TWI478883B - A method for manufacturing a glass substrate, and a manufacturing apparatus for a glass substrate - Google Patents

A method for manufacturing a glass substrate, and a manufacturing apparatus for a glass substrate Download PDF

Info

Publication number
TWI478883B
TWI478883B TW102107094A TW102107094A TWI478883B TW I478883 B TWI478883 B TW I478883B TW 102107094 A TW102107094 A TW 102107094A TW 102107094 A TW102107094 A TW 102107094A TW I478883 B TWI478883 B TW I478883B
Authority
TW
Taiwan
Prior art keywords
tube
glass
molten glass
phase space
glass substrate
Prior art date
Application number
TW102107094A
Other languages
Chinese (zh)
Other versions
TW201400427A (en
Inventor
Shingo Fujimoto
Takao Hamatani
Noriyuki Hioki
Original Assignee
Avanstrate Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Avanstrate Inc filed Critical Avanstrate Inc
Publication of TW201400427A publication Critical patent/TW201400427A/en
Application granted granted Critical
Publication of TWI478883B publication Critical patent/TWI478883B/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B5/00Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
    • C03B5/16Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
    • C03B5/235Heating the glass
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B5/00Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
    • C03B5/16Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
    • C03B5/225Refining
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B18/00Shaping glass in contact with the surface of a liquid
    • C03B18/02Forming sheets
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B18/00Shaping glass in contact with the surface of a liquid
    • C03B18/02Forming sheets
    • C03B18/18Controlling or regulating the temperature of the float bath; Composition or purification of the float bath

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Glass Compositions (AREA)

Description

玻璃基板之製造方法及玻璃基板之製造裝置Method for producing glass substrate and device for manufacturing glass substrate

本發明係關於一種藉由對使玻璃原料熔融而生成之熔融玻璃進行成形來製造玻璃基板之玻璃基板之製造方法以及玻璃基板之製造裝置。The present invention relates to a method for producing a glass substrate for producing a glass substrate by molding molten glass produced by melting a glass raw material, and a glass substrate manufacturing apparatus.

玻璃基板一般係經過由玻璃原料生成熔融玻璃之後,將熔融玻璃成形為玻璃基板之步驟來製造。上述步驟中,包括將熔融玻璃內含之微小氣泡除去之步驟(以下亦稱為澄清)。澄清係藉由如下方法進行:一邊對形成為管之澄清槽主體進行加熱,一邊使添加有As2 O3 等澄清劑之熔融玻璃通過該管狀之澄清槽主體(以下亦稱為澄清管),利用澄清劑之氧化還原反應來除去熔融玻璃中之氣泡,藉此而進行澄清。更具體而言,按照下述方式進行澄清:進而提高粗熔解後之熔融玻璃之溫度以使澄清劑發揮功能,進行氣泡之上浮脫泡後,降低溫度,藉此使熔融玻璃吸收未完全脫泡而殘留之較小之氣泡。即,澄清包含使氣泡上浮脫泡之處理(以下稱為脫泡處理)以及使小泡吸收至熔融玻璃中之處理(以下稱為吸收處理)。於脫泡處理中,使熔融玻璃通過澄清管時,於澄清管之內部上方之表面與熔融玻璃之液面之間具有恆定面積之脫泡用之氣相空間。The glass substrate is generally produced by a step of forming molten glass from a glass raw material and then forming the molten glass into a glass substrate. The above steps include a step of removing minute bubbles contained in the molten glass (hereinafter also referred to as clarification). The clarification is carried out by heating the molten glass to which the clarifying agent such as As 2 O 3 is added, through the tubular clarification tank main body (hereinafter also referred to as a clarification pipe), while heating the clarification tank main body formed as a pipe. The clarification is carried out by removing the bubbles in the molten glass by a redox reaction of a clarifying agent. More specifically, the clarification is carried out in such a manner that the temperature of the molten glass after the crude melting is further increased to function as a clarifying agent, and after the bubbles are floated and defoamed, the temperature is lowered, whereby the molten glass is absorbed incompletely defoamed. The smaller bubbles remain. That is, the clarification includes a treatment for defoaming the bubbles (hereinafter referred to as a defoaming treatment) and a treatment for absorbing the vesicles into the molten glass (hereinafter referred to as an absorption treatment). In the defoaming treatment, when the molten glass is passed through the clarification pipe, a gas phase space for defoaming having a constant area is provided between the surface above the inside of the clarification pipe and the liquid surface of the molten glass.

澄清劑先前一般使用As2 O3 ,但近年來從環境負荷之觀點出發,開始使用毒性低之SnO2 或Fe2 O3 等。As the clarifying agent, As 2 O 3 has been generally used in the past, but in recent years, from the viewpoint of environmental load, use of SnO 2 or Fe 2 O 3 having low toxicity has been used.

又,為了由高溫之熔融玻璃進行高品質之玻璃基板之量產,期 望考慮作為玻璃基板缺陷之主要因素之雜質等不要自製造玻璃基板之任何裝置中混入至熔融玻璃中。因此,於玻璃基板之製造過程中,與熔融玻璃接觸之構件之內壁需要根據與該構件接觸之熔融玻璃之溫度、所要求之玻璃基板之品質等由適當之材料構成。例如,已知構成上述澄清管之管之材料,一般使用鉑或鉑合金等鉑族金屬(專利文獻1)。鉑或鉑合金等雖然價格高但熔點高、對熔融玻璃之耐腐蝕性亦優異,因此適合用於澄清管。In addition, in order to mass-produce high-quality glass substrates from high-temperature molten glass, It is expected that impurities or the like which are the main factors of the glass substrate defect are not mixed into the molten glass from any device for manufacturing the glass substrate. Therefore, in the production process of the glass substrate, the inner wall of the member in contact with the molten glass needs to be made of a suitable material depending on the temperature of the molten glass that is in contact with the member, the quality of the desired glass substrate, and the like. For example, a material of a tube constituting the clarification tube is generally used as a platinum group metal such as platinum or a platinum alloy (Patent Document 1). Platinum or a platinum alloy is suitable for use in a clarification tube because of its high price, high melting point, and excellent corrosion resistance to molten glass.

在脫泡處理時對澄清管進行加熱之溫度根據想要成形之玻璃基板之組成而不同,為1000~1650℃左右。The temperature at which the clarification tube is heated during the defoaming treatment differs depending on the composition of the glass substrate to be formed, and is about 1000 to 1650 °C.

一般情形時,於澄清槽上設置有用於將脫泡出來之氣泡排放至外部之氣體排氣口。因此,有時外部氣體會自氣體排氣口混入澄清槽之內部。含有氧之外部氣體從氣體排氣口混入至澄清槽內之情形時,與澄清管中之氣相空間接觸之內壁部分之鉑或鉑合金會揮發。In a general case, a gas exhaust port for discharging the defoamed bubbles to the outside is provided on the clarification tank. Therefore, sometimes external air is mixed into the inside of the clarification tank from the gas exhaust port. When the external gas containing oxygen is mixed into the clarification tank from the gas vent, the platinum or platinum alloy in the inner wall portion in contact with the gas phase space in the clarification tube volatilizes.

又,於澄清管內部,氣泡中之氣體、例如氧會自熔融玻璃排放至上述之氣相空間。與澄清管中之氣相空間接觸之內壁部分之鉑或鉑合金亦會因該氧成分而揮發。即,澄清槽內部之氣相空間含有由於氧而揮發之鉑或鉑合金之揮發物。Further, inside the clarification pipe, a gas such as oxygen in the bubble is discharged from the molten glass to the gas phase space described above. The platinum or platinum alloy of the inner wall portion in contact with the gas phase space in the clarification tube is also volatilized by the oxygen component. That is, the gas phase space inside the clarification tank contains a volatile substance of platinum or a platinum alloy which is volatilized by oxygen.

[先前技術文獻][Previous Technical Literature] [專利文獻][Patent Literature]

專利文獻1:日本專利特表2006-522001號公報Patent Document 1: Japanese Patent Special Publication No. 2006-522001

又,已知於玻璃基板之製造中,澄清作用有效發揮之溫度會因所使用之澄清劑而有所不同。例如,As2 O3 (亞砷酸)除去氣泡之能力優異,澄清溫度於1500℃左右或較1500℃略高之範圍便足夠。因此,先前一般使用As2 O3 作為澄清劑。然而,亞砷酸之環境負荷高,因此 如上所述,近年來較佳使用SnO2 (氧化錫)等作為環境負荷不高(毒性低)之澄清劑。然而,與亞砷酸相比,氧化錫在脫泡步驟時放出氣泡之能力較弱,需要降低玻璃之黏性來提高脫泡效果。因此需要提高熔融玻璃之溫度而進行澄清。例如,使用氧化錫作為澄清劑之情形時,較佳升溫至1600℃以上。因此,存在如下不良情形:在與上述氣相空間接觸之澄清管之內部上方之表面,來自壁面之鉑或鉑合金較先前更容易揮發。Further, it is known that in the production of a glass substrate, the temperature at which the clarification action is effectively exerted varies depending on the clarifying agent used. For example, As 2 O 3 (arsenite) has an excellent ability to remove bubbles, and a clarification temperature of about 1500 ° C or a range slightly higher than 1500 ° C is sufficient. Therefore, As 2 O 3 has previously been generally used as a fining agent. However, since arsenic acid has a high environmental load, as described above, in recent years, SnO 2 (tin oxide) or the like has been preferably used as a clarifying agent having a low environmental load (low toxicity). However, compared with arsenious acid, tin oxide has a weak ability to release bubbles during the defoaming step, and it is necessary to lower the viscosity of the glass to improve the defoaming effect. Therefore, it is necessary to raise the temperature of the molten glass for clarification. For example, when tin oxide is used as the clarifying agent, it is preferred to raise the temperature to 1600 ° C or higher. Therefore, there is a problem that the platinum or platinum alloy from the wall surface is more volatile than before, on the surface above the inside of the clarification tube which is in contact with the gas phase space described above.

