TWI473709B - A method for manufacturing a copper-clad laminate on both sides, and a group of copper or copper alloy foils to which it is used - Google Patents

A method for manufacturing a copper-clad laminate on both sides, and a group of copper or copper alloy foils to which it is used Download PDF

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TWI473709B
TWI473709B TW99136888A TW99136888A TWI473709B TW I473709 B TWI473709 B TW I473709B TW 99136888 A TW99136888 A TW 99136888A TW 99136888 A TW99136888 A TW 99136888A TW I473709 B TWI473709 B TW I473709B
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copper
alloy foil
foil
copper alloy
sided
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TW99136888A
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Chinese (zh)
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TW201132494A (en
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Toshiyuki Ono
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Jx Nippon Mining & Metals Corp
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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/02Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/022Processes for manufacturing precursors of printed circuits, i.e. copper-clad substrates
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/04Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B15/08Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/20Layered products comprising a layer of metal comprising aluminium or copper
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/09Use of materials for the conductive, e.g. metallic pattern
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/03Conductive materials
    • H05K2201/0332Structure of the conductor
    • H05K2201/0335Layered conductors or foils
    • H05K2201/0355Metal foils
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/11Treatments characterised by their effect, e.g. heating, cooling, roughening
    • H05K2203/1105Heating or thermal processing not related to soldering, firing, curing or laminating, e.g. for shaping the substrate or during finish plating
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/14Related to the order of processing steps
    • H05K2203/1476Same or similar kind of process performed in phases, e.g. coarse patterning followed by fine patterning

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Laminated Bodies (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)

Description

兩面覆銅積層板之製造方法、及其所使用之1組的銅或銅合金箔Method for manufacturing two-sided copper-clad laminate, and a group of copper or copper alloy foil used therefor

本發明係關於一種例如用於可撓性配線板(FPC,Flexible Printed Circuit)之於樹脂層之兩面積層銅或銅合金箔而成的兩面覆銅積層板之製造方法、及其所使用之1組的銅或銅合金箔。The present invention relates to a method for manufacturing a double-sided copper-clad laminate which is used for a two-area layer of copper or a copper alloy foil of a resin layer for a flexible printed circuit (FPC), and a method for using the same Set of copper or copper alloy foils.

可撓性配線板(FPC)中所使用之覆銅積層板(CCL),可使用於樹脂層之單面積層銅箔而成之單面覆銅積層板、及於樹脂層之兩面積層銅箔而成之兩面覆銅積層板(以下稱為「兩面CCL」)。於兩面CCL上形成電路者為兩面可撓性配線板,其容易實現電路之精細化、FPC之省空間化,因此兩面CCL之使用有增加的傾向。A copper clad laminate (CCL) used in a flexible wiring board (FPC), a single-sided copper clad laminate obtained by using a single-layer copper foil for a resin layer, and a two-layer copper foil on a resin layer A two-sided copper clad laminate (hereinafter referred to as "two-sided CCL"). The circuit formed on both sides of the CCL is a two-sided flexible wiring board, which is easy to realize the refinement of the circuit and the space saving of the FPC. Therefore, the use of the two-sided CCL tends to increase.

此種兩面CCL之製造方法,已知有於銅箔之單面澆鑄樹脂組成物之清漆並進行加熱硬化後,於樹脂面熱壓接其他銅箔之方法(專利文獻1)。又,有如下等方法:於兩面具有熱塑性聚醯亞胺層之聚醯亞胺膜之表面與背面,同時熱壓接銅箔;於具有熱塑性聚醯亞胺層之聚醯亞胺膜之單面熱壓接銅箔之後,於與銅箔相反側之聚醯亞胺膜面塗佈熱塑性聚醯亞胺層,並於該面熱壓接其他銅箔;於銅箔之單面澆鑄聚醯亞胺之前驅物即清漆,並進行硬化後,於與銅箔相反側之樹脂表面形成熱塑性聚醯亞胺層,並且於該面熱壓接其他銅箔。In the method for producing a double-sided CCL, there is known a method in which a varnish of a resin composition of a single side of a copper foil is cast and heat-hardened, and then another copper foil is thermocompression-bonded to the resin surface (Patent Document 1). Further, there are the following methods: a surface of the polyimide film having a thermoplastic polyimide layer on both sides and a back surface, and a thermocompression bonding copper foil; and a polyimide film having a thermoplastic polyimide layer After hot-pressing the copper foil, the thermoplastic polyimide layer is coated on the polyimide film on the opposite side of the copper foil, and the other copper foil is thermocompression bonded on the surface; and the polycrystalline silicon is cast on one side of the copper foil. The imide precursor, that is, the varnish, is hardened, and a thermoplastic polyimide layer is formed on the surface of the resin opposite to the copper foil, and the other copper foil is thermocompression bonded to the surface.

專利文獻1:日本特開平05-212824號公報Patent Document 1: Japanese Laid-Open Patent Publication No. 05-212824

此處,若除去於樹脂層(上述聚醯亞胺膜等)之兩面同時層疊銅箔之情形,則會將最初與樹脂層積層之銅箔(第1銅箔)於最初積層時加熱至300℃以上之溫度,並暫時冷卻。進而,於之後在樹脂層之相反面積層其他銅箔(第2銅箔)時,亦同樣對第1銅箔進行再加熱並予以冷卻。Here, when the copper foil is laminated on both surfaces of the resin layer (the above-mentioned polyimide film or the like), the copper foil (first copper foil) which is initially laminated with the resin layer is heated to 300 at the time of initial lamination. Temperature above °C and temporarily cooled. Further, when the other copper foil (second copper foil) is laminated on the opposite surface of the resin layer, the first copper foil is similarly reheated and cooled.

然而,當積層第2銅箔並進行加熱後將其冷卻時,有時與第1銅箔之長度方向平行地且通常於寬度方向中央位置產生皺褶或折痕。即便調整第2銅箔之積層條件或積層時之加熱條件(熱壓接條件、張力等),亦難以完全消除該皺褶或折痕。並且,認為上述皺褶或折痕係於如下情形時產生:由於施加於第1銅箔及第2銅箔之積層時之受熱歷程不同,故因積層第2銅箔並進行加熱後將其冷卻時之溫度變化而導致夾持樹脂層而存在之兩銅箔之尺寸變化率不同,銅箔無法承受由此所產生之應力。However, when the second copper foil is laminated and heated, it may be wrinkled or creased in parallel with the longitudinal direction of the first copper foil and generally at the center in the width direction. Even if the laminated condition of the second copper foil or the heating conditions (such as thermocompression bonding conditions, tension, etc.) at the time of lamination are adjusted, it is difficult to completely eliminate the wrinkles or creases. Further, it is considered that the wrinkles or creases are caused by the fact that the heat history of the first copper foil and the second copper foil is different, so that the second copper foil is heated and then cooled. When the temperature changes to cause the dimensional change rate of the two copper foils which are present in the resin layer to be sandwiched, the copper foil cannot withstand the stress generated thereby.

即,本發明係為解決上述課題而完成者,目的在於提供一種抑制皺褶或折痕之兩面覆銅積層板之製造方法、及其所使用之1組的銅或銅合金箔。That is, the present invention has been made to solve the above problems, and an object of the invention is to provide a method for producing a double-sided copper-clad laminate which suppresses wrinkles or creases, and a copper or copper alloy foil of the same type used.

本發明人等進行各種研究之結果發現:於製造兩面CCL時,即便因兩銅箔之尺寸變化之差而產生應力,亦可藉由調整兩銅箔之特性以使銅箔不翹曲(bucking),而抑制皺褶或折痕。As a result of various studies conducted by the inventors of the present invention, it has been found that when a double-sided CCL is produced, even if stress is generated due to a difference in size between the two copper foils, the characteristics of the two copper foils can be adjusted so that the copper foil is not warped (bucking) ), while suppressing wrinkles or creases.

