TWI484220B - 用於微影蝕刻的具等倍放大率之大尺寸折反射透鏡 - Google Patents

用於微影蝕刻的具等倍放大率之大尺寸折反射透鏡 Download PDF

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Publication number
TWI484220B
TWI484220B TW102118925A TW102118925A TWI484220B TW I484220 B TWI484220 B TW I484220B TW 102118925 A TW102118925 A TW 102118925A TW 102118925 A TW102118925 A TW 102118925A TW I484220 B TWI484220 B TW I484220B
Authority
TW
Taiwan
Prior art keywords
lens
line
imaging
internal reflection
total internal
Prior art date
Application number
TW102118925A
Other languages
English (en)
Chinese (zh)
Other versions
TW201348739A (zh
Inventor
David G Stites
Original Assignee
Ultratech Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ultratech Inc filed Critical Ultratech Inc
Publication of TW201348739A publication Critical patent/TW201348739A/zh
Application granted granted Critical
Publication of TWI484220B publication Critical patent/TWI484220B/zh

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/02—Viewing or reading apparatus
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/04—Prisms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00—Projectors or projection-type viewers; Accessories therefor
    • G03B21/14—Details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/02—Exposure apparatus for contact printing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/42—Projection printing apparatus, e.g. enlarger, copying camera for automatic sequential copying of the same original
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW102118925A 2012-05-30 2013-05-29 用於微影蝕刻的具等倍放大率之大尺寸折反射透鏡 TWI484220B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US201261653020P 2012-05-30 2012-05-30

Publications (2)

Publication Number Publication Date
TW201348739A TW201348739A (zh) 2013-12-01
TWI484220B true TWI484220B (zh) 2015-05-11

Family

ID=49579561

Family Applications (1)

Application Number Title Priority Date Filing Date
TW102118925A TWI484220B (zh) 2012-05-30 2013-05-29 用於微影蝕刻的具等倍放大率之大尺寸折反射透鏡

Country Status (5)

Country Link
US (1) US8830590B2 (enExample)
JP (1) JP5806257B2 (enExample)
KR (1) KR20130135115A (enExample)
DE (1) DE102013008814A1 (enExample)
TW (1) TWI484220B (enExample)

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US9341951B2 (en) * 2012-12-21 2016-05-17 Ultratech, Inc. Wynn-dyson imaging system with reduced thermal distortion
US9488811B2 (en) 2013-08-20 2016-11-08 Ultratech, Inc. Wynne-Dyson optical system with variable magnification
US9436103B2 (en) * 2014-05-19 2016-09-06 Ultratech, Inc. Wynne-Dyson projection lens with reduced susceptibility to UV damage
CN106462085B (zh) 2014-06-23 2019-05-17 Asml荷兰有限公司 光刻设备和方法
JP2016080870A (ja) * 2014-10-17 2016-05-16 財団法人國家實驗研究院 共役共通光路リソグラフィレンズ
DE102015104323A1 (de) 2015-03-23 2016-09-29 Carl Zeiss Smt Gmbh Zoomsystem mit austauschbaren optischen Elementen
JP2016218299A (ja) * 2015-05-22 2016-12-22 財団法人國家實驗研究院 単一非球面共通光学素子露光機レンズセット
US9618734B2 (en) * 2015-06-17 2017-04-11 National Applied Research Laboratories Optical components exposer set having non-spherical component
JP6665646B2 (ja) * 2016-04-08 2020-03-13 日立化成デュポンマイクロシステムズ株式会社 パターン硬化膜の製造方法、電子部品の製造方法、及び当該パターン硬化膜の製造方法に用いるポジ型感光性樹脂組成物
JP6819773B2 (ja) 2016-09-06 2021-01-27 株式会社ニコン 反射屈折等倍アフォーカル瞳孔リレー及びこれを採用した光学撮影系
PT3642674T (pt) * 2017-06-19 2023-05-02 Suss Microtec Solutions Gmbh & Co Kg Compensação de ampliação e/ou direcionamento de feixe em sistemas óticos
WO2021239970A2 (de) * 2020-05-28 2021-12-02 Schott Ag Abbildungssystem umfassend strahlführungselement mit hoher solarisationsbeständigkeit im blauen spektralbereich
CN114322944B (zh) * 2021-12-24 2023-09-12 中国科学院长春光学精密机械与物理研究所 同轴折返式导航与光谱一体化光学系统
CN119395866A (zh) * 2024-12-30 2025-02-07 青岛芯微半导体科技有限公司 一种基于反射对称结构的高像质紫外物镜

Citations (3)

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JP2006512618A (ja) * 2002-12-27 2006-04-13 ウルトラテック インク 大フィールド等倍投影系
TW200615577A (en) * 2004-11-01 2006-05-16 Ultratech Inc Apochromatic unit-magnification projection optical system
US20120063010A1 (en) * 2010-09-10 2012-03-15 Coherent, Inc. Large-field unit-magnification catadioptric projection system

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US2742817A (en) 1953-05-29 1956-04-24 Eastman Kodak Co Unit magnification catadioptric lens system
US4896952A (en) * 1988-04-22 1990-01-30 International Business Machines Corporation Thin film beamsplitter optical element for use in an image-forming lens system
US5159172A (en) * 1990-08-07 1992-10-27 International Business Machines Corporation Optical projection system
US5161062A (en) * 1991-07-11 1992-11-03 General Signal Corporation Optical projection system including a refractive lens assembly having a gap between constituent lenses
JPH08211294A (ja) 1995-02-02 1996-08-20 Nikon Corp 投影露光装置
US5969803A (en) 1998-06-30 1999-10-19 Nikon Corporation Large NA projection lens for excimer laser lithographic systems
EP0989434B1 (en) * 1998-07-29 2006-11-15 Carl Zeiss SMT AG Catadioptric optical system and exposure apparatus having the same
DE10127227A1 (de) * 2001-05-22 2002-12-05 Zeiss Carl Katadioptrisches Reduktionsobjektiv
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JP2006512618A (ja) * 2002-12-27 2006-04-13 ウルトラテック インク 大フィールド等倍投影系
TW200615577A (en) * 2004-11-01 2006-05-16 Ultratech Inc Apochromatic unit-magnification projection optical system
US20120063010A1 (en) * 2010-09-10 2012-03-15 Coherent, Inc. Large-field unit-magnification catadioptric projection system

Also Published As

Publication number Publication date
JP2013250556A (ja) 2013-12-12
US8830590B2 (en) 2014-09-09
DE102013008814A1 (de) 2013-12-05
TW201348739A (zh) 2013-12-01
US20130321935A1 (en) 2013-12-05
JP5806257B2 (ja) 2015-11-10
KR20130135115A (ko) 2013-12-10

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