該鉑或鉑合金等之揮發物凝固而得到之結晶(鉑雜質或鉑合金雜質)之一部分以微粒之形式混入至熔融玻璃中,有可能導致玻璃基板之品質下降。One of the crystals (platinum impurities or platinum alloy impurities) obtained by solidification of the volatile matter such as platinum or a platinum alloy is mixed into the molten glass as fine particles, which may cause deterioration in the quality of the glass substrate.

因此,鑒於以上情形,本發明之目的在於提供一種能夠抑制由自玻璃基板之製造過程中所使用之澄清槽揮發出之鉑或鉑合金形成的雜質之混入之玻璃基板之製造方法及玻璃基板之製造裝置。Therefore, in view of the above circumstances, an object of the present invention is to provide a method for producing a glass substrate capable of suppressing the incorporation of impurities formed by platinum or a platinum alloy volatilized from a clarification tank used in the production process of a glass substrate, and a glass substrate. Manufacturing equipment.

本發明之一態樣為玻璃基板之製造方法。該製造方法包括:熔解步驟,其係將玻璃原料熔解從而生成熔融玻璃;及澄清步驟,其包含脫泡處理,該脫泡處理係於包含由鉑或鉑合金構成且被加熱之長條狀之管之澄清槽中,於形成有氣相空間之狀態下使上述熔融玻璃通過之期間,對上述熔融玻璃進行加熱藉此將氣泡從上述熔融玻璃排放至上述氣相空間。One aspect of the present invention is a method of producing a glass substrate. The manufacturing method includes a melting step of melting a glass raw material to form a molten glass, and a clarification step including a defoaming treatment for comprising a long strip composed of platinum or a platinum alloy and heated In the clarification tank of the tube, while the molten glass is passed through in a state in which the vapor phase is formed, the molten glass is heated to discharge bubbles from the molten glass to the vapor phase space.

上述澄清槽之上述管係以成為使上述氣相空間中所含之鉑揮發物凝固之溫度以下之部位之至少一部分不具有上述氣相空間的方式形成。The tube of the clarification tank is formed such that at least a part of a portion below the temperature at which the platinum volatile matter contained in the gas phase space is solidified does not have the gas phase space.

上述管係以成為使上述氣相空間中所含之鉑揮發物凝固之溫度以下之部位之至少一部分不具有上述氣相空間之方式形成,因此在上述一部分或其附近之上述管之內壁面上難以生成由鉑或鉑合金之揮發 物凝固而得到之結晶,作為雜質混入澄清步驟中之熔融玻璃中之情形減少。因此,製造玻璃基板時,能夠抑制由鉑或鉑合金形成之雜質混入至玻璃基板中。The tube system is formed such that at least a part of a portion at which the platinum volatile matter contained in the gas phase space is solidified does not have the gas phase space, and therefore the inner wall surface of the tube is at or near the part It is difficult to generate volatilization from platinum or platinum alloy The crystal obtained by solidification of the material is reduced as an impurity mixed into the molten glass in the clarification step. Therefore, when a glass substrate is manufactured, it is possible to suppress impurities formed of platinum or a platinum alloy from being mixed into the glass substrate.

上述熔融玻璃之加熱係藉由使電流自設置於上述管上之一對電極板流向上述管進行通電加熱而進行。於上述管之溫度局部下降之上述電極板之位置不具有氣相空間。The heating of the molten glass is performed by applying a current from one of the tubes to the electrode plate to the tube to be electrically heated. The position of the electrode plate partially lowered at the temperature of the tube does not have a gas phase space.

上述電極板用於對上述管進行通電加熱,但其為板形狀,因散熱而容易冷卻,因此上述管之壁之溫度會因設置上述電極板而局部性下降。因此,上述管較佳係以於上述電極板位置不具有上述氣相空間之方式形成。The electrode plate is used to heat the tube, but it has a plate shape and is easily cooled by heat dissipation. Therefore, the temperature of the wall of the tube is locally lowered by the provision of the electrode plate. Therefore, the tube is preferably formed such that the position of the electrode plate does not have the gas phase space.

上述熔融玻璃可含有SnO2 作為澄清劑。含有SnO2 作為澄清劑之熔融玻璃由於毒性少,因此自降低環境負荷之觀點考慮較佳,但其澄清功能低。因此,與先前相比,於澄清步驟中使熔融玻璃為更高之溫度。該情形時,澄清槽之上述管亦會因加熱而達到較先前更高之溫度,因此由於鉑或鉑合金揮發、進而揮發物凝固而導致在上述管之內壁面上生成結晶(鉑雜質、鉑合金雜質)之情形增多。以上述態樣之上述管之壁面之溫度為上述氣相空間內所含之鉑揮發物凝固之溫度以下之部位之至少一部分形成不具有上述氣相空間之部分之方式來形成上述管,因此在上述一部分或其附近之上述管之內壁面上難以生成鉑或鉑合金之結晶,作為雜質混入澄清步驟中之熔融玻璃中之情形減少。因此,製造玻璃基板時,能夠抑制由鉑或鉑合金形成之雜質混入玻璃基板中。The above molten glass may contain SnO 2 as a fining agent. Since the molten glass containing SnO 2 as a clarifying agent is less in toxicity, it is preferable from the viewpoint of reducing environmental load, but its clarifying function is low. Therefore, the molten glass is made to have a higher temperature in the clarification step than before. In this case, the tube of the clarification tank is also heated to a higher temperature than before, and therefore crystals are formed on the inner wall surface of the tube due to volatilization of platinum or platinum alloy and further solidification of the volatile matter (platinum impurity, platinum The situation of alloy impurities) has increased. In the above aspect, the temperature of the wall surface of the tube is such that at least a part of the portion below the temperature at which the platinum volatile material contained in the gas phase space is solidified forms the portion having no portion of the gas phase space, thereby forming the tube. It is difficult to form crystals of platinum or a platinum alloy on the inner wall surface of the above-mentioned part or the vicinity of the tube, and it is less likely to be mixed as impurities into the molten glass in the clarification step. Therefore, when a glass substrate is manufactured, it is possible to suppress impurities formed of platinum or a platinum alloy from being mixed into the glass substrate.

上述熔融玻璃於102.5 泊之溫度可為1500℃以上。102.5 泊之溫度為1500℃以上之玻璃係黏性高之玻璃,因此上述管內之熔融玻璃之溫度設定地較先前更高。然而,該情形時,亦以上述管之壁之溫度為上述鉑揮發物凝固之溫度以下之部位之至少一部分不具有上述氣相空間之 方式來形成上述管,因此在上述管之壁之溫度為上述鉑揮發物凝固之溫度以下之上述一部分或其附近之上述管之內壁面上難以生成鉑或鉑合金之揮發物凝固而得到之結晶,作為雜質混入澄清步驟中之熔融玻璃中之情形減少。因此,製造玻璃基板時,能夠抑制由鉑或鉑合金形成之雜質混入玻璃基板中。The molten glass may have a temperature of 1500 ° C or higher at a temperature of 10 2.5 poise. The temperature of 10 2.5 poise is glass having a high viscosity of 1500 ° C or higher, so the temperature of the molten glass in the above tube is set higher than before. However, in this case, the tube is formed such that at least a part of the portion where the temperature of the wall of the tube is equal to or lower than the temperature at which the platinum volatile substance is solidified does not have the gas phase space, and therefore the temperature at the wall of the tube is The crystal obtained by solidifying the volatile matter of platinum or the platinum alloy on the inner wall surface of the tube at or below the temperature at which the platinum volatiles are solidified is less likely to be mixed as impurities into the molten glass in the clarification step. Therefore, when a glass substrate is manufactured, it is possible to suppress impurities formed of platinum or a platinum alloy from being mixed into the glass substrate.

於上述管之不具有上述氣相空間之部位,上述管之內壁面四周與熔融玻璃接觸。因此,不存在上述氣相空間中所含之鉑揮發物凝固用之上述管之內壁面。因此,作為雜質混入澄清步驟中之熔融玻璃中之情形減少。The portion of the inner wall surface of the tube is in contact with the molten glass at a portion of the tube that does not have the gas phase space. Therefore, there is no inner wall surface of the above-mentioned tube for solidifying the platinum volatiles contained in the gas phase space. Therefore, the situation in which the impurities are mixed into the molten glass in the clarification step is reduced.

