TWI473230B - Package substrate for optically detecting opening shift of solder mask within tolerance range - Google Patents

Package substrate for optically detecting opening shift of solder mask within tolerance range Download PDF

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Publication number
TWI473230B
TWI473230B TW100143648A TW100143648A TWI473230B TW I473230 B TWI473230 B TW I473230B TW 100143648 A TW100143648 A TW 100143648A TW 100143648 A TW100143648 A TW 100143648A TW I473230 B TWI473230 B TW I473230B
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Taiwan
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solder mask
pad
island
opening
package substrate
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TW100143648A
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Chinese (zh)
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TW201322399A (en
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Chia Wei Chang
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Powertech Technology Inc
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

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  • Electric Connection Of Electric Components To Printed Circuits (AREA)

Description

可光學檢測銲罩開口偏移在容許範圍內之封裝基板Optically detecting the package substrate with the gap of the solder mask opening within the allowable range

本發明係有關於電子元件之載板,特別係有關於一種可光學檢測銲罩開口偏移在容許範圍內之封裝基板,可運用於半導體封裝構造中。The present invention relates to a carrier for an electronic component, and more particularly to a package substrate that optically detects that the opening of the solder mask is within an allowable range, and can be used in a semiconductor package structure.

封裝基板普遍作為半導體封裝構造中承載電子元件之載板,例如用以承載晶片、微小型晶片封裝構造或是被動元件…等等,其型態係可為基板面板或是基板條。而基板之表面通常會覆蓋一層銲罩層,用以保護線路銲罩層。然而在基板之製造過程中,銲罩層必須要圖案化以製作出可以顯露線路層接墊之銲罩開口,然而在實際的基板製造上,銲罩開口會有一偏移值,與原設計中應對準的接墊產生位移,一旦超出銲罩開口偏移容許範圍,導致接墊的電性連接失敗或/與異常。此一上述問題將隨著接墊的微間距化與銲罩開口的微小化顯得更為嚴重,這是因為銲罩開口偏移容許範圍將相對變小,而目前卻沒有一種可以簡易且快速的檢測方法來判斷銲罩開口之實際偏移值是否在偏移容許範圍內。The package substrate is generally used as a carrier for carrying electronic components in a semiconductor package structure, for example, for carrying a wafer, a micro-chip package structure or a passive component, etc., and the type thereof may be a substrate panel or a substrate strip. The surface of the substrate is usually covered with a layer of solder mask to protect the line solder mask layer. However, in the manufacturing process of the substrate, the solder mask layer must be patterned to make a solder mask opening that can expose the wiring layer pads. However, in actual substrate manufacturing, the solder mask opening has an offset value, which is in the original design. Displacement of the pads to be aligned, once the tolerance of the gap of the solder mask opening is exceeded, causes electrical connection failure or/and abnormality of the pads. This problem will be more serious with the micro-pitch of the pads and the miniaturization of the opening of the solder mask. This is because the allowable range of the gap opening of the solder mask will be relatively small, but currently there is no one that can be easily and quickly. The detection method is used to determine whether the actual offset value of the shroud opening is within the tolerance of the offset.

為了解決上述之問題,本發明之主要目的係在於一種可光學檢測銲罩開口偏移在容許範圍內之封裝基板,可輕易地以目檢或光學儀器來判斷銲罩開口偏移值是否在容許範圍內。In order to solve the above problems, the main object of the present invention is to provide a package substrate which can optically detect the deviation of the opening of the solder mask within an allowable range, and can easily judge whether the offset value of the gap of the solder mask is allowed by visual inspection or optical instrument. Within the scope.

本發明的目的及解決其技術問題是採用以下技術方案來實現的。本發明揭示一種可光學檢測銲罩開口偏移在容許範圍內之封裝基板,包含一基板主體、一線路層、以及一銲罩層,該線路層係形成於該基板主體之一表面上,該線路層係包含至少一接墊。該銲罩層係形成於該基板主體之該表面與該線路層上,該銲罩層係具有至少一銲罩開口,其係顯露該接墊。其中,該線路層係更包含一檢測墊,並且該銲罩層係包含有一形狀對應且位置對準該檢測墊之銲罩島,該檢測墊與該接墊之間的中間點距離係為一第一節距,該銲罩島至該銲罩開口之間的中間點距離係為一第二節距,該第一節距係等於該第二節距,並且該銲罩島之覆蓋面積係略大於該檢測墊,以在該銲罩開口之偏移容許範圍內完全覆蓋該檢測墊。The object of the present invention and solving the technical problems thereof are achieved by the following technical solutions. The invention discloses a package substrate capable of optically detecting that the opening of the solder mask is within an allowable range, comprising a substrate body, a circuit layer, and a solder mask layer, wherein the circuit layer is formed on a surface of the substrate body, The circuit layer includes at least one pad. The solder mask layer is formed on the surface of the substrate body and the circuit layer, and the solder mask layer has at least one solder mask opening, which exposes the pad. Wherein, the circuit layer further comprises a detection pad, and the solder mask layer comprises a solder mask island corresponding in shape and aligned with the detection pad, and the intermediate point distance between the detection pad and the pad is one The first pitch, the intermediate point distance between the solder mask island and the solder mask opening is a second pitch, the first pitch is equal to the second pitch, and the coverage area of the solder mask island is Slightly larger than the test pad to completely cover the test pad within the tolerance of the weld cap opening.