為達成上述目的,本發明之兩面覆銅積層板之製造方法包括:第1步驟,於第1銅或銅合金箔之單面形成樹脂層,而獲得單面覆銅積層板;及第2步驟,於上述單面覆銅積層板之上述樹脂層側積層第2銅或銅合金箔並進行加熱,而獲得兩面覆銅積層板;且使用上述第1銅或銅合金箔及上述第2銅或銅合金箔,當上述第1銅或銅合金箔之應力σA =EA ×EB /(EA +EB )×(ΔLA -ΔLB )×1000、上述第2銅或銅合金箔之應力σB =EA ×EB /(EA +EB )×(ΔLB -ΔLA )×1000、且將σA 與σB 中之負值者設為σγ 時,10×σγ |≦YSγIn order to achieve the above object, a method for producing a double-sided copper-clad laminate according to the present invention includes: a first step of forming a resin layer on one side of a first copper or copper alloy foil to obtain a single-sided copper-clad laminate; and a second step And heating the second copper or copper alloy foil on the resin layer side of the single-sided copper-clad laminate to obtain a double-sided copper-clad laminate; and using the first copper or copper alloy foil and the second copper or In the copper alloy foil, when the stress of the first copper or copper alloy foil is σ A = E A × E B / (E A + E B ) × (ΔL A - ΔL B ) × 1000, the second copper or copper alloy foil The stress σ B = E A × E B / (E A + E B ) × (ΔL B - ΔL A ) × 1000, and the negative value of σ A and σ B is σ γ , 10 × σ γ |≦YS γ .

其中,EA :將上述第1銅或銅合金箔於350℃保持30分鐘並冷卻至室溫後,再次於350℃保持30分鐘並冷卻至室溫時寬度方向上之楊式模數(單位為GPa);EB :將上述第2銅或銅合金箔於350℃保持30分鐘後冷卻至室溫時寬度方向上之楊式模數(單位為GPa);ΔLA :以自室溫升溫至350℃並保持30分鐘後冷卻至室溫時之尺寸為基準,再次於350℃保持30分鐘並冷卻至室溫後之上述第1銅或銅合金箔寬度方向上之尺寸變化率(單位為ppm,將收縮設為正值);ΔLB :自室溫升溫至350℃,保持30分鐘並冷卻至室溫後之上述第2銅或銅合金箔寬度方向上之尺寸變化率(單位為ppm,將收縮設為正值);YSγ :拉伸試驗中之0.2%安全限應力(Proof stress),且若σA 與σB 中之負值者為A則選擇YSA (單位為MPa),相反則選擇YSB (單位為MPa);YSA :拉伸試驗中上述第1銅或銅合金箔之0.2%安全限應力;YSB :拉伸試驗中上述第2銅或銅合金箔之0.2%安全限應力。Wherein E A : The first copper or copper alloy foil is held at 350 ° C for 30 minutes and cooled to room temperature, and then held at 350 ° C for 30 minutes and cooled to room temperature, the Young's modulus in the width direction (in units GPa); E B : Younger modulus (in units of GPa) in the width direction when the second copper or copper alloy foil is kept at 350 ° C for 30 minutes and then cooled to room temperature; ΔL A : heated from room temperature to 350 ° C And maintaining the dimensional change rate (in ppm) of the first copper or copper alloy foil in the width direction of the first copper or copper alloy foil after the temperature is kept at room temperature for 30 minutes and kept at 350 ° C for 30 minutes. The shrinkage is set to a positive value); ΔL B : the dimensional change rate in the width direction of the second copper or copper alloy foil after the temperature is raised from room temperature to 350 ° C for 30 minutes and cooled to room temperature (in ppm) Positive value); YS γ : 0.2% safety limit stress (Proof stress) in the tensile test, and if the negative value of σ A and σ B is A, select YS A (unit is MPa), otherwise choose YS B (unit: MPa); YS A : 0.2% safety limit stress of the above first copper or copper alloy foil in tensile test; YS B : pull The 0.2% safety limit stress of the above second copper or copper alloy foil in the tensile test.

本發明之1組的銅或銅合金箔係用於上述兩面覆銅積層板之製造方法,且由上述第1銅或銅合金箔及上述第2銅或銅合金箔之組合所構成。The copper or copper alloy foil of the first aspect of the present invention is used in the method for producing the above-mentioned two-sided copper-clad laminate, and is composed of a combination of the first copper or copper alloy foil and the second copper or copper alloy foil.

於本發明之1組的銅或銅合金箔中,上述第2銅或銅合金箔之ΔLB 較佳為145ppm以下。In the copper or copper alloy foil of the first group of the present invention, the ΔL B of the second copper or copper alloy foil is preferably 145 ppm or less.

根據本發明,於製造兩面覆銅積層板時可抑制銅或銅合金箔之皺褶或折痕。According to the present invention, wrinkles or creases of copper or copper alloy foil can be suppressed when manufacturing a double-sided copper clad laminate.

以下,對本發明之實施形態之兩面覆銅積層板之製造方法進行說明。再者,於本發明中,所謂%,只要未作特別說明,則表示質量%(質量%)。圖1係表示兩面覆金屬積層板8之製造方法。Hereinafter, a method of manufacturing a double-sided copper-clad laminate according to an embodiment of the present invention will be described. In the present invention, the term "%" means mass% (% by mass) unless otherwise specified. Fig. 1 shows a method of manufacturing a double-sided metal-clad laminate 8.

圖1中,首先連續捲出捲筒狀之第1銅箔4,使用應用輥機(Application roller)10、11等,於所捲出之第1銅或銅合金箔4之單面以特定厚度連續塗佈清漆狀樹脂組成物2a。樹脂組成物2a於硬化後成為樹脂層2。繼而,將塗佈有樹脂組成物2a之第1銅或銅合金箔4導入至乾燥裝置15中,使樹脂組成物2a硬化(或半硬化)。如此,於第1銅或銅合金箔4之單面形成樹脂層,而獲得單面覆銅積層板(第1步驟)。此處,亦有時於第1步驟結束之後將該單面覆銅積層板捲繞成捲筒狀,再進行至第2步驟。再者,係於第1銅或銅合金箔4之單面形成樹脂層時進行加熱,但除於塗佈上述樹脂組成物之後進行加熱以外,例如亦可將如樹脂膜般已成為樹脂層者熱壓接於第1銅或銅合金箔4之單面。又,通常第1步驟中之加熱溫度成為第2步驟中之加熱溫度以上之溫度。繼而,連續捲出捲筒狀之第2銅或銅合金箔6,於加熱至例如350~400℃之層疊輥20、21之間連續通過第1銅或銅合金箔4及第2銅或銅合金箔6。此時,於第1銅或銅合金箔4之樹脂層2側積層第2銅或銅合金箔6並進行加熱,而獲得兩面覆銅積層板8(第2步驟)。將兩面覆銅積層板8適當捲繞成捲筒。In Fig. 1, first, the first copper foil 4 in a roll shape is continuously wound up, and a specific thickness is applied to one side of the first copper or copper alloy foil 4 to be wound up by using an application roller 10, 11, or the like. The varnish-like resin composition 2a was continuously applied. The resin composition 2a becomes the resin layer 2 after hardening. Then, the first copper or copper alloy foil 4 coated with the resin composition 2a is introduced into the drying device 15, and the resin composition 2a is cured (or semi-hardened). In this manner, a resin layer is formed on one surface of the first copper or copper alloy foil 4 to obtain a single-sided copper-clad laminate (first step). Here, the single-sided copper-clad laminate may be wound into a roll shape after completion of the first step, and the second step may be performed. In addition, when the resin layer is formed on one surface of the first copper or copper alloy foil 4, the heating is performed, and the resin composition may be used as a resin layer, for example, in addition to the resin composition. It is thermocompression bonded to one side of the first copper or copper alloy foil 4. Further, usually, the heating temperature in the first step is a temperature equal to or higher than the heating temperature in the second step. Then, the second copper or copper alloy foil 6 in the form of a roll is continuously wound up, and the first copper or copper alloy foil 4 and the second copper or copper are continuously passed between the laminating rolls 20 and 21 heated to, for example, 350 to 400 °C. Alloy foil 6. At this time, the second copper or copper alloy foil 6 is laminated on the resin layer 2 side of the first copper or copper alloy foil 4 and heated to obtain a double-sided copper-clad laminate 8 (second step). The double-sided copper clad laminate 8 is appropriately wound into a roll.