更具體而言,上述管具備:上述管之管剖面整體為上述熔融玻璃之流路且不具有上述氣相空間之第1部分;及上述澄清槽之管路剖面之一部分為上述熔融玻璃之流路,以使具有上述氣相空間且具有上述熔融玻璃之液面之第2部分。因此,如上所述,上述管之內壁面上難以生成由鉑或鉑合金之揮發物凝固而得到之結晶,作為雜質混入澄清步驟中之熔融玻璃中之情形減少。More specifically, the tube includes a first portion in which the tube cross section of the tube is the flow path of the molten glass and does not have the first portion of the vapor phase space, and a portion of the tube cross section of the clarification tank is the flow of the molten glass The road has a second portion having the gas phase space and having the liquid surface of the molten glass. Therefore, as described above, it is difficult to form crystals obtained by solidification of a volatile substance of platinum or a platinum alloy on the inner wall surface of the tube, and it is reduced as an impurity to be mixed into the molten glass in the clarification step.

上述管之管剖面例如自上述管之不具有上述氣相空間之部位階段性或連續性擴大。The tube cross section of the tube is expanded in stages or continuously from the portion of the tube that does not have the gas phase space.

又,上述澄清槽之上述管較佳以上述管之溫度為1600℃以下之部位之至少一部分不具有上述氣相空間之方式來形成。Further, it is preferable that the tube of the clarification tank is formed such that at least a part of the portion where the temperature of the tube is 1600 ° C or less does not have the gas phase space.

作為上述玻璃基板,較佳為使用無鹼玻璃之無鹼玻璃板、或者使用含有微量鹼性成分之含微量鹼之玻璃之含微量鹼玻璃板。例如平板顯示器用之玻璃基板中,其表面上使用有TFT(Thin Film Transistor,薄膜電晶體)。該情形時,自抑制TFT之影響之觀點出發,玻璃基板較佳使用無鹼玻璃或含微量鹼玻璃。然而,無鹼玻璃或含微量鹼玻璃之高溫黏性高。因此,熔解槽以及澄清槽中之熔融玻璃之溫度較先前變得更高溫。即便如上所述使澄清槽中之熔融玻璃為高 溫之情形時,於上述管之壁面之溫度為上述氣相空間內所含之鉑揮發物凝固之溫度以下之部位之至少一部分亦形成有不具有上述氣相空間之部分。因此,於上述一部分或其附近之上述管之內壁面上難以生成鉑或鉑合金之結晶,作為雜質混入澄清步驟中之熔融玻璃中之情形減少。因此,製造玻璃基板時,能夠抑制由鉑或鉑合金形成之雜質混入至玻璃基板中。As the glass substrate, an alkali-free glass plate using an alkali-free glass or a trace alkali glass plate containing a glass containing a trace amount of a basic component and containing a small amount of alkali is preferably used. For example, in a glass substrate for a flat panel display, a TFT (Thin Film Transistor) is used on the surface. In this case, from the viewpoint of suppressing the influence of the TFT, the glass substrate preferably uses an alkali-free glass or a trace amount of alkali glass. However, alkali-free glass or a small amount of alkali glass has a high temperature viscosity. Therefore, the temperature of the molten glass in the melting tank and the clarification tank becomes higher than before. Even if the molten glass in the clarification tank is made high as described above In the case of temperature, at least a part of a portion where the temperature of the wall surface of the tube is equal to or lower than the temperature at which the platinum volatile matter contained in the gas phase space is solidified is also formed without a portion having the gas phase space. Therefore, it is difficult to form crystals of platinum or a platinum alloy on the inner wall surface of the above-mentioned tube or the vicinity thereof, and it is less likely to be mixed as impurities into the molten glass in the clarification step. Therefore, when a glass substrate is manufactured, it is possible to suppress impurities formed of platinum or a platinum alloy from being mixed into the glass substrate.

上述之一對電極板例如可設置於上述管之入口以及出口之兩端部。One of the pair of electrode plates may be provided, for example, at both ends of the inlet and the outlet of the tube.

本發明之另一態樣為具有用於生成熔融玻璃之熔解槽之玻璃基板之製造裝置。該製造裝置包括:熔解裝置,其將投入之玻璃原料熔解來製作熔融玻璃;澄清槽,其包含由鉑或鉑合金構成之管,於上述管中至少進行脫泡處理,該脫泡處理係於形成有氣相空間之狀態下使上述熔融玻璃通過之期間,使電流在設置於上述管之一對電極板之間流通從而對上述管進行通電加熱,然後使氣泡排放至上述氣相空間;成形裝置,其對通過上述澄清槽後之上述熔融玻璃進行成形而形成玻璃片;緩冷裝置,其對上述玻璃片進行緩冷;及切斷裝置,其對緩冷後之上述玻璃片進行切斷而形成玻璃基板。Another aspect of the present invention is a manufacturing apparatus having a glass substrate for producing a melting tank of molten glass. The manufacturing apparatus includes: a melting device that melts the input glass raw material to produce molten glass; and a clarification tank including a tube made of platinum or a platinum alloy, wherein at least a defoaming treatment is performed in the tube, the defoaming treatment is performed a period in which the molten glass is passed through in a state in which the vapor phase is formed, a current is supplied between one of the tubes and the pair of electrode plates, and the tube is electrically heated, and then the bubbles are discharged to the gas phase space; a device for forming a glass sheet by molding the molten glass after passing through the clarification tank; a slow cooling device for slowly cooling the glass sheet; and a cutting device for cutting the glass sheet after the slow cooling A glass substrate is formed.

上述管中,於上述管之長度方向至少存在一部分上述管之壁之溫度為上述氣相空間內所含之鉑揮發物凝固之溫度以下之部位,於上述一部分中形成不具有上述氣相空間之部分。In the tube, at least a portion of the wall of the tube in the longitudinal direction of the tube is a temperature lower than a temperature at which the platinum volatile matter contained in the gas phase space is solidified, and the gas phase space is not formed in the portion. section.

上述管之壁之溫度為上述氣相空間內所含之鉑揮發物之凝固溫度以下之上述管之長度方向之部分之至少一部分不具有上述氣相空間,因此在上述部分之上述一部分或其附近之上述管之內壁面上難以 生成由鉑或鉑合金之揮發物凝固而得到之結晶,作為雜質混入澄清步驟中之熔融玻璃中之情形減少。因此,玻璃基板之製造裝置能夠抑制由鉑或鉑合金形成之雜質混入玻璃基板中。At least a part of a portion of the wall of the tube having a temperature lower than a solidification temperature of the platinum volatile material contained in the gas phase space does not have the gas phase space, and therefore is at or near the portion of the portion It is difficult to make the inner wall surface of the above tube A crystal obtained by solidification of a volatile matter of platinum or a platinum alloy is formed, and the case where it is mixed as an impurity into the molten glass in the clarification step is reduced. Therefore, the apparatus for manufacturing a glass substrate can suppress impurities which are formed of platinum or a platinum alloy from being mixed into the glass substrate.

上述熔融玻璃之加熱係藉由使電流自設置於上述管上之一對電極板流向上述管進行通電加熱而進行。此時,上述管之壁之溫度為上述鉑揮發物凝固之溫度以下之部位係例如在上述管之長度方向上上述管之壁之溫度因設置有上述電極板而局部性下降之電極板位置。The heating of the molten glass is performed by applying a current from one of the tubes to the electrode plate to the tube to be electrically heated. In this case, the temperature of the wall of the tube below the temperature at which the platinum volatile material is solidified is, for example, the position of the electrode plate in which the temperature of the wall of the tube is locally lowered by the electrode plate provided in the longitudinal direction of the tube.

根據上述態樣之玻璃基板之製造方法以及製造裝置,可抑制因自玻璃基板之製造過程中所使用之澄清槽之管揮發出之鉑或鉑合金形成的雜質之混入。According to the method and apparatus for producing a glass substrate of the above aspect, it is possible to suppress the incorporation of impurities formed by platinum or a platinum alloy which is volatilized from the tube of the clarification tank used in the production process of the glass substrate.

100‧‧‧熔解裝置100‧‧‧melting device

101‧‧‧熔解槽101‧‧‧melting tank

101a‧‧‧液槽101a‧‧‧ liquid tank

101b‧‧‧上部空間101b‧‧‧Upper space

101c‧‧‧液面101c‧‧‧ liquid level

101d‧‧‧螺旋給料機101d‧‧‧Spiral feeder

102‧‧‧澄清槽102‧‧‧Clarification tank

102a‧‧‧澄清管102a‧‧‧Clarification tube

102b‧‧‧通氣管102b‧‧‧ snorkel

102c、102d‧‧‧電極板102c, 102d‧‧‧electrode plates

102g‧‧‧交流電源102g‧‧‧AC power supply

103‧‧‧攪拌槽103‧‧‧Stirring tank

103a‧‧‧攪拌器103a‧‧‧Agitator

104、105、106‧‧‧玻璃供給管104, 105, 106‧‧‧ glass supply tube

200‧‧‧成形裝置200‧‧‧Forming device

210‧‧‧成形體210‧‧‧Formed body

220‧‧‧緩冷裝置220‧‧‧ Slow cooling device

300‧‧‧切斷裝置300‧‧‧cutting device

圖1係表示本實施形態之玻璃基板之製造方法之步驟之一例之圖。Fig. 1 is a view showing an example of a procedure of a method for producing a glass substrate of the present embodiment.

