WO2012026133A1 - Optical waveguide and electronic device - Google Patents

Optical waveguide and electronic device Download PDF

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Publication number
WO2012026133A1
WO2012026133A1 PCT/JP2011/004771 JP2011004771W WO2012026133A1 WO 2012026133 A1 WO2012026133 A1 WO 2012026133A1 JP 2011004771 W JP2011004771 W JP 2011004771W WO 2012026133 A1 WO2012026133 A1 WO 2012026133A1
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WO
WIPO (PCT)
Prior art keywords
refractive index
optical waveguide
core
cladding
layer
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PCT/JP2011/004771
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French (fr)
Japanese (ja)
Inventor
森 哲也
公雄 守谷
Original Assignee
住友ベークライト株式会社
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Publication of WO2012026133A1 publication Critical patent/WO2012026133A1/en

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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/122Basic optical elements, e.g. light-guiding paths
    • G02B6/1221Basic optical elements, e.g. light-guiding paths made from organic materials
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13Integrated optical circuits characterised by the manufacturing method
    • G02B6/138Integrated optical circuits characterised by the manufacturing method by using polymerisation

Definitions

  • the present invention relates to an optical waveguide and an electronic device.
  • optical waveguides have become widespread as means for guiding an optical carrier wave from one point to another point with respect to an optical communication technology for transferring data using the optical carrier wave.
  • the optical waveguide has a linear core part and a clad part provided so as to cover the periphery thereof.
  • Patent Document 1 describes an optical waveguide in which a refractive index adjusting agent is diffused in a polymer substrate so that the refractive index of a core portion is distributed concentrically in a cross section.
  • the refractive index of the cladding part covering the periphery of the core part is constant.
  • the core part is made of a material that is substantially transparent to the light of the optical carrier wave
  • the cladding part is made of a material having a refractive index lower than that of the core part.
  • crosstalk may occur between adjacent core portions.
  • the present invention includes the following.
  • a first cladding layer A core layer provided on the first clad layer and having a clad part, a first core part, a clad part, a second core part, and a clad part provided in the in-layer direction in this order;
  • a second cladding layer provided on the core layer;
  • the refractive index distribution W in the in-layer direction of the first core portion and the portion extending to the clad portion is continuously changed, and the first convex portion, the first concave portion, and the first concave portion Has a region lined up in the order of the two convex portions,
  • the refractive index distribution W located in the first core portion has the first convex portion
  • the refractive index distribution W located in the clad portion has the second convex portion having a maximum refractive index smaller than that of the first convex portion,
  • Optical waveguide [2] In the optical waveguide according to [1], An optical waveguide in which a refractive index distribution T in an interlayer direction in a portion extending from the first cladding layer and the first core portion is different from the refractive index distribution W. [3] In the optical waveguide according to [1] or [2], The difference in refractive index between the maximum value of the refractive index of the first core part and the maximum value of the refractive index of the first cladding layer is the maximum value of the refractive index of the first core part and the maximum value of the refractive index of the cladding part. The optical waveguide is larger than the refractive index difference.
  • the second core layer is an optical waveguide having a third core portion located in an interlayer direction of the first core portion.
  • the optical waveguide has a refractive index at the top of the first recess that is smaller than an average refractive index in the cladding.
  • the refractive index distribution W is an optical waveguide having a top portion of the second convex portion in addition to the vicinity of the interface between the first core portion and the cladding portion.
  • the refractive index distribution W has a top portion of the second convex portion at the center portion of the cladding portion, and is continuously refracted from the top portion of the second convex portion toward the first concave portion.
  • the difference between the refractive index of the top of the first recess and the average refractive index of the cladding is 3 of the difference between the refractive index of the top of the first recess and the refractive index of the top of the first projection.
  • Optical waveguide that is ⁇ 80%.
  • An optical waveguide wherein b is 0.01a to 1.2a, where b is a width having a value less than the average refractive index in the cladding portion.
  • An optical waveguide having a core part and a cladding part adjacent to at least both side surfaces of the core part, The refractive index profile of the cross section of the optical waveguide has at least two minimum values, at least one first maximum value, and at least two second maximum values smaller than the first maximum value.
  • 1 is a perspective view showing an embodiment of an optical waveguide of the present invention (partially cut out and shown through).
  • 1 is a diagram schematically showing an example of a refractive index distribution when the horizontal axis indicates the position of the core layer thickness along the center line and the vertical axis indicates the refractive index. is there. It is a figure which shows an example of intensity distribution of the emitted light when light injects into one of the core parts of the optical waveguide shown in FIG. It is a figure for demonstrating the 1st manufacturing method of the optical waveguide shown in FIG. It is a figure for demonstrating the 1st manufacturing method of the optical waveguide shown in FIG. It is a figure for demonstrating the 1st manufacturing method of the optical waveguide shown in FIG. It is a figure for demonstrating the 1st manufacturing method of the optical waveguide shown in FIG.
  • FIG. 1 is a perspective view showing a first embodiment of the optical waveguide of the present invention (partially cut out and shown in a transparent manner), and FIG. 2 is a horizontal axis of the cross-sectional view taken along the line XX shown in FIG.
  • FIG. 3 shows an example of the refractive index distribution when the position of the core layer in the center line is taken and the vertical axis indicates the refractive index.
  • FIG. 3 shows one of the core portions of the optical waveguide shown in FIG. It is a figure which shows an example of intensity distribution of the emitted light when light injects.
  • the upper side in FIG. 1 is referred to as “upper” and the lower side is referred to as “lower”.
  • the thickness direction of the layers is exaggerated.
  • the optical waveguide of the first embodiment includes a first cladding layer (cladding layer 11), a core layer (core layer 13), and a second cladding layer (cladding layer 12).
  • the core layer (core layer 13) is provided on the clad layer 11, and the clad part, the first core part (core part 14), the clad part (clad part 15), and the second core provided in the in-layer direction. It has a part (core part 14) and a clad part in this order.
  • the second cladding layer is provided on the core layer.
  • the refractive index distribution W in the in-layer direction of the first core part (core part 14) and the part extending over the cladding part (clad part 15) is continuously changing, and the first convex part, It means one having a region arranged in the order of the first concave portion and the second convex portion.
  • Such a refractive index distribution is referred to as a “W-type refractive index distribution”.
  • the refractive index distribution W located in the first core portion has a first convex portion.
  • the refractive index distribution W located in the cladding portion has a second convex portion having a maximum refractive index smaller than that of the first convex portion.
  • the refractive index distribution T in the interlayer direction in the portion extending over the first cladding layer (cladding layer 11) and the first core portion (core portion 14) may have various refractive index distributions.
  • the refractive index distribution P in the interlayer direction of the portion extending over the first cladding layer (cladding layer 11), the cladding portion (cladding portion 15) and the second cladding layer (cladding layer 12) is at least located in the first cladding layer. And the portion located in the cladding portion are different.
  • the refractive index distribution P may change continuously or discontinuously.
  • the refractive index distribution P has a refractive index pattern similar to that of the refractive index distribution T, for example. That is, in the refractive index distribution P, it is preferable that the region located in the cladding portion has the fifth convex portion.
  • the region located in the first cladding layer has a sixth convex portion.
  • the refractive index distribution P has a third concave portion between the fifth convex portion and the sixth convex portion.
  • the maximum refractive index or the average refractive index of the region located in the cladding part is preferably higher than the maximum refractive index or the average refractive index located in the first cladding layer.
  • the laminated structure of the first cladding layer having the refractive index distribution P, the cladding portion of the core layer, and the second cladding layer is composed of the first cladding layer having the refractive index distribution T and the core portion of the core layer. It can be formed in the same process as the laminated structure of the second cladding layer.
  • the refractive index distribution P may be the same as the refractive index distribution T (for example, all of the six vertical and horizontal diagonal directions on the plane in the refractive index distribution extending from the core portion to the adjacent cladding portion (cladding) layer). May be different from each other).
  • the different refractive index distributions means that (i) the shape of the refractive index distribution is different, or (ii) the shape of the refractive index distribution is the same pattern and the refractive index values are different. (However, manufacturing variations may be considered the same).
  • the refractive index difference in the interlayer direction between the adjacent first core part and the cladding layer may be different from the refractive index difference in the in-layer direction between the adjacent first core part and the cladding part.
  • the refractive index distribution P has, for example, any pattern of “step index type (hereinafter referred to as SI type)”, “graded index type (hereinafter referred to as GI type)”, and W type.
  • the SI type refractive index distribution T means that the refractive index is substantially constant in each of the core layer and the cladding layer, and the refractive index is discontinuous at the boundary between the core layer and the cladding layer.
  • the GI-type refractive index distribution P means that the refractive index is continuous from the inside of the cladding part to the first cladding layer.
  • the refractive index distribution change is caused, for example, by the fact that the interlayer movement component diffuses and moves between the layers, and the composition of the material in the stacking direction continuously changes.
  • the refractive index distribution P has the following first to third aspects.
  • the first to third aspects correspond to SI type, GI type, and W type, respectively.
  • the refractive index distribution P in the interlayer direction in the portion extending between the first cladding layer and the cladding portion changes discontinuously at the interface between the first cladding layer and the cladding portion.
  • the refractive index distribution P in the interlayer direction in the portion extending between the first cladding layer and the cladding portion continuously changes.
  • the refractive index distribution P in the interlayer direction of the portion extending between the first clad layer and the clad portion is continuously changing, and the fifth convex portion, the third concave portion, the sixth convex portion,
  • the refractive index distribution P located in the clad has a fifth convex portion, and the refractive index distribution P located in the first clad layer is more than the fifth convex portion.
  • the refractive index distribution in the in-layer direction of the core layer is the W type
  • the refractive index distribution in the interlayer direction of the cladding portion is, for example, SI type, GI type, It is selected from either W type.
  • the first effect is that high optical transmission characteristics can be realized.
  • the first concave portion is formed at the end portion, so that the refractive index difference between the central portion and the end portion of the core portion becomes large.
  • crosstalk between core parts adjacent in the in-layer direction is suppressed.
  • Even if light leaks from the core portion, the leaked light can be confined to the second convex portion of the cladding portion. Thereby, crosstalk between core parts adjacent in the in-layer direction is suppressed.
  • the second effect is that a light confinement effect is obtained in the interlayer direction of the clad portion.
  • the refractive index changes from the cladding part to the cladding layer. For this reason, it becomes possible to confine light in a clad part or a clad layer.
  • the light confinement effect of the layer having a continuous refractive index distribution is very excellent compared to the SI type refractive index distribution. As a result, the occurrence of optical transmission defects is effectively suppressed, and high optical transmission characteristics can be realized. The reason for this is not necessarily clear, but it is considered that when a clad portion having a GI type refractive index profile is provided, the penetration of light from the core layer is effectively suppressed.
  • the third effect is that a design capable of reducing optical loss is possible depending on the usage mode. It is possible to design the refractive index distribution T in the interlayer direction to be different from the refractive index distribution W in the in-layer direction with the first core portion as a base point. For example, by making the refractive index difference in the interlayer direction larger than the refractive index difference in the in-layer direction, it is possible to reduce optical loss when the optical waveguide film is bent or rolled up in the extending direction of the optical waveguide. . This will be described in detail. If the film is bent in a predetermined direction, the film may be stretched and the refractive index difference may be reduced. On the other hand, even if the refractive index difference is reduced by increasing the refractive index difference in the direction in which the film is bent in advance, the optical loss can be reduced.
  • the fourth effect is high design freedom.
  • the optical waveguide of the present embodiment is obtained by laminating films, for example. For this reason, the thickness of the cladding layer is arbitrarily determined in relation to the thickness of the core layer. Further, since the thickness can be controlled, effects such as reduction of optical coupling loss can be enhanced.
  • the refractive index distribution of the present embodiment is measured and specified from the cross section of the optical waveguide in the direction orthogonal to the extending direction of the optical waveguide (for example, the extending direction of the first core portion).
  • the present invention is not limited to this mode, and may have five layers, seven layers or more.
  • one or more second core layers may be stacked on the first core layer. Any one of the core layers is preferably sandwiched between clad layers.
  • the optical waveguide of the present embodiment is provided on the second cladding layer, and may include a second core layer that is a separate member from the core layer.
  • the second core layer has a third core portion located in the interlayer direction of the first core portion.
  • the optical waveguide of the present embodiment may include a plurality of core portions spaced in the in-layer direction and a plurality of core portions spaced in the interlayer direction.
  • a plurality of core portions may be arranged in a lattice shape in the cross section of the optical waveguide.
  • films are laminated. Since the positional deviation of the center of the core part in the interlayer direction is reduced, the optical coupling defect is reduced.
  • the optical waveguide of this Embodiment forms a core part by energy irradiation, for example. Since the misalignment of the core part in the interlayer direction is reduced, the optical coupling defect is reduced.
  • the refractive index distribution in the in-layer direction of the core layer may be such that a part of the region between at least two adjacent core parts is W-type, and regions located on both sides of the core part may be W-type, All the regions may be W-shaped.
  • the W-type refractive index distribution repeated in the in-layer direction may be different for each repeating unit.
  • the refractive index distribution in the interlayer direction of the core portion may be that the region extending at least between the core portion and the upper clad layer (or lower clad portion) is the refractive index distribution T, and the regions located on both sides of the core portion are the refractive index distribution. T may be sufficient, and refractive index distribution T may be repeated in all the area
  • the refractive index distribution T repeated in the interlayer direction may be different for each repeating unit.
  • the refractive index distribution in the interlayer direction of the cladding part may be different at least between the first cladding part and the cladding part, but between the first cladding part and the cladding part and between the second cladding part and the cladding part. May be different.
  • the refractive index distribution P repeated in the interlayer direction may be different for each repeating unit.
  • the difference in refractive index may be, for example, the difference between the maximum value of the first core part and the maximum value of the cladding part, or the difference between the average value of the first core part and the average value of the cladding part.
  • Continuous changing the refractive index distribution means that, for example, a transition region in which the refractive index gradually changes is provided in a region near the interface between the cladding layer and the core layer.
  • the function form representing the continuous change in the refractive index with respect to the thickness direction can take various forms, and examples thereof include a spline function and an exponential function. In the present embodiment, for example, the refractive index between the convex portion and the concave portion changes continuously.
  • the convex portion (first convex portion to sixth convex portion) of the refractive index distribution has either an aspect in which the top portion has a maximum value or an aspect in which the top portion has a flat portion.
  • the concave portions (first concave portion to third concave portion) of the refractive index distribution have both an aspect in which the top has a minimum value and an aspect in which the top has a flat portion.
  • the first core portion is a region from the maximum value of the first convex portion to the minimum value of the first concave portion
  • the cladding portion is a region from the minimum value of the first concave portion to the maximum value of the second concave portion. Also good. Moreover, it may replace with the maximum value or the minimum value, and may employ
  • the width of the flat portion is not particularly limited, but for example, is preferably 100 ⁇ m or less, more preferably 20 ⁇ m or less, and even more preferably 10 ⁇ m or less.
  • the refractive index distribution of the present embodiment is, for example, (1) a method of observing a refractive index-dependent interference fringe using an interference microscope (dual-beam interference microscope) and calculating the refractive index distribution from the interference fringe. Or (2) It becomes possible to measure by the refraction near field method (Refracted Near Field method; RNF).
  • the refraction near field method can employ the measurement conditions described in JP-A-5-332880. In the embodiment, since the measurement is simple, a method using an interference microscope is preferable.
  • an optical waveguide piece is obtained by slicing the optical waveguide in the cross-sectional direction of the optical waveguide. For example, the optical waveguide is sliced so that the length is 200 ⁇ m to 300 ⁇ m.
  • a chamber filled with oil having a refractive index of 1.536 is created in a space surrounded by two glass slides.
  • a measurement sample in which the optical waveguide piece is sandwiched in the space in the chamber and a blank sample in which the optical waveguide piece is not inserted are prepared.
  • an interference fringe photograph in the cross-sectional direction of the optical waveguide fragment is obtained using an interference microscope.
  • the refractive index distribution can be obtained by image analysis of the interference fringe photograph. For example, the optical path length of the interference microscope is changed to continuously acquire image data in which the place where the interference fringes are generated.
  • the refractive index at each measurement point in the interlayer direction and the in-layer direction is calculated from a plurality of image data.
  • the interval between the measurement points is not particularly limited, but is, for example, 2.5 ⁇ m.
  • a maximum value exists in the convex portion of the refractive index distribution, and a minimum value exists in the concave portion.
  • the top of the first protrusion is the maximum value Wm2
  • the top of the second protrusion is the maximum value Wm3
  • the top of the third protrusion is the maximum value Tm2
  • the top of the fourth protrusion is the maximum value.
  • Tm3 the top of the first recess is a minimum value Ws2
  • the top of the second recess is a minimum value Ts2.
  • the optical waveguide 1 shown in FIG. 1 functions as an optical wiring that transmits an optical signal from one end to the other end.
  • the optical waveguide 1, the cladding layer 11 from the lower side in FIG. 1, is formed by laminating a core layer 13 and the cladding layer 12 in this order.
  • the core layer 13 has a refractive index distribution in the surface direction.
  • This refractive index distribution has a region having a relatively high refractive index and a region having a relatively low refractive index, whereby incident light can be confined and propagated in a region having a high refractive index.
  • FIG. 2A is a cross-sectional view taken along the line XX of FIG. 1
  • FIG. 2B is a cross-sectional view taken along the center line C1 passing through the center of the core layer 13 in the thickness direction of the cross-sectional view taken along the line XX. It is a figure which shows an example of refractive index distribution typically.
  • the core layer 13 includes four local minimum values Ws1, Ws2, Ws3, and Ws4 and five local maximum values Wm1, Wm2, Wm3, Wm4, and Wm5 as shown in FIG. 2B in the width direction. It has a refractive index distribution W.
  • the five maximum values include a maximum value having a relatively high refractive index (first maximum value) and a maximum value having a relatively low refractive index (second maximum value).
  • the portion between the minimum value Ws ⁇ b> 1 and the minimum value Ws ⁇ b> 2 includes the maximum value Wm ⁇ b> 2 having a relatively large refractive index, and thus becomes the core portion 14. Since the maximum value Wm4 is also included between Ws3 and the minimum value Ws4, the core portion 14 is formed. More specifically, the core portion 141 is defined between the minimum value Ws1 and the minimum value Ws2, and the core portion 142 is defined between the minimum value Ws3 and the minimum value Ws4.
  • the region on the left side of the minimum value Ws1, the region between the minimum value Ws2 and the minimum value Ws3, and the region on the right side of the minimum value Ws4 are regions adjacent to both sides of the core portion 14, respectively.
  • a region on the left side of the minimum value Ws1 is a side cladding portion 151
  • a region between the minimum value Ws2 and the minimum value Ws3 is a side cladding portion 152
  • a region on the right side of the minimum value Ws4 is a side cladding portion 153.
  • the refractive index distribution W should have at least a region where the second maximum value, the minimum value, the first maximum value, the minimum value, and the second maximum value are arranged in this order. Note that this region is repeatedly provided according to the number of core portions.
  • the refractive index distribution W has a second maximum value, a minimum value, and a first value. Local maximum values, local minimum values, second local maximum values, local minimum values, first local maximum values, local minimum values, second local maximum values, and the like. It is only necessary to have a region in which the maximum value of 1 and the second maximum value are alternately arranged.
  • the plurality of local minimum values, the plurality of first local maximum values, and the plurality of second local maximum values are preferably substantially the same as each other, but the local minimum values are the first local maximum value and the second local maximum value.
  • the values may be slightly different from each other. In that case, it is preferable that the amount of deviation is suppressed within 10% of the average value of the plurality of minimum values.
  • the optical waveguide 1 has an elongated band shape, and the refractive index distribution W as described above is maintained substantially the same distribution in the entire longitudinal direction of the optical waveguide 1.
  • the core layer 13 is formed with two long core portions 14 and three side cladding portions 15 adjacent to each side of the core portions 14. It will be.
  • the optical waveguide 1 shown in FIG. 1 is provided with two parallel core portions 141 and 142 and three side cladding portions 151, 152, and 153 arranged in parallel.
  • each core part 141 and 142 will be in the state surrounded by each side cladding part 151,152,153 and each cladding layer 11,12, respectively.
  • the average refractive index of these two core parts 141 and 142 is higher than the average refractive index of the three side clad parts 151, 152, and 153, each core part 141, 142 and each side clad part 151. , 152, 153 can cause total reflection of light.
  • a dense dot is attached
  • the light incident on one end of the core portion 14 is totally reflected between the core portion 14 and the clad portion (the clad layers 11 and 12 and the side clad portions 15), By propagating, it can be taken out from the other end of the core part 14.
  • a quadrangular shape such as a square or a rectangle, but this shape is not particularly limited.
  • the shape may be a circle such as a triangle, a triangle, a pentagon, or a polygon such as a hexagon.
  • the width and height of the core part 14 are not particularly limited, but are preferably about 1 to 200 ⁇ m, more preferably about 5 to 100 ⁇ m, and more preferably about 20 to 70 ⁇ m. More preferably.
  • the four minimum values Ws1, Ws2, Ws3, and Ws4 are each less than the average refractive index WA in the side cladding portion 15.
  • a region having a smaller refractive index than the side clad portion 15 exists between each core portion 14 and each side clad portion 15.
  • a steeper refractive index gradient is formed in the vicinity of each local minimum value Ws1, Ws2, Ws3, and Ws4. This suppresses light leakage from each core portion 14, thereby reducing transmission loss.
  • the optical waveguide 1 is obtained.
  • the refractive index distribution W the refractive index continuously changes as a whole.
  • the effect of confining light in the core portion 14 is further enhanced, so that transmission loss can be further reduced.
  • the region closer to the center of the core portion 14 is transmitted. Since light propagates intensively, a difference in propagation time for each optical path is less likely to occur. For this reason, even when the transmission light includes a pulse signal, it is possible to suppress blunting of the pulse signal (spreading of the pulse signal). As a result, the optical waveguide 1 that can further improve the quality of optical communication is obtained.
  • the maximum values Wm2 and Wm4 are located at the core portions 141 and 142 as shown in FIG. 2, but the core portions 141 and 142 are located at the center of the width. Yes.
  • the probability that transmission light will gather in the center part of the width of core part 141 and 142 becomes high, and the probability that it will leak to side cladding parts 151, 152, and 153 becomes relatively low.
  • the transmission loss of the core parts 141 and 142 can be further reduced.
  • the central portion of the width of the core portion 141 is a region having a distance of 30% of the width of the core portion 141 on both sides from the midpoint between the minimum value Ws1 and the minimum value Ws2.
  • the positions of the maximum values Wm2 and Wm4 be located at the center of the width of the cores 141 and 142 if possible, but the edge of the cores 141 and 142 (not necessarily the center) ( If it is located outside the vicinity of the portions that are in contact with the side clad portions 151, 152, and 153, a significant deterioration in characteristics can be avoided. That is, the transmission loss of the core parts 141 and 142 can be suppressed to some extent.
  • the vicinity of the edge of the core part 141 is a region having a distance of 5% of the width of the core part 141 from the edge to the inside.
  • the maximum values Wm1, Wm3, and Wm5 of the refractive index distribution W are located in the side cladding portions 151, 152, and 153 as shown in FIG. , 153 is preferably located outside the vicinity of the edge (portion in contact with the core portions 141 and 142).
  • the local maximum values Wm2, Wm4 in the core portions 141, 142 and the local maximum values Wm1, Wm3, Wm5 in the side cladding portions 151, 152, 153 are sufficiently separated from each other.
  • 142 can sufficiently reduce the probability that the transmitted light leaks into the side clad parts 151, 152, 153.
  • the transmission loss of the core parts 141 and 142 can be reduced.
  • the vicinity of the edge of the side cladding portions 151, 152, and 153 is a region having a distance of 5% of the width of the side cladding portions 151, 152, and 153 from the edge to the inside.
  • the local maximum values Wm1, Wm3, and Wm5 are located at the center of the width of the side cladding portions 151, 152, and 153, and the local minimum values Ws1, Ws2 are adjacent to the local maximum values Wm1, Wm3, and Wm5. , Ws3, Ws4, it is preferable that the refractive index continuously decreases.
  • the maximum distances between the maximum values Wm2, Wm4 in the core portions 141, 142 and the maximum values Wm1, Wm3, Wm5 in the side cladding portions 151, 152, 153 are secured, and the maximum values Wm1, Since light can be reliably confined in the vicinity of Wm3 and Wm5, leakage of transmission light from the core portions 141 and 142 described above can be more reliably suppressed.
  • the local maximum values Wm1, Wm3, and Wm5 are smaller in refractive index than the local maximum values Wm2 and Wm4 located in the core portions 141 and 142 described above. Although it does not have, since the refractive index is higher than the surroundings, it has a slight light transmission property. As a result, the side clad parts 151, 152, and 153 have an effect of preventing transmission to other core parts by confining transmission light leaked from the core parts 141 and 142. That is, the presence of the maximum values Wm1, Wm3, and Wm5 can suppress crosstalk.
  • the minimum values Ws1, Ws2, Ws3, and Ws4 are less than the average refractive index WA of the side cladding portion 15, but the difference is desirably within a predetermined range. Specifically, the difference between the minimum value Ws1, Ws2, Ws3, Ws4 and the average refractive index WA of the side cladding portion 15 is the minimum value Ws1, Ws2, Ws3, Ws4 and the maximum value Wm2 in the core portions 141, 142.
  • the difference from Wm4 is preferably about 3 to 80%, more preferably about 5 to 50%, further preferably about 7 to 20% (for example, (WA ⁇ Ws1) / (Wm2 -Ws1) ⁇ 100 is, for example, preferably 3 to 80%, more preferably 5 to 50%, still more preferably 7 to 20% (hereinafter, "to" Unless otherwise indicated, it includes the upper and lower limits)).
  • the side clad portion 15 has a light transmission property necessary and sufficient for suppressing crosstalk.
  • crosstalk can fully be suppressed by making the difference of minimum value Ws1, Ws2, Ws3, Ws4 and the average refractive index WA of the side cladding part 15 more than the said lower limit. By setting it to the upper limit value or less, it is possible to suppress a decrease in the light transmission performance of the core portions 141 and 142 due to the light transmission performance in the side cladding portion 15 being too large.
  • the difference between the minimum values Ws1, Ws2, Ws3, Ws4 and the maximum values Wm1, Wm3, Wm5 is about 6 to 90% of the difference between the minimum values Ws1, Ws2, Ws3, Ws4 and the maximum values Wm2, Wm4. It is preferably about 10 to 70%, more preferably about 14 to 40%. As a result, the balance between the refractive index height of the side cladding portion 15 and the refractive index height of the core portion 14 is optimized, and the optical waveguide 1 has particularly excellent optical transmission properties and more reliably suppresses crosstalk. It will be possible.
  • the difference in refractive index between the minimum values Ws1, Ws2, Ws3, and Ws4 and the maximum values Wm2 and Wm4 in the core portions 141 and 142 is preferably as large as possible, but is about 0.005 to 0.07.
  • it is about 0.007 to 0.05, more preferably about 0.01 to 0.05 (for example, (Wm1-Ws1) / (Wm2-Ws1) ⁇ 100 is 0).
  • 0.005 to 0.07 is preferable, 0.007 to 0.05 is more preferable, and 0.01 to 0.05 is further preferable.
  • the refractive index distribution W in the core portions 141 and 142 has a maximum value when the horizontal axis indicates the cross-sectional position of the core layer 13 and the vertical axis indicates the refractive index.
  • the refractive index is continuously changing in the vicinity of Wm2 and the maximum value Wm4, it may have a substantially convex V shape (substantially linear except for the maximum value). It has an approximately U-shape that is convex upward (the entire vicinity of the maximum value is rounded).
  • the refractive index distribution W has such a shape, the light confinement action in the core portions 141 and 142 becomes more remarkable.
  • the refractive index distribution W has a shape in which the refractive index continuously changes in the vicinity of the minimum value Ws1, the vicinity of the minimum value Ws2, the vicinity of the minimum value Ws3, and the vicinity of the minimum value Ws4. If so, it may have a substantially convex V shape (substantially linear except for the maximum value), but preferably has a substantially U shape convex downward (the entire vicinity of the maximum value is rounded). It is said.
  • the present inventors made light incident on one desired end portion of the plurality of core portions 141 and 142 of the optical waveguide 1 and acquired the intensity distribution of the emitted light at the other end portion. It was found that the intensity distribution is extremely useful for suppressing the crosstalk of the optical waveguide 1.
  • FIG. 3 is a diagram showing the intensity distribution of the emitted light when light is incident on the core portion 141 of the optical waveguide 1.
  • the intensity of the emitted light becomes the largest at the central part of the outgoing end of the core part 141.
  • the intensity of the emitted light decreases as the distance from the central portion of the core portion 141 decreases.
  • an intensity distribution that takes a minimum value in the core portion 142 adjacent to the core portion 141 is obtained. . Since the minimum value of the intensity distribution of the emitted light coincides with the position of the core part 142 in this way, the crosstalk in the core part 142 can be suppressed to be extremely small.
  • An optical waveguide 1 that can reliably prevent the generation is obtained.
  • the intensity distribution of the emitted light does not take the minimum value in the core portion adjacent to the core portion where the light is incident, but rather takes the maximum value, which causes a crosstalk problem. It was.
  • the behavior of the intensity distribution of the emitted light in the optical waveguide of the present invention as described above is extremely useful for suppressing crosstalk.
  • the refractive index distribution W has the minimum values Ws1, Ws2, Ws3, and Ws4, and is refracted.
  • the characteristic refractive index distribution W in which the refractive index continuously changes throughout the refractive index distribution W, represents the intensity distribution of the emitted light, which conventionally had a maximum value in the core section 142, as the core section. For example, the side clad portion 153 adjacent to 142 is shifted. That is, the crosstalk is reliably suppressed by this shift.
  • the intensity distribution of the emitted light as described above is not necessarily observed although the probability of being observed in the optical waveguide of the present invention is high, but the NA (numerical aperture) of the incident light and the cross-sectional area of the core portion 141 are not necessarily observed.
  • the NA number of the incident light
  • the cross-sectional area of the core portion 141 are not necessarily observed.
  • a clear minimum value may not be observed, or the position of the minimum value may deviate from the core part 142. Even in such a case, crosstalk is sufficiently suppressed. Is done.
  • the refractive index in the vicinity of the maximum values Wm2 and Wm4 is continuously equal to or higher than the average refractive index WA. Is a [ ⁇ m], and the width of the portion where the refractive index in the vicinity of the minimum values Ws1, Ws2, Ws3, and Ws4 is continuously less than the average refractive index WA is b [ ⁇ m].
  • b is preferably about 0.01a to 1.2a, more preferably about 0.03a to 1a, and further preferably about 0.1a to 0.8a.
  • the substantial widths of the minimum values Ws1, Ws2, Ws3, and Ws4 can exhibit the above-described functions and effects. That is, by setting b to be equal to or more than the lower limit value, it is possible to suppress the substantial width of the minimum values Ws1, Ws2, Ws3, and Ws4 from being too narrow and the effect of confining light in the core portions 141 and 142 from being reduced. On the other hand, by setting b to be equal to or less than the above upper limit value, the substantial widths of the minimum values Ws1, Ws2, Ws3, and Ws4 are too wide, the width and pitch of the core portions 141 and 142 are limited, and transmission efficiency is reduced. It is possible to suppress the hindrance to multichanneling and high density.
  • the average refractive index WA in the side cladding 15 can be approximated at the midpoint between the maximum value Wm1 and the minimum value Ws1, for example.
  • the constituent material (main material) of the core layer 13 as described above is not particularly limited as long as it is a material that causes the above-described difference in refractive index, but specifically, acrylic resin, methacrylic resin, polycarbonate, polystyrene, epoxy
  • acrylic resin methacrylic resin
  • polycarbonate polycarbonate
  • polystyrene epoxy
  • quartz glass A glass material such as borosilicate glass can be used.
  • the resin material may be a composite material obtained by combining materials having different compositions, and may contain an unpolymerized monomer.
  • the norbornene-based polymer includes, for example, ring-opening metathesis polymerization (ROMP), combination of ROMP and hydrogenation reaction, polymerization by radical or cation, polymerization using a cationic palladium polymerization initiator, and other polymerization initiators (for example, It can be obtained by all known polymerization methods such as polymerization using nickel or other transition metal polymerization initiators).
  • ROMP ring-opening metathesis polymerization
  • combination of ROMP and hydrogenation reaction polymerization by radical or cation
  • polymerization using a cationic palladium polymerization initiator for example, It can be obtained by all known polymerization methods such as polymerization using nickel or other transition metal polymerization initiators.
  • the clad layers 11 and 12 constitute clad portions located at the lower and upper portions of the core layer 13, respectively.
  • the average thickness of the clad layers 11 and 12 is preferably about 0.1 to 1.5 times the average thickness of the core layer 13 (the average height of each core portion 14). More preferably, the average thickness of the cladding layers 11 and 12 is not particularly limited, but it is usually preferably about 1 to 200 ⁇ m, and preferably about 5 to 100 ⁇ m. More preferably, it is about 10 to 60 ⁇ m. Thereby, the function as a clad part is suitably exhibited while preventing the optical waveguide 1 from becoming unnecessarily large (thickened).
  • constituent material of the cladding layers 11 and 12 for example, the same material as the constituent material of the core layer 13 described above can be used, but a norbornene polymer is particularly preferable.
  • the material when selecting the constituent material of the core layer 13 and the constituent materials of the clad layers 11 and 12, the material may be selected in consideration of the difference in refractive index between them. Specifically, in order to ensure total reflection of light at the boundary between the core portion 14 and the cladding layers 11 and 12, the material may be selected so that the refractive index of the constituent material of the core portion 14 is sufficiently large. As a result, a sufficient refractive index difference is obtained in the thickness direction of the optical waveguide 1, and light can be prevented from leaking from the respective core portions 14 to the cladding layers 11 and 12.
  • the adhesiveness (affinity) between the constituent material of the core layer 13 and the constituent materials of the cladding layers 11 and 12 is high.
  • the clad layers 11 and 12 may be provided as necessary, and either one or both may be omitted. In this case, the surface of the core layer 13 is exposed to the atmosphere (air), but since the refractive index of air is sufficiently low, the air can substitute for the functions of the cladding layers 11 and 12.
  • a support film 2 as shown in FIG. 1 may be laminated on the lower surface of the optical waveguide 1 as necessary.
  • Support film 2 supports and reinforces the lower surface of the optical waveguide 1. Thereby, the reliability and mechanical characteristics of the optical waveguide 1 can be improved.
  • the constituent material of the support film 2 examples include various resin materials such as polyethylene terephthalate (PET), polyolefin such as polyethylene and polypropylene, polyimide and polyamide, and metal materials such as copper, aluminum and silver. It is done. In the case of a metal material, a metal foil is preferably used as the support film 2.
  • PET polyethylene terephthalate
  • polyolefin such as polyethylene and polypropylene
  • polyimide and polyamide polyimide and polyamide
  • metal materials such as copper, aluminum and silver. It is done.
  • a metal material a metal foil is preferably used as the support film 2.
  • the average thickness of the support film 2 is not particularly limited, but is preferably about 5 to 200 ⁇ m, more preferably about 10 to 100 ⁇ m. Thereby, since the support film 2 has moderate rigidity, the optical waveguide 1 is reliably supported and the flexibility of the optical waveguide 1 is difficult to be hindered.
  • the support film 2 and the optical waveguide 1 are bonded or bonded, and examples of the method include thermocompression bonding, bonding with an adhesive or a pressure sensitive adhesive, and the like.
  • the adhesive layer examples include acrylic adhesives, urethane adhesives, silicone adhesives, and various hot melt adhesives (polyester and modified olefins).
  • thermoplastic polyimide adhesive agents such as a polyimide, a polyimide amide, a polyimide amide ether, a polyester imide, a polyimide ether, are used preferably. Since the adhesive layer made of such a material is relatively flexible, even if the shape of the optical waveguide 1 changes, the change can be freely followed. As a result, it is possible to reliably prevent peeling due to the shape change.
  • the average thickness of such an adhesive layer is not particularly limited, but is preferably about 1 to 100 ⁇ m, and more preferably about 5 to 60 ⁇ m.
  • the cover film 3 protects the optical waveguide 1 and supports the optical waveguide 1 from above. Thereby, the optical waveguide 1 is protected from dirt and scratches, and the reliability and mechanical characteristics of the optical waveguide 1 can be improved.
  • a constituent material of such a cover film 3 it is the same as the constituent material of the support film 2.
  • resin materials such as polyethylene terephthalate (PET), polyolefin such as polyethylene and polypropylene, polyimide and polyamide
  • Metal materials such as copper, aluminum, silver, are mentioned.
  • a metal material a metal foil is preferably used as the cover film 3.
  • a mirror is formed in the middle of the optical waveguide 1, light is transmitted through the cover film 3, so that the constituent material of the cover film 3 is preferably substantially transparent.
  • the average thickness of the cover film 3 is not particularly limited, but is preferably about 3 to 50 ⁇ m, more preferably about 5 to 30 ⁇ m. By setting the thickness of the cover film 3 within the above range, the cover film 3 has sufficient light transmittance in optical communication, and has sufficient rigidity to reliably protect the optical waveguide 1.
  • cover film 3 and the optical waveguide 1 are bonded or bonded, and examples of the method include thermocompression bonding, bonding with an adhesive or a pressure-sensitive adhesive, and the like. Of these, the adhesive described above can be used.
  • the optical waveguide 1 composed of a laminate of the clad layer 11, the core layer 13, and the clad layer 12 has been described. However, these may be integrally formed.
  • the number of the core parts 14 is not specifically limited, One or three or more may be sufficient. .
  • the refractive index distribution W of the cross section of the optical waveguide 1 has two minimum values, and the minimum value is less than the average refractive index WA as described above. Yes, and it is sufficient that the refractive index continuously changes throughout the refractive index distribution W.
  • the refractive index distribution W has accordingly.
  • the number of local minimum values will increase to 6, 8, 10,.
  • FIGS. 4 to 8 are diagrams for explaining a first manufacturing method of the optical waveguide 1 shown in FIG.
  • the upper side in FIGS. 4 to 8 is referred to as “upper” and the lower side is referred to as “lower”.
  • the optical waveguide 1 is manufactured by preparing a clad layer 11, a core layer 13, and a clad layer 12, and laminating them.
  • the first manufacturing method of the optical waveguide 1 is as follows: [1] After applying the core layer forming composition 900 on the support substrate 951 to form a liquid film, the support substrate 951 is placed on a level table to form the liquid film. While flattening, the solvent is evaporated (desolvent). Thereby, the layer 910 is obtained. [2] Next, a refractive index difference is generated by irradiating a part of the layer 910 with actinic radiation to obtain the core layer 13 in which the core part 14 and the side cladding part 15 are formed. [3] Next, the cladding layers 11 and 12 are laminated on both surfaces of the core layer 13 to obtain the optical waveguide 1.
  • a core layer forming composition 900 is prepared.
  • the core layer forming composition 900 contains a polymer 915 and an additive 920 (including at least a monomer in this embodiment).
  • a composition 900 for forming a core layer is a material that causes a reaction of at least a monomer in the polymer 915 by irradiation with actinic radiation and changes the refractive index distribution accordingly. That is, in the core layer forming composition 900, the refractive index distribution changes due to the deviation in the abundance ratio of the polymer 915 and the monomer, and as a result, the core portion 14 and the side cladding portion 15 are formed in the core layer 13. It is a material that can be used.
  • the core layer forming composition 900 is applied on the support substrate 951 to form a liquid film (see FIG. 4A). Then, the support substrate 951 is placed on the level table to flatten the liquid film and evaporate (desolvent) the solvent. Thereby, the layer 910 is obtained (see FIG. 4B).
  • the support substrate 95 for example, a silicon substrate, a silicon dioxide substrate, a glass substrate, a polyethylene terephthalate (PET) film, or the like is used.
  • a silicon substrate for example, a silicon substrate, a silicon dioxide substrate, a glass substrate, a polyethylene terephthalate (PET) film, or the like is used.
  • PET polyethylene terephthalate
  • Examples of the coating method for forming a liquid film include a doctor blade method, a spin coating method, a dipping method, a table coating method, a spray method, an applicator method, a curtain coating method, and a die coating method.
  • the polymer (matrix) 915 exists substantially uniformly and randomly, and the additive 920 is substantially uniformly and randomly dispersed in the polymer 915. Thereby, the additive 920 is substantially uniformly and randomly dispersed in the layer 910.
  • the average thickness of the layer 910 is appropriately set according to the thickness of the core layer 13 to be formed, and is not particularly limited, but is preferably about 5 to 300 ⁇ m, more preferably about 10 to 200 ⁇ m.
  • the polymer 915 serves as a base polymer for the core layer 13.
  • the polymer 915 has sufficiently high transparency (colorless and transparent) and is compatible with the monomer described later, and among them, the monomer can react (polymerization reaction or crosslinking reaction) as described later. There are preferably used those having sufficient transparency even after the monomer is polymerized.
  • having compatibility means that the monomer is at least mixed and does not cause phase separation with the polymer 915 in the core layer forming composition 900 or the layer 910.
  • Examples of such a polymer 915 include cyclic olefin resins such as norbornene resins and benzocyclobutene resins, acrylic resins, methacrylic resins, polycarbonates, polystyrenes, epoxy resins, polyamides, polyimides, polybenzoxazoles, Examples thereof include silicone resins and fluorine resins, and one or more of these can be used in combination (polymer alloy, polymer blend (mixture), copolymer, etc.).
  • the core layer 13 having excellent optical transmission performance and heat resistance can be obtained.
  • the cyclic olefin-based resin may be unsubstituted or may have hydrogen substituted with other groups.
  • cyclic olefin resins examples include norbornene resins and benzocyclobutene resins.
  • norbornene-based resin it is preferable to use a norbornene-based resin from the viewpoints of heat resistance and transparency. Moreover, since norbornene-type resin has high hydrophobicity, the core layer 13 which cannot produce the dimensional change by water absorption etc. can be obtained.
  • the norbornene-based resin may be either one having a single repeating unit (homopolymer) or one having two or more norbornene-based repeating units (copolymer).
  • a norbornene-based resin for example, (1) addition (co) polymer of norbornene type monomer obtained by addition (co) polymerization of norbornene type monomer, (2) addition copolymers of norbornene monomers with ethylene and ⁇ -olefins, (3) an addition polymer such as an addition copolymer of a norbornene-type monomer and a non-conjugated diene and, if necessary, another monomer; (4) a ring-opening (co) polymer of a norbornene-type monomer, and a resin obtained by hydrogenating the (co) polymer if necessary, (5) a ring-opening (co) polymer of a norbornene-type monomer and ethylene or ⁇ -olefins, and a resin obtained by hydrogenating the (co) polymer if necessary, (6) Ring-opening copolymers such as norbornene-type monomers and non-conjugated dienes, or other monomers,
  • norbornene resins include, for example, ring-opening metathesis polymerization (ROMP), combination of ROMP and hydrogenation reaction, polymerization by radical or cation, polymerization using cationic palladium polymerization initiator, other polymerization initiators (for example, it can be obtained by any known polymerization method such as polymerization using a polymerization initiator of nickel or another transition metal).
  • ROMP ring-opening metathesis polymerization
  • combination of ROMP and hydrogenation reaction polymerization by radical or cation
  • polymerization using cationic palladium polymerization initiator cationic palladium polymerization initiator
  • other polymerization initiators for example, it can be obtained by any known polymerization method such as polymerization using a polymerization initiator of nickel or another transition metal).
  • norbornene resins are preferably those having at least one repeating unit represented by the following structural formula B, that is, addition (co) polymers. Since the addition (co) polymer is rich in transparency, heat resistance, and flexibility, for example, after the optical waveguide 1 is formed, an electrical component or the like may be mounted on the optical waveguide 1 via solder. This is because even in such a case, high heat resistance, that is, reflow resistance can be imparted to the optical waveguide 1.
  • Such a norbornene-based polymer is suitably synthesized by using, for example, a norbornene-based monomer described later (a norbornene-based monomer represented by Structural Formula C described below or a crosslinkable norbornene-based monomer).
  • the product when the optical waveguide 1 is incorporated into various products, the product may be used in an environment of about 80 ° C., for example. Even in such a case, an addition (co) polymer is preferable from the viewpoint of ensuring heat resistance.
  • the norbornene-based resin preferably includes a norbornene repeating unit having a substituent containing a polymerizable group or a norbornene repeating unit having a substituent containing an aryl group.
  • repeating unit of norbornene having a substituent containing a polymerizable group the repeating unit of norbornene having a substituent containing an epoxy group, the repeating unit of norbornene having a substituent containing a (meth) acryl group, and an alkoxysilyl group At least one of the repeating units of norbornene having a substituent containing is preferable.
  • These polymerizable groups are preferable because of their high reactivity among various polymerizable groups.
  • the norbornene-based resin preferably contains an alkylnorbornene repeating unit.
  • the alkyl group may be linear or branched.
  • the norbornene-based resin By including the repeating unit of alkyl norbornene, the norbornene-based resin has high flexibility, and therefore can provide high flexibility (flexibility).
  • a norbornene-based resin containing a repeating unit of alkyl norbornene is preferable because it has excellent transmittance for light in a specific wavelength region (particularly, a wavelength region near 850 nm).
  • norbornene-based resin containing the norbornene repeating unit as described above examples include hexyl norbornene homopolymer, phenylethyl norbornene homopolymer, benzyl norbornene homopolymer, hexyl norbornene and phenylethyl norbornene copolymer, hexyl norbornene. And a copolymer of benzylnorbornene and the like.
  • R 1 represents an alkyl group having 1 to 10 carbon atoms
  • a represents an integer of 0 to 3
  • b represents an integer of 1 to 3
  • p 1 / q 1 is 20 or less.
  • the norbornene-based resin of the formula (1) can be produced as follows. (1) is obtained by dissolving norbornene having R 1 and norbornene having an epoxy group in the side chain in toluene and solution polymerization using Ni compound (A) as a catalyst.
  • the manufacturing method of norbornene which has an epoxy group in a side chain is as (i) (ii), for example.
  • R 1 is an alkyl group having 4 to 10 carbon atoms
  • R 2 represents an alkyl group having 1 to 10 carbon atoms
  • R 3 represents a hydrogen atom or a methyl group
  • c represents an integer of 0 to 3
  • the norbornene-based resin of the formula (2) is obtained by dissolving norbornene having R 2 and norbornene having acryl and methacryl groups in the side chain in toluene, and performing solution polymerization using the above-described Ni compound (A) as a catalyst. Obtainable.
  • R 2 is an alkyl group having 4 to 10 carbon atoms and c is 1 from the viewpoint of achieving both flexibility and heat resistance.
  • Compounds such as copolymers of butylbornene and 2- (5-norbornenyl) methyl acrylate, copolymers of hexylnorbornene and 2- (5-norbornenyl) methyl acrylate, decylnorbornene and 2- (5-norbornenyl) methyl acrylate And a copolymer thereof are preferred.
  • R 4 represents an alkyl group having 1 to 10 carbon atoms
  • each X 3 independently represents an alkyl group having 1 to 3 carbon atoms
  • d represents 0 to 3 carbon atoms. Represents an integer, and p 3 / q 3 is 20 or less.
  • the resin of the formula (3) can be obtained by dissolving norbornene having R 4 and norbornene having an alkoxysilyl group in the side chain in toluene, and solution polymerization using the above-described Ni compound (A) as a catalyst. it can.
  • norbornene-based polymers represented by the formula (3) in particular, a compound in which R 4 is an alkyl group having 4 to 10 carbon atoms, d is 1 or 2, and X 3 is a methyl group or an ethyl group,
  • R 5 represents an alkyl group having 1 to 10 carbon atoms
  • a 1 and A 2 each independently represent a substituent represented by the following formulas (5) to (7). (However, they are not the same substituent at the same time, and p 4 / q 4 + r is 20 or less.)
  • the resin of the formula (4) can be obtained by dissolving norbornene having R 5 and norbornene having A 1 and A 2 in the side chain in toluene, and solution polymerization using Ni compound (A) as a catalyst. it can.
  • R 6 represents a hydrogen atom or a methyl group, and g represents an integer of 0 to 3.
  • Equation (7) in, X 4 each independently represents an alkyl group having 1 to 3 carbon atoms, h is. Represents an integer of 0 to 3)
  • norbornene-based resin represented by the formula (4) for example, any one of butyl norbornene, hexyl norbornene or decyl norbornene, 2- (5-norbornenyl) methyl acrylate, norbornenyl ethyl trimethoxysilane, Terpolymer with either triethoxysilyl norbornene or trimethoxysilyl norbornene, butyl bornene, hexyl norbornene or decyl norbornene, terpolymer of 2- (5-norbornenyl) methyl acrylate and methyl glycidyl ether norbornene, butylbornene, Either hexyl norbornene or decyl norbornene and methyl glycidyl ether norbornene, norbornenyl ethyltrimethoxysilane, triethoxysilylno Terpolymers, etc. with either
  • R 7 represents an alkyl group having 1 to 10 carbon atoms
  • R 8 represents a hydrogen atom, a methyl group or an ethyl group
  • Ar represents an aryl group
  • X 1 represents oxygen Represents an atom or a methylene group
  • X 2 represents a carbon atom or a silicon atom
  • i represents an integer of 0 to 3
  • j represents an integer of 1 to 3
  • p 5 / q 5 is 20 or less is there.
  • the resin of the formula (8) is obtained by dissolving norbornene having R 7 and norbornene containing — (CH 2 ) —X 1 —X 2 (R 8 ) 3-j (Ar) j in the side chain in toluene, It can be obtained by solution polymerization using a compound as a catalyst.
  • norbornene resins represented by the formula (8) those in which X 1 is an oxygen atom, X 2 is a silicon atom, and Ar is a phenyl group are preferable.
  • R 7 is an alkyl group having 4 to 10 carbon atoms
  • X 1 is an oxygen atom
  • X 2 is a silicon atom
  • Ar is a phenyl group
  • R 7 is an alkyl group having 4 to 10 carbon atoms
  • X 1 is a methylene group
  • X 2 is a carbon atom
  • Ar is Compounds in which R 8 is a hydrogen atom, i is 0, and j is 1, for example, a copolymer of butylbornene and phenylethylnorbornene, a copolymer of hexylnorbornene and phenylethylnorbornene, a copolymer of decylnorbornene and phenylethylnorbornene Etc. Further, the following may be used as the norbornene resin.
  • R 10 represents an alkyl group having 1 to 10 carbon atoms
  • R 11 represents an aryl group
  • k is 0 or more and 4 or less.
  • P 6 / q 6 is 20 or less. is there.
  • p 1 / q 1 to p 3 / q 3 , p 5 / q 5 , p 6 / q 6 or p 4 / q 4 + r may be 20 or less, preferably 15 or less, About 0.1 to 10 is more preferable. Thereby, the effect including the repeating unit of multiple types of norbornene is exhibited.
  • the polymer 915 may be an acrylic resin, a methacrylic resin, an epoxy resin, a polyimide, a silicone resin, a fluorine resin, or the like.
  • acrylic resins and methacrylic resins include poly (methyl acrylate), poly (methyl methacrylate), poly (epoxy acrylate), poly (epoxy methacrylate), poly (amino acrylate), and poly (amino methacrylate).
  • epoxy resin examples include alicyclic epoxy resin, bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, biphenyl type epoxy resin having a biphenyl skeleton, naphthalene ring-containing epoxy resin, Dicyclopentadiene type epoxy resin having cyclopentadiene skeleton, phenol novolac type epoxy resin, cresol novolac type epoxy resin, triphenylmethane type epoxy resin, triphenylmethane type epoxy resin, aliphatic epoxy resin, triglycidyl isocyanurate, etc. Of these, one or more of these composite materials are used.
  • the polyimide is not particularly limited as long as it is a resin obtained by ring-closing and curing (imidizing) a polyamic acid which is a polyimide resin precursor.
  • the polyamic acid can be obtained, for example, as a solution by reacting tetracarboxylic dianhydride and diamine in an equimolar ratio in N, N-dimethylacetamide.
  • examples of the tetracarboxylic dianhydride include pyromellitic dianhydride, 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride, and 2,2-bis (2,3-di ().
  • examples of the diamine include m-phenylenediamine, p-phenylenediamine, 3,4'-diaminodiphenyl ether, 4,4'-diaminodiphenyl ether, 4,4'-diaminodiphenyl sulfone, and 3,3'-diaminodiphenyl.
  • examples of the silicone resin include silicone rubber and silicone elastomer. These silicone resins are obtained by reacting a silicone rubber monomer or oligomer with a curing agent.
  • silicone rubber monomer or oligomer examples include those containing a methylsiloxane group, an ethylsiloxane group, or a phenylsiloxane group.
  • silicone rubber monomer or oligomer for example, those obtained by introducing a functional group such as an epoxy group, a vinyl ether group, or an acrylic group are preferably used in order to impart photoreactivity.
  • the fluorine-based resin for example, a polymer obtained from a monomer having a fluorine-containing aliphatic ring structure, a polymer obtained by cyclopolymerizing a fluorine-containing monomer having two or more polymerizable unsaturated bonds, Examples thereof include a polymer obtained by copolymerizing a fluorine-containing monomer and a radical polymerizable monomer.
  • fluorine-containing aliphatic ring structure examples include perfluoro (2,2-dimethyl-1,3-dioxole), perfluoro (4-methyl-1,3-dioxole), and perfluoro (4-methoxy-1,3-dioxole). ) And the like.
  • fluorine-containing monomer examples include perfluoro (allyl vinyl ether), perfluoro (butenyl vinyl ether) and the like.
  • radical polymerizable monomer examples include tetrafluoroethylene, chlorotrifluoroethylene, perfluoro (methyl vinyl ether) and the like.
  • the refractive index of each part of the core layer 13 is determined according to the relative magnitude relationship between the refractive index of the polymer 915 and the refractive index of the monomer in each part and the existence ratio thereof, the polymer depends on the type of monomer used.