本發明的目的及解決其技術問題還可採用以下技術措施進一步實現。The object of the present invention and solving the technical problems thereof can be further achieved by the following technical measures.

在前述之封裝基板中,該線路層係可更包含一電鍍導通線,其係連接至該檢測墊。In the foregoing package substrate, the wiring layer may further include a plating conductive line connected to the detecting pad.

在前述之封裝基板中,可另包含一電鍍層,其係形成於該接墊上,並且該電鍍層係不形成於該檢測墊,當該銲罩開口相對於該接墊之偏移量在該偏移容許範圍內。In the foregoing package substrate, a plating layer may be further formed on the pad, and the plating layer is not formed on the detecting pad, and the offset of the soldering cap opening relative to the pad is at the Within the offset tolerance range.

在前述之封裝基板中,該銲罩島係可形成於該銲罩層之一環槽內。In the above package substrate, the solder mask island may be formed in one of the ring grooves of the solder mask layer.

在前述之封裝基板中,該銲罩層係可更具有一連接部,其係通過該環槽而連接至該銲罩島並覆蓋該電鍍導通線穿過該環槽之部分。In the foregoing package substrate, the solder mask layer may further have a connecting portion connected to the solder mask island through the annular groove and covering a portion of the plating conductive wire passing through the annular groove.

在前述之封裝基板中,該銲罩島與該檢測墊係可皆為方形,該銲罩島係具有一長度等於該檢測墊之對應長度加上兩倍該偏移容許範圍之和。In the above package substrate, the solder mask island and the detection pad may both be square, and the solder mask island has a length equal to the corresponding length of the detection pad plus twice the tolerance of the offset.

在前述之封裝基板中,該銲罩島與該檢測墊係可皆為圓形,該銲罩島係具有一直徑等於該檢測墊之對應直徑加上兩倍該偏移容許範圍之和。In the above package substrate, the solder mask island and the detection pad may each have a circular shape, and the solder mask island has a diameter equal to a corresponding diameter of the detection pad plus twice the tolerance range of the offset.

在前述之封裝基板中,該基板主體係可包含至少一單元區以及一邊框區,而該接墊與該銲罩開口係可位於該單元區內,該檢測墊與該銲罩島係可位於該邊框區內。In the foregoing package substrate, the substrate main system may include at least one unit area and a frame area, and the pad and the solder mask opening may be located in the unit area, and the detecting pad and the solder mask island may be located. The border area.

在前述之封裝基板中,該檢測墊與該銲罩島係可位於該邊框區之一角隅。In the foregoing package substrate, the detection pad and the solder mask island may be located at a corner of the frame region.

在前述之封裝基板中,該銲罩開口係可小於該接墊,以使該接墊為銲罩界定墊(SMD pad)。In the foregoing package substrate, the solder mask opening may be smaller than the pad so that the pad is a solder mask defining pad (SMD pad).

以下將配合所附圖示詳細說明本發明之實施例,然應注意的是,該些圖示均為簡化之示意圖,僅以示意方法來說明本發明之基本架構或實施方法,故僅顯示與本案有關之元件與組合關係,圖中所顯示之元件並非以實際實施之數目、形狀、尺寸做等比例繪製,某些尺寸比例與其他相關尺寸比例或已誇張或是簡化處理,以提供更清楚的描述。實際實施之數目、形狀及尺寸比例為一種選置性之設計,詳細之元件佈局可能更為複雜。The embodiments of the present invention will be described in detail below with reference to the accompanying drawings in which FIG. The components and combinations related to this case, the components shown in the figure are not drawn in proportion to the actual number, shape and size of the actual implementation. Some size ratios are proportional to other related sizes or have been exaggerated or simplified to provide clearer description of. The actual number, shape and size ratio of the implementation is an optional design, and the detailed component layout may be more complicated.

依據本發明之第一較佳實施例,一種可光學檢測銲罩開口偏移在容許範圍內之封裝基板舉例說明於第1圖之局部截面圖、第2圖之表面示意圖以及第3圖之在一銲罩島處之局部放大示意圖。該封裝基板100係主要包含一基板主體110、一線路層120、以及一銲罩層130。According to a first preferred embodiment of the present invention, a package substrate capable of optically detecting that the opening of the solder mask is within an allowable range is illustrated in a partial cross-sectional view of FIG. 1, a surface view of FIG. 2, and a third diagram. A partially enlarged schematic view of a welded island. The package substrate 100 mainly includes a substrate body 110, a circuit layer 120, and a solder mask layer 130.

