TWI496222B - 間隔件及製造間隔件的方法 - Google Patents

間隔件及製造間隔件的方法 Download PDF

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Publication number
TWI496222B
TWI496222B TW097148781A TW97148781A TWI496222B TW I496222 B TWI496222 B TW I496222B TW 097148781 A TW097148781 A TW 097148781A TW 97148781 A TW97148781 A TW 97148781A TW I496222 B TWI496222 B TW I496222B
Authority
TW
Taiwan
Prior art keywords
wafer
spacer
stack
adhesive
openings
Prior art date
Application number
TW097148781A
Other languages
English (en)
Chinese (zh)
Other versions
TW200935525A (en
Inventor
馬克思 羅西
哈馬特 盧德曼
尼可拉 史普林
亞歷山大 拜斯奇
Original Assignee
新加坡恒立私人有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 新加坡恒立私人有限公司 filed Critical 新加坡恒立私人有限公司
Publication of TW200935525A publication Critical patent/TW200935525A/zh
Application granted granted Critical
Publication of TWI496222B publication Critical patent/TWI496222B/zh

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B41/00—Arrangements for controlling or monitoring lamination processes; Safety arrangements
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00—Producing optical elements, e.g. lenses or prisms
    • B29D11/00009—Production of simple or compound lenses
    • B29D11/00278—Lenticular sheets
    • B29D11/00307—Producing lens wafers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
    • B32B37/02—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by a sequence of laminating steps, e.g. by adding new layers at consecutive laminating stations
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
    • H04N23/57—Mechanical or electrical details of cameras or camera modules specially adapted for being embedded in other devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/011—Manufacture or treatment of image sensors covered by group H10F39/12
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80—Constructional details of image sensors
    • H10F39/804—Containers or encapsulations
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B2006/12166—Manufacturing methods
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80—Constructional details of image sensors
    • H10F39/806—Optical elements or arrangements associated with the image sensors
    • H10F39/8063—Microlenses
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/10—Methods of surface bonding and/or assembly therefor
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/15—Sheet, web, or layer weakened to permit separation through thickness
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24273—Structurally defined web or sheet [e.g., overall dimension, etc.] including aperture
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24273—Structurally defined web or sheet [e.g., overall dimension, etc.] including aperture
    • Y10T428/24322—Composite web or sheet
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
    • Y10T428/2457—Parallel ribs and/or grooves

Landscapes

  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Signal Processing (AREA)
  • Health & Medical Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Ophthalmology & Optometry (AREA)
  • Mechanical Engineering (AREA)
  • Micromachines (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Lens Barrels (AREA)
TW097148781A 2007-12-19 2008-12-15 間隔件及製造間隔件的方法 TWI496222B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US1480107P 2007-12-19 2007-12-19
US12/180,175 US20090159200A1 (en) 2007-12-19 2008-07-25 Spacer element and method for manufacturing a spacer element

Publications (2)

Publication Number Publication Date
TW200935525A TW200935525A (en) 2009-08-16
TWI496222B true TWI496222B (zh) 2015-08-11

Family

ID=40787189

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097148781A TWI496222B (zh) 2007-12-19 2008-12-15 間隔件及製造間隔件的方法

Country Status (7)

Country Link
US (3) US20090159200A1 (enExample)
EP (1) EP2225596B1 (enExample)
JP (1) JP5600598B2 (enExample)
KR (1) KR101555074B1 (enExample)
CN (1) CN101946199A (enExample)
TW (1) TWI496222B (enExample)
WO (1) WO2009076786A1 (enExample)