並且,如圖2所示,兩面覆銅積層板8係於第1銅或銅合金箔4之樹脂層2側積層第2銅或銅合金箔6而構成。Further, as shown in FIG. 2, the double-sided copper-clad laminate 8 is formed by laminating a second copper or copper alloy foil 6 on the resin layer 2 side of the first copper or copper alloy foil 4.

第1銅或銅合金箔4及第2銅或銅合金箔6,例如可舉出:純銅、精銅(JIS-1100)、無氧銅(JIS-1020)或於該等純銅、精銅、無氧銅中添加合計為40~2000質量ppm之Sn及/或Ag者。此處,於第1銅或銅合金4及第2銅或銅合金6之兩者之組成均含有合計超過400ppm之Sn及/或Ag之情形時,無法用於要求彎曲性之用途中,但若各箔4、6中任一者含有合計超過400ppm之Sn及/或Ag,則只要利用蝕刻自兩面CCL去除該箔而殘留其他箔則彎曲性不會劣化。可將第1銅或銅合金箔4及第2銅或銅合金箔6之厚度設為例如6~18μm左右。第1銅或銅合金箔4及第2銅或銅合金箔6之組成亦可不同,但通常使用相同組成者。第1銅或銅合金箔4及第2銅或銅合金箔6可為壓延箔,亦可為電解箔。Examples of the first copper or copper alloy foil 4 and the second copper or copper alloy foil 6 include pure copper, refined copper (JIS-1100), and oxygen-free copper (JIS-1020), or pure copper or refined copper. A total of 40 to 2000 ppm by mass of Sn and/or Ag is added to the oxygen-free copper. Here, when the composition of both the first copper or copper alloy 4 and the second copper or copper alloy 6 contains a total of more than 400 ppm of Sn and/or Ag, it cannot be used for applications requiring bending properties, but When any of the foils 4 and 6 contains a total of more than 400 ppm of Sn and/or Ag, the foil is removed from both sides of the CCL by etching, and the other foil remains without deterioration of the bendability. The thickness of the first copper or copper alloy foil 4 and the second copper or copper alloy foil 6 can be, for example, about 6 to 18 μm. The composition of the first copper or copper alloy foil 4 and the second copper or copper alloy foil 6 may be different, but the same composition is usually used. The first copper or copper alloy foil 4 and the second copper or copper alloy foil 6 may be rolled foil or electrolytic foil.

樹脂層2可使用聚醯亞胺、PET(聚對酞酸乙二酯)、環氧樹脂、酚樹脂等熱固性樹脂;飽和聚酯樹脂等熱塑性樹脂,但並不限定於該等樹脂。又,亦可將溶劑中溶解有該等樹脂層之成分之清漆(例如聚醯亞胺之前驅物之聚醯胺酸溶液)塗佈於第1銅或銅合金箔4之單面並進行加熱,藉此去除溶劑,使反應(例如醯亞胺化反應)進行而使其硬化。可將樹脂層2之厚度設為例如1~15μm左右。As the resin layer 2, a thermosetting resin such as polyimine, PET (polyethylene terephthalate), an epoxy resin, or a phenol resin; a thermoplastic resin such as a saturated polyester resin can be used, but it is not limited to these resins. Further, a varnish in which a component of the resin layer is dissolved in a solvent (for example, a polyamidic acid solution of a polyimide precursor) may be applied to one surface of the first copper or copper alloy foil 4 and heated. Thereby, the solvent is removed, and the reaction (for example, hydrazine imidization reaction) is carried out to harden it. The thickness of the resin layer 2 can be, for example, about 1 to 15 μm.

其次,對本發明之特徵部分即第1銅或銅合金箔4及第2銅或銅合金箔6之特性進行說明。Next, the characteristics of the first copper or copper alloy foil 4 and the second copper or copper alloy foil 6 which are characteristic parts of the present invention will be described.

以下,表示當於第1銅或銅合金箔4之單面形成樹脂層之後,積層第2銅或銅合金箔6而製造兩面CCL時,由於夾持樹脂之兩片銅或銅合金箔4、6之尺寸變化之差而產生之應力。Hereinafter, when a resin layer is formed on one surface of the first copper or copper alloy foil 4, and the second copper or copper alloy foil 6 is laminated to produce a double-sided CCL, two pieces of copper or copper alloy foil 4 sandwiching the resin are used. The stress caused by the difference in the dimensional change of 6.

首先,於在溫度T1 (T1 為積層第2銅或銅合金箔6時之加熱溫度)下積層為兩面CCL後冷卻至T2 為止之情形時,對第1銅或銅合金箔4所施加之應力σA 係以下述式1所表示:First, at the temperature T 1 (T 1 is the product of the second layer of copper or copper alloy foil heating the 6 temperature) laminated to both surfaces CCL Upon cooling to the case of T up of 2, a first copper or copper alloy foil 4 The applied stress σ A is expressed by the following formula 1:

σA =EA ×EB /(EA +EB )×(αB ×(T1 -T2 )+ΔLB -(αA ×(T1 -T2 )+ΔLA ))×1000 (1)。再者,尺寸變化Δ係將收縮設為正,且為寬度方向(自銅或銅合金箔之捲筒連續地製造CCL時之捲筒寬度方向)之變化。σ A = E A × E B / (E A + E B ) × (α B × (T 1 - T 2 ) + ΔL B - (α A × (T 1 - T 2 ) + ΔL A )) × 1000 (1). Further, the dimensional change Δ is a change in the shrinkage and is a change in the width direction (the direction of the roll width when the CCL is continuously produced from the roll of copper or copper alloy foil).

此處,用於CCL之銅或銅合金箔為近似於純銅者,因此即便稍微含有添加成分,亦可將熱膨脹係數α(下標A、B分別表示第1銅或銅合金箔4、第2銅或銅合金箔6)視為相同(αA ≒αB )。因此,式1係以下述式2所表示:Here, since the copper or copper alloy foil used for CCL is similar to pure copper, the thermal expansion coefficient α can be obtained even if the additive component is slightly contained (subscripts A and B respectively indicate the first copper or copper alloy foil 4, and the second Copper or copper alloy foil 6) is considered to be the same (α A ≒ α B ). Therefore, Formula 1 is expressed by the following Formula 2:

σA =EA ×EB /(EA +EB )×(ΔLA -ΔLB )×1000 (2)。σ A = E A × E B / (E A + E B ) × (ΔL A - ΔL B ) × 1000 (2).