  • the refractive index of 915 may be adjusted as appropriate.
  • a monomer having an aromatic ring (aromatic group), a nitrogen atom, a bromine atom or a chlorine atom in the molecular structure is generally selected, A polymer 915 is synthesized (polymerized).
  • a monomer having an alkyl group, a fluorine atom or an ether structure (ether group) is generally selected in the molecular structure, and the polymer 915 is synthesized ( Polymerization).
  • norbornene-based resin having a relatively high refractive index those containing a repeating unit of aralkyl norbornene are preferable.
  • Such norbornene-based resins have a particularly high refractive index.
  • Examples of the aralkyl group (arylalkyl group) of the aralkylnorbornene repeating unit include benzyl group, phenylethyl group, phenylpropyl group, phenylbutyl group, naphthylethyl group, naphthylpropyl group, fluorenylethyl group, fluorene group, and the like. Examples thereof include a nylpropyl group, and a benzyl group and a phenylethyl group are particularly preferable.
  • a norbornene-based resin having such a repeating unit is preferable because it has a very high refractive index.
  • the polymer 915 as described above has a leaving group (leaving pendant group) that is branched from the main chain and at least a part of the molecular structure of which can be released from the main chain by irradiation with actinic radiation. Is preferred. Since the refractive index of the polymer 915 decreases due to the removal of the leaving group, the polymer 915 can form a refractive index difference depending on the presence or absence of irradiation with actinic radiation.
  • Examples of the polymer 915 having such a leaving group include a polymer having at least one of an —O— structure, an —Si—aryl structure, and an —O—Si— structure in a molecular structure. Such a leaving group is released relatively easily by the action of a cation.
  • the leaving group that causes a decrease in the refractive index of the resin by leaving at least one of the —Si-diphenyl structure and the —O—Si-diphenyl structure is preferable.
  • examples of the polymer 915 having a leaving group in the side chain include polymers of monocyclic monomers such as cyclohexene and cyclooctene, norbornene, norbornadiene, dicyclopentadiene, dihydrodicyclopentadiene, tetracyclododecene,
  • examples thereof include cyclic olefin resins such as polymers of polycyclic monomers such as cyclopentadiene, dihydrotricyclopentadiene, tetracyclopentadiene, dihydrotetracyclopentadiene and the like.
  • one or more cyclic olefin resins selected from polymers of polycyclic monomers are preferably used. Thereby, the heat resistance of resin can be improved.
  • polymerization forms known forms such as random polymerization and block polymerization can be applied.
  • specific examples of the polymerization of norbornene monomers include (co) polymers of norbornene monomers, copolymers of norbornene monomers and other copolymerizable monomers such as ⁇ -olefins, A combined hydrogenated product corresponds to a specific example.
  • These cyclic olefin resins can be produced by a known polymerization method.
  • the polymerization methods include an addition polymerization method and a ring-opening polymerization method, and among them, the cyclic olefin resin obtained by the addition polymerization method.
  • norbornene-based resins are preferable (that is, addition polymers of norbornene-based compounds). Thereby, it is excellent in transparency, heat resistance, and flexibility.
  • X 1 is an oxygen atom
  • X 2 is a silicon atom
  • Ar is a phenyl group.
  • the side chain may have an epoxy group.
  • the compound represented by the formula (31) includes, for example, hexyl norbornene, diphenylmethyl norbornene methoxysilane (norbornene containing —CH 2 —O—Si (CH 3 ) (Ph) 2 in the side chain) and epoxy norbornene in toluene. It can be obtained by dissolving and solution polymerization using a Ni compound as a catalyst.
  • examples of another leaving group include a substituent having an acetophenone structure at the terminal. This leaving group is released relatively easily by the action of free radicals.
  • the content of the leaving group is not particularly limited, but is preferably 10 to 80% by weight in the polymer 915 having a leaving group in the side chain, and more preferably 20 to 60% by weight. preferable. When the content is within the above range, both flexibility and refractive index modulation function (effect of changing the refractive index difference) are particularly excellent.
  • the width of changing the refractive index can be expanded by increasing the content of the leaving group.
  • Additive 920 contains a monomer and a polymerization initiator.
  • the monomer reacts in the irradiation region of the actinic radiation to form a reactant by irradiation with actinic radiation described later, and the monomer diffuses and moves with it, so that the layer 910 is refracted between the irradiation region and the non-irradiation region. It is a compound that can cause a rate difference.
  • a polymer (polymer) formed by polymerizing the monomer in the polymer 915 As a reaction product of the monomer, a polymer (polymer) formed by polymerizing the monomer in the polymer 915, a cross-linked structure in which the monomer cross-links the polymers 915, and a polymer 915 obtained by polymerizing the monomer to the polymer 915. At least one of the branched structures branched from.
  • the difference in refractive index generated between the irradiated region and the non-irradiated region is generated based on the difference between the refractive index of the polymer 915 and the refractive index of the monomer. Therefore, the monomer contained in the additive 920 is the polymer 915. Is selected in consideration of the magnitude relationship with the refractive index.
  • a polymer 915 having a relatively low refractive index and a monomer having a high refractive index with respect to the polymer 915 are included. Used in combination.
  • a polymer 915 having a relatively high refractive index and a monomer having a low refractive index with respect to the polymer 915 are used in combination.
  • those having compatibility with the polymer 915 and having a refractive index difference with the polymer 915 of 0.01 or more are preferably used.
  • Such a monomer is not particularly limited as long as it is a compound having a polymerizable site, and examples thereof include norbornene monomers, acrylic acid (methacrylic acid) monomers, epoxy monomers, oxetane monomers, and vinyl ether monomers. , A styrene monomer, etc., and one or more of these can be used in combination.
  • a monomer or oligomer having a cyclic ether group such as an oxetanyl group or an epoxy group, or a norbornene monomer as the monomer.
  • a monomer or oligomer having a cyclic ether group the cyclic ether group is likely to be opened, so that a monomer capable of reacting quickly can be obtained.
  • the core layer 13 (optical waveguide 1) having excellent optical transmission performance and excellent heat resistance and flexibility can be obtained.
  • the molecular weight (weight average molecular weight) of the monomer having a cyclic ether group or the molecular weight (weight average molecular weight) of the oligomer is preferably 100 or more and 400 or less, respectively.
  • the monomer having an oxetanyl group and the oligomer having an oxetanyl group those selected from the group of the following formulas (11) to (20) are preferable.
  • these there is an advantage that transparency in the vicinity of a wavelength of 850 nm is excellent and both flexibility and heat resistance are possible. These may be used alone or in combination.
  • n is 0 or more and 3 or less.
  • compounds represented by the following formulas (32) and (33) can be used as the compound having an oxetanyl group.
  • the compound represented by the formula (32) trade name TOSOX manufactured by Toagosei Co., Ltd.
  • trade name OX-SQ manufactured by Toagosei Co., Ltd. trade name OX-SQ manufactured by Toagosei Co., Ltd.
  • n 1 or 2
  • examples of the monomer having an epoxy group and the oligomer having an epoxy group include the following.
  • the monomer and oligomer having an epoxy group are polymerized by ring-opening in the presence of an acid.
  • the monomer having an epoxy group and the oligomer having an epoxy group those represented by the following formulas (34) to (39) can be used.
  • the compound represented by the formula (34) is epoxy norbornene, and as such a compound, for example, EpNB manufactured by Promeras Corporation can be used.
  • the compound represented by the formula (35) is ⁇ -glycidoxypropyltrimethoxysilane, and as this compound, for example, Z-6040 manufactured by Toray Dow Corning Silicone can be used.
  • the compound represented by the formula (36) is 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane. As this compound, for example, E0327 manufactured by Tokyo Chemical Industry can be used.
  • the compound represented by the formula (37) is 3,4-epoxycyclohexenylmethyl-3 ′, 4′-epoxycyclohexenecarboxylate, and for example, Celoxide 2021P manufactured by Daicel Chemical Industries, Ltd. is used. can do.
  • the compound represented by the formula (38) is 1,2-epoxy-4-vinylcyclohexane, and as this compound, for example, Celoxide 2000 manufactured by Daicel Chemical Industries, Ltd. can be used.
  • the compound represented by the formula (39) is 1,2: 8,9 diepoxy limonene.
  • this compound for example, (Celoxide 3000 manufactured by Daicel Chemical Industries, Ltd.) can be used.
  • a monomer having an oxetanyl group, an oligomer having an oxetanyl group, a monomer having an epoxy group, and an oligomer having an epoxy group may be used in combination.
  • the monomer having an oxetanyl group and the oligomer having an oxetanyl group have a slow initiation reaction for initiating polymerization but a fast growth reaction.
  • a monomer having an epoxy group and an oligomer having an epoxy group have a fast initiation reaction for initiating polymerization, but have a slow growth reaction. Therefore, by using a monomer having an oxetanyl group, an oligomer having an oxetanyl group, a monomer having an epoxy group, and an oligomer having an epoxy group, when irradiated with light, the light irradiated portion and the unirradiated portion A difference in refractive index can be reliably generated.
  • the monomer represented by the formula (20) is “first monomer” and the monomer containing the component B is “second monomer”, it is preferable to use the first monomer and the second monomer in combination.
  • the ratio of the combined use is defined by (weight of second monomer) / (weight of first monomer), it is preferably about 0.1 to 1, more preferably about 0.1 to 0.6. preferable.
  • the combined ratio is within the above range, the balance between the reactivity of the monomer and the heat resistance of the optical waveguide 1 is improved.
  • the monomer corresponding to the second monomer includes a monomer having an oxetanyl group different from the monomer represented by the formula (20) and a monomer having a vinyl ether group.
  • a monomer having an oxetanyl group different from the monomer represented by the formula (20) at least one of an epoxy compound (particularly an alicyclic epoxy compound) and a bifunctional oxetane compound (a monomer having two oxetanyl groups) is preferably used.
  • the second monomer include the compound of the above formula (15), the compound of the above formula (12), the compound of the above formula (11), the compound of the above formula (18), and the above formula (19). And compounds of the above formulas (34) to (39).
  • norbornene-based monomer is a generic term for monomers containing at least one norbornene skeleton represented by the following structural formula A, and examples thereof include compounds represented by the following structural formula C.
  • R 12 to R 15 each independently represents a hydrogen atom, a substituted or unsubstituted hydrocarbon group, or a functional substituent, An integer of 0 to 5 is represented. However, when a is a double bond, either one of R 12 and R 13 or one of R 14 and R 15 does not exist. ]
  • Examples of the unsubstituted hydrocarbon group include, for example, a linear or branched alkyl group having 1 to 10 carbon atoms (C 1 to C 10 ), a linear or branched carbon number of 2 -10 (C 2 -C 10 alkenyl group, linear or branched alkynyl group having 2 to 10 carbon atoms (C 2 -C 10 ), cycloalkyl having 4 to 12 carbon atoms (C 4 -C 12 ) Group, a cycloalkenyl group having 4 to 12 carbon atoms (C 4 to C 12 ), an aryl group having 6 to 12 carbon atoms (C 6 to C 12 ), and an aralkyl group having 7 to 24 carbon atoms (C 7 to C 24 )
  • R 12 and R 13 , R 14 and R 15 may each be an alkylidenyl group having 1 to 10 carbon atoms (C 1 to C 10 ).
  • acrylic acid (methacrylic acid) monomers include acrylic acid, methacrylic acid, acrylic acid ester, methacrylic acid ester, acrylic acid amide, methacrylic acid amide, acrylonitrile, and the like. These can be used alone or in combination of two or more.
  • vinyl ether monomers include methyl vinyl ether, ethyl vinyl ether, n-propyl vinyl ether, isopropyl vinyl ether, n-butyl vinyl ether, isobutyl vinyl ether, tert-butyl vinyl ether, n-pentyl vinyl ether, n-hexyl vinyl ether, n-octyl.
  • alkyl vinyl ethers or cycloalkyl vinyl ethers such as vinyl ether, n-dodecyl vinyl ether, 2-ethylhexyl vinyl ether, and cyclohexyl vinyl ether, and one or more of these can be used in combination.
  • examples of the styrene monomer include styrene and divinylbenzene, and one or two of these can be used in combination.
  • the monomer may be oligomerized as described above.
  • the addition amount of these monomers is preferably 1 part by weight or more and 50 parts by weight or less, and more preferably 2 parts by weight or more and 20 parts by weight or less with respect to 100 parts by weight of the polymer.
  • the polymerization initiator acts on the monomer with irradiation of actinic radiation to promote the reaction of the monomer, and is added as necessary in consideration of the reactivity of the monomer.
  • the polymerization initiator to be used is appropriately selected according to the type of monomer polymerization reaction or crosslinking reaction.
  • radical polymerization initiators are preferably used exclusively for acrylic acid (methacrylic acid) monomers and styrene monomers
  • cationic polymerization initiators are preferably used exclusively for epoxy monomers, oxetane monomers, and vinyl ether monomers.
  • radical polymerization initiators examples include benzophenones and acetophenones.
  • examples of the cationic polymerization initiator include Lewis acid generating type such as diazonium salt, Bronsted acid generating type such as iodonium salt and sulfonium salt.
  • the following cationic polymerization initiator photoacid generator
  • photoacid generator photoacid generator
  • sulfonium salts such as triphenylsulfonium trifluoromethanesulfonate, tris (4-t-butylphenyl) sulfonium-trifluoromethanesulfonate, diazonium salts such as p-nitrophenyldiazonium hexafluorophosphate, ammonium salts, phosphonium salts, diphenyliodonium Iodonium salts such as trifluoromethanesulfonate, (triccumyl) iodonium-tetrakis (pentafluorophenyl) borate, quinonediazides, diazomethanes such as bis (phenylsulfonyl) diazomethane, 1-phenyl-1- (4-methylphenyl) sulfonyloxy- Sulfos such as 1-benzoylmethane, N-hydroxynaphthalimide-trifluoromethanes, di
  • the content of the polymerization initiator is preferably 0.01 parts by weight or more and 0.3 parts by weight or less, more preferably 0.02 parts by weight or more and 0.2 parts by weight or less with respect to 100 parts by weight of the polymer. . Thereby, there exists an effect of a reactive improvement.
  • the sensitizer increases the sensitivity of the polymerization initiator to light and is suitable for the function of reducing the time and energy required for the activation (reaction or decomposition) of the polymerization initiator and for the activation of the polymerization initiator. It has a function of changing the wavelength of light to a wavelength.
  • Such a sensitizer is appropriately selected according to the sensitivity of the polymerization initiator and the peak wavelength of absorption of the sensitizer, and is not particularly limited.
  • 9,10-dibutoxyanthracene (CAS No. 76275) is selected. 14-4)), anthracenes, xanthones, anthraquinones, phenanthrenes, chrysenes, benzpyrenes, fluoranthenes, rubrenes, pyrenes, indanthrines, thioxanthen-9-ones (Thioxanthen-9-ones) and the like, and these can be used alone or as a mixture.
  • sensitizer examples include, for example, 2-isopropyl-9H-thioxanthen-9-one, 4-isopropyl-9H-thioxanthen-9-one, 1-chloro-4-propoxythioxanthone, and phenothiazine. Or a mixture thereof.
  • the content of the sensitizer in the core layer forming composition 900 is preferably 0.01% by weight or more, more preferably 0.5% by weight or more, and 1% by weight or more. Is more preferable. In addition, it is preferable that an upper limit is 5 weight% or less.
  • the additive 920 includes a catalyst precursor, a co-catalyst, an antioxidant, an ultraviolet absorber, a light stabilizer, a silane coupling agent, a coating surface improver, a thermal polymerization inhibitor, a leveling agent, and a surfactant. , Colorants, storage stabilizers, plasticizers, lubricants, fillers, inorganic particles, anti-aging agents, wettability improvers, antistatic agents, and the like.
  • the layer 910 containing the polymer 915 and the additive 920 as described above has a predetermined refractive index due to the action of the additive 920 dispersed uniformly in the polymer 915.
  • a mask (masking) 935 in which an opening (window) 9351 is formed is prepared, and the layer 910 is irradiated with active radiation 930 through the mask 935 (see FIG. 5).
  • the irradiation region 925 of the active radiation 930 is mainly the side cladding portion 15.
  • an opening (window) 9351 equivalent to the pattern of the side cladding portion 15 to be formed is mainly formed in the mask 935.
  • This opening 9351 forms a transmission part through which the active radiation 930 to be irradiated passes.
  • the pattern of the core part 14 and the side clad part 15 is determined based on the refractive index distribution W formed according to irradiation of the active radiation 930, the pattern of the opening 9351 and the pattern of the side clad part 15 are completely There is a case in which there is a slight deviation between the two patterns.
  • the mask 935 may be formed in advance (separately formed) (for example, plate-shaped) or may be formed on the layer 910 by, for example, a vapor deposition method or a coating method.
  • Preferred examples of the mask 935 include a photomask made of quartz glass or a PET base material, a stencil mask, a metal thin film formed by a vapor deposition method (evaporation, sputtering, etc.), etc.
  • a photomask or a stencil mask it is particularly preferable to use a photomask or a stencil mask. This is because a fine pattern can be formed with high accuracy, and handling is easy, which is advantageous in improving productivity.
  • the opening (window) 9351 of the mask 935 is shown by partially removing the mask along the pattern of the irradiation region 925 of the active radiation 930.
  • the quartz glass, the PET base material, etc. it is also possible to use a photomask provided with a shielding portion of active radiation 930 made of a shielding material made of metal such as chromium.
  • the part other than the shielding part is the window (transmission part).
  • the actinic radiation 930 to be used is not particularly limited as long as it can cause a photochemical reaction (change) with respect to the polymerization initiator and can release the leaving group contained in the polymer 915.
  • visible light In addition to ultraviolet light, infrared light, and laser light, electron beams, X-rays, and the like can also be used.
  • the actinic radiation 930 is appropriately selected depending on the kind of the sensitizer when it contains a polymerization initiator, a leaving group, and a sensitizer, and is not particularly limited, but has a wavelength of 200 to 450 nm. It is preferable to have a peak wavelength in the range. As a result, the polymerization initiator can be activated relatively easily and the leaving group can be removed relatively easily.
  • the dose of the active radiation 930 is preferably about 0.1 to 9 J / cm 2 , more preferably about 0.2 to 6 J / cm 2, and about 0.2 to 3 J / cm 2. More preferably.
  • the polymerization initiator When the layer 910 is irradiated with the active radiation 930 through the mask 935, the polymerization initiator is activated in the irradiated region 925. Thereby, the monomer is polymerized in the irradiation region 925. When the monomer is polymerized, the amount of monomer in the irradiated region 925 decreases, and accordingly, the monomer in the unirradiated region 940 diffuses and moves to the irradiated region 925.
  • the polymer 915 and the monomer are appropriately selected so that a difference in refractive index is generated between them, a refractive index difference is generated between the irradiated region 925 and the non-irradiated region 940 as the monomer diffuses and moves.
  • FIG. 9 is a diagram for explaining a state in which a difference in refractive index occurs between the irradiated region 925 and the non-irradiated region 940.
  • the horizontal cross-sectional position of the layer 910 is taken on the horizontal axis, and the refractive index of the horizontal cross-section is It is a figure which shows refractive index distribution when it takes on an axis
  • the refractive index of the unirradiated region 940 becomes higher and the refractive index of the irradiated region 925 becomes lower as the monomer diffuses and moves ( FIG. 9 (a)).
  • the diffusion movement of the monomer occurs due to the consumption of the monomer in the irradiation region 925 and the concentration gradient of the monomer formed accordingly. For this reason, the monomers in the entire unirradiated region 940 do not move toward the irradiated region 925 all at once, but gradually move from a portion close to the irradiated region 925 and outward from the center of the unirradiated region 940 to compensate for this. Monomer migration also occurs. As a result, as shown in FIG.
  • the refractive index of the polymer obtained by polymerizing the monomers as described above is almost the same as the refractive index of the monomer before polymerization (the difference in refractive index is about 0 to 0.001). As the polymerization proceeds, the refractive index decreases according to the amount of the monomer and the amount of the substance derived from the monomer. Therefore, the shape of the refractive index distribution W can be controlled by appropriately adjusting the amount of monomer with respect to the polymer.
  • the monomer is not polymerized because the polymerization initiator is not activated.
  • the ease of monomer diffusion transfer gradually decreases as the polymerization of the monomer proceeds.
  • the distribution shape of the low refractive index portion L formed in the irradiated region 925 is likely to be asymmetrical left and right, and the gradient on the non-irradiated region 940 side becomes steeper. Thereby, the refractive index distribution W which the optical waveguide of this invention has is formed.
  • the polymer 915 preferably has a leaving group as described above. This leaving group is released upon irradiation with actinic radiation 930 and decreases the refractive index of the polymer 915. Therefore, when the irradiation region 925 is irradiated with the actinic radiation 930, the above-described diffusion movement of the monomer is started, the leaving group is released from the polymer 915, and the refractive index of the irradiation region 925 decreases from before the irradiation. (See FIG. 9B).
  • This decrease in the refractive index occurs uniformly in the entire irradiation region 925, so that the refractive index difference between the high refractive index portion H and the low refractive index portion L described above is further enlarged. As a result, a refractive index distribution W shown in FIG. 9B is obtained. Note that the change in refractive index in FIG. 9A and the change in refractive index in FIG. 9B occur almost simultaneously. Such a refractive index change further expands the refractive index difference.
  • the refractive index of the core layer after energy irradiation is adjusted by appropriately adjusting the components of the core layer before energy irradiation, the irradiation amount of energy irradiation, or the degree of drying of the core layer before energy irradiation.
  • the shape of the distribution can be controlled.
  • the refractive index difference and the shape of the refractive index distribution to be formed can be controlled by adjusting the dose of the active radiation 930. For example, the refractive index difference can be enlarged by increasing the irradiation amount.
  • the shape of the refractive index distribution can be controlled by adjusting the content and irradiation amount of the photoacid generator.
  • the layer 910 may be dried before the irradiation with the active radiation 930, but the shape of the refractive index distribution can be controlled by adjusting the degree of drying at that time. For example, by increasing the degree of drying, the diffusion transfer amount of the monomer can be suppressed. Also, by increasing the drying temperature, the amount of diffusion can be increased and the refractive index distribution can be controlled.
  • the layer 910 is subjected to heat treatment.
  • the monomer in the irradiation region 925 irradiated with light is further polymerized.
  • the monomer in the unirradiated region 940 is volatilized. Thereby, in the unirradiated region 940, the monomer is further reduced, the refractive index is increased, and the refractive index is close to that of the polymer 915.
  • the heating temperature in this heat treatment is not particularly limited, but is preferably about 30 to 180 ° C, more preferably about 40 to 160 ° C.
  • the heating time is preferably set so that the polymerization reaction of the monomer in the irradiation region 925 is almost completed.
  • the heating time is preferably about 0.1 to 2 hours, preferably 0.1 to 1 hour. More preferred is the degree.
  • the refractive index distribution W there are minimum values Ws1, Ws2, Ws3, and Ws4 converted from the low refractive index portion L (see FIG. 2B), and the positions of these minimum values are the core portion 14 and the side surface. This corresponds to the boundary with the clad portion 15.
  • the refractive index distribution W has a certain correlation with the monomer-derived structure concentration in the core layer 13. Therefore, it is possible to indirectly specify the refractive index distribution W of the optical waveguide 1 by measuring the concentration of the monomer-derived structure.
  • the concentration of the structure can be measured using, for example, FT-IR or TOF-SIMS line analysis, surface analysis, or the like.
  • the refractive index distribution W can be indirectly specified even if the intensity distribution of the emitted light from the optical waveguide 1 has a certain correlation with the refractive index distribution W.
  • the refractive index distribution W can be directly specified by a refraction near field method, a differential interference method, or the like.
  • the refractive index of the movement destination increases with the diffusion movement of the monomer.
  • the irradiation area 940 may be set.
  • the use of the mask 935 may be omitted.
  • the clad layers 11 and 12 are laminated on both surfaces of the core layer 13. Thereby, the optical waveguide 1 is obtained.
  • the clad layer 11 (12) is formed on the support substrate 952 (see FIG. 7).
  • a varnish (cladding layer forming composition) containing a clad material is applied and cured (solidified), and a curable monomer composition is applied and cured (solidified). Any method may be used.
  • the core layer 13 is peeled from the support substrate 951, and the core layer 13 is sandwiched between the support substrate 952 on which the cladding layer 11 is formed and the support substrate 952 on which the cladding layer 12 is formed (FIG. 8A )reference).
  • the clad layers 11 and 12 and the core layer 13 are joined and integrated (see FIG. 8B).
  • the support substrate 952 is peeled off and removed from the cladding layers 11 and 12, respectively. Thereby, the optical waveguide 1 is obtained.
  • a support film 2 is laminated on the lower surface of the optical waveguide 1 and a cover film 3 is laminated on the upper surface.
  • the core layer 13 may be formed not on the support substrate 951 but on the cladding layer 11. Further, the clad layer 12 may be formed by applying a material on the core layer 13 instead of being laminated on the core layer 13.
  • the second manufacturing method is the same as the first manufacturing method except that the composition of the core layer forming composition 900 is different.
  • the second method of manufacturing the optical waveguide 1 is as follows: [1] After applying the core layer forming composition 900 on the support substrate 951 to form a liquid film, the support substrate 951 is placed on a level table to form the liquid film. While flattening, the solvent is evaporated (desolvent). Thereby, the layer 910 is obtained. [2] Next, after irradiating a part of the layer 910 with actinic radiation, the layer 910 is subjected to a heat treatment to cause a refractive index difference, and the core layer 13 having the core portion 14 and the side cladding portion 15 is formed. obtain. [3] Next, the cladding layers 11 and 12 are laminated on both surfaces of the core layer 13 to obtain the optical waveguide 1.
  • a core layer forming composition 900 is prepared.
  • the core layer forming composition 900 used in the second production method contains a catalyst precursor and a cocatalyst instead of the polymerization initiator.
  • the catalyst precursor is a substance capable of initiating a monomer reaction (polymerization reaction, crosslinking reaction, etc.), and is a substance whose activation temperature changes due to the action of a promoter activated by light irradiation. Due to this change in the activation temperature, a difference occurs in the temperature at which the monomer reaction starts between the light irradiation region 925 and the non-irradiation region 940, and as a result, the monomer can be reacted only in the irradiation region 925. .
  • any compound may be used as long as the activation temperature changes (increases or decreases) with irradiation of actinic radiation, and in particular, irradiation with actinic radiation. Along with this, the activation temperature decreases.
  • the core layer 13 optical waveguide 1 can be formed by heat treatment at a relatively low temperature, and unnecessary heat is applied to the other layers, so that the characteristics (optical transmission performance) of the optical waveguide 1 are deteriorated. Can be prevented.
  • a catalyst precursor containing (mainly) at least one of the compounds represented by the following formulas (Ia) and (Ib) is preferably used.
  • E (R) 3 represents a neutral electron donor ligand of group 15, respectively, E represents an element selected from group 15 of the periodic table, and R represents , Represents a moiety containing a hydrogen atom (or one of its isotopes) or a hydrocarbon group, and Q represents an anionic ligand selected from carboxylate, thiocarboxylate and dithiocarboxylate.
  • LB represents a Lewis base
  • WCA represents a weakly coordinating anion
  • a represents an integer of 1 to 3
  • b represents an integer of 0 to 2
  • a and b total is 1 ⁇ 3
  • p and r represent the number of balancing the charge of palladium cations and weakly coordinating anions.
  • Typical catalyst precursors according to Formula Ia include Pd (OAc) 2 (P (i-Pr) 3 ) 2 , Pd (OAc) 2 (P (Cy) 3 ) 2 , Pd (O 2 CCMe 3 ) 2 (P (Cy) 3 ) 2 , Pd (OAc) 2 (P (Cp) 3 ) 2 , Pd (O 2 CCF 3 ) 2 (P (Cy) 3 ) 2 , Pd (O 2 CC 6 H 5 ) 3 (P (Cy) 3 ) 2 may be mentioned, but is not limited thereto.
  • Cp represents a cyclopentyl group
  • Cy represents a cyclohexyl group.
  • the catalyst precursor represented by the formula Ib is preferably a compound in which p and r are selected from integers of 1 and 2, respectively.
  • Typical catalyst precursors according to such formula Ib include Pd (OAc) 2 (P (Cy) 3 ) 2 .
  • Cy represents a cyclohexyl group
  • Ac represents an acetyl group.
  • catalyst precursors can efficiently react with a monomer (in the case of a norbornene-based monomer, an efficient polymerization reaction, a crosslinking reaction, etc. by an addition polymerization reaction).
  • the catalyst precursor in a state where the activation temperature is lowered (active latent state), has an activation temperature lower by about 10 to 80 ° C. (preferably about 10 to 50 ° C.) than the original activation temperature. Is preferred. Thereby, the refractive index difference between the core part 14 and the side clad part 15 can be produced reliably.
  • Such a catalyst precursor includes (mainly) one containing at least one of Pd (OAc) 2 (P (i-Pr) 3 ) 2 and Pd (OAc) 2 (P (Cy) 3 ) 2. Is preferred.
  • the co-catalyst is a substance that can be activated by irradiation with actinic radiation to change the activation temperature of the catalyst precursor (procatalyst) (the temperature at which the monomer reacts).
  • any compound can be used as long as it has a molecular structure that changes (reacts or decomposes) when activated by irradiation with actinic radiation.
  • a compound (photoinitiator) that decomposes upon irradiation with actinic radiation and generates a cation such as a proton or other cation and a weakly coordinated anion (WCA) that can be substituted with a leaving group of the catalyst precursor ( (Mainly) is preferably used.
  • weakly coordinating anions examples include tetrakis (pentafluorophenyl) borate ion (FABA ⁇ ), hexafluoroantimonate ion (SbF 6 ⁇ ), and the like.
  • cocatalyst examples include tetrakis (pentafluorophenyl) gallium in addition to tetrakis (pentafluorophenyl) borate and hexafluoroantimonate represented by the following formula: Acid salts, aluminates, antimonates, other borates, gallates, carboranes, halocarboranes and the like.
  • PHOTOINITIATOR 2074 (CAS No. 178233-72-2) available from Rhodia USA, Cranberry, New Jersey.
  • TAG-372R ((dimethyl (2- (2-naphthyl) -2-oxoethyl) sulfonium tetrakis (pentafluorophenyl) borate: CAS No. 193957) available from Toyo Ink Manufacturing Co., Ltd., Tokyo, Japan” -54-9)
  • MPI-103 CAS No.
  • UV light ultraviolet rays
  • actinic radiation actinic radiation
  • mercury lamp high pressure mercury lamp
  • the layer 910 is irradiated with the active radiation 930 through the mask 935.
  • the co-catalyst reacts (bonds) or decomposes by the action of the active radiation 930, and liberates (generates) cations (protons or other cations) and weakly coordinating anions (WCA).
  • the catalyst precursor in the active latent state (or the latent active state) has an activation temperature lower than the original activation temperature, but there is no temperature increase, that is, at about room temperature, the irradiation region.
  • the optical waveguide 1 (for example, the core layer 13) can be obtained by preparing a plurality of layers 910 after the irradiation with the active radiation 930 and subjecting them to a heat treatment to be described later. Is expensive.
  • the leaving group is detached from the polymer 915 as in the first production method. This creates a refractive index difference between the irradiated region 925 and the unirradiated region 940 of the layer 910.
  • the layer 910 is subjected to heat treatment (first heat treatment).
  • first heat treatment first heat treatment
  • the catalyst precursor in the active latent state is activated (becomes active), and monomer reaction (polymerization reaction or cross-linking reaction) occurs.
  • the monomer concentration in the irradiation region 925 gradually decreases.
  • a difference in monomer concentration occurs between the irradiated region 925 and the unirradiated region 940, and the monomer diffuses from the unirradiated region 940 and collects in the irradiated region 925 in order to eliminate this.
  • a refractive index profile similar to that in the first manufacturing method is formed in the layer 910.
  • the heating temperature in this heat treatment is not particularly limited, but is preferably about 30 to 80 ° C., more preferably about 40 to 60 ° C.
  • the heating time is preferably set so that the reaction of the monomer in the irradiation region 925 is almost completed.
  • the heating time is preferably about 0.1 to 2 hours, preferably 0.1 to 1 hour. More preferred is the degree.
  • second heat treatment is performed on the layer 910.
  • the catalyst precursor remaining in the unirradiated region 940 and / or the irradiated region 925 is activated (activated) directly or with activation of the cocatalyst, whereby each region 925, 940 is activated.
  • the remaining monomer is reacted.
  • the heating temperature in the second heat treatment is not particularly limited as long as it can activate the catalyst precursor or the cocatalyst, but is preferably about 70 to 100 ° C., and is preferably about 80 to 90 ° C. Is more preferable.
  • the heating time is preferably about 0.5 to 2 hours, and more preferably about 0.5 to 1 hour.
  • the layer 910 is subjected to a third heat treatment. Thereby, reduction of the internal stress which arises in the core layer 13 obtained, and the further stabilization of the core part 14 and the side clad part 15 can be aimed at.
  • the heating temperature in the third heat treatment is preferably set to 20 ° C. or more higher than the heating temperature in the second heat treatment, specifically, preferably about 90 to 180 ° C., and preferably 120 to 160 ° C. More preferred is the degree.
  • the heating time is preferably about 0.5 to 2 hours, more preferably about 0.5 to 1 hour.
  • the clad layers 11 and 12 are laminated on both surfaces of the core layer 13. Thereby, the optical waveguide 1 is obtained.
  • the optical waveguide of the present invention as described above is excellent in optical transmission efficiency and long-term reliability. For this reason, by providing the optical waveguide of the present invention, a highly reliable electronic device (electronic device of the present invention) capable of performing high-quality optical communication between two points can be obtained.
  • Examples of the electronic device including the optical waveguide of the present invention include electronic devices such as a mobile phone, a game machine, a router device, a WDM device, a personal computer, a television, and a home server. In any of these electronic devices, it is necessary to transmit a large amount of data at high speed between an arithmetic device such as an LSI and a storage device such as a RAM. Therefore, by providing such an electronic device with the optical waveguide of the present invention, problems such as noise and signal degradation peculiar to electrical wiring are eliminated, and a dramatic improvement in performance can be expected.
  • the amount of heat generated in the optical waveguide portion is greatly reduced compared to electrical wiring. For this reason, the electric power required for cooling can be reduced and the power consumption of the whole electronic device can be reduced.
  • the optical waveguide of the present invention has small transmission loss and pulse signal dullness, and interference does not easily occur even when the number of channels is increased and the density is increased. For this reason, an optical waveguide having high density and a small area and high reliability can be obtained. By mounting the optical waveguide, the reliability of electronic equipment can be improved and the size can be reduced.
  • optical waveguide and the electronic device of the present invention have been described above.
  • present invention is not limited to this, and for example, an arbitrary component may be added to the optical waveguide.
  • a transmission device such as a router device or a WDM (Wavelength Division Multiplexing) device is used as a device for transmitting information to a broadband line (broadband) capable of communicating a large amount of information at high speed.
  • a broadband line broadband line
  • a large number of signal processing boards in which arithmetic elements such as LSIs and storage elements such as memories are combined are installed, and each line is interconnected.
  • the optical waveguide of the present embodiment has excellent optical transmission characteristics such as few optical defects and reduced crosstalk. As a result, it is possible to suppress the occurrence of crosstalk and high-frequency noise, the deterioration of electric signals, and the like as the information transmission speeds up. Therefore, information can be transmitted with high throughput in each signal processing board. In addition, information can be transmitted with high throughput even by a super computer or a large-scale server.
  • the method for producing the optical waveguide of the present invention is not limited to the above-described method.
  • a method of cutting a molecular bond by irradiation with actinic radiation and changing a refractive index (photo bleach method), a core layer is formed.
  • a method in which a photocrosslinkable polymer having an unsaturated bond capable of photoisomerization or photodimerization is contained in the composition to be formed, and this is irradiated with actinic radiation to change the molecular structure and change the refractive index (photoisomerization).
  • photoisomerization photocrosslinkable polymer having an unsaturated bond capable of photoisomerization or photodimerization
  • other methods such as photodimerization method).
  • the amount of change in the refractive index can be adjusted according to the irradiation amount of the active radiation, the irradiation amount of the active radiation applied to each part of the layer according to the shape of the target refractive index distribution W is set. By making them different, a core layer having a refractive index distribution W can be formed.
  • the refractive index distribution in the thickness direction of the optical waveguide of the present invention is not particularly limited.
  • the step index (SI) type distribution, the graded index (GI) type distribution, or the same refractive index distribution W as described above. Distribution etc. may be sufficient.
  • Example 1 Production of optical waveguide (Example 1) (1) Synthesis of norbornene-based resin having a leaving group In a glove box filled with dry nitrogen in which the water and oxygen concentrations are both controlled to 1 ppm or less, 7.2 g (40.1 mmol) of hexylnorbornene (HxNB) Then, 12.9 g (40.1 mmol) of diphenylmethylnorbornenemethoxysilane was weighed into a 500 mL vial, 60 g of dehydrated toluene and 11 g of ethyl acetate were added, and the top was sealed with a silicon sealer.
  • HxNB hexylnorbornene
  • Ni catalyst represented by the following chemical formula (A) and 10 mL of dehydrated toluene are weighed in a 100 mL vial, put a stirrer chip, tightly plugged, and thoroughly agitate the catalyst. Dissolved in.
  • the molar ratio of each structural unit in polymer # 1 was 50 mol% for the hexylnorbornene structural unit and 50 mol% for the diphenylmethylnorbornenemethoxysilane structural unit, as determined by NMR.
  • composition for forming core layer 10 g of the purified polymer # 1 was weighed into a 100 mL glass container, and 40 g of mesitylene, 0.01 g of antioxidant Irganox 1076 (manufactured by Ciba Geigy), cyclohexyl oxetane monomer (formula) 1st monomer shown in (20), Toagosei Co., Ltd.
  • the core layer-forming composition was uniformly applied on the lower clad layer with a doctor blade, and then placed in a dryer at 55 ° C. for 10 minutes. After the solvent was completely removed, a photomask was pressed and selectively irradiated with ultraviolet rays at 1300 mJ / cm 2 . The mask was removed, and heating was performed at 150 ° C. in a dryer for 1.5 hours. It was confirmed that a very clear waveguide pattern appeared after heating. Moreover, formation of the core part and the side clad part was confirmed.
  • the formed optical waveguide has eight core portions formed in parallel. The width of the core portion was 50 ⁇ m, the width of the side cladding portion was 80 ⁇ m, and the thickness of the core layer was 50 ⁇ m.
  • a dry film in which Avatrel 2000P is laminated in advance on a polyethersulfone (PES) film so as to have a dry thickness of 20 ⁇ m is bonded to the above core layer, and put into a vacuum laminator set at 140 ° C. for thermocompression bonding. It was. Thereafter, 100 mJ was irradiated on the entire surface and heated in a dryer at 120 ° C. for 1 hour to cure Avatrel 2000P to form an upper clad layer to obtain an optical waveguide. A length of 10 cm was cut out from the obtained optical waveguide.
  • PES polyethersulfone
  • the refractive index distribution of the width direction was acquired using the interference microscope along the centerline of the thickness direction.
  • the refractive index distribution had a plurality of minimum values and maximum values, and the refractive index was continuously changed.
  • a method for measuring a refractive index distribution using an interference microscope will be described.
  • the optical waveguide was sliced in the cross-sectional direction of the optical waveguide to obtain an optical waveguide fragment.
  • the optical waveguide was sliced so that the length was 200 ⁇ m to 300 ⁇ m.
  • a chamber filled with oil having a refractive index of 1.536 was created in a space surrounded by two glass slides.
  • a measurement sample in which the optical waveguide piece was sandwiched in the space in the chamber and a blank sample without the optical waveguide piece were prepared.
  • an interference fringe photograph in the cross-sectional direction of the optical waveguide fragment was obtained using an interference microscope.
  • the interference fringe photograph was subjected to image analysis to obtain a refractive index distribution.
  • the image analysis of the interference fringe photograph was performed as follows. First, the optical path length of the interference microscope was changed to continuously acquire image data in which the place where the interference fringes were generated. From a plurality of image data, the refractive index at each measurement point in the interlayer direction and the in-layer direction was calculated. In this example, the interval between measurement points was 2.5 ⁇ m.
  • Example 2 An optical waveguide was obtained in the same manner as in Example 1 except that the irradiation amount of ultraviolet rays was increased to 1500 mJ / cm 2 .
  • Example 3 While increasing the irradiation amount of ultraviolet rays to 2000 mJ / cm 2 and changing the molar ratio of each structural unit of polymer # 1 to 40 mol% for the hexyl norbornene structural unit and 60 mol% for the diphenylmethyl norbornene methoxysilane structural unit as the polymer An optical waveguide was obtained in the same manner as in Example 1 except that was used.
  • Example 4 The amount of UV irradiation was reduced to 500 mJ / cm 2 and the polymer molar ratio of each structural unit of polymer # 1 was changed to 45 mol% for hexylnorbornene structural units and 55 mol% for diphenylmethylnorbornenemethoxysilane structural units.
  • An optical waveguide was obtained in the same manner as in Example 1 except that was used.
  • Example 5 Except that the molar ratio of each structural unit of polymer # 1 was changed to 30 mol% for the hexylnorbornene structural unit and 70 mol% for the diphenylmethylnorbornenemethoxysilane structural unit as the polymer, the same as in Example 1. Thus, an optical waveguide was obtained.
  • Example 8 In addition to reducing the amount of UV irradiation to 300 mJ / cm 2 and changing the molar ratio of each structural unit of polymer # 1 to 40 mol% for the hexylnorbornene structural unit and 60 mol% for the diphenylmethylnorbornenemethoxysilane structural unit as the polymer An optical waveguide was obtained in the same manner as in Example 1 except that was used.
  • Example 9 In addition to reducing the amount of UV irradiation to 500 mJ / cm 2 , the polymer has a molar ratio of each structural unit of polymer # 1 changed to 30 mol% for hexylnorbornene structural units and 70 mol% for diphenylmethylnorbornenemethoxysilane structural units.
  • An optical waveguide was obtained in the same manner as in Example 1 except that was used.
  • Example 10 In addition to reducing the irradiation amount of ultraviolet rays to 100 mJ / cm 2 and changing the molar ratio of each structural unit of polymer # 1 to 60 mol% for the hexyl norbornene structural unit and 40 mol% for the diphenylmethylnorbornene methoxysilane structural unit as the polymer An optical waveguide was obtained in the same manner as in Example 1 except that was used.
  • Example 11 In addition to increasing the irradiation amount of ultraviolet rays to 1500 mJ / cm 2 , as a polymer, the molar ratio of each structural unit of polymer # 1 was changed to 10 mol% for the hexyl norbornene structural unit and 90 mol% for the diphenylmethyl norbornene methoxysilane structural unit. An optical waveguide was obtained in the same manner as in Example 1 except that was used.
  • Example 12 In addition to increasing the irradiation amount of ultraviolet rays to 3000 mJ / cm 2 , as a polymer, the molar ratio of each structural unit of polymer # 1 was changed to 5 mol% for the hexylnorbornene structural unit and 95 mol% for the diphenylmethylnorbornenemethoxysilane structural unit.
  • An optical waveguide was obtained in the same manner as in Example 1 except that was used.
  • Example 13 An optical waveguide was obtained in the same manner as in Example 1 except that the core layer forming composition was manufactured by the method shown below.
  • Example 14 An optical waveguide was obtained in the same manner as in Example 1 except that the core layer forming composition was manufactured by the method shown below.
  • Example 15 An optical waveguide was obtained in the same manner as in Example 1 except that the core layer forming composition was manufactured by the method shown below.
  • 10 g of the purified polymer # 1 is weighed into a 100 mL glass container, 40 g of mesitylene, 0.01 g of an antioxidant Irganox 1076 (manufactured by Ciba Geigy), cyclohexyl oxetane monomer (shown by Formula 20, CHOX manufactured by Toagosei Co., Ltd.) 1 g, 1 g of alicyclic epoxy monomer (manufactured by Daicel Chemical Industries, Celoxide 2021P), photoacid generator Rhodorsil Photoinitiator 2074 (manufactured by Rhodia, CAS # 178233-72-2) (1.36E-2 g in 0.1 mL of ethyl acetate) And then uniformly dissolved, followed by filtration with a 0.2 ⁇ m PTFE filter to obtain a clean composition for forming a core layer.
  • an antioxidant Irganox 1076 manufactured by Ciba Geigy
  • Example 16 An optical waveguide was obtained in the same manner as in Example 1 except that the polymer synthesized by the method shown below was used.
  • a polymer was synthesized in the same manner as in Example 1 except that 10.4 g (40.1 mmol) of phenyldimethylnorbornenemethoxysilane was used instead of 12.9 g (40.1 mmol) of diphenylmethylnorbornenemethoxysilane.
  • the structural unit of the obtained polymer is shown in the following formula (103).
  • the molar ratio of each structural unit was 50 mol% for the hexylnorbornene structural unit and 50 mol% for the phenyldimethylnorbornenemethoxysilane structural unit, as determined by NMR.
  • Example 17 The core layer-forming composition was prepared by the following method, and the core layer-forming composition was uniformly applied on the lower clad layer with a doctor blade, and then a dryer at 60 ° C. An optical waveguide was obtained in the same manner as in Example 1 except that the optical waveguide was added for 10 minutes.
  • Example 18 An optical waveguide was obtained in the same manner as in Example 15 except that the irradiation amount of ultraviolet rays was reduced to 500 mJ / cm 2 .
  • a core layer forming composition in which the cyclohexyloxetane monomer was omitted from polymer # 1 was applied thereon, and then exposed and heated to obtain a core layer. Thereafter, an optical waveguide was obtained by forming an upper cladding layer.
  • the refractive index of the core part was almost constant, and the refractive index of the side cladding part was also almost constant. That is, the refractive index distribution of the core layer of the obtained optical waveguide was a so-called step index type.
  • Comparative Example 2 An optical waveguide was obtained in the same manner as in Comparative Example 1 except that exposure was performed using a photomask whose transmittance was continuously changed so that the exposure amount was continuously changed during exposure.
  • the refractive index of the side cladding portion was almost constant, while the refractive index of the core portion continuously decreased from the central portion toward the periphery. That is, the refractive index distribution of the core layer of the obtained optical waveguide is a so-called graded index type.
  • Comparative Example 3 An optical waveguide was obtained in the same manner as in Comparative Example 1 except that exposure was performed using a photomask whose transmittance was continuously changed so that the exposure amount was continuously changed during exposure.
  • the refractive index distribution has a plurality of minimum values and maximum values, and the refractive index of the core portion continuously decreases from the central portion toward the periphery, reaching a minimum value.
  • the refractive index continuously increased as the distance from the minimum value increased.
  • the shape of the refractive index distribution was substantially V-shaped, and the change in the refractive index in the vicinity thereof was discontinuous.
  • each local minimum value Ws1, Ws2, Ws3, Ws4 and each local maximum value Wm1, Wm2, Wm3, Wm4, Wm5 were obtained, and an average refractive index WA in the cladding part was obtained.
  • the width a [ ⁇ m] of the portion where the refractive index in the vicinity of the maximum values Wm2 and Wm4 formed in the core portion has a value equal to or greater than the average refractive index WA, and each minimum value
  • the width b [ ⁇ m] of the portion where the refractive index in the vicinity of Ws1, Ws2, Ws3, and Ws4 has a value less than the average refractive index WA was measured.
  • the refractive index distribution W of the optical waveguide obtained in each example had a continuous change in the refractive index as a whole.
  • the refractive index distribution P over the first cladding layer, the cladding portion, and the cladding layer was SI type.
  • the refractive index distribution of the optical waveguide obtained in Comparative Example 1 was a step index type as described above.
  • the refractive index distribution of the optical waveguide obtained in Comparative Example 2 was a graded index type as described above.
  • the refractive index distribution of the optical waveguide obtained in Comparative Example 3 was discontinuously changed between the core portion and the side cladding portion.
  • FIG. 10 is a diagram for explaining a method of measuring the intensity distribution of outgoing light on the outgoing side end face of the optical waveguide.
  • an incident-side optical fiber 21 having a diameter of 50 ⁇ m is disposed so as to face one of the core portions 14 of the incident-side end face 1a of the optical waveguide 1 to be measured.
  • the incident-side optical fiber 21 is connected to a light emitting element (not shown) for making light incident on the optical waveguide 1, and is arranged so that the optical axis thereof coincides with the optical axis of the core portion 14. Yes.
  • an output side optical fiber 22 having a diameter of 62.5 ⁇ m was disposed so as to face the end surface 1b.
  • the emission-side optical fiber 22 is connected to a light receiving element (not shown) for receiving the emitted light emitted from the optical waveguide 1, and its optical axis is the center in the thickness direction of the core layer of the optical waveguide 1. It is aligned with the line.
  • the exit-side optical fiber 22 is configured to be able to scan the plane including this center line while maintaining a constant distance from the exit-side end face 1b.
  • the light exiting optical fiber 22 is scanned while light is incident on one of the core portions from the light incident side optical fiber 21. Then, by measuring the intensity of the emitted light measured by the light receiving element with respect to the position of the emission side optical fiber 22, the intensity distribution of the emitted light with respect to the position of the emission side end face 1b can be obtained.
  • FIG. 11 shows the intensity distribution of the emitted light measured as described above.
  • the intensity distribution of the emitted light measured by the optical waveguide obtained in Example 1, Comparative Example 1, and Comparative Example 2 is shown as a representative.
  • the crosstalk was sufficiently suppressed in any of the optical waveguides obtained in Example 1. Further, in the optical waveguide obtained in Example 1, the intensity of the emitted light in the core part 14 adjacent to the core part 14 (the central core part 14 in FIG. 11) where light is incident is adjacent to the core part 14. It was confirmed that the intensity of the emitted light was smaller than that of the side clad portion 15 located on the side opposite to the core portion 14 where the light was incident. This is because, in the optical waveguide obtained in Example 1, the side cladding portion 15 has a maximum value smaller than the core portion 14 and the refractive index distribution continuously changes.
  • the light receiving elements connected to the optical waveguide are each core portion 14. Are connected so as to face the end surface of the light-emitting side, and are not connected to the side clad portion 15. Therefore, even if light gathers in the side cladding part 15, crosstalk does not occur and interference is suppressed.
  • the maximum value of the intensity distribution of the emitted light is located in the core portion 14 adjacent to the core portion 14 where the light is incident, and the leaked light is observed. (Crosstalk).
  • the photosensitive resin composition F1 was uniformly applied on the lower clad with a doctor blade, and then placed in a dryer at 50 ° C. for 10 minutes. After completely removing the solvent, a photomask on which a linear pattern with a line of 50 ⁇ m and a space of 50 ⁇ m is drawn is pressure-bonded and irradiated with ultraviolet rays using a parallel exposure machine so that the irradiation dose is 500 mJ / cm 2. did. After that, the mask was removed, and when it was put in an oven at 150 ° C. for 30 minutes and taken out, it was confirmed that a clear waveguide pattern appeared. The thickness of the obtained core layer was 50 ⁇ m.
  • Example B (1) Polymer synthesis 20.0 g of methyl methacrylate, 30.0 g of benzyl methacrylate, and 450 g of methyl isobutyl ketone were charged into a separable flask, mixed with stirring, and then replaced with nitrogen gas to obtain a monomer solution. On the other hand, 0.25 g of azobisisobutyronitrile as a polymerization initiator was dissolved in 10 g of methyl isobutyl ketone and replaced with nitrogen gas to obtain an initiator solution. Thereafter, the monomer solution was heated to 80 ° C. while stirring, and the initiator solution was added to the monomer solution using a syringe. The mixture was heated and stirred at 80 ° C. for 1 hour and then cooled to obtain a polymer solution.
  • the photosensitive resin composition C1 was uniformly applied on the lower clad with a doctor blade, and then placed in a dryer at 50 ° C. for 10 minutes. After completely removing the solvent, a photomask on which a linear pattern with a line of 50 ⁇ m and a space of 50 ⁇ m was drawn was pressure-bonded and irradiated with ultraviolet rays using a parallel exposure machine so that the irradiation dose was 500 mJ / cm 2 . . After that, when the mask was removed, and it was taken out for 30 minutes in a nitrogen dryer at 150 ° C., it was confirmed that a clear waveguide pattern appeared. The thickness of the obtained core layer was 50 ⁇ m.
  • Example C First, a polymer A2 synthesized in the same manner as (1) of Example B was obtained except that 2- (perfluorohexyl) ethyl methacrylate was used instead of benzyl methacrylate. Thereafter, an optical waveguide was obtained in the same manner as in Example B except that the polymer A2 was used instead of the polymer A1.
  • Comparative Example 4 (1) Synthesis of norbornene-based resin having a leaving group In a glove box filled with dry nitrogen in which the water and oxygen concentrations are both controlled to 1 ppm or less, 7.2 g (40.1 mmol) of hexylnorbornene (HxNB) ), 12.9 g (40.1 mmol) of diphenylmethylnorbornenemethoxysilane was weighed into a 500 mL vial, 60 g of dehydrated toluene and 11 g of ethyl acetate were added, and the top was sealed with a silicon sealer.
  • HxNB hexylnorbornene
  • Ni catalyst represented by the following formula (4) and 10 mL of dehydrated toluene are weighed in a 100 mL vial, put a stirrer chip, and tightly plugged. Dissolved in.
  • 1 mL of the Ni catalyst solution represented by the chemical formula (A) is accurately weighed with a syringe, quantitatively injected into the vial bottle in which the two types of norbornene are dissolved, and stirred at room temperature for 1 hour, a marked increase in viscosity is observed. confirmed.
  • the stopper was removed, 60 g of tetrahydrofuran (THF) was added, and the mixture was stirred to obtain a reaction solution.
  • THF tetrahydrofuran
  • a norbornene-based resin A (polymer # 1) having a leaving group in the side chain was obtained by heating and drying for 12 hours.
  • the diphenylmethylnorbornenemethoxysilane structural unit was 50 mol%.
  • the refractive index was 1.55 (measurement wavelength: 633 nm) by Metricon.
  • the present embodiment includes the following.
  • the refractive index of the top part of the first recess may be smaller than the average refractive index in the cladding part.
  • the refractive index distribution W may have the top of the second convex portion in addition to the vicinity of the boundary between the first core portion and the cladding portion.
  • the refractive index distribution W has a top portion of the second convex portion at the center portion of the cladding portion, and the refractive index continuously decreases from the top portion of the second convex portion toward the first concave portion. You may have a region.
  • the refractive index difference between the first core portion and the first cladding layer in the refractive index distribution T may be larger than the refractive index difference between the top of the first concave portion and the top of the first convex portion in the refractive index distribution W.
  • the refractive index of the top portion the maximum value or the refractive index of the central portion of the flat portion can be used.
  • the difference between the refractive index of the top of the first recess and the average refractive index of the cladding is 3 to 80% of the difference between the refractive index of the top of the first recess and the refractive index of the top of the first projection. There may be.
  • the refractive index difference between the refractive index of the top of the first concave portion and the refractive index of the top of the first convex portion may be 0.005 to 0.07.
  • the width of the portion where the refractive index of the first convex portion has a value greater than or equal to the average refractive index of the cladding portion is a [ ⁇ m]
  • the refractive index of the first concave portion is the cladding.
  • An optical waveguide having a core portion and a cladding portion adjacent to at least both side surfaces of the core portion,
  • the refractive index profile of the cross section of the optical waveguide has at least two minimum values, at least one first maximum value, and at least two second maximum values smaller than the first maximum value.
  • the second maximum value is located at the center of the region, and the second maximum value is changed to the minimum value.
  • the refractive index distribution is substantially U-shaped convex in the vicinity of the first maximum value, and substantially U-shaped convex in the vicinity of the minimum value.
  • the width of the portion where the refractive index in the vicinity of the first maximum value has a value greater than or equal to the average refractive index in the cladding portion is a [ ⁇ m], and the vicinity of the minimum value (1) to (6), where b is 0.01a to 1.2a, where b is a width having a refractive index less than the average refractive index of the cladding portion.
  • optical waveguide according to any one of (1) to (7), wherein the optical waveguide includes a plurality of the core portions and the cladding portions adjacent to at least both side surfaces of the core portions.
  • optical waveguide includes a plurality of the core portions and the cladding portions adjacent to at least both side surfaces of the core portions.