圖2係模式性表示本實施形態中進行熔解步驟~切斷步驟之裝置之一例之圖。Fig. 2 is a view schematically showing an example of an apparatus for performing a melting step to a cutting step in the embodiment.

圖3係對本實施形態之澄清槽進行說明之立體圖。Fig. 3 is a perspective view showing the clarification tank of the embodiment.

圖4(a)、(b)係表示本實施形態之澄清管之剖面之圖。4(a) and 4(b) are views showing a cross section of the clarification pipe of the present embodiment.

以下,對本實施形態之玻璃基板之製造方法以及製造裝置進行說明。圖1係表示本實施形態之玻璃基板之製造方法之步驟之一例之圖。Hereinafter, a method of manufacturing a glass substrate and a manufacturing apparatus of the present embodiment will be described. Fig. 1 is a view showing an example of a procedure of a method for producing a glass substrate of the present embodiment.

玻璃基板之製造方法主要具有熔解步驟(ST1)、澄清步驟(ST2)、均質化步驟(ST3)、供給步驟(ST4)、成形步驟(ST5)、緩冷步驟(ST6)及切斷步驟(ST7)。除此以外,還具有研削步驟、研磨步驟、清洗步驟、檢查步驟、包裝步驟等;在包裝步驟中進行了層積之複數個玻璃 基板搬運至收貨方之工作人員。The manufacturing method of a glass substrate mainly has a melting step (ST1), a clarification step (ST2), a homogenization step (ST3), a supply step (ST4), a molding step (ST5), a slow cooling step (ST6), and a cutting step (ST7). ). In addition to this, there are a grinding step, a grinding step, a washing step, an inspection step, a packaging step, and the like; a plurality of layers of glass laminated in the packaging step The substrate is transported to the receiving party's staff.

熔解步驟(ST1)於熔解槽中進行。熔解步驟中,藉由將玻璃原料投入至蓄積於熔解槽中之熔融玻璃之液面上來製作熔融玻璃。進而,使熔融玻璃自流出口流向後步驟,上述流出口設置於熔解槽之內壁中之在俯視呈長方形之熔解槽之長度方向對置之內壁之一側之底部。The melting step (ST1) is carried out in a melting tank. In the melting step, molten glass is produced by putting a glass raw material into the liquid surface of the molten glass accumulated in the melting tank. Further, the molten glass is flown from the outflow port to the bottom portion, and the outflow port is provided at the bottom of one side of the inner wall facing the longitudinal direction of the melting groove in a plan view in the inner wall of the melting tank.

此處,於熔解槽中使用電極對熔解槽中之熔融玻璃進行通電加熱,藉此於熔解槽中得到具有期望溫度之熔融玻璃。即,熔解槽之熔融玻璃係藉由使電流自電極流經熔融玻璃自身而自我發熱來升溫。除了利用通電對熔融玻璃進行加熱外,亦可利用燃燒器輔助性地提供火焰而進行玻璃原料之熔解。再者,玻璃原料中添加有澄清劑。對於澄清劑,自降低環境負荷之觀點出發,較佳使用SnO2 (氧化錫)。Here, the molten glass in the melting tank is electrically heated by using an electrode in the melting tank, whereby molten glass having a desired temperature is obtained in the melting tank. That is, the molten glass of the melting tank is heated by self-heating by causing a current to flow from the electrode through the molten glass itself. In addition to heating the molten glass by energization, it is also possible to use a burner to assist in providing a flame to melt the glass raw material. Further, a clarifying agent is added to the glass raw material. For the clarifying agent, SnO 2 (tin oxide) is preferably used from the viewpoint of reducing the environmental load.

澄清步驟(ST2)係在澄清槽之鉑或鉑合金製之澄清管之內部進行。澄清步驟中,使澄清槽之管內之熔融玻璃升溫。該過程中,澄清劑係藉由還原反應放出氧、之後作為還原劑而發揮作用之物質。熔融玻璃中所含之含O2 、CO2 或SO2 之氣泡吸收由澄清劑之還原反應生成之O2 而成長,上浮至熔融玻璃之液面上,然後氣泡破裂消失。氣泡中所含之氣體通過設置於澄清槽之氣相空間而排出至外部空氣中。The clarification step (ST2) is carried out inside a clarification tube made of platinum or a platinum alloy in a clarification tank. In the clarification step, the molten glass in the tube of the clarification tank is heated. In this process, the clarifying agent is a substance which functions as a reducing agent by releasing oxygen by a reduction reaction. The bubble containing O 2 , CO 2 or SO 2 contained in the molten glass absorbs O 2 generated by the reduction reaction of the clarifying agent, grows up, floats up to the liquid surface of the molten glass, and then the bubble collapses and disappears. The gas contained in the bubbles is discharged to the outside air through a gas phase space provided in the clarification tank.

之後,於澄清步驟中使熔融玻璃之溫度下降。該過程中,藉由澄清劑之還原反應而得到之還原劑發生氧化反應。藉此,熔融玻璃中殘存之氣泡中之O2 等氣體成分再次被吸收至熔融玻璃中,氣泡消失。Thereafter, the temperature of the molten glass is lowered in the clarification step. In this process, the reducing agent obtained by the reduction reaction of the clarifying agent undergoes an oxidation reaction. Thereby, the gas component such as O 2 in the bubbles remaining in the molten glass is again absorbed into the molten glass, and the bubbles disappear.

於均質化步驟(ST3)中,使用攪拌器對通過自澄清槽延伸出之配管而供給之攪拌槽內之熔融玻璃進行攪拌,從而進行玻璃成分之均質化。藉此能夠減少波筋等原因所致之玻璃組成不均。再者,攪拌槽可以設置1個,亦可設置2個。In the homogenization step (ST3), the molten glass in the stirring tank supplied through the piping extending from the clarification tank is stirred by a stirrer to homogenize the glass component. Thereby, it is possible to reduce the glass composition unevenness caused by the ribs and the like. Furthermore, one stirring tank can be provided, or two stirring tanks can be provided.

於供給步驟(ST4)中,熔融玻璃通過從攪拌槽延伸出之配管而供給至成形裝置。In the supply step (ST4), the molten glass is supplied to the molding apparatus through a pipe extending from the stirring tank.

於成形裝置中,進行成形步驟(ST5)以及緩冷步驟(ST6)。In the molding apparatus, a forming step (ST5) and a slow cooling step (ST6) are performed.

於成形步驟(ST5)中,將熔融玻璃成形為片狀玻璃,形成片狀玻璃之流體。成形能夠使用溢流下拉法(overflow download)或浮(float)法。後述之本實施形態中使用溢流下拉法。In the molding step (ST5), the molten glass is formed into a sheet glass to form a fluid of the sheet glass. The forming can use an overflow download method or a float method. In the present embodiment to be described later, an overflow down-draw method is used.

於緩冷步驟(ST6)中,成形流動之片狀玻璃係以形成期望之厚度、不產生內部應變之方式,進而以不產生翹曲之方式進行冷卻。In the slow cooling step (ST6), the flow-formed sheet glass is formed so as to have a desired thickness and no internal strain, and is further cooled without causing warpage.

於切斷步驟(ST7)中,於切斷裝置中將從成形裝置供給之片狀玻璃切斷為特定之長度,從而得到板狀之玻璃板。切斷後之玻璃板進而切斷為特定之尺寸,形成目標尺寸之玻璃基板。之後,進行玻璃基板之端面之研削、研磨,進行玻璃基板之清洗,進而,檢查有無氣泡或波筋等異常缺陷後,將檢查合格品之玻璃板作為最終產品進行包裝。In the cutting step (ST7), the sheet glass supplied from the molding device is cut into a specific length in the cutting device to obtain a plate-shaped glass plate. The cut glass sheet is further cut into a specific size to form a glass substrate of a target size. Thereafter, the end surface of the glass substrate is ground and polished, and the glass substrate is cleaned. Further, the presence or absence of abnormal defects such as bubbles or ribs is checked, and then the glass plate of the qualified product is packaged as a final product.

圖2係模式性表示本實施形態中進行熔解步驟(ST1)~切斷步驟(ST7)之裝置之一例之圖。如圖2所示,該裝置中主要具有熔解裝置100、成形裝置200及切斷裝置300。熔解裝置100具有熔解槽101、澄清槽102、攪拌槽103及玻璃供給管104、105、106。Fig. 2 is a view schematically showing an example of a device for performing a melting step (ST1) to a cutting step (ST7) in the embodiment. As shown in FIG. 2, the apparatus mainly has a melting apparatus 100, a forming apparatus 200, and a cutting apparatus 300. The melting apparatus 100 has a melting tank 101, a clarification tank 102, a stirring tank 103, and glass supply pipes 104, 105, and 106.

