladding portion. For example, the refractive index distribution P may vary continuously or may vary discontinuously. The refractive index distribution P is, for example, a refractive index pattern having the same refractive index distribution T. That is, the refractive index distribution P preferably has a fifth convex portion in a region of the cladding portion. Further, it is more preferable that the refractive index distribution P has a sixth convex portion in a region of the first cladding layer. At this time, the refractive index distribution P has a third concave portion between the fifth convex portion and the sixth convex portion. Further, in the refractive index distribution P, the maximum refractive index or the average refractive index in the region of the cladding portion is preferably higher than the value of the maximum refractive index or the average refractive index of the first cladding layer. Further, in the present embodiment, the first cladding layer having the refractive index distribution P, the cladding portion of the core layer, and the second cladding layer have a laminated structure, and the first cladding layer and the core having the refractive index distribution T The laminated structure of the core portion and the second cladding layer of the layer is formed by the same step.
折射率分佈P可與折射率分佈T相同(例如,於涵括以核心部為基點而鄰接之包覆部(包覆)層為止的折射率分佈中,平面上之縱橫斜之6方向全部相同的情況除外),亦可相異。本實施形態中,所謂折射率分佈相異係指(i)折射率分佈之形狀相異;或(ii)折射率分佈之形狀為相同樣式且折射率值相異(其中,製造上的偏差可視為相同)。例如,鄰接之第1核心部與包覆層之間之層間方向的折射率差,亦可與鄰接之第1核心部與包覆部之間之層內方向的折射率差相異。The refractive index distribution P may be the same as the refractive index distribution T (for example, in the refractive index distribution including the cladding portion (cladding) layer adjacent to the core portion, the sixth direction of the vertical and horizontal oblique directions on the plane is the same Except in the case of), it can also be different. In the present embodiment, the refractive index distribution differs in that (i) the refractive index distribution has a different shape; or (ii) the refractive index distribution has the same shape and the refractive index values are different (wherein the manufacturing deviation is visible) For the same). For example, the refractive index difference in the interlayer direction between the adjacent first core portion and the cladding layer may be different from the refractive index difference in the in-layer direction between the adjacent first core portion and the cladding portion.
折射率分佈P係具有例如「步階型(以下稱為SI型)」、「漸進型(以下稱為GI型)」及W型的任一種樣式。The refractive index distribution P has, for example, any of "step type (hereinafter referred to as SI type)", "progressive type (hereinafter referred to as GI type)", and W type.
SI型之折射率分佈T係指分別於核心層與包覆層中其折射率呈幾乎一定,且於核心層與包覆層之邊界處折射率呈不連續。GI型之折射率分佈P係指自包覆部之內部起涵括至第1包覆層,其折射率呈連續。折射率分佈變化係由例如層間移動成分於層間進行擴散移動,而積層方向之物質構成連續性變化所造成。The refractive index distribution T of the SI type means that the refractive index of the core layer and the cladding layer are almost constant, and the refractive index is discontinuous at the boundary between the core layer and the cladding layer. The refractive index distribution P of the GI type means that the refractive index is continuous from the inside of the cladding portion to the first cladding layer. The refractive index distribution change is caused by, for example, a layer moving component that diffuses and moves between layers, and a substance in the stacking direction constitutes a change in continuity.
本實施形態中,折射率分佈P係具有下述第1至第3態樣。第1至第3態樣係分別相當於SI型、GI型及W型。第1態樣係涵括第1包覆層及包覆部之部分的層間方向之折射率分佈P,於第1包覆層與包覆部之界面呈不連續變化。第2態樣係涵括第1包覆層及包覆部之部分的層間方向之折射率分佈P,呈連續性變化。第3態樣係涵括第1包覆層及包覆部之部分的層間方向之折射率分佈P呈連續性變化,且具有依第5凸部、第3凹部、第6凸部之順序排列的區域,位於包覆之折射率分佈P係具有第5凸部,位於第1包覆層之折射率分佈P係具有折射率最大值小於第5凸部的第6凸部。In the present embodiment, the refractive index distribution P has the following first to third aspects. The first to third aspect patterns correspond to the SI type, the GI type, and the W type, respectively. The first aspect includes a refractive index distribution P in the interlayer direction of the portion of the first cladding layer and the cladding portion, and the interface between the first cladding layer and the cladding portion is discontinuously changed. The second aspect includes a refractive index distribution P in the interlayer direction of the first cladding layer and the portion of the cladding portion, and changes continuously. In the third aspect, the refractive index distribution P in the interlayer direction of the portion including the first cladding layer and the cladding portion is continuously changed, and is arranged in the order of the fifth convex portion, the third concave portion, and the sixth convex portion. In the region, the refractive index distribution P located in the cladding has a fifth convex portion, and the refractive index distribution P located in the first cladding layer has a sixth convex portion having a refractive index maximum value smaller than that of the fifth convex portion.
如上述,本實施形態之光導波路係將核心層之層內方向之折射率分佈設為W型,且由例如SI型、GI型、W型之任一者選擇包覆部之層間方向之折射率分佈。As described above, in the optical waveguide system of the present embodiment, the refractive index distribution in the in-layer direction of the core layer is W-type, and the refraction of the interlayer direction of the cladding portion is selected by, for example, any of the SI type, the GI type, and the W type. Rate distribution.
以下,說明由本實施形態之光導波路所得的效果。Hereinafter, the effects obtained by the optical waveguide of the present embodiment will be described.
第1效果係可實現較高之光傳送特性。The first effect is that higher optical transmission characteristics can be achieved.
於核心部之層內方向之折射率分佈中,由於在端部形成第1凹部,故核心部之中心部與端部的折射率差變大。藉此,抑制層內方向上鄰接之核心部間的互擾。又,即使由核心部發生光漏出,仍可使漏光於包覆部之第2凸部被侷限。藉此,抑制層內方向上鄰接之核心部間的互擾。In the refractive index distribution in the layer inner direction of the core portion, since the first concave portion is formed at the end portion, the difference in refractive index between the central portion and the end portion of the core portion becomes large. Thereby, mutual interference between the adjacent core portions in the in-layer direction is suppressed. Further, even if light leaks from the core portion, the second convex portion that leaks light in the covering portion can be confined. Thereby, mutual interference between the adjacent core portions in the in-layer direction is suppressed.
第2效果係可於包覆部之層間方向上得到光侷限效果。本實施形態中,由包覆部起涵括包覆層,其折射率呈變化。因此,可於包覆部或包覆層侷限光。The second effect is to obtain a light confinement effect in the interlayer direction of the cladding portion. In the present embodiment, the covering portion includes a coating layer, and the refractive index thereof changes. Therefore, light can be confined in the cladding or cladding.
相較於SI型之折射率分佈,具有連續之折射率分佈之層的光侷限效果係非常優越。其結果,光傳送損失的發生被有效抑制,可實現較高之光傳送特性。其理由雖尚未完全闡明,但可認為係因在設置了具有GI型折射率分佈之包覆部時,來自核心層之光滲出被有效抑制所致。The optical confinement effect of a layer having a continuous refractive index profile is superior to that of the SI type. As a result, the occurrence of optical transmission loss is effectively suppressed, and high optical transmission characteristics can be realized. Although the reason for this has not been fully explained, it is considered that the light oozing from the core layer is effectively suppressed when the coating portion having the GI-type refractive index distribution is provided.
第3效果係可視使用態樣而設計成能夠減低光損失。The third effect is designed to reduce light loss depending on the use of the image.
以第1核心部作為基點,可設計成使層間方向之折射率分佈T相對於層內方向之折射率分佈W為相異。例如,藉由使層間方向之折射率差大於層內方向之折射率差,則可使光導波路之薄膜彎曲或上捲至光導波路之延存方向時的光損失減低。以下更詳細說明。在薄膜被彎曲至既定方向時,將有薄膜被拉展、折射率差變小的情形。相對於此,藉由事先使薄膜於彎曲方向的折射率差增大,則即使折射率差變小,仍可減低光損失。The first core portion is used as a base point, and the refractive index distribution T in the interlayer direction can be designed to be different from the refractive index distribution W in the in-layer direction. For example, by making the refractive index difference in the interlayer direction larger than the refractive index difference in the in-layer direction, the optical loss when the film of the optical waveguide is bent or wound up in the direction in which the optical waveguide is extended can be reduced. The following is a more detailed description. When the film is bent to a predetermined direction, there is a case where the film is stretched and the refractive index difference is small. On the other hand, by increasing the refractive index difference of the film in the bending direction in advance, the light loss can be reduced even if the refractive index difference is small.
第4效果在於設計自由度高。The fourth effect is that the degree of freedom in design is high.
本實施形態之光導波路,係例如使薄膜積層而得者。因此,包覆層之厚度係由與核心層厚度間之關係而任意決定。又,由於可控制厚度,故可提高光結合損失減低等之效果。The optical waveguide of the present embodiment is obtained by laminating a thin film, for example. Therefore, the thickness of the coating layer is arbitrarily determined by the relationship with the thickness of the core layer. Moreover, since the thickness can be controlled, the effect of reducing the light coupling loss and the like can be improved.
以下,針對本實施形態之光導波路進行詳細說明。Hereinafter, the optical waveguide of the present embodiment will be described in detail.
本實施形態之折射率分佈,係由相對於光導波路之延存方向(例如第1核心部之延存方向)呈正交方向的光導波路之剖面,進行測定及定性者。The refractive index distribution of the present embodiment is measured and characterized by a cross section of an optical waveguide which is orthogonal to the direction in which the optical waveguide is extended (for example, the extending direction of the first core portion).
本實施形態中雖例示3層,但並不限定於此態樣,亦可具有5層、7層以上。換言之,亦可於第1核心層上積層1層以上之第2核心層。任一核心層較佳係由包覆層所挾持。Although three layers are exemplified in the present embodiment, the present invention is not limited to this embodiment, and may have five or more layers. In other words, one or more second core layers may be laminated on the first core layer. Any core layer is preferably held by a cladding layer.
例如,本實施形態之光導波路係設於第2包覆層上,亦可具備與核心層為不同構件之第2核心層。第2核心層係具有位於第1核心部之層間方向的第3核心部。換言之,本實施形態之光導波路係具備於層內方向上呈離間的複數核心部,同時亦可具備於層間方向上呈離間的複數核心部。For example, the optical waveguide of the present embodiment is provided on the second cladding layer, and may have a second core layer which is different from the core layer. The second core layer has a third core portion located in the interlayer direction of the first core portion. In other words, the optical waveguide system of the present embodiment includes a plurality of core portions which are separated from each other in the in-layer direction, and may have a plurality of core portions which are separated from each other in the interlayer direction.
例如,於光導波路之剖面,複數之核心部亦可配置為格子狀。本實施形態之光導波路係例如使薄膜積層。由於層間方向之核心部的中心位置偏離變少,故光結合損失減低。又,本實施形態之光導波路係例如藉由照射能量,而使核心部形成。由於層間方向之核心部的位置偏離減低,故光結合損失減低。For example, in the cross section of the optical waveguide, the core portion of the plural may be arranged in a lattice shape. In the optical waveguide system of this embodiment, for example, a thin film is laminated. Since the center position deviation of the core portion in the interlayer direction is reduced, the light coupling loss is reduced. Further, in the optical waveguide system of the present embodiment, the core portion is formed by, for example, irradiating energy. Since the positional deviation of the core portion in the interlayer direction is reduced, the light coupling loss is reduced.
核心層之層內方向的折射率分佈,只要至少2個鄰接之核心部之間的一部分區域為W型即可,位於核心部兩側之區域可為W型,亦可其所有區域為W型。又,於層內方向上重複之W型的折射率分佈,亦可依每重複單位呈相異。The refractive index distribution in the inner layer of the core layer may be a W-type portion of at least two adjacent core portions, and the W-type region may be W-shaped on both sides of the core portion, or all of the regions may be W-shaped. . Further, the refractive index distribution of the W-type which is repeated in the direction of the layer may be different for each repeating unit.
核心部之層間方向的折射率分佈,只要至少涵括核心部與上部包覆層(或下部包覆部)之區域為上述折射率分佈T即可,位於核心部兩側之區域可為折射率分佈T,亦可於其所有區域中重複折射率分佈T。又,於層間方向上重複之折射率分佈T,亦可依每重複單位呈相異。The refractive index distribution in the interlayer direction of the core portion may be such that the region of the core portion and the upper cladding layer (or the lower cladding portion) is the refractive index distribution T, and the region on both sides of the core portion may be a refractive index. The distribution T can also repeat the refractive index distribution T in all of its regions. Further, the refractive index distribution T repeated in the interlayer direction may be different for each repeating unit.
包覆部之層間方向上的折射率分佈,只要至少第1包覆部與包覆部之間呈相異即可,但亦可於第1包覆部與包覆部之間且第2包覆部與包覆部之間呈相異。又,於層間方向上重複之折射率分佈P亦可依每重複單位呈相異。The refractive index distribution in the interlayer direction of the cladding portion may be at least different between the first cladding portion and the cladding portion, but may be between the first cladding portion and the cladding portion and the second package. The difference between the cover and the cladding is different. Further, the refractive index distribution P repeated in the interlayer direction may be different for each repeating unit.
折射率差可為例如第1核心部之最大值與包覆部之最大值的差,亦可為第1核心部之平均值與包覆部之平均值的差。The difference in refractive index may be, for example, a difference between the maximum value of the first core portion and the maximum value of the coating portion, or may be the difference between the average value of the first core portion and the average value of the coating portion.
所謂折射率分佈呈連續性變化,係指例如在包覆層與核心層之界面附近區域,設有折射率緩慢變化的過渡區域。表示對厚度方向之折射率之連續變化的函數式可採用各種態樣,可舉例如樣條函數、指數函數等。本實施形態中,例如凸部與凹部之間的折射率呈連續變化。The change in the refractive index distribution continuously means, for example, a transition region in which the refractive index changes slowly, in the vicinity of the interface between the cladding layer and the core layer. A function representing a continuous change in the refractive index in the thickness direction may take various forms, and examples thereof include a spline function, an exponential function, and the like. In the present embodiment, for example, the refractive index between the convex portion and the concave portion changes continuously.
折射率分佈之凸部(第1凸部~第6凸部)係具有於頂部具極大值之態樣、或於頂部具有平坦部之態樣的任一種。又,折射率分佈之凹部(第1凹部~第3凹部)係具有於頂部具有極小值之態樣、或於頂部具有平坦部之態樣的任一種。The convex portion (the first convex portion to the sixth convex portion) of the refractive index distribution has either a state having a maximum value at the top portion or a flat portion at the top portion. Further, the concave portion (the first concave portion to the third concave portion) of the refractive index distribution has any of a state in which the top portion has a minimum value or a flat portion at the top portion.
第1核心部可設為第1凸部之極大值至第1凹部之極小值為止的區域,包覆部可設為第1凹部之極小值至第2凹部之極大值為止的區域。又,亦可取代極大值或極小值,採用頂部之平坦部的中央部。The first core portion may be a region from the maximum value of the first convex portion to the minimum value of the first concave portion, and the covering portion may be a region from the minimum value of the first concave portion to the maximum value of the second concave portion. Further, instead of the maximum value or the minimum value, the center portion of the flat portion at the top may be used.
平坦部之寬度並無特別限定,例如較佳為100μm以下、更佳20μm以下、再更佳10μm以下。藉由減小平坦部之寬度,則光侷限效果變高,可減低鄰接之核心部間的互擾。The width of the flat portion is not particularly limited, and is, for example, preferably 100 μm or less, more preferably 20 μm or less, still more preferably 10 μm or less. By reducing the width of the flat portion, the optical confinement effect becomes high, and the mutual interference between the adjacent core portions can be reduced.
本實施形態之折射率分佈,可藉由例如(1)使用干涉顯微鏡(dual-beam interference microscope)觀測折射率依存的干涉紋,由該干涉紋算出折射率分佈的方法;或(2)藉由折射近場法(Refracted Near Field method;RNF)進行測定。折射近場法可採用日本專利特開平5-332880號公報記載之測定條件。實施形態中,由於測定簡便,較佳為使用干涉顯微鏡的方法。The refractive index distribution of the present embodiment can be obtained by, for example, (1) observing a refractive index-dependent interference fringe using a dual-beam interference microscope, and calculating a refractive index distribution from the interference fringe; or (2) The measurement was performed by a refractive near field method (RNF). The measurement method described in Japanese Laid-Open Patent Publication No. Hei 5-332880 can be used for the refracting near-field method. In the embodiment, since the measurement is simple, a method using an interference microscope is preferred.
針對使用了干涉顯微鏡之折射率分佈之測定步驟的一例進行說明。首先,於光導波路之剖面方向上對光導波路進行切片,得到光導波路斷片。例如,切片成光導波路長度為200μm~300μm。接著,於由2個載玻片所包圍之空間中,作成填充折射率1.536的油而成之腔室。於此,在腔室內的空間挾入光導波路斷片而作成測定樣本,並作成未置入光導波路斷片的空白樣本。接著,使用干涉顯微鏡,得到光導波路斷片之剖面方向的干渉紋照片。對干涉紋照片進行影像解析,可得到折射率分佈。例如,改變干涉顯微鏡之光路徑長,連續取得改變了干涉紋出現處的影像資料。由複數之影像資料,算出層間方向及層內方向之各測定點的折射率。測定點之間隔並無特別限定,例如設為2.5μm。An example of a measurement procedure using a refractive index distribution of an interference microscope will be described. First, the optical waveguide is sliced in the cross-sectional direction of the optical waveguide to obtain an optical waveguide fragment. For example, the length of the sliced optical waveguide is 200 μm to 300 μm. Next, a chamber filled with oil having a refractive index of 1.536 was formed in a space surrounded by two glass slides. Here, the optical waveguide segment is inserted into the space in the chamber to prepare a measurement sample, and a blank sample in which the optical waveguide fragment is not inserted is prepared. Next, using a interference microscope, a dry crepe photograph of the cross section of the optical waveguide chip was obtained. The image of the interference pattern is subjected to image analysis to obtain a refractive index distribution. For example, changing the optical path length of the interference microscope continuously obtains image data that changes the appearance of the interference fringes. The refractive index of each measurement point in the interlayer direction and the in-layer direction was calculated from a plurality of image data. The interval between the measurement points is not particularly limited, and is, for example, 2.5 μm.
以下表示本實施形態之光導波路的一例。此一例中,於折射率分佈之凸部存在極大值,於凹部存在極小值。又,例如設為第1凸部之頂部為極大值Wm2、第2凸部之頂部為極大值Wm3、第3凸部之頂部為極大值Tm2、第4凸部之頂部為極大值Tm3、第1凹部之頂部為極小值Ws2、第2凹部之頂部為極小值Ts2。An example of the optical waveguide of the present embodiment will be described below. In this example, there is a maximum value in the convex portion of the refractive index distribution and a minimum value in the concave portion. Further, for example, the top of the first convex portion is the maximum value Wm2, the top of the second convex portion is the maximum value Wm3, the top of the third convex portion is the maximum value Tm2, and the top of the fourth convex portion is the maximum value Tm3, The top of the concave portion is the minimum value Ws2, and the top of the second concave portion is the minimum value Ts2.
圖1所示之光導波路1係發揮作為由一端部向另一端部傳送光信號之光配線的功能。The optical waveguide 1 shown in FIG. 1 functions as an optical wiring that transmits an optical signal from one end to the other end.
以下詳述光導波路1之各部分。Each part of the optical waveguide 1 will be described in detail below.
光導波路1係由圖1下側起依序積層包覆層11、核心層13及包覆層12而成者。The optical waveguide 1 is formed by sequentially laminating the cladding layer 11, the core layer 13, and the cladding layer 12 from the lower side of FIG.
其中,核心層13中,於面方向上形成有折射率分佈。此折射率分佈具有折射率相對地較高之區域與較低之區域,藉此可使所入射之光侷限於折射率較高之區域而進行傳送。Among them, in the core layer 13, a refractive index distribution is formed in the plane direction. This refractive index distribution has a region where the refractive index is relatively high and a region where the refractive index is relatively high, whereby the incident light can be restricted to a region having a higher refractive index for transmission.
圖2(a)為圖1之X-X線剖面圖,圖2(b)為表示通過X-X線剖面圖之核心層13厚度方向中心的中心線C1上之折射率分佈之一例的模式圖。Fig. 2(a) is a cross-sectional view taken along line X-X of Fig. 1, and Fig. 2(b) is a schematic view showing an example of a refractive index distribution on a center line C1 of the center of the thickness direction of the core layer 13 in the X-X line sectional view.
核心層13係於其寬度方向上,如圖2(b)所示般,具有包含4個極小值Ws1、Ws2、Ws3、Ws4、與5個極大值Wm1、Wm2、Wm3、Wm4、Wm5的折射率分佈W。又,5個極大值中,存在折射率相對較大的極大值(第1極大值)、與折射率相對較小的極大值(第2極大值)。The core layer 13 is in the width direction thereof, and as shown in FIG. 2(b), has a refraction including four minimum values Ws1, Ws2, Ws3, Ws4, and five maximum values Wm1, Wm2, Wm3, Wm4, and Wm5. Rate distribution W. Further, among the five maximum values, there are a maximum value (first maximum value) in which the refractive index is relatively large, and a maximum value (second maximum value) in which the refractive index is relatively small.
其中,在極小值Ws1與極小值Ws2之間及極小值Ws3與極小值Ws4之間,係分別存在折射率相對較大的極大值Wm2及Wm4,其以外之極大值Wm1、Wm3及Wm5,係折射率分別相對地較小的極大值。Among them, between the minimum value Ws1 and the minimum value Ws2 and between the minimum value Ws3 and the minimum value Ws4, there are maximum values Wm2 and Wm4 having relatively large refractive indices, and other maximum values Wm1, Wm3 and Wm5. The maximum value of the refractive index is relatively small, respectively.
光導波路1中,係如圖2所示般,於極小值Ws1與極小值Ws2之間由於含有折射率相對較大的極大值Wm2而成為核心部14,同樣地,極小值Ws3與極小值Ws4之間亦因含有極大值Wm4而成為核心部14。又,更詳言之,係將極小值Ws1與極小值Ws2之間作成核心部141,將極小值Ws3與極小值Ws4之間作成核心部142。In the optical waveguide 1, as shown in FIG. 2, the core portion 14 is formed between the minimum value Ws1 and the minimum value Ws2 by the maximum value Wm2 having a relatively large refractive index. Similarly, the minimum value Ws3 and the minimum value Ws4 are obtained. The core portion 14 is also included because it contains the maximum value Wm4. Further, in more detail, the core portion 141 is formed between the minimum value Ws1 and the minimum value Ws2, and the core portion 142 is formed between the minimum value Ws3 and the minimum value Ws4.
另外,極小值Ws1之左側區域、極小值Ws2與極小值Ws3之間、以及極小值Ws4之右側區域,由於分別屬於與核心部14兩側鄰接之區域,故成為側面包覆部15。又,更詳言之,係將極小值Ws1之左側區域作為側面包覆部151,將極小值Ws2與極小值Ws3之間作為側面包覆部152,將極小值Ws4之右側區域作為側面包覆部153。Further, the left side region of the minimum value Ws1, the minimum value Ws2 and the minimum value Ws3, and the right region of the minimum value Ws4 belong to the region adjacent to both sides of the core portion 14, and thus become the side cladding portion 15. Further, in more detail, the left side region of the minimum value Ws1 is referred to as the side cladding portion 151, and the minimum value Ws2 and the minimum value Ws3 are used as the side cladding portion 152, and the right side region of the minimum value Ws4 is covered as the side surface. Part 153.
亦即,折射率分佈W只要至少具有依第2極大值、極小值、第1極大值、極小值、第2極大值之順序排列的區域即可。又,此區域係配合核心部數而重複設置,如本實施形態般核心部14為2個時,折射率分佈W係如第2極大值、極小值、第1極大值、極小值、第2極大值、極小值、第1極大值、極小值、第2極大值般使極大值與極小值交互排列,且關於極大值,只要具有使第1極大值與第2極大值交互排列的區域即可。In other words, the refractive index distribution W may have at least a region arranged in the order of the second maximum value, the minimum value, the first maximum value, the minimum value, and the second maximum value. Further, this region is repeatedly provided in accordance with the number of core portions. When the core portion 14 is two as in the present embodiment, the refractive index distribution W is such as a second maximum value, a minimum value, a first maximum value, a minimum value, and a second value. The maximum value, the minimum value, the first maximum value, the minimum value, and the second maximum value are arranged such that the maximum value and the minimum value are alternately arranged, and the maximum value is an area in which the first maximum value and the second maximum value are alternately arranged. can.
另外,此等複數之極小值、複數之第1極大值及複數之第2極大值,較佳為彼此幾乎相同的值;若保持極小值小於第1極大值或第2極大值、第2極大值小於第1極大值的關係,則彼此之值亦可稍微偏差。此時,偏差量較佳係抑制於複數之極小值之平均值的10%以內。Further, the minimum value of the complex number, the first maximum value of the complex number, and the second maximum value of the complex number are preferably substantially the same value; if the minimum value is kept smaller than the first maximum value or the second maximum value, the second maximum value If the value is smaller than the first maximum value, the values of each other may be slightly deviated. At this time, the amount of deviation is preferably suppressed within 10% of the average value of the minimum value of the complex number.
另外,光導波路1係形成細長之帶狀,上述般之折射率分佈W係於光導波路1之長度方向整體維持幾乎相同的分佈。Further, the optical waveguide 1 is formed in an elongated strip shape, and the above-described general refractive index distribution W is maintained substantially the same distribution throughout the longitudinal direction of the optical waveguide 1.
隨著以上之折射率分佈W,於核心層13係形成有長尺狀之2個核心部14、與鄰接至此等核心部14各兩側的3個側面包覆部15。With the above refractive index distribution W, two core portions 14 having a long shape and three side cladding portions 15 adjacent to each of the core portions 14 are formed in the core layer 13.
更詳言之,於圖1所示之光導波路1上,交互設有並列之2個核心部141、142與並列之3個側面包覆部151、152、153。藉此,各核心部141、142分別成為由各側面包覆部151、152 153及各包覆層11、12所包圍的狀態。於此,此等2個核心部141、142之平均折射率因高於3個側面包覆部151、152、153之平均折射率,故於各核心部141、142與各側面包覆部151、152、153之間可產生光之全反射。又,於圖1所示之各核心部14標示密點,於各側面包覆部15標示疏點。More specifically, on the optical waveguide 1 shown in FIG. 1, two core portions 141 and 142 which are juxtaposed and three side cladding portions 151, 152 and 153 which are juxtaposed are alternately provided. Thereby, each of the core portions 141 and 142 is surrounded by the respective side surface covering portions 151 and 152 153 and the respective cladding layers 11 and 12. Here, since the average refractive index of the two core portions 141 and 142 is higher than the average refractive index of the three side cladding portions 151, 152, and 153, the core portions 141 and 142 and the respective side cladding portions 151 are formed. Total reflection of light can be produced between 152 and 153. Further, the core portions 14 shown in FIG. 1 are marked with a dense point, and the side surface covering portions 15 are indicated with a sparse point.
於光導波路1中,係於核心部14與包覆部(各包覆層11、12及各側面包覆部15)之間使射入至核心部14一端部的光被全反射,而傳送至另一方,藉此可由核心部14之另一端部取出。In the optical waveguide 1, the light incident on one end portion of the core portion 14 is totally reflected between the core portion 14 and the cladding portion (each of the cladding layers 11 and 12 and the side surface cladding portions 15), and is transmitted. To the other side, it can be taken out by the other end of the core portion 14.
另外,圖1所示之核心部14中,其橫剖面形狀形成為正方形或長方形般之四角形(矩形),但其形狀並無特別限定,亦可為例如真圓、楕圓形、長圓形等之圓形、三角形、五角形、六角形等之多角形。Further, in the core portion 14 shown in FIG. 1, the cross-sectional shape is formed into a square or rectangular quadrangular shape (rectangular shape), but the shape thereof is not particularly limited, and may be, for example, a true circle, an annulus circle, or an oblong shape. Polygons such as circles, triangles, pentagons, hexagons, etc.
核心部14之寬度及高度(核心層13之厚度)並無特別限定,分別較佳為1~200μm左右、更佳5~100μm左右、再更佳20~70μm左右。The width and height of the core portion 14 (the thickness of the core layer 13) are not particularly limited, and are preferably about 1 to 200 μm, more preferably about 5 to 100 μm, still more preferably about 20 to 70 μm.
於此,4個極小值Ws1、Ws2、Ws3、Ws4係分別未滿側面包覆部15之平均折射率WA。藉此,於各核心部14與各側面包覆部15之間,存在折射率更加小於側面包覆部15的區域。其結果,於各極小值Ws1、Ws2、Ws3、Ws4附近,形成更急遽的折射率斜率,因此,使來自各核心部14之漏光受到抑制,而得到傳送損失小的光導波路1。Here, the four minimum values Ws1, Ws2, Ws3, and Ws4 are less than the average refractive index WA of the side cladding portion 15, respectively. Thereby, between the core portion 14 and each of the side surface covering portions 15, there is a region in which the refractive index is smaller than that of the side surface covering portion 15. As a result, a more rapid refractive index slope is formed in the vicinity of each of the minimum values Ws1, Ws2, Ws3, and Ws4. Therefore, light leakage from the core portions 14 is suppressed, and the optical waveguide 1 having a small transmission loss is obtained.
另外,折射率分佈W於整體上折射率係呈連續變化。因此,相較於具有步階型之折射率分佈的光導波路,由於使光侷限於核心部14的作用被更加增強,故達到傳送損失的進一步減低。Further, the refractive index distribution W continuously changes in refractive index as a whole. Therefore, the effect of limiting the light to the core portion 14 is further enhanced as compared with the optical waveguide having the step type refractive index distribution, so that the transmission loss is further reduced.
再者,根據上述具有各極小值Ws1、Ws2、Ws3、Ws4,且折射率呈連續變化的折射率分佈W,由於使傳送光在核心部14之更接近中心部的區域進行集中傳送,故難以於每光路徑的傳送時間上產生差異。因此,即使於傳送光中包含脈衝信號,仍可抑制脈衝信號的遲緩(脈衝信號的擴展)。其結果,可得到更加提高光通信品質的光導波路1。Further, according to the above-described refractive index distribution W having the respective minimum values Ws1, Ws2, Ws3, and Ws4 and having a continuously changing refractive index, it is difficult to collectively transmit the transmitted light in the region closer to the center portion of the core portion 14. A difference occurs in the transmission time per light path. Therefore, even if a pulse signal is included in the transmitted light, the sluggishness of the pulse signal (expansion of the pulse signal) can be suppressed. As a result, the optical waveguide 1 which further improves the optical communication quality can be obtained.
另外,即使核心部14與側面包覆部15間之平均之折射率差較小,仍可將光確實地侷限於核心部14。Further, even if the average refractive index difference between the core portion 14 and the side cladding portion 15 is small, the light can be surely limited to the core portion 14.
另外,折射率分佈W中,極大值Wm2、Wm4係如圖2所示般,位於核心部141、142,但於核心部141、142中仍位於其寬度的中心部。藉此,各核心部141、142中,傳送光集中於核心部141、142之寬度中心部的機率變高,而相對地使光漏出至側面包覆部151、152、153的機率變低。其結果,可更加減低核心部141、142的傳送損失。Further, in the refractive index distribution W, the maximum values Wm2 and Wm4 are located in the core portions 141 and 142 as shown in Fig. 2, but are still located at the center portion of the width in the core portions 141 and 142. As a result, in each of the core portions 141 and 142, the probability that the transmitted light is concentrated at the center portion of the width of the core portions 141 and 142 is increased, and the probability of relatively leaking light to the side surface covering portions 151, 152, and 153 is lowered. As a result, the transmission loss of the core portions 141, 142 can be further reduced.
尚且,例如所謂核心部141之寬度的中心部,係設為自極小值Ws1與極小值Ws2之中點起朝向兩側,核心部141之寬度之30%之距離的區域。In addition, for example, the center portion of the width of the core portion 141 is a region that is a distance of 30% of the width of the core portion 141 from both the minimum value Ws1 and the minimum value Ws2.