Abstract

An optical waveguide is provided with: a first cladding layer; a core layer which is provided on the first cladding layer and which has a cladding section, a first core section, a cladding section, a second core section, and a cladding section provided in the in-layer direction in said order; and a second cladding layer which is provided on the core layer. The refractive-index distribution (W) in the in-layer direction of a portion covering the first core section and the cladding section among the core layer, continuously changes, and has regions lined up in the order of a first convex section, a first concave section and a second convex section, with the refractive-index distribution (W) located in the first core section having the first convex section, the refractive-index distribution (W) located in the cladding section having the second convex section which has a maximum refractive-index that is less than the first convex section.

Description

光導波路および電子機器Optical waveguide and electronic equipment
 本発明は、光導波路および電子機器に関するものである。 The present invention relates to an optical waveguide and an electronic device.
 近年、光搬送波を使用してデータを移送する光通信技術に関して、光搬送波を、一地点から他地点に導くための手段として、光導波路が普及しつつある。光導波路は、線状のコア部と、その周囲を覆うように設けられたクラッド部とを有している。 In recent years, optical waveguides have become widespread as means for guiding an optical carrier wave from one point to another point with respect to an optical communication technology for transferring data using the optical carrier wave. The optical waveguide has a linear core part and a clad part provided so as to cover the periphery thereof.
 光導波路としては、たとえば、特許文献1に記載のものが挙げられる。特許文献1には、ポリマー基体中に屈折率調整剤を拡散させることにより、横断面において、コア部の屈折率が同心円状に分布した光導波路が記載されている。一方、コア部の周囲を覆うクラッド部の屈折率は、一定であることが記載されている。コア部は、光搬送波の光に対して実質的に透明な材料によって構成され、クラッド部は、コア部より屈折率が低い材料によって構成されている。 Examples of the optical waveguide include those described in Patent Document 1. Patent Document 1 describes an optical waveguide in which a refractive index adjusting agent is diffused in a polymer substrate so that the refractive index of a core portion is distributed concentrically in a cross section. On the other hand, it is described that the refractive index of the cladding part covering the periphery of the core part is constant. The core part is made of a material that is substantially transparent to the light of the optical carrier wave, and the cladding part is made of a material having a refractive index lower than that of the core part.
特開2006-276735号公報JP 2006-276735 A
 上記技術において、複数のコア部を形成した場合、隣接したコア部の間でクロストークが発生することがあった。 In the above technique, when a plurality of core portions are formed, crosstalk may occur between adjacent core portions.
 本発明は、以下のものを含む。
[1]
 第1クラッド層と、
 前記第1クラッド層上に設けられており、層内方向に設けられたクラッド部、第1コア部、クラッド部、第2コア部、及びクラッド部をこの順番で有するコア層と、
 前記コア層上に設けられた第2クラッド層と、
を備え、
 前記コア層のうち前記第1コア部、及び前記クラッド部に亘る部分の層内方向の屈折率分布Wが、連続的に変化していて、第1の凸部、第1の凹部、及び第2の凸部の順で並ぶ領域を有しており、
 前記第1コア部に位置する前記屈折率分布Wは、前記第1の凸部を有しており、
 前記クラッド部に位置する前記屈折率分布Wは、前記第1の凸部よりも屈折率の最大値が小さい前記第2の凸部を有しており、
 前記第1クラッド層、前記クラッド部及び第2クラッド層に亘る部分の層間方向の屈折率分布Pが、前記第1クラッド層に位置する部分と前記クラッド部に位置する部分とで相異なる、
光導波路。
[2]
 [1]に記載の光導波路において、
 前記第1クラッド層、前記第1コア部に亘る部分の層間方向の屈折率分布Tが、前記屈折率分布Wと相異なる、光導波路。
[3]
 [1]または[2]に記載の光導波路において、
 前記第1コア部の屈折率の最大値と前記第1クラッド層の屈折率の最大値の屈折率差は、第1コア部の屈折率の最大値と前記クラッド部の屈折率の最大値との屈折率差よりも、大きい、光導波路。
[4]
 [1]から[3]のいずれか1項に記載の光導波路において、
 前記第2クラッド層上に設けられた、前記コア層と別部材の第2コア層を備え、
 前記第2コア層は、前記第1コア部の層間方向に位置する第3コア部を有する、光導波路。
[5]
 [1]から[4]のいずれか1項に記載の光導波路において、
 前記第1の凹部の頂部の屈折率は、前記クラッド部における平均屈折率より小さい、光導波路。
[6]
 [1]から[5]のいずれか1項に記載の光導波路において、
 前記屈折率分布Wは、前記第1コア部と前記クラッド部の界面近傍以外に前記第2の凸部の頂部を有する、光導波路。
[7]
 [1]から[6]のいずれか1項に記載の光導波路において、
 前記屈折率分布Wは、前記クラッド部の中心部に前記第2の凸部の頂部を有しており、前記第2の凸部の前記頂部から前記第1の凹部に向かって連続的に屈折率が低下している領域を有する、光導波路。
[8]
 [1]から[7]のいずれか1項に記載の光導波路において、
 前記第1の凹部の頂部の屈折率と前記クラッド部における平均屈折率との差は、前記第1の凹部の頂部の屈折率と前記第1の凸部の頂部の屈折率との差の3~80%である、光導波路。
[9]
 [1]から[8]のいずれか1項に記載の光導波路において、
 前記第1の凹部の頂部の屈折率と前記第1の凸部の頂部の屈折率との屈折率差は、0.005~0.07である、光導波路。
[10]
 [1]から[9]のいずれか1項に記載の光導波路において、
 前記屈折率分布Wにおいて、前記第1の凸部の屈折率が、前記クラッド部における平均屈折率以上の値を有している部分の幅をa[μm]とし、前記第1の凹部の屈折率が、前記クラッド部における平均屈折率未満の値を有している幅をb[μm]としたとき、bは、0.01a~1.2aである、光導波路。
[11]
 コア部と、該コア部の少なくとも両側面に隣接するクラッド部と、を有する光導波路であって、
 当該光導波路の横断面の屈折率分布は、少なくとも2つの極小値と、少なくとも1つの第1の極大値と、前記第1の極大値より小さい少なくとも2つの第2の極大値と、を有し、これらが、第2の極大値、極小値、第1の極大値、極小値、第2の極大値の順で並ぶ領域を有しており、この領域のうち、前記第1の極大値を含むように前記2つの極小値で挟まれる領域が前記コア部、前記各極小値から前記第2の極大値側の領域が前記クラッド部であり、
 前記各極小値は、前記クラッド部における平均屈折率未満であり、かつ、前記屈折率分布全体で屈折率が連続的に変化していることを特徴とする光導波路。
[12]
 [1]から[11]のいずれか1項に記載の光導波路を備えることを特徴とする電子機器。
The present invention includes the following.
[1]
A first cladding layer;
A core layer provided on the first clad layer and having a clad part, a first core part, a clad part, a second core part, and a clad part provided in the in-layer direction in this order;
A second cladding layer provided on the core layer;
With
In the core layer, the refractive index distribution W in the in-layer direction of the first core portion and the portion extending to the clad portion is continuously changed, and the first convex portion, the first concave portion, and the first concave portion Has a region lined up in the order of the two convex portions,
The refractive index distribution W located in the first core portion has the first convex portion,
The refractive index distribution W located in the clad portion has the second convex portion having a maximum refractive index smaller than that of the first convex portion,
The refractive index distribution P in the interlayer direction of the portion extending between the first cladding layer, the cladding portion, and the second cladding layer is different between a portion located in the first cladding layer and a portion located in the cladding portion.
Optical waveguide.
[2]
In the optical waveguide according to [1],
An optical waveguide in which a refractive index distribution T in an interlayer direction in a portion extending from the first cladding layer and the first core portion is different from the refractive index distribution W.
[3]
In the optical waveguide according to [1] or [2],
The difference in refractive index between the maximum value of the refractive index of the first core part and the maximum value of the refractive index of the first cladding layer is the maximum value of the refractive index of the first core part and the maximum value of the refractive index of the cladding part. The optical waveguide is larger than the refractive index difference.
[4]
In the optical waveguide according to any one of [1] to [3],
A second core layer provided on the second cladding layer, which is a separate member from the core layer;
The second core layer is an optical waveguide having a third core portion located in an interlayer direction of the first core portion.
[5]
In the optical waveguide according to any one of [1] to [4],
The optical waveguide has a refractive index at the top of the first recess that is smaller than an average refractive index in the cladding.
[6]
In the optical waveguide according to any one of [1] to [5],
The refractive index distribution W is an optical waveguide having a top portion of the second convex portion in addition to the vicinity of the interface between the first core portion and the cladding portion.
[7]
In the optical waveguide according to any one of [1] to [6],
The refractive index distribution W has a top portion of the second convex portion at the center portion of the cladding portion, and is continuously refracted from the top portion of the second convex portion toward the first concave portion. An optical waveguide having an area where the rate is reduced.
[8]
In the optical waveguide according to any one of [1] to [7],
The difference between the refractive index of the top of the first recess and the average refractive index of the cladding is 3 of the difference between the refractive index of the top of the first recess and the refractive index of the top of the first projection. Optical waveguide that is ~ 80%.
[9]
In the optical waveguide according to any one of [1] to [8],
An optical waveguide, wherein a refractive index difference between a refractive index of a top portion of the first concave portion and a refractive index of a top portion of the first convex portion is 0.005 to 0.07.
[10]
In the optical waveguide according to any one of [1] to [9],
In the refractive index distribution W, the width of the portion where the refractive index of the first convex portion has a value equal to or larger than the average refractive index of the cladding portion is defined as a [μm], and the refraction of the first concave portion. An optical waveguide, wherein b is 0.01a to 1.2a, where b is a width having a value less than the average refractive index in the cladding portion.
[11]
An optical waveguide having a core part and a cladding part adjacent to at least both side surfaces of the core part,
The refractive index profile of the cross section of the optical waveguide has at least two minimum values, at least one first maximum value, and at least two second maximum values smaller than the first maximum value. , These have a region in which the second local maximum value, the local minimum value, the first local maximum value, the local minimum value, and the second local maximum value are arranged in this order, of which the first local maximum value is A region sandwiched between the two minimum values so as to include the core portion, and a region on the second maximum value side from each minimum value is the cladding portion,
Each of the minimum values is less than the average refractive index in the cladding portion, and the refractive index continuously changes over the entire refractive index distribution.
[12]
An electronic apparatus comprising the optical waveguide according to any one of [1] to [11].
 本発明によれば、隣接したコア部間のクロストークが抑制される。 According to the present invention, crosstalk between adjacent core portions is suppressed.
本発明の光導波路の実施形態を示す(一部切り欠いて、および透過して示す)斜視図である。1 is a perspective view showing an embodiment of an optical waveguide of the present invention (partially cut out and shown through). 図1に示すX-X線断面図について、横軸にコア層の厚さの中心線における位置をとり、縦軸に屈折率をとったときの屈折率分布の一例を模式的に示す図である。1 is a diagram schematically showing an example of a refractive index distribution when the horizontal axis indicates the position of the core layer thickness along the center line and the vertical axis indicates the refractive index. is there. 図1に示す光導波路のコア部の1つに光を入射したときの出射光の強度分布の一例を示す図である。It is a figure which shows an example of intensity distribution of the emitted light when light injects into one of the core parts of the optical waveguide shown in FIG. 図1に示す光導波路の第1の製造方法を説明するための図である。It is a figure for demonstrating the 1st manufacturing method of the optical waveguide shown in FIG. 図1に示す光導波路の第1の製造方法を説明するための図である。It is a figure for demonstrating the 1st manufacturing method of the optical waveguide shown in FIG. 図1に示す光導波路の第1の製造方法を説明するための図である。It is a figure for demonstrating the 1st manufacturing method of the optical waveguide shown in FIG. 図1に示す光導波路の第1の製造方法を説明するための図である。It is a figure for demonstrating the 1st manufacturing method of the optical waveguide shown in FIG. 図1に示す光導波路の第1の製造方法を説明するための図である。It is a figure for demonstrating the 1st manufacturing method of the optical waveguide shown in FIG. 照射領域と未照射領域との間で屈折率差が生じる様子を説明するための図であり、層の横断面の位置を横軸にとり、横断面の屈折率を縦軸にとったときの屈折率分布を示す図である。It is a figure for demonstrating a mode that a refractive index difference arises between an irradiation area | region and a non-irradiation area | region, and takes the position of the cross section of a layer on a horizontal axis, and refraction when taking the refractive index of a cross section on a vertical axis | shaft. It is a figure which shows rate distribution. 光導波路の出射側端面における出射光の強度分布を測定する方法を説明するための図である。It is a figure for demonstrating the method to measure the intensity distribution of the emitted light in the output side end surface of an optical waveguide. 実施例1、比較例1および比較例2で得られた光導波路の出射側端面における出射光の強度分布を示す図である。It is a figure which shows intensity distribution of the emitted light in the output side end surface of the optical waveguide obtained by Example 1, the comparative example 1, and the comparative example 2. FIG.
 以下、本発明の光導波路および電子機器について添付図面に示す好適実施形態に基づいて詳細に説明する。 Hereinafter, the optical waveguide and the electronic device of the present invention will be described in detail based on preferred embodiments shown in the accompanying drawings.
<光導波路>
 まず、本発明の光導波路について説明する。
(第1実施形態)
 図1は、本発明の光導波路の第1実施形態を示す(一部切り欠いて、および透過して示す)斜視図、図2は、図1に示すX-X線断面図について、横軸にコア層の厚さの中心線における位置をとり、縦軸に屈折率をとったときの屈折率分布の一例を示す図、図3は、図1に示す光導波路のコア部の1つに光を入射したときの出射光の強度分布の一例を示す図である。なお、以下の説明では、図1中の上側を「上」、下側を「下」という。また、図1は、層の厚さ方向(各図の上下方向)が誇張して描かれている。
<Optical waveguide>
First, the optical waveguide of the present invention will be described.
(First embodiment)
FIG. 1 is a perspective view showing a first embodiment of the optical waveguide of the present invention (partially cut out and shown in a transparent manner), and FIG. 2 is a horizontal axis of the cross-sectional view taken along the line XX shown in FIG. FIG. 3 shows an example of the refractive index distribution when the position of the core layer in the center line is taken and the vertical axis indicates the refractive index. FIG. 3 shows one of the core portions of the optical waveguide shown in FIG. It is a figure which shows an example of intensity distribution of the emitted light when light injects. In the following description, the upper side in FIG. 1 is referred to as “upper” and the lower side is referred to as “lower”. In FIG. 1, the thickness direction of the layers (the vertical direction in each figure) is exaggerated.
 本実施の形態の光導波路の概要を説明する。
 第1の実施の形態の光導波路は、第1クラッド層(クラッド層11)、コア層(コア層13)、第2クラッド層(クラッド層12)を備える。コア層(コア層13)は、クラッド層11上に設けられており、層内方向に設けられたクラッド部、第1コア部(コア部14)、クラッド部(クラッド部15)、第2コア部(コア部14)、及びクラッド部をこの順番で有する。第2クラッド層は、コア層上に設けられる。
An outline of the optical waveguide of the present embodiment will be described.
The optical waveguide of the first embodiment includes a first cladding layer (cladding layer 11), a core layer (core layer 13), and a second cladding layer (cladding layer 12). The core layer (core layer 13) is provided on the clad layer 11, and the clad part, the first core part (core part 14), the clad part (clad part 15), and the second core provided in the in-layer direction. It has a part (core part 14) and a clad part in this order. The second cladding layer is provided on the core layer.
 コア層のうち第1コア部(コア部14)、及びクラッド部(クラッド部15)に亘る部分の層内方向の屈折率分布Wは、連続的に変化していて、第1の凸部、第1の凹部、及び第2の凸部の順で並ぶ領域を有するものを意味する。このような屈折率分布を、「W型の屈折率分布」と呼称する。 Of the core layer, the refractive index distribution W in the in-layer direction of the first core part (core part 14) and the part extending over the cladding part (clad part 15) is continuously changing, and the first convex part, It means one having a region arranged in the order of the first concave portion and the second convex portion. Such a refractive index distribution is referred to as a “W-type refractive index distribution”.
 第1コア部に位置する屈折率分布Wは、第1の凸部を有している。クラッド部に位置する屈折率分布Wは、第1の凸部よりも屈折率の最大値が小さい第2の凸部を有している。 The refractive index distribution W located in the first core portion has a first convex portion. The refractive index distribution W located in the cladding portion has a second convex portion having a maximum refractive index smaller than that of the first convex portion.
 第1クラッド層(クラッド層11)、及び第1コア部(コア部14)に亘る部分の層間方向の屈折率分布Tは、各種の屈折率分布を有してもよい。 The refractive index distribution T in the interlayer direction in the portion extending over the first cladding layer (cladding layer 11) and the first core portion (core portion 14) may have various refractive index distributions.
 また、第1クラッド層(クラッド層11)、クラッド部(クラッド部15)及び第2クラッド層(クラッド層12)に亘る部分の層間方向の屈折率分布Pが、少なくとも、第1クラッド層に位置する部分とクラッド部に位置する部分とで相異なる。たとえば、屈折率分布Pは、連続的に変化してもよく、不連続的に変化してもよい。屈折率分布Pは、たとえば、屈折率分布Tと同様の屈折率パターンを有するものである。すなわち、屈折率分布Pは、クラッド部に位置する領域が第5の凸部を有することが好ましい。くわえて、屈折率分布Pは、第1クラッド層に位置する領域が第6の凸部を有することがさらに好ましい。この場合、屈折率分布Pは、第5の凸部と第6の凸部との間に、第3の凹部を有することになる。また、屈折率分布Pにおいて、クラッド部に位置する領域の最大屈折率又は平均屈折率は、第1クラッド層に位置する最大屈折率又は平均屈折率よりも高い値であることが好ましい。また、本実施の形態では、屈折率分布Pを有する第1クラッド層、コア層のクラッド部、第2クラッド層の積層構造は、屈折率分布Tを有する第1クラッド層、コア層のコア部、第2クラッド層の積層構造と、同一工程で形成され得る。 Further, the refractive index distribution P in the interlayer direction of the portion extending over the first cladding layer (cladding layer 11), the cladding portion (cladding portion 15) and the second cladding layer (cladding layer 12) is at least located in the first cladding layer. And the portion located in the cladding portion are different. For example, the refractive index distribution P may change continuously or discontinuously. The refractive index distribution P has a refractive index pattern similar to that of the refractive index distribution T, for example. That is, in the refractive index distribution P, it is preferable that the region located in the cladding portion has the fifth convex portion. In addition, in the refractive index distribution P, it is more preferable that the region located in the first cladding layer has a sixth convex portion. In this case, the refractive index distribution P has a third concave portion between the fifth convex portion and the sixth convex portion. In the refractive index distribution P, the maximum refractive index or the average refractive index of the region located in the cladding part is preferably higher than the maximum refractive index or the average refractive index located in the first cladding layer. In the present embodiment, the laminated structure of the first cladding layer having the refractive index distribution P, the cladding portion of the core layer, and the second cladding layer is composed of the first cladding layer having the refractive index distribution T and the core portion of the core layer. It can be formed in the same process as the laminated structure of the second cladding layer.
 屈折率分布Pは、屈折率分布Tと同一でもよいし(たとえば、コア部を基点として隣接するクラッド部(クラッド)層までに亘る屈折率分布のうち、平面上の縦横斜めの6方向のすべてが同一であることを除く)、相異なってもよい。本実施の形態では、屈折率分布が相異なるとは、(i)屈折率分布の形状が異なること、又は、(ii)屈折率分布の形状が同じパターンかつ屈折率値が異なることを意味する(ただし、製造上のバラツキは同一とみなしてもよい)。たとえば、隣接する第1コア部とクラッド層との層間方向の屈折率差は、隣接する第1コア部とクラッド部との層内方向の屈折率差とは、異なってもよい。 The refractive index distribution P may be the same as the refractive index distribution T (for example, all of the six vertical and horizontal diagonal directions on the plane in the refractive index distribution extending from the core portion to the adjacent cladding portion (cladding) layer). May be different from each other). In the present embodiment, the different refractive index distributions means that (i) the shape of the refractive index distribution is different, or (ii) the shape of the refractive index distribution is the same pattern and the refractive index values are different. (However, manufacturing variations may be considered the same). For example, the refractive index difference in the interlayer direction between the adjacent first core part and the cladding layer may be different from the refractive index difference in the in-layer direction between the adjacent first core part and the cladding part.
 屈折率分布Pは、たとえば、「ステップインデックス型(以下、SI型という)、「グレーデッドインデックス型(以下、GI型という)」、及びW型のいずれかのパターンを有する。 The refractive index distribution P has, for example, any pattern of “step index type (hereinafter referred to as SI type)”, “graded index type (hereinafter referred to as GI type)”, and W type.
 SI型の屈折率分布Tは、コア層とクラッド層それぞれにおいて屈折率がほぼ一定で、かつ、コア層とクラッド層の境界で屈折率が不連続となっているものを意味する。GI型の屈折率分布Pは、クラッド部の内部から第1クラッド層に亘って屈折率が連続しているものを意味する。屈折率分布変化は、例えば、層間移動成分が層間を拡散移動し、積層方向の物質の構成が連続的に変化することによってもたらされるものである。 The SI type refractive index distribution T means that the refractive index is substantially constant in each of the core layer and the cladding layer, and the refractive index is discontinuous at the boundary between the core layer and the cladding layer. The GI-type refractive index distribution P means that the refractive index is continuous from the inside of the cladding part to the first cladding layer. The refractive index distribution change is caused, for example, by the fact that the interlayer movement component diffuses and moves between the layers, and the composition of the material in the stacking direction continuously changes.
 本実施の形態では、屈折率分布Pは、次の第1から第3の態様を有する。第1から第3の態様は、それぞれ、SI型、GI型、及びW型に相当する。第1は、第1クラッド層及びクラッド部に亘る部分の層間方向の屈折率分布Pが、第1クラッド層とクラッド部との界面において不連続的に変化している。第2は、第1クラッド層及びクラッド部に亘る部分の層間方向の屈折率分布Pが、連続的に変化している。第3は、第1クラッド層及びクラッド部に亘る部分の層間方向の屈折率分布Pが、連続的に変化していて、第5の凸部、第3の凹部、第6の凸部、の順で並ぶ領域を有しており、クラッドに位置する屈折率分布Pは、第5の凸部を有しており、第1クラッド層に位置する屈折率分布Pは、第5の凸部よりも屈折率の最大値が小さい第6の凸部を有する。 In the present embodiment, the refractive index distribution P has the following first to third aspects. The first to third aspects correspond to SI type, GI type, and W type, respectively. First, the refractive index distribution P in the interlayer direction in the portion extending between the first cladding layer and the cladding portion changes discontinuously at the interface between the first cladding layer and the cladding portion. Second, the refractive index distribution P in the interlayer direction in the portion extending between the first cladding layer and the cladding portion continuously changes. Third, the refractive index distribution P in the interlayer direction of the portion extending between the first clad layer and the clad portion is continuously changing, and the fifth convex portion, the third concave portion, the sixth convex portion, The refractive index distribution P located in the clad has a fifth convex portion, and the refractive index distribution P located in the first clad layer is more than the fifth convex portion. Has a sixth convex portion having a small maximum refractive index.
 以上のように、本実施の形態の光導波路は、コア層の層内方向の屈折率分布をW型とし、かつ、クラッド部の層間方向の屈折率分布を、たとえば、SI型、GI型、W型のいずれかから選択される。 As described above, in the optical waveguide of the present embodiment, the refractive index distribution in the in-layer direction of the core layer is the W type, and the refractive index distribution in the interlayer direction of the cladding portion is, for example, SI type, GI type, It is selected from either W type.
 以下、本実施形態に係る光導波路により得られる効果について説明する。 Hereinafter, effects obtained by the optical waveguide according to the present embodiment will be described.
 第1の効果は、高い光伝送特性を実現できることである。
 コア部の層内方向の屈折率分布では、端部に第1の凹部が形成されるので、コア部の中心部と端部と屈折率差が大きくなる。これにより、層内方向に隣接するコア部の間のクロストークが抑制される。また、コア部から光が漏れ出したとしても、漏れ光は、クラッド部の第2の凸部に閉じこめられ得る。これにより、層内方向に隣接するコア部の間のクロストークが抑制される。
The first effect is that high optical transmission characteristics can be realized.
In the refractive index distribution in the in-layer direction of the core portion, the first concave portion is formed at the end portion, so that the refractive index difference between the central portion and the end portion of the core portion becomes large. Thereby, crosstalk between core parts adjacent in the in-layer direction is suppressed. Even if light leaks from the core portion, the leaked light can be confined to the second convex portion of the cladding portion. Thereby, crosstalk between core parts adjacent in the in-layer direction is suppressed.
 第2の効果は、クラッド部の層間方向において光閉じこめ効果が得られることである。本実施の形態では、クラッド部からクラッド層に亘って屈折率が変化している。このため、クラッド部又はクラッド層に光を閉じこめることが可能となる。 The second effect is that a light confinement effect is obtained in the interlayer direction of the clad portion. In the present embodiment, the refractive index changes from the cladding part to the cladding layer. For this reason, it becomes possible to confine light in a clad part or a clad layer.
 連続した屈折率分布を有している層の光閉じこめ効果は、SI型の屈折率分布と比較して、非常に優れたものとなる。この結果、光伝送欠損の発生が効果的に抑制され、高い光伝送特性を実現できる。この理由は必ずしも明らかではないが、GI型の屈折率分布を有するクラッド部を設けた場合、コア層からの光の浸みだしが効果的に抑制されることによるものと考えられる。 The light confinement effect of the layer having a continuous refractive index distribution is very excellent compared to the SI type refractive index distribution. As a result, the occurrence of optical transmission defects is effectively suppressed, and high optical transmission characteristics can be realized. The reason for this is not necessarily clear, but it is considered that when a clad portion having a GI type refractive index profile is provided, the penetration of light from the core layer is effectively suppressed.
 第3の効果は、使用態様に応じて、光損失の低減をできる設計が可能となることである。
 第1コア部を基点として、層間方向の屈折率分布Tは、層内方向の屈折率分布Wに対して、異ならせる設計が可能である。たとえば、層間方向の屈折率差を、層内方向の屈折率差よりも大きくすることにより、光導波路のフィルムを光導波路の延在方向に折り曲げる、または巻き上げるときにおける光損失を低減させることができる。詳細に説明する。フィルムを所定方向に曲げると、フィルムが引き延ばされて、屈折率差が小さくなることがある。これに対して、予め、フィルムを曲げる方向の屈折率差を大きくすることにより、屈折率差が小さくなったとしても、光損失を低減することができる。
The third effect is that a design capable of reducing optical loss is possible depending on the usage mode.
It is possible to design the refractive index distribution T in the interlayer direction to be different from the refractive index distribution W in the in-layer direction with the first core portion as a base point. For example, by making the refractive index difference in the interlayer direction larger than the refractive index difference in the in-layer direction, it is possible to reduce optical loss when the optical waveguide film is bent or rolled up in the extending direction of the optical waveguide. . This will be described in detail. If the film is bent in a predetermined direction, the film may be stretched and the refractive index difference may be reduced. On the other hand, even if the refractive index difference is reduced by increasing the refractive index difference in the direction in which the film is bent in advance, the optical loss can be reduced.
 第4の効果は、設計自由が高いことである。
 本実施の形態の光導波路は、たとえば、フィルムを積層して得られるものである。このため、クラッド層の厚さは、コア層の厚さとの関係で任意に決定される。また、厚み制御が出来るので、光結合損失の低減などの効果を高めることができる。
The fourth effect is high design freedom.
The optical waveguide of the present embodiment is obtained by laminating films, for example. For this reason, the thickness of the cladding layer is arbitrarily determined in relation to the thickness of the core layer. Further, since the thickness can be controlled, effects such as reduction of optical coupling loss can be enhanced.
 以下、本実施の形態の光導波路について詳細に説明する。
 本実施の形態の屈折率分布は、光導波路の延在方向(例えば、第1コア部の延在方向)に対して直交する方向の光導波路の断面から、測定及び特定されるものである。
Hereinafter, the optical waveguide of the present embodiment will be described in detail.
The refractive index distribution of the present embodiment is measured and specified from the cross section of the optical waveguide in the direction orthogonal to the extending direction of the optical waveguide (for example, the extending direction of the first core portion).
 本実施の形態では、3層の例を示すが、この態様に限定されずに、5層、7層以上を有してもよい。言い換えると、第1コア層上に、1層以上の第2コア層が積層されてもよい。いずれかのコア層は、クラッド層に挟まれていることが好ましい。 In this embodiment, an example of three layers is shown, but the present invention is not limited to this mode, and may have five layers, seven layers or more. In other words, one or more second core layers may be stacked on the first core layer. Any one of the core layers is preferably sandwiched between clad layers.
 たとえば、本実施の形態の光導波路は、第2クラッド層上に設けられており、コア層と別部材の第2コア層を備えてもよい。第2コア層は、第1コア部の層間方向に位置する第3コア部を有する。言い換えると、本実施の形態の光導波路は、層内方向に離間した複数のコア部を備えるとともに、層間方向に離間した複数のコア部を備えてもよい。 For example, the optical waveguide of the present embodiment is provided on the second cladding layer, and may include a second core layer that is a separate member from the core layer. The second core layer has a third core portion located in the interlayer direction of the first core portion. In other words, the optical waveguide of the present embodiment may include a plurality of core portions spaced in the in-layer direction and a plurality of core portions spaced in the interlayer direction.
 たとえば、光導波路の断面において、複数のコア部が、格子状に配置されていてもよい。本実施の形態の光導波路は、たとえば、フィルムが積層される。層間方向のコア部の中心の位置ズレが少なくなるため、光結合欠損が低減される。また、本実施の形態の光導波路は、たとえば、エネルギー照射により、コア部が形成される。層間方向におけるコア部の位置ズレが低減されるため、光結合欠損が低減される。 For example, a plurality of core portions may be arranged in a lattice shape in the cross section of the optical waveguide. In the optical waveguide of the present embodiment, for example, films are laminated. Since the positional deviation of the center of the core part in the interlayer direction is reduced, the optical coupling defect is reduced. Moreover, the optical waveguide of this Embodiment forms a core part by energy irradiation, for example. Since the misalignment of the core part in the interlayer direction is reduced, the optical coupling defect is reduced.
 コア層の層内方向における屈折率分布は、少なくとも2つの隣接コア部の間の一部の領域がW型であればよく、コア部の両側に位置する領域がW型であってもよく、そのすべての領域がW型でもよい。なお、層内方向で繰り返されたW型の屈折率分布は、繰り返し単位ごとに相異なってもよい。 The refractive index distribution in the in-layer direction of the core layer may be such that a part of the region between at least two adjacent core parts is W-type, and regions located on both sides of the core part may be W-type, All the regions may be W-shaped. The W-type refractive index distribution repeated in the in-layer direction may be different for each repeating unit.
 コア部の層間方向における屈折率分布は、少なくともコア部と上部クラッド層(又は下部クラッド部)に亘る領域が上記屈折率分布Tであればよく、コア部の両側に位置する領域が屈折率分布Tであってもよく、そのすべての領域において屈折率分布Tが繰り返されていてもよい。なお、層間方向で繰り返された屈折率分布Tは、繰り返し単位ごとに相異なってもよい。 The refractive index distribution in the interlayer direction of the core portion may be that the region extending at least between the core portion and the upper clad layer (or lower clad portion) is the refractive index distribution T, and the regions located on both sides of the core portion are the refractive index distribution. T may be sufficient, and refractive index distribution T may be repeated in all the area | regions. The refractive index distribution T repeated in the interlayer direction may be different for each repeating unit.
 クラッド部の層間方向における屈折率分布は、少なくとも第1クラッド部とクラッド部との間で相異なっていればよいが、第1クラッド部とクラッド部との間かつ第2クラッド部とクラッド部との間で相異なっていてもよい。なお、層間方向で繰り返された屈折率分布Pは、繰り返し単位ごとに相異なってもよい。 The refractive index distribution in the interlayer direction of the cladding part may be different at least between the first cladding part and the cladding part, but between the first cladding part and the cladding part and between the second cladding part and the cladding part. May be different. The refractive index distribution P repeated in the interlayer direction may be different for each repeating unit.
 屈折率差は、たとえば、第1コア部の最大値と、クラッド部の最大値の差分でもよく、第1コア部の平均値と、クラッド部の平均値の差分でもよい。 The difference in refractive index may be, for example, the difference between the maximum value of the first core part and the maximum value of the cladding part, or the difference between the average value of the first core part and the average value of the cladding part.
 連続的に屈折率分布が変化するとは、例えば、クラッド層とコア層との界面近傍領域において、屈折率が徐々に変化する遷移領域が設けられていることを指す。厚み方向に対する屈折率の連続的変化を表す関数形は様々な態様を取り得るが、たとえば、スプライン関数、指数関数などが挙げられる。本実施の形態では、たとえば、凸部と凹部との間の屈折率が連続的に変化する。 “Continuously changing the refractive index distribution” means that, for example, a transition region in which the refractive index gradually changes is provided in a region near the interface between the cladding layer and the core layer. The function form representing the continuous change in the refractive index with respect to the thickness direction can take various forms, and examples thereof include a spline function and an exponential function. In the present embodiment, for example, the refractive index between the convex portion and the concave portion changes continuously.
 屈折率分布の凸部(第1の凸部~第6の凸部)は、頂部が極大値を有する態様、又は頂部が平坦部を有する態様のいずれも有する。また、屈折率分布の凹部(第1の凹部~第3の凹部)は、頂部が極小値を有する態様、又は頂部が平坦部を有する態様のいずれも有する。
 第1コア部は、第1の凸部の極大値から第1の凹部の極小値までの領域とし、クラッド部は、第1の凹部の極小値から第2の凹部の極大値までの領域としてもよい。また、極大値又は極小値に代えて、頂部の平坦部の中央部を採用してもよい。
The convex portion (first convex portion to sixth convex portion) of the refractive index distribution has either an aspect in which the top portion has a maximum value or an aspect in which the top portion has a flat portion. In addition, the concave portions (first concave portion to third concave portion) of the refractive index distribution have both an aspect in which the top has a minimum value and an aspect in which the top has a flat portion.
The first core portion is a region from the maximum value of the first convex portion to the minimum value of the first concave portion, and the cladding portion is a region from the minimum value of the first concave portion to the maximum value of the second concave portion. Also good. Moreover, it may replace with the maximum value or the minimum value, and may employ | adopt the center part of the flat part of a top part.
 平坦部の幅は、特に限定されないが、例えば、好ましくは100μm以下、より好ましくは20μm以下、更に好ましくは10μm以下である。平坦部の幅を小さくすることにより、光の閉じこめ効果が高くなり、隣接コア部の間のクロストークを低減することが可能となる。 The width of the flat portion is not particularly limited, but for example, is preferably 100 μm or less, more preferably 20 μm or less, and even more preferably 10 μm or less. By reducing the width of the flat portion, the light confinement effect is enhanced, and crosstalk between adjacent core portions can be reduced.
 本実施の形態の屈折率分布は、例えば、(1)干渉顕微鏡(dual-beam interference microscope)を用いて屈折率依存の干渉縞を観測し、その干渉縞から屈折率分布を算出するという方法、又は(2)屈折ニアフィールド法(Refracted Near Field method; RNF)により測定することが可能となる。屈折ニアフィールド法は、特開平5-332880号公報に記載の測定条件を採用することができる。実施の形態では、測定が簡便であるため、干渉顕微鏡を使用する方法が好ましい。 The refractive index distribution of the present embodiment is, for example, (1) a method of observing a refractive index-dependent interference fringe using an interference microscope (dual-beam interference microscope) and calculating the refractive index distribution from the interference fringe. Or (2) It becomes possible to measure by the refraction near field method (Refracted Near Field method; RNF). The refraction near field method can employ the measurement conditions described in JP-A-5-332880. In the embodiment, since the measurement is simple, a method using an interference microscope is preferable.
 干渉顕微鏡を使用した屈折率分布の測定手順の一例について説明する。まず、光導波路の断面方向に光導波路をスライスして、光導波路断片を得る。たとえば、光導波路の長さが200μm~300μmとなるように、スライスする。次いで、2つのスライドガラスで囲まれた空間に、屈折率1.536のオイルで充填したチャンバーを作成する。ここで、チャンバー内の空間に、光導波路断片を挟み込んだ測定サンプルと、光導波路断片を入れていないブランクサンプルを作成する。次いで、干渉顕微鏡を使用して、光導波路断片の断面方向の干渉縞写真を得る。干渉縞写真を画像解析して、屈折率分布を得ることができる。たとえば、干渉顕微鏡の光路長を変更して、干渉縞の出来る場所を変えた画像データを連続的に取得する。複数の画像データから、層間方向及び層内方向の各測定ポイントの屈折率を算出する。測定ポイントの間隔は、特に限定されないが、たとえば、2.5μmとする。 An example of the procedure for measuring the refractive index distribution using an interference microscope will be described. First, an optical waveguide piece is obtained by slicing the optical waveguide in the cross-sectional direction of the optical waveguide. For example, the optical waveguide is sliced so that the length is 200 μm to 300 μm. Next, a chamber filled with oil having a refractive index of 1.536 is created in a space surrounded by two glass slides. Here, a measurement sample in which the optical waveguide piece is sandwiched in the space in the chamber and a blank sample in which the optical waveguide piece is not inserted are prepared. Next, an interference fringe photograph in the cross-sectional direction of the optical waveguide fragment is obtained using an interference microscope. The refractive index distribution can be obtained by image analysis of the interference fringe photograph. For example, the optical path length of the interference microscope is changed to continuously acquire image data in which the place where the interference fringes are generated. The refractive index at each measurement point in the interlayer direction and the in-layer direction is calculated from a plurality of image data. The interval between the measurement points is not particularly limited, but is, for example, 2.5 μm.
 以下、本実施の形態の光導波路の一例を示す。一例では、屈折率分布の凸部に極大値が存在し、凹部に極小値が存在する。また、たとえば、第1の凸部の頂部は極大値Wm2、第2の凸部の頂部は極大値Wm3、第3の凸部の頂部は極大値Tm2、第4の凸部の頂部は極大値Tm3、第1の凹部の頂部は極小値Ws2、第2の凹部の頂部は極小値Ts2とする。 Hereinafter, an example of the optical waveguide of the present embodiment will be shown. In one example, a maximum value exists in the convex portion of the refractive index distribution, and a minimum value exists in the concave portion. Further, for example, the top of the first protrusion is the maximum value Wm2, the top of the second protrusion is the maximum value Wm3, the top of the third protrusion is the maximum value Tm2, and the top of the fourth protrusion is the maximum value. Tm3, the top of the first recess is a minimum value Ws2, and the top of the second recess is a minimum value Ts2.
 図1に示す光導波路1は、一方の端部から他方の端部に光信号を伝送する光配線として機能する。 The optical waveguide 1 shown in FIG. 1 functions as an optical wiring that transmits an optical signal from one end to the other end.
 以下、光導波路1の各部について詳述する。
 光導波路1は、図1中の下側からクラッド層11、コア層13およびクラッド層12をこの順で積層してなるものである。
Hereinafter, each part of the optical waveguide 1 will be described in detail.
The optical waveguide 1, the cladding layer 11 from the lower side in FIG. 1, is formed by laminating a core layer 13 and the cladding layer 12 in this order.
 (コア層)
 このうち、コア層13には、面方向において屈折率分布が形成されている。この屈折率分布は、相対的に屈折率の高い領域と低い領域とを有しており、これにより入射された光を屈折率の高い領域に閉じ込めて伝搬することができる。
(Core layer)
Among these, the core layer 13 has a refractive index distribution in the surface direction. This refractive index distribution has a region having a relatively high refractive index and a region having a relatively low refractive index, whereby incident light can be confined and propagated in a region having a high refractive index.
 図2(a)は、図1のX-X線断面図であり、図2(b)は、X-X線断面図のコア層13の厚さ方向の中心を通過する中心線C1上の屈折率分布の一例を模式的に示す図である。 2A is a cross-sectional view taken along the line XX of FIG. 1, and FIG. 2B is a cross-sectional view taken along the center line C1 passing through the center of the core layer 13 in the thickness direction of the cross-sectional view taken along the line XX. It is a figure which shows an example of refractive index distribution typically.
 コア層13は、その幅方向において、図2(b)に示すような、4つの極小値Ws1、Ws2、Ws3、Ws4と、5つの極大値Wm1、Wm2、Wm3、Wm4、Wm5と、を含む屈折率分布Wを有している。また、5つの極大値には、相対的に屈折率の大きい極大値(第1の極大値)と、相対的に屈折率の小さい極大値(第2の極大値)とが存在している。 The core layer 13 includes four local minimum values Ws1, Ws2, Ws3, and Ws4 and five local maximum values Wm1, Wm2, Wm3, Wm4, and Wm5 as shown in FIG. 2B in the width direction. It has a refractive index distribution W. The five maximum values include a maximum value having a relatively high refractive index (first maximum value) and a maximum value having a relatively low refractive index (second maximum value).
 このうち、極小値Ws1と極小値Ws2との間および極小値Ws3と極小値Ws4との間には、それぞれ相対的に屈折率の大きい極大値Wm2およびWm4が存在しており、それ以外の極大値Wm1、Wm3およびWm5は、それぞれ相対的に屈折率の小さい極大値である。 Among these, there are local maximum values Wm2 and Wm4 having a relatively large refractive index between the minimum value Ws1 and the minimum value Ws2, and between the minimum value Ws3 and the minimum value Ws4, respectively. The values Wm1, Wm3, and Wm5 are local maximum values with relatively small refractive indexes.
 光導波路1では、図2に示すように、極小値Ws1と極小値Ws2との間が、相対的に屈折率の大きい極大値Wm2を含んでいることからコア部14となり、同様に、極小値Ws3と極小値Ws4との間も極大値Wm4を含んでいることからコア部14となる。なお、より詳しくは、極小値Ws1と極小値Ws2との間をコア部141とし、極小値Ws3と極小値Ws4との間をコア部142とする。 In the optical waveguide 1, as shown in FIG. 2, the portion between the minimum value Ws <b> 1 and the minimum value Ws <b> 2 includes the maximum value Wm <b> 2 having a relatively large refractive index, and thus becomes the core portion 14. Since the maximum value Wm4 is also included between Ws3 and the minimum value Ws4, the core portion 14 is formed. More specifically, the core portion 141 is defined between the minimum value Ws1 and the minimum value Ws2, and the core portion 142 is defined between the minimum value Ws3 and the minimum value Ws4.
 また、極小値Ws1の左側の領域、極小値Ws2と極小値Ws3との間、および極小値Ws4の右側の領域は、それぞれコア部14の両側に隣接する領域であることから側面クラッド部15となる。なお、より詳しくは、極小値Ws1の左側の領域を側面クラッド部151とし、極小値Ws2と極小値Ws3との間を側面クラッド部152とし、極小値Ws4の右側の領域を側面クラッド部153とする。 Further, the region on the left side of the minimum value Ws1, the region between the minimum value Ws2 and the minimum value Ws3, and the region on the right side of the minimum value Ws4 are regions adjacent to both sides of the core portion 14, respectively. Become. More specifically, a region on the left side of the minimum value Ws1 is a side cladding portion 151, a region between the minimum value Ws2 and the minimum value Ws3 is a side cladding portion 152, and a region on the right side of the minimum value Ws4 is a side cladding portion 153. To do.
 すなわち、屈折率分布Wは、少なくとも、第2の極大値、極小値、第1の極大値、極小値、第2の極大値がこの順で並ぶ領域を有していればよい。なお、この領域は、コア部の数に応じて繰り返し設けられ、本実施形態のようにコア部14が2つである場合、屈折率分布Wは、第2の極大値、極小値、第1の極大値、極小値、第2の極大値、極小値、第1の極大値、極小値、第2の極大値のように、極大値と極小値が交互に並び、かつ極大値については第1の極大値と第2の極大値が交互に並ぶ領域を有していればよい。 That is, the refractive index distribution W should have at least a region where the second maximum value, the minimum value, the first maximum value, the minimum value, and the second maximum value are arranged in this order. Note that this region is repeatedly provided according to the number of core portions. When the number of core portions 14 is two as in the present embodiment, the refractive index distribution W has a second maximum value, a minimum value, and a first value. Local maximum values, local minimum values, second local maximum values, local minimum values, first local maximum values, local minimum values, second local maximum values, and the like. It is only necessary to have a region in which the maximum value of 1 and the second maximum value are alternately arranged.
 また、これら複数の極小値、複数の第1の極大値、および複数の第2の極大値は、それぞれ互いにほぼ同じ値であることが好ましいが、極小値は第1の極大値や第2の極大値より小さく、第2の極大値は第1の極大値より小さいという関係が保持されれば、互いの値が多少ずれていても差し支えない。その場合、ずれ量は、複数の極小値の平均値の10%以内に抑えられているのが好ましい。 The plurality of local minimum values, the plurality of first local maximum values, and the plurality of second local maximum values are preferably substantially the same as each other, but the local minimum values are the first local maximum value and the second local maximum value. As long as the relationship that the second maximum value is smaller than the first maximum value and the second maximum value is smaller than the first maximum value is maintained, the values may be slightly different from each other. In that case, it is preferable that the amount of deviation is suppressed within 10% of the average value of the plurality of minimum values.
 また、光導波路1は、細長い帯状をなしており、上記のような屈折率分布Wは、光導波路1の長手方向全体においてほぼ同じ分布が維持されている。 Further, the optical waveguide 1 has an elongated band shape, and the refractive index distribution W as described above is maintained substantially the same distribution in the entire longitudinal direction of the optical waveguide 1.
 以上のような屈折率分布Wに伴い、コア層13には、長尺状の2つのコア部14と、これらのコア部14の各両側に隣接する3つの側面クラッド部15とが形成されることとなる。 Along with the refractive index distribution W as described above, the core layer 13 is formed with two long core portions 14 and three side cladding portions 15 adjacent to each side of the core portions 14. It will be.
 より詳しくは、図1に示す光導波路1には、並列する2つのコア部141、142と、並列する3つの側面クラッド部151、152、153とが交互に設けられている。これにより、各コア部141、142は、それぞれ、各側面クラッド部151、152、153および各クラッド層11、12で囲まれた状態となる。ここで、これら2つのコア部141、142の平均屈折率は、3つの側面クラッド部151、152、153の平均屈折率より高くなっているので、各コア部141、142と各側面クラッド部151、152、153との間において光の全反射を生じさせることができる。なお、図1に示す各コア部14には密なドットを付し、各側面クラッド部15には疎なドットを付している。 More specifically, the optical waveguide 1 shown in FIG. 1 is provided with two parallel core portions 141 and 142 and three side cladding portions 151, 152, and 153 arranged in parallel. Thereby, each core part 141 and 142 will be in the state surrounded by each side cladding part 151,152,153 and each cladding layer 11,12, respectively. Here, since the average refractive index of these two core parts 141 and 142 is higher than the average refractive index of the three side clad parts 151, 152, and 153, each core part 141, 142 and each side clad part 151. , 152, 153 can cause total reflection of light. In addition, a dense dot is attached | subjected to each core part 14 shown in FIG. 1, and a sparse dot is attached | subjected to each side clad part 15. FIG.
 光導波路1では、コア部14の一方の端部に入射された光を、コア部14とクラッド部(各クラッド層11、12および各側面クラッド部15)との間で全反射させ、他方に伝搬させることにより、コア部14の他方の端部から取り出すことができる。 In the optical waveguide 1, the light incident on one end of the core portion 14 is totally reflected between the core portion 14 and the clad portion (the clad layers 11 and 12 and the side clad portions 15), By propagating, it can be taken out from the other end of the core part 14.
 また、図1に示すコア部14は、その横断面形状が正方形または長方形のような四角形(矩形)をなしているが、この形状は特に限定されず、例えば、真円、楕円形、長円形等の円形、三角形、五角形、六角形等の多角形であってもよい。 1 has a quadrangular shape (rectangular shape) such as a square or a rectangle, but this shape is not particularly limited. For example, a perfect circle, an ellipse, or an oval The shape may be a circle such as a triangle, a triangle, a pentagon, or a polygon such as a hexagon.