其中,EA :將上述第1銅或銅合金箔於350℃保持30分鐘並冷卻至室溫之後,再次於350℃保持30分鐘並冷卻至室溫之第1受熱歷程中,上述第1銅或銅合金箔之寬度方向上之楊式模數(單位為GPa);EB :由將上述第2銅或銅合金箔於350℃保持30分鐘並冷卻至室溫之第2受熱歷程所產生之上述第2銅或銅合金箔之寬度方向上之楊式模數(單位為GPa);ΔLA :以自室溫升溫至350℃並保持30分鐘後冷卻至室溫時之尺寸為基準,再次於350℃保持30分鐘並冷卻至室溫後之上述第1銅或銅合金箔之寬度方向上之尺寸變化率(單位為ppm,將收縮設為正值);ΔLB :自室溫升溫至350℃,保持30分鐘並冷卻至室溫後之上述第2銅或銅合金箔之寬度方向上之尺寸變化率(單位為ppm,將收縮設為正值)。Here, E A : the first copper or copper alloy foil is held at 350 ° C for 30 minutes and cooled to room temperature, and then held at 350 ° C for 30 minutes and cooled to room temperature in the first heating course, the first copper Or the Young's modulus of the copper alloy foil in the width direction (unit: GPa); E B : produced by the second heat history of holding the second copper or copper alloy foil at 350 ° C for 30 minutes and cooling to room temperature The Young's modulus of the second copper or copper alloy foil in the width direction (unit: GPa); ΔL A : based on the temperature from room temperature to 350 ° C for 30 minutes and then cooled to room temperature, again at 350 The dimensional change rate in the width direction of the first copper or copper alloy foil after the temperature is kept at room temperature for 30 minutes and cooled to room temperature (in ppm, the shrinkage is set to a positive value); ΔL B : the temperature is raised from room temperature to 350 ° C, The dimensional change rate (unit: ppm, and shrinkage was set to a positive value) in the width direction of the second copper or copper alloy foil after holding for 30 minutes and cooling to room temperature.

再者,所謂室溫係為25~35℃(通常為25℃)。Further, the room temperature is 25 to 35 ° C (usually 25 ° C).

即,若使兩片銅或銅合金箔4、6之楊式模數變小,且使銅或銅合金箔4、6之尺寸變化率之差(ΔLA -ΔLB )變小,則應力σA 變小,不易產生製造兩面CCL時之皺褶或折痕。That is, when the Young's modulus of the two copper or copper alloy foils 4 and 6 is made small, and the difference in the dimensional change rate (ΔL A - ΔL B ) between the copper or copper alloy foils 4 and 6 is made small, the stress σ A is small, and it is not easy to produce wrinkles or creases when manufacturing CCL on both sides.

此處,即便兩片銅或銅合金箔4、6使用相同者,亦產生尺寸變化率之差(ΔLA -ΔLB ),因此顯然該差並非由熱膨脹所引起。並且,若對金屬加熱則產生再結晶或回復等組織變化,因此若加熱金屬後進行冷卻,則會變得較原先尺寸短(熱收縮)、或長(熱伸長)。又,即便將暫時加熱並冷卻之金屬再次於相同溫度以下加熱並冷卻,亦不會產生熱收縮或熱伸長。再者,該等現象於壓延箔與電解箔中均會產生,但壓延箔之由壓延所引起之應變更大,又,根據箔之成分之不同,由於製造CCL時所施加之熱而由壓延組織變化為再結晶組織,故熱收縮或熱延伸變大。Here, even if the two copper or copper alloy foils 4, 6 are the same, the difference in dimensional change rate (ΔL A - ΔL B ) occurs, so that it is apparent that the difference is not caused by thermal expansion. Further, if the metal is heated, a change in structure such as recrystallization or recovery occurs. Therefore, if the metal is heated and then cooled, it becomes shorter (heat shrinkage) or longer (thermal elongation) than the original size. Further, even if the temporarily heated and cooled metal is heated and cooled again at the same temperature or lower, heat shrinkage or thermal elongation does not occur. Furthermore, these phenomena are generated in both the rolled foil and the electrolytic foil, but the strain caused by the calendering of the rolled foil is larger, and, depending on the composition of the foil, the calendering due to the heat applied during the manufacture of the CCL The tissue changes to a recrystallized structure, so the heat shrinkage or thermal elongation becomes large.

圖3係表示藉由製造CCL時所施加之熱而產生上述熱延伸或熱收縮,導致第1銅或銅合金箔4產生皺褶(折痕)100之狀態。Fig. 3 shows a state in which the above-described heat extension or heat shrinkage occurs by the heat applied when the CCL is produced, resulting in wrinkles (creases) 100 in the first copper or copper alloy foil 4.

首先,若於上述第1步驟中製造單面覆銅積層板時,將第1銅或銅合金箔4加熱後進行冷卻,則熱收縮成比原先長度小。繼而,若於上述第2步驟中製造兩面覆銅積層板時,將第2銅或銅合金箔6加熱後進行冷卻,則欲熱收縮成比原先之長度小(圖3之箭頭)。另一方面,已於第1步驟中熱收縮之第1銅或銅合金箔4於第2步驟中幾乎不進行熱收縮(圖3之箭頭)。First, when the single-sided copper-clad laminate is produced in the first step, the first copper or copper alloy foil 4 is heated and then cooled, and the heat shrinkage is smaller than the original length. Then, when the double-sided copper-clad laminate is produced in the second step, the second copper or copper alloy foil 6 is heated and then cooled, and is intended to be heat-shrinked to be smaller than the original length (arrow in Fig. 3). On the other hand, the first copper or copper alloy foil 4 which has been heat-shrinked in the first step hardly undergoes heat shrinkage in the second step (arrow in Fig. 3).

因此,於第2步驟中之加熱後冷卻時,藉由第2銅或銅合金箔6欲收縮之力而施加壓縮應力於第1銅或銅合金箔4。繼而,第1銅或銅合金箔4無法承受該壓縮應力而翹曲(產生皺褶或折痕)。Therefore, at the time of cooling after heating in the second step, compressive stress is applied to the first copper or copper alloy foil 4 by the force of the second copper or copper alloy foil 6 to be contracted. Then, the first copper or copper alloy foil 4 cannot withstand the compressive stress and warp (wrinkles or creases).

然而,於施加壓縮應力於第1銅或銅合金箔4側之情形時,若該銅箔之安全限應力大於壓縮應力(式2之σA ),則不會引起翹曲,而難以產生皺褶或折痕。通常無法求出銅箔之相對於壓縮之安全限應力,但是否會引起翹曲之邊界值可由相對於拉伸之安全限應力(YS)代替。即,認為若以YS成為σA 以上之方式選擇第1銅或銅合金箔4,則不會產生皺褶或折痕。However, when compressive stress is applied to the side of the first copper or copper alloy foil 4, if the safety limit stress of the copper foil is greater than the compressive stress (σ A of the formula 2), warpage is not caused, and wrinkles are hard to occur. Pleats or creases. It is generally impossible to determine the safety limit stress of the copper foil with respect to compression, but whether the boundary value causing the warpage can be replaced by the safety limit stress (YS) with respect to the stretching. In other words, it is considered that wrinkles or creases do not occur when the first copper or copper alloy foil 4 is selected such that YS becomes σ A or more.

並且,本發明人等藉由實驗而求出於製造兩面覆銅積層板時不會產生皺褶或折痕之條件,結果可知若以相對於式2之σA 而成為Further, the inventors of the present invention obtained the conditions for producing wrinkles or creases in the production of the double-sided copper-clad laminate by experiments, and as a result, it was found that the σ A was obtained with respect to Formula 2

|10×σA |≦YSA  (3)|10×σ A |≦YS A (3)

之方式選擇第1銅或銅合金箔4,則難以產生皺褶或折痕。When the first copper or copper alloy foil 4 is selected, wrinkles or creases are less likely to occur.