另外,極大值Wm2、Wm4之位置最好儘可能位於核心部141、142之寬度中心部,但即使未必為中心部,只要位於核心部141、142之緣部(與各側面包覆部151、152、153接觸之部分)附近以外,則免於特性之顯著降低。亦即,可某程度地抑制核心部141、142的傳送損失。Further, it is preferable that the positions of the maximum values Wm2 and Wm4 are located at the center of the width of the core portions 141 and 142 as much as possible, but if they are not necessarily the center portion, they are located at the edge portions of the core portions 141 and 142 (with the respective side cladding portions 151, Outside of the vicinity of the 152, 153 contact, there is no significant reduction in characteristics. That is, the transmission loss of the core portions 141, 142 can be suppressed to some extent.
尚且,例如所謂核心部141之緣部附近,係指自上述緣部起朝向內側,核心部141之寬度之5%之距離的區域。In the vicinity of the edge portion of the core portion 141, for example, a region having a distance of 5% of the width of the core portion 141 from the edge portion toward the inside is referred to.
另一方面,折射率分佈W之中,極大值Wm1、Wm3、Wm5係如圖2(b)所示般位於側面包覆部151、152、153中,特佳為位於側面包覆部151、152、153之緣部(與核心部141、142相接之部分)附近以外。藉此,由於核心部141、142中之極大值Wm2、Wm4與側面包覆部151、152、153中之極大值Wm1、Wm3、Wm5彼此充分離間,故可使核心部141、142中之傳送光漏出至側面包覆部151、152、153中的機率充分減低。其結果,可減低核心部141、142之傳送損失。On the other hand, among the refractive index distributions W, the maximum values Wm1, Wm3, and Wm5 are located in the side surface cladding portions 151, 152, and 153 as shown in Fig. 2(b), and particularly preferably located in the side surface cladding portion 151, The edges of the edges 152 and 153 (portions that are in contact with the core portions 141 and 142) are not. Thereby, since the maximum values Wm2, Wm4 in the core portions 141, 142 and the maximum values Wm1, Wm3, Wm5 among the side cladding portions 151, 152, 153 are sufficiently separated from each other, the transmission in the core portions 141, 142 can be performed. The probability of light leaking into the side cladding portions 151, 152, 153 is sufficiently reduced. As a result, the transmission loss of the core portions 141, 142 can be reduced.
尚且,例如所謂側面包覆部151、152、153之緣部附近,係指自上述緣部起朝向內側,側面包覆部151、152、153之寬度之5%之距離的區域。In addition, for example, the vicinity of the edge portion of the side surface covering portions 151, 152, and 153 means a region having a distance of 5% of the width of the side surface covering portions 151, 152, and 153 from the edge portion toward the inside.
另外,較佳係極大值Wm1、Wm3、Wm5位於側面包覆部151、152、153之寬度的中央部,而且較佳係自極大值Wm1、Wm3、Wm5起朝向鄰接之極小值Ws1、Ws2、Ws3、Ws4,其折射率呈連續降低。藉此,核心部141、142中之極大值Wm2、Wm4與側面包覆部151、152、153中之極大值Wm1、Wm3、Wm5之間的離間距離被確保為最大限度,而且可使光確實侷限於極大值Wm1、Wm3、Wm5附近,故可更確實地抑制來自上述核心部141、142之傳送光的漏出。Further, the preferred maximum values Wm1, Wm3, and Wm5 are located at the central portion of the width of the side cladding portions 151, 152, and 153, and preferably from the maximum values Wm1, Wm3, and Wm5 toward the adjacent minimum values Ws1, Ws2. Ws3 and Ws4 have a continuous decrease in refractive index. Thereby, the distance between the maximum values Wm2, Wm4 in the core portions 141, 142 and the maximum values Wm1, Wm3, Wm5 among the side cladding portions 151, 152, 153 is ensured to the maximum, and the light can be sure Since it is limited to the vicinity of the maximum values Wm1, Wm3, and Wm5, leakage of the transmitted light from the core portions 141 and 142 can be more reliably suppressed.
再者,雖然由於極大值Wm1、Wm3、Wm5之折射率較位於上述核心部141、142之極大值Wm2、Wm4小,而不具有如核心部141、142般之高光傳送性,但因其折射率較周圍高,故具有些許光傳送性。其結果,側面包覆部151、152、153侷限由核心部141、142漏出之傳送光,藉此具有防止波及到其他核心部的作用。亦即,藉由存在極大值Wm1、Wm3、Wm5,可抑制互擾。Further, although the refractive indices of the maximum values Wm1, Wm3, and Wm5 are smaller than the maximum values Wm2 and Wm4 located at the core portions 141 and 142, and do not have high light transmission properties as the core portions 141 and 142, they are refracted by the core portions 141 and 142. The rate is higher than the surrounding, so it has a little light transmission. As a result, the side cladding portions 151, 152, and 153 limit the transmitted light leaked from the core portions 141 and 142, thereby preventing the waves from reaching the other core portions. That is, mutual interference can be suppressed by the existence of maximum values Wm1, Wm3, and Wm5.
尚且,極小值Ws1、Ws2、Ws3、Ws4係如上述般,未滿側面包覆部15之平均折射率WA,但其差最好為既定範圍內。具體而言,極小值Ws1、Ws2、Ws3、Ws4與側面包覆部15之平均折射率WA的差,較佳係極小值Ws1、Ws2、Ws3、Ws4與核心部141、142中之極大值Wm2、Wm4之差的3~80%左右,更佳5~50%左右,再更佳7~20%左右(例如,(WA-Ws1)/(Wm2-Ws1)×100例如較佳為3~80%、更佳5~50%、再更佳7~20%。(以下,「~」在未特別註明之下,表示包括上限值與下限值))。藉此,側面包覆部15具有用於抑制互擾所需且充分的光傳送性。又,藉由使極小值Ws1、Ws2、Ws3、Ws4與側面包覆部15之平均折射率WA的差成為上述下限值以上,則可充分抑制互擾。藉由設為上述上限值以下,則可抑制側面包覆部15中之光傳送性過大,核心部141、142之光傳送性降低。Further, the minimum values Ws1, Ws2, Ws3, and Ws4 are less than the average refractive index WA of the side cladding portion 15 as described above, but the difference is preferably within a predetermined range. Specifically, the difference between the minimum values Ws1, Ws2, Ws3, and Ws4 and the average refractive index WA of the side cladding portion 15 is preferably the minimum value Ws1, Ws2, Ws3, Ws4 and the maximum value Wm2 of the core portions 141, 142. The difference of Wm4 is about 3 to 80%, more preferably about 5 to 50%, and even more preferably about 7 to 20% (for example, (WA-Ws1) / (Wm2-Ws1) × 100, for example, preferably 3 to 80. %, more preferably 5 to 50%, and even more preferably 7 to 20%. (Herein, "~" means that the upper limit and the lower limit are included unless otherwise specified). Thereby, the side cladding portion 15 has sufficient light transmission property for suppressing mutual interference. In addition, by making the difference between the minimum values Ws1, Ws2, Ws3, and Ws4 and the average refractive index WA of the side surface cladding portion 15 equal to or higher than the lower limit value, mutual interference can be sufficiently suppressed. When the value is equal to or less than the above upper limit value, the light transmittance in the side surface covering portion 15 is excessively suppressed, and the light transmittance of the core portions 141 and 142 is lowered.
另外,極小值Ws1、Ws2、Ws3、Ws4與極大值Wm1、Wm3、Wm5之間的差,較佳為極小值Ws1、Ws2、Ws3、Ws4與極大值Wm2、Wm4之間的差的6~90%左右、更佳10~70%左右、再更佳14~40%左右。藉此,使側面包覆部15之折射率高度與核心部14之折射率高度的均衡最佳化,光導波路1具有特別優越的光傳送性,同時可更確實地抑制互擾。Further, the difference between the minimum values Ws1, Ws2, Ws3, and Ws4 and the maximum values Wm1, Wm3, and Wm5 is preferably 6 to 90 of the difference between the minimum values Ws1, Ws2, Ws3, and Ws4 and the maximum values Wm2 and Wm4. About %, better 10~70%, and even better 14~40%. Thereby, the balance between the refractive index height of the side cladding portion 15 and the refractive index height of the core portion 14 is optimized, and the optical waveguide 1 has particularly excellent optical transmission properties, and mutual interference can be more reliably suppressed.
尚且,極小值Ws1、Ws2、Ws3、Ws4與核心部141、142中之極大值Wm2、Wm4之間的折射率差,最好儘可能地大,較佳為0.005~0.07左右、更佳0.007~0.05左右、再更佳0.01~0.05左右(例如,(Wm1-Ws1)/(Wm2-Ws1)×100較佳為0.005~0.07、更佳0.007~0.05、再更佳0.01~0.05)。藉由設為上述折射率差,則可將光侷限於核心部141、142中。Further, the refractive index difference between the minimum values Ws1, Ws2, Ws3, and Ws4 and the maximum values Wm2 and Wm4 of the core portions 141 and 142 is preferably as large as possible, preferably about 0.005 to 0.07, more preferably 0.007. It is about 0.05, more preferably about 0.01 to 0.05 (for example, (Wm1-Ws1) / (Wm2-Ws1) × 100 is preferably 0.005 to 0.07, more preferably 0.007 to 0.05, still more preferably 0.01 to 0.05). By setting the refractive index difference as described above, light can be limited to the core portions 141 and 142.
另外,核心部141、142中之折射率分佈W係如圖2(b)所示般,以核心層13之橫剖面位置作為橫軸,以折射率作為縱軸時,於極大值Wm2附近及極大值Wm4附近,若折射率呈連續變化之形狀,則亦可朝上形成凸之略V字狀(極大值以外呈幾乎直線狀),但較佳為朝上形成凸之略U字狀(極大值附近整體呈現圓弧)。若折射率分佈W形成此種形狀,則核心部141、142之光侷限作用變得更顯著。Further, the refractive index distribution W in the core portions 141 and 142 is such that the cross-sectional position of the core layer 13 is the horizontal axis as shown in Fig. 2(b), and the refractive index is the vertical axis, and the maximum value Wm2 is In the vicinity of the maximum value Wm4, if the refractive index is continuously changed, a convex V-shape may be formed upward (a substantially linear shape other than the maximum value), but it is preferable to form a convex U-shape upward ( The whole circle is rounded around the maximum value). If the refractive index distribution W forms such a shape, the optical confinement effect of the core portions 141, 142 becomes more remarkable.
另外,折射率分佈W係如圖2(b)所示般,於極小值Ws1附近、極小值Ws2附近、極小值Ws3附近及極小值Ws4附近,若折射率呈連續變化之形狀,則可朝下形成凸之略V字狀(極大值以外呈幾乎直線狀),較佳係朝下形成凸之略U字狀(極大值附近整體呈現圓弧)。Further, as shown in FIG. 2(b), the refractive index distribution W is in the vicinity of the minimum value Ws1, the vicinity of the minimum value Ws2, the vicinity of the minimum value Ws3, and the minimum value Ws4. The convex shape is slightly V-shaped (substantially linear except for the maximum value), and it is preferable that the convex shape is slightly U-shaped downward (the entire arc exhibits an arc near the maximum value).
於此,本發明者等人發現,光導波路1之複數核心部141、142中,光入射至所需之一端部,並取得另一端部之射出光強度分佈時,其強度分佈成為於抑制光導波路1之互擾時極有用的分佈。Here, the inventors of the present invention have found that when light is incident on one of the desired end portions of the plurality of core portions 141 and 142 of the optical waveguide 1, and the light intensity distribution of the other end portion is obtained, the intensity distribution is such that the light guide is suppressed. A very useful distribution of the mutual interference of Waves 1.
圖3為表示光入射至光導波路1之核心部141時,射出光之強度分佈的圖。FIG. 3 is a view showing an intensity distribution of emitted light when light is incident on the core portion 141 of the optical waveguide 1.
若光入射至核心部141,射出光之強度係於核心部141之射出端中心部變為最大。而且,雖然隨著自核心部141中心部遠離而射出光強度變小,但根據本發明之光導波路,於與核心部141相鄰之核心部142可得到具有極小值般的強度分佈。如此,藉由於核心部142位置使射出光之強度分佈之極小值一致,則可使核心部142之互擾抑制為極小,故可得到即使多頻道化及高密度化仍可確實防止干擾發生的光導波路1。When light is incident on the core portion 141, the intensity of the emitted light is maximized at the center of the emission end of the core portion 141. Further, although the light intensity of the emitted light is smaller as it goes away from the center portion of the core portion 141, the light guiding path according to the present invention can obtain a minimum value-like intensity distribution in the core portion 142 adjacent to the core portion 141. In this way, since the minimum value of the intensity distribution of the emitted light is matched by the position of the core portion 142, the mutual interference of the core portion 142 can be suppressed to be extremely small, so that it is possible to surely prevent interference even if multi-channelization and high density are obtained. Optical waveguide 1.
尚且,習知之光導波路中,與光所射入之核心部相鄰之核心部中,射出光之強度分佈不成為極小值,反而成為極大值,故發生互擾問題。相對於此,如上述般本發明之光導波路中之射出光強度分佈的行為,係於抑制互擾方面極為有用。Further, in the conventional optical waveguide, in the core portion adjacent to the core portion into which the light is incident, the intensity distribution of the emitted light does not become a minimum value, but instead becomes a maximum value, so that a mutual interference problem occurs. On the other hand, the behavior of the light intensity distribution in the optical waveguide of the present invention as described above is extremely useful for suppressing mutual interference.
本發明之光導波路中,雖然得到此種強度分佈的詳細理由不明,但作為其理由之一,可舉例如:以折射率分佈W具有極小值Ws1、Ws2、Ws3、Ws4,且折射率分佈W整體之折射率呈連續變化為特徵的折射率分佈W,使習知中於核心部142具有極大值的射出光強度分佈,移位至與核心部142鄰接之側面包覆部153等。亦即,藉此由此移位,而確實抑制互擾。In the optical waveguide of the present invention, although the reason for obtaining such an intensity distribution is unknown, one of the reasons is that the refractive index distribution W has minimum values Ws1, Ws2, Ws3, and Ws4, and the refractive index distribution W The refractive index distribution W, which is characterized by a continuous change in the refractive index of the whole, is such that the light-intensity distribution having a maximum value at the core portion 142 is shifted to the side cladding portion 153 adjacent to the core portion 142. That is, by this shifting, the mutual interference is surely suppressed.
尚且,即使射出光強度分佈移位至側面包覆部15,由於受光元件等仍配合核心部14之位置而配置,故幾乎不導致干擾,不致使光通信品質劣化。In addition, even if the light-emitting intensity distribution is shifted to the side surface cladding portion 15, since the light-receiving element or the like is disposed in accordance with the position of the core portion 14, the interference is hardly caused, and the optical communication quality is not deteriorated.
另外,上述般之射出光強度分佈,雖然於本發明之光導波路中被觀測到的機率高,但並非必定被觀測到,視射入光之NA(numerical aperture)或核心部141之橫剖面積、核心部141、142之間隙等,亦有未觀測到明確之極小值、或極小值位置偏離核心部142的情形,但於此種情況下互擾仍受到充分抑制。Further, although the above-described light emission intensity distribution is high in the optical waveguide of the present invention, it is not necessarily observed, and the NA of the incident light or the cross-sectional area of the core portion 141 is not necessarily observed. The gap between the core portions 141 and 142 and the like may be such that no clear minimum value or a minimum value is deviated from the core portion 142. However, in this case, mutual interference is still sufficiently suppressed.
另外,圖2(b)所示之折射率分佈W中,將側面包覆部15之平均折射率設為WA時,將極大值Wm2、Wm4附近之折射率呈連續且為平均折射率WA以上的部分的寬度設為a[μm],並將極小值Ws1、Ws2、Ws3、Ws4附近之折射率呈連續且為未滿平均折射率WA的部分的寬度設為b[μm]。此時,b較佳為0.01a~1.2a左右、更佳0.03a~1a左右、再更佳0.1a~0.8a左右。藉此,極小值Ws1、Ws2、Ws3、Ws4之實質寬度可發揮上述作用及效果。亦即,藉由將b設為上述下限值以上,則可抑制極小值Ws1、Ws2、Ws3、Ws4之實質寬度過窄,將光侷限於核心部141、142之作用降低。另一方面,藉由將b設為上述上限值以下,則可抑制極小值Ws1、Ws2、Ws3、Ws4之實質寬度過廣,核心部141、142之寬度或間距受限,傳送效率降低、或多頻道化及高密度化受阻的情形。Further, in the refractive index distribution W shown in FIG. 2(b), when the average refractive index of the side cladding portion 15 is WA, the refractive index in the vicinity of the maximum values Wm2 and Wm4 is continuous and is equal to or higher than the average refractive index WA. The width of the portion is set to a [μm], and the width of the portion in which the refractive index in the vicinity of the minimum values Ws1, Ws2, Ws3, and Ws4 is continuous and is less than the average refractive index WA is set to b [μm]. In this case, b is preferably about 0.01a to 1.2a, more preferably about 0.03a to 1a, still more preferably about 0.1a to 0.8a. Thereby, the substantial widths of the minimum values Ws1, Ws2, Ws3, and Ws4 can exhibit the above-described effects and effects. In other words, by setting b to the lower limit or more, it is possible to suppress the absolute widths of the minimum values Ws1, Ws2, Ws3, and Ws4 from being too narrow, and to reduce the effect of limiting the light to the core portions 141 and 142. On the other hand, when b is equal to or less than the above upper limit value, it is possible to suppress the substantial widths of the minimum values Ws1, Ws2, Ws3, and Ws4 from being excessively wide, and the width or pitch of the core portions 141 and 142 is limited, and the transmission efficiency is lowered. Or multi-channelization and high density is blocked.
尚且,側面包覆部15之平均折射率WA,可例如近似極大值Wm1與極小值Ws1的中點。Further, the average refractive index WA of the side cladding portion 15 may be, for example, approximately the midpoint of the maximum value Wm1 and the minimum value Ws1.
上述之核心層13之構成材料(主材料),只要為產生上述折射率差的材料則無特別限定,具體而言可使用丙烯酸系樹脂、甲基丙烯酸系樹脂、聚碳酸酯、聚苯乙烯、環氧樹脂、聚醯胺、聚醯亞胺、聚苯并唑、聚矽烷、聚矽氮烷、聚矽氧系樹脂、氟系樹脂或苯并環丁烯系樹脂或降烯系樹脂等之環狀烯烴系樹脂般之各種樹脂材料;石英玻璃、硼矽酸玻璃般之玻璃材料等。又,樹脂材料亦可為組合了相異組成的複合材料,亦可含有未聚合之單體。The constituent material (main material) of the core layer 13 is not particularly limited as long as it is a material having the above refractive index difference, and specifically, an acrylic resin, a methacrylic resin, a polycarbonate, a polystyrene, or the like may be used. Epoxy resin, polyamine, polyimine, polybenzo Oxazole, polydecane, polyazane, polyoxynene resin, fluorine resin or benzocyclobutene resin or Various resin materials such as a cyclic olefin resin such as an olefin resin; a glass material such as quartz glass or borosilicate glass. Further, the resin material may be a composite material in which a different composition is combined, and may also contain an unpolymerized monomer.
另外,此等之中特佳為降烯系樹脂。降烯系聚合物可藉由例如開環複分解聚合(ROMP)、ROMP與氫化反應之組合、自由基或陽離子之聚合、使用了陽離子性鈀聚合起始劑的聚合、使用了其以外之聚合起始劑(例如鎳或其他過渡金屬之聚合起始劑)的聚合等公知的所有聚合方法而獲得。In addition, among these, it is especially good for the drop. An olefinic resin. drop The olefin polymer can be, for example, a ring-opening metathesis polymerization (ROMP), a combination of ROMP and a hydrogenation reaction, a polymerization of a radical or a cation, a polymerization using a cationic palladium polymerization initiator, and a polymerization initiation other than the polymerization. It is obtained by a known polymerization method such as polymerization of a reagent (for example, a polymerization initiator of nickel or another transition metal).
包覆層11及12係分別構成位於核心層13下部及上部的包覆部。The cladding layers 11 and 12 respectively constitute a cladding portion located at the lower portion and the upper portion of the core layer 13.
包覆層11、12之平均厚度較佳為核心層13之平均厚度(各核心部14之平均高度)的0.1~1.5倍左右,更佳0.2~1.25倍左右;具體而言,包覆層11、12之平均厚度並無特別限定,分別通常較佳為1~200μm左右,更佳5~100μm左右,再更佳10~60μm左右。藉此,防止光導波路1大型化(厚膜化)至所需以上,同時較佳地發揮作為包覆部的機能。The average thickness of the cladding layers 11 and 12 is preferably about 0.1 to 1.5 times, more preferably about 0.2 to 1.25 times the average thickness of the core layer 13 (average height of each core portion 14); specifically, the cladding layer 11 The average thickness of 12 is not particularly limited, and is usually preferably about 1 to 200 μm, more preferably about 5 to 100 μm, still more preferably about 10 to 60 μm. Thereby, the optical waveguide 1 is prevented from being enlarged (thickened) to a required level or more, and the function as a covering portion is preferably exhibited.
另外,作為包覆層11及12之構成材料,可使用例如與上述核心層13之構成材料相同的材料,但特佳為降烯系聚合物。Further, as the constituent material of the cladding layers 11 and 12, for example, the same material as that of the above-described core layer 13 can be used, but it is particularly preferable. An olefinic polymer.
另外,於選擇核心層13之構成材料及包覆層11、12之構成材料時,可考慮兩者間之折射率差而選擇材料。具體而言,由於在核心部14與包覆層11、12之邊界使光確實地全反射,故只要選擇使核心部14之構成材料之折射率充分變大的材料即可。藉此,於光導波路1之厚度方向上得到充分之折射率差,可抑制光由核心部14漏出至包覆層11、12的情形。Further, when the constituent material of the core layer 13 and the constituent materials of the cladding layers 11 and 12 are selected, the material may be selected in consideration of the difference in refractive index between the two. Specifically, since the light is surely totally reflected at the boundary between the core portion 14 and the cladding layers 11 and 12, it is only necessary to select a material that sufficiently increases the refractive index of the constituent material of the core portion 14. Thereby, a sufficient refractive index difference is obtained in the thickness direction of the optical waveguide 1, and it is possible to suppress leakage of light from the core portion 14 to the cladding layers 11, 12.
尚且,由抑制光衰減的觀點而言,核心層13之構成材料與包覆層11、12之構成材料之間的密黏性(親和性)較高者亦屬重要。Further, from the viewpoint of suppressing light attenuation, it is also important that the adhesive material (affinity) between the constituent materials of the core layer 13 and the constituent materials of the cladding layers 11 and 12 is high.
另外,包覆層11、12可視需要而設置,亦可省略其中任一者或雙方。此時,核心層13之表面雖露出至大氣(空氣),但因空氣之折射率充分低,故此空氣可替代包覆層11、12之機能。Further, the cladding layers 11 and 12 may be provided as needed, or either or both of them may be omitted. At this time, although the surface of the core layer 13 is exposed to the atmosphere (air), since the refractive index of the air is sufficiently low, the air can replace the functions of the cladding layers 11, 12.
於光導波路1下面,視需要亦可積層如圖1所示般之支撐薄膜2。Below the optical waveguide 1, a support film 2 as shown in FIG. 1 may be laminated as needed.
支撐薄膜2係支撐光導波路1之下面,予以保護、補強。藉此,可提高光導波路1之可靠性及機械特性。The support film 2 supports the lower surface of the optical waveguide 1 to protect and reinforce. Thereby, the reliability and mechanical characteristics of the optical waveguide 1 can be improved.
作為此種支撐薄膜2之構成材料,可舉例如聚對苯二甲酸乙二酯(PET)、聚乙烯、聚丙烯般之聚烯烴,聚醯亞胺、聚醯胺等之各種樹脂材料,銅、鋁、銀等之金屬材料。又,於金屬材料的情況,較佳係使用金屬箔作為支撐薄膜2。Examples of the constituent material of the support film 2 include various kinds of resin materials such as polyethylene terephthalate (PET), polyethylene, polypropylene-like polyolefin, polyimide, and polyamide. Metal materials such as aluminum and silver. Further, in the case of a metal material, a metal foil is preferably used as the support film 2.
另外,支撐薄膜2之平均厚度並無特別限定,較佳為5~200μm左右、更佳10~100μm左右。藉此,支撐薄膜2因具有適度的剛性,故確實支撐光導波路1,並難以阻礙光導波路1之柔軟性。Further, the average thickness of the support film 2 is not particularly limited, but is preferably about 5 to 200 μm, more preferably about 10 to 100 μm. Thereby, since the support film 2 has moderate rigidity, the optical waveguide 1 is surely supported, and it is difficult to hinder the flexibility of the optical waveguide 1.
尚且,於支撐薄膜2與光導波路1之間係被接黏或接合,作為其方法,可舉例如以熱壓黏、接黏劑或黏著劑所進行的接黏等。Further, the support film 2 and the optical waveguide 1 are bonded or bonded together, and as a method thereof, for example, adhesion by heat-pressure bonding, an adhesive or an adhesive may be employed.
其中,作為接黏層,可舉例如丙烯酸系接黏劑、胺基甲酸乙酯系接黏劑、聚矽氧系接黏劑,其他之各種熱熔接黏劑(聚酯系、改質烯烴系)等。又,作為耐熱性特別高者,較佳係使用聚醯亞胺、聚醯亞胺醯胺、聚醯亞胺醯胺醚、聚酯醯亞胺、聚醯亞胺醚等之熱可塑性聚醯亞胺接黏劑。由此種材料所構成之接黏層因為較富有柔軟性,故即使改變光導波路1之形狀,仍可自由地追隨其變化。其結果,可確實防止形狀變化所伴隨的剝離。Among them, examples of the adhesive layer include an acrylic adhesive, an urethane adhesive, a polyoxynene adhesive, and various other thermal fusion adhesives (polyester, modified olefin). )Wait. Further, as a particularly high heat resistance, it is preferred to use a thermoplastic polymerizable group such as polyimine, polyimine, phthalimide, polyesterimide or polyimine. Imine adhesive. Since the adhesive layer composed of such a material is relatively flexible, even if the shape of the optical waveguide 1 is changed, the change can be freely followed. As a result, peeling accompanying the shape change can be surely prevented.
此種接黏層之平均厚度並無特別限定,較佳為1~100μm左右、更佳5~60μm左右。The average thickness of the adhesive layer is not particularly limited, but is preferably about 1 to 100 μm, more preferably about 5 to 60 μm.
另一方面,於光導波路1上面視需要亦可積層圖1所示之覆蓋薄膜3。On the other hand, the cover film 3 shown in Fig. 1 may be laminated on the optical waveguide 1 as needed.
覆蓋薄膜3係保護光導波路1,並由上方支撐光導波路1。藉此,可保護光導波路1免於髒污或損傷等,並可提高光導波路1之可靠性及機械特性。The cover film 3 protects the optical waveguide 1 and supports the optical waveguide 1 from above. Thereby, the optical waveguide 1 can be protected from contamination or damage, and the reliability and mechanical characteristics of the optical waveguide 1 can be improved.
作為此種覆蓋薄膜3之構成材料,係與支撐薄膜2之構成材料相同,可舉例如聚對苯二甲酸乙二酯(PET)、聚乙烯、聚丙烯般之聚烯烴,聚醯亞胺、聚醯胺等之各種樹脂材料,銅、鋁、銀等之金屬材料。又,於金屬材料的情況,較佳係使用金屬箔作為覆蓋薄膜3。又,在於光導波路1之途中形成鏡的情況,由於光穿透覆蓋薄膜3,故覆蓋薄膜3之構成材料較佳係實質上為透明。The constituent material of the cover film 3 is the same as the constituent material of the support film 2, and examples thereof include polyethylene terephthalate (PET), polyethylene, polypropylene-like polyolefin, and polyimine. Various resin materials such as polyamide, metal materials such as copper, aluminum, and silver. Further, in the case of a metal material, a metal foil is preferably used as the cover film 3. Further, in the case where the mirror is formed on the way of the optical waveguide 1, since the light penetrates the cover film 3, the constituent material of the cover film 3 is preferably substantially transparent.
另外,覆蓋薄膜3之平均厚度並無特別限定,較佳為3~50μm左右、更佳5~30μm左右。藉由使覆蓋薄膜3之厚度成為上述範圍內,則使覆蓋薄膜3於光通信時具有充分之光穿透率,並具有用於確實保護光導波路1的充分剛性者。Further, the average thickness of the cover film 3 is not particularly limited, but is preferably about 3 to 50 μm, more preferably about 5 to 30 μm. When the thickness of the cover film 3 is within the above range, the cover film 3 has a sufficient light transmittance at the time of optical communication, and has sufficient rigidity for surely protecting the optical waveguide 1.
尚且,覆蓋薄膜3與光導波路1之間係被接黏或接合,作為其方法,可舉例如以熱壓黏、接黏劑或黏著劑所進行的接黏。其中,可使用上述者作為接黏劑。Further, the cover film 3 and the optical waveguide 1 are bonded or bonded to each other, and as a method thereof, for example, adhesion by heat-pressure bonding, an adhesive or an adhesive may be employed. Among them, the above may be used as an adhesive.
另外,本實施形態中,雖針對由包覆層11、核心層13及包覆層12之積層體所構成的光導波路1進行了說明,但亦可為此等之一體形成者。In the present embodiment, the optical waveguide 1 composed of the laminate of the cladding layer 11, the core layer 13, and the cladding layer 12 has been described. However, it is also possible to form one of these.
另外,本實施形態中,雖針對核心層13為具有2個核心部14的情況進行了說明,但核心部14之數量並無特別限定,可為1個,亦可為3個以上。In the present embodiment, the case where the core layer 13 has the two core portions 14 has been described. However, the number of the core portions 14 is not particularly limited, and may be one or three or more.
尚且,例如於核心部14為1個的情況,只要光導波路1之橫剖面的折射率分佈W具有2個極小值,該極小值如上述般未滿平均折射率WA,且折射率分佈W整體中折射率呈連續變化即可;在核心部14增加至3、4、5...個時,配合其數量而折射率分佈W所具有之極小值的數量增加至6、8、10...㊣個。In the case where the core portion 14 is one, for example, the refractive index distribution W of the transverse cross section of the optical waveguide 1 has two minimum values, and the minimum value is less than the average refractive index WA as described above, and the refractive index distribution W as a whole The medium refractive index may be continuously changed; when the core portion 14 is increased to 3, 4, 5..., the number of the minimum value of the refractive index distribution W is increased to 6, 8, 10... Just one.
其次,針對上述光導波路1之製造方法的一例進行說明。Next, an example of a method of manufacturing the optical waveguide 1 will be described.
首先,針對光導波路1之第1製造方法進行說明。First, the first manufacturing method of the optical waveguide 1 will be described.
圖4~8係分別用於說明圖1所示之光導波路1之第1製造方法的圖。又,於以下說明中,將圖4~8之上側稱為「上」,將下側稱為「下」。4 to 8 are views for explaining the first manufacturing method of the optical waveguide 1 shown in Fig. 1, respectively. In the following description, the upper side of FIGS. 4 to 8 is referred to as "upper" and the lower side is referred to as "lower".
光導波路1係分別準備包覆層11、核心層13與包覆層12,藉由將其等積層而製造。The optical waveguide 1 is prepared by preparing the cladding layer 11, the core layer 13, and the cladding layer 12, respectively, and laminating them.
光導波路1之第1製造方法係[1]於支撐基板951上塗佈核心層形成用組成物900以形成液狀被膜後,將此支撐基板951置於水平台上對液狀被膜進行平坦化,並使溶媒蒸發(脫溶媒)。藉此,得到層910。[2]接著,藉由對層910之一部分照射活性放射線使折射率差產生,得到形成有核心部14與側面包覆部15的核心層13。[3]接著,於核心層13之兩面上積層包覆層11、12,得到光導波路1。In the first manufacturing method of the optical waveguide 1 [1], the core layer forming composition 900 is applied onto the support substrate 951 to form a liquid film, and then the support substrate 951 is placed on a water platform to planarize the liquid film. And the solvent is evaporated (desolvent). Thereby, the layer 910 is obtained. [2] Next, a refractive index difference is generated by irradiating a portion of the layer 910 with active radiation, thereby obtaining a core layer 13 in which the core portion 14 and the side cladding portion 15 are formed. [3] Next, the cladding layers 11 and 12 are laminated on both surfaces of the core layer 13 to obtain an optical waveguide 1.