該基板主體110係作為該封裝基板100之主要結構,係可包含至少一核心層,例如BT樹脂、FR-3樹脂或FR-4樹脂。當該封裝基板100為兩層以上多層板結構,該基板主體110之內部可夾設有至少一層之線路層、接地層或電源層以及適當之鍍通孔或/與導通盲孔;當為雙層板結構,該基板主體110之內部可設有上下導通之鍍通孔;當為單層板結構,該基板主體110之內部則不設有金屬層與鍍通孔。通常該基板主體110係為在製造半導體封裝構造之過程中的晶片載板。The substrate body 110 is a main structure of the package substrate 100 and may include at least one core layer such as BT resin, FR-3 resin or FR-4 resin. When the package substrate 100 is a two-layer or more multi-layer board structure, at least one of the circuit layer, the ground layer or the power layer and the appropriate plated through hole or/and the conduction blind hole may be interposed in the substrate body 110; In the layer structure, the inside of the substrate body 110 may be provided with plated through holes that are vertically connected; when it is a single layer plate structure, the inside of the substrate body 110 is not provided with a metal layer and plated through holes. Typically, the substrate body 110 is a wafer carrier during the fabrication of the semiconductor package construction.

該線路層120係形成於該基板主體110之一表面111上,並且該線路層120係包含至少一接墊121。當該表面111係為該半導體封裝構造之一外表面,該接墊121係可為一球墊或是一接觸墊;當該表面111係為該半導體封裝構造之一內表面,該接墊121係可為一接指或一凸塊接墊。該線路層120係可利用壓貼銅箔在圖案化蝕刻達成,或者可利用一圖案化乾膜電鍍形成該線路層120。The circuit layer 120 is formed on one surface 111 of the substrate body 110, and the circuit layer 120 includes at least one pad 121. When the surface 111 is an outer surface of the semiconductor package structure, the pad 121 can be a ball pad or a contact pad; when the surface 111 is an inner surface of the semiconductor package structure, the pad 121 It can be a finger or a bump pad. The circuit layer 120 can be formed by pattern etching using a pressed copper foil, or the wiring layer 120 can be formed by a patterned dry film plating.

該銲罩層130係形成於該基板主體110之該表面111與該線路層120上,該銲罩層130係為電絕緣性的表面保護層,可利用曝光顯影技術形成圖案。該銲罩層130係具有至少一銲罩開口131,其係顯露該接墊121。在本實施例中,該銲罩開口131係可小於該接墊121,以使該接墊121為銲罩界定墊(SMD pad),故在此一墊型態中,該銲罩開口131之偏移程度將會直接影響該接墊121的電性連接位置與接合面積。The solder mask layer 130 is formed on the surface 111 of the substrate body 110 and the circuit layer 120. The solder mask layer 130 is an electrically insulating surface protection layer and can be patterned by exposure and development techniques. The solder mask layer 130 has at least one solder mask opening 131 that exposes the pads 121. In this embodiment, the solder mask opening 131 can be smaller than the pad 121, so that the pad 121 is a solder mask defining pad (SMD pad), so in the pad type, the soldering cap opening 131 The degree of offset will directly affect the electrical connection position and joint area of the pad 121.

其中,該線路層120係更包含至少一檢測墊122,該檢測墊122與該接墊121之距離為固定且表示兩者為同時形成,並且,該銲罩層130係包含有一形狀對應且位置對準該檢測墊122之銲罩島132,該銲罩島132與該銲罩開口131之距離為固定且表示兩者為同時形成,此外,該檢測墊122與該銲罩島132為成對搭配為較宜。以下具體界定為,該檢測墊122與該接墊121之間的中間點距離係為一第一節距D1,該銲罩島132至該銲罩開口131之間的中間點距離係為一第二節距D2,該第一節距D1係等於該第二節距D2,並且該銲罩島132之覆蓋面積係略大於該檢測墊122,以在該銲罩開口131之偏移容許範圍A內完全覆蓋該檢測墊122。依產品設計不同,該銲罩開口131之偏移容許範圍A係可介於0.1~50微米(um),以不大於接墊節距二分之一為宜;例如,當接墊節距為100微米時,該銲罩開口131之偏移容許範圍A係設定為小於50微米的某一數值,例如40微米。The circuit layer 120 further includes at least one detecting pad 122. The distance between the detecting pad 122 and the pad 121 is fixed and indicates that both are formed at the same time, and the solder mask layer 130 includes a shape corresponding position and position. The soldering islands 132 of the detecting pads 122 are aligned, and the distance between the soldering islands 132 and the soldering mask openings 131 is fixed and the two are formed at the same time. Further, the detecting pads 122 are paired with the soldering islands 132. Matching is more appropriate. Specifically, the intermediate point between the detecting pad 122 and the pad 121 is a first pitch D1, and the intermediate point between the welding pad island 132 and the welding cap opening 131 is a first The two pitches D2 are equal to the second pitch D2, and the coverage area of the solder mask island 132 is slightly larger than the detection pad 122 to allow the offset range A of the solder mask opening 131. The detection pad 122 is completely covered inside. Depending on the product design, the tolerance range A of the solder mask opening 131 may be between 0.1 and 50 micrometers (um), preferably not more than one-half of the pitch of the pads; for example, when the pitch of the pads is At 100 microns, the offset allowable range A of the shroud opening 131 is set to a value less than 50 microns, such as 40 microns.