於圖2所示出之示例之熔解槽(熔解裝置)101中,玻璃原料之投入係使用螺旋給料機101d而進行。本實施形態中,使用螺旋給料機101d而進行玻璃原料之投入,但亦可使用其他原料投入方式、例如料斗而進行玻璃原料之投入,對於玻璃原料之投入方式並無限制。澄清槽102包括鉑或鉑合金製之澄清管102a(參照圖3)。於澄清管102a中至少對熔融玻璃MG進行脫泡處理,該脫泡處理中,於按照熔融玻璃MG具有液面之方式形成有氣相空間之狀態下使熔融玻璃MG通過時,使電流在設置於澄清管102a之一對電極板間流通從而對澄清管102a進行通電加熱,藉此使氣泡排放至氣相空間。攪拌槽103利用攪拌器103a對熔融玻璃MG進行攪拌從而使其均質化。In the melting tank (melting apparatus) 101 exemplified in Fig. 2, the glass material is supplied by using the screw feeder 101d. In the present embodiment, the glass material is supplied by using the screw feeder 101d. However, the glass material may be supplied by using another material input method, for example, a hopper, and the method of introducing the glass material is not limited. The clarification tank 102 includes a clarification tube 102a made of platinum or a platinum alloy (refer to FIG. 3). At least the molten glass MG is subjected to a defoaming treatment in the clarification pipe 102a. In the defoaming process, when the molten glass MG is passed in a state in which the vapor phase is formed so that the molten glass MG has a liquid surface, the current is set. The clarification pipe 102a is circulated to one of the clarification pipes 102a to electrically conduct the clarification pipe 102a, thereby discharging the bubbles into the gas phase space. In the stirring tank 103, the molten glass MG is stirred by the agitator 103a, and it is homogenized.

成形裝置200包括成形體210,藉由使用成形體210之溢流下拉法 對通過澄清槽200、攪拌槽103之熔融玻璃MG進行成形,從而得到玻璃片SG。The forming apparatus 200 includes a formed body 210 by using an overflow down-draw method of the formed body 210 The molten glass MG which passed the clarification tank 200 and the stirring tank 103 is shape|molded, and the glass piece SG is obtained.

緩冷裝置220以玻璃片SG不產生板厚偏差、應變以及彎曲之方式對玻璃片SG進行緩冷。The slow cooling device 220 slowly cools the glass sheet SG so that the glass sheet SG does not cause variations in thickness, strain, and bending.

切斷裝置300對緩冷後之玻璃片SG進行切斷從而形成玻璃基板。The cutting device 300 cuts the slowly cooled glass sheet SG to form a glass substrate.

(澄清步驟)(clarification step)

圖3係主要表示進行澄清步驟之裝置構成之圖。圖4(a)、(b)係表示本實施形態中使用之澄清管之剖面與熔融玻璃之關係之圖。Fig. 3 is a view mainly showing the configuration of a device for performing a clarification step. 4(a) and 4(b) are views showing the relationship between the cross section of the clarification pipe used in the present embodiment and the molten glass.

澄清步驟包括脫泡處理及吸收處理。於以下之說明中,以使用SnO2 作為澄清劑之示例而進行說明。與先前之As2 O3 相比,SnO2 之澄清功能較低,但於環境負荷低方面,可較佳作為澄清劑來使用。然而,SnO2 之澄清功能比As2 O3 低,因此在使用SnO2 時必須要使熔融玻璃MG之澄清步驟時之熔融玻璃MG之溫度高於先前。該情形時,例如可使澄清步驟中之最高溫度為1700℃左右、較佳為1710℃以下、更佳為1720℃以下。The clarification step includes a defoaming treatment and an absorption treatment. In the following description, an example in which SnO 2 is used as a clarifying agent will be described. SnO 2 has a lower clarifying function than the previous As 2 O 3 , but can be preferably used as a clarifying agent in terms of low environmental load. However, the clarification function of SnO 2 is lower than that of As 2 O 3 , so the temperature of the molten glass MG at the time of the clarification step of the molten glass MG must be made higher than the previous one when using SnO 2 . In this case, for example, the maximum temperature in the clarification step may be about 1,700 ° C, preferably 1710 ° C or lower, more preferably 1720 ° C or lower.

於熔解槽101中熔解後之熔融玻璃MG係藉由玻璃供給管104(參照圖2)導入至澄清槽102之澄清管102a。The molten glass MG melted in the melting tank 101 is introduced into the clarification pipe 102a of the clarification tank 102 by the glass supply pipe 104 (refer to FIG. 2).

如圖3所示,澄清槽102具備鉑或鉑合金製之長條狀之澄清管102a、設置於澄清管102a之頂部之通氣管102b及電極板102c、102d。As shown in Fig. 3, the clarification tank 102 is provided with a long clarification pipe 102a made of platinum or a platinum alloy, a vent pipe 102b provided at the top of the clarification pipe 102a, and electrode plates 102c and 102d.

雖未圖示,但於澄清管102a之周圍可以被覆耐火磚。於澄清管102a之大致中央部設置有通氣管102b。Although not shown, refractory bricks may be coated around the clarification pipe 102a. A vent pipe 102b is provided at a substantially central portion of the clarification pipe 102a.

於澄清管102a之兩側之端部,以捲繞澄清管102a之外周之方式法蘭狀設置有電極板102c、102d。電極板102c、102d與交流電源102g連接,施加有特定電壓。電極板102c、102d使電流於澄清管102a中流動從而對澄清管102a進行通電加熱,藉此使流經澄清管102a之熔融玻璃MG之溫度升溫至例如1630℃以上。該情形時,例如可使澄清步驟中 之最高溫度為1700℃左右、較佳為1710℃以下、更佳為1720℃以下。Electrode plates 102c and 102d are flange-shaped at the ends of both sides of the clarification pipe 102a so as to wind the outer circumference of the clarification pipe 102a. The electrode plates 102c and 102d are connected to the alternating current power source 102g, and a specific voltage is applied. The electrode plates 102c and 102d flow a current through the clarification pipe 102a to electrically heat the clarification pipe 102a, thereby raising the temperature of the molten glass MG flowing through the clarification pipe 102a to, for example, 1630 ° C or higher. In this case, for example, the clarification step can be The maximum temperature is about 1700 ° C, preferably 1710 ° C or less, more preferably 1720 ° C or less.

另一方面,於澄清管102a內,熔融玻璃MG係以熔融玻璃MG具有液面之方式流動。對於由於升溫導致黏性例如為120~400泊之熔融玻璃MG,於熔融玻璃MG內因澄清劑之作用而膨脹之氣泡上浮,於熔融玻璃MG之液面氣泡破裂,從而使氣泡所含之氣體排放至氣相空間。即,進行脫泡處理。因此,澄清管102a在其內部以熔融玻璃MG具有液面之方式具有氣相空間。On the other hand, in the clarification pipe 102a, the molten glass MG flows so that the molten glass MG has a liquid surface. In the molten glass MG having a viscosity of, for example, 120 to 400 poise due to the temperature rise, the bubble expanded in the molten glass MG by the action of the clarifying agent floats, and the bubble on the surface of the molten glass MG is broken, thereby discharging the gas contained in the bubble. To the gas phase space. That is, a defoaming process is performed. Therefore, the clarification pipe 102a has a gas phase space inside thereof in such a manner that the molten glass MG has a liquid surface.

於澄清管102a之上方之氣相空間破裂而放出之氣體成分通過通氣管102b排放至澄清管102a外。上浮速度快且直徑大之氣泡於澄清管102a中被除去。The gas component which is ruptured in the gas phase space above the clarification pipe 102a is discharged to the outside of the clarification pipe 102a through the vent pipe 102b. The bubbles having a fast floating speed and a large diameter are removed in the clarification pipe 102a.

使流經澄清管102a內之熔融玻璃MG之溫度維持在例如1630℃以上之後,於澄清管102a之後半部分以後或後續之玻璃供給管105以後緩慢(階段性或連續性)降溫,從而進行泡之吸收處理。如上所述,於吸收處理中,氣泡因熔融玻璃MG之降溫而吸收於熔融玻璃MG內從而消失。After the temperature of the molten glass MG flowing through the clarification pipe 102a is maintained at, for example, 1630 ° C or higher, the temperature is gradually lowered (staged or continuous) after the second half of the clarification pipe 102a or after the subsequent glass supply pipe 105, thereby performing bubble generation. Absorption treatment. As described above, in the absorption treatment, the bubbles are absorbed in the molten glass MG due to the temperature drop of the molten glass MG, and disappear.

圖3中表示設置有一對電極板102c、102d之例,但例如於澄清管102a之後半部分降溫之情形時,除了電極板102c、102d之外還可以設置一對以上之電極板。Although an example in which a pair of electrode plates 102c and 102d are provided is shown in Fig. 3, for example, in the case where the second half of the clarification pipe 102a is cooled, a pair of electrode plates may be provided in addition to the electrode plates 102c and 102d.

再者,於澄清管102a中設置有用於將於熔融玻璃MG之液面破裂而放出氣體排放至外部氣體之氣相空間,並且於澄清管102a上設置有通氣管102b。因此,與外部氣體相通之氣相空間含有氧。Further, the clarification pipe 102a is provided with a gas phase space for rupturing the liquid surface of the molten glass MG to discharge the exhaust gas to the outside air, and a vent pipe 102b is provided on the clarification pipe 102a. Therefore, the gas phase space communicating with the outside air contains oxygen.