另一方面,可知於施加壓縮應力於第2銅或銅合金箔6之情形時,若以相對於式2之σB 而成為On the other hand, when the compressive stress is applied to the second copper or copper alloy foil 6, it is known that it becomes σ B with respect to Formula 2

|10×σB |≦YSB  (4)|10×σ B |≦YS B (4)

之方式選擇第2銅或銅合金箔6,則難以產生皺褶或折痕。然而,一般係施加壓縮應力於第1銅或銅合金箔4。When the second copper or copper alloy foil 6 is selected, wrinkles or creases are less likely to occur. However, compressive stress is generally applied to the first copper or copper alloy foil 4.

為滿足式3(或式4),σAB )即尺寸變化率之差(ΔLA -ΔLB )越小越好,因此於第1步驟中第1銅或銅合金箔4所受之熱與於第2步驟中第2銅或銅合金箔6所受之熱之差越小越好。又,於第1步驟中第1銅或銅合金箔4所受之應變越小,尺寸變化率之差(ΔLA -ΔLB )亦變小。In order to satisfy the formula 3 (or the formula 4), σ AB ), that is, the difference in the dimensional change rate (ΔL A - ΔL B ) is preferably as small as possible, so that the first copper or copper alloy foil 4 is subjected to the first step. The difference between the heat and the heat received by the second copper or copper alloy foil 6 in the second step is preferably as small as possible. Moreover, the smaller the strain applied to the first copper or copper alloy foil 4 in the first step, the smaller the dimensional change rate (ΔL A - ΔL B ).

根據以上所述,滿足式3、4之具體方法,可舉出:1)預先加熱第1銅或銅合金箔4及第2銅或銅合金箔6;2)於第1銅或銅合金箔4及第2銅或銅合金箔6為壓延箔之情形時,以低加工度進行壓延;3)使根據箔之厚度與機械性質所設定之壓延時張力不超過限度;4)第1銅或銅合金箔4及第2銅或銅合金箔6使用電解箔。然而,若考慮一般係施加壓縮應力於第1銅或銅合金箔4側,則亦可僅對第2銅或銅合金箔6實施1)至4)之方法。As described above, specific methods for satisfying Expressions 3 and 4 include: 1) preheating the first copper or copper alloy foil 4 and the second copper or copper alloy foil 6; and 2) the first copper or copper alloy foil. 4 and when the second copper or copper alloy foil 6 is a rolled foil, it is calendered with a low degree of work; 3) the pressure delay tension set according to the thickness and mechanical properties of the foil does not exceed the limit; 4) the first copper or An electrolytic foil is used for the copper alloy foil 4 and the second copper or copper alloy foil 6. However, in consideration of the fact that compressive stress is generally applied to the first copper or copper alloy foil 4 side, the method of 1) to 4) may be applied only to the second copper or copper alloy foil 6.

關於上述1)之方法,已知純銅為具有面心立方結構之金屬,若藉由加熱而進行再結晶,則立方體方位擴展,彎曲性變佳。立方體方位擴展之銅箔之楊式模數較低,拉伸試驗中之0.2%安全限應力亦較低。即,可以說此種立方體方位擴展之銅箔於製造兩面CCL時(進行第2步驟時)最容易產生折痕或皺褶。根據本發明人等之實驗判明,例如將純銅箔於350℃保持30分鐘後進行冷卻,結果楊式模數為70GPa左右,0.2%安全限應力為50MPa左右。如此,認為即便將安全限應力較小之銅或銅合金箔再次加熱至350℃左右為止後進行冷卻,尺寸變化亦幾乎為0。Regarding the method of the above 1), it is known that pure copper is a metal having a face-centered cubic structure, and if recrystallization is performed by heating, the cube orientation is expanded and the flexibility is improved. The copper modulus of the cube-azimuth extended copper foil is lower, and the 0.2% safety limit stress in the tensile test is also lower. That is, it can be said that such a cubic azimuth-expanding copper foil is most likely to be creased or wrinkled when the two-side CCL is produced (when the second step is performed). According to experiments by the inventors of the present invention, for example, the pure copper foil was kept at 350 ° C for 30 minutes and then cooled. As a result, the Young's modulus was about 70 GPa, and the 0.2% safety limit stress was about 50 MPa. In this way, it is considered that even if the copper or copper alloy foil having a small safety limit stress is heated again to about 350 ° C and then cooled, the dimensional change is almost zero.

因此,使用相同者作為第1銅或銅合金箔4及第2銅或銅合金箔6(EA ≒EB 、|σA |≒|σB |),以ΔLA ≒0時,式2係以下述式5所表示:Therefore, the same as the first copper or copper alloy foil 4 and the second copper or copper alloy foil 6 (E A ≒ E B , |σ A |≒|σ B |), when ΔL A ≒ 0, Equation 2 It is expressed by the following formula 5:

σA =(EA ×ΔLB )/2×1000 (5)。σ A = (E A × ΔL B ) / 2 × 1000 (5).

並且,根據式3與式5,而成為下述式6:Further, according to Equations 3 and 5, Equation 6 is obtained as follows:

|10000×(EA ×ΔLB /2)|≦YSA  (6),|10000×(E A ×ΔL B /2)|≦YS A (6),

根據上述實驗結果,若將EA =70GPa、YSA =50MPa代入式5中,則可獲得ΔLB =143(ppm)。即,若至少將第2銅或銅合金箔6於使用前加熱,使用ΔLB ≦143(ppm)者,則兼具彎曲性且難以產生折痕或皺褶。只要將第2銅或銅合金箔6之加熱條件設為於50℃~200℃加熱1秒~10小時左右即可,但並不限定於此。例如加熱條件可舉出於60℃保持3小時或於130℃保持3秒。當然,若使用0.2%安全限應力較高之銅箔,則LB 亦可超過143ppm,但若第1銅或銅合金箔4及第2銅或銅合金箔6之兩者使用0.2%安全限應力較高之銅箔,則無法獲得彎曲性,故較佳為於第2銅或銅合金箔6側使用ΔLB ≦143(ppm)者。According to the above experimental results, when E A = 70 GPa and YS A = 50 MPa were substituted into Formula 5, ΔL B = 143 (ppm) was obtained. In other words, when at least the second copper or copper alloy foil 6 is heated before use, ΔL B ≦ 143 (ppm) is used, and both of them have flexibility and are less likely to cause creases or wrinkles. The heating condition of the second copper or copper alloy foil 6 may be heated at 50 to 200 ° C for about 1 to 10 hours, but is not limited thereto. For example, the heating conditions may be maintained at 60 ° C for 3 hours or at 130 ° C for 3 seconds. Of course, if a copper foil with a high safety limit of 0.2% is used, L B may also exceed 143 ppm, but if both the first copper or copper alloy foil 4 and the second copper or copper alloy foil 6 use a 0.2% safety limit. In the case of a copper foil having a high stress, flexibility cannot be obtained. Therefore, it is preferable to use ΔL B ≦ 143 (ppm) on the side of the second copper or copper alloy foil 6 .

其次,關於上述2)之方法,壓延箔之應變係根據最終退火後之壓延加工度、一道次軋縮量、張力及加工溫度等而變化。然而,軋縮量或張力會取決於加工對象之箔之厚度或壓延機之性能而難以同樣地規定。又,加工溫度越高則應變越小,但壓延中壓延油發揮冷卻劑之作用,而難以規定瞬間之加工溫度。Next, in the method of the above 2), the strain of the rolled foil changes depending on the degree of rolling work after the final annealing, the amount of rolling reduction, the tension, the processing temperature, and the like. However, the amount of shrinkage or tension may be difficult to specify in the same manner depending on the thickness of the foil of the object to be processed or the performance of the calender. Further, the higher the processing temperature, the smaller the strain, but the rolling oil in the rolling acts as a coolant, and it is difficult to specify the instantaneous processing temperature.