 コア部14の幅および高さ(コア層13の厚さ)は、特に限定されないが、それぞれ、1~200μm程度であるのが好ましく、5~100μm程度であるのがより好ましく、20~70μm程度であるのがさらに好ましい。 The width and height of the core part 14 (thickness of the core layer 13) are not particularly limited, but are preferably about 1 to 200 μm, more preferably about 5 to 100 μm, and more preferably about 20 to 70 μm. More preferably.
 ここで、4つの極小値Ws1、Ws2、Ws3、Ws4は、それぞれ、側面クラッド部15における平均屈折率WA未満である。これにより、各コア部14と各側面クラッド部15との間に、側面クラッド部15よりもさらに屈折率の小さい領域が存在することとなる。その結果、各極小値Ws1、Ws2、Ws3、Ws4の近傍では、より急峻な屈折率の勾配が形成され、これにより、各コア部14からの光の漏れが抑制されるため、伝送損失の小さい光導波路1が得られる。 Here, the four minimum values Ws1, Ws2, Ws3, and Ws4 are each less than the average refractive index WA in the side cladding portion 15. As a result, a region having a smaller refractive index than the side clad portion 15 exists between each core portion 14 and each side clad portion 15. As a result, a steeper refractive index gradient is formed in the vicinity of each local minimum value Ws1, Ws2, Ws3, and Ws4. This suppresses light leakage from each core portion 14, thereby reducing transmission loss. The optical waveguide 1 is obtained.
 また、屈折率分布Wは、全体で屈折率が連続的に変化している。これにより、ステップインデックス型の屈折率分布を有する光導波路に比べ、コア部14に光を閉じ込める作用がより増強されるため、伝送損失のさらなる低減が図られる。 In the refractive index distribution W, the refractive index continuously changes as a whole. Thereby, compared with an optical waveguide having a step index type refractive index profile, the effect of confining light in the core portion 14 is further enhanced, so that transmission loss can be further reduced.
 さらに、上述したような各極小値Ws1、Ws2、Ws3、Ws4を有するとともに、屈折率が連続的に変化している屈折率分布Wによれば、コア部14のより中心部に近い領域を伝送光が集中的に伝搬するため、光路ごとの伝搬時間に差が生じ難くなる。このため、伝送光にパルス信号が含まれている場合でも、パルス信号の鈍り(パルス信号の広がり)を抑制することができる。その結果、光通信の品質をより高め得る光導波路1が得られる。 Furthermore, according to the refractive index distribution W having the respective minimum values Ws1, Ws2, Ws3, and Ws4 as described above and the refractive index continuously changing, the region closer to the center of the core portion 14 is transmitted. Since light propagates intensively, a difference in propagation time for each optical path is less likely to occur. For this reason, even when the transmission light includes a pulse signal, it is possible to suppress blunting of the pulse signal (spreading of the pulse signal). As a result, the optical waveguide 1 that can further improve the quality of optical communication is obtained.
 また、コア部14と側面クラッド部15との平均の屈折率差が小さくても、コア部14に光を確実に閉じ込めることができる。 Further, even if the average refractive index difference between the core portion 14 and the side clad portion 15 is small, light can be reliably confined in the core portion 14.
 また、屈折率分布Wのうち、極大値Wm2、Wm4は、図2に示すようにコア部141、142に位置しているが、コア部141、142の中でもその幅の中心部に位置している。これにより、各コア部141、142では、伝送光がコア部141、142の幅の中心部に集まる確率が高くなり、相対的に側面クラッド部151、152、153に漏れ出る確率が低くなる。その結果、コア部141、142の伝送損失をより低減することができる。 Further, in the refractive index distribution W, the maximum values Wm2 and Wm4 are located at the core portions 141 and 142 as shown in FIG. 2, but the core portions 141 and 142 are located at the center of the width. Yes. Thereby, in each core part 141 and 142, the probability that transmission light will gather in the center part of the width of core part 141 and 142 becomes high, and the probability that it will leak to side cladding parts 151, 152, and 153 becomes relatively low. As a result, the transmission loss of the core parts 141 and 142 can be further reduced.
 なお、例えばコア部141の幅の中心部とは、極小値Ws1と極小値Ws2の中点から両側に、コア部141の幅の30%の距離の領域とする。 Note that, for example, the central portion of the width of the core portion 141 is a region having a distance of 30% of the width of the core portion 141 on both sides from the midpoint between the minimum value Ws1 and the minimum value Ws2.
 また、極大値Wm2、Wm4の位置は、できればコア部141、142の幅の中心部に位置していることが望まれるが、必ずしも中心部でなくても、コア部141、142の縁部(各側面クラッド部151、152、153に接する部分)近傍以外に位置していれば、特性の著しい低下は免れる。すなわち、コア部141、142の伝送損失をある程度抑えることができる。 In addition, it is desirable that the positions of the maximum values Wm2 and Wm4 be located at the center of the width of the cores 141 and 142 if possible, but the edge of the cores 141 and 142 (not necessarily the center) ( If it is located outside the vicinity of the portions that are in contact with the side clad portions 151, 152, and 153, a significant deterioration in characteristics can be avoided. That is, the transmission loss of the core parts 141 and 142 can be suppressed to some extent.
 なお、例えばコア部141の縁部近傍とは、前述した縁部から内側に、コア部141の幅の5%の距離の領域とする。 Note that, for example, the vicinity of the edge of the core part 141 is a region having a distance of 5% of the width of the core part 141 from the edge to the inside.
 一方、屈折率分布Wのうち、極大値Wm1、Wm3、Wm5は、図2(b)に示すように側面クラッド部151、152、153中に位置しているが、特に側面クラッド部151、152、153の縁部(コア部141、142と接する部分)近傍以外に位置しているのが好ましい。これにより、コア部141、142中の極大値Wm2、Wm4と、側面クラッド部151、152、153中の極大値Wm1、Wm3、Wm5とが、互いに十分に離間したものとなるため、コア部141、142中の伝送光が、側面クラッド部151、152、153中に漏れ出る確率を十分に低くすることができる。その結果、コア部141、142の伝送損失を低減することができる。 On the other hand, the maximum values Wm1, Wm3, and Wm5 of the refractive index distribution W are located in the side cladding portions 151, 152, and 153 as shown in FIG. , 153 is preferably located outside the vicinity of the edge (portion in contact with the core portions 141 and 142). As a result, the local maximum values Wm2, Wm4 in the core portions 141, 142 and the local maximum values Wm1, Wm3, Wm5 in the side cladding portions 151, 152, 153 are sufficiently separated from each other. , 142 can sufficiently reduce the probability that the transmitted light leaks into the side clad parts 151, 152, 153. As a result, the transmission loss of the core parts 141 and 142 can be reduced.
 なお、例えば側面クラッド部151、152、153の縁部近傍とは、前述した縁部から内側に、側面クラッド部151、152、153の幅の5%の距離の領域とする。 Note that, for example, the vicinity of the edge of the side cladding portions 151, 152, and 153 is a region having a distance of 5% of the width of the side cladding portions 151, 152, and 153 from the edge to the inside.
 また、好ましくは、極大値Wm1、Wm3、Wm5は、側面クラッド部151、152、153の幅の中央部に位置しており、しかも、極大値Wm1、Wm3、Wm5から隣接する極小値Ws1、Ws2、Ws3、Ws4に向かっては、屈折率が連続的に低下しているのが好ましい。これにより、コア部141、142中の極大値Wm2、Wm4と、側面クラッド部151、152、153中の極大値Wm1、Wm3、Wm5との離間距離は、最大限確保され、しかも極大値Wm1、Wm3、Wm5近傍に光を確実に閉じ込めることができることになるため、前述したコア部141、142からの伝送光の漏出をより確実に抑制することができる。 Preferably, the local maximum values Wm1, Wm3, and Wm5 are located at the center of the width of the side cladding portions 151, 152, and 153, and the local minimum values Ws1, Ws2 are adjacent to the local maximum values Wm1, Wm3, and Wm5. , Ws3, Ws4, it is preferable that the refractive index continuously decreases. As a result, the maximum distances between the maximum values Wm2, Wm4 in the core portions 141, 142 and the maximum values Wm1, Wm3, Wm5 in the side cladding portions 151, 152, 153 are secured, and the maximum values Wm1, Since light can be reliably confined in the vicinity of Wm3 and Wm5, leakage of transmission light from the core portions 141 and 142 described above can be more reliably suppressed.
 さらに、極大値Wm1、Wm3、Wm5は、前述したコア部141、142に位置する極大値Wm2、Wm4よりも屈折率の小さいものであるので、コア部141、142のような高い光伝送性は有しないものの、周囲よりも屈折率が高くなっているため、わずかな光伝送性を有することとなる。その結果、側面クラッド部151、152、153は、コア部141、142から漏出した伝送光を閉じ込めることで、他のコア部への波及を防止する作用を有するものとなる。すなわち、極大値Wm1、Wm3、Wm5が存在することで、クロストークを抑制することができる。 Furthermore, the local maximum values Wm1, Wm3, and Wm5 are smaller in refractive index than the local maximum values Wm2 and Wm4 located in the core portions 141 and 142 described above. Although it does not have, since the refractive index is higher than the surroundings, it has a slight light transmission property. As a result, the side clad parts 151, 152, and 153 have an effect of preventing transmission to other core parts by confining transmission light leaked from the core parts 141 and 142. That is, the presence of the maximum values Wm1, Wm3, and Wm5 can suppress crosstalk.
 なお、極小値Ws1、Ws2、Ws3、Ws4は、前述したように、側面クラッド部15の平均屈折率WA未満であるが、その差は、所定の範囲内であることが望まれる。具体的には、極小値Ws1、Ws2、Ws3、Ws4と側面クラッド部15の平均屈折率WAとの差は、極小値Ws1、Ws2、Ws3、Ws4とコア部141、142中の極大値Wm2、Wm4との差の3~80%程度であるのが好ましく、5~50%程度であるのがより好ましく、7~20%程度であるのがさらに好ましい(たとえば、(WA-Ws1)/(Wm2-Ws1)×100が、たとえば、3~80%であるのが好ましく、5~50%であるのがより好ましく、7~20%であるのがさらに好ましい。(以下、「~」は、特に明示しない限り、上限値と下限値を含むことを表す))。これにより、側面クラッド部15は、クロストークを抑制するのに必要かつ十分な光伝送性を有するものとなる。なお、極小値Ws1、Ws2、Ws3、Ws4と側面クラッド部15の平均屈折率WAとの差が前記下限値以上とすることにより、クロストークを十分に抑制できる。前記上限値以下とすることにより、側面クラッド部15における光伝送性が大き過ぎて、コア部141、142の光伝送性が低下することを抑制できる。 Note that, as described above, the minimum values Ws1, Ws2, Ws3, and Ws4 are less than the average refractive index WA of the side cladding portion 15, but the difference is desirably within a predetermined range. Specifically, the difference between the minimum value Ws1, Ws2, Ws3, Ws4 and the average refractive index WA of the side cladding portion 15 is the minimum value Ws1, Ws2, Ws3, Ws4 and the maximum value Wm2 in the core portions 141, 142. The difference from Wm4 is preferably about 3 to 80%, more preferably about 5 to 50%, further preferably about 7 to 20% (for example, (WA−Ws1) / (Wm2 -Ws1) × 100 is, for example, preferably 3 to 80%, more preferably 5 to 50%, still more preferably 7 to 20% (hereinafter, "to" Unless otherwise indicated, it includes the upper and lower limits)). As a result, the side clad portion 15 has a light transmission property necessary and sufficient for suppressing crosstalk. In addition, crosstalk can fully be suppressed by making the difference of minimum value Ws1, Ws2, Ws3, Ws4 and the average refractive index WA of the side cladding part 15 more than the said lower limit. By setting it to the upper limit value or less, it is possible to suppress a decrease in the light transmission performance of the core portions 141 and 142 due to the light transmission performance in the side cladding portion 15 being too large.
 また、極小値Ws1、Ws2、Ws3、Ws4と極大値Wm1、Wm3、Wm5との差は、極小値Ws1、Ws2、Ws3、Ws4と極大値Wm2、Wm4との差の6~90%程度であるのが好ましく、10~70%程度であるのがより好ましく、14~40%程度であるのがさらに好ましい。これにより、側面クラッド部15における屈折率の高さとコア部14における屈折率の高さとのバランスが最適化され、光導波路1は、特に優れた光伝送性を有するとともにクロストークをより確実に抑制し得るものとなる。 The difference between the minimum values Ws1, Ws2, Ws3, Ws4 and the maximum values Wm1, Wm3, Wm5 is about 6 to 90% of the difference between the minimum values Ws1, Ws2, Ws3, Ws4 and the maximum values Wm2, Wm4. It is preferably about 10 to 70%, more preferably about 14 to 40%. As a result, the balance between the refractive index height of the side cladding portion 15 and the refractive index height of the core portion 14 is optimized, and the optical waveguide 1 has particularly excellent optical transmission properties and more reliably suppresses crosstalk. It will be possible.
 なお、極小値Ws1、Ws2、Ws3、Ws4とコア部141、142中の極大値Wm2、Wm4との屈折率差は、できるだけ大きい方がよいが、0.005~0.07程度であるのが好ましく、0.007~0.05程度であるのがより好ましく、0.01~0.05程度であるのがさらに好ましい(たとえば、(Wm1-Ws1)/(Wm2-Ws1)×100が、0.005~0.07であるのが好ましく、0.007~0.05であるのがより好ましく、0.01~0.05であるのがさらに好ましい)。上述した屈折率差とすることにより、コア部141、142中に光を閉じ込めることが可能となる。 The difference in refractive index between the minimum values Ws1, Ws2, Ws3, and Ws4 and the maximum values Wm2 and Wm4 in the core portions 141 and 142 is preferably as large as possible, but is about 0.005 to 0.07. Preferably, it is about 0.007 to 0.05, more preferably about 0.01 to 0.05 (for example, (Wm1-Ws1) / (Wm2-Ws1) × 100 is 0). 0.005 to 0.07 is preferable, 0.007 to 0.05 is more preferable, and 0.01 to 0.05 is further preferable. By using the above-described difference in refractive index, light can be confined in the core portions 141 and 142.
 また、コア部141、142における屈折率分布Wは、図2(b)に示すように、横軸にコア層13の横断面の位置をとり、縦軸に屈折率をとったとき、極大値Wm2近傍および極大値Wm4近傍において、屈折率が連続的に変化している形状であれば上に凸の略V字状(極大値以外はほぼ直線状)をなしていてもよいが、好ましくは上に凸の略U字状(極大値近傍全体が丸みを帯びている)とされる。屈折率分布Wがこのような形状をなしていると、コア部141、142における光の閉じ込め作用がより顕著なものとなる。 Further, as shown in FIG. 2B, the refractive index distribution W in the core portions 141 and 142 has a maximum value when the horizontal axis indicates the cross-sectional position of the core layer 13 and the vertical axis indicates the refractive index. If the refractive index is continuously changing in the vicinity of Wm2 and the maximum value Wm4, it may have a substantially convex V shape (substantially linear except for the maximum value). It has an approximately U-shape that is convex upward (the entire vicinity of the maximum value is rounded). When the refractive index distribution W has such a shape, the light confinement action in the core portions 141 and 142 becomes more remarkable.
 また、屈折率分布Wは、図2(b)に示すように、極小値Ws1近傍、極小値Ws2近傍、極小値Ws3近傍および極小値Ws4近傍において、屈折率が連続的に変化している形状であれば下に凸の略V字状(極大値以外はほぼ直線状)をなしていてもよいが、好ましくは下に凸の略U字状(極大値近傍全体が丸みを帯びている)とされる。 Further, as shown in FIG. 2B, the refractive index distribution W has a shape in which the refractive index continuously changes in the vicinity of the minimum value Ws1, the vicinity of the minimum value Ws2, the vicinity of the minimum value Ws3, and the vicinity of the minimum value Ws4. If so, it may have a substantially convex V shape (substantially linear except for the maximum value), but preferably has a substantially U shape convex downward (the entire vicinity of the maximum value is rounded). It is said.
 ここで、本発明者らは、光導波路1の複数のコア部141、142のうち、所望の1つの一方の端部に光を入射し、他方の端部における出射光の強度分布を取得したとき、その強度分布が、光導波路1のクロストークを抑制するにあたって極めて有用な分布になることを見出した。 Here, the present inventors made light incident on one desired end portion of the plurality of core portions 141 and 142 of the optical waveguide 1 and acquired the intensity distribution of the emitted light at the other end portion. It was found that the intensity distribution is extremely useful for suppressing the crosstalk of the optical waveguide 1.
 図3は、光導波路1のコア部141に光を入射したときの出射光の強度分布を示す図である。 FIG. 3 is a diagram showing the intensity distribution of the emitted light when light is incident on the core portion 141 of the optical waveguide 1.
 コア部141に光を入射すると、出射光の強度は、コア部141の出射端の中心部において最も大きくなる。そして、コア部141の中心部から離れるにつれて出射光の強度は小さくなるが、本発明の光導波路によれば、コア部141に隣り合うコア部142において極小値をとるような強度分布が得られる。このようにコア部142の位置に出射光の強度分布の極小値が一致することで、コア部142におけるクロストークは極めて小さく抑えられることとなるため、多チャンネル化および高密度化によっても混信の発生を確実に防止し得る光導波路1が得られる。 When light is incident on the core part 141, the intensity of the emitted light becomes the largest at the central part of the outgoing end of the core part 141. The intensity of the emitted light decreases as the distance from the central portion of the core portion 141 decreases. However, according to the optical waveguide of the present invention, an intensity distribution that takes a minimum value in the core portion 142 adjacent to the core portion 141 is obtained. . Since the minimum value of the intensity distribution of the emitted light coincides with the position of the core part 142 in this way, the crosstalk in the core part 142 can be suppressed to be extremely small. An optical waveguide 1 that can reliably prevent the generation is obtained.
 なお、従来の光導波路では、光を入射するコア部に隣り合うコア部において出射光の強度分布が極小値をとることはなく、むしろ極大値をとっていたので、クロストークの問題が発生していた。これに対し、上述したような本発明の光導波路における出射光の強度分布の振る舞いは、クロストークを抑制する上で極めて有用なものである。 In the conventional optical waveguide, the intensity distribution of the emitted light does not take the minimum value in the core portion adjacent to the core portion where the light is incident, but rather takes the maximum value, which causes a crosstalk problem. It was. On the other hand, the behavior of the intensity distribution of the emitted light in the optical waveguide of the present invention as described above is extremely useful for suppressing crosstalk.
 本発明の光導波路においてこのような強度分布が得られる詳細な理由は明らかでないものの、理由の1つとしては、屈折率分布Wが極小値Ws1、Ws2、Ws3、Ws4を有し、かつ、屈折率分布W全体で屈折率が連続的に変化している、という特徴的な屈折率分布Wが、従来であればコア部142において極大値を有していた出射光の強度分布を、コア部142に隣接する側面クラッド部153等にシフトさせていることが挙げられる。すなわち、このシフトにより、クロストークが確実に抑制されているのである。 Although the detailed reason why such an intensity distribution is obtained in the optical waveguide of the present invention is not clear, one reason is that the refractive index distribution W has the minimum values Ws1, Ws2, Ws3, and Ws4, and is refracted. The characteristic refractive index distribution W, in which the refractive index continuously changes throughout the refractive index distribution W, represents the intensity distribution of the emitted light, which conventionally had a maximum value in the core section 142, as the core section. For example, the side clad portion 153 adjacent to 142 is shifted. That is, the crosstalk is reliably suppressed by this shift.
 なお、出射光の強度分布が側面クラッド部15にシフトしたとしても、受光素子等はコア部14の位置に合わせて配置されているため、混信を招くおそれはほとんどなく、光通信の品質を劣化させることはない。 Even if the intensity distribution of the emitted light is shifted to the side clad portion 15, the light receiving element and the like are arranged in accordance with the position of the core portion 14, so that there is almost no risk of interference and the quality of optical communication is deteriorated. I will not let you.
 また、上記のような出射光の強度分布は、本発明の光導波路において観測される確率は高いものの、必ず観測されるわけではなく、入射光のNA(numerical aperture)やコア部141の横断面積、コア部141、142のピッチ等によっては、明瞭な極小値が観測されなかったり、極小値の位置がコア部142から外れたりする場合もあるが、このような場合でもクロストークは十分に抑制される。 The intensity distribution of the emitted light as described above is not necessarily observed although the probability of being observed in the optical waveguide of the present invention is high, but the NA (numerical aperture) of the incident light and the cross-sectional area of the core portion 141 are not necessarily observed. Depending on the pitches of the core parts 141 and 142, a clear minimum value may not be observed, or the position of the minimum value may deviate from the core part 142. Even in such a case, crosstalk is sufficiently suppressed. Is done.
 また、図2(b)に示す屈折率分布Wにおいて、側面クラッド部15における平均屈折率をWAとしたとき、極大値Wm2、Wm4近傍における屈折率が連続して平均屈折率WA以上である部分の幅をa[μm]とし、極小値Ws1、Ws2、Ws3、Ws4近傍における屈折率が連続して平均屈折率WA未満である部分の幅をb[μm]とする。このとき、bは、0.01a~1.2a程度であるのが好ましく、0.03a~1a程度であるのがより好ましく、0.1a~0.8a程度であるのがさらに好ましい。これにより、極小値Ws1、Ws2、Ws3、Ws4の実質的な幅が、上述した作用・効果を奏することが可能となる。すなわち、bを前記下限値以上とすることにより、極小値Ws1、Ws2、Ws3、Ws4の実質的な幅が狭過ぎ、コア部141、142に光を閉じ込める作用が低下することを抑制できる。一方、bを前記上限値以下とすることにより、極小値Ws1、Ws2、Ws3、Ws4の実質的な幅が広過ぎ、コア部141、142の幅やピッチが制限され、伝送効率が低下したり多チャンネル化および高密度化が妨げられることを抑制することが出来る。 Further, in the refractive index distribution W shown in FIG. 2B, when the average refractive index in the side cladding portion 15 is WA, the refractive index in the vicinity of the maximum values Wm2 and Wm4 is continuously equal to or higher than the average refractive index WA. Is a [μm], and the width of the portion where the refractive index in the vicinity of the minimum values Ws1, Ws2, Ws3, and Ws4 is continuously less than the average refractive index WA is b [μm]. At this time, b is preferably about 0.01a to 1.2a, more preferably about 0.03a to 1a, and further preferably about 0.1a to 0.8a. As a result, the substantial widths of the minimum values Ws1, Ws2, Ws3, and Ws4 can exhibit the above-described functions and effects. That is, by setting b to be equal to or more than the lower limit value, it is possible to suppress the substantial width of the minimum values Ws1, Ws2, Ws3, and Ws4 from being too narrow and the effect of confining light in the core portions 141 and 142 from being reduced. On the other hand, by setting b to be equal to or less than the above upper limit value, the substantial widths of the minimum values Ws1, Ws2, Ws3, and Ws4 are too wide, the width and pitch of the core portions 141 and 142 are limited, and transmission efficiency is reduced. It is possible to suppress the hindrance to multichanneling and high density.
 なお、側面クラッド部15における平均屈折率WAは、例えば、極大値Wm1と極小値Ws1との中点で近似することができる。 The average refractive index WA in the side cladding 15 can be approximated at the midpoint between the maximum value Wm1 and the minimum value Ws1, for example.
 上述したようなコア層13の構成材料(主材料)は、上記の屈折率差が生じる材料であれば特に限定されないが、具体的には、アクリル系樹脂、メタクリル系樹脂、ポリカーボネート、ポリスチレン、エポキシ樹脂、ポリアミド、ポリイミド、ポリベンゾオキサゾール、ポリシラン、ポリシラザン、シリコーン系樹脂、フッ素系樹脂、また、ベンゾシクロブテン系樹脂やノルボルネン系樹脂等の環状オレフィン系樹脂のような各種樹脂材料の他、石英ガラス、ホウケイ酸ガラスのようなガラス材料等を用いることができる。なお、樹脂材料は、異なる組成のものを組み合わせた複合材料であってもよく、未重合のモノマーを含んでいてもよい。 The constituent material (main material) of the core layer 13 as described above is not particularly limited as long as it is a material that causes the above-described difference in refractive index, but specifically, acrylic resin, methacrylic resin, polycarbonate, polystyrene, epoxy In addition to various resin materials such as resin, polyamide, polyimide, polybenzoxazole, polysilane, polysilazane, silicone resin, fluororesin, and cyclic olefin resin such as benzocyclobutene resin and norbornene resin, quartz glass A glass material such as borosilicate glass can be used. The resin material may be a composite material obtained by combining materials having different compositions, and may contain an unpolymerized monomer.
 また、これらの中でも特にノルボルネン系樹脂が好ましい。ノルボルネン系ポリマーは、例えば、開環メタセシス重合(ROMP)、ROMPと水素化反応との組み合わせ、ラジカルまたはカチオンによる重合、カチオン性パラジウム重合開始剤を用いた重合、これ以外の重合開始剤(例えば、ニッケルや他の遷移金属の重合開始剤)を用いた重合等、公知のすべての重合方法で得ることができる。 Of these, norbornene resins are particularly preferred. The norbornene-based polymer includes, for example, ring-opening metathesis polymerization (ROMP), combination of ROMP and hydrogenation reaction, polymerization by radical or cation, polymerization using a cationic palladium polymerization initiator, and other polymerization initiators (for example, It can be obtained by all known polymerization methods such as polymerization using nickel or other transition metal polymerization initiators).
 (クラッド層)
 クラッド層11および12は、それぞれ、コア層13の下部および上部に位置するクラッド部を構成するものである。
(Clad layer)
The clad layers 11 and 12 constitute clad portions located at the lower and upper portions of the core layer 13, respectively.
 クラッド層11、12の平均厚さは、コア層13の平均厚さ(各コア部14の平均高さ)の0.1~1.5倍程度であるのが好ましく、0.2~1.25倍程度であるのがより好ましく、具体的には、クラッド層11、12の平均厚さは、特に限定されないが、それぞれ、通常、1~200μm程度であるのが好ましく、5~100μm程度であるのがより好ましく、10~60μm程度であるのがさらに好ましい。これにより、光導波路1が必要以上に大型化(厚膜化)するのを防止しつつ、クラッド部としての機能が好適に発揮される。 The average thickness of the clad layers 11 and 12 is preferably about 0.1 to 1.5 times the average thickness of the core layer 13 (the average height of each core portion 14). More preferably, the average thickness of the cladding layers 11 and 12 is not particularly limited, but it is usually preferably about 1 to 200 μm, and preferably about 5 to 100 μm. More preferably, it is about 10 to 60 μm. Thereby, the function as a clad part is suitably exhibited while preventing the optical waveguide 1 from becoming unnecessarily large (thickened).
 また、クラッド層11および12の構成材料としては、例えば、前述したコア層13の構成材料と同様の材料を用いることができるが、特にノルボルネン系ポリマーが好ましい。 Further, as the constituent material of the cladding layers 11 and 12, for example, the same material as the constituent material of the core layer 13 described above can be used, but a norbornene polymer is particularly preferable.
 また、コア層13の構成材料およびクラッド層11、12の構成材料を選択する場合、両者の間の屈折率差を考慮して材料を選択すればよい。具体的には、コア部14とクラッド層11、12との境界において光を確実に全反射させるため、コア部14の構成材料の屈折率が十分に大きくなるように材料を選択すればよい。これにより、光導波路1の厚さ方向において十分な屈折率差が得られ、各コア部14からクラッド層11、12に光が漏れ出るのを抑制することができる。 Further, when selecting the constituent material of the core layer 13 and the constituent materials of the clad layers 11 and 12, the material may be selected in consideration of the difference in refractive index between them. Specifically, in order to ensure total reflection of light at the boundary between the core portion 14 and the cladding layers 11 and 12, the material may be selected so that the refractive index of the constituent material of the core portion 14 is sufficiently large. As a result, a sufficient refractive index difference is obtained in the thickness direction of the optical waveguide 1, and light can be prevented from leaking from the respective core portions 14 to the cladding layers 11 and 12.
 なお、光の減衰を抑制する観点からは、コア層13の構成材料とクラッド層11、12の構成材料との密着性(親和性)が高いことも重要である。 In addition, from the viewpoint of suppressing the attenuation of light, it is also important that the adhesiveness (affinity) between the constituent material of the core layer 13 and the constituent materials of the cladding layers 11 and 12 is high.
 また、クラッド層11、12は必要に応じて設ければよく、いずれか一方または双方を省略してもよい。この場合、コア層13の表面は大気(空気)に露出することとなるが、空気の屈折率は十分に低いため、この空気がクラッド層11、12の機能を代替することができる。 The clad layers 11 and 12 may be provided as necessary, and either one or both may be omitted. In this case, the surface of the core layer 13 is exposed to the atmosphere (air), but since the refractive index of air is sufficiently low, the air can substitute for the functions of the cladding layers 11 and 12.
 (支持フィルム)
 光導波路1の下面には、必要に応じて、図1に示すような支持フィルム2を積層するようにしてもよい。
(Support film)
A support film 2 as shown in FIG. 1 may be laminated on the lower surface of the optical waveguide 1 as necessary.
 支持フィルム2は、光導波路1の下面を支持して、保護・補強する。これにより、光導波路1の信頼性および機械的特性を高めることができる。 Support film 2 supports and reinforces the lower surface of the optical waveguide 1. Thereby, the reliability and mechanical characteristics of the optical waveguide 1 can be improved.
 このような支持フィルム2の構成材料としては、例えば、ポリエチレンテレフタレート(PET)、ポリエチレン、ポリプロピレンのようなポリオレフィン、ポリイミド、ポリアミド等の各種樹脂材料の他、銅、アルミニウム、銀等の金属材料が挙げられる。なお、金属材料の場合は、支持フィルム2として金属箔が好ましく用いられる。 Examples of the constituent material of the support film 2 include various resin materials such as polyethylene terephthalate (PET), polyolefin such as polyethylene and polypropylene, polyimide and polyamide, and metal materials such as copper, aluminum and silver. It is done. In the case of a metal material, a metal foil is preferably used as the support film 2.
 また、支持フィルム2の平均厚さは、特に限定されないが、5~200μm程度であるのが好ましく、10~100μm程度であるのがより好ましい。これにより、支持フィルム2は、適度な剛性を有するものとなるため、光導波路1を確実に支持するとともに、光導波路1の柔軟性を阻害し難くなる。 The average thickness of the support film 2 is not particularly limited, but is preferably about 5 to 200 μm, more preferably about 10 to 100 μm. Thereby, since the support film 2 has moderate rigidity, the optical waveguide 1 is reliably supported and the flexibility of the optical waveguide 1 is difficult to be hindered.
 なお、支持フィルム2と光導波路1との間は接着または接合されているが、その方法としては、熱圧着、接着剤または粘着剤による接着等が挙げられる。 The support film 2 and the optical waveguide 1 are bonded or bonded, and examples of the method include thermocompression bonding, bonding with an adhesive or a pressure sensitive adhesive, and the like.
 このうち、接着層としては、例えば、アクリル系接着剤、ウレタン系接着剤、シリコーン系接着剤の他、各種ホットメルト接着剤(ポリエステル系、変性オレフィン系)等が挙げられる。また、特に耐熱性の高いものとして、ポリイミド、ポリイミドアミド、ポリイミドアミドエーテル、ポリエステルイミド、ポリイミドエーテル等の熱可塑性ポリイミド接着剤が好ましく用いられる。このような材料で構成された接着層は、比較的柔軟性に富んでいるため、光導波路1の形状が変化したとしても、その変化に自在に追従することができる。その結果、形状変化に伴う剥離を確実に防止し得るものとなる。 Among these, examples of the adhesive layer include acrylic adhesives, urethane adhesives, silicone adhesives, and various hot melt adhesives (polyester and modified olefins). Moreover, as a thing with especially high heat resistance, thermoplastic polyimide adhesive agents, such as a polyimide, a polyimide amide, a polyimide amide ether, a polyester imide, a polyimide ether, are used preferably. Since the adhesive layer made of such a material is relatively flexible, even if the shape of the optical waveguide 1 changes, the change can be freely followed. As a result, it is possible to reliably prevent peeling due to the shape change.
 このような接着層の平均厚さは、特に限定されないが、1~100μm程度であるのが好ましく、5~60μm程度であるのがより好ましい。 The average thickness of such an adhesive layer is not particularly limited, but is preferably about 1 to 100 μm, and more preferably about 5 to 60 μm.
 (カバーフィルム)
 一方、光導波路1の上面には、必要に応じて、図1に示すようなカバーフィルム3を積層するようにしてもよい。
(Cover film)
On the other hand, you may make it laminate | stack the cover film 3 as shown in FIG. 1 on the upper surface of the optical waveguide 1 as needed.
 カバーフィルム3は、光導波路1を保護するとともに、光導波路1を上方から支持するものである。これにより、汚れや傷などから光導波路1が保護され、光導波路1の信頼性および機械的特性を高めることができる。 The cover film 3 protects the optical waveguide 1 and supports the optical waveguide 1 from above. Thereby, the optical waveguide 1 is protected from dirt and scratches, and the reliability and mechanical characteristics of the optical waveguide 1 can be improved.
 このようなカバーフィルム3の構成材料としては、支持フィルム2の構成材料と同様であり、例えば、ポリエチレンテレフタレート(PET)、ポリエチレン、ポリプロピレンのようなポリオレフィン、ポリイミド、ポリアミド等の各種樹脂材料の他、銅、アルミニウム、銀等の金属材料が挙げられる。なお、金属材料の場合は、カバーフィルム3として金属箔が好ましく用いられる。また、光導波路1の途中にミラーを形成した場合には、カバーフィルム3を光が透過することになるので、カバーフィルム3の構成材料は実質的に透明であるのが好ましい。 As a constituent material of such a cover film 3, it is the same as the constituent material of the support film 2. For example, in addition to various resin materials such as polyethylene terephthalate (PET), polyolefin such as polyethylene and polypropylene, polyimide and polyamide, Metal materials, such as copper, aluminum, silver, are mentioned. In the case of a metal material, a metal foil is preferably used as the cover film 3. Further, when a mirror is formed in the middle of the optical waveguide 1, light is transmitted through the cover film 3, so that the constituent material of the cover film 3 is preferably substantially transparent.
 また、カバーフィルム3の平均厚さは、特に限定されないが、3~50μm程度であるのが好ましく、5~30μm程度であるのがより好ましい。カバーフィルム3の厚さを前記範囲内とすることにより、カバーフィルム3は光通信において十分な光透過率を有するとともに、光導波路1を確実に保護するために十分な剛性を有するものとなる。 Further, the average thickness of the cover film 3 is not particularly limited, but is preferably about 3 to 50 μm, more preferably about 5 to 30 μm. By setting the thickness of the cover film 3 within the above range, the cover film 3 has sufficient light transmittance in optical communication, and has sufficient rigidity to reliably protect the optical waveguide 1.
 なお、カバーフィルム3と光導波路1との間は接着または接合されているが、その方法としては、熱圧着、接着剤または粘着剤による接着等が挙げられる。このうち、接着剤としては前述したようなものを用いることができる。 Note that the cover film 3 and the optical waveguide 1 are bonded or bonded, and examples of the method include thermocompression bonding, bonding with an adhesive or a pressure-sensitive adhesive, and the like. Of these, the adhesive described above can be used.
 また、本実施形態では、クラッド層11、コア層13およびクラッド層12の積層体からなる光導波路1について説明したが、これらが一体的に形成されたものでもよい。 In the present embodiment, the optical waveguide 1 composed of a laminate of the clad layer 11, the core layer 13, and the clad layer 12 has been described. However, these may be integrally formed.
 また、本実施形態では、コア層13が2つのコア部14を有する場合について説明したが、コア部14の数は特に限定されず、1つであっても、3つ以上であってもよい。 Moreover, although this embodiment demonstrated the case where the core layer 13 had the two core parts 14, the number of the core parts 14 is not specifically limited, One or three or more may be sufficient. .
 なお、例えばコア部14が1つである場合には、光導波路1の横断面の屈折率分布Wが、2つの極小値を有し、その極小値が前述したように平均屈折率WA未満であり、かつ屈折率分布W全体で屈折率が連続的に変化していればよく、コア部14が3、4、5・・・と増える場合には、それに応じて、屈折率分布Wが有する極小値の数は、6、8、10・・・と増えることとなる。 For example, when the number of the core portions 14 is one, the refractive index distribution W of the cross section of the optical waveguide 1 has two minimum values, and the minimum value is less than the average refractive index WA as described above. Yes, and it is sufficient that the refractive index continuously changes throughout the refractive index distribution W. When the core portion 14 increases to 3, 4, 5,..., The refractive index distribution W has accordingly. The number of local minimum values will increase to 6, 8, 10,.
<光導波路の製造方法>
 次に、上述した光導波路1の製造方法の一例について説明する。
 (第1の製造方法)
 まず、光導波路1の第1の製造方法について説明する。
<Optical waveguide manufacturing method>
Next, an example of a method for manufacturing the optical waveguide 1 described above will be described.
(First manufacturing method)
First, the 1st manufacturing method of the optical waveguide 1 is demonstrated.
 図4~8は、それぞれ図1に示す光導波路1の第1の製造方法を説明するための図である。なお、以下の説明では、図4~8中の上側を「上」、下側を「下」という。 4 to 8 are diagrams for explaining a first manufacturing method of the optical waveguide 1 shown in FIG. In the following description, the upper side in FIGS. 4 to 8 is referred to as “upper” and the lower side is referred to as “lower”.
 光導波路1は、クラッド層11と、コア層13と、クラッド層12をそれぞれ用意し、これらを積層することにより製造される。 The optical waveguide 1 is manufactured by preparing a clad layer 11, a core layer 13, and a clad layer 12, and laminating them.
 光導波路1の第1の製造方法は、[1]支持基板951上にコア層形成用組成物900を塗布して液状被膜を形成した後、この支持基板951をレベルテーブルに置いて液状被膜を平坦化するとともに、溶媒を蒸発(脱溶媒)させる。これにより、層910を得る。[2]次いで、層910の一部に活性放射線を照射することで屈折率差を生じさせ、コア部14と側面クラッド部15とを形成したコア層13を得る。[3]次いで、コア層13の両面にクラッド層11、12を積層し、光導波路1を得る。 The first manufacturing method of the optical waveguide 1 is as follows: [1] After applying the core layer forming composition 900 on the support substrate 951 to form a liquid film, the support substrate 951 is placed on a level table to form the liquid film. While flattening, the solvent is evaporated (desolvent). Thereby, the layer 910 is obtained. [2] Next, a refractive index difference is generated by irradiating a part of the layer 910 with actinic radiation to obtain the core layer 13 in which the core part 14 and the side cladding part 15 are formed. [3] Next, the cladding layers 11 and 12 are laminated on both surfaces of the core layer 13 to obtain the optical waveguide 1.
 以下、各工程について順次説明する。
 [1]まず、コア層形成用組成物900を用意する。
Hereinafter, each process will be described sequentially.
[1] First, a core layer forming composition 900 is prepared.
 コア層形成用組成物900は、ポリマー915と、添加剤920(本実施形態では、少なくともモノマーを含む。)とを含有するものである。このようなコア層形成用組成物900は、活性放射線の照射により、ポリマー915中において少なくともモノマーの反応が生じ、それに伴って屈折率分布に変化を生じさせる材料である。すなわち、コア層形成用組成物900は、ポリマー915とモノマーの存在比率の偏りによって屈折率分布に変化が生じ、その結果、コア層13中にコア部14と側面クラッド部15とを形成することのできる材料である。 The core layer forming composition 900 contains a polymer 915 and an additive 920 (including at least a monomer in this embodiment). Such a composition 900 for forming a core layer is a material that causes a reaction of at least a monomer in the polymer 915 by irradiation with actinic radiation and changes the refractive index distribution accordingly. That is, in the core layer forming composition 900, the refractive index distribution changes due to the deviation in the abundance ratio of the polymer 915 and the monomer, and as a result, the core portion 14 and the side cladding portion 15 are formed in the core layer 13. It is a material that can be used.
 次いで、支持基板951上にコア層形成用組成物900を塗布して液状被膜を形成する(図4(a)参照)。そして、支持基板951をレベルテーブルに置いて、液状被膜を平坦化するとともに、溶媒を蒸発(脱溶媒)させる。これにより、層910を得る(図4(b)参照)。 Next, the core layer forming composition 900 is applied on the support substrate 951 to form a liquid film (see FIG. 4A). Then, the support substrate 951 is placed on the level table to flatten the liquid film and evaporate (desolvent) the solvent. Thereby, the layer 910 is obtained (see FIG. 4B).
 支持基板951には、例えば、シリコン基板、二酸化ケイ素基板、ガラス基板、ポリエチレンテレフタレート(PET)フィルム等が用いられる。 For the support substrate 951, for example, a silicon substrate, a silicon dioxide substrate, a glass substrate, a polyethylene terephthalate (PET) film, or the like is used.
 液状被膜を形成するための塗布法としては、例えば、ドクターブレード法、スピンコート法、ディッピング法、テーブルコート法、スプレー法、アプリケーター法、カーテンコート法、ダイコート法等の方法が挙げられる。 Examples of the coating method for forming a liquid film include a doctor blade method, a spin coating method, a dipping method, a table coating method, a spray method, an applicator method, a curtain coating method, and a die coating method.
 得られた層910中では、ポリマー(マトリックス)915が実質的に一様かつランダムに存在し、添加剤920は、ポリマー915中に実質的に一様かつランダムに分散している。これにより、層910中には、添加剤920が実質的に一様かつランダムに分散している。 In the obtained layer 910, the polymer (matrix) 915 exists substantially uniformly and randomly, and the additive 920 is substantially uniformly and randomly dispersed in the polymer 915. Thereby, the additive 920 is substantially uniformly and randomly dispersed in the layer 910.
 層910の平均厚さは、形成すべきコア層13の厚さに応じて適宜設定され、特に限定されないが、5~300μm程度であるのが好ましく、10~200μm程度であるのがより好ましい。 The average thickness of the layer 910 is appropriately set according to the thickness of the core layer 13 to be formed, and is not particularly limited, but is preferably about 5 to 300 μm, more preferably about 10 to 200 μm.
 (ポリマー)
 ポリマー915は、コア層13のベースポリマーとなるものである。
(polymer)
The polymer 915 serves as a base polymer for the core layer 13.
 ポリマー915には、透明性が十分に高く(無色透明であり)、かつ、後述するモノマーと相溶性を有するもの、さらに、その中でも後述するようにモノマーが反応(重合反応や架橋反応)可能であり、モノマーが重合した後においても十分な透明性を有するものが好適に用いられる。 The polymer 915 has sufficiently high transparency (colorless and transparent) and is compatible with the monomer described later, and among them, the monomer can react (polymerization reaction or crosslinking reaction) as described later. There are preferably used those having sufficient transparency even after the monomer is polymerized.
 ここで、「相溶性を有する」とは、モノマーが少なくとも混和して、コア層形成用組成物900中や層910中においてポリマー915と相分離を起こさないことをいう。 Here, “having compatibility” means that the monomer is at least mixed and does not cause phase separation with the polymer 915 in the core layer forming composition 900 or the layer 910.
 このようなポリマー915としては、例えば、ノルボルネン系樹脂やベンゾシクロブテン系樹脂等の環状オレフィン系樹脂、アクリル系樹脂、メタクリル系樹脂、ポリカーボネート、ポリスチレン、エポキシ系樹脂、ポリアミド、ポリイミド、ポリベンゾオキサゾール、シリコーン系樹脂、フッ素系樹脂等が挙げられ、これらのうちの1種または2種以上を組み合わせて(ポリマーアロイ、ポリマーブレンド(混合物)、共重合体など)用いることができる。 Examples of such a polymer 915 include cyclic olefin resins such as norbornene resins and benzocyclobutene resins, acrylic resins, methacrylic resins, polycarbonates, polystyrenes, epoxy resins, polyamides, polyimides, polybenzoxazoles, Examples thereof include silicone resins and fluorine resins, and one or more of these can be used in combination (polymer alloy, polymer blend (mixture), copolymer, etc.).
 これらの中でも、特に、環状オレフィン系樹脂を主とするものが好ましい。ポリマー915として環状オレフィン系樹脂を用いることにより、優れた光伝送性能や耐熱性を有するコア層13を得ることができる。 Of these, those mainly composed of cyclic olefin resins are preferred. By using a cyclic olefin resin as the polymer 915, the core layer 13 having excellent optical transmission performance and heat resistance can be obtained.
 環状オレフィン系樹脂は、無置換のものであってもよいし、水素が他の基により置換されたものであってもよい。 The cyclic olefin-based resin may be unsubstituted or may have hydrogen substituted with other groups.
 環状オレフィン系樹脂としては、例えばノルボルネン系樹脂、ベンゾシクロブテン系樹脂等が挙げられる。 Examples of cyclic olefin resins include norbornene resins and benzocyclobutene resins.
 中でも、耐熱性、透明性等の観点からノルボルネン系樹脂を使用することが好ましい。また、ノルボルネン系樹脂は、高い疎水性を有するため、吸水による寸法変化等を生じ難いコア層13を得ることができる。 Among these, it is preferable to use a norbornene-based resin from the viewpoints of heat resistance and transparency. Moreover, since norbornene-type resin has high hydrophobicity, the core layer 13 which cannot produce the dimensional change by water absorption etc. can be obtained.
 ノルボルネン系樹脂としては、単独の繰り返し単位を有するもの(ホモポリマー)、2つ以上のノルボルネン系繰り返し単位を有するもの(コポリマー)のいずれであってもよい。 The norbornene-based resin may be either one having a single repeating unit (homopolymer) or one having two or more norbornene-based repeating units (copolymer).
 このようなノルボルネン系樹脂としては、例えば、
(1)ノルボルネン型モノマーを付加(共)重合して得られるノルボルネン型モノマーの付加(共)重合体、
(2)ノルボルネン型モノマーとエチレンやα-オレフィン類との付加共重合体、
(3)ノルボルネン型モノマーと非共役ジエン、および必要に応じて他のモノマーとの付加共重合体のような付加重合体、
(4)ノルボルネン型モノマーの開環(共)重合体、および必要に応じて該(共)重合体を水素添加した樹脂、
(5)ノルボルネン型モノマーとエチレンやα-オレフィン類との開環(共)重合体、および必要に応じて該(共)重合体を水素添加した樹脂、
(6)ノルボルネン型モノマーと非共役ジエン、または他のモノマーとの開環共重合体、および必要に応じて該(共)重合体を水素添加したポリマーのような開環重合体が挙げられる。これらの重合体としては、ランダム共重合体、ブロック共重合体、交互共重合体等が挙げられる。
As such a norbornene-based resin, for example,
(1) addition (co) polymer of norbornene type monomer obtained by addition (co) polymerization of norbornene type monomer,
(2) addition copolymers of norbornene monomers with ethylene and α-olefins,
(3) an addition polymer such as an addition copolymer of a norbornene-type monomer and a non-conjugated diene and, if necessary, another monomer;
(4) a ring-opening (co) polymer of a norbornene-type monomer, and a resin obtained by hydrogenating the (co) polymer if necessary,
(5) a ring-opening (co) polymer of a norbornene-type monomer and ethylene or α-olefins, and a resin obtained by hydrogenating the (co) polymer if necessary,
(6) Ring-opening copolymers such as norbornene-type monomers and non-conjugated dienes, or other monomers, and polymers obtained by hydrogenating the (co) polymers as necessary. Examples of these polymers include random copolymers, block copolymers, and alternating copolymers.
 これらのノルボルネン系樹脂は、例えば、開環メタセシス重合(ROMP)、ROMPと水素化反応との組み合わせ、ラジカルまたはカチオンによる重合、カチオン性パラジウム重合開始剤を用いた重合、これ以外の重合開始剤(例えば、ニッケルや他の遷移金属の重合開始剤)を用いた重合等、公知のすべての重合方法で得ることができる。 These norbornene resins include, for example, ring-opening metathesis polymerization (ROMP), combination of ROMP and hydrogenation reaction, polymerization by radical or cation, polymerization using cationic palladium polymerization initiator, other polymerization initiators ( For example, it can be obtained by any known polymerization method such as polymerization using a polymerization initiator of nickel or another transition metal).
 これらの中でも、ノルボルネン系樹脂としては、下記構造式Bで表される少なくとも1個の繰り返し単位を有するもの、すなわち、付加(共)重合体が好ましい。付加(共)重合体は、透明性、耐熱性および可撓性に富むことから、例えば光導波路1を形成した後、これに電気部品等を半田を介して実装することがあるが、このような場合においても光導波路1に、高い耐熱性、すなわち、耐リフロー性を付与することができるためである。 Among these, norbornene resins are preferably those having at least one repeating unit represented by the following structural formula B, that is, addition (co) polymers. Since the addition (co) polymer is rich in transparency, heat resistance, and flexibility, for example, after the optical waveguide 1 is formed, an electrical component or the like may be mounted on the optical waveguide 1 via solder. This is because even in such a case, high heat resistance, that is, reflow resistance can be imparted to the optical waveguide 1.
Figure JPOXMLDOC01-appb-C000001
Figure JPOXMLDOC01-appb-C000001
 かかるノルボルネン系ポリマーは、例えば、後述するノルボルネン系モノマー(後述する構造式Cで表されるノルボルネン系モノマーや、架橋性ノルボルネン系モノマー)を用いることにより好適に合成される。 Such a norbornene-based polymer is suitably synthesized by using, for example, a norbornene-based monomer described later (a norbornene-based monomer represented by Structural Formula C described below or a crosslinkable norbornene-based monomer).
 また、光導波路1を各種製品に組み込んだ際には、例えば、80℃程度の環境下で製品が使用される場合がある。このような場合においても、耐熱性を確保するという観点から、付加(共)重合体が好ましい。 Further, when the optical waveguide 1 is incorporated into various products, the product may be used in an environment of about 80 ° C., for example. Even in such a case, an addition (co) polymer is preferable from the viewpoint of ensuring heat resistance.
 中でも、ノルボルネン系樹脂は、重合性基を含む置換基を有するノルボルネンの繰り返し単位や、アリール基を含む置換基を有するノルボルネンの繰り返し単位を含むものが好ましい。 Among them, the norbornene-based resin preferably includes a norbornene repeating unit having a substituent containing a polymerizable group or a norbornene repeating unit having a substituent containing an aryl group.
 重合性基を含む置換基を有するノルボルネンの繰り返し単位としては、エポキシ基を含む置換基を有するノルボルネンの繰り返し単位、(メタ)アクリル基を含む置換基を有するノルボルネンの繰り返し単位、および、アルコキシシリル基を含む置換基を有するノルボルネンの繰り返し単位のうちの少なくとも1種が好適である。これらの重合性基は、各種重合性基の中でも、反応性が高いことから好ましい。 As the repeating unit of norbornene having a substituent containing a polymerizable group, the repeating unit of norbornene having a substituent containing an epoxy group, the repeating unit of norbornene having a substituent containing a (meth) acryl group, and an alkoxysilyl group At least one of the repeating units of norbornene having a substituent containing is preferable. These polymerizable groups are preferable because of their high reactivity among various polymerizable groups.
 また、このような重合性基を含むノルボルネンの繰り返し単位を、2種以上含むものを用いれば、可撓性と耐熱性の両立を図ることができる。 Moreover, if one containing two or more norbornene repeating units containing such a polymerizable group is used, both flexibility and heat resistance can be achieved.
 一方、アリール基を含む置換基を有するノルボルネンの繰り返し単位を含むことにより、アリール基に由来する極めて高い疎水性によって、吸水による寸法変化等をより確実に防止することができる。 On the other hand, by including a norbornene repeating unit having a substituent containing an aryl group, it is possible to more reliably prevent dimensional change due to water absorption due to the extremely high hydrophobicity derived from the aryl group.
 さらに、ノルボルネン系樹脂は、アルキルノルボルネンの繰り返し単位を含むものが好ましい。なお、アルキル基は、直鎖状または分岐状のいずれであってもよい。 Furthermore, the norbornene-based resin preferably contains an alkylnorbornene repeating unit. The alkyl group may be linear or branched.
 アルキルノルボルネンの繰り返し単位を含むことにより、ノルボルネン系樹脂は、柔軟性が高くなるため、高いフレキシビリティ(可撓性)を付与することができる。 By including the repeating unit of alkyl norbornene, the norbornene-based resin has high flexibility, and therefore can provide high flexibility (flexibility).
 また、アルキルノルボルネンの繰り返し単位を含むノルボルネン系樹脂は、特定の波長領域(特に、850nm付近の波長領域)の光に対する透過率が優れることからも好ましい。 Further, a norbornene-based resin containing a repeating unit of alkyl norbornene is preferable because it has excellent transmittance for light in a specific wavelength region (particularly, a wavelength region near 850 nm).
 上記のようなノルボルネンの繰り返し単位を含むノルボルネン系樹脂の具体例としては、ヘキシルノルボルネンのホモポリマー、フェニルエチルノルボルネンのホモポリマー、ベンジルノルボルネンのホモポリマー、ヘキシルノルボルネンとフェニルエチルノルボルネンとのコポリマー、ヘキシルノルボルネンとベンジルノルボルネンとのコポリマー等が挙げられる。 Specific examples of the norbornene-based resin containing the norbornene repeating unit as described above include hexyl norbornene homopolymer, phenylethyl norbornene homopolymer, benzyl norbornene homopolymer, hexyl norbornene and phenylethyl norbornene copolymer, hexyl norbornene. And a copolymer of benzylnorbornene and the like.
 このようなことから、ノルボルネン系樹脂としては、以下の式(1)~(4)、(8)~(10)で表されるものが好適である。 For these reasons, as the norbornene-based resin, those represented by the following formulas (1) to (4) and (8) to (10) are preferable.
Figure JPOXMLDOC01-appb-C000002