以下,針對各步驟依序進行說明。Hereinafter, each step will be described in order.
[1]首先,準備核心層形成用組成物900。[1] First, a core layer forming composition 900 is prepared.
核心層形成用組成物900係含有聚合物915、添加劑920(本實施形態中,至少含有單體)者。此種核心層形成用組成物900係藉由活性放射線的照射,於聚合物915中產生至少單體之反應,隨此而於折射率分佈產生變化的材料。亦即,核心層形成用組成物900係因聚合物915與單體之存在比率的偏差而使折射率分佈發生變化,其結果,屬於可於核心層13中形成核心部14與側面包覆部15的材料。The core layer forming composition 900 contains a polymer 915 and an additive 920 (in the present embodiment, at least a monomer is contained). The core layer-forming composition 900 is a material which undergoes at least a monomer reaction in the polymer 915 by irradiation with actinic radiation, and thus changes in the refractive index distribution. In other words, the core layer forming composition 900 changes the refractive index distribution due to the variation in the ratio of the presence of the polymer 915 to the monomer. As a result, the core portion 14 and the side cladding portion can be formed in the core layer 13. 15 materials.
接著,於支撐基板951上塗佈核心層形成用組成物900以形成液狀被膜(參照圖4(a))。然後,將支撐基板951置於水平台上,對液狀被膜進行平坦化,並使溶媒蒸發(脫溶媒)。藉此得到層910(參照圖4(b))。Next, the core layer forming composition 900 is applied onto the support substrate 951 to form a liquid film (see FIG. 4( a )). Then, the support substrate 951 is placed on a water platform, the liquid film is planarized, and the solvent is evaporated (desolvent). Thereby, the layer 910 is obtained (refer to FIG. 4(b)).
於支撐基板951,係使用例如矽基板、二氧化矽基板、玻璃基板、聚對苯二甲酸乙二酯(PET)薄膜等。For the support substrate 951, for example, a tantalum substrate, a ceria substrate, a glass substrate, a polyethylene terephthalate (PET) film, or the like is used.
作為用於形成液狀被膜的塗佈法,可舉例如刮刀法、旋塗法、浸塗法、平台塗佈法、噴塗法、施加器法、淋幕式塗佈法、模塗法等之方法。Examples of the coating method for forming the liquid film include a doctor blade method, a spin coating method, a dip coating method, a stage coating method, a spray coating method, an applicator method, a curtain coating method, and a die coating method. method.
所得之層910中,聚合物(基質)915實質上為均一且無規地存在,添加劑920係於聚合物915中實質上呈均一且無規地分散著。藉此,於層910中,添加劑920實質上呈均一且無規地分散著。In the resulting layer 910, the polymer (matrix) 915 is substantially uniform and randomly present, and the additive 920 is substantially uniformly and randomly dispersed in the polymer 915. Thereby, in layer 910, additive 920 is substantially uniformly and randomly dispersed.
層910之平均厚度係視所應形成之核心層13之厚度而適當設定,並無特別限定,較佳為5~300μm左右,更佳10~200μm左右。The average thickness of the layer 910 is appropriately set depending on the thickness of the core layer 13 to be formed, and is not particularly limited, but is preferably about 5 to 300 μm, more preferably about 10 to 200 μm.
聚合物915係成為核心層13之基礎聚合物者。The polymer 915 is the base polymer of the core layer 13.
聚合物915中,適合使用透明性充分高(呈無色透明),且與後述單體具有相溶性者,進而,其中如後述般可使單體進行反應(聚合反應或交聯反應),於單體經聚合後仍具有充分透明性者。In the polymer 915, it is suitable to use a sufficiently high transparency (colorless and transparent) and to be compatible with a monomer to be described later, and further, a monomer can be reacted (polymerization reaction or crosslinking reaction) as described later. The body still has sufficient transparency after polymerization.
於此,所謂「具有相溶性」,係指單體至少混合,於核心層形成用組成物900中或層910中不致與聚合物915發生相分離。Here, the term "compatibility" means that at least the monomer is mixed, and the core layer forming composition 900 or the layer 910 does not cause phase separation with the polymer 915.
作為此種聚合物915,可舉例如降烯系樹脂或苯并環丁烯系樹脂等之環狀烯烴系樹脂,丙烯酸系樹脂、甲基丙烯酸系樹脂、聚碳酸酯、聚苯乙烯、環氧系樹脂、聚醯胺、聚醯亞胺、聚苯并唑、聚矽氧系樹脂、氟系樹脂等;可使用此等中之1種或將2種以上組合(聚合物合金、聚合物摻雜物(混合物)、共聚物等)使用。As such a polymer 915, for example, a drop can be mentioned. Cyclic olefin resin such as olefin resin or benzocyclobutene resin, acrylic resin, methacrylic resin, polycarbonate, polystyrene, epoxy resin, polyamine, polyimine Polyphenylene An azole, a polyoxynenoid resin, a fluorine-based resin, etc. can be used, and one type or the combination of two or more types (polymer alloy, polymer dopant (mixture), copolymer, etc.) can be used.
此等之中,特佳係以環狀烯烴系樹脂為主者。藉由使用環狀烯烴系樹脂作為聚合物915,則可得到具有優越光傳送性能或耐熱性的核心層13。Among these, the most preferred one is a cyclic olefin resin. By using a cyclic olefin resin as the polymer 915, the core layer 13 having superior light transmission performance or heat resistance can be obtained.
環狀烯烴系樹脂可為未取代者,亦可為使氫被其他基所取代者。The cyclic olefin resin may be unsubstituted or may be substituted with hydrogen.
作為環狀烯烴系樹脂,可舉例如降烯系樹脂、苯并環丁烯系樹脂等。As a cyclic olefin type resin, for example, it can be mentioned An olefin resin, a benzocyclobutene resin, or the like.
其中,由耐熱性、透明等觀點而言,較佳為使用降烯系樹脂。又,降烯系樹脂因具有較高之疏水性,故可得到不易產生因吸水所造成之尺寸改變等的核心層13。Among them, from the viewpoints of heat resistance, transparency, etc., it is preferred to use An olefinic resin. Again, drop Since the olefinic resin has high hydrophobicity, the core layer 13 which is less likely to cause dimensional change due to water absorption or the like can be obtained.
作為降烯系樹脂,可為具有單獨之重複單位者(均聚物)、具有2個以上降烯系重複單位者(共聚物)的任一種。As a drop The olefinic resin may have a single repeating unit (homopolymer) and have two or more drops. Any one of the olefinic repeat units (copolymers).
作為此種降烯系樹脂,可舉例如:As such a drop The olefinic resin may, for example, be:
(1)使降烯型單體進行加成(共)聚合而得之降烯型單體的加成(共)聚合物;(1) make a drop The addition of an ethylenic monomer to the (co)polymerization An addition (co)polymer of an olefinic monomer;
(2)降烯型單體與乙烯或α-烯烴類的加成共聚物;(2) drop An addition copolymer of an olefinic monomer with ethylene or an α-olefin;
(3)降烯型單體與非共軛二烯、及視需要之其他單體的加成共聚物般之加成聚合物;(3) drop An addition polymer of an olefinic monomer to an addition copolymer of a non-conjugated diene and, if desired, other monomers;
(4)降烯型單體之開環(共)聚合物,及視需要使該(共)聚合物氫化的樹脂;(4) drop a ring-opening (co)polymer of an olefinic monomer, and a resin which hydrogenates the (co)polymer as needed;
(5)降烯型單體與乙烯或α-烯烴類的開環(共)聚合物,及視需要使該(共)聚合物氫化的樹脂;(5) drop a ring-opening (co)polymer of an ethylenic monomer with ethylene or an α-olefin, and a resin which hydrogenates the (co)polymer as needed;
(6)降烯型單體與非共軛二烯或其他單體的開環共聚物,及視需要使該(共)聚合物氫化之樹脂等之開環聚合物。(6) drop A ring-opening copolymer of an ethylenic monomer and a non-conjugated diene or other monomer, and a ring-opening polymer such as a resin which hydrogenates the (co)polymer as needed.
作為此等聚合物,可舉例如無規共聚物、嵌段共聚物、交替共聚物等。As such a polymer, a random copolymer, a block copolymer, an alternating copolymer, etc. are mentioned, for example.
此等之降烯系樹脂,可藉由例如開環複分解聚合(ROMP)、ROMP與氫化反應之組合、以自由基或陽離子進行之聚合、使用了陽離子性鈀聚合起始劑的聚合、使用了其以外之聚合起始劑(例如鎳或其他過渡金屬之聚合起始劑)的聚合等公知之所有聚合方法而獲得。Such a drop The olefinic resin can be polymerized by a ring-opening metathesis polymerization (ROMP), a combination of ROMP and a hydrogenation reaction, a radical or a cation, a polymerization using a cationic palladium polymerization initiator, or a polymerization other than the polymerization. The polymerization of an initiator (for example, a polymerization initiator of nickel or another transition metal) is obtained by all known polymerization methods.
此等之中,作為降烯系樹脂,較佳為具有由下述構造式B所示之至少1個重複單位者,亦即加成(共)聚合物。加成(共)聚合物因富有透明性、耐熱性及可撓性,故例如於形成光導波路1後,對其經由焊焬安裝電氣零件等,即使在此種情況下,仍可對光導波路1賦予高耐熱性、亦即耐迴焊性。Among these, as a drop The olefinic resin preferably has at least one repeating unit represented by the following structural formula B, that is, an addition (co)polymer. Since the addition (co)polymer is transparent, heat-resistant, and flexible, for example, after the optical waveguide 1 is formed, an electric component or the like is attached via a soldering iron, and even in this case, the optical waveguide can be applied. 1 imparts high heat resistance, that is, resistance to reflow.
[化1][Chemical 1]
此種降烯系聚合物,例如可藉由使用後述之降烯系單體(由後述構造式C所示之降烯系單體或交聯性降烯系單體)而適當合成。Such a drop The olefinic polymer can be reduced, for example, by using the latter An olefinic monomer (decreased by the structural formula C described later) Ethyne monomer or crosslinkability The olefinic monomer is appropriately synthesized.
另外,在將光導波路1組裝至各種製品中時,有例如於80℃左右之環境下使用製品的情形。於此種情況下,由確保耐熱性之觀點而言,較佳為加成(共)聚合物。Further, when the optical waveguide 1 is assembled into various products, there is a case where the product is used, for example, in an environment of about 80 °C. In this case, an addition (co)polymer is preferred from the viewpoint of ensuring heat resistance.
其中,降烯系樹脂較佳係含有:具有含聚合性基之取代基的降烯的重複單位,或具有含芳基之取代基的降烯的重複單位。Among them, drop The olefinic resin preferably contains a lowering of a substituent having a polymerizable group. a repeating unit of an ene, or a lowering of a substituent having an aryl group Repeating unit of alkene.
作為具有含聚合性基之取代基的降烯之重複單位,較佳為具有含環氧基之取代基的降烯之重複單位、具有含(甲基)丙烯酸系基之取代基的降烯之重複單位、及具有含烷氧基矽烷基之取代基的降烯之重複單位中的至少一種。此等聚合性基,係於各種聚合性基中屬於反應性較高者,故較佳。As a substituent having a polymerizable group a repeating unit of an alkene, preferably having a substituent having an epoxy group a repeating unit of an alkene having a substituent having a (meth)acrylic group a repeating unit of an alkene, and a substituent having a substituent containing an alkoxyalkyl group At least one of the repeating units of the alkene. These polymerizable groups are preferred among various polymerizable groups because of their high reactivity.
另外,若使用含有二種以上之該種含有聚合性基的降烯之重複單位者,則可達到可撓性與耐熱性的兩立。In addition, if two or more kinds of such a polymerizable group are used, The repeating unit of the olefin can achieve both flexibility and heat resistance.
另一方面,藉由含有具有含芳基之取代基的降烯之重複單位,則因來自芳基的極高疏水性,而可更確實地防止因吸水所造成之尺寸改變等。On the other hand, by containing a substituent having an aryl group-containing substituent The repeating unit of the olefin is more surely prevented from being changed in size due to water absorption due to the extremely high hydrophobicity derived from the aryl group.
再者,降烯系樹脂較佳係含有烷基降烯之重複單位者。又,烷基可為直鏈狀或分支狀的任一種。Again, drop The olefinic resin preferably contains an alkyl group. Repeat unit of olefin. Further, the alkyl group may be either linear or branched.
藉由含有烷基降烯之重複單位,降烯系樹脂因柔軟性變高,故可賦予較高之可撓性。By containing an alkyl drop Repeating unit of alkene Since the olefinic resin has high flexibility, it can impart high flexibility.
另外,含有烷基降烯之重複單位的降烯系樹脂,由於對特定之波長區域(尤其是850nm附近之波長區域)之光的穿透率優越,故亦較佳。In addition, it contains an alkyl drop. Drop of repeating unit of alkene The olefinic resin is also preferable because it has excellent transmittance to light in a specific wavelength region (especially, a wavelength region in the vicinity of 850 nm).
作為上述含有降烯之重複單位的降烯系樹脂的具體例,可舉例如己基降烯之均聚物、苯基乙基降烯之均聚物、苄基降烯之均聚物、己基降烯與苯基乙基降烯的共聚物、己基降烯與苄基降烯的共聚物等。As the above contains Drop of repeating unit of alkene Specific examples of the olefinic resin include, for example, hexyl group Homopolymer, phenylethyl drop Homopolymer, benzyl group Homopolymer, hexyl group Alkene and phenylethyl group Copolymer of olefin, hexyl group Alkene and benzyl group a copolymer of an enelate or the like.
基於此種情形,作為降烯系樹脂,較佳為由以下式(1)~(4)、(8)~(10)所示者。Based on this situation, as a drop The olefinic resin is preferably represented by the following formulas (1) to (4) and (8) to (10).
[化2][Chemical 2]
(式(1)中,R1 表示碳數1~10之烷基,a表示0~3之整數,b表示1~3之整數,p1 /q1 為20以下。)(In the formula (1), R 1 represents an alkyl group having 1 to 10 carbon atoms, a represents an integer of 0 to 3, b represents an integer of 1 to 3, and p 1 /q 1 is 20 or less.)
式(1)之降烯系樹脂可如以下般進行製造。Drop of formula (1) The olefinic resin can be produced as follows.
將具有R1 之降烯、與於側鏈具有環氧基之降烯溶解於甲苯中,使用Ni化合物(A)作為觸媒進行溶液聚合,而得到(1)。Will have the fall of R 1 Alkene, and having an epoxy group in the side chain The olefin is dissolved in toluene, and solution polymerization is carried out using the Ni compound (A) as a catalyst to obtain (1).
[化3][Chemical 3]
尚且,於側鏈具有環氧基之降烯的製造方法,有如下述(i)、(ii)。Still, there is a drop in the epoxy chain in the side chain. The method for producing an alkene is as follows (i) and (ii).
使藉DCPD(二環戊二烯)之裂解所生成之CPD(環戊二烯)與α烯烴(CH2 =CH-CH2 -OH)於高溫高壓下進行反應。The CPD (cyclopentadiene) produced by the cleavage of DCPD (dicyclopentadiene) is reacted with an alpha olefin (CH 2 =CH-CH 2 -OH) under high temperature and high pressure.
[化4][Chemical 4]
藉由降烯甲醇與表氯醇之反應而生成。By descending It is formed by the reaction of alkene methanol with epichlorohydrin.
[化5][Chemical 5]
尚且,於式(1)中,在b為2或3時,係使用表氯醇之亞甲基成為伸乙基、伸丙基等者。Further, in the formula (1), when b is 2 or 3, the methylene group of epichlorohydrin is used as an ethyl group, a propyl group or the like.
式(1)所示之降烯系樹脂中,由可達到可撓性與耐熱性之兩立的觀點而言,特佳係R1 為碳數4~10之烷基、a及b分別為1之化合物,例如丁基降烯與甲基環氧丙基醚降烯的共聚物、己基降烯與甲基環氧丙基醚降烯的共聚物、癸基降烯與甲基環氧丙基醚降烯的共聚物等。Drop shown in equation (1) Alkenyl-based resin, and flexibility can be achieved by the coexistence of the viewpoint of heat resistance, particularly preferably a carbon-based R 1 is alkyl of 4 to 10, a and b, respectively, of compound 1, for example, drop-butyl Alkene and methyl epoxypropyl ether Copolymer of olefin, hexyl group Alkene and methyl epoxypropyl ether Copolymer of olefin Alkene and methyl epoxypropyl ether a copolymer of an enelate or the like.
[化6][Chemical 6]
(式(2)中,R2 表示碳數1~10之烷基,R3 表示氫原子或甲基,c表示0~3之整數,p2 /q2 為20以下。)(In the formula (2), R 2 represents an alkyl group having 1 to 10 carbon atoms, R 3 represents a hydrogen atom or a methyl group, c represents an integer of 0 to 3, and p 2 /q 2 is 20 or less.)
式(2)之降烯系樹脂可藉由使具有R2 之降烯、與於側鏈上具有丙烯酸系及甲基丙烯酸系基之降烯溶解於甲苯中,使用上述Ni化合物(A)作為觸媒進行溶液聚合而獲得。Drop of formula (2) The olefinic resin can be reduced by having R 2 Alkenes, and the presence of acrylic and methacrylic groups on the side chains The olefin is dissolved in toluene and obtained by solution polymerization using the above Ni compound (A) as a catalyst.
尚且,式(2)所示之降烯系樹脂中,由可撓性與耐熱性之兩立的觀點而言,特佳係R2 為碳數4~10之烷基、c為1的化合物,例如丁基降烯與丙烯酸2-(5-降烯基)甲基酯的共聚物、己基降烯與丙烯酸2-(5-降烯基)甲基酯的共聚物、癸基降烯與丙烯酸2-(5-降烯基)甲基酯的共聚物等。Still, the drop shown in equation (2) In the olefinic resin, from the viewpoint of flexibility and heat resistance, the particularly preferable R 2 is a compound having 4 to 10 carbon atoms and c is 1, for example, a butyl group. Alkene and acrylic acid 2-(5-lower Copolymer of alkenyl)methyl ester, hexyl group Alkene and acrylic acid 2-(5-lower Copolymer of alkenyl)methyl ester Alkene and acrylic acid 2-(5-lower A copolymer of an alkenyl)methyl ester or the like.
[化7][Chemistry 7]
(式(3)中,R4 表示碳數1~10之烷基,各X3 分別獨立表示碳數1~3之烷基,d表示0~3之整數,p3 /q3 為20以下。)(In the formula (3), R 4 represents an alkyl group having 1 to 10 carbon atoms, and each of X 3 independently represents an alkyl group having 1 to 3 carbon atoms, d represents an integer of 0 to 3, and p 3 /q 3 is 20 or less. .)
式(3)之樹脂可藉由使具有R4 之降烯、與於側鏈上具有烷基矽烷基之降烯溶解於甲苯中,於觸媒使用上述Ni化合物(A)進行溶液聚合而獲得。The resin of formula (3) can be reduced by having R 4 Alkene, with a drop in the alkyl chain on the side chain The olefin is dissolved in toluene and obtained by solution polymerization using the above-mentioned Ni compound (A) in a catalyst.
尚且,式(3)所示之降烯系聚合物中,特佳係R4 為碳數4~10之烷基、d為1或2、X3 為甲基或乙基的化合物,例如丁基降烯與降烯基乙基三甲氧基矽烷的共聚物、己基降烯與降烯基乙基三甲氧基矽烷的共聚物、癸基降烯與降烯基乙基三甲氧基矽烷的共聚物、丁基降烯與三乙氧基矽烷基降烯的共聚物、己基降烯與三乙氧基矽烷基降烯的共聚物、癸基降烯與三乙氧基矽烷基降烯的共聚物、丁基降烯與三甲氧基矽烷基降烯的共聚物、己基降烯與三甲氧基矽烷基降烯的共聚物、癸基降烯與三甲氧基矽烷基降烯的共聚物等。Still, the drop shown in equation (3) In the olefin polymer, the particularly preferred compound R 4 is a compound having 4 to 10 carbon atoms, d is 1 or 2, and X 3 is a methyl group or an ethyl group, such as a butyl group. Alkene Copolymer of alkenylethyltrimethoxydecane, hexyl group Alkene Copolymer of alkenylethyltrimethoxydecane Alkene Copolymer of alkenylethyltrimethoxydecane, butyl drop Alkene and triethoxynonanyl Copolymer of olefin, hexyl group Alkene and triethoxynonanyl Copolymer of olefin Alkene and triethoxynonanyl Copolymer of olefin, butyl drop Alkene and trimethoxydecyl drop Copolymer of olefin, hexyl group Alkene and trimethoxydecyl drop Copolymer of olefin Alkene and trimethoxydecyl drop a copolymer of an enelate or the like.
[化8][化8]
(式(4)中,R5 表示碳數1~10之烷基,A1 及A2 分別獨立表示下式(5)~(7)所示之取代基,但不同時為相同取代基。又,p4 /q4 +r為20以下。)(In the formula (4), R 5 represents an alkyl group having 1 to 10 carbon atoms, and A 1 and A 2 each independently represent a substituent represented by the following formulas (5) to (7), but are not the same substituent at the same time. Further, p 4 /q 4 +r is 20 or less.)
式(4)之樹脂可藉由將具有R5 之降烯、與於側鏈具有A1 及A2 之降烯溶解於甲苯中,於觸媒使用Ni化合物(A)進行溶解聚合而獲得。The resin of formula (4) can be reduced by having R 5 Alkene, and the side chain has a drop of A 1 and A 2 The olefin is dissolved in toluene and obtained by solution polymerization using a Ni compound (A) in a catalyst.
[化9][Chemistry 9]
(式(5)中,e表示0~3之整數,f表示1~3之整數。)(In the formula (5), e represents an integer from 0 to 3, and f represents an integer from 1 to 3.)
[化10][化10]
(式(6)中,R6 表示氫原子或甲基,g表示0~3之整數。)(In the formula (6), R 6 represents a hydrogen atom or a methyl group, and g represents an integer of 0 to 3.)
[化11][11]
(式(7)中,X4 分別獨立表示碳數1~3之烷基,h表示0~3之整數。)(In the formula (7), X 4 each independently represents an alkyl group having 1 to 3 carbon atoms, and h represents an integer of 0 to 3.)
尚且,作為式(4)所示之降烯系樹脂,可舉例如丁基降烯、己基降烯或癸基降烯的任一者,丙烯酸2-(5-降烯基)甲基酯與降烯基乙基三甲氧基矽烷與三乙氧基矽烷基降烯或三甲氧基矽烷基降烯之任一者的三共聚物,丁基降烯、己基降烯或癸基降烯之任一者與丙烯酸2-(5-降烯基)甲基酯與甲基環氧丙基醚降烯的三共聚物,丁基降烯、己基降烯或癸基降烯之任一者與甲基環氧丙基醚降烯、降烯基乙基三甲氧基矽烷、三乙氧基矽烷基降烯或三甲氧基矽烷基降烯之任一者的三共聚物等。Still, as shown in equation (4) The olefinic resin may, for example, be a butyl group. Alkene Alkene or sulfhydryl group Ethylene, either 2-(5-lower) Alkenyl)methyl ester Alkenylethyltrimethoxydecane and triethoxynonanyl Alkene or trimethoxydecyl drop a tri-copolymer of either of the olefins, a butyl group Alkene Alkene or sulfhydryl group Ethylene or 2-(5-lower) Alkenyl)methyl ester with methyl epoxypropyl ether Triene of olefin, butyl drop Alkene Alkene or sulfhydryl group Ethylene or methyl epoxy propyl ether Alkene Alkenylethyltrimethoxydecane, triethoxynonanyl Alkene or trimethoxydecyl drop a tri-copolymer or the like of any of the alkenes.
[化12][化12]
(式(8)中,R7 表示碳數1~10之烷基,R8 表示氫原子、甲基或乙基,Ar表示芳基,X1 表示氧原子或亞甲基,X2 表示碳原子或矽原子,i表示0~3之整數,j表示1~3之整數,p5 /q5 為20以下。)(In the formula (8), R 7 represents an alkyl group having 1 to 10 carbon atoms, R 8 represents a hydrogen atom, a methyl group or an ethyl group, Ar represents an aryl group, X 1 represents an oxygen atom or a methylene group, and X 2 represents carbon. An atom or a helium atom, i represents an integer from 0 to 3, j represents an integer from 1 to 3, and p 5 /q 5 is 20 or less.)
式(8)之樹脂可藉由將具有R7 之降烯、與於側鏈含有-(CH2 )-X1 -X2 (R8 )3-j (Ar)j 之降烯溶解於甲苯中,於觸媒使用Ni化合物進行溶液聚合而獲得。The resin of formula (8) can be reduced by having R 7 The olefin and the side chain contain -(CH 2 )-X 1 -X 2 (R 8 ) 3-j (Ar) j The olefin is dissolved in toluene and obtained by solution polymerization using a Ni compound on a catalyst.
尚且,式(8)所示之降烯系樹脂中,較佳係X1 為氧原子、X2 為矽原子、Ar為苯基者。Still, the drop shown in equation (8) In the olefin resin, X 1 is an oxygen atom, X 2 is a ruthenium atom, and Ar is a phenyl group.
再者,由可撓性、耐熱性及折射率控制的觀點而言,特佳係R7 為碳數4~10之烷基、X1 為氧原子、X2 為矽原子、Ar為苯基、R8 為甲基、i為1、j為2的化合物,例如丁基降烯與二苯基甲基降烯甲氧基矽烷的共聚物、己基降烯與二苯基甲基降烯甲氧基矽烷的共聚物、癸基降烯與二苯基甲基降烯甲氧基矽烷的共聚物等。Further, from the viewpoint of flexibility, heat resistance and refractive index control, particularly preferred R 7 is an alkyl group having 4 to 10 carbon atoms, X 1 is an oxygen atom, X 2 is a halogen atom, and Ar is a phenyl group. a compound wherein R 8 is a methyl group, i is 1, and j is 2, such as a butyl group. Alkene and diphenylmethyl group Copolymer of olefinic decane, hexyl group Alkene and diphenylmethyl group Copolymer of methoxy methoxy decane Alkene and diphenylmethyl group a copolymer of olefinic decane or the like.
具體而言,較佳係使用以下般之降烯系樹脂。Specifically, it is preferred to use the following An olefinic resin.
[化13][Chemistry 13]
(式(9)中之R7 、p5 、q5 、i係與式(8)相同。)(R 7 , p 5 , q 5 , and i in the formula (9) are the same as the formula (8).)
另外,由可撓性與耐熱性及折射率控制的觀點而言,可為式(8)中R7 為碳數4~10之烷基、X1 為亞甲基、X2 為碳原子、Ar為苯基、R8 為氫原子、i為0、j為1的化合物,例如丁基降烯與苯基乙基降烯的共聚物、己基降烯與苯基乙基降烯的共聚物、癸基降烯與苯基乙基降烯的共聚物等。Further, from the viewpoint of flexibility, heat resistance and refractive index control, R 7 in the formula (8) may be an alkyl group having 4 to 10 carbon atoms, X 1 being a methylene group, and X 2 being a carbon atom. Ar is a phenyl group, R 8 is a hydrogen atom, i is 0, and j is 1, such as a butyl group. Alkene and phenylethyl group Copolymer of olefin, hexyl group Alkene and phenylethyl group Copolymer of olefin Alkene and phenylethyl group a copolymer of an enelate or the like.
再者,作為降烯系樹脂,亦可使用下述者。Again, as a drop As the olefin resin, the following may also be used.
[化14][Chemistry 14]
(式(10)中,R10 表示碳數1~10之烷基,R11 表示芳基,k為0以上且4以下。p6 /q6 為20以下。)(In the formula (10), R 10 represents an alkyl group having 1 to 10 carbon atoms, R 11 represents an aryl group, and k is 0 or more and 4 or less. p 6 /q 6 is 20 or less.)
另外,只要p1 /q1 ~p3 /q3 、p5 /q5 、p6 /q6 或p4 /q4 +r為20以下即可,較佳為15以下,更佳為0.1~10左右。藉此,含有複數種之降烯之重複單位的效果可有效發揮。Further, as long as p 1 /q 1 to p 3 /q 3 , p 5 /q 5 , p 6 /q 6 or p 4 /q 4 +r is 20 or less, it is preferably 15 or less, more preferably 0.1. ~10 or so. In this way, it contains a plurality of species The effect of the repeating unit of the olefin can be effectively exerted.
另一方面,聚合物915可如上述般為丙烯酸系樹脂、甲基丙烯酸系樹脂、環氧系樹脂、聚醯亞胺、聚矽氧系樹脂、氟系樹脂等。On the other hand, the polymer 915 can be an acrylic resin, a methacrylic resin, an epoxy resin, a polyimide, a polyoxymethylene resin, a fluorine resin or the like as described above.
其中,作為丙烯酸系樹脂及甲基丙烯酸系樹脂,可舉例如聚(甲基丙烯酸酯)、聚(甲基丙烯酸甲酯)、聚(丙烯酸環氧基酯)、聚(甲基丙烯酸環氧基酯)、聚(丙烯酸胺基酯)、聚(甲基丙烯酸胺基酯)、聚丙烯酸、聚甲基丙烯酸、聚(異氰酸酯丙烯酸酯)、聚(異氰酸酯甲基丙烯酸酯)、聚(氰酸酯丙烯酸酯)、聚(氰酸酯甲基丙烯酸酯)、聚(硫環氧基丙烯酸酯)、聚(硫環氧基甲基丙烯酸酯)、聚(丙烯酸烯丙基酯)、聚(甲基丙烯酸烯丙基酯)、丙烯酸酯-環氧基丙烯酸酯共聚物(甲基丙烯酸甲酯與甲基丙烯酸環氧丙基酯的共聚物)、苯乙烯-環氧基丙烯酸酯共聚物等;此等可使用1種或2種以上之複合材料。In addition, examples of the acrylic resin and the methacrylic resin include poly(methacrylate), poly(methyl methacrylate), poly(epoxy acrylate), and poly(methacrylic acid epoxy). Ester), poly(amino acrylate), poly(amino methacrylate), polyacrylic acid, polymethacrylic acid, poly(isocyanate acrylate), poly(isocyanate methacrylate), poly(cyanate) Acrylate), poly(cyanate methacrylate), poly(thioepoxy acrylate), poly(thioepoxy methacrylate), poly(allyl acrylate), poly(methyl) Allyl acrylate), acrylate-epoxy acrylate copolymer (copolymer of methyl methacrylate and glycidyl methacrylate), styrene-epoxy acrylate copolymer, etc.; One or two or more composite materials may be used.
另外,作為環氧系樹脂,可舉例如脂環式環氧樹脂、雙酚A型環氧樹脂、雙酚F型環氧樹脂、雙酚S型環氧樹脂、具有聯苯骨架之聯苯型環氧樹脂、含有萘環之環氧樹脂、具有二環戊二烯骨架之二環戊二烯型環氧樹脂、酚酚醛清漆型環氧樹脂、甲酚酚醛清漆型環氧樹脂、三苯基甲烷型環氧樹脂、三苯基甲烷型環氧樹脂、脂肪族系環氧樹脂及三環氧丙基三聚異氰酸酯等;此等可使用1種或2種以上的複合材料。Further, examples of the epoxy resin include an alicyclic epoxy resin, a bisphenol A epoxy resin, a bisphenol F epoxy resin, a bisphenol S epoxy resin, and a biphenyl type having a biphenyl skeleton. Epoxy resin, epoxy resin containing naphthalene ring, dicyclopentadiene type epoxy resin having dicyclopentadiene skeleton, phenol novolak type epoxy resin, cresol novolak type epoxy resin, triphenyl A methane type epoxy resin, a triphenylmethane type epoxy resin, an aliphatic type epoxy resin, and a triepoxypropyl trimeric isocyanate; these may use one or more types of composite materials.