因此,根據壓延加工度來規定箔所需要之條件。此處,若減小壓延加工度則箔之應變變小,但再結晶時立方體方位難以擴展而彎曲性下降,故而不佳。相對於此,若減小壓延前之結晶粒徑,則即便以相同之加工度進行壓延,立方體方位亦擴展。根據以上之見解,本發明人等進行了實驗,結果判明:若最終冷軋加工度R(%)為93.0≦R,且最終退火後之平均結晶粒徑GS(μm)為GS≦3.08×R-260,則不會損害彎曲性,且可抑制折痕或皺褶產生。再者,於將兩面CCL用於彎曲部之情形時,利用蝕刻去除任一方(彎曲性較差一方)之銅箔,僅使彎曲部分成為單面CCL,因此只要第1銅或銅合金箔4及第2銅或銅合金箔6中任一者滿足上述式(GS≦3.08×R-260)即可。Therefore, the conditions required for the foil are specified in accordance with the degree of calendering. Here, if the degree of rolling is reduced, the strain of the foil becomes small, but when the crystal is recrystallized, it is difficult to expand the cube orientation and the bendability is lowered, which is not preferable. On the other hand, when the crystal grain size before rolling is reduced, even if rolling is performed at the same degree of work, the cube orientation is expanded. According to the above findings, the inventors of the present invention conducted experiments and found out that if the final cold rolling degree R (%) is 93.0 ≦R, and the average crystal grain size GS (μm) after final annealing is GS ≦ 3.08 × R -260, does not impair the bendability, and can suppress the occurrence of creases or wrinkles. Further, when the two-sided CCL is used for the bent portion, the copper foil of either one (the one having poor flexibility) is removed by etching, and only the curved portion is a single-sided CCL, so that the first copper or copper alloy foil 4 and Any one of the second copper or copper alloy foils 6 may satisfy the above formula (GS ≦ 3.08 × R - 260).

再者,上述式1~式3係於第1銅或銅合金箔4側產生壓縮應力時之式,通常以下述方式選擇第1銅或銅合金箔及第2銅或銅合金箔:當第1銅或銅合金箔之應力σA =EA ×EB /(EA +EB )×(ΔLA -ΔLB )、第2銅或銅合金箔之應力σB =EA ×EB /(EA +EB )×(ΔLB -ΔLA )、且將σA 與σB 中之負值者設為σγ 時,|10×σγ |≦YSγFurther, in the above formulas 1 to 3, when the compressive stress is generated on the side of the first copper or copper alloy foil 4, the first copper or copper alloy foil and the second copper or copper alloy foil are usually selected in the following manner: 1 Stress of copper or copper alloy foil σ A = E A × E B / (E A + E B ) × (ΔL A - ΔL B ), stress of the second copper or copper alloy foil σ B = E A × E B /(E A + E B ) × (ΔL B - ΔL A ), and when the negative values of σ A and σ B are σ γ , |10 × σ γ | ≦ YS γ .

其中,YSγ :拉伸試驗中之0.2%安全限應力,且若σA 與σB 中之負值者為A則選擇YSA (單位為MPa),相反則選擇YSB (單位為MPa);YSA :拉伸試驗中之上述第1銅或銅合金箔之0.2%安全限應力;YSB :拉伸試驗中之上述第2銅或銅合金箔之0.2%安全限應力。Where YS γ : 0.2% safety limit stress in the tensile test, and if the negative value of σ A and σ B is A, YS A (unit is MPa) is selected, and YS B (unit is MPa) is selected instead. ;YS A : 0.2% safety limit stress of the above first copper or copper alloy foil in the tensile test; YS B : 0.2% safety limit stress of the above second copper or copper alloy foil in the tensile test.

實施例Example

將表1所示之組成之第1銅箔4及第2銅箔6組合,以圖1所示之方式製造兩面CCL。此處,實驗例1~3、10、比較例1及2中,第1銅箔4與第2銅箔6相同。除此以外之實驗例及比較例中,第1銅箔4及第2銅箔6分別使用不同之銅箔。再者,表1中,實驗例6係施加壓縮應力於第2銅箔6側,而σB 成為負值,因此σB 成為σγ ,評價|10×σγ |與YSγ 之間的大小。除此以外之實驗例及比較例係施加壓縮應力於第1銅箔4,而σA 成為負值,因此σA 成為σγ ,評價|10×σγ |與YSγ 之間的大小。The first copper foil 4 and the second copper foil 6 having the composition shown in Table 1 were combined to produce a double-sided CCL as shown in Fig. 1 . Here, in Experimental Examples 1 to 3, 10 and Comparative Examples 1 and 2, the first copper foil 4 was the same as the second copper foil 6. In the other experimental examples and comparative examples, the first copper foil 4 and the second copper foil 6 were each made of a different copper foil. Further, in Table 1, in Experimental Example 6, compressive stress was applied to the second copper foil 6 side, and σ B became a negative value, so σ B became σ γ , and the magnitude between |10 × σ γ | and YS γ was evaluated. . In the other experimental examples and comparative examples, compressive stress was applied to the first copper foil 4, and σ A became a negative value. Therefore, σ A was σ γ , and the magnitude between |10 × σ γ | and YS γ was evaluated.

再者,對一部分銅箔如表1所示般調整平均結晶粒徑GS與加工度R,或實施預先熱處理。再者,預先熱處理係於下述化學處理(電鍍)後進行,亦可於最終壓延後進行,或亦可於將要製造CCL之前進行。Further, a part of the copper foil was adjusted to have an average crystal grain size GS and a workability R as shown in Table 1, or a preliminary heat treatment was performed. Further, the pre-heat treatment is performed after the following chemical treatment (electroplating), or may be performed after the final rolling, or may be performed before the CCL is to be produced.

首先,對第1銅箔4之單面進行化學處理(電鍍),於該面以厚度成為25μm之方式塗佈聚醯亞胺樹脂之前驅物清漆(宇部興產製造之U-Varnish A)。然後,於設定為130℃之熱風循環式高溫槽中乾燥30分鐘,階段性地花費2000秒升溫至350℃並進行硬化(醯亞胺化)而形成樹脂層2,從而製作單面CCL。繼而,於單面CCL之樹脂側面塗佈熱塑性聚醯亞胺(接著層)並進行乾燥後,重疊第2銅箔6,利用加熱至350℃之壓力機進行熱壓接10分鐘而製造兩面CCL。然後,將兩面CCL冷卻至室溫,目測判定折痕或皺褶之產生情況。First, the single surface of the first copper foil 4 was chemically treated (electroplated), and the polyimide varnish (U-Varnish A manufactured by Ube Industries, Ltd.) was applied to the surface at a thickness of 25 μm. Then, it was dried in a hot air circulation type high temperature bath set to 130 ° C for 30 minutes, and the temperature was raised to 350 ° C for 2,000 sec and hardened (imidization) to form the resin layer 2, thereby producing a single-sided CCL. Then, after coating and drying the thermoplastic polyimide on the side of the resin of the single-sided CCL, the second copper foil 6 was overlaid, and thermocompression bonding was performed for 10 minutes by a press heated to 350 ° C to produce a two-sided CCL. . Then, the two-sided CCL was cooled to room temperature, and the occurrence of creases or wrinkles was visually determined.