 (式(1)中、Rは、炭素数1~10のアルキル基を表し、aは、0~3の整数を表し、bは、1~3の整数を表し、p/qが20以下である。)
Figure JPOXMLDOC01-appb-C000002

(In the formula (1), R 1 represents an alkyl group having 1 to 10 carbon atoms, a represents an integer of 0 to 3, b represents an integer of 1 to 3, and p 1 / q 1 is 20 or less.)
 式(1)のノルボルネン系樹脂は、以下のようにして製造することができる。
 Rを有するノルボルネンと、側鎖にエポキシ基を有するノルボルネンとをトルエンに溶かし、Ni化合物(A)を触媒として用いて溶液重合させることで(1)を得る。
The norbornene-based resin of the formula (1) can be produced as follows.
(1) is obtained by dissolving norbornene having R 1 and norbornene having an epoxy group in the side chain in toluene and solution polymerization using Ni compound (A) as a catalyst.
Figure JPOXMLDOC01-appb-C000003
Figure JPOXMLDOC01-appb-C000003
 なお、側鎖にエポキシ基を有するノルボルネンの製造方法は、たとえば、(i)(ii)の通りである。 In addition, the manufacturing method of norbornene which has an epoxy group in a side chain is as (i) (ii), for example.
(i)ノルボルネンメタノール(NB-CH-OH)の合成
 DCPD(ジシクロペンタジエン)のクラッキングにより生成したCPD(シクロペンタジエン)とαオレフィン(CH=CH-CH-OH)を高温高圧下で反応させる。
(I) Synthesis of norbornenemethanol (NB—CH 2 —OH) CPD (cyclopentadiene) produced by cracking of DCPD (dicyclopentadiene) and α-olefin (CH 2 ═CH—CH 2 —OH) under high temperature and high pressure React.
Figure JPOXMLDOC01-appb-C000004
Figure JPOXMLDOC01-appb-C000004
(ii)エポキシノルボルネンの合成
 ノルボルネンメタノールとエピクロルヒドリンとの反応により生成する。
(Ii) Synthesis of epoxy norbornene It is formed by the reaction of norbornene methanol and epichlorohydrin.
Figure JPOXMLDOC01-appb-C000005
Figure JPOXMLDOC01-appb-C000005
 なお、式(1)において、bが2または3の場合には、エピクロルヒドリンのメチレン基がエチレン基、プロピレン基等になったものを使用する。 In the formula (1), when b is 2 or 3, epichlorohydrin in which the methylene group is an ethylene group, a propylene group or the like is used.
 式(1)で表されるノルボルネン系樹脂の中でも、可撓性と耐熱性の両立を図ることが可能との観点から、特に、Rが炭素数4~10のアルキル基であり、aおよびbがそれぞれ1である化合物、例えば、ブチルボルネンとメチルグリシジルエーテルノルボルネンとのコポリマー、ヘキシルノルボルネンとメチルグリシジルエーテルノルボルネンとのコポリマー、デシルノルボルネンとメチルグリシジルエーテルノルボルネンとのコポリマー等が好ましい。 Among the norbornene-based resins represented by the formula (1), from the viewpoint that both flexibility and heat resistance can be achieved, in particular, R 1 is an alkyl group having 4 to 10 carbon atoms, and a and A compound in which each b is 1, for example, a copolymer of butylbornene and methyl glycidyl ether norbornene, a copolymer of hexyl norbornene and methyl glycidyl ether norbornene, a copolymer of decyl norbornene and methyl glycidyl ether norbornene, or the like is preferable.
Figure JPOXMLDOC01-appb-C000006

 (式(2)中、Rは、炭素数1~10のアルキル基を表し、Rは、水素原子またはメチル基を表し、cは、0~3の整数を表し、p/qが20以下である。)
Figure JPOXMLDOC01-appb-C000006

(In Formula (2), R 2 represents an alkyl group having 1 to 10 carbon atoms, R 3 represents a hydrogen atom or a methyl group, c represents an integer of 0 to 3, and p 2 / q 2 Is 20 or less.)
 式(2)のノルボルネン系樹脂は、Rを有するノルボルネンと、側鎖にアクリルおよびメタクリル基を有するノルボルネンとをトルエンに溶かし、上述したNi化合物(A)を触媒に用いて溶液重合させることで得ることができる。 The norbornene-based resin of the formula (2) is obtained by dissolving norbornene having R 2 and norbornene having acryl and methacryl groups in the side chain in toluene, and performing solution polymerization using the above-described Ni compound (A) as a catalyst. Obtainable.
 なお、式(2)で表されるノルボルネン系樹脂の中でも、可撓性と耐熱性との両立の観点から、特に、Rが炭素数4~10のアルキル基であり、cが1である化合物、例えば、ブチルボルネンとアクリル酸2-(5-ノルボルネニル)メチルとのコポリマー、ヘキシルノルボルネンとアクリル酸2-(5-ノルボルネニル)メチルとのコポリマー、デシルノルボルネンとアクリル酸2-(5-ノルボルネニル)メチルとのコポリマー等が好ましい。 Of the norbornene resins represented by the formula (2), R 2 is an alkyl group having 4 to 10 carbon atoms and c is 1 from the viewpoint of achieving both flexibility and heat resistance. Compounds such as copolymers of butylbornene and 2- (5-norbornenyl) methyl acrylate, copolymers of hexylnorbornene and 2- (5-norbornenyl) methyl acrylate, decylnorbornene and 2- (5-norbornenyl) methyl acrylate And a copolymer thereof are preferred.
Figure JPOXMLDOC01-appb-C000007

(式(3)中、Rは、炭素数1~10のアルキル基を表し、各Xは、それぞれ独立して、炭素数1~3のアルキル基を表し、dは、0~3の整数を表し、p/qが20以下である。)
Figure JPOXMLDOC01-appb-C000007

(In Formula (3), R 4 represents an alkyl group having 1 to 10 carbon atoms, each X 3 independently represents an alkyl group having 1 to 3 carbon atoms, and d represents 0 to 3 carbon atoms. Represents an integer, and p 3 / q 3 is 20 or less.)
 式(3)の樹脂は、Rを有するノルボルネンと、側鎖にアルコキシシリル基を有するノルボルネンとをトルエンに溶かし、上述したNi化合物(A)を触媒に用いて溶液重合させることで得ることができる。 The resin of the formula (3) can be obtained by dissolving norbornene having R 4 and norbornene having an alkoxysilyl group in the side chain in toluene, and solution polymerization using the above-described Ni compound (A) as a catalyst. it can.
 なお、式(3)で表されるノルボルネン系ポリマーの中でも、特に、Rが炭素数4~10のアルキル基であり、dが1または2、Xがメチル基またはエチル基である化合物、例えば、ブチルボルネンとノルボルネニルエチルトリメトキシシランとのコポリマー、ヘキシルノルボルネンとノルボルネニルエチルトリメトキシシランとのコポリマー、デシルノルボルネンとノルボルネニルエチルトリメトキシシランとのコポリマー、ブチルボルネンとトリエトキシシリルノルボルネンとのコポリマー、ヘキシルノルボルネンとトリエトキシシリルノルボルネンとのコポリマー、デシルノルボルネンとトリエトキシシリルノルボルネンとのコポリマー、ブチルボルネンとトリメトキシシリルノルボルネンとのコポリマー、ヘキシルノルボルネンとトリメトキシシリルノルボルネンとのコポリマー、デシルノルボルネンとトリメトキシシリルノルボルネンとのコポリマー等が好ましい。 Among the norbornene-based polymers represented by the formula (3), in particular, a compound in which R 4 is an alkyl group having 4 to 10 carbon atoms, d is 1 or 2, and X 3 is a methyl group or an ethyl group, For example, a copolymer of butylbornene and norbornenylethyltrimethoxysilane, a copolymer of hexylnorbornene and norbornenylethyltrimethoxysilane, a copolymer of decylnorbornene and norbornenylethyltrimethoxysilane, butylbornene and triethoxysilylnorbornene Copolymer of hexyl norbornene and triethoxysilyl norbornene, copolymer of decyl norbornene and triethoxysilyl norbornene, copolymer of butylbornene and trimethoxysilyl norbornene, hexyl norbornene And copolymers of trimethoxysilyl norbornene, copolymers, etc. of decyl norbornene and trimethoxysilyl norbornene are preferred.
Figure JPOXMLDOC01-appb-C000008

 (式(4)中、Rは、炭素数1~10のアルキル基を表し、AおよびAは、それぞれ独立して、下記式(5)~(7)で表される置換基を表すが、同時に同一の置換基であることはない。また、p/q+rが20以下である。)
Figure JPOXMLDOC01-appb-C000008

(In the formula (4), R 5 represents an alkyl group having 1 to 10 carbon atoms, and A 1 and A 2 each independently represent a substituent represented by the following formulas (5) to (7). (However, they are not the same substituent at the same time, and p 4 / q 4 + r is 20 or less.)
 式(4)の樹脂は、Rを有するノルボルネンと、側鎖にAおよびAを有するノルボルネンとをトルエンに溶かし、Ni化合物(A)を触媒に用いて溶液重合させることで得ることができる。 The resin of the formula (4) can be obtained by dissolving norbornene having R 5 and norbornene having A 1 and A 2 in the side chain in toluene, and solution polymerization using Ni compound (A) as a catalyst. it can.
Figure JPOXMLDOC01-appb-C000009

 (式(5)中、eは、0~3の整数を表し、fは、1~3の整数を表す。)
Figure JPOXMLDOC01-appb-C000009

(In the formula (5), e represents an integer of 0 to 3, and f represents an integer of 1 to 3.)
Figure JPOXMLDOC01-appb-C000010

 (式(6)中、Rは、水素原子またはメチル基を表し、gは、0~3の整数を表す。)
Figure JPOXMLDOC01-appb-C000010

(In formula (6), R 6 represents a hydrogen atom or a methyl group, and g represents an integer of 0 to 3.)
Figure JPOXMLDOC01-appb-C000011

 (式(7)中、Xは、それぞれ独立して、炭素数1~3のアルキル基を表し、hは、0~3の整数を表す。)
Figure JPOXMLDOC01-appb-C000011

(Equation (7) in, X 4 each independently represents an alkyl group having 1 to 3 carbon atoms, h is. Represents an integer of 0 to 3)
 なお、式(4)で表されるノルボルネン系樹脂としては、例えば、ブチルノルボルネン、ヘキシルノルボルネンまたはデシルノルボルネンのいずれかと、アクリル酸2-(5-ノルボルネニル)メチルと、ノルボルネニルエチルトリメトキシシラン、トリエトキシシリルノルボルネンまたはトリメトキシシリルノルボルネンのいずれかとのターポリマー、ブチルボルネン、ヘキシルノルボルネンまたはデシルノルボルネンのいずれかと、アクリル酸2-(5-ノルボルネニル)メチルと、メチルグリシジルエーテルノルボルネンとのターポリマー、ブチルボルネン、ヘキシルノルボルネンまたはデシルノルボルネンのいずれかと、メチルグリシジルエーテルノルボルネン、ノルボルネニルエチルトリメトキシシラン、トリエトキシシリルノルボルネンまたはトリメトキシシリルノルボルネンのいずれかとのターポリマー等が挙げられる。 As the norbornene-based resin represented by the formula (4), for example, any one of butyl norbornene, hexyl norbornene or decyl norbornene, 2- (5-norbornenyl) methyl acrylate, norbornenyl ethyl trimethoxysilane, Terpolymer with either triethoxysilyl norbornene or trimethoxysilyl norbornene, butyl bornene, hexyl norbornene or decyl norbornene, terpolymer of 2- (5-norbornenyl) methyl acrylate and methyl glycidyl ether norbornene, butylbornene, Either hexyl norbornene or decyl norbornene and methyl glycidyl ether norbornene, norbornenyl ethyltrimethoxysilane, triethoxysilylno Terpolymers, etc. with either bornene or trimethoxysilyl norbornene.
Figure JPOXMLDOC01-appb-C000012


 (式(8)中、Rは、炭素数1~10のアルキル基を表し、Rは、水素原子、メチル基またはエチル基を表し、Arは、アリール基を表し、Xは、酸素原子またはメチレン基を表し、Xは、炭素原子またはシリコン原子を表し、iは、0~3の整数を表し、jは、1~3の整数を表し、p/qが20以下である。)
Figure JPOXMLDOC01-appb-C000012


(In formula (8), R 7 represents an alkyl group having 1 to 10 carbon atoms, R 8 represents a hydrogen atom, a methyl group or an ethyl group, Ar represents an aryl group, and X 1 represents oxygen Represents an atom or a methylene group, X 2 represents a carbon atom or a silicon atom, i represents an integer of 0 to 3, j represents an integer of 1 to 3, and p 5 / q 5 is 20 or less is there.)
 式(8)の樹脂は、Rを有するノルボルネンと、側鎖に-(CH)-X-X(R3-j(Ar)を含むノルボルネンとをトルエンに溶かし、Ni化合物を触媒に用いて溶液重合させることで得ることができる。 The resin of the formula (8) is obtained by dissolving norbornene having R 7 and norbornene containing — (CH 2 ) —X 1 —X 2 (R 8 ) 3-j (Ar) j in the side chain in toluene, It can be obtained by solution polymerization using a compound as a catalyst.
 なお、式(8)で表されるノルボルネン系樹脂の中でも、Xが酸素原子、Xがシリコン原子、Arがフェニル基であるものが好ましい。 Of the norbornene resins represented by the formula (8), those in which X 1 is an oxygen atom, X 2 is a silicon atom, and Ar is a phenyl group are preferable.
 さらには、可撓性、耐熱性および屈折率制御の観点から特に、Rが炭素数4~10のアルキル基であり、Xが酸素原子、Xがシリコン原子、Arがフェニル基、Rがメチル基、iが1、jが2である化合物、例えば、ブチルボルネンとジフェニルメチルノルボルネンメトキシシランとのコポリマー、ヘキシルノルボルネンとジフェニルメチルノルボルネンメトキシシランとのコポリマー、デシルノルボルネンとジフェニルメチルノルボルネンメトキシシランとのコポリマー等が好ましい。
 具体的には、以下のようなノルボルネン系樹脂を使用することが好ましい。
Further, particularly from the viewpoint of flexibility, heat resistance and refractive index control, R 7 is an alkyl group having 4 to 10 carbon atoms, X 1 is an oxygen atom, X 2 is a silicon atom, Ar is a phenyl group, R A compound in which 8 is a methyl group, i is 1 and j is 2, for example, a copolymer of butylbornene and diphenylmethylnorbornenemethoxysilane, a copolymer of hexylnorbornene and diphenylmethylnorbornenemethoxysilane, decylnorbornene and diphenylmethylnorbornenemethoxysilane Of these, the copolymer is preferred.
Specifically, it is preferable to use the following norbornene resin.
Figure JPOXMLDOC01-appb-C000013


 (式(9)におけるR、p、q、iは、式(8)と同じである。)
Figure JPOXMLDOC01-appb-C000013


(R 7 , p 5 , q 5 , and i in formula (9) are the same as in formula (8).)
 また、可撓性と耐熱性および屈折率制御の観点から、式(8)において、Rが炭素数4~10のアルキル基であり、Xがメチレン基、Xが炭素原子、Arがフェニル基、Rが水素原子、iが0、jが1である化合物、例えば、ブチルボルネンとフェニルエチルノルボルネンとのコポリマー、ヘキシルノルボルネンとフェニルエチルノルボルネンとのコポリマー、デシルノルボルネンとフェニルエチルノルボルネンとのコポリマー等であってもよい。
 さらに、ノルボルネン系樹脂として、次のようなものを使用してもよい。
From the viewpoint of flexibility, heat resistance, and refractive index control, in formula (8), R 7 is an alkyl group having 4 to 10 carbon atoms, X 1 is a methylene group, X 2 is a carbon atom, and Ar is Compounds in which R 8 is a hydrogen atom, i is 0, and j is 1, for example, a copolymer of butylbornene and phenylethylnorbornene, a copolymer of hexylnorbornene and phenylethylnorbornene, a copolymer of decylnorbornene and phenylethylnorbornene Etc.
Further, the following may be used as the norbornene resin.
Figure JPOXMLDOC01-appb-C000014


 (式(10)において、R10は、炭素数1~10のアルキル基を表し、R11は、アリール基を示し、kは0以上、4以下である。p/qは20以下である。)
Figure JPOXMLDOC01-appb-C000014


(In Formula (10), R 10 represents an alkyl group having 1 to 10 carbon atoms, R 11 represents an aryl group, and k is 0 or more and 4 or less. P 6 / q 6 is 20 or less. is there.)
 また、p/q~p/q、p/q、p/qまたはp/q+rは、20以下であればよいが、15以下であるのが好ましく、0.1~10程度がより好ましい。これにより、複数種のノルボルネンの繰り返し単位を含む効果が如何なく発揮される。 Further, p 1 / q 1 to p 3 / q 3 , p 5 / q 5 , p 6 / q 6 or p 4 / q 4 + r may be 20 or less, preferably 15 or less, About 0.1 to 10 is more preferable. Thereby, the effect including the repeating unit of multiple types of norbornene is exhibited.
 一方、ポリマー915は、前述したようにアクリル系樹脂、メタクリル系樹脂、エポキシ系樹脂、ポリイミド、シリコーン系樹脂、フッ素系樹脂等であってもよい。 Meanwhile, as described above, the polymer 915 may be an acrylic resin, a methacrylic resin, an epoxy resin, a polyimide, a silicone resin, a fluorine resin, or the like.
 このうち、アクリル系樹脂およびメタクリル系樹脂としては、例えば、ポリ(メチルアクリレート)、ポリ(メチルメタクリレート)、ポリ(エポキシアクリレート)、ポリ(エポキシメタクリレート)、ポリ(アミノアクリレート)、ポリ(アミノメタクリレート)、ポリアクリル酸、ポリメタクリル酸、ポリ(イソシアナートアクリレート)、ポリ(イソシアナートメタクリレート)、ポリ(シアナートアクリレート)、ポリ(シアナートメタクリレート)、ポリ(チオエポキシアクリレート)、ポリ(チオエポキシメタクリレート)、ポリ(アリルアクリレート)、ポリ(アリルメタクリレート)、アクリレート・エポキシアクリレート共重合体(メチルメタクリレートとグリシジルメタクリレートの共重合体)、スチレン・エポキシアクリレート共重合体等が挙げられ、これらの1種または2種以上の複合材料が用いられる。 Among these, examples of acrylic resins and methacrylic resins include poly (methyl acrylate), poly (methyl methacrylate), poly (epoxy acrylate), poly (epoxy methacrylate), poly (amino acrylate), and poly (amino methacrylate). , Polyacrylic acid, polymethacrylic acid, poly (isocyanate acrylate), poly (isocyanate methacrylate), poly (cyanate acrylate), poly (cyanate methacrylate), poly (thioepoxy acrylate), poly (thioepoxy methacrylate) , Poly (allyl acrylate), poly (allyl methacrylate), acrylate / epoxy acrylate copolymer (copolymer of methyl methacrylate and glycidyl methacrylate), styrene / epoxy Acrylate copolymer and the like, these one or more composite material is used.
 また、エポキシ系樹脂としては、例えば、脂環式エポキシ樹脂、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、ビスフェノールS型エポキシ樹脂、ビフェニル骨格を有するビフェニル型エポキシ樹脂、ナフタレン環含有エポキシ樹脂、ジシクロペンタジエン骨格を有するジシクロペンタジエン型エポキシ樹脂、フェノールノボラック型エポキシ樹脂、クレゾールノボラック型エポキシ樹脂、トリフェニルメタン型エポキシ樹脂、トリフェニルメタン型エポキシ樹脂、脂肪族系エポキシ樹脂およびトリグリシジルイソシアヌレート等が挙げられ、これらのうちの1種または2種以上の複合材料が用いられる。 Examples of the epoxy resin include alicyclic epoxy resin, bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, biphenyl type epoxy resin having a biphenyl skeleton, naphthalene ring-containing epoxy resin, Dicyclopentadiene type epoxy resin having cyclopentadiene skeleton, phenol novolac type epoxy resin, cresol novolac type epoxy resin, triphenylmethane type epoxy resin, triphenylmethane type epoxy resin, aliphatic epoxy resin, triglycidyl isocyanurate, etc. Of these, one or more of these composite materials are used.
 また、ポリイミドとしては、ポリイミド樹脂前駆体であるポリアミド酸を閉環し、硬化(イミド化)させることにより得られる樹脂であれば、特に限定されない。 Further, the polyimide is not particularly limited as long as it is a resin obtained by ring-closing and curing (imidizing) a polyamic acid which is a polyimide resin precursor.
 ポリアミド酸としては、例えば、N,N-ジメチルアセトアミド中、テトラカルボン酸二無水物とジアミンとを等モル比にて反応させることにより、溶液として得ることができる。 The polyamic acid can be obtained, for example, as a solution by reacting tetracarboxylic dianhydride and diamine in an equimolar ratio in N, N-dimethylacetamide.
 このうち、テトラカルボン酸二無水物としては、例えば、ピロメリット酸二無水物、3,3’,4,4’-ビフェニルテトラカルボン酸二無水物、2,2-ビス(2,3-ジカルボキシフェニル)-1,1,1,3,3,3-ヘキサフルオロプロパン二無水物、2,2-ビス(3,4-ジカルボキシフェニル)-1,1,1,3,3,3-ヘキサフルオロプロパン二無水物、3,3’,4,4’-ベンゾフェノンテトラカルボン酸二無水物、ビス(3,4-ジカルボキシフェニル)エーテル二無水物、ビス(3,4-ジカルボキシフェニル)スルホン酸二無水物等が挙げられる。 Among these, examples of the tetracarboxylic dianhydride include pyromellitic dianhydride, 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride, and 2,2-bis (2,3-di (). Carboxyphenyl) -1,1,1,3,3,3-hexafluoropropane dianhydride, 2,2-bis (3,4-dicarboxyphenyl) -1,1,1,3,3,3- Hexafluoropropane dianhydride, 3,3 ′, 4,4′-benzophenone tetracarboxylic dianhydride, bis (3,4-dicarboxyphenyl) ether dianhydride, bis (3,4-dicarboxyphenyl) And sulfonic acid dianhydrides.
 一方、ジアミンとしては、例えば、m-フェニレンジアミン、p-フェニレンジアミン、3,4’-ジアミノジフェニルエーテル、4,4’-ジアミノジフェニルエーテル、4,4’-ジアミノジフェニルスルホン、3,3’-ジアミノジフェニルスルホン、2,2-ビス(4-アミノフェノキシフェニル)プロパン、2,2-ビス(4-アミノフェノキシフェニル)ヘキサフルオロプロパン、1,3-ビス(4-アミノフェノキシ)ベンゼン、1,4-ビス(4-アミノフェノキシ)ベンゼン、2,4-ジアミノトルエン、2,6-ジアミノトルエン、ジアミノジフェニルメタン、4,4’-ジアミノ-2,2-ジメチルビフェニル、2,2-ビス(トリフルオロメチル)-4,4’-ジアミノビフェニル等が挙げられる。 On the other hand, examples of the diamine include m-phenylenediamine, p-phenylenediamine, 3,4'-diaminodiphenyl ether, 4,4'-diaminodiphenyl ether, 4,4'-diaminodiphenyl sulfone, and 3,3'-diaminodiphenyl. Sulfone, 2,2-bis (4-aminophenoxyphenyl) propane, 2,2-bis (4-aminophenoxyphenyl) hexafluoropropane, 1,3-bis (4-aminophenoxy) benzene, 1,4-bis (4-aminophenoxy) benzene, 2,4-diaminotoluene, 2,6-diaminotoluene, diaminodiphenylmethane, 4,4′-diamino-2,2-dimethylbiphenyl, 2,2-bis (trifluoromethyl)- 4,4′-diaminobiphenyl and the like.
 また、シリコーン系樹脂としては、例えば、シリコーンゴム、シリコーンエラストマー等が挙げられる。これらのシリコーン系樹脂は、シリコーンゴムモノマーまたはオリゴマーと硬化剤とを反応させることにより得られるものである。 Further, examples of the silicone resin include silicone rubber and silicone elastomer. These silicone resins are obtained by reacting a silicone rubber monomer or oligomer with a curing agent.
 シリコーンゴムモノマーまたはオリゴマーとしては、例えば、メチルシロキサン基、エチルシロキサン基、フェニルシロキサン基を含むものが挙げられる。 Examples of the silicone rubber monomer or oligomer include those containing a methylsiloxane group, an ethylsiloxane group, or a phenylsiloxane group.
 また、シリコーンゴムモノマーまたはオリゴマーとしては、光反応性を付与するため、例えば、エポキシ基、ビニルエーテル基、アクリル基等の官能基を導入してなるものが好ましく用いられる。 Further, as the silicone rubber monomer or oligomer, for example, those obtained by introducing a functional group such as an epoxy group, a vinyl ether group, or an acrylic group are preferably used in order to impart photoreactivity.
 また、フッ素系樹脂としては、例えば、含フッ素脂肪族環構造を有するモノマーから得られる重合体、2つ以上の重合性不飽和結合を有する含フッ素モノマーを環化重合して得られる重合体、含フッ素系モノマーとラジカル重合性単量体とを共重合して得られる重合体等が挙げられる。 In addition, as the fluorine-based resin, for example, a polymer obtained from a monomer having a fluorine-containing aliphatic ring structure, a polymer obtained by cyclopolymerizing a fluorine-containing monomer having two or more polymerizable unsaturated bonds, Examples thereof include a polymer obtained by copolymerizing a fluorine-containing monomer and a radical polymerizable monomer.
 含フッ素脂肪族環構造としては、例えば、ペルフルオロ(2,2-ジメチル-1,3-ジオキソール)、ペルフルオロ(4-メチル-1,3-ジオキソール)、ペルフルオロ(4-メトキシ-1,3-ジオキソール)等が挙げられる。 Examples of the fluorine-containing aliphatic ring structure include perfluoro (2,2-dimethyl-1,3-dioxole), perfluoro (4-methyl-1,3-dioxole), and perfluoro (4-methoxy-1,3-dioxole). ) And the like.
 また、含フッ素モノマーとしては、例えば、ペルフルオロ(アリルビニルエーテル)、ペルフルオロ(ブテニルビニルエーテル)等が挙げられる。 Further, examples of the fluorine-containing monomer include perfluoro (allyl vinyl ether), perfluoro (butenyl vinyl ether) and the like.
 また、ラジカル重合性モノマーとしては、例えば、テトラフルオロエチレン、クロロトリフルオロエチレン、ペルフルオロ(メチルビニルエーテル)等が挙げられる。 Also, examples of the radical polymerizable monomer include tetrafluoroethylene, chlorotrifluoroethylene, perfluoro (methyl vinyl ether) and the like.
 なお、コア層13の各部の屈折率は、各部におけるポリマー915の屈折率とモノマーの屈折率の相対的な大小関係とその存在比率に応じて決定されるため、用いるモノマーの種類に応じてポリマー915の屈折率を適宜調整するようにしてもよい。 In addition, since the refractive index of each part of the core layer 13 is determined according to the relative magnitude relationship between the refractive index of the polymer 915 and the refractive index of the monomer in each part and the existence ratio thereof, the polymer depends on the type of monomer used. The refractive index of 915 may be adjusted as appropriate.
 例えば、比較的高い屈折率を有するポリマー915を得るためには、分子構造中に、芳香族環(芳香族基)、窒素原子、臭素原子や塩素原子を有するモノマーを一般的に選択して、ポリマー915が合成(重合)される。一方、比較的低い屈折率を有するポリマー915を得るためには、分子構造中に、アルキル基、フッ素原子やエーテル構造(エーテル基)を有するモノマーを一般的に選択して、ポリマー915が合成(重合)される。 For example, in order to obtain a polymer 915 having a relatively high refractive index, a monomer having an aromatic ring (aromatic group), a nitrogen atom, a bromine atom or a chlorine atom in the molecular structure is generally selected, A polymer 915 is synthesized (polymerized). On the other hand, in order to obtain a polymer 915 having a relatively low refractive index, a monomer having an alkyl group, a fluorine atom or an ether structure (ether group) is generally selected in the molecular structure, and the polymer 915 is synthesized ( Polymerization).
 比較的高い屈折率を有するノルボルネン系樹脂としては、アラルキルノルボルネンの繰り返し単位を含むものが好ましい。かかるノルボルネン系樹脂は、特に高い屈折率を有する。 As the norbornene-based resin having a relatively high refractive index, those containing a repeating unit of aralkyl norbornene are preferable. Such norbornene-based resins have a particularly high refractive index.
 アラルキルノルボルネンの繰り返し単位が有するアラルキル基(アリールアルキル基)としては、例えば、ベンジル基、フェニルエチル基、フェニルプロピル基、フェニルブチル基、ナフチルエチル基、ナフチルプロピル基、フルオレニルエチル基、フルオレニルプロピル基等が挙げられるが、ベンジル基やフェニルエチル基が特に好ましい。かかる繰り返し単位を有するノルボルネン系樹脂は、極めて高い屈折率を有するものであることから好ましい。 Examples of the aralkyl group (arylalkyl group) of the aralkylnorbornene repeating unit include benzyl group, phenylethyl group, phenylpropyl group, phenylbutyl group, naphthylethyl group, naphthylpropyl group, fluorenylethyl group, fluorene group, and the like. Examples thereof include a nylpropyl group, and a benzyl group and a phenylethyl group are particularly preferable. A norbornene-based resin having such a repeating unit is preferable because it has a very high refractive index.
 また、以上のようなポリマー915は、主鎖から分岐し、活性放射線の照射により、その分子構造の少なくとも一部が主鎖から離脱し得る離脱性基(離脱性ペンダントグループ)を有しているのが好ましい。離脱性基の離脱によりポリマー915の屈折率が低下するため、ポリマー915は、活性放射線の照射の有無によって屈折率差を形成することができる。 Further, the polymer 915 as described above has a leaving group (leaving pendant group) that is branched from the main chain and at least a part of the molecular structure of which can be released from the main chain by irradiation with actinic radiation. Is preferred. Since the refractive index of the polymer 915 decreases due to the removal of the leaving group, the polymer 915 can form a refractive index difference depending on the presence or absence of irradiation with actinic radiation.
 このような離脱性基を有するポリマー915としては、例えば、分子構造中に、-O-構造、-Si-アリール構造および-O-Si-構造のうちの少なくとも1つを有するものが挙げられる。かかる離脱性基は、カチオンの作用により比較的容易に離脱する。 Examples of the polymer 915 having such a leaving group include a polymer having at least one of an —O— structure, an —Si—aryl structure, and an —O—Si— structure in a molecular structure. Such a leaving group is released relatively easily by the action of a cation.
 このうち、離脱により樹脂の屈折率に低下を生じさせる離脱性基としては、-Si-ジフェニル構造および-O-Si-ジフェニル構造の少なくとも一方が好ましい。 Among these, as the leaving group that causes a decrease in the refractive index of the resin by leaving, at least one of the —Si-diphenyl structure and the —O—Si-diphenyl structure is preferable.
 ここで、側鎖に離脱性基を有するポリマー915としては、例えばシクロヘキセン、シクロオクテン等の単環体モノマーの重合体、ノルボルネン、ノルボルナジエン、ジシクロペンタジエン、ジヒドロジシクロペンタジエン、テトラシクロドデセン、トリシクロペンタジエン、ジヒドロトリシクロペンタジエン、テトラシクロペンタジエン、ジヒドロテトラシクロペンタジエン等の多環体モノマーの重合体等の環状オレフィン系樹脂が挙げられる。これらの中でも多環体モノマーの重合体の中から選ばれる1種以上の環状オレフィン系樹脂が好ましく用いられる。これにより、樹脂の耐熱性を向上することができる。 Here, examples of the polymer 915 having a leaving group in the side chain include polymers of monocyclic monomers such as cyclohexene and cyclooctene, norbornene, norbornadiene, dicyclopentadiene, dihydrodicyclopentadiene, tetracyclododecene, Examples thereof include cyclic olefin resins such as polymers of polycyclic monomers such as cyclopentadiene, dihydrotricyclopentadiene, tetracyclopentadiene, dihydrotetracyclopentadiene and the like. Among these, one or more cyclic olefin resins selected from polymers of polycyclic monomers are preferably used. Thereby, the heat resistance of resin can be improved.
 なお、重合形態としては、ランダム重合、ブロック重合等の公知の形態を適用することができる。例えばノルボルネン型モノマーの重合の具体例としては、ノルボルネン型モノマーの(共)重合体、ノルボルネン型モノマーとα-オレフィン類などの共重合可能な他のモノマーとの共重合体、およびこれらの共重合体の水素添加物などが具体例に該当する。これら環状オレフィン系樹脂は、公知の重合法により製造することが可能であり、その重合方法には付加重合法と開環重合法とがあり、前述の中でも付加重合法で得られる環状オレフィン系樹脂(特にノルボルネン系樹脂)が好ましい(すなわち、ノルボルネン系化合物の付加重合体)。これにより、透明性、耐熱性および可撓性に優れる。 In addition, as polymerization forms, known forms such as random polymerization and block polymerization can be applied. For example, specific examples of the polymerization of norbornene monomers include (co) polymers of norbornene monomers, copolymers of norbornene monomers and other copolymerizable monomers such as α-olefins, A combined hydrogenated product corresponds to a specific example. These cyclic olefin resins can be produced by a known polymerization method. The polymerization methods include an addition polymerization method and a ring-opening polymerization method, and among them, the cyclic olefin resin obtained by the addition polymerization method. (In particular, norbornene-based resins) are preferable (that is, addition polymers of norbornene-based compounds). Thereby, it is excellent in transparency, heat resistance, and flexibility.
 さらに、側鎖に離脱性基を有するノルボルネン系樹脂としては、例えば、式(8)で表されるノルボルネン系樹脂の中で、Xが酸素原子、Xがシリコン原子、Arがフェニル基であるものが挙げられる。 Further, as the norbornene resin having a leaving group in the side chain, for example, in the norbornene resin represented by the formula (8), X 1 is an oxygen atom, X 2 is a silicon atom, and Ar is a phenyl group. Some are listed.
 また、式(3)においては、アルコキシシリル基のSi-O-Xの部分で脱離する場合がある。 In the formula (3), there is a case where the Si—O—X 3 portion of the alkoxysilyl group is eliminated.
 また、例えば、式(9)のノルボルネン系樹脂を使用した場合、光酸発生剤(PAGと表記)から発生した酸により、以下のように反応が進むと推測される。なお、ここでは、離脱性基の部分のみを示し、また、i=1の場合で説明している。 Also, for example, when the norbornene resin of the formula (9) is used, it is presumed that the reaction proceeds as follows by the acid generated from the photoacid generator (denoted as PAG). Here, only the part of the leaving group is shown, and the case where i = 1 is described.
Figure JPOXMLDOC01-appb-C000015
Figure JPOXMLDOC01-appb-C000015
 さらに、式(9)の構造に加えて、側鎖にエポキシ基を有するものであってもよい。このようなものを使用することでクラッド層11、12や基材に対して密着性に優れたコア層13が形成可能という効果がある。
 具体例として以下のようなものが挙げられる。
Furthermore, in addition to the structure of the formula (9), the side chain may have an epoxy group. By using such a thing, there exists an effect that the core layer 13 excellent in adhesiveness with respect to the cladding layers 11 and 12 and a base material can be formed.
Specific examples include the following.
Figure JPOXMLDOC01-appb-C000016


 (式(31)において、p/q+rは、20以下である。)
Figure JPOXMLDOC01-appb-C000016


(In formula (31), p 7 / q 7 + r 2 is 20 or less.)
 式(31)で示される化合物は、たとえば、ヘキシルノルボルネンと、ジフェニルメチルノルボルネンメトキシシラン(側鎖に-CH-O-Si(CH)(Ph)を含むノルボルネン)およびエポキシノルボルネンをトルエンに溶かし、Ni化合物を触媒に用いて溶液重合させることで得ることができる。 The compound represented by the formula (31) includes, for example, hexyl norbornene, diphenylmethyl norbornene methoxysilane (norbornene containing —CH 2 —O—Si (CH 3 ) (Ph) 2 in the side chain) and epoxy norbornene in toluene. It can be obtained by dissolving and solution polymerization using a Ni compound as a catalyst.
 一方、別の離脱性基としては、例えば、末端にアセトフェノン構造を有する置換基が挙げられる。この離脱性基は、フリーラジカルの作用により比較的容易に離脱する。 On the other hand, examples of another leaving group include a substituent having an acetophenone structure at the terminal. This leaving group is released relatively easily by the action of free radicals.
 前記離脱性基の含有量は、特に限定されないが、前記側鎖に脱離性基を有するポリマー915中の10~80重量%であるのが好ましく、特に20~60重量%であるのがより好ましい。含有量が前記範囲内であると、特に可撓性と屈折率変調機能(屈折率差を変化させる効果)との両立に優れる。 The content of the leaving group is not particularly limited, but is preferably 10 to 80% by weight in the polymer 915 having a leaving group in the side chain, and more preferably 20 to 60% by weight. preferable. When the content is within the above range, both flexibility and refractive index modulation function (effect of changing the refractive index difference) are particularly excellent.
 例えば、離脱性基の含有量を多くすることにより、屈折率を変化させる幅を拡張することができる。 For example, the width of changing the refractive index can be expanded by increasing the content of the leaving group.
 (添加剤)
 添加剤920は、モノマーおよび重合開始剤を含んでいる。
(Additive)
Additive 920 contains a monomer and a polymerization initiator.
 ((モノマー))
 モノマーは、後述する活性放射線の照射により、活性放射線の照射領域において反応して反応物を形成し、それとともにモノマーが拡散移動することで、層910において照射領域と未照射領域との間に屈折率差を生じさせ得るような化合物である。
((monomer))
The monomer reacts in the irradiation region of the actinic radiation to form a reactant by irradiation with actinic radiation described later, and the monomer diffuses and moves with it, so that the layer 910 is refracted between the irradiation region and the non-irradiation region. It is a compound that can cause a rate difference.
 モノマーの反応物としては、モノマーがポリマー915中で重合して形成されたポリマー(重合体)、モノマーがポリマー915同士を架橋してなる架橋構造、および、モノマーがポリマー915に重合してポリマー915から分岐した分岐構造のうちの少なくとも1つが挙げられる。 As a reaction product of the monomer, a polymer (polymer) formed by polymerizing the monomer in the polymer 915, a cross-linked structure in which the monomer cross-links the polymers 915, and a polymer 915 obtained by polymerizing the monomer to the polymer 915. At least one of the branched structures branched from.
 ところで、照射領域と未照射領域との間に生じる屈折率差は、ポリマー915の屈折率とモノマーの屈折率との差に基づいて生じることから、添加剤920中に含まれるモノマーは、ポリマー915の屈折率との大小関係を考慮して選択される。 By the way, the difference in refractive index generated between the irradiated region and the non-irradiated region is generated based on the difference between the refractive index of the polymer 915 and the refractive index of the monomer. Therefore, the monomer contained in the additive 920 is the polymer 915. Is selected in consideration of the magnitude relationship with the refractive index.
 具体的には、層910において、照射領域の屈折率が高くなることが望まれる場合には、比較的低い屈折率を有するポリマー915と、このポリマー915に対して高い屈折率を有するモノマーとを組み合わせて使用される。一方、照射領域の屈折率が低くなることが望まれる場合には、比較的高い屈折率を有するポリマー915と、このポリマー915に対して低い屈折率を有するモノマーとを組み合わせて使用される。 Specifically, in the layer 910, when it is desired that the refractive index of the irradiated region be high, a polymer 915 having a relatively low refractive index and a monomer having a high refractive index with respect to the polymer 915 are included. Used in combination. On the other hand, when it is desired that the refractive index of the irradiated region be low, a polymer 915 having a relatively high refractive index and a monomer having a low refractive index with respect to the polymer 915 are used in combination.
 なお、屈折率が「高い」または「低い」とは、屈折率の絶対値を意味するものではなく、ある材料同士の相対的な関係を意味するものである。 Note that “high” or “low” in the refractive index does not mean the absolute value of the refractive index but means a relative relationship between certain materials.
 そして、モノマーの反応(反応物の生成)により、層910において照射領域の屈折率が低下する場合、当該部分が屈折率分布Wの極小値を形成し、照射領域の屈折率が上昇する場合、当該部分が屈折率分布の極大値を構成する。 And, when the refractive index of the irradiated region decreases in the layer 910 due to the monomer reaction (reactant generation), when the portion forms a minimum value of the refractive index distribution W and the refractive index of the irradiated region increases, This portion constitutes the maximum value of the refractive index distribution.
 なお、モノマーとしては、ポリマー915との相溶性を有し、ポリマー915との屈折率差が0.01以上であるものが好ましく用いられる。 As the monomer, those having compatibility with the polymer 915 and having a refractive index difference with the polymer 915 of 0.01 or more are preferably used.
 このようなモノマーとしては、重合可能な部位を有する化合物であればよく、特に限定されないが、例えば、ノルボルネン系モノマー、アクリル酸(メタクリル酸)系モノマー、エポキシ系モノマー、オキセタン系モノマー、ビニルエーテル系モノマー、スチレン系モノマー等が挙げられ、これらのうちの1種または2種以上を組み合わせて用いることができる。 Such a monomer is not particularly limited as long as it is a compound having a polymerizable site, and examples thereof include norbornene monomers, acrylic acid (methacrylic acid) monomers, epoxy monomers, oxetane monomers, and vinyl ether monomers. , A styrene monomer, etc., and one or more of these can be used in combination.
 これらの中でも、モノマーとしては、オキセタニル基またはエポキシ基等の環状エーテル基を有するモノマーまたはオリゴマー、あるいはノルボルネン系モノマーを用いるのが好ましい。環状エーテル基を有するモノマーまたはオリゴマーを用いることにより、環状エーテル基の開環が起こり易いため、速やかに反応し得るモノマーが得られる。また、ノルボルネン系モノマーを用いることにより、光伝送性能に優れ、かつ、耐熱性および柔軟性に優れるコア層13(光導波路1)が得られる。 Among these, it is preferable to use a monomer or oligomer having a cyclic ether group such as an oxetanyl group or an epoxy group, or a norbornene monomer as the monomer. By using a monomer or oligomer having a cyclic ether group, the cyclic ether group is likely to be opened, so that a monomer capable of reacting quickly can be obtained. Further, by using a norbornene-based monomer, the core layer 13 (optical waveguide 1) having excellent optical transmission performance and excellent heat resistance and flexibility can be obtained.
 このうち、環状エーテル基を有するモノマーの分子量(重量平均分子量)またはオリゴマーの分子量(重量平均分子量)は、それぞれ100以上400以下であるのが好ましい。 Among these, the molecular weight (weight average molecular weight) of the monomer having a cyclic ether group or the molecular weight (weight average molecular weight) of the oligomer is preferably 100 or more and 400 or less, respectively.
 オキセタニル基を有するモノマー、オキセタニル基を有するオリゴマーとしては、下記式(11)~(20)の群から選ばれるものが好ましい。これらを使用することで波長850nm近傍での透明性に優れ、可撓性と耐熱性の両立が可能という利点がある。また、これらを単独でも混合して用いても差し支えない。 As the monomer having an oxetanyl group and the oligomer having an oxetanyl group, those selected from the group of the following formulas (11) to (20) are preferable. By using these, there is an advantage that transparency in the vicinity of a wavelength of 850 nm is excellent and both flexibility and heat resistance are possible. These may be used alone or in combination.
Figure JPOXMLDOC01-appb-C000017
Figure JPOXMLDOC01-appb-C000017
Figure JPOXMLDOC01-appb-C000018
Figure JPOXMLDOC01-appb-C000018
Figure JPOXMLDOC01-appb-C000019
Figure JPOXMLDOC01-appb-C000019
Figure JPOXMLDOC01-appb-C000020
Figure JPOXMLDOC01-appb-C000020

Figure JPOXMLDOC01-appb-C000021
Figure JPOXMLDOC01-appb-C000021
Figure JPOXMLDOC01-appb-C000022
Figure JPOXMLDOC01-appb-C000022
Figure JPOXMLDOC01-appb-C000023
Figure JPOXMLDOC01-appb-C000023
Figure JPOXMLDOC01-appb-C000024