如第2圖所示,該基板主體110係可包含至少一單元區112以及一邊框區113,而該接墊121與該銲罩開口131係可位於該單元區112內,該檢測墊122與該銲罩島132係可位於該邊框區113內。該基板主體110係可為一基板面板,每一單元區112係可構成為一基板條。其中,該單元區112之全部或一部份係為在構成一如半導體封裝構造等電子元件之後該封裝基板被在保留在元件內之部位,該邊框區113則為元件形成後被裁切掉的部位,該邊框區113將未保留在元件內。因此,該檢測墊122與該銲罩島132的設置位置與形狀可更為多樣化,不受元件微小化設計之局限。更具體地,該檢測墊122與該銲罩島132係可位於該邊框區113之一角隅,並且配置數量可為複數組,藉以達到該銲罩層130與該線路層120之尺寸對應檢測。但如僅有某一角隅之檢測墊122局部外露則可以判定為因熱膨脹係數之不同或者是因基板翹曲的不平坦度所造成的兩者尺寸不對應。As shown in FIG. 2, the substrate body 110 can include at least one unit area 112 and a frame area 113, and the pad 121 and the solder mask opening 131 can be located in the unit area 112. The detecting pad 122 is The shroud island 132 can be located within the bezel area 113. The substrate body 110 can be a substrate panel, and each of the unit regions 112 can be configured as a substrate strip. Wherein, all or a part of the unit area 112 is a portion of the package substrate that remains in the element after forming an electronic component such as a semiconductor package structure, and the frame region 113 is cut after the component is formed. The portion of the border area 113 will not remain within the component. Therefore, the position and shape of the detecting pad 122 and the welding shroud island 132 can be more diverse, and the design of the component is not limited. More specifically, the detection pad 122 and the solder mask island 132 may be located at one corner of the frame region 113, and the number of configurations may be a multiple array, thereby achieving detection corresponding to the size of the solder mask layer 130 and the circuit layer 120. However, if only the detection pad 122 of a certain corner is partially exposed, it can be determined that the size of the two is not matched due to the difference in thermal expansion coefficient or the unevenness of the substrate warpage.

如第3圖所示,在本實施例中,該銲罩島132與該檢測墊122係可皆為方形,該銲罩島132係具有一長度L1,等於該檢測墊122之對應長度L2加上兩倍該偏移容許範圍A之和(如第1圖所示),即L1=L2+2A。As shown in FIG. 3, in the embodiment, the soldering island 132 and the detecting pad 122 are both square, and the soldering island 132 has a length L1 equal to the corresponding length L2 of the detecting pad 122. Up to twice the offset allows the sum of the range A (as shown in Figure 1), ie L1 = L2 + 2A.

因此,當該銲罩開口131之實際偏移值B在偏移容許範圍A內時,即第4A圖所示的B<A時,該銲罩島132將完全覆蓋該檢測墊122,該檢測墊122無外露的金屬表面。如第4A與4B圖所示,當該銲罩開口131之實際偏移值B超出該偏移容許範圍A時,具有相同偏移值之該銲罩島132將無法再完全覆蓋該檢測墊122,該檢測墊122會有外露的金屬表面,在本實施例中,該檢測墊122外露金屬表面之形狀係為「1」字形(如第4B圖所示)。故可輕易地以目檢或光學儀器來判斷該銲罩開口131之實際偏移值是否在偏移容許範圍內。Therefore, when the actual offset value B of the shroud opening 131 is within the offset allowable range A, that is, B < A shown in FIG. 4A, the shroud island 132 will completely cover the detecting pad 122. Pad 122 has no exposed metal surface. As shown in FIGS. 4A and 4B, when the actual offset value B of the shroud opening 131 exceeds the offset allowable range A, the shroud island 132 having the same offset value will no longer completely cover the detecting pad 122. The detecting pad 122 has an exposed metal surface. In the embodiment, the exposed metal surface of the detecting pad 122 has a shape of a "1" shape (as shown in FIG. 4B). Therefore, it can be easily judged by visual inspection or optical instrument whether the actual offset value of the welding cap opening 131 is within the tolerance of the offset.

