KR20130135115A - 마이크로리소그래피용 단위-배율 대형-포맷 반사 굴절 렌즈 - Google Patents

마이크로리소그래피용 단위-배율 대형-포맷 반사 굴절 렌즈 Download PDF

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Publication number
KR20130135115A
KR20130135115A KR1020130061102A KR20130061102A KR20130135115A KR 20130135115 A KR20130135115 A KR 20130135115A KR 1020130061102 A KR1020130061102 A KR 1020130061102A KR 20130061102 A KR20130061102 A KR 20130061102A KR 20130135115 A KR20130135115 A KR 20130135115A
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KR
South Korea
Prior art keywords
lens
prism
line
concave
image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
KR1020130061102A
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English (en)
Korean (ko)
Inventor
데이비드 지. 스타이츠
Original Assignee
울트라테크 인크.
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Filing date
Publication date
Application filed by 울트라테크 인크. filed Critical 울트라테크 인크.
Publication of KR20130135115A publication Critical patent/KR20130135115A/ko
Withdrawn legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/02—Viewing or reading apparatus
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/04—Prisms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00—Projectors or projection-type viewers; Accessories therefor
    • G03B21/14—Details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/02—Exposure apparatus for contact printing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/42—Projection printing apparatus, e.g. enlarger, copying camera for automatic sequential copying of the same original
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020130061102A 2012-05-30 2013-05-29 마이크로리소그래피용 단위-배율 대형-포맷 반사 굴절 렌즈 Withdrawn KR20130135115A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201261653020P 2012-05-30 2012-05-30
US61/653,020 2012-05-30

Publications (1)

Publication Number Publication Date
KR20130135115A true KR20130135115A (ko) 2013-12-10

Family

ID=49579561

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020130061102A Withdrawn KR20130135115A (ko) 2012-05-30 2013-05-29 마이크로리소그래피용 단위-배율 대형-포맷 반사 굴절 렌즈

Country Status (5)

Country Link
US (1) US8830590B2 (enExample)
JP (1) JP5806257B2 (enExample)
KR (1) KR20130135115A (enExample)
DE (1) DE102013008814A1 (enExample)
TW (1) TWI484220B (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20200020812A (ko) * 2017-06-19 2020-02-26 서스 마이크로텍 포토닉 시스템즈 인코포레이티드 광학계에서의 배율 보상 및 빔 조향 방법 및 장치

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9341951B2 (en) * 2012-12-21 2016-05-17 Ultratech, Inc. Wynn-dyson imaging system with reduced thermal distortion
US9488811B2 (en) 2013-08-20 2016-11-08 Ultratech, Inc. Wynne-Dyson optical system with variable magnification
US9436103B2 (en) * 2014-05-19 2016-09-06 Ultratech, Inc. Wynne-Dyson projection lens with reduced susceptibility to UV damage
CN106462085B (zh) 2014-06-23 2019-05-17 Asml荷兰有限公司 光刻设备和方法
JP2016080870A (ja) * 2014-10-17 2016-05-16 財団法人國家實驗研究院 共役共通光路リソグラフィレンズ
DE102015104323A1 (de) 2015-03-23 2016-09-29 Carl Zeiss Smt Gmbh Zoomsystem mit austauschbaren optischen Elementen
JP2016218299A (ja) * 2015-05-22 2016-12-22 財団法人國家實驗研究院 単一非球面共通光学素子露光機レンズセット
US9618734B2 (en) * 2015-06-17 2017-04-11 National Applied Research Laboratories Optical components exposer set having non-spherical component
JP6665646B2 (ja) * 2016-04-08 2020-03-13 日立化成デュポンマイクロシステムズ株式会社 パターン硬化膜の製造方法、電子部品の製造方法、及び当該パターン硬化膜の製造方法に用いるポジ型感光性樹脂組成物
JP6819773B2 (ja) 2016-09-06 2021-01-27 株式会社ニコン 反射屈折等倍アフォーカル瞳孔リレー及びこれを採用した光学撮影系
WO2021239970A2 (de) * 2020-05-28 2021-12-02 Schott Ag Abbildungssystem umfassend strahlführungselement mit hoher solarisationsbeständigkeit im blauen spektralbereich
CN114322944B (zh) * 2021-12-24 2023-09-12 中国科学院长春光学精密机械与物理研究所 同轴折返式导航与光谱一体化光学系统
CN119395866A (zh) * 2024-12-30 2025-02-07 青岛芯微半导体科技有限公司 一种基于反射对称结构的高像质紫外物镜