另一方面,澄清管102a因通電加熱而被加熱至高溫(例如1700℃左右),因此鉑或鉑合金容易自由鉑或鉑合金構成之澄清管102a之內壁面揮發。特別係由於氣相空間含有氧,因此鉑或鉑合金會進而向氣相空間揮發。因此,氣相空間含有自澄清管102a之內壁面氣化之鉑揮發物。On the other hand, since the clarification pipe 102a is heated to a high temperature (for example, about 1700 ° C) by electric conduction heating, the inner wall surface of the clarification pipe 102a made of platinum or a platinum alloy is easily volatilized. In particular, since the gas phase space contains oxygen, the platinum or platinum alloy is further volatilized into the gas phase space. Therefore, the gas phase space contains platinum volatiles vaporized from the inner wall surface of the clarification pipe 102a.

此處,澄清管102a之設置有電極板102c、102d之部分與其以外之部分相比,澄清管102a之剖面積狹窄。如圖4(a)所示,於設置有電極板102c、102d之部分,澄清槽102之澄清管102a之管路剖面整體為熔融玻璃MG之流路(斜線區域)。即,於澄清管102a之內部,於設置有電極板102c、102d之位置(電極板位置)不具有氣相空間。隨著遠離該部分,管路剖面逐漸擴大,如圖4(b)所示,澄清管102a之管路剖面之一部分為熔融玻璃MG之流路(斜線部分),熔融玻璃MG具有液面。即,於澄清槽102之澄清管102a中具備不具有氣相空間之部分(第1部分)、及具有氣相空間並具有熔融玻璃MG之液面之部分(第2部分),上述第1部分位於澄清槽102之澄清管102a之長度方向之電極板位置、並且澄清管102a之管路剖面整體為熔融玻璃MG之流路,上述第2部分中,澄清管102a之管路剖面之一部分為熔融玻璃MG之流路。再者,電極板102c、102d被設置為法蘭形狀,藉此電極板102c、102d與外部氣體接觸之面積大,具有冷卻功能,因此在電極板位置,澄清管102a之壁之溫度局部性下降。又,為了不使電極板102c、102d之溫度過高而從外部進行冷卻之情形時,溫度進而降低。即,於設置有電極板102c、102d之部分,澄清管102a之壁之溫度局部性降低。具體而言,澄清管102a中於澄清管102a之長度方向存在不具有氣相空間之部分,該部分之澄清管102a之壁之溫度為氣相空間內所含之鉑揮發物凝固之溫度以下。Here, the portion of the clarification pipe 102a where the electrode plates 102c and 102d are provided is narrower than the portion of the clarification pipe 102a. As shown in Fig. 4(a), in the portion where the electrode plates 102c and 102d are provided, the entire pipe cross section of the clarification pipe 102a of the clarification tank 102 is a flow path (hatched area) of the molten glass MG. That is, inside the clarification pipe 102a, there is no gas phase space at the position (electrode plate position) where the electrode plates 102c and 102d are provided. As the distance from the portion is increased, the pipe section is gradually enlarged. As shown in Fig. 4(b), one of the pipe sections of the clarification pipe 102a is a flow path (hatched portion) of the molten glass MG, and the molten glass MG has a liquid surface. In other words, the clarification pipe 102a of the clarification tank 102 is provided with a portion (first portion) having no gas phase space and a portion (second portion) having a gas phase space and having a liquid surface of the molten glass MG, and the first portion The electrode plate position in the longitudinal direction of the clarification pipe 102a of the clarification tank 102, and the pipe cross section of the clarification pipe 102a as a whole is a flow path of the molten glass MG, and in the second portion, a part of the pipe cross section of the clarification pipe 102a is melted. Glass MG flow path. Further, the electrode plates 102c and 102d are provided in a flange shape, whereby the electrode plates 102c and 102d have a large contact area with the outside air and have a cooling function, so that the temperature of the wall of the clarification pipe 102a is locally lowered at the position of the electrode plate. . Further, in order to prevent the temperature of the electrode plates 102c and 102d from being excessively high, the temperature is further lowered. That is, in the portion where the electrode plates 102c and 102d are provided, the temperature of the wall of the clarification pipe 102a is locally lowered. Specifically, in the clarification pipe 102a, there is a portion having no gas phase space in the longitudinal direction of the clarification pipe 102a, and the temperature of the wall of the clarification pipe 102a in this portion is equal to or lower than the temperature at which the platinum volatile matter contained in the gas phase space is solidified.

因此,若於該位置存在氣相空間,則氣相空間中之鉑揮發物於上述部分之周圍冷卻,從而容易凝固於該位置之內壁面上,容易生成鉑或鉑合金之結晶。該鉑或鉑合金之結晶之一部分以微粒之形式脫落,落於熔融玻璃MG內而容易混入熔融玻璃MG中。若此種熔融玻璃MG流入後步驟,則會製作出混入有金屬雜質之有缺陷之玻璃基板,因此不佳。Therefore, if a gas phase space exists at this position, the platinum volatile matter in the gas phase space is cooled around the above portion, and it is easy to solidify on the inner wall surface of the position, and it is easy to form crystals of platinum or platinum alloy. One part of the crystal of the platinum or platinum alloy falls off as fine particles, falls in the molten glass MG, and is easily mixed into the molten glass MG. When such a molten glass MG flows into the subsequent step, a defective glass substrate in which metal impurities are mixed is produced, which is not preferable.

本實施形態中,於澄清管102a之壁之溫度為氣相空間內所含之鉑揮發物凝固之溫度以下之長度方向之部分,具體而言,於設置有電極板102c、102d之部分(電極位置之內壁面),為了不存在氣相空間,澄清管102a之管路剖面較其以外之部分小。In the present embodiment, the temperature of the wall of the clarification pipe 102a is a portion in the longitudinal direction of the temperature at which the platinum volatile matter contained in the gas phase space is solidified, and specifically, the portion where the electrode plates 102c and 102d are provided (electrode) In the inner wall surface of the position, in order to prevent the gas phase space from being present, the pipe section of the clarification pipe 102a is smaller than the other portions.

氣相空間內所含之鉑揮發物凝固之溫度預先藉由實驗等而求出。該溫度根據鉑揮發物之揮發量而變動,上述鉑揮發物之揮發量受到氣相空間之氧分壓等氣相空間之條件影響。The temperature at which the platinum volatiles contained in the gas phase space are solidified is determined in advance by an experiment or the like. The temperature fluctuates depending on the amount of volatilization of the platinum volatiles, and the amount of volatilization of the platinum volatiles is affected by the conditions of the gas phase space such as the oxygen partial pressure of the gas phase space.

再者,本實施形態之澄清管102a之管剖面從澄清管102a之不具有氣相空間之第1部分連續擴大,但管剖面亦可階段性擴大。Further, the pipe cross section of the clarification pipe 102a of the present embodiment is continuously expanded from the first portion of the clarification pipe 102a which does not have the gas phase space, but the pipe cross section may be gradually expanded.

又,鉑揮發物凝固之溫度會因澄清管102a內之氣相空間之氣氛中之鉑或鉑合金之濃度而變化,但例如於澄清管102a之溫度為1600℃以下、特別係1500℃以下之區域容易產生鉑揮發物之凝固。因此,澄清管102a較佳以澄清管102a之溫度為1600℃以下之部位之至少一部分不具有氣相空間之方式來形成。Further, the temperature at which the platinum volatiles are solidified varies depending on the concentration of platinum or platinum alloy in the atmosphere of the gas phase space in the clarification pipe 102a, but for example, the temperature of the clarification pipe 102a is 1600 ° C or lower, particularly 1500 ° C or lower. The area is prone to solidification of platinum volatiles. Therefore, the clarification pipe 102a is preferably formed such that at least a part of the portion of the clarification pipe 102a having a temperature of 1600 ° C or less does not have a gas phase space.

於本實施形態中,澄清管102a為管路剖面積隨著遠離電極位置而逐漸擴大之構成,但本實施形態並不限定於此。亦可使用如於遠離電極位置特定距離之部分使管路剖面積急劇擴大之構成。In the present embodiment, the clarification pipe 102a has a configuration in which the cross-sectional area of the pipe gradually increases away from the electrode position, but the embodiment is not limited thereto. It is also possible to use a configuration in which the cross-sectional area of the pipe is sharply enlarged as a part of a distance away from the electrode position.

又,本實施形態之澄清管102a中,於澄清管102a之長度方向,存在有2處溫度為氣相空間內所含之鉑揮發物凝固之溫度以下之位置、即電極板位置,於該2個部位均形成不具有氣相空間之部分。然而,於澄清管102a之長度方向,澄清管102a中存在多處溫度為氣相空間內所含之鉑揮發物凝固之溫度以下之部分時,可於該等部分之至少一個部位形成不具有氣相空間之部分。Further, in the clarification pipe 102a of the present embodiment, in the longitudinal direction of the clarification pipe 102a, there are two positions where the temperature is equal to or lower than the temperature at which the platinum volatile matter contained in the gas phase space is solidified, that is, the position of the electrode plate. Each part forms a part that does not have a gas phase space. However, in the longitudinal direction of the clarification pipe 102a, when there are a plurality of portions of the clarification pipe 102a whose temperature is below the solidification temperature of the platinum volatiles contained in the gas phase space, no gas may be formed in at least one portion of the portions. Part of the phase space.