另外,作為聚醯亞胺,若為藉由使屬於聚醯亞胺樹脂前驅物之聚醯胺酸閉環,使其硬化(醯亞胺化)而得的樹脂,並無特別限定。In addition, the polyimine is not particularly limited as long as it is obtained by ring-closing and polyacrylamide of a polyamidene resin precursor which is a precursor of a polyimide resin.
作為聚醯胺酸,可藉由例如於N,N-二甲基乙醯胺中,使四羧酸二酐與二胺依等莫耳比進行反應,作為溶液而獲得。The polyamic acid can be obtained as a solution by reacting a tetracarboxylic dianhydride with a diamine in a molar ratio, for example, in N,N-dimethylacetamide.
其中,作為四羧酸二酐,可舉例如苯均四酸二酐、3,3’,4,4’-聯苯基四羧酸二酐、2,2-雙(2,3-二羧基苯基)-1,1,1,3,3,3-六氟丙烷二酐、2,2-雙(3,4-二羧基苯基)-1,1,1,3,3,3-六氟丙烷二酐、3,3’,4,4’-二苯基酮四羧酸二酐、雙(3,4-二羧基苯基)醚二酐、雙(3,4-二羧基苯基)磺酸二酐等。Among them, examples of the tetracarboxylic dianhydride include pyromellitic dianhydride, 3,3',4,4'-biphenyltetracarboxylic dianhydride, and 2,2-bis(2,3-dicarboxyl group). Phenyl)-1,1,1,3,3,3-hexafluoropropane dianhydride, 2,2-bis(3,4-dicarboxyphenyl)-1,1,1,3,3,3- Hexafluoropropane dianhydride, 3,3',4,4'-diphenyl ketone tetracarboxylic dianhydride, bis(3,4-dicarboxyphenyl)ether dianhydride, bis(3,4-dicarboxybenzene) Base) sulfonic acid dianhydride and the like.
另一方面,作為二胺,可舉例如間苯二胺、對苯二胺、3,4’-二胺基二苯基醚、4,4’-二胺基二苯基醚、4,4’-二胺基二苯基碸、3,3’-二胺基二苯基碸、2,2-雙(4-胺基苯氧基苯基)丙烷、2,2-雙(4-胺基苯氧基苯基)六氟丙烷、1,3-雙(4-胺基苯氧基)苯、1,4-雙(4-胺基苯氧基)苯、2,4-二胺基甲苯、2,6-二胺基甲苯、二胺基二苯基甲烷、4,4’-二胺基-2,2-二甲基聯苯、2,2-雙(三氟甲基)-4,4’-二胺基聯苯等。On the other hand, examples of the diamine include m-phenylenediamine, p-phenylenediamine, 3,4'-diaminodiphenyl ether, 4,4'-diaminodiphenyl ether, and 4,4. '-Diaminodiphenyl hydrazine, 3,3'-diaminodiphenyl hydrazine, 2,2-bis(4-aminophenoxyphenyl)propane, 2,2-bis(4-amine Phenoxyphenyl)hexafluoropropane, 1,3-bis(4-aminophenoxy)benzene, 1,4-bis(4-aminophenoxy)benzene, 2,4-diamine Toluene, 2,6-diaminotoluene, diaminodiphenylmethane, 4,4'-diamino-2,2-dimethylbiphenyl, 2,2-bis(trifluoromethyl)- 4,4'-diaminobiphenyl and the like.
另外,作為聚矽氧系樹脂,可舉例如聚矽氧橡膠、聚矽氧彈性體。此等之聚矽氧系樹脂可藉由使聚矽氧橡膠單體或寡聚物與硬化劑進行反應而獲得。Further, examples of the polyoxymethylene resin include a polyoxymethylene rubber and a polyoxyxene elastomer. These polyoxygenated resins can be obtained by reacting a polyoxyxylene rubber monomer or oligomer with a hardener.
作為聚矽氧橡膠單體或寡聚物,可舉例如含有甲基矽氧烷基、乙基矽氧烷基、苯基矽氧烷基者。The polyoxyxylene rubber monomer or oligomer may, for example, be a methyl sulfoxyalkyl group, an ethyl sulfoxyalkyl group or a phenyl fluorenyl group.
另外,作為聚矽氧橡膠單體或寡聚物,由於賦予光反應性,故較佳為使用例如導入環氧基、乙烯基醚基、丙烯酸系基等之官能基而成者。In addition, as the polyoxyxene rubber monomer or oligomer, since photoreactivity is imparted, it is preferred to use, for example, a functional group such as an epoxy group, a vinyl ether group or an acrylic group.
另外,作為氟系樹脂,可舉例如由具有含氟脂肪族環構造之單體所得的聚合物、使具有2個以上聚合性不飽和鍵之含氟單體進行環化聚合而得的聚合物、使含氟系單體與自由基聚合性單體進行共聚合而得的聚合物等。In addition, examples of the fluorine-based resin include a polymer obtained from a monomer having a fluorine-containing aliphatic ring structure, and a polymer obtained by subjecting a fluorine-containing monomer having two or more polymerizable unsaturated bonds to cyclopolymerization. A polymer obtained by copolymerizing a fluorine-containing monomer and a radical polymerizable monomer.
作為含氟脂肪族環構造,可舉例如全氟(2,2-二甲基-1,3-二唑)、全氟(4-甲基-1,3-二唑)、全氟(4-甲氧基-1,3-二唑)等。As the fluorine-containing aliphatic ring structure, for example, perfluoro(2,2-dimethyl-1,3-di) Oxazole), perfluoro(4-methyl-1,3-di Oxazole), perfluoro(4-methoxy-1,3-di Oxazole) and the like.
另外,作為含氟單體,可舉例如全氟(烯丙基乙烯基醚)、全氟(丁烯基乙烯基醚)等。Further, examples of the fluorine-containing monomer include perfluoro(allyl vinyl ether) and perfluoro(butenyl vinyl ether).
另外,作為自由基聚合性單體,可舉例如四氟乙烯、氯三氟乙烯、全氟(甲基乙烯基醚)等。Further, examples of the radical polymerizable monomer include tetrafluoroethylene, chlorotrifluoroethylene, and perfluoro(methyl vinyl ether).
尚且,核心層13之各部的折射率,由於係配合各部之聚合物915之折射率與單體之折射率之相對性大小關係與其存在比率而決定,故亦可配合所使用之單體種類而適當調整聚合物915之折射率。Further, since the refractive index of each portion of the core layer 13 is determined by the relationship between the refractive index of the polymer 915 of each portion and the refractive index of the monomer and the ratio of the existence of the monomer, it is also possible to match the type of the monomer used. The refractive index of the polymer 915 is appropriately adjusted.
例如,為了得到具有較高折射率之聚合物915,一般選擇於分子構造中具有芳香族環(芳香族基)、氮原子、溴原子或氯原子的單體,使聚合物915合成(聚合)。另一方面,為了得到具有較低折射率之聚合物915,一般選擇於分子構造中具有烷基、氟原子或醚構造(醚基)的單體,使聚合物915合成(聚合)。For example, in order to obtain a polymer 915 having a higher refractive index, a monomer having an aromatic ring (aromatic group), a nitrogen atom, a bromine atom or a chlorine atom in a molecular structure is generally selected to synthesize (polymerize) the polymer 915. . On the other hand, in order to obtain a polymer 915 having a lower refractive index, a monomer having an alkyl group, a fluorine atom or an ether structure (ether group) in a molecular configuration is generally selected, and the polymer 915 is synthesized (polymerized).
作為具有較高折射率之降烯系樹脂,較佳為含有芳烷基降烯之重複單位者。此種降烯系樹脂具有特別高的折射率。As a lower refractive index An olefinic resin, preferably containing an aralkyl group Repeat unit of olefin. Such a drop The olefinic resin has a particularly high refractive index.
作為芳烷基降烯之重複單位所具有之芳烷基(芳基烷基),可舉例如苄基、苯基乙基、苯基丙基、苯基丁基、萘基乙基、萘基丙基、茀基乙基、茀基丙基等;特佳為苄基或苯基乙基。具有此種重複單位之降烯系樹脂,因具有極高折射率故較佳。As an aralkyl group The aralkyl group (arylalkyl group) of the repeating unit of the alkene may, for example, be a benzyl group, a phenylethyl group, a phenylpropyl group, a phenylbutyl group, a naphthylethyl group, a naphthylpropyl group or a fluorenyl group. Ethyl, decylpropyl and the like; particularly preferably benzyl or phenylethyl. With such a repeating unit The olefinic resin is preferred because it has an extremely high refractive index.
另外,以上述般之聚合物915較佳係具有由主鏈分支出,藉活性放射線之照射,可使其分子構造之至少一部分由主鏈脫離的脫離性基(脫離性側鏈)者。由於因脫離性基之脫離而聚合物915之折射率降低,故聚合物915可藉活性放射線之照射的有無而形成折射率差。Further, the polymer 915 as described above preferably has a debonding group (debondable side chain) which is branched from the main chain and can be detached from the main chain by at least a part of the molecular structure by irradiation with actinic radiation. Since the refractive index of the polymer 915 is lowered due to the detachment of the debonding group, the polymer 915 can form a refractive index difference by the presence or absence of irradiation with actinic radiation.
作為此種具有脫離性基之聚合物915,可舉例如於分子構造中具有-O-構造、-Si-芳基構造及-O-Si-構造中之至少1個者。此種脫離性基可藉陽離子作用而較容易脫離。The polymer 915 having such a debonding group may, for example, have at least one of a -O- structure, a -Si-aryl structure, and an -O-Si- structure in a molecular structure. Such a debonding group can be more easily detached by the action of a cation.
其中,作為藉脫離而使樹脂折射率降低的離脫性基,較佳為-Si-二苯基構造及-O-Si-二苯基構造的至少一者。Among them, the leaving group which lowers the refractive index of the resin by the detachment is preferably at least one of a -Si-diphenyl structure and a -O-Si-diphenyl structure.
於此,作為於側鏈具有脫離性基之聚合物915,可舉例如環己烯、環辛烯等之單環體單體的聚合物,降烯、降二烯、二環戊二烯、二氫二環戊二烯、四環十二烯、三環戊二烯、二氫三環戊二烯、四環戊二烯、二氫四環戊二烯等之多環體單體之聚合物等的環狀烯烴系樹脂。此等之中,較佳係使用由多環體單體之聚合物中選出之1種以上之環狀烯烴系樹脂。藉此,可提升樹脂之耐熱性。Here, as the polymer 915 having a debonding group in the side chain, a polymer of a monocyclic monomer such as cyclohexene or cyclooctene may be mentioned. Alkene Diene, dicyclopentadiene, dihydrodicyclopentadiene, tetracyclododecene, tricyclopentadiene, dihydrotricyclopentadiene, tetracyclopentadiene, dihydrotetracyclopentadiene A cyclic olefin-based resin such as a polymer of a polycyclic monomer. Among these, it is preferred to use one or more kinds of cyclic olefin-based resins selected from the polymers of the polycyclic monomer. Thereby, the heat resistance of the resin can be improved.
尚且,作為聚合形態,可應用無規聚合、嵌段聚合等之公知形態。作為例如降烯型單體之聚合的具體例,有如降烯型單體之(共)聚合物、降烯型單體與α-烯烴類等之可進行共聚合之其他單體的共聚物、及此等共聚物的氫化物等。此等環狀烯烴系樹脂可藉公知聚合法進行製造,該聚合方法中有如加成聚合法與開環聚合法,上述之中較佳為由加成聚合法所得的環狀烯烴系樹脂(尤其是降烯系樹脂)(亦即,降烯系化合物之加成聚合物)。藉此,透明性、耐熱性及可撓性優越。Further, as the polymerization form, a known form such as random polymerization or block polymerization can be applied. As for example A specific example of the polymerization of an ethylenic monomer is as follows. (co)polymer of olefinic monomer A copolymer of an ethylenic monomer and another monomer which can be copolymerized, such as an α-olefin, and a hydride of such a copolymer. These cyclic olefin-based resins can be produced by a known polymerization method, such as an addition polymerization method and a ring-opening polymerization method, and among the above, a cyclic olefin resin obtained by an addition polymerization method is preferable (especially Is descending Ethylene resin) (ie, drop Addition polymer of an olefinic compound). Thereby, transparency, heat resistance and flexibility are excellent.
再者,作為於側鏈具有脫離性基之降烯系樹脂,可舉例如於式(8)所示之降烯系樹脂中,X1 為氧原子、X2 為矽原子、Ar為苯基者。Furthermore, as the side chain has a detachment basis The olefinic resin may, for example, be as shown in the formula (8). In the olefin resin, X 1 is an oxygen atom, X 2 is a ruthenium atom, and Ar is a phenyl group.
另外,式(3)中,有於烷氧基矽烷基之Si-O-X3 之部分發生脫離的情形。Further, in the formula (3), a part of the Si-OX 3 of the alkoxyalkyl group is detached.
另外,推測例如在使用式(9)之降烯系樹脂時,因為由光酸產生劑(表記為PAG)所產生之酸,而如以下般進行反應。又,於此僅表示了脫離性基之一部分,又,以i=1的情況進行說明。In addition, it is speculated, for example, that the drop in the formula (9) is used. In the case of the olefinic resin, the reaction is carried out as follows because of the acid generated by the photoacid generator (hereinafter referred to as PAG). Here, only one part of the detachment base is shown here, and the case where i=1 is also demonstrated.
[化15][化15]
再者,除了式(9)之構造以外,亦可為於側鏈具有環氧基者。藉由使用此種物,則具有可對包覆層11、12或基材形成密黏性優越的核心層13的效果。Further, in addition to the structure of the formula (9), those having an epoxy group in the side chain may be used. By using such an object, it is possible to form the core layer 13 which is excellent in adhesion to the coating layers 11, 12 or the substrate.
可列舉以下者作為具體例。The following are mentioned as a specific example.
[化16][Chemistry 16]
(式(31)中,p7 /q7 +r2 為20以下。)(In the formula (31), p 7 /q 7 +r 2 is 20 or less.)
式(31)所示之化合物,可藉由例如使己基降烯、與二苯基甲基降烯甲氧基矽烷(於側鏈含有-CH2 -O-Si(CH3 )(Ph)2 之降烯)及環氧基降烯溶解於甲苯中,於觸媒使用Ni化合物進行溶液聚合而獲得。a compound represented by the formula (31), which can be reduced, for example, by a hexyl group Alkene and diphenylmethyl group Ethylenoxane (containing -CH 2 -O-Si(CH 3 )(Ph) 2 in the side chain Alkene and epoxy group The olefin is dissolved in toluene and obtained by solution polymerization using a Ni compound on a catalyst.
另一方面,作為其他之脫離性基,可舉例如於末端具有苯乙酮構造之取代基。此脫離性基係藉自由基作用而較容易脫離。On the other hand, as another dissociative group, for example, a substituent having an acetophenone structure at the terminal end may be mentioned. This detachable base is more easily detached by the action of free radicals.
上述脫離性基之含量並無特別限定,較佳係上述於側鏈具有脫離性基之聚合物915中的10~80重量%,特佳20~60重量%。若含量為上述範圍內,則可特別優越地兼顧可撓性與折射率調制機能(使折射率差改變的效果)。The content of the above-mentioned release group is not particularly limited, but is preferably 10 to 80% by weight, particularly preferably 20 to 60% by weight, based on the polymer 915 having a leaving group in the side chain. When the content is within the above range, the flexibility and the refractive index modulation function (the effect of changing the refractive index difference) can be particularly advantageously achieved.
例如,可藉由增加脫離性基含量,使折射率改變的寬度擴張。For example, the width of the refractive index change can be expanded by increasing the detachment group content.
(添加劑)(additive)
添加劑920係含有單體及聚合起始劑。The additive 920 contains a monomer and a polymerization initiator.
((單體))((monomer))
單體係藉由後述之活性放射線照射,於活性放射線之照射區域進行反應而形成反應物,隨此單體進行擴散移動,藉此可於層910中在照射區域與未照射區域之間產生折射率差的化合物。The single system is reacted in the irradiation region of the actinic radiation by the active radiation described later to form a reactant, and the monomer is diffused and moved, whereby the layer 910 can be refracted between the irradiated region and the unirradiated region. The compound with a poor rate.
作為單體之反應物,可舉例如單體於聚合物915中進行聚合而形成之聚合物、單體於聚合物915中彼此交聯而成之交聯構造、及單體於聚合物915中進行聚合而由聚合物915分支出之分支構造中的至少一者。The reactant of the monomer may, for example, be a polymer formed by polymerizing a monomer in the polymer 915, a crosslinked structure in which the monomers are crosslinked in the polymer 915, and a monomer in the polymer 915. At least one of the branched structures branched by the polymer 915 is polymerized.
然而,於照射區域與未照射區域之間所產生之折射率差,係根據聚合物915之折射率與單體之折射率的差而產生,故添加劑920中所含之單體係考慮與聚合物915之折射率間之大小關係而予以選擇。However, the difference in refractive index between the irradiated region and the unirradiated region is caused by the difference between the refractive index of the polymer 915 and the refractive index of the monomer, so the single system consideration and polymerization contained in the additive 920 The magnitude relationship between the refractive indices of the objects 915 is selected.
具體而言,層910中,在照射區域之折射率最好變高的情況,係組合使用具有較低折射率之聚合物915、與具有相對此聚合物915為較高之折射率的單體。另一方面,在照射區域之折射率最好變低的情況,係組合使用具有較高折射率之聚合物915、與具有相對此聚合物915為較低之折射率的單體。Specifically, in the layer 910, in the case where the refractive index of the irradiation region is preferably high, a polymer 915 having a lower refractive index and a monomer having a higher refractive index relative to the polymer 915 are used in combination. . On the other hand, in the case where the refractive index of the irradiation region is preferably lowered, a polymer 915 having a higher refractive index and a monomer having a lower refractive index relative to the polymer 915 are used in combination.
尚且,所謂折射率「高」或「低」,並非指折射率之絕對值,而是指與某材料彼此間的相對關係。In addition, the "high" or "low" refractive index does not mean the absolute value of the refractive index, but refers to the relative relationship between a certain material and a certain material.
而且,藉由單體之反應(反應物之生成),在層910中照射區域之折射率降低時,該部分形成折射率分佈W之極小值;在照射區域之折射率上昇時,該部分構成折射率分佈之極大值。Further, by the reaction of the monomer (reaction of the reactant), when the refractive index of the irradiation region in the layer 910 is lowered, the portion forms a minimum value of the refractive index distribution W; when the refractive index of the irradiation region rises, the portion constitutes The maximum value of the refractive index distribution.
尚且,作為單體,較佳係使用與聚合物915具有相溶性,與聚合物915之間的折射率差為0.01以上者。Further, as the monomer, it is preferred to use a compatibility with the polymer 915 and a difference in refractive index from the polymer 915 of 0.01 or more.
作為此種單體,只要為具有可聚合之部分的化合物即可,並無特別限定,可舉例如降烯系單體、丙烯酸(甲基丙烯酸)系單體、環氧系單體、氧雜環丁烷系單體、乙烯基醚系單體、苯乙烯系單體等,此等可使用1種或組合2種以上使用。The monomer is not particularly limited as long as it is a polymerizable moiety, and may be, for example, reduced. An olefinic monomer, an acrylic acid (methacrylic acid) monomer, an epoxy monomer, an oxetane monomer, a vinyl ether monomer, a styrene monomer, etc., one of which can be used. Use two or more types in combination.
此等之中,作為單體,較佳係使用具有氧雜環丁基或環氧基等之環狀醚基的單體或寡聚物,或降烯系單體。藉由使用具有環狀醚基之單體或寡聚物,由於容易發生環狀醚基之開環,故可得到能迅速反應的單體。又,藉由使用降烯系單體,可得到光傳送性能優越、且耐熱性及柔軟性優越的核心層13(光導波路1)。Among these, as the monomer, a monomer or oligomer having a cyclic ether group such as an oxetanyl group or an epoxy group is preferably used, or An olefinic monomer. By using a monomer or oligomer having a cyclic ether group, since ring opening of a cyclic ether group is likely to occur, a monomer which can react rapidly can be obtained. Again, by using the drop The olefinic monomer can provide the core layer 13 (optical waveguide 1) having excellent light transmission performance and excellent heat resistance and flexibility.
其中,具有環狀醚基之單體的分子量(重量平均分子量)或寡聚物的分子量(重量平均分子量),係分別較佳為100以上且400以下。The molecular weight (weight average molecular weight) of the monomer having a cyclic ether group or the molecular weight (weight average molecular weight) of the oligomer is preferably 100 or more and 400 or less, respectively.
作為具有氧雜環丁基之單體、具有氧雜環丁基之寡聚物,較佳為選自下式(11)~(20)之群者。藉由使用此等,則有於波長850nm附近的透明性優越、可兼顧可撓性與耐熱性的優點。又,此等可單獨或混合使用。The oligomer having an oxetanyl group and an oxetanyl group is preferably selected from the group consisting of the following formulas (11) to (20). By using these, the transparency in the vicinity of the wavelength of 850 nm is excellent, and the flexibility and heat resistance can be achieved. Also, these can be used singly or in combination.
[化17][化17]
[化18][化18]
[化19][Chemistry 19]
[化20][Chemistry 20]
[化21][Chem. 21]
[化22][化22]
[化23][化23]
[化24][Chem. 24]
(式(18)中,n為0以上、3以下。)(In the formula (18), n is 0 or more and 3 or less.)
[化25][化25]
[化26][Chem. 26]
如以上之單體及寡聚物中,由確保與聚合物915間之折射率差的觀點而言,較佳為使用由(13)、(15)、(16)、(17)、(20)所示之化合物。In the above monomers and oligomers, from the viewpoint of ensuring a difference in refractive index with the polymer 915, it is preferred to use (13), (15), (16), (17), (20). ) the compound shown.
再者,若考慮與聚合物915之樹脂間的折射率差、分子量小、單體之運動性高、單體不易揮發的觀點,特佳為使用式(20)、式(15)所示之化合物。Further, in view of the difference in refractive index between the resin of the polymer 915, the small molecular weight, the high mobility of the monomer, and the fact that the monomer is not easily volatilized, it is particularly preferable to use the formula (20) and the formula (15). Compound.
另外,作為具有氧雜環丁基之化合物,可使用以下式(32)、式(33)所示之化合物。作為式(32)所示之化合物,可使用東亞合成製之商品名TESOX等;作為式(33)所示之化合物,可使用東亞合成製之商品名OX-SQ等。Further, as the compound having an oxetanyl group, a compound represented by the following formula (32) or formula (33) can be used. As the compound represented by the formula (32), a trade name TESOX or the like can be used, and a compound represented by the formula (33) can be used, and a trade name of OX-SQ or the like can be used.
[化27][化27]
[化28][化28]
(式(33)中,n為1或2。)(In the formula (33), n is 1 or 2.)
另外,作為具有環氧基之單體、具有環氧基之寡聚物,可舉例如以下者。該具有環氧基之單體、寡聚物,係於酸存在下藉開環進行聚合者。Further, examples of the monomer having an epoxy group and the oligomer having an epoxy group include the following. The monomer or oligomer having an epoxy group is polymerized by ring opening in the presence of an acid.
作為具有環氧基之單體、具有環氧基之寡聚物,可使用下式(34)~(39)所示者。其中,由環氧環之應變能量較大且反應性優越的觀點而言,較佳係使用式(36)~(39)所示之脂環式環氧單體。As the monomer having an epoxy group or the oligomer having an epoxy group, those represented by the following formulas (34) to (39) can be used. Among them, from the viewpoint that the strain energy of the epoxy ring is large and the reactivity is excellent, the alicyclic epoxy monomer represented by the formulas (36) to (39) is preferably used.
尚且,式(34)所示之化合物為環氧基降烯,作為此種化合物,例如可使用Promerus公司製EpNB。式(35)所示之化合物為γ-環氧丙氧基丙基三甲氧基矽烷,作為此化合物,可使用例如東麗‧道康寧‧聚矽氧公司製Z-6040。又,式(36)所示之化合物為2-(3,4-環氧基環己基)乙基三甲氧基矽烷,作為此化合物,可使用例如東京化成製E0327。Further, the compound represented by the formula (34) is an epoxy group. As the compound, for example, EpNB manufactured by Promerus Co., Ltd. can be used. The compound represented by the formula (35) is γ-glycidoxypropyltrimethoxydecane, and as the compound, for example, Z-6040 manufactured by Toray Dow Corning Co., Ltd. can be used. Further, the compound represented by the formula (36) is 2-(3,4-epoxycyclohexyl)ethyltrimethoxydecane, and as the compound, for example, E0327 manufactured by Tokyo Chemical Industry Co., Ltd. can be used.
再者,式(37)所示之化合物為3,4-環氧基環己烯基甲基-3’,4’-環氧基環己烯羧酸酯,作為此化合物,可舉例如Daicel化學公司製CELLOXIDE2021P。又,式(38)所示之化合物為1,2-環氧基-4-乙烯基環己烷,作為此化合物,可使用例如Daicel化學公司製CELLOXIDE2000。Further, the compound represented by the formula (37) is 3,4-epoxycyclohexenylmethyl-3',4'-epoxycyclohexenecarboxylate, and as such a compound, for example, Daicel Chemical company CELLOXIDE2021P. Further, the compound represented by the formula (38) is 1,2-epoxy-4-vinylcyclohexane, and as the compound, for example, CELLOXIDE 2000 manufactured by Daicel Chemical Co., Ltd. can be used.
再者,式(39)所示之化合物為1,2:8,9二環氧基薴,作為此化合物,可使用例如Daicel化學公司製CELLOXIDE3000。Further, the compound represented by the formula (39) is 1,2:8,9-dihydroxy oxime, and as the compound, for example, CELLOXIDE 3000 manufactured by Daicel Chemical Co., Ltd. can be used.
[化29][化29]
[化30][化30]
[化31][化31]
[化32][化32]
[化33][化33]
[化34][化34]
再者,作為單體,亦可併用具有氧雜環丁基之單體、具有氧雜環丁基之寡聚物、具有環氧基之單體、具有環氧基之寡聚物。Further, as the monomer, a monomer having an oxetanyl group, an oligomer having an oxetanyl group, a monomer having an epoxy group, or an oligomer having an epoxy group may be used in combination.
具有氧雜環丁基之單體、具有氧雜環丁基之寡聚物,係開始聚合的起始反應較慢,生長反應較快。相對於此,具有環氧基之單體、具有環氧基之寡聚物係開始聚合之起始反應較快,生長反應較慢。因此,藉由併用具有氧雜環丁基之單體、具有氧雜環丁基之寡聚物、具有環氧基之單體、具有環氧基之寡聚物,於照射光時,可確實產生光照射部分與未照射部分之間的折射率差。The monomer having an oxetanyl group and the oligomer having an oxetanyl group have a slow initial reaction for starting polymerization and a faster growth reaction. On the other hand, the monomer having an epoxy group and the oligomer having an epoxy group start the polymerization with a faster initial reaction and a slower growth reaction. Therefore, by using a monomer having an oxetanyl group, an oligomer having an oxetanyl group, a monomer having an epoxy group, or an oligomer having an epoxy group, it is possible to illuminate light. A refractive index difference between the light-irradiated portion and the unirradiated portion is generated.
具體而言,若以式(20)所示之單體作為「第1單體」,以含有上述成分B之單體作為「第2單體」,則較佳係併用第1單體與第2單體,將其併用比例依(第2單體之重量)/(第1單體之重量)規定時,較佳為0.1~1左右、更佳0.1~0.6左右。若併用比例為上述範圍,則提升單體之反應性速度與光導波路1之耐熱性間的均衡。Specifically, when the monomer represented by the formula (20) is used as the "first monomer" and the monomer containing the component B is the "second monomer", it is preferred to use the first monomer and the first monomer. When the monomer is used in a ratio of (the weight of the second monomer) / (the weight of the first monomer), it is preferably about 0.1 to 1, more preferably about 0.1 to 0.6. When the combined ratio is in the above range, the equilibrium between the reactivity speed of the monomer and the heat resistance of the optical waveguide 1 is improved.
尚且,相當於第2單體之單體,可舉例如與式(20)所示之單體相異之具有氧雜環丁基的單體或具有乙烯基醚基的單體。此等之中,較佳係使用環氧化合物(尤其是脂環式環氧化合物)及2官能之氧雜環丁烷化合物(具有2個氧雜環丁基之單體)的至少1種。藉由使用此等第2單體,可提升第1單體與聚合物915間之反應性,藉此保持透明性,可提升導波路之耐熱性。Further, the monomer corresponding to the second monomer may, for example, be a monomer having an oxetanyl group or a monomer having a vinyl ether group, which is different from the monomer represented by the formula (20). Among these, at least one of an epoxy compound (particularly an alicyclic epoxy compound) and a bifunctional oxetane compound (a monomer having two oxetanyl groups) is preferably used. By using these second monomers, the reactivity between the first monomer and the polymer 915 can be improved, thereby maintaining transparency and improving the heat resistance of the waveguide.
作為此種第2單體之具體例,可舉例如上式(15)之化合物、上式(12)之化合物、上式(11)之化合物、上式(18)之化合物、上式(19)之化合物、上式(34)~(39)之化合物。Specific examples of such a second monomer include a compound of the above formula (15), a compound of the above formula (12), a compound of the above formula (11), a compound of the above formula (18), and the above formula (19). a compound of the above formula (34) to (39).
另外,所謂降烯系單體,係含有至少一個下述構造式A所示之降烯骨架的單體的總稱,可舉例如下述構造式C所示之化合物。In addition, the so-called drop The olefinic monomer contains at least one of the following structural formula A The general name of the monomer of the olefin skeleton is, for example, a compound represented by the following structural formula C.
[化35][化35]
[化36][化36]
[式中,a表示單鍵或雙鍵,R12 ~R15 分別獨立表示氫原子、取代或未取代之烴基、或官能取代基,m表示0~5之整數。其中,a為雙鍵時,R12 及R13 之任一者、R14 及R15 之任一者並不存在。][wherein, a represents a single bond or a double bond, and R 12 to R 15 each independently represent a hydrogen atom, a substituted or unsubstituted hydrocarbon group, or a functional substituent, and m represents an integer of 0 to 5. However, when a is a double bond, either of R 12 and R 13 and any of R 14 and R 15 do not exist. ]
作為未取代之烴基(氫香芹基),可舉例如直鏈狀或分支狀之碳數1~10(C1 ~C10 )之烷基、直鏈狀或分支狀之碳數2~10(C2 ~C10 之烯基)、直鏈狀或分支狀之碳數2~10(C2 ~C10 )之炔基、碳數4~12(C4 ~C12 )之環烷基、碳數4~12(C4 ~C12 )之環烯基、碳數6~12(C6 ~C12 )之芳基、碳數7~24(C7 ~C24 )之芳烷基(芳基烷基)等;其他,R12 及R13 、R14 及R15 分別亦可為碳數1~10(C1 ~C10 )之亞烷基。Examples of the unsubstituted hydrocarbon group (hydrocarvyl group) include a linear or branched carbon number of 1 to 10 (C 1 to C 10 ), and a linear or branched carbon number of 2 to 10. (C 2 ~ C 10 alkenyl), linear or branched carbon number 2 to 10 (C 2 ~ C 10 ) alkynyl group, carbon number 4 to 12 (C 4 ~ C 12 ) cycloalkyl a cycloalkenyl group having 4 to 12 carbon atoms (C 4 to C 12 ), an aryl group having 6 to 12 carbon atoms (C 6 to C 12 ), and an aralkyl group having 7 to 24 carbon atoms (C 7 to C 24 ) Further, R 12 and R 13 , R 14 and R 15 may each independently be an alkylene group having 1 to 10 carbon atoms (C 1 to C 10 ).
尚且,上述以外之單體,作為例如丙烯酸(甲基丙烯酸)系單體,可舉例如丙烯酸、甲基丙烯酸、丙烯酸酯、甲基丙烯酸酯、丙烯酸醯胺、甲基丙烯酸醯胺、丙烯腈等,此等可使用1種或組合2種以上使用。Further, examples of the monomer other than the above include, for example, acrylic acid, methacrylic acid, acrylate, methacrylic acid ester, decyl acrylate, decyl methacrylate, acrylonitrile, etc., as the acrylic acid (methacrylic acid) monomer. These may be used alone or in combination of two or more.