 (式(18)においてnは0以上、3以下である。)
Figure JPOXMLDOC01-appb-C000024

(In formula (18), n is 0 or more and 3 or less.)
Figure JPOXMLDOC01-appb-C000025
Figure JPOXMLDOC01-appb-C000025
Figure JPOXMLDOC01-appb-C000026
Figure JPOXMLDOC01-appb-C000026
 以上のようなモノマーおよびオリゴマーの中でも、ポリマー915との屈折率差を確保する観点から式(13)、(15)、(16)、(17)、(20)で表される化合物を使用することが好ましい。 Among the monomers and oligomers as described above, compounds represented by the formulas (13), (15), (16), (17), and (20) are used from the viewpoint of securing a difference in refractive index from the polymer 915. It is preferable.
 さらには、ポリマー915の樹脂との屈折率差がある点、分子量が小さく、モノマーの運動性が高い点、モノマーが容易に揮発しない点を考慮すると、式(20)、式(15)で表される化合物を使用することが特に好ましい。 Furthermore, in consideration of the difference in refractive index from the polymer 915 resin, the low molecular weight, the high mobility of the monomer, and the fact that the monomer does not easily volatilize, it is expressed by the equations (20) and (15). It is particularly preferred to use the compounds
 また、オキセタニル基を有する化合物としては、以下の式(32)、式(33)で表される化合物を使用することができる。式(32)で表される化合物としては、東亞合成製の商品名TESOX等、式(33)で表される化合物としては、東亞合成製の商品名OX-SQ等を使用することができる。 Further, as the compound having an oxetanyl group, compounds represented by the following formulas (32) and (33) can be used. As the compound represented by the formula (32), trade name TOSOX manufactured by Toagosei Co., Ltd., and as the compound represented by formula (33), trade name OX-SQ manufactured by Toagosei Co., Ltd. can be used.
Figure JPOXMLDOC01-appb-C000027
Figure JPOXMLDOC01-appb-C000027
Figure JPOXMLDOC01-appb-C000028

 (式(33)において、nは1または2である)
Figure JPOXMLDOC01-appb-C000028

(In formula (33), n is 1 or 2)
 また、エポキシ基を有するモノマー、エポキシ基を有するオリゴマーとしては、例えば、以下のようなものが挙げられる。このエポキシ基を有するモノマー、オリゴマーは、酸の存在下において開環により重合するものである。 Further, examples of the monomer having an epoxy group and the oligomer having an epoxy group include the following. The monomer and oligomer having an epoxy group are polymerized by ring-opening in the presence of an acid.
 エポキシ基を有するモノマー、エポキシ基を有するオリゴマーとしては、以下の式(34)~(39)で表されるものを使用することができる。中でも、エポキシ環のひずみエネルギーが大きく反応性に優れるという観点から式(36)~(39)で表される脂環式エポキシモノマーを使用することが好ましい。 As the monomer having an epoxy group and the oligomer having an epoxy group, those represented by the following formulas (34) to (39) can be used. Among them, it is preferable to use an alicyclic epoxy monomer represented by the formulas (36) to (39) from the viewpoint that the strain energy of the epoxy ring is large and the reactivity is excellent.
 なお、式(34)で表される化合物は、エポキシノルボルネンであり、このような化合物としては、例えば、プロメラス社製 EpNBを使用することができる。式(35)で表される化合物は、γ-グリシドキシプロピルトリメトキシシランであり、この化合物としては、例えば、東レ・ダウコーニング・シリコーン社製 Z-6040を使用することができる。また、式(36)で表される化合物は、2-(3,4-エポキシシクロヘキシル)エチルトリメトキシシランであり、この化合物としては、例えば、東京化成製 E0327を使用することができる。 Note that the compound represented by the formula (34) is epoxy norbornene, and as such a compound, for example, EpNB manufactured by Promeras Corporation can be used. The compound represented by the formula (35) is γ-glycidoxypropyltrimethoxysilane, and as this compound, for example, Z-6040 manufactured by Toray Dow Corning Silicone can be used. The compound represented by the formula (36) is 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane. As this compound, for example, E0327 manufactured by Tokyo Chemical Industry can be used.
 さらに、式(37)で表される化合物は、3、4-エポキシシクロヘキセニルメチル-3’、4’-エポキシシクロヘキセンカルボキシレートであり、この化合物としては、例えば、ダイセル化学社製 セロキサイド2021Pを使用することができる。また、式(38)で表される化合物は、1,2-エポキシ-4-ビニルシクロヘキサンであり、この化合物としては、例えば、ダイセル化学社製 セロキサイド2000を使用することができる。 Further, the compound represented by the formula (37) is 3,4-epoxycyclohexenylmethyl-3 ′, 4′-epoxycyclohexenecarboxylate, and for example, Celoxide 2021P manufactured by Daicel Chemical Industries, Ltd. is used. can do. The compound represented by the formula (38) is 1,2-epoxy-4-vinylcyclohexane, and as this compound, for example, Celoxide 2000 manufactured by Daicel Chemical Industries, Ltd. can be used.
 さらに、式(39)で表される化合物は、1,2:8,9ジエポキシリモネンであり、この化合物としては、例えば、(ダイセル化学社製 セロキサイド3000)を使用することができる。 Furthermore, the compound represented by the formula (39) is 1,2: 8,9 diepoxy limonene. As this compound, for example, (Celoxide 3000 manufactured by Daicel Chemical Industries, Ltd.) can be used.
Figure JPOXMLDOC01-appb-C000029
Figure JPOXMLDOC01-appb-C000029
Figure JPOXMLDOC01-appb-C000030
Figure JPOXMLDOC01-appb-C000030
Figure JPOXMLDOC01-appb-C000031
Figure JPOXMLDOC01-appb-C000031

Figure JPOXMLDOC01-appb-C000032
Figure JPOXMLDOC01-appb-C000032

Figure JPOXMLDOC01-appb-C000033
Figure JPOXMLDOC01-appb-C000033

Figure JPOXMLDOC01-appb-C000034
Figure JPOXMLDOC01-appb-C000034

 さらに、モノマーとしては、オキセタニル基を有するモノマー、オキセタニル基を有するオリゴマーと、エポキシ基を有するモノマー、エポキシ基を有するオリゴマーとが併用されていてもよい。 Furthermore, as the monomer, a monomer having an oxetanyl group, an oligomer having an oxetanyl group, a monomer having an epoxy group, and an oligomer having an epoxy group may be used in combination.
 オキセタニル基を有するモノマー、オキセタニル基を有するオリゴマーは重合を開始する開始反応が遅いが、生長反応が速い。これに対し、エポキシ基を有するモノマー、エポキシ基を有するオリゴマーは、重合を開始する開始反応が速いが、生長反応が遅い。そのため、オキセタニル基を有するモノマー、オキセタニル基を有するオリゴマーと、エポキシ基を有するモノマー、エポキシ基を有するオリゴマーとを併用することで、光を照射した際に、光照射部分と、未照射部分との屈折率差を確実に生じさせることができる。 The monomer having an oxetanyl group and the oligomer having an oxetanyl group have a slow initiation reaction for initiating polymerization but a fast growth reaction. On the other hand, a monomer having an epoxy group and an oligomer having an epoxy group have a fast initiation reaction for initiating polymerization, but have a slow growth reaction. Therefore, by using a monomer having an oxetanyl group, an oligomer having an oxetanyl group, a monomer having an epoxy group, and an oligomer having an epoxy group, when irradiated with light, the light irradiated portion and the unirradiated portion A difference in refractive index can be reliably generated.
 具体的には、式(20)で表わされるモノマーを「第1モノマー」とし、上記成分Bを含むモノマーを「第2モノマー」とすると、第1モノマーと第2モノマーとを併用するのが好ましく、その併用割合を(第2モノマーの重量)/(第1モノマーの重量)で規定するとき、0.1~1程度であるのが好ましく、0.1~0.6程度であるのがより好ましい。併用割合が前記範囲内であると、モノマーの反応性の速さと光導波路1の耐熱性とのバランスが向上する。 Specifically, when the monomer represented by the formula (20) is “first monomer” and the monomer containing the component B is “second monomer”, it is preferable to use the first monomer and the second monomer in combination. When the ratio of the combined use is defined by (weight of second monomer) / (weight of first monomer), it is preferably about 0.1 to 1, more preferably about 0.1 to 0.6. preferable. When the combined ratio is within the above range, the balance between the reactivity of the monomer and the heat resistance of the optical waveguide 1 is improved.
 なお、第2モノマーに相当するモノマーには、式(20)で表わされるモノマーと異なるオキセタニル基を有するモノマーやビニルエーテル基を有するモノマーが挙げられる。これらの中でも、エポキシ化合物(特に脂環式エポキシ化合物)および2官能のオキセタン化合物(オキセタニル基を2つ有するモノマー)の少なくとも1種が好ましく用いられる。これらの第2モノマーを用いることにより、第1モノマーとポリマー915との反応性を向上させることができ、それによって透明性を保持しつつ、導波路の耐熱性を向上させることができる。 In addition, the monomer corresponding to the second monomer includes a monomer having an oxetanyl group different from the monomer represented by the formula (20) and a monomer having a vinyl ether group. Among these, at least one of an epoxy compound (particularly an alicyclic epoxy compound) and a bifunctional oxetane compound (a monomer having two oxetanyl groups) is preferably used. By using these second monomers, the reactivity between the first monomer and the polymer 915 can be improved, whereby the heat resistance of the waveguide can be improved while maintaining transparency.
 このような第2モノマーの具体例としては、上記式(15)の化合物、上記式(12)の化合物、上記式(11)の化合物、上記式(18)の化合物、上記式(19)の化合物、上記式(34)~(39)の化合物が挙げられる。 Specific examples of the second monomer include the compound of the above formula (15), the compound of the above formula (12), the compound of the above formula (11), the compound of the above formula (18), and the above formula (19). And compounds of the above formulas (34) to (39).
 また、ノルボルネン系モノマーとは、下記構造式Aで示されるノルボルネン骨格を少なくとも1つ含むモノマーを総称し、例えば、下記構造式Cで表される化合物が挙げられる。 Further, the norbornene-based monomer is a generic term for monomers containing at least one norbornene skeleton represented by the following structural formula A, and examples thereof include compounds represented by the following structural formula C.
Figure JPOXMLDOC01-appb-C000035
Figure JPOXMLDOC01-appb-C000035

Figure JPOXMLDOC01-appb-C000036


 [式中、aは、単結合または二重結合を表し、R12~R15は、それぞれ独立して、水素原子、置換もしくは無置換の炭化水素基、または官能置換基を表し、mは、0~5の整数を表す。ただし、aが二重結合の場合、R12およびR13のいずれか一方、R14およびR15のいずれか一方は存在しない。]
Figure JPOXMLDOC01-appb-C000036


[Wherein, a represents a single bond or a double bond, R 12 to R 15 each independently represents a hydrogen atom, a substituted or unsubstituted hydrocarbon group, or a functional substituent, An integer of 0 to 5 is represented. However, when a is a double bond, either one of R 12 and R 13 or one of R 14 and R 15 does not exist. ]
 無置換の炭化水素基(ハイドロカルビル基)としては、例えば、直鎖状または分岐状の炭素数1~10(C~C10)のアルキル基、直鎖状または分岐状の炭素数2~10(C~C10のアルケニル基、直鎖状または分岐状の炭素数2~10(C~C10)のアルキニル基、炭素数4~12(C~C12)のシクロアルキル基、炭素数4~12(C~C12)のシクロアルケニル基、炭素数6~12(C~C12)のアリール基、炭素数7~24(C~C24)のアラルキル基(アリールアルキル基)等が挙げられ、その他、R12およびR13、R14およびR15が、それぞれ炭素数1~10(C~C10)のアルキリデニル基であってもよい。 Examples of the unsubstituted hydrocarbon group (hydrocarbyl group) include, for example, a linear or branched alkyl group having 1 to 10 carbon atoms (C 1 to C 10 ), a linear or branched carbon number of 2 -10 (C 2 -C 10 alkenyl group, linear or branched alkynyl group having 2 to 10 carbon atoms (C 2 -C 10 ), cycloalkyl having 4 to 12 carbon atoms (C 4 -C 12 ) Group, a cycloalkenyl group having 4 to 12 carbon atoms (C 4 to C 12 ), an aryl group having 6 to 12 carbon atoms (C 6 to C 12 ), and an aralkyl group having 7 to 24 carbon atoms (C 7 to C 24 ) In addition, R 12 and R 13 , R 14 and R 15 may each be an alkylidenyl group having 1 to 10 carbon atoms (C 1 to C 10 ).
 なお、上記以外のモノマー、例えばアクリル酸(メタクリル酸)系モノマーとしては、アクリル酸、メタクリル酸、アクリル酸エステル、メタクリル酸エステル、アクリル酸アミド、メタクリル酸アミド、アクリロニトリル等が挙げられ、これらのうちの1種または2種以上を組み合わせて用いることができる。 In addition, examples of monomers other than the above, for example, acrylic acid (methacrylic acid) monomers include acrylic acid, methacrylic acid, acrylic acid ester, methacrylic acid ester, acrylic acid amide, methacrylic acid amide, acrylonitrile, and the like. These can be used alone or in combination of two or more.
 具体的には、(メタ)アクリル酸2-エチルヘキシル、(メタ)アクリル酸シクロヘキシル、(メタ)アクリル酸2-ブトキシエチル等が挙げられる。 Specific examples include 2-ethylhexyl (meth) acrylate, cyclohexyl (meth) acrylate, 2-butoxyethyl (meth) acrylate, and the like.
 また、ビニルエーテル系モノマーとしては、例えば、メチルビニルエーテル、エチルビニルエーテル、n-プロピルビニルエーテル、イソプロピルビニルエーテル、n-ブチルビニルエーテル、イソブチルビニルエーテル、tert-ブチルビニルエーテル、n-ペンチルビニルエーテル、n-ヘキシルビニルエーテル、n-オクチルビニルエーテル、n-ドデシルビニルエーテル、2-エチルヘキシルビニルエーテル、シクロヘキシルビニルエーテル等のアルキルビニルエーテル類またはシクロアルキルビニルエーテル類が挙げられ、これらのうちの1種または2種以上を組み合わせて用いることができる。 Examples of vinyl ether monomers include methyl vinyl ether, ethyl vinyl ether, n-propyl vinyl ether, isopropyl vinyl ether, n-butyl vinyl ether, isobutyl vinyl ether, tert-butyl vinyl ether, n-pentyl vinyl ether, n-hexyl vinyl ether, n-octyl. Examples thereof include alkyl vinyl ethers or cycloalkyl vinyl ethers such as vinyl ether, n-dodecyl vinyl ether, 2-ethylhexyl vinyl ether, and cyclohexyl vinyl ether, and one or more of these can be used in combination.
 また、スチレン系モノマーとしては、例えば、スチレン、ジビニルベンゼン等が挙げられ、これらのうちの1種または2種を組み合わせて用いることができる。 Also, examples of the styrene monomer include styrene and divinylbenzene, and one or two of these can be used in combination.
 なお、これらのモノマーと前述したポリマー915との組み合わせは、特に限定されず、いかなる組み合わせであってもよい。 In addition, the combination of these monomers and the polymer 915 mentioned above is not specifically limited, Any combination may be sufficient.
 また、モノマーは、その少なくとも一部が上述したようにオリゴマー化していてもよい。 Further, at least a part of the monomer may be oligomerized as described above.
 これらのモノマーの添加量は、ポリマー100重量部に対し、1重量部以上50重量部以下であることが好ましく、2重量部以上20重量部以下であることがより好ましい。これにより、コア/クラッド間の屈折率変調を可能にし、可撓性と耐熱性との両立が図れるという効果がある。 The addition amount of these monomers is preferably 1 part by weight or more and 50 parts by weight or less, and more preferably 2 parts by weight or more and 20 parts by weight or less with respect to 100 parts by weight of the polymer. Thereby, the refractive index modulation between the core and the clad is possible, and there is an effect that both flexibility and heat resistance can be achieved.
 ((重合開始剤))
 重合開始剤は、活性放射線の照射に伴ってモノマーに作用し、モノマーの反応を促すものであり、モノマーの反応性を考慮し、必要に応じて添加される。
((Polymerization initiator))
The polymerization initiator acts on the monomer with irradiation of actinic radiation to promote the reaction of the monomer, and is added as necessary in consideration of the reactivity of the monomer.
 用いる重合開始剤としては、モノマーの重合反応または架橋反応の種類に応じて適宜選択される。例えば、アクリル酸(メタクリル酸)系モノマー、スチレン系モノマーには専らラジカル重合開始剤が、エポキシ系モノマー、オキセタン系モノマー、ビニルエーテル系モノマーには専らカチオン重合開始剤が好ましく用いられる。 The polymerization initiator to be used is appropriately selected according to the type of monomer polymerization reaction or crosslinking reaction. For example, radical polymerization initiators are preferably used exclusively for acrylic acid (methacrylic acid) monomers and styrene monomers, and cationic polymerization initiators are preferably used exclusively for epoxy monomers, oxetane monomers, and vinyl ether monomers.
 ラジカル重合開始剤としては、例えば、ベンゾフェノン類、アセトフェノン類等が挙げられる。 Examples of radical polymerization initiators include benzophenones and acetophenones.
 一方、カチオン重合開始剤としては、例えば、ジアゾニウム塩のようなルイス酸発生型のもの、ヨードニウム塩、スルホニウム塩のようなブレンステッド酸発生型のもの等が挙げられる。 On the other hand, examples of the cationic polymerization initiator include Lewis acid generating type such as diazonium salt, Bronsted acid generating type such as iodonium salt and sulfonium salt.
 特に、モノマーとして環状エーテル基を有するモノマーを用いる場合には、以下のようなカチオン重合開始剤(光酸発生剤)が好ましく用いられる。 In particular, when a monomer having a cyclic ether group is used as the monomer, the following cationic polymerization initiator (photoacid generator) is preferably used.
 例えば、トリフェニルスルフォニウムトリフルオロメタンスルホネート、トリス(4-t-ブチルフェニル)スルホニウム-トリフルオロメタンスルホネートなどのスルホニウム塩類、p-ニトロフェニルジアゾニウムヘキサフルオロホスフェートなどのジアゾニウム塩類、アンモニウム塩類、ホスホニウム塩類、ジフェニルヨードニウムトリフルオロメタンスルホネート、(トリキュミル)ヨードニウム-テトラキス(ペンタフルオロフェニル)ボレートなどのヨードニウム塩類、キノンジアジド類、ビス(フェニルスルホニル)ジアゾメタンなどのジアゾメタン類、1-フェニル-1-(4-メチルフェニル)スルホニルオキシ-1-ベンゾイルメタン、N-ヒドロキシナフタルイミド-トリフルオロメタンサルホネートなどのスルホン酸エステル類、ジフェニルジスルホンなどのジスルホン類、トリス(2,4,6-トリクロロメチル)-s-トリアジン、2-(3.4-メチレンジオキシフェニル)-4,6-ビス-(トリクロロメチル)-s-トリアジンなどのトリアジン類等の化合物が、光酸発生剤として用いられる。なお、これらの光酸発生剤は、単独または複数を組み合わせて用いられる。 For example, sulfonium salts such as triphenylsulfonium trifluoromethanesulfonate, tris (4-t-butylphenyl) sulfonium-trifluoromethanesulfonate, diazonium salts such as p-nitrophenyldiazonium hexafluorophosphate, ammonium salts, phosphonium salts, diphenyliodonium Iodonium salts such as trifluoromethanesulfonate, (triccumyl) iodonium-tetrakis (pentafluorophenyl) borate, quinonediazides, diazomethanes such as bis (phenylsulfonyl) diazomethane, 1-phenyl-1- (4-methylphenyl) sulfonyloxy- Sulfos such as 1-benzoylmethane, N-hydroxynaphthalimide-trifluoromethanesulfonate Acid esters, disulfones such as diphenyldisulfone, tris (2,4,6-trichloromethyl) -s-triazine, 2- (3.4-methylenedioxyphenyl) -4,6-bis- (trichloromethyl) Compounds such as triazines such as -s-triazine are used as photoacid generators. These photoacid generators may be used alone or in combination.
 重合開始剤の含有量は、ポリマー100重量部に対し0.01重量部以上0.3重量部以下であることが好ましく、0.02重量部以上0.2重量部以下であることがより好ましい。これにより、反応性の向上という効果がある。 The content of the polymerization initiator is preferably 0.01 parts by weight or more and 0.3 parts by weight or less, more preferably 0.02 parts by weight or more and 0.2 parts by weight or less with respect to 100 parts by weight of the polymer. . Thereby, there exists an effect of a reactive improvement.
 なお、モノマーの反応性が著しく高い場合には、重合開始剤の添加を省略してもよい。 In addition, when the reactivity of a monomer is remarkably high, addition of a polymerization initiator may be omitted.
 このうち、増感剤は、光に対する重合開始剤の感度を増大して、重合開始剤の活性化(反応または分解)に要する時間やエネルギーを減少させる機能や、重合開始剤の活性化に適する波長に光の波長を変化させる機能を有するものである。 Among these, the sensitizer increases the sensitivity of the polymerization initiator to light and is suitable for the function of reducing the time and energy required for the activation (reaction or decomposition) of the polymerization initiator and for the activation of the polymerization initiator. It has a function of changing the wavelength of light to a wavelength.
 このような増感剤としては、重合開始剤の感度や増感剤の吸収のピーク波長に応じて適宜選択され、特に限定されないが、たとえば、9,10-ジブトキシアントラセン(CAS番号第76275-14-4番)のようなアントラセン類、キサントン類、アントラキノン類、フェナントレン類、クリセン類、ベンツピレン類、フルオラセン類(fluoranthenes)、ルブレン類、ピレン類、インダンスリーン類、チオキサンテン-9-オン類(thioxanthen-9-ones)等が挙げられ、これらを単独または混合物として用いることができる。 Such a sensitizer is appropriately selected according to the sensitivity of the polymerization initiator and the peak wavelength of absorption of the sensitizer, and is not particularly limited. For example, 9,10-dibutoxyanthracene (CAS No. 76275) is selected. 14-4)), anthracenes, xanthones, anthraquinones, phenanthrenes, chrysenes, benzpyrenes, fluoranthenes, rubrenes, pyrenes, indanthrines, thioxanthen-9-ones (Thioxanthen-9-ones) and the like, and these can be used alone or as a mixture.
 増感剤の具体例としては、例えば、2-イソプロピル-9H-チオキサンテン-9-オン、4-イソプロピル-9H-チオキサンテン-9-オン、1-クロロ-4-プロポキシチオキサントン、フェノチアジン(phenothiazine)またはこれらの混合物が挙げられる。 Specific examples of the sensitizer include, for example, 2-isopropyl-9H-thioxanthen-9-one, 4-isopropyl-9H-thioxanthen-9-one, 1-chloro-4-propoxythioxanthone, and phenothiazine. Or a mixture thereof.
 増感剤の含有量は、コア層形成用組成物900中で、0.01重量%以上であるのが好ましく、0.5重量%以上であるのがより好ましく、1重量%以上であるのがさらに好ましい。なお、上限値は、5重量%以下であるのが好ましい。 The content of the sensitizer in the core layer forming composition 900 is preferably 0.01% by weight or more, more preferably 0.5% by weight or more, and 1% by weight or more. Is more preferable. In addition, it is preferable that an upper limit is 5 weight% or less.
 なお、添加剤920はこの他に、触媒前駆体、助触媒、酸化防止剤、紫外線吸収剤、光安定剤、シランカップリング剤、塗面改良剤、熱重合禁止剤、レベリング剤、界面活性剤、着色剤、保存安定剤、可塑剤、滑剤、フィラー、無機粒子、老化防止剤、濡れ性改良剤、帯電防止剤等を含んでいてもよい。 In addition, the additive 920 includes a catalyst precursor, a co-catalyst, an antioxidant, an ultraviolet absorber, a light stabilizer, a silane coupling agent, a coating surface improver, a thermal polymerization inhibitor, a leveling agent, and a surfactant. , Colorants, storage stabilizers, plasticizers, lubricants, fillers, inorganic particles, anti-aging agents, wettability improvers, antistatic agents, and the like.
 以上のようなポリマー915と添加剤920とを含有する層910は、ポリマー915中に一様に分散する添加剤920の作用により、所定の屈折率を有している。 The layer 910 containing the polymer 915 and the additive 920 as described above has a predetermined refractive index due to the action of the additive 920 dispersed uniformly in the polymer 915.
 [2]次に、開口(窓)9351が形成されたマスク(マスキング)935を用意し、このマスク935を介して、層910に対して活性放射線930を照射する(図5参照)。 [2] Next, a mask (masking) 935 in which an opening (window) 9351 is formed is prepared, and the layer 910 is irradiated with active radiation 930 through the mask 935 (see FIG. 5).
 以下では、モノマーとして、ポリマー915より低い屈折率を有するものを用いる場合を一例に説明する。 Hereinafter, the case where a monomer having a refractive index lower than that of the polymer 915 is used as an example will be described.
 すなわち、ここで示す例では、活性放射線930の照射領域925が主に側面クラッド部15となる。 That is, in the example shown here, the irradiation region 925 of the active radiation 930 is mainly the side cladding portion 15.
 ここで示す例では、マスク935には、主に、形成すべき側面クラッド部15のパターンと等価な開口(窓)9351が形成される。この開口9351は、照射する活性放射線930が透過する透過部を形成するものである。なお、コア部14や側面クラッド部15のパターンは、活性放射線930の照射に応じて形成される屈折率分布Wに基づいて決まるため、開口9351のパターンと側面クラッド部15のパターンとは完全に一致するものではなく、前記両パターンには多少のずれが生じる場合もある。 In the example shown here, an opening (window) 9351 equivalent to the pattern of the side cladding portion 15 to be formed is mainly formed in the mask 935. This opening 9351 forms a transmission part through which the active radiation 930 to be irradiated passes. In addition, since the pattern of the core part 14 and the side clad part 15 is determined based on the refractive index distribution W formed according to irradiation of the active radiation 930, the pattern of the opening 9351 and the pattern of the side clad part 15 are completely There is a case in which there is a slight deviation between the two patterns.
 マスク935は、予め形成(別途形成)されたもの(例えばプレート状のもの)でも、層910上に例えば気相成膜法や塗布法により形成されたものでもよい。 The mask 935 may be formed in advance (separately formed) (for example, plate-shaped) or may be formed on the layer 910 by, for example, a vapor deposition method or a coating method.
 マスク935として好ましいものの例としては、石英ガラスやPET基材等で作製されたフォトマスク、ステンシルマスク、気相成膜法(蒸着、スパッタリング等)により形成された金属薄膜等が挙げられるが、これらの中でもフォトマスクやステンシルマスクを用いるのが特に好ましい。微細なパターンを精度良く形成することができるとともに、ハンドリングがし易く、生産性の向上に有利であるからである。 Preferred examples of the mask 935 include a photomask made of quartz glass or a PET base material, a stencil mask, a metal thin film formed by a vapor deposition method (evaporation, sputtering, etc.), etc. Among these, it is particularly preferable to use a photomask or a stencil mask. This is because a fine pattern can be formed with high accuracy, and handling is easy, which is advantageous in improving productivity.
 また、図5においては、マスク935の開口(窓)9351は、活性放射線930の照射領域925のパターンに沿ってマスクを部分的に除去したものを示したが、前記石英ガラスやPET基材等で作製されたフォトマスクを用いる場合、該フォトマスク上に例えばクロム等の金属による遮蔽材で構成された活性放射線930の遮蔽部を設けたものを用いることもできる。このマスクでは、遮蔽部以外の部分が前記窓(透過部)となる。 Further, in FIG. 5, the opening (window) 9351 of the mask 935 is shown by partially removing the mask along the pattern of the irradiation region 925 of the active radiation 930. However, the quartz glass, the PET base material, etc. In the case of using the photomask manufactured in (1), it is also possible to use a photomask provided with a shielding portion of active radiation 930 made of a shielding material made of metal such as chromium. In this mask, the part other than the shielding part is the window (transmission part).
 用いる活性放射線930は、重合開始剤に対して光化学的な反応(変化)を生じさせ得るもの、および、ポリマー915に含まれる離脱性基を離脱させ得るものであればよく、例えば、可視光、紫外光、赤外光、レーザー光の他、電子線やX線等を用いることもできる。 The actinic radiation 930 to be used is not particularly limited as long as it can cause a photochemical reaction (change) with respect to the polymerization initiator and can release the leaving group contained in the polymer 915. For example, visible light, In addition to ultraviolet light, infrared light, and laser light, electron beams, X-rays, and the like can also be used.
 これらの中でも、活性放射線930は、重合開始剤や離脱性基の種類、増感剤を含有する場合には、増感剤の種類等によって適宜選択され、特に限定されないが、波長200~450nmの範囲にピーク波長を有するものであるのが好ましい。これにより、重合開始剤を比較的容易に活性化させるとともに、離脱性基を比較的容易に離脱させることができる。 Among these, the actinic radiation 930 is appropriately selected depending on the kind of the sensitizer when it contains a polymerization initiator, a leaving group, and a sensitizer, and is not particularly limited, but has a wavelength of 200 to 450 nm. It is preferable to have a peak wavelength in the range. As a result, the polymerization initiator can be activated relatively easily and the leaving group can be removed relatively easily.
 また、活性放射線930の照射量は、0.1~9J/cm程度であるのが好ましく、0.2~6J/cm程度であるのがより好ましく、0.2~3J/cm程度であるのがさらに好ましい。 The dose of the active radiation 930 is preferably about 0.1 to 9 J / cm 2 , more preferably about 0.2 to 6 J / cm 2, and about 0.2 to 3 J / cm 2. More preferably.
 マスク935を介して層910に活性放射線930を照射すると、照射領域925において重合開始剤が活性化される。これにより、照射領域925においてモノマーが重合する。モノマーが重合すると、照射領域925におけるモノマーの量が減少するため、それに応じて未照射領域940中のモノマーが照射領域925に拡散移動する。前述したように、ポリマー915とモノマーは、互いに屈折率差が生じるように適宜選択されるため、モノマーの拡散移動に伴って照射領域925と未照射領域940との間に屈折率差が生じる。 When the layer 910 is irradiated with the active radiation 930 through the mask 935, the polymerization initiator is activated in the irradiated region 925. Thereby, the monomer is polymerized in the irradiation region 925. When the monomer is polymerized, the amount of monomer in the irradiated region 925 decreases, and accordingly, the monomer in the unirradiated region 940 diffuses and moves to the irradiated region 925. As described above, since the polymer 915 and the monomer are appropriately selected so that a difference in refractive index is generated between them, a refractive index difference is generated between the irradiated region 925 and the non-irradiated region 940 as the monomer diffuses and moves.
 図9は、照射領域925と未照射領域940との間で屈折率差が生じる様子を説明するための図であり、層910の横断面の位置を横軸にとり、横断面の屈折率を縦軸にとったときの屈折率分布を示す図である。 FIG. 9 is a diagram for explaining a state in which a difference in refractive index occurs between the irradiated region 925 and the non-irradiated region 940. The horizontal cross-sectional position of the layer 910 is taken on the horizontal axis, and the refractive index of the horizontal cross-section is It is a figure which shows refractive index distribution when it takes on an axis | shaft.
 本実施形態では、モノマーとしてポリマー915より屈折率が小さいものを用いているため、モノマーの拡散移動に伴い、未照射領域940の屈折率が高くなるとともに、照射領域925の屈折率は低くなる(図9(a)参照)。 In this embodiment, since a monomer having a smaller refractive index than that of the polymer 915 is used as the monomer, the refractive index of the unirradiated region 940 becomes higher and the refractive index of the irradiated region 925 becomes lower as the monomer diffuses and moves ( FIG. 9 (a)).
 モノマーの拡散移動は、照射領域925においてモノマーが消費され、それに応じて形成されたモノマーの濃度勾配がきっかけとなって起こると考えられる。このため、未照射領域940全体のモノマーが一斉に照射領域925に向かうのではなく、照射領域925に近い部分から徐々に移動が始まり、これを補うように未照射領域940の中央部から外側へのモノマーの移動も生起される。その結果、図9(a)に示すように、照射領域925と未照射領域940との境界を挟んで、未照射領域940側に高屈折率部H、照射領域925側に低屈折率部Lが形成される。これら高屈折率部Hおよび低屈折率部Lは、それぞれ上述したようなモノマーの拡散移動に伴って形成されるため、必然的に滑らかな曲線で構成されることとなる。具体的には、高屈折率部Hは、例えば上に凸の略U字状となり、低屈折率部Lは、例えば下に凸の略U字状となる。 It is considered that the diffusion movement of the monomer occurs due to the consumption of the monomer in the irradiation region 925 and the concentration gradient of the monomer formed accordingly. For this reason, the monomers in the entire unirradiated region 940 do not move toward the irradiated region 925 all at once, but gradually move from a portion close to the irradiated region 925 and outward from the center of the unirradiated region 940 to compensate for this. Monomer migration also occurs. As a result, as shown in FIG. 9A, the high refractive index portion H on the non-irradiated region 940 side and the low refractive index portion L on the irradiated region 925 side across the boundary between the irradiated region 925 and the non-irradiated region 940. Is formed. Since the high refractive index portion H and the low refractive index portion L are formed in accordance with the diffusion movement of the monomer as described above, they are necessarily constituted by smooth curves. Specifically, the high refractive index portion H has, for example, a substantially U shape that is convex upward, and the low refractive index portion L has, for example, a substantially U shape that is convex downward.
 なお、上述したようなモノマーが重合してなるポリマーの屈折率は、重合前のモノマーの屈折率とほぼ同じ(屈折率差が0~0.001程度)であるため、照射領域925では、モノマーの重合が進むにつれ、モノマーの量およびモノマー由来の物質の量に応じて屈折率の低下が進むこととなる。したがって、ポリマーに対するモノマーの量等を適宜調整することにより、屈折率分布Wの形状を制御することができる。 The refractive index of the polymer obtained by polymerizing the monomers as described above is almost the same as the refractive index of the monomer before polymerization (the difference in refractive index is about 0 to 0.001). As the polymerization proceeds, the refractive index decreases according to the amount of the monomer and the amount of the substance derived from the monomer. Therefore, the shape of the refractive index distribution W can be controlled by appropriately adjusting the amount of monomer with respect to the polymer.
 一方、未照射領域940では、重合開始剤が活性化されないため、モノマーは重合しない。 On the other hand, in the unirradiated region 940, the monomer is not polymerized because the polymerization initiator is not activated.
 また、照射領域925ではモノマーの重合が進むにつれてモノマーの拡散移動の容易性が徐々に低下する。これにより、照射領域925では、未照射領域940に近いほど自ずとモノマーの濃度が高くなり、屈折率の低下量が大きくなる。その結果、照射領域925に形成される低屈折率部Lの分布形状は、左右非対称になり易く、未照射領域940側の勾配はより急峻なものとなる。これにより、本発明の光導波路が有する屈折率分布Wが形成される。 Also, in the irradiation region 925, the ease of monomer diffusion transfer gradually decreases as the polymerization of the monomer proceeds. As a result, in the irradiated region 925, the closer to the unirradiated region 940, the higher the monomer concentration, and the greater the amount of decrease in the refractive index. As a result, the distribution shape of the low refractive index portion L formed in the irradiated region 925 is likely to be asymmetrical left and right, and the gradient on the non-irradiated region 940 side becomes steeper. Thereby, the refractive index distribution W which the optical waveguide of this invention has is formed.
 また、ポリマー915は前述したように離脱性基を有しているのが好ましい。この離脱性基は活性放射線930の照射に伴って離脱し、ポリマー915の屈折率を低下させる。したがって、照射領域925に活性放射線930が照射されると、前述したモノマーの拡散移動が開始されるとともに、ポリマー915から離脱性基が離脱し、照射領域925の屈折率は照射前から低下することとなる(図9(b)参照)。 Further, the polymer 915 preferably has a leaving group as described above. This leaving group is released upon irradiation with actinic radiation 930 and decreases the refractive index of the polymer 915. Therefore, when the irradiation region 925 is irradiated with the actinic radiation 930, the above-described diffusion movement of the monomer is started, the leaving group is released from the polymer 915, and the refractive index of the irradiation region 925 decreases from before the irradiation. (See FIG. 9B).
 この屈折率の低下は、照射領域925全体で一律に生じるため、前述した高屈折率部Hと低屈折率部Lの屈折率差は、より拡大される。その結果、図9(b)に示す屈折率分布Wが得られる。なお、図9(a)における屈折率の変化と、図9(b)における屈折率の変化は、ほぼ同時に起こる。このような屈折率変化によってこの屈折率差は、さらに拡大することとなる。 This decrease in the refractive index occurs uniformly in the entire irradiation region 925, so that the refractive index difference between the high refractive index portion H and the low refractive index portion L described above is further enlarged. As a result, a refractive index distribution W shown in FIG. 9B is obtained. Note that the change in refractive index in FIG. 9A and the change in refractive index in FIG. 9B occur almost simultaneously. Such a refractive index change further expands the refractive index difference.
 本実施の形態では、エネルギー照射前のコア層の構成成分、エネルギー照射の照射量、又はエネルギー照射前のコア層の乾燥度合いなどを適切に調整することにより、エネルギー照射後のコア層の屈折率分布の形状を制御することができる。
 また、活性放射線930の照射量を調整することにより、形成される屈折率差および屈折率分布の形状を制御することができる。例えば、照射量を多くすることで、屈折率差を拡大することができる。また、光酸発生剤の含有量と照射量とを調整することにより、屈折率分布の形状を制御することができる。また、活性放射線930の照射前に層910を乾燥させてもよいが、その際の乾燥の程度を調整することにより、屈折率分布の形状を制御することもできる。例えば、乾燥の程度を大きくすることで、モノマーの拡散移動量を抑えることができる。また、乾燥温度を高めることにより、拡散量を増加させて、屈折率分布を制御することができる。
In this embodiment, the refractive index of the core layer after energy irradiation is adjusted by appropriately adjusting the components of the core layer before energy irradiation, the irradiation amount of energy irradiation, or the degree of drying of the core layer before energy irradiation. The shape of the distribution can be controlled.
Moreover, the refractive index difference and the shape of the refractive index distribution to be formed can be controlled by adjusting the dose of the active radiation 930. For example, the refractive index difference can be enlarged by increasing the irradiation amount. In addition, the shape of the refractive index distribution can be controlled by adjusting the content and irradiation amount of the photoacid generator. Further, the layer 910 may be dried before the irradiation with the active radiation 930, but the shape of the refractive index distribution can be controlled by adjusting the degree of drying at that time. For example, by increasing the degree of drying, the diffusion transfer amount of the monomer can be suppressed. Also, by increasing the drying temperature, the amount of diffusion can be increased and the refractive index distribution can be controlled.
 次に、層910に加熱処理を施す。この加熱処理において、光を照射した照射領域925中のモノマーがさらに重合する。一方で、この加熱工程において、未照射領域940のモノマーは揮発することとなる。これにより、未照射領域940ではモノマーがさらに少なくなり、屈折率が高くなってポリマー915に近い屈折率となる。 Next, the layer 910 is subjected to heat treatment. In this heat treatment, the monomer in the irradiation region 925 irradiated with light is further polymerized. On the other hand, in this heating step, the monomer in the unirradiated region 940 is volatilized. Thereby, in the unirradiated region 940, the monomer is further reduced, the refractive index is increased, and the refractive index is close to that of the polymer 915.
 この加熱処理における加熱温度は、特に限定されないが、30~180℃程度であるのが好ましく、40~160℃程度であるのがより好ましい。 The heating temperature in this heat treatment is not particularly limited, but is preferably about 30 to 180 ° C, more preferably about 40 to 160 ° C.
 また、加熱時間は、照射領域925のモノマーの重合反応がほぼ完了するように設定するのが好ましく、具体的には、0.1~2時間程度であるのが好ましく、0.1~1時間程度であるのがより好ましい。 Further, the heating time is preferably set so that the polymerization reaction of the monomer in the irradiation region 925 is almost completed. Specifically, the heating time is preferably about 0.1 to 2 hours, preferably 0.1 to 1 hour. More preferred is the degree.
 なお、この加熱処理は必要に応じて行えばよく、省略してもよい。
 以上のような原理で、屈折率分布Wを有するコア層13が得られる(図6参照)。
Note that this heat treatment may be performed as necessary and may be omitted.
Based on the above principle, the core layer 13 having the refractive index distribution W is obtained (see FIG. 6).
 屈折率分布Wにおいては、低屈折率部Lが転化した極小値Ws1、Ws2、Ws3、Ws4が存在しており(図2(b)参照)、これらの極小値の位置がコア部14と側面クラッド部15との境界に相当する。 In the refractive index distribution W, there are minimum values Ws1, Ws2, Ws3, and Ws4 converted from the low refractive index portion L (see FIG. 2B), and the positions of these minimum values are the core portion 14 and the side surface. This corresponds to the boundary with the clad portion 15.
 なお、屈折率分布Wは、コア層13中のモノマー由来の構造体濃度に一定の相関関係を有している。したがって、このモノマー由来の構造体の濃度を測定することにより、光導波路1が有する屈折率分布Wを間接的に特定することが可能である。 The refractive index distribution W has a certain correlation with the monomer-derived structure concentration in the core layer 13. Therefore, it is possible to indirectly specify the refractive index distribution W of the optical waveguide 1 by measuring the concentration of the monomer-derived structure.
 構造体の濃度の測定は、例えば、FT-IR、TOF-SIMSの線分析、面分析等を用いて行うことができる。 The concentration of the structure can be measured using, for example, FT-IR or TOF-SIMS line analysis, surface analysis, or the like.
 さらには、光導波路1の出射光の強度分布が、屈折率分布Wと一定の相関関係を有していることを利用しても、屈折率分布Wを間接的に特定することができる。 Furthermore, the refractive index distribution W can be indirectly specified even if the intensity distribution of the emitted light from the optical waveguide 1 has a certain correlation with the refractive index distribution W.
 もちろん、屈折率分布Wは、屈折ニアフィールド法、微分干渉法等により、直接特定することもできる。 Of course, the refractive index distribution W can be directly specified by a refraction near field method, a differential interference method, or the like.
 また、モノマーとしてポリマー915より高い屈折率を有するものを用いる場合には、上記と反対に、モノマーの拡散移動に伴って移動先の屈折率が高くなるため、それに応じて、照射領域925および未照射領域940を設定するようにすればよい。 In addition, when a monomer having a higher refractive index than that of the polymer 915 is used as the monomer, the refractive index of the movement destination increases with the diffusion movement of the monomer. The irradiation area 940 may be set.
 また、活性放射線930として、レーザー光のように指向性の高い光を用いる場合には、マスク935の使用を省略してもよい。 Further, when light having high directivity such as laser light is used as the active radiation 930, the use of the mask 935 may be omitted.
 [3]次に、コア層13の両面にクラッド層11、12を積層する。これにより、光導波路1が得られる。 [3] Next, the clad layers 11 and 12 are laminated on both surfaces of the core layer 13. Thereby, the optical waveguide 1 is obtained.
 これにはまず、支持基板952上に、クラッド層11(12)を形成する(図7参照)。 First, the clad layer 11 (12) is formed on the support substrate 952 (see FIG. 7).
 クラッド層11(12)の形成方法としては、クラッド材を含むワニス(クラッド層形成用組成物)を塗布し硬化(固化)させる方法、硬化性を有するモノマー組成物を塗布し硬化(固化)させる方法等、いかなる方法でもよい。 As a method for forming the clad layer 11 (12), a varnish (cladding layer forming composition) containing a clad material is applied and cured (solidified), and a curable monomer composition is applied and cured (solidified). Any method may be used.
 次に、コア層13を支持基板951から剥離し、コア層13を、クラッド層11が形成された支持基板952と、クラッド層12が形成された支持基板952とで挟持する(図8(a)参照)。 Next, the core layer 13 is peeled from the support substrate 951, and the core layer 13 is sandwiched between the support substrate 952 on which the cladding layer 11 is formed and the support substrate 952 on which the cladding layer 12 is formed (FIG. 8A )reference).
 そして、図8(a)中の矢印で示すように、クラッド層12が形成された支持基板952の上面側から加圧し、クラッド層11、12とコア層13とを圧着する。 Then, as indicated by an arrow in FIG. 8A, pressure is applied from the upper surface side of the support substrate 952 on which the cladding layer 12 is formed, and the cladding layers 11 and 12 and the core layer 13 are pressure-bonded.
 これにより、クラッド層11、12とコア層13とが接合、一体化される(図8(b)参照)。 Thereby, the clad layers 11 and 12 and the core layer 13 are joined and integrated (see FIG. 8B).
 次いで、クラッド層11、12から、それぞれ支持基板952を剥離、除去する。これにより、光導波路1が得られる。 Next, the support substrate 952 is peeled off and removed from the cladding layers 11 and 12, respectively. Thereby, the optical waveguide 1 is obtained.
 その後、必要に応じて、光導波路1の下面に支持フィルム2を積層し、上面にカバーフィルム3を積層する。 Then, if necessary, a support film 2 is laminated on the lower surface of the optical waveguide 1 and a cover film 3 is laminated on the upper surface.
 なお、コア層13は、支持基板951上ではなく、クラッド層11上に成膜するようにしてもよい。さらに、クラッド層12は、コア層13上に張り合わせるのではなく、コア層13上に材料を塗布して形成するようにしてもよい。 The core layer 13 may be formed not on the support substrate 951 but on the cladding layer 11. Further, the clad layer 12 may be formed by applying a material on the core layer 13 instead of being laminated on the core layer 13.
 (第2の製造方法)
 次に、光導波路1の第2の製造方法について説明する。
(Second manufacturing method)
Next, a second manufacturing method of the optical waveguide 1 will be described.
 以下、第2の製造方法について説明するが、前記第1の製造方法との相違点を中心に説明し、同様の事項については、その説明を省略する。 Hereinafter, the second manufacturing method will be described, but the description will focus on differences from the first manufacturing method, and description of similar matters will be omitted.
 第2の製造方法では、コア層形成用組成物900の組成が異なる以外は、第1の製造方法と同様である。 The second manufacturing method is the same as the first manufacturing method except that the composition of the core layer forming composition 900 is different.
 光導波路1の第2の製造方法は、[1]支持基板951上にコア層形成用組成物900を塗布して液状被膜を形成した後、この支持基板951をレベルテーブルに置いて液状被膜を平坦化するとともに、溶媒を蒸発(脱溶媒)させる。これにより、層910を得る。[2]次いで、層910の一部に活性放射線を照射した後、層910に加熱処理を施すことで屈折率差を生じさせ、コア部14と側面クラッド部15とを形成したコア層13を得る。[3]次いで、コア層13の両面にクラッド層11、12を積層し、光導波路1を得る。 The second method of manufacturing the optical waveguide 1 is as follows: [1] After applying the core layer forming composition 900 on the support substrate 951 to form a liquid film, the support substrate 951 is placed on a level table to form the liquid film. While flattening, the solvent is evaporated (desolvent). Thereby, the layer 910 is obtained. [2] Next, after irradiating a part of the layer 910 with actinic radiation, the layer 910 is subjected to a heat treatment to cause a refractive index difference, and the core layer 13 having the core portion 14 and the side cladding portion 15 is formed. obtain. [3] Next, the cladding layers 11 and 12 are laminated on both surfaces of the core layer 13 to obtain the optical waveguide 1.
 以下、各工程について順次説明する。
 [1]まず、コア層形成用組成物900を用意する。
Hereinafter, each process will be described sequentially.
[1] First, a core layer forming composition 900 is prepared.
 第2の製造方法で用いられるコア層形成用組成物900は、重合開始剤に代えて、触媒前駆体および助触媒を含有している。 The core layer forming composition 900 used in the second production method contains a catalyst precursor and a cocatalyst instead of the polymerization initiator.
 触媒前駆体は、モノマーの反応(重合反応、架橋反応等)を開始させ得る物質であり、光の照射により活性化した助触媒の作用により、活性化温度が変化する物質である。この活性化温度の変化により、光の照射領域925と未照射領域940との間で、モノマーの反応を開始させる温度に差が生じ、その結果、照射領域925のみにおいてモノマーを反応させることができる。 The catalyst precursor is a substance capable of initiating a monomer reaction (polymerization reaction, crosslinking reaction, etc.), and is a substance whose activation temperature changes due to the action of a promoter activated by light irradiation. Due to this change in the activation temperature, a difference occurs in the temperature at which the monomer reaction starts between the light irradiation region 925 and the non-irradiation region 940, and as a result, the monomer can be reacted only in the irradiation region 925. .
 触媒前駆体(プロカタリスト:procatalyst)としては、活性放射線の照射に伴って活性化温度が変化(上昇または低下)するものであれば、いかなる化合物を用いてもよいが、特に、活性放射線の照射に伴って活性化温度が低下するものが好ましい。これにより、比較的低温による加熱処理でコア層13(光導波路1)を形成することができ、他の層に不要な熱が加わって、光導波路1の特性(光伝送性能)が低下するのを防止することができる。 As the catalyst precursor (procatalyst), any compound may be used as long as the activation temperature changes (increases or decreases) with irradiation of actinic radiation, and in particular, irradiation with actinic radiation. Along with this, the activation temperature decreases. Thereby, the core layer 13 (optical waveguide 1) can be formed by heat treatment at a relatively low temperature, and unnecessary heat is applied to the other layers, so that the characteristics (optical transmission performance) of the optical waveguide 1 are deteriorated. Can be prevented.
 このような触媒前駆体としては、下記式(Ia)および(Ib)で表わされる化合物の少なくとも一方を含む(主とする)ものが好適に用いられる。 As such a catalyst precursor, a catalyst precursor containing (mainly) at least one of the compounds represented by the following formulas (Ia) and (Ib) is preferably used.
Figure JPOXMLDOC01-appb-C000037


 [式Ia、Ib中、それぞれ、E(R)は、第15族の中性電子ドナー配位子を表し、Eは、周期律表の第15族から選択される元素を表し、Rは、水素原子(またはその同位体の1つ)または炭化水素基を含む部位を表し、Qは、カルボキシレート、チオカルボキシレートおよびジチオカルボキシレートから選択されるアニオン配位子を表す。また、式Ib中、LBは、ルイス塩基を表し、WCAは、弱配位アニオンを表し、aは、1~3の整数を表し、bは、0~2の整数を表し、aとbとの合計は、1~3であり、pおよびrは、パラジウムカチオンと弱配位アニオンとの電荷のバランスをとる数を表す。]
Figure JPOXMLDOC01-appb-C000037