ΔLA 及ΔLB 係分別將第1銅箔4及第2銅箔6切成寬度方向為150mm、長度方向為12.5mm之帶狀,利用維氏硬度計打出評點間隔為80mm之凹痕,測定兩凹痕之座標,藉此求出加熱前之距離L。再者,於積層前預先進行熱處理之銅箔試樣之情形時,於該熱處理後同樣求出距離。繼而,將試樣於350℃之烘箱中保持30分鐘後取出,冷卻至室溫,然後測定兩凹痕之座標,求出距離L'。ΔLA 及ΔLB 可分別以(L-L')/L進行計算,且收縮之情形為正值。再者,根據ΔLA 及ΔLB 之定義,ΔLA 係將暫時自室溫升溫至350℃並保持30分鐘後冷卻至室溫時之尺寸設為L,將再次加熱時之兩凹痕之座標設為L'。In the ΔL A and the ΔL B , the first copper foil 4 and the second copper foil 6 were each cut into a strip shape having a width of 150 mm and a longitudinal direction of 12.5 mm, and a dent having a score of 80 mm was measured by a Vickers hardness tester. The coordinates of the two dimples are used to determine the distance L before heating. Further, in the case of a copper foil sample which is previously heat-treated before the lamination, the distance is similarly obtained after the heat treatment. Then, the sample was taken in an oven at 350 ° C for 30 minutes, taken out, cooled to room temperature, and then the coordinates of the two dents were measured to determine the distance L'. ΔL A and ΔL B can be calculated as (L-L')/L, respectively, and the case of shrinkage is a positive value. Further, according to the definitions of ΔL A and ΔL B , ΔL A is temporarily heated from room temperature to 350 ° C for 30 minutes, and then cooled to room temperature, the size is set to L, and the coordinates of the two dents when reheating are set. For L'.

又,第1銅箔4及第2銅箔6之楊式模數EA 、EB 係依據JIS-Z2280-1993利用振動法而求出,0.2%安全限應力YSA 、YSB 係使用拉伸實驗機並依據JIS-Z2241-1998而求出。Further, the Young's modulus E A and E B of the first copper foil 4 and the second copper foil 6 are obtained by the vibration method according to JIS-Z2280-1993, and the 0.2% safety limit stress YS A and YS B are stretched. The experimental machine was obtained in accordance with JIS-Z2241-1998.

彎曲性係以如下方式進行評價。首先,使用已知之光微影技術去除第1銅箔4或第2銅箔6中之任一者,於另一銅箔上形成電路寬度為200μm之配線,於該配線上熱壓接塗佈環氧系接著劑而成之聚醯亞胺膜作為覆蓋層,而製作彎曲試驗用FPC。此時,將樹脂層2之厚度設為15μm,將覆蓋層設為12.5μm,將銅箔上之接著層之厚度設為2.5μm。再者,於將兩面CCL用於彎曲部之情形時,利用蝕刻去除任一方(彎曲性較差一方)之銅箔,僅使彎曲部分成為單面CCL,因此進行去除第1銅箔4或第2銅箔6中之一者時之試驗。The flexibility was evaluated in the following manner. First, any one of the first copper foil 4 or the second copper foil 6 is removed by a known photolithography technique, and a wiring having a circuit width of 200 μm is formed on the other copper foil, and thermocompression bonding is applied to the wiring. A polyimine film made of an epoxy-based adhesive was used as a coating layer to prepare an FPC for bending test. At this time, the thickness of the resin layer 2 was set to 15 μm, the cover layer was set to 12.5 μm, and the thickness of the adhesive layer on the copper foil was set to 2.5 μm. In the case where the double-sided CCL is used for the bent portion, the copper foil of either one (the one having poor flexibility) is removed by etching, and only the curved portion is a single-sided CCL, so that the first copper foil 4 or the second copper strip is removed. Test in one of the copper foils 6.

彎曲試驗係使用IPC(美國印刷電路工業會)滑動彎曲試驗機,彎曲半徑於銅箔厚度為18μm之情形時設為1.5mm、於銅箔厚度為12μm之情形時設為1mm。銅箔厚度越薄則彎曲性越好,因此為以相同基準進行評價,只要根據銅箔厚度而改變彎曲半徑即可。然後,對FPC試驗片負載每分鐘100次之反覆滑動,將配線之電阻自初始上升10%之彎曲次數作為結束。此處,於該彎曲次數超過10萬次之情形時設為良好(○),將未滿5萬次設為差(×),將5萬次以上且未滿10萬次判定為可根據彎曲條件加以使用(△)。In the bending test, an IPC (American Printed Circuit Industry Association) sliding bending tester was used, and the bending radius was set to 1.5 mm when the thickness of the copper foil was 18 μm, and was set to 1 mm when the thickness of the copper foil was 12 μm. The thinner the thickness of the copper foil, the better the bendability. Therefore, the evaluation is performed on the same basis, and the bending radius may be changed according to the thickness of the copper foil. Then, the FPC test piece load was repeatedly slid 100 times per minute, and the number of bends of the resistance of the wiring from the initial rise of 10% was ended. Here, when the number of times of bending exceeds 100,000 times, it is set to be good (○), less than 50,000 times is set to be poor (×), and 50,000 times or more and less than 100,000 times are judged to be bendable. Conditions are used (△).

將所獲得之結果示於表1。再者,表1中,所謂「實驗例1之第1銅箔之彎曲性為○」,表示利用蝕刻將第2銅箔自實驗例1之兩面CCL去除而殘留第1銅箔時之評價。The results obtained are shown in Table 1. In addition, in Table 1, "the bending property of the first copper foil of the experimental example 1 is ○", and the evaluation was performed when the second copper foil was removed from the CCL on both surfaces of Experimental Example 1 by etching, and the first copper foil remained.

如由表1所明示,於對第1銅箔4及第2銅箔6進行預先熱處理之實施例1、2之情形時,成為|10×σγ |≦YSγ ,所獲得之兩面CCL中無皺褶或折痕,且彎曲性亦優異。As shown in Table 1, in the case of Examples 1 and 2 in which the first copper foil 4 and the second copper foil 6 were previously heat-treated, |10 × σ γ | ≦YS γ was obtained, and the obtained two-sided CCL was obtained. No wrinkles or creases, and excellent flexibility.

又,於調整壓延箔之第1銅箔4及第2銅箔6之壓延條件,而使R成為93.0%以上,並且GS≦3.08×R-260之實驗例3之情形時,亦成為|10×σγ |≦YSγ ,所獲得之兩面CCL中無皺褶或折痕,且彎曲性亦優異。Moreover, when the rolling conditions of the first copper foil 4 and the second copper foil 6 of the rolled foil were adjusted to have R of 93.0% or more and the case of the experimental example 3 of GS ≦ 3.08 × R-260, it was also |10. ×σ γ |≦YS γ , the obtained two-sided CCL has no wrinkles or creases, and is excellent in flexibility.

另一方面,於第1銅箔4與第2銅箔6使用不同之銅箔之實驗例4~9之情形時,亦成為|10×σγ |≦YSγ ,所獲得之兩面CCL中無皺褶或折痕。然而,彎曲性係根據殘留第1銅箔4與第2銅箔6中之哪一箔而成為不同結果。例如,於實驗例6之第2銅箔6、實驗例7之第1銅箔4之情形時,Sn之添加量較多(2000ppm),而彎曲性較差。於實驗例8之第1銅箔4、實驗例9之第2銅箔6之情形時,未預先熱處理電解銅箔而加以使用,彎曲性較差。On the other hand, in the case of the experimental examples 4 to 9 in which the first copper foil 4 and the second copper foil 6 were different from each other, the film also became |10 × σ γ | ≦ YS γ , and the obtained two-sided CCL was absent. Wrinkles or creases. However, the flexibility is different depending on which of the first copper foil 4 and the second copper foil 6 remains. For example, in the case of the second copper foil 6 of Experimental Example 6 and the first copper foil 4 of Experimental Example 7, the amount of addition of Sn is large (2000 ppm), and the flexibility is poor. In the case of the first copper foil 4 of Experimental Example 8 and the second copper foil 6 of Experimental Example 9, the electrolytic copper foil was not previously heat-treated and used, and the flexibility was inferior.