具體可舉例如(甲基)丙烯酸2-乙基己基酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸2-丁氧基乙酯等。Specific examples thereof include 2-ethylhexyl (meth)acrylate, cyclohexyl (meth)acrylate, and 2-butoxyethyl (meth)acrylate.
另外,作為乙烯基醚系單體,可舉例如甲基乙烯基醚、乙基乙烯基醚、正丙基乙烯基醚、異丙基乙烯基醚、正丁基乙烯基醚、異丁基乙烯基醚、第三丁基乙烯基醚、正戊基乙烯基醚、正己基乙烯基醚、正辛基乙烯基醚、正十二基乙烯基醚、2-乙基己基乙烯基醚、環己基乙烯基醚等之烷基乙烯基醚類或環烷基乙烯基醚類,此等可使用1種或組合2種以上使用。Further, examples of the vinyl ether monomer include methyl vinyl ether, ethyl vinyl ether, n-propyl vinyl ether, isopropyl vinyl ether, n-butyl vinyl ether, and isobutyl vinyl. Ether, tert-butyl vinyl ether, n-pentyl vinyl ether, n-hexyl vinyl ether, n-octyl vinyl ether, n-dodecyl vinyl ether, 2-ethylhexyl vinyl ether, cyclohexyl An alkyl vinyl ether or a cycloalkyl vinyl ether such as a vinyl ether may be used alone or in combination of two or more.
另外,作為苯乙烯系單體,可舉例如苯乙烯、二乙烯基苯等,此等可使用1種或組合2種以上使用。In addition, as the styrene-based monomer, for example, styrene or divinylbenzene may be used, and these may be used alone or in combination of two or more.
尚且,此等單體與上述聚合物915的組合並無特別限定,可為任一種組合。Further, the combination of these monomers and the above polymer 915 is not particularly limited, and may be any combination.
另外,單體亦可如上述般使其至少一部分寡聚物化。Further, the monomer may be at least partially oligomerized as described above.
此等單體之添加量,係相對於聚合物100重量份,較佳為1重量份以上且50重量份以下,更佳2重量份以上且20重量份以下。藉此,可調制核/包覆間之折射率,具有達到可撓性與耐熱性之兩立的效果。The amount of such monomers added is preferably 1 part by weight or more and 50 parts by weight or less, more preferably 2 parts by weight or more and 20 parts by weight or less based on 100 parts by weight of the polymer. Thereby, the refractive index between the core and the cladding can be modulated, and the effect of achieving flexibility and heat resistance can be achieved.
聚合起始劑係隨著活性放射線之照射而對單體進行作用,促進單體之反應者,可考慮單體之反應性而視需要予以添加。The polymerization initiator is a monomer which acts upon the irradiation of the actinic radiation, and the monomer is reacted, and may be added as needed in consideration of the reactivity of the monomer.
作為所使用之聚合起始劑,係視單體之聚合反應或交聯反應之種類而予以適當選擇。例如丙烯酸(甲基丙烯酸)系單體、苯乙烯系單體中較佳為使用自由基聚合起始劑,環氧系單體、氧雜環丁烷系單體、乙烯基醚系單體中較佳為使用陽離子聚合起始劑。The polymerization initiator to be used is appropriately selected depending on the type of polymerization reaction or crosslinking reaction of the monomer. For example, an acrylic acid (methacrylic acid) monomer or a styrene monomer is preferably a radical polymerization initiator, an epoxy monomer, an oxetane monomer, or a vinyl ether monomer. It is preferred to use a cationic polymerization initiator.
作為自由基聚合起始劑,可舉例如二苯基酮類、苯乙酮類等。Examples of the radical polymerization initiator include diphenylketones and acetophenones.
另一方面,作為陽離子聚合起始劑,可舉例如重氮鹽般之路易斯酸產生型者、錪鹽、鋶鹽般之布氏酸產生型者。On the other hand, examples of the cationic polymerization initiator include those of a Lewis acid-producing type such as a diazonium salt, a strontium salt, and a strontium salt.
尤其是在使用具有環狀醚基之單體作為單體時,較佳為使用以下之陽離子聚合起始劑(光酸產生劑)。In particular, when a monomer having a cyclic ether group is used as a monomer, the following cationic polymerization initiator (photoacid generator) is preferably used.
例如使用三苯基鋶三氟甲烷磺酸鹽、參(4-第三丁基苯基)鋶-三氟甲烷磺酸鹽等之鋶鹽類,對硝基苯基重氮六氟磷酸鹽等之重氮鹽類,銨鹽類,鏻鹽類,二苯基錪三氟甲烷磺酸鹽、(三異丙苯基)錪-肆(五氟苯基)硼酸鹽等之錪鹽類,醌二酸類、雙(苯基磺醯基)重氮甲烷等之重氮甲烷類,1-苯基-1-(4-甲基苯基)磺醯氧基-1-苯甲醯基甲烷、N-羥基萘基醯亞胺-三氟甲烷磺酸酯等之磺酸酯類,二苯基二碸等之二碸類,參(2,4,6-三氯甲基)-s-三、2-(3,4-亞甲基二氧基苯基)-4,6-雙(三氯甲基)-s-三等之三類等化合物作為光酸產生劑。又,此等之光酸產生劑可單獨或組合複數種使用。For example, a sulfonium salt such as triphenylsulfonium trifluoromethanesulfonate or bis(t-butylphenyl)phosphonium-trifluoromethanesulfonate, p-nitrophenyldiazonium hexafluorophosphate or the like is used. Diazo salts, ammonium salts, phosphonium salts, diphenylsulfonium trifluoromethanesulfonate, (triisopropylphenyl)phosphonium-quinone (pentafluorophenyl) borate, etc. Diazomethanes such as diacids, bis(phenylsulfonyl)diazomethane, 1-phenyl-1-(4-methylphenyl)sulfonyloxy-1-benzhydrylmethane, N a sulfonate such as hydroxynaphthylimine-trifluoromethanesulfonate, a diterpenoid such as diphenyldifluorene, or a bis(2,4,6-trichloromethyl)-s-three , 2-(3,4-methylenedioxyphenyl)-4,6-bis(trichloromethyl)-s-three Three Compounds such as the class act as photoacid generators. Further, these photoacid generators may be used singly or in combination of plural kinds.
聚合起始劑之含量係相對於聚合物100重量份,較佳為0.01重量份以上且0.3重量份以下,更佳為0.02重量份以上且0.2重量份以下。藉此,有提升反應性之效果。The content of the polymerization initiator is preferably 0.01 parts by weight or more and 0.3 parts by weight or less, more preferably 0.02 parts by weight or more and 0.2 parts by weight or less based on 100 parts by weight of the polymer. Thereby, there is an effect of improving reactivity.
尚且,於單體之反應性顯著較高的情況,亦可省略聚合起始劑之添加。Further, in the case where the reactivity of the monomer is remarkably high, the addition of the polymerization initiator may be omitted.
其中,增感劑係使聚合起始劑對光之感度增大,具有使聚合起始劑之活性化(反應或分解)所需的時間或能量減少的機能,或使光波長變化成適合聚合起始劑之活性化的波長的機能。Among them, the sensitizer increases the sensitivity of the polymerization initiator to light, has a function of reducing the time or energy required for activation (reaction or decomposition) of the polymerization initiator, or changes the wavelength of light to be suitable for polymerization. The function of the wavelength at which the initiator is activated.
作為此種增感劑,係配合聚合起始劑之感度或增感劑之吸收的波峰波長而適當選擇,並無特別限定,可舉例如9,10-二丁氧基蒽(CAS編號第76275-14-4號)般之蒽類、類、蒽醌類、菲類、類、苯并芘類、類(fluoranthenes)、紅螢烯類、芘類、陰丹士林類、噻噸-9-酮類(thioxanthen-9-ones)等,此等可單獨或作為混合物使用。The sensitizer is appropriately selected depending on the sensitivity of the polymerization initiator or the peak wavelength of the absorption of the sensitizer, and is not particularly limited, and examples thereof include 9,10-dibutoxy fluorene (CAS No. 76275). -14-4) Classes, cockroaches, phenanthrenes, Class, benzopyrene, Fluorhenens, erythroprene, anthraquinone, indanthrene, thioxanthen-9-ones, etc., which may be used singly or as a mixture.
作為增感劑之具體例,可舉例如2-異丙基-9H-噻噸-9-酮、4-異丙基-9H-噻噸-9-酮、1-氯-4-丙氧基噻噸酮、啡噻(phenothiazine)或此等的混合物。Specific examples of the sensitizer include 2-isopropyl-9H-thioxanthene-9-one, 4-isopropyl-9H-thioxanthene-9-one, and 1-chloro-4-propoxy group. Thioxanthone, thiophene (phenothiazine) or a mixture of these.
增感劑之含量係於核心層形成用組成物900中,較佳為0.01重量%以上、更佳0.5重量%以上、再更佳1重量%以上。又,上限值較佳為5重量%以下。The content of the sensitizer is preferably 0.01% by weight or more, more preferably 0.5% by weight or more, still more preferably 1% by weight or more, based on the core layer forming composition 900. Further, the upper limit is preferably 5% by weight or less.
尚且,添加劑920中亦可含有觸媒前驅物、助觸媒、抗氧化劑、紫外線吸收劑、光安定劑、矽烷偶合劑、塗面改良劑、熱聚合禁止劑、均平劑、界面活性劑、著色劑、保存安定劑、可塑劑、滑劑、填充材、無機粒子、抗老化劑、濕潤性改良劑、抗靜電劑等。Further, the additive 920 may further contain a catalyst precursor, a catalyst, an antioxidant, an ultraviolet absorber, a photo-stabilizer, a decane coupling agent, a coating surface modifier, a thermal polymerization inhibitor, a leveling agent, a surfactant, A coloring agent, a storage stabilizer, a plasticizer, a slip agent, a filler, inorganic particles, an anti-aging agent, a wettability improver, an antistatic agent, and the like.
含有以上之聚合物915與添加劑920之層910,係因於聚合物915中均一分散之添加劑920的作用,而具有既定之折射率。The layer 910 comprising the above polymer 915 and additive 920 has a predetermined refractive index due to the action of the uniformly dispersed additive 920 in the polymer 915.
[2]其次,準備形成有開口(窗)9351之遮罩(masking)935,經由此遮罩935,對層910照射活性放射線930(參照圖5)。[2] Next, a masking 935 having an opening (window) 9351 is prepared, and the layer 910 is irradiated with the active radiation 930 (see FIG. 5) via the mask 935.
以下,以使用具有低於聚合物915之折射率者作為單體的情況為一例進行說明。Hereinafter, a case where a member having a refractive index lower than that of the polymer 915 is used as a monomer will be described as an example.
亦即,於此所示之例中,活性放射線930之照射區域925主要成為側面包覆部15。That is, in the example shown here, the irradiation region 925 of the actinic radiation 930 mainly becomes the side cladding portion 15.
於此所示之例中,於遮罩935上主要形成所應形成之側面包覆部15之圖案與等價之開口(窗)9351。此開口9351係形成使照射之活性放射線930穿透之穿透部者。又,核心部14或側面包覆部15之圖案,由於係根據配合活性放射線930之照射而形成之折射率分佈W所決定,故開口9351之圖案與側面包覆部15之圖案並非完全一致,上述兩圖案之間有時會發生稍些偏差。In the example shown here, the pattern of the side cladding portion 15 to be formed and the equivalent opening (window) 9351 are mainly formed on the mask 935. This opening 9351 forms a penetration portion through which the irradiated active radiation 930 penetrates. Further, since the pattern of the core portion 14 or the side cladding portion 15 is determined by the refractive index distribution W formed by the irradiation of the active radiation 930, the pattern of the opening 9351 and the pattern of the side cladding portion 15 are not completely identical. A slight deviation sometimes occurs between the above two patterns.
遮罩935可為事先形成(另外形成)者(例如平板狀者),亦可為例如藉氣相成膜法或塗佈法而形成於層910上者。The mask 935 may be formed in advance (otherwise formed) (for example, a flat plate), or may be formed on the layer 910 by, for example, a vapor phase film formation method or a coating method.
作為遮罩935之較佳物的例子,可舉例如由石英玻璃或PET基材等所製作之光遮罩、模板遮罩、氣相成膜法(蒸鍍、濺鍍等)等所形成之金屬薄膜等,此等之中,特佳為使用光遮罩或模板遮罩。因為其等可精度良好地形成細微圖案,同時操作容易,有利於提升生產性。Examples of preferred examples of the mask 935 include a light mask made of quartz glass or a PET substrate, a template mask, a vapor phase film formation method (evaporation, sputtering, etc.). Among metal films and the like, among them, it is particularly preferable to use a light mask or a template mask. Since it can form a fine pattern with high precision, it is easy to operate at the same time, which is advantageous for improving productivity.
另外,圖5中,雖顯示遮罩935之開口(窗)9351係沿著活性放射線930之照射區域925之圖案部分地去除遮罩者,但在使用由上述石英玻璃或PET基材等所製作之光遮罩時,亦可使用於該光遮罩上設置了例如由鉻等金屬所形成之遮蔽材所構成的活性放射線930之遮蔽部者。此遮罩中,遮蔽部以外的部分成為上述窗(穿透部)。In addition, in FIG. 5, the opening (window) 9351 of the mask 935 is partially removed from the mask along the pattern of the irradiation region 925 of the active radiation 930, but it is made of the above quartz glass or PET substrate. In the case of the light mask, a shield portion of the actinic radiation 930 formed of a masking material made of a metal such as chromium may be used for the light mask. In this mask, a portion other than the shielding portion becomes the above-described window (penetrating portion).
所使用之活性放射線930,只要為可對聚合起始劑造成光化學性反應(變化)者、以及可使聚合物915所含之脫離性基脫離者即可,可使用例如可見光、紫外光、紅外光、雷射光、電子束或X射線等。The active radiation 930 to be used may be any one that can cause a photochemical reaction (change) to the polymerization initiator and a detachable group contained in the polymer 915. For example, visible light, ultraviolet light, or the like can be used. Infrared light, laser light, electron beam or X-ray.
此等之中,活性放射線930係視聚合起始劑或脫離性基之種類、於含有增感劑時則視增感劑之種類等而適當選擇,並無特別限定,較佳為於波長200~450nm之範圍具有波峰波長者。藉此,較容易使聚合起始劑活性化,並使脫離性基較容易脫離。In the above, the active radiation 930 is appropriately selected depending on the type of the polymerization initiator or the detachment group, and the type of the sensitizer when the sensitizer is contained, and is not particularly limited, and is preferably at a wavelength of 200. Those with a peak wavelength in the range of ~450 nm. Thereby, it is easier to activate the polymerization initiator, and the release group is more easily detached.
另外,活性放射線930之照射量,較佳為0.1~9J/cm2 左右,更佳0.2~6J/cm2 左右,再更佳為0.2~3J/cm2 左右。Further, the irradiation amount of the active radiation 930 is preferably about 0.1 to 9 J/cm 2 , more preferably about 0.2 to 6 J/cm 2 , still more preferably about 0.2 to 3 J/cm 2 .
若經由遮罩935對層910照射活性放射線930,則於照射區域925使聚合起始劑活性化。藉此,單體於照射區域925進行聚合。若單體進行聚合,由於在照射區域925中單體量減少,故未照射區域940中之單體因此擴散移動至照射區域925中。如上述,聚合物915與單體係依彼此間產生折射率差的方式予以適當選擇,故隨著單體之擴散移動,於照射區域925與未照射區域940之間產生折射率差。When the layer 910 is irradiated with the actinic radiation 930 via the mask 935, the polymerization initiator is activated in the irradiation region 925. Thereby, the monomer is polymerized in the irradiation region 925. If the monomer is polymerized, since the amount of the monomer in the irradiation region 925 is reduced, the monomer in the unirradiated region 940 is thus diffused and moved into the irradiation region 925. As described above, the polymer 915 and the single system are appropriately selected in such a manner that a refractive index difference occurs between them, so that a refractive index difference occurs between the irradiation region 925 and the non-irradiated region 940 as the monomer diffuses and moves.
圖9為用於說明在照射區域925與未照射區域940之間產生折射率差之情況的圖,係表示以層910之橫剖面的位置作為橫軸、以橫剖面之折射率作為縱軸時之折射率分佈的圖。FIG. 9 is a view for explaining a case where a refractive index difference is generated between the irradiation region 925 and the non-irradiation region 940, and shows a case where the position of the cross section of the layer 910 is the horizontal axis and the refractive index of the cross section is the vertical axis. A map of the refractive index profile.
本實施形態中,由於使用折射率小於聚合物915者作為單體,故隨著單體之擴散移動,而未照射區域940之折射率變高,且照射區域925之折射率變低(參照圖9(a))。In the present embodiment, since the refractive index is smaller than that of the polymer 915, the refractive index of the unirradiated region 940 becomes higher as the monomer diffuses and moves, and the refractive index of the irradiated region 925 becomes lower (refer to the figure). 9(a)).
單體之擴散移動可認為係因單體於照射區域925中被消耗,因此所形成之單體的濃度梯度成為契機而引起。因此,未照射區域940整體之單體並非一起朝向照射區域925,而是由接近照射區域925的部分起慢慢開始移動,為了補上而使單體亦開始由未照射區域940之中央部起朝外面移動。其結果,如圖9(a)所示,包挾照射區域925與未照射區域940之邊界,於未照射區域940側形成高折射率部H,於照射區域925側形成低折射率部L。此等高折射率部H及低折射率部L因分別隨著上述之單體擴散移動而形成,故必定會由圓滑之曲線所構成。具體而言,高折射率部H係例如朝上形成凸之略U字狀,低折射率部L係例如朝下形成凸之略U字狀。The diffusion movement of the monomer is considered to be caused by the fact that the monomer is consumed in the irradiation region 925, and thus the concentration gradient of the formed monomer is caused. Therefore, the monomers of the entire unirradiated region 940 do not gradually face toward the irradiation region 925, but gradually start moving from the portion close to the irradiation region 925, and the monomer also starts to be from the central portion of the unirradiated region 940 in order to make up. Move outside. As a result, as shown in FIG. 9(a), the high refractive index portion H is formed on the side of the non-irradiated region 940, and the low refractive index portion L is formed on the side of the irradiation region 925, at the boundary between the rubbing irradiation region 925 and the non-irradiated region 940. Since the high refractive index portion H and the low refractive index portion L are formed by the diffusion movement of the above-described respective monomers, they are necessarily formed by a smooth curve. Specifically, the high refractive index portion H is, for example, slightly convex in a U shape, and the low refractive index portion L is formed in a slightly U shape, for example, downward.
尚且,使上述單體聚合而成之聚合物的折射率,係與聚合前之單體的折射率幾乎相同(折射率差為0~0.001左右),故照射區域925中,隨著單體之聚合進行,配合單體之量及來自單體之物質的量,進行折射率的降低。因此,藉由適當調整單體相對於聚合物的量,則可控制折射率分佈W的形狀。Further, the refractive index of the polymer obtained by polymerizing the above monomer is almost the same as the refractive index of the monomer before polymerization (the refractive index difference is about 0 to 0.001), so that in the irradiation region 925, with the monomer The polymerization is carried out, and the refractive index is lowered by the amount of the monomer and the amount of the substance derived from the monomer. Therefore, the shape of the refractive index distribution W can be controlled by appropriately adjusting the amount of the monomer relative to the polymer.
另一方面,於未照射區域940中,由於聚合起始劑未被活性化,故單體不進行聚合。On the other hand, in the unirradiated region 940, since the polymerization initiator is not activated, the monomer is not polymerized.
另外,照射區域925中,隨著單體之聚合進行,單體之擴散移動的容易性慢慢降低。因此,於照射區域925中,越接近未照射區域940,單體濃度本身越高,而折射率之降低量變得越大。其結果,形成於照射區域925之低折射率部L的分佈形狀容易成為左右非對稱,未照射區域940側之梯度變得更急遽。因此,形成本發明之光導波路所具有之折射率分佈W。Further, in the irradiation region 925, as the polymerization of the monomer proceeds, the ease of diffusion of the monomer gradually decreases. Therefore, in the irradiation region 925, the closer to the unirradiated region 940, the higher the monomer concentration itself, and the larger the refractive index reduction amount becomes. As a result, the distribution shape of the low refractive index portion L formed in the irradiation region 925 is likely to be asymmetric to the left and right, and the gradient on the side of the non-irradiation region 940 is more urgent. Therefore, the refractive index distribution W of the optical waveguide of the present invention is formed.
另外,聚合物915較佳係如上述般具有脫離性基。該脫離性基係伴隨活性放射線930之照射而脫離,使聚合物915之折射率降低。因此,若對照射區域925照射活性放射線930,則上述單體之擴散移動開始,且脫離性基自聚合物915脫離,照射區域925之折射率變得低於照射前(參照圖9(b))。Further, the polymer 915 preferably has a detachment group as described above. This detachable base is detached by irradiation with the active radiation 930, and the refractive index of the polymer 915 is lowered. Therefore, when the active radiation 930 is irradiated to the irradiation region 925, the diffusion movement of the monomer starts, and the release group is detached from the polymer 915, and the refractive index of the irradiation region 925 becomes lower than before the irradiation (refer to FIG. 9(b)). ).
該折射率之降低係因於照射區域925整體一律地發生,故上述高折射率部H與低折射率部L之折射率差更加擴大。其結果,得到圖9(b)所示之折射率分佈W。又,圖9(a)之折射率之變化、與圖9(b)之折射率之變化幾乎同時發生。藉由此種折射率變化,該折射率差更加擴大。Since the decrease in the refractive index occurs uniformly in the entire irradiation region 925, the refractive index difference between the high refractive index portion H and the low refractive index portion L is further increased. As a result, the refractive index distribution W shown in Fig. 9(b) was obtained. Further, the change in the refractive index of Fig. 9(a) occurs almost simultaneously with the change in the refractive index of Fig. 9(b). This refractive index difference is further enlarged by such a refractive index change.
本實施形態中,藉由適當調整能量照射前之核心層之構成成分、能量照射之照射量、或能量照射前之核心層之乾燥程度等,而可控制能量照射後之核心層之折射率分佈的形狀。In the present embodiment, the refractive index distribution of the core layer after the energy irradiation can be controlled by appropriately adjusting the constituent components of the core layer before the energy irradiation, the irradiation amount of the energy irradiation, or the dryness of the core layer before the energy irradiation. shape.
另外,藉由調整活性放射線930之照射量,可控制所形成之折射率差及折射率分佈的形狀。例如,藉由增加照射量,則可擴大折射率差。又,藉由調整光酸產生劑之含量與照射量,則可控制折射率分佈之形狀。又,亦可於活性放射線930之照射前使層910乾燥,而藉由調整此時之乾燥程度,則亦可控制折射率分佈之形狀。例如,藉由增加乾燥程度,則可抑制單體的擴散移動。又藉由提高乾燥溫度,可使擴散量增加,控制折射率分佈。Further, by adjusting the amount of irradiation of the active radiation 930, the formed refractive index difference and the shape of the refractive index distribution can be controlled. For example, by increasing the amount of irradiation, the refractive index difference can be increased. Further, by adjusting the content of the photoacid generator and the irradiation amount, the shape of the refractive index distribution can be controlled. Further, the layer 910 may be dried before the irradiation of the active radiation 930, and the shape of the refractive index distribution may be controlled by adjusting the degree of drying at this time. For example, by increasing the degree of drying, the diffusion movement of the monomer can be suppressed. Further, by increasing the drying temperature, the amount of diffusion can be increased to control the refractive index distribution.
接著,對層910實施加熱處理。於此加熱處理中,經照射光之照射區域925中之單體進一步聚合。另一方面,於此加熱步驟中,未照射區域940之單體揮發。藉此,未照射區域940中單體更加變少、折射率變高,而成為接近聚合物915的折射率。Next, the layer 910 is subjected to a heat treatment. In this heat treatment, the monomer in the irradiated light irradiation region 925 is further polymerized. On the other hand, in this heating step, the monomer in the unirradiated region 940 is volatilized. Thereby, the amount of the monomer in the unirradiated region 940 is further reduced, and the refractive index is increased to become close to the refractive index of the polymer 915.
此加熱處理中之加熱溫度並無特別限定,較佳為30~180℃左右,更佳40~160℃左右。The heating temperature in the heat treatment is not particularly limited, but is preferably about 30 to 180 ° C, more preferably about 40 to 160 ° C.
又,加熱時間較佳係設定為使照射區域925之單體的聚合反應幾乎結束,具體而言,較佳為0.1~2小時左右、更佳0.1~1小時左右。Further, the heating time is preferably set such that the polymerization reaction of the monomer in the irradiation region 925 is almost completed, and specifically, it is preferably about 0.1 to 2 hours, more preferably about 0.1 to 1 hour.
尚且,此加熱處理可視需要進行,亦可省略。Further, this heat treatment may be performed as needed or may be omitted.
依上述原理,可得到具有折射率分佈W之核心層13(參照圖6)。According to the above principle, the core layer 13 having the refractive index distribution W can be obtained (refer to FIG. 6).
折射率分佈W中,存在低折射率部L經轉化之極小值Ws1、Ws2、Ws3、Ws4(參照圖2(b)),此等極小值之位置相當於核心部14與側面包覆部15間的邊界。In the refractive index distribution W, there are minimum values Ws1, Ws2, Ws3, and Ws4 (see FIG. 2(b)) in which the low refractive index portion L is converted, and the positions of these minimum values correspond to the core portion 14 and the side cladding portion 15 The boundary between the two.
尚且,折射率分佈W係與核心層13中之來自單體的構造體濃度具有一定之相關關係。因此,藉由測定該來自單體之構造體的濃度,則可間接地對光導波路1所具有之折射率分佈W進行定性。Further, the refractive index distribution W has a certain correlation with the concentration of the structural body derived from the monomer in the core layer 13. Therefore, by measuring the concentration of the structure derived from the monomer, the refractive index distribution W of the optical waveguide 1 can be indirectly characterized.
構造體濃度之測定可使用例如FT-IR、TOF-SIMS之線分析、面分析等而進行。The measurement of the concentration of the construct can be carried out using, for example, FT-IR, TOF-SIMS line analysis, surface analysis, or the like.
再者,利用光導波路1之射出光的強度分佈與折射率分佈W之間具有一定之相關關係,則亦可間接地對折射率分佈W進行定性。Further, by having a certain correlation between the intensity distribution of the light emitted from the optical waveguide 1 and the refractive index distribution W, the refractive index distribution W can be indirectly characterized.
當然,折射率分佈W亦可藉由折射近場法、微分干涉法等進行直接定性。Of course, the refractive index distribution W can also be directly characterized by a refractive near-field method, a differential interference method, or the like.
另外,在使用具有高於聚合物915之折射率者作為單體時,係與上述相反地,由於伴隨單體擴散移動而移動目的地之折射率變高,故可配合此情況而設定照射區域925及未照射區域940。Further, when a monomer having a refractive index higher than that of the polymer 915 is used as a monomer, contrary to the above, since the refractive index of the moving destination becomes high accompanying the diffusion movement of the monomer, the irradiation region can be set in accordance with this case. 925 and unirradiated area 940.
另外,在使用如雷射光般之高指向性的光作為活性放射線930時,亦可省略遮罩935的使用。Further, when light having high directivity such as laser light is used as the active radiation 930, the use of the mask 935 can be omitted.
[3]接著,於核心層13之兩面上積層包覆層11、12。藉此,得到光導波路1。[3] Next, the cladding layers 11, 12 are laminated on both sides of the core layer 13. Thereby, the optical waveguide 1 is obtained.
首先,於支撐基板952上形成包覆層11(12)(參照圖7)。First, a cladding layer 11 (12) is formed on the support substrate 952 (refer to FIG. 7).
作為包覆層11(12)之形成方法,可為塗佈含有包覆材之清漆(包覆層形成用組成物)並使其硬化(固化)的方法、塗佈具有硬化性之單體組成物並使其硬化(固化)的方法等任一種方法。As a method of forming the coating layer 11 (12), a method of applying a varnish (a composition for forming a coating layer) containing a coating material and curing (curing), and applying a monomer having curability can be applied. Any method such as a method of hardening (curing) the object.
接著,將核心層13由支撐基板951剝離,以形成有包覆層11之支撐基板952、與形成有包覆層12之支撐基板952挾持核心層13(參照圖8(a))。Next, the core layer 13 is peeled off from the support substrate 951 to form the support substrate 952 on which the cladding layer 11 is formed, and the core layer 13 is held by the support substrate 952 on which the cladding layer 12 is formed (see FIG. 8(a)).
然後,如圖8(a)中之箭頭所示般,由形成有包覆層12之支撐基板952之上面側進行加壓,將包覆層11、12與核心層13進行壓黏。Then, as shown by the arrow in FIG. 8(a), the upper surface side of the support substrate 952 on which the cladding layer 12 is formed is pressed, and the cladding layers 11, 12 and the core layer 13 are pressure-bonded.
藉此,使包覆層11、12與核心層13接合、一體化(參照圖8(b))。Thereby, the cladding layers 11 and 12 and the core layer 13 are joined and integrated (see FIG. 8(b)).
接著,由包覆層11、12分別剝離、去除支撐基板952。藉此得到光導波路1。Next, the support substrate 952 is peeled off and removed by the cladding layers 11 and 12, respectively. Thereby, the optical waveguide 1 is obtained.
其後,視需要於光導波路1下面積層支撐薄膜2,於上面積層覆蓋薄膜3。Thereafter, the film 2 is supported by the area under the optical waveguide 1 as needed, and the film 3 is covered by the upper layer.
尚且,核心層13亦可不形成於支撐基板951上,而成膜於包覆層11上。進而,包覆層12亦可不貼合至核心層13上,而將材料塗佈於核心層13上予以形成。Further, the core layer 13 may not be formed on the support substrate 951 and formed on the cladding layer 11. Further, the cladding layer 12 may be formed by coating the material on the core layer 13 without adhering to the core layer 13.
接著,說明光導波路1之第2製造方法。Next, a second manufacturing method of the optical waveguide 1 will be described.
以下雖說明第2製造方法,但以與上述第1製造方法之相異處為中心進行說明,關於相同事項則省略其說明。In the following, the second manufacturing method will be described, but the description will be focused on the differences from the first manufacturing method described above, and the description of the same matters will be omitted.
第2製造方法中,除了核心層形成用組成物900的組成相異以外,其他係與第1製造方法相同。In the second manufacturing method, the composition of the core layer forming composition 900 is the same as that of the first manufacturing method except that the composition of the core layer forming composition 900 is different.
光導波路1之第2製造方法,係[1]於支撐基板951上塗佈核心層形成用組成物900形成液狀被膜後,將該支撐基板951置於水平台上使液狀被膜平坦化,同時使溶媒蒸發(脫溶媒)。藉此得到層910。[2]接著,對層910之一部分照射活性放射線後,對層910實施加熱處理以產生折射率差,得到形成有核心部14與側面包覆部15的核心層13。[3]接著,於核心層13之兩面上積層包覆層11、12,得到光導波路1。In the second manufacturing method of the optical waveguide 1, the liquid film is formed by coating the core layer forming composition 900 on the support substrate 951, and then the supporting substrate 951 is placed on a water platform to planarize the liquid film. At the same time, the solvent is evaporated (desolvent). Thereby a layer 910 is obtained. [2] Next, after irradiating one portion of the layer 910 with active radiation, the layer 910 is subjected to heat treatment to produce a refractive index difference, and the core layer 13 in which the core portion 14 and the side cladding portion 15 are formed is obtained. [3] Next, the cladding layers 11 and 12 are laminated on both surfaces of the core layer 13 to obtain an optical waveguide 1.
以下,依序說明各步驟。Hereinafter, each step will be described in order.
[1]首先,準備核心層形成用組成物900。[1] First, a core layer forming composition 900 is prepared.
第2製造方法中所使用之核心層形成用組成物900,係取代聚合起始劑而含有觸媒前驅物及助觸媒。The core layer-forming composition 900 used in the second production method contains a catalyst precursor and a promoter, in place of the polymerization initiator.