此外,再如第1圖所示,該封裝基板100係可另包含一電鍍層140,其係形成於該接墊121上,通常該電鍍層140係為鎳金層。並且該電鍍層140係不形成於該檢測墊122,當該銲罩開口131相對於該接墊121之偏移量在該偏移容許範圍A內。更具體地,再如第3圖所示,該線路層120係可更包含一電鍍導通線123,其係連接至該檢測墊122。如第4A圖所示,當該銲罩開口131相對於該接墊121之偏移量超過該偏移容許範圍A,該檢測墊122超出該銲罩島132之外露金屬表面將同樣被電鍍上與相同該電鍍層140之材質並同步形成之一多餘電鍍部141,以避免該外露金屬表面之氧化並容易被視覺或光學儀器所感測到。In addition, as shown in FIG. 1 , the package substrate 100 may further include a plating layer 140 formed on the pad 121 . Generally, the plating layer 140 is a nickel gold layer. Moreover, the plating layer 140 is not formed on the detecting pad 122, and the offset of the soldering cap opening 131 with respect to the pad 121 is within the offset allowable range A. More specifically, as shown in FIG. 3, the circuit layer 120 further includes a plating conductive line 123 connected to the detecting pad 122. As shown in FIG. 4A, when the offset of the shroud opening 131 relative to the pad 121 exceeds the offset allowable range A, the exposed pad surface of the detecting pad 122 beyond the shroud island 132 will also be plated. An excess plating portion 141 is formed in synchronization with the material of the plating layer 140 to avoid oxidation of the exposed metal surface and is easily sensed by a visual or optical instrument.

依據本發明之第二較佳實施例,另一種可光學檢測銲罩開口偏移在容許範圍內之封裝基板舉例說明於第5圖之局部截面圖、第6圖之表面示意圖以及第7圖之在一銲罩島處之局部放大示意圖。該封裝基板200與第一具體實施例之封裝基板100相同名稱與作用之元件將沿用相同圖號並不再贅述相同的細部技術內容,該封裝基板200係主要包含一基板主體110、一線路層120、以及一銲罩層130。According to a second preferred embodiment of the present invention, another package substrate capable of optically detecting the opening of the solder mask opening within an allowable range is illustrated in a partial cross-sectional view of FIG. 5, a surface view of FIG. 6, and a seventh diagram. A partial enlarged view of a welded island. The package substrate 200 has the same name and function as the package substrate 100 of the first embodiment, and the same detailed description is omitted. The package substrate 200 mainly includes a substrate body 110 and a circuit layer. 120, and a solder mask layer 130.

如同第一具體實施例所述,該線路層120係形成於該基板主體110之一表面111上,該線路層120係包含至少一接墊121。該銲罩層130係形成於該基板主體110之該表面111與該線路層120上,該銲罩層130係具有至少一銲罩開口131,其係顯露該接墊121。其中,該線路層120係更包含一檢測墊122,並且該銲罩層130係包含有一形狀對應且位置對準該檢測墊122之銲罩島132,該檢測墊122與該接墊121之間的中間點距離係為一第一節距D1,該銲罩島132至該銲罩開口131之間的中間點距離係為一第二節距D2,該第一節距D1係等於該第二節距D2,並且該銲罩島132之覆蓋面積係略大於該檢測墊122,以在該銲罩開口131之偏移容許範圍A內完全覆蓋該檢測墊122。As shown in the first embodiment, the circuit layer 120 is formed on one surface 111 of the substrate body 110. The circuit layer 120 includes at least one pad 121. The solder mask layer 130 is formed on the surface 111 of the substrate body 110 and the circuit layer 120. The solder mask layer 130 has at least one solder mask opening 131 for exposing the pad 121. The circuit layer 120 further includes a detection pad 122, and the solder mask layer 130 includes a solder mask island 132 corresponding to the shape and aligned with the detection pad 122. The detection pad 122 is between the detection pad 122 and the pad 121. The intermediate point distance is a first pitch D1, and the intermediate point distance between the welding shroud island 132 and the shroud opening 131 is a second pitch D2, and the first pitch D1 is equal to the second The pitch D2, and the coverage area of the shroud island 132 is slightly larger than the detection pad 122 to completely cover the detection pad 122 within the offset tolerance range A of the shroud opening 131.

如第6圖所示,該封裝基板200係可為一基板條型態,該基板主體110係包含至少一單元區112以及一邊框區113,而該接墊121與該銲罩開口131係位於該單元區112內,該檢測墊122與該銲罩島133係位於該邊框區113內。每一單元區112係為在構成一如半導體封裝構造等電子元件之後該封裝基板被在保留在元件內之部位。As shown in FIG. 6, the package substrate 200 can be a substrate strip type, the substrate body 110 includes at least one unit region 112 and a frame region 113, and the pad 121 is located with the solder mask opening 131. In the unit area 112, the detecting pad 122 and the soldering cover island 133 are located in the frame area 113. Each of the unit regions 112 is a portion where the package substrate is retained in the element after forming an electronic component such as a semiconductor package structure.

如第7圖所示,更具體地,該銲罩島132係可形成於該銲罩層130之一環槽234內。該銲罩層130係可更具有一連接部233,其係通過該環槽234而連接至該銲罩島132並覆蓋該電鍍導通線123穿過該環槽234之部分,以避免該電鍍導通線123之不當外露。As shown in FIG. 7, more specifically, the shroud island 132 can be formed in one of the annular grooves 234 of the shim layer 130. The solder mask layer 130 may further have a connecting portion 233 connected to the solder mask island 132 through the annular groove 234 and covering a portion of the plating conductive line 123 passing through the annular groove 234 to avoid the plating conduction. The improper line 123 is exposed.

