TWI497120B - 用於快速改變焦距的偵測系統與方法 - Google Patents
用於快速改變焦距的偵測系統與方法 Download PDFInfo
- Publication number
- TWI497120B TWI497120B TW103123473A TW103123473A TWI497120B TW I497120 B TWI497120 B TW I497120B TW 103123473 A TW103123473 A TW 103123473A TW 103123473 A TW103123473 A TW 103123473A TW I497120 B TWI497120 B TW I497120B
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- Prior art keywords
- focusing
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- focus
- electric field
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Links
- 238000000034 method Methods 0.000 title claims description 32
- 238000007689 inspection Methods 0.000 title description 3
- 230000005684 electric field Effects 0.000 claims description 54
- 238000001514 detection method Methods 0.000 claims description 28
- 230000008859 change Effects 0.000 claims description 26
- 239000013078 crystal Substances 0.000 claims description 26
- 230000003287 optical effect Effects 0.000 claims description 20
- 238000012937 correction Methods 0.000 claims description 19
- 239000000463 material Substances 0.000 claims description 11
- 238000012360 testing method Methods 0.000 claims description 10
- 230000005855 radiation Effects 0.000 claims description 9
- 238000005259 measurement Methods 0.000 claims description 7
- 230000004044 response Effects 0.000 claims description 5
- LFVGISIMTYGQHF-UHFFFAOYSA-N ammonium dihydrogen phosphate Chemical compound [NH4+].OP(O)([O-])=O LFVGISIMTYGQHF-UHFFFAOYSA-N 0.000 claims description 3
- 229910000387 ammonium dihydrogen phosphate Inorganic materials 0.000 claims description 3
- 235000019837 monoammonium phosphate Nutrition 0.000 claims description 3
- LWIHDJKSTIGBAC-UHFFFAOYSA-K tripotassium phosphate Chemical compound [K+].[K+].[K+].[O-]P([O-])([O-])=O LWIHDJKSTIGBAC-UHFFFAOYSA-K 0.000 claims description 3
- 230000007423 decrease Effects 0.000 claims description 2
- 229910000402 monopotassium phosphate Inorganic materials 0.000 claims description 2
- 235000019796 monopotassium phosphate Nutrition 0.000 claims description 2
- PJNZPQUBCPKICU-UHFFFAOYSA-N phosphoric acid;potassium Chemical compound [K].OP(O)(O)=O PJNZPQUBCPKICU-UHFFFAOYSA-N 0.000 claims description 2
- 238000007493 shaping process Methods 0.000 claims description 2
- 239000011162 core material Substances 0.000 claims 10
- 238000005286 illumination Methods 0.000 claims 1
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 claims 1
- 230000006835 compression Effects 0.000 description 6
- 238000007906 compression Methods 0.000 description 6
- 230000005540 biological transmission Effects 0.000 description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 4
- 239000010931 gold Substances 0.000 description 4
- 229910052737 gold Inorganic materials 0.000 description 4
- 230000006698 induction Effects 0.000 description 4
- 230000001939 inductive effect Effects 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
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- 238000004364 calculation method Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 235000012431 wafers Nutrition 0.000 description 3
- 238000013459 approach Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 2
- 230000001902 propagating effect Effects 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 238000002940 Newton-Raphson method Methods 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 230000003667 anti-reflective effect Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000001934 delay Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- ZPWVASYFFYYZEW-UHFFFAOYSA-L dipotassium hydrogen phosphate Chemical compound [K+].[K+].OP([O-])([O-])=O ZPWVASYFFYYZEW-UHFFFAOYSA-L 0.000 description 1
- 229910000396 dipotassium phosphate Inorganic materials 0.000 description 1
- 235000019797 dipotassium phosphate Nutrition 0.000 description 1