觸媒前驅物係可使單體反應(聚合反應、交聯反應等)起始的物質,藉由因光照射而活性化之助觸媒的作用,以改變活性化溫度的物質。藉由此活性化溫度的變化,於光之照射區域925與未照射區域940之間,產生使單體反應起始的溫度差,其結果,可僅於照射區域925中使單體反應。The catalyst precursor is a substance which can initiate a monomer reaction (polymerization reaction, crosslinking reaction, etc.), and which changes the activation temperature by the action of a promoter activated by light irradiation. By the change in the activation temperature, a temperature difference between the light irradiation region 925 and the non-irradiation region 940 causes the monomer reaction to start, and as a result, the monomer can be reacted only in the irradiation region 925.
作為觸媒前驅物(procatalyst),只要為伴隨活性放射線之照射而活性化溫度發生變化(上昇或降低)者,則可使用任意化合物,特佳係伴隨活性放射線之照射而活性化溫度降低者。藉此,可於較低溫之加熱處理中形成核心層13(光導波路1),並可防止對其他層施加不必要的熱而使光導波路1之特性(光傳送性能)降低。As a catalyst precursor, any compound may be used as long as the activation temperature changes (rises or falls) with the irradiation of the active radiation, and it is particularly preferable that the activation temperature is lowered by irradiation with active radiation. Thereby, the core layer 13 (the optical waveguide 1) can be formed in the heat treatment at a lower temperature, and unnecessary heat can be prevented from being applied to the other layers to lower the characteristics (light transmission performance) of the optical waveguide 1.
作為此種觸媒前驅物,適合使用主要含有下式(Ia)及(Ib)所示之化合物之至少一者的物質。As such a catalyst precursor, a substance mainly containing at least one of the compounds represented by the following formulas (Ia) and (Ib) is suitably used.
[化37][化37]
(E(R)3 )2 Pd(Q)2 ...(Ia)(E(R) 3 ) 2 Pd(Q) 2 ...(Ia)
[(E(R)3 )a Pd(Q)(LB)b ]p [WCA]r ...(Ib)[(E(R) 3 ) a Pd(Q)(LB) b ] p [WCA] r ...(Ib)
[式Ia、Ib各者中,E(R)3 表示第15族之中性電子供體配位子,E表示選自周期表第15族的元素,R表示含有氫原子(或其之同位素之一)或烴基的部位,Q表示選自羧酸酯、硫羧酸酯及二硫羧酸酯的陰離子配位子。又,式Ib中,LB表示路易斯鹼,WCA表示弱配位陰離子,a表示1~3之整數,b表示0~2之整數,a與b之合計為1~3,p及r表示取得鈀陽離子與弱配位陰離子之電荷均衡的數。][In each of Formulas Ia and Ib, E(R) 3 represents a Group 15 neutral electron donor ligand, E represents an element selected from Group 15 of the periodic table, and R represents a hydrogen atom (or an isotope thereof) One) or a hydrocarbon group, and Q represents an anionic ligand selected from the group consisting of a carboxylate, a sulfuric acid ester, and a dithiocarboxylic acid ester. Further, in the formula Ib, LB represents a Lewis base, WCA represents a weakly coordinating anion, a represents an integer of 1 to 3, b represents an integer of 0 to 2, and a total of a and b is 1 to 3, and p and r represent palladium. The number of charge equalizations of cations and weakly coordinating anions. ]
作為式Ia之典型的觸媒前驅物,可舉例如Pd(OAc)2 (P(i-Pr)3 )2 、Pd(OAc)2 (P(Cy)3 )2 Pd(O2 CCMe3 )2 (P(Cy)3 )2 、Pd(OAc)2 (P(Cp)3 )2 Pd(O2 CCF3 )2 (P(Cy)3 )2 、Pd(O2 CC6 H5 )3 (P(Cy)3 )2 ,但並不限定於此等。於此,Cp表示環戊基(cyclopentyl)基,Cy表示環己基。Typical catalyst precursors of the formula Ia include, for example, Pd(OAc) 2 (P(i-Pr) 3 ) 2 , Pd(OAc) 2 (P(Cy) 3 ) 2 Pd(O 2 CCMe 3 ). 2 (P(Cy) 3 ) 2 , Pd(OAc) 2 (P(Cp) 3 ) 2 Pd(O 2 CCF 3 ) 2 (P(Cy) 3 ) 2 , Pd(O 2 CC 6 H 5 ) 3 (P(Cy) 3 ) 2 , but is not limited to this. Here, Cp represents a cyclopentyl group, and Cy represents a cyclohexyl group.
另外,作為式Ib所示之觸媒前驅物,較佳係p及r分別為選自1及2之整數的化合物。Further, as the catalyst precursor represented by Formula Ib, it is preferred that each of p and r is a compound selected from an integer of 1 and 2.
作為此種式Ib之典型的觸媒前驅物,可舉例如Pd(OAc)2 (P(Cy)3 )2 。於此,Cy表示環己基,Ac表示乙醯基。As a typical catalyst precursor of the above formula Ib, for example, Pd(OAc) 2 (P(Cy) 3 ) 2 can be mentioned. Here, Cy represents a cyclohexyl group, and Ac represents an ethyl fluorenyl group.
此等之觸媒前驅物可使單體效率佳地進行反應(在降烯系單體時,藉加成聚合反應而效率佳地進行聚合反應或交聯反應等)。These catalyst precursors allow the monomer to react efficiently (in descending In the case of an ethylenic monomer, a polymerization reaction or a crosslinking reaction is carried out efficiently by an addition polymerization reaction.
另外,在活性化溫度呈降低的狀態(活性潛在狀態)下,作為觸媒前驅物,較佳係其活性化溫度較原本之活性化溫度低10~80℃左右(較佳10~50℃左右)。藉此,可使核心層14與側面包覆部15之間的折射率差確實產生。In addition, in the state where the activation temperature is lowered (active potential state), as the catalyst precursor, the activation temperature is preferably about 10 to 80 ° C lower than the original activation temperature (preferably about 10 to 50 ° C). ). Thereby, the refractive index difference between the core layer 14 and the side cladding portion 15 can be surely generated.
作為此種觸媒前驅物,較適合者為(主要)含有Pd(OAc)2 (P(i-Pr)3 )2 及Pd(OAc)2 (P(Cy)3 )2 中之至少一者的物質。As such a catalyst precursor, it is more suitable to contain (mainly) at least one of Pd(OAc) 2 (P(i-Pr) 3 ) 2 and Pd(OAc) 2 (P(Cy) 3 ) 2 . Substance.
助觸媒係藉活性放射線之照射而活性化,可使上述觸媒前驅物(procatalyst)之活性化溫度(使單體進行反應的溫度)改變的物質。The cocatalyst is activated by irradiation with active radiation, and the activation temperature of the catalyst precursor (the temperature at which the monomer reacts) can be changed.
作為該助觸媒(cocatalyst),只要為藉活性放射線之照射,其分子構成發生變化(反應或分解)而活性化的化合物,則可使用任意者,適合使用(主要)含有下述化合物(光起始劑)者:藉特定波長之活性放射線之照射而分解,產生質子或其他陽離子等之陽離子、與可取代至觸媒前驅物之脫離性基的弱配位陰離子(WCA)之化合物。As the cocatalyst, any compound which is activated by irradiation with active radiation and whose molecular structure is changed (reacted or decomposed) can be used, and it is suitable to use (mainly) the following compound (light) Starting agent: A compound which decomposes by irradiation with active radiation of a specific wavelength to generate a cation such as a proton or another cation, and a weakly coordinating anion (WCA) which can be substituted with a debonding group of a catalyst precursor.
作為弱配位陰離子,可舉例如肆(五氟苯基)硼酸離子(FABA- )、六氟銻酸離子(SbF6 - )等。Examples of the weakly coordinating anion include cerium (pentafluorophenyl) borate ion (FABA - ), hexafluoroantimonic acid ion (SbF 6 - ), and the like.
作為此助觸媒(光酸產生劑或光鹼產生劑),可舉例如下式所示之肆(五氟苯基)硼酸鹽或六氟銻酸鹽、肆(五氟苯基)鎘酸鹽、鋁酸鹽類、銻酸鹽類、其他硼酸鹽類、鎘酸鹽類、碳硼烷類、鹵碳硼烷類等。As the cocatalyst (photoacid generator or photobase generator), iridium (pentafluorophenyl) borate or hexafluoroantimonate or ruthenium (pentafluorophenyl) cadmate represented by the following formula can be exemplified. , aluminates, silicates, other borates, cadmiums, carboranes, halocarbboranes, etc.
[化38][化38]
作為此種助觸媒之市售物,可舉例如:可由紐澤西州Cranbury之Rhodia USA公司取得的「RHODORSIL(註冊商標,以下相同)PHOTOINITIATOR 2074(CAS編號第178233-72-2號)」;可由日本東京之東洋油墨製造股份有限公司取得之「TAG-372R((二甲基(2-(2-萘基)-2-側氧基乙基)鋶肆(五氟苯基)硼酸鹽:CAS編號第193957-54-9號));可由日本東京之Midori化學股份有限公司取得之「MPI-103(CAS編號第87709-41-9號)」;可由日本東京之東洋油墨製造股份有限公司取得之「TAG-371(CAS編號第193957-53-8號)」;可由日本東京之東洋合成工業股份有限公司取得之「TTBPS-TPFPB(參(4-第三丁基苯基)鋶肆(五氟苯基)硼酸鹽)」;可由日本東京之Midori化學工業股份有限公司取得之「NAI-105(CAS編號第85342-62-7號)」等。As a commercial product of such a catalyst, for example, "RHODORSIL (registered trademark, the same as below) PHOTOINITIATOR 2074 (CAS No. 178233-72-2)" available from Rhodia USA Co., Cranbury, NJ. "TAG-372R ((dimethyl(2-(2-naphthyl)-2-yloxyethyl) fluorene (pentafluorophenyl) borate) available from Toyo Ink Manufacturing Co., Ltd., Tokyo, Japan : CAS No. 193957-54-9)); "MPI-103 (CAS No. 87709-41-9)" available from Midori Chemical Co., Ltd., Tokyo, Japan; may be manufactured by Tokyo Toyo Ink Co., Ltd. "TAG-371 (CAS No. 193957-53-8)" obtained by the company; "TTBPS-TPFPB (referenced to 4-tert-butylphenyl)" available from Toyo Seiki Co., Ltd., Tokyo, Japan (Pentafluorophenyl)borate); "NAI-105 (CAS No. 85432-62-7)" obtained from Midori Chemical Industry Co., Ltd., Tokyo, Japan.
尚且,在使用RHODORSIL PHOTOINITIATOR 2074作為助觸媒時,適合使用紫外線(UV光)作為後述之活性放射線(化學射線),並適合使用水銀燈(高壓水銀燈)作為紫外線之照射手段。藉此,可對層910供給未滿300nm之充分能量的紫外線(活性放射線),可使RHODORSIL PHOTOINITIATOR 2074效率佳地分解,產生上述陽離子及WCA。In addition, when RHODORSIL PHOTOINITIATOR 2074 is used as the auxiliary catalyst, ultraviolet rays (UV light) are preferably used as the active radiation (chemical rays) to be described later, and a mercury lamp (high pressure mercury lamp) is suitably used as the ultraviolet irradiation means. Thereby, the layer 910 can be supplied with ultraviolet rays (active radiation) having a sufficient energy of less than 300 nm, and the RHODORSIL PHOTOINITIATOR 2074 can be efficiently decomposed to generate the above cations and WCA.
[2][2]
[2-1]接著,與第1製造方法同樣地,經由遮罩935對層910照射活性放射線930。[2-1] Next, in the same manner as in the first manufacturing method, the layer 910 is irradiated with the active radiation 930 via the mask 935.
照射區域925中,助觸媒藉活性放射線930之作用進行反應(結合)或分解,使陽離子(質子或其他之陽離子)與弱配位陰離子(WCA)游離(產生)。In the irradiation region 925, the promoter reacts (bonds) or decomposes by the action of the active radiation 930 to liberate (produce) a cation (proton or other cation) from a weakly coordinating anion (WCA).
然後,此等陽離子或弱配位陰離子係使存在於照射區域925內之觸媒前驅物之分子構造產生變化(分解),將其改變成活性潛在狀態(潛在性活性狀態)。Then, the cation or weakly coordinating anion changes (decomposes) the molecular structure of the catalyst precursor present in the irradiation region 925, and changes it to an active latent state (latent active state).
於此,所謂活性潛在狀態(或潛在性活性狀態)之觸媒前驅物,係指活性化溫度降低至原本之活性化溫度以下,若無溫度上昇、亦即於室溫程度下,則無法於照射區域925內使單體反應發生的狀態的觸媒前驅物。Here, the catalyst precursor of the active latent state (or latent active state) means that the activation temperature is lowered below the original activation temperature, and if there is no temperature rise, that is, at room temperature, it is impossible to A catalyst precursor in a state in which the monomer reaction occurs in the irradiation region 925.
因此,即使於活性放射線930照射後,若依例如-40℃左右保管層910,則可不使單體反應發生,維持其狀態。因此,準備複數之活性放射線930照射後之層910,對其等一次地實施後述之加熱處理,藉此可得到光導波路1(例如核心層13),而便利性高。Therefore, even after the irradiation of the actinic radiation 930, if the layer 910 is stored at about -40 ° C, for example, the monomer reaction can be maintained without maintaining the state. Therefore, the layer 910 after the irradiation of the plurality of active radiation 930 is prepared, and the heat treatment described later is performed once, whereby the optical waveguide 1 (for example, the core layer 13) can be obtained, and the convenience is high.
另外,除了上述觸媒前驅物之分子構造改變以外,與第1製造方法同樣地,脫離性基由聚合物915脫離。藉此,於層910之照射區域925與未照射區域940之間產生折射率差。Further, in the same manner as in the first production method, the release group is separated from the polymer 915, except that the molecular structure of the catalyst precursor is changed. Thereby, a refractive index difference is generated between the irradiation region 925 of the layer 910 and the non-irradiated region 940.
[2-2]接著,對層910實施加熱處理(第1加熱處理)。藉此,於照射區域925內,活性潛在狀態之觸媒前驅物活性化(成為活性狀態),發生單體之反應(聚合反應或交聯反應)。[2-2] Next, the layer 910 is subjected to heat treatment (first heat treatment). Thereby, in the irradiation region 925, the catalyst precursor in the active latent state is activated (in an active state), and a monomer reaction (polymerization reaction or crosslinking reaction) occurs.
然後,單體反應進行時,照射區域925內之單體濃度慢慢降低。因此,於照射區域925與未照區域940之間產生單體濃度差,為了解除此情況,單體由未照射區域940起進行擴散移動而集中至照射區域925。Then, when the monomer reaction proceeds, the monomer concentration in the irradiation region 925 gradually decreases. Therefore, a difference in monomer concentration occurs between the irradiation region 925 and the unexposed region 940. To eliminate this, the monomer is diffused and moved from the unirradiated region 940 to the irradiation region 925.
其結果,於層910形成與第1製造方法相同的折射率分佈。As a result, the same refractive index distribution as in the first manufacturing method is formed in the layer 910.
此加熱處理之加熱溫度並無特別限定,較佳為30~80℃左右、更佳40~60℃左右。The heating temperature of the heat treatment is not particularly limited, but is preferably about 30 to 80 ° C, more preferably about 40 to 60 ° C.
另外,加熱時間較佳係設定為照射區域925內之單體反應幾乎結束,具體而言,較佳為0.1~2小時左右,更佳0.1~1小時左右。Further, it is preferable that the heating time is set such that the monomer reaction in the irradiation region 925 is almost completed, and specifically, it is preferably about 0.1 to 2 hours, more preferably about 0.1 to 1 hour.
其次,對層910實施第2加熱處理。Next, the second heat treatment is performed on the layer 910.
藉此,使殘存於未照射區域940及/或照射區域925之觸媒前驅物,直接或伴隨助觸媒之活性化而進行活性化(成為活性化狀態),藉此使殘存於各區域925、940之單體反應。Thereby, the catalyst precursor remaining in the unirradiated region 940 and/or the irradiation region 925 is activated (activated state) directly or in conjunction with the activation of the promoter, thereby remaining in each region 925. , 940 monomer reaction.
如此,藉由使殘存於各區域925、940之單體反應,可達到所得之核心部14及側面包覆部15的安定化。Thus, the stability of the obtained core portion 14 and the side cladding portion 15 can be achieved by reacting the monomers remaining in the respective regions 925 and 940.
此第2加熱處理之加熱溫度只要為可使觸媒前驅物或助觸媒活性化的溫度即可,並無特別限定,較佳為70~100℃左右、更佳80~90℃左右。The heating temperature of the second heat treatment is not particularly limited as long as it can activate the catalyst precursor or the promoter, and is preferably about 70 to 100 ° C, more preferably about 80 to 90 ° C.
另外,加熱時間較佳為0.5~2小時左右,更佳0.5~1小時左右。Further, the heating time is preferably about 0.5 to 2 hours, more preferably about 0.5 to 1 hour.
其次,對層910實施第3加熱處理。Next, the third heat treatment is performed on the layer 910.
藉此,可達到於所得之核心層13中產生之內部應力的減低,或核心部14及側面包覆部15的更加安定化。Thereby, the internal stress generated in the obtained core layer 13 can be reduced, or the core portion 14 and the side cladding portion 15 can be more stabilized.
此第3加熱處理之加熱溫度較佳係設定為較第2加熱處理之加熱溫度高20℃以上,具體而言,較佳為90~180℃左右、更佳120~160℃左右。The heating temperature of the third heat treatment is preferably set to be higher than the heating temperature of the second heat treatment by 20 ° C or higher, and specifically preferably about 90 to 180 ° C, more preferably about 120 to 160 ° C.
另外,加熱時間較佳為0.5~2小時左右,更佳0.5~1小時左右。Further, the heating time is preferably about 0.5 to 2 hours, more preferably about 0.5 to 1 hour.
經由以上步驟,可得到光導波路1(例如核心層13)。Through the above steps, the optical waveguide 1 (for example, the core layer 13) can be obtained.
尚且,例如於實施第2加熱處理或第3加熱處理前的狀態下,在於核心部14與側面包覆部15之間得到充分折射率差的情況等,亦可省略第2加熱處理之後或第3加熱處理。In the state before the second heat treatment or the third heat treatment, for example, a sufficient refractive index difference is obtained between the core portion 14 and the side surface cladding portion 15, and the second heat treatment or the second heat treatment may be omitted. 3 heat treatment.
[3]接著,與第1製造方法同樣地,於核心層13之兩面積層包覆層11、12。藉此,得到光導波路1。[3] Next, similarly to the first manufacturing method, the layers 11 and 12 are coated on the two layers of the core layer 13. Thereby, the optical waveguide 1 is obtained.
上述般之本發明之光導波路,係光傳送效率及長期可靠性優越者。因此,藉由具備本發明之光導波路,則可得到可於2點之間進行高品質光通信的高可靠性之電子機器(本發明之電子機器)。The optical waveguide of the present invention as described above is superior in optical transmission efficiency and long-term reliability. Therefore, by providing the optical waveguide of the present invention, it is possible to obtain a highly reliable electronic device (an electronic device of the present invention) capable of high-quality optical communication between two points.
作為具備本發明之光導波路的電子機器,可舉例如行動電話、遊戲機、路由器裝置、WDM裝置、個人電腦、電視、家用伺服器等之電子機器類。此等電子機器中,均必須例如於LSI等之演算裝置與RAM等記憶裝置之間,高速地傳送大容量資料。因此,此種電子機器藉由具備本發明之光導波路,則可消除電氣佈線所特有的雜訊、信號劣化等不良情形,期待其性能的卓躍性提升。Examples of the electronic device including the optical waveguide of the present invention include electronic devices such as mobile phones, game machines, router devices, WDM devices, personal computers, televisions, and home servers. In such an electronic device, it is necessary to transfer large-capacity data at high speed between, for example, an arithmetic device such as an LSI and a memory device such as a RAM. Therefore, by providing the optical waveguide of the present invention, such an electronic device can eliminate problems such as noise and signal deterioration peculiar to electrical wiring, and is expected to have an outstanding performance.
再者,於光導波路部分中,相較於電氣佈線,其發熱量被大幅削減。因此,可削減冷卻所需之電力,並可削減電子機器整體之消耗電力。Further, in the optical waveguide portion, the amount of heat generation is greatly reduced as compared with the electrical wiring. Therefore, the power required for cooling can be reduced, and the power consumption of the entire electronic device can be reduced.
另外,本發明之光導波路係傳送損失及脈衝信號的遲緩較小,即使經多頻通化及高密度化仍不易發生干擾。因此,即使為高密度且小面積仍可得到高可靠性的光導波路,藉由搭載此光導波路,可達到電子機器之可靠性提升及小型化。Further, the optical waveguide system of the present invention has a small transmission loss and a slow delay of the pulse signal, and is less likely to cause interference even after multi-frequency modulation and high density. Therefore, even if it is a high-density and small-area optical transmission path with high reliability, by mounting this optical waveguide, the reliability and miniaturization of an electronic device can be achieved.
以上,雖針對本發明之光導波路及電子機器進行了說明,但本發明並不限定於此等,亦可於例如光導波路中附加任意之構成物。Although the optical waveguide and the electronic device of the present invention have been described above, the present invention is not limited to this, and an arbitrary constituent may be added to, for example, the optical waveguide.
本實施形態之電子機器中,作為可依高速通信大容量資料之對寬頻帶回線(broad band)傳送資料的裝置,係使用路由器裝置、WDM(Wavelength Division Multiplexing)裝置等之傳送裝置。此等傳送裝置內,多數設置著組合了LSI般之演算元件、記憶體般之記憶元件等的信號處理基板,以負責各回線的相互連接。In the electronic device of the present embodiment, a device for transmitting data to a wide band by high-speed communication of large-capacity data is used as a transmission device such as a router device or a WDM (Wavelength Division Multiplexing) device. In such a transmission device, a signal processing substrate in which an LSI-like calculation element, a memory-like memory element, or the like is provided is often provided to be responsible for interconnection of the respective return lines.
本實施形態之光導波路,係光損失少且使互擾減低等光傳送特性優越。藉此,隨著資料傳送的高速化,可抑制互擾或高頻雜訊之發生、電信號之劣化等。因此,可於各信號處理基板中依高效率傳送資料。又,在超級電腦或大規模伺服器等中亦可依高效率傳送資料。The optical waveguide of the present embodiment is excellent in optical transmission characteristics such as less light loss and reduced mutual interference. Thereby, with the increase in the speed of data transmission, mutual interference, occurrence of high-frequency noise, deterioration of electrical signals, and the like can be suppressed. Therefore, data can be transmitted with high efficiency in each signal processing substrate. In addition, data can be transmitted with high efficiency in supercomputers or large-scale servers.
另外,本發明之製造光導波路的方法並不限於上述方法,亦可使用例如:藉活性放射線之照射線切斷分子鍵結,使折射率改變的方法(光褪色法);使形成核心層之組成物中含有具有可進行光異性化或光二聚化之不飽和鍵的光交聯性聚合物,對其照射活性放射線使分子構造改變並改變折射率的方法(光異性化法、光二聚化法)等方法。Further, the method for producing an optical waveguide of the present invention is not limited to the above method, and for example, a method of cutting a molecular bond by an irradiation line of actinic radiation to change a refractive index (photo-fading method), and forming a core layer may be used. The composition contains a photocrosslinkable polymer having an unsaturated bond capable of photo-metasonation or photodimerization, and is irradiated with active radiation to change the molecular structure and change the refractive index (photo-isomerization method, photodimerization) Method) and other methods.
此等方法中,可配合活性放射線之照射量調整折射率之變化量,故藉由配合目標之折射率分佈W之形狀而使對層各部分所照射之活性放射量之照射量相異,則可形成具有折射率分佈W的核心層。In these methods, the amount of change in the refractive index can be adjusted in accordance with the amount of irradiation of the active radiation. Therefore, by matching the shape of the refractive index distribution W of the target, the irradiation amount of the active radiation amount irradiated to each portion of the layer is different. A core layer having a refractive index distribution W can be formed.
另外,本發明之光導波路之厚度方向的折射率分佈並無特別限定,例如可為步階(SI)型分佈、漸進(GI)型分佈、或與上述折射率分佈W相同的分佈等。Further, the refractive index distribution in the thickness direction of the optical waveguide of the present invention is not particularly limited, and may be, for example, a step (SI) type distribution, a progressive (GI) type distribution, or a distribution similar to the above refractive index distribution W.
接著說明本發明之實施例。Next, an embodiment of the present invention will be described.
水分及氧濃度均控制於1ppm以下,於充滿了乾燥氮之手套箱中,於500mL玻璃瓶中計量己基降烯(HxNB)7.2g(40.1mmol)、二苯基甲基降烯甲氧基矽烷12.9g(40.1mmol),加入脫水甲苯60g與醋酸乙酯11g,被覆矽製之密封材將上部密栓。The water and oxygen concentrations are controlled below 1ppm. In a glove box filled with dry nitrogen, the hexyl reduction is measured in a 500mL glass bottle. Alkene (HxNB) 7.2g (40.1mmol), diphenylmethyl drop 12.9 g (40.1 mmol) of methoxymethoxy decane was added, and 60 g of dehydrated toluene and 11 g of ethyl acetate were added, and the sealing material prepared by coating was kneaded.
接著,於100mL玻璃瓶中計量下述化學式(A)所示之Ni觸媒1.56g(3.2mmol)與脫水甲苯10mL,放入攪拌片並密栓,充分攪拌觸媒使其完全溶解。Next, 1.56 g (3.2 mmol) of the Ni catalyst represented by the following chemical formula (A) and 10 mL of dehydrated toluene were placed in a 100 mL glass vial, and the mixture was placed in a stirring piece and tightly packed, and the catalyst was sufficiently stirred to completely dissolve.
以針筒正確地計量下述化學式(A)所示之Ni觸媒溶液1mL,定量地注入至溶解了上述2種降烯之玻璃瓶中並於室溫下攪拌1小時,結果確認到顯著的黏度上昇。此時打開蓋栓,加入四氫呋喃(THF)60g進行攪拌,得到反應溶液。1 mL of the Ni catalyst solution represented by the following chemical formula (A) was accurately measured by a syringe, and quantitatively injected to dissolve the above two kinds of drops. The mixture was stirred at room temperature for 1 hour in an aluminum glass bottle, and as a result, a significant viscosity increase was confirmed. At this time, the cap plug was opened, and 60 g of tetrahydrofuran (THF) was added and stirred to obtain a reaction solution.
於100mL燒杯中加入醋酸酐9.5g、過氧化氫水18g(濃度30%)、離子交換水30g並攪拌,當場調製過醋酸水溶液。接著將該水溶液全量加入至上述反應溶液中並攪拌12小時,進行Ni之還原處理。9.5 g of acetic anhydride, 18 g of hydrogen peroxide water (concentration: 30%), and 30 g of ion-exchanged water were placed in a 100 mL beaker and stirred, and an aqueous solution of acetic acid was prepared in the field. Next, the entire amount of the aqueous solution was added to the above reaction solution and stirred for 12 hours to carry out a reduction treatment of Ni.
接著,將處理完成之反應溶液移至分液漏斗中,去除下部水層後,加入異丙基醇之30%水溶液100mL並激烈地進行攪拌。予以靜置並完全進行二層分離後去除水層。將該水洗製程重複合計3次後,於過剩之丙酮中滴下油層而使所生成的聚合物再沉澱,藉過濾濾別出濾液後,於設定為60℃之真空乾燥機中進行加熱乾燥12小時,藉此得到聚合物#1。聚合物#1之分子量分佈係藉GPC測定,Mw=10萬、Mn=4萬。又,聚合物#1中之各構造單位的莫耳比係藉NMR之判定,而己基降烯構造單位為50mol%,二苯基甲基降烯甲氧基矽烷構造單位為50mol%。Next, the treated reaction solution was transferred to a separatory funnel, and the lower aqueous layer was removed, and then 100 mL of a 30% aqueous solution of isopropyl alcohol was added thereto and vigorously stirred. The aqueous layer was removed after standing and completely separating the layers. After the water washing process was recombined three times, the oil layer was dropped into excess acetone to reprecipitate the formed polymer, and the filtrate was filtered by filtration, and then dried by heating in a vacuum dryer set at 60 ° C for 12 hours. Thereby, the polymer #1 was obtained. The molecular weight distribution of the polymer #1 was measured by GPC, Mw = 100,000 and Mn = 40,000. Moreover, the molar ratio of each structural unit in the polymer #1 is determined by NMR, and the hexyl group is lowered. The structural unit of the olefin is 50 mol%, and the diphenylmethyl group is lowered. The structural unit of the methoxymethoxydecane is 50 mol%.
[化39][39]
[化40][化40]
於100mL玻璃容器中秤量經精製的上述聚合物#1 10g,於其中加入40g、抗氧化劑Irganox1076(Ciba-Geigy公司製)0.01g、環己基氧雜環丁烷單體(式(20)所示之第1單體,東亞合成製CHOX,CAS#483303-25-9,分子量186,沸點125℃/1.33kPa)2g、聚合起始劑(光酸產生劑)Rhodorsil Photoinitiator 2074(Rhodia公司製,CAS#178233-72-2)(2.50E-2g,醋酸乙酯0.1mL中)並使其均勻溶解後,藉0.2μm之PTFE過濾器進行過濾,得到清淨的核心層形成用組成物。The purified above polymer #1 10g was weighed in a 100 mL glass vessel and added thereto. 40 g, antioxidant Irganox 1076 (manufactured by Ciba-Geigy Co., Ltd.) 0.01 g, cyclohexyloxetane monomer (first monomer represented by formula (20), CHOX manufactured by Toagosei Co., CAS#483303-25-9, Molecular weight 186, boiling point 125 ° C / 1.33 kPa) 2 g, polymerization initiator (photoacid generator) Rhodorsil Photoinitiator 2074 (manufactured by Rhodia, CAS #178233-72-2) (2.50E-2g, ethyl acetate 0.1mL After uniformly dissolving, it was filtered through a 0.2 μm PTFE filter to obtain a clean core layer-forming composition.
於矽晶圓上藉刮刀均勻塗佈感光性降烯樹脂組成物(Promerus公司製Avatrel2000P清漆)後,投入至45℃乾燥機中15分鐘。將溶劑完全去除後,於經塗佈之整面上照射紫外線80mJ,於乾燥機中以120℃加熱1小時,使塗膜硬化,而形成下側包覆層。所形成之下側包覆層的厚度為20μm,呈無色透明。Uniform coating of the photoresist on the wafer The olefin resin composition (Avatrel 2000P varnish manufactured by Promerus Co., Ltd.) was placed in a dryer at 45 ° C for 15 minutes. After the solvent was completely removed, the coated surface was irradiated with ultraviolet rays of 80 mJ, and heated in a dryer at 120 ° C for 1 hour to cure the coating film to form a lower cladding layer. The lower side cladding layer was formed to have a thickness of 20 μm and was colorless and transparent.
於上述下側包覆層上藉刮刀均勻塗佈核心層形成用組成物後,投入至55℃乾燥機中10分鐘。將溶劑完全去除後,壓黏光遮罩並選擇性地依1300mJ/cm2 照射紫外線。去除遮罩,於乾燥機中依150℃進行加熱1.5小時。加熱後,確認到非常鮮明之導波路圖案的出現。又,確認到核心部及側面包覆部之形成。尚且,所形成之光導波路係8根核心部並列形成者。又,將核心部之寬度設為50μm、側面包覆部之寬度設為80μm、核心層厚度設為50μm。The composition for forming a core layer was uniformly applied to the lower cladding layer by a doctor blade, and then placed in a dryer at 55 ° C for 10 minutes. After the solvent was completely removed, the light-shielding mask was masked and selectively irradiated with ultraviolet rays at 1300 mJ/cm 2 . The mask was removed and heated in a dryer at 150 ° C for 1.5 hours. After heating, it was confirmed that a very sharp guide wave pattern appeared. Further, the formation of the core portion and the side cladding portion was confirmed. Furthermore, the eight core portions of the formed optical waveguide system are formed in parallel. Further, the width of the core portion was set to 50 μm, the width of the side cladding portion was set to 80 μm, and the thickness of the core layer was set to 50 μm.