同時再參閱第5與7圖,較佳地,該銲罩島132與該檢測墊122之形狀應與該接墊121之形狀為一致,以真實模擬銲罩開口與其對應顯露接墊之實際偏移程度。例如,當該接墊121為圓形,該銲罩島132與該檢測墊122之形狀係則可皆為圓形,該銲罩島132係具有一直徑R1,其係等於該檢測墊122之對應直徑R2加上兩倍該偏移容許範圍A之和,即R1=R2+2A。Referring to Figures 5 and 7, at the same time, the shape of the solder mask island 132 and the detecting pad 122 should be consistent with the shape of the pad 121 to simulate the actual deviation of the solder mask opening and its corresponding exposed pad. Degree of shift. For example, when the pad 121 is circular, the shape of the solder mask island 132 and the detecting pad 122 may both be circular, and the soldering island 132 has a diameter R1 which is equal to the detecting pad 122. The corresponding diameter R2 is doubled to the sum of the offset allowable ranges A, that is, R1=R2+2A.

因此,當該銲罩開口131之實際偏移值在偏移容許範圍內時,該銲罩島132將完全覆蓋該檢測墊122,該檢測墊122無外露的金屬表面。第9圖則為本實施例的實品在銲罩島處之局部放大照相圖,圖中可見,銲罩島完全覆蓋檢測墊以及該銲罩層之連接部完全覆蓋電鍍導通線之型態。Therefore, when the actual offset value of the shroud opening 131 is within the offset tolerance range, the shroud island 132 will completely cover the test pad 122, and the test pad 122 has no exposed metal surface. Fig. 9 is a partially enlarged photograph of the actual product of the present embodiment at the welding hood island. It can be seen that the welding hood island completely covers the detection pad and the connection portion of the welding hood layer completely covers the pattern of the electroplating conduction line.

如第8圖所示,當該銲罩開口131之實際偏移值B超出該偏移容許範圍A時,具有相同偏移值之該銲罩島132將無法再完全覆蓋該檢測墊122,該檢測墊122會有外露的金屬表面,在本實施例中,該檢測墊122外露金屬表面之形狀係為圓弧形。故可輕易地以目檢或光學儀器來判斷銲罩開口之實際偏移值是否在偏移容許範圍內。此外,當該接墊121之表面形成有一電鍍層140時,該檢測墊122超出該銲罩島132之外露金屬表面亦會有一與該電鍍層140相同材質且同步形成之多餘電鍍部141。As shown in FIG. 8, when the actual offset value B of the shroud opening 131 exceeds the offset allowable range A, the shroud island 132 having the same offset value will no longer completely cover the detecting pad 122. The detecting pad 122 has an exposed metal surface. In the embodiment, the exposed metal surface of the detecting pad 122 has a circular arc shape. Therefore, it can be easily judged by visual inspection or optical instrument whether the actual offset value of the welding cap opening is within the tolerance of the offset. In addition, when a plating layer 140 is formed on the surface of the pad 121, the detecting pad 122 extends beyond the exposed metal surface of the soldering island 132 to have an unnecessary plating portion 141 which is formed of the same material as the plating layer 140 and formed simultaneously.

以上所述,僅是本發明的較佳實施例而已,並非對本發明作任何形式上的限制,雖然本發明已以較佳實施例揭露如上,然而並非用以限定本發明,任何熟悉本項技術者,在不脫離本發明之技術範圍內,所作的任何簡單修改、等效性變化與修飾,均仍屬於本發明的技術範圍內。The above is only a preferred embodiment of the present invention, and is not intended to limit the scope of the present invention. Although the present invention has been disclosed in the above preferred embodiments, it is not intended to limit the present invention. Any simple modifications, equivalent changes and modifications made without departing from the technical scope of the present invention are still within the technical scope of the present invention.