[In the formulas Ia and Ib, E (R) 3 represents a neutral electron donor ligand of group 15, respectively, E represents an element selected from group 15 of the periodic table, and R represents , Represents a moiety containing a hydrogen atom (or one of its isotopes) or a hydrocarbon group, and Q represents an anionic ligand selected from carboxylate, thiocarboxylate and dithiocarboxylate. In Formula Ib, LB represents a Lewis base, WCA represents a weakly coordinating anion, a represents an integer of 1 to 3, b represents an integer of 0 to 2, and a and b total is 1 ~ 3, p and r represent the number of balancing the charge of palladium cations and weakly coordinating anions. ]
 式Iaに従う典型的な触媒前駆体としては、Pd(OAc)(P(i-Pr)、Pd(OAc)(P(Cy)、Pd(OCCMe(P(Cy)、Pd(OAc)(P(Cp)、Pd(OCCF(P(Cy)、Pd(OCC(P(Cy)が挙げられるが、これらに限定されるわけではない。ここで、Cpは、シクロペンチル(cyclopentyl)基を表し、Cyは、シクロヘキシル基を表す。 Typical catalyst precursors according to Formula Ia include Pd (OAc) 2 (P (i-Pr) 3 ) 2 , Pd (OAc) 2 (P (Cy) 3 ) 2 , Pd (O 2 CCMe 3 ) 2 (P (Cy) 3 ) 2 , Pd (OAc) 2 (P (Cp) 3 ) 2 , Pd (O 2 CCF 3 ) 2 (P (Cy) 3 ) 2 , Pd (O 2 CC 6 H 5 ) 3 (P (Cy) 3 ) 2 may be mentioned, but is not limited thereto. Here, Cp represents a cyclopentyl group, and Cy represents a cyclohexyl group.
 また、式Ibで表される触媒前駆体としては、pおよびrが、それぞれ1および2の整数から選択される化合物が好ましい。 Also, the catalyst precursor represented by the formula Ib is preferably a compound in which p and r are selected from integers of 1 and 2, respectively.
 このような式Ibに従う典型的な触媒前駆体としては、Pd(OAc)(P(Cy)が挙げられる。ここで、Cyは、シクロヘキシル基を表し、Acは、アセチル基を表す。 Typical catalyst precursors according to such formula Ib include Pd (OAc) 2 (P (Cy) 3 ) 2 . Here, Cy represents a cyclohexyl group, and Ac represents an acetyl group.
 これらの触媒前駆体は、モノマーを効率よく反応(ノルボルネン系モノマーの場合、付加重合反応によって効率よく重合反応や架橋反応等)することができる。 These catalyst precursors can efficiently react with a monomer (in the case of a norbornene-based monomer, an efficient polymerization reaction, a crosslinking reaction, etc. by an addition polymerization reaction).
 また、活性化温度が低下した状態(活性潜在状態)において、触媒前駆体としては、その活性化温度が本来の活性化温度よりも10~80℃程度(好ましくは、10~50℃程度)低くなるものが好ましい。これにより、コア部14と側面クラッド部15との間の屈折率差を確実に生じさせることができる。 Further, in a state where the activation temperature is lowered (active latent state), the catalyst precursor has an activation temperature lower by about 10 to 80 ° C. (preferably about 10 to 50 ° C.) than the original activation temperature. Is preferred. Thereby, the refractive index difference between the core part 14 and the side clad part 15 can be produced reliably.
 かかる触媒前駆体としては、Pd(OAc)(P(i-Pr)およびPd(OAc)(P(Cy)のうちの少なくとも一方を含む(主とする)ものが好適である。 Such a catalyst precursor includes (mainly) one containing at least one of Pd (OAc) 2 (P (i-Pr) 3 ) 2 and Pd (OAc) 2 (P (Cy) 3 ) 2. Is preferred.
 助触媒は、活性放射線の照射によって活性化して、前記の触媒前駆体(プロカタリスト)の活性化温度(モノマーに反応を生じさせる温度)を変化させ得る物質である。 The co-catalyst is a substance that can be activated by irradiation with actinic radiation to change the activation temperature of the catalyst precursor (procatalyst) (the temperature at which the monomer reacts).
 この助触媒(コカタリスト:cocatalyst)としては、活性放射線の照射により、その分子構造が変化(反応または分解)して活性化する化合物であれば、いかなるものでも用いることができるが、特定波長の活性放射線の照射によって分解し、プロトンや他の陽イオン等のカチオンと、触媒前駆体の離脱性基に置換し得る弱配位アニオン(WCA)とを発生する化合物(光開始剤)を含む(主とする)ものが好適に用いられる。 As the cocatalyst (cocatalyst), any compound can be used as long as it has a molecular structure that changes (reacts or decomposes) when activated by irradiation with actinic radiation. A compound (photoinitiator) that decomposes upon irradiation with actinic radiation and generates a cation such as a proton or other cation and a weakly coordinated anion (WCA) that can be substituted with a leaving group of the catalyst precursor ( (Mainly) is preferably used.
 弱配位アニオンとしては、例えば、テトラキス(ペンタフルオロフェニル)ホウ酸イオン(FABA)、ヘキサフルオロアンチモン酸イオン(SbF )等が挙げられる。 Examples of weakly coordinating anions include tetrakis (pentafluorophenyl) borate ion (FABA ), hexafluoroantimonate ion (SbF 6 ), and the like.
 この助触媒(光酸発生剤または光塩基発生剤)としては、例えば、下記式で表されるテトラキス(ペンタフルオロフェニル)ホウ酸塩やヘキサフルオロアンチモン酸塩の他、テトラキス(ペンタフルオロフェニル)ガリウム酸塩、アルミン酸塩類、アンチモン酸塩類、他のホウ酸塩類、ガリウム酸塩類、カルボラン類、ハロカルボラン類等が挙げられる。 Examples of the cocatalyst (photoacid generator or photobase generator) include tetrakis (pentafluorophenyl) gallium in addition to tetrakis (pentafluorophenyl) borate and hexafluoroantimonate represented by the following formula: Acid salts, aluminates, antimonates, other borates, gallates, carboranes, halocarboranes and the like.
Figure JPOXMLDOC01-appb-C000038
Figure JPOXMLDOC01-appb-C000038

 このような助触媒の市販品としては、例えば、ニュージャージ州クランベリーのRhodia USA社から入手可能な「RHODORSIL(登録商標、以下同様である。) PHOTOINITIATOR 2074(CAS番号第178233-72-2番)」、日本国東京の東洋インキ製造株式会社から入手可能な「TAG-372R((ジメチル(2-(2-ナフチル)-2-オキソエチル)スルフォニウムテトラキス(ペンタフルオロフェニル)ボレート:CAS番号第193957-54-9番))、日本国東京のみどり化学株式会社から入手可能な「MPI-103(CAS番号第87709-41-9番)」、日本国東京の東洋インキ製造株式会社から入手可能な「TAG-371(CAS番号第193957-53-8番)」、日本国東京の東洋合成工業株式会社から入手可能な「TTBPS-TPFPB(トリス(4-tert-ブチルフェニル)スルフォニウムテトラキス(ペンタペンタフルオロフェニル)ボレート)」、日本国東京のみどり化学工業株式会社より入手可能な「NAI-105(CAS番号第85342-62-7番)」等が挙げられる。 Examples of such commercially available promoters include “RHODORSIL (registered trademark, the same shall apply hereinafter) PHOTOINITIATOR 2074 (CAS No. 178233-72-2) available from Rhodia USA, Cranberry, New Jersey. "TAG-372R ((dimethyl (2- (2-naphthyl) -2-oxoethyl) sulfonium tetrakis (pentafluorophenyl) borate: CAS No. 193957) available from Toyo Ink Manufacturing Co., Ltd., Tokyo, Japan" -54-9)), "MPI-103 (CAS No. 87709-41-9)" available from Midori Chemical Co., Tokyo, Japan, available from Toyo Ink Manufacturing Co., Ltd., Tokyo, Japan "TAG-371 (CAS No. 193957-53- No.), “TTBPS-TPFPB (tris (4-tert-butylphenyl) sulfonium tetrakis (pentapentafluorophenyl) borate)”, available from Toyo Gosei Co., Ltd., Tokyo, Japan “NAI-105 (CAS No. 85342-62-7)” available from Chemical Industry Co., Ltd.
 なお、助触媒として、RHODORSIL PHOTOINITIATOR 2074を用いる場合、後述する活性放射線(化学線)としては、紫外線(UV光)が好適に用いられ、紫外線の照射手段としては、水銀灯(高圧水銀ランプ)が好適に用いられる。これにより、層910に対して、300nm未満の十分なエネルギーの紫外線(活性放射線)を供給することができ、RHODORSIL PHOTOINITIATOR 2074を効率よく分解して、上記のカチオンおよびWCAを発生させることができる。 In addition, when RHODORSIL PHOTOINITIATOR 2074 is used as a co-catalyst, ultraviolet rays (UV light) are preferably used as actinic radiation (actinic radiation) described later, and a mercury lamp (high pressure mercury lamp) is suitable as an ultraviolet irradiation means. Used for. Thereby, ultraviolet rays (active radiation) having sufficient energy of less than 300 nm can be supplied to the layer 910, and RHODOLSIL PHOTOINITIATOR 2074 can be efficiently decomposed to generate the above-mentioned cation and WCA.
 [2]
 [2-1]次に、第1の製造方法と同様に、マスク935を介して層910に活性放射線930を照射する。
[2]
[2-1] Next, as in the first manufacturing method, the layer 910 is irradiated with the active radiation 930 through the mask 935.
 照射領域925,では、助触媒が活性放射線930の作用により反応(結合)または分解して、カチオン(プロトンまたは他の陽イオン)と、弱配位アニオン(WCA)とを遊離(発生)する。 In the irradiation region 925, the co-catalyst reacts (bonds) or decomposes by the action of the active radiation 930, and liberates (generates) cations (protons or other cations) and weakly coordinating anions (WCA).
 そして、これらのカチオンや弱配位アニオンは、照射領域925,内に存在する触媒前駆体の分子構造に変化(分解)を生じさせ、これを活性潜在状態(潜在的活性状態)に変化させる。 These cations and weakly coordinating anions cause a change (decomposition) in the molecular structure of the catalyst precursor existing in the irradiation region 925, and change this into an active latent state (latent active state).
 ここで、活性潜在状態(または潜在的活性状態)の触媒前駆体とは、本来の活性化温度より活性化温度が低下しているが、温度上昇がないと、すなわち、室温程度では、照射領域925内においてモノマーの反応を生じさせることができない状態にある触媒前駆体のことをいう。 Here, the catalyst precursor in the active latent state (or the latent active state) has an activation temperature lower than the original activation temperature, but there is no temperature increase, that is, at about room temperature, the irradiation region. A catalyst precursor that is in a state where a monomer reaction cannot be caused in 925.
 したがって、活性放射線930照射後においても、例えば-40℃程度で、層910を保管すれば、モノマーの反応を生じさせることなく、その状態を維持することができる。このため、活性放射線930照射後の層910を複数用意しておき、これらに一括して後述する加熱処理を施すことにより、光導波路1(たとえば、コア層13)を得ることができ、利便性が高い。 Therefore, even after irradiation with the active radiation 930, if the layer 910 is stored at, for example, about −40 ° C., the state can be maintained without causing a monomer reaction. For this reason, the optical waveguide 1 (for example, the core layer 13) can be obtained by preparing a plurality of layers 910 after the irradiation with the active radiation 930 and subjecting them to a heat treatment to be described later. Is expensive.
 また、上記のような触媒前駆体の分子構造の変化に加え、第1の製造方法と同様、ポリマー915から離脱性基が離脱する。これにより、層910の照射領域925と未照射領域940との間に屈折率差が生じる。 In addition to the change in the molecular structure of the catalyst precursor as described above, the leaving group is detached from the polymer 915 as in the first production method. This creates a refractive index difference between the irradiated region 925 and the unirradiated region 940 of the layer 910.
 [2-2]次に、層910に対して加熱処理(第1の加熱処理)を施す。
 これにより、照射領域925内では、活性潜在状態の触媒前駆体が活性化して(活性状態となって)、モノマーの反応(重合反応や架橋反応)が生じる。
[2-2] Next, the layer 910 is subjected to heat treatment (first heat treatment).
Thereby, in the irradiation region 925, the catalyst precursor in the active latent state is activated (becomes active), and monomer reaction (polymerization reaction or cross-linking reaction) occurs.
 そして、モノマーの反応が進行すると、照射領域925内におけるモノマー濃度が徐々に低下する。これにより、照射領域925と未照射領域940との間には、モノマー濃度に差が生じ、これを解消すべく、未照射領域940からモノマーが拡散移動して照射領域925に集まってくる。
 その結果、層910には、第1の製造方法と同様の屈折率分布が形成される。
As the monomer reaction proceeds, the monomer concentration in the irradiation region 925 gradually decreases. As a result, a difference in monomer concentration occurs between the irradiated region 925 and the unirradiated region 940, and the monomer diffuses from the unirradiated region 940 and collects in the irradiated region 925 in order to eliminate this.
As a result, a refractive index profile similar to that in the first manufacturing method is formed in the layer 910.
 この加熱処理における加熱温度は、特に限定されないが、30~80℃程度であるのが好ましく、40~60℃程度であるのがより好ましい。 The heating temperature in this heat treatment is not particularly limited, but is preferably about 30 to 80 ° C., more preferably about 40 to 60 ° C.
 また、加熱時間は、照射領域925内におけるモノマーの反応がほぼ完了するように設定するのが好ましく、具体的には、0.1~2時間程度であるのが好ましく、0.1~1時間程度であるのがより好ましい。 Further, the heating time is preferably set so that the reaction of the monomer in the irradiation region 925 is almost completed. Specifically, the heating time is preferably about 0.1 to 2 hours, preferably 0.1 to 1 hour. More preferred is the degree.
 次に、層910に対して第2の加熱処理を施す。
 これにより、未照射領域940および/または照射領域925,に残存する触媒前駆体を、直接または助触媒の活性化を伴って、活性化させる(活性状態とする)ことにより、各領域925、940に残存するモノマーを反応させる。
Next, second heat treatment is performed on the layer 910.
Thus, the catalyst precursor remaining in the unirradiated region 940 and / or the irradiated region 925 is activated (activated) directly or with activation of the cocatalyst, whereby each region 925, 940 is activated. The remaining monomer is reacted.
 このように、各領域925、940に残存するモノマーを反応させることにより、得られるコア部14および側面クラッド部15の安定化を図ることができる。 Thus, by reacting the monomer remaining in each of the regions 925 and 940, the core portion 14 and the side clad portion 15 obtained can be stabilized.
 この第2の加熱処理における加熱温度は、触媒前駆体または助触媒を活性化し得る温度であればよく、特に限定されないが、70~100℃程度であるのが好ましく、80~90℃程度であるのがより好ましい。 The heating temperature in the second heat treatment is not particularly limited as long as it can activate the catalyst precursor or the cocatalyst, but is preferably about 70 to 100 ° C., and is preferably about 80 to 90 ° C. Is more preferable.
 また、加熱時間は、0.5~2時間程度であるのが好ましく、0.5~1時間程度であるのがより好ましい。 Further, the heating time is preferably about 0.5 to 2 hours, and more preferably about 0.5 to 1 hour.
 次に、層910に対して第3の加熱処理を施す。
 これにより、得られるコア層13に生じる内部応力の低減や、コア部14および側面クラッド部15の更なる安定化を図ることができる。
Next, the layer 910 is subjected to a third heat treatment.
Thereby, reduction of the internal stress which arises in the core layer 13 obtained, and the further stabilization of the core part 14 and the side clad part 15 can be aimed at.
 この第3の加熱処理における加熱温度は、第2の加熱処理における加熱温度より20℃以上高く設定するのが好ましく、具体的には、90~180℃程度であるのが好ましく、120~160℃程度であるのがより好ましい。 The heating temperature in the third heat treatment is preferably set to 20 ° C. or more higher than the heating temperature in the second heat treatment, specifically, preferably about 90 to 180 ° C., and preferably 120 to 160 ° C. More preferred is the degree.
 また、加熱時間は、0.5~2時間程度であるのが好ましく、0.5~1時間程度であるのがより好ましい。
 以上の工程を経て、光導波路1(たとえばコア層13)が得られる。
The heating time is preferably about 0.5 to 2 hours, more preferably about 0.5 to 1 hour.
Through the above steps, the optical waveguide 1 (for example, the core layer 13) is obtained.
 なお、例えば、第2の加熱処理や第3の加熱処理を施す前の状態で、コア部14と側面クラッド部15との間に十分な屈折率差が得られている場合等には、第2の加熱処理以降または第3の加熱処理を省略してもよい。 For example, when a sufficient refractive index difference is obtained between the core portion 14 and the side cladding portion 15 in a state before the second heat treatment or the third heat treatment, After the second heat treatment or the third heat treatment may be omitted.
 [3]次に、第1の製造方法と同様に、コア層13の両面にクラッド層11、12を積層する。これにより、光導波路1が得られる。 [3] Next, as in the first manufacturing method, the clad layers 11 and 12 are laminated on both surfaces of the core layer 13. Thereby, the optical waveguide 1 is obtained.
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 上述したような本発明の光導波路は、光伝送効率および長期信頼性に優れたものである。このため、本発明の光導波路を備えることにより、2点間で高品質の光通信を行い得る信頼性の高い電子機器(本発明の電子機器)が得られる。
<Electronic equipment>
The optical waveguide of the present invention as described above is excellent in optical transmission efficiency and long-term reliability. For this reason, by providing the optical waveguide of the present invention, a highly reliable electronic device (electronic device of the present invention) capable of performing high-quality optical communication between two points can be obtained.
 本発明の光導波路を備える電子機器としては、例えば、携帯電話、ゲーム機、ルーター装置、WDM装置、パソコン、テレビ、ホーム・サーバー等の電子機器類が挙げられる。これらの電子機器では、いずれも、例えばLSI等の演算装置とRAM等の記憶装置との間で、大容量のデータを高速に伝送する必要がある。したがって、このような電子機器が本発明の光導波路を備えることにより、電気配線に特有なノイズ、信号劣化等の不具合が解消され、その性能の飛躍的な向上が期待できる。 Examples of the electronic device including the optical waveguide of the present invention include electronic devices such as a mobile phone, a game machine, a router device, a WDM device, a personal computer, a television, and a home server. In any of these electronic devices, it is necessary to transmit a large amount of data at high speed between an arithmetic device such as an LSI and a storage device such as a RAM. Therefore, by providing such an electronic device with the optical waveguide of the present invention, problems such as noise and signal degradation peculiar to electrical wiring are eliminated, and a dramatic improvement in performance can be expected.
 さらに、光導波路部分では、電気配線に比べて発熱量が大幅に削減される。このため、冷却に要する電力を削減することができ、電子機器全体の消費電力を削減することができる。 Furthermore, the amount of heat generated in the optical waveguide portion is greatly reduced compared to electrical wiring. For this reason, the electric power required for cooling can be reduced and the power consumption of the whole electronic device can be reduced.
 また、本発明の光導波路は、伝送損失およびパルス信号の鈍りが小さく、多チャンネル化および高密度化しても混信が生じ難い。このため、高密度かつ小面積でも信頼性の高い光導波路が得られ、この光導波路を搭載することで、電子機器の信頼性向上および小型化が図られる。 In addition, the optical waveguide of the present invention has small transmission loss and pulse signal dullness, and interference does not easily occur even when the number of channels is increased and the density is increased. For this reason, an optical waveguide having high density and a small area and high reliability can be obtained. By mounting the optical waveguide, the reliability of electronic equipment can be improved and the size can be reduced.
 以上、本発明の光導波路および電子機器について説明したが、本発明は、これに限定されるものではなく、例えば光導波路には、任意の構成物が付加されていてもよい。 The optical waveguide and the electronic device of the present invention have been described above. However, the present invention is not limited to this, and for example, an arbitrary component may be added to the optical waveguide.
 本実施の形態の電子機器は、大容量の情報を高速で通信可能な広帯域回線(ブロードバンド)に情報を伝送する装置として、ルーター装置、WDM(Wavelength Division Multiplexing)装置等の伝送装置が用いられている。これらの伝送装置内には、LSIのような演算素子、メモリーのような記憶素子等が組み合わされた信号処理基板が多数設置されており、各回線の相互接続を担っている。 In the electronic device of this embodiment, a transmission device such as a router device or a WDM (Wavelength Division Multiplexing) device is used as a device for transmitting information to a broadband line (broadband) capable of communicating a large amount of information at high speed. Yes. In these transmission apparatuses, a large number of signal processing boards in which arithmetic elements such as LSIs and storage elements such as memories are combined are installed, and each line is interconnected.
 本実施の形態の光導波路は、光欠損が少なく、かつクロストークが低減される等、光伝送特性に優れる。これにより、情報伝送の高速化に伴い、クロストークや高周波ノイズの発生、電気信号の劣化等を抑制することができる。したがって、各信号処理基板において高いスループットで情報を伝送することが可能となる。また、スーパーコンピューターや大規模サーバー等でも高いスループットで情報を伝送することが可能となる。 The optical waveguide of the present embodiment has excellent optical transmission characteristics such as few optical defects and reduced crosstalk. As a result, it is possible to suppress the occurrence of crosstalk and high-frequency noise, the deterioration of electric signals, and the like as the information transmission speeds up. Therefore, information can be transmitted with high throughput in each signal processing board. In addition, information can be transmitted with high throughput even by a super computer or a large-scale server.
 また、本発明の光導波路を製造する方法は、上記の方法に限定されず、例えば、活性放射線の照射線により分子結合を切断し、屈折率を変化させる方法(フォトブリーチ法)、コア層を形成する組成物に光異性化または光二量化可能な不飽和結合を有する光架橋性ポリマーを含有させ、これに活性放射線を照射して分子構造を変化させるとともに屈折率を変化させる方法(光異性化法・光二量化法)等の方法を用いることもできる。 In addition, the method for producing the optical waveguide of the present invention is not limited to the above-described method. For example, a method of cutting a molecular bond by irradiation with actinic radiation and changing a refractive index (photo bleach method), a core layer is formed. A method in which a photocrosslinkable polymer having an unsaturated bond capable of photoisomerization or photodimerization is contained in the composition to be formed, and this is irradiated with actinic radiation to change the molecular structure and change the refractive index (photoisomerization). Or other methods such as photodimerization method).
 これらの方法では、活性放射線の照射量に応じて屈折率の変化量を調整することができるので、目的とする屈折率分布Wの形状に応じて層の各部に照射する活性放射線の照射量を異ならせることにより、屈折率分布Wを有するコア層を形成することができる。 In these methods, since the amount of change in the refractive index can be adjusted according to the irradiation amount of the active radiation, the irradiation amount of the active radiation applied to each part of the layer according to the shape of the target refractive index distribution W is set. By making them different, a core layer having a refractive index distribution W can be formed.
 また、本発明の光導波路の厚さ方向の屈折率分布は、特に限定されず、例えばステップインデックス(SI)型分布、グレーデッドインデックス(GI)型分布、あるいは上述した屈折率分布Wと同様の分布等であってもよい。 In addition, the refractive index distribution in the thickness direction of the optical waveguide of the present invention is not particularly limited. For example, the step index (SI) type distribution, the graded index (GI) type distribution, or the same refractive index distribution W as described above. Distribution etc. may be sufficient.
 次に、本発明の実施例について説明する。
1.光導波路の製造
(実施例1)
(1)離脱性基を有するノルボルネン系樹脂の合成
 水分および酸素濃度がいずれも1ppm以下に制御され、乾燥窒素で満たされたグローブボックス中において、ヘキシルノルボルネン(HxNB)7.2g(40.1mmol)、ジフェニルメチルノルボルネンメトキシシラン12.9g(40.1mmol)を500mLバイアル瓶に計量し、脱水トルエン60gと酢酸エチル11gを加え、シリコン製のシーラーを被せて上部を密栓した。
Next, examples of the present invention will be described.
1. Production of optical waveguide (Example 1)
(1) Synthesis of norbornene-based resin having a leaving group In a glove box filled with dry nitrogen in which the water and oxygen concentrations are both controlled to 1 ppm or less, 7.2 g (40.1 mmol) of hexylnorbornene (HxNB) Then, 12.9 g (40.1 mmol) of diphenylmethylnorbornenemethoxysilane was weighed into a 500 mL vial, 60 g of dehydrated toluene and 11 g of ethyl acetate were added, and the top was sealed with a silicon sealer.
 次に、100mLバイアルビン中に下記化学式(A)で表わされるNi触媒1.56g(3.2mmol)と脱水トルエン10mLを計量し、スターラーチップを入れて密栓し、触媒を十分に撹拌して完全に溶解させた。 Next, 1.56 g (3.2 mmol) of Ni catalyst represented by the following chemical formula (A) and 10 mL of dehydrated toluene are weighed in a 100 mL vial, put a stirrer chip, tightly plugged, and thoroughly agitate the catalyst. Dissolved in.
 この下記化学式(A)で表わされるNi触媒溶液1mLをシリンジで正確に計量し、上記2種のノルボルネンを溶解させたバイアル瓶中に定量的に注入し室温で1時間撹拌したところ、著しい粘度上昇が確認された。この時点で栓を抜き、テトラヒドロフラン(THF)60gを加えて撹拌を行い、反応溶液を得た。 When 1 mL of the Ni catalyst solution represented by the following chemical formula (A) is accurately weighed with a syringe and quantitatively injected into the vial bottle in which the above two types of norbornene are dissolved and stirred at room temperature for 1 hour, a marked increase in viscosity occurs. Was confirmed. At this point, the stopper was removed, 60 g of tetrahydrofuran (THF) was added, and the mixture was stirred to obtain a reaction solution.
 100mLビーカーに無水酢酸9.5g、過酸化水素水18g(濃度30%)、イオン交換水30gを加えて撹拌し、その場で過酢酸水溶液を調製した。次にこの水溶液全量を上記反応溶液に加えて12時間撹拌してNiの還元処理を行った。 In a 100 mL beaker, 9.5 g of acetic anhydride, 18 g of hydrogen peroxide (concentration 30%) and 30 g of ion-exchanged water were added and stirred to prepare a peracetic acid aqueous solution on the spot. Next, the total amount of this aqueous solution was added to the above reaction solution and stirred for 12 hours to reduce Ni.
 次に、処理の完了した反応溶液を分液ロートに移し替え、下部の水層を除去した後、イソプロピルアルコールの30%水溶液を100mL加えて激しく撹拌を行った。静置して完全に二層分離が行われた後で水層を除去した。この水洗プロセスを合計で3回繰り返した後、油層を大過剰のアセトン中に滴下して生成したポリマーを再沈殿させ、ろ過によりろ液と分別した後、60℃に設定した真空乾燥機中で12時間加熱乾燥を行うことにより、ポリマー#1を得た。ポリマー#1の分子量分布は、GPC測定により、Mw=10万、Mn=4万であった。また、ポリマー#1中の各構造単位のモル比は、NMRによる同定により、ヘキシルノルボルネン構造単位が50mol%、ジフェニルメチルノルボルネンメトキシシラン構造単位が50mol%であった。 Next, the treated reaction solution was transferred to a separatory funnel, the lower aqueous layer was removed, and then 100 mL of a 30% aqueous solution of isopropyl alcohol was added and vigorously stirred. The aqueous layer was removed after standing and completely separating the two layers. After repeating this water washing process three times in total, the oil layer was dropped into a large excess of acetone to reprecipitate the polymer produced, separated from the filtrate by filtration, and then in a vacuum dryer set at 60 ° C. Polymer # 1 was obtained by heating and drying for 12 hours. The molecular weight distribution of the polymer # 1 was Mw = 100,000 and Mn = 40,000 by GPC measurement. The molar ratio of each structural unit in polymer # 1 was 50 mol% for the hexylnorbornene structural unit and 50 mol% for the diphenylmethylnorbornenemethoxysilane structural unit, as determined by NMR.
Figure JPOXMLDOC01-appb-C000039
Figure JPOXMLDOC01-appb-C000039

Figure JPOXMLDOC01-appb-C000040
Figure JPOXMLDOC01-appb-C000040
(2)コア層形成用組成物の製造
 精製した上記ポリマー#1 10gを100mLのガラス容器に秤量し、これにメシチレン40g、酸化防止剤Irganox1076(チバガイギー社製)0.01g、シクロヘキシルオキセタンモノマー(式(20)で示した第1モノマー、東亞合成製 CHOX、CAS#483303-25-9、分子量186、沸点125℃/1.33kPa)2g、重合開始剤(光酸発生剤) RhodorsilPhotoinitiator 2074(Rhodia社製、CAS# 178233-72-2)(2.50E-2g、酢酸エチル0.1mL中)を加え均一に溶解させた後、0.2μmのPTFEフィルターによりろ過を行い、清浄なコア層形成用組成物を得た。
(2) Production of composition for forming core layer 10 g of the purified polymer # 1 was weighed into a 100 mL glass container, and 40 g of mesitylene, 0.01 g of antioxidant Irganox 1076 (manufactured by Ciba Geigy), cyclohexyl oxetane monomer (formula) 1st monomer shown in (20), Toagosei Co., Ltd. CHOX, CAS # 483303-25-9, molecular weight 186, boiling point 125 ° C./1.33 kPa) 2 g, polymerization initiator (photoacid generator) Rhodosil Photoinitiator 2074 (Rhodia) CAS # 178233-72-2) (2.50E-2 g in 0.1 mL of ethyl acetate) was added and dissolved uniformly, and then filtered through a 0.2 μm PTFE filter to form a clean core layer. A composition was obtained.
(3)光導波路の製造
(下側クラッド層の作製)
 シリコンウエハー上に感光性ノルボルネン樹脂組成物(プロメラス社製 Avatrel2000Pワニス)をドクターブレードにより均一に塗布した後、45℃の乾燥機に15分間投入した。溶剤を完全に除去した後、塗布された全面に紫外線を80mJ照射し、乾燥機中120℃で1時間加熱して、塗膜を硬化させて、下側クラッド層を形成させた。形成された下側クラッド層は、厚みが20μmであり、無色透明であった。
(3) Production of optical waveguide (production of lower clad layer)
A photosensitive norbornene resin composition (Avatrel 2000P varnish manufactured by Promeras Co., Ltd.) was uniformly applied on a silicon wafer with a doctor blade, and then placed in a dryer at 45 ° C. for 15 minutes. After completely removing the solvent, the entire coated surface was irradiated with 80 mJ of ultraviolet light and heated in a dryer at 120 ° C. for 1 hour to cure the coating film to form a lower clad layer. The formed lower clad layer had a thickness of 20 μm and was colorless and transparent.
(コア層の作製)
 上記下側クラッド層上にコア層形成用組成物をドクターブレードによって均一に塗布した後、55℃の乾燥機に10分間投入した。溶剤を完全に除去した後、フォトマスクを圧着して紫外線を1300mJ/cmで選択的に照射した。マスクを取り去り、乾燥機中150℃で1.5時間の加熱を行った。加熱後、非常に鮮明な導波路パターンが現れているのが確認された。また、コア部および側面クラッド部の形成が確認された。なお、形成した光導波路は、コア部が8本並列に形成されたものである。また、コア部の幅を50μm、側面クラッド部の幅を80μm、コア層の厚さを50μmとした。
(Production of core layer)
The core layer-forming composition was uniformly applied on the lower clad layer with a doctor blade, and then placed in a dryer at 55 ° C. for 10 minutes. After the solvent was completely removed, a photomask was pressed and selectively irradiated with ultraviolet rays at 1300 mJ / cm 2 . The mask was removed, and heating was performed at 150 ° C. in a dryer for 1.5 hours. It was confirmed that a very clear waveguide pattern appeared after heating. Moreover, formation of the core part and the side clad part was confirmed. The formed optical waveguide has eight core portions formed in parallel. The width of the core portion was 50 μm, the width of the side cladding portion was 80 μm, and the thickness of the core layer was 50 μm.
(上側クラッド層の作製)
 ポリエーテルスルホン(PES)フィルム上に、予め乾燥厚み20μmになるようにAvatrel2000Pを積層させたドライフィルムを、上記コア層に貼り合わせ、140℃に設定された真空ラミネーターに投入して熱圧着を行った。その後、紫外線を100mJ全面照射し乾燥機中120℃で1時間加熱して、Avatrel2000Pを硬化させて、上側クラッド層を形成させ、光導波路を得た。
 なお、得られた光導波路から、長さ10cm分を切り出した。
(Preparation of upper clad layer)
A dry film in which Avatrel 2000P is laminated in advance on a polyethersulfone (PES) film so as to have a dry thickness of 20 μm is bonded to the above core layer, and put into a vacuum laminator set at 140 ° C. for thermocompression bonding. It was. Thereafter, 100 mJ was irradiated on the entire surface and heated in a dryer at 120 ° C. for 1 hour to cure Avatrel 2000P to form an upper clad layer to obtain an optical waveguide.
A length of 10 cm was cut out from the obtained optical waveguide.
(屈折率分布の評価)
 そして、得られた光導波路のコア層の横断面について、その厚さ方向の中心線に沿って干渉顕微鏡を使用して、幅方向の屈折率分布を取得した。その結果、屈折率分布は、複数の極小値および極大値を有し、屈折率が連続的に変化したものであった。
 以下、干渉顕微鏡を使用した屈折率分布の測定方法を示す。
 まず、光導波路の断面方向に光導波路をスライスして、光導波路断片を得た。光導波路の長さが200μm~300μmとなるように、スライスした。次いで、2つのスライドガラスで囲まれた空間に、屈折率1.536のオイルで充填したチャンバーを作成した。このチャンバー内の空間に、光導波路断片を挟み込んだ測定サンプルと、光導波路断片を入れていないブランクサンプルを作成した。次いで、干渉顕微鏡を使用して、光導波路断片の断面方向の干渉縞写真を得た。この後、干渉縞写真を画像解析して、屈折率分布を得た。ここで、干渉縞写真の画像解析は、次のように行った。まず、干渉顕微鏡の光路長を変更して、干渉縞の出来る場所を変えた画像データを連続的に取得した。複数の画像データから、層間方向及び層内方向の各測定ポイントの屈折率を算出した。本実施例では、測定ポイントの間隔は、2.5μmとした。
(Evaluation of refractive index distribution)
And about the cross section of the core layer of the obtained optical waveguide, the refractive index distribution of the width direction was acquired using the interference microscope along the centerline of the thickness direction. As a result, the refractive index distribution had a plurality of minimum values and maximum values, and the refractive index was continuously changed.
Hereinafter, a method for measuring a refractive index distribution using an interference microscope will be described.
First, the optical waveguide was sliced in the cross-sectional direction of the optical waveguide to obtain an optical waveguide fragment. The optical waveguide was sliced so that the length was 200 μm to 300 μm. Next, a chamber filled with oil having a refractive index of 1.536 was created in a space surrounded by two glass slides. A measurement sample in which the optical waveguide piece was sandwiched in the space in the chamber and a blank sample without the optical waveguide piece were prepared. Next, an interference fringe photograph in the cross-sectional direction of the optical waveguide fragment was obtained using an interference microscope. Thereafter, the interference fringe photograph was subjected to image analysis to obtain a refractive index distribution. Here, the image analysis of the interference fringe photograph was performed as follows. First, the optical path length of the interference microscope was changed to continuously acquire image data in which the place where the interference fringes were generated. From a plurality of image data, the refractive index at each measurement point in the interlayer direction and the in-layer direction was calculated. In this example, the interval between measurement points was 2.5 μm.
(実施例2)
 紫外線の照射量を1500mJ/cmに高めた以外は、実施例1と同様にして光導波路を得た。
(Example 2)
An optical waveguide was obtained in the same manner as in Example 1 except that the irradiation amount of ultraviolet rays was increased to 1500 mJ / cm 2 .
(実施例3)
 紫外線の照射量を2000mJ/cmに高めるとともに、ポリマーとして、ポリマー#1の各構造単位のモル比を、ヘキシルノルボルネン構造単位が40mol%、ジフェニルメチルノルボルネンメトキシシラン構造単位が60mol%に変更したものを用いるようにした以外は、実施例1と同様にして光導波路を得た。
(Example 3)
While increasing the irradiation amount of ultraviolet rays to 2000 mJ / cm 2 and changing the molar ratio of each structural unit of polymer # 1 to 40 mol% for the hexyl norbornene structural unit and 60 mol% for the diphenylmethyl norbornene methoxysilane structural unit as the polymer An optical waveguide was obtained in the same manner as in Example 1 except that was used.
(実施例4)
 紫外線の照射量を500mJ/cmに減らすとともに、ポリマーとして、ポリマー#1の各構造単位のモル比を、ヘキシルノルボルネン構造単位が45mol%、ジフェニルメチルノルボルネンメトキシシラン構造単位が55mol%に変更したものを用いるようにした以外は、実施例1と同様にして光導波路を得た。
(Example 4)
The amount of UV irradiation was reduced to 500 mJ / cm 2 and the polymer molar ratio of each structural unit of polymer # 1 was changed to 45 mol% for hexylnorbornene structural units and 55 mol% for diphenylmethylnorbornenemethoxysilane structural units. An optical waveguide was obtained in the same manner as in Example 1 except that was used.
(実施例5)
 ポリマーとして、ポリマー#1の各構造単位のモル比を、ヘキシルノルボルネン構造単位が30mol%、ジフェニルメチルノルボルネンメトキシシラン構造単位が70mol%に変更したものを用いるようにした以外は、実施例1と同様にして光導波路を得た。
(Example 5)
Except that the molar ratio of each structural unit of polymer # 1 was changed to 30 mol% for the hexylnorbornene structural unit and 70 mol% for the diphenylmethylnorbornenemethoxysilane structural unit as the polymer, the same as in Example 1. Thus, an optical waveguide was obtained.
(実施例8)
 紫外線の照射量を300mJ/cmに減らすとともに、ポリマーとして、ポリマー#1の各構造単位のモル比を、ヘキシルノルボルネン構造単位が40mol%、ジフェニルメチルノルボルネンメトキシシラン構造単位が60mol%に変更したものを用いるようにした以外は、実施例1と同様にして光導波路を得た。
(Example 8)
In addition to reducing the amount of UV irradiation to 300 mJ / cm 2 and changing the molar ratio of each structural unit of polymer # 1 to 40 mol% for the hexylnorbornene structural unit and 60 mol% for the diphenylmethylnorbornenemethoxysilane structural unit as the polymer An optical waveguide was obtained in the same manner as in Example 1 except that was used.
(実施例9)
 紫外線の照射量を500mJ/cmに減らすとともに、ポリマーとして、ポリマー#1の各構造単位のモル比を、ヘキシルノルボルネン構造単位が30mol%、ジフェニルメチルノルボルネンメトキシシラン構造単位が70mol%に変更したものを用いるようにした以外は、実施例1と同様にして光導波路を得た。
Example 9
In addition to reducing the amount of UV irradiation to 500 mJ / cm 2 , the polymer has a molar ratio of each structural unit of polymer # 1 changed to 30 mol% for hexylnorbornene structural units and 70 mol% for diphenylmethylnorbornenemethoxysilane structural units. An optical waveguide was obtained in the same manner as in Example 1 except that was used.
(実施例10)
 紫外線の照射量を100mJ/cmに減らすとともに、ポリマーとして、ポリマー#1の各構造単位のモル比を、ヘキシルノルボルネン構造単位が60mol%、ジフェニルメチルノルボルネンメトキシシラン構造単位が40mol%に変更したものを用いるようにした以外は、実施例1と同様にして光導波路を得た。
(Example 10)
In addition to reducing the irradiation amount of ultraviolet rays to 100 mJ / cm 2 and changing the molar ratio of each structural unit of polymer # 1 to 60 mol% for the hexyl norbornene structural unit and 40 mol% for the diphenylmethylnorbornene methoxysilane structural unit as the polymer An optical waveguide was obtained in the same manner as in Example 1 except that was used.
(実施例11)
 紫外線の照射量を1500mJ/cmに高めるとともに、ポリマーとして、ポリマー#1の各構造単位のモル比を、ヘキシルノルボルネン構造単位が10mol%、ジフェニルメチルノルボルネンメトキシシラン構造単位が90mol%に変更したものを用いるようにした以外は、実施例1と同様にして光導波路を得た。
(Example 11)
In addition to increasing the irradiation amount of ultraviolet rays to 1500 mJ / cm 2 , as a polymer, the molar ratio of each structural unit of polymer # 1 was changed to 10 mol% for the hexyl norbornene structural unit and 90 mol% for the diphenylmethyl norbornene methoxysilane structural unit. An optical waveguide was obtained in the same manner as in Example 1 except that was used.
(実施例12)
 紫外線の照射量を3000mJ/cmに高めるとともに、ポリマーとして、ポリマー#1の各構造単位のモル比を、ヘキシルノルボルネン構造単位が5mol%、ジフェニルメチルノルボルネンメトキシシラン構造単位が95mol%に変更したものを用いるようにした以外は、実施例1と同様にして光導波路を得た。
(Example 12)
In addition to increasing the irradiation amount of ultraviolet rays to 3000 mJ / cm 2 , as a polymer, the molar ratio of each structural unit of polymer # 1 was changed to 5 mol% for the hexylnorbornene structural unit and 95 mol% for the diphenylmethylnorbornenemethoxysilane structural unit. An optical waveguide was obtained in the same manner as in Example 1 except that was used.
(実施例13)
 コア層形成用組成物として、以下に示す方法で製造されたものを用いるようにした以外は、実施例1と同様にして光導波路を得た。
(Example 13)
An optical waveguide was obtained in the same manner as in Example 1 except that the core layer forming composition was manufactured by the method shown below.
 精製した上記ポリマー#1 10gを100mLのガラス容器に秤量し、これにメシチレン40g、酸化防止剤Irganox1076(チバガイギー社製)0.01g、2官能オキセタンモノマー(式(15)で示したもの、東亞合成製、DOX、CAS#18934-00-4、分子量214、沸点119℃/0.67kPa)2g、光酸発生剤 RhodorsilPhotoinitiator 2074(Rhodia社製、CAS# 178233-72-2)(1.36E-2g、酢酸エチル0.1mL中)を加え均一に溶解させた後、0.2μmのPTFEフィルターによりろ過を行い、清浄なコア層形成用組成物を得た。 10 g of the purified polymer # 1 was weighed into a 100 mL glass container, and 40 g of mesitylene, 0.01 g of antioxidant Irganox 1076 (manufactured by Ciba Geigy), bifunctional oxetane monomer (shown by the formula (15), Toagosei Co., Ltd.) Manufactured by DOX, CAS # 18934-00-4, molecular weight 214, boiling point 119 ° C./0.67 kPa) 2 g, photoacid generator Rhodosil Photoinitiator 2074 (manufactured by Rhodia, CAS # 178233-72-2) (1.36E-2g) In 0.1 mL of ethyl acetate) and uniformly dissolved, followed by filtration with a 0.2 μm PTFE filter to obtain a clean composition for forming a core layer.
(実施例14)
 コア層形成用組成物として、以下に示す方法で製造されたものを用いるようにした以外は、実施例1と同様にして光導波路を得た。
(Example 14)
An optical waveguide was obtained in the same manner as in Example 1 except that the core layer forming composition was manufactured by the method shown below.
 精製した上記ポリマー#1 10gを100mLのガラス容器に秤量し、これにメシチレン40g、酸化防止剤Irganox1076(チバガイギー社製)0.01g、脂環式エポキシモノマー(式(37)で示したもの、ダイセル化学製、セロキサイド2021P、CAS#2386-87-0、分子量252、沸点188℃/4hPa)2g、光酸発生剤 RhodorsilPhotoinitiator 2074(Rhodia社製、CAS# 178233-72-2)(1.36E-2g、酢酸エチル0.1mL中)を加え均一に溶解させた後、0.2μmのPTFEフィルターによりろ過を行い、清浄なコア層形成用組成物を得た。 10 g of the purified polymer # 1 was weighed into a 100 mL glass container, and 40 g of mesitylene, 0.01 g of an antioxidant Irganox 1076 (manufactured by Ciba Geigy), an alicyclic epoxy monomer (shown by the formula (37), Daicel) Chemical, Celoxide 2021P, CAS # 2386-87-0, molecular weight 252, boiling point 188 ° C./4 hPa) 2 g, photoacid generator Rhodorsil Photoinitiator 2074 (Rhodia, CAS # 178233-72-2) (1.36E-2g) In 0.1 mL of ethyl acetate) and uniformly dissolved, followed by filtration with a 0.2 μm PTFE filter to obtain a clean composition for forming a core layer.
(実施例15)
 コア層形成用組成物として、以下に示す方法で製造されたものを用いるようにした以外は、実施例1と同様にして光導波路を得た。
(Example 15)
An optical waveguide was obtained in the same manner as in Example 1 except that the core layer forming composition was manufactured by the method shown below.
 精製した上記ポリマー#1 10gを100mLのガラス容器に秤量し、これにメシチレン40g、酸化防止剤Irganox1076(チバガイギー社製)0.01g、シクロヘキシルオキセタンモノマー(式20で示したもの、東亞合成製 CHOX)1g、脂環式エポキシモノマー(ダイセル化学製、セロキサイド2021P)1g、光酸発生剤 RhodorsilPhotoinitiator 2074(Rhodia社製、CAS# 178233-72-2)(1.36E-2g、酢酸エチル0.1mL中)を加え均一に溶解させた後、0.2μmのPTFEフィルターによりろ過を行い、清浄なコア層形成用組成物を得た。 10 g of the purified polymer # 1 is weighed into a 100 mL glass container, 40 g of mesitylene, 0.01 g of an antioxidant Irganox 1076 (manufactured by Ciba Geigy), cyclohexyl oxetane monomer (shown by Formula 20, CHOX manufactured by Toagosei Co., Ltd.) 1 g, 1 g of alicyclic epoxy monomer (manufactured by Daicel Chemical Industries, Celoxide 2021P), photoacid generator Rhodorsil Photoinitiator 2074 (manufactured by Rhodia, CAS # 178233-72-2) (1.36E-2 g in 0.1 mL of ethyl acetate) And then uniformly dissolved, followed by filtration with a 0.2 μm PTFE filter to obtain a clean composition for forming a core layer.
(実施例16)
 ポリマーとして、以下に示す方法で合成されたものを用いるようにした以外は、実施例1と同様にして光導波路を得た。
(Example 16)
An optical waveguide was obtained in the same manner as in Example 1 except that the polymer synthesized by the method shown below was used.
 まず、ジフェニルメチルノルボルネンメトキシシラン12.9g(40.1mmol)に代えて、フェニルジメチルノルボルネンメトキシシラン10.4g(40.1mmol)を用いた以外は実施例1と同様にしてポリマーを合成した。得られたポリマーの構造単位を下記式(103)に示す。このポリマーの分子量は、GPC測定により、Mw=11万、Mn=5万であった。また、各構造単位のモル比は、NMRによる同定により、ヘキシルノルボルネン構造単位が50mol%、フェニルジメチルノルボルネンメトキシシラン構造単位が50mol%であった。 First, a polymer was synthesized in the same manner as in Example 1 except that 10.4 g (40.1 mmol) of phenyldimethylnorbornenemethoxysilane was used instead of 12.9 g (40.1 mmol) of diphenylmethylnorbornenemethoxysilane. The structural unit of the obtained polymer is shown in the following formula (103). The molecular weight of this polymer was Mw = 110,000 and Mn = 50,000 by GPC measurement. The molar ratio of each structural unit was 50 mol% for the hexylnorbornene structural unit and 50 mol% for the phenyldimethylnorbornenemethoxysilane structural unit, as determined by NMR.
(実施例17)
 コア層形成用組成物として、以下に示す方法で製造されたものを用いた点、及び下側クラッド層上にコア層形成用組成物をドクターブレードによって均一に塗布した後、60℃の乾燥機に10分間投入した点以外は、実施例1と同様にして光導波路を得た。
(Example 17)
The core layer-forming composition was prepared by the following method, and the core layer-forming composition was uniformly applied on the lower clad layer with a doctor blade, and then a dryer at 60 ° C. An optical waveguide was obtained in the same manner as in Example 1 except that the optical waveguide was added for 10 minutes.
 精製した上記ポリマー#1 10gを100mLのガラス容器に秤量し、これにメシチレン40g、酸化防止剤Irganox1076(チバガイギー社製)0.01g、シクロヘキシルオキセタンモノマー(式(20)で示したもの、東亞合成製 CHOX)2g光酸発生剤 RhodorsilPhotoinitiator 2074(Rhodia社製、CAS# 178233-72-2)(2.72E-2g、酢酸エチル0.1mL中)を加え均一に溶解させた後、0.2μmのPTFEフィルターによりろ過を行い、清浄なコア層形成用組成物を得た。 10 g of the purified polymer # 1 was weighed into a 100 mL glass container, 40 g of mesitylene, 0.01 g of an antioxidant Irganox 1076 (manufactured by Ciba Geigy), cyclohexyloxetane monomer (shown by the formula (20), manufactured by Toagosei Co., Ltd. (CHOX) 2 g photoacid generator Rhodorsil Photoinitiator 2074 (manufactured by Rhodia, CAS # 178233-72-2) (2.72E-2 g in 0.1 mL of ethyl acetate) was added and uniformly dissolved, and then 0.2 μm of PTFE was added. Filtration through a filter gave a clean core layer forming composition.
(実施例18)
 紫外線の照射量を500mJ/cmに減らした以外は、実施例15と同様にして光導波路を得た。
(Example 18)
An optical waveguide was obtained in the same manner as in Example 15 except that the irradiation amount of ultraviolet rays was reduced to 500 mJ / cm 2 .
Figure JPOXMLDOC01-appb-C000041
Figure JPOXMLDOC01-appb-C000041