於聚醚碸(PES)薄膜上,將預先以乾燥厚度20μm之方式積層了Avatrel2000P的乾燥薄膜,貼合至上述核心層,投入至設定為140℃之真空層合機中進行熱壓黏。其後,以100mJ全面照射紫外線並於乾燥機中以120℃加熱1小時,使Avatrel2000P硬化,形成上側包覆層,得到光導波路。A dried film of Avatrel 2000P was laminated on a polyether enamel (PES) film in a dry thickness of 20 μm, bonded to the core layer, and placed in a vacuum laminator set at 140 ° C for hot press bonding. Thereafter, the ultraviolet ray was irradiated at 100 mJ in total and heated at 120 ° C for 1 hour in a dryer to cure Avatrel 2000P to form an upper cladding layer, thereby obtaining an optical waveguide.
尚且,由所得之光導波路,切出長度10cm之部分。Further, from the obtained optical waveguide, a portion having a length of 10 cm was cut out.
而且,針對所得之光導波路之核心層的橫剖面,沿著其厚度方向之中心線,使用干涉顯微鏡取得寬度方向的折射率分佈。其結果,折射率分佈具有複數之極小值及極大值,折射率呈連續性變化。Further, with respect to the cross section of the core layer of the obtained optical waveguide, the refractive index distribution in the width direction was obtained using an interference microscope along the center line in the thickness direction. As a result, the refractive index distribution has a minimum value and a maximum value of the complex number, and the refractive index changes continuously.
以下表示使用了干涉顯微鏡之折射率分佈的測定方法。The measurement method using the refractive index distribution of an interference microscope is shown below.
首先,於光導波路之剖面方向上對光導波路進行切片,得到光導波路斷片。以光導波路長度成為200μm~300μm之方式進行切片。接著,於由2個載玻片所包圍之空間中,作成填充折射率1.536的油而成之腔室。在該腔室內的空間中,挾入光導波路斷片而作成測定樣本,並作成未置入光導波路斷片的空白樣本。接著,使用干涉顯微鏡,得到光導波路斷片之剖面方向的干渉紋照片。其後,對干涉紋照片進行影像解析,可得到折射率分佈。於此,干涉紋照片的影像解析係如下述般進行。首先,改變干涉顯微鏡之光路徑長,連續取得改變了干涉紋出現處的影像資料。由複數之影像資料,算出層間方向及層內方向之各測定點的折射率。本實施例中,測定點之間隔設為2.5μm。First, the optical waveguide is sliced in the cross-sectional direction of the optical waveguide to obtain an optical waveguide fragment. The slice was sliced so that the length of the optical waveguide was 200 μm to 300 μm. Next, a chamber filled with oil having a refractive index of 1.536 was formed in a space surrounded by two glass slides. In the space in the chamber, the optical waveguide segment is broken into a measurement sample, and a blank sample is not inserted into the optical waveguide segment. Next, using a interference microscope, a dry crepe photograph of the cross section of the optical waveguide chip was obtained. Thereafter, image analysis of the interference pattern photograph is performed to obtain a refractive index distribution. Here, the image analysis of the interference pattern photograph is performed as follows. First, the length of the light path of the interference microscope is changed, and the image data of the occurrence of the interference pattern is continuously obtained. The refractive index of each measurement point in the interlayer direction and the in-layer direction was calculated from a plurality of image data. In the present embodiment, the interval between the measurement points was set to 2.5 μm.
除了將紫外線照射量提高至1500mJ/cm2 以外,其餘與實施例1同樣地進行而得到光導波路。An optical waveguide was obtained in the same manner as in Example 1 except that the amount of ultraviolet irradiation was increased to 1,500 mJ/cm 2 .
除了將紫外線照射量提高至2000mJ/cm2 ,並將作為聚合物之聚合物#1的各構造單位的莫耳比變更成己基降烯構造單位為40mol%、二苯基甲基降烯甲氧基矽烷構造單位為60mol%以外,其餘與實施例1同樣地進行而得到光導波路。In addition to increasing the amount of ultraviolet irradiation to 2000 mJ/cm 2 , the molar ratio of each structural unit of the polymer #1 as a polymer was changed to a hexyl group. The olefin structural unit is 40 mol%, diphenylmethyl drop An optical waveguide was obtained in the same manner as in Example 1 except that the structural unit of the methoxymethoxydecane was 60 mol%.
除了將紫外線照射量減少至500mJ/cm2 ,並將作為聚合物之聚合物#1的各構造單位的莫耳比變更成己基降烯構造單位為45mol%、二苯基甲基降烯甲氧基矽烷構造單位為55mol%以外,其餘與實施例1同樣地進行而得到光導波路。In addition to reducing the amount of ultraviolet irradiation to 500 mJ/cm 2 , the molar ratio of each structural unit of the polymer #1 as a polymer was changed to a hexyl group. The structural unit of the olefin is 45 mol%, and the diphenylmethyl group is lowered. An optical waveguide was obtained in the same manner as in Example 1 except that the structural unit of the methoxymethoxydecane was 55 mol%.
除了將作為聚合物之聚合物#1的各構造單位的莫耳比變更成己基降烯構造單位為30mol%、二苯基甲基降烯甲氧基矽烷構造單位為70mol%以外,其餘與實施例1同樣地進行而得到光導波路。In addition to changing the molar ratio of each structural unit of polymer #1 as a polymer to a hexyl group The structural unit of the olefin is 30 mol%, and the diphenylmethyl group is lowered. An optical waveguide was obtained in the same manner as in Example 1 except that the structural unit of the methoxymethoxydecane was 70 mol%.
除了將紫外線照射量減少至300mJ/cm2 ,並將作為聚合物之聚合物#1的各構造單位的莫耳比變更成己基降烯構造單位為40mol%、二苯基甲基降烯甲氧基矽烷構造單位為60mol%以外,其餘與實施例1同樣地進行而得到光導波路。In addition to reducing the amount of ultraviolet irradiation to 300 mJ/cm 2 , the molar ratio of each structural unit of the polymer #1 as a polymer was changed to a hexyl group. The olefin structural unit is 40 mol%, diphenylmethyl drop An optical waveguide was obtained in the same manner as in Example 1 except that the structural unit of the methoxymethoxydecane was 60 mol%.
除了將紫外線照射量減少至500mJ/cm2 ,並將作為聚合物之聚合物#1的各構造單位的莫耳比變更成己基降烯構造單位為30mol%、二苯基甲基降烯甲氧基矽烷構造單位為70mol%以外,其餘與實施例1同樣地進行而得到光導波路。In addition to reducing the amount of ultraviolet irradiation to 500 mJ/cm 2 , the molar ratio of each structural unit of the polymer #1 as a polymer was changed to a hexyl group. The structural unit of the olefin is 30 mol%, and the diphenylmethyl group is lowered. An optical waveguide was obtained in the same manner as in Example 1 except that the structural unit of the methoxymethoxydecane was 70 mol%.
除了將紫外線照射量減少至100mJ/cm2 ,並將作為聚合物之聚合物#1的各構造單位的莫耳比變更成己基降烯構造單位為60mol%、二苯基甲基降烯甲氧基矽烷構造單位為40mol%以外,其餘與實施例1同樣地進行而得到光導波路。In addition to reducing the amount of ultraviolet irradiation to 100 mJ/cm 2 , the molar ratio of each structural unit of the polymer #1 as a polymer was changed to a hexyl group. The structural unit of the olefin is 60 mol%, and the diphenylmethyl group is lowered. An optical waveguide was obtained in the same manner as in Example 1 except that the structural unit of the methoxymethoxydecane was 40 mol%.
除了將紫外線照射量提高至1500mJ/cm2 ,並將作為聚合物之聚合物#1的各構造單位的莫耳比變更成己基降烯構造單位為10mol%、二苯基甲基降烯甲氧基矽烷構造單位為90mol%以外,其餘與實施例1同樣地進行而得到光導波路。In addition to increasing the amount of ultraviolet irradiation to 1500 mJ/cm 2 , the molar ratio of each structural unit of the polymer #1 as a polymer was changed to a hexyl group. The structural unit of the olefin is 10 mol%, and the diphenylmethyl group is lowered. An optical waveguide was obtained in the same manner as in Example 1 except that the structural unit of the methoxymethoxydecane was 90 mol%.
除了將紫外線照射量提高至3000mJ/cm2 ,並將作為聚合物之聚合物#1的各構造單位的莫耳比變更成己基降烯構造單位為5mol%、二苯基甲基降烯甲氧基矽烷構造單位為95mol%以外,其餘與實施例1同樣地進行而得到光導波路。In addition to increasing the amount of ultraviolet irradiation to 3000 mJ/cm 2 , the molar ratio of each structural unit of the polymer #1 as a polymer was changed to a hexyl group. The structural unit of the olefin is 5 mol%, and the diphenylmethyl group is lowered. An optical waveguide was obtained in the same manner as in Example 1 except that the structural unit of the methoxymethoxy decane was 95 mol%.
除了使用以下所示方法所製造者作為核心層形成用組成物以外,其餘與實施例1同樣地進行而得到光導波路。An optical waveguide was obtained in the same manner as in Example 1 except that the manufacturer was used as the core layer-forming composition.
於100mL玻璃容器中秤量經精製之上述聚合物#1 10g,於其中加入40g、抗氧化劑Irganox1076(Ciba-Geigy公司製)0.01g、2官能氧雜環丁烷單體(式(15)所示者,東亞合成製,DOX,CAS#18934-00-4,分子量214,沸點119℃/0.67kPa)2g、光酸產生劑Rhodorsil Photoinitiator 2074(Rhodia公司製,CAS#178233-72-2)(1.36E-2g,醋酸乙酯0.1mL中)使其均勻溶解後,藉0.2μm之PTFE過濾器進行過濾,得到清淨之核心層形成用組成物。Weigh the refined polymer #1 10g in a 100mL glass container and add it to it. 40 g, an antioxidant Irganox 1076 (manufactured by Ciba-Geigy Co., Ltd.), 0.01 g, a bifunctional oxetane monomer (manufactured by the formula (15), manufactured by Toagosei Co., Ltd., DOX, CAS #18934-00-4, molecular weight 214, 2 g of a boiling point of 119 ° C / 0.67 kPa), a photoacid generator Rhodorsil Photoinitiator 2074 (manufactured by Rhodia Co., Ltd., CAS #178233-72-2) (1.36E-2 g, ethyl acetate 0.1 mL) was uniformly dissolved, and then 0.2. The μm PTFE filter was filtered to obtain a clean core layer forming composition.
除了使用以下所示方法所製造者作為核心層形成用組成物以外,其餘與實施例1同樣地進行而得到光導波路。An optical waveguide was obtained in the same manner as in Example 1 except that the manufacturer was used as the core layer-forming composition.
於100mL玻璃容器中秤量經精製之上述聚合物#1 10g,於其中加入40g、抗氧化劑Irganox1076(Ciba-Geigy公司製)0.01g、脂環式環氧單體(式(37)所示者,Daicel化學製,CELLOXIDE 2021P,CAS#2386-87-0,分子量252,沸點188℃/4hPa)2g、光酸產生劑Rhodorsil Photoinitiator 2074(Rhodia公司製,CAS#178233-72-2)(1.36E-2g,醋酸乙酯0.1mL中)使其均勻溶解後,藉0.2μm之PTFE過濾器進行過濾,得到清淨之核心層形成用組成物。Weigh the refined polymer #1 10g in a 100mL glass container and add it to it. 40 g, antioxidant Irganox 1076 (manufactured by Ciba-Geigy Co., Ltd.) 0.01 g, alicyclic epoxy monomer (manufactured by formula (37), manufactured by Daicel Chemical Co., Ltd., CELLOXIDE 2021P, CAS #2386-87-0, molecular weight 252, boiling point 2 g of 188 ° C / 4 hPa), a photoacid generator Rhodorsil Photoinitiator 2074 (manufactured by Rhodia Co., Ltd., CAS #178233-72-2) (1.36E-2 g, ethyl acetate 0.1 mL) was uniformly dissolved, and then 0.2 μm was used. The PTFE filter was filtered to obtain a clean core layer-forming composition.
除了使用以下所示方法所製造者作為核心層形成用組成物以外,其餘與實施例1同樣地進行而得到光導波路。An optical waveguide was obtained in the same manner as in Example 1 except that the manufacturer was used as the core layer-forming composition.
於100mL玻璃容器中秤量經精製之上述聚合物#1 10g,於其中加入40g、抗氧化劑Irganox1076(Ciba-Geigy公司製)0.01g、環己基氧雜環丁烷單體(式20所示者,東亞合成製CHOX)1g、脂環式環氧單體(Daicel化學製,CELLOXIDE 2021P)1g、光酸產生劑Rhodorsil Photoinitiator 2074(Rhodia公司製,CAS#178233-72-2)(1.36E-2g,醋酸乙酯0.1mL中)使其均勻溶解後,藉0.2μm之PTFE過濾器進行過濾,得到清淨之核心層形成用組成物。Weigh the refined polymer #1 10g in a 100mL glass container and add it to it. 40 g, an antioxidant Irganox 1076 (manufactured by Ciba-Geigy Co., Ltd.), 0.01 g, a cyclohexyloxetane monomer (shown in Formula 20, CHOX, manufactured by Toagosei Co., Ltd.), 1 g, and an alicyclic epoxy monomer (manufactured by Daicel Chemical Co., Ltd.) CELLOXIDE 2021P) 1g, photoacid generator Rhodorsil Photoinitiator 2074 (manufactured by Rhodia Co., Ltd., CAS #178233-72-2) (1.36E-2g, ethyl acetate 0.1mL) was uniformly dissolved, and filtered by 0.2 μm of PTFE. The device was filtered to obtain a clean core layer forming composition.
除了使用以下所示方法所合成者作為聚合物以外,其餘與實施例1同樣地進行而得到光導波路。An optical waveguide was obtained in the same manner as in Example 1 except that the polymer was synthesized as a polymer by the method shown below.
首先,除了取代二苯基甲基降烯甲氧基矽烷12.9g(40.1mmol),使用苯基二甲基降烯甲氧基矽烷10.4g(40.1mmol)以外,其餘與實施例1同樣地進行而合成聚合物。將所得聚合物之構造單位示於下式(103)。此聚合物之分子量分佈係藉GPC測定,Mw=11萬、Mn=5萬。又,各構造單位的莫耳比係藉NMR之判定,而己基降烯構造單位為50mol%,苯基二甲基降烯甲氧基矽烷構造單位為50mol%。First, in addition to replacing the diphenylmethyl group Ethyl methoxy decane 12.9 g (40.1 mmol) using phenyl dimethyl The polymer was synthesized in the same manner as in Example 1 except that 10.4 g (40.1 mmol) of the methoxymethoxy decane was used. The structural unit of the obtained polymer is shown in the following formula (103). The molecular weight distribution of this polymer was measured by GPC, Mw = 110,000 and Mn = 50,000. Moreover, the Mohr ratio of each structural unit is determined by NMR, and the hexyl group is lowered. The olefin structural unit is 50 mol%, and the phenyl dimethyl group is lowered. The structural unit of the methoxymethoxydecane is 50 mol%.
除了使用以下所示方法所製造者作為核心層形成用組成物,並將核心層形成用組成物藉刮刀均勻塗佈至下側包覆層上後,投入至60℃乾燥機中10分鐘以外,其餘與實施例1同樣地進行而得到光導波路。The core layer forming composition was uniformly applied to the lower cladding layer by a doctor blade, and was put into a 60 ° C dryer for 10 minutes, except that the composition was formed by the method shown below. The same procedure as in Example 1 was carried out to obtain an optical waveguide.
於100mL玻璃容器中秤量經精製之上述聚合物#1 10g,於其中加入40g、抗氧化劑Irganox1076(Ciba-Geigy公司製)0.01g、環己基氧雜環丁烷單體(式(20)所示者,東亞合成製CHOX)2g、光酸產生劑Rhodorsil Photoinitiator 2074(Rhodia公司製,CAS#178233-72-2)(2.72E-2g,醋酸乙酯0.1mL中)使其均勻溶解後,藉0.2μm之PTFE過濾器進行過濾,得到清淨之核心層形成用組成物。Weigh the refined polymer #1 10g in a 100mL glass container and add it to it. 40 g, antioxidant Irganox 1076 (manufactured by Ciba-Geigy Co., Ltd.) 0.01 g, cyclohexyloxetane monomer (shown by formula (20), CHOX manufactured by Toagosei Co., Ltd.) 2 g, photoacid generator Rhodorsil Photoinitiator 2074 (Rhodia Corporation) The system was prepared by uniformly dissolving it in a solution of 2.72E-2g (ethyl acetate, 0.1 mL), and filtering it through a 0.2 μm PTFE filter to obtain a clean core layer-forming composition.
除了將紫外線照射量減少至500mJ/cm2 以外,其餘與實施例15同樣地進行而得到光導波路。An optical waveguide was obtained in the same manner as in Example 15 except that the amount of ultraviolet irradiation was reduced to 500 mJ/cm 2 .
[化41][化41]
除了如下述般進行以外,其餘與實施例1同樣地進行而得到光導波路。An optical waveguide was obtained in the same manner as in Example 1 except that the following was carried out.
首先,形成下側包覆層後,於其上塗佈自聚合物#1省略了環己基氧雜環丁烷單體而成的核心層形成用組成物,予以曝光、加熱而得到核心層。First, after the lower cladding layer is formed, a composition for forming a core layer obtained by omitting a cyclohexyloxetane monomer from the polymer #1 is applied thereon, and exposed and heated to obtain a core layer.
其後,藉由形成上側包覆層,得到光導波路。Thereafter, an optical waveguide is obtained by forming the upper cladding layer.
尚且,於所得之光導波路中,核心部之折射率呈幾乎一定,側面包覆部之折射率亦呈幾乎一定。亦即,所得之光導波路之核心層的折射率分佈成為所謂步階型。Further, in the obtained optical waveguide, the refractive index of the core portion is almost constant, and the refractive index of the side cladding portion is also almost constant. That is, the refractive index distribution of the core layer of the obtained optical waveguide is a so-called step type.
除了使用於曝光時使曝光量連續變化、使穿透率連續變化的光遮罩進行曝光以外,其餘與比較例1同樣地進行而得到光導波路。An optical waveguide was obtained in the same manner as in Comparative Example 1, except that the exposure amount was continuously changed during exposure, and the light transmittance was continuously changed.
尚且,於所得之光導波路中,側面包覆部之折射率呈幾乎一定;另一方面,核心部之折射率由中央部朝周邊呈連續性降低。亦即,所得之光導波路之核心層的折射率分佈成為所謂漸進型。Further, in the obtained optical waveguide, the refractive index of the side cladding portion is almost constant; on the other hand, the refractive index of the core portion is continuously reduced from the central portion toward the periphery. That is, the refractive index distribution of the core layer of the obtained optical waveguide becomes a so-called progressive type.
除了使用於曝光時使曝光量連續變化、使穿透率連續變化的光遮罩進行曝光以外,其餘與比較例1同樣地進行而得到光導波路。An optical waveguide was obtained in the same manner as in Comparative Example 1, except that the exposure amount was continuously changed during exposure, and the light transmittance was continuously changed.
尚且,於所得之光導波路中,折射率分佈具有複數之極小值及極大值,核心部之折射率由中央部朝周邊呈連續性降低,到達極小值;另一方面,側面包覆部中,折射率隨著遠離極小值而呈連續增加。又,極小值中,折射率分佈之形狀形成略V字狀,於其附近之折射率的變化呈不連續。Further, in the obtained optical waveguide, the refractive index distribution has a minimum value and a maximum value of the complex number, and the refractive index of the core portion decreases continuously from the central portion toward the periphery to a minimum value; on the other hand, in the side cladding portion, The refractive index increases continuously as it moves away from the minimum value. Further, in the minimum value, the shape of the refractive index distribution is formed in a substantially V shape, and the change in the refractive index in the vicinity thereof is discontinuous.
針對所得之光導波路之核心層的橫剖面,沿著其厚度方向之中心線,使用干涉顯微鏡,與上述方法同樣地進行而得到折射率分佈。又,所得之折射率分佈係依每個核心部重複同樣的折射率分佈樣式,故由所得之折射率分佈切出一部分,以其作為折射率分佈W。折射率分佈W之形狀係如圖2所示般,呈4個極小值與5個極大值交互排列的形狀。The cross-sectional profile of the core layer of the obtained optical waveguide was carried out in the same manner as the above method using the interference microscope along the center line in the thickness direction thereof to obtain a refractive index distribution. Further, since the obtained refractive index distribution repeats the same refractive index distribution pattern for each core portion, a part of the obtained refractive index distribution is cut out as the refractive index distribution W. The shape of the refractive index distribution W is a shape in which four minimum values and five maximum values are alternately arranged as shown in FIG. 2 .
然後,由所得之折射率分佈W,求得各極小值Ws1、Ws2、Ws3、Ws4及各極大值Wm1、Wm2、Wm3、Wm4、Wm5,並求得包覆部之平均折射率WA。Then, from the obtained refractive index distribution W, the minimum values Ws1, Ws2, Ws3, and Ws4 and the respective maximum values Wm1, Wm2, Wm3, Wm4, and Wm5 are obtained, and the average refractive index WA of the cladding portion is obtained.
另外,於折射率分佈W中,形成於核心部之極大值Wm2、Wm4附近的折射率,係測定具有平均折射率WA以上之值之部分的寬度a[μm],各極小值Ws1、Ws2、Ws3、Ws4附近之折射率,係測定具有未滿平均折射率WA值之部分的寬度b[μm]。Further, in the refractive index distribution W, the refractive index formed in the vicinity of the maximum values Wm2 and Wm4 of the core portion is a width a [μm] of a portion having a value equal to or higher than the average refractive index WA, and each minimum value Ws1, Ws2. The refractive index in the vicinity of Ws3 and Ws4 is a width b [μm] of a portion having a WA value which is less than the average refractive index.
其結果,由各實施例所得之光導波路之折射率分佈W,係分別於其整體中折射率變化呈連續。又,實施例中,涵括第1包覆層、包覆部、包覆層的折射率分佈P為SI型。As a result, the refractive index distribution W of the optical waveguide obtained in each of the examples was continuous in the refractive index change of the whole. Further, in the examples, the refractive index distribution P including the first cladding layer, the cladding portion, and the cladding layer was of the SI type.
另一方面,由比較例1所得之光導波路之折射率分佈,係如上述般為步階型。On the other hand, the refractive index distribution of the optical waveguide obtained in Comparative Example 1 was a step type as described above.
另外,由比較例2所得之光導波路之折射率分佈,係如上述般為漸進型。Further, the refractive index distribution of the optical waveguide obtained in Comparative Example 2 was a progressive type as described above.
再者,由比較例3所得之光導波路的折射率分佈,係於核心部與側面包覆部之間折射率呈不連續變化。Further, the refractive index distribution of the optical waveguide obtained in Comparative Example 3 was such that the refractive index of the core portion and the side cladding portion were discontinuously changed.
將藉850nmVCSEL(面發光雷射)發出之光經由50μmψ之光纖而導入至所得的光導波路,藉200μmψ之光纖進行受光並測定光強度。又,測定時採用回截法。以光導波路之長度方向作為橫軸,以插入損失作為縱軸,而對測定值進行繪圖,結果測定值排列於直線上。藉此,由該直線之斜率算出傳送損失。The light emitted by the 850 nm VCSEL (surface-emitting laser) was introduced into the obtained optical waveguide via a 50 μm-twisted optical fiber, and the light was measured by an optical fiber of 200 μm, and the light intensity was measured. Further, a back-cut method was used for the measurement. The longitudinal direction of the optical waveguide is taken as the horizontal axis, and the insertion loss is taken as the vertical axis, and the measured values are plotted. As a result, the measured values are arranged on a straight line. Thereby, the transmission loss is calculated from the slope of the straight line.
對所得之光導波路,由雷射脈衝光源射入脈衝寬1ns之脈衝信號,測定射出光的脈衝寬。For the obtained optical waveguide, a pulse signal having a pulse width of 1 ns is incident from the laser pulse source, and the pulse width of the emitted light is measured.
然後,針對所測定之射出光的脈衝寬,算出將由比較例1所得之光導波路(步階型之光導波路)之測定值設為1時的相對值,對其依以下評估基準進行評估。Then, the relative value when the measured value of the optical waveguide (step type optical waveguide) obtained in Comparative Example 1 was set to 1 was calculated for the pulse width of the measured emitted light, and was evaluated based on the following evaluation criteria.
◎:脈衝寬之相對值未滿0.5◎: The relative value of the pulse width is less than 0.5
○:脈衝寬之相對值為0.5以上且未滿0.8○: The relative value of the pulse width is 0.5 or more and less than 0.8.
△:脈衝寬之相對值為0.8以上且未滿1△: The relative value of the pulse width is 0.8 or more and less than 1
╳::脈衝寬之相對值為1以上╳:: The relative value of the pulse width is 1 or more
以上,將2.2及2.3之評估結果示於表1。The evaluation results of 2.2 and 2.3 are shown in Table 1.
如表1所示般,可確認到由各實施例所得之光導波路中,相較於由各比較例所得之光導波路,傳送損失及脈衝信號的遲緩分別受到抑制。又,實施例之包覆部中之傳送損失及脈衝信號的遲緩,相較於第1包覆層、包覆部及第2包覆層均具有均勻之折射率時的包覆部,係分別受到抑制。As shown in Table 1, it was confirmed that the optical waveguides obtained in the respective examples were suppressed in transmission loss and pulse signal delay compared to the optical waveguides obtained in the respective comparative examples. Further, in the coating portion of the embodiment, the transmission loss and the delay of the pulse signal are different from those of the first cladding layer, the cladding portion, and the second cladding layer, respectively. Suppressed.
針對所得之光導波路之射出側端面,測定對8個核心部中之一者射入光時之射出光的強度分佈。The intensity distribution of the emitted light when one of the eight core portions was incident on the light was measured for the output side end surface of the obtained optical waveguide.
尚且,射出光之強度分佈之測定係如以下般進行。Further, the measurement of the intensity distribution of the emitted light was carried out as follows.
圖10為用於說明測定光導波路之射出側端面中之射出光強度分佈的方法的圖。FIG. 10 is a view for explaining a method of measuring the intensity distribution of the emitted light in the end surface on the emission side of the optical waveguide.
於圖10所示之方法中,首先,以對測定對象之光導波路1之射入側端面1a之核心部14之一者呈相對向的方式,配置直徑50μm之射入側光纖21。該射入側光纖21係連接至用於使光射入至光導波路1中的發光元件(未圖示),將其光軸與核心部14之光軸配置成一致。In the method shown in FIG. 10, first, the incident side optical fiber 21 having a diameter of 50 μm is disposed so as to face one of the core portions 14 of the incident side end surface 1a of the optical waveguide 1 to be measured. The incident-side optical fiber 21 is connected to a light-emitting element (not shown) for causing light to enter the optical waveguide 1, and its optical axis and the optical axis of the core portion 14 are arranged to coincide with each other.
另一方面,於光導波路1之射出側端面1b上,依與其相對向之方式配置直徑62.5μm的射出側光纖22。該射出側光纖22係連接至用於接受由光導波路1射出之射出光的受光元件(未圖示),其光軸係對準光導波路1之核心層之厚度方向的中心線。然後,將射出側光纖22與射出側端面1b之離間距離維持一定,構成為可對含有該中心線之面內進行掃瞄的構成。On the other hand, on the emission-side end surface 1b of the optical waveguide 1, an emission-side optical fiber 22 having a diameter of 62.5 μm is disposed so as to face the same. The emission side optical fiber 22 is connected to a light receiving element (not shown) for receiving the light emitted from the optical waveguide 1, and its optical axis is aligned with the center line in the thickness direction of the core layer of the optical waveguide 1. Then, the distance between the exit side optical fiber 22 and the emission side end surface 1b is kept constant, and the configuration is such that the inside surface including the center line can be scanned.
然後,由射入側光纖21使光射入至核心部之一者中,並對射出側光纖22進行掃瞄。然後,藉由對射出側光纖22之位置測定由受光元件所測定之射出光強度,則可取得射出光對於射出側端面1b之位置的強度分佈。Then, light is incident on one of the core portions by the incident-side optical fiber 21, and the output-side optical fiber 22 is scanned. Then, by measuring the intensity of the emitted light measured by the light-receiving element on the position of the output-side optical fiber 22, the intensity distribution of the position of the emitted light on the output-side end surface 1b can be obtained.
圖11表示如以上所測定之射出光的強度分佈。又,圖11中,代表性地表示由實施例1、比較例1及比較例2所得之光導波路所測定的射出光之強度分佈。Fig. 11 shows the intensity distribution of the emitted light as measured above. Further, in Fig. 11, the intensity distribution of the emitted light measured by the optical waveguides obtained in Example 1, Comparative Example 1, and Comparative Example 2 is representatively shown.
由圖11可明確確認到,由實施例1所得之光導波路中,互擾均受到充分抑制。又,由實施例1所得之光導波路中,確認到與經光射入之核心部14(圖11之中央的核心部14)相鄰之核心部14中的射出光強度,係小於鄰接於該核心部14之位於上述經光射入之核心部14相反側之側面包覆部15中之射出光強度。此情況推斷係因於實施例1所得之光導波路中,側面包覆部15具有小於核心部14之值的極大值,且折射率分佈呈連續變化,故於習知中漏出至相鄰之核心部14而成為「互擾」的光,集中至側面包覆部15,結果防止了互擾發生。因此,於實施例1所得之光導波路中,可防止頻道間之干擾。As is clear from Fig. 11, in the optical waveguide obtained in the first embodiment, mutual interference is sufficiently suppressed. Further, in the optical waveguide obtained in the first embodiment, it is confirmed that the intensity of the emitted light in the core portion 14 adjacent to the core portion 14 through which the light is incident (the core portion 14 in the center of FIG. 11) is smaller than the adjacent The intensity of the emitted light in the side cladding portion 15 of the core portion 14 on the side opposite to the core portion 14 through which the light is incident. In this case, it is inferred that in the optical waveguide obtained in the first embodiment, the side cladding portion 15 has a maximum value smaller than the value of the core portion 14, and the refractive index distribution changes continuously, so that it leaks to the adjacent core in the prior art. The light that becomes "interference" in the portion 14 is concentrated on the side cladding portion 15, and as a result, mutual interference is prevented from occurring. Therefore, in the optical waveguide obtained in the first embodiment, interference between channels can be prevented.
尚且,實施例1所得之光導波路中,雖觀測到射出光之一部分集中於側面包覆部15的狀況,但通常,連接於光導波路之受光元件係連接成與各核心部14之射出側端面相對向,且不連接於側面包覆部15。因此,即使光集中至側面包覆部15,仍不發生互擾,而抑制干擾。Further, in the optical waveguide obtained in the first embodiment, it is observed that one of the emitted light is concentrated on the side cladding portion 15, but generally, the light receiving elements connected to the optical waveguide are connected to the exit side end faces of the respective core portions 14. It is opposed to each other and is not connected to the side cladding portion 15. Therefore, even if light is concentrated to the side cladding portion 15, mutual interference does not occur, and interference is suppressed.
另外,雖未予以圖示,但在由其他實施例所得之光導波路中,仍與實施例1同樣地充分抑制互擾。Further, although not illustrated, in the optical waveguide obtained by the other embodiments, mutual interference is sufficiently suppressed as in the first embodiment.
另一方面,於比較例1、2所得之光導波路中,在與射入光之核心部14相鄰的核心部14中,存在有射出光之強度分佈之極大值,且觀測到光漏出(互擾)。On the other hand, in the optical waveguides obtained in Comparative Examples 1 and 2, in the core portion 14 adjacent to the core portion 14 of the incident light, there is a maximum value of the intensity distribution of the emitted light, and light leakage is observed ( Mutual interference).
另外,雖未予以圖示,但在由比較例3所得之光導波路中,亦觀測到互擾。Further, although not shown, mutual interference was also observed in the optical waveguide obtained in Comparative Example 3.