100‧‧‧封裝基板100‧‧‧Package substrate

110‧‧‧基板主體110‧‧‧Substrate body

111‧‧‧表面111‧‧‧ surface

112‧‧‧單元區112‧‧‧Unit area

113‧‧‧邊框區113‧‧‧Border area

120‧‧‧線路層120‧‧‧Line layer

121‧‧‧接墊121‧‧‧ pads

122‧‧‧檢測墊122‧‧‧Test pad

123‧‧‧電鍍導通線123‧‧‧Electroplating conduction line

130‧‧‧銲罩層130‧‧‧welding layer

131‧‧‧銲罩開口131‧‧‧welding opening

132‧‧‧銲罩島132‧‧‧welding island

140‧‧‧電鍍層140‧‧‧Electroplating

141‧‧‧多餘電鍍部141‧‧‧Excess plating department

200‧‧‧封裝基板200‧‧‧Package substrate

233‧‧‧連接部233‧‧‧Connecting Department

234‧‧‧環槽234‧‧‧ Ring groove

A‧‧‧偏移容許範圍A‧‧‧Offset tolerance

B‧‧‧實際偏移量B‧‧‧ actual offset

D1‧‧‧第一節距D1‧‧‧ first pitch

D2‧‧‧第二節距D2‧‧‧second pitch

L1‧‧‧銲罩島之長度Length of L1‧‧‧welding island

L2‧‧‧檢測墊之長度Length of L2‧‧‧ test pad

R1‧‧‧銲罩島之直徑R1‧‧‧diameter of welding island

R2‧‧‧檢測墊之長度R2‧‧‧ length of test pad

第1圖:依據本發明之第一實施例之一種可光學檢測銲罩開口偏移在容許範圍內之封裝基板之局部截面圖。1 is a partial cross-sectional view of a package substrate in which an optically detectable solder mask opening is offset within an allowable range in accordance with a first embodiment of the present invention.

第2圖:依據本發明之第一實施例之該封裝基板之表面示意圖。Figure 2 is a schematic view showing the surface of the package substrate in accordance with the first embodiment of the present invention.

第3圖:依據本發明之第一實施例繪示該封裝基板之表面在一銲罩島處之局部放大示意圖。FIG. 3 is a partially enlarged schematic view showing the surface of the package substrate at a solder mask island according to the first embodiment of the present invention.

第4A與4B圖:依據本發明之第一實施例繪示當一銲罩開口之偏移值超過偏移容許範圍時,該封裝基板之局部截面示意圖與在該銲罩島處之局部表面放大示意圖。4A and 4B are diagrams showing a partial cross-sectional view of the package substrate and a partial surface enlargement at the island of the solder mask when the offset value of the opening of the solder mask exceeds the allowable range of the offset according to the first embodiment of the present invention. schematic diagram.

第5圖:依據本發明之第二實施例之一種可光學檢測銲罩開口偏移在容許範圍內之封裝基板之局部截面圖。Figure 5 is a partial cross-sectional view of a package substrate in which the optical opening of the solder mask is offset within an allowable range in accordance with a second embodiment of the present invention.

第6圖:依據本發明之第二實施例之該封裝基板之表面示意圖。Figure 6 is a schematic view showing the surface of the package substrate in accordance with a second embodiment of the present invention.

第7圖:依據本發明之第二實施例繪示該封裝基板之表面在一銲罩島處之局部放大示意圖。FIG. 7 is a partially enlarged schematic view showing the surface of the package substrate at a solder mask island according to a second embodiment of the present invention.

第8圖:依據本發明之第二實施例繪示當一銲罩開口之偏移值超過偏移容許範圍時,該封裝基板包含在該銲罩島處之局部截面示意圖。FIG. 8 is a partial cross-sectional view showing the package substrate included in the solder mask island when the offset value of a solder mask opening exceeds an offset tolerance range according to the second embodiment of the present invention.

第9圖:依據本發明之第二實施例該封裝基板之表面在該銲罩島處之實物照相圖。Figure 9 is a pictorial view of the surface of the package substrate at the island of the solder mask in accordance with a second embodiment of the present invention.

100...封裝基板100. . . Package substrate

110...基板主體110. . . Substrate body

111...表面111. . . surface

120...線路層120. . . Circuit layer

121...接墊121. . . Pad

122...檢測墊122. . . Test pad

130...銲罩層130. . . Welding mask

131...銲罩開口131. . . Weld cap opening

132...銲罩島132. . . Weld island

140...電鍍層140. . . Plating

141...多餘電鍍部141. . . Excess plating

B...實際偏移量B. . . Actual offset

D1...第一節距D1. . . First pitch

D2...第二節距D2. . . Second pitch

Claims (10)