如此,澄清槽102之澄清管102a於澄清管102a之壁之溫度因設置電極板102c、102d而局部降低之電極板位置不具有氣相空間,澄清管102a之管路剖面整體為熔融玻璃MG之流路,因此自澄清管102a揮發 之鉑或鉑合金不會在電極板位置發生結晶化,因此,鉑雜質或鉑合金雜質等金屬雜質混入熔融玻璃MG中之情形少,能夠抑制金屬雜質向所製作之玻璃基板中之混入。Thus, the position of the electrode plate of the clarification pipe 102a of the clarification tank 102 at the temperature of the wall of the clarification pipe 102a is partially reduced by the electrode plates 102c and 102d, and the gas pipe space of the clarification pipe 102a is entirely the molten glass MG. Flow path, thus volatilizing from clarification tube 102a Since platinum or a platinum alloy does not crystallize at the position of the electrode plate, metal impurities such as platinum impurities or platinum alloy impurities are less likely to be mixed into the molten glass MG, and the incorporation of metal impurities into the produced glass substrate can be suppressed.

本實施形態之效果於如下述(A)、(B)情形、即澄清管內之熔融玻璃之溫度高於先前之情形時能夠更有效發揮。The effects of the present embodiment can be more effectively exhibited in the case of the following (A) and (B), that is, when the temperature of the molten glass in the clarification pipe is higher than the previous case.

(A)與先前作為澄清劑一直使用之As2 O3 相比,SnO2 毒性少,因此自降低環境負荷之觀點出發,較佳使用SnO2 作為澄清劑。然而,為了使與作為澄清劑一直使用之As2 O3 相比澄清功能較差之SnO2 之澄清功能有效地發揮,需使澄清管內之熔融玻璃之溫度高於先前。(A) as compared with previously been using a refining agent of As 2 O 3, SnO 2 and less toxicity, and therefore from the viewpoint of reducing the environmental impact of the departure, preferably using SnO 2 as a fining agent. However, in order to effectively exert the clarifying function of SnO 2 having a poorer clarifying function than As 2 O 3 which has been used as a clarifying agent, it is necessary to make the temperature of the molten glass in the clarification pipe higher than the previous one.

(B)對於高溫黏性高之熔融玻璃,於澄清步驟之脫泡處理中,亦要使澄清管內之熔融玻璃之溫度高於先前。作為高溫黏性高之玻璃,可以舉出例如熔融玻璃MG之102.5 泊之溫度為1500℃以上之玻璃。又,無鹼玻璃以及含微量鹼玻璃係高溫黏性高之玻璃。(B) For the molten glass having high viscosity at a high temperature, in the defoaming treatment in the clarification step, the temperature of the molten glass in the clarification tube is also made higher than the previous one. The glass having a high temperature and high viscosity is, for example, a glass having a temperature of 10 2.5 poise of the molten glass MG of 1500 ° C or higher. Moreover, the alkali-free glass and the glass containing a trace amount of alkali glass are high-temperature adhesive.

(玻璃組成)(glass composition)

玻璃基板之玻璃組成可以舉出例如以下之組成。The glass composition of the glass substrate can be exemplified by the following composition.

以下所示之組成之含有率以質量%表示。The content ratio of the composition shown below is expressed by mass%.

較佳含有下述成分之無鹼玻璃。An alkali-free glass containing the following components is preferred.

SiO2 :50%~70%、Al2 O3 :0%~25%、B2 O3 :1%~15%、MgO:0%~10%、CaO:0%~20%、SrO:0%~20%、BaO:0%~10%、RO:5%~30%(其中R係選自Mg、Ca、Sr以及Ba中之至少1種,並且係玻璃基板所含之物質)SiO 2 : 50% to 70%, Al 2 O 3 : 0% to 25%, B 2 O 3 : 1% to 15%, MgO: 0% to 10%, CaO: 0% to 20%, SrO: 0 %~20%, BaO: 0%~10%, RO: 5%~30% (where R is selected from at least one of Mg, Ca, Sr, and Ba, and is a substance contained in a glass substrate)

再者,本實施形態中為無鹼玻璃,但玻璃基板亦可為微量含有鹼金屬之含微量鹼玻璃。含有鹼金屬之情形時,較佳含有R'2 O之合計為0.10%以上且0.5%以下、較佳為0.20%以上且0.5%以下(其中R'係選自Li、Na以及K中之至少1種,並且係玻璃基板所含之物質)。當然,R'2 O之合計可以低於0.10%。又,較佳實質上不含有As2 O3 、Sb2 O3 以及PbO。Further, in the present embodiment, the alkali-free glass is used, but the glass substrate may be a trace amount of alkali glass containing an alkali metal. In the case of containing an alkali metal, the total content of R' 2 O is preferably 0.10% or more and 0.5% or less, preferably 0.20% or more and 0.5% or less (wherein R' is selected from at least Li, Na, and K. One type is a substance contained in a glass substrate). Of course, the total of R' 2 O can be less than 0.10%. Further, it is preferable that substantially no As 2 O 3 , Sb 2 O 3 and PbO are contained.

又,適用本實施形態之玻璃基板之製造方法之情形時,除了上述各成分之外,玻璃組成物還能夠以質量%表示含有0.01%~1%(較佳為0.01%~0.5%)之SnO2 、0%~0.2%(較佳為0.01%~0.08%)之Fe2 O3 ;若考慮到環境負荷,以實質上不含有As2 O3 、Sb2 O3 以及PbO之方式來製備玻璃原料。Further, in the case of applying the method for producing a glass substrate of the present embodiment, in addition to the above respective components, the glass composition can also contain 0.01% to 1% (preferably 0.01% to 0.5%) of SnO by mass%. 2 , 0% to 0.2% (preferably 0.01% to 0.08%) of Fe 2 O 3 ; if the environmental load is taken into consideration, the glass is prepared substantially without As 2 O 3 , Sb 2 O 3 and PbO raw material.

以上,對本發明之玻璃基板之製造方法以及製造裝置進行了詳細說明,但本發明並不限於上述實施形態,當然於不脫離本發明之主旨之範圍內,可以進行各種各樣之改良及變更。In the above, the present invention is not limited to the above-described embodiments, and various modifications and changes can be made without departing from the spirit and scope of the invention.

102‧‧‧澄清槽102‧‧‧Clarification tank

102a‧‧‧澄清管102a‧‧‧Clarification tube

102b‧‧‧通氣管102b‧‧‧ snorkel

102c、102d‧‧‧電極板102c, 102d‧‧‧electrode plates

102g‧‧‧交流電源102g‧‧‧AC power supply

Claims (10)

一種玻璃基板之製造方法,其特徵在於包括:熔解步驟,其係將玻璃原料熔解從而生成熔融玻璃;及澄清步驟,其包含脫泡處理,該脫泡處理係於包含由鉑或鉑合金構成且被加熱之長條狀之管之澄清槽中,於形成有氣相空間之狀態下使上述熔融玻璃通過之期間,對上述熔融玻璃進行加熱藉此將氣泡自上述熔融玻璃排放至上述氣相空間;上述澄清槽之管係以成為使上述氣相空間中所含之鉑揮發物凝固之溫度以下之部位之至少一部分不具有上述氣相空間的方式形成。 A method for producing a glass substrate, comprising: a melting step of melting a glass raw material to form a molten glass; and a clarifying step comprising a defoaming treatment comprising consisting of platinum or a platinum alloy and In the clarification tank of the heated long tube, the molten glass is heated while the molten glass is formed in a state in which the vapor phase is formed, thereby discharging the bubbles from the molten glass to the vapor phase space. The tube of the clarification tank is formed so that at least a part of a portion below the temperature at which the platinum volatile matter contained in the gas phase space is solidified does not have the gas phase space. 如請求項1之玻璃基板之製造方法,其中上述熔融玻璃之加熱係藉由使電流自設置於上述管上之一對電極板流向上述管進行通電加熱而進行,於上述管之溫度局部下降之上述電極板之位置上不具有氣相空間。 The method for producing a glass substrate according to claim 1, wherein the heating of the molten glass is performed by causing a current to flow from the one of the tubes to the tube to be electrically heated, and the temperature of the tube is locally lowered. The electrode plate does not have a gas phase space at the position. 如請求項1或2之玻璃基板之製造方法,其中上述熔融玻璃含有SnO2 作為澄清劑。The method for producing a glass substrate according to claim 1 or 2, wherein the molten glass contains SnO 2 as a fining agent. 如請求項1或2之玻璃基板之製造方法,其中上述熔融玻璃於102.5 泊之溫度為1500℃以上。The method for producing a glass substrate according to claim 1 or 2, wherein the molten glass has a temperature of 1500 ° C or higher at 10 2.5 poise. 如請求項1或2之玻璃基板之製造方法,其中於上述管之不具有上述氣相空間之部位,上述管之內壁面四周與熔融玻璃接觸。 The method for producing a glass substrate according to claim 1 or 2, wherein the inner wall surface of the tube is in contact with the molten glass at a portion of the tube which does not have the gas phase space. 如請求項1或2之玻璃基板之製造方法,其中上述管具備:上述管之管剖面整體為上述熔融玻璃之流路且不具有上述氣相空間之第1部分;及上述澄清槽之管路剖面之一部分為上述熔融玻璃之流路,以使具有上述氣相空間,且具有上述熔融玻璃之液面 之第2部分。 The method for producing a glass substrate according to claim 1 or 2, wherein the tube has: a tube having a cross section of the tube as a whole of the molten glass flow path and having no first portion of the gas phase space; and a conduit of the clarification tank One of the sections is a flow path of the molten glass to have a gas phase space and have a liquid surface of the molten glass Part 2 of it. 如請求項1或2之玻璃基板之製造方法,其中上述管之管剖面自上述管之不具有上述氣相空間之部位階段性或連續性擴大。 The method for producing a glass substrate according to claim 1 or 2, wherein the tube cross section of the tube is expanded in a stepwise or continuous manner from a portion of the tube which does not have the gas phase space. 如請求項1或2之玻璃基板之製造方法,其中上述一對電極板係設置於上述管之入口以及出口之兩端部。 The method of producing a glass substrate according to claim 1 or 2, wherein the pair of electrode plates are provided at both ends of the inlet and the outlet of the tube. 如請求項1或2之玻璃基板之製造方法,其中上述玻璃基板係無鹼玻璃或含微量鹼玻璃基板。 The method for producing a glass substrate according to claim 1 or 2, wherein the glass substrate is an alkali-free glass or a trace amount of an alkali glass substrate. 一種玻璃基板之製造裝置,其特徵在於:其係具有生成熔融玻璃之熔解槽者,且包括:熔解裝置,其將投入之玻璃原料熔解來製作熔融玻璃;澄清槽,其含有由鉑或鉑合金構成之管,於上述管中至少進行脫泡處理,該脫泡處理係於形成有氣相空間之狀態下使上述熔融玻璃通過之期間,使電流在設置於上述管之一對電極板之間流通從而對上述管進行通電加熱,然後使氣泡排放至上述氣相空間;成形裝置,其對通過上述澄清槽後之上述熔融玻璃進行成形從而形成玻璃片;緩冷裝置,其對上述玻璃片進行緩冷;及切斷裝置,其對緩冷後之上述玻璃片進行切斷從而形成玻璃基板;上述管中,於上述管之長度方向上,在上述管之壁之溫度為上述氣相空間內所含之鉑揮發物凝固之溫度以下之部位之至少一部分形成有不具有上述氣相空間之部分。 A glass substrate manufacturing apparatus characterized by comprising a melting tank for generating molten glass, and comprising: a melting device for melting an input glass raw material to produce molten glass; and a clarification tank containing platinum or a platinum alloy In the tube, at least a defoaming treatment is performed in the tube, and the defoaming treatment is performed while the molten glass is passed through the vapor phase space, and a current is provided between one of the tubes and the counter electrode Circulating to electrically heat the tube, and then discharging the bubbles to the gas phase space; forming means for forming the glass sheet by molding the molten glass after passing through the clarification tank; and slow cooling device for performing the glass sheet a slow cooling; and a cutting device for cutting the glass sheet after the slow cooling to form a glass substrate; wherein, in the tube, the temperature of the wall of the tube is in the gas phase space in the longitudinal direction of the tube At least a portion of the portion below the temperature at which the platinum volatiles are solidified is formed with a portion that does not have the gas phase space.
TW102107094A 2012-06-29 2013-02-27 A method for manufacturing a glass substrate, and a manufacturing apparatus for a glass substrate TWI478883B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012147993 2012-06-29

Publications (2)

Publication Number Publication Date
TW201400427A TW201400427A (en) 2014-01-01
TWI478883B true TWI478883B (en) 2015-04-01

Family

ID=49892149

Family Applications (1)

Application Number Title Priority Date Filing Date
TW102107094A TWI478883B (en) 2012-06-29 2013-02-27 A method for manufacturing a glass substrate, and a manufacturing apparatus for a glass substrate

Country Status (4)

Country Link
JP (1) JP5552551B2 (en)
KR (1) KR101486133B1 (en)
CN (1) CN103508654B (en)
TW (1) TWI478883B (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014119709A1 (en) * 2013-02-01 2014-08-07 AvanStrate株式会社 Method for manufacturing glass substrate and glass substrate manufacturing apparatus
JP6247958B2 (en) * 2014-02-26 2017-12-13 AvanStrate株式会社 Glass plate manufacturing method and glass plate manufacturing apparatus
CN204356216U (en) * 2014-03-31 2015-05-27 安瀚视特控股株式会社 Glass substrate manufacturing installation
JP5976863B2 (en) * 2014-03-31 2016-08-24 AvanStrate株式会社 Glass substrate manufacturing method and glass substrate manufacturing apparatus
TWI629248B (en) * 2014-06-30 2018-07-11 安瀚視特控股股份有限公司 Method for producing glass substrate, glass substrate and glass substrate laminate
US20170305777A1 (en) * 2014-09-24 2017-10-26 Corning Incorporated Volatile filtration systems for fusion draw machines
JP6494969B2 (en) * 2014-09-30 2019-04-03 AvanStrate株式会社 Glass substrate manufacturing method and glass substrate manufacturing apparatus
JP6792821B2 (en) * 2016-12-14 2020-12-02 日本電気硝子株式会社 Support structure of glass supply pipe, flat glass manufacturing equipment, flat glass manufacturing method, and preheating method of glass supply pipe
JP6768216B2 (en) * 2016-12-16 2020-10-14 日本電気硝子株式会社 Plate glass manufacturing method, clarification container and plate glass manufacturing equipment
KR102417853B1 (en) * 2017-12-08 2022-07-06 코닝 인코포레이티드 Glass manufacturing apparatus and glass manufacturing method
JP7092021B2 (en) 2018-12-21 2022-06-28 日本電気硝子株式会社 Manufacturing method of glass articles
JP7212535B2 (en) * 2019-01-31 2023-01-25 AvanStrate株式会社 Glass substrate manufacturing method and glass substrate manufacturing apparatus

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080092597A1 (en) * 2005-06-06 2008-04-24 Asahi Glass Company, Limited Glass manufacturing apparatus, a structural member thereof and method for heating the structural member by conduction heating
US20090120133A1 (en) * 2007-11-08 2009-05-14 Raymond Eugene Fraley Process and system for fining glass
US20100199721A1 (en) * 2008-11-12 2010-08-12 Keisha Chantelle Ann Antoine Apparatus and method for reducing gaseous inclusions in a glass
US20120125050A1 (en) * 2010-09-30 2012-05-24 Avanstrate Inc. Method for manufacturing glass plate

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19939779C2 (en) 1999-08-21 2003-06-26 Schott Glas Device and method for the continuous melting and refining of inorganic compounds, in particular glasses and glass ceramics
TWI276611B (en) * 2000-08-17 2007-03-21 Hoya Corp Process for producing glass and glass-melting apparatus thereof
JP2004091244A (en) * 2002-08-30 2004-03-25 Nippon Electric Glass Co Ltd Alkali-free glass substrate and method for manufacturing the same
CN101130450B (en) * 2006-08-12 2013-06-05 史考特公司 Lead-free optical glass of the hard flint and lanthanum hard flint position
JP5769574B2 (en) * 2011-09-30 2015-08-26 AvanStrate株式会社 Manufacturing method of glass plate
JP5719797B2 (en) * 2012-04-06 2015-05-20 AvanStrate株式会社 Glass plate manufacturing method and glass plate manufacturing apparatus

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080092597A1 (en) * 2005-06-06 2008-04-24 Asahi Glass Company, Limited Glass manufacturing apparatus, a structural member thereof and method for heating the structural member by conduction heating
US20090120133A1 (en) * 2007-11-08 2009-05-14 Raymond Eugene Fraley Process and system for fining glass
WO2009061484A1 (en) * 2007-11-08 2009-05-14 Corning Incorporated Process and system for fining glass
US20100199721A1 (en) * 2008-11-12 2010-08-12 Keisha Chantelle Ann Antoine Apparatus and method for reducing gaseous inclusions in a glass
US20120125050A1 (en) * 2010-09-30 2012-05-24 Avanstrate Inc. Method for manufacturing glass plate

Also Published As

Publication number Publication date
KR101486133B1 (en) 2015-01-23
JP5552551B2 (en) 2014-07-16
CN103508654B (en) 2016-08-03
JP2014028734A (en) 2014-02-13
KR20140002473A (en) 2014-01-08
TW201400427A (en) 2014-01-01
CN103508654A (en) 2014-01-15

Similar Documents

Publication Publication Date Title
TWI478883B (en) A method for manufacturing a glass substrate, and a manufacturing apparatus for a glass substrate
TWI480251B (en) A manufacturing method of a glass plate and a manufacturing apparatus for a glass plate
JP5752647B2 (en) Manufacturing method of glass substrate
TWI417256B (en) Manufacture of glass plates
JP5616450B2 (en) Manufacturing method of glass plate
JP5921730B2 (en) Glass substrate manufacturing method and glass substrate manufacturing apparatus
JP5769574B2 (en) Manufacturing method of glass plate
JP6082779B2 (en) Manufacturing method of glass plate
JP6247958B2 (en) Glass plate manufacturing method and glass plate manufacturing apparatus
JP6722096B2 (en) Glass substrate and glass substrate laminate
JP5730259B2 (en) Glass manufacturing apparatus and glass manufacturing method
TWI585052B (en) A glass substrate manufacturing apparatus and a method for manufacturing the glass substrate
JP6847620B2 (en) Glass substrate manufacturing method and glass substrate manufacturing equipment