將Daicel化學工業(股)製CELLOXIDE2081 20g、ADEKA(股)公司製ADEKA OPTOMER SP-170 0.6g、甲基異丁基酮80g攪拌混合,藉0.2μm孔徑之PTFE過濾器進行過濾而得到清淨且無色透明的包覆溶液E1。CELLOXIDE2081 20g manufactured by Daicel Chemical Industry Co., Ltd., 0.6g of ADEKA OPTOMER SP-170 manufactured by ADEKA Co., Ltd., and 80g of methyl isobutyl ketone were stirred and mixed, and filtered by a PTFE filter having a pore size of 0.2 μm to obtain a clean and colorless product. Transparent coating solution E1.
將新日鐵化學(股)製YP-50S 20g、Daicel化學工業(股)製CELLOXIDE2021P 5g與ADEKA(股)製ADEKA OPTOMER SP-170 0.2g投入至甲基異丁基酮80g中予以攪拌溶解,藉0.2μm孔徑之PTFE過濾器進行過濾,而得到清淨且無色透明之感光性樹脂組成物F1。YP-50S 20g manufactured by Nippon Steel Chemical Co., Ltd., CELLOXIDE 2021P 5g manufactured by Daicel Chemical Industry Co., Ltd., and 0.2 g of ADEKA OPTOMER SP-170 manufactured by ADEKA Co., Ltd. were placed in 80 g of methyl isobutyl ketone, and stirred and dissolved. Filtration was carried out by a PTFE filter having a pore size of 0.2 μm to obtain a clear and colorless transparent photosensitive resin composition F1.
於厚25μm之聚醯亞胺薄膜上藉刮刀均勻塗佈上述包覆溶液E1後,投入至50℃乾燥機中10分鐘。將溶媒完全去除後,藉UV曝光機對整面依500mJ/cm2 照射紫外線,使其硬化而形成無色透明的下層包覆。所得之包覆層厚度為10μm。The coating solution E1 was uniformly applied onto a 25 μm thick polyimine film by a doctor blade, and then placed in a dryer at 50 ° C for 10 minutes. After the solvent was completely removed, the entire surface was irradiated with ultraviolet rays at 500 mJ/cm 2 by a UV exposure machine to be hardened to form a colorless and transparent undercoat. The resulting coating layer had a thickness of 10 μm.
於上述下層包覆上藉刮刀均勻塗佈上述感光性樹脂組成物F1後,投入至50℃乾燥機中10分鐘。將溶劑完全去除後,壓黏於整面上描繪了線50μm、間距50μm之直線圖案的光遮罩,使用平行曝光機依照射量500mJ/cm2 照射紫外線。其後,移除遮罩,投入至150℃烘爐中30分鐘並取出,確認到鮮明的導波路圖案出現。所得核心層之厚度為50μm。The photosensitive resin composition F1 was uniformly applied by the doctor blade on the lower layer coating, and then placed in a dryer at 50 ° C for 10 minutes. After the solvent was completely removed, a light mask having a linear pattern of 50 μm in line and 50 μm in pitch was drawn on the entire surface, and ultraviolet rays were irradiated with a dose of 500 mJ/cm 2 using a parallel exposure machine. Thereafter, the mask was removed, placed in an oven at 150 ° C for 30 minutes, and taken out, and it was confirmed that a clear waveguide pattern appeared. The resulting core layer had a thickness of 50 μm.
於上述核心層上,使用上述包覆溶液E1依與下層包覆相同的條件形成上層包覆。所得之上層包覆的厚度為10μm。On the core layer, the coating solution E1 was used to form an upper layer coating under the same conditions as the under layer coating. The resulting upper layer was coated to a thickness of 10 μm.
於分離燒瓶中投入甲基丙烯酸甲酯20.0g、苄基甲基丙烯酸酯30.0g及甲基異丁基酮450g,予以攪拌混合後,以氮氣置換而得到單體溶液。另一方面,將作為聚合起始劑之偶氮雙異丁腈0.25g溶解於甲基異丁基酮10g中,以氮氣置換而得到起始劑溶液。其後,一邊攪拌上述單體溶液、一邊加熱至80℃,使用針筒將上述起始劑溶液添加至單體溶液中。直接於80℃進行加熱攪拌1小時後,予以冷卻得到聚合物溶液。20.0 g of methyl methacrylate, 30.0 g of benzyl methacrylate, and 450 g of methyl isobutyl ketone were placed in a separation flask, stirred and mixed, and then replaced with nitrogen to obtain a monomer solution. On the other hand, 0.25 g of azobisisobutyronitrile as a polymerization initiator was dissolved in 10 g of methyl isobutyl ketone, and replaced with nitrogen to obtain a starter solution. Thereafter, while stirring the above monomer solution, the mixture was heated to 80 ° C, and the above initiator solution was added to the monomer solution using a syringe. The mixture was heated and stirred at 80 ° C for 1 hour, and then cooled to obtain a polymer solution.
接著,於燒杯準備5L之異丙醇並於常溫下以攪拌機進行攪拌,同時滴下上述聚合物溶液。結束滴下後接著攪拌30分鐘,其後取出沉澱的聚合物,以真空乾燥機於減壓下依60℃乾燥8小時而得到聚合物A1。Next, 5 L of isopropyl alcohol was prepared in a beaker and stirred at a normal temperature with a stirrer while dropping the above polymer solution. After the completion of the dropwise addition, the mixture was stirred for 30 minutes, and then the precipitated polymer was taken out, and dried at 60 ° C for 8 hours under reduced pressure in a vacuum dryer to obtain a polymer A1.
將互應化學工業(股)製之水性丙烯酸酯樹脂溶液RD-180 20g、異丙醇20g及日清紡化學(股)製CARBODILITE V-02-L2 0.4g攪拌混合,藉0.2μm孔徑之PTFE過濾器進行過濾,而得到清淨且無色透明的包覆溶液B1。20 g of water-based acrylate resin solution RD-180, 20 g of isopropyl alcohol and 0.4 g of CARBODILITE V-02-L2 manufactured by Nisshin Chemical Co., Ltd., and a PTFE filter with a pore size of 0.2 μm. Filtration was carried out to obtain a clear and colorless transparent coating solution B1.
將(1)之方法所得的聚合物A1 20g與甲基丙烯酸環己酯5g與BASF Japan(股)製Irgacure651 0.2g,投入至甲基異丁基酮80g中並攪拌溶解,藉0.2μm孔徑之PTFE過濾器進行過濾,得到清淨且無色透明之感光性樹脂組成物C1。20 g of the polymer A1 obtained by the method (1), 5 g of cyclohexyl methacrylate and 0.2 g of Irgacure 651 manufactured by BASF Japan Co., Ltd. were placed in 80 g of methyl isobutyl ketone and stirred and dissolved, and a pore size of 0.2 μm was used. The PTFE filter was filtered to obtain a clear, colorless and transparent photosensitive resin composition C1.
於厚25μm之聚醯亞胺薄膜上藉刮刀均勻塗佈上述包覆溶液B1後,投入至80℃乾燥機中10分鐘。將溶媒完全去除後,進一步投入至150℃烘爐中10分鐘使其硬化,得到無色透明之下層包覆。所得之包覆層厚度為10μm。The coating solution B1 was uniformly applied onto a 25 μm thick polyimine film by a doctor blade, and then placed in a dryer at 80 ° C for 10 minutes. After the solvent was completely removed, it was further poured into an oven at 150 ° C for 10 minutes to be hardened to obtain a colorless transparent underlayer coating. The resulting coating layer had a thickness of 10 μm.
於上述下層包覆上藉刮刀均勻塗佈上述感光性樹脂組成物C1後,投入至50℃乾燥機中10分鐘。將溶劑完全去除後,壓黏於整面上描繪了線50μm、間距50μm之直線圖案的光遮罩,使用平行曝光機依照射量500mJ/cm2 照射紫外線。其後,移除遮罩,投入至150℃之氮乾燥機中30分鐘並取出,確認到鮮明的導波路圖案出現。所得核心層之厚度為50μm。The photosensitive resin composition C1 was uniformly applied by the doctor blade on the lower layer coating, and then placed in a dryer at 50 ° C for 10 minutes. After the solvent was completely removed, a light mask having a linear pattern of 50 μm in line and 50 μm in pitch was drawn on the entire surface, and ultraviolet rays were irradiated with a dose of 500 mJ/cm 2 using a parallel exposure machine. Thereafter, the mask was removed, placed in a nitrogen dryer at 150 ° C for 30 minutes, and taken out, and it was confirmed that a clear waveguide pattern appeared. The resulting core layer had a thickness of 50 μm.
於上述核心層上,使用上述包覆溶液B1依與下層包覆相同的條件形成上層包覆。所得之上層包覆的厚度為10μm。On the core layer, the coating solution B1 was used to form an upper layer coating under the same conditions as the lower layer coating. The resulting upper layer was coated to a thickness of 10 μm.
首先,除了取代苄基甲基丙烯酸酯而使用甲基丙烯酸2-(全氟己基)乙酯以外,其餘與實施例B之(1)同樣地進行而得到所合成之聚合物A2。First, the synthesized polymer A2 was obtained in the same manner as in the above (1) except that 2-(perfluorohexyl)ethyl methacrylate was used instead of the benzyl methacrylate.
以下,除了取代聚合物A1而使用聚合物A2以外,其餘與實施例B同樣地進行而得到光導波路。In the same manner as in Example B, except that the polymer A2 was used instead of the polymer A1, an optical waveguide was obtained.
將藉850nmVCSEL(面發光雷射)發出之光經由50μm徑之光纖,導入至實施例A~C所得的光導波路,藉200μm徑之光纖進行受光並測定光強度。然後,藉回截法測定傳送損失。其後,以導波路長作為橫軸、以插入損失作為縱軸而進行繪圖,結果測定值排列於直線上,由其斜率算出各光導波路之傳送損失均為0.05dB/cm。Light emitted from an 850 nm VCSEL (surface-emitting laser) was introduced into the optical waveguide obtained in Examples A to C through an optical fiber having a diameter of 50 μm, and light was received by an optical fiber having a diameter of 200 μm to measure the light intensity. Then, the transmission loss is determined by the back-cut method. Then, the waveguide length was plotted on the horizontal axis and the insertion loss was plotted on the vertical axis. As a result, the measured values were arranged on a straight line, and the transmission loss of each optical waveguide was calculated to be 0.05 dB/cm from the slope.
另外,實施例A~C中,將折射率分佈之參數變更為與1.之實施例相同,結果得到與2.相同傾向的評估結果。Further, in Examples A to C, the parameters of the refractive index distribution were changed to be the same as those of the example of 1. As a result, the evaluation results of the same tendency as 2. were obtained.
對實施例A~C所得之光導波路,依與2.3相同之方法評估脈衝信號之波形的保持性,結果確認到任一脈衝信號的遲緩均小。With respect to the optical waveguides obtained in Examples A to C, the waveform retention of the pulse signals was evaluated in the same manner as in 2.3, and as a result, it was confirmed that the jitter of any of the pulse signals was small.
另外,實施例A~C中,將折射率分佈之參數變更為與1.之實施例相同,結果得到與2.相同傾向的評估結果。Further, in Examples A to C, the parameters of the refractive index distribution were changed to be the same as those of the example of 1. As a result, the evaluation results of the same tendency as 2. were obtained.
在水分及氧濃度均控制於1ppm以下、被乾燥氮所充滿之手套箱中,於500mL玻璃瓶中計量己基降烯(HxNB)7.2g(40.1mmol)、二苯基甲基降烯甲氧基矽烷12.9g(40.1mmol),加入脫水甲苯60g與醋酸乙酯11g,被覆矽製之密封材將上部密栓。In a glove box filled with dry nitrogen and nitrogen and water concentrations controlled to less than 1 ppm, the hexyl group is measured in a 500 mL glass bottle. Alkene (HxNB) 7.2g (40.1mmol), diphenylmethyl drop 12.9 g (40.1 mmol) of methoxymethoxy decane was added, and 60 g of dehydrated toluene and 11 g of ethyl acetate were added, and the sealing material prepared by coating was kneaded.
接著,於100mL玻璃瓶中計量下式(4)所示之Ni觸媒1.56g(3.2mmol)與脫水甲苯10mL,放入攪拌片並密栓,充分攪拌觸媒使其完全溶解。Next, 1.56 g (3.2 mmol) of the Ni catalyst represented by the following formula (4) and 10 mL of dehydrated toluene were measured in a 100 mL glass vial, placed in a stirring piece, and the mixture was tightly packed, and the catalyst was thoroughly stirred to completely dissolve.
以針筒正確地計量該化學式(A)所示之Ni觸媒溶液1mL,定量地注入至溶解了上述2種降烯之玻璃瓶中並於室溫下攪拌1小時,結果確認到顯著的黏度上昇。此時打開蓋栓,加入四氫呋喃(THF)60g進行攪拌,得到反應溶液。1 mL of the Ni catalyst solution represented by the chemical formula (A) was accurately measured by a syringe, and quantitatively injected to dissolve the above two kinds of drops. The mixture was stirred at room temperature for 1 hour in an aluminum glass bottle, and as a result, a significant viscosity increase was confirmed. At this time, the cap plug was opened, and 60 g of tetrahydrofuran (THF) was added and stirred to obtain a reaction solution.
於100mL燒杯中加入醋酸酐9.5g、過氧化氫水18g(濃度30%)、離子交換水30g並攪拌,調製過醋酸水溶液。接著將該水溶液全量加入至上述反應溶液中並攪拌12小時,進行Ni之還原處理。9.5 g of acetic anhydride, 18 g of hydrogen peroxide water (concentration: 30%), and 30 g of ion-exchanged water were placed in a 100 mL beaker and stirred to prepare an aqueous solution of acetic acid. Next, the entire amount of the aqueous solution was added to the above reaction solution and stirred for 12 hours to carry out a reduction treatment of Ni.
接著,將處理完成之反應溶液移至分液漏斗中,去除下部水層後,加入異丙基醇之30%水溶液100mL並激烈地進行攪拌。予以靜置並完全進行二層分離後去除水層。將該水洗製程重複合計3次後,於過剩之丙酮中滴下油層而使所生成的聚合物再沉澱,藉過濾濾別出濾液後,於設定為60℃之真空乾燥機中進行加熱乾燥12小時,藉此得到於側鏈具有脫離性基之降烯系樹脂A(聚合物#1)。降烯系樹脂A之分子量分佈係藉GPC測定,Mw=10萬、Mn=4萬,降烯系樹脂A中之各構造單位的莫耳比係藉NMR之判定,而己基降烯構造單位為50mol%,二苯基甲基降烯甲氧基矽烷構造單位為50mol%。又,折射率係藉Metricon測定而為1.55(測定波長:633nm)。Next, the treated reaction solution was transferred to a separatory funnel, and the lower aqueous layer was removed, and then 100 mL of a 30% aqueous solution of isopropyl alcohol was added thereto and vigorously stirred. The aqueous layer was removed after standing and completely separating the layers. After the water washing process was recombined three times, the oil layer was dropped into excess acetone to reprecipitate the formed polymer, and the filtrate was filtered by filtration, and then dried by heating in a vacuum dryer set at 60 ° C for 12 hours. Thereby obtaining a drop-off basis in the side chain Alkene resin A (Polymer #1). drop The molecular weight distribution of the olefinic resin A is determined by GPC, Mw = 100,000, Mn = 40,000, The molar ratio of each structural unit in the olefinic resin A is determined by NMR, and the hexyl group is lowered. The structural unit of the olefin is 50 mol%, and the diphenylmethyl group is lowered. The structural unit of the methoxymethoxydecane is 50 mol%. Further, the refractive index was 1.55 (measurement wavelength: 633 nm) as measured by Metricon.
[化42][化42]
[化43][化43]
於100mL玻璃容器中秤量經精製的降烯系樹脂A 10g,於其中加入40g、抗氧化劑Irganox1076(Ciba-Geigy公司製)0.01g、環己基氧雜環丁烷單體(式(20)所示之第1單體,東亞合成製CHOX,CAS#483303-25-9,分子量186,沸點125℃/1.33kPa)2g、光酸產生劑Rhodorsil Photoinitiator 2074(Rhodia公司製,CAS#178233-72-2)(1.36E-2g,醋酸乙酯0.1mL中)並使其均勻溶解後,藉0.2μm之PTFE過濾器進行過濾,調製清淨的核心層用之感光性樹脂組成物清漆V1。Weighed and refined in a 100mL glass container Ethylene resin A 10g, added to it 40 g, antioxidant Irganox 1076 (manufactured by Ciba-Geigy Co., Ltd.) 0.01 g, cyclohexyloxetane monomer (first monomer represented by formula (20), CHOX manufactured by Toagosei Co., CAS#483303-25-9, 2 g of molecular weight 186, boiling point 125 ° C / 1.33 kPa), photoacid generator Rhodorsil Photoinitiator 2074 (manufactured by Rhodia Co., Ltd., CAS #178233-72-2) (1.36E-2 g, ethyl acetate 0.1 mL) and uniformly dissolved Thereafter, the mixture was filtered through a 0.2 μm PTFE filter to prepare a photosensitive resin composition varnish V1 for the clean core layer.
於矽晶圓上藉刮刀均勻塗佈感光性降烯樹脂組成物(Promerus公司製Avatrel2000P清漆)後,投入至45℃乾燥機中15分鐘。將溶劑完全去除後,於經塗佈之整面上照射紫外線100mJ,於乾燥機中以120℃加熱1小時,使塗膜硬化,而形成下層包覆。所形成之下層包覆的厚度為20μm,呈無色透明,折射率為1.52(測定波長:633nm)。Uniform coating of the photoresist on the wafer The olefin resin composition (Avatrel 2000P varnish manufactured by Promerus Co., Ltd.) was placed in a dryer at 45 ° C for 15 minutes. After the solvent was completely removed, the coated surface was irradiated with ultraviolet rays of 100 mJ, and heated at 120 ° C for 1 hour in a dryer to cure the coating film to form a lower layer coating. The underlying layer was formed to have a thickness of 20 μm, was colorless and transparent, and had a refractive index of 1.52 (measurement wavelength: 633 nm).
於上述下層包覆上藉刮刀均勻塗佈調製而得之上述感光性樹脂組成物清漆V1後,投入至45℃乾燥機中15分鐘。將溶劑完全去除後,壓黏光遮罩並選擇性地依500mJ/cm2 照射紫外線。去除遮罩,於乾燥機中依45℃30分鐘、85℃30分鐘、150℃1小時之三階段進行加熱。加熱後,確認到出現了非常鮮明之導波路圖案的核心層。The photosensitive resin composition varnish V1 obtained by uniformly coating and coating the lower layer coating with a doctor blade was placed in a dryer at 45 ° C for 15 minutes. After the solvent was completely removed, the light-shielding mask was masked and selectively irradiated with ultraviolet rays at 500 mJ/cm 2 . The mask was removed and heated in a dryer at 30 ° C for 30 minutes, 85 ° C for 30 minutes, and 150 ° C for 1 hour. After heating, it was confirmed that a core layer having a very distinct waveguide pattern appeared.
於聚醚碸(PES)薄膜上,將預先以乾燥厚度20μm之方式積層感光性降烯樹脂組成物(Promerus公司製Avatrel2000P清漆),得到上層包覆用薄膜。On the polyether enamel (PES) film, the photosensitive layer is preliminarily deposited in a dry thickness of 20 μm. The olefin resin composition (Avatrel 2000P varnish manufactured by Promerus Co., Ltd.) was used to obtain a film for coating an upper layer.
將形成於下層包覆層上之核心層、與上述上層包覆用薄膜貼合,投入至設定為140℃之真空層合機中進行熱壓黏後,以100mJ全面照射紫外線並於乾燥機中以120℃加熱1小時,使Avatrel2000P硬化,形成上層包覆,得到光導波路。The core layer formed on the lower cladding layer is bonded to the film for coating the upper layer, and is placed in a vacuum laminator set at 140 ° C for thermal compression bonding, and then irradiated with ultraviolet rays at 100 mJ in a dryer. After heating at 120 ° C for 1 hour, Avatrel 2000P was hardened to form an upper layer coating to obtain an optical waveguide.
確認到比較例4之光導波路之核心層的層內方向之折射率分佈並非W型。It was confirmed that the refractive index distribution in the in-layer direction of the core layer of the optical waveguide of Comparative Example 4 was not W-type.
本實施形態包括以下者。This embodiment includes the following.
第1凹部之頂部的折射率可小於包覆部之平均折射率。The refractive index of the top of the first recess may be smaller than the average refractive index of the cladding portion.
折射率分佈W可於第1核心部與包覆部之邊界附近以外具有第2凸部之頂部。The refractive index distribution W may have a top portion of the second convex portion other than the vicinity of the boundary between the first core portion and the cladding portion.
折射率分佈W可於包覆部之中心部具有第2凸部之頂部,且由第2凸部之頂部起朝向第1凹部具有折射率呈連續性降低的區域。折射率分佈T中之第1核心部與第1包覆層之折射率差,可大於折射率分佈W中之第1凹部之頂部與第1凸部之頂部的折射率差。於此,作為頂部之折射率,可使用極大值或平坦部之中央部的折射率。The refractive index distribution W may have a top portion of the second convex portion at the center portion of the cladding portion, and a region in which the refractive index is continuously reduced from the top of the second convex portion toward the first concave portion. The refractive index difference between the first core portion and the first cladding layer in the refractive index distribution T may be larger than the refractive index difference between the top portion of the first concave portion and the top portion of the first convex portion in the refractive index distribution W. Here, as the refractive index of the top portion, a maximum value or a refractive index at the central portion of the flat portion can be used.
可具有設置成穿越第1核心部及第1包覆層的空孔,藉該空孔之內面,構成使於上述核心部所傳送之光進行反射的反射面。The hole may be provided to pass through the first core portion and the first cladding layer, and the inner surface of the hole may constitute a reflection surface for reflecting the light transmitted by the core portion.
第1凹部之頂部之折射率與包覆部中之平均折射率的差,可為第1凹部之頂部之折射率與第1凸部之頂部之折射率的差的3~80%。The difference between the refractive index at the top of the first concave portion and the average refractive index in the cladding portion may be 3 to 80% of the difference between the refractive index at the top of the first concave portion and the refractive index at the top of the first convex portion.
第1凹部之頂部之折射率與第1凸部之頂部之折射率的折射率差,可為0.005~0.07。The difference in refractive index between the refractive index at the top of the first concave portion and the refractive index at the top of the first convex portion may be 0.005 to 0.07.
折射率分佈W中,將第1凸部之折射率具有包覆部中之平均折射率以上之值的部分的寬度設為a[μm],並將第1凹部之折射率具有未滿包覆部中之平均折射率之值的寬度設為b[μm]時,b可為0.01a~1.2a。In the refractive index distribution W, the width of the portion where the refractive index of the first convex portion has a value equal to or greater than the average refractive index in the coating portion is a [μm], and the refractive index of the first concave portion is not covered. When the width of the value of the average refractive index in the portion is b [μm], b may be 0.01a to 1.2a.
再者,包括下述之本實施形態。Furthermore, the present embodiment described below is included.
(1)一種光導波路,係具有核心部、及與該核心部之至少兩側面鄰接之包覆部者,其特徵為,該光導波路之橫剖面之折射率分佈,係具有至少2個極小值、至少1個第1極大值、與小於上述第1極大值之至少2個第2極大值,且具有此等係依第2極大值、極小值、第1極大值、極小值、第2極大值之順序排列的區域;此區域中,包括上述第1極大值而由上述2個極小值所挾持的區域為上述核心部,自上述各極小值起至上述第2極大值側的區域為上述包覆部;上述各極小值係未滿上述包覆部中之平均折射率,且於上述折射率分佈整體中折射率呈連續性變化。(1) An optical waveguide having a core portion and a cladding portion adjacent to at least two side surfaces of the core portion, wherein the refractive index distribution of the optical waveguide has a minimum refractive index distribution of at least two minimum values At least one first maximum value and at least two second maximum values smaller than the first maximum value, and having the second maximum value, the minimum value, the first maximum value, the minimum value, and the second maximum a region in which the values are sequentially arranged; wherein the region including the first maximum value and held by the two minimum values is the core portion, and the region from the minimum value to the second maximum value side is The coating portion; each of the minimum values is less than an average refractive index in the coating portion, and the refractive index changes continuously in the entire refractive index distribution.
(2)如(1)之光導波路,其中,上述折射率分佈中,在對應上述包覆部之區域中,上述第2極大值位於與上述核心部間之界面附近以外。(2) The optical waveguide of (1), wherein, in the refractive index distribution, the second maximum value is located outside the interface between the core portion and the region corresponding to the cladding portion.
(3)如(2)之光導波路,其中,上述折射率分佈中,在對應上述包覆部之區域中,上述第2極大值位於該區域之中心部,且折射率依自上述第2極大值起朝向上述極小值呈連續降低的方式變化。(3) The optical waveguide of (2), wherein, in the refractive index distribution, in the region corresponding to the covering portion, the second maximum value is located at a central portion of the region, and the refractive index is from the second maximum The value changes in such a manner that the above-mentioned minimum value continuously decreases.
(4)如(1)至(3)中任一項之光導波路,其中,上述極小值與上述包覆部中之平均折射率的差,係上述極小值與上述第1極大值之差的3~80%。(4) The optical waveguide of any one of (1) to (3), wherein a difference between the minimum value and an average refractive index in the coating portion is a difference between the minimum value and the first maximum value 3~80%.
(5)如(4)之光導波路,其中,上述極小值與上述第1極大值之折射率差為0.005~0.07。(5) The optical waveguide of (4), wherein a difference in refractive index between the minimum value and the first maximum value is 0.005 to 0.07.
(6)如(1)至(5)中任一項之光導波路,其中,以上述橫剖面之位置作為橫軸,以上述橫剖面之折射率作為縱軸時,上述折射率分佈係於上述第1極大值附近朝上形成凸之略U字狀,於上述極小值附近朝下形成凸之略U字狀。(6) The optical waveguide according to any one of (1) to (5) wherein, when the position of the cross section is the horizontal axis and the refractive index of the cross section is the vertical axis, the refractive index distribution is A convex U-shape is formed in the vicinity of the first maximum value, and a convex U-shape is formed downward in the vicinity of the minimum value.
(7)如(1)至(6)中任一項之光導波路,其中,上述折射率分佈中,將上述第1極大值附近之折射率具有上述包覆部中之平均折射率以上之值的部分的寬度設為a[μm],並將上述極小值附近之折射率具有未滿上述包覆部中之平均折射率之值的寬度設為b[μm]時,b為0.01a~1.2a。(A) The optical waveguide of any one of (1) to (6), wherein, in the refractive index distribution, a refractive index in the vicinity of the first maximum value has a value equal to or greater than an average refractive index in the coating portion. When the width of the portion is set to a [μm], and the width of the refractive index in the vicinity of the minimum value is less than the value of the average refractive index in the cladding portion, b [μm], b is 0.01a to 1.2. a.
(8)如(1)至(7)中任一項之光導波路,其中,該光導波路係具有複數之上述核心部、分別鄰接至該各核心部之至少兩側面的上述包覆部。The optical waveguide of any one of (1) to (7), wherein the optical waveguide has a plurality of core portions and the cladding portions adjacent to at least two side faces of the core portions.
(9)如(1)至(8)中任一項之光導波路,其中,上述核心部係由降烯系樹脂所構成。(9) The optical waveguide of any one of (1) to (8), wherein the core portion is lowered It is composed of an olefinic resin.
(10)一種電子機器,其特徵為具備上述(1)至(9)中任一項之光導波路。(10) An electronic device comprising the optical waveguide of any one of (1) to (9) above.
此申請案係主張以平成22年8月27日申請之日本專利申請特願2010-191293為基礎的優先權,並將其所有揭示內容引用於此。Priority is claimed on the basis of Japanese Patent Application No. 2010-191293, filed on Jan. 27, 2011, the entire disclosure of which is incorporated herein.
1...光導波路1. . . Optical waveguide
1a...射入側端面1a. . . Injection side end face
1b...射出側端面1b. . . Injection side end face
2...支撐薄膜2. . . Support film
3...覆蓋薄膜3. . . Cover film
11、12...包覆層11,12. . . Coating
13...核心層13. . . Core layer
14...核心部14. . . Core department
15...包覆部15. . . Covering part
21...射入側光纖twenty one. . . Injection side fiber
22...射出側光纖twenty two. . . Injection side fiber
141、142...核心部141, 142. . . Core department
151、152、153...側面包覆部151, 152, 153. . . Side cladding
900...核心層形成用組成物900. . . Core layer forming composition
910...層910. . . Floor
915...聚合物915. . . polymer
920...添加劑920. . . additive
925...照射區域925. . . Irradiated area
930...活性放射線930. . . Active radiation
935...遮罩935. . . Mask
9351...開口(窗)9351. . . Opening (window)
940...未照射區域940. . . Unirradiated area
951...支撐基板951. . . Support substrate
952...支撐基板952. . . Support substrate
圖1為表示本發明之光導波路之實施形態(一部分切除及穿透表示)的斜視圖。BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a perspective view showing an embodiment (partially cut and penetrated) of an optical waveguide of the present invention.
圖2為表示圖1所示之X-X線剖面圖中,以核心層厚度之中心線的位置作為橫軸,以折射率作為縱軸時之折射率分佈之一例的模式圖。FIG. 2 is a schematic view showing an example of a refractive index distribution when the position of the center line of the thickness of the core layer is the horizontal axis and the refractive index is the vertical axis in the X-X line cross-sectional view shown in FIG. 1 .
圖3為表示光入射至圖1所示之光導波路之核心部之一時,射出光之強度分佈之一例的圖。Fig. 3 is a view showing an example of an intensity distribution of emitted light when light is incident on one of the core portions of the optical waveguide shown in Fig. 1;
圖4為用於說明圖1所示光導波路之第1製造方法的圖。Fig. 4 is a view for explaining a first manufacturing method of the optical waveguide shown in Fig. 1;
圖5為用於說明圖1所示光導波路之第1製造方法的圖。Fig. 5 is a view for explaining a first manufacturing method of the optical waveguide shown in Fig. 1;
圖6為用於說明圖1所示光導波路之第1製造方法的圖。Fig. 6 is a view for explaining a first manufacturing method of the optical waveguide shown in Fig. 1;
圖7為用於說明圖1所示光導波路之第1製造方法的圖。Fig. 7 is a view for explaining a first manufacturing method of the optical waveguide shown in Fig. 1;
圖8為用於說明圖1所示光導波路之第1製造方法的圖。Fig. 8 is a view for explaining a first manufacturing method of the optical waveguide shown in Fig. 1;
圖9為用於說明在照射區域與未照射區域之間產生折射率差之情況的圖,係表示以層之橫剖面的位置作為橫軸、以橫剖面之折射率作為縱軸時之折射率分佈的圖。FIG. 9 is a view for explaining a case where a refractive index difference is generated between an irradiation region and a non-irradiation region, and is a refractive index when the position of the cross section of the layer is the horizontal axis and the refractive index of the cross section is the vertical axis. Distributed map.
圖10為用於說明測定光導波路之射出側端面中之射出光強度分佈的方法的圖。FIG. 10 is a view for explaining a method of measuring the intensity distribution of the emitted light in the end surface on the emission side of the optical waveguide.
圖11為表示實施例1、比較例1及比較例2所得之光導波路之射出側端面中之射出光強度分佈的圖。FIG. 11 is a view showing the intensity distribution of the emitted light in the end surface on the emission side of the optical waveguide obtained in Example 1, Comparative Example 1, and Comparative Example 2. FIG.
1...光導波路1. . . Optical waveguide
2...支撐薄膜2. . . Support film
3...覆蓋薄膜3. . . Cover film
11...包覆層11. . . Coating
12...包覆層12. . . Coating
13...核心層13. . . Core layer
14...核心部14. . . Core department
15...包覆部15. . . Covering part
141...核心部141. . . Core department
142...核心部142. . . Core department
151...側面包覆部151. . . Side cladding
152...側面包覆部152. . . Side cladding
153...側面包覆部153. . . Side cladding
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JP2005300652A (en) * | 2004-04-07 | 2005-10-27 | Hitachi Chem Co Ltd | Optical waveguide and its manufacturing method |
US20060127022A1 (en) * | 2004-12-09 | 2006-06-15 | Tae Hong Kim | Planar optical waveguide and method of fabricating the same |
WO2008105404A1 (en) * | 2007-02-27 | 2008-09-04 | Keio University | Polymer parallel optical waveguide and its manufacturing method |
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