一種可光學檢測銲罩開口偏移在容許範圍內之封裝基板,包含:一基板主體,係具有一表面;一線路層,係形成於該基板主體之該表面上,該線路層係包含至少一接墊;以及一銲罩層,係形成於該基板主體之該表面與該線路層上,該銲罩層係具有至少一銲罩開口,其係顯露該接墊;其中,該線路層係更包含一檢測墊,並且該銲罩層係包含有一形狀對應且位置對準該檢測墊之銲罩島,該檢測墊與該接墊之間的中間點距離係為一第一節距,該銲罩島至該銲罩開口之間的中間點距離係為一第二節距,該第一節距係等於該第二節距,並且該銲罩島之覆蓋面積係略大於該檢測墊,以在該銲罩開口之偏移容許範圍內完全覆蓋該檢測墊。A package substrate capable of optically detecting a gap of a solder mask opening within an allowable range, comprising: a substrate body having a surface; a circuit layer formed on the surface of the substrate body, the circuit layer comprising at least one a pad; and a solder mask layer formed on the surface of the substrate body and the circuit layer, the solder mask layer having at least one solder mask opening to expose the pad; wherein the circuit layer is further Included as a test pad, and the solder mask layer includes a solder mask island corresponding to the shape and aligned with the test pad, and the intermediate point between the test pad and the pad is a first pitch, the soldering The intermediate point between the hood island and the opening of the welding hood is a second pitch, the first pitch is equal to the second pitch, and the coverage area of the welding hood island is slightly larger than the detecting pad, The test pad is completely covered within the tolerance of the gap of the shroud opening. 依據申請專利範圍第1項之可光學檢測銲罩開口偏移在容許範圍內之封裝基板,其中該線路層係更包含一電鍍導通線,其係連接至該檢測墊。According to the scope of claim 1, the package substrate can be optically detected to be within an allowable range of the solder mask opening, wherein the circuit layer further comprises an electroplating conductive line connected to the detecting pad. 依據申請專利範圍第2項之可光學檢測銲罩開口偏移在容許範圍內之封裝基板,另包含一電鍍層,其係形成於該接墊上,並且該電鍍層係不形成於該檢測墊,當該銲罩開口相對於該接墊之偏移量在該偏移容許範圍內。The package substrate capable of optically detecting that the opening of the solder mask is offset within an allowable range according to the second aspect of the patent application, further comprising a plating layer formed on the pad, and the plating layer is not formed on the detecting pad. The offset of the shroud opening relative to the pad is within the tolerance of the offset. 依據申請專利範圍第2項之可光學檢測銲罩開口偏移在容許範圍內之封裝基板,其中該銲罩島係形成於該銲罩層之一環槽內。According to the scope of claim 2, the package substrate can be optically detected to be within an allowable range of the solder mask opening, wherein the solder mask island is formed in one of the ring grooves of the solder mask layer. 依據申請專利範圍第4項之可光學檢測銲罩開口偏移在容許範圍內之封裝基板,其中該銲罩層係更具有一連接部,其係通過該環槽而連接至該銲罩島並覆蓋該電鍍導通線穿過該環槽之部分。According to claim 4, the package substrate can be optically detected to be within an allowable range of the solder mask opening, wherein the solder mask layer further has a connecting portion connected to the solder mask island and covered by the ring groove. The plated conductive wire passes through a portion of the ring groove. 依據申請專利範圍第1項之可光學檢測銲罩開口偏移在容許範圍內之封裝基板,其中該銲罩島與該檢測墊係皆為方形,該銲罩島係具有一長度等於該檢測墊之對應長度加上兩倍該偏移容許範圍之和。According to the first aspect of the patent application, the package substrate can be optically detected to be within an allowable range of the solder mask opening, wherein the solder mask island and the detection pad are both square, and the solder mask island has a length equal to the detection pad. The corresponding length is doubled to the sum of the allowable ranges of the offset. 依據申請專利範圍第1項之可光學檢測銲罩開口偏移在容許範圍內之封裝基板,其中該銲罩島與該檢測墊係皆為圓形,該銲罩島係具有一直徑等於該檢測墊之對應直徑加上兩倍該偏移容許範圍之和。According to claim 1, the optically detectable solder mask opening is offset within an allowable range, wherein the solder mask island and the detection pad are both circular, and the solder mask island has a diameter equal to the detection. The corresponding diameter of the pad plus twice the sum of the allowable ranges of the offset. 依據申請專利範圍第1項之可光學檢測銲罩開口偏移在容許範圍內之封裝基板,其中該基板主體係包含至少一單元區以及一邊框區,而該接墊與該銲罩開口係位於該單元區內,該檢測墊與該銲罩島係位於該邊框區內。The package substrate according to the first aspect of the patent application, wherein the solder mask opening is offset within an allowable range, wherein the substrate main system comprises at least one unit area and a frame area, and the pad is located with the solder mask opening In the unit area, the detecting pad and the welding hood island are located in the frame area. 依據申請專利範圍第6項之可光學檢測銲罩開口偏移在容許範圍內之封裝基板,其中該檢測墊與該銲罩島係位於該邊框區之一角隅。According to the sixth aspect of the patent application, the package substrate can be optically detected to be within an allowable range of the solder mask opening, wherein the detecting pad and the solder mask island are located at a corner of the frame region. 依據申請專利範圍第1項之可光學檢測銲罩開口偏移在容許範圍內之封裝基板,其中該銲罩開口係小於該接墊,以使該接墊為銲罩界定墊(SMD pad)。According to the scope of claim 1, the package substrate can be optically detected to be within an allowable range of the solder mask opening, wherein the solder mask opening is smaller than the pad so that the pad is a solder mask defining pad (SMD pad).
TW100143648A 2011-11-29 2011-11-29 Package substrate for optically detecting opening shift of solder mask within tolerance range TWI473230B (en)

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TW200614477A (en) * 2004-10-26 2006-05-01 Advanced Semiconductor Eng Substrate for flip-chip package
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TW200507195A (en) * 2003-08-01 2005-02-16 Advanced Semiconductor Eng Substrate with reinforced structure of contact pad
TW200614477A (en) * 2004-10-26 2006-05-01 Advanced Semiconductor Eng Substrate for flip-chip package
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