- 230000005685 electric field effect Effects 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000000275 quality assurance Methods 0.000 description 1
- 230000002940 repellent Effects 0.000 description 1
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- 238000004088 simulation Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 239000010455 vermiculite Substances 0.000 description 1
- 229910052902 vermiculite Inorganic materials 0.000 description 1
- 235000019354 vermiculite Nutrition 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/29—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the position or the direction of light beams, i.e. deflection
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N21/00—Selective content distribution, e.g. interactive television or video on demand [VOD]
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/11—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on acousto-optical elements, e.g. using variable diffraction by sound or like mechanical waves
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/29—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the position or the direction of light beams, i.e. deflection
- G02F1/294—Variable focal length devices
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Biochemistry (AREA)
- Pathology (AREA)
- Immunology (AREA)
- General Health & Medical Sciences (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Nonlinear Science (AREA)
- Optics & Photonics (AREA)
- Multimedia (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Signal Processing (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Automatic Focus Adjustment (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
- Investigating Or Analyzing Materials By The Use Of Ultrasonic Waves (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US39167210P | 2010-10-10 | 2010-10-10 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201443485A TW201443485A (zh) | 2014-11-16 |
| TWI497120B true TWI497120B (zh) | 2015-08-21 |
Family
ID=45924889
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW103123473A TWI497120B (zh) | 2010-10-10 | 2011-09-07 | 用於快速改變焦距的偵測系統與方法 |
| TW100132244A TWI477819B (zh) | 2010-10-10 | 2011-09-07 | 用於快速改變焦距的偵測系統與方法 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW100132244A TWI477819B (zh) | 2010-10-10 | 2011-09-07 | 用於快速改變焦距的偵測系統與方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (2) | US8488117B2 (enrdf_load_stackoverflow) |
| JP (2) | JP5844114B2 (enrdf_load_stackoverflow) |
| KR (2) | KR101485069B1 (enrdf_load_stackoverflow) |
| TW (2) | TWI497120B (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI662262B (zh) * | 2018-04-20 | 2019-06-11 | 國立臺灣大學 | 具等向性轉換函數之量化差分相位對比顯微系統 |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8488117B2 (en) | 2010-10-10 | 2013-07-16 | Applied Materials Israel, Ltd. | Inspection system and method for fast changes of focus |
| US9784689B2 (en) | 2015-07-10 | 2017-10-10 | Applied Materials Israel Ltd. | Method and system for inspecting an object with an array of beams |
| US9535014B1 (en) * | 2015-07-15 | 2017-01-03 | Applied Materials Israel Ltd. | Systems and methods for inspecting an object |
| WO2020200530A1 (en) * | 2019-03-29 | 2020-10-08 | Mycronic AB | Long sweep length duv microlithographic beam scanning acousto-optical deflector and optics design |
| KR102358454B1 (ko) * | 2020-07-27 | 2022-02-07 | 엘아이지넥스원 주식회사 | 레이저 위치 추적 시스템 및 그 운용 방법 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6950245B2 (en) * | 2002-02-05 | 2005-09-27 | Olympus Corporation | Optical system, and optical apparatus |
| US20060249676A1 (en) * | 2002-01-09 | 2006-11-09 | Hitachi High-Technologies Corp. | Apparatus and method for wafer pattern inspection |