又,於第1銅箔4與第2銅箔6使用相同銅箔之實驗例10之情形時,亦成為|10×σγ |≦YSγ ,所獲得之兩面CCL中無皺褶或折痕。然而,兩箔均為GS>3.08×R-260,因此於殘留任一箔之情形時彎曲性均為△。Further, in the case of the experimental example 10 in which the same copper foil was used for the first copper foil 4 and the second copper foil 6, it was also |10 × σ γ | ≦ YS γ , and the obtained two-sided CCL was free from wrinkles or creases. . However, both of the foils have a GS>3.08×R-260, so the bendability is Δ in the case where any of the foils remains.

於比較例1及2之情形時,箔之組合不合適,故成為|10×σγ |>YSγ ,所獲得之兩面CCL中產生皺褶或折痕。In the case of Comparative Examples 1 and 2, the combination of the foils was not suitable, so that |10 × σ γ | > YS γ was produced, and wrinkles or creases were formed in the obtained two-sided CCL.

又,於將作為市售品之精銅直接用於第1銅箔4及第2銅箔6之比較例3之情形時,壓延條件為GS>3.08×R-260,因此彎曲性較差。In the case where the refined copper which is a commercial product is used in the first comparative example 3 of the first copper foil 4 and the second copper foil 6, the rolling condition is GS>3.08×R-260, and therefore the bending property is inferior.

2...樹脂層2. . . Resin layer

2a...樹脂組成物2a. . . Resin composition

4...第1銅或銅合金箔4. . . 1st copper or copper alloy foil

6...第2銅或銅合金箔6. . . 2nd copper or copper alloy foil

8...兩面覆銅積層板8. . . Two-sided copper clad laminate

10、11...應用輥機10, 11. . . Application roller

15...乾燥裝置15. . . Drying device

20、21...層疊輥20, 21. . . Laminating roll

100...皺褶(折痕)100. . . Wrinkle

圖1,係表示本發明之實施形態之兩面覆銅積層板之製造方法的圖。Fig. 1 is a view showing a method of manufacturing a double-sided copper-clad laminate according to an embodiment of the present invention.

圖2,係表示兩面覆銅積層板之構成例之剖面圖。Fig. 2 is a cross-sectional view showing a configuration example of a double-sided copper clad laminate.

圖3,係表示由於兩面覆銅積層板之製造時所施加之熱而第1銅或銅合金箔產生皺褶(折痕)之狀態之圖。Fig. 3 is a view showing a state in which wrinkles (creases) occur in the first copper or copper alloy foil due to heat applied during the production of the double-sided copper clad laminate.

2...樹脂層2. . . Resin layer

2a...樹脂組成物2a. . . Resin composition

4...第1銅或銅合金箔4. . . 1st copper or copper alloy foil

6...第2銅或銅合金箔6. . . 2nd copper or copper alloy foil

8...兩面覆銅積層板8. . . Two-sided copper clad laminate

10、11...應用輥機10, 11. . . Application roller

15...乾燥裝置15. . . Drying device

20、21...層疊輥20, 21. . . Laminating roll

Claims (3)

一種兩面覆銅積層板之製造方法,其具有:第1步驟:係於第1銅或銅合金箔之單面形成樹脂層,而獲得單面覆銅積層板;及第2步驟,係於該單面覆銅積層板之該樹脂層側積層第2銅或銅合金箔並進行加熱,而獲得兩面覆銅積層板;且所使用之該第1銅或銅合金箔及該第2銅或銅合金箔,當該第1銅或銅合金箔之應力σA =EA ×EB /(EA +EB )×(ΔLA -ΔLB )×1000、該第2銅或銅合金箔之應力σB =EA ×EB /(EA +EB )×(ΔLB -ΔLA )×1000、且將σA 與σB 中之負值者設為σγ 時,|10×σγ |≦YSγ ,其中,EA :將該第1銅或銅合金箔於350℃保持30分鐘並冷卻至室溫後,再次於350℃保持30分鐘並冷卻至室溫時寬度方向上之楊式模數(單位為GPa);EB :將該第2銅或銅合金箔於350℃保持30分鐘後冷卻至室溫時寬度方向上之楊式模數(單位為GPa);ΔLA :以自室溫升溫至350℃並保持30分鐘後冷卻至室溫時之尺寸為基準,再次於350℃保持30分鐘並冷卻至室溫後之該第1銅或銅合金箔寬度方向上之尺寸變化率(單位為ppm,將收縮設為正值);ΔLB :自室溫升溫至350℃,保持30分鐘並冷卻至室溫後之該第2銅或銅合金箔寬度方向上之尺寸變化率(單位為ppm,將收縮設為正值);YSγ :拉伸試驗中之0.2%安全限應力(Proof stress),且若σA 與σB 中之負值者為A時,則選擇YSA (單位為MPa),相反則選擇YSB (單位為MPa);YSA :拉伸試驗中之該第1銅或銅合金箔之0.2%安全限應力;YSB :拉伸試驗中之該第2銅或銅合金箔之0.2%安全限應力。A method for producing a double-sided copper-clad laminate, comprising: a first step of forming a resin layer on one side of a first copper or copper alloy foil to obtain a single-sided copper-clad laminate; and a second step The second copper or copper alloy foil is laminated on the resin layer side of the single-sided copper-clad laminate to obtain a double-sided copper-clad laminate; and the first copper or copper alloy foil and the second copper or copper are used In the alloy foil, when the stress of the first copper or copper alloy foil is σ A = E A × E B / (E A + E B ) × (ΔL A - ΔL B ) × 1000, the second copper or copper alloy foil When the stress σ B = E A × E B / (E A + E B ) × (ΔL B - ΔL A ) × 1000, and the negative value of σ A and σ B is σ γ , |10 × σ γ |≦YS γ , wherein E A : the first copper or copper alloy foil is held at 350 ° C for 30 minutes and cooled to room temperature, and then held at 350 ° C for 30 minutes and cooled to room temperature in the width direction Young's modulus (in GPa); E B : Younger modulus (in GPa) in the width direction when the second copper or copper alloy foil is kept at 350 ° C for 30 minutes and then cooled to room temperature; ΔL A : Cooling from room temperature to 350 ° C and holding for 30 minutes The dimensional change rate (in ppm, the shrinkage is set to a positive value) in the width direction of the first copper or copper alloy foil after the temperature at room temperature is maintained at 350 ° C for 30 minutes and cooled to room temperature. ; ΔL B : dimensional change rate in the width direction of the second copper or copper alloy foil after heating from room temperature to 350 ° C for 30 minutes and cooling to room temperature (in ppm, the shrinkage is set to a positive value); YS γ : 0.2% safety stress (Proof stress) in the tensile test, and if the negative value of σ A and σ B is A, then YS A (unit is MPa) is selected, and YS B (unit is selected instead) MPa); YS A : 0.2% safety limit stress of the first copper or copper alloy foil in the tensile test; YS B : 0.2% safety limit stress of the second copper or copper alloy foil in the tensile test. 一種1組的銅或銅合金箔,其用於申請專利範圍第1項之兩面覆銅積層板之製造方法,且由該第1銅或銅合金箔及該第2銅或銅合金箔之組合所構成。A group of copper or copper alloy foils for use in a method for producing a two-sided copper clad laminate according to claim 1 and comprising a combination of the first copper or copper alloy foil and the second copper or copper alloy foil Composition. 如申請專利範圍第2項之銅或銅合金箔,其中,該第2銅或銅合金箔之ΔLB 為145ppm以下。A copper or copper alloy foil according to claim 2, wherein the second copper or copper alloy foil has a ΔL B of 145 ppm or less.
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