(比較例1)
 下記のようにした以外は、実施例1と同様にして光導波路を得た。
(Comparative Example 1)
An optical waveguide was obtained in the same manner as in Example 1 except for the following.
 まず、下側クラッド層を形成後、その上にポリマー#1からシクロヘキシルオキセタンモノマーを省略してなるコア層形成用組成物を塗布し、露光、加熱してコア層を得た。
 その後、上側クラッド層を形成することにより、光導波路を得た。
First, after forming a lower clad layer, a core layer forming composition in which the cyclohexyloxetane monomer was omitted from polymer # 1 was applied thereon, and then exposed and heated to obtain a core layer.
Thereafter, an optical waveguide was obtained by forming an upper cladding layer.
 なお、得られた光導波路では、コア部の屈折率がほぼ一定であり、側面クラッド部の屈折率もほぼ一定であった。すなわち、得られた光導波路のコア層の屈折率分布は、いわゆるステップインデックス型になっていた。 In the obtained optical waveguide, the refractive index of the core part was almost constant, and the refractive index of the side cladding part was also almost constant. That is, the refractive index distribution of the core layer of the obtained optical waveguide was a so-called step index type.
(比較例2)
 露光の際に、露光量が連続的に変化するよう、透過率が連続的に変化したフォトマスクを用いて露光するようにした以外は、比較例1と同様にして光導波路を得た。
(Comparative Example 2)
An optical waveguide was obtained in the same manner as in Comparative Example 1 except that exposure was performed using a photomask whose transmittance was continuously changed so that the exposure amount was continuously changed during exposure.
 なお、得られた光導波路では、側面クラッド部の屈折率がほぼ一定である一方、コア部の屈折率は中央部から周辺に向かって連続的に低下していた。すなわち、得られた光導波路のコア層の屈折率分布は、いわゆるグレーテッドインデックス型になっていた。 In the obtained optical waveguide, the refractive index of the side cladding portion was almost constant, while the refractive index of the core portion continuously decreased from the central portion toward the periphery. That is, the refractive index distribution of the core layer of the obtained optical waveguide is a so-called graded index type.
(比較例3)
 露光の際に、露光量が連続的に変化するよう、透過率が連続的に変化したフォトマスクを用いて露光するようにした以外は、比較例1と同様にして光導波路を得た。
(Comparative Example 3)
An optical waveguide was obtained in the same manner as in Comparative Example 1 except that exposure was performed using a photomask whose transmittance was continuously changed so that the exposure amount was continuously changed during exposure.
 なお、得られた光導波路では、屈折率分布が複数の極小値および極大値を有し、コア部の屈折率は中央部から周辺に向かって連続的に低下し、極小値に至っており、一方、側面クラッド部では極小値から離れるにつれて屈折率が連続的に増加していた。なお、極小値では、屈折率分布の形状が略V字状をなしており、その近傍における屈折率の変化は不連続的であった。 In the obtained optical waveguide, the refractive index distribution has a plurality of minimum values and maximum values, and the refractive index of the core portion continuously decreases from the central portion toward the periphery, reaching a minimum value. In the side cladding portion, the refractive index continuously increased as the distance from the minimum value increased. At the minimum value, the shape of the refractive index distribution was substantially V-shaped, and the change in the refractive index in the vicinity thereof was discontinuous.
2.評価
2.1 光導波路の屈折率分布
 得られた光導波路のコア層の横断面について、その厚さ方向の中心線に沿って、干渉顕微鏡を用い、上記方法と同様にして屈折率分布を得た。なお、得られた屈折率分布は、コア部ごとに同様の屈折率分布パターンが繰り返されているので、得られた屈折率分布から一部を切り出し、これを屈折率分布Wとした。屈折率分布Wの形状は、図2に示すような、4つの極小値と5つの極大値とが交互に並んだ形状であった。
2. Evaluation 2.1 Refractive Index Distribution of Optical Waveguide With respect to the cross section of the core layer of the obtained optical waveguide, a refractive index distribution was obtained in the same manner as described above using an interference microscope along the center line in the thickness direction. It was. In addition, since the obtained refractive index distribution has the same refractive index distribution pattern repeated for every core part, a part was cut out from the obtained refractive index distribution, and this was made into the refractive index distribution W. The shape of the refractive index distribution W was a shape in which four minimum values and five maximum values were alternately arranged as shown in FIG.
 そして、得られた屈折率分布Wから、各極小値Ws1、Ws2、Ws3、Ws4および各極大値Wm1、Wm2、Wm3、Wm4、Wm5を求めるとともに、クラッド部における平均屈折率WAを求めた。 Then, from the obtained refractive index distribution W, each local minimum value Ws1, Ws2, Ws3, Ws4 and each local maximum value Wm1, Wm2, Wm3, Wm4, Wm5 were obtained, and an average refractive index WA in the cladding part was obtained.
 また、屈折率分布Wにおいて、コア部に形成された極大値Wm2、Wm4近傍における屈折率が、平均屈折率WA以上の値を有している部分の幅a[μm]、および、各極小値Ws1、Ws2、Ws3、Ws4近傍における屈折率が、平均屈折率WA未満の値を有している部分の幅b[μm]をそれぞれ測定した。 In the refractive index distribution W, the width a [μm] of the portion where the refractive index in the vicinity of the maximum values Wm2 and Wm4 formed in the core portion has a value equal to or greater than the average refractive index WA, and each minimum value The width b [μm] of the portion where the refractive index in the vicinity of Ws1, Ws2, Ws3, and Ws4 has a value less than the average refractive index WA was measured.
 その結果、各実施例で得られた光導波路の屈折率分布Wは、それぞれ、その全体において屈折率の変化が連続的であった。また、実施例において、第1クラッド層、クラッド部、クラッド層に亘る屈折率分布Pは、SI型であった。 As a result, the refractive index distribution W of the optical waveguide obtained in each example had a continuous change in the refractive index as a whole. Further, in the examples, the refractive index distribution P over the first cladding layer, the cladding portion, and the cladding layer was SI type.
 一方、比較例1で得られた光導波路の屈折率分布は、上述したように、ステップインデックス型であった。 On the other hand, the refractive index distribution of the optical waveguide obtained in Comparative Example 1 was a step index type as described above.
 また、比較例2で得られた光導波路の屈折率分布は、上述したように、グレーテッドインデックス型であった。 The refractive index distribution of the optical waveguide obtained in Comparative Example 2 was a graded index type as described above.
 さらに、比較例3で得られた光導波路の屈折率分布は、コア部と側面クラッド部との間で屈折率が不連続的に変化しているものであった。 Furthermore, in the refractive index distribution of the optical waveguide obtained in Comparative Example 3, the refractive index was discontinuously changed between the core portion and the side cladding portion.
2.2 光導波路の伝送損失
 850nmVCSEL(面発光レーザー)より発せられた光を50μmφの光ファイバーを経由して得られた光導波路に導入し、200μmφの光ファイバーで受光を行って光の強度を測定した。なお、測定にはカットバック法を採用した。光導波路の長手方向を横軸にとり、挿入損失を縦軸にとって測定値をプロットしたところ、測定値は直線上に並んだ。そこで、その直線の傾きから伝送損失を算出した。
2.2 Transmission loss of optical waveguide Light emitted from an 850 nm VCSEL (surface emitting laser) was introduced into an optical waveguide obtained via an optical fiber of 50 μmφ, and received by a 200 μmφ optical fiber to measure the light intensity. . The cutback method was used for the measurement. When the measured values were plotted with the longitudinal direction of the optical waveguide taken on the horizontal axis and the insertion loss on the vertical axis, the measured values were arranged on a straight line. Therefore, the transmission loss was calculated from the slope of the straight line.
2.3 パルス信号の波形の保持性
 得られた光導波路に対して、レーザーパルス光源からパルス幅1nsのパルス信号を入射し、出射光のパルス幅を測定した。
2.3 Retention of pulse signal waveform A pulse signal having a pulse width of 1 ns was incident on the obtained optical waveguide from a laser pulse light source, and the pulse width of the emitted light was measured.
 そして、測定した出射光のパルス幅について、比較例1で得られた光導波路(ステップインデックス型の光導波路)の測定値を1としたときの相対値を算出し、これを以下の評価基準にしたがって評価した。 And the relative value when the measured value of the optical waveguide (step index type optical waveguide) obtained in Comparative Example 1 is set to 1 is calculated for the measured pulse width of the emitted light, and this is used as the following evaluation criteria. Therefore, it was evaluated.
 <パルス幅の評価基準>
 ◎:パルス幅の相対値が0.5未満である
 ○:パルス幅の相対値が0.5以上0.8未満である
 △:パルス幅の相対値が0.8以上1未満である
 ×:パルス幅の相対値が1以上である
 以上、2.2および2.3の評価結果を表1に示す。
<Evaluation criteria for pulse width>
A: Relative value of pulse width is less than 0.5 B: Relative value of pulse width is 0.5 or more and less than 0.8 Δ: Relative value of pulse width is 0.8 or more and less than 1 ×: The relative value of the pulse width is 1 or more. Table 1 shows the evaluation results of 2.2 and 2.3.
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000001
 表1から明らかなように、各実施例で得られた光導波路では、各比較例で得られた光導波路に比べ、伝送損失およびパルス信号の鈍りがそれぞれ抑えられていることが認められた。また、実施例のクラッド部における伝送損失およびパルス信号の鈍りは、第1クラッド層、クラッド部、及び第2クラッド層がすべて均一の屈折率を有する場合のクラッド部と比較して、それぞれ抑えられていることが分かった。 As is apparent from Table 1, it was confirmed that the transmission loss and the blunting of the pulse signal were suppressed in the optical waveguides obtained in the respective examples as compared with the optical waveguides obtained in the respective comparative examples. In addition, the transmission loss and the blunting of the pulse signal in the clad part of the example are respectively suppressed as compared with the clad part in which the first clad layer, the clad part, and the second clad layer all have a uniform refractive index. I found out.
2.4 光導波路の出射光の強度分布
 得られた光導波路の出射側端面について、8つのコア部のうちの一方に光を入射したときの出射光の強度分布を測定した。
2.4 Intensity Distribution of Emitted Light of Optical Waveguide The intensity distribution of the emitted light when light was incident on one of the eight core portions was measured on the end face of the obtained optical waveguide.
 なお、出射光の強度分布の測定は、以下のようにして行った。
 図10は、光導波路の出射側端面における出射光の強度分布を測定する方法を説明するための図である。
The intensity distribution of the emitted light was measured as follows.
FIG. 10 is a diagram for explaining a method of measuring the intensity distribution of outgoing light on the outgoing side end face of the optical waveguide.
 図10に示す方法では、まず、測定対象の光導波路1の入射側端面1aのコア部14の1つに対向するように、直径50μmの入射側光ファイバー21を配置する。この入射側光ファイバー21は、光導波路1に光を入射するための発光素子(図示せず)に接続されており、その光軸と、コア部14の光軸とが一致するように配置されている。 In the method shown in FIG. 10, first, an incident-side optical fiber 21 having a diameter of 50 μm is disposed so as to face one of the core portions 14 of the incident-side end face 1a of the optical waveguide 1 to be measured. The incident-side optical fiber 21 is connected to a light emitting element (not shown) for making light incident on the optical waveguide 1, and is arranged so that the optical axis thereof coincides with the optical axis of the core portion 14. Yes.
 一方、光導波路1の出射側端面1bには、これに対向するように直径62.5μmの出射側光ファイバー22を配置した。この出射側光ファイバー22は、光導波路1から出射した出射光を受光するための受光素子(図示せず)に接続されており、その光軸は、光導波路1のコア層の厚さ方向の中心線に合わせてある。そして、出射側光ファイバー22は、出射側端面1bとの離間距離を一定に維持しつつ、この中心線を含む面内を走査し得るよう構成されている。 On the other hand, on the output side end face 1b of the optical waveguide 1, an output side optical fiber 22 having a diameter of 62.5 μm was disposed so as to face the end surface 1b. The emission-side optical fiber 22 is connected to a light receiving element (not shown) for receiving the emitted light emitted from the optical waveguide 1, and its optical axis is the center in the thickness direction of the core layer of the optical waveguide 1. It is aligned with the line. The exit-side optical fiber 22 is configured to be able to scan the plane including this center line while maintaining a constant distance from the exit-side end face 1b.
 そして、入射側光ファイバー21からコア部の1つに光を入射しつつ、出射側光ファイバー22を走査させる。そして、出射側光ファイバー22の位置に対して受光素子で測定された出射光の強度を測定することにより、出射側端面1bの位置に対する出射光の強度分布を取得することができる。 Then, the light exiting optical fiber 22 is scanned while light is incident on one of the core portions from the light incident side optical fiber 21. Then, by measuring the intensity of the emitted light measured by the light receiving element with respect to the position of the emission side optical fiber 22, the intensity distribution of the emitted light with respect to the position of the emission side end face 1b can be obtained.
 以上のようにして測定した出射光の強度分布を図11に示す。なお、図11には、実施例1、比較例1および比較例2で得られた光導波路で測定された出射光の強度分布を代表に示す。 FIG. 11 shows the intensity distribution of the emitted light measured as described above. In addition, in FIG. 11, the intensity distribution of the emitted light measured by the optical waveguide obtained in Example 1, Comparative Example 1, and Comparative Example 2 is shown as a representative.
 図11から明らかなように、実施例1で得られた光導波路では、いずれもクロストークが十分に抑えられていることが認められた。また、実施例1で得られた光導波路では、光を入射したコア部14(図11の中央のコア部14)に隣り合うコア部14における出射光の強度は、そのコア部14に隣接した、前記光を入射したコア部14とは反対側に位置する側面クラッド部15における出射光の強度より小さいことが認められた。これは、実施例1で得られた光導波路では、側面クラッド部15に、コア部14より小さい値の極大値を有しており、かつ、屈折率分布が連続的に変化しているため、従来であれば隣り合うコア部14に漏れ出て「クロストーク」になってしまう光が、側面クラッド部15に集まり、結果的にクロストークの発生を防止しているためであると推察される。したがって、実施例1で得られた光導波路では、チャンネル間での混信を防止することができる。 As is clear from FIG. 11, it was confirmed that the crosstalk was sufficiently suppressed in any of the optical waveguides obtained in Example 1. Further, in the optical waveguide obtained in Example 1, the intensity of the emitted light in the core part 14 adjacent to the core part 14 (the central core part 14 in FIG. 11) where light is incident is adjacent to the core part 14. It was confirmed that the intensity of the emitted light was smaller than that of the side clad portion 15 located on the side opposite to the core portion 14 where the light was incident. This is because, in the optical waveguide obtained in Example 1, the side cladding portion 15 has a maximum value smaller than the core portion 14 and the refractive index distribution continuously changes. Conventionally, it is assumed that light that leaks into the adjacent core portion 14 and becomes “crosstalk” gathers in the side cladding portion 15 and consequently prevents the occurrence of crosstalk. . Therefore, in the optical waveguide obtained in Example 1, it is possible to prevent interference between channels.
 なお、実施例1で得られた光導波路では、出射光の一部が側面クラッド部15に集まっている様子が観測されたが、通常、光導波路に接続される受光素子は、各コア部14の出射側端面に対向するように接続され、側面クラッド部15には接続されない。よって、側面クラッド部15に光が集まったとしても、クロストークとはならず、混信が抑制される。 In the optical waveguide obtained in Example 1, it was observed that a part of the emitted light was collected in the side clad portion 15. Usually, the light receiving elements connected to the optical waveguide are each core portion 14. Are connected so as to face the end surface of the light-emitting side, and are not connected to the side clad portion 15. Therefore, even if light gathers in the side cladding part 15, crosstalk does not occur and interference is suppressed.
 また、図示していないが、他の実施例で得られた光導波路でも、実施例1と同様、クロストークが十分に抑えられていた。 Although not shown, the crosstalk was sufficiently suppressed in the optical waveguides obtained in other examples as in Example 1.
 一方、比較例1、2で得られた光導波路では、光を入射したコア部14に隣り合うコア部14において、出射光の強度分布の極大値が位置しており、漏れ出た光が観測された(クロストーク)。 On the other hand, in the optical waveguides obtained in Comparative Examples 1 and 2, the maximum value of the intensity distribution of the emitted light is located in the core portion 14 adjacent to the core portion 14 where the light is incident, and the leaked light is observed. (Crosstalk).
 また、図示していないが、比較例3で得られた光導波路でも、クロストークが観測された。 Although not shown, crosstalk was also observed in the optical waveguide obtained in Comparative Example 3.
(3.その他の実施例)
3.1光導波路の製造
(実施例A)
(1)クラッド溶液の製造
 ダイセル化学工業(株)製セロキサイド2081 20g、(株)ADEKA社製アデカオプトマーSP-170 0.6g、メチルイソブチルケトン80gを撹拌混合し、0.2μm孔径のPTFEフィルターでろ過して清浄で無色透明なクラッド溶液E1を得た。
(3. Other Examples)
3.1 Production of optical waveguide (Example A)
(1) Manufacture of clad solution 20 g of Celoxide 2081 manufactured by Daicel Chemical Industries, Ltd., 0.6 g of Adekaoptomer SP-170 manufactured by ADEKA Co., Ltd., and 80 g of methyl isobutyl ketone were mixed with stirring, and a PTFE filter having a 0.2 μm pore size. To obtain a clean, colorless and transparent clad solution E1.
(2)感光性樹脂組成物の製造
 新日鐵化学(株)製YP-50S 20gと、ダイセル化学工業(株)製セロキサイド2021P 5gと、(株)ADEKA製アデカオプトマーSP-170 0.2gと、をメチルイソブチルケトン80g中に投入し撹拌溶解し、0.2μm孔径のPTFEフィルターでろ過して清浄で無色透明な感光性樹脂組成物F1を得た。
(2) Production of photosensitive resin composition 20 g of YP-50S manufactured by Nippon Steel Chemical Co., Ltd., 5 g of Celoxide 2021P manufactured by Daicel Chemical Industries, Ltd., and 0.2 g of Adekaoptomer SP-170 manufactured by ADEKA Corporation Were added to 80 g of methyl isobutyl ketone, dissolved by stirring, and filtered through a PTFE filter having a pore size of 0.2 μm to obtain a clean, colorless and transparent photosensitive resin composition F1.
(3)下層クラッドの作製
 厚み25μmのポリイミドフィルム上に前記クラッド溶液E1をドクターブレードにより均一に塗布した後、50℃の乾燥機に10分間投入した。溶媒を完全に除去した後、UV露光機で全面に紫外線を500mJ/cmとなるように照射し、硬化させて無色透明な下層クラッドを形成した。得られたクラッド層の厚みは10μmであった。
(3) Production of lower layer clad The clad solution E1 was uniformly applied onto a polyimide film having a thickness of 25 μm by a doctor blade, and then placed in a dryer at 50 ° C. for 10 minutes. After completely removing the solvent, the entire surface was irradiated with UV light at 500 mJ / cm 2 with a UV exposure machine and cured to form a colorless and transparent lower clad. The thickness of the obtained cladding layer was 10 μm.
(4)コア層の形成、コア領域およびクラッド領域のパターニング
 前記下層クラッド上に前記感光性樹脂組成物F1をドクターブレードにて均一に塗布した後、50℃の乾燥機に10分間投入した。溶剤を完全に除去した後に、ラインが50μm、スペースが50μmの直線パターンが全面に描かれたフォトマスクを圧着し、平行露光機を用いて照射量が500mJ/cmとなるように紫外線を照射した。その後、マスクを取り去り、150℃のオーブンに30分間投入して取り出すと鮮明な導波路パターンが現れているのが確認された。得られたコア層の厚みは50μmであった。
(4) Formation of core layer, patterning of core region and clad region The photosensitive resin composition F1 was uniformly applied on the lower clad with a doctor blade, and then placed in a dryer at 50 ° C. for 10 minutes. After completely removing the solvent, a photomask on which a linear pattern with a line of 50 μm and a space of 50 μm is drawn is pressure-bonded and irradiated with ultraviolet rays using a parallel exposure machine so that the irradiation dose is 500 mJ / cm 2. did. After that, the mask was removed, and when it was put in an oven at 150 ° C. for 30 minutes and taken out, it was confirmed that a clear waveguide pattern appeared. The thickness of the obtained core layer was 50 μm.
(5)上層クラッドの形成
 前記コア層上に前記クラッド溶液E1を用いて下層クラッドと同様の条件にて上層クラッドを形成した。得られた上層クラッドの厚みは10μmであった。
(5) Formation of upper clad An upper clad was formed on the core layer using the clad solution E1 under the same conditions as the lower clad. The thickness of the obtained upper cladding was 10 μm.
(実施例B)
(1)ポリマーの合成
 セパラブルフラスコにメタクリル酸メチル20.0g、ベンジルメタクリレート30.0g、およびメチルイソブチルケトン450gを投入し、撹拌混合したのち、窒素ガスで置換してモノマー溶液を得た。一方、重合開始剤としてアゾビスイソブチロニトリル0.25gをメチルイソブチルケトン10gに溶解し、窒素ガスで置換して開始剤溶液を得た。その後、前記モノマー溶液を撹拌しながら80℃に加熱し前記開始剤溶液をシリンジを用いてモノマー溶液に添加した。そのまま80℃で1時間加熱撹拌したのちに冷却し重合体溶液を得た。
(Example B)
(1) Polymer synthesis 20.0 g of methyl methacrylate, 30.0 g of benzyl methacrylate, and 450 g of methyl isobutyl ketone were charged into a separable flask, mixed with stirring, and then replaced with nitrogen gas to obtain a monomer solution. On the other hand, 0.25 g of azobisisobutyronitrile as a polymerization initiator was dissolved in 10 g of methyl isobutyl ketone and replaced with nitrogen gas to obtain an initiator solution. Thereafter, the monomer solution was heated to 80 ° C. while stirring, and the initiator solution was added to the monomer solution using a syringe. The mixture was heated and stirred at 80 ° C. for 1 hour and then cooled to obtain a polymer solution.
 次いで、5Lのイソプロパノールをビーカーに準備し常温で撹拌機で撹拌しながら、前記重合体溶液を滴下した。滴下が完了してからも引き続き30分間撹拌し、その後沈殿したポリマーを取り出し、真空乾燥機にて減圧下60℃で8時間乾燥してポリマーA1を得た。 Next, 5 L of isopropanol was prepared in a beaker, and the polymer solution was dropped while stirring with a stirrer at room temperature. After completion of the dropping, the mixture was further stirred for 30 minutes, and then the precipitated polymer was taken out and dried in a vacuum dryer at 60 ° C. for 8 hours under reduced pressure to obtain a polymer A1.
(2)クラッド溶液の製造
 互応化学工業(株)製の水性アクリレート樹脂溶液RD-180 20g、イソプロパノール20g、および日清紡ケミカル(株)製カルボジライトV-02-L2 0.4gを撹拌混合し、0.2μm孔径のPTFEフィルターでろ過して清浄で無色透明なクラッド溶液B1を得た。
(2) Production of Cladding Solution 20 g of aqueous acrylate resin solution RD-180 manufactured by Kyoyo Chemical Industry Co., Ltd., 20 g of isopropanol, and 0.4 g of Carbodilite V-02-L2 manufactured by Nisshinbo Chemical Co., Ltd. were stirred and mixed. Filtration through a PTFE filter having a pore size of 2 μm gave a clean, colorless and transparent clad solution B1.
(3)感光性樹脂組成物の製造
 (1)の方法で得られたポリマーA1 20gと、メタクリル酸シクロヘキシル5gと、BASFジャパン(株)製イルガキュア651 0.2gと、をメチルイソブチルケトン80g中に投入し撹拌溶解し、0.2μm孔径のPTFEフィルターでろ過して清浄で無色透明な感光性樹脂組成物C1を得た。
(3) Production of photosensitive resin composition 20 g of polymer A1 obtained by the method of (1), 5 g of cyclohexyl methacrylate, and 0.2 g of Irgacure 651 manufactured by BASF Japan Ltd. in 80 g of methyl isobutyl ketone The solution was stirred and dissolved, and filtered through a PTFE filter having a pore size of 0.2 μm to obtain a clean, colorless and transparent photosensitive resin composition C1.
(4)下層クラッドの作製
 厚み25μmのポリイミドフィルム上に前記クラッド溶液B1をドクターブレードにより均一に塗布した後、80℃の乾燥機に10分間投入した。溶媒を完全に除去した後、さらに150℃のオーブンに10分間投入し硬化させて無色透明な下層クラッドを形成した。得られたクラッド層の厚みは10μmであった。
(4) Preparation of lower layer clad The clad solution B1 was uniformly applied with a doctor blade on a polyimide film having a thickness of 25 μm, and then placed in a dryer at 80 ° C. for 10 minutes. After completely removing the solvent, it was further put into an oven at 150 ° C. for 10 minutes to be cured to form a colorless and transparent lower clad. The thickness of the obtained cladding layer was 10 μm.
(5)コア層の形成、コア領域およびクラッド領域のパターニング
 前記下層クラッド上に前記感光性樹脂組成物C1をドクターブレードにて均一に塗布した後、50℃の乾燥機に10分間投入した。溶剤を完全に除去した後に、ライン50μm、スペースが50μmの直線パターンが全面に描かれたフォトマスクを圧着し、平行露光機を用いて照射量が500mJ/cmとなるように紫外線を照射した。その後、マスクを取り去り、150℃の窒素乾燥機に30分間投入して取り出すと鮮明な導波路パターンが現れているのが確認された。得られたコア層の厚みは50μmであった。
(5) Formation of core layer, patterning of core region and clad region The photosensitive resin composition C1 was uniformly applied on the lower clad with a doctor blade, and then placed in a dryer at 50 ° C. for 10 minutes. After completely removing the solvent, a photomask on which a linear pattern with a line of 50 μm and a space of 50 μm was drawn was pressure-bonded and irradiated with ultraviolet rays using a parallel exposure machine so that the irradiation dose was 500 mJ / cm 2 . . After that, when the mask was removed, and it was taken out for 30 minutes in a nitrogen dryer at 150 ° C., it was confirmed that a clear waveguide pattern appeared. The thickness of the obtained core layer was 50 μm.
(6)上層クラッドの形成
 前記コア層上に前記クラッド溶液B1を用いて下層クラッドと同様の条件にて上層クラッドを形成した。得られた上層クラッドの厚みは10μmであった。
(6) Formation of upper clad An upper clad was formed on the core layer under the same conditions as the lower clad using the clad solution B1. The thickness of the obtained upper cladding was 10 μm.
(実施例C)
 まず、ベンジルメタクリレートの代わりに2-(パーフルオロヘキシル)エチルメタクリレートを用いたこと以外は実施例Bの(1)と同様にして合成されたポリマーA2を得た。
 以下、ポリマーA1に代えてポリマーA2を用いるようにした以外は、実施例Bと同様にして光導波路を得た。
(Example C)
First, a polymer A2 synthesized in the same manner as (1) of Example B was obtained except that 2- (perfluorohexyl) ethyl methacrylate was used instead of benzyl methacrylate.
Thereafter, an optical waveguide was obtained in the same manner as in Example B except that the polymer A2 was used instead of the polymer A1.
3.2 評価
(光導波路の伝送損失)
 850nmVCSEL(面発光レーザー)より発せられた光を50μm径の光ファイバーを経由し、実施例A~C得られた光導波路に導入し、200μm径の光ファイバーで受光して光の強度を測定した。そして、カットバック法により伝送損失を測定した。その後、導波路長を横軸にとり、挿入損失を縦軸にプロットすると測定値は直線上に並び、その傾きから各光導波路の伝搬損失はいずれも0.05dB/cmと算出することができた。
 また、実施例A~Cにおいて、屈折率分布のパラメーターを1.の実施例と同様にして変更したところ、2.と同じ傾向の評価結果が得られた。
3.2 Evaluation (Transmission loss of optical waveguide)
Light emitted from an 850 nm VCSEL (surface emitting laser) was introduced into the optical waveguide obtained in Examples A to C via a 50 μm diameter optical fiber, received by a 200 μm diameter optical fiber, and the light intensity was measured. And the transmission loss was measured by the cutback method. Thereafter, when the waveguide length is plotted on the horizontal axis and the insertion loss is plotted on the vertical axis, the measured values are arranged on a straight line, and the propagation loss of each optical waveguide can be calculated as 0.05 dB / cm from the slope. .
In Examples A to C, the refractive index distribution parameters were set to 1. When changed in the same manner as in Example 1, 2. The evaluation result of the same tendency was obtained.
(パルス信号の波形の保持性)
 実施例A~Cで得られた光導波路について、2.3と同様の方法でパルス信号の波形の保持性を評価したところ、いずれもパルス信号の鈍りが小さいことが認められた。
 また、実施例A~Cにおいて、屈折率分布のパラメーターを1.の実施例と同様にして変更したところ、2.と同じ傾向の評価結果が得られた。
(Pulse signal waveform retention)
Regarding the optical waveguides obtained in Examples A to C, when the retention property of the pulse signal waveform was evaluated by the same method as in 2.3, it was found that the bluntness of the pulse signal was small in all cases.
In Examples A to C, the refractive index distribution parameters were set to 1. When changed in the same manner as in Example 1, 2. The evaluation result of the same tendency was obtained.
 比較例4 
(1)脱離性基を有するノルボルネン系樹脂の合成
 水分および酸素濃度がいずれも1ppm以下に制御され、乾燥窒素で充満されたグローブボックス中において、ヘキシルノルボルネン(HxNB)7.2g(40.1mmol)、ジフェニルメチルノルボルネンメトキシシラン12.9g(40.1mmol)を500mLバイアル瓶に計量し、脱水トルエン60gと酢酸エチル11gを加え、シリコン製のシーラーを被せて上部を密栓した。
 次に、100mLバイアルビン中に下記式(4)で表わされるNi触媒1.56g(3.2mmol)と脱水トルエン10mLを計量し、スターラーチップを入れて密栓し、触媒を十分に撹拌して完全に溶解させた。
 この化学式(A)で表わされるNi触媒溶液1mLをシリンジで正確に計量し、上記2種のノルボルネンを溶解させたバイアル瓶中に定量的に注入し室温で1時間撹拌したところ、著しい粘度上昇が確認された。この時点で栓を抜き、テトラヒドロフラン(THF)60gを加えて撹拌を行い、反応溶液を得た。
 100mLビーカーに無水酢酸9.5g、過酸化水素水18g(濃度30%)、イオン交換水30gを加えて撹拌し、その場で過酢酸水溶液を調製した。次にこの水溶液全量を上記反応溶液に加えて12時間撹拌してNiの還元処理を行った。
 次に、処理の完了した反応溶液を分液ロートに移し替え、下部の水層を除去した後、イソプロピルアルコールの30%水溶液を100mL加えて激しく撹拌を行った。静置して完全に二層分離が行われた後で水層を除去した。この水洗プロセスを合計で3回繰り返した後、油層を大過剰のアセトン中に滴下して生成したポリマーを再沈殿させ、ろ過によりろ液と分別した後、60℃に設定した真空乾燥機中で12時間加熱乾燥を行うことにより、側鎖に脱離性基を有するノルボルネン系樹脂A(ポリマー#1)を得た。ノルボルネン系樹脂Aの分子量は、GPC測定によりMw=10万、Mn=4万、ノルボルネン系樹脂A中の各構造単位のモル比は、NMRによる同定により、ヘキシルルボルネン構造単位が50mol%、ジフェニルメチルノルボルネンメトキシシラン構造単位が50mol%であった。また屈折率はメトリコンにより1.55(測定波長;633nm)であった。
Comparative Example 4
(1) Synthesis of norbornene-based resin having a leaving group In a glove box filled with dry nitrogen in which the water and oxygen concentrations are both controlled to 1 ppm or less, 7.2 g (40.1 mmol) of hexylnorbornene (HxNB) ), 12.9 g (40.1 mmol) of diphenylmethylnorbornenemethoxysilane was weighed into a 500 mL vial, 60 g of dehydrated toluene and 11 g of ethyl acetate were added, and the top was sealed with a silicon sealer.
Next, 1.56 g (3.2 mmol) of Ni catalyst represented by the following formula (4) and 10 mL of dehydrated toluene are weighed in a 100 mL vial, put a stirrer chip, and tightly plugged. Dissolved in.
When 1 mL of the Ni catalyst solution represented by the chemical formula (A) is accurately weighed with a syringe, quantitatively injected into the vial bottle in which the two types of norbornene are dissolved, and stirred at room temperature for 1 hour, a marked increase in viscosity is observed. confirmed. At this point, the stopper was removed, 60 g of tetrahydrofuran (THF) was added, and the mixture was stirred to obtain a reaction solution.
In a 100 mL beaker, 9.5 g of acetic anhydride, 18 g of hydrogen peroxide (concentration 30%) and 30 g of ion-exchanged water were added and stirred to prepare an aqueous solution of peracetic acid on the spot. Next, the total amount of this aqueous solution was added to the above reaction solution and stirred for 12 hours to reduce Ni.
Next, the treated reaction solution was transferred to a separatory funnel, the lower aqueous layer was removed, and then 100 mL of a 30% aqueous solution of isopropyl alcohol was added and vigorously stirred. The aqueous layer was removed after standing and completely separating the two layers. After repeating this water washing process three times in total, the oil layer was dropped into a large excess of acetone to reprecipitate the polymer produced, separated from the filtrate by filtration, and then in a vacuum dryer set at 60 ° C. A norbornene-based resin A (polymer # 1) having a leaving group in the side chain was obtained by heating and drying for 12 hours. The molecular weight of the norbornene-based resin A is Mw = 100,000 by MPC measurement, Mn = 40,000, and the molar ratio of each structural unit in the norbornene-based resin A is 50 mol% of hexylbornene structural unit by identification by NMR. The diphenylmethylnorbornenemethoxysilane structural unit was 50 mol%. The refractive index was 1.55 (measurement wavelength: 633 nm) by Metricon.
Figure JPOXMLDOC01-appb-C000042
Figure JPOXMLDOC01-appb-C000042
Figure JPOXMLDOC01-appb-C000043
Figure JPOXMLDOC01-appb-C000043
(2)感光性樹脂組成物の調製
 精製したノルボルネン系樹脂A10gを100mLのガラス容器に秤量し、これにメシチレン40g、酸化防止剤Irganox1076(チバガイギー社製)0.01g、シクロヘキシルオキセタンモノマー(式(20)で示した第1モノマー、東亜合成製 CHOX、CAS#483303-25-9、分子量186、沸点125℃/1.33kPa)2g、光酸発生剤RhodorsilPhotoinitiator 2074(Rhodia社製、CAS# 178233-72-2)(1.36E-2g、酢酸エチル0.1mL中)を加え均一に溶解させた後、0.2μmのPTFEフィルターによりろ過を行い、清浄なコア層用の感光性樹脂組成物ワニスV1を調製した。
(2) Preparation of photosensitive resin composition 10 g of purified norbornene-based resin A was weighed into a 100 mL glass container, and 40 g of mesitylene, 0.01 g of antioxidant Irganox 1076 (manufactured by Ciba Geigy), cyclohexyloxetane monomer (formula (20 2), photoacid generator Rhodorsil Photoinitiator 2074 (manufactured by Rhodia, CAS # 178233-72) -2) (1.36E-2 g in 0.1 mL of ethyl acetate) was added and dissolved uniformly, followed by filtration with a 0.2 μm PTFE filter to obtain a photosensitive resin composition varnish V1 for a clean core layer Was prepared.
(3)光導波路の製造
(下層クラッドの作製)
 シリコンウエハ上に感光性ノルボルネン樹脂組成物(プロメラス社製 Avatrel2000Pワニス)をドクターブレードにより均一に塗布した後、45℃の乾燥機に15分間投入した。溶剤を完全に除去した後、塗布された全面に紫外線を100mJ照射し、乾燥機中120℃で1時間加熱して、塗膜を硬化させて、下層クラッドを形成させた。形成された下層クラッドは、厚みが20μmであり、無色透明であり、屈折率は1.52(測定波長;633nm)であった。
(3) Production of optical waveguide (production of lower clad)
A photosensitive norbornene resin composition (Avatrel 2000P varnish manufactured by Promeras Co., Ltd.) was uniformly applied on a silicon wafer with a doctor blade, and then placed in a dryer at 45 ° C. for 15 minutes. After completely removing the solvent, the entire coated surface was irradiated with 100 mJ of ultraviolet light and heated in a dryer at 120 ° C. for 1 hour to cure the coating film to form a lower cladding. The formed lower clad had a thickness of 20 μm, was colorless and transparent, and had a refractive index of 1.52 (measurement wavelength: 633 nm).
(コア領域、クラッド領域の作製)
 上記下層クラッド上に、調製して得られた上述の感光性樹脂組成物ワニスV1をドクターブレードによって均一に塗布した後、45℃の乾燥機に15分間投入した。溶剤を完全に除去した後、フォトマスクを圧着して紫外線を500mJ/cmで選択的に照射した。マスクを取り去り、乾燥機中45℃で30分間、85℃で30分間、150℃で1時間と三段階で加熱を行った。加熱後、非常に鮮明な導波路パターンが現れたコア層が確認された。
(Manufacture of core region and cladding region)
The above-mentioned photosensitive resin composition varnish V1 obtained by preparation was uniformly applied on the lower clad by a doctor blade, and then placed in a dryer at 45 ° C. for 15 minutes. After completely removing the solvent, a photomask was pressed and selectively irradiated with ultraviolet rays at 500 mJ / cm 2 . The mask was removed, and heating was performed in three stages of 45 ° C. for 30 minutes, 85 ° C. for 30 minutes, and 150 ° C. for 1 hour in a dryer. After heating, a core layer with a very clear waveguide pattern was confirmed.
(上層クラッドの作製)
 ポリエーテルスルホン(PES)フィルム上に、予め乾燥厚み20μmになるように感光性ノルボルネン樹脂組成物(プロメラス社製 Avatrel2000Pワニス)を積層して上層クラッド用フィルムを得た。
(Preparation of upper cladding)
On the polyethersulfone (PES) film, a photosensitive norbornene resin composition (Avatrel 2000P varnish manufactured by Promelas Co., Ltd.) was laminated in advance so as to have a dry thickness of 20 μm to obtain an upper clad film.
(光導波路の作製)
 下層クラッド層上に形成したコア層と、上述の上層クラッド用フィルムとを、貼り合わせて、140℃に設定された真空ラミネーターに投入して熱圧着を行った後、紫外線を100mJ全面照射し乾燥機中120℃で1時間加熱して、Avatrel2000Pを硬化させて、上層クラッドを形成させ、光導波路を得た。
 比較例4の光導波路のコア層の層内方向の屈折率分布は、W型ではないことを確認した。
(Production of optical waveguide)
The core layer formed on the lower clad layer and the above-mentioned upper clad film are bonded together, put into a vacuum laminator set at 140 ° C. and thermocompression bonded, and then irradiated with 100 mJ whole surface for drying. By heating in the machine at 120 ° C. for 1 hour, Avatrel 2000P was cured to form an upper clad to obtain an optical waveguide.
It was confirmed that the refractive index distribution in the in-layer direction of the core layer of the optical waveguide of Comparative Example 4 was not W-shaped.
本実施の形態は以下のものを含む。 The present embodiment includes the following.
 第1の凹部の頂部の屈折率は、クラッド部における平均屈折率より小さくてもよい。
 屈折率分布Wは、第1コア部とクラッド部の境界近傍以外に第2の凸部の頂部を有してもよい。
 屈折率分布Wは、クラッド部の中心部に第2の凸部の頂部を有しており、第2の凸部の頂部から第1の凹部に向かって連続的に屈折率が低下している領域を有してもよい。屈折率分布Tにおける第1コア部と第1クラッド層との屈折率差は、屈折率分布Wにおける第1の凹部の頂部と第1の凸部の頂部との屈折率差より大きくてもよい。ここで、頂部の屈折率としては、極大値又は平坦部の中央部の屈折率を用いることができる。
 第1コア部および第1クラッド層を横切るように設けられた空孔を有し、該空孔の内面により、前記コア部を伝送される光を反射する反射面が構成されてもよい。
 第1の凹部の頂部の屈折率とクラッド部における平均屈折率との差は、第1の凹部の頂部の屈折率と第1の凸部の頂部の屈折率との差の3~80%であってもよい。
 第1の凹部の頂部の屈折率と第1の凸部の頂部の屈折率との屈折率差は、0.005~0.07であってもよい。
 屈折率分布Wにおいて、第1の凸部の屈折率が、クラッド部における平均屈折率以上の値を有している部分の幅をa[μm]とし、第1の凹部の屈折率が、クラッド部における平均屈折率未満の値を有している幅をb[μm]としたとき、bは、0.01a~1.2aであってもよい。
The refractive index of the top part of the first recess may be smaller than the average refractive index in the cladding part.
The refractive index distribution W may have the top of the second convex portion in addition to the vicinity of the boundary between the first core portion and the cladding portion.
The refractive index distribution W has a top portion of the second convex portion at the center portion of the cladding portion, and the refractive index continuously decreases from the top portion of the second convex portion toward the first concave portion. You may have a region. The refractive index difference between the first core portion and the first cladding layer in the refractive index distribution T may be larger than the refractive index difference between the top of the first concave portion and the top of the first convex portion in the refractive index distribution W. . Here, as the refractive index of the top portion, the maximum value or the refractive index of the central portion of the flat portion can be used.
There may be a hole provided so as to cross the first core part and the first cladding layer, and an inner surface of the hole may constitute a reflection surface that reflects light transmitted through the core part.
The difference between the refractive index of the top of the first recess and the average refractive index of the cladding is 3 to 80% of the difference between the refractive index of the top of the first recess and the refractive index of the top of the first projection. There may be.
The refractive index difference between the refractive index of the top of the first concave portion and the refractive index of the top of the first convex portion may be 0.005 to 0.07.
In the refractive index distribution W, the width of the portion where the refractive index of the first convex portion has a value greater than or equal to the average refractive index of the cladding portion is a [μm], and the refractive index of the first concave portion is the cladding. When the width having a value less than the average refractive index in the part is b [μm], b may be 0.01a to 1.2a.
 さらに、下記の本実施の形態を含む。
 (1) コア部と、該コア部の少なくとも両側面に隣接するクラッド部と、を有する光導波路であって、
 当該光導波路の横断面の屈折率分布は、少なくとも2つの極小値と、少なくとも1つの第1の極大値と、前記第1の極大値より小さい少なくとも2つの第2の極大値と、を有し、これらが、第2の極大値、極小値、第1の極大値、極小値、第2の極大値の順で並ぶ領域を有しており、この領域のうち、前記第1の極大値を含むように前記2つの極小値で挟まれる領域が前記コア部、前記各極小値から前記第2の極大値側の領域が前記クラッド部であり、
 前記各極小値は、前記クラッド部における平均屈折率未満であり、かつ、前記屈折率分布全体で屈折率が連続的に変化していることを特徴とする光導波路。
Furthermore, the following embodiment is included.
(1) An optical waveguide having a core portion and a cladding portion adjacent to at least both side surfaces of the core portion,
The refractive index profile of the cross section of the optical waveguide has at least two minimum values, at least one first maximum value, and at least two second maximum values smaller than the first maximum value. , These have a region in which the second local maximum value, the local minimum value, the first local maximum value, the local minimum value, and the second local maximum value are arranged in this order, of which the first local maximum value is A region sandwiched between the two minimum values so as to include the core portion, and a region on the second maximum value side from each minimum value is the cladding portion,
Each of the minimum values is less than the average refractive index in the cladding portion, and the refractive index continuously changes over the entire refractive index distribution.
 (2) 前記屈折率分布のうち、前記クラッド部に対応する領域では、前記第2の極大値が前記コア部との界面近傍以外に位置している上記(1)に記載の光導波路。 (2) The optical waveguide according to (1), wherein in the region corresponding to the cladding portion in the refractive index distribution, the second maximum value is located outside the vicinity of the interface with the core portion.
 (3) 前記屈折率分布のうち、前記クラッド部に対応する領域では、前記第2の極大値が該領域の中心部に位置しており、かつ、前記第2の極大値から前記極小値に向かって連続的に低下するよう屈折率が変化している上記(2)に記載の光導波路。 (3) In the region corresponding to the cladding portion in the refractive index distribution, the second maximum value is located at the center of the region, and the second maximum value is changed to the minimum value. The optical waveguide according to (2) above, wherein the refractive index is changed so as to continuously decrease.
 (4) 前記極小値と前記クラッド部における平均屈折率との差は、前記極小値と前記第1の極大値との差の3~80%である上記(1)ないし(3)のいずれかに記載の光導波路。 (4) Any of the above (1) to (3), wherein the difference between the minimum value and the average refractive index in the cladding is 3 to 80% of the difference between the minimum value and the first maximum value An optical waveguide according to 1.
 (5) 前記極小値と前記第1の極大値との屈折率差は、0.005~0.07である上記(4)に記載の光導波路。 (5) The optical waveguide according to (4), wherein a difference in refractive index between the minimum value and the first maximum value is 0.005 to 0.07.
 (6) 前記横断面の位置を横軸にとり、前記横断面における屈折率を縦軸にとったとき、
 前記屈折率分布は、前記第1の極大値近傍において上に凸の略U字状をなし、前記極小値近傍において下に凸の略U字状をなしている上記(1)ないし(5)のいずれかに記載の光導波路。
(6) When the position of the cross section is taken on the horizontal axis, and the refractive index in the cross section is taken on the vertical axis,
The refractive index distribution is substantially U-shaped convex in the vicinity of the first maximum value, and substantially U-shaped convex in the vicinity of the minimum value. (1) to (5) The optical waveguide according to any one of the above.
 (7) 前記屈折率分布において、前記第1の極大値近傍における屈折率が、前記クラッド部における平均屈折率以上の値を有している部分の幅をa[μm]とし、前記極小値近傍における屈折率が、前記クラッド部における平均屈折率未満の値を有している幅をb[μm]としたとき、bは、0.01a~1.2aである上記(1)ないし(6)のいずれかに記載の光導波路。 (7) In the refractive index distribution, the width of the portion where the refractive index in the vicinity of the first maximum value has a value greater than or equal to the average refractive index in the cladding portion is a [μm], and the vicinity of the minimum value (1) to (6), where b is 0.01a to 1.2a, where b is a width having a refractive index less than the average refractive index of the cladding portion. The optical waveguide according to any one of the above.
 (8) 当該光導波路は、複数の前記コア部と、該各コア部の少なくとも両側面にそれぞれ隣接する前記クラッド部と、を有している上記(1)ないし(7)のいずれかに記載の光導波路。 (8) The optical waveguide according to any one of (1) to (7), wherein the optical waveguide includes a plurality of the core portions and the cladding portions adjacent to at least both side surfaces of the core portions. Optical waveguide.
 (9) 前記コア部は、ノルボルネン系樹脂で構成されている上記(1)ないし(8)のいずれかに記載の光導波路。 (9) The optical waveguide according to any one of (1) to (8), wherein the core portion is made of a norbornene resin.
 (10) 上記(1)ないし(9)のいずれかに記載の光導波路を備えることを特徴とする電子機器。 (10) An electronic apparatus comprising the optical waveguide according to any one of (1) to (9) above.
 この出願は、平成22年8月27日に出願された日本特許出願特願2010-191293を基礎とする優先権を主張し、その開示の全てをここに取り込む。 This application claims priority based on Japanese Patent Application No. 2010-191293 filed on Aug. 27, 2010, the entire disclosure of which is incorporated herein.

Claims (12)

  1.  第1クラッド層と、
     前記第1クラッド層上に設けられており、層内方向に設けられたクラッド部、第1コア部、クラッド部、第2コア部、及びクラッド部をこの順番で有するコア層と、
     前記コア層上に設けられた第2クラッド層と、
    を備え、
     前記コア層のうち前記第1コア部、及び前記クラッド部に亘る部分の層内方向の屈折率分布Wが、連続的に変化していて、第1の凸部、第1の凹部、及び第2の凸部の順で並ぶ領域を有しており、
     前記第1コア部に位置する前記屈折率分布Wは、前記第1の凸部を有しており、
     前記クラッド部に位置する前記屈折率分布Wは、前記第1の凸部よりも屈折率の最大値が小さい前記第2の凸部を有しており、
     前記第1クラッド層、前記クラッド部及び第2クラッド層に亘る部分の層間方向の屈折率分布Pが、前記第1クラッド層に位置する部分と前記クラッド部に位置する部分とで相異なる、
    光導波路。
    A first cladding layer;
    A core layer provided on the first clad layer and having a clad part, a first core part, a clad part, a second core part, and a clad part provided in the in-layer direction in this order;
    A second cladding layer provided on the core layer;
    With
    In the core layer, the refractive index distribution W in the in-layer direction of the first core portion and the portion extending to the clad portion is continuously changed, and the first convex portion, the first concave portion, and the first concave portion Has a region lined up in the order of the two convex portions,
    The refractive index distribution W located in the first core portion has the first convex portion,
    The refractive index distribution W located in the clad portion has the second convex portion having a maximum refractive index smaller than that of the first convex portion,
    The refractive index distribution P in the interlayer direction of the portion extending between the first cladding layer, the cladding portion, and the second cladding layer is different between a portion located in the first cladding layer and a portion located in the cladding portion.
    Optical waveguide.
  2.  請求項1に記載の光導波路において、
     前記第1クラッド層、前記第1コア部に亘る部分の層間方向の屈折率分布Tが、前記屈折率分布Wと相異なる、光導波路。
    The optical waveguide according to claim 1,
    An optical waveguide in which a refractive index distribution T in an interlayer direction in a portion extending from the first cladding layer and the first core portion is different from the refractive index distribution W.
  3.  請求項1または2に記載の光導波路において、
     前記第1コア部の屈折率の最大値と前記第1クラッド層の屈折率の最大値の屈折率差は、前記第1コア部の屈折率の最大値と前記クラッド部の屈折率の最大値との屈折率差よりも、大きい、光導波路。
    The optical waveguide according to claim 1 or 2,
    The difference in refractive index between the maximum value of the refractive index of the first core part and the maximum value of the refractive index of the first cladding layer is the maximum value of the refractive index of the first core part and the maximum value of the refractive index of the cladding part. The optical waveguide is larger than the refractive index difference.
  4.  請求項1から3のいずれか1項に記載の光導波路において、
     前記第2クラッド層上に設けられた、前記コア層と別部材の第2コア層を備え、
     前記第2コア層は、前記第1コア部の層間方向に位置する第3コア部を有する、光導波路。
    In the optical waveguide according to any one of claims 1 to 3,
    A second core layer provided on the second cladding layer, which is a separate member from the core layer;
    The second core layer is an optical waveguide having a third core portion located in an interlayer direction of the first core portion.
  5.  請求項1から4のいずれか1項に記載の光導波路において、
     前記第1の凹部の頂部の屈折率は、前記クラッド部における平均屈折率より小さい、光導波路。
    In the optical waveguide according to any one of claims 1 to 4,
    The optical waveguide has a refractive index at the top of the first recess that is smaller than an average refractive index in the cladding.
  6.  請求項1から5のいずれか1項に記載の光導波路において、
     前記屈折率分布Wは、前記第1コア部と前記クラッド部の界面近傍以外に前記第2の凸部の頂部を有する、光導波路。
    In the optical waveguide according to any one of claims 1 to 5,
    The refractive index distribution W is an optical waveguide having a top portion of the second convex portion in addition to the vicinity of the interface between the first core portion and the cladding portion.
  7.  請求項1から6のいずれか1項に記載の光導波路において、
     前記屈折率分布Wは、前記クラッド部の中心部に前記第2の凸部の頂部を有しており、前記第2の凸部の前記頂部から前記第1の凹部に向かって連続的に屈折率が低下している領域を有する、光導波路。
    The optical waveguide according to any one of claims 1 to 6,
    The refractive index distribution W has a top portion of the second convex portion at the center portion of the cladding portion, and is continuously refracted from the top portion of the second convex portion toward the first concave portion. An optical waveguide having an area where the rate is reduced.
  8.  請求項1から7のいずれか1項に記載の光導波路において、
     前記第1の凹部の頂部の屈折率と前記クラッド部における平均屈折率との差は、前記第1の凹部の頂部の屈折率と前記第1の凸部の頂部の屈折率との差の3~80%である、光導波路。
    In the optical waveguide according to any one of claims 1 to 7,
    The difference between the refractive index of the top of the first recess and the average refractive index of the cladding is 3 of the difference between the refractive index of the top of the first recess and the refractive index of the top of the first projection. Optical waveguide that is ~ 80%.
  9.  請求項1から8のいずれか1項に記載の光導波路において、
     前記第1の凹部の頂部の屈折率と前記第1の凸部の頂部の屈折率との屈折率差は、0.005~0.07である、光導波路。
    In the optical waveguide according to any one of claims 1 to 8,
    An optical waveguide, wherein a refractive index difference between a refractive index of a top portion of the first concave portion and a refractive index of a top portion of the first convex portion is 0.005 to 0.07.
  10.  請求項1から9のいずれか1項に記載の光導波路において、
     前記屈折率分布Wにおいて、前記第1の凸部の屈折率が、前記クラッド部における平均屈折率以上の値を有している部分の幅をa[μm]とし、前記第1の凹部の屈折率が、前記クラッド部における平均屈折率未満の値を有している幅をb[μm]としたとき、bは、0.01a~1.2aである、光導波路。
    The optical waveguide according to any one of claims 1 to 9,
    In the refractive index distribution W, the width of the portion where the refractive index of the first convex portion has a value equal to or larger than the average refractive index of the cladding portion is defined as a [μm], and the refraction of the first concave portion. An optical waveguide, wherein b is 0.01a to 1.2a, where b is a width having a value less than the average refractive index in the cladding portion.
  11.  コア部と、該コア部の少なくとも両側面に隣接するクラッド部と、を有する光導波路であって、
     当該光導波路の横断面の屈折率分布は、少なくとも2つの極小値と、少なくとも1つの第1の極大値と、前記第1の極大値より小さい少なくとも2つの第2の極大値と、を有し、これらが、第2の極大値、極小値、第1の極大値、極小値、第2の極大値の順で並ぶ領域を有しており、この領域のうち、前記第1の極大値を含むように前記2つの極小値で挟まれる領域が前記コア部、前記各極小値から前記第2の極大値側の領域が前記クラッド部であり、
     前記各極小値は、前記クラッド部における平均屈折率未満であり、かつ、前記屈折率分布全体で屈折率が連続的に変化していることを特徴とする光導波路。
    An optical waveguide having a core part and a cladding part adjacent to at least both side surfaces of the core part,
    The refractive index profile of the cross section of the optical waveguide has at least two minimum values, at least one first maximum value, and at least two second maximum values smaller than the first maximum value. , These have a region in which the second local maximum value, the local minimum value, the first local maximum value, the local minimum value, and the second local maximum value are arranged in this order, of which the first local maximum value is A region sandwiched between the two minimum values so as to include the core portion, and a region on the second maximum value side from each minimum value is the cladding portion,
    Each of the minimum values is less than the average refractive index in the cladding portion, and the refractive index continuously changes over the entire refractive index distribution.
  12.  請求項1から11のいずれか1項に記載の光導波路を備えることを特徴とする電子機器。 An electronic apparatus comprising the optical waveguide according to any one of claims 1 to 11.
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