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JP5504376B2 (ja) 2010-04-21 2014-05-28 エンパイア テクノロジー ディベロップメント エルエルシー スタック型ウエハアセンブリのための精密スペーシング
JP2013531812A (ja) * 2010-06-14 2013-08-08 ヘプタゴン・オサケ・ユキチュア 複数の光学装置の製造方法
WO2011156928A2 (en) 2010-06-14 2011-12-22 Heptagon Oy Camera, and method of manufacturing a plurality of cameras
US9168679B2 (en) * 2010-07-16 2015-10-27 Northwestern University Programmable soft lithography: solvent-assisted nanoscale embossing
KR101976881B1 (ko) 2010-08-17 2019-05-09 헵타곤 마이크로 옵틱스 피티이. 리미티드 카메라를 위한 복수의 광학 장치를 제조하는 방법
CN103237713B (zh) * 2010-12-06 2015-09-30 本田技研工业株式会社 副框架结构体
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DE102011005379A1 (de) * 2011-03-10 2012-09-13 Via Optronics Gmbh Optoelektronische Vorrichtung
KR101852030B1 (ko) * 2011-08-25 2018-04-25 삼성전자주식회사 마이크로 소자의 웨이퍼 레벨 보호 구조물과 이를 포함하는 마이크로 소자 및 이들의 제조방법
JP6223975B2 (ja) * 2011-08-25 2017-11-01 ヘプタゴン・マイクロ・オプティクス・プライベート・リミテッドHeptagon Micro Optics Pte. Ltd. 光学装置の、特にコンピュテーショナルカメラ用モジュールのウェハレベルの製作
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US9634051B2 (en) 2012-07-17 2017-04-25 Heptagon Micro Optics Pte. Ltd. Optical devices, in particular computational cameras, and methods for manufacturing the same
CN102891155B (zh) * 2012-09-27 2015-08-19 豪威科技(上海)有限公司 用于制作镜头的晶圆级贴合方法
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EP3142859B1 (en) 2014-05-16 2019-07-10 Heptagon Micro Optics Pte. Ltd. Wafer-level manufacture of devices, in particular of optical devices
JP6967830B2 (ja) * 2015-07-31 2021-11-17 ソニーセミコンダクタソリューションズ株式会社 半導体装置、レンズモジュール及びその製造方法、並びに、電子機器
JP6619174B2 (ja) * 2015-07-31 2019-12-11 ソニーセミコンダクタソリューションズ株式会社 製造装置および方法
US10889078B2 (en) * 2015-08-05 2021-01-12 Omnivision Technologies, Inc. Optical spacer including controlled located aperture and method of manufacturing the same
KR102519178B1 (ko) * 2015-09-25 2023-04-06 삼성전자주식회사 색분리 소자를 포함하는 이미지 센서 및 이를 포함하는 촬상 장치
US10018781B1 (en) 2017-01-06 2018-07-10 International Business Machines Corporation Fluid control structure
WO2019054940A1 (en) * 2017-09-12 2019-03-21 Ams Sensors Singapore Pte. Ltd. WAFER LEVEL MANUFACTURE OF MICRO-DEVICES AND ASSOCIATED TWO-PIECE DEVICES, ESPECIALLY MICRO-OPTIC SYSTEMS
CN108654109B (zh) * 2018-04-08 2023-08-04 东莞市安普城塑胶有限公司 一种闪光变色片生产工艺
EP3570103B1 (en) * 2018-05-17 2020-07-01 Axis AB Camera arrangement and method for aligning a sensor board and an optics unit
CN113573877B (zh) 2019-03-12 2024-03-29 ams传感器新加坡私人有限公司 晶圆对准特征
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KR102534260B1 (ko) * 2019-08-30 2023-05-19 삼성전기주식회사 렌즈 조립체
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JP7784892B2 (ja) * 2021-12-28 2025-12-12 株式会社ダイセル レンズ用スペーサの製造方法及び、レンズユニットの製造方法
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Also Published As

Publication number Publication date
US20110039048A1 (en) 2011-02-17
WO2009076786A1 (en) 2009-06-25
JP5600598B2 (ja) 2014-10-01
KR20100109553A (ko) 2010-10-08
TW200935525A (en) 2009-08-16
CN101946199A (zh) 2011-01-12
JP2011508900A (ja) 2011-03-17
US20090159200A1 (en) 2009-06-25
US20130280492A1 (en) 2013-10-24
EP2225596A1 (en) 2010-09-08
EP2225596B1 (en) 2024-02-14
KR101555074B1 (ko) 2015-09-22

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