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8011A (en) * 1851-04-01 Improvement in blasti ng rocks
US1401345A (en) 1921-09-02 1921-12-27 Mechau Emil Motion-picture-projection apparatus
US1783998A (en) 1927-03-09 1930-12-09 Tech D Optique Et De Photograp Photographic reproduction objective with two diaphragms and its application as in printing positives for black and white cinematography, color cinematography, or cinematography in relief
US2742817A (en) 1953-05-29 1956-04-24 Eastman Kodak Co Unit magnification catadioptric lens system
US4896952A (en) * 1988-04-22 1990-01-30 International Business Machines Corporation Thin film beamsplitter optical element for use in an image-forming lens system
US5159172A (en) * 1990-08-07 1992-10-27 International Business Machines Corporation Optical projection system
US5161062A (en) * 1991-07-11 1992-11-03 General Signal Corporation Optical projection system including a refractive lens assembly having a gap between constituent lenses
JPH08211294A (ja) 1995-02-02 1996-08-20 Nikon Corp 投影露光装置
US5969803A (en) 1998-06-30 1999-10-19 Nikon Corporation Large NA projection lens for excimer laser lithographic systems
EP0989434B1 (en) * 1998-07-29 2006-11-15 Carl Zeiss SMT AG Catadioptric optical system and exposure apparatus having the same
DE10127227A1 (de) * 2001-05-22 2002-12-05 Zeiss Carl Katadioptrisches Reduktionsobjektiv
EP1430346A1 (en) * 2001-09-20 2004-06-23 Carl Zeiss SMT AG Catadioptric reduction lens
TWI249082B (en) * 2002-08-23 2006-02-11 Nikon Corp Projection optical system and method for photolithography and exposure apparatus and method using same
US6879383B2 (en) 2002-12-27 2005-04-12 Ultratech, Inc. Large-field unit-magnification projection system
US6813098B2 (en) 2003-01-02 2004-11-02 Ultratech, Inc. Variable numerical aperture large-field unit-magnification projection system
US6863403B2 (en) 2003-05-27 2005-03-08 Ultratech, Inc. Deep ultraviolet unit-magnification projection optical system and projection exposure apparatus
JP2005024584A (ja) * 2003-06-30 2005-01-27 Nikon Corp 走査型投影露光装置及び露光方法
US20080151364A1 (en) * 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
JP2005312182A (ja) 2004-04-21 2005-11-04 Denso Corp 回転電機の集中巻き型ステータコイル
US7148953B2 (en) 2004-11-01 2006-12-12 Ultratech, Inc. Apochromatic unit-magnification projection optical system
DE102005024290A1 (de) * 2005-05-27 2006-11-30 Carl Zeiss Smt Ag Abbildungssystem, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage
EP1912098B1 (en) * 2006-10-12 2012-04-25 Carl Zeiss SMT GmbH Unit magnification projection objective
US20100283978A1 (en) * 2009-05-07 2010-11-11 Ultratech,Inc. LED-based UV illuminators and lithography systems using same
US8493670B2 (en) * 2010-09-10 2013-07-23 Coherent, Inc. Large-field unit-magnification catadioptric projection system

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20200020812A (ko) * 2017-06-19 2020-02-26 서스 마이크로텍 포토닉 시스템즈 인코포레이티드 광학계에서의 배율 보상 및 빔 조향 방법 및 장치

Also Published As

Publication number Publication date
JP2013250556A (ja) 2013-12-12
TWI484220B (zh) 2015-05-11
US8830590B2 (en) 2014-09-09
DE102013008814A1 (de) 2013-12-05
TW201348739A (zh) 2013-12-01
US20130321935A1 (en) 2013-12-05
JP5806257B2 (ja) 2015-11-10

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PA0109 Patent application

Patent event code: PA01091R01D

Comment text: Patent Application

Patent event date: 20130529

PG1501 Laying open of application
PC1203 Withdrawal of no request for examination
WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid