TWI629248B - Method for producing glass substrate, glass substrate and glass substrate laminate - Google Patents

Method for producing glass substrate, glass substrate and glass substrate laminate Download PDF

Info

Publication number
TWI629248B
TWI629248B TW104121267A TW104121267A TWI629248B TW I629248 B TWI629248 B TW I629248B TW 104121267 A TW104121267 A TW 104121267A TW 104121267 A TW104121267 A TW 104121267A TW I629248 B TWI629248 B TW I629248B
Authority
TW
Taiwan
Prior art keywords
molten glass
glass
molten
temperature
glass substrate
Prior art date
Application number
TW104121267A
Other languages
Chinese (zh)
Other versions
TW201619075A (en
Inventor
藤本慎吾
鈴木駿介
Original Assignee
安瀚視特控股股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 安瀚視特控股股份有限公司 filed Critical 安瀚視特控股股份有限公司
Publication of TW201619075A publication Critical patent/TW201619075A/en
Application granted granted Critical
Publication of TWI629248B publication Critical patent/TWI629248B/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B5/00Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
    • C03B5/16Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
    • C03B5/225Refining
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B7/00Distributors for the molten glass; Means for taking-off charges of molten glass; Producing the gob, e.g. controlling the gob shape, weight or delivery tact
    • C03B7/02Forehearths, i.e. feeder channels
    • C03B7/06Means for thermal conditioning or controlling the temperature of the glass
    • C03B7/07Electric means
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00Technologies relating to the processing of minerals
    • Y02P40/50Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57Improving the yield, e-g- reduction of reject rates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Glass Compositions (AREA)
  • Surface Treatment Of Glass (AREA)
  • Laminated Bodies (AREA)
  • Glass Melting And Manufacturing (AREA)

Abstract

本發明之玻璃基板之製造方法,即便於玻璃基板混入鉑族金屬之雜質,於玻璃基板亦不易產生應變、不易形成玻璃基板之主表面之凹凸。本發明之玻璃基板之製造方法包括:熔融玻璃處理步驟,其於因熔融玻璃之導入而形成由熔融玻璃之表面與壁包圍之氣相空間且上述壁之至少一部分係由包含鉑族金屬之材料構成之玻璃處理裝置中處理熔融玻璃時,存在於氣相空間之自壁揮發之鉑族金屬之揮發物之凝聚物作為異物混入;以及凝聚物處理步驟,其縮小凝聚物之大小,以使於該熔融玻璃處理步驟中混入至熔融玻璃之凝聚物中,最大長度為50μm以下之凝聚物之個數之比率為70%以上。玻璃基板積層體之玻璃基板之體積合計為0.1m3以上,玻璃基板所含有之全部鉑族金屬凝聚物中,最大長度為50μm以下之凝聚物之個數之比率為70%以上。 In the method for producing a glass substrate of the present invention, even if impurities of a platinum group metal are mixed in the glass substrate, strain is less likely to occur on the glass substrate, and unevenness of the main surface of the glass substrate is less likely to be formed. The method for producing a glass substrate of the present invention comprises: a molten glass treatment step of forming a gas phase space surrounded by a surface of the molten glass and a wall by introduction of molten glass, and at least a part of the wall is made of a material containing a platinum group metal When the molten glass is processed in the glass processing apparatus, the aggregate of the volatile matter of the platinum group metal which is volatilized from the wall in the gas phase space is mixed as a foreign matter; and the agglomerate processing step reduces the size of the aggregate so that In the molten glass treatment step, the ratio of the number of aggregates having a maximum length of 50 μm or less is 70% or more. The total volume of the glass substrate of the glass substrate laminate is 0.1 m 3 or more, and the ratio of the number of aggregates having a maximum length of 50 μm or less in all the platinum group metal aggregates contained in the glass substrate is 70% or more.

Description

玻璃基板之製造方法、玻璃基板及玻璃基板積層體 Method for producing glass substrate, glass substrate and glass substrate laminate

本發明係關於一種玻璃基板之製造方法、玻璃基板及玻璃基板積層體。 The present invention relates to a method for producing a glass substrate, a glass substrate, and a glass substrate laminate.

一般而言,玻璃基板係於自玻璃原料生成熔融玻璃之後,經過澄清步驟、均質化步驟並經由使熔融玻璃成形為玻璃基板之步驟而製造。然而,為了自高溫之熔融玻璃批量生產高品質之玻璃基板,期望考慮使成為玻璃基板之缺陷主因之異物等不自製造玻璃基板之任一玻璃處理裝置混入至熔融玻璃。因此,於玻璃基板之製造過程中與熔融玻璃接觸之構件之壁必須根據與該構件接觸之熔融玻璃之溫度、所要求之玻璃基板之品質等而由適當之材料構成。 In general, a glass substrate is produced by a step of forming a molten glass from a glass raw material, passing through a clarification step, a homogenization step, and forming a molten glass into a glass substrate. However, in order to mass-produce a high-quality glass substrate from a high-temperature molten glass, it is desirable to mix any glass processing apparatus which does not manufacture a glass substrate, such as a foreign material which is a main cause of a glass substrate, into a molten glass. Therefore, the wall of the member that is in contact with the molten glass during the production of the glass substrate must be made of a suitable material depending on the temperature of the molten glass that is in contact with the member, the quality of the desired glass substrate, and the like.

例如,於生成熔融玻璃後至供給至成形步驟之期間,熔融玻璃為極高溫狀態,因此,進行熔融、澄清、供給、攪拌之裝置採用含有作為耐熱性較高之鉑族金屬之鉑之構件(例如,專利文獻1)。 For example, since the molten glass is in an extremely high temperature state after the molten glass is produced and supplied to the molding step, the apparatus for melting, clarifying, supplying, and stirring is made of a member containing platinum as a platinum group metal having high heat resistance ( For example, Patent Document 1).

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本專利特開2010-111533號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2010-111533

然而,鉑族金屬容易隨著高溫而揮發。而且,若鉑族金屬之揮發物凝聚,則作為該凝聚物之結晶之一部分以異物形式混入熔融玻璃 中,有導致玻璃基板之品質下降之憂。特別是,自熔解步驟至成形步驟之間,澄清步驟係熔融玻璃之溫度最高之步驟,故而主要進行澄清步驟之澄清管被加熱至極高之溫度。因此,於澄清步驟後之熔融玻璃中,藉由自澄清管揮發之鉑族金屬凝聚而獲得之凝聚物之一部分容易成為異物混入其中。 However, platinum group metals tend to volatilize at high temperatures. Further, if the volatile matter of the platinum group metal is agglomerated, the molten glass is mixed as a part of the crystal of the aggregate as a foreign matter. There is a concern that the quality of the glass substrate is degraded. In particular, the clarification step is the step of the highest temperature of the molten glass from the melting step to the forming step, so that the clarification tube mainly performing the clarification step is heated to an extremely high temperature. Therefore, in the molten glass after the clarification step, a part of the aggregate obtained by agglomerating the platinum group metal volatilized from the clarification tube is likely to be mixed into the foreign matter.

若於玻璃基板製造過程中混入鉑族金屬之異物,則產生如下問題:由於鉑族金屬之異物與玻璃之熱膨脹係數之差,於玻璃基板中產生應變,由於該應變會引起顯示器之顯示不良;或者,鉑族金屬會存在於玻璃基板之主表面附近而於玻璃基板之主表面上形成凹凸,從而不能均勻地進行設於主表面上之薄膜電晶體(TFT)之形成,因此導致產生顯示器之顯示不良。近年來,隨著圖像顯示裝置之畫面顯示之高清晰化,就用於顯示器之玻璃基板而言,進一步強烈要求降低混入玻璃基板內之鉑族金屬之異物。 If a foreign matter of a platinum group metal is mixed in the glass substrate manufacturing process, the following problem occurs: strain is generated in the glass substrate due to the difference in thermal expansion coefficient between the foreign matter of the platinum group metal and the glass, and the display may cause display failure due to the strain; Alternatively, the platinum group metal may be present in the vicinity of the main surface of the glass substrate to form irregularities on the main surface of the glass substrate, so that the formation of the thin film transistor (TFT) provided on the main surface cannot be uniformly performed, thereby causing the display to be produced. Poor display. In recent years, with the high-definition display of the image display device, it has been strongly demanded to reduce the foreign matter of the platinum group metal mixed in the glass substrate in the glass substrate used for the display.

如此,較佳為降低混入至玻璃基板之鉑族金屬之異物(凝聚物)之量。然而,成形前之熔融玻璃之溫度極高,特別是於進行澄清步驟之澄清管中,不能自澄清管之氣相空間氣氛中排除作為誘發鉑族金屬之揮發之原因的氧,不能完全消除鉑族金屬之揮發。另外,於澄清管中,亦不能使作為產生鉑族金屬之揮發物之凝聚之原因之裝置內壁面的溫度差為0,亦不能完全消除鉑族金屬之揮發。因此,難以於製造過程中完全阻止鉑族金屬之異物(凝聚物)混入熔融玻璃中。 Thus, it is preferable to reduce the amount of foreign matter (agglomerate) of the platinum group metal mixed in the glass substrate. However, the temperature of the molten glass before forming is extremely high, particularly in the clarification tube in which the clarification step is performed, the oxygen which is the cause of the volatilization of the platinum group metal cannot be excluded from the gas phase space atmosphere of the clarification tube, and the platinum cannot be completely eliminated. Volatile metal. Further, in the clarification pipe, the temperature difference of the inner wall surface of the apparatus which is a cause of aggregation of the volatile matter of the platinum group metal cannot be made zero, and the volatilization of the platinum group metal cannot be completely eliminated. Therefore, it is difficult to completely prevent the foreign matter (agglomerate) of the platinum group metal from being mixed into the molten glass during the manufacturing process.

因此,本發明之目的在於,提供一種即便於玻璃基板中混入鉑族金屬之異物(凝聚物)亦難以產生上述問題之玻璃基板之製造方法、玻璃基板及玻璃基板積層體。 Therefore, an object of the present invention is to provide a method for producing a glass substrate, a glass substrate, and a glass substrate laminate which are less likely to cause the above problems even if a foreign substance (aggregate) of a platinum group metal is mixed in a glass substrate.

如上所述,鑒於難以於玻璃基板之製造過程中完全阻止鉑族金屬之異物(凝聚物)混入熔融玻璃中,因此,本申請案發明人對即便於 熔融玻璃中混入鉑族金屬之異物(凝聚物)亦不易於玻璃基板上產生應變、不易形成玻璃基板之主表面之凹凸之異物之形態進行探索。其結果獲得如下之見解:鉑族金屬之最大長度為50μm以下對於不易於玻璃基板上產生應變、不易形成玻璃基板之主表面之凹凸較為有效,另外,混入至玻璃基板之鉑族金屬之異物(凝聚物)中,鉑族金屬之最大長度為50μm以下之鉑族金屬之異物(凝聚物)之個數比率為70%以上較為有效。特別是,獲得如下見解:於製造玻璃基板時降低混入至熔融玻璃之鉑族金屬之異物(凝聚物)之大小對於不易於玻璃基板上產生應變、不易形成玻璃基板之主表面之凹凸較為有效。該見解係自為了抑制產生顯示不良而降低鉑族金屬之異物(凝聚物)之絕對數之先前技術中無法容易想到。 As described above, in view of the fact that it is difficult to completely prevent the foreign matter (aggregate) of the platinum group metal from being mixed into the molten glass during the manufacturing process of the glass substrate, the inventors of the present application even In the molten glass, a foreign matter (agglomerate) in which a platinum group metal is mixed is not easily explored in the form of a foreign matter which is strained on the glass substrate and which is less likely to form irregularities on the main surface of the glass substrate. As a result, the maximum length of the platinum group metal is 50 μm or less. It is effective for not easily causing strain on the glass substrate, and it is difficult to form the unevenness of the main surface of the glass substrate, and the foreign matter of the platinum group metal mixed in the glass substrate ( In the aggregates, it is effective that the number ratio of the foreign matter (agglomerate) of the platinum group metal having a maximum length of the platinum group metal of 50 μm or less is 70% or more. In particular, it has been found that the size of the foreign matter (aggregate) of the platinum group metal mixed in the molten glass at the time of producing the glass substrate is effective for not easily causing strain on the glass substrate and making it difficult to form the unevenness of the main surface of the glass substrate. This finding cannot be easily conceived in the prior art in order to suppress the occurrence of display defects and reduce the absolute number of foreign substances (agglomerates) of the platinum group metal.

即,本發明之一態樣係一種玻璃基板之製造方法。該玻璃基板之製造方法包括以下形態。 That is, one aspect of the present invention is a method of producing a glass substrate. The method for producing the glass substrate includes the following aspects.

(第1形態) (first form)

一種玻璃基板之製造方法包括:熔解步驟,其熔解玻璃原料而生成熔融玻璃;以及熔融玻璃處理步驟,其於玻璃處理裝置中處理上述熔融玻璃,上述玻璃處理裝置具有因上述熔融玻璃導入而形成由上述熔融玻璃之表面與壁包圍之氣相空間之空間,上述壁之至少一部分由包含鉑族金屬之材料構成,且於處理上述熔融玻璃時,存在於上述氣相空間之自上述壁揮發之鉑族金屬之揮發物之凝聚物作為異物混入至上述熔融玻璃中,且包括凝聚物處理步驟,其減少混入至上述熔融玻璃之凝聚物之大小,以使混入至上述熔融玻璃之凝聚物中,最大長度為50μm以下之凝聚物之個數之比率為70%以上。 A method for producing a glass substrate, comprising: a melting step of melting a glass raw material to form molten glass; and a molten glass processing step of treating the molten glass in a glass processing apparatus, wherein the glass processing apparatus is formed by introduction of the molten glass a space between the surface of the molten glass and a gas phase space surrounded by the wall, wherein at least a portion of the wall is made of a material containing a platinum group metal, and when the molten glass is processed, the platinum volatilized from the wall in the gas phase space The aggregate of the volatiles of the group metal is mixed as a foreign matter into the molten glass, and includes an agglomerate treatment step of reducing the size of the agglomerates mixed into the molten glass so as to be mixed into the aggregate of the molten glass, and the largest The ratio of the number of aggregates having a length of 50 μm or less is 70% or more.

(第2形態) (second form)

一種玻璃基板之製造方法包括:熔解步驟,其熔解玻璃原料而生成熔融玻璃;熔融玻璃處理步驟,其於玻璃處理裝置中處理上述熔融玻璃,上述玻璃處理裝置具有包含上述熔融玻璃之液相、以及由上述熔融玻璃之液面與壁所形成之氣相空間,包圍上述氣相空間之壁之至少一部分由包含鉑族金屬之材料構成,且於處理上述熔融玻璃時,存在於上述氣相空間之自上述壁揮發之鉑族金屬之揮發物之凝聚物作為異物混入上述熔融玻璃中;以及凝聚物處理步驟,其減小混入至上述熔融玻璃之凝聚物之大小,以使上述熔融玻璃處理步驟中混入至熔融玻璃之凝聚物中,最大長度為50μm以下之凝聚物之個數之比率為70%以上。 A method for producing a glass substrate, comprising: a melting step of melting a glass raw material to form molten glass; and a molten glass processing step of treating the molten glass in a glass processing apparatus, wherein the glass processing apparatus has a liquid phase containing the molten glass, and a gas phase space formed by the liquid surface and the wall of the molten glass, at least a part of the wall surrounding the gas phase space is made of a material containing a platinum group metal, and is present in the gas phase space when the molten glass is processed. The agglomerate of the volatile matter of the platinum group metal volatilized from the wall is mixed as the foreign matter into the molten glass; and the agglomerate treatment step of reducing the size of the agglomerate mixed into the molten glass so that the molten glass treatment step is The ratio of the number of aggregates having a maximum length of 50 μm or less mixed into the aggregate of the molten glass is 70% or more.

(第3形態) (third form)

一種玻璃基板之製造方法包括:熔解步驟,其熔解玻璃原料而生成熔融玻璃;以及熔融玻璃處理步驟,其於玻璃處理裝置中處理上述熔融玻璃,上述玻璃處理裝置具有因上述熔融玻璃導入而形成由上述熔融玻璃之表面與壁包圍之氣相空間之空間,上述壁之至少一部分由包含鉑族金屬之材料構成,且於處理上述熔融玻璃時,存在於上述氣相空間之自上述壁揮發之鉑族金屬之揮發物之凝聚物作為異物混入上述熔融玻璃中,且包括凝聚物處理步驟,其調整上述熔融玻璃中之上述凝聚物之溶解度,以減小混入上述熔融玻璃中之凝聚物之大小。 A method for producing a glass substrate, comprising: a melting step of melting a glass raw material to form molten glass; and a molten glass processing step of treating the molten glass in a glass processing apparatus, wherein the glass processing apparatus is formed by introduction of the molten glass a space between the surface of the molten glass and a gas phase space surrounded by the wall, wherein at least a portion of the wall is made of a material containing a platinum group metal, and when the molten glass is processed, the platinum volatilized from the wall in the gas phase space The aggregate of the volatiles of the group metal is mixed as a foreign matter into the molten glass, and includes an agglomerate treatment step of adjusting the solubility of the agglomerate in the molten glass to reduce the size of the agglomerates mixed into the molten glass.

(第4形態) (fourth form)

一種玻璃基板之製造方法包括:熔解步驟,其熔解玻璃原料而生成熔融玻璃;以及熔融玻璃處理步驟,其於玻璃處理裝置中處理上述熔融玻璃, 上述玻璃處理裝置具有包含上述熔融玻璃之液相、以及由上述熔融玻璃之液面與壁所形成之氣相空間,包圍上述氣相空間之壁之至少一部分由包含鉑族金屬之材料構成,且於處理上述熔融玻璃時,存在於上述氣相空間之自上述壁揮發之鉑族金屬之揮發物之凝聚物作為異物混入上述熔融玻璃中,且進而包括凝聚物處理步驟,其控制提供至上述凝聚物之熱量,以使提供至上述凝聚物之熱量為能夠減小混入至上述熔融玻璃之上述凝聚物之大小之最小熱量以上。 A method for producing a glass substrate includes: a melting step of melting a glass raw material to form molten glass; and a molten glass processing step of treating the molten glass in a glass processing apparatus, The glass processing apparatus includes a liquid phase including the molten glass, and a vapor phase space formed by a liquid surface and a wall of the molten glass, and at least a part of a wall surrounding the vapor phase space is made of a material containing a platinum group metal, and When the molten glass is treated, the aggregate of the volatile matter of the platinum group metal volatilized from the wall in the gas phase space is mixed as a foreign matter into the molten glass, and further includes an agglomerate treatment step, and the control is provided to the agglomeration The amount of heat of the substance is such that the amount of heat supplied to the agglomerate is less than the minimum amount of heat that can be mixed into the aggregate of the molten glass.

(第5形態) (fifth form)

根據第1形態至第4形態中任一形態之玻璃基板之製造方法,其中於上述玻璃基板之製造方法中,使與上述氣相空間接觸之上述壁之最高溫度與最低溫度之差為5℃以上,上述氣相空間包含氧。 The method for producing a glass substrate according to any one of the first aspect to the fourth aspect, wherein, in the method for producing the glass substrate, a difference between a maximum temperature and a minimum temperature of the wall in contact with the gas phase space is 5 ° C As described above, the gas phase space contains oxygen.

(第6形態) (6th form)

根據上述第1形態至上述第5形態中任一形態之玻璃基板之製造方法,其中上述凝聚物處理步驟中進行升溫,使含有上述凝聚物之上述熔融玻璃之溫度高於上述熔融玻璃處理步驟中凝聚物混入至熔融玻璃之區域中之熔融玻璃之溫度。或者,於上述凝聚物處理步驟中,上述熔融玻璃之溫度為最高溫度。 The method for producing a glass substrate according to any one of the first aspect to the fifth aspect, wherein the temperature of the molten glass containing the agglomerate is higher than the temperature of the molten glass processing step The temperature at which the agglomerates are mixed into the molten glass in the region of the molten glass. Alternatively, in the agglomerate treatment step, the temperature of the molten glass is the highest temperature.

(第7形態) (7th form)

根據上述第1形態至第6形態中任一形態之玻璃基板之製造方法,其中於上述凝聚物處理步驟中,使上述凝聚物溶解於熔融玻璃之溶解度高於上述熔融玻璃處理步驟中凝聚物混入至熔融玻璃之區域中之上述溶解度。或者,根據上述第1形態至上述第6形態中任一形態之玻璃基板之製造方法,其中於上述凝聚物處理步驟中,藉由提高上述 凝聚物溶解於熔融玻璃之溶解度而縮小混入至上述熔融玻璃之凝聚物之大小。詳細而言,根據上述第1形態至上述第6形態中任一形態之玻璃基板之製造方法,其中於上述凝聚物處理步驟中,藉由加熱控制熔融玻璃以提高上述凝聚物溶解於熔融玻璃之溶解度,而減小混入至上述熔融玻璃之凝聚物之大小。 The method for producing a glass substrate according to any one of the first aspect to the sixth aspect, wherein, in the agglomerate treatment step, the solubility of the aggregated material in the molten glass is higher than the aggregated material in the molten glass treatment step. The above solubility to the area of the molten glass. Or a method of producing a glass substrate according to any one of the first aspect to the sixth aspect, wherein the agglomerate processing step is performed by The agglomerates are dissolved in the solubility of the molten glass to reduce the size of the agglomerates mixed into the molten glass. In the method for producing a glass substrate according to any one of the first aspect to the sixth aspect, in the agglomerate processing step, the molten glass is controlled by heating to improve dissolution of the aggregate in the molten glass. Solubility, and the size of the agglomerates mixed into the above molten glass is reduced.

(第8形態) (8th form)

根據上述第1形態至上述第7形態中任一形態之玻璃基板之製造方法,其中上述玻璃處理裝置係具有澄清管之澄清裝置,上述熔融玻璃於上述澄清管中流動,上述澄清管內之上述氣相空間沿上述熔融玻璃之流動方向而形成,上述凝聚物處理步驟係於上述澄清管中進行。 The method for producing a glass substrate according to any one of the first aspect to the seventh aspect, wherein the glass processing apparatus is a clarification device having a clarification tube, wherein the molten glass flows in the clarification tube, and the The gas phase space is formed along the flow direction of the molten glass, and the agglomerate treatment step is performed in the clarification pipe.

(第9形態) (9th form)

根據上述第1形態至上述第8形態中任一形態之玻璃基板之製造方法,其中於上述熔融玻璃處理步驟中,使用上述熔融玻璃中包含之氧化錫進行減少上述熔融玻璃中之氣泡數之澄清處理,上述熔融玻璃於上述玻璃處理裝置中流動,在與上述氣相空間接觸之上述壁上形成沿上述熔融玻璃之流動方向之溫度分佈,於上述氣相空間中形成沿上述熔融玻璃之流動方向之氧濃度分佈。 The method for producing a glass substrate according to any one of the first aspect to the eighth aspect, wherein, in the molten glass treatment step, clarification of reducing the number of bubbles in the molten glass by using tin oxide contained in the molten glass The molten glass flows in the glass processing apparatus, and a temperature distribution along a flow direction of the molten glass is formed on the wall in contact with the vapor phase space, and a flow direction along the molten glass is formed in the vapor phase space. Oxygen concentration distribution.

(第10形態) (10th form)

根據上述第1形態至上述第9形態中任一形態之玻璃基板之製造方法,其中上述凝聚物處理步驟係於上述玻璃處理裝置中進行,上述熔融玻璃於上述玻璃處理裝置中流動,在於上述玻璃處理裝置中流動之熔融玻璃中,於上述氣相空間中沿著熔融玻璃之流動方向上,對與 氧濃度最高之區域對應之位置上流動之熔融玻璃進行上述凝聚物處理步驟。 The method for producing a glass substrate according to any one of the first aspect to the ninth aspect, wherein the agglomerate processing step is performed in the glass processing apparatus, and the molten glass flows in the glass processing apparatus in the glass In the molten glass flowing in the processing device, in the flow direction of the molten glass in the gas phase space, The molten glass flowing at a position corresponding to the region having the highest oxygen concentration performs the above-described coagulation treatment step.

(第11形態) (11th form)

根據上述第1形態至上述第10形態中任一形態之玻璃基板之製造方法,其中使上述氣相空間中之氧濃度超過0%、且為1.0%以下,使與上述氣相空間接觸之上述壁之最高溫度與最低溫度之差為5℃以上且100℃以下。 The method for producing a glass substrate according to any one of the first aspect to the tenth aspect, wherein the oxygen concentration in the gas phase space is more than 0% and 1.0% or less, and the gas phase is brought into contact with the vapor phase space. The difference between the highest temperature and the lowest temperature of the wall is 5 ° C or more and 100 ° C or less.

(第12形態) (12th form)

根據上述第1形態至上述第11形態中任一形態之玻璃基板之製造方法,其中控制熔融玻璃之溫度,以使上述凝聚物處理步驟中之上述熔融玻璃之溫度在1670℃~1730℃之溫度範圍內。 The method for producing a glass substrate according to any one of the first aspect to the eleventh aspect, wherein the temperature of the molten glass is controlled such that the temperature of the molten glass in the agglomerate treatment step is between 1670 ° C and 1730 ° C Within the scope.

(第13形態) (13th form)

根據上述第1形態至上述第12形態中任一形態之玻璃基板之製造方法,其中控制熔融玻璃之溫度,以使於上述熔融玻璃處理步驟中凝聚物混入至熔融玻璃之區域中之上述熔融玻璃之溫度為1580℃~1660℃之溫度範圍內。 The method for producing a glass substrate according to any one of the first aspect to the twelfth aspect, wherein the temperature of the molten glass is controlled so that the aggregated material is mixed into the molten glass in the molten glass treatment step The temperature is in the range of 1580 ° C ~ 1660 ° C.

(第14形態) (14th form)

根據上述第1形態至上述第13形態中任一形態之玻璃基板之製造方法,其中上述熔融玻璃處理步驟包括上述凝聚物處理步驟。 The method for producing a glass substrate according to any one of the first aspect to the thirteenth aspect, wherein the molten glass treatment step includes the agglomerate treatment step.

(第15形態) (15th form)

根據上述第1形態至上述第14形態中任一形態之玻璃基板之製造方法, 其中上述玻璃基板係顯示器用玻璃基板。 The method for producing a glass substrate according to any one of the first aspect to the fourteenth aspect, The glass substrate is a glass substrate for a display.

(第16形態) (16th form)

根據上述第1形態至上述第15形態中任一形態之玻璃基板之製造方法,其中使上述凝聚物處理步驟開始時之溶於上述熔融玻璃中之鉑族金屬之濃度為0.05~20ppm。 The method for producing a glass substrate according to any one of the first aspect to the first aspect, wherein the concentration of the platinum group metal dissolved in the molten glass at the start of the agglomerate treatment step is 0.05 to 20 ppm.

(第17形態) (17th form)

根據上述第1形態至上述第16形態中任一形態之玻璃基板之製造方法,其中於上述凝聚物處理步驟中,在玻璃基板之[Fe3+]/([Fe2+]+[Fe3+])為0.2~0.5之範圍內調整上述熔融玻璃之上述鉑族金屬之飽和溶解度。 The method for producing a glass substrate according to any one of the first aspect to the sixth aspect, wherein in the agglomerate processing step, [Fe 3+ ]/([Fe 2+ ]+[Fe 3 in the glass substrate + ]) The saturation solubility of the above-mentioned platinum group metal of the above molten glass is adjusted within the range of 0.2 to 0.5.

(第18形態) (18th form)

根據上述第1形態至上述第17形態中任一形態之玻璃基板之製造方法,上述玻璃基板中鹼金屬氧化物之含量為0~0.5質量%。 In the method for producing a glass substrate according to any one of the first aspect to the seventeenth aspect, the content of the alkali metal oxide in the glass substrate is 0 to 0.5% by mass.

(第19形態) (19th form)

一種玻璃基板之製造方法,其特徵在於,包括:熔解步驟,其熔解玻璃原料而生成熔融玻璃;熔融玻璃處理步驟,其於玻璃處理裝置中處理上述熔融玻璃,上述玻璃處理裝置具有因上述熔融玻璃之導入而形成由上述熔融玻璃之表面與壁包圍之氣相空間的空間,上述壁之至少一部分由包含鉑族金屬之材料構成,且於處理上述熔融玻璃時,存在於上述氣相空間之自上述壁揮發之鉑族金屬之揮發物之凝聚物作為異物混入上述熔融玻璃中;以及凝聚物處理步驟,其使於上述熔融玻璃處理步驟中混入至上述 熔融玻璃之凝聚物之至少一部分溶解於上述熔融玻璃,使上述凝聚物處理步驟開始時之溶於上述熔融玻璃中之鉑族金屬之濃度為0.05~20ppm。 A method for producing a glass substrate, comprising: a melting step of melting a glass raw material to form a molten glass; and a molten glass processing step of treating the molten glass in a glass processing apparatus having the molten glass Introducing to form a space of the gas phase space surrounded by the surface of the molten glass and the wall, at least a part of the wall being composed of a material containing a platinum group metal, and being present in the gas phase space when the molten glass is processed The aggregate of the volatile matter of the platinum group metal volatilized by the wall is mixed into the molten glass as a foreign matter; and the agglomerate treatment step is mixed in the molten glass treatment step to the above At least a part of the aggregate of the molten glass is dissolved in the molten glass, and the concentration of the platinum group metal dissolved in the molten glass at the start of the agglomerate treatment step is 0.05 to 20 ppm.

(第20形態) (20th form)

一種玻璃基板之製造方法,其特徵在於,包括:熔解步驟,其熔解玻璃原料而製作熔融玻璃;熔融玻璃處理步驟,其使用玻璃處理裝置處理上述熔融玻璃,上述玻璃處理裝置因上述熔融玻璃之導入而形成由上述熔融玻璃之表面與壁包圍之氣相空間,與上述氣相空間接觸之壁之至少一部分由包含鉑族金屬之材料構成,且於處理上述熔融玻璃時,存在於上述氣相空間之自上述壁揮發之鉑族金屬之揮發物之凝聚物混入至上述熔融玻璃;以及凝聚物處理步驟,其使於上述熔融玻璃處理步驟中混入至上述熔融玻璃之凝聚物之至少一部分溶解於上述熔融玻璃,於上述凝聚物處理步驟中,基於在使用上述玻璃處理裝置製成之玻璃基板中檢測到之上述凝聚物之缺陷個數調整上述熔融玻璃之溫度,而調整上述凝聚物鉑族金屬之飽和溶解度,以使新製作之玻璃基板中包含之上述凝聚物之缺陷個數處於容許水平。 A method for producing a glass substrate, comprising: a melting step of melting a glass raw material to produce molten glass; and a molten glass processing step of treating the molten glass with a glass processing apparatus, wherein the glass processing apparatus is introduced by the molten glass Forming a gas phase space surrounded by the surface of the molten glass and the wall, at least a portion of the wall in contact with the gas phase space is made of a material containing a platinum group metal, and is present in the gas phase space when the molten glass is processed. The agglomerate of the volatile matter of the platinum group metal volatilized from the wall is mixed into the molten glass; and the agglomerate treatment step of dissolving at least a part of the agglomerate mixed in the molten glass in the molten glass treatment step The molten glass is adjusted in the agglomerate processing step by adjusting the temperature of the molten glass based on the number of defects of the agglomerate detected in the glass substrate produced by using the glass processing apparatus, and adjusting the agglomerate platinum group metal Saturated solubility to make a newly made glass substrate The number of defects was condensed in the above-described allowable level.

此處,於上述凝聚物處理步驟中,為了調整上述凝聚物之飽和溶解度,較佳為於1660~1750℃之範圍內調整上述熔融玻璃之溫度。 Here, in the agglomerate treatment step, in order to adjust the saturated solubility of the aggregate, it is preferred to adjust the temperature of the molten glass in the range of 1660 to 1750 °C.

(第21形態) (21st form)

一種玻璃基板之製造方法,其特徵在於,包括:熔解步驟,其熔解玻璃原料而製作熔融玻璃;熔融玻璃處理步驟,其使用玻璃處理裝置處理上述熔融玻璃,上述玻璃處理裝置因上述熔融玻璃之導入而形成由上述熔融玻璃之表面與壁包圍之氣相空間,與上述氣相空間接觸之壁之至少一部分由包 含鉑族金屬之材料構成,且於處理上述熔融玻璃時,存在於上述氣相空間之自上述壁揮發之鉑族金屬之揮發物之凝聚物混入至上述熔融玻璃;以及凝聚物處理步驟,其使於上述熔融玻璃處理步驟中混入至上述熔融玻璃之凝聚物之至少一部分溶解於上述熔融玻璃,於上述凝聚物處理步驟中,藉由於0.2~0.5之範圍內調整玻璃基板之[Fe3+]/([Fe2+]+[Fe3+])來調整上述熔融玻璃之上述鉑族金屬之飽和溶解度,使玻璃基板中包含之上述凝聚物之缺陷個數在容許水平。 A method for producing a glass substrate, comprising: a melting step of melting a glass raw material to produce molten glass; and a molten glass processing step of treating the molten glass with a glass processing apparatus, wherein the glass processing apparatus is introduced by the molten glass Forming a gas phase space surrounded by the surface of the molten glass and the wall, at least a portion of the wall in contact with the gas phase space is made of a material containing a platinum group metal, and is present in the gas phase space when the molten glass is processed. The agglomerate of the volatile matter of the platinum group metal volatilized from the wall is mixed into the molten glass; and the agglomerate treatment step of dissolving at least a part of the agglomerate mixed in the molten glass in the molten glass treatment step In the molten glass treatment, the platinum of the molten glass is adjusted by adjusting [Fe 3+ ]/([Fe 2+ ]+[Fe 3+ ]) of the glass substrate in the range of 0.2 to 0.5. The saturated solubility of the group metal is such that the number of defects of the above-mentioned agglomerates contained in the glass substrate is at an allowable level.

此處,上述[Fe3+]/([Fe2+]+[Fe3+])較佳為藉由調節上述玻璃基板所含有之氧化錫之含量及玻璃原料中含有之氧化物之含量中至少任一者來進行調整。 Here, the above [Fe 3+ ]/([Fe 2+ ]+[Fe 3+ ]) is preferably adjusted by adjusting the content of tin oxide contained in the glass substrate and the content of the oxide contained in the glass raw material. At least either of them to make adjustments.

另外,本發明之另一態樣係積層有複數片玻璃基板之玻璃基板積層體。此時,包括以下之第22形態。 Further, another aspect of the present invention is to laminate a glass substrate laminate having a plurality of glass substrates. In this case, the following twenty-first aspect is included.

(第22形態) (22nd form)

一種玻璃基板積層體,其特徵在於,上述玻璃基板積層體中之玻璃基板之體積之合計為0.1m3以上,上述玻璃基板含有之全部鉑族金屬之凝聚物中,最大長度為50μm以下之凝聚物之個數之比率為70%以上。 A glass substrate laminate in which the total volume of the glass substrate in the glass substrate laminate is 0.1 m 3 or more, and the aggregate of all platinum group metals contained in the glass substrate has a maximum length of 50 μm or less. The ratio of the number of objects is 70% or more.

另外,本發明之其他一態樣係一種玻璃基板,包括以下之第23形態。 Further, another aspect of the present invention is a glass substrate comprising the following twenty-third aspect.

(第23形態) (23rd form)

一種玻璃基板,其特徵在於,玻璃基板所含有之鉑族金屬之凝聚物中,最大長度為50μm以下之凝聚物之個數之比率為70%以上。 A glass substrate characterized in that the ratio of the number of aggregates having a maximum length of 50 μm or less is 70% or more in the aggregate of the platinum group metal contained in the glass substrate.

進而,本發明之其他一態樣係一種玻璃基板製造裝置。該玻璃基板製造裝置包含以下形態。 Further, another aspect of the present invention is a glass substrate manufacturing apparatus. This glass substrate manufacturing apparatus contains the following aspects.

(第24形態) (24th form)

一種玻璃基板製造裝置,其包括:熔解裝置,其熔解玻璃原料而生成熔融玻璃;玻璃處理裝置,其用於處理上述熔融玻璃,並具有因上述熔融玻璃之導入而形成由上述熔融玻璃之表面與壁包圍之氣相空間之空間,上述壁之至少一部分由包含鉑族金屬之材料構成,且於處理上述熔融玻璃時,存在於上述氣相空間之自上述壁揮發之鉑族金屬之揮發物之凝聚物作為異物混入至上述熔融玻璃;以及處理單元,減小混入至上述熔融玻璃之凝聚物之大小,使於上述熔融玻璃處理步驟中混入至熔融玻璃之凝聚物中,最大長度為50μm以下之凝聚物之個數之比率為70%以上。 A glass substrate manufacturing apparatus comprising: a melting device that melts a glass raw material to form molten glass; a glass processing device that processes the molten glass and has a surface formed by the molten glass introduced by the molten glass a space surrounding the gas phase space surrounded by the wall, wherein at least a portion of the wall is composed of a material containing a platinum group metal, and when the molten glass is treated, a volatile matter of a platinum group metal volatilized from the wall in the gas phase space The aggregate is mixed as a foreign matter into the molten glass; and the treatment unit reduces the size of the aggregate mixed into the molten glass, and is mixed into the aggregate of the molten glass in the molten glass treatment step, and the maximum length is 50 μm or less. The ratio of the number of aggregates is 70% or more.

進而,本發明之其他一態樣亦為一種玻璃基板製造裝置。該玻璃基板製造裝置包括以下形態。 Furthermore, another aspect of the present invention is also a glass substrate manufacturing apparatus. This glass substrate manufacturing apparatus includes the following aspects.

(第25形態) (25th form)

一種玻璃基板製造裝置,其包括:熔解裝置,其熔解玻璃原料而生成熔融玻璃;以及玻璃處理裝置,其具有因上述熔融玻璃之導入而形成由上述熔融玻璃之表面與壁包圍之氣相空間之空間,上述壁之至少一部分由包含鉑族金屬之材料構成,且於處理上述熔融玻璃時,存在於上述氣相空間之自上述壁揮發之鉑族金屬之揮發物之凝聚物作為異物混入至上述熔融玻璃,且包括調整上述熔融玻璃中之上述凝聚物之溶解度之調整單元,以減小混入至上述熔融玻璃之凝聚物之大小。 A glass substrate manufacturing apparatus comprising: a melting device that melts a glass raw material to form molten glass; and a glass processing device having a gas phase space surrounded by a surface and a wall of the molten glass by introduction of the molten glass a space in which at least a part of the wall is made of a material containing a platinum group metal, and when the molten glass is treated, an aggregate of a volatile matter of a platinum group metal volatilized from the wall in the gas phase space is mixed as a foreign matter to the above The molten glass includes an adjusting unit for adjusting the solubility of the agglomerate in the molten glass to reduce the size of the agglomerate mixed into the molten glass.

(第26形態) (26th form)

另外,上述第1形態至上述第21形態之玻璃基板之製造方法、上述第22形態之玻璃基板積層體、上述第23形態之玻璃基板、以及上述 第24、25形態之玻璃基板製造裝置中任一形態之上述玻璃基板係具有650℃以上之應變點之玻璃基板。 Further, the method for producing a glass substrate according to the first aspect to the twenty-first aspect, the glass substrate laminate of the twenty-second aspect, the glass substrate of the twenty-third aspect, and the above The glass substrate of any one of the glass substrate manufacturing apparatuses of the 24th and 25th aspect is a glass substrate which has a strain point of 650 ° C or more.

上述第1形態至上述第21形態之玻璃基板之製造方法、上述第22形態之玻璃基板積層體、上述第23形態之玻璃基板、及上述第24、25形態之玻璃基板製造裝置中任一形態之上述玻璃基板被用作液晶顯示器用玻璃基板、有機EL(Electro-Luminescence:電致發光)顯示器用玻璃基板、或者使用LTPS(Low Temperature Poly-silicon:低溫多晶矽)薄膜半導體之顯示器用玻璃基板。 The method of producing the glass substrate of the first aspect to the twenty-first aspect, the glass substrate laminate of the twenty-second aspect, the glass substrate of the twenty-third aspect, and the glass substrate manufacturing apparatus of the twenty-fifth and twenty-fifth aspects The glass substrate is used as a glass substrate for a liquid crystal display, a glass substrate for an organic EL (Electro-Luminescence) display, or a glass substrate for a display using an LTPS (Low Temperature Poly-silicon) thin film semiconductor.

根據上述玻璃基板之製造方法、玻璃基板、玻璃基板積層體及玻璃基板製造裝置,即便於玻璃基板中混入鉑族金屬之異物(凝聚物),亦能夠不易於玻璃基板上產生應變、能夠不易形成玻璃基板之主表面之凹凸。藉此,製造玻璃基板時之良率得以提高。 According to the method for producing a glass substrate, the glass substrate, the glass substrate laminate, and the glass substrate manufacturing apparatus, even if a foreign substance (aggregate) of a platinum group metal is mixed into the glass substrate, strain can be prevented from occurring on the glass substrate, and formation can be prevented. Concavities and convexities on the main surface of the glass substrate. Thereby, the yield at the time of manufacturing a glass substrate is improved.

40‧‧‧熔解槽 40‧‧‧melting tank

41‧‧‧澄清管 41‧‧‧clarification tube

41a‧‧‧通氣管 41a‧‧‧ snorkel

41b‧‧‧加熱電極 41b‧‧‧heating electrode

41c‧‧‧氣相空間 41c‧‧‧ gas phase space

42‧‧‧成形裝置 42‧‧‧Forming device

52‧‧‧成形體 52‧‧‧ Shaped body

43a、43b、43c‧‧‧輸送管 43a, 43b, 43c‧‧‧ delivery tube

100‧‧‧攪拌裝置 100‧‧‧Agitator

200‧‧‧玻璃基板製造裝置 200‧‧‧Glass substrate manufacturing equipment

圖1係表示實施形態之玻璃基板之製造方法之步驟的流程圖。 Fig. 1 is a flow chart showing the procedure of a method for producing a glass substrate of an embodiment.

圖2係表示實施形態之玻璃基板製造裝置之構成的模式圖。 Fig. 2 is a schematic view showing the configuration of a glass substrate manufacturing apparatus of the embodiment.

圖3係主要表示實施形態之澄清管之外觀圖。 Fig. 3 is a perspective view mainly showing the clarification pipe of the embodiment.

圖4係表示實施形態之澄清管之內部之截面圖與澄清管之溫度分佈之一例的圖。 Fig. 4 is a view showing an example of a cross section of the inside of the clarification pipe of the embodiment and a temperature distribution of the clarification pipe.

圖5係表示熔融玻璃之最高溫度與異物之比率之關係之圖表。 Fig. 5 is a graph showing the relationship between the maximum temperature of molten glass and the ratio of foreign matter.

本實施形態之玻璃基板之製造方法於玻璃處理裝置中處理熔融玻璃(熔融玻璃處理步驟),上述玻璃處理裝置具有因熔融玻璃之導入而形成由熔融玻璃之表面與壁包圍之氣相空間之空間,上述壁之至少一部分由包含鉑族金屬之材料構成,例如,上述玻璃處理裝置具有包含熔融玻璃之液相、以及由熔融玻璃之液面與壁形成之氣相空間,包 圍氣相空間之壁之至少一部分由包含鉑族金屬之材料構成。於該熔融玻璃之處理時,存在於氣相空間之自上述壁揮發之鉑族金屬之揮發物之凝聚物作為異物混入熔融玻璃中。進行減小混入至熔融玻璃之凝聚物之大小之處理,以使混入至熔融玻璃之上述凝聚物中,最大長度為50μm以下之凝聚物之個數之比率為70%以上(凝聚物處理步驟)。或者,調整熔融玻璃中之異物(凝聚物)之溶解度,使混入至熔融玻璃之凝聚物之大小變小。例如,控制提供至異物(凝聚物)之熱量,使提供至異物(凝聚物)之熱量為能縮小混入至熔融玻璃之異物(凝聚物)之大小之最小熱量以上(凝聚物處理步驟)。 The method for producing a glass substrate according to the present embodiment processes a molten glass (a molten glass treatment step) in a glass processing apparatus, and the glass processing apparatus has a space in which a vapor phase space surrounded by a surface and a wall of the molten glass is formed by introduction of molten glass. At least a part of the wall is made of a material containing a platinum group metal. For example, the glass processing apparatus has a liquid phase containing molten glass, and a gas phase space formed by a liquid surface and a wall of the molten glass. At least a portion of the wall surrounding the gas phase space is comprised of a material comprising a platinum group metal. At the time of the treatment of the molten glass, the aggregate of the volatile matter of the platinum group metal volatilized from the wall in the gas phase space is mixed as a foreign matter into the molten glass. The treatment for reducing the size of the agglomerates mixed into the molten glass is carried out so that the ratio of the number of aggregates having a maximum length of 50 μm or less to the aggregates of the molten glass is 70% or more (agglomerate treatment step) . Alternatively, the solubility of the foreign matter (agglomerate) in the molten glass is adjusted to reduce the size of the agglomerates mixed into the molten glass. For example, the amount of heat supplied to the foreign matter (aggregate) is controlled so that the amount of heat supplied to the foreign matter (agglomerate) is less than the minimum amount of heat (the agglomerate treatment step) that can reduce the size of the foreign matter (aggregate) mixed into the molten glass.

如此,藉由縮小混入至玻璃基板之鉑族金屬之異物(凝聚物)之大小,而能夠不易於玻璃基板上產生應變,且不易形成玻璃基板之主表面之凹凸。因此,改善先前之問題,改善玻璃基板之製造良率。 By reducing the size of the foreign matter (aggregate) of the platinum group metal mixed in the glass substrate, it is possible to prevent strain on the glass substrate from being easily formed, and it is difficult to form irregularities on the main surface of the glass substrate. Therefore, the previous problems are improved and the manufacturing yield of the glass substrate is improved.

於以後之說明中,作為控制調整溶解度之條件以使凝聚物相對於熔融玻璃之溶解度為凝聚物能夠溶解於熔融玻璃並能減少大小之最小溶解度以上之例子,舉出控制提供至凝聚物之熱量以使提供至凝聚物之熱量為能夠減少混入至熔融玻璃之凝聚物之大小之最小熱量以上的例子來進行說明。 In the following description, as a condition for controlling the solubility adjustment so that the solubility of the aggregate with respect to the molten glass is an example in which the aggregate can be dissolved in the molten glass and can be reduced in the minimum solubility of the size, the heat supplied to the aggregate is controlled. The heat supplied to the aggregate is described as an example in which the minimum amount of heat which is mixed into the aggregate of the molten glass can be reduced.

(玻璃基板之製造方法及玻璃基板製造裝置) (Method for Producing Glass Substrate and Glass Substrate Manufacturing Apparatus)

圖1係表示本實施形態之玻璃基板製造方法之步驟之一個例子之流程圖。如圖1所示,玻璃基板之製造方法主要包括:熔解步驟S1、澄清步驟S2、攪拌步驟S3、成形步驟S4、緩冷步驟S5、以及切斷步驟S6。 Fig. 1 is a flow chart showing an example of the procedure of the method for producing a glass substrate of the present embodiment. As shown in FIG. 1, the manufacturing method of the glass substrate mainly includes a melting step S1, a clarification step S2, a stirring step S3, a forming step S4, a slow cooling step S5, and a cutting step S6.

圖2係表示本實施形態之玻璃基板製造裝置200之構成之一個例子之模式圖。玻璃基板製造裝置200包括熔解槽40、澄清管41、攪拌裝置100、成形裝置42、以及輸送管43a、43b、43c。輸送管43a連接熔解槽40與澄清管41。輸送管43b連接澄清管41與攪拌裝置100。輸送 管43c連接攪拌裝置100與成形裝置42。 FIG. 2 is a schematic view showing an example of the configuration of the glass substrate manufacturing apparatus 200 of the present embodiment. The glass substrate manufacturing apparatus 200 includes a melting tank 40, a clarification pipe 41, a stirring device 100, a molding device 42, and transfer pipes 43a, 43b, and 43c. The conveying pipe 43a connects the melting tank 40 and the clarification pipe 41. The conveying pipe 43b is connected to the clarification pipe 41 and the stirring device 100. delivery The tube 43c connects the stirring device 100 and the forming device 42.

於熔解步驟S1中,熔解玻璃之原料而生成熔融玻璃。熔融玻璃貯存於熔解槽40中,並被加熱至具有所期望之溫度。熔融玻璃含有澄清劑。就降低環境負擔之觀點而言,適合使用氧化錫作為澄清劑。 In the melting step S1, the raw material of the glass is melted to form molten glass. The molten glass is stored in the melting tank 40 and heated to have a desired temperature. The molten glass contains a clarifying agent. From the viewpoint of reducing the environmental burden, tin oxide is suitably used as a fining agent.

於熔解槽40中,玻璃原料被加熱至與其組成等相應之溫度而被熔解。藉此,於熔解槽40中,例如獲得1500℃~1620℃之高溫之熔融玻璃G。再者,於熔解槽40中,可藉由於至少1對之電極間流通電流來通電加熱電極間之熔融玻璃G,另外,亦可除通電加熱外,輔助性地提供燃燒器之火焰來加熱玻璃原料。 In the melting tank 40, the glass raw material is heated to a temperature corresponding to its composition and the like to be melted. Thereby, in the melting tank 40, for example, a molten glass G having a high temperature of 1500 ° C to 1620 ° C is obtained. Further, in the melting tank 40, the molten glass G between the electrodes may be energized by a current flowing between at least one pair of electrodes, and in addition to the electric heating, the flame of the burner may be additionally provided to heat the glass. raw material.

澄清步驟S2於熔融玻璃流動之輸送管43a及澄清管41之內部進行。首先,使熔融玻璃之溫度上升。澄清劑因升溫而引起還原反應,放出氧。包含於熔融玻璃中之氣泡吸收放出之氧而擴大,上浮至熔融玻璃與氣相空間接觸之表面,破裂並消失。即,進行消泡處理步驟S2A。進而,自消泡處理步驟S2A之中途開始、或者於消泡處理步驟S2A結束之後,進行凝聚物處理步驟S2B,其提高熔融玻璃之溫度,減小於消泡處理中混入之鉑族金屬之凝聚物之大小。然後,降低熔融玻璃之溫度。藉此,所還原之澄清劑引起氧化反應,吸收殘留於熔融玻璃中之氧氣等氣體成分。即,進行吸收處理步驟S2C。 The clarification step S2 is carried out inside the conveying pipe 43a and the clarification pipe 41 through which the molten glass flows. First, the temperature of the molten glass is raised. The clarifying agent causes a reduction reaction due to the temperature rise and releases oxygen. The bubbles contained in the molten glass absorb the released oxygen and expand, and float up to the surface where the molten glass is in contact with the gas phase space, and rupture and disappear. That is, the defoaming process step S2A is performed. Further, after the middle of the defoaming treatment step S2A or after the completion of the defoaming treatment step S2A, the agglomerate treatment step S2B is performed to increase the temperature of the molten glass and reduce the aggregation of the platinum group metal mixed in the defoaming treatment. The size of the object. Then, the temperature of the molten glass is lowered. Thereby, the reduced clarifying agent causes an oxidation reaction to absorb a gas component such as oxygen remaining in the molten glass. That is, the absorption processing step S2C is performed.

具體而言,於熔解槽40中獲得之熔融玻璃G自熔解槽40通過輸送管43a流入至澄清管41。澄清管41具有因熔融玻璃G之導入而形成由熔融玻璃G之表面與壁包圍之氣相空間之空間,該壁之至少一部分由包含鉑族金屬之材料構成。例如,具有熔融玻璃流動之液相以及由熔融玻璃之液面與壁形成之氣相空間,包圍氣相空間之壁之至少一部分由包含鉑族金屬之材料構成。輸送管43a、43b、43c係鉑族金屬製之管。再者,鉑族金屬意指包含單一之鉑族元素之金屬、以及包含鉑族元素之金屬之合金。鉑族元素係鉑(Pt),鈀(Pd),銠(Rh),釕(Ru),鋨 (Os)及銥(Ir)此6種元素。於本實施形態中,例如,適合使用鉑含量為70%以上之鉑與銠之合金。鉑族金屬之熔點較高,對熔融玻璃之耐蝕性優異。於澄清管41與熔解槽40同樣地設置有加熱單元。另外,至少於輸送管43a亦設置加熱單元。 Specifically, the molten glass G obtained in the melting tank 40 flows from the melting tank 40 into the clarification pipe 41 through the conveying pipe 43a. The clarification pipe 41 has a space in which a vapor phase space surrounded by the surface of the molten glass G and the wall is formed by introduction of the molten glass G, and at least a part of the wall is made of a material containing a platinum group metal. For example, a liquid phase having a molten glass flow and a gas phase space formed by a liquid surface and a wall of the molten glass, at least a portion of the wall surrounding the gas phase space is composed of a material containing a platinum group metal. The transfer pipes 43a, 43b, and 43c are pipes made of a platinum group metal. Further, the platinum group metal means a metal containing a single platinum group element and an alloy containing a metal of a platinum group element. Platinum group elements are platinum (Pt), palladium (Pd), rhodium (Rh), rhodium (Ru), rhodium (Os) and 铱 (Ir) these six elements. In the present embodiment, for example, an alloy of platinum and rhodium having a platinum content of 70% or more is suitably used. The platinum group metal has a high melting point and is excellent in corrosion resistance to molten glass. A heating unit is provided in the same manner as the melting tank 40 in the clarification pipe 41. Further, a heating unit is also provided at least in the conveying pipe 43a.

於澄清步驟S2中,進行以下步驟:消泡處理步驟,其藉由使熔融玻璃G升溫而消泡;凝聚物處理步驟,其藉由調整向混入至熔融玻璃之鉑族金屬之異物(凝聚物)提供之熱量,而斷開或者熔解鉑族金屬之異物(凝聚物)來減小鉑族金屬之異物(凝聚物)之大小;以及吸收處理步驟,其藉由使熔融玻璃降溫而使熔融玻璃吸收熔融玻璃中之氣泡。於凝聚物處理步驟中,為了斷開或熔解混入至熔融玻璃之異物(凝聚物)而減小鉑族金屬之異物(凝聚物)之大小,必須使提供至異物(凝聚物)之熱量為特定熱量(最小熱量)以上。於該情形時,控制提供至熔融玻璃中之異物(凝聚物)之熱量,以使提供至異物(凝聚物)之熱量為該最小熱量以上。上述最小熱量可藉由預先進行實驗等而預先研究。在以熔融玻璃G之溫度控制最小熱量之情形時,例如,控制澄清管41中之熔融玻璃G之溫度在1580℃~1730℃之範圍內,較佳為在1670℃~1730℃之範圍內。 In the clarification step S2, the following steps are performed: a defoaming treatment step of defoaming by heating the molten glass G; and an agglomerate treatment step of adjusting foreign matter (aggregate) to the platinum group metal mixed into the molten glass Providing heat, breaking or melting a foreign matter (agglomerate) of the platinum group metal to reduce the size of the foreign matter (agglomerate) of the platinum group metal; and an absorption treatment step of cooling the glass by cooling the molten glass Absorbs bubbles in the molten glass. In the agglomerate treatment step, in order to reduce or melt the foreign matter (aggregate) mixed in the molten glass and reduce the size of the foreign matter (aggregate) of the platinum group metal, it is necessary to make the heat supplied to the foreign matter (agglomerate) specific. Heat (minimum heat) or more. In this case, the heat of the foreign matter (aggregate) supplied to the molten glass is controlled so that the amount of heat supplied to the foreign matter (agglomerate) is equal to or higher than the minimum amount of heat. The above minimum heat can be studied in advance by performing experiments or the like in advance. In the case where the minimum heat is controlled by the temperature of the molten glass G, for example, the temperature of the molten glass G in the clarification pipe 41 is controlled to be in the range of 1580 ° C to 1730 ° C, preferably in the range of 1670 ° C to 1730 ° C.

於澄清步驟S2中,就充分進行熔融玻璃G之澄清之觀點而言,較佳為於輸送管43a之內部流動之熔融玻璃G之溫度並非降溫,而為逐漸升溫。較佳為於熔解步驟S1之後,熔融玻璃G以3℃/分鐘以上之速度升溫至1630℃以上。 In the clarification step S2, from the viewpoint of sufficiently clarifying the molten glass G, it is preferred that the temperature of the molten glass G flowing inside the transfer pipe 43a is not lowered, but is gradually increased. It is preferred that after the melting step S1, the molten glass G is heated to a temperature of 16 ° C or higher at a rate of 3 ° C / min or more.

於輸送管43a流動之熔融玻璃G之最高溫度為1620℃~1690℃,較佳為1640℃~1670℃。另外,於作為連接輸送管43a與澄清管41之區域之澄清管入口處之熔融玻璃G之溫度為1610℃~1680℃,較佳為1630℃~1660℃。進而,於作為連接澄清管41與輸送管43b之區域之澄清管出口處之熔融玻璃G之溫度為1530℃~1600℃,較佳為1540℃ ~1580℃。 The maximum temperature of the molten glass G flowing through the conveying pipe 43a is 1620 ° C to 1690 ° C, preferably 1640 ° C to 1670 ° C. Further, the temperature of the molten glass G at the inlet of the clarification pipe which is a region connecting the transfer pipe 43a and the clarification pipe 41 is 1610 ° C to 1680 ° C, preferably 1630 ° C to 1660 ° C. Further, the temperature of the molten glass G at the exit of the clarification pipe which is a region connecting the clarification pipe 41 and the transfer pipe 43b is 1530 ° C to 1600 ° C, preferably 1540 ° C. ~1580 °C.

於澄清管41中澄清後之熔融玻璃G自澄清管41通過輸送管43b流入至攪拌裝置100。熔融玻璃G於通過輸送管43b時冷卻。 The molten glass G clarified in the clarification pipe 41 flows from the clarification pipe 41 through the transfer pipe 43b to the stirring device 100. The molten glass G is cooled while passing through the conveying pipe 43b.

於攪拌步驟S3中,攪拌澄清後之熔融玻璃,使熔融玻璃之成分均質化。藉此,降低導致玻璃基板之脈理等之熔融玻璃之組成不規則。均質化後之熔融玻璃被送到成形步驟S4。 In the stirring step S3, the clarified molten glass is stirred to homogenize the components of the molten glass. Thereby, the composition irregularity of the molten glass which causes the pulse of a glass substrate etc. is reduced. The homogenized molten glass is sent to a forming step S4.

具體而言,於攪拌裝置100中,在低於通過澄清管41之熔融玻璃G之溫度之溫度下攪拌熔融玻璃G。例如,於攪拌裝置100中,熔融玻璃G之溫度為1250℃~1450℃。例如,於攪拌裝置100中,熔融玻璃G之黏度為500泊~1300泊。熔融玻璃G於攪拌裝置100中被攪拌而被均質化。 Specifically, in the stirring device 100, the molten glass G is stirred at a temperature lower than the temperature of the molten glass G passing through the clarification pipe 41. For example, in the stirring device 100, the temperature of the molten glass G is 1250 ° C to 1450 ° C. For example, in the stirring device 100, the viscosity of the molten glass G is 500 poise to 1300 poise. The molten glass G is stirred and homogenized in the stirring device 100.

於攪拌裝置100中均質化後之熔融玻璃G自攪拌裝置100通過輸送管43c流入至成形裝置42。熔融玻璃G通過輸送管43c時,冷卻為適於熔融玻璃G之成形之黏度。例如,熔融玻璃G冷卻至1100~1300℃。 The molten glass G homogenized in the stirring device 100 flows from the stirring device 100 to the forming device 42 through the conveying pipe 43c. When the molten glass G passes through the transfer pipe 43c, it is cooled to a viscosity suitable for the formation of the molten glass G. For example, the molten glass G is cooled to 1100 to 1300 °C.

再者,本實施形態之攪拌步驟S3於澄清步驟S2之後進行,但攪拌步驟S3亦可於澄清步驟S2之前進行。於該情形時,攪拌步驟S3時之熔融玻璃G之溫度可與澄清管41內之熔融玻璃G之溫度相等或更高。 Further, the stirring step S3 of the present embodiment is performed after the clarification step S2, but the stirring step S3 may be performed before the clarification step S2. In this case, the temperature of the molten glass G at the time of stirring step S3 may be equal to or higher than the temperature of the molten glass G in the clarification pipe 41.

於成形步驟S4中,利用溢流下拉法或浮式法連續地由熔融玻璃成形為平板玻璃。 In the forming step S4, the molten glass is continuously formed into a flat glass by an overflow down-draw method or a floating method.

具體而言,流入至成形裝置42之熔融玻璃G被供給至設置於成形爐(未圖示)之內部之成形體52。於成形體52之上表面沿成形體52之長度方向形成有槽。熔融玻璃G被供給至成形體52之上表面之槽。自槽溢出之熔融玻璃G經過成形體52之一對側面,向下方流下。沿成形體52之側面流下之一對熔融玻璃G於成形體52之下端合流,連續地成形為平板玻璃GR。 Specifically, the molten glass G that has flowed into the molding device 42 is supplied to the molded body 52 provided inside the forming furnace (not shown). A groove is formed on the upper surface of the formed body 52 along the longitudinal direction of the formed body 52. The molten glass G is supplied to the groove of the upper surface of the formed body 52. The molten glass G overflowing from the groove passes through one of the side faces of the molded body 52 and flows downward. One pair of molten glass G flowing down the side of the formed body 52 merges at the lower end of the formed body 52, and is continuously formed into a flat glass GR.

於緩冷步驟S5中,於成形步驟S4中連續成形之平板玻璃具有所期望之厚度,且以不產生應變及翹曲之方式緩緩冷卻。 In the slow cooling step S5, the flat glass continuously formed in the forming step S4 has a desired thickness and is gradually cooled so as not to cause strain and warpage.

於切斷步驟S6中,於緩冷步驟S5中緩冷之平板玻璃被切斷為特定之長度,獲得玻璃板。玻璃板被進一步切斷為特定之尺寸,獲得玻璃基板。 In the cutting step S6, the slowly cooled flat glass in the slow cooling step S5 is cut to a specific length to obtain a glass plate. The glass plate was further cut to a specific size to obtain a glass substrate.

(玻璃基板積層體及玻璃基板) (glass substrate laminate and glass substrate)

本實施形態提供積層多片玻璃基板而形成之玻璃基板積層體及玻璃基板。 This embodiment provides a glass substrate laminate and a glass substrate formed by laminating a plurality of glass substrates.

本實施形態之玻璃基板積層體之特徵在於,其體積合計為0.1m3以上,該玻璃基板積層體含有之所有鉑族金屬之凝聚物中,最大長度為50μm以下之凝聚物之個數的比率為70%以上。如後所述,此種玻璃基板積層體能夠不易於玻璃基板上產生應變,能夠不易形成玻璃基板之主表面之凹凸。因此,上述積層體之各玻璃基板適合用於顯示器用玻璃基板,特別是,對於在畫面顯示方面要求高清晰度之顯示器面板用玻璃基板較為有效。 The glass substrate laminate of the present embodiment has a total volume of 0.1 m 3 or more, and the ratio of the number of aggregates having a maximum length of 50 μm or less in the aggregate of all platinum group metals contained in the glass substrate laminate. It is 70% or more. As described later, such a glass substrate laminate can easily form strain on the glass substrate, and it is difficult to form irregularities on the main surface of the glass substrate. Therefore, each of the glass substrates of the above laminated body is suitably used for a glass substrate for a display, and in particular, it is effective for a glass substrate for a display panel which requires high definition for screen display.

另外,本實施形態之玻璃基板之特徵在於,玻璃基板含有之鉑族金屬之凝聚物中,最大長度為50μm以下之凝聚物之個數之比率為70%以上。藉由此種構成之玻璃基板,如後所述,能夠不易於玻璃基板上產生應變,能夠更不易形成玻璃基板之主表面之凹凸。 Further, the glass substrate of the present embodiment is characterized in that the ratio of the number of aggregates having a maximum length of 50 μm or less in the aggregate of the platinum group metal contained in the glass substrate is 70% or more. According to the glass substrate having such a configuration, as described later, strain can be prevented from occurring on the glass substrate, and irregularities on the main surface of the glass substrate can be more difficult to be formed.

此外,玻璃基板積層體及玻璃基板更佳為含有之鉑族金屬之凝聚物中,最大長度為50μm以下之凝聚物之個數之比率為90%以上。另外,玻璃基板積層體及玻璃基板更佳為含有之鉑族金屬之凝聚物中,最大長度為30μm以下之凝聚物之個數之比率為90%以上。 Further, the glass substrate laminate and the glass substrate are more preferably contained in the aggregate of the platinum group metal, and the ratio of the number of aggregates having a maximum length of 50 μm or less is 90% or more. Further, the glass substrate laminate and the glass substrate are more preferably contained in the aggregate of the platinum group metal, and the ratio of the number of aggregates having a maximum length of 30 μm or less is 90% or more.

關於用於玻璃基板之玻璃,應變點為600℃以上之玻璃適於後述之玻璃基板之製造方法。上述應變點更佳為650℃以上,尤其較佳為690℃以上,特別較佳為730℃以上。 Regarding the glass used for the glass substrate, the glass having a strain point of 600 ° C or higher is suitable for a method of producing a glass substrate to be described later. The strain point is more preferably 650 ° C or higher, particularly preferably 690 ° C or higher, and particularly preferably 730 ° C or higher.

(玻璃基板之應用例) (Application example of glass substrate)

利用本實施形態之玻璃基板之製造方法製造之玻璃基板特別適合用作液晶顯示器、電漿顯示器、有機EL顯示器等顯示器用玻璃基板或保護顯示器之保護玻璃。使用顯示器用玻璃基板之顯示器除了具有顯示器表面為平坦之平板顯示器以外,亦包括有機EL顯示器、液晶顯示器且顯示器表面彎曲之曲面顯示器。作為高清顯示器用玻璃基板,玻璃基板較佳用作例如液晶顯示器用玻璃基板、有機EL(Electro-Luminescence:電致發光)顯示器用玻璃基板、使用LTPS(Low Temperature Poly-silicon:低溫多晶矽)薄膜半導體或者IGZO(Indium,Gallium,Zinc,Oxide:銦鎵鋅氧化物)等氧化物半導體之顯示器用玻璃基板。 The glass substrate manufactured by the method for producing a glass substrate of the present embodiment is particularly suitably used as a glass substrate for a display such as a liquid crystal display, a plasma display, or an organic EL display, or a cover glass for a protective display. A display using a glass substrate for a display includes a flat panel display having a flat display surface, and an organic EL display, a liquid crystal display, and a curved display having a curved display surface. As a glass substrate for a high-definition display, the glass substrate is preferably used as, for example, a glass substrate for a liquid crystal display, a glass substrate for an organic EL (Electro-Luminescence) display, or a thin film poly-silicon semiconductor film using LTPS (Low Temperature Poly-silicon). Or a glass substrate for an oxide semiconductor display such as IGZO (Indium, Gallium, Zinc, Oxide).

作為顯示器用玻璃基板,使用無鹼玻璃或含微量鹼之玻璃。顯示器用玻璃基板於高溫時之黏性較高。例如,具有102.5泊之黏性之熔融玻璃之溫度在1500℃以上。再者,無鹼玻璃係實質上不含鹼金屬氧化物(R2O)之組成之玻璃。實質上不含鹼金屬氧化物係指,除去自原料等混入之雜質,未添加鹼金屬氧化物作為玻璃原料之組成之玻璃,例如,鹼金屬氧化物之含量未達0.1質量%。 As the glass substrate for a display, an alkali-free glass or a glass containing a small amount of alkali is used. The glass substrate for display has high viscosity at high temperatures. For example, the temperature of the molten glass having a viscosity of 10 2.5 poise is 1500 ° C or higher. Further, the alkali-free glass is a glass which does not substantially contain a composition of an alkali metal oxide (R 2 O). The fact that the alkali metal oxide is not contained in the raw material, and the alkali metal oxide is not added as a glass raw material, for example, the content of the alkali metal oxide is less than 0.1% by mass.

(玻璃組成) (glass composition)

於熔解槽40中,利用未圖示之加熱單元熔解玻璃原料,生成熔融玻璃G。玻璃原料被調配成實質上能獲得所期望組成之玻璃。作為玻璃之組成之一個例子,作為平板顯示器(FPD)用玻璃基板等顯示器用玻璃基板較佳之無鹼玻璃含有SiO2 50質量%~70質量%;Al2O3 0質量%~25質量%;B2O3 0質量%~15質量%;MgO 0質量%~10質量%;CaO 0質量%~20質量%;SrO 0質量%~20質量%;BaO 0質量%~10質量%。再者,亦可為BaO為0質量%~20質量%,而代替BaO 0質量%~10質量%。此處,MgO、CaO、SrO及BaO之合計之含量為5 質量%~30質量%。 In the melting tank 40, the glass raw material is melted by a heating unit (not shown) to produce molten glass G. The glass raw material is formulated into a glass that substantially achieves the desired composition. As an example of the composition of the glass, as a flat panel display (FPD) comprises a display glass substrate or the like with a preferred SiO 2 50 mass alkali-free glass of the glass substrate to 70% by mass%; Al 2 O 3 0 mass% to 25 mass%; B 2 O 3 0% by mass to 15% by mass; MgO 0% by mass to 10% by mass; CaO 0% by mass to 20% by mass; SrO 0% by mass to 20% by mass; BaO 0% by mass to 10% by mass. Further, BaO may be 0% by mass to 20% by mass, instead of BaO 0% by mass to 10% by mass. Here, the total content of MgO, CaO, SrO, and BaO is 5% by mass to 30% by mass.

另外,作為顯示器用玻璃基板,亦可使用含有微量鹼金屬氧化物之含微量鹼之玻璃。含微量鹼之玻璃包含0.1質量%~0.5質量%之R'2O作為其成分,較佳為包含0.2質量%~0.5質量%之R'2O作為其成分。此處,R'係選自Li、Na及K中之至少1種,R'2O係Li2O、Na2O、K2O之含量之合計。此外,R'2O之含量之合計亦可未達0.1質量%。因此,關於本實施形態之玻璃基板,除無鹼玻璃以外,亦適合使用鹼金屬氧化物(R'2O)之含量為0~0.5質量%之玻璃。 Further, as the glass substrate for a display, a glass containing a trace amount of an alkali metal oxide and a small amount of alkali may be used. The glass containing a trace amount of alkali contains 0.1% by mass to 0.5% by mass of R' 2 O as a component thereof, and preferably contains 0.2% by mass to 0.5% by mass of R' 2 O as a component thereof. Here, R 'is selected from Li, Na and K, of at least one, R' 2 O-based Li 2 O, Na 2 O, the total content of K 2 O. Further, the total content of R' 2 O may be less than 0.1% by mass. Therefore, in the glass substrate of the present embodiment, in addition to the alkali-free glass, a glass having an alkali metal oxide (R' 2 O) content of 0 to 0.5% by mass is preferably used.

根據本實施形態製造之玻璃可除上述成分外進而含有SnO2 0.01質量%~1質量%(較佳為0.01質量%~0.5質量%);Fe2O3 0質量%~0.2質量%(較佳為0.01質量%~0.08質量%)。另外,考慮環境負擔,較佳為利用本發明製造之玻璃實質上不含有As2O3、Sb2O3及PbO。為了減輕環境負擔,較佳為將氧化錫(SnO2)用作澄清劑。 The glass produced according to the present embodiment may further contain 0.01% by mass to 1% by mass (preferably 0.01% by mass to 0.5% by mass) of SnO 2 in addition to the above components; and Fe 2 O 3 0% by mass to 0.2% by mass (preferably It is 0.01% by mass to 0.08% by mass). Further, in consideration of environmental burden, it is preferred that the glass produced by the present invention does not substantially contain As 2 O 3 , Sb 2 O 3 and PbO. In order to reduce the environmental burden, tin oxide (SnO 2 ) is preferably used as a fining agent.

本實施形態以熔融玻璃處理步驟為澄清步驟、熔融玻璃處理裝置為包括澄清管41之澄清裝置之形態為例子進行了說明,但只要進行熔融玻璃處理步驟之裝置係設於熔解槽40與成形裝置42之間來對熔融玻璃進行特定處理之裝置,則無特別限制。玻璃處理裝置除了為澄清裝置以外,例如亦可為攪拌裝置、或者輸送熔融玻璃之輸送管。因此,熔融玻璃之處理除了包括澄清熔融玻璃之處理以外,亦包括對熔融玻璃進行均質化之處理、輸送熔融玻璃之處理等。另外,舉出於澄清步驟S2中亦進行凝聚物處理步驟S2B之例子來進行了說明,但例如亦可於攪拌步驟S3、用輸送管輸送熔融玻璃G之步驟中進行凝聚物處理步驟S2B。再者,即便係於澄清步驟S2中進行凝聚物處理步驟S2B之情形時,如上所述,凝聚物處理步驟S2B亦無需於吸收處理步驟S2C之前進行,可於吸收處理步驟S2C之後進行。 In the present embodiment, the molten glass processing step is a clarification step, and the molten glass processing apparatus is a clarification device including the clarification tube 41. However, the apparatus for performing the molten glass processing step is provided in the melting tank 40 and the forming apparatus. The apparatus for specifically treating the molten glass between 42 is not particularly limited. The glass processing apparatus may be, for example, a stirring device or a conveying pipe for conveying molten glass, in addition to the clarifying device. Therefore, the treatment of the molten glass includes, in addition to the treatment for clarifying the molten glass, the treatment of homogenizing the molten glass, the treatment of transporting the molten glass, and the like. Further, although the example in which the agglomerate treatment step S2B is performed in the clarification step S2 has been described, for example, the agglomerate treatment step S2B may be performed in the step of stirring the step S3 and transporting the molten glass G by the transfer tube. Further, even in the case where the agglomerate treatment step S2B is performed in the clarification step S2, as described above, the agglomerate treatment step S2B does not need to be performed before the absorption treatment step S2C, and can be performed after the absorption treatment step S2C.

(澄清管之構成) (constitution of clarification pipe)

繼而,詳細說明本實施形態中之澄清裝置之澄清管41之構成。並且,澄清裝置除了澄清管41以外,亦包括通氣管41a、加熱電極41b、及包圍澄清管41之外周之未圖示之耐火保護層及耐火磚。圖3係主要表示澄清管41之外觀圖。圖4係表示澄清管41之內部之截面圖及示出澄清管之溫度分佈之一個例子的圖。 Next, the configuration of the clarification pipe 41 of the clarification device in the present embodiment will be described in detail. Further, the clarification device includes a vent pipe 41a, a heating electrode 41b, and a refractory protective layer and a refractory brick (not shown) which surround the outer periphery of the clarification pipe 41, in addition to the clarification pipe 41. Fig. 3 is a view mainly showing the appearance of the clarification pipe 41. Fig. 4 is a cross-sectional view showing the inside of the clarification pipe 41 and a view showing an example of the temperature distribution of the clarification pipe.

於澄清管41上安裝有通氣管41a及一對加熱電極41b。澄清管41之內部具有因熔融玻璃G之導入而形成由熔融玻璃G之表面與壁包圍之氣相空間41c之空間。例如,澄清管41之內部具有熔融玻璃G流動之液相、及由熔融玻璃G之液面與壁形成之氣相空間。氣相空間41c沿熔融玻璃G之流動方向形成。包圍氣相空間41c之壁之至少一部分由包含鉑族金屬之材料構成。於本實施形態中,包圍氣相空間41c之整個壁均由包含鉑族金屬之材料構成。 A vent pipe 41a and a pair of heating electrodes 41b are attached to the clarification pipe 41. The inside of the clarification pipe 41 has a space in which the gas phase space 41c surrounded by the surface and the wall of the molten glass G is formed by the introduction of the molten glass G. For example, the inside of the clarification pipe 41 has a liquid phase in which the molten glass G flows, and a gas phase space formed by the liquid surface and the wall of the molten glass G. The gas phase space 41c is formed along the flow direction of the molten glass G. At least a portion of the wall surrounding the gas phase space 41c is composed of a material containing a platinum group metal. In the present embodiment, the entire wall surrounding the gas phase space 41c is made of a material containing a platinum group metal.

通氣管41a於熔融玻璃G之流動方向之中途設於與氣相空間41c接觸之壁,使氣相空間41c與澄清管41之外側之大氣連通。通氣管41a較佳為與澄清管41同樣地用鉑族金屬成形。通氣管41a由於散熱功能,使通氣管41a之溫度容易下降,故而亦可設置用以加熱通氣管41a之加熱機構。 The vent pipe 41a is provided in the wall contacting the gas phase space 41c in the flow direction of the molten glass G, and connects the gas phase space 41c to the atmosphere outside the clarification pipe 41. The vent pipe 41a is preferably formed of a platinum group metal in the same manner as the clarification pipe 41. Since the vent pipe 41a has a heat dissipation function, the temperature of the vent pipe 41a is easily lowered, and a heating mechanism for heating the vent pipe 41a may be provided.

一對加熱電極41b係設於澄清管41a之兩端之凸緣形狀之電極板。加熱電極41b使自未圖示之電源供給之電流流向澄清管41,利用該電流,澄清管41被通電加熱。於使用氧化錫作為澄清劑之情形時,例如澄清管41之壁被加熱至最高溫度為1670℃~1750℃,更佳為1690℃~1750℃。澄清管41之壁之最高溫度與最低溫度之差為5℃以上,氣相空間具有氧氣。熔融玻璃G之溫度被加熱至促進氧化錫之還原反應的溫度。進而,熔融玻璃G較佳為被加熱至斷開或者熔解鉑族金屬之異物(凝聚物)之溫度,例如1670℃以上,更佳為被加熱至1680℃以上。更具體而言,較佳為被加熱至1670℃~1730℃,更佳為被加熱至1680℃ ~1700℃。熔融玻璃G之最高溫度若超過1730℃,則包含構成澄清管41a之鉑族金屬之管容易熔損。此外,熔融玻璃G之最高溫度可根據設於澄清管41之未圖示之熱電偶之測量值算出。 The pair of heating electrodes 41b are provided on the flange-shaped electrode plates at both ends of the clarification pipe 41a. The heating electrode 41b causes a current supplied from a power source (not shown) to flow to the clarification pipe 41, and the clarification pipe 41 is electrically heated by the current. In the case where tin oxide is used as the fining agent, for example, the wall of the clarification tube 41 is heated to a maximum temperature of 1670 ° C to 1750 ° C, more preferably 1690 ° C to 1750 ° C. The difference between the highest temperature and the lowest temperature of the wall of the clarification pipe 41 is 5 ° C or more, and the gas phase space has oxygen. The temperature of the molten glass G is heated to a temperature that promotes the reduction reaction of tin oxide. Further, the molten glass G is preferably heated to a temperature at which the foreign matter (agglomerate) of the platinum group metal is broken or melted, for example, 1670 ° C or higher, more preferably heated to 1680 ° C or higher. More specifically, it is preferably heated to 1670 ° C ~ 1730 ° C, more preferably heated to 1680 ° C ~1700 °C. When the maximum temperature of the molten glass G exceeds 1730 ° C, the tube containing the platinum group metal constituting the clarification tube 41 a is easily melted. Further, the maximum temperature of the molten glass G can be calculated from the measured value of a thermocouple (not shown) provided in the clarification pipe 41.

可藉由控制於澄清管41流動之電流來控制此種於澄清管41之內部流動之熔融玻璃G之溫度。 The temperature of the molten glass G flowing inside the clarification pipe 41 can be controlled by controlling the current flowing through the clarification pipe 41.

於澄清管41設置一對加熱電極41b,但加熱電極41b之數量並無特別限制。藉由控制加熱電極41b之電流量,而澄清管41之與氣相空間41c接觸之壁之溫度例如被控制於1500~1750℃之範圍內。 The pair of heating electrodes 41b are provided in the clarification pipe 41, but the number of the heating electrodes 41b is not particularly limited. By controlling the amount of current of the heating electrode 41b, the temperature of the wall of the clarification tube 41 which is in contact with the gas phase space 41c is controlled, for example, in the range of 1500 to 1750 °C.

於澄清管41之內部,利用熔融玻璃G中含有之澄清劑例如氧化錫之氧化還原反應,除去熔融玻璃G中包含之含有CO2或SO2之氣泡。具體而言,首先,升高熔融玻璃G之溫度使澄清劑還原,使於熔融玻璃G中產生氧氣泡。熔融玻璃G中包含之含有CO2、N2、SO2等氣體成分之氣泡與因澄清劑之還原反應而產生之氧氣泡合體。與氧氣泡合體後之氣泡上浮至與氣相空間接觸之熔融玻璃G之表面而釋放氣泡,即破裂消失(消泡處理)。該消泡處理中之熔融玻璃G之溫度為1610℃~1730℃,較佳為1640℃~1710℃。為上述範圍之溫度時,鉑族金屬自澄清管41之壁大量揮發。因消泡而向氣相空間釋放氧,故而於進行消泡處理之氣相空間之部分氧濃度變高,其結果,鉑族金屬之揮發更加活躍。與此相伴,氣相空間中含有之鉑族金屬之揮發物之濃度變高,因此,容易產生氣相空間中含有之鉑族金屬之揮發物之凝聚。尤其,鉑族金屬之揮發物容易於壁之局部冷卻之位置,例如於澄清管41之入口附近之壁凝聚。因此,附著於澄清管41之壁之鉑族金屬之凝聚物之一部分脫落,容易作為異物混入熔融玻璃G內。例如,於熔融玻璃流入至澄清管41後,容易於熔融玻璃G之溫度為1580℃~1660℃之區域發生包含於氣相空間中之鉑族金屬之揮發物之凝聚及凝聚物混入至熔融玻璃G。 Inside the clarification pipe 41, a bubble containing CO 2 or SO 2 contained in the molten glass G is removed by a redox reaction of a clarifying agent such as tin oxide contained in the molten glass G. Specifically, first, the temperature of the molten glass G is raised to reduce the clarifying agent, and oxygen bubbles are generated in the molten glass G. An oxygen bubble mixture containing bubbles of a gas component such as CO 2 , N 2 , and SO 2 contained in the molten glass G and a reduction reaction by a clarifying agent. The bubble which is combined with the oxygen bubble floats up to the surface of the molten glass G which is in contact with the gas phase space to release the bubble, that is, the crack disappears (defoaming treatment). The temperature of the molten glass G in the defoaming treatment is from 1610 ° C to 1730 ° C, preferably from 1640 ° C to 1710 ° C. When it is the temperature of the above range, the platinum group metal is largely volatilized from the wall of the clarification pipe 41. Since oxygen is released into the gas phase space by defoaming, the oxygen concentration in the gas phase space where the defoaming treatment is performed is increased, and as a result, the volatilization of the platinum group metal is more active. Along with this, the concentration of the volatile matter of the platinum group metal contained in the gas phase space becomes high, and therefore, aggregation of the volatile matter of the platinum group metal contained in the gas phase space is likely to occur. In particular, the volatiles of the platinum group metal are prone to localized cooling of the walls, for example to the walls near the inlet of the clarification tube 41. Therefore, one of the aggregates of the platinum group metal adhering to the wall of the clarification pipe 41 is partially detached, and it is easy to be mixed into the molten glass G as a foreign matter. For example, after the molten glass flows into the clarification pipe 41, it is easy to cause agglomeration of the volatile matter of the platinum group metal contained in the gas phase space and the agglomerate is mixed into the molten glass in the region where the temperature of the molten glass G is from 1580 ° C to 1660 ° C. G.

因此,自消泡處理之中途、或者於消泡處理結束之後,進行減小混入至熔融玻璃G之鉑族金屬之異物(凝聚物)之大小的凝聚物處理步驟。 Therefore, in the middle of the defoaming treatment or after the completion of the defoaming treatment, an agglomerate treatment step of reducing the size of the foreign matter (aggregate) of the platinum group metal mixed in the molten glass G is performed.

於消泡處理結束之後進行凝聚物處理步驟之情形時,較佳為使熔融玻璃G升溫,以使包含鉑族金屬之異物(凝聚物)之熔融玻璃G之溫度高於鉑族金屬之異物(凝聚物)混入至熔融玻璃G之區域中之熔融玻璃之溫度。 In the case where the agglomerate treatment step is performed after the completion of the defoaming treatment, it is preferred to raise the temperature of the molten glass G so that the temperature of the molten glass G containing the foreign matter (agglomerate) of the platinum group metal is higher than that of the platinum group metal ( Agglomerate) The temperature of the molten glass mixed into the region of the molten glass G.

另外,於自消泡處理步驟之中途進行凝聚物處理步驟之情形時,同時進行消泡處理步驟與凝聚物處理步驟。於自消泡處理步驟之中途進行凝聚物處理步驟之情形時,有時同時進行消泡處理步驟與凝聚物處理步驟。於自消泡處理步驟之中途進行凝聚物處理步驟之情形時,於凝聚物處理步驟中熔融玻璃為最高溫度。即,消泡處理步驟(熔融玻璃處理步驟)亦可包括凝聚物處理步驟。 Further, in the case where the agglomerate treatment step is carried out in the middle of the defoaming treatment step, the defoaming treatment step and the agglomerate treatment step are simultaneously performed. In the case where the agglomerate treatment step is performed in the middle of the defoaming treatment step, the defoaming treatment step and the agglomerate treatment step may be simultaneously performed. In the case where the agglomerate treatment step is carried out in the middle of the defoaming treatment step, the molten glass is at the highest temperature in the agglomerate treatment step. That is, the defoaming treatment step (melting glass treatment step) may also include a coagulum treatment step.

於凝聚物處理步驟中,較佳為藉由控制對混入至熔融玻璃之鉑族金屬之異物(凝聚物)施加之熱量,具體而言藉由使熔融玻璃G之溫度為1670℃以上,而斷開、熔解鉑族金屬之異物(凝聚物)。此時,藉由以混入至熔融玻璃G之鉑族金屬之異物(凝聚物)中,最大長度為50μm以下大小之異物之個數之比率在70%以上之方式進行凝聚物處理步驟,而使玻璃基板產生之應變較小,亦較少地於玻璃基板之主表面形成凹凸。為了形成此種大小之異物,較佳為使熔融玻璃G之溫度在1670℃以上之狀態維持10分鐘以上,更佳為維持30分鐘以上。即,於縮小鉑族金屬之異物(凝聚物)之大小之凝聚物減小處理中,藉由於1670℃以上之溫度下保持10分鐘以上,而能夠減小鉑族金屬之異物(凝聚物)之大小。 In the agglomerate treatment step, it is preferred to control the heat applied to the foreign matter (agglomerate) of the platinum group metal mixed in the molten glass, specifically, by setting the temperature of the molten glass G to 1670 ° C or more. Opening and melting foreign matter (agglomerate) of platinum group metals. In this case, the agglomerate treatment step is carried out so that the ratio of the number of the foreign matter having a maximum length of 50 μm or less is 70% or more among the foreign matter (aggregate) of the platinum group metal mixed in the molten glass G. The glass substrate produces less strain and less irregularities are formed on the main surface of the glass substrate. In order to form a foreign matter having such a size, it is preferable to maintain the temperature of the molten glass G at 1,670 ° C or higher for 10 minutes or longer, and more preferably for 30 minutes or longer. In other words, in the agglomerate reduction treatment for reducing the size of the foreign matter (agglomerate) of the platinum group metal, the foreign matter (aggregate) of the platinum group metal can be reduced by holding at a temperature of 1670 ° C or higher for 10 minutes or longer. size.

另外,於本實施形態中,於上述凝聚物處理步驟中,亦較佳為控制溶解度,以使混入至熔融玻璃之鉑族金屬之異物(凝聚物)溶解於 熔融玻璃之溶解度高於在熔融玻璃處理步驟中鉑族金屬之異物(凝聚物)混入至熔融玻璃之區域中之溶解度。於提高異物(凝聚物)向熔融玻璃G之溶解度之情形時,藉由使熔融玻璃G之溫度上升,而能提高凝聚物向熔融玻璃之溶解度,或者,藉由使熔融玻璃G之溫度上升及/或延長處理時間,而能提高異物(凝聚物)向熔融玻璃G之溶解量。 Further, in the present embodiment, in the agglomerate treatment step, it is also preferred to control the solubility so that the foreign matter (aggregate) of the platinum group metal mixed in the molten glass is dissolved. The solubility of the molten glass is higher than the solubility of the foreign matter (agglomerate) of the platinum group metal in the region of the molten glass in the molten glass treatment step. When the solubility of the foreign matter (aggregate) to the molten glass G is increased, the solubility of the aggregate to the molten glass can be increased by increasing the temperature of the molten glass G, or by increasing the temperature of the molten glass G and / or to extend the treatment time, and to increase the amount of dissolution of foreign matter (agglomerate) into the molten glass G.

再者,鉑族金屬之異物(凝聚物)係於一個方向上細長之線狀物。因此,鉑族金屬之凝聚物(異物)之最大長度係指,拍攝鉑族金屬之異物(凝聚物)時外接(外切)於異物之像之外接長方形之長邊的長度。 Further, the foreign matter (agglomerate) of the platinum group metal is a linear elongated line in one direction. Therefore, the maximum length of the aggregate of the platinum group metal (foreign matter) means the length of the long side of the rectangle which is externally connected (externally cut) to the image of the foreign object when the foreign matter (aggregate) of the platinum group metal is photographed.

於凝聚物處理步驟前,最大長度為100μm以上之鉑族金屬之異物(凝聚物)之比率超過80%。另外,於本實施形態中,凝聚物處理步驟前之鉑族金屬之異物(凝聚物)係指,最大長度與最小長度之比,即縱橫比超過100之鉑族金屬之異物。例如,鉑族金屬之異物(凝聚物)之最大長度為50μm~300μm,最小長度為0.5μm~2μm。 Before the agglomerate treatment step, the ratio of the foreign matter (agglomerate) of the platinum group metal having a maximum length of 100 μm or more exceeds 80%. Further, in the present embodiment, the foreign matter (aggregate) of the platinum group metal before the agglomerate treatment step means a ratio of the maximum length to the minimum length, that is, a foreign matter of a platinum group metal having an aspect ratio of more than 100. For example, the foreign matter (agglomerate) of the platinum group metal has a maximum length of 50 μm to 300 μm and a minimum length of 0.5 μm to 2 μm.

然後,降低熔融玻璃G之溫度,使還原之澄清劑氧化。藉此,殘留於熔融玻璃G中之氣泡之氧被熔融玻璃G吸收(吸收處理)。如此,殘留之氣泡變小並消失。如此,利用澄清劑之氧化還原反應除去熔融玻璃G中包含之氣泡。另外,於吸收處理步驟S2C中,熔融玻璃G之溫度及澄清管41之壁之溫度降至1580℃以下,與消泡處理步驟S2A相比,氣相空間中含有之氧濃度下降,故而難以進行鉑族金屬之揮發及凝聚。因此,於吸收處理步驟S2C中,與消泡處理步驟S2A相比,新的鉑族金屬之凝聚物成為異物並混入至熔融玻璃G之可能性極低。 Then, the temperature of the molten glass G is lowered to oxidize the reduced fining agent. Thereby, the oxygen of the bubble remaining in the molten glass G is absorbed by the molten glass G (absorption treatment). As a result, the remaining bubbles become smaller and disappear. Thus, the bubbles contained in the molten glass G are removed by the redox reaction of the clarifying agent. Further, in the absorption treatment step S2C, the temperature of the molten glass G and the temperature of the wall of the clarification pipe 41 are lowered to 1,580 ° C or lower, and the oxygen concentration in the gas phase space is lowered as compared with the defoaming treatment step S2A, so that it is difficult to carry out Volatilization and agglomeration of platinum group metals. Therefore, in the absorption treatment step S2C, compared with the defoaming treatment step S2A, the possibility that the new aggregate of the platinum group metal becomes a foreign matter and is mixed into the molten glass G is extremely low.

雖未圖示,但於澄清管41之外壁面設有耐火保護層。於耐火保護層之外側進而設有耐火磚。耐火磚載置於基台(未圖示)。再者,亦可藉由耐火保護層及/或耐火磚而調整來自澄清管41之散熱量而控制澄清管41之與氣相空間41c接觸之壁的溫度及/或於澄清管41內流動之熔融玻璃溫度。 Although not shown, a refractory protective layer is provided on the outer wall surface of the clarification pipe 41. A refractory brick is further provided on the outer side of the refractory protective layer. The refractory bricks are placed on abutment (not shown). Further, the temperature of the wall of the clarification pipe 41 contacting the gas phase space 41c may be adjusted by the refractory protective layer and/or the refractory brick to adjust the amount of heat released from the clarification pipe 41 and/or flow in the clarification pipe 41. Molten glass temperature.

圖4示出與澄清管41之X方向之位置對應表示之澄清管41之溫度分佈(澄清管41之與氣相空間41c接觸之壁之X方向之溫度分佈)的一個例子。於溫度分佈中,於澄清管41之熔融玻璃G流入側之端部41d(入口)與通氣管41a之間,溫度變為最高溫度Tmax。形成自該最高溫度Tmax之位置P起朝著澄清管41之端部41d溫度下降之溫度梯度。同樣,形成自最高溫度Tmax之位置P起朝著通氣管41a之X方向之位置溫度下降之溫度梯度。另外,雖未圖示,但除了上述以外,亦於通氣管41a之X方向之位置與澄清管41之熔融玻璃G流出側之端部41e(出口)之間形成溫度梯度區域。於此種溫度梯度區域中,任一溫度梯度區域中,溫度梯度區域中之最高溫度與最低溫度之溫度差超過0℃且為150℃以下,更佳為超過0℃且為100℃以下。如圖4所示,於持續至壁之溫度成為最高溫度Tmax之溫度上升區間之前半部分開始消泡處理,至少持續至最高溫度Tmax。另外,於包括最高溫度Tmax之溫度上升區間之後半部分開始凝聚物處理步驟,至少持續至最高溫度Tmax。凝聚物處理步驟例如於熔融玻璃G之溫度為1670℃以上開始。再者,關於消泡處理步驟結束及凝聚物處理步驟結束之時間點,可為任一者在先,但就將混入至熔融玻璃之所有鉑族金屬之異物作為凝聚物處理步驟之對象之方面而言,較佳為凝聚物處理步驟之結束與消泡處理步驟之結束同時或者於其之後。 4 shows an example of the temperature distribution of the clarification pipe 41 corresponding to the position of the clarification pipe 41 in the X direction (the temperature distribution in the X direction of the wall of the clarification pipe 41 which is in contact with the gas phase space 41c). In the temperature distribution, the temperature becomes the highest temperature T max between the end portion 41d (inlet) of the molten glass G inflow side of the clarification pipe 41 and the vent pipe 41a. A temperature gradient from the position P of the highest temperature T max to the temperature drop toward the end portion 41d of the clarification pipe 41 is formed. Similarly, a temperature gradient from the position P of the highest temperature T max from the position in the X direction of the vent pipe 41a is formed. Further, although not shown, in addition to the above, a temperature gradient region is formed between the position of the vent pipe 41a in the X direction and the end portion 41e (outlet) of the molten glass G outflow side of the clarification pipe 41. In such a temperature gradient region, in any of the temperature gradient regions, the temperature difference between the highest temperature and the lowest temperature in the temperature gradient region exceeds 0 ° C and is 150 ° C or less, more preferably exceeds 0 ° C and is 100 ° C or less. As shown in FIG. 4, the defoaming process is started in the first half of the temperature rise section until the temperature of the wall becomes the highest temperature Tmax , at least until the maximum temperature Tmax . In addition, the agglomerate treatment step is started in the second half of the temperature rise interval including the highest temperature T max , at least to the highest temperature T max . The agglomerate treatment step starts, for example, at a temperature at which the temperature of the molten glass G is 1670 °C or higher. Further, the time point at which the defoaming treatment step ends and the agglomerate treatment step are completed may be either first, but the foreign matter of all the platinum group metals mixed in the molten glass is used as the object of the agglomerate treatment step. Preferably, the end of the agglomerate treatment step is coincident with or after the end of the defoaming treatment step.

如此,於本實施形態中,對熔融玻璃G中之氣泡進行消泡處理,但此時,自壁揮發之鉑族金屬之揮發物之凝聚物作為異物混入熔融玻璃G中。減小混入至熔融玻璃G之凝聚物之大小,使混入至熔融玻璃G之異物(凝聚物)中,最大長度為50μm以下之異物(凝聚物)之個數之比率為70%以上。或者,控制施加於鉑族金屬之異物之熱量,以減小混入之鉑族金屬之異物之大小。藉此,即便鉑族金屬之異物混入至玻璃基板,亦能夠不易於玻璃基板上產生應變,能夠不易形成玻璃基板之 主表面之凹凸。 As described above, in the present embodiment, the bubbles in the molten glass G are subjected to the defoaming treatment. However, at this time, the aggregate of the volatile matter of the platinum group metal volatilized from the wall is mixed into the molten glass G as a foreign matter. The amount of the agglomerates mixed in the molten glass G is reduced, and the ratio of the number of foreign substances (agglomerates) having a maximum length of 50 μm or less is 70% or more in the foreign matter (agglomerate) of the molten glass G. Alternatively, the amount of heat applied to the foreign matter of the platinum group metal is controlled to reduce the size of the foreign matter of the platinum group metal mixed therein. Thereby, even if a foreign matter of a platinum group metal is mixed into the glass substrate, strain on the glass substrate can be prevented, and the glass substrate can be easily formed. The unevenness of the main surface.

另外,上述之澄清管41中之與氣相空間接觸之壁之溫度的最高溫度與最低溫度之差為5℃以上,即便氣相空間係含氧之氣氛,即,即便為容易產生鉑族金屬之凝聚物之條件,亦能降低熔融玻璃中包含之鉑族金屬之異物之大小,或者能使最大長度為50μm以下之鉑族金屬之異物之個數之比率在70%以上。因此,即便鉑族金屬之異物混入至玻璃基板,亦能夠不易於玻璃基板上產生應變,能夠不易形成玻璃基板之主表面之凹凸。 Further, the difference between the highest temperature and the lowest temperature of the temperature of the wall in contact with the gas phase space in the above-mentioned clarification pipe 41 is 5 ° C or more, even if the gas phase space is an oxygen-containing atmosphere, that is, even if it is easy to generate a platinum group metal The condition of the agglomerate can also reduce the size of the foreign matter of the platinum group metal contained in the molten glass, or the ratio of the number of foreign matters of the platinum group metal having a maximum length of 50 μm or less is 70% or more. Therefore, even if a foreign matter of a platinum group metal is mixed into the glass substrate, strain on the glass substrate can be prevented from occurring, and irregularities on the main surface of the glass substrate can be prevented from being easily formed.

另外,於進行凝聚物處理步驟時,較佳為升溫,以使包含凝聚物之熔融玻璃G之溫度高於熔融玻璃處理步驟中鉑族金屬之異物(凝聚物)混入至熔融玻璃G之區域中之熔融玻璃之溫度。藉此,能藉由熱斷開或熔解鉑族金屬之異物(凝聚物),能可靠地減小鉑族金屬之異物(凝聚物)之大小。 Further, in the step of performing the agglomerate treatment, it is preferred to raise the temperature so that the temperature of the molten glass G containing the aggregate is higher than the foreign matter (aggregate) of the platinum group metal in the molten glass treatment step, and is mixed into the region of the molten glass G. The temperature of the molten glass. Thereby, the foreign matter (aggregate) of the platinum group metal can be reliably broken or melted, and the size of the foreign matter (aggregate) of the platinum group metal can be reliably reduced.

另外,玻璃處理裝置係具有澄清管41之澄清裝置,澄清管41內之氣相空間沿熔融玻璃之流動方向形成,凝聚物處理步驟較佳為於澄清管41進行。於直至成形步驟之期間,澄清管41中之熔融玻璃G之溫度為最高溫度,因此能容易地藉由熱而將鉑族金屬之異物(凝聚物)斷開或者熔解。 Further, the glass processing apparatus has a clarification device for the clarification pipe 41, and the gas phase space in the clarification pipe 41 is formed along the flow direction of the molten glass, and the agglomerate treatment step is preferably performed on the clarification pipe 41. The temperature of the molten glass G in the clarification pipe 41 is the highest temperature until the forming step, so that the foreign matter (agglomerate) of the platinum group metal can be easily broken or melted by heat.

於本實施形態之玻璃處理步驟中,使用熔融玻璃G中包含之氧化錫進行減少熔融玻璃G中之氣泡數之澄清處理,使玻璃處理裝置中之與氣相空間接觸之壁形成沿著熔融玻璃之流動方向之溫度分佈,使氣相空間形成沿著熔融玻璃G之流動方向之氧濃度分佈。於此種裝置中,由於有對鉑族金屬之揮發產生影響之氧濃度分佈,因此容易產生鉑族金屬之揮發物之凝聚物,該凝聚物容易作為異物混入至熔融玻璃。即便於此種情形時,亦能容易地減小鉑族金屬之異物(凝聚物)之大小,而能夠不易於玻璃基板上產生應變,能夠不易形成玻璃基板之 主表面之凹凸。 In the glass treatment step of the present embodiment, the tin oxide contained in the molten glass G is used to reduce the number of bubbles in the molten glass G, and the wall in the glass processing apparatus which is in contact with the gas phase space is formed along the molten glass. The temperature distribution in the flow direction causes the gas phase space to form an oxygen concentration distribution along the flow direction of the molten glass G. In such an apparatus, since there is an oxygen concentration distribution which affects the volatilization of the platinum group metal, aggregation of volatile matter of the platinum group metal is likely to occur, and the aggregate is easily mixed as a foreign matter into the molten glass. That is, in this case, the size of the foreign matter (agglomerate) of the platinum group metal can be easily reduced, and the strain on the glass substrate can be prevented from being easily formed, and the glass substrate can be easily formed. The unevenness of the main surface.

較佳為凝聚物處理步驟於玻璃處理裝置中進行,以將於該玻璃處理裝置中流動之熔融玻璃中之在與氣相空間中氧濃度最高之區域對應之流動方向之位置上流動之熔融玻璃包含在內之方式進行凝聚物處理步驟。於圖4所示之溫度分佈中,熔融玻璃G之消泡處理在最高溫度Tmax處最活躍進行。藉此,由於自氣泡釋放之氧,於最高溫度Tmax附近之氣相空間內之區域中,氧濃度變得最高。例如,對通過與該氧濃度最高之氣相空間內之區域對應之流動方向之位置的熔融玻璃進行凝聚物處理步驟。因此,即便鉑族金屬因最大氧濃度而使鉑族金屬之揮發活躍,其結果導致容易產生鉑族金屬之凝聚物而使鉑族金屬之凝聚物作為異物混入至熔融玻璃時,亦能高效地減小該異物之大小。 Preferably, the agglomerate treatment step is carried out in a glass processing apparatus, and the molten glass flowing in the flow direction of the molten glass flowing in the glass processing apparatus at a position corresponding to a flow direction corresponding to a region having the highest oxygen concentration in the gas phase space The condensate treatment step is carried out in a manner included. In the temperature distribution shown in Fig. 4, the defoaming treatment of the molten glass G is most actively performed at the highest temperature T max . Thereby, the oxygen concentration becomes the highest in the region in the gas phase space near the highest temperature T max due to the oxygen released from the bubble. For example, the agglomeration treatment step is performed on the molten glass passing through the position in the flow direction corresponding to the region in the gas phase space having the highest oxygen concentration. Therefore, even if the platinum group metal is active in the volatilization of the platinum group metal due to the maximum oxygen concentration, the aggregate of the platinum group metal is likely to be generated, and the aggregate of the platinum group metal can be efficiently mixed as a foreign matter to the molten glass. Reduce the size of the foreign object.

較佳為澄清管41之氣相空間中之氧濃度超過0%且為1.0%以下,澄清管41之壁之最高溫度與最低溫度之差為5℃以上且100℃以下。藉此,能抑制鉑族金屬之揮發,抑制混入至熔融玻璃G之鉑族金屬之異物。然而,即便於該情形時,亦不能完全使鉑族金屬之異物為零。因此,藉由減小鉑族金屬之異物之大小,而不易於玻璃基板上產生應變、不易形成玻璃基板之主表面之凹凸之本實施形態之效果更加顯著。另外,由於能抑制鉑族金屬之揮發,故而能提高澄清管41等由鉑族金屬構成之裝置之壽命。 It is preferable that the oxygen concentration in the gas phase space of the clarification pipe 41 exceeds 0% and is 1.0% or less, and the difference between the highest temperature and the lowest temperature of the wall of the clarification pipe 41 is 5 ° C or more and 100 ° C or less. Thereby, the volatilization of the platinum group metal can be suppressed, and the foreign matter of the platinum group metal mixed in the molten glass G can be suppressed. However, even in this case, the foreign matter of the platinum group metal cannot be completely made zero. Therefore, the effect of the present embodiment in which the size of the foreign matter of the platinum group metal is reduced, the strain on the glass substrate is less likely to occur, and the unevenness of the main surface of the glass substrate is less likely to be formed is more remarkable. Further, since the volatilization of the platinum group metal can be suppressed, the life of the device made of the platinum group metal such as the clarification pipe 41 can be improved.

另外,於熔融玻璃處理步驟之至少一部分中將熔融玻璃G之溫度控制在1580℃~1660℃之溫度範圍,將凝聚物處理步驟時之熔融玻璃G之溫度控制在1670℃~1730℃,而能可靠地進行消泡處理,且能可靠地減小鉑族金屬之異物(凝聚物)之大小。亦即,能兼顧玻璃基板中包含之氣泡數之減少與最大長度為50μm以上之鉑族金屬之異物之減少。另外,於澄清管41之氣相空間之氧濃度具有因場所而異之分佈之情形時,於氧濃度高於特定值之區域中,容易向熔融玻璃G混入鉑族 金屬之異物(凝聚物),因此,較佳為將熔融玻璃G之溫度調整為即便混入鉑族金屬之異物(凝聚物)亦能減小鉑族金屬之異物(凝聚物)之大小之程度的溫度,例如1680℃以上之溫度。更佳為,將熔融玻璃溫度控制為沿氣相空間之氧濃度分佈形成熔融玻璃之溫度分佈。 Further, in at least a part of the molten glass treatment step, the temperature of the molten glass G is controlled to a temperature range of 1580 ° C to 1660 ° C, and the temperature of the molten glass G at the agglomerate treatment step is controlled at 1670 ° C to 1730 ° C, and The defoaming treatment is reliably performed, and the size of the foreign matter (agglomerate) of the platinum group metal can be reliably reduced. In other words, it is possible to achieve a reduction in the number of bubbles included in the glass substrate and a reduction in foreign matter of the platinum group metal having a maximum length of 50 μm or more. Further, when the oxygen concentration in the gas phase space of the clarification pipe 41 has a distribution depending on the place, in the region where the oxygen concentration is higher than a specific value, it is easy to mix the platinum group into the molten glass G. Since the foreign matter (aggregate) of the metal is adjusted, the temperature of the molten glass G is preferably adjusted to a level that reduces the size of the foreign matter (aggregate) of the platinum group metal even if the foreign matter (aggregate) of the platinum group metal is mixed. Temperature, for example, a temperature above 1680 °C. More preferably, the temperature of the molten glass is controlled to form a temperature distribution of the molten glass along the oxygen concentration distribution in the gas phase space.

於上述實施形態中,作為控制調整熔融玻璃中之凝聚物之溶解度之條件之例子,舉例說明了控制提供至凝聚物之熱量之例子。然而,調整溶解度之條件以溶解度為上述最小溶解度以上之方式,可例舉包括上述熱量控制之以下條件。藉由控制該等條件或者組合控制該等條件,而能調整溶解度。 In the above embodiment, as an example of the condition for controlling the solubility of the aggregate in the molten glass, an example of controlling the amount of heat supplied to the aggregate is exemplified. However, the condition for adjusting the solubility is such that the solubility is equal to or higher than the above minimum solubility, and the following conditions including the above-described heat control can be exemplified. The solubility can be adjusted by controlling the conditions or controlling the conditions in combination.

(調整凝聚物之溶解度之條件) (conditions for adjusting the solubility of condensate)

作為用以調整凝聚物之溶解度之條件,例如可例舉:(a)溶於熔融玻璃之鉑族金屬之濃度;(b)熔融玻璃之溫度或者溫度分佈(對凝聚物提供之熱量);(c)氣相空間之壓力;(d)熔融玻璃之氧活度。 As conditions for adjusting the solubility of the aggregate, for example, (a) the concentration of the platinum group metal dissolved in the molten glass; (b) the temperature or temperature distribution of the molten glass (the heat supplied to the aggregate); c) pressure in the gas phase space; (d) oxygen activity of the molten glass.

(a)溶於熔融玻璃之鉑族金屬之濃度 (a) Concentration of platinum group metals dissolved in molten glass

凝聚處理步驟開始時之溶於熔融玻璃之鉑族金屬之濃度越低,則於鉑處理步驟中,熔融玻璃中之鉑族金屬之異物溶解之溶解度越上升。熔融玻璃之鉑族金屬之濃度例如可藉由對澄清管內之熔融玻璃進行採樣,冷卻後粉碎,使用ICP定量分析來測定求得。 The lower the concentration of the platinum group metal dissolved in the molten glass at the beginning of the coagulation treatment step, the higher the solubility of the foreign matter of the platinum group metal dissolved in the molten glass in the platinum treatment step. The concentration of the platinum group metal of the molten glass can be determined, for example, by sampling the molten glass in the clarification tube, cooling, pulverizing, and measuring by ICP quantitative analysis.

若鉑族金屬之濃度過低,則鉑族金屬之凝聚物之溶解度變大,反而存在鉑族金屬自與熔融玻璃接觸之澄清管之壁溶出至熔融玻璃而使澄清管熔損之情況。 When the concentration of the platinum group metal is too low, the solubility of the aggregate of the platinum group metal becomes large, and conversely, the platinum group metal is eluted from the wall of the clarification tube which is in contact with the molten glass to the molten glass, and the clarification tube is melted.

就抑制產生此種缺陷之觀點而言,調整鉑族金屬之濃度。 The concentration of the platinum group metal is adjusted in view of suppressing the occurrence of such defects.

再者,澄清管41中之凝聚物處理步驟開始時之溶於熔融玻璃之鉑族金屬主要來源於自澄清管41、或輸送管43a等之與熔融玻璃接觸 之壁面溶出之鉑族金屬。自該壁面溶出之鉑族金屬之量依賴於輸送管43a、凝聚物處理步驟開始前之消泡處理步驟中之熔融玻璃之溫度或者與熔融玻璃接觸之澄清管41之壁面之溫度。因此,藉由調整輸送管43a、澄清管41之壁面之溫度或者溫度分佈,而能調整凝聚物處理步驟開始時之熔融玻璃之鉑族金屬之濃度。例如,可藉由調整於澄清管41流動之電流、調整對配置於澄清管41之周圍之加熱器供給之電流、或者藉由該等之組合來進行調整。藉由降低凝聚物處理步驟開始時之溶於熔融玻璃之鉑族金屬之濃度,而凝聚物處理步驟開始時熔融玻璃中之鉑族金屬之異物溶解之溶解度上升。就該方面而言,較佳為將凝聚物處理步驟開始時之溶於熔融玻璃之鉑族金屬之濃度調整為0.05~20ppm。 Further, the platinum group metal dissolved in the molten glass at the beginning of the agglomerate treatment step in the clarification tube 41 is mainly derived from the contact with the molten glass from the clarification tube 41, or the delivery tube 43a or the like. The platinum group metal dissolved on the wall surface. The amount of the platinum group metal eluted from the wall depends on the temperature of the molten glass in the defoaming treatment step before the start of the agglomeration treatment step or the wall surface of the clarification tube 41 which is in contact with the molten glass. Therefore, by adjusting the temperature or temperature distribution of the wall surface of the conveying pipe 43a and the clarification pipe 41, the concentration of the platinum group metal of the molten glass at the start of the coagulating treatment step can be adjusted. For example, the current can be adjusted by adjusting the current flowing through the clarification pipe 41, adjusting the current supplied to the heater disposed around the clarification pipe 41, or by a combination of the above. By reducing the concentration of the platinum group metal dissolved in the molten glass at the beginning of the agglomerate treatment step, the solubility of the foreign matter of the platinum group metal dissolved in the molten glass at the beginning of the agglomerate treatment step increases. In this respect, it is preferred to adjust the concentration of the platinum group metal dissolved in the molten glass at the beginning of the agglomerate treatment step to 0.05 to 20 ppm.

藉此,於玻璃基板之製造步驟中,即便鉑族金屬之凝聚物混入至熔融玻璃,亦能製造出鉑族金屬之凝聚物之缺陷個數在容許水平之玻璃基板。 Thereby, even in the manufacturing process of a glass substrate, even if the aggregate of a platinum group metal mixes in a molten glass, the glass substrate which the number of defects of the platinum group metal aggregates is the tolerance level can be manufactured.

(b)熔融玻璃之溫度或溫度分佈 (b) Temperature or temperature distribution of molten glass

於澄清管41中,混入至熔融玻璃之鉑族金屬之凝聚物之溶解度可藉由提高熔融玻璃之溫度而增加。上面已對熔融玻璃之溫度或溫度分佈進行了描述,故而省略其說明。 In the clarification pipe 41, the solubility of the aggregate of the platinum group metal mixed into the molten glass can be increased by increasing the temperature of the molten glass. The temperature or temperature distribution of the molten glass has been described above, and the description thereof is omitted.

若熔融玻璃之溫度過高,則鉑族金屬之凝聚物之溶解量增大,反而會產生下述缺陷。 When the temperature of the molten glass is too high, the amount of dissolution of the aggregate of the platinum group metal increases, and the following defects occur.

‧重沸氣泡之增加 ‧ increase in reboiled bubbles

若澄清管41中熔融玻璃之溫度過高,則會於消泡處理步驟中過度消泡,因此導致熔融玻璃之氧活度變低,其結果,熔融玻璃成為還原狀態。若於該狀態下進行吸收處理步驟,則由於以下機制,存在於熔融玻璃中過度產生重沸氣泡,導致於玻璃基板中殘留重沸氣泡之氣泡之情形。重沸氣泡具體而言係包含因在熔融玻璃中作為雜質含有之 硫或碳而產生之SO2或者CO2等之氣泡。於熔融玻璃之還原狀態時間變長之情形時,溶解於熔融玻璃之SO3、CO3容易被還原,容易生成SO2、CO2。該SO2、CO2與SO3、CO3相比難以溶解於熔融玻璃,故而容易成為氣泡。若較多產生此種重沸氣泡,則有於玻璃基板中作為氣泡缺陷而殘留,導致玻璃基板之品質降低之情形。此外,殘留於玻璃基板之氣泡例如用雷射顯微鏡或目視檢測。 When the temperature of the molten glass in the clarification pipe 41 is too high, excessive defoaming is performed in the defoaming treatment step, so that the oxygen activity of the molten glass is lowered, and as a result, the molten glass is in a reduced state. When the absorption treatment step is carried out in this state, there is a case where excessively re-boiled bubbles are generated in the molten glass due to the following mechanism, and bubbles of the reboiled bubbles remain in the glass substrate. The reboiled gas bubbles specifically include bubbles of SO 2 or CO 2 generated by sulfur or carbon contained as impurities in the molten glass. When the reduction state of the molten glass becomes long, SO 3 and CO 3 dissolved in the molten glass are easily reduced, and SO 2 and CO 2 are easily formed. Since SO 2 and CO 2 are less soluble in molten glass than SO 3 and CO 3 , they are likely to become bubbles. When such a heavy boiling bubble is generated in a large amount, it may remain as a bubble defect in a glass substrate, and the quality of a glass substrate may fall. Further, the bubbles remaining on the glass substrate are detected by, for example, a laser microscope or visual inspection.

‧玻璃成分之揮發量之增加 ‧ increase in the amount of volatilization of glass components

若澄清管41中熔融玻璃之溫度過高,則熔融玻璃之成分例如B2O3會較多地揮發至氣相空間。其結果為,玻璃組成局部變化,玻璃之熱膨脹係數、或黏度等玻璃特性會局部變化,於玻璃基板上產生脈理等線。 When the temperature of the molten glass in the clarification pipe 41 is too high, a component of the molten glass such as B 2 O 3 is volatilized to a large amount in the gas phase space. As a result, the glass composition changes locally, and the glass characteristics such as the thermal expansion coefficient or the viscosity of the glass locally change, and a pulse line is generated on the glass substrate.

‧鉑族金屬之揮發量之增加 ‧ increase in the amount of platinum group metal

若澄清管41中熔融玻璃之溫度過高,則與熔融玻璃接觸之氣相空間之溫度亦變高,進而,因熔融玻璃之消泡處理而向氣相空間釋放之氧量變多,其結果,鉑族金屬容易自包圍氣相空間之澄清管之壁揮發。若鉑族金屬之揮發量增加,則氣相空間之鉑族金屬之濃度變高,容易引起凝聚及凝聚物混入至熔融玻璃。 When the temperature of the molten glass in the clarification pipe 41 is too high, the temperature of the gas phase space in contact with the molten glass is also increased, and the amount of oxygen released into the gas phase space by the defoaming treatment of the molten glass is increased. The platinum group metal is easily volatilized from the wall of the clarification tube surrounding the gas phase space. When the amount of volatilization of the platinum group metal increases, the concentration of the platinum group metal in the gas phase space becomes high, and aggregation and aggregates are likely to be mixed into the molten glass.

‧澄清管之熔損 ‧Clarification of the melt loss of the tube

若澄清管41中熔融玻璃之溫度過高,則存在與熔融玻璃接觸之澄清管41之壁熔損之情形。 If the temperature of the molten glass in the clarification pipe 41 is too high, the wall of the clarification pipe 41 which is in contact with the molten glass may be melted.

就抑制此種缺點產生之觀點而言,進行澄清管41中之熔融玻璃之溫度或者溫度分佈之調整。 The adjustment of the temperature or temperature distribution of the molten glass in the clarification pipe 41 is performed from the viewpoint of suppressing the occurrence of such a disadvantage.

(c)氣相空間之壓力 (c) Pressure in the gas phase space

鉑族金屬之凝聚物之溶解度可藉由提高澄清管41之氣相空間41c之壓力而增加。氣相空間之壓力意指氣相空間中所包含之氣體之總壓力。 The solubility of the agglomerates of the platinum group metal can be increased by increasing the pressure of the gas phase space 41c of the clarification tube 41. The pressure in the gas phase space means the total pressure of the gas contained in the gas phase space.

例如,可藉由調整氣相空間41c內之氣體通過通氣管41a而被吸引至澄清管41之外側之量(吸引量)、或對澄清管41內之氣體例如惰性氣體之供給量、自熔融玻璃放出之氣體之放出量來進行氣相空間41c之壓力之調整。例如,藉由使澄清管41之通氣管41a之出口與吸引裝置連接、或使上述出口變窄等來調節氣相空間41c與澄清管41之外側之大氣之壓力差的大小,而能調整吸引量。例如,藉由調整熔融玻璃中包含之澄清劑之量、玻璃成分之調配比,而能調整自熔融玻璃放出之氣體之放出量。再者,例如可根據自通氣管41a放出之氣體量而求出氣相空間41c之壓力較澄清管41之外側之大氣壓高或低。 For example, it is possible to adjust the amount (suction amount) of the gas in the gas phase space 41c to the outside of the clarification pipe 41 through the vent pipe 41a, or the supply amount of the gas in the clarification pipe 41 such as an inert gas, self-melting. The amount of gas released by the glass is adjusted to adjust the pressure of the gas phase space 41c. For example, by adjusting the pressure difference between the gas phase space 41c and the atmosphere outside the clarification pipe 41 by connecting the outlet of the vent pipe 41a of the clarification pipe 41 to the suction device or narrowing the outlet, the suction can be adjusted. the amount. For example, by adjusting the amount of the clarifying agent contained in the molten glass and the blending ratio of the glass component, the amount of gas released from the molten glass can be adjusted. Further, for example, the pressure of the gas phase space 41c can be determined to be higher or lower than the atmospheric pressure on the outer side of the clarification pipe 41 based on the amount of gas discharged from the vent pipe 41a.

為使熔融玻璃中之異物溶於熔融玻璃而提高氣相空間41c之壓力之方法,如上所述,可藉由調整對澄清管41內之氣體之供給量例如惰性氣體之供給量、或者自熔融玻璃放出之氣體之放出量而進行。氣相空間41c之壓力較佳為於例如0.8~1.2atm之範圍內調整。 The method of increasing the pressure of the gas phase space 41c in order to dissolve the foreign matter in the molten glass in the molten glass, as described above, by adjusting the supply amount of the gas in the clarification pipe 41, for example, the supply amount of the inert gas, or self-melting The amount of gas released by the glass is released. The pressure in the gas phase space 41c is preferably adjusted within a range of, for example, 0.8 to 1.2 atm.

若氣相空間41c之壓力過高,則鉑族金屬之凝聚物之溶解量會增大,反而產生下述之缺點。 When the pressure in the gas phase space 41c is too high, the amount of dissolution of the aggregate of the platinum group metal increases, which in turn causes the following disadvantages.

‧澄清不良 ‧Clarification

若氣相空間41c內之壓力過高,則有可能於消泡處理步驟中使於熔融玻璃中產生之氣泡難以自熔融玻璃之表面釋放,從而導致澄清不良。 If the pressure in the gas phase space 41c is too high, there is a possibility that bubbles generated in the molten glass are hardly released from the surface of the molten glass in the defoaming treatment step, resulting in poor clarification.

‧鉑族金屬之揮發量之增加 ‧ increase in the amount of platinum group metal

若氣相空間41c內之壓力過高,則與澄清管41外側之大氣之壓力差變大,氣相空間41內之氣流之流速上升。因此,氣相空間41c內之鉑族金屬之濃度無法上升,難以成為飽和狀態,故而使來自澄清管41之壁之鉑族金屬之揮發量增加。 When the pressure in the gas phase space 41c is too high, the pressure difference from the atmosphere outside the clarification pipe 41 becomes large, and the flow velocity of the gas flow in the gas phase space 41 rises. Therefore, the concentration of the platinum group metal in the gas phase space 41c cannot be increased, and it is difficult to be saturated, so that the amount of volatilization of the platinum group metal from the wall of the clarification pipe 41 is increased.

就抑制此種缺點產生之觀點而言,進行氣相空間之壓力調整。 In view of suppressing the occurrence of such a disadvantage, pressure adjustment in the gas phase space is performed.

(d)熔融玻璃之氧活度 (d) Oxygen activity of molten glass

於澄清管41中,藉由使熔融玻璃之氧活度上升而能增加鉑族金屬之凝聚物之溶解度。熔融玻璃之氧活度意指溶解於熔融玻璃之氧量(除去作為氣泡而存在於熔融玻璃中之氧量)。於本實施形態中,使用[Fe3+]/([Fe2+]+[Fe3+])作為氧活度之指標。此處,[Fe2+]及[Fe3+]係熔融玻璃中包含之Fe2+及Fe3+之活度,具體而言,係用質量百分數表示之含量,可使用分光光度法測量。 In the clarification pipe 41, the solubility of the aggregate of the platinum group metal can be increased by increasing the oxygen activity of the molten glass. The oxygen activity of the molten glass means the amount of oxygen dissolved in the molten glass (the amount of oxygen present in the molten glass as bubbles) is removed. In the present embodiment, [Fe 3+ ]/([Fe 2+ ]+[Fe 3+ ]) is used as an index of oxygen activity. Here, the activity of Fe 2+ and Fe 3+ contained in the [Fe 2+ ] and [Fe 3+ ]-based molten glass, specifically, the content expressed by mass percentage can be measured by spectrophotometry.

例如,於澄清步驟中之消泡處理步驟中,熔融玻璃之溫度變高,溶存於熔融玻璃之氧成為氣泡而被消泡,故而熔融玻璃之氧活度下降。另一方面,於澄清步驟中,若熔融玻璃之溫度變低,則澄清劑吸收氧,故而氧活度增大。 For example, in the defoaming treatment step in the clarification step, the temperature of the molten glass becomes high, and the oxygen dissolved in the molten glass becomes bubbles and is defoamed, so that the oxygen activity of the molten glass is lowered. On the other hand, in the clarification step, if the temperature of the molten glass becomes low, the clarifying agent absorbs oxygen, and thus the oxygen activity increases.

例如,除了於熔解步驟中調整熔融玻璃中包含之澄清劑、氧化物之量以外,除了調整熔融玻璃中包含之澄清劑或玻璃原料之氧化物之量以外,亦能藉由於澄清步驟中調整凝聚物處理步驟開始前之熔融玻璃之溫度、或者於凝聚物處理步驟開始前使含氧氣體在熔融玻璃內起泡而調整熔融玻璃之氧活度。 For example, in addition to adjusting the amount of the clarifying agent and the oxide contained in the molten glass in the melting step, in addition to adjusting the amount of the clarifying agent or the glass raw material oxide contained in the molten glass, it is also possible to adjust the condensation by the clarification step. The oxygen activity of the molten glass is adjusted by foaming the oxygen-containing gas in the molten glass before the start of the agglomeration treatment step or before the start of the agglomeration treatment step.

熔融玻璃中之氧活度之調整亦可與熔融玻璃之溫度或者溫度分佈之調整一起進行。另外,調整熔融玻璃中之氧活度亦可與氣相空間41c之壓力調整一起進行。如上所述,除了藉由調整熔融玻璃中包含之澄清劑或玻璃原料之氧化物之量以外,亦能藉由於澄清步驟中調整凝聚物處理步驟開始前之熔融玻璃之溫度、或者於凝聚物處理步驟開始前使含氧氣體於熔融玻璃內起泡來調整熔融玻璃中之氧活度。於凝聚物處理步驟中,較佳為例如於0.2~0.5之範圍內調整作為氧活度之指標之[Fe3+]/([Fe2+]+[Fe3+])。 The adjustment of the oxygen activity in the molten glass can also be carried out in conjunction with the adjustment of the temperature or temperature distribution of the molten glass. Further, adjusting the oxygen activity in the molten glass can also be performed together with the pressure adjustment of the gas phase space 41c. As described above, in addition to adjusting the amount of the clarifying agent or the glass raw material oxide contained in the molten glass, it is also possible to adjust the temperature of the molten glass before the start of the agglomerating treatment step in the clarification step, or to treat the agglomerate The oxygen-containing gas is bubbled in the molten glass before the start of the step to adjust the oxygen activity in the molten glass. In the agglomerate treatment step, it is preferred to adjust [Fe 3+ ]/([Fe 2+ ]+[Fe 3+ ]) as an index of oxygen activity, for example, in the range of 0.2 to 0.5.

於熔融玻璃之氧活度之調整時,若使熔融玻璃之氧活度過高,則鉑族金屬之凝聚物之溶解量增大,相反產生下述缺點。 When the oxygen activity of the molten glass is adjusted too high in the oxygen activity of the molten glass, the amount of the aggregate of the platinum group metal is increased, and the following disadvantages are caused.

‧鉑族金屬之揮發量增加 ‧ Increased volatilization of platinum group metals

若使熔融玻璃之氧活度過大,則於消泡處理步驟中自熔融玻璃釋放至氣相空間之氧量增加,氣相空間之氧濃度上升,因此鉑族金屬容易氧化而易於揮發。若鉑族金屬易於揮發,則易於生成鉑族金屬之凝聚物,且容易混入至熔融玻璃中。 When the oxygen activity of the molten glass is excessively large, the amount of oxygen released from the molten glass to the gas phase space increases in the defoaming treatment step, and the oxygen concentration in the gas phase space increases, so that the platinum group metal is easily oxidized and is easily volatilized. If the platinum group metal is easily volatilized, it is easy to form agglomerates of the platinum group metal and is easily incorporated into the molten glass.

‧氧氣泡於熔融玻璃中之殘留 ‧Residual oxygen bubbles in molten glass

若使熔融玻璃之氧活度過大,則於吸收處理步驟中,被還原之澄清劑不會吸收氧,於熔融玻璃中生成含氧之氣泡(氧氣泡),其於玻璃基板中作為氣泡殘留,故而容易使玻璃基板之品質下降。 When the oxygen activity of the molten glass is too large, in the absorption treatment step, the reduced clarifying agent does not absorb oxygen, and oxygen-containing bubbles (oxygen bubbles) are formed in the molten glass, which remain as bubbles in the glass substrate. Therefore, the quality of the glass substrate is easily lowered.

就抑制此種缺點產生之觀點而言,較佳為藉由調整熔融玻璃之氧活度而增大鉑族金屬之凝聚物之溶解量時組合適當之條件參數(熔融玻璃之溫度等)來進行調整。 From the viewpoint of suppressing the occurrence of such a disadvantage, it is preferred to increase the amount of dissolution of the aggregate of the platinum group metal by adjusting the oxygen activity of the molten glass, and to combine the appropriate condition parameters (temperature of the molten glass, etc.). Adjustment.

或者,亦可基於凝聚物之缺陷個數對熔融玻璃之溫度調整進行反饋調整。作為調整對象之熔融玻璃之溫度可為開始凝聚物處理步驟之時間點之溫度,亦可為凝聚物處理步驟中途之溫度。 Alternatively, the temperature adjustment of the molten glass may be feedback-adjusted based on the number of defects of the agglomerates. The temperature of the molten glass to be adjusted may be the temperature at the time of starting the agglomerate treatment step, or may be the temperature in the middle of the agglomerate treatment step.

藉由於玻璃基板之各位置進行自斜向對玻璃基板之表面射入雷射等光並接收其反射光,並根據藉由接收光而獲得之圖像確定與鉑族金屬之凝聚物之形狀一致之區域,而能檢測玻璃基板中之鉑族金屬之凝聚物之缺陷。凝聚物之缺陷亦可用目視檢測而代替如此使用裝置進行。該凝聚物之缺陷個數之容許水平用單位質量表示時,例如為0.02個/kg以下。上述容許水平隨玻璃基板之用戶所要求之與應變、或主表面之凹凸相關之規格而變化。 The laser beam is incident on the surface of the glass substrate from the oblique direction of the glass substrate and receives the reflected light, and the image obtained by receiving the light is determined to be consistent with the shape of the agglomerate of the platinum group metal. The region is capable of detecting defects of the aggregate of the platinum group metal in the glass substrate. Defects in the condensate can also be visually detected instead of using the device as such. When the allowable level of the number of defects of the aggregate is expressed by the unit mass, for example, it is 0.02 pieces/kg or less. The above tolerance level varies depending on the strain required by the user of the glass substrate or the specification of the unevenness of the main surface.

例如,於玻璃基板中檢測到之缺陷個數超過容許水平之情形時,提高熔融玻璃之溫度並提高熔融玻璃中之鉑族金屬之飽和溶解度,藉此,促進混入至熔融玻璃之凝聚物之溶解。另一方面,於玻璃基板中檢測到之缺陷個數處於容許水平之情形時,可在高於與處於容許水平之缺陷個數之上限值對應之熔融玻璃之溫度之範圍內降低。藉 由如此調整熔融玻璃之溫度,而能調整鉑族金屬之飽和溶解度至適當之範圍,藉此,能將玻璃基板中包含之凝聚物之缺陷個數抑制於容許水平,並能抑制因重沸氣泡之增加等而產生之玻璃基板之品質下降。 For example, when the number of defects detected in the glass substrate exceeds an allowable level, the temperature of the molten glass is increased and the saturation solubility of the platinum group metal in the molten glass is increased, thereby promoting dissolution of the agglomerates mixed into the molten glass. . On the other hand, when the number of defects detected in the glass substrate is at an allowable level, it can be lowered within a range higher than the temperature of the molten glass corresponding to the upper limit of the number of defects at the allowable level. borrow By adjusting the temperature of the molten glass in this manner, the saturation solubility of the platinum group metal can be adjusted to an appropriate range, whereby the number of defects of the aggregate contained in the glass substrate can be suppressed to an allowable level, and the bubble due to reboiling can be suppressed. The quality of the glass substrate resulting from the increase or the like is lowered.

具體而言,於玻璃處理裝置係包括澄清管之澄清裝置之情形時,藉由使電流流向澄清管來進行通電加熱,而能進行熔融玻璃之溫度調整。可根據對加熱電極施加之電壓之大小而調整電流量。另外,亦可取代通電加熱、或與通電加熱組合而利用配置於澄清管之周圍之未圖示之加熱器來間接地調整熔融玻璃之溫度。加熱器例如配置於耐火保護層、或耐火磚之內部或外側。另外,亦可藉由使用耐火保護層、或耐火磚來調整來自澄清管之散熱量而進行熔融玻璃之溫度調整。 Specifically, in the case where the glass processing apparatus includes a clarification apparatus for a clarification tube, the temperature of the molten glass can be adjusted by causing a current to flow to the clarification tube to perform electric heating. The amount of current can be adjusted according to the magnitude of the voltage applied to the heating electrode. Further, in place of the electric heating or the electric heating, the temperature of the molten glass may be indirectly adjusted by a heater (not shown) disposed around the clarification pipe. The heater is disposed, for example, inside or outside the refractory protective layer or the refractory brick. Further, the temperature of the molten glass can be adjusted by adjusting the amount of heat released from the clarification tube by using a refractory protective layer or a refractory brick.

於凝聚物處理步驟中,較佳為代替熔融玻璃之溫度調整、或除溫度調整以外,於0.2~0.5之範圍內調整作為上述熔融玻璃之氧活度之指標之玻璃基板之[Fe3+]/([Fe2+]+[Fe3+]),從而調整上述鉑族金屬之飽和溶解度,以使玻璃基板中包含之凝聚物之缺陷個數處於容許水平。 In the agglomerate treatment step, it is preferable to adjust the [Fe 3+ ] of the glass substrate which is an index of the oxygen activity of the molten glass in the range of 0.2 to 0.5 in place of the temperature adjustment of the molten glass or the temperature adjustment. /([Fe 2+ ]+[Fe 3+ ]), thereby adjusting the saturation solubility of the above platinum group metal so that the number of defects of the aggregate contained in the glass substrate is at an allowable level.

(凝聚物處理步驟後之鉑族金屬之凝聚物) (Agglomerates of platinum group metals after the agglomerate treatment step)

於凝聚物處理步驟後,熔融玻璃、玻璃基板或玻璃基板積層體中包含之鉑族金屬之異物(凝聚物)中,最大長度超過50μm之異物(凝聚物)之個數之比率減少至未達30%。 After the coagulum treatment step, the ratio of the number of foreign matter (agglomerates) having a maximum length of more than 50 μm in the foreign matter (agglomerate) of the platinum group metal contained in the molten glass, the glass substrate or the glass substrate laminate is reduced to less than 30%.

於本實施形態中,在為了提高熔融玻璃G之溫度而提高澄清管41之溫度之情形時,能有效地發揮本實施形態之上述效果。 In the present embodiment, when the temperature of the clarification pipe 41 is raised to increase the temperature of the molten glass G, the above-described effects of the embodiment can be effectively exhibited.

例如,為了減輕環境負擔,較佳為使用氧化錫作為熔融玻璃之澄清劑,但氧化錫與As2O3或Sb2O3相比,獲得澄清效果(氧化反應)之溫度較高。因此,於使用氧化錫作為澄清劑之情形時,與使用As2O3、或Sb2O3作為澄清劑之情形相比,必須提高澄清管41之溫度, 提高熔融玻璃G之溫度。即,由於使用氧化錫作為澄清劑,故而與先前相比,更容易產生澄清管41之揮發(氧化),容易產生鉑族金屬之揮發及凝聚之問題。即便如此由於使用氧化錫作為澄清劑而使鉑族金屬之異物(凝聚物)混入至熔融玻璃之量增加,亦可如本實施形態所示減小鉑族金屬之異物之大小,故而能夠不易於玻璃基板上產生應變、能夠不易形成玻璃基板之主表面之凹凸等效果顯著。即,能充分降低引起顯示不良之異物(凝聚物)之量。 For example, in order to reduce the environmental burden, it is preferable to use tin oxide as a clarifying agent for molten glass, but the temperature at which tin oxide obtains a clarifying effect (oxidation reaction) is higher than that of As 2 O 3 or Sb 2 O 3 . Therefore, when tin oxide is used as the clarifying agent, it is necessary to increase the temperature of the clarification pipe 41 and increase the temperature of the molten glass G as compared with the case of using As 2 O 3 or Sb 2 O 3 as a clarifying agent. That is, since tin oxide is used as the clarifying agent, volatilization (oxidation) of the clarification pipe 41 is more likely to occur than in the prior art, and the problem of volatilization and aggregation of the platinum group metal is likely to occur. Even if the amount of the foreign matter (aggregate) of the platinum group metal mixed into the molten glass is increased by using tin oxide as a clarifying agent, the size of the foreign matter of the platinum group metal can be reduced as shown in the embodiment, so that it is not easy. The effect of strain on the glass substrate and uneven formation of the main surface of the glass substrate is remarkable. In other words, the amount of foreign matter (aggregate) causing display failure can be sufficiently reduced.

另外,黏性較高之熔融玻璃於澄清步驟中氣泡之上浮速度較慢,難以澄清。並且,於攪拌裝置100中進行之攪拌步驟中亦難以均勻地攪拌黏性較高之熔融玻璃。因此,為了充分地獲得澄清效果或者熔融玻璃之均質化,必須提高熔融玻璃之溫度。為此,若為了獲得溫度較高之熔融玻璃而亦升高玻璃處理裝置之溫度,則於玻璃處理步驟中,鉑族金屬之揮發變得激烈,異物(凝聚物)混入至熔融玻璃之量易於增加。即,容易產生鉑族金屬之揮發及凝聚之問題。 In addition, the molten glass having a higher viscosity is slower in floating speed in the clarification step, and it is difficult to clarify. Further, in the stirring step performed in the stirring device 100, it is also difficult to uniformly stir the molten glass having a high viscosity. Therefore, in order to sufficiently obtain the clarifying effect or the homogenization of the molten glass, it is necessary to increase the temperature of the molten glass. For this reason, if the temperature of the glass processing apparatus is also raised in order to obtain a molten glass having a relatively high temperature, the volatilization of the platinum group metal becomes intense in the glass treatment step, and the amount of foreign matter (agglomerate) mixed into the molten glass is easy. increase. That is, the problem of volatilization and agglomeration of the platinum group metal tends to occur.

例如,於用於顯示器面板之玻璃基板形成薄膜電晶體,但玻璃基板較佳為使用無鹼玻璃或者含微量鹼之玻璃,以避免對薄膜電晶體之動作產生不良影響。無鹼玻璃或者含微量鹼之玻璃與鈉玻璃等含鹼玻璃相比,黏性較高,故而於澄清步驟中氣泡之上浮速度較慢,難以澄清。為此,為了充分地獲得澄清效果,必須提高澄清管41之溫度,提高熔融玻璃G之溫度。即,由於製造之對象為無鹼玻璃或者含微量鹼之玻璃,因此,與鹼玻璃相比,更易於產生澄清管41之揮發(氧化),容易產生鉑族金屬之揮發及凝聚之問題。即便如此為了使用無鹼玻璃或者含微量鹼之玻璃而提高澄清管41之溫度,使鉑族金屬之異物(凝聚物)混入至熔融玻璃之量增加,亦可如本實施形態所示減小鉑族金屬之異物之大小,因此能夠不易於玻璃基板上產生應變、能夠不易形成玻璃基板之主表面之凹凸等效果顯著。即,能充分降低引起顯 示不良之異物(凝聚物)之量。 For example, a thin film transistor is formed on a glass substrate used for a display panel, but the glass substrate is preferably an alkali-free glass or a glass containing a small amount of alkali to avoid adversely affecting the operation of the thin film transistor. The alkali-free glass or the glass containing a small amount of alkali has higher viscosity than the alkali-containing glass such as soda glass, so the bubble float speed is slow in the clarification step, and it is difficult to clarify. For this reason, in order to sufficiently obtain the clarifying effect, it is necessary to increase the temperature of the clarification pipe 41 and increase the temperature of the molten glass G. In other words, since the object to be produced is an alkali-free glass or a glass containing a small amount of alkali, the volatilization (oxidation) of the clarification tube 41 is more likely to occur than that of the alkali glass, and the problem of volatilization and aggregation of the platinum group metal tends to occur. Even if the temperature of the clarification pipe 41 is increased by using an alkali-free glass or a glass containing a small amount of alkali, and the amount of the foreign matter (agglomerate) of the platinum group metal is mixed into the molten glass, the platinum can be reduced as shown in the embodiment. Since the size of the foreign matter of the group metal is small, it is not easy to cause strain on the glass substrate, and the effect of being able to form unevenness on the main surface of the glass substrate is remarkable. That is, it can be fully reduced to cause significant The amount of foreign matter (agglomerate) showing bad.

上述無鹼玻璃或者含微量鹼之玻璃為應變點較高之玻璃。應變點較高之玻璃與應變點較低之玻璃相比,黏性較高,因此於澄清步驟中氣泡之上浮速度較慢,難以澄清。為此,為了充分地獲得澄清效果,必須提高澄清管41之溫度,提高熔融玻璃G之溫度。即,於製造應變點較高之玻璃之情形時,與製造應變點較低之玻璃之情形相比,更易於產生澄清管之揮發(氧化),容易產生鉑族金屬之揮發及凝聚之問題。即便如此由於使用應變點較高之玻璃,故而即便提高澄清管41之溫度,使鉑族金屬之異物(凝聚物)混入至熔融玻璃之量增加,亦可如本實施形態所示減小鉑族金屬之異物之大小,故而能夠不易於玻璃基板上產生應變、能夠不易形成玻璃基板之主表面之凹凸等效果顯著。即,能充分降低引起顯示不良之異物(凝聚物)之量。 The above alkali-free glass or glass containing a small amount of alkali is a glass having a high strain point. The glass with the higher strain point has higher viscosity than the glass with lower strain point, so the floating speed of the bubble in the clarification step is slower and difficult to clarify. For this reason, in order to sufficiently obtain the clarifying effect, it is necessary to increase the temperature of the clarification pipe 41 and increase the temperature of the molten glass G. That is, in the case of producing a glass having a higher strain point, the volatilization (oxidation) of the clarification tube is more likely to occur than in the case of producing a glass having a lower strain point, and the problem of volatilization and aggregation of the platinum group metal is liable to occur. Even if the glass having a high strain point is used, even if the temperature of the clarification pipe 41 is increased and the amount of the foreign matter (aggregate) of the platinum group metal is increased to the molten glass, the platinum group can be reduced as shown in the embodiment. Since the size of the foreign matter of the metal is small, it is not easy to cause strain on the glass substrate, and the effect of forming the unevenness of the main surface of the glass substrate is remarkable. In other words, the amount of foreign matter (aggregate) causing display failure can be sufficiently reduced.

再者,對於顯示器用玻璃基板,要求玻璃基板之應變點為600℃以上、更佳為650℃以上,若玻璃基板之應變點為600℃以上,則本實施形態之能充分降低引起顯示不良之大小之異物(凝聚物)之量的效果顯著。另外,對於高清晰顯示器用玻璃基板,要求應變點更高,較佳為應變點為690℃以上,更佳為730℃以上。若如此應變點為690℃以上、730℃以上,則本實施形態之上述效果更為顯著。 Further, in the glass substrate for a display, the strain point of the glass substrate is required to be 600 ° C or higher, more preferably 650 ° C or higher, and when the strain point of the glass substrate is 600 ° C or higher, the present embodiment can sufficiently reduce display defects. The effect of the amount of foreign matter (aggregate) of size is remarkable. Further, for the glass substrate for a high-definition display, the strain point is required to be higher, and the strain point is preferably 690 ° C or higher, more preferably 730 ° C or higher. When the strain point is 690 ° C or higher and 730 ° C or higher, the above effects of the present embodiment are more remarkable.

另外,關於本實施形態中使用之包含氧化錫之熔融玻璃之黏度,較佳為1500℃以上之溫度、例如為1500℃~1700℃、或者1550℃~1650℃之溫度下,黏度為102.5泊。於該情形時,本實施形態之上述效果變得更為顯著。 Further, the viscosity of the molten glass containing tin oxide used in the present embodiment is preferably 1500 ° C or higher, for example, 1500 ° C to 1700 ° C, or 1550 ° C to 1650 ° C, and the viscosity is 10 2.5 poise. . In this case, the above effects of the embodiment are more remarkable.

另外,於利用本實施形態製造之玻璃基板之板厚為0.005mm~0.8mm、較佳為0.01mm~0.5mm、更佳為0.01mm~0.2mm之情形時,本實施形態之上述效果變得更為顯著。若製造此種板厚較薄之玻璃基板,則異物(凝聚物)容易出現於玻璃表面,形成表面凹凸。於本 實施形態中,可利用上述效果解決因此種板厚導致之問題。 Further, when the thickness of the glass substrate produced by the present embodiment is 0.005 mm to 0.8 mm, preferably 0.01 mm to 0.5 mm, more preferably 0.01 mm to 0.2 mm, the above-described effects of the embodiment become More significant. When such a glass substrate having a small thickness is produced, foreign matter (aggregates) tend to occur on the surface of the glass to form surface irregularities. Yu Ben In the embodiment, the above-described effects can be utilized to solve the problem caused by the thickness of the plate.

[實驗例] [Experimental example]

為了確認本實施形態之效果,利用包括圖1所示之凝聚物處理步驟S2B之製造步驟而製作玻璃基板(實施例)。於凝聚物處理步驟S2B中,進行提供至凝聚物之熱量之控制。 In order to confirm the effect of the present embodiment, a glass substrate (Example) was produced by a manufacturing process including the agglomerate treatment step S2B shown in Fig. 1 . In the agglomerate treatment step S2B, control of the amount of heat supplied to the agglomerates is performed.

玻璃基板之製作條件如下所述。 The production conditions of the glass substrate are as follows.

玻璃基板之玻璃之組成為:SiO2 60.7質量%;Al2O3 17質量%;B2O3 11.5質量%;MgO 2質量%;CaO 5.6質量%;SrO 3質量%;SnO2 0.2質量%,應變點為660℃,板厚為0.4mm。 The composition of the glass of the glass substrate is: SiO 2 60.7% by mass; Al 2 O 3 17% by mass; B 2 O 3 11.5% by mass; MgO 2% by mass; CaO 5.6 % by mass; SrO 3 % by mass; SnO 2 0.2% by mass The strain point is 660 ° C and the thickness is 0.4 mm.

另外,不進行圖1所示之凝聚物處理步驟S2B,藉由於消泡處理步驟S2A之後進行吸收處理步驟S2C之先前製造步驟,按上述製作條件製作玻璃基板。具體而言,於下述表1所示之例1~5中,使澄清管41中之熔融玻璃G之最高溫度為1670℃~1720℃,使熔融玻璃G之溫度在1670℃以上之時間為40分鐘。另一方面,於例6、7中,使熔融玻璃G之最高溫度未達1670℃,使熔融玻璃G之溫度在1670℃以上之時間為0分鐘。 Further, the agglomerate treatment step S2B shown in Fig. 1 is not performed, and the glass substrate is produced under the above-described production conditions by the previous production step of the absorption treatment step S2C after the defoaming treatment step S2A. Specifically, in Examples 1 to 5 shown in Table 1 below, the maximum temperature of the molten glass G in the clarification pipe 41 was 1670 ° C to 1720 ° C, and the temperature of the molten glass G was 1670 ° C or more. 40 minutes. On the other hand, in Examples 6 and 7, the maximum temperature of the molten glass G was less than 1670 ° C, and the temperature of the molten glass G was 1670 ° C or more for 0 minutes.

使用光學顯微鏡對如此製作之0.1m3之複數片玻璃基板中之鉑族金屬之異物(凝聚物)統計數量,並計測鉑族金屬之異物(凝聚物)之最大長度。然後,求出混入至玻璃基板之所有鉑族金屬之異物(凝聚物)中最大長度為50μm以下之異物之個數的比率。求出之比率與最高溫度一起示於下述表1。關於例1~5之異物之比率,任何玻璃基板均為70%以上,關於例6、7之異物之比率,任何玻璃基板均為35%以下。圖5係表示熔融玻璃之最高溫度與異物之比率之關係的圖表。由圖5可知,藉由使熔融玻璃之最高溫度為自1660℃至1670℃以上,最大長度為50μm以下之異物之比率急劇上升,於1670℃以上之溫度下為70%以上。於1690℃以上時,最大長度為50μm以下之異物之比率變為 92%以上,尤其,於1700℃以上時,最大長度為50μm以下之異物之比率變為100%。藉此可知,於本實驗例之條件下,於控制對異物提供之熱量之情形時,較佳為,使熔融玻璃之最高溫度為1670℃以上、較佳為1690℃以上、更較為1700℃以上而對異物提供熱量。於本實驗例之條件下,最高溫度1670℃係使最大長度為50μm以下之異物之比率為70%之最高溫度之下限溫度,但並非必須使最高溫度為1670℃以上,藉由用其他方法調整凝聚物(異物)之溶解度,亦能實現使最大長度為50μm以下之異物之比率為70%。 The foreign matter (aggregate) of the platinum group metal in the thus-produced 0.1 m 3 of the plurality of glass substrates was counted by an optical microscope, and the maximum length of the foreign matter (agglomerate) of the platinum group metal was measured. Then, the ratio of the number of foreign matters having a maximum length of 50 μm or less among the foreign matter (agglomerates) of all the platinum group metals mixed in the glass substrate was determined. The ratio obtained is shown together with the highest temperature in Table 1 below. Regarding the ratio of the foreign matter of Examples 1 to 5, any glass substrate was 70% or more, and the ratio of the foreign matter of Examples 6 and 7 was 35% or less of any glass substrate. Fig. 5 is a graph showing the relationship between the maximum temperature of molten glass and the ratio of foreign matter. As can be seen from Fig. 5, the ratio of the foreign matter having a maximum length of 50 μm or less is sharply increased by the maximum temperature of the molten glass from 1660 ° C to 1670 ° C or more, and is 70% or more at a temperature of 1670 ° C or higher. When the temperature is 1690 ° C or higher, the ratio of the foreign matter having a maximum length of 50 μm or less is 92% or more. In particular, when the temperature is 1700 ° C or higher, the ratio of the foreign matter having a maximum length of 50 μm or less becomes 100%. From this, it is understood that, in the case of controlling the heat supplied to the foreign matter under the conditions of the experimental examples, the maximum temperature of the molten glass is preferably 1670 ° C or higher, preferably 1690 ° C or higher, and more preferably 1700 ° C or higher. And provide heat to foreign objects. Under the conditions of this experimental example, the maximum temperature of 1670 °C is such that the ratio of the foreign matter having a maximum length of 50 μm or less is the lower limit temperature of the highest temperature of 70%, but it is not necessary to make the maximum temperature be 1670 ° C or more, by other methods. The solubility of the agglomerates (foreign substances) can also achieve a ratio of foreign matter having a maximum length of 50 μm or less of 70%.

以上,詳細說明了本發明之玻璃基板之製造方法、玻璃基板及玻璃基板積層體,但本發明並不限於上述實施形態,當然於不脫離本發明主旨之範圍內可進行各種改良或變更。 In the above, the method of producing the glass substrate of the present invention, the glass substrate, and the glass substrate layered body are described in detail. However, the present invention is not limited to the above-described embodiments, and various modifications and changes can be made without departing from the spirit and scope of the invention.

Claims (19)

一種玻璃基板之製造方法,其特徵在於,包括:熔解步驟,其熔解玻璃原料而生成熔融玻璃;以及熔融玻璃處理步驟,其於玻璃處理裝置之管中一面使上述熔融玻璃流動一面處理上述熔融玻璃,上述玻璃處理裝置具有因上述熔融玻璃之導入而形成由上述熔融玻璃之表面與壁包圍之氣相空間之空間,上述壁之至少一部分由包含鉑族金屬之材料構成,且於處理上述熔融玻璃時,存在於上述氣相空間之自上述壁揮發之鉑族金屬之揮發物之凝聚物作為異物混入上述熔融玻璃中,且包括凝聚物處理步驟,其於上述玻璃處理裝置之上述管中,使上述熔融玻璃之溫度成為1670℃以上,而減小混入至上述熔融玻璃之凝聚物之大小,以使混入至上述熔融玻璃之凝聚物中,最大長度為50μm以下之凝聚物之個數之比率為70%以上;於上述玻璃處理裝置之上述管中設置有使上述氣相空間與上述玻璃處理裝置之外側之大氣連通的通氣管,於上述玻璃處理裝置之上述管中流動的上述熔融玻璃成為最高溫度之上述流動方向的最高溫度位置位於將上述熔融玻璃導入上述玻璃處理裝置之上述管的入口、與上述通氣管之上述熔融玻璃之流動方向的位置之間。 A method for producing a glass substrate, comprising: a melting step of melting a glass raw material to form molten glass; and a molten glass processing step of treating the molten glass while flowing the molten glass in a tube of a glass processing apparatus The glass processing apparatus includes a space in which a vapor phase space surrounded by a surface of the molten glass and a wall is formed by introduction of the molten glass, and at least a part of the wall is made of a material containing a platinum group metal, and the molten glass is processed. When the agglomerate of the volatile matter of the platinum group metal volatilized from the wall in the gas phase space is mixed as a foreign matter into the molten glass, and includes an agglomerate treatment step in the tube of the glass processing apparatus The temperature of the molten glass is 1670 ° C or more, and the amount of the agglomerates mixed in the molten glass is reduced so that the ratio of the number of aggregates having a maximum length of 50 μm or less to the aggregate of the molten glass is 70% or more; provided in the above tube of the above glass processing apparatus a vent pipe in which the phase space communicates with the atmosphere on the outer side of the glass processing apparatus, wherein the molten glass flowing through the tube of the glass processing apparatus has a highest temperature in the flow direction at a highest temperature position, and the molten glass is introduced into the glass treatment. The inlet of the tube of the apparatus is between the position of the flow direction of the molten glass of the vent tube. 一種玻璃基板之製造方法,其特徵在於,包括:熔解步驟,其熔解玻璃原料而生成熔融玻璃;熔融玻璃處理步驟,其於玻璃處理裝置之管中一面使上述熔融玻璃流動一面處理上述熔融玻璃,上述玻璃處理裝置具有包 含上述熔融玻璃之液相、以及由上述熔融玻璃之液面與壁所形成之氣相空間,包圍上述氣相空間之壁之至少一部分由包含鉑族金屬之材料構成,且於處理上述熔融玻璃時,存在於上述氣相空間之自上述壁揮發之鉑族金屬之揮發物之凝聚物作為異物混入上述熔融玻璃中;以及凝聚物處理步驟,其於上述玻璃處理裝置之上述管中,使上述熔融玻璃之溫度成為1670℃以上,而減小於上述熔融玻璃處理步驟中混入至上述熔融玻璃之凝聚物之大小,以使混入至熔融玻璃之凝聚物中,最大長度為50μm以下之凝聚物之個數之比率為70%以上;於上述玻璃處理裝置之上述管中設置有使上述氣相空間與上述玻璃處理裝置之外側之大氣連通的通氣管,於上述玻璃處理裝置之上述管中流動的上述熔融玻璃成為最高溫度之上述流動方向的最高溫度位置位於將上述熔融玻璃導入上述玻璃處理裝置之上述管的入口、與上述通氣管之上述熔融玻璃之流動方向的位置之間。 A method for producing a glass substrate, comprising: a melting step of melting a glass raw material to form a molten glass; and a molten glass treatment step of treating the molten glass while flowing the molten glass in a tube of a glass processing apparatus The above glass processing device has a package a liquid phase containing the molten glass, and a gas phase space formed by the liquid surface and the wall of the molten glass, at least a part of a wall surrounding the gas phase space being composed of a material containing a platinum group metal, and processing the molten glass When the agglomerate of the volatile matter of the platinum group metal volatilized from the wall in the gas phase space is mixed as a foreign matter into the molten glass, and the agglomerate treatment step is performed in the tube of the glass processing apparatus The temperature of the molten glass is 1670 ° C or more, and is reduced to the size of the agglomerate mixed in the molten glass in the molten glass treatment step so as to be mixed into the aggregate of the molten glass, and the aggregate having a maximum length of 50 μm or less The ratio of the number is 70% or more; and the tube of the glass processing apparatus is provided with a vent pipe that communicates the gas phase space with the atmosphere outside the glass processing apparatus, and flows through the tube of the glass processing apparatus. The molten glass has a maximum temperature position in the flow direction at which the highest temperature is located, and the molten glass is introduced Inlet of the glass tube processing apparatus, the above-described direction of the flow of the molten glass through a position between the trachea. 一種玻璃基板之製造方法,其特徵在於,包括:熔解步驟,其熔解玻璃原料而生成熔融玻璃;以及熔融玻璃處理步驟,其於玻璃處理裝置之管中一面使上述熔融玻璃流動一面處理上述熔融玻璃,上述玻璃處理裝置具有因上述熔融玻璃之導入而形成由上述熔融玻璃之表面與壁包圍之氣相空間之空間,上述壁之至少一部分由包含鉑族金屬之材料構成,且於處理上述熔融玻璃時,存在於上述氣相空間之自上述壁揮發之鉑族金屬之揮發物之凝聚物作為異物混入上述熔融玻璃中,且包括凝聚物處理步驟,其於上述玻璃處理裝置之上述管 中,使上述熔融玻璃之溫度成為1670℃以上,而調整上述熔融玻璃中之上述凝聚物之溶解度,以減小混入至上述熔融玻璃之凝聚物之大小;於上述玻璃處理裝置之上述管中設置有使上述氣相空間與上述玻璃處理裝置之外側之大氣連通的通氣管,於上述玻璃處理裝置之上述管中流動的上述熔融玻璃成為最高溫度之上述流動方向的最高溫度位置位於將上述熔融玻璃導入上述玻璃處理裝置之上述管的入口、與上述通氣管之上述熔融玻璃之流動方向的位置之間。 A method for producing a glass substrate, comprising: a melting step of melting a glass raw material to form molten glass; and a molten glass processing step of treating the molten glass while flowing the molten glass in a tube of a glass processing apparatus The glass processing apparatus includes a space in which a vapor phase space surrounded by a surface of the molten glass and a wall is formed by introduction of the molten glass, and at least a part of the wall is made of a material containing a platinum group metal, and the molten glass is processed. When the agglomerate of the volatile matter of the platinum group metal volatilized from the wall in the gas phase space is mixed as a foreign matter into the molten glass, and includes an agglomerate treatment step in the tube of the glass processing apparatus The temperature of the molten glass is set to 1670 ° C or higher, and the solubility of the aggregate in the molten glass is adjusted to reduce the size of the aggregates mixed into the molten glass; and the tube is disposed in the tube of the glass processing apparatus. a vent pipe that communicates the vapor phase space with an atmosphere outside the glass processing apparatus, wherein the molten glass flowing through the tube of the glass processing apparatus has a highest temperature at a highest temperature in the flow direction, and the molten glass is located The inlet of the tube introduced into the glass processing apparatus is placed between the inlet of the fused pipe and the position of the molten glass in the flow direction. 一種玻璃基板之製造方法,其特徵在於,包括:熔解步驟,其熔解玻璃原料而生成熔融玻璃;以及熔融玻璃處理步驟,其於玻璃處理裝置之管中一面使上述熔融玻璃流動一面處理上述熔融玻璃,上述玻璃處理裝置具有包含上述熔融玻璃之液相、以及由上述熔融玻璃之液面與壁所形成之氣相空間,包圍上述氣相空間之壁之至少一部分由包含鉑族金屬之材料構成,且於處理上述熔融玻璃時,存在於上述氣相空間之自上述壁揮發之鉑族金屬之揮發物之凝聚物作為異物混入上述熔融玻璃中,且進而包括凝聚物處理步驟,其於上述玻璃處理裝置之上述管中,使上述熔融玻璃之溫度成為1670℃以上,而控制提供至上述凝聚物之熱量,以使提供至上述凝聚物之熱量為能夠減小混入至上述熔融玻璃之上述凝聚物之大小的最小熱量以上;於上述玻璃處理裝置之上述管中設置有使上述氣相空間與上述玻璃處理裝置之外側之大氣連通的通氣管,於上述玻璃處理裝置之上述管中流動的上述熔融玻璃成為最高溫度之上述流動方向的最高溫度位置位於將上述熔融玻璃導入上述玻璃處理裝 置之上述管的入口、與上述通氣管之上述熔融玻璃之流動方向的位置之間。 A method for producing a glass substrate, comprising: a melting step of melting a glass raw material to form molten glass; and a molten glass processing step of treating the molten glass while flowing the molten glass in a tube of a glass processing apparatus The glass processing apparatus includes a liquid phase including the molten glass, and a vapor phase space formed by a liquid surface and a wall of the molten glass, and at least a portion of a wall surrounding the vapor phase space is made of a material containing a platinum group metal. When the molten glass is processed, the aggregate of the volatile matter of the platinum group metal volatilized from the wall in the gas phase space is mixed as a foreign matter into the molten glass, and further includes an agglomerate treatment step in which the glass treatment is performed. In the tube of the apparatus, the temperature of the molten glass is set to 1670 ° C or higher, and the heat supplied to the aggregate is controlled so that the heat supplied to the aggregate is such that the agglomerate mixed into the molten glass can be reduced. The minimum amount of heat above the size; in the above tube of the above glass processing apparatus a vent pipe for connecting the gas phase space to the atmosphere outside the glass processing apparatus, wherein the molten glass flowing through the tube of the glass processing apparatus has a maximum temperature at a highest temperature in the flow direction Glass is introduced into the above glass treatment equipment The inlet of the tube is disposed between a position of a flow direction of the molten glass of the vent pipe. 如請求項1至4中任一項之玻璃基板之製造方法,其中使與上述氣相空間接觸之上述壁之最高溫度與最低溫度之差為5℃以上,上述氣相空間包含氧。 The method for producing a glass substrate according to any one of claims 1 to 4, wherein a difference between a maximum temperature and a minimum temperature of the wall in contact with the gas phase space is 5 ° C or more, and the gas phase space contains oxygen. 如請求項1至4中任一項之玻璃基板之製造方法,其中於上述凝聚物處理步驟中進行升溫,使含有上述凝聚物之上述熔融玻璃之溫度高於在上述熔融玻璃處理步驟中凝聚物混入至熔融玻璃之區域中之熔融玻璃之溫度。 The method for producing a glass substrate according to any one of claims 1 to 4, wherein, in the agglomerating step, the temperature is raised so that the temperature of the molten glass containing the agglomerate is higher than that in the molten glass processing step. The temperature of the molten glass mixed into the region of the molten glass. 如請求項1至4中任一項之玻璃基板之製造方法,其中於上述凝聚物處理步驟中,使上述凝聚物溶解於熔融玻璃之溶解度高於在上述熔融玻璃處理步驟中凝聚物混入至熔融玻璃之區域中之上述溶解度。 The method for producing a glass substrate according to any one of claims 1 to 4, wherein in the agglomerating step, the solubility of the agglomerate in the molten glass is higher than the melting of the agglomerate in the molten glass treatment step. The above solubility in the region of the glass. 如請求項1至4中任一項之玻璃基板之製造方法,其中上述玻璃處理裝置係具有澄清管之澄清裝置,上述熔融玻璃於上述澄清管中流動,上述澄清管內之上述氣相空間沿上述熔融玻璃之流動方向而形成,上述凝聚物處理步驟於上述澄清管中進行。 The method for producing a glass substrate according to any one of claims 1 to 4, wherein the glass processing apparatus is a clarification device having a clarification tube, wherein the molten glass flows in the clarification tube, and the gas phase space in the clarification tube The flow direction of the molten glass is formed, and the agglomerate treatment step is performed in the clarification tube. 如請求項1至4中任一項之玻璃基板之製造方法,其中於上述熔融玻璃處理步驟中,使用上述熔融玻璃中包含之氧化錫進行減少上述熔融玻璃中之氣泡數之澄清處理,上述熔融玻璃於上述玻璃處理裝置中流動,在與上述氣相空間接觸之上述壁上形成沿上述熔融玻璃之流動方向之溫度分佈, 於上述氣相空間中形成沿上述熔融玻璃之流動方向之氧濃度分佈。 The method for producing a glass substrate according to any one of claims 1 to 4, wherein in the molten glass treatment step, clarification treatment for reducing the number of bubbles in the molten glass is performed using tin oxide contained in the molten glass, the melting The glass flows in the glass processing apparatus, and a temperature distribution along a flow direction of the molten glass is formed on the wall in contact with the gas phase space. An oxygen concentration distribution along the flow direction of the molten glass is formed in the gas phase space. 如請求項1至4中任一項之玻璃基板之製造方法,其中上述熔融玻璃於上述玻璃處理裝置中流動,上述凝聚物處理步驟於上述玻璃處理裝置中進行,在於上述玻璃處理裝置中流動之熔融玻璃中,對上述氣相空間中沿著熔融玻璃之流動方向在與氧濃度最高之區域對應之位置上流動之熔融玻璃進行上述凝聚物處理步驟。 The method for producing a glass substrate according to any one of claims 1 to 4, wherein the molten glass flows in the glass processing apparatus, and the agglomerate processing step is performed in the glass processing apparatus, and flows in the glass processing apparatus In the molten glass, the agglomerate treatment step is performed on the molten glass flowing in the gas phase space along the flow direction of the molten glass at a position corresponding to the region having the highest oxygen concentration. 如請求項1至4中任一項之玻璃基板之製造方法,其中使上述氣相空間中之氧濃度超過0%、且為1.0%以下,使與上述氣相空間接觸之上述壁之最高溫度與最低溫度之差為5℃以上、且為150℃以下。 The method for producing a glass substrate according to any one of claims 1 to 4, wherein the highest temperature of the wall in contact with the gas phase space is made such that the oxygen concentration in the gas phase space exceeds 0% and is 1.0% or less. The difference from the lowest temperature is 5 ° C or more and 150 ° C or less. 如請求項1至4中任一項之玻璃基板之製造方法,其中控制熔融玻璃之溫度,以使上述凝聚物處理步驟中之上述熔融玻璃之溫度在1670℃~1730℃之溫度範圍內。 The method for producing a glass substrate according to any one of claims 1 to 4, wherein the temperature of the molten glass is controlled such that the temperature of the molten glass in the agglomerating step is in a temperature range of 1670 ° C to 1730 ° C. 如請求項1至4中任一項之玻璃基板之製造方法,其中控制熔融玻璃之溫度,以使於上述熔融玻璃處理步驟中凝聚物混入至熔融玻璃之區域中之上述熔融玻璃之溫度為1580℃~1660℃之溫度範圍內。 The method for producing a glass substrate according to any one of claims 1 to 4, wherein the temperature of the molten glass is controlled such that the temperature of the molten glass in the region of the molten glass in the molten glass treatment step is 1580 Within the temperature range of °C~1660 °C. 如請求項1至4中任一項之玻璃基板之製造方法,其中上述熔融玻璃處理步驟包括上述凝聚物處理步驟。 The method for producing a glass substrate according to any one of claims 1 to 4, wherein the molten glass treatment step comprises the above-described agglomerate treatment step. 如請求項1至4中任一項之玻璃基板之製造方法,其中上述玻璃基板係顯示器用玻璃基板。 The method for producing a glass substrate according to any one of claims 1 to 4, wherein the glass substrate is a glass substrate for a display. 一種玻璃基板之製造方法,其特徵在於,包括:熔解步驟,其熔解玻璃原料而生成熔融玻璃;以及熔融玻璃處理步驟,其於玻璃處理裝置中處理上述熔融玻 璃,上述玻璃處理裝置具有因上述熔融玻璃之導入而形成由上述熔融玻璃之表面與壁包圍之氣相空間之空間,上述壁之至少一部分由包含鉑族金屬之材料構成,且於處理上述熔融玻璃時,存在於上述氣相空間之自上述壁揮發之鉑族金屬之揮發物之凝聚物作為異物混入上述熔融玻璃中,且包括凝聚物處理步驟,其藉由調整上述熔融玻璃之溫度、或調整上述凝聚物於上述熔融玻璃中之溶解度,而減小混入至上述熔融玻璃之凝聚物之大小,以使混入至上述熔融玻璃之凝聚物中,最大長度為50μm以下之凝聚物之個數之比率為70%以上;且使上述凝聚物處理步驟開始時之溶於上述熔融玻璃中之鉑族金屬之濃度為0.05~20ppm。 A method for producing a glass substrate, comprising: a melting step of melting a glass raw material to form molten glass; and a molten glass processing step of treating the molten glass in a glass processing apparatus In the glass processing apparatus, the glass processing apparatus has a space in which a vapor phase space surrounded by a surface of the molten glass and a wall is formed by introduction of the molten glass, and at least a part of the wall is made of a material containing a platinum group metal, and the molten material is processed. In the case of glass, the agglomerate of the volatile matter of the platinum group metal volatilized from the wall in the gas phase space is mixed as a foreign matter into the molten glass, and includes an agglomerate treatment step of adjusting the temperature of the molten glass, or Adjusting the solubility of the agglomerate in the molten glass, and reducing the size of the agglomerates mixed into the molten glass so as to be mixed into the aggregate of the molten glass, and the number of aggregates having a maximum length of 50 μm or less The ratio is 70% or more; and the concentration of the platinum group metal dissolved in the molten glass at the beginning of the agglomeration treatment step is 0.05 to 20 ppm. 一種玻璃基板之製造方法,其特徵在於,包括:熔解步驟,其熔解玻璃原料而生成熔融玻璃;以及熔融玻璃處理步驟,其於玻璃處理裝置中處理上述熔融玻璃,上述玻璃處理裝置具有因上述熔融玻璃之導入而形成由上述熔融玻璃之表面與壁包圍之氣相空間之空間,上述壁之至少一部分由包含鉑族金屬之材料構成,且於處理上述熔融玻璃時,存在於上述氣相空間之自上述壁揮發之鉑族金屬之揮發物之凝聚物作為異物混入上述熔融玻璃中,且包括凝聚物處理步驟,其藉由調整上述熔融玻璃之溫度、或調整上述凝聚物於上述熔融玻璃中之溶解度,而減小混入至上述熔融玻璃之凝聚物之大小,以使混入至上述熔融玻璃之凝聚物中,最大長度為50μm以下之凝聚物之個數之比率為70%以上;且於上述凝聚物處理步驟中,在玻璃基板之[Fe3+]/([Fe2+]+[Fe3+]) 為0.2~0.5之範圍內調整上述熔融玻璃之上述鉑族金屬之飽和溶解度。 A method for producing a glass substrate, comprising: a melting step of melting a glass raw material to form molten glass; and a molten glass processing step of treating the molten glass in a glass processing apparatus having the melting a space for forming a vapor phase space surrounded by a surface of the molten glass and a wall, wherein at least a part of the wall is made of a material containing a platinum group metal, and is present in the gas phase space when the molten glass is processed. The agglomerate of the volatile matter of the platinum group metal volatilized from the wall is mixed as a foreign matter into the molten glass, and includes an agglomerate treatment step of adjusting the temperature of the molten glass or adjusting the agglomerate in the molten glass. The solubility is reduced to reduce the size of the agglomerates mixed into the molten glass so as to be mixed into the aggregate of the molten glass, and the ratio of the number of aggregates having a maximum length of 50 μm or less is 70% or more; was treated step, the glass substrate [Fe 3+] / ([Fe 2+] + [Fe 3+]) of 0.2 to 0.5 Above the saturation solubility of adjusting the platinum group metal within the range of the molten glass. 一種玻璃基板積層體,其特徵在於,其積層複數片玻璃基板而形成,且上述玻璃基板積層體之上述玻璃基板之體積合計為0.1m3以上,上述玻璃基板積層體所含有之全部鉑族金屬之凝聚物中,最大長度為50μm以下之凝聚物之個數之比率為70%以上。 A glass substrate laminate which is formed by laminating a plurality of glass substrates, and the total volume of the glass substrate of the glass substrate laminate is 0.1 m 3 or more, and all of the platinum group metals contained in the glass substrate laminate In the aggregate, the ratio of the number of aggregates having a maximum length of 50 μm or less is 70% or more. 一種玻璃基板,其特徵在於,玻璃基板所含有之鉑族金屬之凝聚物中,最大長度為50μm以下之凝聚物之個數之比率為70%以上。 A glass substrate characterized in that the ratio of the number of aggregates having a maximum length of 50 μm or less is 70% or more in the aggregate of the platinum group metal contained in the glass substrate.
TW104121267A 2014-06-30 2015-06-30 Method for producing glass substrate, glass substrate and glass substrate laminate TWI629248B (en)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP2014134578 2014-06-30
JP2014-134578 2014-06-30
JP2014-202455 2014-09-30
JP2014202301 2014-09-30
JP2014-202301 2014-09-30
JP2014202455 2014-09-30

Publications (2)

Publication Number Publication Date
TW201619075A TW201619075A (en) 2016-06-01
TWI629248B true TWI629248B (en) 2018-07-11

Family

ID=55019344

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104121267A TWI629248B (en) 2014-06-30 2015-06-30 Method for producing glass substrate, glass substrate and glass substrate laminate

Country Status (5)

Country Link
JP (2) JP6088056B2 (en)
KR (2) KR101811508B1 (en)
CN (2) CN109534656B (en)
TW (1) TWI629248B (en)
WO (1) WO2016002814A1 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11104597B2 (en) * 2016-10-31 2021-08-31 Nippon Electric Glass Co., Ltd. Glass production device, glass production method, glass supply pipe, and molten glass transport method
JP6792821B2 (en) * 2016-12-14 2020-12-02 日本電気硝子株式会社 Support structure of glass supply pipe, flat glass manufacturing equipment, flat glass manufacturing method, and preheating method of glass supply pipe
WO2018221374A1 (en) * 2017-05-29 2018-12-06 東洋紡株式会社 Layered body of polyimide film and inorganic substrate
KR102696609B1 (en) * 2018-07-04 2024-08-21 니폰 덴키 가라스 가부시키가이샤 Method for manufacturing glass articles, manufacturing apparatus and glass substrate
DE102019120064A1 (en) * 2019-07-24 2021-01-28 Schott Ag Device and method for producing glass ribbons

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1590325A (en) * 2003-08-08 2005-03-09 Hoya株式会社 Method of manufacturing glass melt and method of manufacturing molded glass material
TW201006771A (en) * 2008-02-29 2010-02-16 Corning Inc Methods and apparatus for reducing platinum-group defects in sheet glass
CN103118993A (en) * 2010-09-30 2013-05-22 安瀚视特控股株式会社 Method for producing glass sheet
TW201410627A (en) * 2012-09-04 2014-03-16 Avanstrate Inc Glass substrate manufacturing method and glass substrate manufacturing apparatus
CN203513469U (en) * 2013-09-25 2014-04-02 安瀚视特控股株式会社 Clarification tank for molten glass and manufacturing device of glass substrate

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060242996A1 (en) * 2005-04-27 2006-11-02 Gilbert Deangelis System and method for controlling the environment around one or more vessels in a glass manufacturing system
US8925353B2 (en) * 2007-11-08 2015-01-06 Corning Incorporated Process and system for fining glass
JP4790783B2 (en) 2008-11-05 2011-10-12 AvanStrate株式会社 Manufacturing method of glass plate
US8177114B2 (en) * 2010-08-30 2012-05-15 Corning Incorporated Method for eliminating carbon contamination of platinum-containing components for a glass making apparatus
JP5535112B2 (en) * 2011-03-25 2014-07-02 月島機械株式会社 Coal thermal power generation facility and coal thermal power generation method
WO2012133467A1 (en) * 2011-03-31 2012-10-04 AvanStrate株式会社 Method for producing glass plate
JP5456895B2 (en) * 2011-03-31 2014-04-02 AvanStrate株式会社 Glass plate manufacturing method
WO2012132472A1 (en) * 2011-03-31 2012-10-04 AvanStrate株式会社 Method for producing glass plate
EP2530057B1 (en) * 2011-05-31 2019-04-10 Corning Incorporated Glass melt handling equipment and method
JP5719797B2 (en) * 2012-04-06 2015-05-20 AvanStrate株式会社 Glass plate manufacturing method and glass plate manufacturing apparatus
JP5552551B2 (en) * 2012-06-29 2014-07-16 AvanStrate株式会社 Glass substrate manufacturing method and glass substrate manufacturing apparatus
JP2014069980A (en) * 2012-09-28 2014-04-21 Avanstrate Inc Method for producing glass substrate and glass substrate producing apparatus
JP2014071360A (en) * 2012-09-28 2014-04-21 Avanstrate Inc Glass substrate for flat panel display and manufacturing method thereof, and liquid crystal display
US20140123710A1 (en) * 2012-11-02 2014-05-08 David Myron Lineman Apparatus and method for minimizing platinum group metal particulate inclusion in molten glass

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1590325A (en) * 2003-08-08 2005-03-09 Hoya株式会社 Method of manufacturing glass melt and method of manufacturing molded glass material
TW201006771A (en) * 2008-02-29 2010-02-16 Corning Inc Methods and apparatus for reducing platinum-group defects in sheet glass
CN103118993A (en) * 2010-09-30 2013-05-22 安瀚视特控股株式会社 Method for producing glass sheet
TW201410627A (en) * 2012-09-04 2014-03-16 Avanstrate Inc Glass substrate manufacturing method and glass substrate manufacturing apparatus
CN203513469U (en) * 2013-09-25 2014-04-02 安瀚视特控股株式会社 Clarification tank for molten glass and manufacturing device of glass substrate

Also Published As

Publication number Publication date
KR102205920B1 (en) 2021-01-20
TW201619075A (en) 2016-06-01
WO2016002814A1 (en) 2016-01-07
CN105431385A (en) 2016-03-23
KR20170128624A (en) 2017-11-22
KR20160023631A (en) 2016-03-03
JP2017048113A (en) 2017-03-09
KR101811508B1 (en) 2017-12-21
CN109534656B (en) 2022-02-18
CN109534656A (en) 2019-03-29
JP6088056B2 (en) 2017-03-01
CN105431385B (en) 2018-10-09
JP6722096B2 (en) 2020-07-15
JPWO2016002814A1 (en) 2017-04-27

Similar Documents

Publication Publication Date Title
TWI629248B (en) Method for producing glass substrate, glass substrate and glass substrate laminate
TWI545096B (en) A glass substrate manufacturing method, a glass substrate manufacturing apparatus, and a molten glass processing apparatus
TWI417256B (en) Manufacture of glass plates
TWI568695B (en) A manufacturing method of a glass substrate, a manufacturing apparatus for a molten glass processing apparatus and a glass substrate
TWI568696B (en) A glass substrate manufacturing method and a glass substrate manufacturing apparatus
JP6025897B2 (en) Glass substrate manufacturing method and glass substrate manufacturing apparatus
TWI564258B (en) Manufacture of glass plates
TWI588108B (en) Method of manufacturing glass substrate and glass substrate manufacturing apparatus
JP7212535B2 (en) Glass substrate manufacturing method and glass substrate manufacturing apparatus
TWI588105B (en) Method of manufacturing glass substrate and glass substrate manufacturing apparatus
JP2016069252A (en) Manufacturing method for glass substrate and manufacturing apparatus for glass substrate
JP2016069250A (en) Manufacturing method for glass substrate and manufacturing apparatus for glass substrate
JP6433224B2 (en) Glass substrate manufacturing method and glass substrate manufacturing apparatus
JP6494969B2 (en) Glass substrate manufacturing method and glass substrate manufacturing apparatus
JP2016069247A (en) Manufacturing method for glass substrate and manufacturing apparatus for glass substrate
JP6396744B2 (en) Glass substrate manufacturing method and glass substrate manufacturing apparatus
JP2016069249A (en) Manufacturing method for glass substrate and manufacturing apparatus for glass substrate