| TWI325996B (enrdf_load_stackoverflow) * | 2006-02-28 | 2010-06-11 | Toshiba Kk |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53117448A (en) * | 1977-03-23 | 1978-10-13 | Canon Inc | Modulating optical system |
| JPH04264420A (ja) * | 1991-02-19 | 1992-09-21 | Ricoh Co Ltd | 光走査装置 |
| US5619369A (en) * | 1992-07-16 | 1997-04-08 | Matsushita Electric Industrial Co., Ltd. | Diffracting device having distributed bragg reflector and wavelength changing device having optical waveguide with periodically inverted-polarization layers |
| JPH0654124A (ja) * | 1992-07-28 | 1994-02-25 | Nikon Corp | 画像読取装置および画像読取装置に用いる変倍・焦点検出用チャート |
| JP3453406B2 (ja) * | 1993-07-23 | 2003-10-06 | 三菱電機株式会社 | 光変調器 |
| JPH10289475A (ja) * | 1997-04-16 | 1998-10-27 | Sony Corp | 露光装置 |
| TW558861B (en) * | 2001-06-15 | 2003-10-21 | Semiconductor Energy Lab | Laser irradiation stage, laser irradiation optical system, laser irradiation apparatus, laser irradiation method, and method of manufacturing semiconductor device |
| US6809808B2 (en) * | 2002-03-22 | 2004-10-26 | Applied Materials, Inc. | Wafer defect detection system with traveling lens multi-beam scanner |
| KR20060013007A (ko) * | 2004-08-05 | 2006-02-09 | 동부아남반도체 주식회사 | 목적물 결함 검사 방법 및 장치 |
| KR20060053541A (ko) * | 2004-11-17 | 2006-05-22 | 삼성에스디아이 주식회사 | 음극선관용 전자총 |
| JP2006284183A (ja) | 2005-03-31 | 2006-10-19 | Toshiba Corp | 検査装置及び撮像装置 |
| KR20060119636A (ko) * | 2005-05-21 | 2006-11-24 | 삼성테크윈 주식회사 | 포커싱이 수행되는 디지털 영상 처리 장치의 주밍 방법 |
| KR20090083492A (ko) * | 2005-06-20 | 2009-08-03 | 니폰덴신뎅와 가부시키가이샤 | 광강도 변조기 |
| KR101384260B1 (ko) * | 2005-12-05 | 2014-04-11 | 전자빔기술센터 주식회사 | 전자칼럼의 전자빔 포커싱 방법 |
| KR100662238B1 (ko) * | 2006-08-08 | 2006-12-28 | 주식회사 디오스텍 | 구동 수단을 구비한 렌즈 조립체 및 이를 포함하는 자동초점 조절 장치 |
| JP4945343B2 (ja) * | 2007-06-29 | 2012-06-06 | パナソニック電工Ｓｕｎｘ株式会社 | 焦点距離調整装置、レーザ加工装置、レーザ変位計及び電気光学素子 |
| JP5130810B2 (ja) * | 2007-07-13 | 2013-01-30 | 沖電気工業株式会社 | 光偏向器 |
| KR101442615B1 (ko) * | 2008-07-31 | 2014-09-23 | 삼성전자주식회사 | 포커스 렌즈의 제어 방법, 상기 방법에 따라 작동하는포커스 렌즈의 제어 장치, 및 상기 방법을 기록한 기록매체 |
| US8488117B2 (en) | 2010-10-10 | 2013-07-16 | Applied Materials Israel, Ltd. | Inspection system and method for fast changes of focus |
-
2011
- 2011-09-01 US US13/224,096 patent/US8488117B2/en active Active
- 2011-09-07 TW TW103123473A patent/TWI497120B/zh active
- 2011-09-07 TW TW100132244A patent/TWI477819B/zh not_active IP Right Cessation
- 2011-09-30 JP JP2011230159A patent/JP5844114B2/ja not_active Expired - Fee Related
- 2011-09-30 KR KR20110100231A patent/KR101485069B1/ko not_active Expired - Fee Related
-
2013
- 2013-06-20 US US13/923,086 patent/US8659754B2/en active Active
-
2014
- 2014-06-12 KR KR1020140071343A patent/KR101455049B1/ko active Active
- 2014-07-17 JP JP2014146500A patent/JP5945303B2/ja active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060249676A1 (en) * | 2002-01-09 | 2006-11-09 | Hitachi High-Technologies Corp. | Apparatus and method for wafer pattern inspection |
| US6950245B2 (en) * | 2002-02-05 | 2005-09-27 | Olympus Corporation | Optical system, and optical apparatus |
| TWI325996B (enrdf_load_stackoverflow) * | 2006-02-28 | 2010-06-11 | Toshiba Kk |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI662262B (zh) * | 2018-04-20 | 2019-06-11 | 國立臺灣大學 | 具等向性轉換函數之量化差分相位對比顯微系統 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20140076542A (ko) | 2014-06-20 |
| TW201224519A (en) | 2012-06-16 |
| JP5844114B2 (ja) | 2016-01-13 |
| US8488117B2 (en) | 2013-07-16 |
| US20130342893A1 (en) | 2013-12-26 |
| JP2012108488A (ja) | 2012-06-07 |
| KR101455049B1 (ko) | 2014-10-28 |
| US8659754B2 (en) | 2014-02-25 |
| JP5945303B2 (ja) | 2016-07-05 |
| KR20120036756A (ko) | 2012-04-18 |
| US20120086937A1 (en) | 2012-04-12 |
| TW201443485A (zh) | 2014-11-16 |
| KR101485069B1 (ko) | 2015-01-21 |
| TWI477819B (zh) | 2015-03-21 |
| JP2015017987A (ja) | 2015-01-29 |
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